Semiconductor device, semiconductor element manufacturing method, and semiconductor device manufacturing method

Abstract

Provided is a semiconductor device which can further improve the performance of a semiconductor element having a gate electrode surrounding three surfaces of a plate-shaped channel region. The present invention comprises: a semiconductor layer; a channel region that is provided on the semiconductor layer; first and second main electrode regions that are provided to face both end sides of the channel region in a channel length direction; gate insulation films that are provided on inner walls of first and second trenches provided on both mutually facing sides of the channel region and on the upper surface of the channel region; and a gate electrode that has a first convex part embedded in the first trench with the gate insulation film therebetween, a second convex part embedded in the second trench with the gate insulation film therebetween, and a horizontal part connected to the upper ends of the first and second convex parts and provided on the upper surface of the channel region with the gate insulation film therebetween, wherein the depths of the first and second main electrode regions are equal to or larger than the depths of the first and second convex parts.

Description

[Technical field]

[0001] The technology according to the present disclosure (the present technology) relates to a semiconductor element, a semiconductor device, a method for manufacturing a semiconductor element, and a method for manufacturing a semiconductor device. [Background technology]

[0002] Conventionally, in order to improve noise, etc., a MOSFET (fin FET) has been proposed in which the three main sides of a plate-shaped channel region are surrounded by a gate electrode having a protruding portion embedded in the upper part of a semiconductor layer (see Patent Documents 1 and 2). [Prior art documents] [Patent documents]

[0003] [Patent Document 1] JP 2006-121093 A [Patent Document 2] JP 2006-121093 A Summary of the Invention [Problem to be solved by the invention]

[0004] Further improvements in performance, such as an improvement in transconductance gm, are required for the FinFETs described in Patent Documents 1 and 2. Patent Documents 1 and 2 do not disclose any relationship between the depth of the protrusion of the gate electrode of the MOSFET and the depth of the source region and the drain region.

[0005] The present technology aims to provide a semiconductor element, a semiconductor device, a method for manufacturing a semiconductor element, and a method for manufacturing a semiconductor device that can further improve the performance of an insulated gate semiconductor element having a gate electrode surrounding three sides of a plate-shaped channel region. [Means for solving the problem]

[0006] A semiconductor element according to one aspect of the present technology includes a semiconductor layer, a channel region provided on an upper portion of the semiconductor layer, first and second main electrode regions provided opposite both ends of the channel region in a channel length direction, inner walls of first and second trenches provided on both sides of the channel region facing each other in a channel width direction, a gate insulating film provided on an upper surface of the channel region, and a first convex portion embedded in the first trench via the gate insulating film, a second convex portion embedded in the second trench via the gate insulating film, and a gate electrode having a horizontal portion connected to upper ends of the first and second convex portions and provided on the upper surface of the channel region via the gate insulating film, wherein the depth of the first and second main electrode regions is the same as the depth including the gate insulating films of the first and second convex portions.

[0007] A semiconductor device according to one aspect of the present technology includes a first semiconductor element having a semiconductor layer, a channel region provided on an upper portion of the semiconductor layer, first and second main electrode regions provided opposite both ends of the channel region in a channel length direction, inner walls of first and second trenches provided on both sides of the channel region facing each other in a channel width direction, and a gate insulating film provided on an upper surface of the channel region, a first convex portion embedded in the first trench via the gate insulating film, a second convex portion embedded in the second trench via the gate insulating film, and a gate electrode connected to upper ends of the first and second convex portions and having a horizontal portion provided on the upper surface of the channel region via the gate insulating film, and a second semiconductor element having third and fourth main electrode regions provided opposite to an upper portion of the semiconductor layer, and a second gate electrode provided on the semiconductor layer sandwiched between the third and fourth main electrode regions via a second gate insulating film, wherein a depth of the first and second main electrode regions is the same as a depth including the gate insulating films of the first and second convex portions.

[0008] A method for manufacturing a semiconductor device according to one aspect of the present technology includes the steps of: digging a recess in an upper part of a semiconductor layer to form a channel region partitioned by the recess; filling an isolation insulating film in the recess; forming a channel region in an upper part of the semiconductor layer; filling the upper part of the semiconductor layer with the isolation insulating film; selectively removing the isolation insulating film to dig first and second trenches to expose opposing side surfaces of the channel region in a channel width direction; forming a gate insulating film on inner walls of the first and second trenches and on an upper surface of the channel region; filling a conductive material layer in the first and second trenches via the gate insulating film to form a gate electrode having a first convex portion filled in the first trench, a second convex portion filled in the second trench, and a horizontal portion connected to upper ends of the first and second convex portions and provided on the upper surface of the channel region via the gate insulating film; and forming first and second main electrode regions opposing each other on both ends of the channel region in a channel length direction to the same depth as a depth including the gate insulating films of the first and second convex portions.

[0009] A method for manufacturing a semiconductor device according to one aspect of the present technology includes the steps of: digging a recess in an upper portion of a semiconductor layer to form a channel region partitioned by the recess; filling an element isolation insulating film in the recess; selectively removing the element isolation insulating film to dig first and second trenches exposing opposing side surfaces of the channel region in a channel width direction; forming a gate insulating film on inner walls of the first and second trenches and on an upper surface of the channel region; filling a conductive material layer in the first and second trenches via the gate insulating film, and forming a first convex portion filled in the first trench and a second convex portion filled in the second trench. The method includes the steps of: forming a gate electrode having a horizontal portion connected to upper ends of the first and second convex portions and provided on the upper surface of the channel region via a gate insulating film; forming first and second main electrode regions opposing each other across both ends of the channel region in the channel length direction, at the same depth as the depth including the gate insulating films of the first and second convex portions; forming a second gate electrode on a semiconductor layer via a gate insulating film; and forming third and fourth main electrode regions opposing each other across the semiconductor layer below the second gate electrode, at a depth different from the depth of the first and second main electrode regions. [Brief description of the drawings]

[0010] [Figure 1] FIG. 1 is a schematic configuration diagram of a semiconductor device (solid-state imaging device) according to the first embodiment. [Diagram 2] FIG. 2 is an equivalent circuit of the pixel region of the semiconductor device according to the first embodiment. [Diagram 3] FIG. 3 is a cross-sectional view of a main part of the semiconductor device according to the first embodiment. [Figure 4] FIG. 4 is a plan view of a main part of the semiconductor device according to the first embodiment. [Diagram 5] FIG. 5 is a cross-sectional view seen from the BB' direction in FIG. [Figure 6] FIG. 6 is a cross-sectional view taken along the CC' direction in FIG. [Figure 7A] FIG. 7A is a process cross-sectional view showing the method for manufacturing the semiconductor device according to the first embodiment. [Figure 7B] FIG. 7B is a cross-sectional view illustrating the steps of the method for manufacturing the semiconductor device according to the first embodiment. [Figure 8A] FIG. 8A is a cross-sectional view showing a process subsequent to FIG. 7A, illustrating the method for manufacturing the semiconductor device according to the first embodiment. [Figure 8B] FIG. 8B is a cross-sectional view showing a process subsequent to FIG. 7B, illustrating the method for manufacturing the semiconductor device according to the first embodiment. [Figure 9A] FIG. 9A is a cross-sectional view showing a process subsequent to FIG. 8A, illustrating the method for manufacturing the semiconductor device according to the first embodiment. [Figure 9B] FIG. 9B is a cross-sectional view showing a process subsequent to FIG. 8B, illustrating the method for manufacturing the semiconductor device according to the first embodiment. [Figure 10A] FIG. 10A is a cross-sectional view showing a process subsequent to FIG. 9A, illustrating the method for manufacturing the semiconductor device according to the first embodiment. [Figure 10B] FIG. 10B is a cross-sectional view showing a process subsequent to FIG. 9B, illustrating the method for manufacturing the semiconductor device according to the first embodiment. [Figure 11]11A to 11C are cross-sectional views showing the steps of the method for manufacturing the semiconductor device according to the first embodiment, following FIG. [Figure 12] 12A to 12C are cross-sectional views showing a process following FIG. 11, illustrating the method for manufacturing the semiconductor device according to the first embodiment. [Figure 13] 13A to 13C are cross-sectional views showing the steps of the method for manufacturing the semiconductor device according to the first embodiment, following FIG. 12. [Figure 14] FIG. 14 is a cross-sectional view of a main part of a semiconductor device according to a modified example of the first embodiment. [Figure 15] FIG. 15 is a cross-sectional view of a main part of the semiconductor device according to the second embodiment. [Figure 16] FIG. 16 is a cross-sectional view of a main part of a semiconductor device according to a comparative example of the second embodiment. [Figure 17] 17A to 17C are cross-sectional views illustrating the steps of the method for manufacturing the semiconductor device according to the second embodiment. [Figure 18] 18A to 18C are cross-sectional views showing a process following FIG. 17, illustrating the method for manufacturing the semiconductor device according to the second embodiment. [Figure 19] 19A to 19C are cross-sectional views showing a process following FIG. 18, illustrating the method for manufacturing the semiconductor device according to the second embodiment. [Figure 20] 20A to 20C are cross-sectional views showing a process following FIG. 19, illustrating the method for manufacturing the semiconductor device according to the second embodiment. [Figure 21] 21A to 21C are cross-sectional views showing the steps of the method for manufacturing the semiconductor device according to the second embodiment, following FIG. 20. In FIG. [Figure 22] 22A to 22C are cross-sectional views showing a process following FIG. 21, illustrating the method for manufacturing the semiconductor device according to the second embodiment. [Figure 23] 23A to 23C are cross-sectional views illustrating steps in a method for manufacturing a semiconductor device according to a modification of the second embodiment. [Figure 24] 24A to 24C are cross-sectional views illustrating steps in a method for manufacturing a semiconductor device according to a modified example of the second embodiment, which are subsequent to FIG. [Diagram 25] 25A to 25C are cross-sectional views illustrating steps in a method for manufacturing a semiconductor device according to a modified example of the second embodiment, which are subsequent to FIG. [Figure 26] FIG. 26 is a schematic diagram showing an electronic device to which a semiconductor device according to another embodiment is applied. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0011] The first and second embodiments of the present technology will be described below with reference to the drawings. The following description refers to the drawings. In the description of the drawings, the same or similar parts are given the same or similar symbols. However, it should be noted that the drawings are schematic, and the relationship between thickness and planar dimensions, the thickness ratio of each layer, etc. are different from the actual ones. Therefore, the specific thickness and dimensions should be determined with reference to the following description. In addition, it goes without saying that the drawings include parts with different dimensional relationships and ratios. Note that the effects described in this specification are merely examples and are not limited to the above, and other effects may also be present.

