sensor

Abstract

To provide a sensor capable of improving its characteristics. [Solution] According to the embodiment, the sensor includes a first element portion. The first element portion includes an element member, a first electrode including a first side portion, a second electrode including a second side portion, and an oxide member including a first oxide portion. The element member includes a first element layer, a first convex portion provided on the first element layer and projecting in a first direction, and a second convex portion provided on the first element layer and projecting in the first direction. The second direction from the first convex portion to the second convex portion intersects with the first direction. The first oxide portion is located between the first convex portion and the second convex portion. The first side portion is located between the first convex portion and the first oxide portion. The second side portion is located between the first oxide portion and the second convex portion.

Description

Technical Field

[0006] ,

[0004] , , ,

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[0001] Embodiments of the present invention relate to sensors.

Background Art

[0002] For example, there are sensors that detect detection targets such as gases. In sensors, improvement in characteristics is desired.

Prior Art Documents

Patent Documents

[0003]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0004] Embodiments of the present invention provide a sensor capable of improving characteristics.

Means for Solving the Problems

[0005] According to an embodiment of the present invention, a sensor includes a first element portion. The first element portion includes an element member, a first electrode including a first side portion, a second electrode including a second side portion, and an oxide member including a first oxide portion. The element member includes a first element layer, a first convex portion provided on the first element layer and protruding in a first direction, and a second convex portion provided on the first element layer and protruding in the first direction. A second direction from the first convex portion to the second convex portion intersects the first direction. The first oxide portion is between the first convex portion and the second convex portion. The first side portion is between the first convex portion and the first oxide portion. The second side portion is between the first oxide portion and the second convex portion.

Brief Description of the Drawings

[0006] [Figure 1] FIG. 1(a) and FIG. 1(b) are schematic cross-sectional views illustrating a sensor according to a first embodiment. [Figure 2] Figure 2 is a schematic plan view illustrating a sensor according to the first embodiment. [Figure 3] Figure 3 is a schematic cross-sectional view illustrating a part of the sensor according to the first embodiment. [Figure 4] Figure 4 is a schematic cross-sectional view illustrating a sensor according to the second embodiment. [Figure 5] Figure 5 is a schematic cross-sectional view illustrating a sensor according to the second embodiment. [Figure 6] Figure 6 is a schematic cross-sectional view illustrating a sensor according to the second embodiment. [Modes for carrying out the invention]

[0007] The embodiments of the present invention will be described below with reference to the drawings. Drawings are schematic or conceptual, and the relationships between the thickness and width of each part, as well as the ratios of the sizes of different parts, are not necessarily identical to those of reality. Even when representing the same part, the dimensions and ratios may differ between drawings. In this specification and in each figure, elements similar to those described above are denoted by the same reference numerals with respect to previously shown figures, and detailed explanations are omitted as appropriate.

[0008] (First Embodiment) Figures 1(a) and 1(b) are schematic cross-sectional views illustrating a sensor according to the first embodiment. Figure 2 is a schematic plan view illustrating a sensor according to the first embodiment. Figure 1(a) corresponds to the section view along line A1-A2 in Figure 2. Figure 2(b) corresponds to the section view along line B1-B2 in Figure 2. Figure 3 is a schematic cross-sectional view illustrating a part of the sensor according to the first embodiment. As shown in Figures 1(a), 1(b), and 2, the sensor 110 according to this embodiment includes a first element section 10A.

[0009] The first element portion 10A includes an element member 20M, a first electrode 11, a second electrode 12, and an oxide member 40. The first electrode 11 includes a first side portion 11s. The second electrode 12 includes a second side portion 12s. The oxide member 40 includes a first oxide portion 40a.

[0010] The element member 20M includes a first element layer 21L, a first protrusion 21, and a second protrusion 22. The first protrusion 21 is provided on the first element layer 21L and protrudes in a first direction D1. The second protrusion 22 is provided on the first element layer 21L and protrudes in a first direction D1.

