Method for manufacturing an irradiation device

Abstract

The illumination device is fabricated by selectively removing passive optical nanostructures from a monolithic array of light-emitting elements while maintaining their relative spatial positioning, the nanostructures being selected in at least one direction such that for each pair of selectively removed passive optical nanostructures, there is at least one unselected nanostructure disposed in the monolithic array between the pair of selectively removed passive optical nanostructures in at least one direction, while maintaining the relative spatial positioning to form a non-monolithic array of passive optical nanostructures with the selectively removed passive optical nanostructures, and aligning each non-monolithic array of passive optical nanostructures with a respective light-emitting element of the non-monolithic array of light-emitting elements.

Description

[Technical field]

[0001] The present disclosure relates generally to modifying light output from illumination devices and methods of manufacturing illumination devices, including display devices that include passive optical nanostructures. The illumination devices can be used for applications such as ambient illumination or for image display. [Background technology]

[0002] In illumination devices, passive optical structures (e.g., polarizing elements, color conversion elements, etc.) are often incorporated to control how the illumination device provides light. One type of illumination device is an illumination device that uses micro-LEDs as the light emitting element. It tends to be difficult to fabricate suitable passive optical structures that work well with light emitting elements the size of micro-LEDs. Summary of the Invention

[0003] According to the present disclosure, there is provided a method of manufacturing an illumination device, the method including forming a non-monolithic array of light emitting elements; forming a first monolithic array of first passive optical nanostructures; and selectively removing a plurality of first passive optical nanostructures from the first monolithic array in a manner that maintains relative spatial positions of the selectively removed first passive optical nanostructures, wherein the plurality of first passive optical nanostructures to be selectively removed from the first monolithic array are selected such that, for at least one pair of selectively removed first passive optical nanostructures in at least one direction, for each respective pair: The method includes selectively removing at least one unselected respective first passive optical nanostructure disposed in a first monolithic array between a pair of selectively removed first passive optical nanostructures in at least one direction; forming a first non-monolithic array of first passive optical nanostructures having the selectively removed first passive optical nanostructures in a manner that maintains the relative spatial positions of the selectively removed first passive optical nanostructures; and aligning each of the first passive optical nanostructures of the first non-monolithic array with a respective light-emitting element of the non-monolithic array of light-emitting elements.

[0004] Advantageously, at least some of the light emitting elements of the array of light emitting elements may be provided with aligned passive optical nanostructures. With very thin stacks, optical functionality may be improved. Alignment can be achieved for many light emitting elements and passive optical elements in a small number of steps, reducing cost and complexity. The size of the monolithic array may be smaller than the size of the illumination device. The cost of equipment for providing the monolithic wafer can be reduced. Areas of the monolithic wafer between the aligned passive optical elements can be used for further alignment steps, improving yield and reducing cost.

[0005] A non-monolithic array of light emitting devices can be formed on a supporting substrate. Advantageously, the light emitting devices can be provided with low cost control electrodes and electronics while maintaining dimensional stability.

[0006] The method may further include sandwiching the non-monolithic array of light emitting elements and the first non-monolithic array of first passive optical nanostructures between a supporting substrate and another substrate opposite the supporting substrate, such that each first passive optical nanostructure is aligned with a respective light emitting element. Advantageously, the array of passive optical nanostructures and the array of light emitting elements may each have high dimensional stability.

[0007] The method may further include transferring the first non-monolithic array of the first passive optical nanostructures onto another substrate prior to sandwiching. Advantageously, alignment can be achieved for many light emitting elements and passive optical elements in a small number of steps, reducing cost and complexity.

[0008] The method may further include transferring each of the first passive optical nanostructures of the first non-monolithic array to a respective one of the light emitting elements prior to sandwiching. Alignment of the light emitting elements and the passive optical nanostructures may be maintained relative to substrates having different thermal expansions. A spacing between the light emitting elements and the passive optical nanostructures may be reduced, increasing the efficiency of coupling light from the light emitting elements to the passive optical nanostructures.

[0009] The method may further include stacking each of the first passive optical nanostructures of the first non-monolithic array of passive optical nanostructures on a respective light emitting element of the non-monolithic array of light emitting elements. Advantageously, the nanostructures may be positioned to receive light from the light emitting elements.

[0010] The method may further include measuring the optical or electrical properties of the first passive optical nanostructures for at least two regions of the first monolithic array, classifying the measurement of the optical or electrical properties of each region as above or below a predetermined measurement threshold of the optical or electrical property, and simply selectively removing the first passive optical nanostructures from the regions where the measurement of the optical or electrical property is above or alternatively below the predetermined measurement threshold. Advantageously, the performance of each transferred passive optical nanostructure is above the predetermined threshold. Device uniformity is improved and rework costs are reduced. Only regions of the monolithic wafer that contain suitable passive optical elements can be used such that the tolerance of the uniformity of the monolithic wafer is relaxed. Processing yield is improved and device costs are reduced. The uniformity of the output of the illumination device can be increased.

[0011] The method may further include providing a substrate that is transparent to light in the electromagnetic wavelength range, forming a release layer on the first substrate, the release layer configured to at least partially separate from the substrate when exposed to light in the electromagnetic wavelength range, and forming a first monolithic array of first passive optical nanostructures on the release layer. Advantageously, a substrate suitable for optical addressing during transfer may be provided.

[0012] Selectively removing the plurality of first passive optical nanostructures may include illuminating an area of ​​the release layer in which the selected plurality of first passive optical nanostructures are formed with light in the electromagnetic wavelength band through the substrate, thereby at least partially separating the selected plurality of first passive optical nanostructures from the substrate. A controllable optical illumination system may be provided to select which passive optical nanostructures are separated. Advantageously controllable selection of the transferred passive optical nanostructures may be achieved.

[0013] The irradiation can at least partially separate the selected plurality of first passive optical nanostructures from the remainder of the first monolithic array of first passive optical nanostructures. In the removal transfer step, only the removed desired elements are separated. Advantageously, the transferred passive optical nanostructures can have high uniformity. The cost of the transferred passive optical nanostructures is reduced and the yield is increased.

[0014] A selected plurality of the first passive optical nanostructures may be at least partially separated from the remainder of the first monolithic array of first passive optical nanostructures by etching, scribing, or ablation. Advantageously, the passive optical nanostructures may be provided with suitable formed shapes and edge qualities.

[0015] The illumination may include multiple shaped laser beams. Advantageously, multiple passive optical nanostructures may be extracted with high processing speed, precision, and efficiency. Costs may be reduced.

[0016] The electromagnetic wavelength band can be an ultraviolet wavelength band.The bonds of the release layer can be advantageously broken without damaging the passive optical nanostructures.

[0017] The irradiation can dissociate material of the exfoliation layer to form a gas. Light in the electromagnetic wavelength range can dissociate the layer of material forming the first passive optical nanostructure. Uniform exfoliation of the passive optical nanostructure can be achieved, advantageously increasing the reliability of the extraction and reducing costs.

[0018] The method may include transferring the selectively removed plurality of first passive optical nanostructures to a transfer member and transferring each of the selectively removed plurality of first passive optical nanostructures from the transfer member to a respective light emitting element. Advantageously, damage to the array of light emitting elements during the transferring step may be reduced and yields increased. The transfer member may have a different stiffness than the support substrate of the monolithic array of first passive optical nanostructures and each light emitting element. The transfer member may comprise a material to achieve optimized alignment of the light emitting element and each passive optical element.

[0019] The method may include forming a monolithic array of passive optical nanostructures on a first substrate, the first substrate being opaque to light in the electromagnetic wavelength range; transferring the monolithic array of passive optical nanostructures onto a second substrate, the second substrate being transparent to light in the electromagnetic wavelength range; and illuminating a plurality of the first passive optical nanostructures through the second substrate with light in the electromagnetic wavelength range, thereby at least partially isolating the plurality of passive optical nanostructures from the second substrate. A substrate suitable for forming high performance passive optical nanostructures may be provided, and a separate substrate suitable for selective transfer may be provided. Performance of the growth or patterning and transfer of the passive optical nanostructures may be individually tuned to improve performance of the passive optical nanostructures. Yields may be improved and costs may be reduced.

[0020] Selectively removing the plurality of first passive optical nanostructures may include adhering the plurality of first passive optical nanostructures to a first adhesive substrate in a manner that maintains the relative spatial positions of the first passive optical nanostructures. The method may further include transferring the removed plurality of first passive optical nanostructures from the first adhesive substrate to a second adhesive substrate in a manner that maintains the relative spatial positions of the selectively removed light emitting elements, and transferring the first passive optical nanostructures from the second adhesive substrate to a support substrate in a manner that maintains the relative spatial positions of the selectively removed light emitting elements. Advantageously, uniform alignment between the passive optical nanostructures and the light emitting elements may be maintained during the transferring and aligning steps.

[0021] Each of the first passive optical nanostructures may include a first surface and a second surface opposite to the first surface, and the first passive optical nanostructures are adhered to the first adhesive substrate such that their first surfaces are adhered to the first adhesive substrate and their second surfaces are exposed. The first passive optical nanostructures may be transferred to the second adhesive substrate such that their second surfaces are in contact with the second adhesive substrate and their first surfaces are exposed. The first passive optical nanostructures may be transferred to the support substrate such that their first surfaces are in contact with the support substrate and their second surfaces are exposed. The adhesive force between the first passive optical nanostructures and the second adhesive substrate may be greater than the adhesive force between the first passive optical nanostructures and the first adhesive substrate. The passive optical nanostructures may be provided with an optical input side configured to receive light from the respective aligned light emitting elements. The adhesive force between the first passive optical nanostructures and the support substrate may be greater than the adhesive force between the first passive optical nanostructures and the second adhesive substrate. Advantageously, optical performance may be improved.

[0022] The support substrate may be a planar substrate. Advantageously, a uniform light output may be achieved. The substrate may be suitable for handling in semiconductor processing equipment. The substrate may be flexible.

[0023] Each of the light emitting elements may be a microLED with a maximum dimension of at most 300 micrometers, preferably at most 200 micrometers, most preferably at most 100 micrometers. Advantageously, a high resolution array may be provided.

