Optical detection device and optical detection system

Abstract

To solve such a problem that an electric charge generated by a tunnel effect increases in proportion to the area of a region where an electric charge is detected, on the other hand, if the area of the region where an electric charge is detected is decreased, an electric charge generated by the tunnel effect can be suppressed, however, if the area of the region where an electric charge is detected is decreased, there is a possibility of lowering photo-detection efficiency.SOLUTION: In plane view, a first semiconductor region of a first conductivity type overlaps at least a portion of a third semiconductor region, a second semiconductor region overlaps at least a portion of a fourth semiconductor region of a second conductivity type, a height of a potential of the third semiconductor region with respect to an electric charge of the first conductivity type is lower than that of the fourth semiconductor region, and a difference between a height of a potential of the first semiconductor region and that of the third semiconductor region is larger than a difference between a height of a potential of the second semiconductor region and that of the fourth semiconductor region.SELECTED DRAWING: Figure 1

Description

[Technical field]

[0001] The present invention relates to a photodetection device and a photodetection system that perform photoelectric conversion. [Background technology]

[0002] 2. Description of the Related Art Conventionally, there has been known a photodetection device capable of detecting weak light at the single photon level by utilizing avalanche (electron avalanche) multiplication.

[0003] Patent Document 1 discloses a SPAD (Single Photon Avalanche Diode) in which photocharges resulting from a single photon undergo avalanche amplification in a PN junction region of a semiconductor region that constitutes a photoelectric conversion unit.

[0004] In addition, the SPAD of Patent Document 1 has a P-type semiconductor region with a high impurity concentration arranged on the surface of a semiconductor substrate, and an N-type semiconductor region arranged below the P-type semiconductor region. The N-type semiconductor region is arranged so as to be included in an N-type epitaxial layer. The P-type semiconductor region and the N-type semiconductor region form a PN junction, and a high reverse bias voltage is applied to the PN junction. [Prior art documents] [Patent documents]

[0005] [Patent Document 1] U.S. Pat. No. 9,209,336 Summary of the Invention [Problem to be solved by the invention]

[0006] In the SPAD described in Patent Document 1, the region where charge is detected is a PN junction region. Since a strong electric field is generated in the region where charge is detected, there is a risk that a tunnel effect will occur between the PN junctions due to the strong electric field. Charges generated by the tunnel effect will be detected as false signals in the region where charge is detected, and may become noise. The amount of charge generated by this tunnel effect increases in proportion to the area of ​​the region where charge is detected.

[0007] On the other hand, if the area of ​​the region for detecting electric charges is reduced, it is possible to suppress the electric charges generated by the tunnel effect, but if the area of ​​the region for detecting electric charges is reduced, there is a risk that the light detection efficiency will decrease.

[0008] SUMMARY OF THE PRESENT EMBODIMENTS Accordingly, an object of the present invention is to provide a photodetection device capable of suppressing a decrease in photodetection efficiency while suppressing noise. [Means for solving the problem]

[0009] The present invention relates to A photodetector having a semiconductor substrate having a first surface and a second surface opposite to the first surface, and a region in which a plurality of avalanche diodes are arranged in the semiconductor substrate, the avalanche diodes each comprising a first semiconductor region of a first conductivity type arranged at a first depth with respect to the first surface, a second semiconductor region of a second conductivity type opposite to the first conductivity type arranged at a second depth with respect to the first surface that is deeper than the first depth, a third semiconductor region of the first conductivity type arranged at a third depth with respect to the first surface that is deeper than the second depth and has a lower impurity concentration than the first semiconductor region, and a fourth semiconductor region of the second conductivity type provided between the third semiconductor regions of each of the avalanche diodes, and a fifth semiconductor region of the second conductivity type arranged at a fourth depth with respect to the first surface that is deeper than the third semiconductor regions, the first semiconductor region and the second semiconductor region are configured to form a region where avalanche amplification occurs, an area of ​​a region where the first semiconductor region and the second semiconductor region overlap in a plan view is smaller than an area of ​​the third semiconductor region, and the fourth semiconductor region is electrically connected to the second semiconductor region and the fifth semiconductor region. It is characterized by: Effect of the Invention

[0010] According to the present invention, it is possible to suppress a decrease in light detection efficiency while suppressing noise. [Brief description of the drawings]

[0011] [Figure 1] Cross-sectional diagram of an avalanche diode [Diagram 2] Planar schematic diagram of an avalanche diode [Diagram 3] Potential diagram of an avalanche diode [Figure 4] Photodetector block diagram [Diagram 5] Block diagram of a pixel including its equivalent circuit [Figure 6] Cross-sectional diagram of an avalanche diode [Figure 7] Planar schematic diagram of an avalanche diode [Figure 8] Avalanche diode manufacturing method [Figure 9] Equivalent circuit diagram [Figure 10] Cross-sectional diagram of an avalanche diode [Figure 11] Cross-sectional diagram of an avalanche diode [Figure 12]Cross-sectional diagram of an avalanche diode [Figure 13] Planar schematic diagram of an avalanche diode [Figure 14] Cross-sectional diagram of an avalanche diode [Figure 15] Planar schematic diagram of an avalanche diode [Figure 16] Cross-sectional diagram of an avalanche diode [Figure 17] Optical detection system block diagram [Figure 18] Optical detection system block diagram [Figure 19] Optical detection system block diagram [Figure 20] Cross-sectional diagram of an avalanche diode DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0012] The photodetector of this embodiment will be described with reference to Figures 1 to 3. The photodetector of this embodiment has pixels including avalanche diodes. The conductivity type of the charge pairs generated in the avalanche diodes and used as signal charges is called the first conductivity type. The conductivity type opposite to the first conductivity type is called the second conductivity type.

[0013] 1 is a schematic cross-sectional view of an avalanche diode in this embodiment. The avalanche diode in this embodiment is disposed on a semiconductor substrate 15. The semiconductor substrate 15 has a first surface and a second surface opposite to the first surface. For example, the first surface is the front surface of the semiconductor substrate 15, and the second surface is the back surface of the semiconductor substrate 15. In this embodiment, the depth direction is from the first surface to the second surface. A gate electrode of a transistor and a multilayer wiring structure are disposed on the front surface side of the semiconductor substrate 15.

[0014] In FIG. 1, in a region sandwiched between isolation portions 16, a first semiconductor region 71 of a first conductivity type, a second semiconductor region 76, a third semiconductor region 74, a fourth semiconductor region 72 of a second conductivity type, and a fifth semiconductor region 75 are arranged.

[0015] A first semiconductor region 71 and a second semiconductor region 76 are disposed at the first depth X. The first semiconductor region 71 and the second semiconductor region 76 are in contact with each other. The second semiconductor region 76 is disposed between the first semiconductor region 71 and the isolation portion 16. Here, disposing the first semiconductor region 71 and the second semiconductor region 76 at the first depth X means, for example, that a region (peak) with the highest concentration of implanted impurities is disposed at the first depth X. However, it is not necessarily required that the peak is disposed at the first depth X, and design errors and manufacturing errors are also allowed.

[0016] The third semiconductor region 74 and the fourth semiconductor region 72 are disposed at a second depth Y that is deeper than the first depth X from the first surface. The third semiconductor region 74 and the fourth semiconductor region 72 are in contact with each other.

[0017] The first semiconductor region 71 overlaps with at least a portion of the third semiconductor region 74, and the second semiconductor region 76 overlaps with at least a portion of the fourth semiconductor region 72. The fourth semiconductor region 72 is disposed between the third semiconductor region 74 and the isolation portion 16.

[0018] A fifth semiconductor region 75 is disposed at a third depth Z that is deeper than the second depth Y from the first surface. The third semiconductor region 74 and the fourth semiconductor region 72 overlap with the fifth semiconductor region 75.

[0019] 2A is a schematic plan view at a first depth X, and FIG. 2B is a schematic plan view at a second depth Y. FIG.

[0020] 2(a), at the first depth X, the first semiconductor region 71 is contained within the second semiconductor region 76. The second semiconductor region 76 is contained within the isolation portion 16.

[0021] 2(b), at the second depth Y, the third semiconductor region 74 is included in the fourth semiconductor region 72. The fourth semiconductor region 72 is included in the isolation portion 16. As is clear from FIGS. 1 and 2, in a plan view, the first semiconductor region 71 overlaps with at least a portion of the third semiconductor region 74, and the third semiconductor region 74 and the fourth semiconductor region 72 overlap with the fifth semiconductor region 75. Furthermore, the second semiconductor region 76 overlaps with at least a portion of the fourth semiconductor region 72.

[0022] Figure 3 shows a potential diagram of an avalanche diode. Figure 3 shows an example of the potential distribution of line segments JK and GH in the cross-sectional view shown in Figure 1. Dotted line 20 shows the potential distribution of line segment GH, and solid line 21 shows the potential distribution of line segment JK. Here, the potential is shown as seen from the perspective of electrons, which are signal charges. Note that if the signal charges are holes, the relationship between high and low potentials is reversed.

[0023] 3, depths X, Y, Z, and W correspond to the depths shown in FIG. 1, and depth W is an arbitrary depth between depth Y and depth Z.