[0011] The first direction D1 is defined as the Z-axis direction. One direction perpendicular to the Z-axis direction is defined as the X-axis direction. The direction perpendicular to both the Z-axis and X-axis directions is defined as the Y-axis direction.

[0012] The first element layer 21L is aligned with the XY plane. The first element layer 21L is, for example, layered. The first element layer 21L is, for example, membrane-like. The first element layer 21L is, for example, insulating.

[0013] The second direction D2 from the first protrusion 21 to the second protrusion 22 intersects with the first direction D1. The second direction D2 is, for example, the X-axis direction.

[0014] The first oxide portion 40a is located between the first protrusion 21 and the second protrusion 22. The first side portion 11s is located between the first protrusion 21 and the first oxide portion 40a. The second side portion 12s is located between the first oxide portion 40a and the second protrusion 22.

[0015] In the sensor 110, the first electrode 11 and the second electrode 12 are configured such that the electrical resistance between the first electrode 11 and the second electrode 12 changes depending on the first detection target around the first element portion 10A.

[0016] In sensor 110, the first electrode 11 is spatially separated from the second electrode 12. An oxide member 40 is provided in at least a part of the region between the first electrode 11 and the second electrode 12. The characteristics of the oxide contained in the oxide member 40 change according to the first detection target existing around the first element part 10A. According to the change in the characteristics of the oxide, the electrical resistance between the first electrode 11 and the second electrode 12 changes according to the first detection target. By detecting the change in the electrical resistance, the first detection target can be detected. The first detection target is, for example, a gas or a liquid. The first detection target may, for example, contain hydrogen. The sensor 110 may be, for example, a gas sensor.

[0017] In sensor 110, electrodes are provided on the respective side surfaces of the two convex portions. The two electrodes can face each other with a wide area in the second direction D2. Thereby, the electrical resistance between the two electrodes changes with high sensitivity with respect to the change in the characteristics of the oxide member 40 according to the change in the first detection target. According to the embodiment, a sensor with improved characteristics can be provided.

[0018] For example, a reference example in which two electrode layers are provided on a flat element layer can be considered. In this case, the oxide member 40 is provided between the side surfaces of the two electrode layers. When the two electrode layers are thin, it is difficult to obtain high sensitivity because the amount of the oxide member 40 located between the two electrode layers is small. On the other hand, when the two electrode layers are thick, the formation and processing of the electrode layers become difficult and the cost increases.

[0019] In the embodiment, electrode layers are provided on the respective side surfaces of the plurality of convex portions. The electrode layers may be thin. In the embodiment, the formation and processing of the electrode layers are easy, and high sensitivity can be obtained.

[0020] As shown in FIG. 3, the first convex portion 21 includes a first side surface 21s that intersects the second direction D2. The second convex portion 22 includes a second side surface 22s that intersects the second direction D2. The first side portion 11s is provided on the first side surface 21s. The second side portion 12s is provided on the second side surface 22s.

[0021] As shown in Figure 3, the first protrusion 21 may further include a first vertex region 21a. The second protrusion 22 may further include a second vertex region 22a. The first electrode 11 may further include a first vertex portion 11a provided in the first vertex region 21a. The second electrode 12 may further include a second vertex portion 12a provided in the second vertex region 22a.

[0022] As shown in Figure 3, the first electrode 11 may further include a first other side portion 11r. The second electrode 12 may further include a second other side portion 12r. At least a portion of the first protrusion 21 may be provided between the first other side portion 11r and the first side portion 11s in the second direction D2. At least a portion of the second protrusion 22 may be provided between the second side portion 12s and the second other side portion 12r in the second direction D2.

[0023] As shown in Figure 3, the first element layer 21L may include a first non-overlapping region 20c. The first non-overlapping region 20c does not overlap with the first protrusion 21 in the first direction D1. The first non-overlapping region 20c does not overlap with the second protrusion 22 in the first direction D1. The direction from a part of the first non-overlapping region 20c to a part of the first electrode 11 may be along the first direction D1. A part of the first electrode 11 may be provided on the first non-overlapping region 20c.

