Substrate cleaning device and substrate cleaning method

Abstract

To provide a substrate cleaning device and a substrate cleaning method capable of improving particle removal capability.SOLUTION: In a substrate processing device, a substrate cleaning device 40 includes: a substrate rotation support portion 41 that supports and rotates a substrate W; a roll holding portion 45 that rotatably holds a first roll cleaning member 42a and a second roll cleaning member 42b having lengths approximately equal to the radius of the substrate; a roll rotation drive portion 43 that rotates the first roll cleaning member and the second roll cleaning member around their respective center axes parallel to a surface of the substrate; and a roll pressing portion that brings the rotating first roll cleaning member and second roll cleaning member into sliding contact with the surface of the substrate. The first roll cleaning member and the second roll cleaning member are arranged to cover different radius portions of the surface of the substrate.SELECTED DRAWING: Figure 2

Description

Technical Field

[0001] The present invention relates to a substrate cleaning apparatus and a substrate cleaning method.

Background Art

[0002] Conventionally, there has been a scrub cleaning apparatus as a cleaning apparatus for cleaning a semiconductor substrate. This apparatus has a substrate rotation support unit that holds and rotates a semiconductor substrate as an object to be cleaned, a roll sponge that rotates around an axis parallel to the surface of the substrate, and a cleaning liquid nozzle that supplies a cleaning liquid to the surface to be cleaned of the substrate. The substrate rotation support unit rotates while supporting the outer periphery of the substrate, and the rotational force is transmitted to the outer surface of the substrate so that the substrate rotates. The roll sponge rotates around its central axis and cleans while sliding on the surface of the substrate.

[0003] In a conventional roll cleaning apparatus, the length of the roll cleaning member extends over the diameter of the substrate. In this case, depending on the relative relationship between the rotation direction of the substrate and the rotation direction of the roll cleaning member, in one-side radius region on the axis of the roll cleaning member, the sliding directions at the sliding contact portion between the roll cleaning member and the substrate are the same as each other. However, in this region, the rotating roll cleaning member acts to face particles on the substrate and entrain them into the substrate, so it hardly contributes to the cleaning of the substrate. On the contrary, there is an influence of reattaching particles from the roll cleaning member to the substrate.

[0004] Japanese Patent Application Laid-Open No. 2002-313767 (Patent Document 1) discloses that the length of the roll cleaning member extending in a direction parallel to the substrate is set to be the length over the radius of the substrate, and the sliding directions at the sliding contact portion between the roll cleaning member and the substrate are made to be opposite to each other. However, the required specifications for cleaning performance are increasing year by year, and further improvement is required.

Prior Art Documents

Patent Documents

[0005]

Patent Document 1

Summary of the Invention

[0006] The present invention has been made in consideration of the above points. An object of the present invention is to provide a substrate cleaning apparatus and a substrate cleaning method capable of improving particle removal ability.

[0007] The substrate cleaning apparatus according to the first aspect of the present invention is a substrate rotation support unit that supports and rotates a substrate, a roll cleaning member holding unit that rotatably holds a first roll cleaning member and a second roll cleaning member having a length substantially the same as the radius of the substrate, a roll rotation driving unit that rotates the first roll cleaning member and the second roll cleaning member around respective central axes parallel to the surface of the substrate, a roll pressing unit that brings the rotating first roll cleaning member and second roll cleaning member into sliding contact with the surface of the substrate, and is provided with the first roll cleaning member and the second roll cleaning member are configured to be arranged so as to cover different radius portions of the surface of the substrate.

[0008] According to such an aspect, while rotating the substrate, the first roll cleaning member, and the second roll cleaning member, by bringing the first roll cleaning member and the second roll cleaning member into sliding contact with the surface of the substrate, the surface of the substrate is washed twice by the first roll cleaning member and the second roll cleaning member during one rotation. Therefore, the particle removal ability can be doubled.

[0009] The substrate cleaning apparatus according to the second aspect of the present invention is the substrate cleaning apparatus according to the first aspect, wherein The roll rotation driving unit rotates the first roll cleaning member and the second roll cleaning member in such a direction that the sliding directions at the sliding contact portions between the first roll cleaning member and the substrate are opposite to each other, and the sliding directions at the sliding contact portions between the second roll cleaning member and the substrate are opposite to each other.