[0024] The height of the potential of the XH level indicates the height of the potential of the fourth semiconductor region 72. The height of the potential of the H level indicates the height of the potential of the third semiconductor region 74. The height of the potential of the M level is the height of the potential of the second semiconductor region 76. The height of the potential of the L level indicates the height of the potential of the first semiconductor region 71. Note that, although it has been stated here that the height of the potential of the second semiconductor region 76 is lower than the height of the potential of the third semiconductor region 74, the opposite may also be true.

[0025] The dotted line 20 indicates the height of the potential between the XH level and the H level at depth Z. The potential gradually decreases as one approaches depth W from depth Z. Then, the potential gradually increases as one approaches depth Y from depth W, and at depth Y, the potential is at the XH level. The potential gradually decreases as one approaches depth X from depth Y. At depth X, the potential is at the M level.

[0026] The solid line 21 indicates the potential height between the XH level and the H level at depth Z. The potential gradually decreases from depth Z until it approaches depth Y. As it approaches depth Y, the potential height begins to decrease sharply, and at depth Y, it reaches the H level potential height. The potential height decreases sharply from depth Y until it approaches depth X. Then, at depth X, it reaches the L level potential height.

[0027] At depth Z, the potentials of dotted line 20 and solid line 21 are approximately the same height, and in the region indicated by line segments GH and JK, there is a potential gradient that gradually decreases toward the first surface side of semiconductor substrate 15. Therefore, the charge generated in the photodetector moves toward the first surface side due to the gradual potential gradient.

[0028] As the distance approaches depth Y from depth W, the solid line 21 has a gradually decreasing potential gradient, and charges move toward the first surface. On the other hand, the dotted line 20 has a potential gradient that acts as a potential barrier against charges moving toward the first surface. This potential barrier (fourth semiconductor region 72) inhibits charges from moving from fifth semiconductor region 75 to second semiconductor region 76. Since the potential in the direction moving from line segment GH to line segment JK is lower than this potential barrier, charges present on line segment GH from depth W to depth Y tend to move to the vicinity of line segment JK as they move toward the first surface.

[0029] The charge that moves to the vicinity of the region indicated by the line segment JK is accelerated by a steep potential gradient, i.e., a strong electric field, from depth Y to depth X, and the accelerated charge reaches the first semiconductor region 71. Avalanche amplification occurs in the region from depth Y to X. In contrast, in the region indicated by the line segment GH, the potential distribution does not cause avalanche breakdown, or is less likely to cause avalanche breakdown than the region indicated by the line segment JK, particularly the region from depth Y to X of the line segment JK. As an example of realizing such a structure, it is preferable to configure the difference between the potential height of the first semiconductor region 71 and the potential height of the third semiconductor region 74 to be larger than the difference between the potential height of the second semiconductor region 76 and the potential height of the fourth semiconductor region 72.

[0030] By adopting such a potential structure, it is possible to reduce the noise charge generated by the above-mentioned tunnel effect, compared to a conventional structure in which avalanche breakdown occurs in the entire avalanche diode. In addition, the avalanche diode of this embodiment does not cause a decrease in sensitivity. This is because the potential structure allows the signal charge present in the region of the fifth semiconductor region 75 that overlaps with the fourth semiconductor region 72 to easily move to the first semiconductor region via the third semiconductor region 74.

[0031] Specifically, this is because the potential level of the third semiconductor region 74 is lower than the potential level of the fourth semiconductor region 72. In other words, the fourth semiconductor region 72 functions as a potential barrier against the signal charges present in the fifth semiconductor region 75, and as a result, the charges are more likely to move to the first semiconductor region 71 via the third semiconductor region 74.

[0032] 3 shows the potential structure when the third semiconductor region 74 is a P-type semiconductor region, but even if the third semiconductor region 74 is an N-type semiconductor region, the potential height at position Y is higher by the dotted line 20 than by the solid line 21. Also, although the potential structure when the second semiconductor region 76 is an N-type semiconductor region is shown, the potential height at position Y is higher by the dotted line 20 than by the solid line 21 even if the second semiconductor region 76 is a P-type semiconductor region.

[0033] In addition, it is preferable that the entire region of the first semiconductor region 71 overlaps with the third semiconductor region 74 in a plan view. With such a configuration, a PN junction is not formed between the first semiconductor region 71 and the fourth semiconductor region 72. Therefore, it is possible to suppress avalanche amplification from occurring at the PN junction between the first semiconductor region 71 and the fourth semiconductor region 72, and to suppress noise caused by the tunnel effect.

[0034] Hereinafter, the embodiments of the present invention will be described using specific examples. In each example, a configuration in which the signal charges are electrons will be described, but the present invention can also be applied to a case in which the signal charges are holes. In that case, the semiconductor regions and the potential relationships will be reversed.

[0035] Example 1 An embodiment of a photodetector applicable to the present invention will be described with reference to Figures 4 to 9. Furthermore, parts having the same functions as those in Figures 1 to 3 are given the same reference numerals, and detailed description thereof will be omitted.

[0036] 4 is a block diagram of a photodetector 1010 according to this embodiment. The photodetector 1010 includes a pixel section 106, a control pulse generator 109, a horizontal scanning circuit section 104, a column circuit 105, a signal line 107, and a vertical scanning circuit section 103.

[0037] The pixel section 106 has a plurality of pixels 100 arranged in a matrix. Each pixel 100 is composed of a photoelectric conversion element 101 and a pixel signal processing section 102. The photoelectric conversion element 101 converts light into an electrical signal. The pixel signal processing section 102 outputs the converted electrical signal to a column circuit 105.

[0038] The vertical scanning circuit unit 103 receives a control pulse supplied from a control pulse generating unit 109, and supplies the control pulse to each pixel 100. The vertical scanning circuit unit 103 uses logic circuits such as a shift register and an address decoder.

[0039] The signal line 107 supplies a signal output from the pixel 100 selected by the vertical scanning circuit unit 103 to a circuit subsequent to the pixel 100 as a potential signal.

[0040] The column circuit 105 receives signals from each pixel 100 via a signal line 107 and performs a predetermined process. The predetermined process is a process of removing noise from the input signal, amplifying the signal, and converting the signal into a form that can be output outside the sensor. For example, the column circuit has a parallel-serial conversion circuit.

[0041] The horizontal scanning circuit unit 104 supplies the column circuits 105 with control pulses for sequentially outputting the signals processed by the column circuits 105 to the output circuits 108 .

[0042] The output circuit 108 is composed of a buffer amplifier, a differential amplifier, etc., and outputs the signal output from the column circuit 105 to a recording unit or a signal processing unit outside the photodetector 1010.

[0043] 4, the pixels 100 in the pixel section 106 may be arranged one-dimensionally, or may be composed of only a single pixel. The vertical scanning circuit section 103, horizontal scanning circuit section 104, and column circuit 105 may be arranged for each block by dividing the pixel section 106 into a plurality of pixel columns, or may be arranged for each pixel column.

[0044] The functions of the pixel signal processing unit 102 do not necessarily need to be provided for each pixel 100. For example, one pixel signal processing unit 102 may be shared by a plurality of pixels 100, and signal processing may be performed sequentially. The pixel signal processing unit 102 may be provided on a semiconductor substrate different from that of the photoelectric conversion element 101 in order to increase the aperture ratio of the photoelectric conversion element 101. In this case, the photoelectric conversion element 101 and the pixel signal processing unit 102 are electrically connected via a connection wiring provided for each pixel. The vertical scanning circuit unit 103, the horizontal scanning circuit unit 104, the signal line 107, and the column circuit 105 may also be provided on different semiconductor substrates as described above.

[0045] An example of a block diagram of a pixel 100 including an equivalent circuit in this embodiment is shown in Fig. 5. In Fig. 5, one pixel 100 has a photoelectric conversion element 101 and a pixel signal processing unit 102.

[0046] The photoelectric conversion element 101 includes a photoelectric conversion unit 201 and a control unit 202 .

[0047] The photoelectric conversion unit 201 generates a pair of electric charges according to incident light through photoelectric conversion. The photoelectric conversion unit 201 uses an avalanche diode.

[0048] A potential based on a potential VH higher than the potential VL supplied to the anode is supplied to the cathode of the photoelectric conversion unit 201. A potential is supplied to the anode and cathode of the photoelectric conversion unit 201 so that a reverse bias is applied so that the photoelectric conversion unit 201 becomes an avalanche diode. By performing photoelectric conversion in a state where such a reverse bias potential is supplied, the charge generated by the incident light causes avalanche amplification, generating an avalanche current.

[0049] When a reverse bias potential is applied, and the potential difference between the anode and cathode is greater than the breakdown voltage, the avalanche diode operates in the Geiger mode. A SPAD is a photodiode that uses the Geiger mode to quickly detect weak signals at the single photon level.

[0050] Furthermore, when the potential difference between the anode and cathode of the photoelectric conversion unit 201 is equal to or greater than the potential difference at which the charge generated in the photoelectric conversion unit 201 causes avalanche amplification and is equal to or less than the breakdown voltage, the avalanche diode is in linear mode. An avalanche diode that detects light in linear mode is called an avalanche photodiode (APD). In this embodiment, the photoelectric conversion unit 201 may operate as either type of avalanche diode. The potential difference that causes avalanche amplification will be described later.

