Method and system for determining and controlling the separation distance between the processing head of a laser processing machine and the surface of an object being processed using low-coherence optical interferometry - Patents.com

Abstract

A method and system for determining and controlling a separation distance between a machining head of a machine tool and a surface of a workpiece is described, comprising the steps of generating a measurement low-coherence optical radiation beam and directing the measurement beam toward the workpiece and directing the measurement beam reflected or scattered from the surface of the workpiece toward an optical interferometric sensor array in a first incident direction, generating a reference low-coherence optical radiation beam and directing the reference beam toward the optical interferometric sensor array in a second incident direction at a preset angle of incidence relative to the first incident direction of the measurement beam, superimposing the measurement beam and the reference beam on a common incident region of the sensor array, detecting a position of an interference fringe pattern between the measurement beam and the reference beam on the incident region, and determining a difference in optical path length between the measurement optical path and the reference optical path based on the position of the interference fringe pattern along an illumination axis of the incident region, which indicates a difference between (a) a current separation distance between the machining head and the surface of the workpiece and (b) a predetermined nominal separation distance.

Description

[Technical field]

[0001] The present invention relates to laser processing of materials, preferably metallic materials, in particular to improved control of laser processing of materials, e.g. laser cutting, drilling or welding of said materials or additive manufacture of predetermined structures in said materials.

[0002] More specifically, the present invention relates to a method and a system for determining the separation distance between a processing head in a machine for laser processing of materials and the surface of the material, as defined in the preambles of claims 1 and 23.

[0003] According to another aspect, the invention relates to a machine for laser processing of material according to the preamble of claim 24, which comprises a system for determining a separation distance between the processing head and the surface of the material, which system is provided for carrying out the above-mentioned method. [Background technology]

[0004] In this specification and in the claims below, the terms "material" and "metallic material" in the preferred embodiment are used to identify any product, e.g. a plate or an elongated profile, with a closed cross section (e.g. a hollow circular, rectangular or square shape) or with an open cross section (e.g. a flat cross section, or an L-, C- or U-shaped cross section, etc.). The term "material" in additive manufacturing identifies a raw material (typically a powder) that is subjected to local sintering or melting using a laser beam.

[0005] In industrial processes for processing materials, plates and metal profiles, lasers are used as heating tools for a wide variety of applications, which depend on parameters related to the interaction between the laser beam and the material to be processed, in particular the energy density per volume of incidence of the laser beam on the material, and the interaction time.

[0006] For example, a metal piece is subjected to low-density energy (surface 1 mm 2 The hardening process occurs by directing a high energy density (on the order of tens of watts per mm) at the same metal piece for a long time (in the range of a few seconds), while the hardening process occurs by directing a high energy density (on the order of 1 mm of the surface) at the same metal piece for a time on the order of femtoseconds or picoseconds. 2 Photoablation processes occur by directing a laser beam (of the order of tens of megawatts per second) at a wavelength of 1000 nm. In the intermediate range of increasing energy densities and decreasing processing times, controlling these parameters makes it possible to carry out welding, cutting, drilling, engraving and marking processes.

[0007] In some processes, including drilling and cutting processes, it is necessary to generate a flow of assist gas in the processing area where the laser beam interacts with the material, which has a mechanical function to drive the melt, or a chemical function to assist combustion, or a technological function of shielding the processing area from the environment surrounding it.

[0008] In the layering process, the material may be in the form of a filament, or in the form of a powder emitted from a nozzle, taking into account, for example, a flow of assist gas, or alternatively may be present in the form of a powder bed, so that the material is melted by the laser radiation and a three-dimensional mold is obtained after resolidification of said material.

[0009] In the field of laser processing of materials, laser cutting, drilling and welding are processes that can be performed on the same machine, which is achieved by using a focused high-power laser beam with a pre-set transverse power distribution, typically 1-10000 kW / mm 2 A laser beam having a power density of 1000 nm can be generated on at least one processing surface of the material, and the direction and position of incidence of the beam along the material can be controlled. The difference between the different types of processing that can be performed on a material is essentially due to the power of the laser beam used and the interaction time between the laser beam and the material to be processed.

[0010] A prior art laser processing machine is shown in FIGS.

[0011] FIG. 1 shows a schematic representation of a machine for industrial processes using a CO2 laser with an optical path of the laser beam in air, comprising a light source, for example a CO2 laser generator, configured to emit a single-mode or multimode laser beam B, and a number of reflecting mirrors 12a, 12b, 12c configured to direct the laser beam emitted by the light source along an optical path for transmission towards a processing head, generally indicated with the reference 14, which is arranged close to a material WP. The processing head 14 comprises an optical system 16 for focusing the laser beam, generally consisting of a focusing lens, which is configured to focus the laser beam along a propagation axis incident on the metallic material. A nozzle 18 is arranged downstream of the focusing lens, through which passes the laser beam directed towards an area of ​​the processing surface of the material. The nozzle is configured to direct a beam of assist gas injected by a corresponding plant (not shown) towards the processing area on the material. The assist gas is used to control the execution of the processing process (drilling or cutting) and the obtainable process quality. For example, the assist gas may contain oxygen, which promotes an exothermic reaction with the metal, such as the oxidation of iron, which generates various types of iron oxides by exothermic reaction, thereby releasing energy into the material and contributing to maintaining the dynamic equilibrium of the process together with the energy released from the laser beam, thereby making it possible to increase the cutting speed, or it may generate an inert gas, such as nitrogen, which does not contribute to the melting of the material, but performs the function of propelling the melting material itself, but protects the (metal) material from unwanted oxidation at the edges of the machining profile, protects the machining head from possible splashes of the melt, and may be used to cool the sides of the grooves generated in the material, thereby surrounding the extension of the heat affected zone.

[0012] 2 shows a schematic diagram of an industrial processing machine with a laser beam launched into an optical fiber. The machine comprises a light source, e.g. a laser generator 10, capable of launching a laser beam into a transmission fiber, e.g. an ytterbium-doped fiber laser, or a direct diode laser, configured to emit a single-mode or multimode laser beam, and further comprises an optical fiber guide 12d configured to guide the laser light emitted by the light source towards a processing head 14 arranged near the material WP. In the processing head, the laser beam emerging from the divergence-controlled fiber is collimated by a refractive collimation optic 20, reflected by a reflective optic 22 and focused using an optical focusing system 16, generally consisting of a focusing lens, and passes through a discharge nozzle 18 along the light propagation axis incident on the material WP.

[0013] As a first approximation, an ideal laser beam, i.e. a laser beam ideally collimated to parallel rays, is focused downstream of an optical focusing system into a focused spot with finite dimensions at its waist. In general, optimal processing conditions are reached in industrial processing when the lateral position of the plane corresponds to the waist of the beam, defined to an accuracy of 1 / 10 of a millimeter, relative to the wall of the material into which the beam enters and the wall of the material from which the beam exits.

[0014] The power density distribution of a normally collimated laser beam is typically Gaussian shaped with rotational symmetry for single-mode beams, where the power is concentrated around the longitudinal axis of the beam (z-axis) and gradually decreases along the peripheral coverage, or can be described as the envelope of a Gaussian profile with rotational symmetry for multimode beams.

[0015] The use of beams of single or multimode laser radiation, which can be described in a first approximation as Gaussian, responds to the need for technological control in the field of high-power applications of lasers. In fact, a Gaussian beam is easily described by small parameters and can be easily controlled regarding its propagation along the optical transmission path in the head of the processing machine by the source. It can be described using ray values ​​and divergence values ​​in the propagation conditions in the far field (if the geometrical approximation can be used) since it benefits from the propagation characteristics without changing the power distribution. In the propagation conditions in the near field of a focused beam, along the processing trajectory, where the geometrical approximation does not matter, the beam maintains a Gaussian-shaped power distribution for each of its cross sections.

[0016] Laser beams containing higher-order transverse modes have a non-Gaussian power distribution. These conditions are typically obtained by using refractive optics (transmissive optics, i.e. lenses) or reflective optics (reflective optics, i.e. mirrors), which change the shape of the beam from a Gaussian distribution.

[0017] Control of the propagation direction of the laser beam or the shape of the transverse power distribution, which may have a symmetry different from the rotational symmetry in the processing area of ​​the material, unlike the Gaussian shape, is advantageous for processing processes, for example in connection with the controlled distribution of the assist gas or as a result of the separation distance between the processing head and the material, the processing trajectory to be followed, and the type of process to be performed. For example, control of the power distribution of the laser beam makes it possible to specify or expand the required power distribution in connection with the separation distance and processing trajectory between the processing head and the material, possibly by breaking the rotational symmetry of the beam.

[0018] It is clear that the control of the direction of propagation of the laser beam or the control of the transverse power distribution shape of the laser beam must be as accurate and repeatable as possible, so that the indicated advantages can be achieved. For this reason, the movement of the processing head and the position of its proximal end, i.e. the position of the laser beam output, the position of the nozzle for the outflow of assist gas during processing that requires this, relative to the material, must be controlled with high precision and in real time, based on the current processing conditions and the current position along the processing trajectory, in particular relative to the point at which the laser beam enters the material. To this end, there is a risk of focusing the laser power on undesired processing surfaces within the thickness of the material and of using an assist gas pressure that is excessive or insufficient at the surface of the material.

[0019] For these reasons, in the field of laser processing, it is desirable to be able to accurately determine the separation distance between the processing head, i.e., the proximal end of the processing head, and the material and the surface of said material.

[0020] When machining metallic materials, it is known to use a capacitance sensor arranged to detect the change in electrical capacitance between the metal end of the machining head, e.g. the opening of a nozzle, and the surface of the material.