[0012] In this specification, the "first main electrode region" of a semiconductor element constituting a semiconductor device including a solid-state imaging device means a semiconductor region that becomes either a source region or a drain region of an insulated gate field effect transistor (MISFET), an insulated gate static induction transistor (MISSIT), a high electron mobility transistor (HEMT), or the like. The "second main electrode region" means a semiconductor region that becomes either a source region or a drain region that does not become the above-mentioned first main electrode region of a MISFET, or the like. In this way, if the "first main electrode region" is the source region, the "second main electrode region" means the drain region. In addition, the "third main electrode region" and the "fourth main electrode region" of a semiconductor element constituting a semiconductor device including a solid-state imaging device also have the same relationship as the "first main electrode region" and the "second main electrode region".

[0013] In the following description, the first conductivity type is n-type and the second conductivity type is p-type. However, the conductivity types may be selected in the opposite relationship, with the first conductivity type being p-type and the second conductivity type being n-type. The "+" or "-" attached to "n" or "p" means that the semiconductor region has a relatively high or low impurity concentration, respectively, compared to a semiconductor region without the "+" or "-" attached. However, even if the semiconductor regions have the same "n" and "n" attached, it does not mean that the impurity concentrations of the respective semiconductor regions are strictly the same.

[0014] In addition, the definitions of directions such as up and down in the following description are merely for the convenience of explanation and do not limit the technical idea of ​​the present technology. For example, if an object is rotated 90 degrees and observed, up and down are converted to left and right and read, and if it is rotated 180 degrees and observed, up and down are reversed and read.

[0015] (First embodiment) <Semiconductor device> As one type of semiconductor device (semiconductor integrated circuit) according to the first embodiment, a solid-state imaging device such as a CMOS image sensor is exemplified. As shown in FIG. 1, the semiconductor device according to the first embodiment includes a pixel region 1 and peripheral circuits (3, 4, 5, 6, 7). The pixel region 1 has a plurality of pixels 2 arranged in a two-dimensional matrix. Although not shown in FIG. 1, each of the plurality of pixels 2 has a photoelectric conversion unit that photoelectrically converts incident light, and a plurality of pixel transistors that control the photoelectrically converted signal charge. The plurality of pixel transistors can employ, for example, four transistors: a transfer transistor, a reset transistor, a selection transistor, and an amplification transistor.

[0016] The peripheral circuits (3, 4, 5, 6, 7) include a vertical drive circuit 3, a column signal processing circuit 4, a horizontal drive circuit 5, an output circuit 6, and a control circuit 7. The vertical drive circuit 3 is formed of, for example, a shift register. The vertical drive circuit 3 sequentially selects pixel drive wirings 8a, supplies pulses for driving the pixels 2 to the selected pixel drive wirings 8a, and drives each pixel 2 row by row. That is, the vertical drive circuit 3 sequentially selects and scans each pixel 2 in the pixel region 1 vertically row by row, and supplies an output signal (pixel signal) from the pixel based on a signal charge generated in the photoelectric conversion unit of each pixel 2 to the column signal processing circuit 4 through the vertical signal line 8b.

[0017] The column signal processing circuit 4 is arranged, for example, for each column of pixels 2, and performs signal processing such as noise removal for each pixel column on signals output from one row of pixels 2. For example, the column signal processing circuit 4 performs signal processing such as correlated double sampling (CDS) and analog-to-digital (AD) conversion for removing fixed pattern noise specific to each pixel.

[0018] The horizontal drive circuit 5 is formed of, for example, a shift register. The horizontal drive circuit 5 sequentially outputs horizontal scanning pulses to the column signal processing circuits 4, selects the column signal processing circuits 4 in order, and causes the selected column signal processing circuits 4 to output pixel signals that have been subjected to signal processing to a horizontal signal line 9. The output circuit 6 processes the pixel signals sequentially supplied from each of the column signal processing circuits 4 through the horizontal signal line 9, and outputs the processed pixel signals.

[0019] The control circuit 7 generates clock signals and control signals that serve as a reference for the operation of the vertical drive circuit 3, the column signal processing circuit 4, the horizontal drive circuit 5, etc., based on the vertical synchronization signal, the horizontal synchronization signal, and the master clock signal. Then, the control circuit 7 outputs the generated clock signals and control signals to the vertical drive circuit 3, the column signal processing circuit 4, the horizontal drive circuit 5, etc.

[0020] The semiconductor device according to the first embodiment may be configured as shown in Fig. 1 using a single substrate, or may be configured as a laminated structure in which multiple substrates are bonded together. For example, the semiconductor device according to the first embodiment may be configured with first and second substrates, with the photoelectric conversion unit and pixel transistors provided on the first substrate, and the peripheral circuits (3, 4, 5, 6, 7) and the like provided on the second substrate. Alternatively, the photoelectric conversion unit and a portion of the pixel transistors may be provided on the first substrate, and the remaining portion of the pixel transistors and the peripheral circuits (3, 4, 5, 6, 7) and the like may be provided on the second substrate.

[0021] FIG. 2 shows an example of an equivalent circuit of a pixel 2 of the semiconductor device according to the first embodiment. As shown in FIG. 2, the anode of a photodiode PD, which is a photoelectric conversion unit of the pixel 2, is grounded, and the source of a transfer transistor T1, which is an active element, is connected to the cathode of the photodiode PD. A floating charge accumulation region (floating diffusion region) FD is connected to the drain of the transfer transistor T1. The charge accumulation region FD is connected to the source of a reset transistor T2, which is an active element, and the gate of an amplification transistor T3, which is an active element. The source of the amplification transistor T3 is connected to the drain of a selection transistor T4, which is an active element, and the drain of the amplification transistor T3 is connected to a power supply Vdd. The source of the selection transistor T4 is connected to a vertical signal line VSL. The drain of the reset transistor T2 is connected to a power supply Vdd.

[0022] During operation of the semiconductor device according to the first embodiment, the signal charge generated in the photodiode PD of the pixel 2 is accumulated in the charge accumulation region FD of the pixel 2 via the transfer transistor T1 of the pixel 2. The signal charge accumulated in the charge accumulation region FD of the pixel 2 is read out and applied to the gate of the amplification transistor T3 of the pixel 2. A selection control signal for a horizontal line is provided to the gate of the selection transistor T4 of the pixel 2 from the vertical shift register. By setting the selection control signal to a high (H) level, the selection transistor T4 becomes conductive, and a current corresponding to the potential of the charge accumulation region FD of the pixel 2 amplified by the amplification transistor T3 of the pixel 2 flows in the vertical signal line VSL. In addition, by setting the reset control signal applied to the gate of the reset transistor T2 to a high (H) level, the reset transistor T2 of the pixel 2 becomes conductive, and the signal charge accumulated in the charge accumulation region FD of the pixel 2 is reset.

[0023] 3, the semiconductor device according to the first embodiment includes a first semiconductor element 101 and a second semiconductor element 102 provided in the same semiconductor layer (semiconductor substrate) 10. The first semiconductor element 101 is an active element corresponding to, for example, the amplifying transistor T3 shown in FIG. 2, and is defined within an active region (first active region) of the semiconductor layer 10. The second semiconductor element 102 is an active element corresponding to, for example, a low-voltage analog transistor included in the peripheral circuits (3, 4, 5, 6, 7) shown in FIG. 1, and is defined within an active region (second active region) of the semiconductor layer 10.