[0024] Each of the first passive optical nanostructures may have a maximum dimension of at most 400 micrometers, preferably at most 250 micrometers, most preferably at most 150 micrometers. The maximum dimension of each of the first passive optical nanostructures may be equal to or greater than the maximum dimension of the light emitting area of ​​the light emitting element aligned with that first passive optical nanostructure. Advantageously, light from the light emitting element may be input to the passive optical nanostructure. The extent of the passive optical nanostructure may be reduced. Crosstalk between adjacent elements may be reduced.

[0025] The first passive optical nanostructure includes one or more subfeatures having a maximum dimension of at most 5 micrometers, preferably at most 1 micrometer, and most preferably at most 0.5 micrometer. Advantageously, diffusion artifacts can be reduced or eliminated.

[0026] The first passive optical nanostructure includes any one of the following types: a wire grid polarizer, a form birefringent retarder, a quantum dot or quantum rod color conversion structure, a distributed Bragg reflector, a metamaterial, a dichroic stack, a hologram, a moth-eye structure, a nanoblack material, a nanocollimator, an air gap surrounding a nanocolumn, and a photonic crystal.

[0027] The first passive optical nanostructure may be a wire grid polarizer. Advantageously, the output of the light emitting element may be polarized in a polarization state having a first electric vector transmission direction. Light of the orthogonal polarization state may be scattered within the light emitting element and / or other passive optical nanostructures and recycled as light having the first polarization state. Advantageously, efficiency may be improved. Such a device may be used to provide highly efficient illumination to a display with an input polarizer, such as a liquid crystal display.

[0028] At least one of the wire grid polarizers can be aligned with each light emitting element in a first orientation and at least one other of the wire grid polarizers can be aligned with each light emitting element in a second orientation, the second orientation being orthogonal to the first orientation. Advantageously, a stereoscopic display can be provided.

[0029] The first passive optical nanostructure may include a form birefringent retarder. Advantageously, optical retardance can be achieved to provide a change in polarization output. In a polarized output device, recycling efficiency may be improved. A circular output polarization can be provided to a stereoscopic display to provide head tilt for users using circular analyzer eyewear.

[0030] The first passive optical nanostructure may include a distributed Bragg reflector, which may advantageously modify the spectral output of the illumination device.

[0031] The first passive optical nanostructure may include a metamaterial, which may advantageously modify the refractive index properties of the illumination device.

[0032] The first passive optical nanostructure may include a dichroic stack, which may advantageously modify the spectral output characteristics of the illumination device.

[0033] The first passive optical nanostructure may include a hologram, which may advantageously modify the directional output characteristics of the illumination device.

[0034] The first passive optical nanostructure may include a moth-eye structure. The first passive optical nanostructure may include a nano-black material. Advantageously, the reflectance of the illumination device may be reduced and contrast may be improved.

[0035] The first passive optical nanostructure may include a nano-collimator. Advantageously, the directionality of the light output may be altered. A privacy illumination device may be provided.

[0036] The first passive optical nanostructure may include an air gap surrounding the nanocolumn. Advantageously, the illumination device may be bonded to another substrate to enhance dimensional stability. The output may be coupled to the optical device within a critical angle to enhance coupling efficiency and reduce stray light.

[0037] The first passive optical nanostructure may include a photonic crystal. Advantageously, the spectral and / or directional output may be altered to provide enhanced functionality.

[0038] The color conversion structure can be photoluminescent. The first passive optical nanostructure can be a quantum dot or quantum rod color conversion structure. Advantageously, high color conversion efficiency can be achieved. Spectral bandwidth can be controlled.

[0039] At least one of the light emitting elements of the non-monolithic array of light emitting elements may not have a quantum dot or quantum rod color conversion structure aligned therewith. Advantageously, output efficiency is increased in at least one wavelength band.

[0040] The method includes forming a second monolithic array of second passive optical nanostructures and selectively removing a plurality of second passive optical nanostructures from the second monolithic array in a manner that maintains relative spatial positions of the selectively removed second passive optical nanostructures, wherein a plurality of second passive optical nanostructures are selected for selective removal from the second monolithic array such that, for at least one pair of selectively removed second passive optical nanostructures in at least one direction, a pair of selectively removed second passive nanostructures in at least one direction are selectively removed from the second monolithic array in a manner that maintains relative spatial positions of the selectively removed second passive optical nanostructures. and selectively removing at least one respective unselected second passive optical nanostructure disposed in the second monolithic array among the optical nanostructures, forming a second non-monolithic array of second passive optical nanostructures having the selectively removed second passive optical nanostructures in a manner that maintains the relative spatial positions of the selectively removed second passive optical nanostructures, and aligning each of the second passive optical nanostructures of the second non-monolithic array of second passive optical nanostructures with a respective light emitting element of the non-monolithic array of light emitting elements. Advantageously, further modification of the light output of the light emitting elements and the aligned passive optical nanostructures can be achieved.

[0041] The first passive optical nanostructure may be a different type of passive optical nanostructure than the second passive optical nanostructure. The first monolithic array of the first passive optical nanostructures may be formed separately from the second monolithic array of the second passive optical nanostructures. The method may further include stacking each second passive optical nanostructure of the second non-monolithic array of passive optical nanostructures to either a respective light emitting element or a respective first passive optical nanostructure. Advantageously, multiple optical modifications may be achieved with very thin optical thickness and low cost.

[0042] At least one of the light emitting elements having a first passive optical nanostructure aligned thereto may not have a second passive optical nanostructure aligned thereto, and / or at least one of the light emitting elements having a second passive optical nanostructure aligned thereto may not have a first passive optical nanostructure aligned thereto. Advantageously, the output of the entire array of light emitting elements may be altered to provide different performance, e.g., color, polarization state, and emission cone solid angle, for different light emitting elements.

[0043] A non-monolithic array of light emitting elements may be formed by forming a monolithic array of light emitting elements, selectively removing a plurality of light emitting elements from the monolithic array in a manner that maintains the relative spatial positions of the selectively removed light emitting elements, wherein a plurality of light emitting elements to be selectively removed from a first monolithic array are selected such that, in at least one direction, for at least one pair of selectively removed light emitting elements in at least one direction, there is at least one respective unselected light emitting element disposed in the first monolithic array between the pair of selectively removed light emitting elements in the at least one direction, and forming a non-monolithic array of light emitting elements having the selectively removed light emitting elements in a manner that maintains the relative spatial positions of the selectively removed light emitting elements. Advantageously, a low-cost array of sparsely separated light emitting elements may be provided at low cost and with high efficiency.

[0044] The method may further include forming an illumination device having a first non-monolithic array of aligned first passive optical nanostructures and a non-monolithic array of light emitting elements. Advantageously, the optical function of the illumination device is provided with high efficiency and uniformity in a larger, thinner structure than could be achieved by the array of light emitting elements alone.

[0045] The method may further include forming a display device with the illumination device. Advantageously, the high efficiency, low cost, and thin display may have a light output that may be arranged to achieve at least some of the following: color display, stereoscopic display, privacy display, low stray light display. The display may be flexible and bendable.

[0046] According to a second aspect of the present disclosure, there is provided an illumination device that may include a non-monolithic array of light-emitting elements and a non-monolithic array of passive optical nanostructures from a monolithic array of passive optical nanostructures, wherein each of the passive optical nanostructures is aligned with a respective light-emitting element of the non-monolithic array of light-emitting elements, and the passive optical nanostructures of the non-monolithic array of passive optical nanostructures are arranged with their original positions maintained relative to each other within the monolithic array, and in at least one direction, for at least one pair of passive optical nanostructures of the non-monolithic array in at least one direction, there was at least one respective passive optical nanostructure in the monolithic array of passive optical nanostructures that was arranged in the monolithic array of passive optical nanostructures between the pair of passive optical nanostructures in the at least one direction, and that was not arranged between them in the non-monolithic array of passive optical nanostructures.

[0047] The illumination device may be a backlight for a transmissive spatial light modulator. Advantageously, privacy backlighting may be achieved. The nanostructures may be arranged to convert blue light into multiple spectral bands to provide white light. The backlight may be highly efficient and arranged in a thin package. Privacy display illumination may be provided.

[0048] The illumination device may further comprise a control system arranged to provide image data to the light-emitting elements, which are addressable and may be driven as pixels. When the illumination device is arranged for use in a backlight, advantageously a high dynamic range operation may be achieved.

[0049] According to a third aspect of the present disclosure, there is provided a display device including the illumination device of the second aspect. Advantageously, a very thin thickness can be achieved with high quality light output and low cost.

[0050] Any aspect of the present disclosure may be applied in any combination.

[0051] The embodiments of the present disclosure can be used in a variety of optical systems. The embodiments can include or operate with a variety of projectors, projection systems, optical components, displays, microdisplays, computer systems, processors, self-contained projection systems, visual and / or audiovisual systems, and electrical and / or optical devices. Aspects of the present disclosure can be used with virtually any apparatus related to optical and electrical devices, optical systems, presentation systems, or any apparatus that can include any type of optical system. Thus, the embodiments of the present disclosure can be used in optical systems, devices used in visual and / or optical presentations, visual peripherals, and the like, as well as in numerous computing environments.

[0052] Before proceeding to details of the disclosed embodiments, it should be understood that the disclosure is not limited in its application or construction to the details of the particular arrangements shown, since other embodiments are possible. Moreover, aspects of the disclosure can be described in different combinations and arrangements to define unique embodiments in themselves. Also, the terminology used herein is for purposes of description and not of limitation.

