Imprint apparatus, imprint method, exposure apparatus, and method for manufacturing articles
The imprint apparatus forms protective patterns on alignment marks using controlled light irradiation to minimize substrate area and maintain alignment precision, addressing the challenges of overlapping mark deformation and cost in existing techniques.
JP2026105672APending Publication Date: 2026-06-26CANON KK
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- CANON KK
- Filing Date
- 2024-12-16
- Publication Date
- 2026-06-26
Smart Images
Figure 2026105672000001_ABST
Abstract
This technology minimizes the area of overlapping marks on the circuit board during imprinting. [Solution] After an imprint process in which a resin 19 pattern is formed on the substrate 11 using a mold 50, the control unit 7 causes the coating unit 12 to apply the resin 19 to the first alignment mark portion, the light modulation device 104 to limit the irradiation range to the first alignment mark portion, and the light irradiation unit 102 to irradiate with light 106 to form a protective pattern 110 that protects the first alignment mark.
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