[0024] FIG. 4 is a plan view of the first semiconductor element 101 shown on the left side of FIG. 3, and a cross-sectional view taken from the AA' direction in FIG. 4 corresponds to FIG. 3. FIG. 5 is a cross-sectional view taken from the BB' direction in FIG. 4. FIG. 6 is a cross-sectional view taken from the CC' direction in FIG. 4. For convenience, the interlayer insulating film, gate surface wiring, source electrode, drain electrode, protective film, etc. covering the first semiconductor element 101 and the second semiconductor element 102 are omitted from the illustrations in FIGS. 3 to 6.

[0025] As shown in FIGS. 3 to 6, the first semiconductor element 101 includes first conductivity type (n-type) semiconductor layers 101a and 101b provided on the upper portion of the semiconductor layer 10 at both ends in the direction of the channel length L of the channel region 10a and facing each other. + A first main electrode region (source region) 11 of a first conductivity type (n + The second main electrode region (drain region) 12 has a second main electrode region (drain region) of the n-type.

[0026] The semiconductor layer 10 is a high resistivity first conductivity type (n - The semiconductor layer 10 may be formed of a silicon (Si) substrate of the second conductivity type (p) and used in a depleted state. The semiconductor layer 10 may be a well region in the upper part of the Si substrate or an epitaxially grown layer on the Si substrate. Alternatively, the semiconductor layer 10 may be formed of a semiconductor layer on an insulating layer that constitutes an SOI substrate. The semiconductor layer 10 may be formed of a silicon (Si) substrate of the second conductivity type (p - The semiconductor device may be constructed using a silicon substrate of the same type.

[0027] The impurity concentration of the first main electrode region 11 and the second main electrode region 12 is higher than the impurity concentration of the semiconductor layer 10. The depth D1 of the first main electrode region 11 and the second main electrode region 12 defined in Fig. 3 is, for example, about 200 nm to 500 nm, for example, about 300 nm. The first main electrode region 11 and the second main electrode region 12 are partitioned and isolated by an element isolation insulating film 16 provided on the upper part of the semiconductor layer 10. The element isolation insulating film 16 can be composed of an insulating film such as a silicon oxide film (SiO2 film).

[0028] 3, 4, and 6, a part of the semiconductor layer 10 sandwiched between the first main electrode region 11 and the second main electrode region 12 constitutes a channel region (first channel region) 10a. The first channel region 10a is configured in a fin type (plate shape) and extends in a direction in which the first main electrode region 11 and the second main electrode region 12 face each other (the direction of the channel length L1). In FIG. 4, the first channel region 10a hidden directly under the gate electrode (first gate electrode) 14 is shown by a dashed line.

[0029] As shown in FIGS. 3 to 6, the first semiconductor element 101 includes a first gate electrode 14 provided so as to surround both opposing side surfaces and an upper surface of the first channel region 10a with a gate insulating film (first gate insulating film) 13 interposed therebetween.

[0030] The first gate insulating film 13 may be made of a single layer of silicon oxide film (SiO2 film), silicon oxynitride film (SiON film), strontium oxide film (SrO film), silicon nitride film (Si3N4 film), aluminum oxide film (Al2O3 film), magnesium oxide film (MgO film), yttrium oxide film (Y2O3 film), hafnium oxide film (HfO2 film), zirconium oxide film (ZrO2 film), tantalum oxide film (Ta2O5 film), or bismuth oxide film (Bi2O3 film), or a composite film formed by stacking a plurality of these films. When the first gate insulating film 13 is a SiO2 film, the thickness of the first gate insulating film 13 may be set to, for example, about 5 nm to 20 nm under the condition of operating at a low voltage where the Fowler-Nordheim (FN) tunnel current is not a problem. When the thickness of the SiO2 film is 5 nm or less, leakage due to direct tunneling current must be taken into consideration. However, by selecting a material with a large relative dielectric constant for the first gate insulating film 13, it is possible to make the equivalent thickness of the SiO2 film 13 1 nm or less.

[0031] For example, polysilicon doped with a high concentration of n-type impurities (doped polysilicon) can be used as the material of the first gate electrode 14. Note that the material of the first gate electrode 14 may be a conductive material other than doped polysilicon (DOPOS), such as a high-melting point metal such as tungsten (W), molybdenum (Mo), titanium (Ti), a silicide of a high-melting point metal and polysilicon, or a composite film of polysilicon and a silicide of a high-melting point metal, such as polycide.

[0032] As shown in FIG. 3 to FIG. 6, the first gate electrode 14 is embedded in the upper part of the semiconductor layer 10 via the first gate insulating film 13, and has a first convex portion 142 and a second convex portion 143 parallel to each other, and a horizontal portion 141 provided on the semiconductor layer 10 via the first gate insulating film 13, and connecting the upper surfaces of the first convex portion 142 and the second convex portion 143 to each other. The first gate electrode 14 has a shape close to a C-shaped rail (hereinafter referred to as a "C-shaped rail shape") with the first convex portion 142, the second convex portion 143, and the horizontal portion 141. That is, the first semiconductor element 101 constitutes a MOSFET (fin type FET) having a plate-shaped (fin type) first channel region 10a whose upper surface and side surfaces are surrounded by the C-shaped rail-shaped first gate electrode 14. The C-shaped rail-shaped first gate electrode 14 realizes a structure in which the three surfaces of the plate-shaped (thin rectangular parallelepiped) first channel region 10a are surrounded.

[0033] As shown in FIG. 6, the C-shaped rail-like cross-sectional shape of the first gate electrode 14 can be compared to the Greek letter π. The first convex portion 142 and the second convex portion 143 sandwich both sides of the side surface of the first channel region 10a via the first gate insulating film 13 in a direction (channel width W1 direction) perpendicular to the opposing direction of the first main electrode region 11 and the second main electrode region 12. The first convex portion 142 and the second convex portion 143 extend parallel to the channel length L1 direction of the first channel region 10a between the first main electrode region 11 and the second main electrode region 12. As shown in FIG. 3 and FIG. 5, a sidewall insulating film 15 made of a silicon nitride film (Si3N4 film) or the like is provided on the sidewall that becomes the channel end of the horizontal portion 141 of the first gate electrode 14.

[0034] 3 to 6, the first gate electrode 14 is shown to have a C-rail shape having two first protrusions 142 and second protrusions 143, but the number of protrusions of the first gate electrode 14 is not particularly limited, and the first gate electrode 14 is not limited to the C-rail shape. For example, the first gate electrode 14 may have three or more protrusions, and a plurality of channel regions, two or more in number corresponding to the number of protrusions, may be provided.

[0035] The first gate electrode 14 electrostatically controls the surface potential of the first channel region 10a facing the first convex portion 142, the second convex portion 143, and the horizontal portion 141 via the first gate insulating film 13, thereby forming channels on both sides of the side surface and the upper surface of the first channel region 10a.

[0036] The depth D0 of the first convex portion 142 and the second convex portion 143 from the upper surface of the channel region 10a, including the thickness of the first gate insulating film 13, as defined in Figures 5 and 6, is, for example, about 200 nm to 400 nm, for example, about 300 nm. The height H1 of the horizontal portion 141 above the channel region 10a, including the thickness of the first gate insulating film 13, as defined in Figures 3 and 5, is, for example, about 200 nm to 400 nm, for example, about 300 nm. The depth D0 of the first convex portion 142 and the second convex portion 143 and the height H1 of the horizontal portion 141 may be approximately the same as each other or may be different from each other.

[0037] In the semiconductor device according to the first embodiment, the depth D1 of the first main electrode region 11 and the second main electrode region 12 defined in Fig. 3 is set to be equal to or greater than the depth D0 of the first convex portion 142 and the second convex portion 143 including the thickness of the first gate insulating film 13 defined in Fig. 5 and Fig. 6. By setting D1 ≧ D0, the mutual conductance gm of the semiconductor device according to the first embodiment can be increased. The depth D1 of the first main electrode region 11 and the second main electrode region 12 may be, for example, about 0 nm to 200 nm deeper, or about 0 nm to 100 nm deeper, than the depth D0 of the first convex portion 142 and the second convex portion 143 including the thickness of the first gate insulating film 13.