[0024] The first element layer 21L may include a first superimposed region 20a and a second superimposed region 20b. The first superimposed region 20a overlaps with the first protrusion 21 in the first direction D1. The second superimposed region 20b overlaps with the second protrusion 22 in the first direction D1. A first non-superimposed region 20c is provided between the first superimposed region 20a and the second superimposed region 20b.

[0025] As shown in Figure 3, the first height H1 of the first protrusion 21 is greater than the first thickness t1 along the second direction D2 of the first side portion 11s. A sufficiently high first protrusion 21 allows for a large area of ​​the first side portion 11s, making it easier to obtain high sensitivity.

[0026] The first height H1 can be, for example, 5 times or more the first thickness t1. High sensitivity can be obtained. The first height H1 can also be, for example, 20 times or less the first thickness t1. A practical first element section 10A can be obtained.

[0027] The first thickness t1 corresponds to the thickness of the first electrode 11. The first thickness t1 may be, for example, between 1 nm and 200 nm. The first height H1 may be, for example, between 10 nm and 1 μm.

[0028] As shown in Figure 3, the length of the first side portion 11s along the first direction D1 is defined as the first side portion length Lz1. The first side portion length Lz1 is longer than the first thickness t1.

[0029] As shown in Figure 3, the oxide member 40 includes a plurality of first particles 41. The plurality of first particles 41 include an oxide. The oxide includes at least one selected from the group consisting of tin, zinc, tungsten, molybdenum, and indium, and oxygen. The average diameter of the plurality of first particles 41 may be, for example, 10 nm to 500 nm.

[0030] The oxide member 40 may contain a plurality of second particles 42. The plurality of second particles 42 may include, for example, at least one selected from the group consisting of platinum, gold, silver, copper, palladium, aluminum, and titanium nitride. By providing a plurality of second particles 42, for example, high sensitivity can be easily obtained. The plurality of second particles 42 may function as a catalyst, for example. The oxide member 40 may contain a resin. The resin may be, for example, a polymer.

[0031] At least one of the first electrode 11 and the second electrode 12 may contain at least one selected from the group consisting of platinum, gold, silver, copper, palladium, aluminum, and titanium nitride. For example, the surface portions of these electrodes may contain at least one selected from the group consisting of platinum, gold, silver, copper, palladium, aluminum, and titanium nitride. These materials may function, for example, as catalysts. The region containing these materials may be in contact with the oxide member 40. High sensitivity is easily obtained.

[0032] As shown in Figure 3, the element member 20M may further include a first conductive layer 51. At least a portion of the first conductive layer 51 lies between a portion of the first protrusion 21 and another portion of the first protrusion 21 in the second direction D2. The first conductive layer 51 is embedded in the first protrusion 21. For example, an insulating film may be formed so as to cover the first conductive layer 51, and this insulating film may become the first protrusion 21.

[0033] Another portion of the first conductive layer 51 may be located between a portion of the second protrusion 22 and another portion of the second protrusion 22 in the second direction D2. The other portion of the first conductive layer 51 is embedded in the second protrusion 22. For example, an insulating film may be formed to cover this other portion of the first conductive layer 51, and this insulating film may become the second protrusion 22. The first conductive layer 51 may have a meander shape in the XY plane.

[0034] The element member 20M may further include a first non-conductive layer 51a. At least a portion of the first non-conductive layer 51a may overlap with the first conductive layer 51 in the first direction D1. The first non-conductive layer 51a may have a meander shape in the XY plane.

[0035] As shown in Figure 1, the sensor 110 may further include a first circuit 71. The first circuit 71 may be configured to supply power to the first conductive layer 51. For example, the first conductive layer 51 may function as a heater. The first circuit 71 may be configured to supply power to the first other conductive layer 51a. The heat from the first conductive layer 51 is efficiently transferred to the oxide member 40. Higher sensitivity detection is possible.

