Manufacturing method of exhaust gas purification catalyst device

Abstract

To provide a highly efficient method for manufacturing an exhaust gas purification catalyst device that can shorten the overall processing time of the whole process while ensuring a determined suction time, when coating a coating liquid on a honeycomb substrate is performed by placing the coating liquid on one end face of the honeycomb substrate and suctioning from the opposite end face.SOLUTION: A method for manufacturing exhaust gas purification catalyst device includes the steps of: (A) holding a honeycomb base material which has a plurality of cell flow paths divided by cell walls, so that the flow path direction of the cell flow paths is vertical, and placing a coating liquid for catalyst coating layer formation on an upper end surface of the base material; (B) suctioning the base material after the step (A) from a lower end surface by a decompression pump and applying the coating liquid at least one of on the cell walls and in the cell walls of the base material; and (C) transferring the base material after the step (A) to the next step, in which the step (B) and the step (C) are performed simultaneously by a transfer / suction device 100.SELECTED DRAWING: Figure 1

Description

[Technical field]

[0001] The present invention relates to a method for manufacturing an exhaust gas purification catalyst device. [Background technology]

[0002] Exhaust gas discharged from an internal combustion engine such as an automobile engine is purified by an exhaust gas purification catalyst device installed in an exhaust system and then released into the atmosphere. This exhaust gas purification catalyst device has a structure including, for example, a honeycomb substrate having a plurality of cell flow paths separated by partition walls, and a catalyst coating layer formed on and / or within the partition walls of the honeycomb substrate.

[0003] Such an exhaust gas purification catalyst device is manufactured, for example, by coating a coating liquid containing raw material components of a catalyst coating layer on a honeycomb substrate, and then firing the coating liquid.

[0004] Here, it is known that the coating of the coating liquid on the honeycomb substrate is performed by placing the coating liquid on one end face of the honeycomb substrate and sucking it from the opposite end face. For example, Patent Document 1 describes a method in which a frame-shaped storage jig capable of storing the coating liquid is attached to a first end face of the honeycomb substrate, the coating liquid is stored on the first end face, and the pressure on the second end face side opposite to the first end face is made lower than the pressure on the first end face side, causing the coating liquid to flow from the first end face to the second end face, thereby coating the coating liquid on the honeycomb substrate.

[0005] Incidentally, industrial production of exhaust gas purification catalyst devices is usually carried out by an automated processing system, in which a plurality of processing stations are provided from the upstream side to the downstream side, and processing is carried out sequentially while the workpiece is transferred from the upstream processing station to the downstream processing station.

[0006] In such an automatic processing system, the processing time at each processing station is not necessarily the same. In this case, the processing at the processing station that requires the longest processing time among the series of processing stations provided from the upstream side to the downstream side becomes the rate-limiting step of the entire process.

[0007] In such a case, it may be possible to provide a plurality of rate-limiting processing devices, arrange them side by side from the upstream side to the downstream side of the automatic processing system, and have them share the rate-limiting process.

[0008] For example, Patent Document 2 describes a conveying device consisting of a conveying means for conveying a work (piece to be processed) along a conveying line and a processing means provided near the conveying line, in which an overtaking assistance means is provided for grasping and lifting a preceding work on the conveying line, so that the following work can overtake the preceding work and be conveyed ahead. [Prior art documents] [Patent documents]

[0009] [Patent Document 1] JP 2018-015704 A [Patent Document 2] JP 2003-237940 A Summary of the Invention [Problem to be solved by the invention]

[0010] When coating a coating liquid onto a honeycomb substrate by placing the coating liquid on one end face of the honeycomb substrate and suctioning it from the opposite end face, the suction step is often rate-determining.

[0011] Specifically, in a coating method that involves placing a coating liquid on an end face of a honeycomb substrate and suctioning it, the process of suctioning the coating liquid from one end face of the honeycomb substrate often takes longer than the process of placing the coating liquid on the opposite end face, and therefore the suction process often becomes the rate-limiting step for coating the coating liquid.

[0012] When the method described in Patent Document 2 is applied to coating a coating liquid onto a honeycomb substrate, where the suction process is rate-limiting, the time from placing the coating liquid to the start of suction will vary from honeycomb substrate to honeycomb substrate, and there is a concern that the quality of the resulting coating layer will vary from honeycomb substrate to honeycomb substrate.

[0013] As an alternative to the method described in Patent Document 2, for a certain machining process that requires a certain amount of machining time, it is possible to sequentially transfer a single workpiece to multiple machining devices, and have each device divide and perform a short portion of the machining time, thereby ensuring the specified machining time across the multiple machining devices.

[0014] However, when applying a coating liquid to a honeycomb substrate, if the coating liquid is placed on the end face and then sucked in portions, unevenness in the coating layer may occur, which may impair the exhaust gas purification performance.