[0053] These and other advantages and features of the present disclosure will become apparent to those of ordinary skill in the art upon reading the present disclosure in its entirety. [Brief description of the drawings]

[0054] Embodiments are illustrated by way of example in the accompanying figures, in which like reference numbers indicate similar parts, and in which: [Figure 1] FIG. 2 is a schematic diagram showing a part of the structure of the irradiation device. [Diagram 2] FIG. 1 is a schematic diagram showing an example of a combination of different types of passive optical nanostructures that can be stacked on an LED. [Diagram 3] 1 is a flow chart illustrating steps of a method for fabricating passive optical nanostructures. [Figure 4] FIG. 1 is a schematic diagram showing the discrimination of passive optical nanostructures that pass or fail a criterion. [Diagram 5] FIG. 1 is a schematic diagram showing the discrimination of passive optical nanostructures that pass or fail a criterion. [Figure 6A] FIG. 1 is a schematic diagram showing the completion of an array of passive optical nanostructures. [Figure 6B] FIG. 1 is a schematic diagram showing the completion of an array of passive optical nanostructures. [Figure 6C] FIG. 1 is a schematic diagram showing the completion of an array of passive optical nanostructures. [Figure 7A] 4 is a schematic diagram illustrating various steps of a method for fabricating the passive optical nanostructure of FIG. 3. [Figure 7B] 4 is a schematic diagram illustrating various steps of a method for fabricating the passive optical nanostructure of FIG. 3. [Figure 7C] 4 is a schematic diagram illustrating various steps of a method for fabricating the passive optical nanostructure of FIG. 3. [Figure 7D] 4 is a schematic diagram illustrating various steps of a method for fabricating the passive optical nanostructure of FIG. 3. [Figure 7E] 4 is a schematic diagram illustrating various steps of a method for fabricating the passive optical nanostructure of FIG. 3. [Figure 7F] 4 is a schematic diagram illustrating various steps of a method for fabricating the passive optical nanostructure of FIG. 3. [Figure 7G] 4 is a schematic diagram illustrating various steps of a method for fabricating the passive optical nanostructure of FIG. 3. [Figure 7H] 4 is a schematic diagram illustrating various steps of a method for fabricating the passive optical nanostructure of FIG. 3. [Figure 7I]4 is a schematic diagram illustrating various steps of a method for fabricating the passive optical nanostructure of FIG. 3. [Figure 8A] 5A-5C are schematic diagrams illustrating further steps of a method for fabricating passive optical nanostructures. [Figure 8B] 5A-5C are schematic diagrams illustrating further steps of a method for fabricating passive optical nanostructures. [Figure 9] 5A-5C are schematic diagrams illustrating further steps of a method for fabricating passive optical nanostructures. [Figure 10A] FIG. 1 is a schematic diagram showing a moth-eye structure as an example of one type of passive optical nanostructure. [Figure 10B] FIG. 1 is a schematic diagram showing a moth-eye structure as an example of one type of passive optical nanostructure. [Figure 10C] FIG. 1 is a schematic diagram showing a moth-eye structure as an example of one type of passive optical nanostructure. [Figure 10D] FIG. 1 is a schematic diagram showing a moth-eye structure as an example of one type of passive optical nanostructure. [Figure 10E] FIG. 1 is a schematic diagram showing a moth-eye structure as an example of one type of passive optical nanostructure. [Figure 11A] FIG. 1 is a schematic diagram showing quantum rods as an example of one type of passive optical nanostructure. [Figure 11B] FIG. 1 is a schematic diagram showing quantum rods as an example of one type of passive optical nanostructure. [Figure 11C] FIG. 1 is a schematic diagram showing quantum rods as an example of one type of passive optical nanostructure. [Figure 11D] FIG. 1 is a schematic diagram showing quantum rods as an example of one type of passive optical nanostructure. [Figure 11E] FIG. 1 is a schematic diagram showing quantum rods as an example of one type of passive optical nanostructure. [Figure 11F] FIG. 1 is a schematic diagram showing quantum rods as an example of one type of passive optical nanostructure. [Figure 11G] FIG. 1 is a schematic diagram showing quantum rods as an example of one type of passive optical nanostructure. [Figure 12A]FIG. 1 is a schematic diagram illustrating a wire grid polarizer as an example of one type of passive optical nanostructure. [Figure 12B] FIG. 1 is a schematic diagram illustrating a wire grid polarizer as an example of one type of passive optical nanostructure. [Figure 12C] FIG. 1 is a schematic diagram illustrating a wire grid polarizer as an example of one type of passive optical nanostructure. [Figure 12D] FIG. 1 is a schematic diagram illustrating a wire grid polarizer as an example of one type of passive optical nanostructure. [Figure 12E] FIG. 1 is a schematic diagram illustrating a wire grid polarizer as an example of one type of passive optical nanostructure. [Figure 13A] FIG. 1 is a schematic diagram showing a collimating nanostructure as an example of one type of passive optical nanostructure. [Figure 13B] FIG. 1 is a schematic diagram showing a collimating nanostructure as an example of one type of passive optical nanostructure. [Figure 14A] FIG. 1 is a schematic diagram showing an air gap surrounding a nanocolumn as an example of one type of passive optical nanostructure. [Figure 14B] FIG. 1 is a schematic diagram showing an air gap surrounding a nanocolumn as an example of one type of passive optical nanostructure. [Figure 15A] FIG. 1 is a schematic diagram showing the use of nanoblack structures to surround an LED. [Figure 15B] FIG. 1 is a schematic diagram showing the use of nanoblack structures to surround an LED. [Figure 15C] FIG. 1 is a schematic diagram showing the use of nanoblack structures to surround an LED. [Figure 16A] FIG. 13 is a schematic diagram showing the use of a well to surround an LED. [Figure 16B] FIG. 13 is a schematic diagram showing the use of a well to surround an LED. [Figure 16C] FIG. 13 is a schematic diagram showing the use of a well to surround an LED. [Figure 16D] FIG. 13 is a schematic diagram showing the use of a well to surround an LED. [Figure 16E]FIG. 13 is a schematic diagram showing the use of a well to surround an LED. [Figure 17A] 1A-1C are schematic diagrams illustrating cross-sectional views of a method for attaching an optical structure to a support substrate during manufacturing of an illumination device. [Figure 17B] 1A-1C are schematic diagrams illustrating cross-sectional views of a method for attaching an optical structure to a support substrate during manufacturing of an illumination device. [Figure 18A] 13A-13C show cross-sectional views of another method of attaching an optical structure to a supporting substrate during manufacturing of an illumination device. [Figure 18B] 13A-13C show cross-sectional views of another method of attaching an optical structure to a supporting substrate during manufacturing of an illumination device. [Figure 19A] 1A-1D show cross-sectional views of a method for manufacturing an illumination device. [Figure 19B] 1A-1D show cross-sectional views of a method for manufacturing an illumination device. [Figure 19C] 1A-1D show cross-sectional views of a method for manufacturing an illumination device. [Figure 20A] 13A-13C show cross-sectional views of further methods for transferring passive optical nanostructures to respective light emitting elements. [Figure 20B] 13A-13C show cross-sectional views of further methods for transferring passive optical nanostructures to respective light emitting elements. [Figure 20C] 13A-13C show cross-sectional views of further methods for transferring passive optical nanostructures to respective light emitting elements. [Figure 21A] 13A-13C show cross-sectional views of further methods for transferring passive optical nanostructures to respective light emitting elements. [Figure 21B] 13A-13C show cross-sectional views of further methods for transferring passive optical nanostructures to respective light emitting elements. [Figure 21C] 13A-13C show cross-sectional views of further methods for transferring passive optical nanostructures to respective light emitting elements. [Figure 21D] 13A-13C show cross-sectional views of further methods for transferring passive optical nanostructures to respective light emitting elements. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0055] In this specification (unless modified by the term "packaged"), "LED" or "micro LED" refers to an unpackaged LED die chip extracted directly from a monolithic wafer, i.e., a semiconductor element. Micro LEDs can be formed by array extraction methods in which multiple LEDs are removed in parallel from a monolithic epitaxial wafer, and can be positioned with a positional tolerance of less than 5 micrometers. This differs from packaged LEDs, which typically have a lead frame and a plastic or ceramic package with solder terminals suitable for standard surface mount PCB (printed circuit board) assembly. The size of packaged LEDs and the limitations of PCB assembly techniques mean that displays formed from packaged LEDs are difficult to assemble with a pixel pitch of less than about 1 mm. The accuracy of components placed by such assemblers is typically about plus or minus 30 micrometers. Such sizes and tolerances preclude their application in very high resolution displays.

[0056] The structure and operation of various directional display devices will now be described. In this description, common elements will have common reference numbers. It should be noted that the disclosure regarding any element applies to each device in which the same or corresponding element is provided. Thus, for the sake of brevity, such disclosure will not be repeated.

[0057] 1 is a schematic diagram showing part of the structure of an illumination device 100 according to one embodiment. The illumination device 100 can be any type of illumination device, for example, an emissive modulator, a backlight for a transmissive spatial light modulator, or an ambient illumination device. The illumination device 100 can form part of a display device, such as a computer monitor, a television, or other type of display.

[0058] The illumination device 100 comprises a planar supporting substrate 200. The supporting substrate may be a planar substrate and may be flexible or rigid.

[0059] A non-monolithic array of LEDs 110 and a number of different types of passive optical nanostructures 300, 400, 500, 600, 800 are arranged on a support substrate 200. The support substrate 200 constitutes a backplane on which the LEDs 110 are mounted. The LEDs 110 are micro LEDs, i.e. LEDs with a maximum dimension of up to 300 micrometers (although preferably, the maximum dimension of each LED 110 is up to 200 micrometers, most preferably up to 100 micrometers). Each LED 110 of the above dimensions may include a single light-emitting area or may include multiple light-emitting areas provided by an electrode arrangement, or may include an array of nanoemitters, for example quantum rod emitters.

[0060] Each passive optical nanostructure 300, 400, 500, 600, 800 is aligned and stacked with a respective LED 110 such that each LED 110 has a plurality of different types of passive optical nanostructures stacked thereon. In this manner, a non-monolithic array of passive optical nanostructures 300, 400, 500, 600, 800 of each type is formed on the non-monolithic array of LEDs 110. Each passive optical nanostructure 300, 400, 500, 600, 800 has a maximum dimension of up to 400 micrometers (although preferably, the maximum dimension of each passive optical nanostructure is up to 250 micrometers, and most preferably up to 150 micrometers). The maximum dimension of each passive optical nanostructure 300, 400, 500, 600, 800 is equal to or greater than the maximum dimension of the light emitting area of ​​each LED 110.