[0036] As shown in Figure 2, the first electrode 11 may extend along the third direction D3. The second electrode 12 may extend along the third direction D3. The third direction D3 intersects with the first direction D1 and the second direction D2. The third direction D3 is, for example, the Y-axis direction.

[0037] The first element section 10A may include a plurality of first electrodes 11 and a plurality of second electrodes 12. One of the plurality of first electrodes 11 is located between one of the plurality of second electrodes 12 and another of the plurality of second electrodes 12. One of the plurality of second electrodes 12 is located between one of the plurality of first electrodes 11 and another of the plurality of first electrodes 11. The first electrodes 11 and the second electrodes 12 may be arranged alternately. A first electrode connection section 11T for electrically connecting the plurality of first electrodes 11 may be provided. A second electrode connection section 12T for electrically connecting the plurality of second electrodes 12 may be provided. The plurality of first electrodes 11 and the plurality of second electrodes 12 may form a comb-shaped electrode.

[0038] A first protrusion 21 is provided corresponding to each of the multiple first electrodes 11. A second protrusion 22 is provided corresponding to each of the multiple second electrodes 12.

[0039] As shown in Figure 1, the sensor 110 further includes a substrate 50s. The first element portion 10A further includes a first fixing portion 31a. The first fixing portion 31a is fixed to the substrate 50s. The first element layer 21L is supported by the first fixing portion 31a. There is a first void g1 between the substrate 50s and the first element layer 21L. The first element portion 10A has, for example, a MEMS (Micro Electro Mechanical Systems) structure.

[0040] As shown in Figure 2, the first element portion 10A may further include a second fixing portion 31b, a third fixing portion 31c, and a fourth fixing portion 31d in addition to the first fixing portion 31a. These fixing portions are fixed to the substrate 50s. In the example of Figure 2, the direction from the first fixing portion 31a to the second fixing portion 31b is along the second direction D2. In the example of Figure 2, the direction from the third fixing portion 31c to the fourth fixing portion 31d is along the third direction D3. These fixing portions indicate the first element layer 21L.

[0041] As shown in Figure 2, the first element section 10A may further include a first connection section 31p, a second connection section 31q, a third connection section 31r, and a fourth connection section 31s. The first connection section 31p is supported by the first fixed section 31a and supports the first element layer 21L. The second connection section 31q is supported by the second fixed section 31b and supports the first element layer 21L. The third connection section 31r is supported by the third fixed section 31c and supports the first element layer 21L. The fourth connection section 31s is supported by the fourth fixed section 31d and supports the first element layer 21L. These connection sections may have a meander structure.

[0042] (Second Embodiment) The sensor according to the second embodiment includes a plurality of element sections.

[0043] Figure 4 is a schematic cross-sectional view illustrating a sensor according to the second embodiment. As shown in Figure 4, the sensor 111 according to this embodiment includes a second element section 10B in addition to the first element section 10A.

[0044] The second element section 10B includes a second element layer 22L and a second conductive layer 62 fixed to the second element layer 22L. A second gap g2 is provided between the substrate 50s and the second element layer 22L. For example, the electrical resistance of the second conductive layer 62 changes according to the flow velocity of the second detection target around the second element section 10B. The first conductive layer height h1 of the first conductive layer 51 relative to the substrate 50s is substantially the same as the second conductive layer height h2 of the second conductive layer 62 relative to the substrate 50s.

[0045] For example, the first conductive layer 51 may be formed from a material that will become the second conductive layer 62. A protrusion (such as the first protrusion 21) can be obtained by a simple process.

[0046] The second element section 10B may further include a second non-conductive layer 62a. The second conductive layer 62 is fixed to the second element layer 22L. Power may be supplied to the second non-conductive layer 62a. The second non-conductive layer 62a may function as a heater. The first non-conductive layer 51a may be formed from the material that becomes the second non-conductive layer 62a.

