Heat Treatment Equipment

The heat treatment device addresses temperature variations in existing devices by employing a partition structure with expandable and retractable partition members, which divides the space around the processing container to maintain consistent temperatures.

JP7658672B2Active Publication Date: 2025-04-08TOKYO ELECTRON LTD
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Patent Information

Application Number
JP2021096161
Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
Filing Date
2021-06-08
Publication Date
2025-04-08
Estimated Expiration
2041-06-08

AI Technical Summary

Technical Problem

Existing heat treatment devices experience significant temperature variations within the processing container, which can affect the consistency and quality of the heat treatment process.

Method used

A heat treatment device is designed with a cylindrical processing container surrounded by a heat insulating member, featuring a partition structure that includes multiple first and second partition members. These partition members are capable of expanding and retracting to divide the space around the processing container, thereby reducing temperature variations.

Benefits of technology

The implementation of the partition structure effectively reduces temperature variations within the processing container, enhancing the consistency and quality of the heat treatment process.

✦ Generated by Eureka AI based on patent content.

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Abstract

To provide a technique capable of reducing temperature variations inside a processing container.SOLUTION: A heat treatment device has a cylindrical processing container, a heat insulating member provided around the processing container with a separating space, a heating element provided on the inner circumference of the heat insulating member, and a partition structure provided in the space. The partition structure includes a plurality of first partition members extending in the longitudinal direction of the processing container and partitioning the space, and a plurality of second partition members extending in the circumferential direction of the processing container to partition the space.SELECTED DRAWING: Figure 1
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Description

[Technical field]

[0001] The present disclosure relates to a thermal processing apparatus. [Background technology]

[0002] A technique is known in which a partition is provided in the space between a processing vessel and a heating means provided around it, and the space is divided into a first space corresponding to the position where the temperature sensor is provided, and a second space excluding the first space (see, for example, Patent Document 1). [Prior art documents] [Patent documents]

[0003] [Patent Document 1] JP 2020-098808 A Summary of the Invention [Problem to be solved by the invention]

[0004] The present disclosure provides a technique that can reduce temperature variations within a processing vessel. [Means for solving the problem]

[0005] A heat treatment apparatus according to one aspect of the present disclosure includes a cylindrical processing vessel, a heat insulating member provided around the processing vessel with a space therebetween, a heating element provided on an inner circumferential side of the heat insulating member, and a partition structure provided in the space, the partition structure including a plurality of first partition members extending in a longitudinal direction of the processing vessel and partitioning the space, and a plurality of second partition members extending in a circumferential direction of the processing vessel and partitioning the space. fruit , Each of the plurality of first partition members is extendable and contractible in the longitudinal direction of the processing vessel. . Effect of the Invention

[0006] According to the present disclosure, temperature variation within a processing chamber can be reduced. [Brief description of the drawings]

[0007] [Figure 1] FIG. 1 is a vertical cross-sectional view showing an example of a heat treatment apparatus according to a first embodiment; [Diagram 2] Cross-sectional view of Fig. 1 [Diagram 3] FIG. 2 is a perspective view for explaining the partition structure of FIG. 1; [Figure 4] FIG. 1 is a perspective view showing an example of a heat treatment apparatus according to a second embodiment; [Diagram 5] FIG. 2 is a perspective view showing an example of a heat treatment apparatus according to a second embodiment; [Figure 6] FIG. 13 is a perspective view showing an example of a heat treatment apparatus according to a third embodiment; [Figure 7] An exploded perspective view of FIG. [Figure 8] FIG. 7 is a perspective view showing a modification of the horizontal partition member of FIG. 6; [Figure 9] FIG. 13 is a perspective view showing an example of a heat treatment apparatus according to a fourth embodiment; [Figure 10] 9 is an exploded perspective view of FIG. [Figure 11] FIG. 10 is a diagram showing a modification of the horizontal partition member of FIG. 9. [Figure 12] FIG. 10 is a diagram showing another modified example of the horizontal partition member of FIG. 9. [Figure 13] FIG. 13 is a perspective view showing an example of a heat treatment apparatus according to a fifth embodiment. [Figure 14] FIG. 13 is a perspective view showing an example of a heat treatment apparatus according to a sixth embodiment; [Figure 15] FIG. 13 is a perspective view showing an example of a heat treatment apparatus according to a seventh embodiment. [Figure 16] 16 is an exploded perspective view of FIG. 15 . [Figure 17] FIG. 16 is a diagram showing a modified example of the vertical partition member in FIG. 15. [Figure 18] FIG. 16 is a diagram showing another modified example of the vertical partition member of FIG. 15. [Figure 19] FIG. 16 is a diagram showing yet another modified example of the vertical partition member of FIG. 15. [Figure 20] FIG. 16 is a diagram showing a modification of the horizontal partition member of FIG. 15. [Figure 21] FIG. 13 is a perspective view showing an example of a heat treatment apparatus according to an eighth embodiment. [Figure 22] FIG. 22 is a perspective view showing an example of the heat treatment apparatus of FIG. 21. [Diagram 23]FIG. 22 is a perspective view showing a modified example of the vertical partition member of FIG. 21; [Figure 24] FIG. 13 is a perspective view showing an example of a heat treatment apparatus according to a ninth embodiment; [Diagram 25] 25 is an exploded perspective view of FIG. [Figure 26] FIG. 19 is a perspective view showing an example of a heat treatment apparatus according to a tenth embodiment; [Figure 27] FIG. 19 is a perspective view showing an example of a heat treatment apparatus according to an eleventh embodiment. [Figure 28] FIG. 12 is a perspective view showing an example of a heat treatment apparatus according to a twelfth embodiment; [Figure 29] FIG. 23 is a perspective view showing an example of a heat treatment apparatus according to a thirteenth embodiment; [Diagram 30] FIG. 23 is a perspective view showing an example of a heat treatment apparatus according to a fourteenth embodiment; DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0008] Hereinafter, non-limiting exemplary embodiments of the present disclosure will be described with reference to the accompanying drawings. In all of the accompanying drawings, the same or corresponding members or parts are designated by the same or corresponding reference numerals, and duplicated descriptions will be omitted.

[0009] [First embodiment] An example of a heat treatment apparatus 1A according to a first embodiment will be described with reference to Figures 1 to 3. The heat treatment apparatus 1A according to the first embodiment is a batch-type vertical heat treatment apparatus that simultaneously performs heat treatment on a plurality of substrates W. The heat treatment apparatus 1A includes a processing container 10, a gas supply unit 30, an exhaust unit 40, a heating unit 50, a temperature sensor 60, a control unit 90, and the like.

[0010] The processing vessel 10 can reduce the pressure inside. The processing vessel 10 accommodates a substrate W. The substrate W is, for example, a semiconductor wafer. The processing vessel 10 includes an inner tube 11, an outer tube 12, and the like. The inner tube 11 has a cylindrical shape with an open lower end and an open upper end. The outer tube 12 has a cylindrical shape with a ceiling that is open at the lower end and closed at the upper end. The outer tube 12 is arranged so as to cover the outside of the inner tube 11. The inner tube 11 and the outer tube 12 are formed of a heat-resistant material such as quartz, and are arranged coaxially to form a double tube structure. The inner tube 11 and the outer tube 12 are held at their lower ends by a manifold 13 formed of, for example, stainless steel. The manifold 13 is fixed to a base plate 14. However, the entire processing vessel 10 may be formed of, for example, quartz without providing the manifold 13.

[0011] A disk-shaped cover 15 made of, for example, stainless steel is attached to the opening at the lower end of the manifold 13 so as to be airtightly sealed via a seal member 16. A rotating shaft 18 that can rotate in an airtight state by, for example, a magnetic fluid seal 17 is inserted into approximately the center of the cover 15. The lower end of the rotating shaft 18 is connected to a rotating mechanism 19. A table 20 made of, for example, stainless steel is fixed to the upper end of the rotating shaft 18.

[0012] An insulating cylinder 21 made of, for example, quartz is placed on the table 20. A boat 22 made of, for example, quartz is placed on the insulating cylinder 21.

[0013] A plurality of (e.g., 50 to 150) substrates W are accommodated at a predetermined interval (e.g., a pitch of about 10 mm) in the boat 22. The boat 22, the heat-retaining cylinder 21, the table 20, and the lid 15 are loaded (carried into) and unloaded (carried out) from the processing vessel 10 as a whole by a lifting mechanism 23, which is, for example, a boat elevator.