[0015] However, in the conventional automatic processing system, the workpiece cannot be processed while it is being transferred from one processing station to the next, so in addition to the processing time at each processing station, the transfer time must also be considered as part of the process time, which is an obstacle to reducing the overall processing time.

[0016] The present invention has been made in consideration of the above-mentioned circumstances, and its object is to provide a highly efficient method for manufacturing an exhaust gas purification catalyst device, which can shorten the processing time of the entire process while ensuring a specified suction time, when coating a coating liquid on a honeycomb substrate by placing the coating liquid on one end face of the honeycomb substrate and suctioning it from the opposite end face. [Means for solving the problem]

[0017] The present invention is as follows.

[0018] (A) A honeycomb substrate having a plurality of cell channels partitioned by cell walls is held so that the flow direction of the cell channels is vertical, and a coating liquid for forming a catalyst coating layer is placed on the upper end surface of the substrate. (B) sucking the substrate after the step (A) from the lower end surface with a vacuum pump to coat the coating liquid on the cell walls of the substrate and at least one of the cell walls; and (C) transporting the substrate after the step (A) to a next step; A method for producing an exhaust gas purification catalyst device, comprising: The step (B) and the step (C) are carried out simultaneously by a transfer suction device. A method for manufacturing an exhaust gas purification catalyst device. Aspect 2: The method for producing an exhaust gas purification catalyst device according to aspect 1, wherein the transfer suction device has one or more vacuum channels connecting the lower end surface of the substrate after step (A) to the vacuum pump. Aspect 3: Each of the pressure reduction channels includes a first pressure reduction channel and a second pressure reduction channel; the first vacuum channel is connected to a vacuum pump and is vacuumed; The second vacuum channel includes: After the transfer suction device receives the substrate after the step (A), the lower end surface of the substrate is connected to the first decompression channel until the substrate is transferred to a predetermined position; and When the substrate is transferred to a predetermined position, the lower end surface of the substrate is released from the first vacuum channel. A method for producing the exhaust gas purification catalyst device according to aspect 2. Aspect 4: The transfer suction device has a first layer including the first vacuum channel and a second layer including the second vacuum channel, and these are configured as two layers stacked together; the second layer is movable relative to the first layer; The second layer receives the substrate after the step (A) and then moves relative to the first layer to transport the substrate to the next step. A method for producing the exhaust gas purification catalyst device according to aspect 3. Aspect 5: The method for producing an exhaust gas purification catalyst device according to any one of Aspects 1 to 4, wherein the transfer suction device is disk-shaped. Aspect 6: The transfer and suction device is a two-layer disk-shaped device in which the first layer and the second layer are coaxially stacked, the relative movement of the second layer with respect to the first layer is a rotation; A method for producing an exhaust gas purification catalyst device according to aspect 4. Aspect 7: The first pressure reduction channel includes: a pump connection opening that opens on a surface of the first layer opposite to the second layer, for connection to the decompression pump; and an arc-shaped opening that opens in an arc along the circumference of the first layer on the surface on the second layer side; having The second vacuum channel includes: a pressure reduction channel connection opening that opens onto a surface of the second layer that faces the first layer and is connected to the first pressure reduction channel; and a base material connecting opening that opens on the surface opposite to the first layer and is for connecting to the lower end surface of the base material after the step (A); having When the second layer rotates relative to the first layer, After the second layer receives the substrate after the step (A), until the substrate is transferred to a predetermined position, the vacuum channel connecting opening of the second layer moves along the arc shape of the arc-shaped opening of the first layer, and When the substrate is transferred to a predetermined position, the vacuum channel connecting opening of the second layer is displaced from the arc shape of the arc-shaped opening of the first layer, thereby releasing the connection between the lower end surface of the substrate and the first vacuum channel. A method for producing the exhaust gas purification catalyst device according to aspect 6. A method for producing an exhaust gas purification catalyst device according to Aspect 7, wherein the central angle of the arc of the arc-shaped opening of the first pressure reduction channel is greater than or equal to 90° and less than or equal to 270°. A coating liquid placing device that holds a substrate having a plurality of cell channels partitioned by cell walls such that the flow paths of the cell channels are vertical, and places a coating liquid for forming a catalyst coating layer on an upper end surface of the substrate; and a transfer and suction device which simultaneously performs the steps of: sucking the substrate after the step (A) from a lower end surface to coat the coating liquid on one or more of the cell walls of the substrate and transferring the substrate after the step (A) to a next step; A manufacturing system for an exhaust gas purification catalyst device, comprising: A transfer and suction device that simultaneously sucks a substrate having a coating liquid for forming a catalyst coating layer placed on an upper end surface of the substrate, the substrate having a plurality of cell flow paths partitioned by cell walls, from its lower end surface to coat the coating liquid on the cell walls of the substrate and at least one of the cell walls, and transfers the substrate to a next process. Effect of the Invention

