Silane Compounds

Abstract

To provide a compound that can form a surface treatment layer excellent in friction durability and alkali durability.SOLUTION: The present invention provides a compound represented by the formula (1) in the figure (where: R1 is a monovalent group comprising one or more Si atoms to which no hydroxyl group or hydrolyzable group is directly bonded; X1 is a divalent organic group comprising an amide bond; R11 are each independently a hydroxyl group or hydrolyzable group; R12 are each independently a hydrogen atom or monovalent organic group; and n1 is an integer from 1 to 3).SELECTED DRAWING: None

Description

[Technical Field]

[0001] The present disclosure relates to silane compounds. [Background technology]

[0002] It is known that certain silane compounds can provide excellent water and oil repellency when used in the surface treatment of a substrate (Patent Document 1). [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Japanese Patent Application Publication No. 2019-44179 Summary of the Invention [Problem to be solved by the invention]

[0004] An object of the present disclosure is to provide a compound capable of forming a surface treatment layer that is excellent in friction resistance and alkali resistance. [Means for solving the problem]

[0005] The present disclosure includes the following aspects. [1] The following formula (1): [ka] [In formula: R 1 is a monovalent group containing one or more Si atoms to which no hydroxyl group or hydrolyzable group is directly bonded, X 1 is a divalent organic group containing an amide bond, R 11 are each independently a hydroxyl group or a hydrolyzable group, R 12 are each independently a hydrogen atom or a monovalent organic group, n1 is an integer from 1 to 3. A compound represented by the formula: [2] R 1 is R 3 -(SiR 4 2O) n -SiR 4 2- and R 3 is C 1-12 an alkyl group, a phenyl group, or an A group; The A group has the formula: TIFF0007626961000002.tif15106[in formula: R 51 are each independently R 53 -(SiR 53 2-R 61 ) ma - is a group represented by R 61 are each independently a single bond, an oxygen atom, or C 1-6 is an alkylene group, R 53 are each independently a hydrocarbon group or R 51’ and R 51’ is R 51 is equivalent to Each ma is independently an integer of 1 to 5; However, R 51 Medium, R 51’ The number of is 20 or less, R 52 are each independently a hydrocarbon group, na is an integer from 1 to 3, z is 0 or 1. is a group represented by R 4 are each independently 1-12 Alkyl group, phenyl group, or R 3 -(SiR 4’ 2O) n - and R 4’ are each independently 1-12 an alkyl group or a phenyl group, n is 1 to 1500; The compound according to [1] above. [3] R3 is C 1-4 The compound according to the above [2], which is an alkyl group. [4] R 3 is a methyl group. [5] R 4 is a methyl group. [6] X 1 is expressed by the following formula: -R 14 -CONR 13 -R 15 - [In formula: R 13 is a hydrogen atom, C 1-6 an alkyl group or a phenyl group, R 14 is -(R 51 ) p5 -(X 51 ) q5 - and R 51 is a single bond, -(CH2) p - or an o-, m- or p-phenylene group, p5 is an integer from 0 to 30, X 51 is -(X 52 ) l5 - and X 52 each independently represents -O-, -S-, o-, m- or p-phenylene group, -CO-, -C(O)O-, or -CONR 54 -, -O-CONR 54 -, -NR 54 - and -(CH2) n5 - is a group selected from the group consisting of R 54 are each independently a hydrogen atom or a monovalent organic group, n5 is independently an integer of 1 to 20, l5 is an integer from 1 to 10, p5 is 0 or 1; q5 is 0 or 1, R 15 is a single bond, -(CH2) q- or an o-, m- or p-phenylene group, and q is an integer from 1 to 10. is a group represented by The compound according to any one of the above [1] to [5]. [7] R 1 is expressed by the following formula: R 3 -(SiR 4 2O) n -SiR 4 2- [In formula: R 3 is C 1-4 is an alkyl group, R 4 is a methyl group, n is 1 to 80. is a group represented by X 1 is expressed by the following formula: -(CH2) p -CONR 13 -(CH2) q - -(CH2) p1 -O-(CH2) p2 -CONR 13 -(CH2) q - [In formula: R 13 is a hydrogen atom, p is an integer from 1 to 30, p1 is an integer from 1 to 10, p2 is an integer from 1 to 10, and q is an integer from 1 to 10. is a group represented by R 11 is OCH3, n1 is 3, The compound according to any one of the above [1] to [6]. [8] The compound according to the above [7], wherein n is an integer of 1 to 30. [9] The compound according to the above [7], wherein n is an integer of 20 to 80.

[10] R 1 is R 3-(SiR 4 2O) n -SiR 4 2- and R 3 is C 1-4 is an alkyl group or an A group, The A group is [(CH3)3SiO]2CH3Si(CH3)2O- or [(CH3)3SiO]3Si(CH3)2O-; R 4 is a methyl group, n is 1 to 100; X 1 is -(CH2) p -CONH-(CH2) q - and p is an integer from 3 to 30; The compound according to any one of the above [1] to [9], wherein q is an integer of 2 to 3.

[11] The compound according to any one of the above [1] to

[10] , which is selected from the following compounds: CH3Si(CH3)2O(Si(CH3)2O) n Si(CH3)2(CH2) 10 CONHCH2CH2CH2Si(OCH3)3 CH3(CH2)3(Si(CH3)2O) n Si(CH3)2(CH2)3OCH2CONHCH2CH2CH2Si(OCH3)3 CH3CH2CH2CH2Si(CH3)2O(Si(CH3)2O) n Si(CH3)2CH2CH2CH2OCH2CONHCH2CH2CH2Si(OCH3)3 [(CH3)3SiO]2CH3SiO(Si(CH3)2O) n Si(CH3)2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CONHCH2CH2CH2Si(OCH3)3 [(CH3)3SiO]3SiO(Si(CH3)2O) nSi(CH3)2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CONHCH2CH2CH2Si(OCH3)3 n is an integer from 2 to 80.

[12] The compound according to any one of the above [1] to

[11] , which is selected from the following compounds: CH3Si(CH3)2O(Si(CH3)2O) n Si(CH3)2(CH2) 10 CONHCH2CH2CH2Si(OCH3)3 (n is an integer between 10 and 30) CH3(CH2)3(Si(CH3)2O) n Si(CH3)2(CH2)3OCH2CONHCH2CH2CH2Si(OCH3)3 (n is an integer between 10 and 30) CH3CH2CH2CH2Si(CH3)2O(Si(CH3)2O) n Si(CH3)2CH2CH2CH2OCH2CONHCH2CH2CH2Si(OCH3)3 (n is an integer between 40 and 70) [(CH3)3SiO]2CH3SiO(Si(CH3)2O) n Si(CH3)2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CONHCH2CH2CH2Si(OCH3)3 (n is an integer from 5 to 20) [(CH3)3SiO]3SiO(Si(CH3)2O) n Si(CH3)2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CONHCH2CH2CH2Si(OCH3)3 (n is an integer from 5 to 20)

[13] The following formula (2): R 3 -(SiR 4 2O) n -SiR 4 2-(CH2) p -CONR 13 -(CH2) q’-CH=CH2(2) [In formula: R 3 is C 1-12 an alkyl group, a phenyl group, or an A group; The A group has the formula: TIFF0007626961000003.tif15106[in formula: R 51 are each independently -(R 54 -SiR 53 2) ma -R 53 is a group represented by R 54 are each independently an oxygen atom or C 1-6 is an alkylene group, R 53 are each independently a hydrocarbon group or R 1’ and R 51’ is R 51 is equivalent to Each ma is independently an integer of 1 to 5; However, R 51 Medium, R 51’ The number of is 20 or less, R 52 are each independently or a hydrocarbon group, na is 1 to 3, z is 0 or 1. is a group represented by R 4 are each independently 1-12 Alkyl group, phenyl group, or R 3 -(SiR 4’ 2O) n - and R 4’ are each independently 1-12 an alkyl group or a phenyl group, n is 1 to 1500; R 13 is a hydrogen atom, C 1-6 an alkyl group or a phenyl group, p is an integer from 0 to 30, and q' is an integer from 1 to 8. A compound represented by the formula:

[14] The compound according to any one of the above [1] to

[12] and a compound of formula (3): R 21 -R 22 -CONR 24 -R 23 -SiR 11 n1 R 12 3-n1 (3) [In formula: R 21 is CH3CH2CH2-, CH3CH=CH-, or R 12 3-n1 R 11 n1 Si-, R 22 is C 0-30 is an alkylene group, R 23 is C 1-10 is an alkylene group, R 24 is a hydrogen atom, C 1-6 an alkyl group or a phenyl group, R 11 are each independently a hydroxyl group or a hydrolyzable group, R 12 are each independently a hydrogen atom or a monovalent organic group, n1 is an integer from 1 to 3. A composition comprising a compound represented by the formula:

[15] The composition according to the above

[14] , containing the compound represented by formula (3) in an amount of 0.1% by mass to 30% by mass based on the total amount of the compound represented by formula (1) and the compound represented by formula (3).

[16] The composition according to

[14] or

[15] above, which is a surface treatment agent.

[17] A surface treatment agent comprising the compound according to any one of the above [1] to

[12] .

[18] The surface treatment agent according to the above

[16] or

[17] , further comprising a condensate of the compound according to any one of the above [1] to

[12] .

[19] Furthermore, R 81 OR82 , R 83 n8 C6H 6-n8 , R 84 R 85 R 86 Si-(O-SiR 87 R 88 ) m8 -R 89 , and (OSiR 87 R 88 ) m9 [In the ceremony R 81 ~R 89 are each independently a monovalent organic group having 1 to 10 carbon atoms, m8 is an integer from 1 to 6, m9 is an integer from 4 to 8, n8 is an integer from 0 to 6. The surface treatment agent according to any one of the above

[16] to

[18] , which contains a solvent selected from compounds represented by the following formula:

[20] The solvent is R 84 R 85 R 86 Si-(O-SiR 87 R 88 ) m8 -R 89 The surface treatment agent according to

[19] above,

[21] The surface treatment agent according to

[19] above, wherein the solvent is hexamethyldisiloxane, hexaethyldisiloxane, octamethyltrisiloxane, octamethylcyclotetrasiloxane, or decamethylcyclopentasiloxane.

[22] The surface treatment agent according to any one of the above items

[16] to

[21] , which is for vacuum deposition.

[23] The surface treatment agent according to any one of the above

[16] to

[22] , which is for wet coating.

[24] Pellets containing the surface treatment agent according to any one of the above

[16] to

[23] .

[25] An article comprising a substrate and a layer formed on the substrate from the compound according to any one of the above [1] to

[12] .

[26] The article according to

[25] above, further comprising an intermediate layer comprising silicon oxide between the substrate and the layer.

[27] The article according to

[26] above, wherein the intermediate layer contains alkali metal atoms.

[28] The article according to

[27] above, wherein at least a portion of the alkali metal atoms are sodium atoms.

[29] The article according to any one of the above items

[25] to

[28] , which is an optical member.

[30] The article according to any one of the above items

[25] to

[28] , which is a display. [Effects of the Invention]

[0006] According to the present disclosure, a compound capable of forming a surface treatment layer having excellent friction resistance and alkali resistance can be provided. DETAILED DESCRIPTION OF THE INVENTION

[0007] As used herein, the term "monovalent organic group" refers to a monovalent group containing carbon. The monovalent organic group is not particularly limited, but may be a hydrocarbon group or a derivative thereof. A hydrocarbon group derivative refers to a group having one or more N, O, S, Si, amide, sulfonyl, siloxane, carbonyl, carbonyloxy, etc. at the end or in the molecular chain of the hydrocarbon group. Note that when simply referring to an "organic group," it refers to a monovalent organic group. Furthermore, the term "divalent organic group" refers to a divalent group containing carbon. Examples of such divalent organic groups include divalent groups obtained by eliminating one additional hydrogen atom from an organic group. Similarly, a trivalent or higher organic group refers to a group obtained by eliminating a predetermined number of hydrogen atoms from an organic group.

[0008] As used herein, the term "hydrocarbon group" refers to a group containing carbon and hydrogen, which is obtained by removing a hydrogen atom from a hydrocarbon. Such hydrocarbon groups include, but are not limited to, C 1-20Examples of hydrocarbon groups include aliphatic hydrocarbon groups and aromatic hydrocarbon groups. The "aliphatic hydrocarbon group" may be linear, branched, or cyclic, and may be saturated or unsaturated. The hydrocarbon group may contain one or more ring structures. The hydrocarbon group may be substituted with one or more substituents.