[0010] According to such an aspect, when the first roll cleaning member and the second roll cleaning member clean the substrate while bringing the rotating substrate and the cleaning member rotating around the axis into contact with each other, the particles on the substrate approaching relatively to the cleaning member can be received and scraped up, so that the particle removing ability can be improved.

[0011] The substrate cleaning apparatus according to the third aspect of the present invention is the substrate cleaning apparatus according to the first or second aspect, and the central axis of the first roll cleaning member and the central axis of the second roll cleaning member are parallel to each other, and the first roll cleaning member and the second roll cleaning member are arranged so as to cover the radius portions on opposite sides of the substrate surface with the center of the substrate interposed therebetween.

[0012] According to such an aspect, it becomes easy to hold the first roll cleaning member and the second roll cleaning member by the same roll rotation holding unit, and the apparatus configuration can be simplified.

[0013] The substrate cleaning apparatus according to the fourth aspect of the present invention is the substrate cleaning apparatus according to any one of the first to third aspects, and the roll rotation driving unit rotates the first roll cleaning member and the second roll cleaning member at different rotational speeds.

[0014] According to such an aspect, the relative speed at the sliding contact portion between the first roll cleaning member and the substrate can be made different from the relative speed at the sliding contact portion between the second roll cleaning member and the substrate. Thereby, it becomes possible to realize a removing action according to the size of particles, or to immediately remove particles reattached from the roll cleaning member to the substrate, and the particle removing ability can be improved.

[0015] The substrate cleaning apparatus according to the fifth aspect of the present invention is a substrate cleaning apparatus according to any one of the first to fourth aspects, and the roll rotation driving unit has a motor that rotates the first roll cleaning member and the second roll cleaning member, the substrate cleaning apparatus has a control device that controls the roll pressing unit, the control device receives a signal of the load torque of the motor, and when the load torque of the motor exceeds a preset upper limit value, the first roll cleaning member and the second roll cleaning member are separated from the substrate by a distance corresponding to the difference between the upper limit value and the load torque of the motor, and when the load torque of the motor falls below a preset lower limit value, the first roll cleaning member and the second roll cleaning member are brought closer to the substrate by a distance corresponding to the difference between the lower limit value and the load torque of the motor, and controls the roll pressing unit.

[0016] According to such an aspect, by keeping the load torque of the motor within a certain predetermined range, the pressing state of the roll cleaning member against the substrate surface can be kept within a certain range, and stable cleaning performance can be maintained.

[0017] The substrate cleaning apparatus according to the sixth aspect of the present invention is a substrate cleaning apparatus according to any one of the first to fifth aspects, and the roll pressing unit a first pressing unit that slidably contacts the first roll cleaning member and the second roll cleaning member with the surface of the substrate by applying a load in a direction perpendicular to the surface of the substrate to the roll cleaning member holding unit, By tilting the roll holding portion with respect to the surface of the substrate, a second pressing portion that makes the pressing load of the first roll cleaning member and the pressing load of the second roll cleaning member different from each other with respect to the surface of the substrate; It has.

[0018] According to such an aspect, by providing a difference in the pressing load of a plurality of roll cleaning members with respect to the substrate and then performing scrub cleaning using the first roll cleaning member and the second roll cleaning member, it is possible to realize a removal action according to the size of particles, or to immediately remove particles reattached from the roll cleaning member to the substrate. Therefore, the particle removal ability can be improved.

[0019] The substrate cleaning apparatus according to the seventh aspect of the present invention is a substrate cleaning apparatus according to any one of the first to sixth aspects, The roll rotation driving unit includes a first motor that rotates the first roll cleaning member and a second motor that rotates the second roll cleaning member.

[0020] According to such an aspect, it is easy to make the rotation speed of the first roll cleaning member different from the rotation speed of the second roll cleaning member.