[0019] According to the present invention, when coating a coating liquid onto a honeycomb substrate by placing the coating liquid on one end face of the honeycomb substrate and suctioning it from the opposite end face, a highly efficient method for manufacturing an exhaust gas purification catalyst device is provided, which can shorten the processing time of the entire process while ensuring a specified suction time. [Brief description of the drawings]

[0020] [Figure 1] FIG. 1 is a perspective view showing an outline of an example of a transfer and suction device according to the present invention. [Diagram 2] FIG. 2 is an internal perspective view showing the internal structure of a first layer and a second layer of an example of a transfer and suction device in the present invention. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0021] <<Method of manufacturing an exhaust gas purification catalyst device>> The method for producing an exhaust gas purification catalyst device of the present invention includes the steps of: (A) holding a honeycomb substrate having a plurality of cell flow paths partitioned by cell walls such that the flow paths of the cell flow paths are vertical, and placing a coating liquid for forming a catalyst coating layer on the upper end surface of the substrate (coating liquid placing step); (B) using a vacuum pump to suck the substrate after the (A) coating liquid placing step from the lower end surface, and coat the coating liquid on and in one or more of the cell walls of the substrate (suction coating step); and (C) (A) Transporting the substrate after the coating liquid placing step to the next step (transport step); A method for producing an exhaust gas purification catalyst device, comprising: (B) The suction coating step and (C) the transfer step are carried out simultaneously by a transfer suction device; A method for manufacturing an exhaust gas purification catalyst device.

[0022] In the manufacturing method of the exhaust gas purification catalyst device of the present invention, the substrate is simultaneously transported and sucked after the coating liquid for forming the catalyst coating layer is placed thereon using a transport and suction device. With this method, no congestion occurs while waiting for suction, so the time from placing the coating liquid on the honeycomb substrate to starting suction can be easily controlled to a predetermined time. Furthermore, in the method of the present invention, the transport and suction device performs the suction process for one honeycomb substrate without interruption. Therefore, unevenness is unlikely to occur in the resulting coating layer, and a high-quality coating layer can be obtained. Furthermore, with the method of the present invention, the suction coating process is performed even during the transport time during which the workpiece could not be processed in the conventional technology, so that the processing time of the entire process can be extremely shortened.

[0023] As described above, the manufacturing method of the exhaust gas purification catalyst device of the present invention includes (A) a coating liquid placing step, (B) a suction coating step, and (C) a transfer step, and in the manufacturing method of the exhaust gas purification catalyst device, (B) the suction coating step and (C) the transfer step are performed simultaneously by a transfer suction device.

[0024] Each element of the method for producing an exhaust gas purification catalyst device of the present invention will be described below in order.

[0025] <Base material> The substrate applied to the manufacturing method of the exhaust gas purification catalyst device of the present invention is a honeycomb substrate having a plurality of cell passages partitioned by cell walls. This honeycomb substrate may be, for example, a straight-flow type or wall-flow type monolith honeycomb substrate made of a material such as cordierite, SiC, stainless steel, inorganic oxide particles, etc.

[0026] (A) Coating liquid placing step (A) In the coating liquid placing process, a honeycomb substrate having a plurality of cell flow paths separated by cell walls is held so that the flow path direction of the cell flow paths is vertical, and a coating liquid for forming a catalyst coating layer is placed on the upper end surface of the substrate.

[0027] The coating liquid placing step may be performed by a coating device. For example, the coating device may be a coating device capable of placing the coating liquid on the upper end surface of the honeycomb substrate held so that the flow path direction of the cell flow paths is vertical.

[0028] The coating device may include, for example, a frame-shaped mounting jig and a coating liquid supplying device.

[0029] The mounting jig may, for example, have a frame shape and be capable of being removably placed on the upper end surface of the honeycomb substrate, and the upper end surface of the substrate and the mounting jig may form a mounting portion for the coating liquid.

[0030] The coating liquid supplying machine may have a function of supplying the coating liquid to the placement unit and placing the coating liquid on the placement unit. The coating liquid supplying machine may be, for example, a shower type, a spray type, or the like.

[0031] (B) Suction Coating Process The suction coating step (B) is a step in which the substrate after the coating liquid placing step (A) is sucked from the lower end surface by a vacuum pump to coat the coating liquid on the cell walls of the substrate and at least one portion in the cell walls.

[0032] When the substrate after the coating liquid placing step is sucked from the lower end surface, an air flow is generated from the upper end to the lower end of the cell flow paths of the substrate, causing the coating liquid placed on the upper end surface of the substrate to flow into the cell flow paths, coating the substrate with the coating liquid and forming a coating layer.

