Maintenance system and maintenance method

Abstract

This disclosure provides a maintenance system and maintenance method suitable for vertical maintenance. [Solution] A maintenance system according to one aspect of the present disclosure comprises a rail, a work robot, and a self-propelled trolley. The rail is fixed to the outside of a substrate processing apparatus having a processing unit and extends vertically. The work robot is detachable from the rail and can move up and down along the rail. The self-propelled trolley transports the work robot. The work robot has an arm that can enter the interior of the processing unit.

Description

Technical Field

[0001] The present disclosure relates to a maintenance system and a maintenance method.

Background Art

[0002] Patent Document 1 discloses a substrate processing apparatus having a plurality of stacked processing blocks. Each processing block has a plurality of processing modules stacked on top of each other.

Prior Art Documents

Patent Documents

[0003]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0004] As a device for automating the maintenance of a substrate processing apparatus, for example, a maintenance device including a robot, a lifting axis for the robot to move up and down, and a moving mechanism for moving the robot and the lifting axis to the substrate processing apparatus can be considered.

[0005] However, in such a maintenance device, when performing maintenance at a relatively high position in the vertical direction, the position of the center of gravity of the maintenance device becomes high, making the robot prone to wobbling and potentially reducing the working accuracy of the robot.

[0006] The above problems are not limited to substrate processing apparatuses in which a plurality of processing blocks (processing modules) are stacked, but can also occur in general substrate processing apparatuses. For example, in a substrate processing apparatus having a processing module with a relatively large dimension in the vertical direction, the above problems can occur even if the processing module has a single-stage configuration. Also, when a processing module is stacked on top of components other than the processing module, such as components of an exhaust system or a power supply system, the above problems can occur.

[0007] This disclosure provides a maintenance system and maintenance method suitable for vertical maintenance. [Means for solving the problem]

[0008] A maintenance system according to one aspect of the present disclosure comprises a rail, a work robot, and a self-propelled trolley. The rail is fixed to the outside of a substrate processing apparatus having a processing unit and extends vertically. The work robot is detachable from the rail and can move up and down along the rail. The self-propelled trolley transports the work robot. The work robot has an arm that can enter the interior of the processing unit. [Effects of the Invention]

[0009] This disclosure provides a maintenance system and maintenance method suitable for vertical maintenance. [Brief explanation of the drawing]

[0010] [Figure 1] Figure 1 is a plan view showing an example of the configuration of a substrate processing apparatus and maintenance system according to the first embodiment. [Figure 2] Figure 2 is a perspective view showing an example of the configuration of the maintenance system according to the first embodiment. [Figure 3] Figure 3 is a side view showing the maintenance process using the maintenance system according to the first embodiment. [Figure 4] Figure 4 is a plan view showing an example of the configuration of a substrate processing apparatus and maintenance system according to the second embodiment. [Figure 5] Figure 5 is a side view showing the maintenance process using the maintenance system according to the second embodiment. [Figure 6] Figure 6 is a side view showing the maintenance process using the maintenance system according to the third embodiment. [Figure 7]Figure 7 is a plan view illustrating the operation of the maintenance system according to the fourth embodiment. [Figure 8] Figure 8 is a side view illustrating the operation of the maintenance system according to the fourth embodiment. [Figure 9] Figure 9 is a plan view illustrating the operation of the maintenance system according to the fifth embodiment. [Figure 10] Figure 10 is a side view illustrating the operation of the maintenance system according to the fifth embodiment. [Modes for carrying out the invention]

[0011] The following describes in detail, with reference to the drawings, the embodiments for implementing the maintenance system and maintenance method described herein (hereinafter referred to as "Embodiments"). However, these embodiments do not limit the disclosure. Furthermore, each embodiment can be combined as appropriate, provided that the processing content is not inconsistent. Also, the same parts are denoted by the same reference numerals in each of the following embodiments, and redundant descriptions are omitted.

[0012] Furthermore, in the embodiments described below, expressions such as "orthogonal" or "parallel" may be used, but these expressions do not require that the lines be strictly "orthogonal" or "parallel." In other words, each of the above expressions allows for deviations such as manufacturing accuracy and installation accuracy.

[0013] <First Embodiment> (Configuration of substrate processing apparatus) First, the configuration of the substrate processing apparatus 1 according to the first embodiment will be described with reference to Figure 1. Figure 1 is a plan view showing an example of the configuration of a substrate processing apparatus 1 and a maintenance system 100A according to the first embodiment.

[0014] As shown in Figure 1, the substrate processing apparatus 1 comprises an input / output station 11 and a processing station 12. The input / output station 11 and the processing station 12 are located adjacent to each other.

[0015] The loading / unloading station 11 includes a carrier placement unit 111 and a transfer unit 112. A plurality of carriers C for accommodating a plurality of semiconductor wafers W (hereinafter referred to as "wafer W") in a horizontal state are placed on the carrier placement unit 111.

[0016] The transfer unit 112 is provided adjacent to the carrier placement unit 111. Inside the transfer unit 112, a transfer device 113 and a delivery unit 114 are arranged.

[0017] The transfer device 113 includes a wafer holding mechanism for holding the wafer W. Further, the transfer device 113 is capable of moving in the horizontal and vertical directions and turning around a vertical axis, and transfers the wafer W between the carrier C and the delivery unit 114 using the wafer holding mechanism.

[0018] The delivery unit 114 temporarily places the wafer W.

[0019] The processing station 12 is provided adjacent to the transfer unit 112. The processing station 12 includes a transfer block 13, a first processing block 14, and a second processing block 15.

[0020] The transfer block 13 includes a transfer area 131 and a transfer device 132. The transfer area 131 is, for example, a rectangular parallelepiped region extending along the arrangement direction (X-axis direction) of the loading / unloading station 11 and the processing station 12. The transfer device 132 is arranged in the transfer area 131.

[0021] The transfer device 132 includes a wafer holding mechanism 132a for holding the wafer W. Further, the transfer device 132 is capable of moving in the horizontal and vertical directions and turning around a vertical axis, and transfers the wafer W among the delivery unit 114, the first processing block 14, and the second processing block 15 using the wafer holding mechanism 132a.

[0022] The first processing block 14 and the second processing block 15 are arranged adjacent to the transport area 131 on both sides of the transport area 131. For example, the first processing block 14 is arranged on one side (positive Y-axis side) of the transport area 131 in the direction (Y-axis direction) perpendicular to the direction (X-axis direction) in which the loading / unloading stations 11 and processing stations 12 are aligned. The second processing block 15 is arranged on the other side (negative Y-axis side) of the transport area 131 in the direction (Y-axis direction) perpendicular to the direction (X-axis direction) in which the loading / unloading stations 11 and processing stations 12 are aligned.