[0051] The control unit 202 is connected to a power supply voltage that supplies a high potential VH and the photoelectric conversion unit 201. The control unit 202 has a function of converting a change in avalanche current occurring in the photoelectric conversion unit 201 into a voltage signal. Furthermore, the control unit 202 functions as a load circuit (quench circuit) during signal amplification by avalanche amplification, and has a function of suppressing the avalanche amplification by suppressing the voltage supplied to the photoelectric conversion unit 201 (quench operation). As the control unit 202, for example, a resistive element or an active quench circuit that detects an increase in the avalanche current and performs feedback control to actively suppress the avalanche amplification is used.

[0052] The pixel signal processing unit 102 has a waveform shaping unit 203, a counter circuit 209, and a selection circuit 206. The waveform shaping unit 203 shapes a voltage change obtained when a photon level signal is detected, and outputs a pulse signal. For example, an inverter circuit is used as the waveform shaping unit 203. Although an example in which one inverter is used as the waveform shaping unit 203 has been shown, a circuit in which a plurality of inverters are connected in series may be used, or another circuit having a waveform shaping effect may be used.

[0053] The pulse signal output from the waveform shaping unit 203 is counted by the counter circuit 209. In the case of, for example, an N-bit counter (N: positive integer), the counter circuit 209 can count up to about 2 to the power of N pulse signals generated by a single photon. The counted signal is held as a detected signal. Furthermore, when a control pulse pRES is supplied via the drive line 207, the detected signal held in the counter circuit 209 is reset.

[0054] 4 via a drive line 208, the selection circuit 206 switches between electrical connection and non-connection between a counter circuit 209 and a signal line 107. The selection circuit 206 uses, for example, a transistor or a buffer circuit for outputting a signal to outside the pixel.

[0055] Note that electrical connection may be switched by disposing a switch such as a transistor between the control unit 202 and the photoelectric conversion unit 201 or between the photoelectric conversion element 101 and the pixel signal processing unit 102. Similarly, the supply of the high potential VH supplied to the control unit 202 or the low potential VL supplied to the photoelectric conversion element 101 may be electrically switched using a switch such as a transistor.

[0056] In a pixel section 106 in which a plurality of pixels 100 are arranged in a matrix, a captured image may be obtained by a rolling shutter operation in which the count of a counter circuit 209 is reset sequentially for each row, and the detected signals held in the counter circuit 209 are output sequentially for each row.

[0057] Alternatively, a captured image may be acquired by a global electronic shutter operation in which the counts of the counter circuits 209 of all pixel rows are reset simultaneously and the detected signals held in the counter circuits 209 are output row by row in sequence. When the global electronic shutter operation is performed, it is advisable to provide a means for switching between a case where the counter circuit 209 counts and a case where it does not. The switching means is, for example, the switch described above.

[0058] In this embodiment, a configuration has been shown in which a captured image is acquired using the counter circuit 209. However, instead of the counter circuit 209, a time to digital converter (hereinafter, referred to as TDC) and a memory may be used to configure the photodetection device 1010 to acquire the pulse detection timing.

[0059] At this time, the generation timing of the pulse signal output from the waveform shaping unit 203 is converted into a digital signal by the TDC. To measure the timing of the pulse signal, the TDC is supplied with a control pulse pREF (reference signal) from the vertical scanning circuit unit 103 in Fig. 4 via a drive line. The TDC acquires, as a digital signal, a signal obtained when the input timing of the signal output from each pixel via the waveform shaping unit 203 is converted into a relative time based on the control pulse pREF.

[0060] The TDC circuit may use, for example, a delay line method in which buffer circuits are connected in series to create a delay, a looped TDC method in which delay lines are connected in a loop, etc. Other methods may be used, but it is preferable to use a circuit method that can achieve a time resolution equal to or greater than that of the photoelectric conversion unit 201.

[0061] The digital signal indicating the pulse detection timing obtained by the TDC is stored in one or more memories. When multiple memories are provided, by supplying multiple signals to the selection circuit 206, when the digital signal stored in the memory is output to the signal line 107, it is possible to control the output to the signal line 107 for each memory.

[0062] A schematic cross-sectional view and a schematic plan view of the avalanche diode of this embodiment will be described with reference to Figures 6 and 7. In Figure 6, an N-type semiconductor region 1 is arranged in the region where the first semiconductor region 71 in Figure 1 is arranged, and an N-type semiconductor region 6 is arranged in the region where the second semiconductor region 76 in Figure 1 is arranged. In Figure 6, an N-type semiconductor region 4 is arranged in the region where the third semiconductor region 74 in Figure 1 is arranged, and a P-type semiconductor region 2 is arranged in the region where the fourth semiconductor region 72 in Figure 1 is arranged. In Figure 6, an N-type semiconductor region 5 is arranged in the region where the fifth semiconductor region 75 in Figure 1 is arranged.

[0063] First, the cross-sectional structure of the isolation portion 16 and the photoelectric conversion region sandwiched between the isolation portions 16 will be described with reference to FIG.

[0064] A semiconductor substrate 15 on which a plurality of pixels 100 are arranged is provided with an isolation portion 16 that isolates each of the plurality of pixels 100 from one another.

[0065] The separation section 16 is composed of a P-type semiconductor region arranged in the depth direction from the first surface. Specifically, as the separation section 16, a P-type semiconductor region 3 and a P-type semiconductor region 7 are arranged in this order in the depth direction from the first surface and are in contact with each other. Note that the P-type semiconductor region 3 is electrically connected to the P-type semiconductor region 7, a P-type semiconductor region 8 described below, and a P-type semiconductor region 2 described below.

[0066] The impurity concentration of the P-type semiconductor region 3 is higher than the impurity concentrations of each of the P-type semiconductor region 7, the P-type semiconductor region 8, and the P-type semiconductor region 2. This makes it possible to lower the contact resistance by connecting the P-type semiconductor region 3 and the contact plug 17 than by connecting the P-type semiconductor region 7 and the contact plug 17, for example.

[0067] The N-type semiconductor region 1 has a higher impurity concentration than the N-type semiconductor region 6, the N-type semiconductor region 4, and the N-type semiconductor region 5 described below. By setting the impurity concentration at such a level, it is possible to strengthen the electric field of the depletion layer generated in the N-type semiconductor region 1. Note that a potential that serves as a reverse bias with respect to the isolation portion 16 is supplied to the N-type semiconductor region 1.

[0068] The impurity concentration of the N-type semiconductor region 4 is set lower than the impurity concentration of the N-type semiconductor region 1. This makes it easier for charges near the N-type semiconductor region 4 to move to the N-type semiconductor region 1.

[0069] The impurity concentration of the N-type semiconductor region 6 is set to be lower than the impurity concentration of the N-type semiconductor region 1. For example, the impurity concentration of the N-type semiconductor region 1 is set to be 6.0×10 18 [atms / cm 3 ] or more, the impurity concentration of the N-type semiconductor region 6 is 1.0×10 16 [atms / cm 3 ] or more, 1.0×10 18 [atms / cm 3 ] below.

[0070] 6 shows a configuration in which the N-type semiconductor region 6 having no impurity concentration gradient is arranged in the second semiconductor region 76 in Fig. 1, but it is better for the semiconductor region arranged in the region in which the second semiconductor region 76 is arranged in Fig. 1 to be a region having an impurity concentration gradient. By configuring the region between the N-type semiconductor region 1 and the P-type semiconductor region 3 to have an impurity concentration gradient, a strong electric field that can be generated between the N-type semiconductor region 1 and the P-type semiconductor region 3 is alleviated compared to a case in which the N-type semiconductor region 6 does not have an impurity concentration gradient.

[0071] Two examples of regions having a gradient of impurity concentration will be described. In the first example, an N-type semiconductor region having an impurity concentration lower than that of the N-type semiconductor region 1 is arranged in a region close to the N-type semiconductor region 1, and an N-type semiconductor region having an impurity concentration lower than that of the N-type semiconductor region is arranged in a region close to the isolation section 16. In the second example, an N-type semiconductor region having an impurity concentration lower than that of the N-type semiconductor region 1 is arranged in a region close to the N-type semiconductor region 1, and a P-type semiconductor region having an impurity concentration lower than that of the P-type semiconductor region 3 is arranged in a region close to the isolation section 16. Specifically, as shown in FIG. 20, a P-type semiconductor region 2000 having an impurity concentration lower than that of the P-type semiconductor region 3 is provided between the P-type semiconductor region 3 and the N-type semiconductor region 6.

[0072] In this manner, by configuring the region between the N-type semiconductor region 1 and the P-type semiconductor region 3 to have an impurity concentration gradient, the strong electric field that can occur between the N-type semiconductor region 1 and the P-type semiconductor region 3 is alleviated compared to a case in which the N-type semiconductor region 6 does not have an impurity concentration gradient.

[0073] Next, the impurity concentration of the P-type semiconductor region 2 is set to be equal to or lower than that of the P-type semiconductor region 7. The P-type semiconductor region 2 and the N-type semiconductor region 4 form a PN junction. This PN junction causes the entire region of the N-type semiconductor region 4 to become a depletion layer region. Furthermore, this depletion layer region extends to a partial region of the N-type semiconductor region 1. A strong electric field is induced in the extended depletion layer region. This strong electric field causes avalanche amplification in the depletion layer region extending to a partial region of the N-type semiconductor region 1, and a current based on the amplified charge is output from the wiring 9. That is, in this embodiment, the photodetection region becomes the depletion layer region in a partial region of the N-type semiconductor region 1.