[0009] As used herein, the substituent of the "hydrocarbon group" is not particularly limited, but examples thereof include a halogen atom, a C 1-6 Alkyl group, C 2-6 Alkenyl group, C 2-6 Alkynyl group, C 3-10 Cycloalkyl groups, C 3-10 Unsaturated cycloalkyl groups, 5- to 10-membered heterocyclyl groups, 5- to 10-membered unsaturated heterocyclyl groups, C 6-10 Examples include one or more groups selected from aryl groups and 5- to 10-membered heteroaryl groups.

[0010] As used herein, the term "hydrolyzable group" refers to a group that can undergo a hydrolysis reaction, i.e., a group that can be removed from the main skeleton of a compound by a hydrolysis reaction. Examples of hydrolyzable groups include -OR h , -OCOR h , -ON=CR h 2, -NR h 2, -NHR h , —NCO, halogen (wherein R h represents a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms), and preferably -OR h (i.e., an alkoxy group). h Examples of the alkyl group include unsubstituted alkyl groups such as methyl, ethyl, propyl, isopropyl, n-butyl, and isobutyl; and substituted alkyl groups such as chloromethyl. Among these, alkyl groups, particularly unsubstituted alkyl groups, are preferred, with methyl and ethyl groups being more preferred.

[0011] The silane compound of the present disclosure has the following formula (1): [ka] [In formula: R 1 is a monovalent group containing one or more Si atoms to which no hydroxyl group or hydrolyzable group is directly bonded, X 1 is a divalent organic group containing an amide bond, R 11 are each independently a hydroxyl group or a hydrolyzable group, R 12 are each independently a hydrogen atom or a monovalent organic group, n1 is an integer from 1 to 3. It is a compound represented by the formula:

[0012] R 1 is a monovalent group containing one or more Si atoms to which no hydroxyl group or hydrolyzable group is directly bonded.

[0013] The monovalent group containing one or more Si atoms to which a hydroxyl group or a hydrolyzable group is not directly bonded may contain a Si atom to which a hydroxyl group or a hydrolyzable group is directly bonded.

[0014] In one embodiment, the monovalent group containing one or more Si atoms to which a hydroxyl group or a hydrolyzable group is not directly bonded does not contain a Si atom to which a hydroxyl group or a hydrolyzable group is directly bonded.

[0015] In another embodiment, the monovalent group containing one or more Si atoms to which a hydroxyl group or a hydrolyzable group is not directly bonded contains one or more Si atoms to which a hydroxyl group or a hydrolyzable group is directly bonded.

[0016] In one embodiment, R 1 is the group: R 3 -(SiR 4 2O) n -SiR 4 2- [In formula: R 3 is C1-12 Alkyl, phenyl or A groups: [ka] [In formula: R 51 are each independently -(R 54 -SiR 53 2) ma -R 53 is a group represented by R 54 are each independently an oxygen atom or C 1-6 is an alkylene group, R 53 are each independently a hydrocarbon group or R 51’ and R 51’ is R 51 is equivalent to Each ma is independently an integer of 1 to 5; However, R 51 Medium, R 51’ The number of is 20 or less, R 52 are each independently or a hydrocarbon group, na is 1 to 3, z is 0 or 1. is a group represented by R 4 are each independently 1-12 Alkyl group, phenyl group, or R 3 -(SiR 4’ 2O) n - and R 4’ are each independently 1-12 an alkyl group or a phenyl group, n is 1 to 1500. It is a group represented by the following formula:

[0017] R 3 is C 1-12 It is an alkyl group, a phenyl group, or an A group.

[0018] In one embodiment, R 3is C 1-12 In another embodiment, R 3 is a phenyl group. 3 is the A group.

[0019] R 3 C in 1-12 The alkyl group may be straight-chain or branched. 1-12 The alkyl group is linear. 1-12 The alkyl group is branched. 1-12 The alkyl group is preferably C 1-6 Alkyl groups, more preferably C 1-4 It is preferably an alkyl group, more preferably a methyl group or an ethyl group, and particularly preferably a methyl group.

[0020] The A group has the formula: TIFF0007626961000006.tif15106[in formula: R 51 are each independently R 53 -(SiR 53 2-R 61 ) ma - is a group represented by R 61 are each independently a single bond, an oxygen atom, or C 1-6 is an alkylene group, R 53 are each independently a hydrocarbon group or R 51’ and R 51’ is R 51 is equivalent to Each ma is independently an integer of 1 to 5; However, R 51 Medium, R 51’ The number of is 20 or less, R 52 are each independently a hydrocarbon group, na is an integer from 1 to 3, z is 0 or 1. It is a group represented by the following formula:

[0021] R 51 are each independently R 53 -(SiR 53 2-R 61 ) ma - is a group represented by the formula:

[0022] R 61 are each independently a single bond, an oxygen atom, or C 1-6 It is an alkylene group.

[0023] R 61 C in 1-6 The alkylene group may be a straight chain or a branched chain. 1-6 The alkylene group is preferably C 1-4 Alkylene groups, more preferably C 2-4 It may be an alkylene group.

[0024] In one embodiment, R 61 is an oxygen atom or C 1-6 It is an alkylene group.

[0025] In one embodiment, R 61 is an oxygen atom.

[0026] In one embodiment, some R 61 is an oxygen atom, and other R 61 is C 1-6 It is an alkylene group.

[0027] R 53 are each independently a hydrocarbon group or R 51’ is.

[0028] R 53 The hydrocarbon group in the formula (I) may preferably be an alkyl group or an aryl group.

[0029] The alkyl group may be linear or branched. The alkyl group is preferably an alkyl group having 1 to 6 carbon atoms, more preferably an alkyl group having 1 to 4 carbon atoms. The alkyl group is particularly preferably a methyl group, an ethyl group, an n-propyl group, an isopropyl group, or a tert-butyl group.

[0030] The aryl group may be monocyclic or polycyclic. The aryl is preferably an aryl group having 6 to 20 carbon atoms, more preferably an aryl group having 6 to 10 carbon atoms. The aryl group is particularly preferably a phenyl group.

[0031] R 53 is preferably an alkyl group, more preferably an alkyl group having 1 to 4 carbon atoms.

[0032] R 51’ is R 51 That is, R 51’ is R 53 -(SiR 53 2O) ma -, but R 51 Medium, R 51’ The number is 20 or less, preferably 10 or less, more preferably 6 or less, and even more preferably 3 or less.

[0033] In one embodiment, R 53 are each independently a hydrocarbon group or R 51’ is.

[0034] In a preferred embodiment, R 53 are each independently a hydrocarbon group.

[0035] In one embodiment, R 53 is R 53’ -(SiR 53’ 2-R 61’ ) ma’ - [In formula: R 53’ are each independently a hydrocarbon group or R 53 -(SiR53 2-R 61 ) ma - and At least one R 53’ is R 53 -(SiR 53 2-R 61 ) ma - and R 53 are each independently or a hydrocarbon group, R 61 are each independently a single bond, an oxygen atom, or C 1-6 is an alkylene group, Each ma is independently an integer of 1 to 5; R 61’ are each independently an oxygen atom or C 1-6 is an alkylene group, Each m' is independently an integer of 1 to 5. is.

[0036] In another embodiment, in one embodiment, R 53 is R 53’ -(SiR 53’ 2-R 61’ ) ma’ - [In formula: R 53’ are each independently a hydrocarbon group or R 53” -(SiR 53” 2-R 61” ) ma” - and At least one R 53’ is R 53” -(SiR 53” 2-R 61” ) ma” - and R 53” are each independently a hydrocarbon group or R 53 -(SiR 53 2-R 61 ) ma - and At least one R 53” is R 53 -(SiR 52 2-R 61) ma - and R 53 are each independently or a hydrocarbon group, R 61 are each independently an oxygen atom or C 1-6 is an alkylene group, Each ma is independently an integer of 1 to 5; R 61” are each independently an oxygen atom or C 1-6 is an alkylene group, Each m a ” is independently an integer of 1 to 5; R 61’ are each independently an oxygen atom or C 1-6 is an alkylene group, Each m' is independently an integer of 1 to 5. is.

[0037] Each ma is independently an integer of 1 to 5, preferably 1 or 2.

[0038] R 52 are each independently a hydrocarbon group.

[0039] R 52 The hydrocarbon group in the formula (I) may preferably be an alkyl group or an aryl group.

[0040] The alkyl group may be linear or branched. The alkyl group is preferably an alkyl group having 1 to 6 carbon atoms, more preferably an alkyl group having 1 to 4 carbon atoms. The alkyl group is particularly preferably a methyl group, an ethyl group, an n-propyl group, an isopropyl group, or a tert-butyl group.

[0041] The aryl group may be monocyclic or polycyclic. The aryl is preferably an aryl group having 6 to 20 carbon atoms, more preferably an aryl group having 6 to 10 carbon atoms. The aryl group is particularly preferably a phenyl group.

[0042] R52 is preferably an alkyl group, more preferably an alkyl group having 1 to 4 carbon atoms.

[0043] na is an integer of 1 to 3. In one embodiment, na is 2. In another embodiment, na is 3. 51’ If there is, na is (R 61 -SiR 53 2) ma are selected independently.

[0044] z is 0 or 1. In one embodiment, z is 0. In another embodiment, z is 1.

[0045] In a preferred embodiment, in the A group: R 51 are each independently R 53 -(SiR 53 2-R 61 ) ma - is a group represented by R 61 are each independently a single bond, an oxygen atom, or C 1-6 an alkylene group, preferably an oxygen atom, or C 1-6 is an alkylene group, R 53 are each independently a hydrocarbon group, preferably an alkyl group having 1 to 4 carbon atoms, ma is 1 or 2, R 52 are each independently a hydrocarbon group, preferably an alkyl group having 1 to 4 carbon atoms, na is 1 or 2.

[0046] Examples of A groups include, but are not limited to, the following groups: [ka]

[0047] [ka]

[0048] [ka]

[0049] R 4 are each independently 1-12 Alkyl group, phenyl group, or R 3 -(SiR 4’ 2O) n -It is.

[0050] In one embodiment, R 4 is C 1-12 It is an alkyl group or a phenyl group.

[0051] In one embodiment, R 4 is C 1-12 In another embodiment, R 4 is a phenyl group.

[0052] R 4 C in 1-12 The alkyl group may be straight-chain or branched. 1-12 The alkyl group is linear. 1-12 The alkyl group is branched. 1-12 The alkyl group is preferably C 1-6 Alkyl groups, more preferably C 1-3 It is preferably an alkyl group, more preferably a methyl group or an ethyl group, and particularly preferably a methyl group.

[0053] In one embodiment, R 4 is R 3 -(SiR 4’ 2O) n - That is, R 1 The siloxane group in has a branched structure.

[0054] R 4’ are each independently 1-12 It is an alkyl group or a phenyl group.

[0055] In one embodiment, R 4’ is C 1-12 In another embodiment, R 4’ is a phenyl group.

[0056] R 4’ C in 1-12 The alkyl group may be straight-chain or branched. 1-12 The alkyl group is linear. 1-12 The alkyl group is branched. 1-12 The alkyl group is preferably C 1-6 Alkyl groups, more preferably C 1-3 It is preferably an alkyl group, more preferably a methyl group or an ethyl group, and particularly preferably a methyl group.

[0057] n is 1 to 1500, preferably 1 to 500, more preferably 1 to 100, even more preferably 1 to 20, still more preferably 1 to 10, for example, 1 or 2.

[0058] In one embodiment, n is 10 to 500, more preferably 10 to 100, and even more preferably 10 to 80, for example, 20 to 500, 20 to 100, 20 to 80, 30 to 80, 40 to 80, or 40 to 70. By setting n within this range, the tactile feel and slipperiness of the obtained surface treatment layer are improved.

[0059] In another embodiment, n is 1 to 100, more preferably 1 to 50, and even more preferably 10 to 30, for example, 2 to 100, 2 to 50, 2 to 30, 5 to 100, 5 to 50, 5 to 30, or 5 to 20. By setting n within this range, the friction durability of the obtained surface treatment layer is improved.

[0060] In a preferred embodiment, R 3 is methyl and R 4 is methyl and n is 1 or 2.

[0061] In one embodiment, R1 can be a monovalent organic group that contains one or more Si atoms to which no hydroxyl group or hydrolyzable group is directly bonded and does not contain a siloxane bond.