[0014] The gas supply unit 30 supplies a processing gas into the processing chamber 10. The gas supply unit 30 includes a gas nozzle 31, a gas supply system 32, and the like.

[0015] The gas nozzle 31 is made of, for example, quartz. The gas nozzle 31 is provided so as to airtightly penetrate the manifold 13. The base end of the gas nozzle 31 is connected to a gas supply system 32, and the tip end is located inside the inner tube 11. The gas nozzle 31 discharges a process gas introduced from the base end into the inner tube 11 from an opening at the tip end.

[0016] The gas supply system 32 is connected to the base end of the gas nozzle 31. The gas supply system 32 includes a gas source, a valve, a flow rate controller (none of which are shown), and the like. The gas source includes a film forming gas, an etching gas, a cleaning gas, a purge gas, and the like. The gas supply system 32 introduces a processing gas from the gas source into the gas nozzle 31 by controlling the flow rate of the processing gas using the flow rate controller.

[0017] 1, the gas supply unit 30 includes one gas nozzle 31. However, the present invention is not limited to this. For example, the gas supply unit 30 may include two or more gas nozzles.

[0018] The exhaust unit 40 exhausts various process gases from inside the process chamber 10. The exhaust unit 40 includes a gas outlet 41, an exhaust system 42, and the like.

[0019] The gas outlet 41 is provided at the top of the manifold 13. The gas outlet 41 is connected to an exhaust system .

[0020] The exhaust system 42 includes a pressure regulating valve, a vacuum pump (neither of which are shown), etc. The exhaust system 42 evacuates the processing gas inside the processing vessel 10 using the vacuum pump while adjusting the pressure inside the processing vessel 10 using the pressure regulating valve.

[0021] The heating part 50 heats the substrate W in the processing chamber 10. The heating part 50 includes a heat insulating member 51, a protective cover 52, a heating element 53, a holding member 54, and the like.

[0022] The heat insulating member 51 has a ceiling and is formed in a cylindrical shape with an open lower end. The heat insulating member 51 is provided around the processing vessel 10 with a space S therebetween. The lower end of the heat insulating member 51 is supported by the base plate 14. The heat insulating member 51 is formed of, for example, a mixture of soft amorphous silica and alumina, which have low thermal conductivity.

[0023] The protective cover 52 is attached so as to cover the entire outer periphery of the heat insulating member 51. The protective cover 52 is made of, for example, stainless steel.

[0024] The heating element 53 is arranged in a spirally wound manner on the inner periphery of the heat insulating member 51. The heating element 53 is held by the holding member 54 in a state in which the heating element 53 is spaced apart from the inner surface of the heat insulating member 51 by a predetermined gap, so that the heating element 53 can thermally expand and contract. However, instead of being held by the holding member 54, the heating element 53 may be fixed by being fitted into a spiral groove (not shown) formed on the inner periphery of the heat insulating member 51. The heating element 53 is connected to a power source (not shown), and generates heat when power is supplied from the power source, thereby heating the substrate W held in the boat 22. The heating element 53 is divided into a plurality of heating regions (zones) in the vertical direction (the longitudinal direction of the processing vessel 10). When the heating element 53 is divided into a plurality of heating regions in the vertical direction in this way, the temperature in the vertical direction of the processing vessel 10 can be adjusted by controlling the amount of heat generated by the heating element 53 for each heating region. 1, the multiple heating regions include a TOP region, a CT region, a CTR region, a CB region, and a BTM region, which are arranged from top to bottom. Note that the heating element 53 may form a single heating region without being divided into multiple heating regions.

[0025] The holding members 54 extend in the axial direction of the heat insulating member 51 and are provided at predetermined intervals in the circumferential direction on the inner surface of the heat insulating member 51. The holding members 54 hold the heating element 53 so as to be capable of thermal expansion and thermal contraction.

[0026] The temperature sensor 60 measures the temperature inside the processing vessel 10. The temperature sensor 60 includes temperature measuring units 61-65. The temperature measuring units 61-65 are provided at intervals in the vertical direction between the inner pipe 11 and the outer pipe 12. The temperature measuring units 61-65 are provided in the BTM region, the CB region, the CTR region, the CT region, and the TOP region, respectively, and measure the temperatures of the BTM region, the CB region, the CTR region, the CT region, and the TOP region, respectively. The temperature measuring units 61-65 may be provided in the inner pipe 11 or in the space S.

[0027] The control unit 90 is configured to control the operation of each part of the heat treatment device 1A. The control unit 90 may be, for example, a computer. A computer program for controlling the operation of each part of the heat treatment device 1A is stored in a storage medium. The storage medium may be, for example, a flexible disk, a compact disk, a hard disk, a flash memory, a DVD, or the like.

[0028] The heat treatment apparatus 1A also has a partition structure 100. The partition structure 100 is provided in the space S. The partition structure 100 is made of a heat-resistant material, for example, a ceramic material such as alumina (Al2O3) or aluminum nitride (AlN), or quartz. The partition structure 100 includes vertical partition members 111-115, horizontal partition members 121-124, etc.

[0029] The vertical partition members 111-115 are provided at intervals in the circumferential direction of the processing vessel 10. The lower end of each of the vertical partition members 111-115 is held by the manifold 13. Each of the vertical partition members 111-115 extends in the up-down direction to divide the space S. Each of the vertical partition members 111-115 has a rectangular plate shape, and the upper end extends above the boundary between the TOP region and the CT region.

[0030] The horizontal partition members 121-124 are provided at intervals in the vertical direction. The horizontal partition members 121-124 are provided at the boundary between the BTM region and the CB region, the boundary between the CB region and the CTR region, the boundary between the CTR region and the CT region, and the boundary between the CT region and the TOP region, respectively. Each of the horizontal partition members 121-124 extends in the horizontal direction to divide the space S. Each of the horizontal partition members 121-124 has an annular plate shape, a center thereof is the same as the center of the outer tube 12, an inner diameter thereof is approximately the same as the outer diameter of the outer tube 12, and an outer diameter thereof is slightly smaller than the inner diameter of the heat insulating member 51. Each of the horizontal partition members 121-124 is detachably attached to the vertical partition members 111-115. However, each of the horizontal partition members 121-124 may be formed integrally with the vertical partition members 111-115.

[0031] As described above, the heat treatment apparatus 1A of the first embodiment has a plurality of vertical partition members 111-115 extending in the vertical direction to divide the space S, and a plurality of horizontal partition members 121-124 extending in the horizontal direction to divide the space S. This makes it possible to suppress the occurrence of convection in the circumferential direction of the processing vessel 10 within the space S, and also to suppress the occurrence of convection between different heating regions. As a result, the temperature variation within the processing vessel 10 can be reduced.

[0032] Second Embodiment An example of a heat treatment apparatus 1B according to a second embodiment will be described with reference to Fig. 4 and Fig. 5. Fig. 4 shows a state before a treatment container is attached inside a heat insulating member, and Fig. 5 shows a state after the treatment container is attached inside the heat insulating member.

[0033] The heat treatment apparatus 1B of the second embodiment differs from the heat treatment apparatus 1A in that it has a partition structure 200 instead of the partition structure 100. The rest of the configuration is the same as that of the heat treatment apparatus 1A. The following description will focus on the differences from the heat treatment apparatus 1A.

[0034] The partition structure 200 is provided in a space S. The partition structure 200 is made of a heat-resistant material, for example, a ceramic material such as Al2O3 or AlN, or quartz. The partition structure 200 includes vertical partition members 211-215, horizontal partition members 221-224, a support member 230, and the like.

[0035] The vertical partition members 211-215 are provided at intervals in the circumferential direction of the processing vessel 10. Each of the vertical partition members 211-215 extends in the up-down direction to divide the space S. The lower end of each of the vertical partition members 211-215 extends to the lowermost heating region, and the upper end of each of the vertical partition members 211-215 extends to the uppermost heating region. Each of the vertical partition members 211-215 can be folded in a zigzag shape. That is, each of the vertical partition members 211-215 is expandable and contractible in the up-down direction. For example, each of the vertical partition members 211-215 is folded and contracted when the processing vessel 10 is not attached inside the heat insulating member 51 (FIG. 4), and is expanded without being folded when the processing vessel 10 is attached inside the heat insulating member 51 (FIG. 5).