[0074] In this embodiment, the N-type semiconductor region 4 is configured as an N-type region rather than a P-type region in order to extend the depletion layer deeper into the N-type semiconductor region 5, thereby making it possible to acquire charges from deeper inside.

[0075] Also, if N-type semiconductor region 6 were a P-type semiconductor region, a depletion layer region would be formed between this P-type semiconductor region and N-type semiconductor region 1, and avalanche amplification would likely occur between the P-type semiconductor region and N-type semiconductor region 1. If the depletion layer region expands closer to the first surface of P semiconductor substrate 15, noise would increase, and therefore in this embodiment, N-type semiconductor region 1 is configured as an N type.

[0076] Furthermore, the impurity concentrations of the N-type semiconductor region 1, the N-type semiconductor region 4, and the P-type semiconductor region 2 are set to impurity concentrations that do not deplete the entire region of the N-type semiconductor region 1 when a potential difference that causes avalanche amplification is supplied in a depletion layer region generated in a part of the N-type semiconductor region 1. This is because if the depletion layer region expands so as to contact the first surface of the semiconductor substrate 15, noise may occur on the first surface of the semiconductor substrate 15. On the other hand, the impurity concentrations are set to such that the entire region of the N-type semiconductor region 4 is depleted.

[0077] The condition for depleting all of the N-type semiconductor region 4 is shown in Equation 1. Here, the impurity concentration of the N-type semiconductor region 4 is the impurity concentration Nd, the impurity concentration of the P-type semiconductor region 2 is the impurity concentration Na, and the elementary charge is the elementary charge q. Furthermore, the dielectric constant of the semiconductor is the dielectric constant ε, the potential difference between the PN junction of the N-type semiconductor region 4 and the P-type semiconductor region 2 is the potential difference V, and the length of the N-type semiconductor region 4 sandwiched between the P-type semiconductor regions 2 is the length D.

[0078]

number

[0079] The impurity concentration at which the entire N-type semiconductor region 1 is not depleted is, for example, 6.0×10 18 [atms / cm 3 In this case, the impurity concentration that satisfies these depletion conditions is 1.0×10 16 [atms / cm 3 The impurity concentration of the N-type semiconductor region 4 is 1.0×10 17 [atms / cm 3 However, the impurity concentrations are not limited to these.

[0080] Then, the potential difference between the N-type semiconductor region 1 and the separation portion 16 is set so that the electric field in the depth direction induced in the extended depletion layer becomes sufficiently large. Here, the sufficiently large potential difference is a potential difference that causes avalanche amplification of charges affected by the electric field. In other words, it is the potential difference between the N-type semiconductor region 1 and the P-type semiconductor region 3 that realizes the photoelectric conversion portion 201 to operate as an avalanche diode (APD or SPAD).

[0081] Specifically, the potential difference between the N-type semiconductor region 1 and the P-type semiconductor region 2 is 6 V or more. At this time, as described above, the entire region of the N-type semiconductor region 4 electrically connected to the N-type semiconductor region 1 becomes a depletion layer region, and a strong electric field that causes avalanche amplification is generated in the depletion layer region extending to a portion of the N-type semiconductor region 1.

[0082] In addition, taking into consideration the impurity concentration that satisfies the above-mentioned depletion condition, it is more preferable that the potential difference between the N-type semiconductor region 1 and the P-type semiconductor region 3 is 10 V or more and 30 V or less. In this case, for example, a potential of 10 V or more is supplied to the N-type semiconductor region 1, and a potential of 0 V or less is supplied to the P-type semiconductor region 3. However, as long as the potential difference is 6 V or more, the potential values ​​are not limited to these.

[0083] In addition, the depletion layer formed between the P-type semiconductor region 2 and the N-type semiconductor region 6 may spread to the N-type semiconductor region 1, causing avalanche amplification. In this case, if the entire N-type semiconductor region 1 is depleted, noise may be generated. Therefore, it is preferable to set the impurity concentration of the N-type semiconductor region 1 so that the entire N-type semiconductor region 1 is not depleted.

[0084] In the present embodiment, charges are generated in the N-type semiconductor region 5 and collected and read out in the N-type semiconductor region 1. That is, charges generated in the semiconductor region of the first conductivity type are read out from the semiconductor region of the first conductivity type.

[0085] In contrast, in the device described in U.S. Pat. No. 9,209,336, charges generated in the N-type epitaxial layer 2 are avalanche amplified at the interface between the N-type epitaxial layer 2 and the p-type anode region 14, and the charges are read out from the p-type anode region 14. In other words, charges generated in the first conductivity type semiconductor region are read out from the second conductivity type semiconductor region. In this respect as well, this embodiment differs from the device described in U.S. Pat. No. 9,209,336.

[0086] In FIG. 6, it is assumed that the P-type semiconductor region 2 and the N-type semiconductor region 4 are not provided, and an N-type semiconductor region 5 having a lower impurity concentration than the N-type semiconductor region 1 is disposed immediately below the N-type semiconductor region 1 having a high impurity concentration. In this case, it is possible to generate charges in the N-type semiconductor region 5 and read the charges from the N-type semiconductor region 1, but it is difficult to perform avalanche amplification under voltage conditions equivalent to those of this embodiment. This is because most of the potential difference applied between the N-type semiconductor region 1 and the P-type semiconductor region 3 is applied to the depletion layer region of the N-type semiconductor region 5, so that the potential difference applied to the avalanche amplification region near the N-type semiconductor region 1 becomes small. On the other hand, in this embodiment, the N-type semiconductor region 5 is surrounded by P-type semiconductor regions in all directions except the portion in contact with the N-type semiconductor region 4, so that the potential of the N-type semiconductor region 5 is closer to the level of the surrounding P-type semiconductor regions than the N-type semiconductor region 1. In other words, by suppressing the excessive spread of the depletion layer deep into the substrate in the P-type semiconductor region 2, it becomes possible to concentrate most of the applied potential difference in the avalanche amplification region near the N-type semiconductor region 1. As a result, photocharges can be avalanche-amplified at a lower voltage.

[0087] Next, the impurity concentration of the N-type semiconductor region 5 is equal to or lower than the impurity concentration of the N-type semiconductor region 4. For example, the impurity concentration of the N-type semiconductor region 5 is 1.0×10 17 [atms / cm 3] or less. Since it is "or less", the impurity concentration of the N-type semiconductor region 5 and the impurity concentration of the N-type semiconductor region 4 may be the same. Furthermore, it is sufficient that the impurity concentration of the N-type semiconductor region 5 is at least less than the impurity concentration of the N-type semiconductor region 1.

[0088] 6, the N-type semiconductor region 5 is shown as an example of a region having the same impurity concentration. However, it is preferable that the N-type semiconductor region 5 has an impurity concentration gradient so as to form a potential structure in which charges move toward the first surface side of the semiconductor substrate 15. By providing such an impurity concentration gradient, it is possible to facilitate the movement of charges to the N-type semiconductor region 1.

[0089] In addition, when the impurity concentration has a gradient such that a potential structure is formed in which charges move toward the first surface side of the semiconductor substrate 15, in the region in which the N-type semiconductor region 5 is arranged, the first surface side may be an N-type semiconductor region, and the second surface side may be a P-type semiconductor region.

[0090] Alternatively, a P-type semiconductor region having an impurity concentration lower than the impurity concentration of the P-type semiconductor region 2 may be disposed in place of the N-type semiconductor region 5. Even in this case, it is preferable to have an impurity concentration gradient so as to achieve a potential structure in which charges move toward the first surface side of the semiconductor substrate 15.

[0091] For example, this P-type semiconductor region has a first region, a second region disposed at a deeper position than the first region with respect to the first surface, and a third region disposed at a deeper position than the second region with respect to the first surface. When the first region has a first impurity concentration, the second region has a second impurity concentration, and the third region has a third impurity concentration, the first impurity concentration may be less than the second impurity concentration less than the third impurity concentration. The first impurity concentration is lower than the impurity concentration of the P-type semiconductor region 2. Here, the P-type semiconductor region disposed in place of the N-type semiconductor region 5 is divided into three regions, but this is not limited to the above.

[0092] The P-type semiconductor region 8 is disposed at a deeper position than the N-type semiconductor region 5, and defines the depth of the photoelectric conversion region. The N-type semiconductor region 5 forms PN junctions with each of the P-type semiconductor region 2, the P-type semiconductor region 7, and the P-type semiconductor region 8. The impurity concentration of the P-type semiconductor region 8 is made higher than the impurity concentration of the P-type semiconductor region 2. This makes it easier for charges generated near the P-type semiconductor region 8 to move in the direction of the first surface.

[0093] A contact plug 18 is connected to the N-type semiconductor region 1, and a wiring 9 is connected to the contact plug 18. A contact plug 17 is connected to the P-type semiconductor region 3, and a wiring 10 is connected to the contact plug 17. The wiring 9 or the wiring 10 is connected to a control unit 202 such as a resistance element for performing a quenching operation. In the following description, it is assumed that the control unit 202 is connected to the wiring 9.