[0062] In one embodiment, R 1 is expressed by the following formula: -SiR 5 3 [In formula: R 5 are each independently 1-6 Alkyl group, -SiR 6 3, or -OSiR 6 There are 3, R 6 are each independently 1-6 is an alkyl group. It is a group represented by the following formula:

[0063] R 5 C in 1-6 The alkyl group may be straight-chain or branched. 1-6 The alkyl group is linear. 1-6 The alkyl group is branched. 1-6 The alkyl group is preferably C 1-4 It is an alkyl group.

[0064] R 6 C in 1-12 The alkyl group may be straight-chain or branched. 1-12 The alkyl group is linear. 1-12 The alkyl group is branched. 1-12 The alkyl group is preferably C 1-6 Alkyl groups, more preferably C 1-3 It is preferably an alkyl group, more preferably a methyl group or an ethyl group, and particularly preferably a methyl group.

[0065] The above SiR 53 is preferably -Si(CH3)3, -Si(CH2CH3)3, -Si(CH(CH3)2)3, -Si(CH3)(CH3)(C(CH3)3)), -Si(Si(CH3) 3)3, -Si(Si(CH2CH3)3, which can be -Si(OSi(CH3)3)3, -Si(CH3)(OSi(CH3)3)2, or -Si(OSi(CH2CH3)3)3.

[0066] In a preferred embodiment, SiR 5 3 can be —Si(OSi(CH3)3)3.

[0067] In a preferred embodiment, SiR 5 3 can be —Si(CH)(OSi(CH)).

[0068] X 1 is a divalent organic group containing an amide bond.

[0069] X 1 is preferably of the formula: -R 14 -CONR 13 -R 15 - [In formula: R 13 is a hydrogen atom, C 1-6 an alkyl group or a phenyl group, R 14 is -(R 51 ) p5 -(X 51 ) q5 - and R 51 is a single bond, -(CH2) p - or an o-, m- or p-phenylene group, p5 is an integer from 0 to 30, X 51 is -(X 52 ) l5 - and X 52 each independently represents -O-, -S-, o-, m- or p-phenylene group, -CO-, -C(O)O-, or -CONR 54 -, -O-CONR54 -, -NR 54 - and -(CH2) n5 - is a group selected from the group consisting of R 54 are each independently a hydrogen atom or a monovalent organic group, and are preferably a hydrogen atom, a phenyl group, or C 1-6 an alkyl group (preferably a methyl group) or an oxyalkylene-containing group having 1 to 10 carbon atoms, n5 each independently represents an integer of 1 to 20, preferably an integer of 1 to 15, more preferably an integer of 1 to 10, even more preferably an integer of 1 to 6, for example, an integer of 1 to 3; l5 is an integer of 1 to 10, preferably an integer of 1 to 5, more preferably an integer of 1 to 3, p5 is 0 or 1; q5 is 0 or 1, R 15 is a single bond, -(CH2) q - or an o-, m- or p-phenylene group, and q is an integer from 1 to 10. It is a group represented by the following formula:

[0070] In one embodiment, X 1 is preferably of the formula: -(CH2) p -CONR 13 -(CH2) q - [In formula: R 13 is a hydrogen atom, C 1-6 an alkyl group or a phenyl group, p is an integer of 0 to 30, preferably an integer of 1 to 30, more preferably an integer of 3 to 30; q is an integer of 1 to 10, preferably an integer of 2 to 3.] It is a group represented by the following formula:

[0071] In another embodiment, X 1 is preferably of the formula: -(CH2) p1 -O-(CH2) p2 -CONR13 -(CH2) q - [In formula: R 13 is a hydrogen atom, C 1-6 an alkyl group or a phenyl group, p1 is an integer from 1 to 10, p2 is an integer from 1 to 10, and q is an integer from 1 to 10. It is a group represented by the following formula:

[0072] In one embodiment, R 13 is a hydrogen atom.

[0073] In another embodiment, R 13 is C 1-6 It is an alkyl group or a phenyl group.

[0074] R 13 C in 1-6 The alkyl group may be straight-chain or branched. 1-6 The alkyl group is linear. 1-6 The alkyl group is branched. 1-6 The alkyl group is preferably C 1-4 It is an alkyl group.

[0075] In one embodiment, p is 0.

[0076] In another embodiment, p is an integer of 1 to 30, preferably an integer of 6 to 28, for example, an integer of 10 to 26, an integer of 11 to 24, or an integer of 12 to 22.

[0077] q may be an integer of 1 to 10, preferably an integer of 2 to 6, for example, an integer of 2 to 4.

[0078] In a preferred embodiment, p is an integer of 1 to 30, preferably an integer of 6 to 28, for example, an integer of 10 to 26, an integer of 11 to 24, or an integer of 12 to 22, and q is an integer of 1 to 10, preferably an integer of 2 to 6, for example, an integer of 2 to 4.

[0079] R 11 are each independently a hydroxyl group or a hydrolyzable group.

[0080] R 11 are preferably each independently a hydrolyzable group.

[0081] R 11 are preferably each independently -OR h , -OCOR h , -ON=CR h 2, -NR h 2, -NHR h , —NCO, or halogen (wherein R h is a substituted or unsubstituted C 1-4 alkyl group), and more preferably -OR h (i.e., an alkoxy group). h Examples of R include unsubstituted alkyl groups such as methyl, ethyl, propyl, isopropyl, n-butyl, and isobutyl; and substituted alkyl groups such as chloromethyl. Among these, alkyl groups, particularly unsubstituted alkyl groups, are preferred, and methyl or ethyl groups are more preferred. In one embodiment, R h is a methyl group, and in another embodiment, R h is an ethyl group.

[0082] R 12 are each independently a monovalent organic group. Such monovalent organic groups are monovalent organic groups excluding the above-mentioned hydrolyzable groups.

[0083] R 12 In the formula, the monovalent organic group is preferably C 1-20 alkyl group, more preferably C 1-6 It is preferably an alkyl group, more preferably a methyl group.

[0084] In the above formula, n1 is an integer of 1 to 3, preferably an integer of 2 to 3, and more preferably 3.

[0085] In a preferred embodiment, the compounds of the present disclosure are R 1 But the following formula: R 3 -(SiR 4 2O) n -SiR 4 2- [In formula: R 3 is C 1-4 is an alkyl group, R 4 is a methyl group, n is an integer of 1 to 80, for example, an integer of 1 to 30, or an integer of 20 to 80. is a group represented by X 1 But the following formula: -(CH2) p -CONR 13 -(CH2) q - -(CH2) p1 -O-(CH2) p2 -CONR 13 -(CH2) q - [In formula: R 13 is a hydrogen atom, p is an integer from 1 to 30, p1 is an integer from 1 to 10, p2 is an integer from 1 to 10, and q is an integer from 1 to 10. is a group represented by R 11 is OCH3, The compound is one in which n1 is 3.

[0086] In a further preferred embodiment, the compound of the present disclosure is R 1 is R 3 -(SiR 4 2O) n-SiR 4 2- and R 3 is C 1-4 is an alkyl group or an A group, The A group is [(CH3)3SiO]2CH3Si(CH3)2O- or [(CH3)3SiO]3Si(CH3)2O-; R 4 is a methyl group, n is 1 to 100; X 1 is -(CH2) p -CONH-(CH2) q - and p is an integer from 3 to 30; q is an integer of 2 to 3, and is a compound.

[0087] Compounds of the present disclosure include, for example, the following compounds: CH3Si(CH3)2O(Si(CH3)2O) n Si(CH3)2(CH2) 10 CONHCH2CH2CH2Si(OCH3)3 CH3(CH2)3(Si(CH3)2O) n Si(CH3)2(CH2)3OCH2CONHCH2CH2CH2Si(OCH3)3 CH3CH2CH2CH2Si(CH3)2O(Si(CH3)2O) n Si(CH3)2CH2CH2CH2OCH2CONHCH2CH2CH2Si(OCH3)3 [(CH3)3SiO]2CH3SiO(Si(CH3)2O) n Si(CH3)2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CONHCH2CH2CH2Si(OCH3)3 [(CH3)3SiO]3SiO(Si(CH3)2O) n Si(CH3)2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CONHCH2CH2CH2Si(OCH3)3 n is an integer from 2 to 80.

[0088] Preferred compounds of the present disclosure include, for example, the following compounds: CH3Si(CH3)2O(Si(CH3)2O) n Si(CH3)2(CH2) 10 CONHCH2CH2CH2Si(OCH3)3 (n is an integer between 10 and 30) CH3(CH2)3(Si(CH3)2O) n Si(CH3)2(CH2)3OCH2CONHCH2CH2CH2Si(OCH3)3 (n is an integer between 10 and 30) CH3CH2CH2CH2Si(CH3)2O(Si(CH3)2O) n Si(CH3)2CH2CH2CH2OCH2CONHCH2CH2CH2Si(OCH3)3 (n is an integer between 40 and 70) [(CH3)3SiO]2CH3SiO(Si(CH3)2O) n Si(CH3)2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CONHCH2CH2CH2Si(OCH3)3 (n is an integer from 5 to 20) [(CH3)3SiO]3SiO(Si(CH3)2O) n Si(CH3)2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CONHCH2CH2CH2Si(OCH3)3 (n is an integer from 5 to 20)

[0089] The silane compound is not particularly limited, but may be 5×10 2 ~1×10 5 The silane compound represented by the above formula (1) or (2) preferably has a number average molecular weight of 1,000 to 30,000, more preferably 1,500 to 10,000, from the viewpoint of abrasion durability. The "number average molecular weight" is defined as 1 The value is measured by H-NMR.

[0090] The compound represented by formula (1) can be produced, for example, by the following method. First, an unsaturated carboxylic acid or an unsaturated carboxylic acid ester, for example, a compound represented by the formula: CH2=CH-R 71 -COR 72 [In the formula, R 71 represents a single bond or a divalent organic group, for example, an alkylene group having 1 to 28 carbon atoms; R 72 is a hydroxy group, a chlorine atom, or C 1-6 is an alkoxy group.] and silane compounds, for example, compounds represented by the formula: R 3 -(SiR 4 2O) n -SiR 4 2-H [In formula: R 3 is C 1-12 is an alkyl group or a phenyl group, R 4 are each independently 1-12 is an alkyl group or a phenyl group, n is 1 to 1500. and reacting a compound represented by the formula: R 3 -(SiR 4 2O) n -SiR 4 2-CH2CH2-R 71 -COOR 72 The polydimethylsiloxane group-containing carboxylic acid is represented by the formula:

[0033] In addition, commercially available compounds such as X-22-3710 manufactured by Shin-Etsu Chemical Co., Ltd. and MCR-B12 manufactured by Gelest can be used as the polydimethylsiloxane group-containing carboxylic acid. Next, the polydimethylsiloxane group-containing carboxylic acid is reacted with an amine derivative having a terminal carbon-carbon double bond, for example, an amine derivative having a terminal carbon-carbon double bond, represented by the formula: NH2-R 74 -CH=CH [In the formula, R 74 is a single bond or C 1-30 It is an alkylene group. and reacting the compound represented by the formula: R 3 -(SiR 4 2O) n -SiR 4 2-CH2CH2-R 71 -CONH2-R 74 -CH=CH2 Finally, the compound obtained above is reacted with a compound represented by, for example, the formula: HSi(R 77 )3 [In the formula, R 77 is a hydrolyzable group. The compound represented by formula (1) can be obtained by reacting the compound represented by formula (1) with a compound represented by formula (1).

[0091] The present disclosure provides a compound of formula (2), which is an intermediate in the production of formula (1): R 3 -(SiR 4 2O) n -SiR 4 2-(CH2) p -CONR 13 -(CH2) q’ -CH=CH2(2) [In formula: R 3 is C 1-30 is an alkyl group or a phenyl group, R 4 are each independently 1-12 Alkyl group, phenyl group, or R 3 -(SiR 4’ 2O) n - and R 4’ are each independently 1-12 an alkyl group or a phenyl group, n is 1 to 1500; R 13 is a hydrogen atom, C 1-30 an alkyl group or a phenyl group, p is an integer from 0 to 30, and q' is an integer from 1 to 8. Also provided is a compound represented by the following formula: wherein each symbol includes the same embodiments as in formula (1).

[0092] Next, the surface treatment agent of the present invention will be described.

[0093] The surface treatment agent of the present disclosure contains at least one compound represented by formula (1).

