ROBOTIC APPARATUS, SYSTEM AND METHOD FOR SUBSTRATE TRANSPORT IN ELECTRONIC DEVICE MANUFACTURING - Patent application

Abstract

An electronic device manufacturing system, robotic apparatus, and related methods are described. The systems, apparatus, and methods are configured to efficiently retrieve and place substrates from N substrate supports (where N>2). The robotic apparatus includes at least N end effectors and one end effector (N+1) or two end effectors (N+2), allowing the robot to sequentially retrieve and place substrates in one or more process chambers during a single cycle (e.g., without having to return to a load lock or other location to deposit processed substrates and retrieve unprocessed substrates).

Description

[Technical field]

[0001] The present disclosure relates to electronic device manufacturing, and more particularly to an apparatus and method adapted for transporting multiple substrates within an electronic device manufacturing apparatus. [Background technology]

[0002]

[0002] A conventional electronic device manufacturing system may include multiple chambers, such as process chambers and load lock chambers. Such chambers may be included in a cluster tool, in which multiple such process chambers and load lock chambers are distributed around a transfer chamber. Alternatively, such chambers may be included in a linear tool, in which multiple such process chambers and load lock chambers are distributed around a rectangular transfer chamber.

[0003]

[0003] Such electronic device manufacturing systems may employ robotic devices in a transfer chamber configured to transfer substrates between various load lock chambers and process chambers. In some embodiments, the transfer chamber, process chambers, and load lock chambers may operate under reduced pressure at certain times. However, in certain configurations of electronic device manufacturing systems, transferring substrates between various chambers using the robotic devices may be inefficient and may involve repeatedly moving the robot arm between the load lock chambers and the process chambers.

[0004]

[0004] Therefore, there is a need for improved robotic apparatus, electronic device manufacturing apparatus, and methods for transporting substrates with improved efficiency. Summary of the Invention

[0005]

[0005] Disclosed in the present specification, according to various embodiments, is a system comprising one or more process chambers collectively or individually having N substrate supports (N being an integer greater than or equal to 2), at least one load lock, and a robotic apparatus configured to transport substrates between the at least one load lock and the at least one process chamber, the robotic apparatus having at least N+1 end effectors configured to transport substrates.

[0006]

[0006] According to multiple embodiments, disclosed herein is a system comprising at least one process chamber having a plurality of substrate supports, where a total number of substrate supports in the at least one process chamber is N, where N is an even number greater than or equal to 2, at least one load lock, and a robotic apparatus configured to transport substrates between the at least one load lock and the at least one process chamber, the robotic apparatus having at least N+2 end effectors configured to transport substrates.

[0007]

[0007] In still further embodiments, disclosed herein is a system comprising at least one process chamber with at least one substrate support, at least one via with at least one substrate support, wherein the total number of substrate supports in the at least one process chamber and at least one via totals N, where N is an integer greater than or equal to 2, at least one via, at least one load lock, and a robotic apparatus configured to transport substrates between the at least one load lock, the at least one process chamber, and the at least one via, wherein the robotic apparatus has at least N+1 or at least N+2 end effectors configured to transport substrates.

[0008]

[0008] According to multiple embodiments, disclosed herein is a method of transporting substrates by a robotic device, comprising retrieving a first substrate by a first end effector from a first substrate support and onto a first end effector, the first end effector being attached to the robotic device; retrieving the first substrate; placing a second substrate by a second end effector on the first substrate support, the second end effector being attached to the robotic device; placing the second substrate by the second end effector on the first substrate support, the second end effector being attached to the robotic device; retrieving a third substrate onto a second end effector; disposing a fourth substrate on the second substrate support by the third end effector, where the third end effector is attached to the robotic device; retrieving a fifth substrate from the third substrate support by the third end effector onto the third end effector; and disposing a sixth substrate on the third substrate support by the fourth end effector, where the fourth end effector is attached to the robotic device.

[0009]

[0009] Further disclosed herein is a method of transporting substrates by a robotic device, comprising retrieving a first substrate by a first end effector from a first substrate support in a first process chamber and onto a first end effector, the first end effector being attached to the robotic device; retrieving the first substrate; placing a second substrate by a second end effector on the first substrate support, the second end effector being attached to the robotic device; placing the second substrate; and removing by the second end effector from the second substrate support in a second process chamber. retrieving a third substrate onto the second end effector; disposing a fourth substrate on the second substrate support by the third end effector, where the third end effector is attached to the robotic device; retrieving a fifth substrate from a third substrate support in a third process chamber by the third end effector onto the third end effector; and disposing a sixth substrate on the third substrate support by the fourth end effector, where the fourth end effector is attached to the robotic device.

[0010]

[0010] Numerous other features are provided in accordance with the above and other aspects of the present disclosure. Other features and aspects of the present disclosure will become more fully apparent from the following detailed description, the claims, and the accompanying drawings. [Brief description of the drawings]

[0011] [Figure 1A] FIG. 1 illustrates a top view of a substrate processing system including a robotic device, according to one or more embodiments. [Figure 1B]

[0012] FIG. 1 illustrates a top view of a substrate processing system including a robotic device according to one or more embodiments. [Figure 2A]

[0013] FIG. 1 illustrates a perspective view of a robotic device including four independently controllable forearms, each having an end effector, in accordance with one or more embodiments. [Figure 2B]

[0014] FIG. 1 illustrates a side plan view of a robotic device including four independently controllable forearms, each having an end effector, in accordance with one or more embodiments. [Figure 3A]

[0015] FIG. 1 illustrates a perspective view of a robotic device including two independently rotatable forearms, each including two wrists, each with an end effector, in accordance with one or more embodiments. [Figure 3B]

[0016] FIG. 1 illustrates a side plan view of a robotic device that includes two independently controllable forearms, each including two wrists, each with an end effector, in accordance with one or more embodiments. [Figure 4]

[0017] FIG. 1 illustrates a perspective view of a robotic device having a forearm including a pair of twin wrists including an end effector on each wrist, in accordance with one or more embodiments. [Diagram 5]

[0018] FIG. 1 is a perspective view of a robotic device having a forearm including three twin wrists with an end effector on each wrist, in accordance with one or more embodiments. [Figure 6]

[0019] FIG. 1 illustrates a perspective view of a robotic device having four in-line extendable wrists, each having an end effector, in accordance with one or more embodiments. [Figure 7A]

[0020] 1 is a flow chart illustrating a method of transferring a substrate to and from a processing chamber in accordance with one or more embodiments. [Figure 7B]

[0021] 1 is a flow chart illustrating a method of transferring a substrate to and from a processing chamber in accordance with one or more embodiments. [Figure 8]

[0022] 1 is a flow chart illustrating a method of transferring a substrate to and from a processing chamber in accordance with one or more embodiments. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0012]

[0023] Electronic device transport systems require precision and efficiency in transferring substrates between various locations. However, in some systems, the transfer between various chambers can be an efficiency-limiting bottleneck. In steady-state production, it is ideal to run the process 100% of the time for maximum utilization. To optimize efficiency, the robot should be configured to hold the maximum number of substrates that the process chamber can process per cycle. Maintaining at least one empty end effector allows the unloading and reloading of a process chamber (or in some cases a set of process chambers) in one cycle, without the robot having to return to a load lock or other station for unloading and reloading. In a process-limited system, for example a system that takes an hour, the most efficient sequence is to open the slit valve, unload and reload all the substrates, and then close the slit valve, minimizing the overhead of the substrate transfer process and maximizing productivity. If the slit valve can be opened and closed quickly when the system is process-limited, utilization of the process chambers is maximized, allowing 10 more substrates to be processed per hour, significantly improving the return on investment.

[0013]

[0024] In conventional electronic device manufacturing systems, a robot does not directly reload a chamber (i.e., in one load / unload cycle). Instead, the robot performs multiple cycles to unload a process chamber full of processed substrates, and multiple cycles to reload the process chamber with unprocessed substrates. For example, a standard setup is a two-arm robot containing two end effectors. Each end effector can hold one substrate. To empty and reload a quad chamber, the robot retrieves two processed substrates from the process chamber, moves to a load lock, places two processed substrates in the load lock, picks up two unprocessed substrates from the load lock (or another load lock), returns to the process chamber, places two unprocessed substrates in the process chamber, retrieves the remaining two processed substrates from the process chamber, returns to the load lock, places two processed substrates in the load lock, picks up two more unprocessed substrates, returns to the process chamber, and places two more unprocessed substrates in the process chamber. Similarly, a robot with two end effectors can retrieve and exchange (i.e., swap) one substrate at a time for a quad pedestal (i.e., four substrate supports) process chamber, but still require four trips between the process chamber and the load lock. In contrast, embodiments described herein provide an electronic device manufacturing system in which the transfer chamber robot has at least one more capacity than the process chamber volume (or the combined process chamber volume of a set of process chambers). Embodiments allow the load / unload sequence to be performed in a single cycle, dramatically increasing the throughput of the transfer chamber robot.

[0014]

[0025] Some embodiments described herein relate to a system including at least one process chamber, at least one load lock, and a robotic device (also referred to herein as a robot assembly or simply a robot). The system maximizes substrate handling efficiency when transferring substrates between at least one process chamber and at least one load lock (or via or pass-through). At least one process chamber may be a multi-substrate process chamber having multiple substrate supports within the chamber and, if present, one or more additional substrate supports within a substrate holding chamber (also known as a "via"). In some embodiments, at least one multi-substrate process chamber includes N substrate supports within a single chamber or N substrate supports within both the chamber and the substrate holding chamber, where N is an integer equal to or greater than 2. For example, the chamber may include three (3) substrate supports, and the substrate holding chamber may also include three (3) substrate supports (N=6). Each substrate support is configured to hold one substrate. Alternatively, a group of process chambers and / or vias may together include N substrate supports. For example, the transfer chamber may be connected to six process chambers, each of which can accommodate a single substrate at a time, in which case the six process chambers may together have six substrate supports (e.g., N=6).