[0036] The horizontal partition members 221-224 may have the same configuration as the horizontal partition members 121-124 of the first embodiment. Each of the horizontal partition members 221-224 moves up and down as the vertical partition members 211-215 expand and contract. For example, when the vertical partition members 211-215 contract, each of the horizontal partition members 221-224 moves to the BTM region. Also, when the vertical partition members 211-215 expand, each of the horizontal partition members 221-224 moves to the boundary between the BTM region and the CB region, the boundary between the CB region and the CTR region, the boundary between the CTR region and the CT region, and the boundary between the CT region and the TOP region, respectively, and divides the space S.

[0037] The support member 230 is connected to the upper ends of the vertical partition members 211-215. The support member 230 has a cap shape that fits along the ceiling portion of the outer pipe 12, and is held by the ceiling portion of the outer pipe 12 (FIG. 5). When the support member 230 is held by the ceiling portion of the outer pipe 12, the vertical partition members 211-215 extend.

[0038] As described above, the heat treatment apparatus 1B of the second embodiment has a plurality of vertical partition members 211-215 extending in the vertical direction to divide the space S, and a plurality of horizontal partition members 221-224 extending in the horizontal direction to divide the space S. This makes it possible to suppress convection in the circumferential direction of the processing vessel 10 within the space S, and also to suppress convection between different heating regions. As a result, the temperature variation within the processing vessel 10 can be reduced.

[0039] Third embodiment An example of a heat treatment apparatus 1C according to a third embodiment will be described with reference to Figures 6 and 7. Note that configurations other than an outer tube and a partition structure are omitted in Figures 6 and 7.

[0040] The heat treatment apparatus 1C of the third embodiment differs from the heat treatment apparatus 1A in that it has a partition structure 300 instead of the partition structure 100. The rest of the configuration is the same as that of the heat treatment apparatus 1A. The following description will focus on the differences from the heat treatment apparatus 1A.

[0041] The partition structure 300 is provided in the space S. The partition structure 300 is made of a heat-resistant material, for example, a ceramic material such as Al2O3 or AlN, or quartz. The partition structure 300 includes vertical partition members 311-314, horizontal partition members 321-323, and the like.

[0042] The vertical partition members 311-314 are provided at intervals in the circumferential direction of the processing vessel 10. Each of the vertical partition members 311-314 is fixed to the outer peripheral wall of the outer tube 12. Each of the vertical partition members 311-314 extends in the vertical direction to divide the space S. Each of the vertical partition members 311-314 has a rectangular plate shape, with a lower end extending to the lowermost heating region and an upper end extending to the uppermost heating region.

[0043] Three notches 311n1 to 311n3 are formed in the vertical partition member 311 at intervals in the up-down direction. Three notches 312n1 to 312n3 are formed in the vertical partition member 312 at intervals in the up-down direction. Three notches 313n1 to 313n3 are formed in the vertical partition member 313 at intervals in the up-down direction. Three notches 314n1 to 314n3 are formed in the vertical partition member 314 at intervals in the up-down direction.

[0044] Each of the notches 311n1-311n3, 312n1-312n3, 313n1-313n3, 314n1-314n3 is formed, for example, at the boundary between adjacent heating regions. Each of the vertical partition members 311-314 holds the horizontal partition member 321 at the notches 311n1, 312n1, 313n1, 314n1. Each of the vertical partition members 311-314 holds the horizontal partition member 322 at the notches 311n2, 312n2, 313n2, 314n2. Each of the vertical partition members 311-314 holds the horizontal partition member 323 at the notches 311n3, 312n3, 313n3, 314n3.

[0045] The horizontal partition members 321-323 are provided at intervals in the vertical direction. Each of the horizontal partition members 321-323 is provided at the boundary between adjacent heating regions. Each of the horizontal partition members 321-323 extends in the horizontal direction to divide the space S. Each of the horizontal partition members 321-323 has an annular plate shape, a center coincident with the center of the outer tube 12, an inner diameter approximately the same as the outer diameter of the outer tube 12, and an outer diameter slightly smaller than the inner diameter of the heat insulating member 51. Each of the horizontal partition members 321-323 is formed with a notch 321n-323n.

[0046] The notches 321n to 323n are formed on the inner periphery of the horizontal partition members 321 to 323. The horizontal partition member 321 is attached to the vertical partition members 311 to 314 by moving it downward with the notch 321n aligned with the vertical partition members 311 to 314 (FIG. 7) and rotating it at the height of the notches 311n1, 312n1, 313n1, and 314n1 (FIG. 6). The horizontal partition member 322 is attached to the vertical partition members 311 to 314 by moving it downward with the notch 322n aligned with the vertical partition members 311 to 314 (FIG. 7) and rotating it at the height of the notches 311n2, 312n2, 313n2, and 314n2 (FIG. 6). The horizontal partition member 323 is attached to the vertical partition members 311-314 by moving it downward with the notches 323n aligned with the vertical partition members 311-314 (FIG. 7) and rotating it at the height of the notches 311n3, 312n3, 313n3, and 314n3 (FIG. 6). In this manner, the horizontal partition members 321-323 are detachably attached to the vertical partition members 311-314.

[0047] As described above, the heat treatment apparatus 1C of the third embodiment has a plurality of vertical partition members 311-314 extending in the vertical direction to divide the space S, and a plurality of horizontal partition members 321-323 extending in the horizontal direction to divide the space S. This makes it possible to suppress convection in the circumferential direction of the processing vessel 10 within the space S, and also to suppress convection between different heating regions. As a result, the temperature variation within the processing vessel 10 can be reduced.

[0048] In the heat treatment apparatus 1C of the third embodiment, the horizontal partition members 321-323 are each annular plate-shaped, but the present invention is not limited thereto. For example, at least one of the horizontal partition members 321-323 may be divided into a plurality of pieces in the circumferential direction of the treatment vessel 10. As an example, as shown in FIG. 8, the horizontal partition member 321 may include two divided pieces 321a and 321b each having a semi-annular plate shape. In this case, when the horizontal partition member 321 is attached to the vertical partition members 311-314, it can be attached from the side of the outer tube 12 without attaching the vertical partition members 311-314 from above, so that it is not necessary to provide a notch in the horizontal partition member 321. The horizontal partition members 322 and 323 may be the same as the horizontal partition member 321.

[0049] [Fourth embodiment] An example of a heat treatment apparatus 1D according to a fourth embodiment will be described with reference to Figures 9 and 10. Note that in Figures 9 and 10, configurations other than an outer tube and a partition structure are omitted from illustration.

[0050] The heat treatment apparatus 1D of the fourth embodiment differs from the heat treatment apparatus 1C in that it has a partition structure 400 instead of the partition structure 300. The rest of the configuration is the same as that of the heat treatment apparatus 1C. The following description will focus on the differences from the heat treatment apparatus 1C.

[0051] The partition structure 400 is provided in the space S. The partition structure 400 is made of a heat-resistant material, for example, a ceramic material such as Al2O3 or AlN, or quartz. The partition structure 400 includes vertical partition members 411-414, horizontal partition members 421-423, protrusions 431-434, and the like.

[0052] The vertical partition members 411-414 are provided at intervals in the circumferential direction of the processing vessel 10. Each of the vertical partition members 411-414 extends in the vertical direction to divide the space S. Each of the vertical partition members 411-414 has a rectangular plate shape, with a lower end extending to the lowermost heating region and an upper end extending to the uppermost heating region.

[0053] Vertical partition member 411 includes three divided pieces 411a to 411c divided in the up-down direction. Vertical partition member 412 includes three divided pieces 412a to 412c divided in the up-down direction. Vertical partition member 413 includes three divided pieces 413a to 413c divided in the up-down direction.

[0054] Divided pieces 411a to 414a are formed integrally with horizontal partition member 421 on the lower surface of horizontal partition member 421. Divided pieces 411b to 414b are formed integrally with horizontal partition member 422 on the lower surface of horizontal partition member 422. Divided pieces 411c to 414c are formed integrally with horizontal partition member 423 on the lower surface of horizontal partition member 423.