[0038] However, the deeper the depth D1 of the first main electrode region 11 and the second main electrode region 12, the greater the short channel effect, making it difficult to control the drain current with the gate voltage. Therefore, in the case where the first semiconductor element 101 is a MOSFET or MISFET, in order to suppress the manifestation of the short channel effect, it is preferable to set the depth D1 of the first main electrode region 11 and the second main electrode region 12 to be approximately equal to the depth D0 including the thickness of the first gate insulating film 13 of the first convex portion 142 and the second convex portion 143. Note that the depth D1 of the first main electrode region 11 and the second main electrode region 12 defined in FIG. 3 may be set to be approximately equal to the depth of only the first convex portion 142 and the second convex portion 143 defined by the dimensions not including the thickness of the first gate insulating film 13. Furthermore, when the depth D1 of the first main electrode region 11 and the second main electrode region 12 is the same as the depth D0 of the first convex portion 142 and the second convex portion 143 including the thickness of the first gate insulating film 13, they do not necessarily have to be completely the same, but may be approximately the same or similar within a range that does not impair the characteristics of the semiconductor device according to the first embodiment. Also, there may be a difference in value on the order of a manufacturing error.

[0039] In addition, when the first semiconductor element 101 is a MISSIT or a MOSSIT, since an SIT is a semiconductor element that actively utilizes the short channel effect, the depth D1 of the first main electrode region 11 and the second main electrode region 12 may be made deeper than the depth D0 including the thickness of the first gate insulating film 13 of the first convex portion 142 and the second convex portion 143 to increase the mutual conductance gm.

[0040] In the semiconductor device according to the first embodiment, the height H1 of the horizontal portion 141 of the first gate electrode 14 is set to be equal to or greater than the depth D1 of the first main electrode region 11 and the second main electrode region 12. For example, the height H1 of the horizontal portion 141 of the first gate electrode 14 is substantially the same as the depth D1 of the first main electrode region 11 and the second main electrode region 12 (for example, 300 nm, respectively). In the manufacturing process of the semiconductor device according to the first embodiment, when the first main electrode region 11 and the second main electrode region 12 are formed, the horizontal portion 141 is used as an ion implantation mask to implant impurities in a self-aligned manner. In this case, by setting the height H1 of the horizontal portion 141 to be equal to or greater than the depth D1 of the first main electrode region 11 and the second main electrode region 12, it is possible to prevent the implanted impurity ions from penetrating the horizontal portion 141 and reaching the first channel region 10a.

[0041] On the other hand, the second semiconductor element 102 shown on the right side of FIG. 3 is composed of a general planar type n-channel MOSFET. The second semiconductor element 102 is provided in a well region 10b of a second conductivity type (p-type) provided on the upper part of the semiconductor layer 10. Note that, when the semiconductor layer 10 is a well region of the second conductivity type (p - In the case where the semiconductor layer 10 is configured on a Si substrate of the first conductivity type (n-type), the second semiconductor element 102 may be provided on the semiconductor layer 10. The second semiconductor element 102 may be a first conductivity type (n-type) semiconductor + A third main electrode region (source region) 21 of the first conductivity type (n + The third main electrode region 21 and the fourth main electrode region 22 have a higher impurity concentration than the semiconductor layer 10.

[0042] The second semiconductor element 102 further includes a second gate electrode 24 provided via a second gate insulating film 23 on a channel region (second channel region) that is an upper surface side of the well region 10b sandwiched between the third main electrode region 21 and the fourth main electrode region 22. The second gate electrode 24 electrostatically controls the surface potential of the second channel region via the second gate insulating film 23, thereby forming an inversion channel in the second channel region. A sidewall insulating film 25 made of a silicon nitride film (Si3N4 film) or the like is provided on a sidewall of the second gate electrode 24 that is to be a channel end portion.

[0043] The third main electrode region 21 and the fourth main electrode region 22 of the second semiconductor element 102 are formed in an independent process different from the process of forming the first main electrode region 11 and the second main electrode region 12 of the first semiconductor element 101. The depth D2 of the third main electrode region 21 and the fourth main electrode region 22 of the second semiconductor element 102 is set to be different from the depth D1 of the first main electrode region 11 and the second main electrode region 12 of the first semiconductor element 101. For example, the depth D2 of the third main electrode region 21 and the fourth main electrode region 22 of the second semiconductor element 102 is set to be shallower than the depth D1 of the first main electrode region 11 and the second main electrode region 12. The depth D2 of the third main electrode region 21 and the fourth main electrode region 22 of the second semiconductor element 102 is, for example, about 100 nm to 200 nm, and may be, for example, about 150 nm.

[0044] For example, when the second semiconductor element 102 is a transistor of a peripheral circuit, the third main electrode region 21 and the fourth main electrode region 22 of the second semiconductor element 102 are produced in a process independent of the first main electrode region 11 and the second main electrode region 12 of the first semiconductor element 101. This makes it possible to prevent the first semiconductor element 101 from affecting the miniaturization of the element isolation width, gate length, etc. of the peripheral circuit, even if the first main electrode region 11 and the second main electrode region 12 of the first semiconductor element 101 are provided deep.

[0045] The second gate electrode 24 of the second semiconductor element 102 is formed in an independent process different from the process of forming the first gate electrode 14 of the first semiconductor element 101. The height H2 of the second gate electrode 24 is set to be different from the height H1 of the horizontal portion 141 of the first gate electrode 14. For example, the height H2 of the second gate electrode 24 is set lower than the height H1 of the horizontal portion 141 of the first gate electrode 14, and does not need to be made thicker than the first gate electrode 14. The height H2 of the second gate electrode 24 is, for example, about 100 nm to 200 nm, for example, about 150 nm.

[0046] In cases where the second semiconductor element 102 is a transistor of a peripheral circuit, for example, the second gate electrode 24 of the second semiconductor element 102 can be produced in a process independent of the first gate electrode 14 of the first semiconductor element 101, so that even if the height H1 of the horizontal portion 141 of the first gate electrode 14 is increased, the gate length of the second gate electrode 24 of the second semiconductor element 102 can be reduced without being affected by the first semiconductor element 101.

[0047] <Method of Manufacturing Semiconductor Device> Next, with reference to Figures 7A to 13, an example of a method for manufacturing the semiconductor device according to the first embodiment will be described with a focus on the structure of the semiconductor element included in the semiconductor device. Here, the description will be mainly focused on the first semiconductor element 101 shown on the left side of Figure 3. Figures 7A, 8A, 9A, and 10 to 13 are process cross-sectional views seen from the AA' direction in Figure 3, and Figures 7B, 8B, and 9B are process cross-sectional views seen from the CC' direction in Figure 3.

[0048] First, an etching protection film (first etching protection film) 41 such as an oxide film is deposited on the semiconductor layer 10. Then, the first etching protection film 41 is patterned by photolithography and dry etching such as reactive ion etching (RIE) to define the first and second active regions. Using the patterned first etching protection film 41 as an etching mask, a recess (element isolation recess) 30 is excavated by dry etching such as RIE to leave the first and second active regions on the upper part of the semiconductor layer 10, as shown in FIGS. 7A and 7B. The upper part of the semiconductor layer 10, which is partitioned by the recess 30 and exposed as the first active region, becomes the first channel region 10a. Then, the first etching protection film 41 is removed.

[0049] Next, according to a shallow trench isolation (STI) technique, an element isolation insulating film 16 such as an oxide film is embedded inside the recess 30 of the semiconductor layer 10, thereby forming the element isolation insulating film 16 so as to partition the first active region, as shown in FIGS. 8A and 8B.

[0050] Next, a new etching protection film (second etching protection film) 42 such as an oxide film is deposited on the first channel region 10a and the element isolation insulating film 16 by a CVD method or the like. Then, the second etching protection film 42 is patterned by photolithography and dry etching. Using the patterned second etching protection film 42 as an etching mask, a part of the element isolation insulating film 16 is selectively removed by dry etching such as RIE, as shown in FIGS. 9A and 9B, to excavate a pair of first trenches 31 and second trenches 32 in parallel with each other so that both sides of the side of the first channel region 10a are exposed. The first channel region 10a is defined by being surrounded by the respective vertical side walls of the pair of first trenches 31 and second trenches 32. The pair of first trenches 31 and second trenches 32 penetrate the element isolation insulating film 16 to expose the upper surface of the semiconductor layer 10 at the bottom of the element isolation insulating film 16. Thereafter, the second etching protection film 42 is removed.

[0051] Next, an oxide film is formed as the first gate insulating film 13 on the inner walls of the pair of first trenches 31 and second trenches 32 and on the upper surface of the first channel region 10a by a thermal oxidation method (dry oxidation method) or the like. Simultaneously with the process of forming the first gate insulating film 13 of the first semiconductor element 101, the second gate insulating film 23 of the second semiconductor element 102 shown in FIG. 3 is also formed in the second active region with the same film thickness. Furthermore, in the first active region, a conductive material layer such as a DOPOS layer is deposited on the first channel region 10a and the element isolation insulating film 16 via the first gate insulating film 13 by a CVD method or the like so as to fill the pair of first trenches 31 and second trenches 32. Then, a part of the first gate insulating film 13 and the conductive material layer is selectively removed by a photolithography technique and dry etching. As a result, as shown in Figures 10A and 10B, a C-rail-shaped first gate electrode 14 is formed in the first active region by a first convex portion 142 and a second convex portion 143 made of a conductive material layer buried in the first trench 31 and the second trench 32 with the first gate insulating film 13 interposed therebetween, and a horizontal portion 141 made of a conductive material layer provided on the semiconductor layer 10 with the first gate insulating film 13 interposed therebetween.