[0033] Coating the cell walls of the substrate with the coating liquid means that a coating layer of the coating liquid is formed on the surfaces of the cell walls facing the cell flow paths, and coating the inside of the cell walls of the substrate with the coating liquid means that a coating layer of the coating liquid is formed on the surfaces of the pore walls of the porous cell walls.

[0034] <(C) Transfer process> The (C) transporting step is a step of transporting the substrate after the (A) coating liquid applying step to the next step.

[0035] The next step may be any step such as, for example, a calcination step, a step of forming a second catalyst coating layer, a step of supporting a catalyst component, a conditioning step, a step of loading into a casing, and the like.

[0036] <Transfer suction device> In the manufacturing method of the exhaust gas purification catalyst device of the present invention, the above-mentioned (B) suction coating step and (C) transport step are performed simultaneously by a transport suction device. Therefore, this transport suction device has both a transport function of transporting the substrate after the (A) coating liquid placing step to the next step and a suction coating function of sucking the substrate after the (A) coating liquid placing step from the lower end surface and coating the coating liquid on the cell walls of the substrate and at least one of the cell walls.

[0037] The transport function of the transport suction device may be a function of performing linear transport as represented by a belt conveyor, etc., or a function of performing transport in an arc-shaped manner as represented by a rotating disk, etc.

[0038] The suction coating function of the transfer suction device may be realized by a vacuum channel connecting the lower end surface of the substrate after the (A) coating liquid placing step with a vacuum pump. The transfer suction device may have only one vacuum channel or may have two or more vacuum channels.

[0039] The vacuum channel of the transfer suction device may include a first vacuum channel and a second vacuum channel. Here, the first vacuum channel may be connected to a vacuum pump and be depressurized. The second vacuum channel may apply a reduced pressure to the lower end surface of the substrate after the (A) coating liquid placing step by connecting the first vacuum channel in a depressurized state to the lower end surface of the substrate after the (A) coating liquid placing step.

[0040] When performing the suction coating process using a transport suction device, it is also a preferred embodiment of the present invention to interpose a suitable mounting jig between the substrate and the transport suction device in order to ensure airtightness at the connection between the lower end surface of the substrate and the vacuum channel (particularly the second vacuum channel).

[0041] The second decompression channel may be capable of moving relatively to the first decompression channel, and this may allow the transfer of the substrate after the (A) coating liquid depositing step.

[0042] Also, when the second reduced pressure channel moves, When the substrate is within a predetermined range, the second vacuum channel and the first vacuum channel are connected to each other, and a vacuum is applied to the lower end surface of the substrate. When the substrate reaches a predetermined position, the second vacuum channel is disconnected from the first vacuum channel, and the vacuum on the lower end surface of the substrate is removed, thereby completing the suction coating process. This may also be an aspect.

[0043] When the transfer suction device has two or more vacuum channels, each of the vacuum channels may include a first vacuum channel and a second vacuum channel.

[0044] As an example of a mode for realizing the above-mentioned relationship between the first decompression channel and the second decompression channel, The transfer suction device has a first layer including a first vacuum channel and a second layer including a second vacuum channel, the first layer and the second layer being laminated together; The second layer is movable relative to the first layer. The following embodiments can be illustrated.

[0045] In such a transfer suction device, the second layer receives the substrate after step (A) and then moves relatively to the first layer, thereby allowing the substrate to be transferred to the next step.

[0046] The transfer and suction device used in the method for producing an exhaust gas purification catalyst device of the present invention may have any shape as long as it can perform the above-mentioned functions.

[0047] The transfer suction device of the present invention may be, for example, disk-shaped. In particular, it may be a two-layer disk-shaped device having a first layer and a second layer, each of which is disk-shaped and stacked coaxially. In this case, the second layer can be moved relative to the first layer by rotating the second layer relative to the first layer.

[0048] In this type of two-layer disk-shaped transfer and suction device, The first vacuum channel is A pump connection opening for connection to a pressure reducing pump, the opening being located on the surface of the first layer opposite the second layer; and An arc-shaped opening on the surface of the second layer that opens in an arc along the circumference of the first layer may have the following structure:

[0049] The second pressure reduction channel is A pressure reduction channel connection opening that opens onto the surface of the second layer that faces the first layer and is connected to the first pressure reduction channel; and A substrate connection opening on the surface opposite to the first layer for connection to the lower end surface of the substrate after step (A). It may have the following structure:

[0050] With this configuration, when the second layer rotates relative to the first layer, after the second layer receives the substrate after step (A), the opening connected to the vacuum channel of the second layer can move along the arc shape of the arc-shaped opening of the first layer until the substrate is transferred to a predetermined position. As a result, the second vacuum channel of the second layer is depressurized via the first vacuum channel of the first layer, so that the depressurization is also applied to the lower end surface of the substrate above the opening connected to the substrate of the second layer.