[0023] The first processing block 14 and the second processing block 15 may be arranged in multiple stages along the vertical direction (see Figure 3). For example, in the substrate processing apparatus 1 according to the first embodiment, the first processing block 14 and the second processing block 15 are each arranged in three stages. The number of stages of these processing blocks is not particularly limited.

[0024] The transfer of the wafer W between the first processing block 14 and the second processing block 15 and the transfer unit 114 may be performed by a single transfer device 132 located in the transfer block 13.

[0025] The first processing block 14 may have a first region 141 and a second region 142 along the X-axis direction. The second processing block 15 may have a third region 151 and a fourth region 152 along the X-axis direction.

[0026] Multiple (in this case, two) liquid processing units 2 (an example of processing units) may be arranged in each of the first region 141 and the second region 142. As shown in Figure 1, the multiple liquid processing units 2 are arranged side by side, for example, along the X-axis.

[0027] A measuring unit 3 (an example of a processing unit), a drying unit 4 (an example of a processing unit), and a supply unit 5 may be arranged in the third region 151 and the fourth region 152, respectively. The measuring unit 3 may be placed on top of the drying unit 4 (see Figure 3). The measuring unit 3, the drying unit 4, and the supply unit 5 may be arranged side by side along the X-axis.

[0028] The liquid treatment unit 2 performs a cleaning process to clean the upper surface of the wafer W, which is the pattern formation surface. The liquid treatment unit 2 also performs a liquid film formation process by supplying IPA (isopropyl alcohol) liquid to the upper surface of the wafer W after the cleaning process to form a liquid film.

[0029] The measurement unit 3 may, for example, measure the weight of the wafer W before and after the liquid film formation process. The control unit 201, which will be described later, may, for example, calculate the amount of liquid film formed on the upper surface of the wafer W by the liquid film formation process from the weight of the wafer W before and after the liquid film formation process measured by the measurement unit 3.

[0030] The drying unit 4 performs a drying process on the wafer W after the liquid film formation process. Specifically, the drying unit 4 dries the wafer W by bringing it into contact with a supercritical processing fluid. This drying process allows the wafer W to be dried while suppressing the collapse of the pattern formed on the upper surface of the wafer W.

[0031] The supply unit 5 supplies a processing fluid to the drying unit 4. This processing fluid may be, for example, CO2. The supply unit 5 may include a group of supply equipment, such as a flow meter, a flow regulator, a back pressure valve, and a heater, and a housing that accommodates the group of supply equipment.

[0032] The processing units provided by the substrate processing apparatus 1 are not limited to the liquid processing unit 2, the measurement unit 3, and the drying unit 4. The substrate processing apparatus 1 may also include other processing units that perform substrate processing on the wafer W. In the following description, the liquid processing unit 2, the measurement unit 3, and the drying unit 4 may be referred to simply as "processing units" without any particular distinction.

[0033] The substrate processing apparatus 1 includes a control device 200. The control device 200 is, for example, a computer and includes a control unit 201 and a storage unit 202.

[0034] The control unit 201 includes a microcomputer having a CPU (Central Processing Unit), ROM (Read Only Memory), RAM (Random Access Memory), input / output ports, and various circuits. The CPU of this microcomputer reads and executes programs stored in the ROM to control the transport devices 113, 132, the liquid processing unit 2, the drying unit 4, the supply unit 5, and the work robot 7, which will be described later.

[0035] Such a program may have been recorded on a computer-readable recording medium and installed from that medium to the storage unit 202 of the control device 200. Examples of computer-readable recording media include hard disks (HDs), flexible disks (FDs), compact discs (CDs), magnetic optical discs (MOs), and memory cards.

[0036] The memory unit 202 is implemented by, for example, semiconductor memory elements such as RAM and flash memory, or storage devices such as hard disks and optical discs.

[0037] (Maintenance system configuration) Next, the configuration of the maintenance system 100A according to the first embodiment will be described with reference to Figure 1. As shown in Figure 1, the maintenance system 100A performs maintenance on the substrate processing apparatus 1. The maintenance system 100A includes a rail 6, a work robot 7, and a trolley 8.

[0038] The rail 6 has a shape that extends in the vertical direction (see Figure 3). As shown in Figure 1, in the first embodiment, the rail 6 is fixed to the outside of the substrate processing apparatus 1. The number of rails 6 fixed to the substrate processing apparatus 1 may be, for example, four.

[0039] As shown in Figure 1, in the first embodiment, the four rails 6 are arranged adjacent to the first region 141, the second region 142, the third region 151, and the fourth region 152, respectively. The number and positions of the rails 6 fixed to the outer part of the substrate processing apparatus 1 are not particularly limited.

[0040] The work robot 7 can be attached to and detached from the rail 6. When attached to the rail 6, the work robot 7 can move up and down along the rail 6. The work robot 7 also has an arm 71 that can enter the inside of the processing unit. The work robot 7 moves up and down the rail 6 to the height of the processing unit to be maintained and uses the arm 71 to perform maintenance on the processing unit. The detailed configuration of the work robot 7 will be described later with reference to Figure 2.

[0041] The trolley 8 is a self-propelled trolley. In the first embodiment, the trolley 8 transports the work robot 7 to the rail 6. Alternatively, the trolley 8 transports the work robot 7, which has been removed from the rail 6, to a predetermined waiting area.

[0042] The trolley 8 according to the first embodiment may have a transfer mechanism for transferring the work robot 7 to the base portion 61 of the rail 6, which will be described later. By using such a transfer mechanism, the trolley 8 can attach and detach the work robot 7 from the rail 6. The detailed configuration of the trolley 8 will be described later with reference to Figure 2.

[0043] Next, the configuration of the maintenance system 100A according to the first embodiment will be described in detail with reference to Figure 2. Figure 2 is a perspective view showing an example of the configuration of the maintenance system 100A according to the first embodiment. As described above, the maintenance system 100A includes a rail 6, a work robot 7, and a trolley 8.

[0044] As shown in Figure 2, the rail 6 may have a base portion 61 (an example of a second base portion) that can move up and down along the rail 6. The base portion 72 of the work robot 7, which will be described later, is attached to the base portion 61. By moving the base portion 61 up and down along the rail 6, the work robot 7 can be moved up and down in the vertical direction.