[0055] The horizontal partition members 421-423 are provided at intervals in the vertical direction. Each of the horizontal partition members 421-423 is provided at the boundary between adjacent heating regions. Each of the horizontal partition members 421-423 extends in the horizontal direction to divide the space S. Each of the horizontal partition members 421-423 has an annular plate shape, a center coincident with the center of the outer tube 12, an inner diameter approximately the same as the outer diameter of the outer tube 12, and an outer diameter slightly smaller than the inner diameter of the heat insulating member 51. Each of the horizontal partition members 421-423 is formed with a notch 421n-423n.

[0056] The notches 421n-423n are formed on the inner periphery of the horizontal partition members 421-423. The horizontal partition member 421 is attached onto the lowermost convex portions 431-434 (FIG. 9) by moving it downward with the notches 421n and the convex portions 431-434 aligned (FIG. 10) and rotating it at the height position of the upper surfaces of the lowermost convex portions 431-434 (FIG. 10). The horizontal partition member 422 is attached onto the middle-stage convex portions 431-434 (FIG. 9) by moving it downward with the notches 422n and the convex portions 431-434 aligned (FIG. 10) and rotating it at the height position of the upper surfaces of the middle-stage convex portions 431-434 (FIG. 10). The horizontal partition member 423 is attached onto the uppermost convex portion 431-434 by moving it downward with the notch 423n aligned with the convex portions 431-434 (FIG. 10) and rotating it at the height of the upper surface of the uppermost convex portion 431-434 (FIG. 9). In this manner, the vertical partition members 411-414 and the horizontal partition members 421-423 are detachably attached to the outer tube 12.

[0057] The protrusions 431-434 are provided at intervals in the circumferential direction of the processing vessel 10. Each of the protrusions 431-434 protrudes from the outer peripheral wall of the outer tube 12 and holds the horizontal partition members 421-423 on the upper surface. Each of the protrusions 431-434 has, for example, a rectangular parallelepiped shape. However, each of the protrusions 431-434 may have a cylindrical shape with the radial direction of the processing vessel 10 as the axial direction.

[0058] As described above, the heat treatment apparatus 1D of the fourth embodiment has a plurality of vertical partition members 411-414 extending in the vertical direction to divide the space S, and a plurality of horizontal partition members 421-423 extending in the horizontal direction to divide the space S. This makes it possible to suppress convection in the circumferential direction of the processing vessel 10 in the space S, and also to suppress convection between different heating regions. As a result, the temperature variation in the processing vessel 10 can be reduced.

[0059] In the heat treatment device 1D of the fourth embodiment, the horizontal partition members 421-423 are formed separately, but the present invention is not limited to this. For example, as shown in Fig. 11, two horizontal partition members 421, 422 may be integrally formed by being connected by divided pieces 411b-414b. Also, for example, two horizontal partition members 422, 423 may be integrally formed, or three horizontal partition members 421-423 may be integrally formed.

[0060] In the heat treatment apparatus 1D of the fourth embodiment, the horizontal partition members 421-423 are each formed in a circular plate shape, but the present invention is not limited thereto. For example, at least one of the horizontal partition members 421-423 may be divided into a plurality of parts in the circumferential direction of the treatment vessel 10. As an example, as shown in FIG. 12, the horizontal partition member 421 may include two divided pieces 421a and 421b each having a semicircular plate shape. In this case, when the horizontal partition member 421 is attached onto the lowermost protrusions 431-434, it can be attached from the side of the outer tube 12 without being attached from above the protrusions 431-434, so that it is not necessary to provide a notch in the horizontal partition member 421. The horizontal partition members 422 and 423 may be similar to the horizontal partition member 421.

[0061] Fifth embodiment An example of a heat treatment apparatus 1E according to the fifth embodiment will be described with reference to Fig. 13. Note that in Fig. 13, configurations other than the outer tube and the partition structure are omitted from illustration.

[0062] The heat treatment apparatus 1E of the fifth embodiment differs from the heat treatment apparatus 1D in that it has a partition structure 500 instead of the partition structure 400. The rest of the configuration is the same as that of the heat treatment apparatus 1D. The following description will focus on the differences from the heat treatment apparatus 1D.

[0063] The partition structure 500 is provided in the space S. The partition structure 500 is made of a heat-resistant material, for example, a ceramic material such as Al2O3 or AlN, or quartz. The partition structure 500 includes vertical partition members 511-514, horizontal partition members 521-523, convex portions 531-534, and the like.

[0064] The vertical partition members 511 to 514 may have the same configuration as the vertical partition members 411 to 414 of the fourth embodiment.

[0065] The horizontal partition members 521-523 are different from the horizontal partition members 421-423 of the fourth embodiment in that they are not formed with the notches 421n-423n.

[0066] Unlike the protrusions 431 to 434 in the fourth embodiment, the protrusions 531 to 534 are provided only on the bottom portion.

[0067] In the partition structure 500, the horizontal partition member 521 is placed on the protrusions 431-434, the lower ends of the vertical partition members 511b-514b are placed on the horizontal partition member 521, and the lower ends of the vertical partition members 511c-514c are placed on the horizontal partition member 522 (FIG. 13).

[0068] As described above, the heat treatment apparatus 1E of the fifth embodiment has a plurality of vertical partition members 511-514 extending in the vertical direction to divide the space S, and a plurality of horizontal partition members 521-523 extending in the horizontal direction to divide the space S. This makes it possible to suppress the occurrence of convection in the circumferential direction of the processing vessel 10 within the space S, and also to suppress the occurrence of convection between different heating regions. As a result, the temperature variation within the processing vessel 10 can be reduced.

[0069] Sixth embodiment An example of a heat treatment apparatus 1F according to the sixth embodiment will be described with reference to Fig. 14. Note that in Fig. 14, configurations other than the outer tube and the partition structure are omitted from illustration.

[0070] The heat treatment apparatus 1F of the sixth embodiment differs from the heat treatment apparatus 1E in that it has a partition structure 600 instead of the partition structure 500. The other configurations are the same as those of the heat treatment apparatus 1E. The following description will focus on the differences from the heat treatment apparatus 1D.

[0071] The partition structure 600 is provided in the space S. The partition structure 600 is made of a heat-resistant material, for example, a ceramic material such as Al2O3 or AlN, or quartz. The partition structure 600 includes vertical partition members 611-614, horizontal partition members 621-623, a protrusion 630, and the like.

[0072] The vertical partition members 611 to 614 may have the same configuration as the vertical partition members 511 to 514 in the fifth embodiment.

[0073] The horizontal partition members 621 to 623 may have the same configuration as the horizontal partition members 521 to 523 of the fifth embodiment.

[0074] The protrusion 630 has a flange shape that protrudes from the outer peripheral wall of the outer tube 12, and holds the horizontal partition members 621-623 on the upper surface.

[0075] In the partition structure 600, the lower ends of the vertical partition members 611a to 614a are placed on the protrusion 630, the lower ends of the vertical partition members 611b to 614b are placed on the horizontal partition member 621, and the lower ends of the vertical partition members 611c to 614c are placed on the horizontal partition member 622 (FIG. 14).

[0076] As described above, the heat treatment apparatus 1F of the sixth embodiment has a plurality of vertical partition members 611-614 extending in the vertical direction to divide the space S, and a plurality of horizontal partition members 621-623 extending in the horizontal direction to divide the space S. This makes it possible to suppress convection in the circumferential direction of the processing vessel 10 in the space S, and also to suppress convection between different heating regions. As a result, it is possible to reduce temperature variation in the processing vessel 10.

[0077] Seventh embodiment An example of a heat treatment apparatus 1G according to the seventh embodiment will be described with reference to Figures 15 and 16. Note that in Figures 15 and 16, configurations other than the outer tube and the partition structure are omitted from illustration.

[0078] The heat treatment apparatus 1G of the seventh embodiment differs from the heat treatment apparatus 1A in that it has a partition structure 700 instead of the partition structure 100. The rest of the configuration is the same as that of the heat treatment apparatus 1A. The following description will focus on the differences from the heat treatment apparatus 1A.

[0079] The partition structure 700 is provided in the space S. The partition structure 700 is made of a heat-resistant material, for example, a ceramic material such as Al2O3 or AlN, or quartz. The partition structure 700 includes vertical partition members 711-714, horizontal partition members 721-724, protrusions 731-734, and the like.