[0052] Separately from the step of forming the first gate electrode 14 of the first semiconductor element 101, a step of forming the second gate electrode 24 of the second semiconductor element 102 shown in FIG. 3 is performed on the second active region. That is, a conductive material layer is deposited by a CVD method or the like on the semiconductor layer 10 which is to be the region where the second semiconductor element 102 is to be formed. Then, a part of the conductive material layer is selectively removed by photolithography and dry etching to form the second gate electrode 24 of the second semiconductor element 102 in the second active region shown in FIG. 3. The second gate insulating film 23 of the second semiconductor element 102 may be formed in a step separate from the step of forming the first gate insulating film 13 of the first semiconductor element 101.

[0053] Next, an extended insulating film is deposited on the semiconductor layer 10 and the horizontal portion 141 shown in Fig. 10A by a CVD method or the like. Then, a part of the extended insulating film is selectively removed by photolithography and dry etching so that the extended insulating film remains on both ends of the horizontal portion 141 in the gate length direction. By selectively etching the extended insulating film, a half-cylindrical sidewall insulating film 15 is formed on the sidewall of the horizontal portion 141 in the gate length direction, as shown in Fig. 11.

[0054] Next, a photoresist film 43 is applied and patterned by using a photolithography technique. Then, as shown in FIG. 12, arsenic ions ( 75 As + ) and phosphorus ions ( 31 P + ) or other impurity ions exhibiting a first conductivity type (n-type), thereby forming ion implantation regions 11x, 12x in the upper part of the semiconductor layer 10. The implantation of the n-type impurity ions is performed in a self-aligned manner using the horizontal portion 141 and the sidewall insulating film 15 exposed inside the opening of the patterned photoresist film 43 as an ion implantation mask, as shown in FIG. 12. At this time, since the height H1 of the horizontal portion 141 is set to be equal to or greater than the depth D1 defined in FIG. 3, it is possible to prevent the implanted impurity ions from penetrating the horizontal portion 141 and reaching the first channel region 10a. Thereafter, the photoresist film 43 is removed.

[0055] Furthermore, in order to form the third main electrode region 21 and the fourth main electrode region 22 of the second semiconductor element 102 shown in FIG. 3 in the second active region, a new photoresist film is applied and the photoresist film is patterned using a photolithography technique. Ion implantation is performed using the patterned photoresist film as an ion implantation mask. At this time, the acceleration voltage is adjusted so that the projected range is shallower than the projected range D3 of the ion implantation for forming the first main electrode region 11 and the second main electrode region 12.

[0056] Instead of setting the height H1 of the horizontal portion 141 to be equal to or greater than the depth D1 of the first main electrode region 11 and the second main electrode region 12 after the impurities are thermally diffused, the height H1 of the horizontal portion 141 may be set to be equal to or greater than the projected range D3 defined in Fig. 12. The projected range D3 is shallower than the depth D1 of the first main electrode region 11 and the second main electrode region 12.

[0057] Then, the impurity ions in the ion implantation regions 11x and 12x are activated by heat treatment, and the activated impurity elements are thermally diffused to form the first main electrode region 11 and the second main electrode region 12 as shown in FIG. 13. The depth D1 of the first main electrode region 11 and the second main electrode region 12 is equal to or greater than the depth D0 including the thickness of the first gate insulating film 13 of the first convex portion 142 and the second convex portion 143. Furthermore, the impurity ions in the ion implantation region of the second semiconductor element 102 are simultaneously activated by this heat treatment, and the activated impurity elements are simultaneously thermally diffused to form the third main electrode region 21 and the fourth main electrode region 22. Then, gate wiring, source electrodes, drain electrodes, and the like are formed by a well-known metallization process, thereby completing a semiconductor device including the first semiconductor element 101 and the second semiconductor element 102 as part of a circuit element as shown in FIG. 3.

[0058] According to the manufacturing method of the semiconductor device of the first embodiment, by making the depth D1 of the first main electrode region 11 and the second main electrode region 12 of the first semiconductor element 101 equal to or greater than the depth D0 including the thickness of the first gate insulating film 13 of the first convex portion 142 and the second convex portion 143, it is possible to realize a first semiconductor element 101 that can increase the mutual conductance gm.

[0059] Furthermore, since the process of forming the first gate electrode 14 of the first semiconductor element 101 and the process of forming the second gate electrode 24 of the second semiconductor element 102 are performed separately, even if the depth D1 of the first main electrode region 11 and the second main electrode region 12 of the first semiconductor element 101 is increased, it is possible to prevent any impact on the miniaturization of the second semiconductor element 102.

[0060] Furthermore, since the ion implantation process for forming the first main electrode region 11 and the second main electrode region 12 of the first semiconductor element 101 and the ion implantation process for forming the third main electrode region 21 and the fourth main electrode region 22 of the second semiconductor element 102 are performed separately, even if the depth D1 of the first main electrode region 11 and the second main electrode region 12 of the first semiconductor element 101 is increased, any impact on the miniaturization of the second semiconductor element 102 can be prevented.

[0061] <Modification of the first embodiment> A first semiconductor element 101 included in the semiconductor device according to the modification of the first embodiment is different from the first semiconductor element 101 of the semiconductor device according to the first embodiment shown in FIG. 3 in that it has a lightly doped drain (LDD) structure as shown in FIG. 14. As shown in FIG. 14, a first extension region 11a serving as a low-concentration protruding region (LDD region) is provided on the upper portion of the first main electrode region 11. The depth of the first extension region 11a is shallower than the depth of the first main electrode region 11, and the impurity concentration of the first extension region 11a is lower than the impurity concentration of the first main electrode region 11. A second extension region 12a serving as a low-concentration protruding region is provided on the upper portion of the second main electrode region 12. The depth of the second extension region 12a is shallower than the depth of the second main electrode region 12, and the impurity concentration of the second extension region 12a is lower than the impurity concentration of the second main electrode region 12.

[0062] As shown in Fig. 14, the first extension region 11a and the second extension region 12a face each other, protrude toward the channel side, and overlap with the region below the end of the horizontal portion 141. The semiconductor element 101 included in the semiconductor device according to the modification of the first embodiment has a gate overlap structure including the first extension region 11a and the second extension region 12a, and is therefore more suitable for suppressing the short channel effect. Other configurations of the first semiconductor element 101 included in the semiconductor device according to the modification of the first embodiment are similar to those of the first semiconductor element 101 of the semiconductor device according to the first embodiment shown in Figs. 3 to 6, and therefore repeated explanations will be omitted.

[0063] Second embodiment <Semiconductor device> The semiconductor element 101 included in the semiconductor device according to the second embodiment has a first main electrode region 51 and a second main electrode region 52 that face each other via a first channel region 10a on an upper portion of a semiconductor layer 10, as shown in Fig. 15. Fig. 15 corresponds to a cross-sectional view of the first semiconductor element 101 of the semiconductor device according to the first embodiment shown in Fig. 4, as viewed from the AA' direction.

[0064] As shown in FIG. 15, the depth D1 of the first main electrode region 51 and the second main electrode region 52 is set to be equal to or greater than the depth D0 (see FIGS. 5 and 6) including the thickness of the first gate insulating film 13 of the first convex portion 142 and the second convex portion 143, which is common to the first semiconductor element 101 according to the first embodiment. However, the semiconductor element 101 according to the second embodiment is different from the first semiconductor element 101 according to the first embodiment in that the first main electrode region 51 and the second main electrode region 52 are made of DOPOS formed by vapor phase growth such as selective CVD. The first main electrode region 51 and the second main electrode region 52 may be epitaxially grown by vapor phase growth at a higher temperature, or the DOPOS may be heat-treated to convert the crystallinity to that of an epitaxially grown layer. In order to make the first main electrode region 51 and the second main electrode region 52 into an epitaxially grown layer with high crystallinity, a photoexcited molecular layer epitaxial growth technique under ultra-high vacuum may be used. It is also possible to make the first main electrode region 51 and the second main electrode region 52 have a crystallinity close to that of a single crystal by utilizing the photosurface catalytic effect of ultraviolet light in the low-pressure CVD.

[0065] Similar to the first semiconductor element 101 according to the first embodiment, the first gate electrode 14 has a first convex portion 142 and a second convex portion 143 that are parallel to each other and are embedded in the upper part of the semiconductor layer 10 via the first gate insulating film 13, and a horizontal portion 141 that is provided on the semiconductor layer 10 via the first gate insulating film 13 and connects the upper surfaces of the first convex portion 142 and the second convex portion 143 to each other (see FIGS. 5 and 6, etc.). An interlayer insulating film 17 is provided on the horizontal portion 141 of the first gate electrode 14.