[0047] Figure 5 is a schematic cross-sectional view illustrating a sensor according to the second embodiment. As shown in Figure 5, the sensor 112 according to this embodiment includes a third element section 10C in addition to the first element section 10A.

[0048] The third element section 10C includes a fixed electrode 63E, a third element layer 23L, a third element support section 33s, a third conductive layer 63, and a third other conductive layer 63a. The fixed electrode 63E is fixed to the substrate 50s. The third element support section 33s is fixed to the substrate 50s and supports the third element layer 23L. The third conductive layer 63 is fixed to the third element layer 23L. The third other conductive layer 63a is fixed to the third element layer 23L.

[0049] At least a portion of the third conductive layer 63a is located between the fixed electrode 63E and the third conductive layer 63. A third gap g3 is provided between the fixed electrode 63E and the third element layer 23L.

[0050] For example, the capacitance between the fixed electrode 63E and the third non-conductive layer 63a changes according to the state of the third detection target around the third element 10C. The third element 10C is, for example, a capacitance-changing type sensor.

[0051] At least a portion of the first conductive layer 51 is the same as at least a portion of the third conductive layer 63. The first conductive layer 51 may be formed from the material that will become the third conductive layer 63.

[0052] As shown in Figure 5, the third element section 10C may include a third element characteristic changing layer 33L. The third element characteristic changing layer 33L is fixed to the third element support section 33s. For example, the volume of the third element characteristic changing layer 33L changes depending on the state of the third detection target. This may cause the position of the third element layer 23L in the first direction D1 to change. This may cause the capacitance to change. The third element characteristic changing layer 33L may include, for example, at least one selected from the group consisting of platinum, palladium, and titanium.

[0053] Figure 6 is a schematic cross-sectional view illustrating a sensor according to the second embodiment. As shown in Figure 6, the sensor 113 according to this embodiment includes a fourth element section 10D in addition to the first element section 10A.

[0054] The fourth element section 10D includes a fourth element layer 24L and a fourth conductive layer 64 fixed to the fourth element layer 24L. A fourth gap g4 is provided between the substrate 50s and the fourth element layer 24L. The electrical resistance of the fourth conductive layer 64 changes according to the state of the fourth detection target around the fourth element section 10D. The first conductive layer height h1 of the first conductive layer 51 relative to the substrate 50s may be substantially the same as the fourth conductive layer height h4 of the fourth conductive layer 64 relative to the substrate 50s. For example, the first conductive layer 51 may be formed from the material that will become the fourth conductive layer 64. A protrusion (such as the first protrusion 21) can be obtained by a simple process.

[0055] As shown in Figure 6, the fourth element section 10D may include a fourth element characteristic changing layer 34L. The fourth conductive layer 64 is located between the substrate 50s and the fourth element characteristic changing layer 34L. For example, the fourth element characteristic changing layer 34L changes depending on the state of the fourth detection target. This may cause the electrical resistance of the fourth conductive layer 64 to change. The fourth element section 10D is, for example, a catalytic combustion type sensor. The fourth element characteristic changing layer 34L may include, for example, at least one selected from the group consisting of palladium, platinum, silver, and rhodium.

[0056] The embodiments may include the following technical proposals. (Technical proposal 1) It comprises a first element section, The first element section is, Element component and A first electrode including the first side portion, The second electrode includes the second side portion, An oxide member containing a first oxide portion, Includes, The element member is The first element layer, A first protrusion is provided on the first element layer and protrudes in a first direction, A second protrusion is provided on the first element layer and protrudes in the first direction, Includes, The second direction from the first protrusion to the second protrusion intersects with the first direction, The first oxide portion is located between the first protrusion and the second protrusion. The first side portion is located between the first protrusion and the first oxide portion. The second side portion is a sensor located between the first oxide portion and the second protrusion.

[0057] (Technical proposal 2) The first protrusion includes a first surface that intersects with the second direction, The second protrusion includes a second surface that intersects the second direction, The first side portion is provided on the first side surface, The second side portion is the sensor described in Technical Proposal 1, which is provided on the second side.