[0051] Therefore, when the vacuum channel connecting opening of the second layer moves along the arc of the arc-shaped opening of the first layer, (B) suction coating process and (C) transfer process are performed simultaneously on the substrate after (A) coating liquid placing process.

[0052] When the relative rotation of the second layer with respect to the first layer continues from the above state, the opening connecting the vacuum channel of the second layer moves out of the arc-shaped range of the arc-shaped opening of the first layer. Then, the connection between the lower end surface of the substrate and the first vacuum channel is released, the lower end surface of the substrate returns to normal pressure, and the (B) suction coating step ends. Also, when the point where the opening connecting the vacuum channel moves out of the arc-shaped range of the arc-shaped opening is set near the destination of the transfer, the (C) transfer step may also end here.

[0053] In the disk-shaped transport suction device as described above, by adjusting the central angle of the arc of the arc-shaped opening of the first vacuum channel, it is possible to set an appropriate transport distance according to the positional relationship between the coating liquid placement device and the position where the next process is performed, and it is also possible to adjust the suction time in the (B) suction coating process.

[0054] The suction time in the suction coating step (B) can also be adjusted by adjusting the relative rotation speed of the second layer with respect to the first layer.

[0055] In the first layer of the disk-shaped transfer suction device as described above, the central angle of the arc of the arc-shaped opening of the first pressure reduction channel may be, for example, 90° or more, 120° or more, 150° or more, 180° or more, or 210° or more, depending on the positional relationship between the coating liquid placing device and the position where the next process is performed and the desired suction time, and may be, for example, 270° or less, 240° or less, 210° or less, 180° or less, or 150° or less.

[0056] The central angle of the arc of the arcuate opening of the first vacuum channel may typically be greater than or equal to 90° and less than or equal to 270°.

[0057] <Production system for exhaust gas purification catalyst device> According to another aspect of the present invention, there is provided a system for manufacturing an exhaust gas purification catalyst device.

[0058] The manufacturing system for an exhaust gas purification catalyst device of the present invention comprises: A coating liquid placing device that holds a substrate having a plurality of cell flow paths partitioned by cell walls so that the flow paths of the cell flow paths are vertical, and places a coating liquid for forming a catalyst coat layer on the upper end surface of the substrate; and A transfer and suction device that simultaneously performs the following operations: sucking the substrate after step (A) from the lower end surface to coat the coating liquid on the cell walls of the substrate and at least one of the cell walls; and transporting the substrate after step (A) to a next process. The present invention relates to a manufacturing system for an exhaust gas purification catalyst device.

[0059] For each element of the production system for an exhaust gas purification catalyst device of the present invention, the relevant portions of the explanation for each element of the production method for an exhaust gas purification catalyst device of the present invention described above can be cited.

[0060] 《Transfer suction device》 According to yet another aspect of the present invention, a transfer suction apparatus is provided.

[0061] The transfer and suction device of the present invention is a transfer and suction device that simultaneously sucks a substrate, on whose upper end surface a coating liquid for forming a catalyst coating layer has been placed, from its lower end surface, thereby coating the coating liquid on the cell walls of the substrate and at least one of the cell walls, and transfers the substrate to the next process.

[0062] For each element of the transfer and suction device of the present invention, the relevant portions of the explanation of each element of the manufacturing method of the exhaust gas purification catalyst device of the present invention described above can be cited.

[0063] <<Embodiment>> An example of the configuration of a transfer suction device used in the manufacturing method of an exhaust gas purification catalyst device of the present invention is shown in Figures 1 and 2. Figure 1 is a perspective view showing the general shape of the transfer suction device, and Figure 2 is an internal see-through perspective view for explaining the internal structure of the first and second layers constituting the transfer suction device.

[0064] The transfer suction device (100) of Figs. 1 and 2 has a disk shape composed of a first layer (10) and a second layer (20) each having a disk shape, which are stacked coaxially.

[0065] The second layer (20) of the transfer suction device (100) can rotate in the direction of the dashed arrows in Figures 1 and 2, thereby allowing the second layer (20) to move relative to the first layer (10).

[0066] As shown in FIG. 2, the first layer (10) of the transfer suction device (100) includes a first vacuum channel (11) and the second layer (20) includes a second vacuum channel (21).

[0067] The first pressure reduction channel (11) of the first layer (10) is composed of three channel systems: a first pressure reduction channel A system (11a), a first pressure reduction channel B system (11b), and a first pressure reduction channel C system (11c).

[0068] Each channel system of the first pressure reduction channel (11) of the first layer (10) has an arc-shaped opening on the upper surface (the surface facing the second layer (20)) of the first layer (10) that opens in an arc shape along the circumference of the disk-shaped first layer (10), and has a pump connection opening on the lower surface (the surface opposite the second layer (20)) for connection to a pressure reduction pump.