[0080] The vertical partition members 711-714 are provided at intervals in the circumferential direction of the processing vessel 10. Each of the vertical partition members 711-714 is detachably attached to the horizontal partition members 721-724. Each of the vertical partition members 711-714 extends in the vertical direction to divide the space S. Each of the vertical partition members 711-714 has a rectangular plate shape, with a lower end extending to the lowermost heating region and an upper end extending to the uppermost heating region.

[0081] Four notches 711n1 to 711n4 are formed at intervals in the vertical direction in the vertical partition member 711. The vertical partition member 711 is attached to the horizontal partition members 721 to 724 by inserting the notches 711n1 to 711n4 into the outer notches 721m to 724m.

[0082] Four notches 712n1 to 712n4 are formed at intervals in the vertical direction in the vertical partition member 712. The vertical partition member 712 is attached to the horizontal partition members 721 to 724 by inserting the notches 712n1 to 712n4 into the outer notches 721m to 724m.

[0083] Four notches 713n1 to 713n4 are formed at intervals in the vertical direction in the vertical partition member 713. The vertical partition member 713 is attached to the horizontal partition members 721 to 724 by inserting the notches 713n1 to 713n4 into the outer notches 721m to 724m.

[0084] Four notches 714n1 to 714n4 are formed at intervals in the vertical direction in the vertical partition member 714. The vertical partition member 711 is attached to the horizontal partition members 721 to 724 by inserting the notches 714n1 to 714n4 into the outer notches 721m to 724m.

[0085] The horizontal partition members 721-724 are provided at intervals in the vertical direction. Each of the horizontal partition members 721-724 is provided at the boundary between adjacent heating regions. Each of the horizontal partition members 721-724 extends in the horizontal direction to divide the space S. Each of the horizontal partition members 721-724 has an annular plate shape, a center coincident with the center of the outer tube 12, an inner diameter approximately the same as the outer diameter of the outer tube 12, and an outer diameter slightly smaller than the inner diameter of the heat insulating member 51. Each of the horizontal partition members 721-724 is formed with inner notches 721n-724n and outer notches 721m-724m.

[0086] The inner notches 721n-724n are formed on the inner periphery of the horizontal partition members 721-724. The horizontal partition member 721 is attached onto the lowermost convex portion 731-734 by moving it downward with the inner notch 721n and the convex portions 731-734 aligned (FIG. 16) and rotating it at the height position of the upper surfaces of the lowermost convex portions 731-734 (FIG. 15). The horizontal partition member 722 is attached onto the second-lowest convex portion 731-734 by moving it downward with the inner notch 722n and the convex portions 731-734 aligned (FIG. 16) and rotating it at the height position of the upper surfaces of the second-lowest convex portions 731-734 (FIG. 15). The horizontal partition member 723 is attached onto the third protrusion 731-734 from the bottom by moving it downward with the inner notch 723n and the protrusions 731-734 aligned (FIG. 16) and rotating it at the height of the upper surfaces of the third protrusions 731-734 from the bottom (FIG. 15). The horizontal partition member 724 is attached onto the uppermost protrusion 731-734 by moving it downward with the inner notch 724n and the protrusions 731-734 aligned (FIG. 16) and rotating it at the height of the upper surfaces of the uppermost protrusions 731-734 (FIG. 15). In this way, the horizontal partition members 721-724 are detachably attached onto the protrusions 731-734.

[0087] The outer cutouts 721m-724m are formed in the outer periphery of the horizontal partition members 721-724.

[0088] The protrusions 731-734 are provided at intervals in the circumferential direction of the processing vessel 10. Each of the protrusions 731-734 protrudes from the outer peripheral wall of the outer tube 12 and holds the horizontal partition members 721-724. Each of the protrusions 731-734 has, for example, a rectangular parallelepiped shape. However, each of the protrusions 731-734 may have a cylindrical shape with its axial direction aligned with the radial direction of the processing vessel 10.

[0089] As described above, the heat treatment apparatus 1G of the seventh embodiment has a plurality of vertical partition members 711-714 extending in the vertical direction to divide the space S, and a plurality of horizontal partition members 721-724 extending in the horizontal direction to divide the space S. This makes it possible to suppress convection in the circumferential direction of the processing vessel 10 in the space S, and also to suppress convection between different heating regions. As a result, it is possible to reduce temperature variation in the processing vessel 10.

[0090] In the heat treatment device 1G of the seventh embodiment, the vertical partition members 711-714 are formed with rectangular notches 711n1-711n4, 712n1-712n4, 713n1-713n4, and 714n1-714n4 in a side view, but the present invention is not limited to this. For example, as shown in Fig. 17, each of the notches 711n1-711n4 may be L-shaped in a side view. Also, each of the notches 712n1-712n4, 713n1-713n4, and 714n1-714n4 may be L-shaped in a side view, similar to each of the notches 711n1-711n4. Since the notches 711n1 to 711n4, 712n1 to 712n4, 713n1 to 713n4, and 714n1 to 714n4 are L-shaped in side view, the vertical partition members 711 to 714 are prevented from coming off the horizontal partition members 721 to 724 due to vibration or the like.

[0091] In addition, in the heat treatment apparatus 1G of the seventh embodiment, the vertical partition members 711-714 extend from the lowermost heating region to the uppermost heating region, but the present invention is not limited to this. For example, the vertical partition members 711-714 may be divided into a plurality of parts in the vertical direction. As an example, as shown in Figs. 18 and 19, the vertical partition member 711 may include two divided pieces 711a and 711b divided in the vertical direction. In addition, the vertical partition members 712-714 may be similar to the vertical partition member 711.

[0092] In the heat treatment apparatus 1G of the seventh embodiment, the horizontal partition members 721-724 are each formed in a circular plate shape, but the present invention is not limited thereto. For example, at least one of the horizontal partition members 721-724 may be divided into a plurality of pieces in the circumferential direction of the treatment vessel 10. As an example, as shown in FIG. 20, the horizontal partition member 721 may include two divided pieces 721a and 721b each having a semicircular plate shape. In this case, when the horizontal partition member 721 is attached onto the lowermost convex parts 731-734, it can be attached from the side of the outer tube 12 without attaching it from above the convex parts 731-734, so that the horizontal partition member 721 does not need to have an inner notch. The horizontal partition members 722-724 may also be similar to the horizontal partition member 721.

[0093] Eighth embodiment An example of a heat treatment apparatus 1H according to an eighth embodiment will be described with reference to Figures 21 and 22. Note that in Figures 21 and 22, illustration of components other than an outer tube and a partition structure is omitted.

[0094] The heat treatment apparatus 1H of the eighth embodiment differs from the heat treatment apparatus 1G in that it has a partition structure 800 instead of the partition structure 700. The rest of the configuration is the same as that of the heat treatment apparatus 1G. The following description will focus on the differences from the heat treatment apparatus 1G.

[0095] The partition structure 800 is provided in the space S. The partition structure 800 is made of a heat-resistant material, for example, a ceramic material such as Al2O3 or AlN, or quartz. The partition structure 800 includes vertical partition members 811-814, horizontal partition members 821-824, convex portions 831-834, and the like.

[0096] The vertical partition members 811-814 are provided at intervals in the circumferential direction of the processing vessel 10. The vertical partition members 811-814 are detachably attached to the horizontal partition members 821-824. The vertical partition members 811-814 extend in the up-down direction to divide the space S.

[0097] Vertical partition member 811 includes segments 811a to 811c, vertical partition member 812 includes segments 812a to 812c, vertical partition member 813 includes segments 813a to 813c, and vertical partition member 814 includes segments 814a to 814c. Segments 811a to 814a are attached between horizontal partition member 821 and horizontal partition member 822. Segments 811b to 814b are attached between horizontal partition member 822 and horizontal partition member 823. Segments 811c to 814c are attached between horizontal partition member 823 and horizontal partition member 824.

[0098] The segments 811a to 811c include legs 811a1 to 811c1, connecting portions 811a2 to 811c2, and arms 811a3 to 811c3. The segments 812a to 812c include legs 812a1 to 812c1, connecting portions 812a2 to 812c2, and arms 812a3 to 812c3. The segments 813a to 813c include legs 812a1 to 812c1, connecting portions 812a2 to 812c2, and arms 812a3 to 812c3. The segments 814a to 814c include legs 814a1 to 814c1, connecting portions 814a2 to 814c2, and arms 814a3 to 814c3.