[0058] (Technical proposal 3) The first convex portion further includes a first vertex region, The second protrusion further includes a second vertex region, The first electrode further includes a first apex portion provided in the first apex region, The sensor according to Technical Proposal 2, wherein the second electrode further includes a second vertex portion provided in the second vertex region.

[0059] (Technical proposal 4) The first electrode further includes a first other side portion, The second electrode further includes a second other-side portion, At least a portion of the first protrusion is located between the first other side portion and the first side portion in the second direction. At least a portion of the second protrusion is located between the second side portion and the second other side portion in the second direction, as described in any one of Technical Proposals 1 to 3.

[0060] (Technical proposal 5) The sensor according to any one of Technical Proposals 1 to 4, wherein the first height of the first protrusion is greater than the first thickness of the first side portion along the second direction.

[0061] (Technical proposal 6) The sensor according to Technical Proposal 5, wherein the first height is five times or more the first thickness.

[0062] (Technical proposal 7) The sensor according to any one of Technical Proposals 1 to 4, wherein the length of the first side portion along the first direction of the first side portion is longer than the first thickness along the second direction of the first side portion.

[0063] (Technical proposal 8) The aforementioned first element layer includes a first non-superposition region, The first non-overlapping region does not overlap with the first protrusion in the first direction. The sensor according to any one of Technical Proposals 1 to 7, wherein the direction from a portion of the first non-superimposed region to a portion of the first electrode is along the first direction.

[0064] (Technical proposal 9) The sensor according to any one of the technical proposals 1 to 8, wherein the first electrode and the second electrode are configured such that the electrical resistance between the first electrode and the second electrode changes depending on a first detection target around the first element portion.

[0065] (Technical proposal 10) The oxide member comprises a plurality of first particles containing oxide, The oxide comprises at least one selected from the group consisting of tin, zinc, tungsten, molybdenum, and indium, and oxygen. The sensor according to any one of Technical Proposals 1 to 9, wherein at least one of the first electrode and the second electrode includes at least one selected from the group consisting of platinum, gold, silver, copper, palladium, aluminum, and titanium nitride.

[0066] (Technical proposal 11) The first electrode extends along a third direction intersecting the first and second directions, The second electrode extends along the third direction, as described in any one of the technical proposals 1 to 10.

[0067] (Technical proposal 12) The first element portion includes a plurality of first electrodes and a plurality of second electrodes, One of the plurality of first electrodes is located between one of the plurality of second electrodes and another of the plurality of second electrodes. One of the plurality of second electrodes is located between one of the plurality of first electrodes and another of the plurality of first electrodes. Each of the plurality of first electrodes is provided with the first protrusion, The sensor according to any one of the technical proposals 1 to 11, wherein the second protrusion is provided corresponding to each of the plurality of second electrodes.

[0068] (Technical proposal 13) The element member further includes a first conductive layer, The sensor according to any one of the technical proposals 1 to 12, wherein at least a portion of the first conductive layer is located between a portion of the first protrusion and another portion of the first protrusion in the second direction.

[0069] (Technical proposal 14) The first conductive layer is embedded in the first protrusion, as described in Technical Proposal 13.

[0070] (Technical proposal 15) The element member further includes a first non-conductive layer, The sensor according to technical proposal 13 or 14, wherein at least a portion of the first conductive layer overlaps with the first conductive layer in the first direction.

[0071] (Technical proposal 16) The sensor according to any one of the technical proposals 13 to 15, further comprising a first circuit configured to supply power to the first conductive layer.

[0072] (Technical proposal 17) Further comprising a base, The first element portion further includes a first fixing portion fixed to the substrate, The first element layer is supported by the first fixing portion, A sensor according to any one of the technical proposals 13 to 16, wherein there is a first void between the substrate and the first element layer.