[0069] The arcuate openings of each channel system of the first decompression channel (11) are formed concentrically, and the central angle of the arc of each of these arcuate openings is approximately 180°.

[0070] The pump connection opening of each channel is connected to a vacuum pump via a vacuum pump connection passage (12). In the transfer suction device (100), the three first vacuum channel systems (11a, 11b, 11c) are connected to individual vacuum pumps (P1, P2, P3) via their own vacuum pump connection passages (12a, 12b, 12c).

[0071] The underside of the first layer (10) has no openings other than a pump connection opening in the first vacuum channel (11).

[0072] The second pressure reduction channel (21) of the second layer (20) is composed of three channel systems: a second pressure reduction channel A system (21a), a second pressure reduction channel B system (21b), and a second pressure reduction channel C system (21c).

[0073] Each channel system of the second pressure reduction channel (21) of the second layer (20) has a substrate connection opening on the upper surface (the surface opposite to the first layer (10)) of the second layer (20) for connection to the lower end surface of the substrate after the coating liquid placing step (A), and has a pressure reduction channel connection opening on the lower surface (the surface on the first layer (10) side) for connection to the first pressure reduction channel (11) of the first layer (10).

[0074] The three second pressure reduction channel systems (21a, 21b, 21c) of the second layer (20) each have two pressure reduction channels, and the substrate connection openings and pressure reduction channel connection openings of the pressure reduction channels belonging to the same system are arranged point symmetrically (at positions 180° apart from each other) on the upper and lower surfaces of the second layer (20), respectively.

[0075] The substrate-connecting openings of the three second pressure reduction channel systems (21a, 21b, 21c) all open near the outer periphery of the second layer (20) at equal distances from the axis of the second layer (20).

[0076] On the other hand, the pressure reduction channel connection openings of the three second pressure reduction channel systems (21a, 21b, 21c) are different in distance from the axis of the second layer (20) for each system. That is, the pressure reduction channel connection openings of the second pressure reduction channel A system (21a) are opened at a position corresponding to the substrate connection openings on the lower surface of the second layer (20). The second pressure reduction channel B system (21b) extends radially inward from the substrate connection openings on the upper surface of the second layer (20), and the pressure reduction channel connection openings are opened at a position slightly radially inward from the position corresponding to the substrate connection openings on the lower surface of the second layer (20). The second pressure reduction channel C system (21c) extends radially further inward from the substrate connection openings on the upper surface of the second layer (20), and the pressure reduction channel connection openings are opened at a position further radially inward from the position corresponding to the substrate connection openings on the lower surface of the second layer (20).

[0077] Here, when the first layer (10) and the second layer (20) are coaxially stacked, the distance from the axis of the second layer (20) of the reduction-pressure channel connecting opening of the second reduction-pressure channel A system (21a) of the second layer (20) matches the arc radius of the arc-shaped opening of the first reduction-pressure channel A system (11a) of the first layer (10). Also, the distance from the axis of the reduction-pressure channel connecting opening of the second reduction-pressure channel B system (21b) matches the arc radius of the arc-shaped opening of the first reduction-pressure channel B system (11b). Furthermore, the distance from the axis of the reduction-pressure channel connecting opening of the second reduction-pressure channel C system (21c) matches the arc radius of the arc-shaped opening of the first reduction-pressure channel C system (11c).

[0078] With this configuration, when the first layer (10) and the second layer (20) are stacked coaxially and the second layer (20) is rotated relative to the first layer (10), The pressure reduction channel connecting opening of the second pressure reduction channel A system (21a) moves along the arc-shaped opening of the first pressure reduction channel A system (11a); The pressure reduction channel connecting opening of the second pressure reduction channel B system (21b) moves along the arc-shaped opening of the first pressure reduction channel B system (11b); The vacuum channel connecting opening of the second vacuum channel C system (21c) moves along the arcuate opening of the first vacuum channel C system (11c).

[0079] When the second layer (20) rotates relative to the first layer (10), when the vacuum channel connecting opening of the second vacuum channel (21) is in the opening region of the arc-shaped opening of the first vacuum channel (11), the vacuum channel connecting opening moves along the arc-shaped opening and the two are connected, but when the vacuum channel connecting opening of the second vacuum channel moves out of the opening region of the arc-shaped opening of the first vacuum channel, the connection between the two is released.

[0080] Therefore, by using the transfer suction device (100) shown in Figures 1 and 2 and positioning the position for carrying out the (A) coating liquid placing step and the position for carrying out the next step near both ends of the arc-shaped opening of the first pressure reduction channel (11) of the first layer (10) of the transfer suction device (100), it is possible to simultaneously carry out the (B) suction coating step and the (C) transfer step on the substrate after the (A) coating liquid placing step.