[0045] The base portion 61 according to the first embodiment may have a mounting surface 611, a first wall surface 612, and a second wall surface 613. Furthermore, the base portion 61 according to the first embodiment may also have a movable fixing pin 614, a power receiving ring 615, a first terminal 616, and a guide groove 617.

[0046] The mounting surface 611 is the surface on which the base portion 72 of the work robot 7, which will be described later, is mounted. The first wall surface 612 is a surface perpendicular to the outer wall of the substrate processing apparatus 1 and extends from the mounting surface 611 in the Z-axis direction. In the example shown in Figure 2, the first wall surface 612 abuts against the side surface of the base portion 72, which will be described later, on the negative X-axis side.

[0047] The second wall surface 613 is a surface parallel to the outer wall of the substrate processing apparatus 1 and extends from the mounting surface 611 in the Z-axis direction. In the example shown in Figure 2, the second wall surface 613 abuts against the side surface of the base portion 72, which will be described later, on the positive Y-axis side.

[0048] The base portion 61 may have a movable fixing pin 614. The fixing pin 614 may be located on the mounting surface 611. The fixing pin 614 can be raised and lowered, for example under the control of the control unit 201, and protrudes from the mounting surface 611 as needed.

[0049] Furthermore, the base portion 61 may have a power receiving ring 615. The power receiving ring 615 may be provided on the side of the base portion 61 on the negative X-axis side. A power supply line 9, which will be described later, is inserted through the power receiving ring 615. The power receiving ring 615 can receive power from the power supply line 9.

[0050] Furthermore, the base portion 61 may have a first terminal 616 that is electrically connected to the power receiving ring 615. The first terminal 616 is connected to a second terminal 722 of the work robot 7, which will be described later. The first terminal 616 may be located, for example, on the first wall surface 612. With this configuration, power can be supplied from the power receiving ring 615 to the work robot 7 via the first terminal 616.

[0051] Furthermore, the base portion 61 may have a guide groove 617 on the mounting surface 611. As shown in Figure 2, the shape of the guide groove 617 in plan view may be, for example, a triangular shape pointed toward the negative X-axis direction. Such a guide groove 617 may be formed by cutting out a triangular shape from the base portion 611 from the end of the mounting surface 611 on the positive X-axis side to the center of the mounting surface 611.

[0052] The rail 6 may have multiple base sections 61. With this configuration, multiple work robots 7 can be attached to a single rail 6. This improves the work efficiency of the maintenance system 100A.

[0053] The power supply line 9 extends along the rail 6. The power supply line 9 may be electrically connected to the substrate processing apparatus 1. The power supply line 9 is inserted through the power receiving ring 615 in a non-contact manner. With this configuration, power can be supplied from the substrate processing apparatus 1 to the power receiving ring 615 via the power supply line 9.

[0054] Specifically, the power receiving ring 615 and the power supply line 9 function as a contactless power supply mechanism. More specifically, the oscillating magnetic field formed around the axis of the power supply line 9 generates an electromotive force in the power receiving ring 615. This allows power to be supplied contactlessly from the substrate processing apparatus 1 to the power receiving ring 615 via the power supply line 9.

[0055] With this configuration, power can be supplied to the work robot 7 without connecting a power supply cable or the like to the robot 7. This reduces the risk of the power supply cable getting caught in the moving work robot 7.

[0056] The power supply line 9 may be composed of, for example, a cable through which alternating current flows. Alternatively, the power supply line 9 may be composed of a rod-shaped conductor or the like through which alternating current flows.

[0057] The work robot 7 may have an arm 71, a base portion 72 (an example of a first base portion), a maintenance member 73, and a holding plate 74.

[0058] The arm 71 may be, for example, a multi-joint arm. The arm 71 may have a gripping portion 711 at its tip for gripping the maintenance member 73. The arm 71 is provided, for example, on the upper part of the base portion 72. The arm 71 can move the gripping portion 711 in multiple directions using the base portion 72 as a pivot point.

[0059] The arm 71 enters the processing unit and performs maintenance on it. Specifically, the gripping part 711 enters the processing unit and performs maintenance on the processing unit using the maintenance member 73 held by the gripping part 711.

[0060] The maintenance member 73 may be, for example, a cleaning member. In this case, the work robot 7 can clean the processing unit using the cleaning member. Alternatively, the maintenance member 73 may be, for example, a component of the processing unit. In this way, the work robot 7 can also replace parts of the processing unit. A holding plate 74 for placing the maintenance member 73 may be provided on the upper surface of the base portion 72.

[0061] The base portion 72 has, for example, a rectangular parallelepiped shape. As described above, an arm 71 may be provided on the upper part of the base portion 72. The base portion 72 is placed on the mounting surface 611 of the base portion 61. The base portion 72 may have a pin hole 721, a second terminal 722, and a protrusion 723. The shape of the base portion 72 is not particularly limited.

[0062] The pin hole 721 may be located on the bottom surface of the base portion 72. The fixing pin 614 of the base portion 61 is inserted into the pin hole 721. This allows the work robot 7 and the rail 6 to be connected.

[0063] The second terminal 722 may be located on the side of the base portion 72 on the negative X-axis side. The second terminal 722 is connected to the first terminal 616 of the base portion 61. This allows power to be supplied from the power receiving ring 615 to the work robot 7 via the first terminal 616 and the second terminal 722.

[0064] The first terminal 616, the second terminal 722, and the rail 6 may also have communication capabilities. With this configuration, the operation of the work robot 7 can be controlled under the control of the control unit 201.

[0065] Furthermore, the work robot 7 may perform maintenance operations autonomously. In this case, the work robot 7 may have a computer built into the base unit 72, for example, to control the operation of the work robot 7.

[0066] The protrusion 723 is located on the bottom surface of the base portion 72. The protrusion 723 may have a triangular shape that is substantially the same as the guide groove 617 of the base portion 61. As will be described in more detail later, with this configuration, the base portion 72 can be easily attached to the base portion 61 of the rail 6.

[0067] The trolley 8 transports the work robot 7. The trolley 8 is capable of autonomous movement. The trolley 8 according to the first embodiment may have a mounting surface 81 for placing the work robot 7 on. The trolley 8 according to the first embodiment may also have a pressing part 82 and a claw part 83 as a transfer mechanism for transferring the work robot 7 to the base part 61 of the rail 6.