[0015]

[0026] The substrates may be of any suitable material for processing. The substrates may include, but are not limited to, silicon wafers, masks, glass, displays, etc. In some embodiments, N may include 4 substrate supports (i.e., N=4), 5 substrate supports (i.e., N=5), 6 substrate supports (i.e., N=6), 7 substrate supports (i.e., N=7), 8 substrate supports (i.e., N=8), 9 substrate supports (i.e., N=9), etc.

[0016]

[0027] In some embodiments, a system includes multiple single substrate process chambers, i.e., each chamber has one substrate support. The total number of substrate supports in all process chambers in the system is N, where N is an integer equal to or greater than 2. For example, a system may include three (3) single substrate process chambers (N=3) and may not include a substrate support in a substrate holding chamber.

[0017]

[0028] The at least one process chamber may be of any suitable shape. For example, the at least one process chamber may be square, rectilinear (e.g., rectangular), radial, a hybrid combination of any of the foregoing, or any other shape known to one of skill in the art. In some embodiments, the at least one process chamber is of any suitable shape supported by the robotic device kinematics. The robotic device may be, for example, a radial SCARA with at least N+1 or at least N+2 end effectors on a radial mainframe (i.e., transfer chamber) or a mainframe having another shape. For example, as shown in FIG. 1A and FIG. 1B, the transfer chamber may have a square shape with four equally sized sides (also referred to as facets). Alternatively, the transfer chamber may have a rectangular shape with two generally parallel facets having a first length and two generally parallel facets having a second length. The mainframe / transfer chamber may also have other numbers of sides / facets, such as five sides, six sides, seven sides, eight sides, etc. The sides may have the same dimensions as one another or may have different dimensions.

[0018]

[0029] The robotic device is configured to unload and reload (e.g., swap, retrieve, and place) substrates in at least one process chamber in a single load / unload cycle (i.e., without returning to a load lock or another station for removal and / or placement of substrates prior to fully swapping multiple substrates in at least one process chamber). To complete this single cycle swap, the robotic device includes at least N end effectors and one end effector (N+1). In some embodiments, the robotic device includes at least N+2 end effectors (N+2), or at least N+3, or at least N+4, etc. Of the at least N+1 end effectors, N of the end effectors can hold N substrates. At least one end effector remains empty. In this manner, the use of a robot having at least N+1 end effectors may, for example, reduce the number of cycles used to load a substrate into a process chamber and / or reduce the number of cycles used to remove a processed wafer from a process chamber and / or replace a processed wafer with an unprocessed substrate in a process chamber. As described herein, a robot having at least N+1 end effectors may significantly increase the throughput and efficiency of an electronic device processing system in some use cases, such as when the transfer time (the time required to transfer a substrate into and / or out of a process chamber) is greater than or comparable to the process time (the time actually used to perform a process on a wafer in the process chamber).

[0019]

[0030] For example, where the multiple substrate process chamber includes three (3) substrate supports, the robotic device in some embodiments includes at least four end effectors. During transfer, three of the end effectors hold unprocessed substrates while the fourth end effector is empty. The robotic device is positioned to access the substrate supports in the multiple substrate process chamber. Using the empty end effector, the robotic device retrieves a first processed substrate from the first substrate support. The robot then uses the second end effector, which is holding an unprocessed substrate, to place an unprocessed second substrate on the first substrate support. The second end effector is then empty and can retrieve the second processed substrate from the process chamber. The third end effector can then place the second unprocessed substrate in the process chamber, emptied the third end effector. The now empty third end effector can then retrieve the third processed substrate from the process chamber. The fourth end effector can then place the third unprocessed substrate in the process chamber. The robot can then move to the load lock and place the three processed substrates in the load lock chamber, thus allowing the robot to swap out the three processed substrates with three unprocessed substrates in a single cycle (i.e., in one trip to the process chamber).

[0020]

[0031] In some embodiments, the system may include at least one multi-substrate process chamber including multiple substrate supports accessible by a robotic device having a forearm or wrist member with "twin" end effectors. The multiple substrates may be arranged radially or in rows within the process chamber in some embodiments. The twin end effector is configured to simultaneously retrieve two substrates from two substrate supports at a time. In some embodiments, the multi-substrate process chamber may include four substrate supports (N=4) in two rows (e.g., two rows from the opening of the chamber) and the robotic device may include three forearms, each of which has a twin end effector at their distal end (resulting in N+2 end effectors). During substrate transfer, four (4) of the end effectors may hold four (4) unprocessed substrates and two of the end effectors are empty. The empty twin end effector can simultaneously retrieve two processed substrates from two of the substrate supports. The robotic device then rotates and simultaneously places two unprocessed substrates on the two empty substrate supports. The now empty end effector then retrieves the remaining two processed substrates from the other substrate supports. The robotic device then places the remaining two unprocessed substrates on top of the empty substrate supports. A complete swap of processed and unprocessed substrates is completed within a single cycle.

[0021]

[0032] The systems described herein may include a robotic device having three or more end effectors. End effector (also referred to as a blade) as used herein means a portion of or an attachment to a forearm or wrist member configured to hold a substrate. Embodiments of the robotic device described herein may include one or more arm components and N+1 end effectors coupled to the one or more arm components.

[0022]

[0033] Systems described herein further include at least one load lock including at least one substrate support. The at least one load lock can be a single substrate load lock or a multiple substrate load lock. In embodiments, the system can include at least two load locks. One load lock can be designed for loading and the other load lock can be designed for unloading. In embodiments, both load locks can be configured for loading and unloading. Productivity of the system can be increased by the use of at least one multiple substrate load lock, where a robotic device having at least N+1 end effectors is configured to simultaneously swap all N substrates between the end effectors and the substrate supports in the multiple substrate load lock. For example, the load lock can include N substrate supports, and when all substrate supports are empty, the robotic device can be configured to simultaneously place all N substrates on the substrate supports. In embodiments, the robotic device is then positioned near an adjacent multiple substrate load lock to simultaneously retrieve N unprocessed substrates from the N substrate supports in the adjacent load lock.

[0023]

[0034] Further details and exemplary embodiments illustrating various aspects of the system and robotic device are described herein with reference to FIGS. 1A-8.

[0024]

[0035] 1A, an exemplary embodiment of an electronic device manufacturing system 100 is provided in accordance with embodiments of the present disclosure. The electronic device processing system 100 may include a main frame 101 including a transfer chamber 113 and at least two process chambers 103. The housing of the main frame 101 includes the transfer chamber 113 therein. The transfer chamber 113 may include a top wall (not shown), a bottom wall (floor) 139, and side walls. In some embodiments, the transfer chamber 113 may be maintained under reduced pressure. In one embodiment depicted, a robotic device 102, such as depicted in FIGS. 2A-2B, 3A-3B, 4, 5, and 6, is attached to the bottom wall (floor) 139. However, the robotic device 102 may be attached elsewhere, such as to a top wall (not shown, removed for clarity). As discussed above, the transfer chamber may be of any suitable shape known to those skilled in the art.

[0025]

[0036] The process chambers 103 may be adapted to perform any number of steps on a substrate (not shown). The steps may include deposition, oxidation, nitridation, etching, polishing, cleaning, lithography, metrology, etc. Other steps may be performed as well. Each process chamber 103 may include at least one substrate support 104. The total number N of substrate supports in the system 100 of FIG. 1A is six (6).

[0026]

[0037] The robotic device 102 may include at least N+1 end effectors for transporting substrates. In one embodiment shown, the robotic device 102 includes an arm 112. The arm 112 includes seven forearms 114A-114G, each having a corresponding end effector 118A-118G attached thereto. As shown, each single blade 118A may transport one substrate at a time.

[0027]

[0038] The system 100 further includes load lock apparatuses 109A, 109B configured to interact with a factory interface 117 or other system components. The factory interface 117 or other system components may receive substrates from a substrate carrier 119 (e.g., a front-opening unified pod) that is dockable at a load port of the factory interface 117, for example. A load / unload robot 121 (shown in dotted lines) may be used to transfer substrates between the substrate carrier 119 and the load lock apparatuses 109A, 109B. Substrate transfer may be performed in any order or direction. The load / unload robot 121 may be similar to the robot apparatus 102 in some embodiments, but may include a mechanism to allow the robot apparatus to move in either lateral direction, as indicated by arrow 123. In one embodiment, the robot apparatus 102 is configured to operate under vacuum, while the load / unload robot 121 may not be configured to operate under vacuum. Any other suitable robot may be used. As shown, transfer may occur through slit valve 111 and substrates may be removed from or deposited into load lock apparatus 109A and 109B.

[0028]

[0039] Each load lock 109A, 109B includes at least one substrate support 110A, 110B. In some embodiments, the load lock 109A may be configured for the robot 102 to remove an unprocessed substrate when loaded from the substrate carrier 119 (i.e., entry) and the load lock 109B may be configured for the robot 102 to place a processed substrate when removed from the process chamber 103 (i.e., exit). In some embodiments, each load lock 109A, 109B includes N substrate supports. The N substrate supports may be spaced in a row to allow at least some of the N processed substrates held by the end effectors 118A-118G of the robot 102 to be simultaneously removed from or placed on the substrate supports 110 in the load locks 109A, 109B by the robot 102. In some embodiments, each load lock 109A, 109B may include N+1 substrate supports, although not all substrate supports may be used during a cycle. In some embodiments, one or more load locks 109A, 109B may include less than N substrate supports (e.g., may include a single substrate support).