[0081] That is, for example, the first layer (10) of the transfer and suction device (100) is fixed, and the second layer (20) is continuously rotated relative to the first layer (10). In this state, when the substrate after the (A) coating liquid placing step is received on the substrate connecting opening of the second layer (20) and rotated, the substrate is transferred from the implementation position of the (A) coating liquid placing step to the implementation position of the next step, and the (C) transferring step is performed.

[0082] During this time, the vacuum channel connecting opening of the second vacuum channel (21) of the second layer (20) is located in the opening area of ​​the arc-shaped opening of the first vacuum channel (11) of the first layer (10), so the reduced pressure generated by the vacuum pump is applied to the lower end surface of the substrate via the vacuum pump connecting path, the pump connecting opening, the first vacuum channel (11), the arc-shaped opening, the vacuum channel connecting opening, the second vacuum channel (21), and the substrate connecting opening, and thus (B) the suction coating process is performed.

[0083] Then, when the substrate reaches the vicinity of the position where the next process is to be performed, the vacuum channel connecting opening of the second vacuum channel (21) is out of the arcuate region of the arcuate opening of the first vacuum channel (11), and the connection between the second vacuum channel (21) and the first vacuum channel (11) is released. This also removes the vacuum applied to the lower end surface of the substrate, and the (C) suction coating process is terminated. At this point, the (B) transport process may also be terminated.

[0084] The second layer (20) continues to rotate even after the substrate is transferred to the next process. At this time, the second decompression channel (21) is disconnected from the first decompression channel (11) and leaves the decompressed state. With the substrate connection opening open, the second decompression channel (21) returns to the vicinity of the position where the (A) coating liquid placing process is performed, and prepares for the (B) transport process and (C) suction coating process of the next substrate.

[0085] The transfer suction device (100) has three systems of vacuum channels, each connected to a separate vacuum pump and capable of maintaining an individual vacuum state for each. Therefore, without waiting for the completion of the (B) transfer step and (C) suction coating step of one substrate, the (B) transfer step and (C) suction coating step of the next substrate can be started, thereby achieving an efficient process.

[0086] Furthermore, by adjusting the rotation speed of the second layer (20), the time required for the (B) transfer step and the (C) suction coating step can be adjusted, so the transfer suction device (100) can be applied to processes in which the specified suction time after the coating liquid is placed is different. [Explanation of symbols]

[0087] 10 1st layer 11 First vacuum channel 11a First pressure reduction channel A 11b First pressure reduction channel B 11c First pressure reduction channel C 12a Pressure reducing pump connection line A 12b Pressure reducing pump connection line B 12c Pressure reducing pump connection line C 20 2nd layer 21 Secondary Pressure Reduction Channel 21a Second pressure reduction channel A 21b Second pressure reduction channel B 21c Second pressure reduction channel C 100 Transfer suction device P1, P2, P3 Pressure Reducing Pump

Claims

1. (A) holding a honeycomb substrate having a plurality of cell channels partitioned by cell walls such that the flow direction of the cell channels is vertical, and placing a coating liquid for forming a catalyst coating layer on the upper end surface of the substrate; (B) sucking the substrate after the step (A) from the lower end surface with a vacuum pump to coat the coating liquid on one or more of the cell walls and in the cell walls of the substrate; and (C) transporting the substrate after the step (A) to a next step; A method for producing an exhaust gas purification catalyst device, comprising: The steps (B) and (C) are carried out simultaneously by a transfer suction device. A method for manufacturing an exhaust gas purification catalyst device, comprising the steps of: The transfer suction device has one or more vacuum channels connecting the lower end surface of the substrate after the step (A) and the vacuum pump; each of the reduced pressure channels includes a first reduced pressure channel and a second reduced pressure channel; the first vacuum channel is connected to a vacuum pump and is vacuumed; The second vacuum channel includes: After the transfer suction device receives the substrate after the step (A), the lower end surface of the substrate is connected to the first decompression channel until the substrate is transferred to a predetermined position; and When the substrate is transferred to a predetermined position, a lower end surface of the substrate is released from the first vacuum channel; The transfer suction device has a first layer including the first vacuum channel and a second layer including the second vacuum channel, and these are configured as two layers stacked together; the second layer is movable relative to the first layer; The second layer receives the substrate after the step (A) and then moves relative to the first layer to transport the substrate to the next step. A method for manufacturing an exhaust gas purification catalyst device.

2. The method for producing an exhaust gas purification catalyst device according to claim 1 , wherein the transfer suction device is disk-shaped.