[0094] 6, the contact plug 17 and the wiring 10 are described as being disposed on the first surface side. However, the contact plug 17 and the wiring 10 may be disposed on the second surface side.

[0095] When the contact plug 17 and the wiring 10 are disposed on the second surface side, it is preferable that the impurity concentration of the region of the P-type semiconductor region 8 where the contact plug 17 is disposed is higher than the impurity concentration of the P-type semiconductor region 7. In other words, it becomes a P-type semiconductor region 3. At this time, the contact plug 17 is no longer connected to the P-type semiconductor region 3 that was disposed on the first surface side, so it is preferable that the impurity concentration is approximately the same as that of the P-type semiconductor region 7. This makes it possible to alleviate the electric field generated between the P-type semiconductor region 3 and the N-type semiconductor region 1.

[0096] Even when the isolation portion 16 has an insulating isolation portion on the first surface side, the contact plugs 17 and 10 are disposed on the second surface side. In this case, the isolation portion 16 is disposed in contact with the insulating isolation portion, the P-type semiconductor region 7, and the P-type semiconductor region 3 in this order so as to overlap in the depth direction from the first surface.

[0097] Next, a planar structure of the isolation portion 16 and the photoelectric conversion region sandwiched between the isolation portions 16 at an arbitrary depth in the cross-sectional structure of Fig. 6 will be described with reference to Fig. 7. Although the boundaries of the semiconductor regions are depicted as circles in Fig. 7, this is not limiting.

[0098] 7(a) shows a schematic plan view of line segment AB at depth X in FIG. 6. N-type semiconductor region 1 is included in N-type semiconductor region 6. N-type semiconductor region 6 is included in P-type semiconductor region 3. The area of ​​N-type semiconductor region 6 is larger than the area of ​​N-type semiconductor region 1.

[0099] 7(b) is a schematic plan view of a line segment CD at a depth Y in FIG. 6. The N-type semiconductor region 4 is included in the P-type semiconductor region 2. The P-type semiconductor region 2 is included in the P-type semiconductor region 3.

[0100] Fig. 7(c) is a schematic plan view of a line segment EF at a depth Z in Fig. 6. The N-type semiconductor region 5 is contained within the P-type semiconductor region .

[0101] When FIG. 7(b) and FIG. 7(c) are overlapped, the N-type semiconductor region 4 and the P-type semiconductor region 2 overlap with the N-type semiconductor region 5 in a plan view.

[0102] 7(a) and 7(b), the N-type semiconductor region 1 overlaps with at least a portion of the N-type semiconductor region 4, and the N-type semiconductor region 6 overlaps with at least a portion of the P-type semiconductor region 2 in a plan view.

[0103] Next, a method for manufacturing the avalanche diode in the cross-sectional schematic diagram shown in Fig. 6 will be described with reference to Fig. 8. The order of steps that are not specifically described may be changed as appropriate. Also, well-known manufacturing methods can be applied to the steps that are not described in Fig. 8.

[0104] 8(a), P-type impurity ions (hereinafter, ion implantation) are implanted into a region that will become an N-type semiconductor region 5 from a normal direction to the first surface of the semiconductor substrate 15. As a result, a P-type semiconductor region 8 is formed at a deep position relative to the first surface of the semiconductor substrate 15.

[0105] Next, as shown in FIG. 8(b), a mask 77 is formed on the first surface of the semiconductor substrate 15. The mask 77 has an opening 30. Then, P-type ions are implanted from the normal direction to the first surface of the semiconductor substrate 15 to form the P-type semiconductor region 3 and the P-type semiconductor region 7 arranged in this order from the first surface. At this time, the P-type semiconductor region 7 and a part of the P-type semiconductor region 8 are connected. Also, the impurity concentration of the P-type semiconductor region 3 is set to be higher than the impurity concentration of the P-type semiconductor region 7. Specifically, for example, there is a method of performing ion implantation multiple times with different ion implantation energies.

[0106] Next, the mask 77 is removed, and a mask 78 is placed. The mask 78 has an opening 32. Then, as shown in FIG. 8(c), a region that becomes the P-type semiconductor region 2 is formed by implanting P-type ions from a direction parallel to the normal direction to the first surface of the semiconductor substrate 15. Thereafter, a region that becomes the N-type semiconductor region 6 is formed by implanting N-type ions at a position shallower with respect to the first surface than the position where the P-type ion implantation was performed to form the region that becomes the P-type semiconductor region 2. Here, the region that becomes the P-type semiconductor region 2 is formed, and then the region that becomes the N-type semiconductor region 6 is formed, but the reverse may be true.

[0107] Next, mask 78 is removed, and mask 73 is placed. Mask 73 has openings 33. As shown in Fig. 8(d), N-type ions are implanted from a direction parallel to the normal direction to the first surface of semiconductor substrate 15 to a depth where a region that becomes P-type semiconductor region 2 is to be disposed, thereby forming N-type semiconductor region 4 in a part of the region that becomes P-type semiconductor region 2.

[0108] Thereafter, N-type semiconductor region 1 is formed by implanting N-type ions into the first surface side of semiconductor substrate 15 from a direction parallel to the normal direction to the first surface of semiconductor substrate 15. Here, N-type semiconductor region 4 is formed first, but N-type semiconductor region 1 may be formed first.

[0109] In this way, when ion implantation is performed using impurity ions of the same conductivity type, the diffusion of the impurity ions in the direction parallel to the first surface is greater when ion implantation is performed at a position deep relative to the first surface, which is the incident surface, than when ion implantation is performed at a position shallower relative to the first surface. In other words, when ion implantation is performed using the same mask, the N-type semiconductor region 1 is included in the N-type semiconductor region 4 in plan view.

[0110] Impurity ions having different thermal diffusion coefficients may be used as the impurity ions implanted to form the N-type semiconductor region 1 and the N-type semiconductor region 4. With this configuration, the degree of freedom in potential design is improved in the region where the N-type semiconductor region 1 and the N-type semiconductor region 4 are arranged.

[0111] 8(d), if different masks are used to implant ions when forming the N-type semiconductor region 1 and the N-type semiconductor region 4, misalignment may occur, resulting in an asymmetric electric field distribution, which may cause a tunnel effect. On the other hand, according to the manufacturing method of this embodiment, the N-type semiconductor region 1 and the N-type semiconductor region 4 are formed using the same mask, so that it is possible to suppress misalignment between the two semiconductor regions, and it is possible to suppress the tunnel effect that may occur due to misalignment.

[0112] Next, the control unit 202 of this embodiment will be described with reference to Fig. 9. In this embodiment, the control unit 202 has two configurations. In the first configuration, as shown in Fig. 9(a), the control unit 202 is arranged on the cathode side of the photoelectric conversion unit 201 to which a high potential VH is supplied. In the second configuration, as shown in Fig. 9(b), the control unit 202 is arranged on the anode side of the photoelectric conversion unit 201 to which a low potential VL is supplied.

[0113] 9(a) and 9(b), a certain amount of time is required from when the input potential of the waveform shaping unit 203 changes due to the avalanche current until the voltage is dropped by the control unit 202 and the bias of the photoelectric conversion unit 201 returns to its initial state. In this way, the period from when a charge is detected once until the bias state returns so that the charge can be detected again is called the dead time. The shorter this dead time is, the more charges can be counted per unit time, and the greater the dynamic range of the photodetector.

[0114] For example, when the control unit 202 is a resistive element, the dead time (τd [s]) of the avalanche diode of this embodiment is determined by the product of the resistance (R [Ω]) and the capacitance of the input terminal (C [F]). In the following formula, the PN junction capacitance of the photoelectric conversion unit 201 is represented by Cpd, the capacitance of the well of the photoelectric conversion unit 201 is represented by Cw, and the parasitic capacitance of the wiring and diffusion layer is represented by C.

[0115] In the case of FIG. 9(a), the dead time is calculated by Equation 2. τd=R(Cpd+C) ... (Formula 2) In the case of FIG. 9(b), the dead time is calculated by Equation 3. τd=R(Cpd+Cw+C) ... (Equation 3)

[0116] The PN junction capacitance Cpd of the photoelectric conversion unit 201 is the PN junction capacitance of the photodetection region that induces a strong electric field to cause avalanche amplification. Therefore, the PN junction capacitance Cpd changes in proportion to the area of ​​the photodetection region. In other words, if the area of ​​the photodetection region is increased to increase the photodetection efficiency, the PN junction capacitance Cpd increases and the dead time increases. As a result, the dynamic range decreases.

[0117] That is, there is a trade-off relationship between the light detection efficiency and the dynamic range. On the other hand, according to the pixel structure of this embodiment, it is possible to reduce the area of the light detection region while ensuring a large area of the photoelectric conversion region. Therefore, Cpd can be reduced and Dead time can be reduced. As a result, it is possible to achieve both high light detection efficiency and high dynamic range.

[0118] The improvement effect of the dynamic range by the pixel structure of this embodiment is more显著 in the configuration of FIG. 9(a) than in FIG. 9(b). For example, assuming that the ratio of Cpd of the SPAD structure of this embodiment to the conventional SPAD structure is A (0 < A < 1), the improvement rate Δ of the dynamic range in each circuit method of FIG. 9(a) and FIG. 9(b) is represented by Formula 4 and Formula 5, respectively. Δ1=(1 - A)Cpd / (ACpd + C) …(Formula 4) Δ2=(1 - A)Cpd / (ACpd + Cw + C) …(Formula 5)

[0119] In Formula 4 and Formula 5, the calculation is performed by utilizing the fact that the dynamic range is inversely proportional to the Dead time. It can be seen from the above formula that Δ1 > Δ2 is always satisfied.