[0021] The substrate cleaning apparatus according to the eighth aspect of the present invention is a substrate cleaning apparatus according to the seventh aspect, Receiving signals of the load torques of each of the first motor and the second motor, and when the load torque of the first motor exceeds a preset first upper limit value, separating the first roll cleaning member from the substrate by a distance corresponding to the difference between the first upper limit value and the load torque of the first motor; when the load torque of the first motor is lower than a preset first lower limit value, approaching the first roll cleaning member to the substrate by a distance corresponding to the difference between the first lower limit value and the load torque of the first motor; when the load torque of the second motor exceeds a preset second upper limit value, separating the second roll cleaning member from the substrate by a distance corresponding to the difference between the second upper limit value and the load torque of the second motor; when the load torque of the second motor is lower than a preset second lower limit value, approaching the second roll cleaning member to the substrate by a distance corresponding to the difference between the second lower limit value and the load torque of the second motor, and comprising a control device for controlling the roll pressing portion.

[0022] According to such an aspect, by keeping the load torque of the motor within a certain predetermined range, the pressing state of the roll cleaning member against the substrate surface can be kept within a certain range, and stable cleaning performance can be maintained.

[0023] The substrate cleaning device according to the ninth aspect of the present invention is the substrate cleaning device according to any one of the first to sixth aspects, and the roll rotation driving portion includes a first motor that rotates the first roll cleaning member, and a power transmission portion that transmits the rotation of the first roll cleaning member to the second roll cleaning member.

[0024] According to such an aspect, power can be transmitted to two roll cleaning members without installing two motors. For example, the space can be saved and the weight of the device can be reduced.

[0025] The substrate cleaning device according to the tenth aspect of the present invention is the substrate cleaning device according to any one of the first to ninth aspects, and Further provided is a roll translation unit that integrally moves the first roll cleaning member and the second roll cleaning member in a direction parallel to the surface of the substrate.

[0026] According to such an aspect, even if the central axis of the roll cleaning member is not arranged to overlap with the diameter of the substrate in a plan view, by cleaning while reciprocally moving the roll cleaning member in a direction orthogonal to the central axis of the roll cleaning member, the roll cleaning member can be brought into sliding contact with the central portion of the substrate, and the central portion of the substrate can be evenly cleaned. Further, in a conventional apparatus, since cleaning is performed only in an arrangement where the central axis of the roll cleaning member overlaps with the diameter of the substrate in a plan view, the position of the nozzle (concavo-convex) provided on the outer periphery of the surface of the roll cleaning member becomes a fixed position at a radial distance from the center of the substrate, and there is a non-uniform distribution of the contact times of the nozzles depending on the radial position. Therefore, the time until the end of cleaning is determined at a position where the contact times of the nozzles are small. On the other hand, according to such an aspect, by cleaning while reciprocally moving the roll cleaning member in a direction orthogonal to the central axis of the roll cleaning member, the position of the nozzle provided on the outer periphery of the surface of the roll cleaning member becomes a variable position at a radial distance from the center of the substrate, the non-uniform distribution of the contact times of the nozzles depending on the radial position is suppressed, and the time until the end of cleaning can be relatively shortened.

[0027] The substrate cleaning apparatus according to the 11th aspect of the present invention is the substrate cleaning apparatus according to any one of the 1st to 10th aspects, and further includes a cleaning liquid nozzle that supplies a cleaning liquid to the surface of the substrate.

[0028] The substrate cleaning apparatus according to the 12th aspect of the present invention is the substrate cleaning apparatus according to the 11th aspect, and the cleaning liquid nozzle includes a first cleaning liquid nozzle that supplies a cleaning liquid to the sliding contact portion between the first roll cleaning member and the substrate, and a second cleaning liquid nozzle that supplies a cleaning liquid to the sliding contact portion between the second roll cleaning member and the substrate.

[0029] According to such an aspect, the cleaning liquid can be efficiently supplied to the sliding contact portion between each roll cleaning member and the substrate.