[0061] Each passive optical nanostructure may include one or more subfeatures with a maximum dimension of up to 5 micrometers (although it is preferred that each subfeature has a maximum dimension of up to 1 micrometer, and most preferably up to 0.5 micrometers). Examples of subfeatures include, but are not limited to, conductive ridges, quantum rods, quantum dots, pillared dielectric structures, elongated dielectric structures, pillared nanoblack structures, and holographic refractive index patterned structures.

[0062] At least one of the LEDs 110 has the same combination of passive optical nanostructures of the type stacked on another one of the LEDs 110. However, not all of the LEDs 110 have the same combination of passive optical nanostructures of the type stacked on it. In other words, at least one of the LEDs 110 has a different combination of passive optical nanostructures of the type stacked on at least another one of the LEDs 110. The passive optical nanostructures 300, 400, 500, 600, 800 act to manipulate and / or modify the properties of the light output by the LEDs 110, so that the light output by each LED 110 has certain desired properties after passing through the passive optical nanostructures stacked on the LED 110. The particular desired properties vary depending on the combination of types of passive optical nanostructures through which the light passed. For example, as shown by reference numbers 934BL, 934BR, 934GR, 934GL, 934RL, and 934RR, depending on the combination of types of passive optical nanostructures passed through, the light will have different states of circular polarization (i.e., right-handed or left-handed) and different colors (e.g., red, blue, or green). Some of the LEDs 110 may provide other visible light wavelength bands or may be infrared (IR) or ultraviolet (UV) emitters.

[0063] Different types of passive optical nanostructures 300, 400, 500, 600, 800 include moth-eye structures 300, quantum rod structures 400, wire grid polarizers 500, form birefringent retarders 600, and collimating nanostructures 800, which are described in more detail below with reference to FIG. 2.

[0064] Although not shown, it will be appreciated that the illumination device may include other components, such as a control system for addressing and driving the LEDs as pixels using image data. Such a control system may include circuitry at the edge of the substrate 200 or within the array of LEDs, or a combination of the two.

[0065] Figure 2 is a schematic diagram illustrating an example of a combination of different types of passive optical nanostructures that can be stacked on the LED 110 in the illumination device 100 of Figure 1. Features of the embodiment of Figure 2 that are not discussed in further detail can be assumed to correspond to features with like reference numbers discussed above, including potential variations of features.

[0066] In this example, from the bottom up, the stack includes an LED 110, a moth-eye structure 300, a quantum rod structure 400, a collimating nanostructure 800, a wire grid polarizer 500, and a form birefringent retarder 600. The LED 110 is configured to emit light 922 (e.g., unpolarized Lambertian blue light) towards the moth-eye structure 300.

[0067] The moth-eye structure 300 is configured to receive light 922 emitted by the LED 110. The moth-eye structure provides a refractive index gradient at the output of the LED, advantageously improving the extraction of light from the LED 110.

[0068] The moth-eye structure 300 is configured to output light 924 towards the quantum rod structure 400. The quantum rod structure 400 is configured to receive the light 924 from the moth-eye structure 300 and convert the color of the light 924 (e.g., by a photoluminescence color conversion mechanism). The quantum rod structure 400 is configured to output the color converted light 926 towards the collimating nanostructure 800. The collimating nanostructure 800 is configured to receive the color converted light 926 from the quantum rod structure 400 and collimate at least a portion of the color converted light 926. At least a portion of the light received by the collimating nanostructure 800 is reflected and recycled towards the quantum rod structure 400 by an optical collimating design, which may be, for example, a microprism. Advantageously, the efficiency of the light output is improved.

[0069] The collimating nanostructures 800 are configured to output collimated light 930 towards the wire grid polarizer 500. The wire grid polarizer 500 is configured to receive the collimated light 930 from the collimating nanostructures 800 and linearly polarize the light with a particular polarization state. The wire grid polarizer 500 is configured to output linearly polarized light 932 towards the form birefringent retarder 600. The form birefringent retarder 600 is configured to receive the linearly polarized light 932 from the wire grid polarizer 500 and convert the linearly polarized light to circularly polarized light. The state of circular polarization depends on the direction of the linear polarization induced by the wire grid polarizer 500. The form birefringent retarder 600 is configured to output circularly polarized light for use by the illumination device 100 for illumination.

[0070] It will be understood that the passive optical nanostructures illustrated by Figures 1 and 2 are not the only types contemplated. Other types of passive optical nanostructures, such as quantum dot color conversion structures, Fabry-Perot cavity structures including IGZO layers for selective color reflection, distributed Bragg reflectors, metamaterials, dichroic stacks, holograms, nanoblack materials, air gaps surrounding nanocolumns, etc. Photonic crystals can be stacked on the LED 110 in addition to or instead of any of those described with reference to Figures 1 and 2.

[0071] As a comparison to the present embodiment, the growth of a stack of nanostructure layers grown directly on micro LEDs on a monolithic LED wafer is considered here. The process growth conditions of each nanostructure may be incompatible or even damaging to already deposited layers. Furthermore, the growth of each nanostructure results in a good device yield. Once the various nanostructure growth processes are completed, the overall yield loss is the sum of the individual yield losses, which can be very low for the illuminating device itself.

[0072] In this embodiment, the growth and fabrication of each nanostructured layer can be individually optimized: only good nanostructured elements are transferred, increasing overall device yield and improving optical performance.

[0073] The transfer from each nanostructured substrate can be in parallel, so that many elements can be aligned in a single step. Because alignment on the micron scale is required, this elimination of alignment steps advantageously achieves substantial cost savings.

[0074] Furthermore, for illumination devices using micro-LEDs, stacks of passive optical nanostructures tend to be more desirable compared to conventional large-scale optical structures, since the small size of micro-LEDs makes it difficult to combine micro-LEDs with conventional ones. However, stacks of passive optical nanostructures tend to be difficult to manufacture. For example, the growth of stacks of nanostructures tends to suffer from problems of overgrowth, lack of sufficient seed substrate surface quality, and poor wafer uniformity, resulting in very low yields. Next, a method of manufacturing stacks of passive optical nanostructures that can avoid and / or address the above problems is described.

[0075] FIG. 3 is a flow chart illustrating steps in a method of fabricating passive optical nanostructures for use in an illumination device, such as illumination device 100 of FIG.

[0076] In step S1, a monolithic array of a single type of passive optical nanostructure is grown on a growth substrate. The passive optical nanostructures may be any suitable type of passive optical nanostructure, including but not limited to wire grid polarizers, form birefringent retarders, quantum dot or quantum rod color conversion structures, distributed Bragg reflectors, metamaterials, dichroic stacks, holograms, moth-eye structures, nanoblack materials, nanocollimators, air gaps surrounding nanocolumns, and photonic crystals. The growth substrate may undergo further processing, such as etching, to define the individual sizes of the optical nanostructures.

[0077] In step S2, the monolithic array is inspected. For example, optical or electrical properties of the passive optical nanostructures may be measured for different regions of the monolithic array of passive optical nanostructures as part of the inspection. Optical properties include, but are not limited to, reflectance, transmittance, spectral properties, retardance, photoluminescence, and polarization extinction. Electrical properties include, but are not limited to, electrical conductivity.

[0078] Inspection may further identify defective particles, scratches, and uniformity of properties across the monolithic array.

[0079] In step S3, passive optical nanostructures that pass and / or fail a predefined criterion are identified based on the testing performed in step S2. More specifically, passive optical nanostructures that exceed a predefined measurement threshold of an optical or electrical property are classified as passing the criterion and passive optical nanostructures that fall below a predefined measurement threshold of an optical or electrical property are classified as not meeting the criterion, or vice versa. The purpose of the testing is to identify good devices prior to further transfer.

[0080] In step S4, a selection of passive optical nanostructures that pass the criteria are extracted / removed from the monolithic array. The extraction / removal is selective in the sense that one or more passive optical nanostructures that pass the criteria are not selected for extraction / removal. One or more passive optical nanostructures that pass the criteria but are not selected for extraction / removal may be positioned between the passive optical nanostructures selected for extraction / removal. The selected passive optical nanostructures are extracted / removed from the monolithic array in a manner that maintains their relative spatial position. In this way, the selected passive optical nanostructures are extracted / removed such that their relative spacing is not altered. The sparse array may be extracted with a pitch that matches the LED 110. Alignment of the selected nanostructures to the LED 110 may be provided in a single step.

[0081] In step S5, the removed passive optical nanostructures are transferred to a support substrate. More specifically, each of the removed passive optical nanostructures is transferred to a respective LED on the support substrate. The removed passive optical nanostructures are transferred in a manner that maintains the relative spatial positions of the removed passive optical nanostructures. In this manner, the relative spatial positions of the passive optical nanostructures in the initial monolithic array are maintained even after the passive optical structures are on the support substrate. This preservation of spatial positions tends to enable placement of the passive optical nanostructures on the support substrate with high precision.

[0082] In step S6, it is determined whether the desired non-monolithic array of passive optical nanostructures is complete. If the desired array is not complete, the method returns to step S4 to extract more passive optical nanostructures that pass the criteria and transfer them to a support substrate. If the desired non-monolithic array of passive optical nanostructures is complete, the method returns to step S1 and repeats with a different type of passive optical nanostructure.

[0083] Method steps S1-S6 are repeated successively with different types of passive optical nanostructures until all desired non-monolithic arrays of different types of passive optical nanostructures have been formed and stacked on the supporting substrate. In this manner, a stack of various types of passive optical nanostructures is created for each LED, for example as shown in Figures 1 and 2. It will be appreciated that the same or different types of combinations of passive optical nanostructures can be stacked on different LEDs, and in general each LED can have any types of combinations of passive optical nanostructures stacked in any order as desired.

[0084] Figures 4-5 are schematic diagrams further illustrating steps S2 and S3 of the method of Figure 3. Figure 4 is a schematic diagram illustrating an example of a region 950 of passive optical nanostructures 938 of a monolithic array of passive optical nanostructures 900. Features of the embodiments of Figures 4 and 5 that are not discussed in further detail may be assumed to correspond to features with like reference numbers discussed above, including potential variations of features.