[0120] From the above, when FIGS. 9(a) and 9(b) are applied in the configuration of this embodiment, the improvement rate of the dynamic range is higher in FIG. 9(a) than in FIG. 9(b) in principle.

[0121] So far, the control unit 202 has been described as a resistance element, but the same applies to the case of an active quenching circuit.

[0122] From the above, the control unit 202 for the pixel of this embodiment can achieve a greater improvement effect on the dynamic range when arranged on the cathode side than when arranged on the anode side of the photoelectric conversion unit 201.

[0123] According to the configuration of this embodiment, it is possible to suppress the decrease in light detection efficiency by forming a path through which charges move, that is, it is possible to reduce noise while suppressing the decrease in light detection efficiency.

[0124] Example 2 Fig. 10 is a cross-sectional schematic diagram of an avalanche diode in this embodiment. Figs. 4, 5, 8, and 9 are similar to those in embodiment 1. Furthermore, parts having similar functions to those in Figs. 1 to 9 are given the same reference numerals, and detailed explanations are omitted. Fig. 10 differs from Fig. 6 in that a P-type semiconductor region 24 is arranged in the region where the N-type semiconductor region 4 is arranged.

[0125] In FIG. 10, the N-type semiconductor region 1 and the P-type semiconductor region 24 form a PN junction. The P-type semiconductor region 24 is electrically connected to the P-type semiconductor region 3 via the P-type semiconductor region 2. Therefore, the potential of the P-type semiconductor region 24 is reverse biased to the N-type semiconductor region 1. A strong electric field is induced in the PN junction region between the N-type semiconductor region 1 and the P-type semiconductor region 24. This strong electric field causes avalanche amplification in the PN junction region, and a current based on the amplified charge is output from the wiring 9 or 10. That is, in this embodiment, the photodetection region is the PN junction region between the N-type semiconductor region 1 and the P-type semiconductor region 24. With this configuration, the potential difference required to cause avalanche amplification can be made smaller than that in the first embodiment. That is, the potential difference between the N-type semiconductor region 1 and the P-type semiconductor region 3 in this embodiment can be made smaller than the potential difference between the N-type semiconductor region 1 and the P-type semiconductor region 3 in the first embodiment.

[0126] 10, the impurity concentration of the P-type semiconductor region 24 is lower than the impurity concentration of the P-type semiconductor region 2 and the impurity concentration of the P-type semiconductor region 7. Therefore, the potential relationship as shown in FIG. 3 holds in this embodiment as well.

[0127] The impurity concentration of the N-type semiconductor region 1 is set so that the entire N-type semiconductor region 1 is not depleted when a potential that causes avalanche amplification is supplied across the PN junction, as described above.

[0128] In this embodiment, the impurity concentration at which the entire N-type semiconductor region 1 is not depleted is, for example, 6.0×10 18 [atms / cm 3 The impurity concentration of the P-type semiconductor region 24 is 1.0×10 17 [atms / cm 3 This is because if the depletion layer region expands so as to contact the first surface of semiconductor substrate 15, noise may occur on the first surface of semiconductor substrate 15. However, the impurity concentrations are not limited to these.

[0129] Specifically, the potential difference between the N-type semiconductor region 1 and the P-type semiconductor region 24 when the above-mentioned photoelectric conversion unit 201 operates as an avalanche diode (APD or SPAD) is 6V or more.

[0130] Considering the above-mentioned impurity concentration relationship, it is more preferable that the potential difference between the N-type semiconductor region 1 and the P-type semiconductor region 24 is 10 V or more. In this case, for example, a potential of 10 V or more is supplied to the N-type semiconductor region 1, and a potential of 0 V or less is supplied to the P-type semiconductor region 24 via the P-type semiconductor region 2. However, as long as the potential difference is 6 V or more, it is not limited to these potentials.

[0131] In this embodiment, when applying the manufacturing method shown in FIG. 8, in FIG. 8(d), a P-type semiconductor region 24 is formed by performing N-type ion implantation to the extent that the impurity concentration in a portion of the region that will become the P-type semiconductor region 2 is locally reduced.

[0132] This embodiment also has the same effects as the first embodiment.

[0133] Example 3 Fig. 11 is a schematic cross-sectional view of an avalanche diode in this embodiment. Parts having the same functions as those in Figs. 1 to 10 are given the same reference numerals, and detailed explanations will be omitted.

[0134] Figure 11 differs from the potential of the region in which N-type semiconductor region 5 of Figure 6 is arranged in that the potential of the region farther from isolation portion 16 is lower than the potential of the region closer to isolation portion 16 in a direction parallel to the first surface.

[0135] In FIG. 11, in the direction parallel to the first surface, an N-type semiconductor region 28 is arranged in a region close to the isolation portion 16, and an N-type semiconductor region 27 is arranged in a region far from the isolation portion 16.

[0136] In this embodiment, the impurity concentrations are set such that the potential of N-type semiconductor region 27 is lower than the potential of N-type semiconductor region 28, making it easier for charges to move from N-type semiconductor region 28 to N-type semiconductor region 27.

[0137] That is, in the direction parallel to the first surface, the potential of the region farther from the isolation portion 16 (N-type semiconductor region 27) is lower than the potential of the region closer to the isolation portion 16 (N-type semiconductor region 28).

[0138] Therefore, it is preferable that the impurity concentration of N-type semiconductor region 28 is lower than the impurity concentration of N-type semiconductor region 27. In order to form a potential gradient toward the photodetection region, the impurity concentration of N-type semiconductor region 27 is made lower than the impurity concentration of N-type semiconductor region 4.

[0139] When a P-type semiconductor region is disposed in place of N-type semiconductor region 27, a P-type semiconductor region having a higher impurity concentration than the impurity concentration of the substituted P-type semiconductor region is disposed in place of N-type semiconductor region .

[0140] According to this configuration, when the direction from the position where the isolation portion 16 is disposed to the position where the N-type semiconductor region 27 is disposed is defined as the in-plane direction, an impurity distribution that moves charges in the in-plane direction induces an in-plane electric field. This electric field causes charges generated deep inside the semiconductor substrate 15 to move in the in-plane direction.

[0141] With such a configuration, for example, it is possible to shorten the time it takes for charges generated deep within the semiconductor substrate 15 to move to the light detection region.

[0142] Furthermore, as described above, it is preferable to set the potential so that charges can easily move from a deep position to a shallow position on the first surface of the semiconductor substrate 15. By setting such a potential relationship, it is possible to further reduce the time it takes for charges to move to the light detection region.

[0143] This embodiment is applicable to all the embodiments.

[0144] Example 4 Fig. 12 is a schematic cross-sectional view of an avalanche diode in this embodiment. Parts having the same functions as those in Figs. 1 to 11 are given the same reference numerals, and detailed description thereof will be omitted.

[0145] FIG. 12 differs from the P-type semiconductor region 2 in FIG. 6 in that it is composed of a P-type semiconductor region 2B and a P-type semiconductor region 2A that are at different depths.

[0146] 12, the P-type semiconductor region 2 has a P-type semiconductor region 2A and a P-type semiconductor region 2B. The P-type semiconductor region 2A is disposed at a first depth X between the N-type semiconductor region 6 and the P-type semiconductor region 3 constituting the isolation portion 16. The P-type semiconductor region 2B is disposed at a second depth Y between the N-type semiconductor region 5 and the N-type semiconductor region 4. A portion of the P-type semiconductor region 2A contacts the N-type semiconductor region 5, and another portion of the P-type semiconductor region 2A contacts the P-type semiconductor region 2B.

[0147] Next, the planar structure of the isolation portion 16 and the photoelectric conversion region sandwiched between the isolation portions 16 at an arbitrary depth in the cross-sectional structure of Fig. 12 will be described with reference to Fig. 13. Although the boundaries of the semiconductor regions are depicted as circles in Fig. 13, this is not limiting. Note that a schematic plan view of the line segment EF at depth Z is omitted because it is similar to Fig. 7(c).

[0148] Fig. 13(a) shows a schematic plan view of line segment AB at a first depth X in Fig. 12. The N-type semiconductor region 1 is included in the N-type semiconductor region 6. The N-type semiconductor region 6 is included in the P-type semiconductor region 2A. The P-type semiconductor region 2A is included in the P-type semiconductor region 3.

[0149] 13(b) shows a schematic plan view of the line segment CD at the second depth Y in FIG. 12. The N-type semiconductor region 4 is included in the P-type semiconductor region 2B. The P-type semiconductor region 2B is included in the N-type semiconductor region 5. The N-type semiconductor region 5 is included in the P-type semiconductor region 3.

[0150] 13(a) and 13(b) are overlapped, the P-type semiconductor region 2A overlaps with the P-type semiconductor region 2B and the N-type semiconductor region 5. In FIG.