[0094] In one embodiment, the surface treatment agent of the present disclosure is at least one compound represented by formula (1) itself.

[0095] In one embodiment, the content of the compound represented by the above formula (1) may be preferably 0.1 to 50.0 mass%, more preferably 1.0 to 30.0 mass%, even more preferably 5.0 to 25.0 mass%, and particularly preferably 10.0 to 20.0 mass%, based on the total mass of the surface treatment agent.

[0096] In another embodiment, the content of the compound represented by the above formula (1) may be preferably 0.001 to 30 mass%, more preferably 0.01 to 10 mass%, even more preferably 0.05 to 5 mass%, and particularly preferably 0.05 to 2 mass%, based on the total mass of the surface treatment agent.

[0097] In one embodiment, the surface treatment agent of the present disclosure may contain a compound represented by formula (1) and a condensate in which at least a portion of the compound represented by formula (1) is condensed.

[0098] In the above embodiment, the content of the condensate may be preferably 40% by mass or less, more preferably 30% by mass or less, based on the total of the silane compound and the condensate. Here, the content of the condensate can be determined, for example, from the abundance ratio of peak position and area in GPC (gel permeation chromatography).

[0099] The surface treatment agent of the present disclosure may further comprise a compound represented by formula (3): R 21 -R 22-CONR 24 -R 23 -SiR 11 n1 R 12 3-n1 (3) [In formula: R 21 is CH3CH2CH2-, CH3CH=CH-, or R 12 3-n1 R 11 n1 Si-, R 22 is C 0-30 is an alkylene group, R 23 is C 1-10 is an alkylene group, R 24 is a hydrogen atom, C 1-30 an alkyl group or a phenyl group, R 11 are each independently a hydroxyl group or a hydrolyzable group, R 12 are each independently a hydrogen atom or a monovalent organic group, n1 is an integer from 1 to 3. The surface treatment agent of the present disclosure may contain a compound represented by formula (3), which further improves friction durability.

[0100] In one embodiment, R 21 can be CH3CH2CH2- and CH3CH=CH-.

[0101] In one embodiment, R 22 is a C0 alkylene group, i.e., a single bond.

[0102] In another embodiment, R 22 is C 1-30 Alkylene groups, such as C 1-10 Alkylene group, C 3-6 Alkylene group, C 6-30 Alkylene group, C 7-30 Alkylene group, C 8-30 Alkylene group, C 9-30 It may be an alkylene group.

[0103] R 23 is C 1-10 Alkylene group, preferably C 2-6 Alkylene groups, more preferably C 2-4 an alkylene group,

[0104] In one embodiment, R 24 is a hydrogen atom.

[0105] In another embodiment, R 24 is C 1-6 It is an alkyl group or a phenyl group.

[0106] R 24 C in 1-6 The alkyl group may be straight-chain or branched. 1-6 The alkyl group is linear. 1-6 The alkyl group is branched. 1-6 The alkyl group is preferably C 1-4 It is an alkyl group.

[0107] R 11 , R 12 and n are defined as in formula (1).

[0108] The surface treatment agent of the present disclosure may contain the compound represented by formula (3) in an amount of preferably 0.1% by mass to 30% by mass, more preferably 0.5% by mass to 20% by mass, and even more preferably 1.0% by mass to 20% by mass, based on the total amount of the compound represented by formula (1) and the compound represented by formula (3).

[0109] In one embodiment, the surface treatment agent of the present disclosure is R 24 C 1-6 The compound represented by formula (3), which is an alkyl group or a phenyl group, may be contained in an amount of preferably 0.5% by mass to 30% by mass, more preferably 1.0% by mass to 20% by mass, based on the total of the compound represented by formula (1) and the compound represented by formula (3).

[0110] In one embodiment, the surface treatment agent of the present disclosure is R 24 R 12 3-n1 R 11 n1 The compound represented by formula (3) which is Si- may be contained in an amount of preferably 0.1 mass % to 3.0 mass %, more preferably 0.1 mass % to 1.0 mass %, based on the total of the compound represented by formula (1) and the compound represented by formula (3).

[0111] The surface treatment agent of the present disclosure may contain a solvent, a (non-reactive) silicone compound that can be understood as silicone oil (hereinafter referred to as "silicone oil"), an amine compound, an alcohol, a catalyst, a surfactant, a polymerization inhibitor, a sensitizer, etc.

[0112] In one embodiment, the surface treatment agent of the present disclosure is R 81 OR 82 , R 83 n8 C6H 6-n8 , R 84 R 85 R 86 Si-(O-SiR 87 R 88 ) m8 -R 89 , and (OSiR 87 R 88 ) m9 [In the ceremony R 81 ~R 89 are each independently a monovalent organic group having 1 to 10 carbon atoms, m8 is an integer from 1 to 6, m9 is an integer from 3 to 8, n8 is an integer from 0 to 6. The solvent may include a solvent selected from compounds represented by the formula:

[0113] The monovalent organic group having 1 to 10 carbon atoms may be a straight chain or a branched chain, and may further contain a cyclic structure.

[0114] In one embodiment, the monovalent organic group having 1 to 10 carbon atoms may contain an oxygen atom, a nitrogen atom, or a halogen atom.

[0115] In another embodiment, the monovalent organic group having 1 to 10 carbon atoms does not contain a halogen atom.

[0116] In a preferred embodiment, the monovalent organic group having 1 to 10 carbon atoms is a hydrocarbon group which may be substituted with a halogen, preferably a hydrocarbon group which is not substituted with a halogen.

[0117] In one embodiment, the hydrocarbon group is linear.

[0118] In another embodiment, the hydrocarbon group is branched.

[0119] In another embodiment, the hydrocarbon group comprises a cyclic structure.

[0120] In one embodiment, the solvent is R 81 OR 82 is.

[0121] R 81 and R 82 are each independently preferably a hydrocarbon group having 1 to 8 carbon atoms, more preferably C 1-6 or C 5-8 It can be a cycloalkyl group of the formula:

[0122] In one embodiment, the solvent is R 83 n8 C6H 6-n8 is.

[0123] C6H 6-n8 is an n8-valent benzene ring. That is, R 83 n8 C6H 6-n8 is n8 R 83 is benzene substituted with

[0124] R 83are each independently a halogen or a C optionally substituted by a halogen. 1-6 The alkyl group may be:

[0125] n8 is preferably an integer of 1 to 3.

[0126] In one embodiment, the solvent is R 84 R 85 R 86 Si-(O-SiR 87 R 88 ) m8 -R 89 is.

[0127] In one embodiment, the solvent is (OSiR 87 R 88 ) m9 (OSiR 87 R 88 ) m9 is multiple OSiR 87 R 88 It is a cyclic siloxane formed by bonding units in a ring.

[0128] R 84 ~R 89 are each independently a hydrogen atom or C 1-6 alkyl groups, preferably C 1-6 alkyl groups of the formula C 1-3 The alkyl group is preferably a methyl group.

[0129] m8 is preferably an integer of 1 to 6, more preferably an integer of 1 to 5, and even more preferably 1 to 2.

[0130] m9 is preferably an integer of 3 to 6, and more preferably an integer of 3 to 5.

[0131] In one embodiment, the solvent may be, for example, an aliphatic hydrocarbon such as hexane, cyclohexane, heptane, octane, nonane, decane, undecane, dodecane, or mineral spirit; an aromatic hydrocarbon such as benzene, toluene, xylene, naphthalene, or solvent naphtha; or an alkyl ester such as methyl acetate, ethyl acetate, propyl acetate, n-butyl acetate, isopropyl acetate, isobutyl acetate, cellosolve acetate, propylene glycol methyl ether acetate, carbitol acetate, diethyl oxalate, ethyl pyruvate, or ethyl-2-hydroxybutyrate. Esters such as acetone, ethyl acetoacetate, amyl acetate, methyl lactate, ethyl lactate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 2-hydroxyisobutyrate, ethyl 2-hydroxyisobutyrate; ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, 2-hexanone, cyclohexanone, methyl amino ketone, 2-heptanone; ethyl cellosolve, methyl cellosolve acetate, ethyl cellosolve acetate, propylene glycol monomethyl ether, propylene Glycol ethers such as glycol monoethyl ether, propylene glycol monobutyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monobutyl ether acetate, dipropylene glycol dimethyl ether, and ethylene glycol monoalkyl ether; alcohols such as methanol, ethanol, isopropanol, n-butanol, isobutanol, tert-butanol, sec-butanol, 3-pentanol, octyl alcohol, 3-methyl-3-methoxybutanol, and tert-amyl alcohol; glycols such as ethylene glycol and propylene glycol; cyclic ethers such as tetrahydrofuran, tetrahydropyran, and dioxane; amides such as N,N-dimethylformamide, N,N-dimethylacetamide, and N-methylpyrrolidone; ether alcohols such as methyl cellosolve, cellosolve, isopropyl cellosolve, butyl cellosolve, and diethylene glycol monomethyl ether; and diethylene glycol monoethyl ether acetate.Polyfluoroaromatic hydrocarbons (e.g., 1,3-bis(trifluoromethyl)benzene); polyfluoroaliphatic hydrocarbons (e.g., CF; 13CH2CH3 (e.g., Asahiklin® AC-6000 manufactured by Asahi Glass Co., Ltd.), 1,1,2,2,3,3,4-heptafluorocyclopentane (e.g., Zeorora® H manufactured by Zeon Corporation); hydrofluoroethers (HFEs) (e.g., perfluoropropyl methyl ether (C3F7OCH3) (e.g., Novec® 7000 manufactured by Sumitomo 3M Limited), perfluorobutyl methyl ether (C4F9OCH3) (e.g., Novec® 7100 manufactured by Sumitomo 3M Limited), perfluorobutyl ethyl ether (C4F9OC2H5) (e.g., Novec® 7200 manufactured by Sumitomo 3M Limited), perfluorohexyl methyl ether (C2F Examples of suitable solvents include alkyl perfluoroalkyl ethers (the perfluoroalkyl and alkyl groups may be linear or branched) such as CF3CH2OCF2CHF2 (e.g., Novec™ 7300 manufactured by Sumitomo 3M Limited), ether alcohols such as cyclopentyl methyl ether, and siloxanes such as hexamethyldisiloxane, hexaethyldisiloxane, octamethyltrisiloxane, octamethylcyclotetrasiloxane, octamethylcyclopentasiloxane, decamethyltetrasiloxane, dodecamethylpentasiloxane, and tetradecamethylhexasiloxane. These solvents can be used alone or in combination. Among these, aliphatic hydrocarbons, aromatic hydrocarbons, esters, glycol ethers, alcohols, ether alcohols, and siloxanes are preferred.For example, hexane, cyclohexane, heptane, octane, nonane, decane, undecane, dodecane, mineral spirits, benzene, toluene, xylene, naphthalene, methyl acetate, ethyl acetate, propyl acetate, n-butyl acetate, isopropyl acetate, isobutyl acetate, cellosolve acetate, propylene glycol methyl ether acetate, carbitol acetate, diethyl oxalate, ethyl pyruvate, ethyl 2-hydroxybutyrate, ethyl acetoacetate, amyl acetate, methyl lactate, ethyl lactate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 2-hydroxyisobutyrate, 2-hydroxyisobutyrate, methyl ... Particularly preferred are ethyl hydroxyisobutyrate, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, methanol, ethanol, isopropanol, n-butanol, isobutanol, tert-butanol, sec-butanol, diethylene glycol monomethyl ether, hexamethyldisiloxane, hexaethyldisiloxane, octamethyltrisiloxane, decamethyltetrasiloxane, dodecamethylpentasiloxane, tetradecamethylhexasiloxane, octamethylcyclotetrasiloxane, and octamethylcyclopentasiloxane.

[0132] The silicone oil is not particularly limited, but examples thereof include silicone oils represented by the following general formula (3a): R 1a -(SiR 3a 2-O) a1 -SiR 3a 2-R 1a (3a) [In formula: R 1a are each independently a hydrogen atom or a hydrocarbon group, R 3a are each independently a hydrogen atom or a hydrocarbon group, a1 is 2 to 3000. Examples of the compound include compounds represented by the following formula:

[0133] Above R 3aare each independently a hydrogen atom or a hydrocarbon group. Such hydrocarbon groups may be substituted.

[0134] R 3a are each independently preferably an unsubstituted hydrocarbon group or a hydrocarbon group substituted with a halogen atom. Such a halogen atom is preferably a fluorine atom.