[0068] The pressing portion 82 is provided so as to contact the base portion 72, which is placed on the mounting surface 81, from a horizontal direction. As shown in Figure 2, the pressing portion 82 may be, for example, a plate material having a plane perpendicular to the X-axis. Such a plate material may be attached to the claw portion 83, which will be described later. The transfer mechanism can transfer the work robot 7 to the base portion 61 of the rail 6 by pushing the work robot 7 using the pressing portion 82. The specific operation of the transfer mechanism will be described later.

[0069] The claw portion 83 is provided so as to contact the base portion 72, which is placed on the mounting surface 81, from the vertically upward direction. Specifically, the claw portion 83 may protrude vertically upward from the mounting surface 81, or its shape in a side view from the Y-axis direction may be an inverted L-shape. The transfer mechanism can remove the work robot 7 from the base portion 61 of the rail 6 by pulling the work robot 7 using the claw portion 83.

[0070] As shown in Figure 2, a plate material 84 may be positioned between the mounting surface 81 and the base portion 72. The plate material 84 may be made of a self-lubricating resin. Examples of self-lubricating resins include Teflon®. As will be described in more detail later, by providing a plate material 84 on the trolley 8, the work robot 7 can be smoothly transferred to the base portion 61 of the rail 6.

[0071] (Regarding the operation of the transfer mechanism) Next, the operation of the transfer mechanism described above will be explained in more detail with reference to Figure 2.

[0072] The transfer mechanism uses a pressing section 82 to push the base section 72 along a direction parallel to the outer wall of the substrate processing apparatus 1, thereby moving the work robot 7 from the mounting surface 81 of the trolley 8 onto the mounting surface 611 of the base section 61. For example, in the example shown in Figure 2, the transfer mechanism moves the work robot 7 toward the negative X-axis direction.

[0073] At this time, the transfer mechanism moves the work robot 7 so that the position of the pin hole 721 in the base portion 72 aligns with the position of the fixing pin 614 in the base portion 61. After the work robot 7 has finished moving, the fixing pin 614 rises from the mounting surface 611 and is inserted into the pin hole 721. This connects the work robot 7 and the rail 6.

[0074] As described above, the base portion 61 may have a guide groove 617. Also, as described above, the base portion 72 may have a protrusion 723. With this configuration, for example, in the example shown in Figure 2, even if the base portion 72 is transported in a state where it is offset from the base portion 61 in the Y-axis direction, the two can be properly aligned.

[0075] Specifically, by guiding the protrusion 723 with the guide groove 617 and transferring the base portion 72 to the base portion 61, the two can be connected while appropriately adjusting the position of the base portion 72 relative to the base portion 61. Therefore, with this configuration, the precision required for the loading position of the work robot 7 by the trolley 8 can be relaxed.

[0076] The transfer mechanism uses the claw portion 83 to pull the base portion 72 along a direction parallel to the outer wall of the substrate processing apparatus 1, thereby moving the work robot 7 from the mounting surface 611 to the mounting surface 81. For example, in the example shown in Figure 2, the transfer mechanism moves the work robot 7 toward the positive X-axis direction.

[0077] Thus, with a trolley 8 having a pressing section 82 and a claw section 83 as a transfer mechanism, the work robot 7 can be attached to and detached from the base section 61 of the rail 6 by utilizing the driving force of the trolley 8. Therefore, the mechanism for attaching and detaching the work robot 7 from the rail 6 can be simplified.

[0078] Furthermore, as described above, when attaching or detaching the work robot 7 to the base portion 61, moving the work robot 7 along a direction parallel to the outer wall of the substrate processing apparatus 1 reduces the amount of pressing or tensile force applied to the substrate processing apparatus 1. This reduces the risk of adverse effects on the substrate processing apparatus 1.

[0079] As described above, a plate material 84 made of self-lubricating resin may be positioned between the base portion 72 and the mounting surface 81. With this configuration, friction between the base portion 61 and the base portion 72 can be reduced when transferring the work robot 7 to the base portion 61. Therefore, the work robot 7 can be smoothly transferred to the base portion 61.

[0080] (Regarding operation during maintenance) Next, the operation of the maintenance system 100A when maintaining the substrate processing apparatus 1 will be described with reference to Figure 3. Figure 3 is a side view showing the maintenance process using the maintenance system 100A according to the first embodiment. In Figure 3, an example is shown in which the work robot 7 maintains a processing unit located in the third region 151 of the second processing block 15.

[0081] In the maintenance of the processing unit, first, the work robot 7 moves up and down the rail 6 to a predetermined work position. Specifically, this predetermined work position may be a position facing the processing unit in the third region 151 that is the target of maintenance. Then, the work robot 7, positioned at the work position, inserts the gripping portion 711 of the arm 71 into the interior of the processing unit and performs maintenance on the processing unit using the maintenance member 73.

[0082] Although not shown in Figure 3, openings for the arm 71 to enter may be provided on the side of the substrate processing apparatus 1 and the side of the processing unit. These openings may be controlled to open or close, for example, by the control unit 201.

[0083] Maintenance of the processing units located in the first region 141, the second region 142, and the fourth region 152 is performed by work robots 7 attached to rails 6 located adjacent to each of the first, second, and fourth regions 141, and 152, respectively. The work robots 7 are transported to each rail 6 by a trolley 8.

[0084] According to the maintenance system 100A of the first embodiment, the work robot 7 can be attached to a rail 6 fixed to the substrate processing apparatus 1, thereby integrating the work robot 7 and the substrate processing apparatus 1. This reduces problems such as wobbling of the work robot 7.

[0085] For example, if the maintenance robot itself has a lifting mechanism, when performing maintenance at a relatively high position in the vertical direction, the robot's center of gravity becomes higher, making it more prone to wobbling. If the robot wobbles, the accuracy of its work may decrease.

[0086] On the other hand, when the work robot 7 and the substrate processing device 1 are integrated, the weight of the substrate processing device 1 is relatively large, which stabilizes the center of gravity of the integrated work robot 7 and substrate processing device 1. Therefore, according to the maintenance system 100A of the first embodiment, the wobbling of the work robot 7 can be reduced, thereby improving the accuracy of maintenance of the processing unit by the work robot 7.

[0087] <Second Embodiment> Next, the configuration of the maintenance system 100B according to the second embodiment will be described with reference to Figures 4 and 5. Figure 4 is a plan view showing an example of the configuration of the substrate processing apparatus 1 and the maintenance system 100B according to the second embodiment. Figure 5 is a side view showing the maintenance performed by the maintenance system 100B according to the second embodiment.