[0151] According to the configuration of this embodiment, a part of the region where the P-type semiconductor region 2 is arranged at the second depth Y in Fig. 6 can be made into the N-type semiconductor region 5. This makes it possible to increase the efficiency of detecting short wavelength light, particularly when a front-illuminated type is used.

[0152] This embodiment is applicable to all the embodiments.

[0153] Example 5 Fig. 14 is a schematic cross-sectional view of a photodiode in this embodiment. Parts having the same functions as those in Figs. 1 to 13 are given the same reference numerals, and detailed explanations are omitted. Fig. 14 differs from Fig. 6 in that a plurality of N-type semiconductor regions 1 and a plurality of N-type semiconductor regions 4 are arranged.

[0154] FIG. 14 shows a configuration in which two N-type semiconductor regions 1 and two N-type semiconductor regions 4 are arranged, but the number is not limited to two as long as a plurality of each are arranged.

[0155] The N-type semiconductor region 1A is sandwiched between N-type semiconductor regions 6. Similarly, the N-type semiconductor region 1B is sandwiched between N-type semiconductor regions 6.

[0156] The N-type semiconductor region 4A is sandwiched between the P-type semiconductor regions 2. Similarly, the N-type semiconductor region 4B is sandwiched between the P-type semiconductor regions 2.

[0157] Next, the planar structure of the isolation portion 16 and the photoelectric conversion region sandwiched between the isolation portions 16 at an arbitrary depth in the cross-sectional structure of Fig. 14 will be described with reference to Fig. 15. Although the boundaries of the semiconductor regions are depicted as circles in Fig. 15, this is not limiting. Note that a planar schematic diagram of the line segment EF at depth Z is omitted because it is similar to Fig. 7(c).

[0158] Fig. 15(a) shows a schematic plan view of line segment AB at depth X in Fig. 14. N-type semiconductor region 1A and N-type semiconductor region 1B are each contained in N-type semiconductor region 6. N-type semiconductor region 6 is contained in P-type semiconductor region 3. The area of ​​N-type semiconductor region 6 is larger than the areas of N-type semiconductor region 1A and N-type semiconductor region 1B.

[0159] Fig. 15(b) shows a schematic plan view of line segment CD at depth Y in Fig. 14. N-type semiconductor region 4A and N-type semiconductor region 4B are each included in P-type semiconductor region 2. P-type semiconductor region 2 is included in P-type semiconductor region 7.

[0160] 15(b) and 7(c), the N-type semiconductor region 4A, the N-type semiconductor region 4B, and the P-type semiconductor region 2 overlap with the N-type semiconductor region 5. In FIG.

[0161] 15(a) and 15(b) are overlapped, in a plan view, the N-type semiconductor region 1A overlaps with at least a portion of the N-type semiconductor region 4A. In a plan view, the N-type semiconductor region 1B overlaps with at least a portion of the N-type semiconductor region 4B. As described above, it is preferable that the entire region of the N-type semiconductor region 1 overlaps with the N-type semiconductor region 4 so as to be included within the N-type semiconductor region 4 in a plan view.

[0162] 15(a) and 15(b) are overlapped, the N-type semiconductor region 6 overlaps at least a part of the P-type semiconductor region 2. As shown in FIG.

[0163] According to the configuration of this embodiment, the N-type semiconductor regions 1 and 4 arranged at multiple locations can shorten the average travel distance of charges generated in the photoelectric conversion region to the photodetection region, thereby shortening the time it takes for charges generated deep in the photoelectric conversion region to be detected.

[0164] This embodiment is applicable to all the embodiments.

[0165] Example 6 Fig. 16 is a schematic cross-sectional view of the avalanche diode and the control section in this embodiment. Parts having the same functions as those in Figs. 1 to 15 are given the same reference numerals, and detailed description thereof will be omitted.

[0166] In FIG. 16, the photoelectric conversion unit 201 and the control unit 202 are arranged on different semiconductor substrates. The configuration of the avalanche diode constituting the photoelectric conversion unit 201 is the same as that of the first embodiment. A plurality of photoelectric conversion units 201 are arranged on the semiconductor substrate 15, and a configuration in which two avalanche diodes are arranged is shown here as an example. The control unit 202 and wiring 1107 connected to the control unit 202 are arranged on the semiconductor substrate 1102. Here, a configuration in which the control unit 202 and wiring 1107 are arranged on the semiconductor substrate 1102 is shown, but other circuits may be arranged thereon.

[0167] The avalanche diode of this embodiment has a back-illuminated structure. Light is incident from the N-type semiconductor region 5 toward the N-type semiconductor region 1. At this time, the light passes through the microlens 1103 and the color filter 1104 and is incident on the N-type semiconductor region 5.

[0168] As described above, photoelectric conversion is performed in the N-type semiconductor region 5, and the generated charges pass through the N-type semiconductor region 4 and move to the N-type semiconductor region 1. Avalanche amplification occurs due to the electric field between the N-type semiconductor region 1 and the depletion layer generated between the P-type semiconductor region 2 and the N-type semiconductor region 4, and a current flows in the wiring 9.

[0169] The wiring 9 is connected through a connection portion 1105 to a control portion 202 provided on a semiconductor substrate 1102 prepared separately.

[0170] The signal detected for each avalanche diode is processed by a scanning circuit or the like provided around the pixel region of the semiconductor substrate 1102. The scanning circuit may be provided on a semiconductor substrate different from the semiconductor substrate 15 and the semiconductor substrate 1102.

[0171] According to the configuration of this embodiment, a different semiconductor substrate 1102 is laminated on the semiconductor substrate 15 on which the avalanche diode is disposed. By arranging a processing circuit such as a control unit 202 on the laminated semiconductor substrate 1102, it becomes possible to increase the aperture ratio of the avalanche diode and improve the light detection efficiency.

[0172] In this embodiment, when the microlens 1103 is disposed in each avalanche diode, it is preferable to arrange the positional relationship such that the optical axis of the microlens 1103 is contained within the N-type semiconductor region 4 in a planar view. For example, when vertical light is incident on the center of the photoelectric conversion element 101, the distribution of the probability of generation of signal charges inside the N-type semiconductor region 5 becomes maximum near the optical axis of the microlens 1103. Here, the optical axis of the microlens is an axis that passes through the center of the microlens in a planar view and is perpendicular to the semiconductor substrate 15.

[0173] As in the configuration of this embodiment, if the optical axis of the microlens 1103 is two-dimensionally contained within the N-type semiconductor region 4, charges are more likely to be generated in the N-type semiconductor region 5 at a position close to the N-type semiconductor region 4 in a planar view. This makes it possible to reduce the probability of charges being generated at positions farther away in a planar view, and it becomes possible to suppress a decrease in the time resolution until charges are detected in the light detection region due to charges generated at shallow positions and charges generated at deep positions relative to the first surface of the semiconductor substrate 15.

[0174] In this embodiment, a back-illuminated photodiode configuration is used, but even a front-illuminated type can achieve the effects of this embodiment, i.e., both high light detection efficiency and low DCR. However, since this embodiment has a configuration in which the photoelectric conversion unit is formed on the back surface, the back-illuminated type can detect charges generated near the top surface of the substrate (the light incidence side) with higher efficiency than the front-illuminated type. In other words, it is preferable that the photoelectric conversion unit 201 of this embodiment be a back-illuminated type, since it can achieve high light detection efficiency in a broad wavelength band from short wavelengths to long wavelengths.

[0175] This embodiment is applicable to all the embodiments.

[0176] Example 7 In this embodiment, an example of a light detection system using the light detection device 1010 of each embodiment will be described. An invisible light detection system and a medical diagnosis system such as PET, which are examples of a light detection system, will be described with reference to FIG. 17. Parts having the same functions as those in FIG. 1 to FIG. 16 are given the same reference numerals, and detailed description will be omitted. Note that the pixel 100 of this embodiment has a TDC and a memory instead of the counter circuit 209 in FIG. 5. Here, the TDC will be described as TDC 204, and the memory will be described as memory 205.

[0177] 17 is a block diagram illustrating the configuration of the invisible light detection system. The invisible light detection system includes a wavelength conversion unit 1201, a data processing unit 1207, and a plurality of light detection devices 1010.

[0178] The irradiation object 1200 irradiates light in a wavelength band that becomes invisible light. The wavelength conversion unit 1201 receives the light in a wavelength band that becomes invisible light irradiated from the irradiation object 1200, and irradiates visible light.

[0179] The photoelectric conversion unit 201, to which the visible light irradiated from the wavelength conversion unit 1201 is incident, performs photoelectric conversion, and the photodetector 1010 stores a digital signal based on a signal based on the photoelectrically converted charge in the memory 205 via the control unit 202, the waveform shaping unit 203, and the TDC 204. The multiple photodetectors 1010 may be formed as a single device, or may be formed by arranging multiple devices.

[0180] The digital signals stored in the memory 205 of the photodetectors 1010 are subjected to signal processing by the data processor 1207. Here, as a signal processing means, a synthesis process is performed for a plurality of images obtained from the digital signals.

[0181] Next, the configuration of a medical diagnostic system such as PET will be described as a specific example of an invisible light detection system.

[0182] A subject, which is an irradiated object 1200, emits radioactive particles from within the living body. The wavelength converting unit 1201 constitutes a scintillator, which irradiates visible light when the radioactive particles emitted from the subject are incident on the scintillator.