[0073] (Technical proposal 18) Further comprising a second element section, The second element section is, The second element layer, A second conductive layer fixed to the second element layer, Includes, A second gap is provided between the substrate and the second element layer. The electrical resistance of the second conductive layer changes according to the flow velocity of the second detection target around the second element portion. The sensor according to Technical Proposal 17, wherein the first conductive layer height of the first conductive layer relative to the substrate is substantially the same as the second conductive layer height of the second conductive layer relative to the substrate.

[0074] (Technical proposal 19) Further comprising a third element section, The third element section is, A fixed electrode fixed to the substrate, The third element layer, A third element support portion fixed to the substrate and supporting the third element layer, A third conductive layer fixed to the third element layer, A third non-conductive layer fixed to the third element layer, Includes, At least a portion of the third conductive layer is located between the fixed electrode and the third conductive layer. A third gap is provided between the fixed electrode and the third element layer. The capacitance between the fixed electrode and the third non-conductive layer changes according to the state of the third detection target around the third element portion. The sensor according to Technical Proposal 17, wherein at least a portion of the first material of the first conductive layer is the same as at least a portion of the third material of the third conductive layer.

[0075] (Technical proposal 20) Further comprising a fourth element section, The fourth element section is, The fourth element layer, A fourth conductive layer fixed to the fourth element layer, Includes, A fourth gap is provided between the substrate and the fourth element layer. The electrical resistance of the fourth conductive layer changes according to the state of the fourth detection target around the fourth element portion. The sensor according to Technical Proposal 17, wherein the first conductive layer height of the first conductive layer relative to the substrate is substantially the same as the fourth conductive layer height of the fourth conductive layer relative to the substrate.

[0076] According to the embodiment, a sensor capable of improving characteristics is provided.

[0077] In this specification, "electrically connected state" includes a state in which multiple conductors are physically in contact and an electric current flows between them. "Electrically connected state" also includes a state in which another conductor is inserted between multiple conductors and an electric current flows between them.

[0078] The embodiments of the present invention have been described above with reference to specific examples. However, the present invention is not limited to these specific examples. For example, the specific configuration of each element included in the sensor, such as the element part, element layer, electrode, oxide member, substrate, fixing part, and connecting part, is included within the scope of the present invention as long as those skilled in the art can appropriately select from the known range to implement the present invention in the same way and obtain the same effects.

[0079] Furthermore, combinations of two or more elements from any of the specific examples, to the extent technically feasible, are also included within the scope of the present invention, insofar as they encompass the gist of the invention.

[0080] Furthermore, all sensors that can be implemented by those skilled in the art by appropriately modifying the design based on the sensors described above as embodiments of the present invention also fall within the scope of the present invention, insofar as they encompass the gist of the present invention.

[0081] Furthermore, within the scope of the concept of the present invention, a person skilled in the art could conceive of various modifications and alterations, and these modifications and alterations are also understood to fall within the scope of the present invention.

[0082] While several embodiments of the present invention have been described, these embodiments are presented as examples only and are not intended to limit the scope of the invention. These novel embodiments can be carried out in a variety of other forms, and various omissions, substitutions, and modifications can be made without departing from the spirit of the invention. These embodiments and their variations are included in the scope and spirit of the invention, as well as in the claims of the invention and its equivalents. [Explanation of symbols]

[0083] 10A~10D: 1st to 4th element sections, 11, 12: 1st and 2nd electrodes, 11T, 12T: 1st and 2nd connection sections, 11a, 12a: 1st and 2nd apex sections, 11r, 12r: 1st and 2nd other side sections, 11s, 12s: 1st and 2nd side sections, 20M: element material, 20a, 20b: 1st and 2nd superimposed regions, 20c: 1st non-superimposed region, 21, 22: 1st and 2nd convex sections, 21L~24L: 1st to 4th element layers, 21a, 22a: 1st and 2nd apex regions, 21s, 22s: 1st and 2nd side surfaces, 31a~31d: 1st to 4th fixing sections, 31p~31s: 1st to 4th connection sections, 33L, 34L: Third and fourth element characteristic change layers, 33s: Third element support part, 40: Oxide material, 40a: First oxide portion, 41, 42: First and second particles, 50s: Substrate, 51: First conductive layer, 51a: First other conductive layer, 62~64: Second to fourth conductive layers, 62a, 63a: Second and third other conductive layers, 63E: Fixed electrode, 71: First circuit, 110~113: Sensor, D1~D3: First to third directions, H1: First height, Lz1: First side portion length, g1~g4: First to fourth voids, h1, h2, h4: First, second, and fourth conductive layer heights, t1: First thickness