[0135] R 3a are each independently preferably C optionally substituted by a halogen atom. 1-6 an alkyl group or an aryl group, more preferably C 1-6 It is an alkyl group or an aryl group.

[0136] Above C 1-6 The alkyl group may be straight-chain or branched, but is preferably straight-chain. C 1-6 The alkyl group is preferably C 1-3 It is preferably an alkyl group, more preferably a methyl group.

[0137] The aryl group is preferably a phenyl group.

[0138] In one embodiment, R 3a are each independently 1-6 Alkyl groups, preferably C 1-3 It is preferably an alkyl group, more preferably a methyl group.

[0139] In another embodiment, R 3a is a phenyl group.

[0140] In another embodiment, R 3a is a methyl group or a phenyl group, preferably a methyl group.

[0141] Above R 1a are each independently a hydrogen atom or a hydrocarbon group, and 3a It has the same meaning as:

[0142] R1a are each independently preferably C optionally substituted by a halogen atom. 1-6 an alkyl group or an aryl group, more preferably C 1-6 It is an alkyl group or an aryl group.

[0143] In one embodiment, R 1a are each independently 1-6 Alkyl groups, preferably C 1-3 It is preferably an alkyl group, more preferably a methyl group.

[0144] In another embodiment, R 1a is a phenyl group.

[0145] In another embodiment, R 1a is a methyl group or a phenyl group, preferably a methyl group.

[0146] The above-mentioned a1 is 2 to 1500. a1 is preferably 5 or more, more preferably 10 or more, even more preferably 15 or more, for example, 30 or more, or 50 or more. a1 is preferably 1000 or less, more preferably 500 or less, even more preferably 200 or less, even more preferably 150 or less, for example, 100 or less, or 80 or less.

[0147] a1 may be preferably 5 to 1000, more preferably 10 to 500, even more preferably 15 to 200, and even more preferably 15 to 150.

[0148] Another silicone oil is (3b) below: R 1a -R S2 -R 3a (3b) [In formula: R 1a are each independently a hydrocarbon group, R 3a are each independently a hydrocarbon group, R S2 has the same meaning as in formula (2). Examples of the compound include compounds represented by the following formula:

[0149] The silicone oil may have an average molecular weight of 500 to 1,000,000, preferably 1,000 to 100,000. The molecular weight of the silicone oil can be measured using GPC.

[0150] Examples of the silicone oil include -(SiR 3a 2-O) a1 Linear or cyclic silicone oils in which a1 is 30 or less can be used. The linear silicone oils may be so-called straight silicone oils or modified silicone oils. Examples of straight silicone oils include dimethyl silicone oil, methylphenyl silicone oil, and methylhydrogen silicone oil. Examples of modified silicone oils include straight silicone oils modified with alkyl, aralkyl, polyether, higher fatty acid ester, fluoroalkyl, amino, epoxy, carboxyl, alcohol, etc. Examples of cyclic silicone oils include cyclic dimethylsiloxane oil.

[0151] The silicone oil may be contained in an amount of, for example, 0 to 50% by mass, preferably 0.001 to 30% by mass, and more preferably 0.1 to 5% by mass, relative to the surface treatment agent of the present disclosure.

[0152] In the surface treatment agent of the present disclosure, such silicone oil may be contained in an amount of, for example, 0 to 300 parts by mass, preferably 0 to 100 parts by mass, more preferably 0 to 50 parts by mass, and even more preferably 0 to 10 parts by mass, relative to a total of 100 parts by mass of the compounds of the present disclosure (if there are two or more types, the total of these, the same applies hereinafter).

[0153] The silicone oil contributes to improving the surface slipperiness of the surface treatment layer.

[0154] Examples of the alcohols include methanol, ethanol, isopropanol, n-butanol, isobutanol, tert-butanol, sec-butanol, 3-pentanol, octyl alcohol, 3-methyl-3-methoxybutanol, and tert-amyl alcohol. Addition of these alcohols to the surface treatment agent improves the stability of the surface treatment agent.

[0155] Examples of the catalyst include acids (e.g., acetic acid, hydrochloric acid, nitric acid, sulfuric acid, phosphoric acid, sulfonic acid, p-toluenesulfonic acid, trifluoroacetic acid, etc.), bases (e.g., sodium hydroxide, potassium hydroxide, ammonia, triethylamine, diethylamine, etc.), transition metals (e.g., Ti, Ni, Sn, Zr, Al, B, Si, Ta, Nb, Mo, W, Cr, Hf, V, etc.), sulfur-containing compounds having an unshared electron pair in the molecular structure, or nitrogen-containing compounds (e.g., sulfoxide compounds, aliphatic amine compounds, aromatic amine compounds, phosphoric acid amide compounds, amide compounds, urea compounds), etc.

[0156] Examples of the aliphatic amine compounds include diethylamine, triethylamine, etc. Examples of the aromatic amine compounds include aniline, pyridine, etc.

[0157] In a preferred embodiment, the transition metal is contained as a transition metal compound represented by MR (wherein M is a transition metal atom and R is a hydrolyzable group). By using a transition metal compound in which a transition metal is bonded to a hydrolyzable group, the transition metal atom can be contained more efficiently in the surface treatment layer, and the friction durability and chemical resistance of the surface treatment layer can be further improved.

[0158] The hydrolyzable group means a group that can undergo a hydrolysis reaction, similar to the hydrolyzable group in the above-mentioned compound, that is, a group that can be separated from a transition metal atom by a hydrolysis reaction. Examples of the hydrolyzable group include -OR m , -OCOR m , -ON=CR m2, -NR m 2, -NHR m , —NCO, halogen (wherein R m is a substituted or unsubstituted C 1-4 (representing an alkyl group) and the like.

[0159] In a preferred embodiment, the hydrolyzable group is -OR m By using an alkoxy group as the hydrolyzable group, transition metal atoms can be more efficiently incorporated into the surface treatment layer, and the friction durability and chemical resistance of the surface treatment layer can be further improved.

[0160] In one embodiment, the hydrolyzable group may be the same as the hydrolyzable group contained in the compound described above. By using the same hydrolyzable group in the compound and the transition metal compound, even if the hydrolyzable groups are exchanged with each other, the effect can be reduced.

[0161] In another embodiment, the hydrolyzable group may be different from the hydrolyzable group contained in the compound. By making the hydrolyzable groups in the compound and the transition metal compound different, the hydrolysis reactivity can be controlled.

[0162] In one embodiment, the hydrolyzable group and the hydrolyzable group contained in the compound may be interchangeable in the surface treatment agent.

[0163] In a preferred embodiment, the transition metal compound is Ta(OR m )5(wherein, R m is a substituted or unsubstituted C 1-4 is an alkyl group.), preferably Ta(OCH2CH3)5 or Si(OR m ) 1-m1 R m’ m1 (In the formula, R m is a substituted or unsubstituted C 1-4 is an alkyl group, and R m’ is C1-4 is an alkyl group, and m1 is 0 or 1.) and may be preferably tetraethoxysilane, methyltrimethoxysilane, methyltriethoxysilane, tetraisopropoxysilane, dimethyldiethoxysilane, or dimethyldimethoxysilane.

[0164] The catalyst may be contained in an amount of, for example, 0.0002% by mass or more relative to the entire surface treatment agent. The catalyst is preferably contained in an amount of 0.02% by mass or more, more preferably 0.04% by mass or more, relative to the entire surface treatment agent. The catalyst may be contained in an amount of, for example, 10% by mass or less, particularly 1% by mass or less, relative to the entire surface treatment agent. By containing the catalyst at the above-mentioned concentration, the surface treatment agent of the present disclosure can contribute to the formation of a surface treatment layer with better durability.

[0165] The content of the catalyst is preferably 0 to 10% by mass, more preferably 0 to 5% by mass, and particularly preferably 0 to 1% by mass, based on the compound of the present disclosure.

[0166] The catalyst promotes the hydrolysis and dehydration condensation of the compound of the present disclosure, and promotes the formation of the layer formed by the surface treatment agent of the present disclosure.

[0167] In addition to the above, other components include, for example, tetraethoxysilane, methyltrimethoxysilane, 3-aminopropyltrimethoxysilane, 3-glycidoxypropyltrimethoxysilane, and methyltriacetoxysilane.

[0168] In addition to the components described above, the surface treatment agent of the present disclosure may contain trace amounts of impurities such as Pt, Rh, Ru, 1,3-divinyltetramethyldisiloxane, triphenylphosphine, NaCl, KCl, and silane condensates.

[0169] In one embodiment, the surface treatment agent of the present disclosure is for use in a dry coating method, preferably vacuum deposition.

[0170] In one embodiment, the surface treatment agent of the present disclosure is for use in a wet coating method, preferably dip coating.

[0171] The surface treatment agent of the present disclosure can be impregnated into a porous substance, such as a porous ceramic material or a metal fiber, such as a flocculated steel wool, to form pellets, which can be used for vacuum deposition, for example.

[0172] The articles of the present disclosure are described below.

[0173] The article of the present disclosure includes a substrate and a layer (surface treatment layer) formed on the surface of the substrate from the surface treatment agent of the present disclosure.

[0174] Substrates that can be used in the present disclosure may be made of any suitable material, such as glass, resin (which may be a natural or synthetic resin, for example, a common plastic material), metal, ceramics, semiconductors (silicon, germanium, etc.), fibers (woven fabrics, nonwoven fabrics, etc.), fur, leather, wood, ceramics, stone, etc., building materials, etc., sanitary products, etc.

[0175] For example, if the article to be manufactured is an optical component, the material constituting the surface of the substrate may be a material for optical components, such as glass or transparent plastic. Furthermore, if the article to be manufactured is an optical component, some layer (or film), such as a hard coat layer or an antireflection layer, may be formed on the surface (outermost layer) of the substrate. The antireflection layer may be either a single-layer antireflection layer or a multilayer antireflection layer. Examples of inorganic materials that can be used for the antireflection layer include SiO2, SiO, ZrO2, TiO2, TiO, Ti2O3, Ti2O5, Al2O3, Ta2O5, Ta3O5, Nb2O5, HfO2, Si3N4, CeO2, MgO, YO3, SnO2, MgF2, and WO3. These inorganic materials may be used alone or in combination (e.g., as a mixture) of two or more of them. When a multilayer antireflection layer is used, it is preferable to use SiO2 and / or SiO for the outermost layer. When the product to be manufactured is an optical glass component for a touch panel, a transparent electrode, such as a thin film using indium tin oxide (ITO) or indium zinc oxide, may be provided on a portion of the surface of the substrate (glass). Furthermore, the substrate may have an insulating layer, an adhesive layer, a protective layer, a decorative frame layer (I-CON), an atomizing film layer, a hard coating film layer, a polarizing film, a phase difference film, a liquid crystal display module, etc., depending on the specific specifications.

[0176] The shape of the substrate is not particularly limited and may be, for example, a plate, a film, or other form. The surface region of the substrate on which the surface treatment layer is to be formed may be at least a part of the substrate surface, and may be appropriately determined depending on the use and specific specifications of the product to be manufactured.

[0177] In one embodiment, at least the surface portion of such a substrate may be made of a material that originally contains hydroxyl groups. Examples of such materials include glass, metals (especially base metals), ceramics, semiconductors, and the like, on whose surfaces native oxide or thermal oxide films form. Alternatively, for materials such as resins, which do not have sufficient hydroxyl groups or do not originally contain hydroxyl groups, some pretreatment can be performed on the substrate to introduce or increase the number of hydroxyl groups on the surface. Examples of such pretreatments include plasma treatment (e.g., corona discharge) and ion beam irradiation. Plasma treatment can introduce or increase hydroxyl groups on the substrate surface and can also be used to clean the substrate surface (remove foreign matter, etc.). Another example of such pretreatment is a method in which an interfacial adsorbent having carbon-carbon unsaturated bond groups is first formed in the form of a monomolecular film on the substrate surface by the Langmuir-Blodgett method (LB method) or chemical adsorption, followed by cleavage of the unsaturated bonds in an atmosphere containing oxygen, nitrogen, or the like.

[0178] In another embodiment, the substrate may have at least a surface portion made of a material containing another reactive group, such as a silicone compound having one or more Si—H groups, or an alkoxysilane.

[0179] In a preferred embodiment, the substrate is glass, such as sapphire glass, soda-lime glass, alkali aluminosilicate glass, borosilicate glass, alkali-free glass, crystal glass, quartz glass, and crystallized glass, with chemically strengthened soda-lime glass, chemically strengthened alkali aluminosilicate glass, and chemically bonded borosilicate glass being particularly preferred.