[0066] The height H1 of the horizontal portion 141 may be equal to or greater than the depth D1 of the first main electrode region 51 and the second main electrode region 52, or may be equal to the depth D1 of the first main electrode region 51 and the second main electrode region 52. The height H1 of the horizontal portion 141 of the first gate electrode 14 may be smaller than the depth D1 of the first main electrode region 51 and the second main electrode region 52.

[0067] Other configurations of the first semiconductor element 101 according to the second embodiment are similar to those of the first semiconductor element 101 according to the first embodiment shown in Figures 3 to 6, so duplicated explanations will be omitted. Also, the configuration of the second semiconductor element included in the semiconductor device according to the second embodiment is similar to that of the second semiconductor element 102 included in the semiconductor device according to the first embodiment shown in Figure 3, so duplicated explanations will be omitted.

[0068] According to the semiconductor device of the second embodiment, similarly to the semiconductor device of the first embodiment, the depth D1 of the first main electrode region 51 and the second main electrode region 52 of the first semiconductor element 101 is set to be equal to or greater than the depth D0 including the thickness of the first gate insulating film 13 of the first convex portion 142 and the second convex portion 143. Therefore, the mutual conductance gm of the first semiconductor element 101 can be increased.

[0069] Furthermore, the first main electrode region 51 and the second main electrode region 52 are formed by a vapor phase growth technique such as a selective CVD method. Therefore, even if the height H1 of the horizontal portion 141 of the first gate electrode 14 is not set to be equal to or greater than the depth D1 of the first main electrode region 51 and the second main electrode region 52, the impurity ions implanted to form the first main electrode region 51 and the second main electrode region 52 can be prevented from penetrating the horizontal portion 141 and reaching the first channel region 10a in the manufacturing process of the semiconductor device according to the second embodiment. That is, since a doping gas is used to add impurities of a desired conductivity type during vapor phase growth, a process of ion implantation to form the first main electrode region 51 and the second main electrode region 52 is not required. If the first main electrode region 51 and the second main electrode region 52 are n-type, phosphine (PH3) or arsine (AsH3) can be used as the doping gas.

[0070] <Comparative Example> Here, a semiconductor device according to a comparative example will be described. The semiconductor element included in the semiconductor device according to the comparative example is different from the first semiconductor element 101 included in the semiconductor device according to the second embodiment shown in FIG. 15 in that the semiconductor element includes a first main electrode region 51x and a second main electrode region 52x formed by ion implantation and heat treatment after the implantation, as shown in FIG. 16. In the semiconductor device according to the comparative example, crystal damage is introduced by ion implantation for forming the first main electrode region 51x and the second main electrode region 52x, and impurities are segregated in the semiconductor layer 10 located below the first main electrode region 51x and the second main electrode region 52x by the subsequent heat treatment, and end-of-range (EOR) defects such as dislocation loops are generated. Due to the EOR defects, impurities are not activated sufficiently, and a high resistance layer is formed partially, which may increase the contact resistance.

[0071] In contrast to the semiconductor device according to the comparative example, the first semiconductor element 101 included in the semiconductor device according to the second embodiment has the first main electrode region 51 and the second main electrode region 52 formed by vapor phase growth as shown in Fig. 15, and therefore has no EOR defects below the first main electrode region 51 and the second main electrode region 52. By using the vapor phase growth method, it is possible to suppress the increase in resistance due to EOR defects and to reduce the resistance and contact resistance in the semiconductor layer 10. The presence or absence of EOR defects can be confirmed by a transmission electron microscope (TEM).

[0072] Furthermore, in the semiconductor device according to the second embodiment, the first main electrode region 51 and the second main electrode region 52 are formed by vapor phase growth. Because the vapor phase growth method is used, even if the height H1 of the horizontal portion 141 of the first gate electrode 14 is not set to be equal to or greater than the depth D1 of the first main electrode region 51 and the second main electrode region 52, it is possible to prevent the impurity ions implanted into the first main electrode region and the second main electrode region from penetrating the horizontal portion 141 and reaching the first channel region 10a.

[0073] <Method of Manufacturing Semiconductor Device> Next, with reference to FIGS. 17 to 21 etc., an example of a method for manufacturing the semiconductor device according to the second embodiment will be described, focusing on the structure of first semiconductor element 101 included in the semiconductor device shown in FIG.

[0074] The method for manufacturing the semiconductor device according to the second embodiment is similar to the method for manufacturing the semiconductor device according to the first embodiment up to the steps shown in Figures 10A and 10B. Next, as shown in Figure 17, an interlayer insulating film 17 is formed on the upper surface of the horizontal portion 141 by CVD, dry etching, or the like, and sidewall insulating films 15 are formed on both end surfaces of the horizontal portion 141 in the gate length direction.

[0075] Next, as shown in FIG. 18, a hard mask insulating film 44 made of an oxide film or the like is deposited by a CVD method or the like. Next, a photoresist film 45 is applied onto the hard mask insulating film 44, and the photoresist film 45 is patterned using a photolithography technique. Using the patterned photoresist film 45 as an etching mask, the hard mask insulating film 44 is patterned to form a hard mask made of the patterned hard mask insulating film 44, as shown in FIG. 19. Thereafter, the photoresist film 45 is removed.

[0076] Next, a portion of the semiconductor layer 10 is removed in a self-aligned manner by dry etching such as RIE using the hard mask 44, the interlayer insulating film 17, and the sidewall insulating film 15 as an etching mask. As a result, a rectangular third trench (first well-shaped groove portion) 61 and a fourth trench (second well-shaped groove portion) 62 are formed facing each other in the upper part of the semiconductor layer 10, as shown in FIG.

[0077] Next, as shown in FIG. 21, a silicon layer is selectively vapor-phase grown (vapor-phase deposited) in each of the third trench 61 and the fourth trench 62 to form the first main electrode region 51 and the second main electrode region 52. Then, the hard mask 44 is removed. Depending on the growth conditions of the vapor phase growth, the silicon layer becomes an epitaxial growth layer (single crystal layer), a polysilicon layer (polycrystalline layer), or an amorphous layer (non-crystalline layer). Since there is also diffusion due to autodoping during the vapor phase growth, the doped region diffuses laterally to below the sidewall insulating film 15. Then, a gate wiring, a source electrode, a drain electrode, and the like are formed by a well-known metallization process, thereby completing the semiconductor device according to the second embodiment including the first semiconductor element 101 shown in FIG. 15 as a part of the circuit element.

[0078] According to the method for manufacturing a semiconductor device in accordance with the second embodiment, the first main electrode region 51 and the second main electrode region 52 are formed by vapor phase growth (vapor phase deposition) inside the third trench 61 and the fourth trench 62, respectively. That is, the method for manufacturing a semiconductor device in accordance with the second embodiment can solve the problem that implanted impurity ions penetrate the horizontal portion 141 to reach the first channel region 10a when the first main electrode region and the second main electrode region are formed by using ion implantation.

[0079] <Modification of the second embodiment> As a manufacturing method for a semiconductor device according to a modified example of the second embodiment, a method for increasing the impurity concentration of the first main electrode region 51 and the second main electrode region 52 will be described when the impurity concentration of the first main electrode region 51 and the second main electrode region 52 is insufficient when the first main electrode region 51 and the second main electrode region 52 are simply grown in a vapor phase (doping growth) using a doping gas.

[0080] The method for manufacturing a semiconductor device according to the modified example of the second embodiment is similar to the method for manufacturing a semiconductor device according to the second embodiment up to the steps shown in FIG. 20. Next, the bottom and side surfaces of the third trench 61 and the fourth trench 62 are doped with impurities of a first conductivity type (n-type) such as arsenic (As) or phosphorus (P) by plasma doping or solid-phase diffusion or the like. As a result, as shown in FIG. 22, impurities of the first conductivity type (n-type) such as arsenic (As) or phosphorus (P) are doped into the bottom and side surfaces of the third trench 61 and the fourth trench 62. + The first doping regions 51a and 52a are formed in a doped region of the n-type.

[0081] Next, a silicon layer is selectively grown in a vapor phase so as to be embedded in the third trench 61 and the fourth trench 62, thereby forming a first conductivity type (n + The second doping regions 51b and 52b are formed of a n-type dopant.

[0082] Next, as shown in FIG. 24, the hard mask 44, the interlayer insulating film 17, and the sidewall insulating film 15 are used as an ion implantation mask to implant arsenic ions ( 75 As + ) and phosphorus ions ( 31 P + 25, impurity ions of a first conductivity type (n type) such as ZnO, ZnS, ZnO ... + As a result, a first main electrode region (51a, 51b, 51c) consisting of the first doping region 51a, the second doping region 51b, and the third doping region 51c is formed, and a second main electrode region (52a, 52b, 52c) consisting of the first doping region 52a, the second doping region 52b, and the third doping region 52c is formed. Thereafter, the hard mask 44 is removed.