[0085] FIG. 4 illustrates the variation of measured properties across a wafer 900. Passive optical nanostructures 30 are grown or deposited in a monolithic array 900. Variations in process conditions across the wafer 900 may provide variations in optical or electrical properties that may be divided into individual performance regions, as shown in FIG. 4. Different regions of the wafer may be included in different property groups. For example, all those items within contour 950 may be within a first target property group, and all items within region 940 may be outside the target property group. Within each property group 950, the passive optical nanostructures may be divided into performance bins. In an illustrative example, the passive optical nanostructures (PONs) may be reflective wire grid polarizer passive optical nanostructures. Property groups outside contour 950 may have a polarization extinction ratio of less than 20:1, and the passive optical nanostructures 938 may be rejected and not transferred. Within contour 950, the elements may be divided by the contour into bins with extinction ratios, for example, from 20:1 to 25:1 and from 25:1 to 30:1. Advantageously, underperforming PONs 938 are not transferred out, improving device performance.

[0086] In comparison to this embodiment, in a monolithic transfer approach, the entirety of both the active LED wafer and the passive optical nanostructure wafer are lost outside of contour 950. Advantageously, this embodiment achieves cost savings.

[0087] It may further be desirable to avoid transferring passive optical nanostructures in areas of defects and scratches and inoperable passive optical nanostructures.

[0088] 5 is a schematic diagram showing a plurality of passive optical nanostructures in a monolithic array 900. In this case, those shown as boxes 942 do not meet a criterion, which may be, for example, light transmission above a certain threshold. The other passive optical nanostructures 938 pass this criterion. The failed devices are identified and only known good die are transferred. Advantageously, the yield of the final illuminated device can be improved.

[0089] Figures 6A-6C are schematic diagrams further illustrating step S6 of Figure 3. More specifically, these figures show the process of completing a non-monolithic array of desired passive optical nanostructures by filling gaps where passive optical nanostructures are desired but were not transferred from the monolithic array. Features of the embodiments of Figures 6A-6C that are not discussed in further detail can be assumed to correspond to features with like reference numbers discussed above, including potential variations of features.

[0090] Figure 6A shows the support substrate 200 onto which the array of accepted optical elements in the feature set 950 of Figure 4 and the accepted passive optical nanostructures 938 of Figure 5 are transferred in a first transfer step. The wafer placement boundary 903A indicates the extent of the monolithic wafer of passive optical nanostructures, and the missing elements 951 indicate locations that have not been transferred.

[0091] 6B shows the transferred passive optical nanostructures 938 in at least one subsequent transfer step from the multiple wafer arrangements indicated by wafer arrangement boundaries 903B, 903C and 903D. Advantageously, the support substrate 200 is filled with devices.

[0092] 6C shows the assembled support substrate 200 with a complete set of passed passive optical nanostructures 938. Advantageously, high uniformity and reliability can be achieved.

[0093] Next, the extraction of the array of passive optical nanostructures 938 will be described.

[0094] Figures 7A-7I are schematic diagrams illustrating steps S1, S4 and S5 of the method of Figure 3. Features of the embodiments of Figures 7A-7I that are not discussed in further detail can be assumed to correspond to features with like reference numbers discussed above, including potential variations of features.

[0095] First, a growth substrate 900 is provided, as shown in Figure 7A. The growth substrate 900 is transparent to light in a particular electromagnetic wavelength band. The growth substrate 900 may be formed, for example, from sapphire and transparent to UV light.

[0096] Next, a release layer 901 is formed on the growth substrate 900, as shown in FIG. 7B. The release layer 901 can be formed from undoped gallium nitride (e.g., U-GaN). The release process can include the use of short laser pulses to facilitate the ablation process without causing thermal damage to adjacent materials. Alternatively, it can be another material with optical release layer properties, such as polyimide. Alternatively, the layer can be a release layer that can be removed by etching or heat treatment.

[0097] Next, a monolithic array of passive optical nanostructures 938 is formed (eg, grown) on the exfoliation layer 901, as shown in FIG. 7C.

[0098] Next, as shown in FIG. 7D, a transfer member 902 is provided having an adhesive layer 904 formed thereon.

[0099] Next, as shown in Figure 7E, the transfer member 902 is adhered to the monolithic array of passive optical nanostructures 938 using an adhesive layer 904. Further, the regions 912 of the release layer 901 corresponding to selected passed passive optical nanostructures 938 are illuminated through the growth substrate 900 with light in a particular band of electromagnetic wavelengths for which the growth substrate 900 is transparent. The illumination may include a plurality of shaped laser beams.

[0100] As shown in FIG. 7F, irradiation at least partially separates the selected passive optical nanostructures 938, along with the portion of the release layer 901 attached to the selected passive optical nanostructures 938, from the remainder of the passive optical nanostructures 938 and the monolithic array of growth substrate 900. This may be accomplished at least in part by irradiation dissociating the layer of material forming the release layer 901 to form a gas. The selected passive optical nanostructures 938 remain adhered to the transfer member 902 via the adhesive layer 904, which allows them to be removed by lifting them off with the transfer member 902. In addition to irradiation, etching and / or scribing may also be used to help separate the selected passive optical nanostructures from the remainder of the monolithic array.

[0101] As shown in FIG. 7G, the portions of the release layer still attached to the removed passive optical nanostructures 938 are then removed, for example, by etching or washing.

[0102] The removed passive optical nanostructures 938 are then transferred from the transfer member 902 to respective LEDs 110 on the support substrate 200, as shown in Figures 7H and 7I. The transfer may include illuminating the passive optical nanostructures 938 with light 910 to separate them from the carrier substrate, and / or adhering the passive optical nanostructures 938 to the LEDs 110 with adhesive 906. Alternatively, a thermal process or differential bonding adhesion may be used. The passive optical nanostructures 938 may then be washed to remove excess material. In this exemplary embodiment, some of the passive optical nanostructures 938 are shown as the same size as the LEDs 110, although they may be larger or smaller.

[0103] Figures 8A-8B are schematic diagrams illustrating an alternative method of growing passive optical nanostructures 938 to those shown in Figures 7A-7C. Features of the embodiment of Figures 8A-8B that are not discussed in further detail can be assumed to correspond to features with like reference numbers discussed above, including potential variations of features.

[0104] Instead of being grown on a substrate that is transparent to light in the electromagnetic wavelength band, as shown in Figure 8A, a monolithic array of passive optical nanostructures 938 is grown on a substrate 900a that is opaque to light in the electromagnetic wavelength band. Then, as shown in Figure 8B, the monolithic array of passive optical nanostructures 938 is transferred to a substrate 900b that is transparent to light in the electromagnetic wavelength band. Then, the steps shown in Figures 7D-7I can be performed. The transfer can use a release layer (not shown) or can use a layer on the etched substrate 900a (not shown).

[0105] Figure 9 is a schematic diagram illustrating additional steps that may be performed between steps 7G and 7H. Features of the embodiment of Figure 9 that are not discussed in further detail may be assumed to correspond to features with like reference numbers discussed above, including potential variations of features.

[0106] As shown in FIG. 9, the removed passive optical nanostructures 938 are transferred from the transfer member 902 to another transfer member 902a in a manner that maintains the relative spatial positions of the selectively removed light emitting elements. This is accomplished by adhering the passive optical nanostructures 938 to the adhesive layer 904a of the other transfer member 902a while the passive optical nanostructures are still adhered to the adhesive layer 904 of the transfer member 902, and pulling the two carrier substrates 902, 902a apart. Since the adhesive force of the adhesive layer 904a to the passive optical nanostructures is greater than that of the adhesive layer 904, the passive optical nanostructures separate from the adhesive layer 904 and adhere to the adhesive layer 904a. In this way, the passive optical nanostructures are inverted such that different opposing surfaces of each of the passive optical nanostructures are exposed. The strength of the adhesive layer 904 can be modified, for example, by heat and / or UV light.

[0107] Figures 10A-10E are schematic diagrams illustrating a moth-eye structure 300 as one type of passive optical nanostructure that can be fabricated according to the methods described above with reference to Figures 3-9. Features of the embodiments of Figures 10A-10E that are not discussed in further detail can be assumed to correspond to features with like reference numbers discussed above, including potential variations of features.

[0108] As shown in Figure 10A, the moth-eye structure 300 is attached and grown on a base layer 301 on a release layer 901. Figures 10B-10D show the removal and transfer of the moth-eye structure 300 to an LED 110 on a support substrate 200 by the method described above. Figure 10E is a schematic diagram showing a non-monolithic array of moth-eye structures 300 formed on a non-monolithic array of LEDs 38R, 38G, 38B.

[0109] Advantageously, the efficiency of light extraction from each LED can be increased.

[0110] Figures 11A-11G are schematic diagrams illustrating a quantum rod structure 400 as one type of passive optical nanostructure that can be fabricated according to the methods described above with reference to Figures 3-9. Features of the embodiments of Figures 11A-11G that are not discussed in further detail can be assumed to correspond to features with like reference numbers discussed above, including potential variations of features.

[0111] 11A, quantum rod structure 400 includes a plurality of quantum rods 402 on a growth substrate 401. In the illustrative example, each quantum rod 402 includes an n-doped inner rod structure 403, a plurality of quantum wells 404, and a p-doped outer layer 406. The materials may include, for example, GaN, InGaN, AlInGaP, and other known wavelength-converting photoluminescent materials.

[0112] Quantum rods 402 are disposed over LED 110 and convert the wavelength of light from LED 110, for example converting blue light to red light or converting ultraviolet radiation to red-green light.

[0113] Compared to coating quantum dot material onto an LED, quantum rods grown on a wafer can be positioned with high precision and conveniently patterned to provide coverage of the light-emitting area of ​​the LED. Advantageously, efficiency may be improved. Nanorods can be selected from area 952 of the wafer in FIG. 4 to provide color variation that matches the color output of the aligned LED. Advantageously, accuracy of color conversion may be improved.

[0114] 11B-11E show the removal and transfer of quantum rod structures 400 to LEDs 110 on a support substrate 200 by the above method. FIG. 11F is a schematic diagram showing a non-monolithic array of quantum rod structures 400R, 400G formed on a non-monolithic array of LEDs 38B for the purpose of converting blue light to red or green light, or UV light to blue, green or red light. As shown, not all of the LEDs 38B have quantum rod structures 400R, 400G stacked thereon. FIG. 11G is a schematic diagram showing another non-monolithic array of quantum rod structures 400R, 400G, 400B formed on a non-monolithic array of LEDs 38UV for the purpose of converting UV light to red, green or blue light. As shown, in this array, all of the LEDs 38UV have quantum rod structures 400R, 400G, 400B stacked thereon.