[0180] In one embodiment, the article of the present disclosure may include an intermediate layer containing silicon oxide between the glass and the surface treatment layer. By providing such an intermediate layer, adhesion between the glass and the surface treatment layer is improved, and durability is improved.

[0181] In a preferred embodiment, the intermediate layer may contain an alkali metal in addition to silicon oxide.

[0182] Examples of the alkali metal include lithium, sodium, potassium, etc. The alkali metal is preferably sodium.

[0183] The thickness of the intermediate layer is not particularly limited, but is preferably 1 to 200 nm, and particularly preferably 1 to 20 nm. By making the thickness of the intermediate layer equal to or greater than the lower limit of the above range, the effect of the intermediate layer in improving adhesiveness becomes greater.

[0184] The alkali metal atom concentration in the intermediate layer can be measured by various surface analysis devices, such as TOF-SIMS, XPS, and XRF.

[0185] The proportion of alkali metal atoms in the total atoms of the entire intermediate layer can be obtained by XPS depth profile analysis using ion sputtering, which is performed by alternating between XPS measurement and surface etching by ion sputtering using an ion gun built into the XPS instrument.

[0186] The average alkali metal concentration in the intermediate layer in a region 1 nm or less deep from the surface in contact with the surface treatment layer is determined by obtaining a depth profile of the alkali metal atom concentration by TOF-SIMS (time-of-flight secondary ion mass spectrometry) depth profile analysis using ion sputtering, and then calculating the average alkali metal atom concentration in the profile. TOF-SIMS depth profile analysis using ion sputtering is performed by alternately repeating TOF-SIMS measurement and surface etching by ion sputtering using an ion gun built into the TOF-SIMS device.

[0187] The article of the present disclosure can be produced by forming a layer of the surface treatment agent of the present disclosure on the surface of the substrate, and then post-treating this layer as necessary, thereby forming a layer from the surface treatment agent of the present disclosure.

[0188] The layer formation of the surface treatment agent of the present disclosure can be carried out by applying the surface treatment agent to the surface of a substrate so as to coat the surface. The coating method is not particularly limited. For example, a wet coating method or a dry coating method can be used.

[0189] Examples of wet coating methods include dip coating, spin coating, flow coating, spray coating, roll coating, gravure coating, wipe coating, squeegee coating, die coating, ink jet, casting, Langmuir-Blodgett coating, and similar methods.

[0190] Examples of dry coating methods include vapor deposition (usually vacuum deposition), sputtering, CVD, and similar methods. Specific examples of vapor deposition methods (usually vacuum deposition) include resistance heating, electron beam, high frequency heating using microwaves, ion beam, and similar methods. Specific examples of CVD methods include plasma-CVD, optical CVD, thermal CVD, and similar methods.

[0191] Furthermore, coating by atmospheric pressure plasma method is also possible.

[0192] When using the wet coating method, the surface treatment agent of the present disclosure can be diluted with a solvent and then applied to the substrate surface. From the viewpoint of the stability of the composition of the present disclosure and the volatility of the solvent, the following solvents are preferably used: aliphatic hydrocarbons such as hexane, cyclohexane, heptane, octane, nonane, decane, undecane, dodecane, mineral spirits, etc.; aromatic hydrocarbons such as benzene, toluene, xylene, naphthalene, solvent naphtha, etc.; methyl acetate, ethyl acetate, propyl acetate, n-butyl acetate, isopropyl acetate, isobutyl acetate, cellosolve acetate, propylene glycol methyl ether acetate, carbohydrate acetate, etc. Esters such as ethanol, diethyl oxalate, ethyl pyruvate, ethyl 2-hydroxybutyrate, ethyl acetoacetate, amyl acetate, methyl lactate, ethyl lactate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 2-hydroxyisobutyrate, and ethyl 2-hydroxyisobutyrate; ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, 2-hexanone, cyclohexanone, methyl amino ketone, and 2-heptanone; ethyl cellosolve, methyl cellosol Glycol ethers such as propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monobutyl ether acetate, dipropylene glycol dimethyl ether, and ethylene glycol monoalkyl ether; alcohols such as methanol, ethanol, isopropanol, n-butanol, isobutanol, tert-butanol, sec-butanol, 3-pentanol, octyl alcohol, 3-methyl-3-methoxybutanol, and tert-amyl alcohol; glycols such as ethylene glycol and propylene glycol; cyclic ethers such as tetrahydrofuran, tetrahydropyran, and dioxane; amides such as N,N-dimethylformamide, N,N-dimethylacetamide, and N-methylpyrrolidone;Ether alcohols such as methyl cellosolve, cellosolve, isopropyl cellosolve, butyl cellosolve, and diethylene glycol monomethyl ether; diethylene glycol monoethyl ether acetate; polyfluoroaromatic hydrocarbons (e.g., 1,3-bis(trifluoromethyl)benzene); polyfluoroaliphatic hydrocarbons (e.g., CF; 13CH2CH3 (e.g., Asahiklin (registered trademark) AC-6000 manufactured by Asahi Glass Co., Ltd.), 1,1,2,2,3,3,4-heptafluorocyclopentane (e.g., Zeorora (registered trademark) H manufactured by Zeon Corporation); hydrofluoroethers (HFEs) (e.g., perfluoropropyl methyl ether (C3F7OCH3) (e.g., Novec (trademark) 7000 manufactured by Sumitomo 3M Limited), perfluorobutyl methyl ether (C4F9OCH3) (e.g., Novec (trademark) 7100 manufactured by Sumitomo 3M Limited), perfluorobutyl ethyl ether (C4F9OC2H5) (e.g., Novec (trademark) 7200 manufactured by Sumitomo 3M Limited), perfluorohexyl methyl ether ( Examples of suitable solvents include alkyl perfluoroalkyl ethers (the perfluoroalkyl group and alkyl group may be linear or branched) such as C2F5CF(OCH3)C3F7 (e.g., Novec™ 7300 manufactured by Sumitomo 3M Limited), or CF3CH2OCF2CHF2 (e.g., Asahiklin™ AE-3000 manufactured by Asahi Glass Co., Ltd.), ether alcohols such as cyclopentyl methyl ether, and siloxanes such as hexamethyldisiloxane, hexaethyldisiloxane, octamethyltrisiloxane, octamethylcyclotetrasiloxane, octamethylcyclopentasiloxane, decamethyltetrasiloxane, dodecamethylpentasiloxane, and tetradecamethylhexasiloxane. These solvents can be used alone or in combination. Among these, aliphatic hydrocarbons, aromatic hydrocarbons, esters, glycol ethers, alcohols, ether alcohols, and siloxanes are preferred.For example, hexane, cyclohexane, heptane, octane, nonane, decane, undecane, dodecane, mineral spirits, benzene, toluene, xylene, naphthalene, methyl acetate, ethyl acetate, propyl acetate, n-butyl acetate, isopropyl acetate, isobutyl acetate, cellosolve acetate, propylene glycol methyl ether acetate, carbitol acetate, diethyl oxalate, ethyl pyruvate, ethyl 2-hydroxybutyrate, ethyl acetoacetate, amyl acetate, methyl lactate, ethyl lactate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 2-hydroxyisobutyrate, 2-hydroxyisobutyrate, methyl ... Particularly preferred are ethyl hydroxyisobutyrate, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, methanol, ethanol, isopropanol, n-butanol, isobutanol, tert-butanol, sec-butanol, diethylene glycol monomethyl ether, hexamethyldisiloxane, hexaethyldisiloxane, octamethyltrisiloxane, decamethyltetrasiloxane, dodecamethylpentasiloxane, tetradecamethylhexasiloxane, octamethylcyclotetrasiloxane, and octamethylcyclopentasiloxane.

[0193] When the dry coating method is used, the surface treatment agent of the present disclosure may be subjected to the dry coating method as it is, or may be subjected to the dry coating method after being diluted with the above-mentioned solvent.

[0194] The layer formation of the surface treatment agent is preferably carried out so that the surface treatment agent of the present disclosure is present in the layer together with a catalyst for hydrolysis and dehydration condensation. Conveniently, in the case of a wet coating method, the surface treatment agent of the present disclosure may be diluted with a solvent, and then a catalyst may be added to the diluted solution of the surface treatment agent of the present disclosure immediately before application to the substrate surface. In the case of a dry coating method, the surface treatment agent of the present disclosure to which the catalyst has been added may be directly subjected to vapor deposition (usually vacuum deposition), or a pellet-shaped material impregnated with the surface treatment agent of the present disclosure to which the catalyst has been added may be subjected to vapor deposition (usually vacuum deposition) on a porous metal such as iron or copper.

[0195] The catalyst may be any suitable acid or base, transition metal (e.g., Ti, Ni, Sn, Zr, Al, B, etc.), sulfur-containing compound having an unshared electron pair in its molecular structure, or nitrogen-containing compound (e.g., sulfoxide compound, aliphatic amine compound, aromatic amine compound, phosphoric acid amide compound, amide compound, urea compound), etc. Examples of acid catalysts that can be used include acetic acid, formic acid, trifluoroacetic acid, hydrochloric acid, nitric acid, sulfuric acid, phosphoric acid, sulfonic acid, methanesulfonic acid, p-toluenesulfonic acid, etc. Examples of base catalysts that can be used include ammonia, sodium hydroxide, potassium hydroxide, and organic amines such as triethylamine and diethylamine. Examples of transition metals, aliphatic amine compounds, and aromatic amine compounds are the same as those described above.

[0196] The surface treatment layer included in the article of the present disclosure has both high abrasion resistance and fingerprint wiping properties. In addition to high abrasion resistance, the surface treatment layer may have water repellency, oil repellency, antifouling properties (e.g., preventing adhesion of stains such as fingerprints), waterproof properties (preventing water penetration into electronic components, etc.), surface slipperiness (or lubricity, e.g., ease of wiping off stains such as fingerprints and excellent tactile feel), chemical resistance, etc., depending on the composition of the surface treatment agent used, and can be suitably used as a functional thin film.

[0197] Therefore, the present disclosure also relates to an optical material having the above-described surface treatment layer as the outermost layer.

[0198] Preferred examples of the optical material include optical materials related to displays and the like, such as those exemplified below, as well as a wide variety of other optical materials: for example, displays such as cathode ray tubes (CRTs; for example, personal computer monitors), liquid crystal displays, plasma displays, organic EL displays, inorganic thin-film EL dot matrix displays, rear projection displays, vacuum fluorescent displays (VFDs), and field emission displays (FEDs), or protective plates for such displays, or displays whose surfaces have been treated with an anti-reflection film.

[0199] The article of the present disclosure may be, but is not particularly limited to, an optical member. Examples of optical members include lenses for eyeglasses and the like; front protective plates, anti-reflection plates, polarizing plates, and anti-glare plates for displays such as PDPs and LCDs; touch panel sheets for devices such as mobile phones and personal digital assistants; disc surfaces of optical discs such as Blu-ray (registered trademark) discs, DVD discs, CD-Rs, and MOs; optical fibers; and the display surfaces of watches and clocks.

[0200] The article of the present disclosure may also be a medical device or medical material. The article having a layer obtained by the present disclosure may also be an automobile interior or exterior component. Examples of exterior components include windows, light covers, and exterior camera covers. Examples of interior components include instrument panel covers, navigation system touch panels, and decorative interior components.

[0201] The thickness of the layer is not particularly limited. In the case of optical members, the thickness of the layer is preferably in the range of 1 to 50 nm, 1 to 30 nm, and preferably 1 to 15 nm, from the viewpoints of optical performance, abrasion resistance, and antifouling properties.

[0202] The intermediate layer containing silicon oxide can be formed by applying a silicon oxide precursor to the surface of the substrate. When the intermediate layer contains an alkali metal, the intermediate layer can be formed by applying a composition containing a silicon oxide precursor and an alkali metal source to the surface of the substrate.