[0099] The legs 811a1-814a1 have an arcuate plate shape with the same curvature as horizontal partition member 821, and are placed on horizontal partition member 821. The connecting portions 811a2-814a2 have a rectangular plate shape, and connect the legs 811a1-814a1 and the arm portions 811a3-814a3. The arm portions 811a3-814a3 have an arcuate plate shape with the same curvature as horizontal partition member 822, and support horizontal partition member 822 on their upper surfaces.

[0100] The legs 811b1-814b1 have an arcuate plate shape with the same curvature as horizontal partition member 822, and are placed on horizontal partition member 822. The connecting portions 811b2-814b2 have a rectangular plate shape, and connect the legs 811b1-814b1 and the arm portions 811b3-814b3. The arm portions 811b3-814b3 have an arcuate plate shape with the same curvature as horizontal partition member 823, and support horizontal partition member 823 on their upper surfaces.

[0101] The legs 811c1-814c1 have an arcuate plate shape with the same curvature as horizontal partition member 823, and are placed on horizontal partition member 823. The connecting portions 811c2-814c2 have a rectangular plate shape, and connect the legs 811c1-814c1 and the arm portions 811c3-814c3. The arm portions 811c3-814c3 have an arcuate plate shape with the same curvature as horizontal partition member 824, and support horizontal partition member 824 on their upper surfaces.

[0102] The horizontal partition members 821-824 are provided at intervals in the vertical direction. Each of the horizontal partition members 821-824 is provided at the boundary between adjacent heating regions. Each of the horizontal partition members 821-824 extends in the horizontal direction to divide the space S. Each of the horizontal partition members 821-824 has an annular plate shape, a center coincident with the center of the outer tube 12, an inner diameter approximately the same as the outer diameter of the outer tube 12, and an outer diameter slightly smaller than the inner diameter of the heat insulating member 51. Each of the horizontal partition members 821-824 is formed with a notch 821n-824n.

[0103] The notches 821n-824n are formed on the inner periphery of the horizontal partition members 821-824. The horizontal partition member 821 is attached onto the lowermost convex portion 831-834 by moving it downward with the notches 821n and the convex portions 831-834 aligned (FIG. 22) and rotating it at the height position of the upper surfaces of the lowermost convex portions 831-834 (FIG. 21). The horizontal partition member 822 is attached onto the second-lowest convex portions 831-834 by moving it downward with the notches 822n and the convex portions 831-834 aligned (FIG. 22) and rotating it at the height position of the upper surfaces of the second-lowest convex portions 831-834 (FIG. 21). The horizontal partition member 823 is attached onto the third protrusions 831-834 from the bottom by moving it downward with the notches 823n and the protrusions 831-834 aligned (FIG. 22) and rotating it at the height of the upper surfaces of the third protrusions 831-834 from the bottom (FIG. 21). The horizontal partition member 824 is attached onto the uppermost protrusions 831-834 by moving it downward with the notches 824n and the protrusions 831-834 aligned (FIG. 22) and rotating it at the height of the upper surfaces of the uppermost protrusions 831-834 (FIG. 21). In this way, the horizontal partition members 821-824 are detachably attached onto the protrusions 831-834.

[0104] The convex portions 831 to 834 may have the same configuration as the convex portions 731 to 734 in the seventh embodiment.

[0105] As described above, the heat treatment apparatus 1H of the eighth embodiment has a plurality of vertical partition members 811-814 extending in the vertical direction to divide the space S, and a plurality of horizontal partition members 821-824 extending in the horizontal direction to divide the space S. This makes it possible to suppress convection in the circumferential direction of the processing vessel 10 in the space S, and also to suppress convection between different heating regions. As a result, the temperature variation in the processing vessel 10 can be reduced.

[0106] In the heat treatment device 1H of the eighth embodiment, the divided pieces include legs, connecting parts, and arms, but the present invention is not limited to this. For example, as shown in FIG. 23, the divided pieces 811a may have legs 811a1 and connecting parts 811a2, but may not have arms 811a3. The divided pieces 811b-811c, 812a-812c, 813a-813c, and 814a-814c may have the same configuration as the divided piece 811a. The legs, connecting parts, and arms included in the divided pieces may be formed separately or integrally.

[0107] Ninth embodiment An example of a heat treatment apparatus 1I according to the ninth embodiment will be described with reference to Figures 24 and 25. Note that in Figures 24 and 25, configurations other than the outer tube and the partition structure are omitted from illustration.

[0108] The heat treatment apparatus 1I of the ninth embodiment differs from the heat treatment apparatus 1G in that it has a partition structure 900 instead of the partition structure 700. The rest of the configuration is the same as that of the heat treatment apparatus 1G. The following description will focus on the differences from the heat treatment apparatus 1G.

[0109] The partition structure 900 is provided in a space S. The partition structure 900 is made of a heat-resistant material, for example, a ceramic material such as Al2O3 or AlN, or quartz. The partition structure 900 includes vertical partition members 911-914, horizontal partition members 921-924, convex portions 931-934, and the like.

[0110] The vertical partition members 911-914 are provided at intervals in the circumferential direction of the processing vessel 10. The vertical partition members 911-914 are detachably attached to the horizontal partition members 921-924. The vertical partition members 911-914 extend in the up-down direction to divide the space S.

[0111] Vertical partition member 911 includes division pieces 911a to 911c, vertical partition member 912 includes division pieces 912a to 912c, vertical partition member 913 includes division pieces 913a to 913c, and vertical partition member 914 includes division pieces 914a to 914c. Division pieces 911a to 914a are attached between horizontal partition member 921 and horizontal partition member 922. Division pieces 911b to 914b are attached between horizontal partition member 922 and horizontal partition member 923. Division pieces 911c to 914c are attached between horizontal partition member 923 and horizontal partition member 924.

[0112] The horizontal partition members 921-924 are provided at intervals in the up-down direction. Each of the horizontal partition members 921-924 is provided at the boundary between adjacent heating regions. Each of the horizontal partition members 921-924 extends in the horizontal direction to divide the space S. Each of the horizontal partition members 921-924 has an annular plate shape, a center coincident with the center of the outer tube 12, an inner diameter approximately equal to the outer diameter of the outer tube 12, and an outer diameter slightly smaller than the inner diameter of the heat insulating member 51. Each of the horizontal partition members 921-924 is formed with notches 921n-924n and guide portions 921g-923g.

[0113] The notches 921n-924n are formed on the inner periphery of the horizontal partition members 921-924. The horizontal partition member 921 is attached onto the lowermost convex portion 931-934 by moving it downward with the notches 921n and the convex portions 931-934 aligned (FIG. 25) and rotating it at the height position of the upper surfaces of the lowermost convex portions 931-934 (FIG. 24). The horizontal partition member 922 is attached onto the second-lowest convex portion 931-934 by moving it downward with the notches 922n and the convex portions 931-934 aligned (FIG. 25) and rotating it at the height position of the upper surfaces of the second-lowest convex portions 931-934 (FIG. 24). The horizontal partition member 923 is attached onto the third protrusion 931-934 from the bottom by moving it downward with the notch 923n and the protrusion 931-934 aligned (FIG. 25) and rotating it at the height of the upper surface of the third protrusion 931-934 from the bottom (FIG. 24). The horizontal partition member 924 is attached onto the uppermost protrusion 931-934 by moving it downward with the notch 924n and the protrusion 931-934 aligned (FIG. 25) and rotating it at the height of the upper surface of the uppermost protrusion 931-934 (FIG. 24). In this way, the horizontal partition members 921-924 are detachably attached onto the protrusions 931-934.

[0114] The guide portions 921g-923g are fixed to the horizontal partition members 921-924 and hold the vertical partition members 911-914 between the adjacent horizontal partition members 921-924. The guide portion 921g includes a lower guide 921g1 fixed to the upper surface of the horizontal partition member 921 and an upper guide 921g2 fixed to the lower surface of the horizontal partition member 921, and holds the divided pieces 911a-914a between the horizontal partition members 921 and 922. The guide portion 922g includes a lower guide 922g1 fixed to the upper surface of the horizontal partition member 922 and an upper guide 922g2 fixed to the lower surface of the horizontal partition member 923, and holds the divided pieces 911b-914b between the horizontal partition members 922 and 923. The guide portion 923g includes a lower guide 923g1 fixed to the upper surface of the horizontal partition member 923 and an upper guide 923g2 fixed to the lower surface of the horizontal partition member 924, and holds the divided pieces 911c to 914c between the horizontal partition members 923 and 924.