[0115] Figures 12A-12E are schematic diagrams illustrating a wire grid polarizer 500 as one type of passive optical nanostructure that can be fabricated according to the methods described above with reference to Figures 3-9. Features of the embodiments of Figures 12A-12E that are not discussed in further detail can be assumed to correspond to features with like reference numbers discussed above, including potential variations of features.

[0116] As shown in FIG. 12A, the wire grid polarizer 500 is grown attached to a base layer 501 that is on top of a release layer 901. FIGS. 12B-12D show the removal of the wire grid polarizer 500 and transfer to an LED 110 on a support substrate 200 by the method described above. FIG. 12E is a schematic diagram showing a non-monolithic array of wire grid polarizers 500P, 500S formed on a non-monolithic array of LEDs 110. As shown, some of the wire grid polarizers 500P polarize light in a first direction and some of the wire grid polarizers 500S polarize light in a second, orthogonal direction to the first direction. This is achieved by placing the wire grid polarizers 500S, 500P on the LED 110 in different, orthogonal directions depending on the polarization direction required. The wire grid polarizers 500 can be placed in other orientations, e.g., at + / - 45 degrees.

[0117] Figures 13A-13B are schematic diagrams illustrating collimating nanostructures 800 as one type of passive optical nanostructure that can be fabricated according to the methods described above with reference to Figures 3-9. Features of the embodiments of Figures 13A and 13B that are not discussed in further detail can be assumed to correspond to features with like reference numbers discussed above, including potential variations of features.

[0118] As shown in Figure 13A, collimating nanostructures 800 are attached to and formed on a base layer 801 with gaps 802 between adjacent collimating nanostructures 800. As shown in Figure 13B, light emitted from an LED is received by collimating nanostructures 800. Some light 923 is not deflected by collimating nanostructures 800 and passes through the gaps 802, some light 925 is deflected by slanted sides 804 of collimating nanostructures 800 to continue traveling away from the LED collimated, and some light 921 is reflected by collimating nanostructures 800 towards the LED.

[0119] Figures 14A-14B are schematic diagrams illustrating an air gap surrounding a nano-column 700 as one type of passive optical nanostructure that may be fabricated according to the methods described above with reference to Figures 3-9. Features of the embodiment of Figures 14A-14B that are not discussed in further detail may be assumed to correspond to features bearing like reference numbers discussed above, including potential variations of features.

[0120] 14A, the air gap surrounding the nanocolumns 700 is sandwiched between the LED 110 and a substrate 720. The air gap surrounding the nanocolumns 700 includes a number of pillars 702 extending from a base layer 701. The pillars 702 act to separate the substrate 720 from the LED 110 and to define an air gap 704 between the LED 110 and the substrate 720. As shown in FIG. 14B, the pillars 702 are bonded to the substrate 720 by an adhesive layer 706.

[0121] The color conversion layer 438 is disposed between the base layer 701 and the LED 110. In operation, light from the LED 110 that reaches the interface between the base layer 701 and the air gap 704 is totally internally reflected when it hits the interface at an angle of incidence greater than the critical angle. Thus, only light that hits the interface at an angle of incidence less than the critical angle passes through the interface. Light ray 740 is a light ray that is not color converted by the color conversion layer 438 and passes through the air gap 704 because its angle of incidence at the interface is less than the critical angle. Light ray 722 is a light ray that is color converted by the color conversion layer 438 and passes through the air gap 704 because its angle of incidence at the interface is less than the critical angle. Light ray 724 is a light ray that is color converted by the color conversion layer 438 and totally reflected at the interface. This advantageously tends to mean that light reaching the substrate 720 through the air gap has a limited range of angles and is therefore less scattered, more focused, and less likely to be trapped in a propagating mode by being guided within one of the substrate layers, e.g. 720.

[0122] Desired dimensional characteristics of the passive optical nanostructures 130 for a nominal wavelength of 550 nm are now described. The spacers 132 each have a height h that is greater than the wavelength λ of the light passing through the air gaps 133. The width w and pitch p of the spacers 132 are configured to minimize diffuse light scattering from the spacers 132 of the light passing through the air gaps 133 and to minimize guiding of light within the spacers 132.

[0123] The pitch p may be less than 2λ, preferably less than λ, more preferably less than λ / 2, most preferably less than λ / 5. The ratio w / p may be less than 0.5, preferably less than 0.3, more preferably less than 0.1. Such elements may provide high angle diffraction or zero order diffraction. Advantageously, diffractive scattering from spacers and gaps between spacers may be reduced, and light scattering between adjacent curved reflectors 222A, 222B may be minimized. Such elements may be provided by lithographic fabrication techniques on monolithic wafers. The elements may be transferred from the monolithic wafer or configured to provide a replication tool as described elsewhere herein.

[0124] In comparison to passive optical nanostructures, a passive optical microstructure with, for example, a pitch p of 20 microns and a width w of 5 microns can be used to achieve low effective refractive index and low angle diffractive scattering. Such a spacer guides the incident light within the spacer and provides a Lambertian input to the optical structure 220. Undesirable crosstalk may be provided between the reflectors 220A, 220B.

[0125] The air gap surrounding the nanocolumns 700 has an effective refractive index, n 1 Having:

number

[0126] It allows light to be coupled to the LED via an external substrate while providing a controlled cone angle and high efficiency to couple light into the optical element, reducing optical crosstalk and improving the mechanical and thermal stability of the illumination system.

[0127] It may be desirable to provide a very low light reflectance in the area surrounding the LED.

[0128] 15A-15C are schematic diagrams illustrating further steps that may be performed in addition to the fabrication and stacking of passive optical nanostructures described above. Features of the embodiments of FIG. 15A-15C that are not discussed in further detail may be assumed to correspond to features with like reference numbers discussed above, including potential variations of features.

[0129] 15A, before the LED 110 is disposed on the support substrate 200, nanoblack structures 850 are formed on the support substrate 200 around the space in which the LED 110 will be disposed. The nanoblack structures 850 surround the space 40 but are not disposed in the space 40.

[0130] Nanoblack structures absorb a very high percentage of incident light due to multiple reflections within the columnar absorbing surfaces. Advantageously, stray light can be significantly reduced. In common with other passive optical nanostructures described elsewhere herein, highly absorbing nanoblack materials can be fabricated using on-wafer semiconductor processing equipment and are therefore expensive over large areas. It would be desirable to minimize the total area of ​​use of nanoblack materials.

[0131] As shown in FIG. 15B, the LED 110 is then placed in the space 40 such that it is surrounded by the nanoblack structure 850.

[0132] As shown in FIG. 15C, various passive optical nanostructures 300, 400, 500, 600 are then sequentially stacked on top of the LED 110 using any of the methods described above. The nanoblack structure 850 acts to block light emitted from the LED 110 at wide angles, helping to provide a more directional light output. The nanoblack structure also suppresses reflections of ambient light incident on the display, improving the contrast of the display. Further crosstalk between adjacent LEDs is significantly reduced, improving image fidelity in display applications.

[0133] 16A-16E are schematic diagrams illustrating further steps that may be performed in addition to the fabrication and stacking of passive optical nanostructures described above. Features of the embodiments of FIG. 16A-16E that are not discussed in further detail may be assumed to correspond to features with like reference numbers discussed above, including potential variations of features.

[0134] As shown, a well 830 using a material such as photoresist can be formed around the LED 110 on the support substrate 200 after the LED 110 is placed on the support substrate 200. The various passive optical nanostructures 300, 400, 500, 600 are then sequentially stacked on top of the LED 110 using any of the methods described above. The well 830 acts to block light emitted from the LED 110 at wide angles to help provide a more directed and controlled light output. The well can further have sloped metalized sides to more efficiently direct the light forward.

[0135] The wells may be formed on a monolithic wafer and transferred as described elsewhere herein.

[0136] Next, a method for manufacturing an optical device including a passive optical element and a light emitting element 110 including an air gap surrounding the nano-columns of this embodiment will be described.

[0137] 17A-17B are schematic diagrams illustrating cross-sectional views of a method for attaching an optical structure 220 to a support substrate 200 during manufacture of an illumination device 100. Features of the embodiments of Figures 17A-17B that are not discussed in further detail can be assumed to correspond to features with like reference numbers discussed above, including potential variations of the features.

[0138] As shown in FIG. 17A, initially, the optical structure 220 is disposed on a supporting substrate 200 having a passive optical nanostructure including an air gap surrounding the nano-columns 700, a light emitting element 110, a reflective mask 35, and an output mask 150 including an opaque region 151 and an aperture region 152 attached thereto.

[0139] The opaque light absorbing regions 151 of the output mask 150 can be formed from any suitable opaque material, for example, by printing a black material onto the substrate 200. The opaque regions 151 may alternatively or additionally comprise a nanostructured black absorber, "nanoblack," or other similar material, such as that sold by Acktar (Kiryat-Gat, Israel). Advantageously, very low reflectance can be achieved from the front of the illumination device.

[0140] The optical structure 220 includes a plurality of concave curved reflective surfaces 222A, 222B arranged such that each of the curved reflective surfaces 222A, 222B is aligned with a respective light emitting element 110 with the optical axis 199 .

[0141] The optical structure 220 may be formed of a transparent body and a reflective material disposed thereon that constitutes the curved reflectors 222A, 222B. The body of the optical structure 220 may be a glass or polymer material. The surface relief structure of the curved reflectors may be provided, for example, by a molding or casting process material of the polymer material. A reflective layer may be formed on the curved reflectors 222A, 222B, for example, a silver or aluminum material and a deposited metal coating that may include a surface adhesion promoter and a protective layer.