[0021] Such an approach is shown by way of example in Fig. 3, which shows a processing head 14 according to an embodiment of the prior art, arranged at a separation distance d from the material WP to be processed, and an associated electronic unit ECU for controlling the process. The laser beam generated by a light source and transmitted to the processing head 14 by means of an optical path in air or in an optical fiber with multiple reflections is collimated along an optical propagation axis in a certain direction of incidence on the material to be processed towards an optical collection system, emerging from a beam output 32 preferably downstream of a protective glass (not shown) configured to protect the collection system from possible splashes of the melt.

[0022] The expression "beam output" in the following description refers to the part of the processing head where the processing laser beam appears in the open air, i.e. propagating outside the volume of the head towards the material to be processed, and may be the end of the optical focusing system or its protective structure, or the tapered end of a nozzle for providing a flow of assist gas for applications requiring gas supply to the process. This part may be considered as the distal part of the processing head relative to the whole machine, or the end proximal to the material to be processed, and these terms will be used equally in the description.

[0023] The movement actuator means 40 are connected to the machining head 14 and are controlled by a unit ECU for controlling the machining by means of servo motors 42, controlling the mechanical parameters of the machining, for example controlling the movement of the machining head along the degrees of freedom given thereto by the particular embodiment of the machine, following the programmed machining trajectory T on the material to be machined, in particular for movement along the Z-axis towards and away from the material based on its profile or machining profile. Means (not shown) are also provided for mechanically adjusting the optical focusing system, calibrating the position of the system transversely to the beam propagation direction (XY axes) and in the beam propagation direction (Z axis).

[0024] A capacitance sensor attached to the processing head 14 is designated by the reference number 44 and is configured to detect the change in capacitance between the end 32 of the processing head close to the material (here the opening of the nozzle coincident with the laser beam output) and the surface of the material WP placed at a reference potential. The capacitance signal detected by the sensor 44 is processed by an associated computer module 46 with knowledge of the machine and processing parameters, which is programmed to determine the separation distance between the processing head and the material based on the obtained capacitance value, and is transferred from there to a unit for controlling the processing ECU, which controls the movement of the processing head by means of feedback. Summary of the Invention [Problem to be solved by the invention]

[0025] Unfortunately, this technique is not applicable when machining non-metallic materials.

[0026] This also lacks precision, since capacitance effects do not only occur locally between the laser beam output and the corresponding point of incidence on the material, but also as a result of the large surface of the processing head and the material close to the laser beam output and the point of incidence. In case of significant curvatures (positive or negative) in the surface of the material close to the edge, or when the processing head approaches the material in a direction that is not perpendicular to the local surface, it is necessary to carry out calculation algorithms to compensate the measurements, which algorithms are rather cumbersome in computer terms and in any case are unable to fully compensate for the complexities of configurations that may be encountered in practice.

[0027] The present invention aims to provide a method for determining the separation distance between a processing head of a machine for laser processing a material and the surface of said material, which method is accurate and robust, i.e. is not affected by effects linked to the shape or processing conditions of the material under which the machine operates, such as the relative speed and translation direction of the processing head with respect to the material.

[0028] It is an additional object of the present invention to provide a method for determining the separation distance between a processing head of a machine for laser processing a material and the surface of said material without compromising measurement accuracy over a wide range of measurable distances. [Means for solving the problem]

[0029] According to the invention, these objects are achieved by considering a method for determining the separation distance between a processing head of a machine for laser processing of a material and a surface of said material, which method has the features set forth in claim 1.

[0030] Particular embodiments form the subject matter of dependent claims, the content of which is to be understood as an integral part of this description.

[0031] The invention also relates to a system for determining the separation distance between a processing head of a machine for laser processing a material and a surface of said material, said system having the features as stated in claim 23.

[0032] The invention also relates to a machine for laser processing of a material, comprising a system for determining a separation distance between said processing head and a surface of the material, said system being configured to carry out the method described above.

[0033] In summary, the present invention is based on the application of the principles of optical interference.

[0034] The term "optical interference" refers to several techniques that exploit the phenomenon of interference between a measurement light beam and a reference light beam, which are superimposed and generate interference fringes. Although the theory of optical interference in coherent light is well known and is used for relative comparisons between distances, it cannot provide unambiguous absolute measurement information about said distances, for example in the case of a momentary interruption of the optical signal.

[0035] The present invention is inspired by the observation that absolute distance measurements can be performed in the optical domain by using low-coherence interferometry techniques. Low-coherence interferometry is a simple technique for measuring the distance between a probe and a target with high accuracy, based on a comparison between the distance traveled by a measurement light beam propagating from a light source to a detector assembly, emitted by the probe during this path and reflected back by the target, and the distance traveled by a reference light beam propagating from a light source to a detector assembly through a reference path aligned to the measurement path at a known nominal distance condition between the probe and the target.

[0036] In low-coherence interferometry, the measurement and reference light beams are generated by low-coherence light sources, e.g. LEDs or superluminescent diodes, and the interference fringes between the aforementioned beams appear only if the lengths of the individual optical paths or optical paths correspond. The optical path is defined as the sum of the products of the geometrical length and the individual refractive index at each part along the entire traveling optical path, i.e., when the length of the measurement path corresponds to the length of the reference path within the coherence length. Assuming that the length of the reference path is known, it is possible to derive the length of the measurement path by detecting the presence of the envelope of the interference fringes with a resolution of the order of the coherence length, which is typically in the micrometer range (5 μm to 100 μm).

[0037] This approach is particularly robust with respect to optical noise, since light coming from other light sources or from the laser processing process is incoherently added to the interference signal without modifying the interference fringe pattern. The measurement is applied locally at the point where the measurement light beam is directed and is independent of the surrounding morphology. This also allows for accurate absolute measurement of distances in a distribution that is substantially coaxial with the laser processing.

[0038] Advantageously, low coherence interferometry techniques using detection of interference fringe patterns in the spatial domain are the most promising and more efficient in terms of operational flexibility for the purposes of the present invention compared to detection in the time or frequency domain.

[0039] Indeed, in low-coherence interferometry with detection in the time domain, the fringe pattern is detected by a photodiode or an array of photodiodes or by a similar acquisition screen, and by adapting the length of the reference path, a condition is reached in which the length of the reference path and the length of the measurement path correspond, except for a tolerance of the order of the coherence length. In this case, the limitation of the available measurement range is related to the adaptation of the length of the reference path, which is carried out, for example, by means of a translation of a back reflection element arranged along the said path. The translation spatial range of the back reflection element of the reference path can be between a few microns and a few millimeters, the size of the translation range being a penalty in terms of the driving speed or the complexity of the operation.

[0040] The time domain detection approach is relatively simple to implement and the correspondence between the absolute optical lengths of the measurement and reference paths can be easily achieved. However, this is unsuitable for implementation in applications where the course of an industrial process is measured in real time. Indeed, in dynamic measurements, the length of the reference path must be continuously modulated to find the condition where it corresponds to the current length of the measurement path, which condition gives rise to the appearance of an interference fringe pattern. This can be obtained using various types of control devices, including refractive index modulators or fast-acting mechanical actuators, such as piezoelectric actuators. However, these types of devices are rather expensive and very delicate. The reason is that they need to operate at a driving speed (typically higher than kHz) much faster than the sampling rate for measuring the distance, a condition that is not easily obtained, especially in the range of large displacements.

[0041] A different detection technique is based on the Fourier transform relationship between the spectral density function and the cross-correlation of the measurement and reference beams, which allows to extract a differential distance measurement in real space from the spectral profile of the wavelengths of the two interfering beams. Thus, no mechanical actuator is required to match the length of the reference path to the length of the measurement path. A single spectrum acquisition of the superimposed measurement and reference beams is possible using a diffraction grating and a downstream focusing lens, and the spectral distribution of the interfering beam can be projected onto a linear sensor device, e.g., a video camera. The spectrum of the two interfering beams shows a periodic modulation, and the periodicity (frequency) of this modulation in wavelength space varies with the difference between the optical lengths of the measurement path and the reference path. An algorithm for calculating the Fourier transform, e.g., an FFT algorithm, is applied to extract a measurement of the signal intensity peak in relation to the difference between the optical paths in real space.

[0042] This technique also requires high quality optics, which must be aligned with a high precision and high speed sensor to acquire the signal. Furthermore, the back reflected signal can determine artifacts in the measurement and the presence of autocorrelation signals can reduce the sensitivity of the acquisition, especially in the case of highly reflective surfaces. To calculate the absolute distance, the signal must be rapidly processed based on the implementation of FFT algorithms, which require specific computers.

[0043] Unlike the low coherence interferometry technique in the time domain, where the scanning of the length of the reference path is distributed in time, in the frequency domain, the comparative information between the lengths of the measurement path and the reference path is encoded in wavelength space, and the low coherence interferometry technique with detection in the spatial domain combines two conventional techniques and allows the results of the measurement in real space to be directly visualized, enabling rapid acquisition using economical devices such as, for example, image sensors, linear sensors, etc.

[0044] In a typical design of a low-coherence interference system with detection in the spatial domain, the measurement beam and the reference beam are incident on the sensor means surface from different directions and are superimposed. The surface of the sensor means is directly configured to detect the interference fringe pattern resulting from this superposition. In this configuration, the spatial variation of the measurement optical path relative to the reference optical path is directly displayed on the sensor means as a result of the mutual tilt angle of the two beams. Thus, a measure of the difference between the length of the measurement optical path and the length of the reference optical path can be easily extracted by detecting the position of the interference fringe pattern on the sensor means. The extension of the interference fringe pattern in the linear dimension of the sensor means is of the order of the coherence length of the optical radiation of the beam.