[0088] As described above, the first embodiment described an example in which the rail 6 is fixed to the outside of the substrate processing apparatus 1. On the other hand, as shown in Figure 4, in the second embodiment, the rail 6 may be detachable from the substrate processing apparatus 1.

[0089] The maintenance system 100B according to the second embodiment includes a rail 6, a work robot 7 attached to the rail 6, and a trolley 8. In the second embodiment, the trolley 8 transports the rail 6 to which the work robot 7 is attached to the outside of the substrate processing apparatus 1. In the second embodiment, the rail 6 may be fixed to the trolley 8.

[0090] As shown in Figure 5, the upper part of the rail 6 according to the second embodiment may be provided with a fixing part 63 for fixing the rail 6 to the substrate processing apparatus 1. The fixing part 63 may be, for example, a movable hook. The fixing part 63 may be connected to, for example, a frame (not shown) provided on the outer wall of the substrate processing apparatus 1. With this configuration, the rail 6 that has been transported by the trolley 8 can be easily fixed to the substrate processing apparatus 1.

[0091] As shown in Figure 4, in the second embodiment, the rail 6 may be positioned adjacent to the first region 141, the second region 142, the third region 151, or the fourth region 152. For example, in Figure 4, the rail 6 is positioned adjacent to the third region 151. The mounting position of the rail 6 to the substrate processing apparatus 1 is not particularly limited.

[0092] As shown in Figure 4, the trolley 8 according to the second embodiment may have a recess 85 that, in a plan view from the vertical direction, is recessed inward from the outer surface of the trolley 8 and penetrates the trolley 8 vertically. The rail 6 and the work robot 7 may be located inside the recess 85 in a plan view from the vertical direction.

[0093] With this configuration, the work robot 7 can be lowered further along the rail 6 compared to the case where the trolley 8 does not have a recess 85. As a result, the work robot 7 can properly perform maintenance even on processing units located at the bottom of the substrate processing device 1.

[0094] According to the maintenance system 100B of the second embodiment, the work robot 7 and the substrate processing apparatus 1 can be integrated by fixing the rail 6 to which the work robot 7 is attached to the substrate processing apparatus 1. Therefore, similar to the maintenance system 100A of the first embodiment, the wobbling of the work robot 7 can be reduced, thereby improving the accuracy of maintenance of the processing unit by the work robot 7.

[0095] <Third Embodiment> Next, the substrate processing apparatus 1 and maintenance system 100C according to the third embodiment will be described with reference to Figure 6. Figure 6 is a side view showing the maintenance process using the maintenance system 100C according to the third embodiment.

[0096] As shown in Figure 6, the substrate processing apparatus 1 according to the third embodiment may include a frame 16. As shown in Figure 6, the frame 16 may be provided on the outer wall surface of the substrate processing apparatus 1 so as to be along the edges of the first processing block 14 and the second processing block 15.

[0097] As shown in Figure 6, the maintenance system 100C according to the third embodiment may include a lifting mechanism 300 for raising and lowering the work robot 7 along the vertical direction, instead of the rail 6. Furthermore, the work robot 7 according to the third embodiment may have a gripping mechanism 75 for gripping the frame 16 of the substrate processing apparatus 1.

[0098] The lifting mechanism 300 can position the work robot 7 at a predetermined work location by raising and lowering it vertically. The lifting mechanism 300 may be, for example, a crane attached to the substrate processing device 1.

[0099] The gripping mechanism 75 may be provided on the base portion 72 of the work robot 7. The gripping mechanism 75 grips the frame 16 when the work robot 7 is positioned at a predetermined work location.

[0100] According to the maintenance system 100C of the third embodiment, the work robot 7 can be fixed to the substrate processing apparatus 1 by gripping the frame 16 with the gripping mechanism 75. Therefore, similar to the maintenance systems 100A and 100B described above, the wobbling of the work robot 7 can be reduced, thereby improving the accuracy of maintenance of the processing unit by the work robot 7.

[0101] <Fourth Embodiment> Next, the maintenance system 100D according to the fourth embodiment will be described with reference to Figures 7 and 8. Figure 7 is a plan view illustrating the operation of the maintenance system 100D according to the fourth embodiment. Figure 8 is a side view illustrating the operation of the maintenance system 100D according to the fourth embodiment.

[0102] In the first embodiment described above, an example was explained in which a trolley 8 is used to transport the work robot 7 to the rail 6 fixed to the outside of the substrate processing apparatus 1. On the other hand, as shown in Figure 7, in the fourth embodiment, instead of the trolley 8, an overhead transport mechanism 400 (an example of a transport device) provided separately from the substrate processing apparatus 1 may be used to transport the work robot 7 to the rail 6.

[0103] As shown in Figure 7, the ceiling transport mechanism 400 may include, for example, a rail 410 provided on the ceiling above the substrate processing apparatus 1, and a crane 420 that can move along the rail 410.

[0104] As shown in Figure 7, the rails 410 may be arranged in a grid pattern, for example, when the overhead transport mechanism 400 is viewed from the vertical. In Figure 7, the rails 410 are schematically shown by black lines. The overhead transport mechanism 400 can move the work robot 7 horizontally (parallel to the XY plane) by moving the crane 420 along the rails 410 while the crane 420 is holding the work robot 7. Note that the arrangement of the rails 410 is not limited to the example shown in Figure 7.

[0105] As shown in Figure 8, the crane 420 may have an arm 421 that can be raised and lowered along the vertical direction. The crane 420 can move the work robot 7 vertically by raising and lowering the arm 421 vertically (in the Z-axis direction) while the work robot 7 is gripped by the arm 421.

[0106] As shown in Figure 8, the work robot 7 according to the fourth embodiment may have a projection 724 that is grasped by the arm 421 of the crane 420. The projection 724 is provided so as to protrude from the side of the base portion 72, for example. For example, in the example shown in Figure 8, the base portion 72 has projections 724 on the side on the positive Y-axis side and the side on the negative Y-axis side.

[0107] In this way, by providing the work robot 7 with the projection 724, the work robot 7 can be transported using a transport device such as the ceiling transport mechanism 400.

[0108] In the fourth embodiment, the ceiling transport mechanism 400 transports the work robot 7 to the substrate processing device 1, for example, as follows. First, the crane 420 holds (grabs) the work robot 7 at a predetermined standby position (not shown). Next, the crane 420 moves horizontally along the rail 410 and is positioned above the rail 6 (see Figure 7). Next, the crane 420 lowers the arm 421 to place the work robot 7 on the base portion 61 of the rail 6 (see Figure 8). After that, the fixing pin 614 of the base portion 61 is inserted into the pin hole 721 of the base portion 72, and the work robot 7 is attached to the rail 6.