[0203] Examples of the silicon oxide precursor include silicic acid, partial condensates of silicic acid, alkali metal silicates, silane compounds having a hydrolyzable group bonded to a silicon atom, and partial hydrolysis condensates of the silane compounds. Silicic acid and its partial condensates can be converted into silicon oxide by dehydration condensation. Alkali metal silicates can be converted into silicic acid or its partial condensates by the addition of an acid or a cation exchange resin, and the resulting silicic acid or its partial condensates can then be dehydration condensed into silicon oxide. Examples of the hydrolyzable group in a silane compound having a hydrolyzable group bonded to a silicon atom include an alkoxy group and a chlorine atom. The hydrolyzable group in the silane compound can be hydrolyzed to a hydroxyl group, and the resulting silanol compound can be dehydration condensed to form silicon oxide. Examples of silane compounds having a hydrolyzable group bonded to a silicon atom include alkoxysilanes such as tetraalkoxysilanes and alkyltrialkoxysilanes, and tetrachlorosilane.

[0204] Examples of the alkali metal source include alkali metal hydroxides, water-soluble alkali metal salts, etc. Examples of the water-soluble alkali metal salts include alkali metal carbonates, alkali metal hydrogencarbonates, alkali metal hydrochlorides, alkali metal nitrates, etc. As the alkali metal source, alkali metal hydroxides and alkali metal carbonates are preferred.

[0205] Alkali metal silicates can be used as silicon oxide precursors and alkali metal sources. Alkali metal silicates can be converted to silicon oxide via silicic acid, but a small amount of alkali metal may remain in the resulting silicon oxide. Therefore, by adjusting the amount of the remaining alkali metal, silicon oxide containing a desired amount of alkali metal atoms can be obtained.

[0206] The compounds, compositions, and articles of the present disclosure have been described in detail above. However, the compounds, compositions, and articles of the present disclosure are not limited to those exemplified above. [Example]

[0207] The present disclosure will be described below with reference to examples, but the present disclosure is not limited to the following examples.

[0208] In the following examples, the number of repeating units n of the siloxane is: 1 Calculated by H-NMR.

[0209] (Synthesis Example 1) CH3Si(CH3)2O(Si(CH3)2O) n Si(CH3)2(CH2) 10 5.01 g of COOH, 15.0 g of tetrahydrofuran, 0.99 g of 1-(3-dimethylaminopropyl)-3-ethylcarbodiimide hydrochloride, 0.047 g of 4-dimethylaminopyridine, and 0.38 mL of allylamine were added and stirred overnight at room temperature. After purification, polydimethylsiloxane group-containing compound (1) CH3Si(CH3)2O(Si(CH3)2O) n Si(CH3)2(CH2) 10 4.80 g of CONHCH2CH=CH2 (n≒16) was obtained.

[0210] 1 H-NMR(CDCl3,400MHz)δ[ppm]:-0.124-0.279(m),0.486-0.523(t),1.243-1.269 (m),1.617(bs),2.161-2.196(t),3.859(bs),5.083-5.175(m),5.781-5.848(m)

[0211] (Synthesis Example 2) Polydimethylsiloxane group-containing compound (1) obtained in Synthesis Example 1: CH3Si(CH3)2O(Si(CH3)2O) n Si(CH3)2(CH2) 104.34 g of CONHCH2CH=CH2, 13.09 g of toluene, 0.035 g of triacetoxymethylsilane, and 0.15 ml of a xylene solution containing 2% Pt complex of 1,3-divinyl-1,1,3,3-tetramethyldisiloxane were added, followed by 0.61 mL of trichlorosilane, which was heated to 60°C and stirred for 4 hours. After distilling off the volatiles under reduced pressure, a mixed solution of 0.280 g of methanol and 6.340 g of trimethyl orthoformate was added, heated to 50°C, and stirred for 3 hours. Purification was then performed to obtain compound (2) CH3Si(CH3)2O (Si(CH3)2O) having a terminal trimethoxysilyl group. n Si(CH3)2(CH2) 10 4.24 g of CONHCH2CH2CH2Si(OCH3)3 (n ≈ 16) was obtained.

[0212] 1 H-NMR(CDCl3,400MHz)δ[ppm]:-0.010-0.157(m),0.495-0.666(m),1.251-1. 274(m),1.578-1.654(m),2.123-2.312(m),3.218-3.267(m),3.420-3.605(m)

[0213] (Synthesis Example 3) CH3CH2CH2CH2(Si(CH3)2O) n Si(CH3)2(CH2) 10 5.00 g of COOH, 15.1 g of tetrahydrofuran, 0.97 g of 1-(3-dimethylaminopropyl)-3-ethylcarbodiimide hydrochloride, 0.048 g of 4-dimethylaminopyridine, and 0.38 mL of allylamine were added and stirred overnight at room temperature. After purification, polydimethylsiloxane group-containing compound (3) CH3CH2CH2CH2(Si(CH3)2O) n Si(CH3)2(CH2) 10 4.07 g of CONHCH2CH=CH2 (n≒16) was obtained.

[0214] 1H-NMR(CDCl3,400MHz)δ[ppm]:-0.114-0.291(m),0.507-0.547(m),0.855-0.890(t),1.180-1.320(m),1.577 -1.629(m),1.948-2.049(m),2.197-2.327(m),3.893(s),5.102-5.191(m),5.388-5.394(m),5.754-5.823(m)

[0215] (Synthesis Example 4) Polydimethylsiloxane group-containing compound (3) obtained in Synthesis Example 3: CH3CH2CH2CH2(Si(CH3)2O) n Si(CH3)2(CH2) 10 3.7262 g of CONHCH2CH=CH2, 11.4 g of toluene, 0.02 g of triacetoxymethylsilane, and 0.13 ml of a xylene solution containing 2% Pt complex of 1,3-divinyl-1,1,3,3-tetramethyldisiloxane were added, followed by 1.3 mL of trichlorosilane, which was heated to 60°C and stirred for 4 hours. After distilling off the volatiles under reduced pressure, a mixed solution of 0.244 g of methanol and 5.347 g of trimethyl orthoformate was added, heated to 50°C, and stirred for 3 hours. Purification was then performed to obtain compound (4) CH3(CH2)3(Si(CH3)2O) with a terminal trimethoxysilyl group. n 3.69 g of Si(CH3)2(CH2)3OCH2CONHCH2CH2CH2Si(OCH3)3 (n ≈ 16) was obtained.

[0216] 1 H-NMR(CDCl3,400MHz)δ[ppm]:-0.012-0.303(m),0.502-0.543(m),0.625-0.666(m),0.854- 0.888(m),1.244-1.338(m),1.576-1.652(m),3.218-3.267(m),3.470-3.611(m),5.690(bs)

[0217] (Synthesis Example 5) CH3CH2CH2CH2Si(CH3)2O(Si(CH3)2O) n5.0 g of Si(CH3)2CH2CH2CH2OCH2COOH, 92 mg of 2-propen-1-amine, 31 mg of 1-(3-dimethylaminopropyl)-3-ethylcarbodiimide hydrochloride, 13 mg of 4-dimethylaminopyridine, and 20 mL of dichloromethane were mixed and stirred at room temperature for 16 hours. The reaction mixture was washed with hydrochloric acid and water, and then concentrated under reduced pressure to obtain compound (5), CH3CH2CH2CH2Si(CH3)2O(Si(CH3)2O). n 5.28 g of Si(CH3)2CH2CH2CH2OCH2CONHCH2CH=CH2 (n≒59) was obtained.

[0218] 1 H-NMR (400MHz, chloroform-D) δ [ppm] 6.59-6.71 (br), 5.80-5.91 (m), 5.12-5.24 (m), 3.91-3.97 (m), 3.45-3.50 (t), 1.58-1.69 (m), 1.24-1.36 (m), 0.86-0.91 (t), 0.51-0.58 (m), -0.10-0.30 (m)

[0219] (Synthesis Example 6) 2.0 g of compound (5), 10 mL of toluene, 47 μL of a xylene solution containing 2% Pt complex of 1,3-divinyl-1,1,3,3-tetramethyldisiloxane, and 113 μL of aniline were added, followed by 210 μL of trimethoxysilane and stirring at 40°C for 3 hours. After purification, compound (6) CH3CH2CH2CH2Si(CH3)2O(Si(CH3)2O) n 1.74 g of Si(CH3)2CH2CH2CH2OCH2CONHCH2CH2CH2Si(OCH3)3 (n ≈ 59) was obtained.

[0220] 1H-NMR (400MHz, chloroform-D) δ [ppm] 6.62-6.70 (br), 3.92 (s), 3.53-3.62 (m), 3.43-3.49 (t), 3.27-3.33 (q), 1.58-1.72 (m), 1.24-1.35 (m), 0.85-0.92 (t), 0.63-0.69 (t), 0.50-0.57 (m), -0.13-0.32 (m)

[0221] (Synthesis Example 7) [(CH3)3SiO]2CH3SiO(Si(CH3)2O) n 1.0 g of Si(CH3)2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CONHCH2CH=CH2 (n≒8.7), 10 mL of toluene, 72 μL of a xylene solution containing 2% Pt complex of 1,3-divinyl-1,1,3,3-tetramethyldisiloxane, and 17 μL of aniline were added, followed by 323 μL of trimethoxysilane and stirring at room temperature for 16 hours. After purification, compound (7) [(CH3)3SiO]2CH3SiO(Si(CH3)2O) n 0.97 g of Si(CH3)2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CONHCH2CH2CH2Si(OCH3)3 (n≈9) was obtained.

[0222] 1 H-NMR (400MHz, chloroform-D) δ [ppm] 7.00(s), 6.71-6.78(br), 5.65(s), 5.33-5.47(m), 4.62(s), 4.21-4.50(br), 3.46-3.67(m), 3.16-3.29(m), 2.10-2.39(m), 1.91-2.06(m), 1.52-1.68(m), 1.14-1.36(br), 0.85-0.99(m), 0.60-0.70(t), 0.48-0.59(m), -0.13-0.25(m)

[0223] (Synthesis Example 8) [(CH3)3SiO]3SiO(Si(CH3)2O) n 1.0 g of Si(CH3)2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CONHCH2CH=CH2 (n≒6.7), 10 mL of toluene, 69 μL of a xylene solution containing 2% Pt complex of 1,3-divinyl-1,1,3,3-tetramethyldisiloxane, and 17 μL of aniline were added, followed by 309 μL of trimethoxysilane and stirring at room temperature for 16 hours. After purification, compound (8) [(CH3)3SiO]3SiO(Si(CH3)2O) n 0.98 g of Si(CH3)2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CONHCH2CH2CH2Si(OCH3)3 (n≈8) was obtained.

[0224] 1 H-NMR (400MHz, chloroform-D) δ [ppm] 7.00(s), 6.71-6.78(br), 5.65(s), 5.33-5.47(m), 4.62(s), 4.21-4.50(br), 3.46-3.67(m), 3.16-3.29(m), 2.10-2.39(m), 1.91-2.06(m), 1.52-1.68(m), 1.14-1.38(br), 0.85-0.99(m), 0.60-0.70(t), 0.48-0.59(m), -0.13-0.25(m)

[0225] (Comparative Example) The following compound (X) was used. Compound (X): MCR-XT11 (triethoxysilylethyl-terminated polydimethylsiloxane, Mw=600-900), manufactured by Gelest

[0226] <Formation of surface treatment layer> As shown in Table 1 below, a surface treatment agent was prepared by combining a solvent and a compound. The compound concentration was 20 wt%. In Examples 1 and 3, CH3(CH2)9CONHCH2CH2CH2Si(OCH3)3 (0.5 wt%) and CH3CH=CH(CH2)7CONHCH2CH2CH2Si(OCH3)3 (0.5 wt%) were added. In Examples 2 and 4, CH3(CH2)9CONHCH2CH2CH2Si(OCH3)3 (16.0 wt%), CH3CH=CH(CH2)7CONHCH2CH2CH2Si(OCH3)3 (6.0 wt%), and (H3CO)3Si(CH2) 10 CONHCH2CH2CH2Si(OCH3)3 (1.0 wt%) was added.

[0227] <Sodium-containing intermediate layer forming material> 2.2 g of sodium hydroxide (manufactured by Fujifilm Wako Pure Chemical Corporation) was dissolved in 24 g of distilled water to obtain an 8.4 mass% aqueous sodium hydroxide solution. 24 g of this 8.4 mass% aqueous sodium hydroxide solution and 20 g of MS gel (M.S.GELD-100-60A (manufactured by AGC Si-Tech Co., Ltd.)) were mixed to absorb the aqueous sodium hydroxide solution into the MS gel. The MS gel that had absorbed the aqueous sodium hydroxide solution was dried at 25°C for 8 hours, then molded with a tablet molding machine (at 4 MPa for 1 minute), and fired at 1,000°C for 1 hour to obtain Formed Body 1 (pellet).