[0045] In low-coherence interference techniques with spatial domain detection, the optical path length of each beam incident obliquely on a common incidence area of ​​the sensor means varies linearly with the position along the illumination axis of the sensor means. Therefore, the difference between the measurement optical path and the reference optical path also varies linearly. The interference fringe pattern appears in a certain linear range of the image acquired by the sensor means, which corresponds to the condition where the optical lengths of the measurement path and the reference path are equal within the coherence length of the optical radiation, while in other areas of the sensor means the beams are incoherently superimposed. By detecting the position of the envelope of the interference fringe pattern along the linear extension of the sensor means, it is possible to extract the specific length of the measurement path.

[0046] The measurement is limited only by the condition under which the envelope of the interference fringe pattern is formed within the illuminated area of ​​the sensor means, i.e. within the sensing area of ​​the photodetector device forming the sensor means. The measurement range is determined by the inclination of the beam on the incident area, or the angle of incidence between them, and for the same beam inclination, it is determined from the minimum between the number of photodetectors or photodetection areas (also called pixels of the sensor means) illuminated by the superimposed beams and the total number of photodetectors of the sensor array, or from the minimum number of areas (pixels) that must be illuminated to demodulate the interference fringe pattern relative to the total number of areas (pixels) available on the sensor means. Under common conditions involving a sensor array with several thousand photodetectors, a measurement range of a few tens of millimeters is obtained before the appearance of aliasing effects of the interference fringes. However, the inventors have demonstrated that the presence of aliasing effects of the interference fringe pattern does not limit the measurement and can in fact be used to increase the range of measurable distances, as will be explained in more detail below. In fact, this subsampling system is reflected in an effective demodulation of the interference fringe pattern at lower spatial frequencies, which demodulation can be obtained in a similar manner directly at the level of the photodetectors of the interferometric sensor array, without the need for intervening additional elements.

[0047] Advantageously, the adoption of an interference technique with detection in the spatial domain allows accurate distance measurements to be made using a static system of measurement and reference optical paths, due to the individual acquisition or sampling of the spatial distribution of the optical radiation of the superimposed measurement and reference beams incident on the sensor means. To provide such a system, only standard optical elements are required, and the signals emitted by the sensor means are processed on the basis of simple calculation algorithms and are therefore computationally unintimidating. This technique also overcomes the drawbacks of detection techniques in the frequency domain, namely the presence of autocorrelation signal components, artifacts at negative frequencies and reduced sensitivity at high values ​​for measurable distances.

[0048] According to the invention, the application of the above considerations to a machine for laser processing of materials, in particular a machine for laser cutting, drilling or welding or additive manufacturing, is achieved by means of a configuration of an interferometer system comprising a measurement optical path at least partially integrated in the processing head and a reference optical path associated with the measurement optical path, which may be integrated in the processing head or externally thereto, the measurement optical path emerging from the measurement head in the region of the output of the beam or more generally at an end of the head close to the surface of the material to be processed. [Brief description of the drawings]

[0049] Further features and advantages of the invention will be presented in more detail in the following detailed description of embodiments thereof, given as non-limiting examples, with reference to the attached drawings, in which:

[0050] [Figure 1] 1 is an example of a laser processing machine according to the prior art; [Diagram 2] 1 is an example of a laser processing machine according to the prior art; [Diagram 3] 1 shows a schematic example of a processing head and associated control means of a laser machine close to the material to be processed according to the prior art; [Figure 4a] FIG. 1 is a schematic diagram of a linear low-coherence interferometry system configuration using spatial detection. [Figure 4b] 1 is a schematic diagram of the change in length of the measurement and reference optical paths of an interference fringe pattern, referenced to a relative point of incidence on the illumination axis of a sensor array; [Figure 4c] Schematic diagram of the change in the difference between the length of the measurement optical path and the length of the reference optical path based on the relative point of incidence on the illumination axis of the sensor array (top graph), and identification of the interference fringe pattern on the illumination axis of the sensor array under the condition that the optical length of the measurement reference path and the optical length of the reference optical path are equal (bottom graph). [Diagram 5] 1 is a schematic diagram of a system for determining the separation distance between a processing head of a machine for laser processing a material and the surface of the material, which is the subject of the present invention; [Figure 6]1 illustrates diagrammatically the paths of a processing laser beam and a low-coherence measurement light beam within a processing head according to a simplified embodiment of the processing head; [Figure 7] FIG. 2 is a detailed view of the relative positions of the processing laser beam and the measurement low-coherence light beam at the output of the processing head in the region of cutting or drilling material. [Figure 8] 1 is a graph showing trends in contrast or visibility values ​​of a simulated interference fringe pattern as a function of the ratio of the spatial frequency of the interference fringe pattern to the spatial frequency of a linear array of photodetectors along the illumination axis of the sensor array of the interference fringe pattern. [Figure 9a] 1 is a graph showing the dependence of the interferometer measurement result, expressed in terms of the optical length difference between the measurement optical path and the reference optical path, on the pressure of an assist gas used, for example, in a laser cutting process, which is formed along a portion of the measurement optical path for a predetermined separation distance between the processing head and the surface of the material. [Figure 9b] A graph showing the dependence between the interferometer measurement results, expressed in terms of changes in the local position of the surface of an optical element that protects or bounds the assist gas chamber along the measurement beam, and the trend (increase, decrease) in the pressure of the assist gas. [Figure 10a] 1 is a diagram showing a main signal indicating the identification of an interference fringe pattern along the illumination axis of the sensor array as a function of separation distance between the processing head and the material, and a corresponding additional multiplexed signal indicating the identification of each additional interference fringe pattern along the illumination axis of the sensor array, which arises from a traveling additional measurement or reference optical path having a geometric length different from that of the main measurement or reference optical path, which includes at least one partial back reflection at a surface of an optical element intervening along the optical path of the processing laser beam. [Figure 10b] 4 is an exemplary calibration curve showing the trend of the peak of the signal representing the main interference fringe pattern as a function of the separation distance between the processing head and the material. [Figure 10c] 1 shows a series of graphs representing measurements made during the cutting process. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0051] 1 to 3 have been described above with reference to the prior art, the contents of which, in so far as they are common to the controlled production of processing machines, are referred to here for carrying out the method according to the teachings of the present invention.

[0052] Fig. 4a is a schematic diagram of a low-coherence interferometer system configuration with linear spatial detection. A collimated measurement beam of optical radiation (denoted M) and a collimated reference beam of the same optical radiation (denoted R) are incident on the sensor array S in such a way that they are superimposed at a predetermined angle of incidence α on a common incidence area C of the sensor array, forming an interference fringe pattern F, the extension of which on the common incidence area is of the order of the coherence length of the optical radiation. The width of the collimated measurement beam of optical radiation and the width of the collimated reference beam of optical radiation are preferably sized to illuminate substantially the entire sensor array. To increase the intensity and contrast of the detected signal, the beams may be focused on the sensor in a direction perpendicular to the illumination axis, for example by means of a cylindrical focusing lens.

[0053] The sensor array S comprises, for example, an array of photodetectors along at least one illumination axis (x-axis in the figures) of the entrance area. The array of photodetectors is a linear or two-dimensional array of photodetectors, preferably a linear array. The illumination axis of the entrance area is determined by the intersection between a plane defined by the angles of incidence of the measurement beam M and the reference beam R and a sensor surface of the sensor array.

[0054] In Fig. 4b, the graph shows diagrammatically the variation of the length P of the measurement and reference optical paths, referring to the initial incidence wavefronts of the individual measurement and reference beams on the common incidence area of ​​the sensor array S, in a typical configuration in which the two incidence beams are symmetrical on the sensor array. The x-axis indicates the position along the illumination axis or x-coordinate of the photodetector array. Reference sign p1 indicates the additional length of the first optical path, e.g. the measurement optical path of the measurement optical radiation beam M, with reference to the initial point of incidence of the wavefront of the measurement beam M at the first end x1 of the common incidence area C, which is the origin of the measurement axis. Reference sign p2 indicates the additional length of the second optical path, e.g. the reference optical path of the reference optical radiation beam R, with reference to the initial point of incidence of the wavefront of the reference beam R at the second end x2 of the common incidence area, which is opposite to the first end. Reference sign Δp indicates the difference p1-p2 of the additional lengths of the two paths, which is zero at the mid-coordinate of the sensor array and is equal to the value Δp at the end x1 of the common incidence area. x1 to the value Δp at the edge x2 of the common incidence area x2 changes to.

[0055] In Fig. 4c, the upper graph shows the curve Δp corresponding to the graph of Fig. 4b, and the lower graph shows the identification of the fringe pattern F on the illumination axis (x) of the sensor array S that occurs when the optical lengths of the measurement and reference paths are equal. The envelope of the fringe pattern F is shown hatched, and the specific difference Δp between the additional lengths of the paths of the measurement and reference light beams is shown. p Using the upper graph, find the envelope peak x p is associated with the coordinates of

[0056] P M and P R indicates the measurement path and the reference path, the total length of which is P M =P1+p1, P R =P2+p2, where P1 is the optical length of the measurement optical path from the low coherence optical radiation source to the first wavefront incident on the sensor array, and P2 is the optical length of the reference optical path from the same low coherence optical radiation source to the first wavefront incident on the sensor array, and is preferably constant. head +D standoffIt can be considered that P head is the length of the optical path upstream and within the processing head, including a first portion between the low coherence optical radiation source and the end of the processing head proximal to the material WP to be processed (e.g., laser beam output 32), and a second portion between the aforementioned proximal end of the processing head (e.g., laser beam output 32) and the sensor array S, which have specific, predetermined, and invariant geometric lengths; D standoff is the separation distance in ambient air between the end of the processing head proximal to the material WP to be processed and the surface of said material. P2 is the optical length of the reference optical path, which is equivalent to the optical length of the measurement optical path at nominal operating conditions, and is defined below as P1 nom , and the distance between the proximal end of the processing head (e.g., laser beam output 32) and the surface of the material WP is a predetermined nominal separation distance D standoff_nom Corresponds to.