[0029]

[0040] In the use case shown in FIG. 1A, a seven (7) blade robot 102 sequentially unloads and reloads substrates from and to each process chamber 103. For example, a robot (N=6) carrying six (6) unprocessed substrates on end effectors 118A-118F has one (+1) empty end effector 118G (for example). The empty end effector 118G retrieves a processed substrate from the substrate support 104 in the first of the process chambers 103. The robot 102 then uses end effector 118A (for example) to place the unprocessed substrate on the empty substrate support in the first process chamber. The robot 102 then moves to a second of the process chambers 103, for example, the robot 102 may move to an adjacent process chamber 103 or may move to the next closest process chamber 103 where processing has been completed. In some embodiments, the robot 102 follows a first in-first out order when moving between process chambers. At the next process chamber 103, using the empty end effector 118A, the robot retrieves the processed substrate from the process chamber 103 and uses the end effector 118B (for example) to place an unprocessed substrate on an empty substrate support. Once the robot 102 has swapped the processed substrate with an unprocessed substrate in all of the process chambers 103 in the system 100, the robot 102 then returns to the load locks 109A, 109B to exchange the processed substrate for an unprocessed substrate. Using the empty end effector 118F (for example), the robot 102 retrieves the unprocessed substrate from the substrate support in the load lock 109A and places the processed substrate on an empty substrate support. The robot 102 continues to swap unprocessed substrates with processed substrates until six (N) end effectors 118B-118G (for example) are holding unprocessed substrates and one end effector 118A (for example) is empty. The robot 102 may then proceed to sequentially unload / reload the process chambers 103.

[0030]

[0041] In embodiments where the load locks 109A, 109B include multiple substrate supports (e.g., N substrate supports), the pitch of the load lock slots and the robot blades 118B-118G (for example) allow the robot 102 to simultaneously unload multiple processed substrates (e.g., N) and simultaneously reload multiple unprocessed substrates (e.g., N). In embodiments, the load lock 109A may be configured for unloading and the load lock 109B may be configured for loading. In other embodiments, the system 100 may have only one load lock 109 (not shown). A single load lock may be a single substrate load lock or may include more than one substrate support (e.g., N substrate supports). In one embodiment, the load lock includes N×2 substrate supports, e.g., two rows of N substrate supports. In one embodiment, the robot 102 may place multiple substrates (e.g., N) simultaneously onto a row of empty substrate supports and may remove multiple substrates (e.g., N) simultaneously from a row holding unprocessed substrates.

[0031]

[0042] 1B, an exemplary embodiment of an electronic device manufacturing system 105 is provided in accordance with embodiments of the present disclosure. The electronic device processing system 105 may include a main frame 101 including a transfer chamber 113 and at least two process chambers 106. The housing of the main frame 101 includes the transfer chamber 113 therein. The transfer chamber 113 may include a top wall (not shown), a bottom wall (floor) 139, and side walls. In some embodiments, the transfer chamber 113 may be maintained under reduced pressure. In one embodiment depicted, a robotic device 107, such as depicted in FIGS. 2A-2B, 3A-3B, 4, 5, and 6, is attached to the bottom wall (floor) 139. However, the robotic device 107 may be attached elsewhere, such as to a top wall (not shown, removed for clarity). As discussed above, the transfer chamber may be of any suitable shape known to those skilled in the art.

[0032]

[0043] The process chambers 106 may be adapted to perform any number of steps on a substrate (not shown). The steps may include deposition, oxidation, nitridation, etching, polishing, cleaning, lithography, metrology, etc. Other steps may be performed as well. Each process chamber 106 may include N substrate supports 108, where N=4 in FIG. 1B. Alternatively, each process chamber may include N / 2 substrate supports. For example, two process chambers may have N substrate supports together (e.g., two dual process chambers may have N=4 together).

[0033]

[0044] The robotic device 107 may include at least N+2 end effectors to transport the substrates. In one embodiment shown, the robotic device 107 includes an arm 112. The arm 112 includes three twin forearms 116A-C, each having a pair of end effectors 120A-F. As shown, a single forearm 116A may include two forearm limbs, each having an end effector 120A-B attached to the end of the limb, to transport two substrates at a time. The system 105 further includes load lock devices 109A, 109B, a factory interface 117, a substrate carrier 119, and a load / unload robot 121, as described with reference to FIG. 1A.

[0034]

[0045] In the use case shown in FIG. 1B, a triple twin blade robot 107 may sequentially unload and reload substrates from and to each process chamber 106. For example, a robot 107 carrying four (4) unprocessed substrates (N=4) has two (+2) empty end effectors 120E, 120F (for example). The empty end effectors 120E, 120F retrieve two processed substrates from two substrate supports 108 in the first of the process chambers 106. The robot 107 then rotates the blade and places the two unprocessed substrates onto the empty substrate supports in the first process chamber 106 using the end effectors 120A, 120B (for example). Then, using the empty end effectors 120A, 120B, the robot 107 retrieves two processed substrates from the two remaining substrate supports 122 and places two unprocessed substrates on the empty substrate supports 122 using the end effectors 120C, 120D. The robot 107 then returns to the load lock 109A to replace the processed substrates with unprocessed substrates, two at a time. Using the empty end effectors 120C, 120D (for example), the robot 107 may retrieve two unprocessed substrates from the two substrate supports in the load lock 109A and place two processed substrates on the empty substrate supports. The robot 107 may continue to swap unprocessed substrates with processed substrates, two at a time, until four (N) end effectors 120C-120F (for example) are holding unprocessed substrates and the two end effectors 120A, 120B (for example) are empty. The robot 107 may then proceed to unload / reload the process chambers 106 in sequence.

[0035]

[0046] In alternative embodiments, the robot 107 may be configured as described in connection with FIG. 1A, whereby the robot includes five (5) blades. In this embodiment, the robot may carry four (N=4) unprocessed substrates on four end effectors, with the fifth end effector (+1) remaining empty. The robot sequentially unloads substrates, one at a time, using the empty end effector to retrieve processed substrates from the process chamber 106, and reloads substrates into the process chamber 106 using the other end effector to place unprocessed substrates on the empty substrate support, until the processed substrates are completely swapped with unprocessed ones.

[0036]

[0047] 2A shows a perspective view of a robotic device 200 including four independently controllable forearms 214A-214D, each with a corresponding end effector 218A-218D. FIG 2B shows a side plan view of a robotic device 200 including four independently controllable forearms 214A-214D, each with a corresponding end effector 218A-218D, according to one or more embodiments.

[0037]

[0048] In one embodiment, the robotic device 200 corresponds to the robotic device 102 of FIG. 1A or the robotic device 107 of FIG. 1B. In such embodiments, the robotic device 200 may be configured and adapted to, for example, transfer substrates between the various process chambers 103, 106 and / or exchange substrates in one or more load lock devices 109A, 109B. In the depicted embodiment of FIG. 1A, two load lock devices 109A, 109B are shown. However, the robotic device 200 may be used with only one load lock device or more than two load lock devices.

[0038]

[0049] The robotic device 200 has an arm 212 including an inboard end 212i and an outboard end 212o. The inboard end 212i is configured to be rotatable about a shoulder axis 222 by an arm drive motor of a drive motor assembly 226. A drive assembly of drive and driven pulleys and transmission members is contained within the arm 212.

[0039]

[0050] The illustrated robotic device 200 includes four forearms 214A-214D coupled to an outboard end 212o opposite an inboard end 212i of an arm 212. Each forearm 214A-214D has a corresponding blade 218A-218D. Each forearm 214A-214D is independently rotatable about an outboard axis 224 via commanded motion of a first drive motor and a second drive motor, respectively. The first drive motor and the second drive motor are commanded by appropriate control signals received from a controller 216. The controller 216 may be any suitable processor, memory, electronics, and / or drivers capable of processing control instructions and executing movements of the forearms 214A-214D.

[0040]

[0051] The arm 212 can have a center-to-center length L1. The center of the length L1 is the shoulder axis 222 and the outboard axis 224. Each of the blades 218A-218D in the depicted embodiment can be comprised of a forearm member, i.e., a first forearm portion 214A, a second forearm portion 214B, a third forearm portion 214C, and a fourth forearm portion 214D. Additionally, each of the forearms 214A-214D in the depicted embodiment includes an end effector 218A-218D, i.e., a first end effector 218A, a second end effector 218B, a third end effector 218C, and a fourth end effector 218D, each configured and adapted to support and transport a substrate thereon.

[0041]

[0052] Each of the forearms 214A-214D has a center-to-center length L2. The center of length L2 for the forearms 214A-214D is the outboard axis 224 and the nominal center of end effector position 225 corresponding to the end effector 218A-218D. The nominal center 225 is the center of a substrate that would rest on each of the first, second, third, and fourth end effectors 218A-218D when the substrate is normally placed thereon, as depicted. Constraining features constrain the position of the substrate on the end effectors 218A-218D within limits. In one depicted embodiment, the forearms 214A-214D and the end effectors 218A-218D are separate interconnected members. However, it should be understood that each forearm member and end effector may be integrally formed and comprise one unitary component in some embodiments. In one depicted embodiment, each of the forearm members 214A-214D may include a corresponding orientation adjuster 230A-230D at their end to allow fine orientation adjustments (e.g., adjustments for droop and / or tilt) for each of the end effectors 218A-218D. The orientation adjusters 230A-230D may use screws and / or shims to provide attitudinal adjustments of the end effectors.