[0083] According to the method for manufacturing a semiconductor device according to the modified example of the second embodiment, the first doped regions 51a, 52a which will become parts of the first main electrode region 51 and the second main electrode region 52 are formed by plasma doping or the like before vapor-phase growth of the second doped regions 51b, 52b which will become parts of the first main electrode region 51 and the second main electrode region 52. Therefore, compared to the case where the first main electrode region 51 and the second main electrode region 52 are only vapor-phase grown, the impurity concentrations of the first main electrode regions (51a, 51b, 51c) and the second main electrode regions (52a, 52b, 52c), particularly the impurity concentrations of the first doped regions 51a, 52a, can be increased.

[0084] Furthermore, after the second doping regions 51b, 52b that will become parts of the first main electrode region 51 and the second main electrode region 52 are grown by vapor phase growth, shallow ion implantation and post-implantation heat treatment are performed on the upper surfaces of the second doping regions 51b, 52b to form third doping regions 51c, 52c that will become parts of the first main electrode region 51 and the second main electrode region 52. Therefore, compared to the case where the first main electrode region 51 and the second main electrode region 52 are only grown by vapor phase growth, the impurity concentrations of the first main electrode region (51a, 51b, 51c) and the second main electrode region (52a, 52b, 52c), particularly the impurity concentrations of the third doping regions 51c, 52c, can be increased.

[0085] As a manufacturing method of a semiconductor device according to a modification of the second embodiment, a case has been exemplified in which both the step of forming the first doping regions 51a, 52a shown in Fig. 22 and the step of forming the third doping regions 51c, 52c shown in Fig. 24 and Fig. 25 are performed. However, it is also possible to perform only one of the steps of forming the first doping regions 51a, 52a shown in Fig. 22 and the step of forming the third doping regions 51c, 52c shown in Fig. 24 and Fig. 25, and not to perform the other step.

[0086] (Other embodiments) As described above, the present technology has been described by the first and second embodiments and each modified example, but the description and drawings forming a part of this disclosure should not be understood as limiting the present technology. Various alternative embodiments, examples, and operating techniques will be apparent to those skilled in the art from this disclosure.

[0087] For example, the semiconductor device according to the first and second embodiments can be applied to any type of electronic device having an imaging function, such as a camera system such as a digital still camera or a video camera, or a mobile phone having an imaging function. For example, the semiconductor device according to the first and second embodiments can be applied to an electronic device (camera) shown in Fig. 26. The electronic device shown in Fig. 26 is, for example, a video camera capable of taking still or moving images, and includes a semiconductor device 200, an optical system (optical lens) 201, a shutter device 202, a drive unit 204 that drives the semiconductor device 200 and the shutter device 202, and a signal processing unit 203.

[0088] The semiconductor device 200 can be applied to the semiconductor device according to the first and second embodiments. The optical system 201 guides image light (incident light) from an object to the pixel region 1 of the semiconductor device 200. The optical system 201 may be composed of a plurality of optical lenses. The shutter device 202 controls a light irradiation period and a light blocking period for the semiconductor device 200. The drive unit 204 controls the transfer operation of the semiconductor device 200 and the shutter operation of the shutter device 202. The signal processing unit 203 performs various signal processing on the signal output from the semiconductor device 200. The video signal after the signal processing is stored in a storage medium such as a memory, or is output to a monitor or the like.

[0089] In the semiconductor devices according to the first and second embodiments, the first semiconductor element 101 is an amplifying transistor, but the first semiconductor element 101 may be a pixel transistor such as a transfer transistor other than an amplifying transistor. The first semiconductor element 101 can also be used as an analog transistor of a peripheral circuit other than a pixel transistor. When the first semiconductor element 101 is an analog transistor of a peripheral circuit, the s factor (s value) can be reduced by setting the depth D1 of the first main electrode region 51 and the second main electrode region 52 to a depth D0 or more including the thickness of the first gate insulating film 13 of the first convex portion 142 and the second convex portion 143.

[0090] In addition, in the semiconductor devices according to the first and second embodiments, the semiconductor layer 10 is a Si substrate. However, instead of a Si substrate, a semiconductor substrate having a wider band gap than Si (wide band gap semiconductor), such as silicon carbide (SiC), gallium nitride (GaN), or gallium arsenide (GaAs), may be used.

[0091] In this way, if one understands the gist of the technical content disclosed in the above embodiment, it will be clear to a person skilled in the art that various alternative embodiments, examples, and operational techniques can be included in the present technology. In addition, the present technology naturally includes various embodiments not described here, such as configurations in which the configurations described in the above embodiment and each modification are arbitrarily applied. Therefore, the technical scope of the present technology is determined only by the invention-specific matters related to the claims that are appropriate from the above exemplary description.

[0092] The present technology can be configured as follows. (1) A semiconductor layer; a channel region provided in an upper portion of the semiconductor layer; First and second main electrode regions provided opposite to each other on both ends of the channel region in a channel length direction; a gate insulating film provided on inner walls of first and second trenches provided on both sides of the channel region facing each other in a channel width direction and on an upper surface of the channel region; a gate electrode including a first convex portion embedded in the first trench via the gate insulating film, a second convex portion embedded in the second trench via the gate insulating film, and a horizontal portion connected to upper ends of the first and second convex portions and provided on an upper surface of the channel region via the gate insulating film; Equipped with a depth of the first and second main electrode regions is the same as a depth of the first and second protrusions including the gate insulating film. (2) The semiconductor element according to (1), wherein the height of the horizontal portion is equal to or greater than the depth of the first and second main electrode regions. (3) The semiconductor element according to (1) or (2), wherein the semiconductor layer located directly below the first and second main electrode regions does not have end-of-range defects. (4) a first semiconductor element including: a semiconductor layer, a channel region provided on an upper portion of the semiconductor layer, first and second main electrode regions provided opposite both ends of the channel region in a channel length direction, inner walls of first and second trenches provided on both sides of the channel region facing each other in a channel width direction, a gate insulating film provided on an upper surface of the channel region, a first convex portion embedded in the first trench via the gate insulating film, a second convex portion embedded in the second trench via the gate insulating film, and a gate electrode connected to upper ends of the first and second convex portions and having a horizontal portion provided on the upper surface of the channel region via the gate insulating film; a second semiconductor element including third and fourth main electrode regions provided on an upper portion of the semiconductor layer so as to face each other, and a second gate electrode provided on the semiconductor layer between the third and fourth main electrode regions, with a second gate insulating film interposed therebetween; Equipped with a depth of the first and second main electrode regions is the same as a depth of the first and second protrusions including the gate insulating film. (5) The semiconductor device according to (4), wherein the depth of the third and fourth main electrode regions is shallower than the depth of the first and second main electrode regions. (6) The semiconductor device according to (4) or (5), wherein the height of the second gate electrode is lower than the height of the horizontal portion. (7) the first semiconductor element is an amplifying transistor included in a pixel of a solid-state imaging device, the second semiconductor element is a transistor included in a peripheral circuit of the solid-state imaging device; The semiconductor device according to any one of (4) to (6). (8) a step of digging a recess in an upper portion of a semiconductor layer and forming a channel region defined by the recess; filling the recess with an element isolation insulating film; selectively removing the element isolation insulating film to excavate first and second trenches exposing opposing side surfaces of the channel region in a channel width direction; forming a gate insulating film on inner walls of the first and second trenches and on an upper surface of the channel region; a step of filling the first and second trenches with a conductive material layer via the gate insulating film, and forming a gate electrode having a first convex portion filled in the first trench, a second convex portion filled in the second trench, and a horizontal portion connected to upper ends of the first and second convex portions and provided on an upper surface of the channel region via the gate insulating film; forming first and second main electrode regions opposed to each other across both ends of the channel region in a channel length direction, to the same depth as a depth of the first and second protrusions including the gate insulating film; A method for manufacturing a semiconductor device, comprising: (9) The step of forming the first and second main electrode regions includes: implanting impurity ions into an upper surface of the semiconductor layer; activating the impurity ions by heat treatment; Including, The method for manufacturing a semiconductor element according to (8), wherein the thickness of the horizontal portion is made thicker than the projected range of the impurity ions. (10) The step of forming the first and second main electrode regions includes: digging third and fourth trenches facing each other on both ends of the channel region in a channel length direction; forming the first and second main electrode regions by vapor deposition of a conductive material layer into the third and fourth trenches; The method for producing a semiconductor element according to (8), comprising: (11) The method for manufacturing a semiconductor element according to (10), further comprising the step of adding impurities having the same conductivity type as the first and second main electrode regions to the bottom and side surfaces of the third and fourth trenches by thermal diffusion prior to the step of filling by vapor phase growth. (12) After the vapor deposition embedding step, implanting impurity ions having the same conductivity type as the first and second main electrode regions into upper surfaces of the first and second main electrode regions; activating the impurity ions by heat treatment; The method for producing a semiconductor element according to (10) or (11), further comprising: (13) a step of digging a recess in an upper portion of a semiconductor layer and forming a channel region defined by the recess; a step of filling the recess with an isolation insulating film; and a step of excavating first and second trenches exposing side surfaces of the channel region facing each other in a channel width direction by selectively removing the isolation insulating film. forming a gate insulating film on inner walls of the first and second trenches and on an upper surface of the channel region; a step of filling the first and second trenches with a conductive material layer via the gate insulating film, and forming a gate electrode having a first convex portion filled in the first trench, a second convex portion filled in the second trench, and a horizontal portion connected to upper ends of the first and second convex portions and provided on an upper surface of the channel region via the gate insulating film; forming first and second main electrode regions opposed to each other across both ends of the channel region in a channel length direction, to the same depth as a depth of the first and second protrusions including the gate insulating film; forming a second gate electrode on the semiconductor layer via the gate insulating film; forming third and fourth main electrode regions facing each other across the semiconductor layer below the second gate electrode at a depth different from that of the first and second main electrode regions; A method for manufacturing a semiconductor device comprising the steps of: [Explanation of symbols]