[0057] The optical length difference between the measurement and reference optical paths is mathematically expressed as follows: P M -P R Interference fringes appear under the condition where this is zero, that is, under the following condition: P M -P R =0 A relationship can be decomposed as follows: P1+p1-(P2+p2)=0 It can be rewritten as follows: P head +D standoff +p1-P2-p2=0 From this, the following can be deduced: P head +D standoff -P2+Δp=0 P head +D standoff -P1 nom +Δp=0 P head +D standoff -P head -D standoff_nom +Δp=0 Δp=D standoff_nom -D standoff That is, (a) the current separation distance D between the processing head and the surface of the material in the processing area. standoff and (b) the nominal separation distance D standoff_nom The difference between is equal to the difference between the additional length of the measurement optical path and the reference optical path.

[0058] Therefore, the current separation distance between the processing head 14 and the surface of the material WP (which is different from the nominal separation distance), determined by the difference in optical length between the measurement optical path and the reference optical path, is due to the difference between the additional lengths of the measurement optical path and the reference optical path, and therefore due to a movement of the interference fringe pattern along the illumination axis x of the sensor array S, relative to a nominal position, e.g., the central plane of the sensor array S.

[0059] It is noted that in laser cutting or drilling applications that include a flow of assist gas, the end of the processing head adjacent the material being processed is typically the end of the assist gas nozzle, whereas in welding or additive manufacturing applications where no gas is supplied, the end of the processing head adjacent the material being processed is typically the processing laser beam output.

[0060] In the application forming the subject of the present invention, the length of the reference optical path is set to correspond to the length of the measurement optical path at a preset nominal separation distance between the processing head and the surface of the material in the processing area. The difference between (a) the current separation distance between the processing head and the surface of the material in the processing area and (b) the preset nominal separation distance results from the difference in length between the measurement optical path and the reference optical path, which can be identified based on the position of the interference fringe pattern along the illumination axis of the entrance area of ​​the sensor array S. Advantageously, the middle position of the interference fringe pattern along the illumination axis corresponds to the preset nominal separation distance. Alternatively, the end position of the interference fringe pattern along the illumination axis may correspond to a zero nominal separation distance between the nozzle and the material to be processed, which is equivalent to contact between the nozzle constituting the proximal end of the head and the material. This only increases the separation distance between them, and the interference fringe pattern moves exclusively towards the opposite end of the illumination axis.

[0061] Referring to the lower graph in Fig. 4c, the position X of the interference fringe pattern along the illumination axis p is a unique position of the envelope of the intensity of the optical radiation of said interference fringe pattern, this unique position of the envelope of the intensity of the optical radiation of the interference fringe pattern being for example the position of a peak or maximum intensity of the optical radiation envelope, and the intermediate position of the photodetector is weighted with the optical intensity of the fringe envelope.

[0062] The detection of the fringe envelope can be performed using light intensity profile demodulation techniques, for example by sequentially applying band-pass or high-pass and low-pass spatial filters, to reveal only the signal components corresponding to the spatial frequencies of the fringes. For example, in a first step of processing the light intensity data, the light intensity detected by the sensor matrix is ​​integrated over a direction perpendicular to the direction of development of the fringes, for example over the columns of the sensor matrix oriented to receive a vertically aligned fringe pattern (this operation is not required if the sensor array is a linear array of photodetectors whose beams are focused using cylindrical lenses). The signal generated by the photodetector is then normalized with respect to a background signal, for example extracted from an image without fringes. Thus, a high-pass spatial filter is applied, for example, at 1 / 5 of the photodetector spatial frequency, to remove the baseline and to preserve the fringe pattern. Since a signal oscillating around zero is thus obtained, the absolute value of the signal is extracted, and thus a low-pass spatial filter is applied, for example, at 1 / 25 of the photodetector spatial frequency, to extract the envelope of the fringe pattern. Finally, the position of the interference fringe pattern is obtained by detecting the position of the envelope of the fringe pattern, thereby finding its maximum value, or by comparing the envelope with a predefined model function (e.g. a Gaussian function) and extracting the peak of the model function.

[0063] FIG. 5 shows an exemplary diagram of a system for determining the separation distance between a processing head 14 of a machine for laser processing a material WP and the surface of said material, which forms the subject of the present invention according to a currently preferred embodiment.

[0064] In the figure, reference number 100 denotes a source of low coherence light radiation, such as an LED or a superluminescent diode, suitably with linear polarization, operating, for example, in the visible or near infrared wavelength range. The optical radiation emitted by the source 100 is injected downstream of a suitable optical isolator 120 into an optical waveguide, for example an optical fiber 140, and conveyed to a beam splitter 160, which is connected to a measurement optical path P M a measurement optical radiation beam M routed onto a reference optical path P R The optical fiber 10 is configured to generate a reference optical radiation beam R routed onto the optical fiber 10 .

[0065] Measurement optical path P M and the reference optical path P R is a waveguide path and includes a light guide (e.g., an optical fiber) configured to maintain the same beam polarization along the entire path.

[0066] Measurement optical path P M is, as mentioned above, guided to the processing head 14 of the machine for laser processing of materials and emerges from there towards and impinges on the material WP to be processed. The area where the measurement beam M is output corresponds to the area of ​​the measuring head, which is intended to measure the distance of said measuring head from said material, for example the opening of a nozzle supplying a flow of assist gas or the laser beam power.

[0067] Instead, the reference optical path P Ris preferably guided to the reflection return element 180 by the intervening optical density filter 200, the optical dispersion compensation element 220, the λ / 4 plate 240 and the collecting lens 260. The optical reflection element 180 is arranged along the reference optical path such that the optical length of this path from the beam splitter 160 to the optical reflection element 180 corresponds to the optical length of the measurement optical path from the beam splitter 160 to the (reflective) surface of the material WP to be processed, which in the operating state is located at a preset nominal separation distance D from the processing head, i.e. from the end of the processing head close to the material (e.g. the opening of the nozzle for the assist gas or the beam output). standoff_nom It is located at.

[0068] Measurement optical path and reference optical path P M ,P R is formed such that the optical radiation travels in both directions along these paths and returns to the beam splitter 160 after being reflected by the surface of the material to be processed WP and the reflective optical element 180, respectively. R , the double pass of reference beam R through λ / 4 plate 240 results in a rotation of the linear polarization of the beam by approximately 90°, so that it assumes an orthogonal linear polarization to the linear polarization of measurement beam M. Thus, beam splitter 160 recombines and directs the measurement and reference light beams into detection optical path P. D (common to a portion of the measurement optical path and a portion of the reference optical path) toward the sensor array S.

[0069] Both the measurement and reference light beams are directed through a cylindrical focusing lens 280, which is configured to focus the collimated beam in one direction, in particular orthogonal to the illumination axis of the sensor array, with the aim of concentrating the signal along this axis, thereby optimizing the illumination of the photodetector, and reach a polarizing beam splitter 300, which performs separation of the measurement light beam M from the reference light beam R based on their polarization, directing the first one towards the first reflecting element M1 and the second one towards the second reflecting element M2, in the latter case by interposing a λ / 2 plate 320 that restores the original polarization. Due to this configuration, the first and second reflecting elements M1, M2 direct the measurement light beam and the reference light beam, respectively, towards the sensor array S, more precisely at an incidence angle α towards a common incidence area of ​​the sensor array. If the system is configured such that the reflective elements M1, M2 are translatable along the propagation axis of the relative light beams and rotatable about an axis perpendicular to the plane of incidence (dashed line position in the figure), the angle of incidence α is conveniently controlled within a preset range of values.

[0070] As mentioned above, the sensor array S comprises a plurality of photodetector devices, each of which is configured to emit a specific signal representative of the light intensity incident thereon, and these signals are transmitted as a whole to a processing means 350, which is configured to identify the interference fringe pattern F formed at a common incident area C of the sensor array by obtaining the total incident light power of the superimposed measurement and reference light beams.

[0071] Preferably, the measurement optical path and the reference optical path comprise corresponding optical elements, in particular the reference optical path comprises a reflective return element, the reflection and light diffusion properties of which correspond as far as possible to the reflection and light diffusion properties of the surface of the material interposed in the measurement optical path. Light attenuating means and / or light dispersing means may be provided as required, which are configured to balance the intensity and chromatic dispersion of the reference light radiation reflected by said reflective return element with respect to the intensity of the measurement light radiation reflected by the material to be processed.

[0072] Using the system of Figure 5 or an equivalent system, a method is carried out for determining a separation distance between a processing head 14 of a machine for laser processing a material and a surface of a material WP within a processing area defined along a predetermined processing trajectory T followed by a processing laser beam emitted from the head.

[0073] The method includes generating a measurement beam M of low coherence optical radiation, which is directed towards the processing area via the processing head 14, reflected or scattered by the surface of the material WP in the processing area, and directed in a first incident direction towards the sensor array S via the processing head 14.

[0074] When processing metallic materials, it is possible to assume that the measurement light beam is reflected or diffused at the first surface of the material. In certain cases, for example in welding or additive manufacturing processes, it is necessary to measure the distance from the surface of the weld pool, which represents the first surface of the molten metal, instead of the surface of the solid (or substrate) to be welded. Internal sub-surface layers of the material generate a signal in non-metallic and translucent materials (ceramics, plastics, biological tissue, etc.) or painted metals.