[0042]

[0053] It is therefore apparent that the first forearm 214A is configured to rotate independently with respect to the arm 212 about the outboard axis 224, and the first forearm 214A includes a first end effector 218A. The first forearm member 214A may be disposed directly above the second forearm 214B. In that case, the first end effector 218A is correspondingly above the second end effector 218B. Similarly, the second forearm 214B may be configured to rotate independently with respect to the arm 212 about the outboard axis 224. The second forearm member 214B may be disposed directly above the third forearm member 214C. In that case, the second end effector 218B is correspondingly above the third end effector 218C. Similarly, the third forearm 214C may be configured to rotate independently with respect to the arm 212 about the outboard axis 224. The third forearm member 214C may be disposed directly above the fourth forearm member 214D, where the third end effector 218C is correspondingly above the fourth end effector 218D. Similarly, the fourth forearm 214D may be configured to rotate independently relative to the arm 212 about the outboard axis 224. The rotation is provided by a drive motor assembly 226 and a drive assembly described below.

[0043]

[0054] As can be seen in Figures 2A-2B, the first end effector 218A, the second end effector 218B, the third end effector 218C, and the fourth end effector 218D lie one on top of the other when configured in a stacked zero configuration (e.g., vertically stacked configuration) as shown. This stacked zero configuration is a neutral configuration, and the forearms 214A-214D can rotate approximately + / - 170 degrees from this orientation, for example, using SST band driven linkages. In some embodiments, an unlimited range of motion can be achieved, for example, if motors are located on the shafts.

[0044]

[0055] FIG. 3A shows a perspective view of a robotic device 300 according to several disclosed embodiments. FIG. 3B shows a plan view of the robotic device 300 according to several disclosed embodiments. The robotic device 300 includes an arm 312 that rotates about a first axis of rotation 322. A first forearm 314A may be attached to a distal end of the arm 312, such that the first forearm 314A rotates about a second axis of rotation 324. Two wrist members 315A, 315B may be attached to a distal end of the forearm 314A, such that they each rotate about a third axis of rotation 328. The first wrist member 315A may be disposed above the forearm 314A, and the second wrist member 315B may be disposed below the forearm 314A. The first wrist member 315A and the second wrist member 315B may be L-shaped. The first wrist member 315A may include a first leg 315A1 and a second leg 315A2. The first leg 315A1 may be coupled to the forearm 314A for rotation about a third axis of rotation 328 at a rotation point. The second leg 315A2 may be longer than the first leg 315A1 and may be coupled to the first end effector 318A.

[0045]

[0056] The second wrist member 315B may include a first leg 315B1 and a second leg 315B2. The first leg 315B1 may be coupled to the forearm 314A for rotation about the third axis of rotation 328 at a rotation point. The second leg 315B2 may be longer than the first leg 315B1 and may be coupled to the second end effector 318B.

[0046]

[0057] A second forearm 314B may be attached to a distal end of the arm 312, such that the second forearm 314B rotates around a second axis of rotation 324. Two wrist members 315C, 315D may be attached to a distal end of the forearm 314B, such that they each rotate around a fourth axis of rotation 329. A third wrist member 315C may be disposed above the forearm 314B, and a fourth wrist member 315D may be disposed below the forearm 314B. The third wrist member 315C and the fourth wrist member 315D may be L-shaped. The third wrist member 315C may include a first leg 315C1 and a second leg 315C2. The first leg 315C1 may be coupled to the forearm 314B so as to be rotatable around the fourth axis of rotation 329 at a rotation point. The second leg 315B2 may be longer than the first leg 315B1 and may be coupled to a third end effector 318C.

[0047]

[0058] The fourth wrist member 315D may include a first leg 315D1 and a second leg 315D2. The first leg 315D1 may be coupled to the forearm 314B for rotation about a fourth axis of rotation 329 at a rotation point. The second leg 315D2 may be longer than the first leg 315D1 and may be coupled to the fourth end effector 318D.

[0048]

[0059] The first legs 315A1, 315B1, 315C1, 315D1 may include a curved portion that provides vertical alignment of the first and third end effectors 318A and 318C with the second and fourth end effectors 318B and 318D. Thus, the second and fourth end effectors 318B, 318D may be disposed below the first and third end effectors 318A, 318C.

[0049]

[0060] An embodiment of the robotic device 300 shown in Figures 3A and 3B may be adapted for use in the substrate processing system 100 of Figure 1A and the substrate processing system 105 of Figure 1B. In operation, the arm 312 may be rotated to position the end effectors 318A-318D adjacent a destination (e.g., process chambers 103, 106 or load lock chambers 109A-B) to pick up or place a substrate. The arm 312 and one of the forearms 314A, 314B may then be appropriately actuated (e.g., rotated) to move (e.g., extend) the wrist members 315A-315D to or from the destination. As the wrist members 315A-315B move away from the first axis of rotation 322, the wrist members 315A-315D may rotate in opposite directions about the third and fourth axes of rotation 328, 329. The centers 334A, 334B of the standard substrate placement positions on the end effectors 318A-318D may be separated by a first distance, which may depend on a second distance between the end effectors 318A-D and the first axis of rotation 322.

[0050]

[0061] The first forearm 314A including the first and second end effectors 318A, 318B and the second forearm 314B including the third and fourth end effectors 318C, 318D may be simultaneously inserted through a multiple slit valve (e.g., a dual slit valve) into a process chamber (e.g., 103, 106) in a linear manner, i.e., in a direction substantially perpendicular to a facet or side of the process chamber 103, 106. While passing through the dual slit valve, the first and second end effectors 318A, 318B and the third and fourth end effectors 318C, 318D may be at a first pitch that provides a first separation distance between the nominal substrate placement centers of the first and third end effectors 318A, 318C (and the second and fourth end effectors 318B and 318D). This first separation distance may match the opening offset distance of the dual slit valve. Each slit valve of the dual slit valve may be a dual-height slit valve sized to receive two vertically stacked end effectors (e.g., end effectors 318A, 318B).

[0051]

[0062] Upon passing through the dual slit valve, the first and third end effectors 318A, 318C (and the second and fourth end effectors 318B, 318D) may be rotationally separated about the third rotation axis 328 or the fourth rotation axis by a second pitch that provides a second separation distance between the nominal substrate placement centers of the first and third end effectors 318A, 318C (and the second and fourth end effectors 318B and 318D). For example, the first wrist member 315A and the second wrist member 315B may rotate about the third rotation axis 328. The second separation distance may accommodate a processing distance between dual processing locations in the process chambers 103, 106 that is greater than the distance between the dual slit valves.

[0052]

[0063] Similarly, the end effectors 318A-318D may be simultaneously inserted in a linear manner into the load lock chambers 109A-B (FIGS. 1A-1B) through a slit valve (which may be a dual height dual slit valve). When passing through the slit valve, the end effectors 318A-318D may be at a first pitch. For example, the distance between the end effectors 318A and 318B may have a first value. Upon passing through the slit valve, the first and second end effectors 318A, 318B may remain at the first pitch or may be rotated outward to a second pitch. For example, the first wrist member 315A and the second wrist member 315B may rotate about the third axis of rotation 328 to a second value for the distance between the end effectors 318A and 318B. The second value of the distance may be selected to be approximately the same as the separation distance between the centers of the dual transfer positions in the load lock chambers 109A-B. The steps described above may be applied in reverse order when the first end effector 318A and the second end effector 318B are retracted from the process chambers 103, 106 or the load lock chambers 109A-B.

[0053]

[0064] This variable pitch robotic device 300 may also be used to access two sets of twin slit valves that are not the same pitch. In some embodiments, two adjacent load lock chambers are horizontally spaced apart by a first pitch D1. In some embodiments, the first pitch D1 between the centers of two adjacent load lock chambers may range from about 20 inches to about 25 inches. Other distances for the first pitch D1 may also be possible.

[0054]

[0065] According to several embodiments, at least one pair of two adjacent process chambers are horizontally spaced apart by a second pitch D2 that is different from the first pitch D1 (e.g., the second pitch D2 may be greater than the first pitch D1). In some embodiments, the second pitch D2 between the centers of two adjacent process chambers 120 may range from about 32 inches to about 40 inches. Other distances for the second pitch D2 may also be possible.

[0055]

[0066] One or more of the load lock chambers may be accessed by the robotic device 300 through a slit valve. One or more of the process chambers may also be accessed by the robotic device 300 through a slit valve.

[0056]

[0067] The slit valve may have a slit valve width that allows the robotic device 300 (particularly the first end effector 318A and the second end effector 318B) to access the slit valve in either a dual substrate handling mode or a single substrate handling mode. In certain embodiments, the first end effector 318A and / or the second end effector 318B access the slit valve(s) orthogonally (relative to the horizontal opening of the slit valve). In alternative embodiments, the first end effector 318A and / or the second end effector 318B access the slit valve(s) at an angle (relative to the horizontal centerline of the slit valve). The first and / or second end effector 318A, 318B may access one or more of the slit valves at an angle ranging from about 0 degrees to about 20 degrees, about 5 degrees to about 17 degrees, or about 7 degrees to about 14 degrees, as measured relative to the horizontal centerline of the slit valve.

[0057]

[0068] The substrate processing system may be described as being configured such that when the first end effector 318A and the second end effector 318B are at an initial distance from the first axis of rotation 328, the first wrist member 315A and the second wrist member 315B rotate the first end effector 318A to a first pitch that provides a first end effector distance between the first end effector 318A and the second end effector 318B. When the first end effector 318A and the second end effector 318B are at an extended distance from the first axis of rotation 328, the first wrist member 315A and the second wrist member 315B may rotate in the opposite direction to a second pitch that provides a second end effector distance between the first end effector 318A and the second end effector 318B. Thus, the distance between the end effectors 318 and 318B may depend on the distance the wrist members extend and may be kinematically determined by a cam within the robotic device 300 that is part of the pulley system that drives the wrist members 315A, 315B.