Claims

1. It comprises a first element section, The first element section is, Element component and A first electrode including the first side portion, The second electrode includes the second side portion, An oxide member containing a first oxide portion, Includes, The element member is The first element layer, A first protrusion is provided on the first element layer and protrudes in a first direction, A second protrusion is provided on the first element layer and protrudes in the first direction, Includes, The second direction from the first protrusion to the second protrusion intersects with the first direction. The first oxide portion is located between the first protrusion and the second protrusion. The first side portion is located between the first protrusion and the first oxide portion. The second side portion is a sensor located between the first oxide portion and the second protrusion.

2. The sensor according to claim 1, wherein the first height of the first protrusion is greater than the first thickness of the first side portion along the second direction.

3. The first element layer includes a first non-superposition region, The first non-overlapping region does not overlap with the first protrusion in the first direction. The sensor according to claim 1 or 2, wherein the direction from a portion of the first non-overlapping region to a portion of the first electrode is along the first direction.

4. The sensor according to claim 1 or 2, wherein the first electrode and the second electrode are configured such that the electrical resistance between the first electrode and the second electrode changes depending on the first detection target around the first element portion.

5. The oxide member comprises a plurality of first particles containing oxide, The oxide comprises at least one selected from the group consisting of tin, zinc, tungsten, molybdenum, and indium, and oxygen. The sensor according to claim 1 or 2, wherein at least one of the first electrode and the second electrode includes at least one selected from the group consisting of platinum, gold, silver, copper, palladium, aluminum, and titanium nitride.

6. The element member further includes a first conductive layer, The sensor according to claim 1 or 2, wherein at least a portion of the first conductive layer is located between a portion of the first protrusion and another portion of the first protrusion in the second direction.

7. Further comprising a base, The first element portion further includes a first fixing portion fixed to the substrate, The first element layer is supported by the first fixing portion, The sensor according to claim 6, wherein there is a first void between the substrate and the first element layer.

8. Further comprising a second element section, The second element section is, The second element layer, A second conductive layer fixed to the second element layer, Includes, A second gap is provided between the substrate and the second element layer. The electrical resistance of the second conductive layer changes according to the flow velocity of the second detection target around the second element portion. The sensor according to claim 7, wherein the first conductive layer height of the first conductive layer relative to the substrate is substantially the same as the second conductive layer height of the second conductive layer relative to the substrate.

9. Further comprising a third element section, The third element section is, A fixed electrode fixed to the substrate, The third element layer, A third element support portion fixed to the substrate and supporting the third element layer, A third conductive layer fixed to the third element layer, A third non-conductive layer fixed to the third element layer, Includes, At least a portion of the third conductive layer is located between the fixed electrode and the third conductive layer. A third gap is provided between the fixed electrode and the third element layer. The capacitance between the fixed electrode and the third non-conductive layer changes according to the state of the third detection target around the third element portion. The sensor according to claim 7, wherein at least a portion of the first material of the first conductive layer is the same as at least a portion of the third material of the third conductive layer.

10. Further comprising a fourth element section, The fourth element section is, The fourth element layer, A fourth conductive layer fixed to the fourth element layer, Includes, A fourth gap is provided between the substrate and the fourth element layer. The electrical resistance of the fourth conductive layer changes according to the state of the fourth detection target around the fourth element portion. The sensor according to claim 7, wherein the first conductive layer height of the first conductive layer relative to the substrate is substantially the same as the fourth conductive layer height of the fourth conductive layer relative to the substrate.

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