[0075] The measurement light radiation beam M travels, in particular, along a measurement optical path from the light source 100 to the sensor array S, which includes two portions having specific, predetermined and invariant geometric lengths: a first portion is between the light source 100 and the end of the processing head 14 that is close to the material WP, and a second portion is between the end of the processing head 14 that is close to the material WP and the sensor array S.

[0076] The reference beam R of low coherence optical radiation is generated by the same light source 100 and is directed towards the sensor array S in a second direction of incidence at a predetermined angle of incidence with respect to the first direction of incidence of the measurement beam M. The reference beam R is aligned along the measurement optical path P M A reference optical path P having an optical length equivalent to the optical length of R , and the distance between the processing head 14 and the material WP is equal to a predetermined nominal separation distance D standoff_nom Corresponds to.

[0077] The measurement beam M and the reference beam R are superimposed on a common incidence area C of the sensor array S along a preset illumination axis. The position of the interference fringe pattern F between the measurement beam M and the reference beam R on the common incidence area C is detected by the processing means 350 as described above and is represented by the measurement optical path P. M and the reference optical path P R It enables one to determine the difference in optical length between, which indicates the difference between (a) the current separation distance between the processing head 14 and the surface of the material WP in the processing area, and (b) a preset nominal separation distance.

[0078] The method may be performed in real time during processing to determine the separation distance between the processing head and the current processing area on the material, or may be performed before or after processing to, for example, identify the piece being processed or the process being performed.

[0079] 6 and 7, an exemplary embodiment of the paths of the processing laser beam B and the measurement light beam M within the processing head and the relative positions of the processing laser beam B and the measurement light beam M at the cutting or drilling portion of the material WP are shown generally.

[0080] FIG. 6 shows a reflecting element for deflecting the laser beam, for example a dichroic mirror, indicated by the reference DM, which deflects the optical axis of propagation of the processing laser beam B from the head entry direction to the direction of incidence on the material WP to be processed. This is the configuration adopted in one embodiment of a processing head with a transverse laser beam input. In this embodiment, the measurement light radiation beam M is directed towards the measurement area of ​​the material, passes through the dichroic mirror DM without substantial deflection, and is then scanned by a reflective optical scanning system SM or a folding mirror, the tilt of which is controlled, for example piezoelectrically, based on the absolute value and direction of the advancement speed of the processing head along the processing trajectory in order to control the position at which the measurement point intercepts the surface. Downstream of the reflective optical scanning system SM, a focusing lens FL is arranged, which can control the position H at which the measurement point intercepts the surface of the material. As can be seen in the figure, the propagation direction of the measurement beam can be controlled by the tilt of the reflective optical scanning system SM, which is controlled differently from the processing laser beam B so as not to be coaxially superimposed thereon. Those skilled in the art will appreciate that a "dual" or "opposite" configuration is also possible, in which a dichroic mirror is provided that is transparent to the processing laser beam and reflects the measurement beam coming from the lateral input.

[0081] Advantageously, in a machine for laser cutting, drilling or welding of material with a laser or for additive manufacturing of three-dimensional structures, the machine is provided with a processing head including a nozzle for supplying a flow of assist gas arranged near the material, and the measurement light radiation beam is guided via the nozzle and directed towards a measurement area of ​​the material coaxial with or in the vicinity of the current processing area, preferably in front of it according to the processing trajectory.

[0082] Advantageously, in a machine for laser welding or for additive manufacturing of three-dimensional structures with a laser, the machine comprises a processing head comprising an output for a high-power processing laser beam downstream of an optical system for focusing the laser beam, this system being arranged near the laser beam. A measuring light radiation beam is guided via the aforementioned beam output and directed towards a measuring area of ​​the material coaxial with or in the vicinity of the current processing area, preferably behind it according to the processing trajectory.

[0083] The incidence of the measurement beam M, which is coaxial with the processing laser beam B, is suitably used, for example, to evaluate the drilling depth, the weld height and / or the height and depth of the structured material during additive manufacturing. The incidence of the measurement beam M in a setback position relative to the processing area is used to check the weld quality or the build-up deposit. The incidence of the measurement beam M in a forward position relative to the processing area is used for early measurement of the separation distance of the head from the material during cutting and welding or to identify the morphology of the surface of the material after a spatial scan, for example, to follow the weld joint along the processing trajectory. The latter configuration is shown by way of example in FIG. 7, where N denotes the nozzle supplying the assist gas, B denotes the processing laser light incident on the current processing area of ​​the material WP, the cutting operation is proceeding according to the trajectory indicated by the arrow, which is forming a groove G, and M denotes the measurement beam. In the cutting operation, the arrangement of the measurement beam M, which is coaxial with the processing beam B, makes the measurements very uncertain, since they are taken at the cutting edge, and the walls of the groove in the material have an uncontrollable profile, which depends on a number of processing parameters.

[0084] The following specification describes improvements of the present invention.

[0085] Advantageously, in a configuration in which the measurement and reference beams are incident on a common incidence region of the sensor array S, the incidence angle α is controlled and extended to an extent that the spatial frequency of the interference fringe pattern is greater than the spatial frequency of the photodetector to increase the measurable distance range.

[0086] Assuming that the measurement and reference beams propagate as plane waves, it is known that the total light intensity as a function of the x-coordinate along the illumination axis of the sensor array S in the plane of the incidence angle can be approximated as follows:

[0087]

number

[0088] where I1 and I2 are the intensities of the individual beams and k f is the wavenumber or spatial frequency of the interference fringe pattern. Denoting the angles of incidence of the measurement and reference beams relative to the normal to the sensor array as α1 and α2, the spacing between the interference fringes is given by:

[0089]

number

[0090] Thus, a larger tilt angle results in a higher frequency of the fringe pattern and therefore a higher fringe density on the sensor array.

[0091] According to the prior art, in order to respect the Nyquist sampling criterion and to avoid the phenomenon of aliasing or subsampling, the spatial frequency of the photodetector is set to be equal to the sampling pixel spatial frequency (k p ), the frequency of the interference fringe pattern is k f must be at least twice as large as k f / k p The ratio must be less than 0.5.

[0092] Information about the difference in optical paths can be extracted directly from the position of the envelope of the interference fringe pattern in the intensity profile of the optical radiation incident on the sensor array. Pdenotes the number of photodetector devices of the sensor array that are illuminated by both the superimposed measurement and reference beams, and the maximum path difference that can be measured is therefore:

[0093]

number

[0094] The measurement range is directly proportional to the number of illuminated photodetectors of the superimposed beams, which is a result of the resolution of the sensor array and the dimensions of the beams. Thus, an increase in the range of measurable path differences can be obtained by increasing the number of photodetector devices, which may introduce greater costs in forming the sensor array and in processing the resulting signals. The above measurable difference range is also determined by the k-squared distance between the frequency of the interference fringe pattern and the spatial frequency of the photodetector. f / k p It is directly proportional to the ratio k f / k p The ratio depends on the angle of incidence between the measurement and reference beams and the spatial dimensions of the photodetectors, and therefore it is necessary to achieve a balance between the beam tilt and the number of illuminated photodetectors.

[0095] The inventors noticed that, depending on the wavelength and coherence length of the low-coherence optical radiation used, several tens of fringes are typically visible in the fringe pattern formed at the common incidence area of ​​the sensor array. Acquiring a large number of fringes over a wide measurement range while respecting the Nyquist criterion requires a large number of photodetectors, which results in an overacquisition of information. The reason is that only the position of the envelope of the fringe pattern is relevant to determine the difference between the measurement and reference paths. As a result, the inventors investigated the possibility of demodulating the fringe pattern at increasingly smaller spatial frequencies. This can be obtained at increasingly larger angles of incidence between the measurement and reference beams, so that the frequency of the fringe pattern is greater than the spatial frequency of the photodetectors (a condition that leads to the occurrence of the aliasing phenomenon).

[0096] Assuming a fixed number of photodetectors, this approach allows the measurement range to be increased without losing information, simply at the expense of reduced contrast of the interference fringes, since multiple fringes are detected by a single photodetector.

[0097] The contrast ν of the interference fringes is determined by the aliasing factor k according to the following relationship: f / k p It can be shown from the prior art that the

[0098]

number

[0099] As shown in Figure 8, the spatial frequency k p is zero at integer multiples of .

[0100] Advantageously, to have maximum local contrast the spatial frequency of the interference fringe pattern should be greater than the spatial frequency of the photodetector and different from a multiple of the spatial frequency of the photodetector, preferably close to a half integer multiple of said spatial frequency of the photodetector.

[0101] In fact, as is clear from the graph in Fig. 8, the trend of the contrast ν between the interference fringes is shown as a continuous line, and this trend is f / k p Calculated as a function of the ratio, the maximum is close to a half-integer multiple of the spatial frequency of the photodetector, accompanied by a sharp drop in maximum contrast (qualitatively indicated in the figure by a discontinuous line).

[0102] Conveniently, the angle of incidence between the measurement beam and the reference beam is selected to have k equal to about 1.5 (or about 2.5, about 3.5, etc.). f / k p It is possible to obtain a ratio.

[0103] The present invention as described above may be improved as described below.

[0104] Generally, the propagation characteristics of a measurement optical radiation beam are influenced by the physical parameters (temperature, pressure, mechanical deformations) of the transmission means through which said beam propagates, since the refractive index of the transmission means can vary depending on these parameters.