[0058]

[0069] In some embodiments, the robotic device 300 may include additional forearm members, wrist members, and end effectors to provide the capability of transporting additional substrates. For example, the robotic device may include a third forearm rotatable relative to the arm 312 about the forearm axis 324. A fifth and sixth wrist member may be rotatable relative to the third forearm about the wrist axis. A fifth end effector may be attached to a distal end of the fifth wrist member, and a sixth end effector may be attached to a distal end of the sixth wrist member. The fifth end effector may be below the third end effector and may have a fixed position relative to the third end effector. Similarly, the sixth end effector may be below the fourth end effector and may have a fixed position relative to the fourth end effector. The fifth and sixth wrist members may be rotatable dependently about the wrist axis. When in the retracted position, the fifth wrist member may be disposed directly beneath the first and third wrist members and the sixth wrist member may be disposed directly beneath the second and fourth wrist members. The fifth and sixth wrist members may be configured to provide a first distance between the distal ends of the fifth and sixth wrist members when retracted and the same distance or a second distance between their distal ends when extended.

[0059]

[0070] FIG. 4 illustrates another embodiment of a robotic device 400 having two twin forearm members. The robotic device 400 includes an arm 412 that rotates around a first axis of rotation 422. A forearm 414 may be attached to a distal end of the arm 412, such that the forearm 414 rotates around a second axis of rotation 424. Two twin wrist members 415A and 415B may be attached to a distal end of the forearm 414, such that the two twin wrist members 415A and 415B each rotate around a third axis of rotation 428. The first twin wrist member 415A may be disposed above the second twin wrist member 415B, and the twin wrist members 415A, 415B may be U-shaped. The first twin wrist member 415A may include a first leg 415A1 and a second leg 415A2. A first end effector 418A may be attached to a distal end of the first leg 415A1 and a second end effector 418B may be attached to a distal end of the second leg 415A2. The second twin wrist member 415B may also include a first leg 415B1 and a second leg 415B2. A third end effector 418C may be attached to a distal end of the first leg 415B1 and a fourth end effector 418D may be attached to a distal end of the second leg 415B2.

[0060]

[0071] The first and second twin wrist members 415A and 415B may be independently rotatable about axis 428 to retrieve and place substrates from a source to a destination. In some embodiments, each of the twin wrist members 415A and 415B may perform dual get and put or triple get and put operations using four end effectors 418A-418D attached to each leg of the twin wrist members 415A and 415B. In another embodiment, the twin wrist members may be attached to two different independently rotatable forearms. Thus, the first twin wrist member 415A and the second twin wrist member 415B may be independently movable about axis 424.

[0061]

[0072] In other embodiments, the robotic device 400 may include additional twin wrist members (e.g., 3, 4, 5, 6, 7, etc.). For example, FIG. 5 illustrates a triple twin robotic device 500 having three twin forearm members. The robotic device 500 includes an arm 512 that rotates about a first axis of rotation 522. A forearm 514 may be attached to a distal end of the arm 512 such that the forearm 514 rotates about a second axis of rotation 524. Three twin wrist members 515A-515C may be attached to a distal end of the forearm 514 such that the three twin wrist members 515A-515C each rotate about a third axis of rotation 528. The first twin wrist member 515A may be disposed above the second twin wrist member. The second twin wrist member may be disposed above the third twin wrist member 515C. The twin wrist members 515A-515C may each be U-shaped. The first twin wrist member 515A may include a first leg 515A1 and a second leg 515A2. A first end effector 518A may be attached to a distal end of the first leg 515A1, and a second end effector 518B may be attached to a distal end of the second leg 515A2. The second twin wrist member 515B may also include a first leg 515B1 and a second leg 515B2. A third end effector 518C may be attached to a distal end of the first leg 515B1, and a fourth end effector 518D may be attached to a distal end of the second leg 515B2. The third twin wrist member 515C may also include a first leg 515C1 and a second leg 515C2. A fifth end effector 518E may be attached to a distal end of the first leg 515C1, and a sixth end effector 518F may be attached to a distal end of the second leg 515C2.

[0062]

[0073] The wrist members 515A-C may be independently rotatable about axis 528 to retrieve and place substrates from a source to a destination. In some embodiments, each of the twin wrist members 515A-C may perform dual get and put, triple get and put, quadruple get and put, or quintuple get and put operations using six end effectors 518A-F attached to each leg of the twin wrist members 515A-C. In another embodiment, the twin wrist members may be attached to two different independently rotatable forearms. Thus, the twin wrist members 515A-C may be movable about axis 524 independently of each other.

[0063]

[0074] FIG. 6 illustrates another embodiment of a robotic device 600 used to swap wafers in a single step. The robot 600 includes a first arm assembly 636A and a second arm assembly 636B. The first arm assembly 636A may include a first arm 612A, and the second arm assembly 636B may include a second arm 612B. The first arm 612A and the second arm 612B may be substantially rigid cantilevers with forearm drive assembly components therein. The second arm 612B is spaced vertically above the first arm 612A, and they are independently rotatable about a shoulder axis 622. In another aspect, the first arm 612A and the second arm 612B may be configured and adapted to simultaneously rotate in clockwise and counterclockwise rotational directions relative to the motor housing about the shoulder axis 622 (e.g., a first axis). Rotation of the arms 612A-612B may be accomplished by a first motor and a third motor positioned within the motor housing as commanded by the controller 616. When in a fully retracted orientation, the arm assemblies 636A-636B may be rotated to a new position with synchronous and / or dependent rotation of the second motor. In another embodiment, the first arm assembly and the second arm assembly may be rotatable asynchronously. For example, the movement of the first arm and therefore the first arm assembly may be independent of the movement of the second arm and the second arm assembly.

[0064]

[0075] The shoulder shaft 622 may be stationary in the vertical direction. This embodiment of the robot 600 may not include Z-axis functionality and may be used with lift pins, moving platforms, or other similar movable substrate support structures in the process chambers 103, 106, and / or load lock chambers 109A-B (FIG. 1) to accomplish substrate swap. However, other embodiments of the robot 600 may include separate motors and vertical drive assemblies to accomplish Z-axis functionality. Such Z-axis or vertical drive assemblies are known.

[0065]

[0076] The first arm assembly 636A includes a first forearm 614A1 attached and rotatably coupled to the first arm 612A at an axis 624A. The axis 624A is spaced from the shoulder axis 622. The first forearm 614A1 is configured and adapted to be rotated in the X-Y plane relative to the first arm 612A about the second axis 624A. The rotation of the first forearm 614A1 about the second axis 624A may be subordinate to the rotation of the first arm 612A about the shoulder axis 622. The first forearm 614A may be positioned vertically between the first arm 612A and the second arm 612B.

[0066]

[0077] The second arm assembly 636B includes a second forearm 614B attached and rotatably coupled to the second arm 612B at an axis 624B. The second forearm 614B may be configured and adapted to be rotated in the X-Y plane relative to the second arm 612B about a third axis 624B. The rotation of the second forearm 614B about the third axis 624B may be subordinate to the rotation of the second arm 612B about the shoulder axis 622. The second forearm 614B may be positioned vertically between the first arm 612A and the second arm 612B.

[0067]

[0078] The first and second forearms 614A and 614B are configured and adapted to be rotated in either a clockwise or counterclockwise rotational direction about their respective second and third axes 624A and 624B. The rotation may be about + / - 140 degrees. Each of the forearms 614A-614B is positioned at a different vertical position between the first and second arms 612A and 612B and does not interfere with each other when rotating independently via rotation of the first and / or second arms 612A and / or 612B.

[0068]

[0079] The first arm assembly 626A includes a first wrist member 615A attached and rotatably coupled to the first forearm 614A at a fourth axis 628A. The fourth axis 628A is spaced from the second axis 624A. The first wrist member 615A is configured and adapted to be rotated in the X-Y plane relative to the first forearm 614A about the fourth axis 628A. The rotation of the first wrist member 615A about the fourth axis 628A may be subordinate to the rotation of the first forearm 614A about the second axis 624A. The first wrist member 615A may be positioned vertically between the first arm 612A and the second arm 612B.

[0069]

[0080] The first wrist member 615A may be coupled to a first end effector 618A. In some embodiments, the first wrist member 615A and the first end effector 618A may be integral with one another, i.e., from the same piece of material. The first end effector 618A may be configured to carry and transport a substrate.

[0070]

[0081] Rotation of the first wrist member 615A and thus the first end effector 618A may be provided by a first wrist member drive assembly. The first wrist member 615A may be configured and adapted to rotate relative to the first forearm 614A in either a clockwise or counterclockwise rotational direction about the fourth axis 628A by the first wrist member drive assembly. The rotation may be + / - about 170 degrees. In particular, the relative rotation between the first forearm 614A and the first arm 612A causes the first wrist member 615A coupled to the first end effector 618A and the first supported substrate (if present) to translate along a first half path in approximately a first radial direction. Such translation may be, for example, into one of the process chambers 103, 106 as shown in FIG. 1. However, the first wrist member drive assembly may be configured to include a cammed pulley configured to effect a first path other than a purely radial path, such as a sweeping path.