3. the transfer suction device is a two-layer disk-like structure in which the first layer and the second layer are each disk-shaped and stacked coaxially; the relative movement of the second layer with respect to the first layer is a rotation; A method for producing the exhaust gas purification catalyst device according to claim 1.

4. The first vacuum channel includes: a pump connection opening that opens on a surface of the first layer opposite to the second layer, for connection to the decompression pump; and an arc-shaped opening that opens in an arc along the circumference of the first layer on the surface on the second layer side; having The second vacuum channel includes: a vacuum channel connection opening that opens on a surface of the second layer that faces the first layer and is connected to the first vacuum channel; and a base material connecting opening, which opens on the surface opposite to the first layer and is for connecting to the lower end surface of the base material after the step (A); having When the second layer rotates relative to the first layer, After the second layer receives the substrate after the step (A), until the substrate is transferred to a predetermined position, the vacuum channel connecting opening of the second layer moves along the arc shape of the arc opening of the first layer; and When the substrate is transferred to a predetermined position, the vacuum channel connecting opening of the second layer is displaced from the arc shape of the arc-shaped opening of the first layer, thereby releasing the connection between the lower end surface of the substrate and the first vacuum channel. A method for producing the exhaust gas purification catalyst device according to claim 3.

5. The method for producing an exhaust gas purification catalyst device according to claim 4, wherein a central angle of the arc of the arc-shaped opening of the first pressure reduction channel is equal to or greater than 90° and equal to or less than 270°.

6. A coating liquid placing device that holds a substrate having a plurality of cell flow paths defined by cell walls such that the flow paths of the cell flow paths are vertical, and places a coating liquid for forming a catalyst coat layer on an upper end surface of the substrate; and A transfer and suction device that simultaneously performs the following operations: sucking the substrate on which a coating liquid for forming a catalyst coat layer is placed from a lower end surface, coating the coating liquid on one or more of the cell walls of the substrate and inside the cell walls, and transferring the substrate on which the coating liquid for forming a catalyst coat layer is placed to a next process. A manufacturing system for an exhaust gas purification catalyst device, comprising: The transfer suction device has one or more vacuum channels that connect the lower end surface of the substrate on which the catalyst coating layer forming coating liquid is placed to a vacuum pump, each of the reduced pressure channels includes a first reduced pressure channel and a second reduced pressure channel; the first vacuum channel is connected to a vacuum pump and is vacuumed; The second vacuum channel includes: After the transfer suction device receives the substrate on which the catalyst coating layer forming coating liquid is placed, the transfer suction device connects a lower end surface of the substrate to the first decompression channel until the substrate is transferred to a predetermined position, and When the substrate is transferred to a predetermined position, a lower end surface of the substrate is released from the first vacuum channel; The transfer suction device has a first layer including the first vacuum channel and a second layer including the second vacuum channel, and these are configured as two layers stacked together; the second layer is movable relative to the first layer; The second layer receives the substrate on which the catalyst coating layer forming coating liquid is placed, and then moves relative to the first layer to transport the substrate to the next process. A manufacturing system for exhaust gas purification catalyst devices.

7. the transfer suction device is a two-layer disk-like structure in which the first layer and the second layer are each disk-shaped and stacked coaxially; the relative movement of the second layer with respect to the first layer is a rotation; A system for manufacturing an exhaust gas purification catalyst device according to claim 6.

8. A transfer and suction device which simultaneously performs the following operations: a substrate having a plurality of cell flow paths partitioned by cell walls, on whose upper end surface a coating liquid for forming a catalyst coating layer is placed, and a transfer and suction device is used to coat the coating liquid on the cell walls of the substrate and at least one of the cell walls, and transfer the substrate to a next process; The transfer suction device has one or more vacuum channels that connect the lower end surface of the substrate on which the catalyst coating layer forming coating liquid is placed to a vacuum pump, each of the reduced pressure channels includes a first reduced pressure channel and a second reduced pressure channel; the first vacuum channel is connected to a vacuum pump and is vacuumed; The second vacuum channel includes: After the transfer suction device receives the substrate on which the catalyst coating layer forming coating liquid is placed, the transfer suction device connects a lower end surface of the substrate to the first decompression channel until the substrate is transferred to a predetermined position, and When the substrate is transferred to a predetermined position, a lower end surface of the substrate is released from the first vacuum channel; The transfer suction device has a first layer including the first vacuum channel and a second layer including the second vacuum channel, and these are configured as two layers stacked together; the second layer is movable relative to the first layer; The second layer receives the substrate on which the catalyst coating layer forming coating liquid is placed, and then moves relative to the first layer to transport the substrate to the next process. Transfer suction device.

9. the transfer suction device is a two-layer disk-like structure in which the first layer and the second layer are each disk-shaped and stacked coaxially; the relative movement of the second layer with respect to the first layer is a rotation; 9. The transfer suction device of claim 8.

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