[0115] The convex portions 931 to 934 may have the same configuration as the convex portions 731 to 734 in the seventh embodiment.

[0116] As described above, the heat treatment apparatus 1I of the ninth embodiment has a plurality of vertical partition members 911-914 extending in the vertical direction to divide the space S, and a plurality of horizontal partition members 921-924 extending in the horizontal direction to divide the space S. This can suppress the occurrence of convection in the circumferential direction of the processing vessel 10 in the space S, and can also suppress the occurrence of convection between different heating regions. As a result, the temperature variation in the processing vessel 10 can be reduced.

[0117] Tenth embodiment An example of a heat treatment apparatus 1J according to the tenth embodiment will be described with reference to Fig. 26. Note that in Fig. 26, configurations other than the partition structure are omitted from illustration.

[0118] A heat treatment apparatus 1J of the tenth embodiment differs from the heat treatment apparatus 1A in that it has a partition structure 1000 instead of the partition structure 100. The rest of the configuration is the same as that of the heat treatment apparatus 1A. The following description will focus on the differences from the heat treatment apparatus 1A.

[0119] The partition structure 1000 is provided in a space S. The partition structure 1000 is made of a heat-resistant material, for example, a ceramic material such as Al2O3 or AlN, or quartz. The partition structure 1000 includes vertical partition members 1011-1014, horizontal partition members 1021-1024, upper partition members 1031-1034, and the like.

[0120] The vertical partition members 1011-1014 are provided at intervals in the circumferential direction of the processing vessel 10. The vertical partition members 1011-1014 are attached to the horizontal partition members 1021-1024. The vertical partition members 1011-1014 extend in the up-down direction to divide the space S.

[0121] The horizontal partition members 1021-1024 are provided at intervals in the vertical direction. Each of the horizontal partition members 1021-1024 is provided at the boundary between adjacent heating regions. Each of the horizontal partition members 1021-1024 extends in the horizontal direction to divide the space S. Each of the horizontal partition members 1021-1024 has an annular plate shape, a center coincident with the center of the outer pipe 12, an inner diameter approximately the same as the outer diameter of the outer pipe 12, and an outer diameter slightly smaller than the inner diameter of the heat insulating member 51.

[0122] The upper partition members 1031-1034 are provided at intervals in the circumferential direction of the processing vessel 10 between the ceiling of the outer pipe 12 and the ceiling of the heat insulating member 51. Each of the upper partition members 1031-1034 extends in the radial direction of the outer pipe 12 and partitions the space S between the ceiling of the outer pipe 12 and the ceiling of the heat insulating member 51. Each of the upper partition members 1031-1034 is attached to the upper surface of the horizontal partition member 1024, for example.

[0123] As described above, the heat treatment apparatus 1J of the tenth embodiment has a plurality of vertical partition members 1011-1014 extending in the vertical direction to divide the space S, and a plurality of horizontal partition members 1021-1024 extending in the horizontal direction to divide the space S. This can suppress the occurrence of convection in the circumferential direction of the processing vessel 10 in the space S, and can also suppress the occurrence of convection between different heating regions. As a result, the temperature variation in the processing vessel 10 can be reduced.

[0124] Moreover, the heat treatment apparatus 1J of the tenth embodiment has upper partition members 1031-1034 that extend in the radial direction of the outer tube 12 and partition the space S between the ceiling of the outer tube 12 and the ceiling of the heat insulating member 51. This makes it possible to suppress the occurrence of convection in the circumferential direction of the processing vessel 10 in the space S between the ceiling of the outer tube 12 and the ceiling of the heat insulating member 51. As a result, the temperature variation in the processing vessel 10 can be further reduced.

[0125] Eleventh embodiment An example of a heat treatment apparatus 1K according to the eleventh embodiment will be described with reference to Fig. 27. Note that in Fig. 27, configurations other than the outer tube and the partition structure are omitted from illustration.

[0126] A heat treatment apparatus 1K of the eleventh embodiment differs from the heat treatment apparatus 1A in that it has a partition structure 1100 instead of the partition structure 100. The rest of the configuration is the same as that of the heat treatment apparatus 1A. The following description will focus on the differences from the heat treatment apparatus 1A.

[0127] The partition structure 1100 is provided in a space S. The partition structure 1100 is made of a heat-resistant material, for example, a ceramic material such as Al2O3 or AlN, or quartz. The partition structure 1100 includes vertical partition members 1111-1114, horizontal partition members 1121-1123, a convex portion 1130, a hanging portion 1140, and the like.

[0128] The vertical partition members 1111-1114 are provided at intervals in the circumferential direction of the processing vessel 10. Each of the vertical partition members 1111-1114 extends in the up-down direction to divide the space S.

[0129] The horizontal partition members 1121-1123 are provided at intervals in the vertical direction. Each of the horizontal partition members 1121-1123 is provided at the boundary between adjacent heating regions. Each of the horizontal partition members 1121-1123 extends in the horizontal direction to divide the space S. Each of the horizontal partition members 1121-1123 has an annular plate shape, a center coincident with the center of the outer tube 12, an inner diameter approximately the same as the outer diameter of the outer tube 12, and an outer diameter slightly smaller than the inner diameter of the heat insulating member 51. The horizontal partition members 1121-1123 are formed integrally with the vertical partition members 1111-1114.

[0130] The protruding portion 1130 is attached to the top of the outer tube 12. The protruding portion 1130 has, for example, a cylindrical shape with the axial direction extending in the up-down direction. However, the protruding portion 1130 may have a rectangular parallelepiped shape.

[0131] The hanging portion 1140 has one end attached to the protruding portion 1130 and the other end attached to the vertical partition members 1111-1114, and holds the vertical partition members 1111-1114 in a suspended state relative to the protruding portion 1130.

[0132] As described above, the heat treatment apparatus 1K of the eleventh embodiment has a plurality of vertical partition members 1111-1114 extending in the vertical direction to divide the space S, and a plurality of horizontal partition members 1121-1123 extending in the horizontal direction to divide the space S. This makes it possible to suppress convection in the circumferential direction of the processing vessel 10 within the space S, and also to suppress convection between different heating regions. As a result, the temperature variation within the processing vessel 10 can be reduced.

[0133] [Twelfth embodiment] An example of a heat treatment apparatus 1L according to the twelfth embodiment will be described with reference to Fig. 28. Note that in Fig. 28, configurations other than the outer tube and the partition structure are omitted from illustration.

[0134] The heat treatment apparatus 1L of the twelfth embodiment differs from the heat treatment apparatus 1K in that it has a partition structure 1200 instead of the partition structure 1100. The rest of the configuration is the same as that of the heat treatment apparatus 1K. The following description will focus on the differences from the heat treatment apparatus 1K.

[0135] The partition structure 1200 is provided in the space S. The partition structure 1200 is made of a heat-resistant material, for example, a ceramic material such as Al2O3 or AlN, or quartz. The partition structure 1200 includes vertical partition members 1211-1214, horizontal partition members 1221-1223, hanging portions 1231-1234, and the like.

[0136] The vertical partition members 1211 to 1214 may have the same configuration as the vertical partition members 1111 to 1114 in the eleventh embodiment.

[0137] The horizontal partition members 1221 to 1223 may have the same configuration as the horizontal partition members 1121 to 1123 of the eleventh embodiment.

[0138] The hanging portions 1231-1234 have one end attached to the ceiling portion of the heat insulating member 51 and the other end attached to the upper ends of the vertical partition members 1211-1214, and hold the vertical partition members 1211-1214 in a suspended state relative to the heat insulating member 51.

[0139] As described above, the heat treatment apparatus 1K of the twelfth embodiment has a plurality of vertical partition members 1211-1214 extending in the vertical direction to divide the space S, and a plurality of horizontal partition members 1221-1223 extending in the horizontal direction to divide the space S. This can suppress the occurrence of convection in the circumferential direction of the processing vessel 10 in the space S, and can also suppress the occurrence of convection between different heating regions. As a result, the temperature variation in the processing vessel 10 can be reduced.

[0140] Thirteenth embodiment An example of a heat treatment apparatus 1M according to the thirteenth embodiment will be described with reference to Fig. 29. Note that in Fig. 29, configurations other than the outer tube and the partition structure are omitted from illustration.