[0142] Next, as shown in FIG. 17B, an adhesive layer 206 is formed between the optical structure 220 and the support substrate 200 to attach the optical structure 220 to the support substrate 200. The adhesive layer 206 fills the space around the light emitting element 110 and the passive optical nanostructures 700. The adhesive of the adhesive layer 206 can be injected into the space between the optical structure 220 and the support substrate 200 in liquid form and then set in solid form to bond the optical structure 220 to the support substrate 200, for example, by UV and / or thermal curing. Advantageously, thermal and mechanical variations during operation are minimized.

[0143] In operation, light beam 180 is output by light emitting element 110 and directed towards passive optical nanostructure 700, which includes an air gap surrounding a nano-column. Light output from nanostructure 700 is provided within the critical angle θc of the material of optical structure 220. Light from light emitting element 110 is directed only towards aligned curved reflective surface 222B and not towards curved reflective surface 222A.

[0144] After reflection from the curved reflective surface 222B, the light rays 180 are directed towards the apertures 152 of the output mask 150 and are not substantially directed towards the opaque regions 150. The light is transmitted through the aperture regions 152 to a viewer. The reflective mask 35 is positioned to block light rays from the light emitting elements that pass through the apertures 152 without reflection from the curved reflective surface 222B. Advantageously, Fresnel reflections at the gap between the optical substrate 220 and the support substrate 200 are reduced, improving optical efficiency and reducing crosstalk between adjacent channels.

[0145] Light beams 180 are directed to respective aligned apertures 152B rather than apertures 152A, advantageously reducing crosstalk between adjacent channels. The light emitting elements 110 may comprise image data and the illumination device may be a display device. Reflections from opaque regions 151 of output mask 150 may be reduced and, advantageously, image contrast in brightly lit environments may be increased.

[0146] It may be desirable to provide a passive optical element 700 on the optical structure 220 .

[0147] 18A-18B show cross-sectional views of another method of attaching the optical structure 150 to the support substrate 200 during manufacture of the illumination device 100. Features of the embodiment of FIGS. 18A-18B that are not discussed in further detail can be assumed to correspond to features with like reference numbers discussed above, including potential variations of the features.

[0148] As shown in FIG. 18A, in the method, the optical structure 220 is disposed on a supporting substrate 200, which has a light-emitting element 110 and a reflective mask 35 and an output mask 150 attached thereto, and the optical structure 150 has a passive optical nanostructure 700 attached thereto.

[0149] Each passive optical nanostructure 700 is attached to the optical structure 220 such that it is aligned with a respective curved reflective surface 222A, 222B of the optical structure 220. The optical structures 220 are positioned such that each of their curved reflective surfaces 222A, 222B is aligned with a respective light emitting element 110.

[0150] Next, as shown in Fig. 18B, an adhesive layer 206 is formed between the optical structure 220 and the support substrate 200 to attach the optical structure 220 to the support substrate 200. The adhesive layer 206 fills the space around the light emitting element 110 and the passive optical nanostructure 130. The adhesive of the adhesive layer 206 can be injected in liquid form into the space between the optical structure 150 and the support substrate 200 and then set in solid form to bond the optical structure 150 to the support substrate 200. The operation of the structure is similar to that shown in Fig. 17B.

[0151] 17B, ​​the passive optical nanostructures 700 are not formed on the light emitting elements, advantageously reducing complexity and improving yield of the substrate 200. The passive optical nanostructures 700 are provided with high uniformity and low cost, as shown elsewhere herein. Advantageously, device uniformity can be increased.

[0152] It may be desirable to provide optical elements on the optical structure 220 .

[0153] 19A-19C show cross-sectional views of a method of manufacturing an illumination device 100. Features of the embodiments of Figures 19A-19C that are not discussed in further detail can be assumed to correspond to features with like reference numbers discussed above, including potential variations of features.

[0154] As shown in Figures 19A and 19B, in the method, the passive optical nanostructures 700 are first attached to the optical structure 220 such that each passive optical nanostructure 700 is aligned with a respective curved reflective surface 222A, 222B of the optical structure 220. The light emitting elements 110 are then attached to the passive optical nanostructures 700 such that each light emitting element 110 is aligned with a respective passive optical nanostructure 700. Next, as shown in Figure 19C, a further support substrate 53 including a reflective mask 35 is bonded to the optical structure 220 using, for example, an adhesive layer 206 as described above with reference to Figures 17A-17B and 18A-18B. The substrate 35 may optionally further include driving electrodes and circuitry (not shown).

[0155] Advantageously, alignment of the light emitting elements 110 to the curved reflective surfaces 222A, 222B is achieved during the mounting step, enhancing uniformity of alignment.

[0156] In the embodiments of Figures 17A-19C, the passive optical elements may further include other passive optical elements to provide further modification of the light output, as described elsewhere herein.

[0157] 19B, passive optical elements 1000A, 1000B may be formed in the aperture regions 152A, 152B using methods described elsewhere herein to modify the polarization, color and reflectance of light transmitted through the apertures 152. Furthermore, such passive optical elements are remote from the light emitting element 110, thereby reducing degradation due to heating and advantageously extending lifetime.

[0158] Next, methods for transferring passive optical nanostructures using a transfer substrate will be further described.

[0159] 20A-20C show cross-sectional views of a further method for transferring passive optical nanostructures 938 to respective light emitting elements 110. FIG.

[0160] First, as shown in Figure 20A, a growth substrate 900 having a monolithic array of passive optical nanostructures 938 thereon is placed on a receiver substrate 975. Next, regions 912 corresponding to selected passive optical nanostructures 938 are illuminated with light 910, such as UV light, which at least partially isolates the selected passive optical nanostructures 938 from the growth substrate 900.

[0161] 20B, selected passive optical nanostructures 938 corresponding to the illuminated regions 912 are then detached from the growth substrate 900 and bonded to a receiver substrate 975. The receiver substrate 975 may be adhesive such that the selected passive optical nanostructures 938 adhere to the receiver substrate 975 when they come into contact with it.

[0162] Next, as shown in FIG. 20C, the receiver substrate 975 having the selected passive optical nanostructures thereon is placed on top of the support substrate 200 having the light emitting elements 110 thereon, such that each selected passive optical nanostructure 938 is aligned with its respective light emitting element 110.

[0163] In this embodiment, each of the light emitting elements 110 also has a respective passive optical nanostructure 1000 of a different type stacked thereon. Selected passive optical nanostructures 938 on the receiver substrate 975 are then transferred from the receiver substrate 975 to the respective light emitting element 110 such that each selected passive optical nanostructure 938 is attached to the top of the stack.

[0164] Advantageously, the receiver substrate 975 is a transfer substrate that may have different material properties than the support substrate 200. For example, the receiver substrate 975 may be a flexible material to aid in alignment between the array of passive optical nanostructures 1000 and the light emitting elements 110 in the z-direction. Additionally, multiple receiver substrates 975 may be used from each monolithic wafer 900, advantageously increasing throughput and reducing particle contamination from the monolithic wafer to the support substrate 200. Yields may be improved and costs reduced.

[0165] It may be desirable to assemble a stack of passive optical nanostructures prior to transfer to a supporting substrate.

[0166] 21A-21D show cross-sectional views of a further method of transferring passive optical nanostructures 938 to respective light emitting elements 110. The method is similar to the method shown in FIG. 20A-20C, but in which, after being transferred to a receiver substrate 975, the selected passive optical nanostructure 938 is transferred onto another stack of passive optical nanostructures 1000 already constructed on another receiver substrate 977, as shown in FIG. 21A and FIG. 21B. The entire stack including the selected passive optical nanostructure 938 is then aligned with and transferred onto the respective light emitting element 110, as shown in FIG. 21C and FIG. 21D.

[0167] The stack of passive optical nanostructures 1000 can be provided with high uniformity over a large area to advantageously achieve improved yields and uniformity compared to the arrangements of Figures 20A-20C without degrading the substrate 200 containing the light emitting element 110.

[0168] Features of the embodiments of Figures 20A-20C and Figures 21A-21D that are not discussed in further detail can be assumed to correspond to features with like reference numbers discussed above, including potential variations of features.

[0169] As may be used herein, the terms "substantially" and "approximately" provide industry-accepted tolerances for corresponding terms and / or relativities between items. Such industry-accepted tolerances may range from 0 percent to 10 percent and may correspond to, but are not limited to, component values, angles, and the like. Such relativities between items may range from approximately 0 percent to 10 percent.

[0170] While various embodiments according to the principles disclosed herein have been described above, it should be understood that they have been presented by way of example only, and not limitation. Thus, the breadth and scope of the present disclosure should not be limited by any of the above-described exemplary embodiments, but should be defined only in accordance with the claims and their equivalents issued from this disclosure. Moreover, while the above advantages and features are provided in the described embodiments, application of such issued claims to processes and structures that achieve any or all of the above advantages should not be limited.

[0171] In addition, the section headings herein are provided for consistency with suggestions under 37 CFR 1.77 or to provide organizational clues. These headings should not limit or characterize the embodiments described in claims that may be issued from this disclosure. Specifically, by way of example, the headings refer to the "Technical Field," but the claims should not be limited by the language selected under this heading to describe the so-called field. Furthermore, the description of a technology in the "Background" should not be construed as an admission that a particular technology is prior art to any embodiment in this disclosure. Nor should the "Abstract" be considered a feature of the embodiments described in the issued claims. Furthermore, references to the singular "invention" in this disclosure should not be used to assert that there is only a single point of novelty in this disclosure. Multiple embodiments may be described according to the limitations of multiple claims issued from this disclosure, and such claims thus define the embodiments and their equivalents that are protected thereby. In all cases, the scope of such claims should be considered on their own merits in light of this disclosure, but should not be constrained by the headings set forth herein.

Claims

1. 1. A method of manufacturing an illumination device, the method comprising the steps of: forming a non-monolithic array of light emitting devices; forming a first monolithic array of first passive optical nanostructures; selectively removing the plurality of first passive optical nanostructures from the first monolithic array in a manner that maintains relative spatial positions of the selectively removed plurality of first passive optical nanostructures, wherein the plurality of first passive optical nanostructures to be selectively removed from the first monolithic array are selected such that, in at least one direction, for at least one pair of the selectively removed plurality of first passive optical nanostructures in the at least one direction, for each respective pair, there is at least one unselected respective first passive optical nanostructure positioned in the first monolithic array between the at least one pair of the selectively removed plurality of first passive optical nanostructures in the at least one direction; forming a first non-monolithic array of first passive optical nanostructures having the selectively removed plurality of first passive optical nanostructures in a manner that maintains the relative spatial positions of the selectively removed plurality of first passive optical nanostructures; and aligning each of the first passive optical nanostructures of the first non-monolithic array of passive optical nanostructures with a respective light emitting element of the non-monolithic array of light emitting elements.