[0109] According to the maintenance system 100D of the fourth embodiment, the work robot 7 and the substrate processing apparatus 1 can be integrated by attaching the work robot 7 to a rail 6 fixed to the substrate processing apparatus 1. Therefore, similar to the maintenance system 100A of the first embodiment, the wobbling of the work robot 7 can be reduced, thereby improving the accuracy of maintenance of the processing unit by the work robot 7.

[0110] Furthermore, the rail 6 according to the fourth embodiment may be detachable from the substrate processing apparatus 1. That is, the rail 6 according to the fourth embodiment may have the above-mentioned fixing portion 63 on its upper part. In this case, the rail 6 may be transported to the substrate processing apparatus 1 by the trolley 8. Thus, the maintenance system 100D according to the fourth embodiment may be configured to transport the rail 6 by the trolley 8 and the work robot 7 by the overhead transport mechanism 400.

[0111] <Fifth Embodiment> Next, the maintenance system 100E according to the fifth embodiment will be described with reference to Figures 9 and 10. Figure 9 is a plan view illustrating the operation of the maintenance system 100E according to the fifth embodiment. Figure 10 is a side view illustrating the operation of the maintenance system 100E according to the fifth embodiment.

[0112] In the second embodiment described above, an example was explained in which a trolley 8 is used to transport the rail 6 to which the work robot 7 is attached to the outside of the substrate processing apparatus 1. On the other hand, as shown in Figure 9, in the fifth embodiment, instead of the trolley 8, the overhead transport mechanism 400 described above may be used to transport the rail 6 to which the work robot 7 is attached to the outside of the substrate processing apparatus 1.

[0113] As shown in Figure 9, the overhead transport mechanism 400 can move the rail 6 horizontally (parallel to the XY plane) by moving the crane 420 along the rail 410 while the crane 420 is holding the rail 6. In addition, the crane 420 can move the rail 6 vertically by raising and lowering the arm 421 vertically (in the Z-axis direction) while the arm 421 is gripping the rail 6.

[0114] As shown in Figure 10, the rail 6 according to the fifth embodiment may have the above-described fixing portion 63 on its upper part. The rail 6 according to the fifth embodiment may also have a projection 64 that is gripped by the arm 421 of the crane 420. The projection 64 may be provided, for example, on the upper part of the rail 6 so as to protrude from the side of the rail 6.

[0115] In this way, by providing the protrusions 64 on the rail 6, the work robot 7 can be transported using a transport device such as the ceiling transport mechanism 400.

[0116] In the fifth embodiment, the ceiling transport mechanism 400 transports the rail 6 to the outside of the substrate processing apparatus 1, for example, as follows. First, the crane 420 holds (gripping) the rail 6 at a predetermined standby position (not shown). Next, the crane 420 moves horizontally along the rail 410 and is positioned at a predetermined location (see Figure 9). The predetermined location here may be, for example, a position adjacent to the third region 151 in a plan view of the substrate processing apparatus 1, as shown in Figure 9. Next, the crane 420 lowers the arm 421 to position the rail 6 at the same height as the substrate processing apparatus 1. After that, the rail 6 is fixed to the substrate processing apparatus 1 by the fixing part 63.

[0117] According to the maintenance system 100E of the fifth embodiment, the work robot 7 and the substrate processing apparatus 1 can be integrated by fixing the rail 6 to which the work robot 7 is attached to the substrate processing apparatus 1. Therefore, similar to the maintenance system 100B of the second embodiment, the wobbling of the work robot 7 can be reduced, thereby improving the accuracy of maintenance of the processing unit by the work robot 7.

[0118] In the example shown in Figure 10, the rail 6 has a length approximately equal to the height of the substrate processing apparatus 1, but the length of the rail 6 may be approximately equal to, for example, the height of the first processing block 14 and the second processing block 15. By using a rail 6 that is relatively short in length, the transport of the rail 6 by the ceiling transport mechanism 400 can be made more efficient.

[0119] Although the present disclosure has been described in detail above, this disclosure is not limited to the embodiments described above, and various modifications and improvements are possible without departing from the gist of this disclosure.

[0120] In the embodiments described above, the substrate processing apparatus 1 was described using an example in which it has a configuration having multiple processing blocks stacked in multiple stages, or in other words, a configuration having multiple processing units stacked in multiple stages. However, the substrate processing apparatus 1 does not necessarily have to have a configuration having multiple stacked processing blocks (processing modules). For example, the substrate processing apparatus 1 may have a configuration in which processing modules with large vertical dimensions are arranged in a single stage (in other words, stacked horizontally). Also, the substrate processing apparatus 1 may have a configuration in which processing modules are stacked on top of components other than processing modules, such as exhaust systems or power supply systems. That is, the substrate processing apparatus 1 may have a configuration in which the exhaust system or power supply system is arranged in the lower block and the processing units are arranged in the upper block.

[0121] The embodiments disclosed herein should be considered in all respects as illustrative and not restrictive. Indeed, the embodiments described above can be embodied in a variety of forms. Furthermore, the embodiments described above may be omitted, replaced, or modified in various ways without departing from the scope and spirit of the appended claims.