[0141] The heat treatment apparatus 1M of the thirteenth embodiment differs from the heat treatment apparatus 1K in that it has a partition structure 1300 instead of the partition structure 1100. The rest of the configuration is the same as that of the heat treatment apparatus 1K. The following description will focus on the differences from the heat treatment apparatus 1K.

[0142] The partition structure 1300 is provided in the space S. The partition structure 1300 is made of a heat-resistant material, for example, a ceramic material such as Al2O3 or AlN, or quartz. The partition structure 1300 includes vertical partition members 1311-1314, horizontal partition members 1321-1323, and the like.

[0143] The vertical partition members 1311 to 1314 may have the same configuration as the vertical partition members 1111 to 1114 in the eleventh embodiment.

[0144] The horizontal partition members 1321 to 1323 may have the same configuration as the horizontal partition members 1121 to 1123 of the eleventh embodiment.

[0145] As described above, the heat treatment apparatus 1K of the thirteenth embodiment has a plurality of vertical partition members 1311-1314 extending in the vertical direction to divide the space S, and a plurality of horizontal partition members 1321-1323 extending in the horizontal direction to divide the space S. This can suppress the occurrence of convection in the circumferential direction of the processing vessel 10 in the space S, and can also suppress the occurrence of convection between different heating regions. As a result, the temperature variation in the processing vessel 10 can be reduced.

[0146] [Fourteenth embodiment] An example of a heat treatment apparatus 1N according to the fourteenth embodiment will be described with reference to Fig. 30. Note that in Fig. 30, configurations other than the outer tube and the partition structure are omitted from illustration.

[0147] The heat treatment apparatus 1N of the fourteenth embodiment differs from the heat treatment apparatus 1K in that it has a partition structure 1400 instead of the partition structure 1100. The rest of the configuration is the same as that of the heat treatment apparatus 1K. The following description will focus on the differences from the heat treatment apparatus 1K.

[0148] The partition structure 1400 is provided in a space S. The partition structure 1400 is made of a heat-resistant material, for example, a ceramic material such as Al2O3 or AlN, or quartz. The partition structure 1400 includes vertical partition members 1411-1414, horizontal partition members 1421-1423, and the like.

[0149] The vertical partition members 1411-1414 are provided at intervals in the circumferential direction of the processing vessel 10. Each of the vertical partition members 1411-1414 extends in the up-down direction to divide the space S.

[0150] The horizontal partition members 1421-1423 are provided at intervals in the vertical direction. Each of the horizontal partition members 1421-1423 is provided at the boundary between adjacent heating regions. Each of the horizontal partition members 1421-1423 extends in the horizontal direction to divide the space S. Each of the horizontal partition members 1421-1423 has an annular plate shape, a center coincident with the center of the outer tube 12, an inner diameter approximately the same as the outer diameter of the outer tube 12, and an outer diameter slightly smaller than the inner diameter of the heat insulating member 51.

[0151] The vertical partition members 1411-1414 and the horizontal partition members 1421-1423 are integrally formed and fixed to the outer peripheral wall of the outer tube 12. The vertical partition members 1411-1414 and the horizontal partition members 1421-1423 may be integrally formed with the outer tube 12.

[0152] As described above, the heat treatment apparatus 1N of the fourteenth embodiment has a plurality of vertical partition members 1411-1414 extending in the vertical direction to divide the space S, and a plurality of horizontal partition members 1421-1423 extending in the horizontal direction to divide the space S. This can suppress the occurrence of convection in the circumferential direction of the processing vessel 10 in the space S, and can also suppress the occurrence of convection between different heating regions. As a result, the temperature variation in the processing vessel 10 can be reduced.

[0153] In the above embodiment, the vertical partition members 111-114, 211-214, 311-314, 411-414, 511-514, 611-614, 711-714, 811-814, 911-914, 1011-1014, 1111-1114, 1211-1214, 1311-1314, and 1411-1414 are examples of first partition members.

[0154] In the above embodiment, the horizontal partition members 121-124, 221-224, 321-323, 421-423, 521-523, 621-623, 721-724, 821-824, 921-924, 1021-1024, 1121-1123, 1221-1223, 1321-1323, and 1421-1423 are examples of second partition members.

[0155] In the above embodiment, the upper partition members 1031 to 1034 are an example of a third partition member.

[0156] The embodiments disclosed herein should be considered to be illustrative and not restrictive in all respects. The above-described embodiments may be omitted, substituted, or modified in various forms without departing from the scope and spirit of the appended claims.

[0157] In the above embodiment, the partition structure includes four vertical partition members, but the present disclosure is not limited to this. For example, the partition structure may include two or three vertical partition members, or may include five or more vertical partition members.

[0158] In the above embodiment, the partition structure includes three or four horizontal partition members, but the present disclosure is not limited to this. For example, the partition structure may include two horizontal partition members, or may include five or more horizontal partition members. [Explanation of symbols]

[0159] 1A~1N Heat treatment equipment 10 Processing vessel 51 Insulation materials 53 Heating element 100 Partition structure 111~114 Vertical partition members 121~124 Horizontal partition members S space

Claims

1. A cylindrical processing vessel; a heat insulating member provided around the processing vessel with a space therebetween; A heating element provided on an inner circumferential side of the heat insulating member; A partition structure provided in the space; having The partition structure includes: a plurality of first partition members extending in a longitudinal direction of the processing vessel and partitioning the space; a plurality of second partition members extending in a circumferential direction of the processing vessel to partition the space; Including, Each of the plurality of first partition members is extendable and contractible in a longitudinal direction of the processing vessel. Heat treatment equipment.

2. A cylindrical processing vessel; a heat insulating member provided around the processing vessel with a space therebetween; A heating element provided on an inner circumferential side of the heat insulating member; A partition structure provided in the space; having The partition structure includes: a plurality of first partition members extending in a longitudinal direction of the processing vessel and partitioning the space; a plurality of second partition members extending in a circumferential direction of the processing vessel to partition the space; Including, One or more of the plurality of first partition members and one or more of the plurality of second partition members are integrally formed. Heat treatment equipment.

3. A cylindrical processing vessel having one end closed; a heat insulating member provided around the processing vessel with a space therebetween; A heating element provided on an inner circumferential side of the heat insulating member; A partition structure provided in the space; having The partition structure includes: a plurality of first partition members extending in a longitudinal direction of the processing vessel and partitioning the space; a plurality of second partition members extending in a circumferential direction of the processing vessel to partition the space; a support member held at the one end of the processing vessel; Including, The support member is connected to the plurality of first partition members. Heat treatment equipment.

4. The partition structure is detachably attached to the processing vessel. The heat treatment apparatus according to claim 1 .

5. The partition structure is integrally formed with the processing vessel. The heat treatment apparatus according to claim 2 .

6. The partition structure is supported by the heat insulating member. The heat treatment apparatus according to claim 2 .

7. The plurality of first partition members are provided at intervals in a circumferential direction of the processing vessel. The heat treatment apparatus according to claim 1 .

8. Each of the plurality of first partition members has a rectangular plate shape. The heat treatment apparatus according to claim 1 .

9. At least one of the plurality of first partition members includes a plurality of divided pieces divided in a longitudinal direction of the processing vessel. The heat treatment apparatus according to claim 2 .

10. Each of the plurality of first partition members is extendable and contractible in a longitudinal direction of the processing vessel. The heat treatment apparatus according to claim 3 .

11. Each of the plurality of second partition members has an annular plate shape. The heat treatment apparatus according to claim 1 .

12. At least one of the plurality of second partition members includes a plurality of divided pieces divided in a circumferential direction of the processing vessel. The heat treatment apparatus according to claim 1 .

13. The plurality of first partition members and the plurality of second partition members are detachably connected to each other. The heat treatment apparatus according to claim 1 .

14. the partition structure includes a plurality of protrusions protruding from an outer peripheral wall of the processing vessel and holding the plurality of second partition members; The heat treatment apparatus according to claim 2 .

15. The processing vessel has one end closed, the partition structure includes a third partition member that partitions a space between the one end of the processing vessel and the heat insulating member. The heat treatment apparatus according to claim 2 .

16. The partition structure is formed of a heat-resistant material. The heat treatment apparatus according to claim 1 .

Citation Information

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