[0105] In machines for laser cutting, drilling or welding of materials with a laser or for additive manufacturing of three-dimensional structures, the machine comprises a processing head with a nozzle supplying a flow of assist gas, and in which it is desired to determine the distance between the nozzle and the material to be processed, the measurement light radiation beam is configured to propagate via the nozzle, so that the propagation characteristics of the measurement beam are influenced by the pressure of the assist gas.

[0106] FIG. 9a shows the interferometer measurements (measurement optical path P M and the reference optical path P R 1 shows the dependence between the result of the measurement (expressed in terms of the difference in optical length between and ) and the pressure of the assist gas formed along a part of the measurement optical path (typically in the chamber of the nozzle supplying the assist gas). As can be seen from the experimental values ​​performed in the two measurements and from the partially discontinuous interpolated curve, the dependence is practically linear.

[0107] Therefore, to improve the accuracy of the method of the present invention, the determination of the optical length difference between the measurement optical path and the reference optical path may preferably be based on a normalized optical length of the measurement optical path, which is calculated from the geometric length and the normalized refractive index of the portion of said measurement optical path that passes through the assist gas chamber or nozzle, the normalized refractive index being calculated as a function of the pressure of the assist gas in said chamber according to a predetermined nominal dependency between the refractive index of the assist gas and the pressure of said gas.

[0108] For these reasons, the pressure of the assist gas in the assist gas chamber of the nozzle may be detected directly by a pressure sensor facing said chamber, or it may be derived indirectly from measurements of changes in the local position of a surface of an optical element protecting or delimiting the assist gas chamber along the axis of the measurement beam according to a predetermined nominal relationship between the position of the surface of said optical element relative to a particular predetermined nominal position and the pressure of the assist gas.

[0109] The measurement of the change in local position of the surface of the optical element is determined, for example, as a function of the difference in length between (a) an auxiliary measurement optical path referencing the optical element, the auxiliary measurement optical path including at least one of (i) a first portion between a light source of the measurement beam and an optical element at a first surface where the measurement beam is incident with partial back reflection and (ii) a second portion between a surface of the material to be processed and an optical element at a second surface where the measurement beam is incident with partial back reflection, and (b) a specific auxiliary reference optical path having an optical length equal to the optical length of the auxiliary measurement optical path of the optical element in a nominal operating condition including partial back reflection of the measurement beam at the first or second surface of the optical element when in a predetermined nominal position along the axis of the processing laser beam at a predetermined reference pressure value for the assist gas in the assist gas chamber of the nozzle.

[0110] Figure 9b shows the dependence between the results of the interferometer measurements expressed in terms of the change in the local position of the surface of the optical element for protecting or delimiting the chamber of assist gas along the axis of the measurement beam and the trend (increase, decrease) of the pressure of the assist gas in said chamber. Curve A represents the change in the local position of the surface of the optical element for protecting or delimiting the chamber of assist gas as the pressure in the chamber increases. Curve B represents the change in the local position of the surface of the optical element for protecting or delimiting the chamber of assist gas as the pressure in the chamber decreases.

[0111] More generally, the determination of the optical length difference between the measurement optical path and the reference optical path can be based on a normalized optical length of the measurement optical path, which is calculated from the geometric length and from a normalized refractive index of the transmission means of the measurement optical path or of a part of the measurement optical path, which refractive index is calculated based on the temperature of the part of the optical path according to a predetermined nominal relationship.

[0112] Alternatively or in combination with the above, the determination of the optical length difference between the measurement optical path and the reference optical path may be based on a normalized optical length of the measurement optical path calculated from a normalized geometric length and from the refractive index of a material transmission means of a portion of said measurement optical path, the normalized geometric length being calculated based on a mechanical deformation of said material transmission means according to a predetermined nominal relationship.

[0113] More advantageously, the technique forming the subject of the present invention makes it possible to determine a disturbance of the current optical length of at least a part of the measurement optical path with reference to the current optical length of the corresponding part of the reference optical path and to correct the determined value for the separation distance between the processing head and the surface of the material on the basis of said disturbance, for example by subtracting the disturbance measurement value from the measurement of the processing distance (possibly after applying a correction factor). The disturbance is formed, for example, as a result of a change in at least one physical parameter of the transmission means through which the measurement optical path extends.

[0114] For these reasons, the measurement beam incident on the sensor array S comprises at least one measurement calibration beam resulting from a measurement calibration optical path travelled along it. The measurement beam is reflected or diffused by at least one back-reflecting surface of a static optical element interposed along the measurement optical path. The reference beam incident on the sensor array S comprises a particular reference calibration beam resulting from a measurement calibration optical path travelled along it. This has an optical length equal to the optical length of the measurement calibration optical path in a nominal calibration operating condition, in which the geometric length and the refractive index of the transmission means of the measurement calibration optical path are equal to the geometric length and the refractive index of the transmission means of the reference calibration optical path within a predetermined tolerance. The static optical element may for example be an optical focusing system 16 of the laser beam.

[0115] Determining a disturbance in a current optical length of at least one portion of a measurement optical path includes the following steps. · Superimposing the measurement calibration beam and the reference calibration beam on a common incidence area of ​​the sensor array S along the illumination axis. Detecting a position of an interference fringe pattern between the measurement calibration beam and the reference calibration beam along an illumination axis within a common incidence area. determining an optical length difference between the measurement calibration optical path and the reference calibration optical path, respectively, based on a position of the interference fringe pattern along the illumination axis of the incident region, the optical length difference being indicative of a difference between (a) the geometric length of the measurement calibration optical path and the geometric length of the reference calibration optical path and / or (b) the refractive index of the measurement calibration optical path and the refractive index of the reference calibration optical path, the optical length difference between the measurement calibration optical path and the reference calibration optical path being indicative of said disturbance in the current optical length of at least a portion of the measurement optical length.

[0116] When the position of the interference fringe pattern is detected, a predetermined reference position of the interference fringe pattern (corresponding to a condition where the optical lengths of the measurement and reference calibration optical paths are equal) may be, by purely non-limiting example, a mid-position or an end position along the illumination axis of the photodetector.

[0117] Other solutions for increasing the range of measurable differences between the lengths of the measurement path and the reference path using the techniques forming the subject of the present invention are to utilize partial back reflection at the surface of at least one optical element interposed along the optical path of the processing laser beam and the optical path of the measurement light radiation beam, or to utilize a reference optical path having a predetermined length different from the length of the main reference optical path.

[0118] In one embodiment, the measurement beam incident on the sensor array S includes a main measurement beam resulting from a main measurement optical path traveling along it (comprising reflection from the surface of the material in the processing area and transmission through each optical element interposed along the optical path of the high-power processing laser beam) and at least one additional multiplexed measurement beam resulting from an additional measurement optical path traveling along it (comprising reflection from the surface of the material to be processed and having a geometric length greater than the geometric length of the main measurement optical path), for example due to at least one partial back reflection on a surface of an optical element arranged along the optical path of the high-power processing laser light and a surface of an optical element arranged along the measurement light radiation.

[0119] In this embodiment, the method of the invention is based on detecting the position of an additional interference fringe pattern on a common incidence region C of the sensor array S, determined by interference between the additional measurement beam and a reference beam. The additional interference fringe pattern may, for example, comprise (i) a peak or maximum intensity of the optical radiation envelope that is different, e.g. lower, than the peak or maximum intensity of the optical radiation envelope of the main interference fringe pattern between the main measurement beam and the reference beam, or (ii) a unique position of the optical radiation intensity envelope that is different from the unique position of the optical radiation intensity envelope of the main interference fringe pattern, when appearing simultaneously with the main interference fringe pattern.

[0120] FIG. 10a is a graph showing the signal emitted by the photodetector along the illumination axis (vertical axis) of the sensor array S, which signal shows the intensity of the envelope of the interference fringe pattern formed on the common incidence area. In particular, the figure shows the interference signal, and therefore the spatial position of the interference fringe pattern along the illumination axis (vertical axis), as a function of the separation distance (horizontal axis) between the processing head and the material facing it. For example, such a graph may be generated in a calibration step by providing a constant length of the reference optical path, continuously varying the relative position between the processing head and the surface of the material (i.e., the separation distance of the processing head from the surface of the material) along the z-axis, and obtaining interference signal measurements as a function of predetermined discrete values ​​of the separation distance.

[0121] The figure shows the acquisition of a strong interference signal in the aliasing condition and the translation of the envelope of the interference fringe pattern over a range of about 2 mm (corresponding to about 1500 pixels) according to the almost linear trend of the peaks of the signal showing the interference fringe pattern (shown in Fig. 10b). The sensitivity can be defined as the separation distance corresponding to the dimension of a pixel of the photodetector or incident field (in this case 1.5 μm / pixel). The translation of the envelope of the interference fringe pattern over the entire illumination axis of the sensor array allows to determine the separation distance between the processing head and the surface of the material (from about 0.25 mm to about 2 mm).

[0122] In the circled regions, corresponding additional multiplexed signals are marked to indicate the identification of individual additional interference fringe patterns along the illumination axis of the sensor array, which result from additional measurement or reference optical paths traveled therealong and have a geometric length greater than the geometric length of the main measurement or reference optical path, which includes at least one partial back reflection at a surface of an optical element intervening along the optical path of the processing laser beam.

[0123] When multiple separate operating ranges are not opposed or overlapping on the sensor array, but are sufficiently separated to alternatively show individual interference fringes, the selection of the interference fringe pattern is automatic, producing an interference fringe pattern that falls on the surface of the sensor array S as a result of reaching a separation distance between the processing head and the material where only one of the main measurement beam and the additional measurement beam interferes with the reference beam.