2. The method of claim 1 , wherein the non-monolithic array of light emitting elements is formed on a supporting substrate.

3. 3. The method of claim 2, further comprising sandwiching the non-monolithic array of light emitting elements and the first non-monolithic array of first passive optical nanostructures between the supporting substrate and another substrate opposite the supporting substrate, such that each first passive optical nanostructure is aligned with a respective light emitting element.

4. The method of claim 3 , further comprising the step of transferring the first non-monolithic array of passive optical nanostructures onto another substrate prior to the sandwiching step.

5. The method of claim 3 , further comprising the step of transferring each of the first passive optical nanostructures of the first non-monolithic array to a respective one of the light emitting elements prior to the sandwiching step.

6. 6. The method of claim 1 , further comprising stacking each of the first passive optical nanostructures of the first non-monolithic array of the first passive optical nanostructures on a respective light-emitting element of the non-monolithic array of light-emitting elements.

7. measuring optical or electrical properties of the first passive optical nanostructures for at least two regions of the first monolithic array; classifying the measurement of the optical or electrical property of each region as above or below a predetermined measurement threshold of the optical or electrical property; The method of any one of claims 1 to 6, further comprising the step of selectively removing only the first passive optical nanostructure from areas where the measurement of the optical or electrical property is above or alternatively below the predetermined measurement threshold.

8. providing a substrate that is transparent to light in a range of electromagnetic wavelengths; forming a release layer on the substrate, the release layer configured to at least partially separate from the substrate when exposed to light in the electromagnetic wavelength range; The method of claim 1 , further comprising forming a first monolithic array of the first passive optical nanostructures on the release layer.

9. Selectively removing the first plurality of passive optical nanostructures comprises:

10. The method of claim 8, comprising illuminating an area of ​​the release layer in which the selected plurality of first passive optical nanostructures are formed with light in the electromagnetic wavelength band through the substrate, thereby at least partially separating the selected plurality of first passive optical nanostructures from the substrate.

10. The method of claim 9 , wherein the irradiating at least partially isolates the selected plurality of first passive optical nanostructures from a remainder of the first monolithic array of first passive optical nanostructures.

11. 11. The method of claim 9 or 10, wherein the selected plurality of first passive optical nanostructures are at least partially separated from the remainder of the first monolithic array of first passive optical nanostructures by etching, scribing, or ablation.

12. 12. The method of claim 9, wherein the irradiation comprises a plurality of shaped laser beams.

13. 13. The method of any one of claims 9 to 12, wherein the electromagnetic wavelength band is an ultraviolet wavelength band.

14. 14. The method of claim 9, wherein the irradiation dissociates material of the release layer to form a gas.

15. 15. The method of claim 9, wherein the light in the electromagnetic wavelength band dissociates a layer of material forming the first passive optical nanostructure.

16. transferring the selectively removed first plurality of passive optical nanostructures onto a transfer member; 16. The method of claim 1, further comprising: transferring each of the selectively removed plurality of first passive optical nanostructures from the transfer member onto a respective light emitting element.

17. forming a monolithic array of the first passive optical nanostructures on a first substrate, the first substrate blocking light in an electromagnetic wavelength band; transferring the first monolithic array of passive optical nanostructures onto a second substrate, the second substrate being transparent to light in the electromagnetic wavelength band; 17. The method of claim 1, further comprising: irradiating the plurality of first passive optical nanostructures through the second substrate with light in the electromagnetic wavelength band, thereby at least partially separating the plurality of first passive optical nanostructures from the second substrate.

18. 18. The method of claim 1 , wherein selectively removing the plurality of first passive optical nanostructures comprises adhering the plurality of first passive optical nanostructures to a first adhesive substrate in a manner that maintains the relative spatial positions of the first passive optical nanostructures.

19. The method of claim 18, further comprising: transferring the removed first passive optical nanostructures from the first adhesive substrate to a second adhesive substrate in a manner that maintains the relative spatial positions of the light emitting elements; 20. The method of claim 18, further comprising: transferring the first passive optical nanostructures from the second bonding substrate to a support substrate in a manner that maintains the relative spatial positions of the light emitting elements.

20. 20. The method of claim 19, wherein each of the first passive optical nanostructures includes a first surface and a second surface opposite the first surface, and the first passive optical nanostructures are adhered to the first adhesive substrate such that their first surfaces are in contact with the first adhesive substrate and their second surfaces are exposed.

21. 21. The method of claim 19 or 20, wherein the first passive optical nanostructures are transferred to the second adhesive substrate such that their second surfaces are in contact with the second adhesive substrate and their first surfaces are exposed.

22. 22. The method of any one of claims 19 to 21, wherein the first passive optical nanostructures are transferred to the supporting substrate such that their first surfaces are in contact with the supporting substrate and their second surfaces are exposed.

23. 23. The method of claim 19, wherein the adhesion force between the first passive optical nanostructure and the second adhesive substrate is greater than the adhesion force between the first passive optical nanostructure and the first adhesive substrate.

24. 23. The method of claim 19, wherein the adhesion between the first passive optical nanostructure and the support substrate is greater than the adhesion between the first passive optical nanostructure and the second adhesive substrate.

25. 25. The method of any one of claims 19 to 24, wherein the support substrate is a planar substrate.

26. 26. The method of any one of claims 1 to 25, wherein each of the light emitting elements is a micro LED comprising a maximum dimension of at most 300 micrometers.

27. 27. The method of claim 1, wherein each of the first passive optical nanostructures has a maximum dimension of at most 400 micrometers.

28. 28. The method of claim 1, wherein a maximum dimension of each of the first passive optical nanostructures is greater than or equal to a maximum dimension of a light emitting area of ​​a light emitting element aligned with each of the first passive optical nanostructures.

29. 29. The method of any one of claims 1 to 28, wherein the first passive optical nanostructure comprises one or more subfeatures having a maximum dimension of at most 5 micrometers.

30. The first passive optical nanostructure comprises: Wire grid polarizers, Form birefringent retarder, Quantum dot or quantum rod color conversion structures; distributed Bragg reflector, Metamaterials, Fabry-Perot resonator structure, Dichroic stack, hologram, Moth eye structure, Nano black material, Nano collimator, An air gap surrounding the nanocolumn, 30. The method of claim 1 , comprising any one of the types of: photonic crystal.

31. 31. The method of any one of claims 1 to 30, wherein the first passive optical nanostructure is a wire grid polarizer.

32. 32. The method of claim 31 , wherein at least one of the wire grid polarizers is aligned with a respective light emitting element in a first orientation and at least one other wire grid polarizer is aligned with a respective light emitting element in a second orientation, the second orientation being orthogonal to the first orientation.

33. 33. The method of any one of claims 1 to 32, wherein the first passive optical nanostructure is a quantum dot or quantum rod color conversion structure.

34. 34. The method of claim 33, wherein at least one of the light emitting elements of the non-monolithic array of light emitting elements does not have a quantum dot or quantum rod color conversion structure aligned therewith.

35. forming a second monolithic array of a second passive optical nanostructure; selectively removing the plurality of second passive optical nanostructures from the second monolithic array in a manner that maintains relative spatial positions of the selectively removed plurality of second passive optical nanostructures, wherein the plurality of second passive optical nanostructures to be selectively removed from the second monolithic array are selected such that, in at least one direction, for at least one pair of the selectively removed plurality of second passive optical nanostructures in the at least one direction, for each respective pair, there is at least one unselected respective second passive optical nanostructure positioned in the second monolithic array between the at least one pair of the selectively removed plurality of second passive optical nanostructures in the at least one direction; forming a second non-monolithic array of second passive optical nanostructures having the selectively removed plurality of second passive optical nanostructures in a manner that maintains the relative spatial positions of the selectively removed plurality of second passive optical nanostructures; 35. The method of claim 1, further comprising aligning each of the second passive optical nanostructures of the second non-monolithic array of passive optical nanostructures with a respective light emitting element of the non-monolithic array of light emitting elements.

36. 36. The method of claim 35, wherein the first passive optical nanostructure is a different type of passive optical nanostructure than the second passive optical nanostructure.

37. 37. The method of claim 35 or 36, wherein the first monolithic array of first passive optical nanostructures is formed separately from the second monolithic array of second passive optical nanostructures.

38. 38. The method of any one of claims 35 to 37, further comprising stacking each second passive optical nanostructure of the second non-monolithic array of first passive optical nanostructures to either a respective light emitting element or a respective first passive optical nanostructure.

39. At least one of the light emitting elements having a first passive optical nanostructure aligned thereto does not have a second passive optical nanostructure aligned thereto; and / or 39. The method of any one of claims 35 to 38, wherein at least one of the light emitting elements having a second passive optical nanostructure aligned thereto does not have a first passive optical nanostructure aligned thereto.

40. The non-monolithic array of light emitting elements comprises: forming a monolithic array of light emitting devices; selectively removing the plurality of light emitting elements from the monolithic array in a manner that maintains the relative spatial positions of the selectively removed plurality of light emitting elements, wherein the plurality of light emitting elements to be selectively removed from the first monolithic array are selected such that, in at least one direction, for at least one pair of the selectively removed plurality of light emitting elements in the at least one direction, there is at least one respective unselected light emitting element positioned in the first monolithic array between the at least one pair of the selectively removed plurality of light emitting elements in the at least one direction; forming a non-monolithic array of light-emitting elements having the selectively removed light-emitting elements in a manner that maintains the relative spatial positions of the selectively removed light-emitting elements.

41. 41. The method of any one of claims 1 to 40, further comprising forming an illumination device having the aligned first non-monolithic array of passive optical nanostructures and the non-monolithic array of light emitting elements.

42. 42. The method of claim 41, further comprising forming a display device having the illumination device.

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