[0071]

[0082] The first arm assembly 636A also includes a second wrist member 615B attached and rotatably coupled to the first forearm 614A at the fourth axis 628A. The second wrist member 615B may be configured and adapted to be rotated in the X-Y plane relative to the first forearm 614A about the fourth axis 628A. The rotation of the second wrist member 615B about the fourth axis 628A may be subordinate to the rotation of the first forearm 614A about the second axis 624A. The second wrist member 615B may be positioned below the first wrist member 615A and vertically between the first arm 612A and the second arm 612B.

[0072]

[0083] The second wrist member 615B may be coupled to a second end effector 618B. In some embodiments, the second wrist member 615B and the second end effector 618B may be integral with one another, i.e., from the same piece of material. The second end effector 618B may be configured to carry and transport substrates.

[0073]

[0084] Rotation of the second wrist member 615B and thus the second end effector 618B may be provided by a second wrist member drive assembly. The second wrist member 615B may be configured and adapted to rotate relative to the first forearm 614A in either a clockwise or counterclockwise rotational direction about the fourth axis 628A by the second wrist member drive assembly. The rotation may be + / - about 170 degrees. In particular, the relative rotation between the first forearm 614A and the first arm 612A causes the second wrist member 615B coupled to the first end effector 618B and the supported second substrate (if present) to translate along a second path in approximately a second radial direction. Such translation may be, for example, into one of the process chambers 103, 106 as shown in FIG. 1. However, the second wrist member drive assembly may be configured to include a cammed pulley configured to effect a second path other than a purely radial path, such as a sweeping path.

[0074]

[0085] The second arm assembly 636B includes a third wrist member 615C attached and rotatably coupled to the second forearm 614B at a fifth axis 628B. The fifth axis 628B is spaced from the third axis 624B. The third wrist member 615C may be configured and adapted to be rotated in the X-Y plane relative to the second forearm 614B about the fifth axis 628B. The rotation of the third wrist member 615C about the fifth axis 628B may be subordinate to the rotation of the second forearm 614B about the third axis 624B. The third wrist member 615C may be positioned vertically between the first arm 612A and the second arm 612B.

[0075]

[0086] The third wrist member 615C may be coupled to a third end effector 618C. In some embodiments, the third wrist member 615C and the third end effector 618C may be integral with one another, i.e., from the same piece of material. The third end effector 618C may be configured to carry and transport substrates.

[0076]

[0087] The translation of the third wrist member 615C and thus the third end effector 618C and supported substrate (if present) may be provided by a third wrist member drive assembly. The third wrist member 615C is configured and adapted to rotate relative to the second forearm 614B in a clockwise or counterclockwise rotational direction about the fifth axis 628B by the third wrist member drive assembly. The rotation may be + / - about 170 degrees. In particular, the relative rotation between the second forearm 614B and the second arm 612B may translate the third wrist member 615C and the associated third end effector 618C, and supported substrate (if present), substantially radially along a third path. Such translation may be, for example, into one of the process chambers 103, 106 as shown in FIG. 1. In another embodiment, the process chambers 103, 106 may be configured radially around the robotic device 600 rather than rectangular as depicted in Figure 1. However, it should be understood that the third wrist member drive assembly may be configured to include a cammed pulley to effectuate a third path other than purely radial.

[0077]

[0088] The second arm assembly 636B also includes a fourth wrist member 615D attached and rotatably coupled to the second forearm 614B at the fifth axis 628B. The fourth wrist member 615D may be configured and adapted to be rotated in the X-Y plane relative to the second forearm 614B about the fifth axis 628B. The rotation of the fourth wrist member 615D about the fifth axis 628B may be subordinate to the rotation of the second forearm 614B about the third axis 624B. The fourth wrist member 615D may be positioned below the third wrist member 615C and vertically between the first arm 612A and the second arm 612B.

[0078]

[0089] The fourth wrist member 615D may be coupled to a fourth end effector 618D. In some embodiments, the fourth wrist member 615D and the fourth end effector 618D may be integral with one another, i.e., from the same piece of material. The fourth end effector 618D may be configured to carry and transport substrates.

[0079]

[0090] Translation of the fourth wrist member 615D and thus the fourth end effector 618D and supported substrate (if present) may be provided by a fourth wrist member drive assembly. The fourth wrist member 615D is configured and adapted to rotate relative to the second forearm 614B in a clockwise or counterclockwise rotational direction about a fifth axis 628B by the fourth wrist member drive assembly. The rotation may be + / - about 170 degrees. In particular, the relative rotation between the second forearm 614B and the second arm 612B may translate the fourth wrist member 615D and the coupled fourth end effector 618D, and supported substrate (if present), substantially radially along a fourth path. Such translation may be, for example, into one of the process chambers 103, 106 as shown in FIG. 1. In another embodiment, the process chambers 103, 106 may be configured radially around the robotic device 600 rather than rectangular as depicted in Figure 1. However, it should be understood that the fourth wrist member drive assembly may be configured to include a cammed pulley to effectuate a fourth path other than purely radial.

[0080]

[0091] The forearms 614A, 614B and wrist members 615A-615D are all received between the positions of the first arm 612 and the second arm 612B in the vertical direction. Furthermore, the first arm 612A, the first forearm 614A, and the first and second wrist members 615A, 615B are all disposed below the second arm 612B, the second forearm 614B, and the third and fourth wrist members 615C-615D. Thereby, interference is avoided for all rotation conditions.

[0081]

[0092] In one or more embodiments, the first arm 612A and the first forearm 614A may be of unequal length. For example, a distance L21 between the shoulder axis 622 and the second axis 624A on the first arm 612A may be longer than a distance L22 between the second axis 624A and the fourth axis 628A on the first forearm 614A. The second arm 612B and the second forearm 614B may also be of unequal length. For example, a length L23 between the shoulder axis 622 and the third axis 624B on the second arm 612B may be longer than a length L24 between the third axis 624B and the fifth axis 628B on the second forearm 614B.

[0082]

[0093] In some embodiments, the lengths L21 and L23 of the first arm 612A and the second arm 612B are greater than the lengths L22 and L24 of the first forearm 614A and the second forearm 614B, respectively, and may be between about 110% and 200% thereof. In one or more embodiments, the lengths L21 and L23 of the first arm 612A and the second arm 612B may be between about 200 mm and about 380 mm. The lengths L22 and L24 of the first forearm 614A and the second forearm 614B may be between about 100 mm and 345 mm. The second forearm 614B may be a mirror image of the first forearm 614A.

[0083]

[0094] In one embodiment depicted, the first forearm 614A may include a first wrist member drive assembly. The first wrist member drive assembly includes a first wrist member drive member. The first wrist member drive member includes a cam surface and a first wrist member driven member connected by a first wrist member transmission element comprised of a plurality of belts. The first wrist member drive member may be an elliptical pulley including a cam surface. The first wrist member drive member may be rigidly coupled to the first arm 612A, for example, by a shaft or by a direct connection. Other types of rigid connections may be used. Similarly, the first wrist member driven member may also be an elliptical pulley including a cam surface and rigidly coupled to the first wrist member 615A.

[0084]

[0095] The first forearm 614A may further include a second wrist member drive assembly including a second wrist member drive member. The second wrist member drive member may include a cam surface and a second wrist member driven member connected by a second wrist member transmission element comprised of a plurality of belts. The second wrist member drive member may be an elliptical pulley including a cam surface. The second wrist member drive member may be rigidly coupled to the first arm 612A, for example, by a shaft or by a direct connection. Other types of rigid connections may be used. Similarly, the second wrist member driven member may also be an elliptical pulley including a cam surface and rigidly coupled to the second wrist member 615B.

[0085]

[0096] In one embodiment depicted, the second forearm 614B may include a third wrist member drive assembly. The third wrist member drive assembly includes a third wrist member drive member. The third wrist member drive member includes a cam surface and a third wrist member driven member connected by a third wrist member transmission element comprised of a plurality of belts. The third wrist member drive member may be an elliptical pulley including a cam surface. The third wrist member drive member may be rigidly coupled to the second arm 612B, for example, by a shaft or by a direct connection. Other types of rigid connections may be used. Similarly, the third wrist member driven member may also be an elliptical pulley including a cam surface and rigidly coupled to the third wrist member 615B.

[0086]

[0097] The second forearm 614B may further include a fourth wrist member drive assembly. The fourth wrist member drive assembly includes a fourth wrist member drive member. The fourth wrist member drive member includes a cam surface and a fourth wrist member driven member connected by a fourth wrist member transmission element composed of a plurality of belts. The fourth wrist member drive member may be an elliptical pulley including a cam surface. The fourth wrist member drive member may be rigidly coupled to the second arm 612B, for example, by a shaft or by a direct connection. Other types of rigid connections may be used. Similarly, the fourth wrist member driven member may also be an elliptical pulley including a cam surface and rigidly coupled to the fourth wrist member 615D.

[0087]

[0098] 7A, a method 800 for transporting substrates to and from at least one process chamber including N substrate supports, where N>2, is described. Method 800 may be performed using, for example, any of the robotic devices described in the embodiments above. In some embodiments, the robotic device includes at least N+1 end effectors. Each end effector may be attached to a distal end of a corresponding forearm, or two end effectors may be attached to distal ends of legs of a single forearm. In some embodiments, where N=3, the robotic device may have four forearms or four arms, each of which has one end effector attached thereto. Method 800 may be performed by a robotic device including N+1 end effectors, where N of the end effectors hold a substrate (e.g., an unprocessed substrate) to be placed in a process chamber.

[0088]

[0099] The method 800 includes, at block 802, retrieving a first substrate from a first substrate support (e.g., of a first process chamber) by a first end effector (empty end effector), where the first end effector is attached to a robotic device. The method 800 includes, at block 804, placing a second substrate on the first substrate support by a second end effector, where the second end effector is attached to a robotic device.