[0124] In the previous condition, the difference in optical length between the additional measurement optical path and the reference optical path is determined as a function of the position of the additional interference fringe pattern along the illumination axis of the incident area, which indicates the difference between (i) the current separation distance between the processing head and the surface of the material in the processing area and (ii) a predetermined nominal separation distance.

[0125] In a different embodiment, the reference beam incident on the sensor array S comprises a main reference beam arising from a main reference optical path traveling along it and at least one additional multiplexed reference beam arising from an additional reference optical path traveling along it, which has a geometric length different from the geometric length of the main reference optical path.

[0126] In this embodiment, the method of the invention is based on detecting the position of an additional interference fringe pattern at a common incidence area of ​​the sensor array S, which is determined from the interference between the measurement beam and an additional reference beam.

[0127] In this case, the additional interference fringe pattern may, for example, include (i) a peak or maximum intensity of the optical radiation envelope that is different, e.g., lower, than the peak or maximum intensity of the optical radiation envelope of the main interference fringe pattern between the main measurement beam and the reference beam, or (ii) if it appears simultaneously with the main interference fringe pattern, a unique position of the optical radiation intensity envelope that is different from the unique position of the optical radiation intensity envelope of the main interference fringe pattern.

[0128] If multiple separate operating ranges are not facing or overlapping the sensor array and are sufficiently separated to alternatively show individual interference fringes, the interference fringe patterns are selected to select additional reference paths.

[0129] Thus, under the above conditions, the difference in optical length between the measurement optical path and the additional reference optical path is determined as a function of the position of the additional interference fringe pattern along the illumination axis of the incident area, which indicates the difference between (i) the current separation distance between the processing head and the surface of the material in the processing area, and (ii) a predetermined nominal separation distance.

[0130] As can be seen from Figure 10a, a sensor array S having an illumination axis with a small extension, for example half the extension adopted for the measurement in question, would allow detection of the separation distance between the machining head and the material surface in the same numerical range of 0.25 to 2 mm, depending on the signal measurement values ​​indicating the main interference fringe pattern in a first range and the signal measurement values ​​indicating the additional interference fringe pattern in a second range.

[0131] FIG. 10c shows a series of graphs representing measurements performed during the cutting process, in this example cutting a square incision with a width of 40 mm in a mild steel plate with a thickness of 3 mm, with the machining head operating at a nominal distance from the plate (which can vary between 1.3 and 1.2 mm during machining).

[0132] The top graph shows the time trends of a series of process parameters. In particular, V x and V y The curve shown as P represents the translational velocity of the cutting head in the orthogonal directions x and y on the cutting surface. L The curve shown as represents the light intensity of the processing laser beam, and the curve P r represents the assist gas pressure. The middle graph shows the measured trend of the actual separation distance between the processing head and the piece. The bottom graph shows the time trend of the interference fringes obtained using a spatial domain detection technique.

[0133] The precise determination of the separation distance between the processing head and the surface of the material in the processing area, even in the current processing area or in the calibration processing area, suitably allows the ECU unit for controlling the process of the laser processing machine to use feedback for the correction or control of the processing distance or other processing parameters, for example acting on the movement actuator means 40 to control the movement of the processing head, for example along the Z axis towards or away from the material as a function of the result of the interferometer measurement, for example to maintain the distance between the processing head and the material around a predetermined value as a function of a predetermined processing project. This is particularly useful for improving the efficiency of the cutting process, for example. Alternatively or additionally, by determining the separation distance between the processing head and the surface of the material, the ECU unit for controlling the process can use feedback to control the movement of the processing head along multiple axes instead of the Z axis by acting on the movement actuator means 40 after a spatial scan, for example to maintain the trajectory of the processing head along a predetermined path adapted to the morphology of the surface being processed, thus with a translation or tilt relative to the surface. This is particularly useful for optimizing the welding process, for example as a result of tracking the weld joint.

[0134] It should be noted that the designs proposed in the foregoing discussion are purely exemplary in nature and are not intended to limit the present invention. Those skilled in the art can easily implement the present invention in various embodiments, which do not deviate from the principles described herein and are therefore encompassed by this patent.

[0135] This is particularly applicable to measurement and reference optical paths involving optical elements different from those cited or, as a non-limiting example, shown in FIG. 5 with respect to the possibility of using different low-coherence optical radiation wavelengths.

[0136] Naturally, without prejudice to the principles of the invention, the embodiments and implementation details may be varied considerably with respect to what has been described and illustrated purely as non-limiting examples, without departing from the scope of protection of the invention as defined by the appended claims.

Claims

1. 1. In a machine for laser processing of a material, operating with a high-power processing laser beam emitted by a processing head and directed along a processing trajectory on the material comprising a series of processing zones, a method for determining a separation distance between a processing head and a surface of the material in said processing zones, comprising: - generating a measurement beam of measurement low-coherence optical radiation, directing said measurement beam via said processing head towards the processing area and directing the measurement beam reflected or scattered from the surface of the material in the processing area along a first direction of incidence via said processing head towards an optical interferometric sensor means, the measurement beam travelling along a measurement optical path from a respective light source to said optical interferometric sensor means, the measurement optical path including a first section between said light source and the processing head and a second section between said processing head and the interferometric sensor means, the measurement optical path having a respective predetermined and invariant geometric length; - generating a reference beam of said low coherence optical radiation, directing said reference beam towards said optical interference sensor means along a second direction of incidence at a predetermined angle of incidence relative to the first direction of incidence of said measurement beam, said reference beam traversing a reference optical path of an optical length corresponding to an optical length of a measurement optical path at a nominal operating condition in which the distance between the processing head and the surface of the material corresponds to a predetermined nominal separation distance; - superimposing a measurement beam and a reference beam along a predetermined illumination axis onto a common incidence area of ​​said optical interference sensor means; - detecting a position of an interference fringe pattern between a measurement beam and a reference beam along the illumination axis on the common incidence area, the extension of the interference fringe pattern along the illumination axis corresponding to a coherence length of the low coherence optical radiation; - determining a difference in optical length between a measurement optical path and a reference optical path as a function of the position of the interference fringe pattern along the illumination axis of the common entrance area, the difference in optical length indicating a difference between (a) a current separation distance between a processing head and a surface of a material in the processing area, and (b) a predetermined nominal separation distance.

2. The method of claim 1 , wherein the position of the interference fringe pattern along the illumination axis is a unique position of an envelope of the intensity of the optical radiation of the interference fringe pattern.

3. The method of claim 2 , wherein the characteristic position of the envelope of the intensity of the optical radiation of the interference fringe pattern is a position of a peak or maximum of the envelope of the intensity of the optical radiation.

4. the optical interference sensor means comprises an array of photodetectors along the illumination axis; The method of claim 1 or 2, wherein the angle of incidence is controlled such that the spatial frequency of the interference fringe pattern is greater than the spatial frequency of the photodetector.

5. The method of claim 4 , wherein the spatial frequency of the interference fringe pattern is different from a multiple of the spatial frequency of the photodetector, and is preferably close to a half integer multiple of the spatial frequency of the photodetector.

6. the optical interference sensor means comprises an array of photodetectors along the illumination axis; The method of claim 1 , wherein the array of photodetectors is a linear array of photodetectors.

7. the optical interference sensor means comprises an array of photodetectors along the illumination axis; The method of claim 1 , wherein the array of photodetectors is a two-dimensional arrangement of photodetectors.

8. A machine for laser cutting, drilling or welding of a material or for additive manufacturing of three-dimensional structures by laser, said machine comprising a processing head arranged close to said material and having a nozzle for providing a flow of assist gas, The method according to any one of claims 1 to 7, wherein a measurement beam is guided through the nozzle and directed towards a measurement area of ​​material coaxial with or adjacent to the processing area, preferably ahead of it along the processing trajectory.

9. A machine for laser welding of materials or additive manufacturing of three-dimensional structures by laser, said machine comprising a processing head having an output of a high-power processing laser beam arranged in close proximity to said material, The method according to any one of claims 1 to 7, wherein a measurement beam is guided via the output of the high-power processing laser beam and directed towards a measurement area of ​​material coaxial with or adjacent to the processing area, preferably behind it along the processing trajectory.

10. 10. The method according to claim 8 or 9, wherein the measurement beam is directed towards the measurement area by means of an optical scanning system, the tilt of the optical scanning system being controlled according to the absolute value and direction of the advancement speed of the processing head along the processing path.

11. A method according to any one of claims 1 to 10, wherein the illumination axis of the common incident area is determined by the intersection of a plane defined by the incident angle with a detection surface of the optical interference sensor means.

12. the measurement optical path and the reference optical path include corresponding optical elements; the reference optical path includes a reflective return element corresponding to a surface of a material interposed in the measurement optical path; A method according to any one of claims 1 to 11, comprising: an optical attenuation means configured to balance the intensity of the reference optical radiation reflected by the reflection back element with respect to the intensity of the measurement optical radiation reflected by the material to be processed.

13. the measurement optical path and the reference optical path originate from a common light source, are separated using a beam splitting means, and are separately directed to a surface of the material to be processed and to the reflective return element, respectively, and are collected in a detection optical path; 13. The method of claim 12, wherein in the detection optical path, a measurement beam is separated from a reference beam, and the measurement beam and the reference beam are directed at a controllable orientation towards the common incidence area of ​​an optical interference sensor means, the controllable orientation determining an angle of incidence between the measurement beam and the reference beam.