[0183] Photoelectric conversion unit 201, which receives visible light irradiated from the scintillator, performs photoelectric conversion, and photodetector 1010 stores a digital signal based on a signal based on the photoelectrically converted charge in memory 205 via control unit 202, waveform shaping unit 203, and TDC 204. In other words, photodetector 1010 is disposed to detect the arrival time of radiation pairs emitted from the subject, detects visible light irradiated from the scintillator, and stores a digital signal in memory 205.

[0184] The digital signals stored in memory 205 of the multiple photodetectors 1010 are processed in data processing unit 1207. Here, as a signal processing means, a synthesis process such as image reconstruction is performed using multiple images obtained from the multiple digital signals, and an image of the subject's inside the body is formed.

[0185] Example 8 In this embodiment, an example of a light detection system using the light detection device 1010 of each embodiment will be described. Parts having the same functions as those in Figs. 1 to 16 are given the same reference numerals, and detailed description thereof will be omitted.

[0186] A distance detection system, which is an example of a light detection system, will be described with reference to Fig. 18. Note that the pixel 100 of this embodiment has a TDC and a memory instead of the counter circuit 209 in Fig. 5. Here, the TDC will be described as TDC 204, and the memory will be described as memory 205.

[0187] An example of a block diagram of the distance detection system of this embodiment will be described with reference to Fig. 18. The distance detection system includes a light source control unit 1301, a light emitting unit 1302, an optical member 1303, a light detection device 1010, and a distance calculation unit 1309.

[0188] A light source control unit 1301 controls the driving of a light emitting unit 1302. Upon receiving a signal from the light source control unit 1301, the light emitting unit 1302 irradiates a short pulse (train) of light in the shooting direction.

[0189] Light emitted from a light emitting unit 1302 is reflected by a subject 1304. The reflected light passes through an optical member 1303 and is received by a photoelectric conversion unit 201 of the light detection device 1010. A signal based on the photoelectrically converted charge is input to a TDC 204 via a waveform shaping unit 203.

[0190] The TDC 204 compares the signal obtained from the light source control unit 1301 with the signal input from the waveform shaping unit 203. Then, it performs highly accurate digital conversion of the time from when the light emitting unit 1302 emits pulsed light to when it receives the light reflected from the subject 1304. The digital signal output from the TDC 204 is held in the memory 205.

[0191] A distance calculation unit 1309 calculates the distance from the light detection device to the subject based on the digital signals from the multiple measurements stored in the memory 205. This distance detection system can be applied to, for example, an in-vehicle system.

[0192] Next, an example of a light detection system using counter circuit 209 in Fig. 5 is shown in Fig. 19. In Fig. 19, a light detection system relating to an on-vehicle camera, which is an example of the light detection system, will be described.

[0193] The light detection system 1000 is a light detection system including ranging pixels and imaging pixels according to the present invention. The light detection system 1000 has an image processing unit 1030 that performs image processing on a plurality of digital signals acquired by a light detection device 1010. Furthermore, the light detection system 1000 has a parallax calculation unit 1040 that calculates parallax (phase difference of parallax images) from the plurality of image data acquired by the image processing unit 1030.

[0194] The light detection system 1000 also includes a distance measurement unit 1050 that calculates the distance to the object based on the calculated parallax, and a collision determination unit 1060 that determines whether or not there is a possibility of collision based on the calculated distance. Here, the parallax calculation unit 1040 and the distance measurement unit 1050 are an example of a distance information acquisition unit that acquires distance information to the object. In other words, the distance information is information related to the parallax, the defocus amount, the distance to the object, and the like.

[0195] The collision determination unit 1060 may determine the possibility of a collision using any of these pieces of distance information. The distance information acquisition means may be realized by dedicated hardware, a software module, or a combination of these. It may also be realized by a Field Programmable Gate Array (FPGA) or an Application Specific Integrated Circuit (ASIC), or a combination of these.

[0196] The optical detection system 1000 is connected to a vehicle information acquisition device 1310 and can acquire vehicle information such as vehicle speed, yaw rate, steering angle, etc. The optical detection system 1000 is also connected to a control ECU 1410, which is a control device that outputs a control signal to generate a braking force for the vehicle based on the determination result by the collision determination unit 1060.

[0197] The light detection system 1000 is also connected to an alarm device 1420 that issues an alarm to the driver based on the determination result by the collision determination unit 1060. For example, if the collision determination unit 1060 determines that there is a high possibility of a collision, the control ECU 1410 performs vehicle control to avoid a collision and reduce damage by applying the brakes, releasing the accelerator, suppressing engine output, etc. The alarm device 1420 warns the user by sounding an alarm, displaying alarm information on the screen of a car navigation system, etc., vibrating the seat belt or steering wheel, etc.

[0198] In this embodiment, the light detection system 1000 captures the surroundings of the vehicle, for example, the front or rear. FIG. 19(B) shows the light detection system when capturing an image of the front of the vehicle. In addition, although the above describes the control to avoid collision with other vehicles, the light detection system can also be applied to control of automatic driving by following other vehicles, and control of automatic driving so as not to deviate from the lane. Furthermore, the light detection system is not limited to vehicles such as the vehicle itself, but can be applied to moving bodies (moving devices) such as ships, aircraft, and industrial robots. In addition, the light detection system can be applied not only to moving bodies, but also to equipment that widely uses object recognition, such as intelligent transport systems (ITS). [Explanation of symbols]

[0199] 1 N-type semiconductor region 2 P-type semiconductor region 4 N-type semiconductor region 5 N-type semiconductor region 6 N-type semiconductor region 15 Semiconductor Substrates 16 Separation part

Claims

1. a semiconductor substrate having a first surface and a second surface opposite to the first surface; a region in which a plurality of avalanche diodes are arranged on the semiconductor substrate, The avalanche diode is a first semiconductor region of a first conductivity type disposed at a first depth relative to the first surface; a second semiconductor region of a second conductivity type opposite to the first conductivity type and disposed at a second depth relative to the first surface that is deeper than the first depth; a third semiconductor region of the first conductivity type, the third semiconductor region being disposed at a third depth that is deeper than the second depth with respect to the first surface and having an impurity concentration lower than that of the first semiconductor region; a fourth semiconductor region of the second conductivity type provided between the third semiconductor regions of each of the plurality of avalanche diodes; a fifth semiconductor region of the second conductivity type disposed at a fourth depth with respect to the first surface that is deeper than the third semiconductor region; the first semiconductor region and the second semiconductor region are configured to form a region in which avalanche amplification occurs; an area where the first semiconductor region and the second semiconductor region overlap is smaller than an area of ​​the third semiconductor region in a plan view; The fourth semiconductor region is electrically connected to the second semiconductor region and the fifth semiconductor region.

2. 2. The photodetector device according to claim 1, wherein the charges generated in the third semiconductor region are collected in the region where the avalanche amplification occurs.

3. 3. The photodetector according to claim 1, wherein the entire first semiconductor region overlaps with the second semiconductor region in a plan view.

4. The impurity concentration of the first semiconductor region is 6.0×10 １８ [atms / cm ３ ] and above, The impurity concentration of the second semiconductor region is 1.0×10 １７ [atms / cm ３ 4. The light detection device according to claim 1, wherein the optical axis of the light detection device is equal to or smaller than the optical axis of the light detection device.

5. 5. The photodetection device according to claim 1, wherein the third semiconductor region has a lower potential for the first conductivity type charge at a position shallower than the first surface than at a position deeper than the first surface.

6. 6. The photodetector device according to claim 1, wherein in a direction parallel to the first surface, a region of the third semiconductor region farther from the fourth semiconductor region is lower than a region closer to the fourth semiconductor region.

7. 7. The photodetector according to claim 1, wherein an area of ​​an overlapping region between the first semiconductor region and the second semiconductor region is smaller than an area of ​​the second semiconductor region in a plan view.

8. 8. The photodetector according to claim 1, wherein the first conductivity type is an N-type, and the second conductivity type is a P-type.

9. a semiconductor substrate different from the semiconductor substrate; a control unit for controlling a potential supplied to the first semiconductor region is disposed on the different semiconductor substrate; The semiconductor substrate and the different semiconductor substrate are stacked, 9. The photodetector according to claim 1, wherein the first semiconductor region and the control unit are electrically connected via a wiring.

10. A microlens is provided.

10. The light detection device according to claim 1, wherein the microlens is disposed such that an optical axis of the microlens overlaps with the second semiconductor region in a plan view.

11. A light detection system comprising a light detection device according to any one of claims 1 to 10, a wavelength conversion unit that converts light of a first wavelength band into light of a second wavelength band different from the first wavelength band; the photodetector into which the light of the second wavelength band output from the wavelength conversion unit is incident; and a signal processing means for processing a digital signal corresponding to light in the second wavelength band from the photodetector.

12. A light detection system comprising a light detection device according to any one of claims 1 to 10, a light emitting unit that emits light to be detected by the light detection device; and distance calculation means for calculating a distance using a digital signal corresponding to the detected light from the light detection device.

13. A mobile object, A light detection device according to any one of claims 1 to 10, a distance information acquisition means for acquiring distance information to an object based on a signal from the light detection device; and a control means for controlling the moving body based on the distance information.

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