[0089]

[0100] The method 800 includes retrieving a third substrate from a second substrate support (e.g., of the first process chamber or of the second process chamber) by the second end effector and onto the second end effector at block 806. The method 800 includes placing a fourth substrate on the second substrate support by the third end effector at block 808, where the third end effector is attached to a robotic device.

[0090]

[0101] The method 800 includes retrieving a fifth substrate from a third substrate support (e.g., of the first process chamber, the second process chamber, or the third process chamber) by the third end effector and onto the third end effector at block 810. The method 800 includes placing a sixth substrate on the third substrate support by a fourth end effector at block 812, where the fourth end effector is attached to a robotic device.

[0091]

[0102] As a result of the retrieve and place, the second, fourth, and sixth substrates are placed in the process chamber, the first, second, and third end effectors each hold one of the three processed substrates, and the fourth end effector is empty. After the processed substrates are removed from the process chamber and held on the end effectors, they may be placed in a load lock or other process chamber. If N is 4 or more, further load and unload operations may be performed to alternately retrieve the next processed wafer from the process chamber(s) and place the next unprocessed wafer into the process chamber(s). This cycle is repeated until N processed substrates have been removed from the process chamber(s) and N unprocessed substrates have been placed into the process chamber(s). Thus, if N=4, 4 unload operations and 4 load operations are performed. If N=5, 5 unload operations and 5 load operations are performed.

[0092]

[0103] In one embodiment, a robotic device sequentially removes unprocessed substrates from a load lock containing at least N substrate supports and places processed substrates in the load lock. In embodiments, the first, second, and third end effectors may simultaneously place processed substrates in a load lock designed specifically for loading and remove unprocessed substrates from a load lock designed specifically for unloading.

[0093]

[0104] 7B, a method 801 of transferring substrates to and from at least one process chamber including N substrate supports (where N=4), such as in FIG. 1B, is described. The method 801 may be performed using, for example, any of the robotic devices described in the embodiments above. In some embodiments, the robotic device includes at least N+2 end effectors. Each end effector may be attached to a distal end of a corresponding arm, forearm, or wrist linkage of the robotic device. In some embodiments, the robotic device has three forearms or three arms, each of which has two blades attached to each in a triple twin configuration (N+2).

[0094]

[0105] The method 801 includes, at block 803, retrieving a first substrate and a second substrate from a first substrate support and a second substrate support by a first end effector and a second end effector, respectively, where the first end effector and the second end effector are attached to a robotic device. The method 801 includes, at block 805, placing (e.g., simultaneously or in parallel) a third substrate and a fourth substrate on the first substrate support and the second substrate support (respectively) by a third end effector and a fourth end effector, where the third end effector and the fourth end effector are attached to the robotic device.

[0095]

[0106] The method 801 includes retrieving a fifth substrate on the third end effector and a sixth substrate on the fourth end effector from a third substrate support and a fourth substrate support in the process chamber by the third end effector and the fourth end effector (respectively) at block 807. The method 801 includes placing a seventh substrate on the third substrate support and an eighth substrate on the fourth substrate support by the fifth end effector and the sixth end effector at block 809, where the fifth end effector and the sixth end effector are attached to a robotic device.

[0096]

[0107] As a result of the retrieve and place, the third, fourth, seventh, and eighth substrates are placed in the process chamber, the first, second, third, and fourth end effectors each hold one of the four processed substrates, and the fifth and sixth end effectors are empty. After the processed substrates are removed from the process chamber and held on the end effectors, they may be placed in a load lock or other process chamber. In one embodiment, the first and second end effectors may simultaneously or in parallel place processed substrates in the load lock and remove unprocessed substrates from the load lock, and the fifth and sixth end effectors may simultaneously or in parallel place processed substrates in the load lock and remove unprocessed substrates from the load lock. Method 801 describes a manufacturing apparatus that includes N substrate supports that are handled as a unit. The robot arm has N+2 end effectors (e.g., from a triple twin robot apparatus), where N=4. However, in some embodiments, method 801 may also be performed to handle N=6, in which case there are N+2 end effectors (e.g., from a quadruple twin robotic machine). In such embodiments, further operations may be performed after block 809 to pick up the ninth and tenth processed substrates and then place the eleventh and twelfth unprocessed substrates.

[0097]

[0108] 8, a method 900 of transferring substrates to and from a process chamber in a system is described. Each process chamber 103 may include only one substrate support as shown in FIG. 1A. In embodiments, the total number of substrates N in the system 100 may be 3, 4, 5, 6, etc. The robotic device 102 may have N+1 end effectors, i.e., 4, 5, 6, 7, etc. end effectors. The robotic device of method 900 may be, for example, any of the robotic devices described in the embodiments above.

[0098]

[0109] The method 900 includes, at block 902, retrieving a first substrate (i.e., a processed substrate) by a first end effector (i.e., empty) from a first substrate support in the first process chamber 103 and onto the first end effector. In some embodiments, the first end effector and the first substrate may move out of the first process chamber and a second end effector carrying a second substrate (e.g., an unprocessed substrate) may move into the process chamber. At block 904, the method 900 includes placing a second substrate on the first substrate support by the second end effector.

[0099]

[0110] At block 906, the method 900 includes retrieving a third substrate from a second substrate support in the second process chamber onto the second end effector. After placing the second substrate on the first substrate support, the robot moves the second end effector to the second process chamber to retrieve the third substrate. The second end effector may then move out of the second process chamber and the third end effector may move into the second process chamber. At block 908, the method 900 includes placing a fourth substrate onto the second substrate support by the third end effector.

[0100]

[0111] At block 910, the method 900 includes retrieving a fifth substrate from a third substrate support in the third process chamber onto the third end effector by the third end effector. The third end effector may move out of the second process chamber into the third process chamber to retrieve the fifth substrate. At block 912, the method 900 includes placing a sixth substrate onto the third substrate support by the fourth end effector. As a result of the retrieval and placement, the first, third, and fifth (unprocessed) substrates are each placed in the three process chambers, the first, second, and third end effectors each hold one of the three processed substrates, and the fourth end effector is empty. According to various embodiments as described herein, after the processed substrates are removed from the process chambers and held on the end effectors, they may be placed into a load lock or other process chamber.

[0101]

[0112] The systems, robotic devices, and methods disclosed herein can provide increased throughput and efficiency over electronic device manufacturing systems, robots, and methods known in the art. For example, a known loading and unloading sequence performed by a known robotic device for unloading a set of four processed wafers from a quad process chamber and loading a set of four unprocessed wafers into the quad process chamber is as follows: Dual get from load lock by first and second end effectors (pickup of two substrates) (6.8 seconds) Rotate to chamber (5 seconds) Dual get from process chamber with third and fourth end effectors (7.2 seconds) Dual put into process chamber by first and second end effectors (two substrates placed on two substrate holders) (7.2 seconds) The chamber spindle rotates 180 degrees (0 seconds) Rotate to load lock (5 seconds) Dual put to load lock with 3rd and 4th end effectors (6.8 seconds) Dual get from load lock with first and second end effectors (6.8 seconds) Rotate to chamber (5.0 seconds) Dual get from process chamber with third and fourth end effectors (7.2 seconds) Dual put into process chamber with first and second end effectors (7.2 seconds) Rotate to load lock (5 seconds) Dual put to load lock with 3rd and 4th end effectors (6.8 seconds) Total time: 76 seconds -> 189.47 boards / hour

[0102]

[0113] By comparison, a suitable loading and unloading sequence performed by a triple twin-yaw robotic machine such as that shown in Figures 1B and 5 for unloading a set of four processed wafers from a quad process chamber and loading four unprocessed wafers into the quad process chamber is as follows: Dual get from load lock by first and second end effectors (pickup of two substrates) (6.8 seconds) Dual get from load lock with third and fourth end effectors (pickup of two substrates) (6.8 seconds) Rotate to chamber (5 seconds) Dual get from process chamber with 5th and 6th end effectors (7.2 seconds) Dual put to process chamber with third and fourth end effectors (7.2 seconds) Dual get from process chamber with third and fourth end effectors (7.2 seconds) Dual put into process chamber with first and second end effectors (7.2 seconds) Rotate to load lock (5 seconds) Dual put to process chamber with 5th and 6th end effectors (6.8 seconds) Dual put to process chamber with third and fourth end effectors (6.8 seconds) Total time: 56 seconds -> 257.14 boards / hour

[0103]

[0114] As shown in this example, by providing a robotic device having at least N+1 or N+2 end effectors according to embodiments herein, multiple sequence steps requiring returns to a load lock can be eliminated. By allowing the robotic device to fully swap out a processed substrate with an unprocessed substrate in a single cycle, the efficiency and substrate throughput of an electronic device manufacturing system can be significantly improved. Further productivity improvements are possible when, in embodiments, simultaneous loading / unloading of all four (4) substrates at the load lock is achieved.