14. A machine for laser cutting, drilling or welding of materials or for additive manufacturing of three-dimensional structures by laser, comprising a processing head having a nozzle for providing a flow of assist gas, a measurement beam is directed through the nozzle; 2. The method of claim 1, wherein the determination of the optical length difference between the measurement optical path and the reference optical path is based on a normalized optical length of the measurement optical path calculated starting from a geometric length and a normalized refractive index of a portion of the measurement optical path passing through a chamber of an assist gas of the nozzle, which is calculated as a function of the pressure of the assist gas in the chamber according to a predetermined nominal dependence of the refractive index of the assist gas on the pressure of the gas.

15. 2. The method of claim 1, wherein the determination of the optical length difference between the measurement optical path and the reference optical path is based on a normalized optical length of the measurement optical path calculated from a geometric length and a normalized refractive index of a transmission medium of a portion of the measurement optical path, the normalized optical length of the measurement optical path being calculated as a function of a temperature, pressure or mechanical deformation of the at least a portion of the measurement optical path according to a predetermined nominal dependence of the refractive index on the temperature, pressure or mechanical deformation of the transmission medium of the measurement beam.

16. The determination of the optical length difference between the measurement optical path and the reference optical path is based on a normalized optical length of the measurement optical path, calculated starting from a normalized geometric length and a refractive index of a material transmission medium of a portion of the measurement optical path; 2. The method of claim 1, wherein the normalized geometric length is calculated as a function of a mechanical deformation of a material transmission medium according to a predetermined nominal dependence of the geometric length of the measurement beam on the mechanical deformation of the material transmission medium.

17. determining a perturbation of a current optical length of at least a portion of the measurement optical path relative to a current optical length of at least a portion of the reference optical path; and correcting the determined value of the separation distance between the processing head and the surface of the material based on the perturbation. the measurement beams incident on the optical interference sensor means include at least one calibration measurement beam resulting from travelling a calibration measurement optical path; the measurement beam is reflected or diffused by at least one retroreflective surface of a static optical element interposed along the measurement optical path; said reference beams incident on said optical interference sensor means include individual calibration reference beams resulting from the travel of calibration reference optical paths having optical lengths corresponding to the optical lengths of the calibration measurement optical paths at nominal operating conditions of calibration, in which the geometric length and the refractive index of the transmission medium of the calibration measurement optical paths are equal to the geometric length and the refractive index of the transmission medium of the calibration reference optical paths within a predetermined tolerance; Determining a perturbation of a current optical length of at least a portion of the measurement optical path includes: - superimposing a calibration measurement beam and a calibration reference beam along a predetermined illumination axis on a common incidence area of ​​said optical interference sensor means; Detecting a position of an interference fringe pattern between a calibration measurement beam and a calibration reference beam along the illumination axis on the common incidence area; determining an optical length difference between a calibration measurement optical path and a calibration reference optical path, each depending on a position of the interference fringe pattern along the illumination axis of the common incidence area; the optical length difference indicates (a) a difference between the geometric length of the calibration measurement optical path and the geometric length of the calibration reference optical path, and / or (b) a difference between the refractive index of the calibration measurement optical path and the refractive index of the calibration reference optical path; The method of any one of claims 1 to 16, wherein the optical length difference between the calibration measurement optical path and the calibration reference optical path is indicative of the perturbation in the current optical length of at least a portion of a measurement optical path.

18. 15. The method of claim 14, wherein the pressure of the assist gas in the assist gas chamber of the nozzle is directly sensed using a pressure sensor facing said chamber.

19. the pressure of the assist gas in the assist gas chamber of the nozzle is indirectly derived from a measurement of a change in the local position of a surface of an optical element protecting or delimiting the assist gas chamber along the axis of the measurement beam, according to a predetermined nominal relationship between the position of the surface of said optical element protecting or delimiting the assist gas chamber and a predetermined nominal position and pressure of the assist gas; Measuring the change in local position of the surface of the protective or demarcating optical element of the assist gas chamber comprises: an additional measurement optical path for measuring the protective or demarcating optical element, the additional measurement optical path including at least one of: (i) a first section between a measurement beam source and a protective or demarcating optical element on a first surface on which the measurement beam is incident with partial back reflection; and (ii) a second section between a surface of the material to be processed and a protective or demarcating optical element on a second surface on which the measurement beam is incident with partial back reflection; The method of claim 14, wherein the method is determined as a function of the difference in length between an additional reference optical path having an optical length equal to the optical length of the additional measurement optical path of the protective or boundary setting optical element at a nominal operating condition including partial back reflection of the measurement beam on the first or second surface of the protective or boundary setting optical element when it is at the predetermined nominal position along the axis of the processing laser beam for a predetermined reference pressure value of the assist gas in the assist gas chamber of the nozzle.

20. The measurement beam incident on the optical interference sensor means comprises: a main measurement beam resulting from travelling along a main measurement optical path with reflection from a surface of the material within the processing region and transmission through each optical element intervening along the optical path of the high power processing laser beam; at least one additional multiplexed measurement beam resulting from the travel of an additional measurement optical path having a geometric length greater than the geometric length of the main measurement optical path with reflection from a surface of the material to be processed, which includes at least partial back reflection at a surface of an optical element interposed along the optical path of the high-power processing laser beam; The method comprises: - detecting, on said common incidence region, the position of an additional interference fringe pattern having (i) a peak or maximum of the intensity of the optical radiation different from the peak or maximum of the intensity of the optical radiation of the main interference fringe pattern between the main measurement beam and the reference beam, or (ii) a unique position of the envelope of the intensity of the optical radiation that is offset from the unique position of the envelope of the intensity of the optical radiation of the main interference fringe pattern; A method according to any one of claims 1 to 19, comprising: determining a difference in optical length between an additional measurement optical path and a reference optical path as a function of the position of the additional interference fringe pattern along the illumination axis of the common entrance area, the difference in optical length being indicative of the difference between (i) a current separation distance between the processing head and a surface of the material in the processing area, and (ii) the predetermined nominal separation distance.

21. The reference beam incident on the optical interference sensor means is a main reference beam resulting from travelling along a main reference optical path; and at least one additional multiplexed reference beam resulting from the travel of an additional reference optical path having a geometric length different from that of the main reference optical path; The method comprises: - detecting, on said common incidence region, the position of an additional interference fringe pattern having (i) a peak or maximum of the intensity of the optical radiation different from the peak or maximum of the intensity of the optical radiation of the main interference fringe pattern between the measurement beam and the main reference beam, or (ii) a unique position of the envelope of the intensity of the optical radiation offset from the unique position of the envelope of the intensity of the optical radiation of the main interference fringe pattern; A method according to any one of claims 1 to 20, comprising: determining a difference in optical length between a measurement optical path and an additional reference optical path as a function of the position of the additional interference fringe pattern along the illumination axis of the common entrance area, the difference in optical length being indicative of the difference between (i) a current separation distance between the processing head and a surface of the material in the processing area, and (ii) a predetermined nominal separation distance.

22. 1. In a machine for laser processing of a material, operating with a high-power processing laser beam emitted by a processing head and directed along a processing trajectory on the material comprising a series of processing zones, a method for determining a separation distance between a processing head and a surface of the material in said processing zones, comprising: - carrying out a method for determining a separation distance between a processing head and a surface of a material according to any one of claims 1 to 21; and moving the machining head towards or away from the material, or in a translational or tilted state relative to the surface, as a function of a predetermined machining design and a determined separation distance between the machining head and the surface of the material.

23. 1. In a machine for laser processing of a material, operating with a high-power processing laser beam emitted by a processing head and directed along a processing trajectory on the material including a series of processing zones, a system for determining a separation distance between a processing head and a surface of the material in said processing zones, comprising: - means for generating a measurement beam of measurement low coherence optical radiation; - means for propagation of the measurement beam arranged to direct the measurement beam via the processing head towards the processing area and to direct the measurement beam reflected or diffused at a surface of a material in the processing area along a first direction of incidence via the head towards an optical interferometric sensor means, the measurement beam travelling along a measurement optical path from a respective light source to the optical interferometric sensor means, the measurement optical path comprising a first section between the light source and the processing head and a second section between the processing head and the interferometric sensor means, the measurement optical path having a respective predetermined and invariant geometric length; - means for generating a reference beam of said low coherence optical radiation; - means for propagation of the reference beam configured to direct the reference beam towards the optical interference sensor means along a second direction of incidence at a predetermined angle of incidence with respect to the first direction of incidence of the measurement beam, the reference beam traveling a reference optical path of an optical length corresponding to an optical length of a measurement optical path at a nominal operating condition in which the distance between the processing head and the surface of the material corresponds to a predetermined nominal separation distance, the means for propagation of the measurement beam and the means for propagation of the reference beam are configured to overlap the measurement beam and the reference beam on a common incidence area of ​​the optical interference sensor means along a predetermined illumination axis; The system further comprises: - means for detecting a position of an interference fringe pattern between a measurement beam and a reference beam along the illumination axis on the common incidence area, the extension of the interference fringe pattern along the illumination axis corresponding to a coherence length of the low coherence optical radiation; and - A system comprising a processing means configured to determine a difference in optical length between a measurement optical path and a reference optical path as a function of the position of the interference fringe pattern along the illumination axis of the common entrance area, the difference in optical length indicating the difference between (a) a current separation distance between the processing head and a surface of the material in the processing area, and (b) a predetermined nominal separation distance.

24. 1. A machine for laser processing of a material, which operates with a high power processing laser beam emitted by a processing head and directed along a processing trajectory on the material comprising a series of processing areas, comprising: means for controlling a relative position between the processing head and the material; a system for determining a separation distance between the processing head and a surface of a material at the processing area; 22. A method for carrying out a method according to any one of claims 1 to 21, The machine, wherein the means for controlling the relative position between the processing head and the material operates according to a predetermined processing design and a determined separation distance between the processing head and a surface of the material.

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