[0228] (Sodium-containing intermediate layer) The surface treatment agents 1 to 13 prepared above were vacuum-deposited on chemically strengthened glass (manufactured by Corning, Gorilla Glass, thickness 0.7 mm). Specifically, a molybdenum boat in the vacuum deposition apparatus was filled with 0.1 g of the surface treatment agent, and the inside of the vacuum deposition apparatus was evacuated to a pressure of 3.0×10 -3 Pa or less. Then, using Formed Body 1, it was deposited by an electron beam evaporation method to form a silicon dioxide film containing Na with a thickness of 7 nm, and subsequently, the boat was heated by a resistance heating method to form a surface treatment layer. Then, a heat treatment was performed in an oven at 150°C for 2 hours to obtain a surface treatment layer.

[0229] (SiO2 intermediate layer) The surface treatment agents 1, 4, and 13 prepared above were vacuum-deposited onto chemically strengthened glass (Corning Gorilla Glass, 0.7 mm thick). Specifically, 0.1 g of the surface treatment agent was loaded into a molybdenum boat in a vacuum deposition apparatus, and the vacuum deposition apparatus was evacuated to a pressure of 3.0 × 10 Pa or less. A silicon dioxide film with a thickness of 7 nm was then formed, and the boat was subsequently heated using a resistance heating method to form a surface treatment layer. The surface treatment layer was then obtained by heat treatment in an oven at 150 °C for 2 hours.

[0230] [Wear resistance evaluation] (Abrasion resistance test method) After the surface treatment layer was formed, the excess was wiped off, and then the friction element described below was brought into contact with the formed surface treatment layer, a load of 5 N was applied thereon, and the friction element was moved back and forth at a speed of 40 mm / sec while the load was applied. The static contact angle (°) of water was measured after 100 friction cycles. The contact angle was measured in an environment of 25°C using a fully automatic contact angle meter, DropMaster 700 (manufactured by Kyowa Interface Science Co., Ltd.). Specifically, the substrate having the surface treatment layer to be measured was placed horizontally, 2 μL of water was dropped onto the surface from a microsyringe, and a still image was taken with a video microscope 1 second after the drop to measure the static contact angle. The static contact angle was measured at five different points on the surface treatment layer of the substrate, and the average value was calculated.

[0231] Metrics Over 80°: ◎ (Excellent) 60° or more and less than 80°: Good (good) 50° or more and less than 60°: △ (acceptable) Less than 50°: × (bad) ·Friction element The surface of the silicone rubber processed product shown below was covered with cotton soaked in artificial sweat of the composition shown below and used as a friction element. Silicone rubber processed products: The silicone rubber stopper SR-51 manufactured by Tigers Polymer is processed into a cylindrical shape with a diameter of 1 cm and a thickness of 1 cm. Artificial sweat composition: Anhydrous disodium hydrogen phosphate: 2g Sodium chloride: 20g 85% lactic acid: 2g Histidine hydrochloride: 5g Distilled water: 1 kg

[0232] [Alkali resistance evaluation] After the formation of the surface treatment layer, the excess sodium hydroxide on the surface was wiped off, and then the formed surface treatment layer was brought into contact with a 0.1 mol / L aqueous solution of sodium hydroxide. After leaving it for 1 hour, the aqueous solution of sodium hydroxide was washed away with water, and the surface was dried, after which the static contact angle (°) was measured. Metrics Initial contact angle maintenance rate 90% or more: ◎ (Excellent) Initial contact angle retention rate: 80% or more but less than 90%: Good (good) Initial contact angle retention rate: 70% or more but less than 80%: △ (Acceptable) Initial contact angle retention rate less than 70%: × (poor)

[0233] Table 1 below shows the results of the abrasion resistance evaluation and alkali resistance evaluation.

[0234] [Table 1] [Industrial Applicability]

[0235] The surface treatment agent of the present disclosure can be suitably used in a wide variety of applications.

Claims

1. The following formula (1): 【Chemistry 1】 [In the formula: R １ is R 3 —(SiR 4 2 O) n —SiR 4 2 —, R 3 is a C 1-4 alkyl group or a group A; The A group has the following formula: 【change】 [In the formula: Each R 51 is independently a group represented by R 53 -(SiR 53 2 -R 61 ) ma -; Each R 61 is independently an oxygen atom; R 53 each independently represents an alkyl group having 1 to 4 carbon atoms or R 51 '; R 51′ has the same meaning as R 51 ; Each m is independently an integer from 1 to 5, However, the number of R 51 ' in R 51 is 3 or less; Each R 52 is independently a methyl group; n a is an integer from 1 to 3, z is 0 or 1. is a group represented by Each R 4 is independently a methyl group; n is 5 to 100; X １ is represented by the following formula: -(CH 2 ) p -CONR 13 -(CH 2 ) q - [In the formula: R 13 is a hydrogen atom or a C 1-6 alkyl group; p is an integer from 3 to 30; and q is an integer from 1 to 10. or a group represented by the following formula: -(CH 2 ) p1 -O-(CH 2 ) p2 -CONR 13 -(CH 2 ) q - [In the formula: R 13 is a hydrogen atom or a C 1-6 alkyl group; p1 is an integer from 1 to 10, p2 is an integer from 1 to 10, and q is an integer from 1 to 10. is a group represented by R １１ are each independently a hydroxyl group or a hydrolyzable group, R １２ each independently represents a hydrogen atom or a monovalent organic group, n1 is an integer from 1 to 3. A compound represented by the formula:

2. R ３ The compound according to claim 1 , wherein is a methyl group.

3. R １ is represented by the following formula: R ３ -(SiR ４ ２ O) ｎ -SiR ４ ２ - [In the formula: R ３ is C １－４ is an alkyl group, R ４ is a methyl group, n is an integer from 5 to 80. is a group represented by X １ is represented by the following formula: -(CH ２ ) ｐ -CONR １３ -(CH ２ ) ｑ - -(CH ２ ) ｐ１ -O-(CH ２ ) ｐ２ -CONR １３ -(CH ２ ) ｑ - [In the formula: R １３ is a hydrogen atom, p is an integer from 1 to 30; p1 is an integer from 1 to 10, p2 is an integer from 1 to 10, and q is an integer from 1 to 10. is a group represented by R １１ is OCH ３ and n1 is 3; The compound of claim 1.

4. The compound according to claim 3, wherein n is an integer from 5 to 30.

5. The compound according to claim 3, wherein n is an integer from 20 to 80.

6. R １ is R ３ -(SiR ４ ２ O) ｎ -SiR ４ ２ - and R ３ is C １－４ an alkyl group or an A group, The A group is [(CH ３ ) ３ SiO ２ CH ３ Si(CH ３ ) ２ O- or [(CH ３ ) ３ SiO ３ Si(CH ３ ) ２ O-, R ４ is a methyl group, n is an integer from 5 to 100, X １ is -(CH ２ ) ｐ -CONH-(CH ２ ) ｑ - and p is an integer from 3 to 30; The compound according to claim 1, wherein q is an integer from 2 to 3.

7. 2. The compound of claim 1 selected from the following compounds: CH ３ H ３ ) ２ O(Si(CH ３ ) ２ O) ｎ H ３ ) ２ (CH ２ ) １０ P.S. ２ CH ２ CH ２ H. ３ ) ３ CH ３ (CH ２ ) ３ (S) ３ ) ２ O) ｎ H ３ ) ２ (CH ２ ) ３ SO ２ P.S. ２ CH ２ CH ２ H. ３ ) ３ CH ３ CH ２ CH ２ CH ２ H ３ ) ２ O(Si(CH ３ ) ２ O) ｎ H ３ ) ２ CH ２ CH ２ CH ２ SO ２ P.S. ２ CH ２ CH ２ H. ３ ) ３ [(CH ３ ) ３ SiO] ２ CH ３ H.E. ３ ) ２ O) ｎ H ３ ) ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ P.S. ２ CH ２ CH ２ H. ３ ) ３ [(CH ３ ) ３ SiO] ３ H.E. ３ ) ２ O) ｎ H ３ ) ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ P.S. ２ CH ２ CH ２ H. ３ ) ３ n is an integer from 2 to 80.

8. 2. The compound of claim 1 selected from the following compounds: CH ３ Si(CH ３ ) ２ O(Si(CH ３ ) ２ O) ｎ Si(CH ３ ) ２ (CH ２ ) １０ CONHC ２ CH ２ CH ２ Si(OCH ３ ) ３ (n is an integer from 10 to 30) CH ３ (CH ２ ) ３ (Si(CH ３ ) ２ O) ｎ Si(CH ３ ) ２ (CH ２ ) ３ OCH ２ CONHC ２ CH ２ CH ２ Si(OCH ３ ) ３ (n is an integer from 10 to 30) CH ３ CH ２ CH ２ CH ２ Si(CH ３ ) ２ O(Si(CH ３ ) ２ O) ｎ Si(CH ３ ) ２ CH ２ CH ２ CH ２ OCH ２ CONHC ２ CH ２ CH ２ Si(OCH ３ ) ３ (n is an integer from 40 to 70) [(CH ３ ) ３ SiO] ２ CH ３ SiO(Si(CH ３ ) ２ O) ｎ Si(CH ３ ) ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CONHCH ２ CH ２ CH ２ Si(OCH ３ ) ３ (n is an integer from 5 to 20)​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​ [(CH ３ ) ３ SiO] ３ SiO(Si(CH ３ ) ２ O) ｎ Si(CH ３ ) ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CONHCH ２ CH ２ CH ２ Si(OCH ３ ) ３ (n is an integer from 5 to 20)​​​

9. A compound according to claim 1 and a compound of formula (3): R ２１ -R ２２ -CONR ２４ -R ２３ -SiR １１ ｎ１ R １２ ３－ｎ１ (3) [In the formula: R ２１ is CH ３ CH ２ CH ２ -, CH ３ CH=CH-, or R １２ ３－ｎ１ R １１ ｎ１ Si-, R ２２ is C ０－３０ is an alkylene group, R ２３ is C １－１０ is an alkylene group, R ２４ is a hydrogen atom, C １－６ an alkyl group or a phenyl group, R １１ are each independently a hydroxyl group or a hydrolyzable group, R １２ each independently represents a hydrogen atom or a monovalent organic group, n1 is an integer from 1 to 3. A composition comprising a compound represented by the formula:

10. The composition according to claim 9, comprising the compound represented by formula (3) in an amount of 0.1% by mass to 30% by mass based on the total amount of the compound represented by formula (1) and the compound represented by formula (3).

11. The composition of claim 9 which is a surface treatment agent.

12. A surface treatment agent comprising the compound according to any one of claims 1 to 8.

13. The surface treatment agent according to claim 12, further comprising a condensate of the compound according to claim 1.

14. Furthermore, R ８１ OR ８２ , R ８３ ｎ８ C ６ H ６－ｎ８ , R ８４ R ８５ R ８６ Si-(O-SiR ８７ R ８８ ) ｍ８ -R ８９ , and (OSiR ８７ R ８８ ) ｍ９ [During the ceremony R ８１ ~R ８９ are each independently a monovalent organic group having 1 to 10 carbon atoms, m8 is an integer from 1 to 6, m9 is an integer from 4 to 8, n8 is an integer from 0 to 6. The surface treatment agent according to claim 12, further comprising a solvent selected from compounds represented by the following formula:

15. The solvent is R ８４ R ８５ R ８６ Si-(O-SiR ８７ R ８８ ) ｍ８ -R ８９ The surface treatment agent according to claim 14,

16. 15. The surface treatment agent according to claim 14, wherein the solvent is hexamethyldisiloxane, hexaethyldisiloxane, octamethyltrisiloxane, octamethylcyclotetrasiloxane, or decamethylcyclopentasiloxane.

17. The surface treatment agent according to claim 12, which is for vacuum deposition.

18. The surface treatment agent according to claim 12, which is for wet coating.

19. A pellet comprising the surface treatment agent according to claim 17.

20. An article comprising a substrate and a layer formed on the substrate from a compound according to any one of claims 1 to 8.

21. 21. The article of claim 20, comprising an intermediate layer between the substrate and the layer comprising silicon oxide.

22. 22. The article of claim 21, wherein the intermediate layer comprises alkali metal atoms.

23. 23. The article of claim 22, wherein at least a portion of the alkali metal atoms are sodium atoms.

24. 21. The article of claim 20, which is an optical component.

25. 21. The article of claim 20 which is a display.

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