[0104]

[0115] The foregoing description discloses only certain exemplary embodiments. For example, certain exemplary embodiments describe two stacked end effectors. Modifications of the above disclosed systems, apparatus, and methods that fall within the scope of the present disclosure will be readily apparent to those of ordinary skill in the art. For example, the embodiments described with reference to two stacked end effectors also apply to three or more stacked end effectors. Furthermore, the embodiments are not limited to the robot, process chamber architecture, or transfer chamber architecture shown and described herein. Thus, although the present disclosure has been disclosed in connection with certain exemplary embodiments, it should be understood that other embodiments may fall within the scope of the present disclosure as defined by the following claims. The present application also includes the aspects described below. (Aspect 1) one or more process chambers collectively or individually comprising N substrate supports, where N is an integer greater than or equal to 2; At least one load lock; and a robotic device configured to transfer substrates between the at least one load lock and the at least one process chamber, the robotic device comprising at least N+1 end effectors configured to transfer the substrates. (Aspect 2) The robot device includes: a first arm rotatable about a first shoulder axis; a first forearm rotatable relative to the first arm about a first forearm axis offset from the shoulder axis; a first end effector of the at least N+1 end effectors attached to a distal end of the first forearm; a second forearm rotatable relative to the first arm about the first forearm axis; a second end effector of the at least N+1 end effectors attached to a distal end of the second forearm; a third forearm rotatable relative to the first arm about the first forearm axis; and 2. The system of aspect 1, further comprising a third end effector of the at least N+1 end effectors attached to a distal end of the third forearm. (Aspect 3) The robot device includes: a fourth forearm rotatable relative to the first arm about the first forearm axis; a fourth end effector of the at least N+1 end effectors attached to a distal end of the fourth forearm; and Optionally, the system of aspect 2 further comprises a fifth forearm rotatable relative to the first arm about the first forearm axis, and a fifth end effector of the at least N+1 end effectors attached to a distal end of the fifth forearm. (Aspect 4) 3. The system of claim 2, wherein the first forearm, the second forearm, and the third forearm are each independently rotatable about the first forearm axis. (Aspect 5) 2. The system of aspect 1, comprising a plurality of process chambers, each process chamber comprising less than N substrate supports, the number of the less than N substrate supports of the plurality of process chambers equaling N in total. (Aspect 6) The system of embodiment 1, comprising four (4) process chambers, each process chamber comprising one substrate support, where N=4. (Aspect 7) The system of embodiment 1, comprising six (6) process chambers, each process chamber comprising one substrate support, where N=6. (Aspect 8) 2. The system of embodiment 1, wherein the one or more process chambers each comprise N substrate supports. (Aspect 9) 2. The system of embodiment 1, further comprising one or more vias in the one or more process chambers, the transfer chamber, or an additional chamber coupled to the transfer chamber. (Aspect 10) at least one process chamber comprising a plurality of substrate supports, wherein a total number of substrate supports in the at least one process chamber is N, where N is an even number greater than or equal to 2; At least one load lock; and a robotic device configured to transfer substrates between the at least one load lock and the at least one process chamber, the robotic device comprising at least N+2 end effectors configured to transfer the substrates. (Aspect 11) The robot device includes: Arms that can rotate around a shoulder axis, a forearm rotatable relative to the arm about a forearm axis offset from the shoulder axis; a first wrist member rotatable relative to the forearm about a wrist axis offset from the forearm axis, the first wrist member comprising a first end effector and a second end effector of the at least N+2 end effectors attached to a distal end of the first wrist member, the first end effector and the second end effector being laterally spaced apart by a first fixed position; a second wrist member disposed vertically below the first wrist member and rotatable relative to the forearm about the wrist axis, the second wrist member comprising a third end effector and a fourth end effector of the at least N+2 end effectors attached to a distal end of the second wrist member, the third end effector and the fourth end effector being laterally spaced apart at a second fixed position; Optionally, the system of aspect 10, wherein each of the first end effector through the fourth end effector includes a substrate support position having a nominal center, and in a neutral rest position of the robotic apparatus, the nominal centers of the first end effector and the third end effector are aligned along a first vertical axis, and the nominal centers of the second end effector and the fourth end effector are aligned along a second vertical axis. (Aspect 12) The robot device includes: a third wrist member disposed vertically below the second wrist member and rotatable relative to the forearm about the wrist axis, the third wrist member comprising a fifth end effector and a sixth end effector of the at least N+2 end effectors attached to a distal end of the third wrist member, the fifth end effector and the sixth end effector being laterally spaced apart at a third fixed position; Optionally, the system of aspect 11 further comprises a fourth wrist member disposed vertically below the third wrist member and rotatable relative to the forearm about the wrist axis, the fourth wrist member comprising a seventh end effector and an eighth end effector of the at least N+2 end effectors attached to a distal end of the fourth wrist member, the seventh end effector and the eighth end effector being laterally spaced apart at a fourth fixed position. (Aspect 13) 13. The system of embodiment 12, wherein the first wrist member, the second wrist member, the third wrist member, and the fourth wrist member are independently rotatable about the wrist axis. (Aspect 14) The system of aspect 13, wherein each of the first end effector through the eighth end effector includes a substrate support position having a nominal center, and in a neutral rest position of the robotic device, the nominal centers of the first end effector, the third end effector, the fifth end effector, and the seventh end effector are aligned along a first vertical axis, and the nominal centers of the second end effector, the fourth end effector, the sixth end effector, and the eighth end effector are aligned along a second vertical axis. (Aspect 15) 11. The system of embodiment 10, comprising at least one process chamber comprising four (4) substrate supports, wherein N=4. (Aspect 16) 11. The system of embodiment 10, comprising at least one process chamber comprising six (6) substrate supports, where N=6. (Aspect 17) 2. The system of embodiment 1, wherein the one or more process chambers each comprise N substrate supports. (Aspect 18) at least one process chamber having at least one substrate support; at least one via with at least one substrate support, wherein a total number of substrate supports in the at least one process chamber and the at least one via is N in total, where N is an integer equal to or greater than 1; At least one load lock; and a robotic device configured to transfer substrates between the at least one load lock, the at least one process chamber, and the at least one via, the robotic device comprising at least N+1 or at least N+2 end effectors configured to transfer the substrates. (Aspect 19) 1. A method for transporting a substrate by a robotic device, comprising: retrieving a first substrate from a first substrate support by a first end effector and onto the first end effector, the first end effector being attached to the robotic device; placing a second substrate on the first substrate support by a second end effector, the second end effector being attached to the robotic device; retrieving a third substrate from a second substrate support onto the second end effector by the second end effector; placing a fourth substrate on the second substrate support by a third end effector, the third end effector being attached to the robotic device; retrieving a fifth substrate from a third substrate support onto the third end effector by the third end effector; and placing a sixth substrate on the third substrate support by a fourth end effector, the fourth end effector being attached to the robotic device. (Aspect 20) 1. A method for transporting a substrate by a robotic device, comprising: retrieving a first substrate from a first substrate support in a first process chamber by a first end effector and onto the first end effector, the first end effector being attached to the robotic device; placing a second substrate on the first substrate support by a second end effector, the second end effector being attached to the robotic device; retrieving a third substrate from a second substrate support in a second process chamber onto the second end effector by the second end effector; placing a fourth substrate on the second substrate support by a third end effector, the third end effector being attached to the robotic device; retrieving a fifth substrate from a third substrate support in a third process chamber onto the third end effector by the third end effector; and placing a sixth substrate on the third substrate support by a fourth end effector, the fourth end effector being attached to the robotic device.

Claims

1. one or more process chambers collectively or individually comprising N substrate supports, where N is an integer greater than or equal to two; At least one load lock; and a robotic device configured to transfer substrates between the at least one load lock and the one or more process chambers, the robotic device comprising at least N+1 end effectors configured to transfer the substrates; The robot device includes: a first arm rotatable about a first shoulder axis; a first forearm rotatable relative to the first arm about a first forearm axis offset from the shoulder axis; a first end effector of the at least N+1 end effectors attached to a distal end of the first forearm; a second forearm rotatable relative to the first arm about the first forearm axis; a second end effector of the at least N+1 end effectors attached to a distal end of the second forearm; a third forearm rotatable relative to the first arm about the first forearm axis; and The system further comprises a third end effector of the at least N+1 end effectors attached to a distal end of the third forearm.

2. The robot device includes: a fourth forearm rotatable relative to the first arm about the first forearm axis; a fourth end effector of the at least N+1 end effectors attached to a distal end of the fourth forearm; and 10. The system of claim 1, optionally further comprising a fifth forearm rotatable relative to the first arm about the first forearm axis, and a fifth end effector of the at least N+1 end effectors attached to a distal end of the fifth forearm.

3. The system of claim 1 , wherein the first forearm, the second forearm, and the third forearm are each independently rotatable about the first forearm axis.

4. one or more process chambers collectively or individually comprising N substrate supports, where N is an integer greater than or equal to two; At least one load lock; and a robotic device configured to transfer substrates between the at least one load lock and the one or more process chambers, the robotic device comprising at least N+1 end effectors configured to transfer the substrates; A system comprising a plurality of process chambers, each process chamber comprising less than N substrate supports, the number of the less than N substrate supports of the plurality of process chambers equaling N in total.

5. one or more process chambers collectively or individually comprising N substrate supports, where N is an integer greater than or equal to two; At least one load lock; and a robotic device configured to transfer substrates between the at least one load lock and the one or more process chambers, the robotic device comprising at least N+1 end effectors configured to transfer the substrates; A system comprising four (4) process chambers, each process chamber comprising one substrate support, where N=4.

6. one or more process chambers collectively or individually comprising N substrate supports, where N is an integer greater than or equal to two; At least one load lock; and a robotic device configured to transfer substrates between the at least one load lock and the one or more process chambers, the robotic device comprising at least N+1 end effectors configured to transfer the substrates; A system comprising six (6) process chambers, each process chamber comprising one substrate support, where N=6.

7. The system of claim 2 , wherein the one or more process chambers each comprise N substrate supports.

8. The system of claim 2 , further comprising one or more vias in the one or more process chambers, the transfer chamber, or a further chamber coupled to the transfer chamber.

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