[0122] Furthermore, this technology can also be configured as follows. (1) A maintenance system for performing maintenance on a substrate processing apparatus having a processing unit, A rail fixed to the outer part of the substrate processing apparatus and extending in the vertical direction, A work robot that is detachable from the rail and can move up and down along the rail, A self-propelled trolley for transporting the aforementioned work robot and It has, The aforementioned work robot is a maintenance system having an arm capable of entering the interior of the processing unit. (2) The aforementioned work robot has a first base portion having a pin hole, The rail is movable up and down along the rail and has a second base portion having a movable fixing pin that is inserted into the pin hole. The maintenance system according to (1), wherein the work robot and the rail are connected by inserting the fixing pin of the second base portion into the pin hole of the first base portion. (3) The trolley has a transfer mechanism for transferring the work robot to the second base section. The maintenance system according to (2), wherein the transfer mechanism moves the work robot so as to align the position of the pin hole with the position of the fixing pin. (4) The aforementioned transfer mechanism is, The robot has an extrusion portion that is provided to contact the first base portion of the work robot from a horizontal direction, and a claw portion that contacts the first base portion from above in a vertical direction, The maintenance system according to (3), wherein the extrusion unit is used to move the work robot from the trolley onto the second base unit, and the claw unit is used to move the work robot from the second base unit onto the trolley. (5) The maintenance system according to (4), wherein the transfer mechanism moves the work robot along a direction parallel to the outer wall of the substrate processing apparatus using the extrusion portion or the claw portion. (6) The power receiving ring provided on the second base portion, A power supply line extending along the rail and inserted without contact with the power receiving ring, A first terminal provided on the second base portion and electrically connected to the power receiving ring, A second terminal provided on the first base portion and electrically connected to the first terminal and A maintenance system according to any one of (2) to (5) above, having the following: (7) The rail is a maintenance system according to any one of (2) to (6) above, having a plurality of the second base portions. (8) A rail fixed to the outer part of a substrate processing apparatus having a processing unit, extending vertically, A work robot having an arm that is detachable from the rail and can enter the interior of the processing unit, Self-propelled trolley and A maintenance method using a maintenance system equipped with, A step of transporting the work robot to the rail using the trolley, The process of raising and lowering the aforementioned work robot along the rail to a predetermined work position, The process involves performing maintenance on the processing unit using the arm at the aforementioned work position. Maintenance methods, including those mentioned above. (9) A maintenance system for performing maintenance on a substrate processing apparatus having a processing unit, A rail that is detachable from the substrate processing apparatus and extends vertically, A work robot attached to the aforementioned rail and capable of moving up and down along the aforementioned rail, A self-propelled trolley for transporting the aforementioned rails and It has, The aforementioned work robot is a maintenance system having an arm capable of entering the interior of the processing unit. (10) The maintenance system according to (9), wherein a fixing portion for fixing the rail to the substrate processing apparatus is provided on the upper part of the rail. (11) The aforementioned trolley, in a plan view from the vertical direction, has a recess that is concave from the outer surface toward the interior and penetrates the trolley vertically. The aforementioned work robot has a base portion which moves up and down along the rail, to which the arm is attached. The maintenance system according to (9) or (10), wherein the rail and the base portion are located inside the recess in a plan view from the vertical direction. (12) The rail is the maintenance system according to (11) above, having a plurality of base portions. (13) It is detachable from a substrate processing apparatus having a processing unit, and includes a rail that extends vertically, A work robot having an arm that is attached to the rail and can enter the interior of the processing unit, Self-propelled trolley and A maintenance method using a maintenance system equipped with, A step of transporting the rail to the substrate processing apparatus using the trolley, The process of raising and lowering the aforementioned work robot along the rail to a predetermined work position, The process involves performing maintenance on the processing unit using the arm at the aforementioned work position. Maintenance methods, including those mentioned above. (14) A maintenance system for performing maintenance on a substrate processing apparatus having a processing unit, A work robot having an arm that can enter the interior of the processing unit and a gripping mechanism for gripping the frame of the substrate processing device, A lifting mechanism for raising and lowering the aforementioned work robot in the vertical direction A maintenance system that has the following features. (15) A work robot having an arm capable of entering the interior of a processing unit in a substrate processing apparatus, and a gripping mechanism for gripping the frame of the substrate processing apparatus, A lifting mechanism for raising and lowering the aforementioned work robot in the vertical direction A maintenance method using a maintenance system equipped with, The process of raising and lowering the work robot to a predetermined work position using the lifting mechanism, The process involves performing maintenance on the processing unit using the arm while the frame is being gripped by the gripping mechanism at the aforementioned work position. Maintenance methods, including those mentioned above. (16) A maintenance system for performing maintenance on a substrate processing apparatus having a processing unit, A rail fixed to the outer part of the substrate processing apparatus and extending in the vertical direction, A work robot having an arm that is detachable from the rail, can move up and down along the rail, and can enter the interior of the processing unit, It has, The aforementioned work robot is configured to be transportable by a transport device, and is part of a maintenance system. (17) The maintenance system according to (16), wherein the work robot has a projection that is grasped by an arm provided by the transport device. (18) A rail fixed to the outer part of a substrate processing apparatus having a processing unit, extending vertically, A work robot having an arm that is detachable from the rail, can move up and down along the rail, can enter the interior of the processing unit, and is configured to be transportable by a transport device, A maintenance method using a maintenance system equipped with, The process of transporting the work robot to the rail using the transport device, The process of raising and lowering the aforementioned work robot along the rail to a predetermined work position, The process involves performing maintenance on the processing unit using the arm at the aforementioned work position. Maintenance methods, including those mentioned above. (19) A maintenance system for performing maintenance on a substrate processing apparatus having a processing unit, A rail that is detachable from the substrate processing apparatus and extends vertically, A work robot having an arm that is attached to the rail, is capable of moving up and down along the rail, and can enter the interior of the processing unit, It has, The rail is configured to be transportable by a transport device, and this is part of the maintenance system. (20) The maintenance system according to (19), wherein the rail has a projection that is gripped by an arm provided by the transport device. (twenty one) A rail that is detachable from a substrate processing apparatus having a processing unit, extends vertically, and is configured to be transportable by a transport device, A work robot having an arm that is attached to the rail, is capable of moving up and down along the rail, and can enter the interior of the processing unit, A maintenance method using a maintenance system equipped with, The process of transporting the rail to the substrate processing apparatus using the transport device, The process of raising and lowering the aforementioned work robot along the rail to a predetermined work position, The process involves performing maintenance on the processing unit using the arm at the aforementioned work position. Maintenance methods, including those mentioned above. [Explanation of Symbols]

[0123] 1. Substrate processing device 2. Liquid Processing Unit (An example of a processing unit) 3. Measurement Unit (An example of a processing unit) 4. Drying unit (an example of a processing unit) 5 Supply Units 6 rails 7. Work robots 8 carts 9 Power supply line 16 frames 61 Base section (an example of the second base section) 72 Base section (an example of the first base section) 63 Fixed part 64 Protrusion 71 Arm 75 Gripping mechanism 81,611 Mounting surface 82 Pressing part 83 Nail area 84 Board material 85 recess 100A, 100B, 100C, 100D, 100E Maintenance System 300 Lifting mechanism 400 Ceiling transport mechanism (an example of a transport device) 410 rails 420 Cranes 421 Arm 614 Fixing pin 615 Power receiving ring 616 1st terminal 711 Gripping part 721 pinholes 722 2nd terminal 724 Protrusion W wafer

Claims

1. A maintenance system for performing maintenance on a substrate processing apparatus having a processing unit, A rail fixed to the outer part of the substrate processing apparatus and extending in the vertical direction, A work robot that is detachable from the rail and can move up and down along the rail, A self-propelled trolley for transporting the aforementioned work robot and It has, The aforementioned work robot is a maintenance system having an arm capable of entering the interior of the processing unit.