[0093] 1...pixel region, 2...pixel, 3...vertical drive circuit, 4...column signal processing circuit, 5...horizontal drive circuit, 6...output circuit, 7...control circuit, 8a...pixel drive wiring, 8b...vertical signal line, 9...horizontal signal line, 10...semiconductor layer, 10a...channel region, 10b...well region, 11,12...main electrode region, 11a,12a...extension region, 11x,12x...ion implantation region, 13...gate insulating film, 14...gate electrode, 15...sidewall insulating film, 16...element isolation insulating film, 17...interlayer insulating film, 21,22...main electrode region region, 23...gate insulating film, 24...gate electrode, 30...recess, 31, 32...trench, 41, 42...etching protection film, 43, 45...photoresist film, 44...hard mask, 51, 51x, 52, 52x...main electrode region, 51a, 51b, 51c, 52a, 52b, 52c...doping region, 61, 62...trench, 101, 102...semiconductor element, 141...horizontal portion, 142, 143...projection portion, 200...semiconductor device, 201...optical system, 202...shutter device, 203...signal processing unit, 204...drive unit

Claims

1. a first semiconductor element including: a semiconductor layer, a channel region provided on an upper portion of the semiconductor layer, first and second main electrode regions provided opposite both ends of the channel region in a channel length direction, inner walls of first and second trenches provided on both sides of the channel region facing each other in a channel width direction, a gate insulating film provided on an upper surface of the channel region, a first convex portion embedded in the first trench via the gate insulating film, a second convex portion embedded in the second trench via the gate insulating film, and a gate electrode connected to upper ends of the first and second convex portions and having a horizontal portion provided on the upper surface of the channel region via the gate insulating film; a second semiconductor element including third and fourth main electrode regions provided on an upper portion of the semiconductor layer so as to face each other, and a second gate electrode provided on the semiconductor layer between the third and fourth main electrode regions, with a second gate insulating film interposed therebetween; Equipped with a depth of the first and second main electrode regions is equal to a depth of the first and second protrusions including the gate insulating film; a depth of the third and fourth main electrode regions is shallower than a depth of the first and second main electrode regions.

2. a first semiconductor element including: a semiconductor layer, a channel region provided on an upper portion of the semiconductor layer, first and second main electrode regions provided opposite both ends of the channel region in a channel length direction, inner walls of first and second trenches provided on both sides of the channel region facing each other in a channel width direction, a gate insulating film provided on an upper surface of the channel region, a first convex portion embedded in the first trench via the gate insulating film, a second convex portion embedded in the second trench via the gate insulating film, and a gate electrode connected to upper ends of the first and second convex portions and having a horizontal portion provided on the upper surface of the channel region via the gate insulating film; a second semiconductor element including third and fourth main electrode regions provided on an upper portion of the semiconductor layer so as to face each other, and a second gate electrode provided on the semiconductor layer between the third and fourth main electrode regions, with a second gate insulating film interposed therebetween; Equipped with a depth of the first and second main electrode regions is equal to a depth of the first and second protrusions including the gate insulating film; a height of the second gate electrode being lower than a height of the horizontal portion.

3. a first semiconductor element including: a semiconductor layer, a channel region provided on an upper portion of the semiconductor layer, first and second main electrode regions provided opposite both ends of the channel region in a channel length direction, inner walls of first and second trenches provided on both sides of the channel region facing each other in a channel width direction, a gate insulating film provided on an upper surface of the channel region, a first convex portion embedded in the first trench via the gate insulating film, a second convex portion embedded in the second trench via the gate insulating film, and a gate electrode connected to upper ends of the first and second convex portions and having a horizontal portion provided on the upper surface of the channel region via the gate insulating film; a second semiconductor element including third and fourth main electrode regions provided on an upper portion of the semiconductor layer so as to face each other, and a second gate electrode provided on the semiconductor layer between the third and fourth main electrode regions, with a second gate insulating film interposed therebetween; Equipped with a depth of the first and second main electrode regions is equal to a depth of the first and second protrusions including the gate insulating film; the first semiconductor element is an amplifying transistor included in a pixel of a solid-state imaging device, The semiconductor device, wherein the second semiconductor element is a transistor included in a peripheral circuit of the solid-state imaging device.

4. a step of digging a recess in an upper portion of a semiconductor layer and forming a channel region defined by the recess; filling the recess with an element isolation insulating film; selectively removing the element isolation insulating film to excavate first and second trenches exposing opposing side surfaces of the channel region in a channel width direction; forming a gate insulating film on inner walls of the first and second trenches and on an upper surface of the channel region; a step of filling the first and second trenches with a conductive material layer via the gate insulating film, and forming a gate electrode having a first convex portion filled in the first trench, a second convex portion filled in the second trench, and a horizontal portion connected to upper ends of the first and second convex portions and provided on an upper surface of the channel region via the gate insulating film; forming first and second main electrode regions opposed to each other across both ends of the channel region in a channel length direction, to the same depth as a depth of the first and second protrusions including the gate insulating film; Including, The step of forming the first and second main electrode regions includes: implanting impurity ions into an upper surface of the semiconductor layer; activating the impurity ions by heat treatment; Including, A method for manufacturing a semiconductor device, comprising the steps of: making the thickness of the horizontal portion greater than the projected range of the impurity ions.

5. a step of digging a recess in an upper portion of a semiconductor layer and forming a channel region defined by the recess; filling the recess with an element isolation insulating film; selectively removing the element isolation insulating film to excavate first and second trenches exposing opposing side surfaces of the channel region in a channel width direction; forming a gate insulating film on inner walls of the first and second trenches and on an upper surface of the channel region; a step of filling the first and second trenches with a conductive material layer via the gate insulating film, and forming a gate electrode having a first convex portion filled in the first trench, a second convex portion filled in the second trench, and a horizontal portion connected to upper ends of the first and second convex portions and provided on an upper surface of the channel region via the gate insulating film; forming first and second main electrode regions opposed to each other across both ends of the channel region in a channel length direction, to the same depth as a depth of the first and second protrusions including the gate insulating film; Including, The step of forming the first and second main electrode regions includes: digging third and fourth trenches facing each other on both ends of the channel region in a channel length direction; forming the first and second main electrode regions by vapor deposition of a conductive material layer into the third and fourth trenches; A method for manufacturing a semiconductor device, comprising:

6. 6. The method of claim 5, further comprising the step of adding impurities having the same conductivity type as the first and second main electrode regions to bottom and side surfaces of the third and fourth trenches by thermal diffusion before the step of filling by vapor phase growth.

7. After the vapor deposition embedding step, implanting impurity ions having the same conductivity type as the first and second main electrode regions into upper surfaces of the first and second main electrode regions; activating the impurity ions by heat treatment; The method for manufacturing a semiconductor device according to claim 5 , further comprising:

8. a step of digging a recess in an upper portion of a semiconductor layer and forming a channel region defined by the recess; filling the recess with an element isolation insulating film; selectively removing the element isolation insulating film to excavate first and second trenches exposing opposing side surfaces of the channel region in a channel width direction; forming a gate insulating film on inner walls of the first and second trenches and on an upper surface of the channel region; a step of filling the first and second trenches with a conductive material layer via the gate insulating film, and forming a gate electrode having a first convex portion filled in the first trench, a second convex portion filled in the second trench, and a horizontal portion connected to upper ends of the first and second convex portions and provided on an upper surface of the channel region via the gate insulating film; forming first and second main electrode regions opposed to each other across both ends of the channel region in a channel length direction, to the same depth as a depth of the first and second protrusions including the gate insulating film; forming a second gate electrode on the semiconductor layer via the gate insulating film; forming third and fourth main electrode regions facing each other across the semiconductor layer below the second gate electrode at a depth different from that of the first and second main electrode regions; A method for manufacturing a semiconductor device comprising the steps of:

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