2. The aforementioned work robot has a first base portion having a pin hole, The rail is movable up and down along the rail and has a second base portion having a movable fixing pin that is inserted into the pin hole. The maintenance system according to claim 1, wherein the work robot and the rail are connected by inserting the fixing pin of the second base portion into the pin hole of the first base portion.

3. The trolley has a transfer mechanism for transferring the work robot to the second base section. The maintenance system according to claim 2, wherein the transfer mechanism moves the work robot so as to align the position of the pin hole with the position of the fixing pin.

4. The aforementioned transfer mechanism is, The robot has an extrusion portion that is provided to contact the first base portion of the work robot from a horizontal direction, and a claw portion that contacts the first base portion from above in a vertical direction, The maintenance system according to claim 3, wherein the extrusion portion is used to move the work robot from the trolley onto the second base portion, and the claw portion is used to move the work robot from the second base portion onto the trolley.

5. The maintenance system according to claim 4, wherein the transfer mechanism moves the work robot along a direction parallel to the outer wall of the substrate processing apparatus using the extrusion portion or the claw portion.

6. The power receiving ring provided on the second base portion, A power supply line extending along the rail and inserted without contact with the power receiving ring, A first terminal is provided on the second base portion and is electrically connected to the power receiving ring, A second terminal is provided on the first base portion and is electrically connected to the first terminal. The maintenance system according to claim 2, having the following features.

7. The maintenance system according to claim 2, wherein the rail has a plurality of the second base portions.

8. A rail fixed to the outer part of a substrate processing apparatus having a processing unit, extending vertically, A work robot having an arm that is detachable from the rail and can enter the interior of the processing unit, Self-propelled trolley and A maintenance method using a maintenance system equipped with, A step of transporting the work robot to the rail using the trolley, The process of raising and lowering the aforementioned work robot along the rail to a predetermined work position, The process involves performing maintenance on the processing unit using the arm at the aforementioned work position. Maintenance methods, including those mentioned above.

9. A maintenance system for performing maintenance on a substrate processing apparatus having a processing unit, A rail that is detachable from the substrate processing apparatus and extends vertically, A work robot attached to the aforementioned rail and capable of moving up and down along the aforementioned rail, A self-propelled trolley for transporting the aforementioned rails and It has, The aforementioned work robot is a maintenance system having an arm capable of entering the interior of the processing unit.

10. The maintenance system according to claim 9, wherein a fixing portion for fixing the rail to the substrate processing apparatus is provided on the upper part of the rail.

11. The aforementioned trolley, in a plan view from the vertical direction, has a recess that is concave from the outer surface toward the interior and penetrates the trolley vertically. The aforementioned work robot has a base portion which moves up and down along the rail, to which the arm is attached. The maintenance system according to claim 9, wherein the rail and the base portion are located inside the recess in a plan view from the vertical direction.

12. The maintenance system according to claim 11, wherein the rail has a plurality of base portions.

13. It is detachable from a substrate processing apparatus having a processing unit, and includes a rail that extends vertically, A work robot having an arm that is attached to the rail and can enter the interior of the processing unit, Self-propelled trolley and A maintenance method using a maintenance system equipped with, A step of transporting the rail to the substrate processing apparatus using the trolley, The process of raising and lowering the aforementioned work robot along the rail to a predetermined work position, The process involves performing maintenance on the processing unit using the arm at the aforementioned work position. Maintenance methods, including those mentioned above.

14. A maintenance system for performing maintenance on a substrate processing apparatus having a processing unit, A work robot having an arm that can enter the interior of the processing unit and a gripping mechanism for gripping the frame of the substrate processing device, A lifting mechanism for raising and lowering the aforementioned work robot in the vertical direction A maintenance system that has the following features.

15. A work robot having an arm capable of entering the interior of a processing unit in a substrate processing apparatus, and a gripping mechanism for gripping the frame of the substrate processing apparatus, A lifting mechanism for raising and lowering the aforementioned work robot in the vertical direction A maintenance method using a maintenance system equipped with, The process of raising and lowering the work robot to a predetermined work position using the lifting mechanism, The process involves performing maintenance on the processing unit using the arm while the frame is being gripped by the gripping mechanism at the aforementioned work position. Maintenance methods, including those mentioned above.

16. A maintenance system for performing maintenance on a substrate processing apparatus having a processing unit, A rail fixed to the outer part of the substrate processing apparatus and extending in the vertical direction, A work robot having an arm that is detachable from the rail, can move up and down along the rail, and can enter the interior of the processing unit, It has, The aforementioned work robot is configured to be transportable by a transport device, and is part of a maintenance system.

17. The maintenance system according to claim 16, wherein the work robot has a projection that is grasped by an arm provided by the transport device.

18. A rail fixed to the outer part of a substrate processing apparatus having a processing unit, extending vertically, A work robot having an arm that is detachable from the rail, can move up and down along the rail, can enter the interior of the processing unit, and is configured to be transportable by a transport device, A maintenance method using a maintenance system equipped with, The process of transporting the work robot to the rail using the transport device, The process of raising and lowering the aforementioned work robot along the rail to a predetermined work position, The process involves performing maintenance on the processing unit using the arm at the aforementioned work position. Maintenance methods, including those mentioned above.

19. A maintenance system for performing maintenance on a substrate processing apparatus having a processing unit, A rail that is detachable from the substrate processing apparatus and extends vertically, A work robot having an arm that is attached to the rail, is capable of moving up and down along the rail, and can enter the interior of the processing unit, It has, The rail is configured to be transportable by a transport device, and this is part of the maintenance system.

20. The maintenance system according to claim 19, wherein the rail has a projection that is gripped by an arm provided by the transport device.

21. A rail that is detachable from a substrate processing apparatus having a processing unit, extends vertically, and is configured to be transportable by a transport device, A work robot having an arm that is attached to the rail, is capable of moving up and down along the rail, and can enter the interior of the processing unit, A maintenance method using a maintenance system equipped with, The process of transporting the rail to the substrate processing apparatus using the transport device, The process of raising and lowering the aforementioned work robot along the rail to a predetermined work position, The process involves performing maintenance on the processing unit using the arm at the aforementioned work position. Maintenance methods, including those mentioned above.

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