[0030] The substrate cleaning apparatus according to the 13th aspect of the present invention is the substrate cleaning apparatus according to the 12th aspect, wherein the first cleaning liquid nozzle supplies the cleaning liquid from the upstream side in the rotation direction of the substrate to the sliding contact portion between the first roll cleaning member and the substrate, and the second cleaning liquid nozzle supplies the cleaning liquid from the upstream side in the rotation direction of the substrate to the sliding contact portion between the second roll cleaning member and the substrate.

[0031] According to such an aspect, the cleaning liquid can be more efficiently supplied to the sliding contact portion between each roll cleaning member and the substrate.

[0032] The substrate cleaning apparatus according to the 14th aspect of the present invention is the substrate cleaning apparatus according to any one of the 11th to 13th aspects, wherein the cleaning liquid nozzle has a third cleaning liquid nozzle that supplies the cleaning liquid to the central portion of the substrate.

[0033] According to such an aspect, the cleaning liquid can be efficiently supplied to the central portion of the substrate.

[0034] The substrate processing apparatus according to the 15th aspect of the present invention includes a substrate polishing apparatus for polishing a substrate, and a substrate cleaning apparatus according to any one of the 1st to 14th aspects for cleaning the polished substrate. and is provided with

[0035] The substrate processing method according to the 16th aspect of the present invention arranges a first roll cleaning member and a second roll cleaning member having lengths substantially the same as the radius of the substrate so as to cover different radius portions of the surface of the substrate, rotates the substrate, and while rotating the first roll cleaning member and the second roll cleaning member around their respective central axes parallel to the surface of the substrate, brings them into sliding contact with the surface of the substrate.

Brief Description of the Drawings

[0036]

Figure 1

Figure 2

Figure 3

Figure 4

Figure 5

Figure 6

Figure 7

Figure 8

Figure 9

Figure 10

Figure 11

Figure 12

Embodiments for Carrying Out the Invention

[0037] Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. In the following description and the drawings used in the following description, the same reference numerals are used for parts that can be configured identically, and redundant descriptions are omitted. Also, in this specification, expressions such as "above ~" and "below ~" mean expressions that include cases where two components are separated from each other as well as cases where two components are in contact with each other, unless otherwise specified in this specification. Furthermore, the expressions "including", "having", "comprising", or "equipped with" for one component do not exclude the existence of other components. Also, unless otherwise specified, "above" means the direction in which the first cleaning tool exists starting from the substrate, and "below" means the opposite direction (assuming not only the case where the second cleaning tool exists but also the case where the second cleaning tool does not exist). Also, regarding the cleaning tool and the components constituting the same, "upper surface" and "surface" mean the surface on the side where the first cleaning tool contacts the substrate.

[0038] FIG. 1A is a plan view showing the overall configuration of a substrate processing apparatus 1 including a substrate cleaning apparatus according to an embodiment.

[0039] As shown in FIG. 1A, the substrate processing apparatus 1 includes a substantially rectangular housing 10 and a load port 12 on which a substrate cassette (not shown) for stocking a plurality of substrates W is placed. The load port 12 is arranged adjacent to the housing 10. An open cassette, a SMIF (Standard Manufacturing Interface) pod, or a FOUP (Front Opening Unified Pod) can be mounted on the load port 12. The SMIF pod and the FOUP are sealed containers that can accommodate a substrate cassette inside and maintain an environment independent of the external space by covering it with a partition wall. Examples of the substrate W include semiconductor wafers. However, the substrate to be processed is not limited to semiconductor wafers, and may be other types of substrates used in the manufacture of semiconductor devices such as glass substrates and ceramic substrates.

[0040] Inside the housing 10, there are accommodated a plurality (four in the embodiment shown in FIG. 1A) of polishing units (substrate polishing apparatuses) 14a to 14d for polishing the substrate W, a first cleaning unit 16 and a second cleaning unit 18 for cleaning the polished substrate W, and a drying unit 20 for drying the cleaned substrate W. The polishing units 14a to 14d are arranged along the longitudinal direction of the housing 10, and the cleaning units 16 and 18 and the drying unit 20 are also arranged along the longitudinal direction of the housing 10. Further, in the present embodiment, the substrate W having no trench on the substrate surface is targeted. Furthermore, due to the configuration described later, the substrate W in a state where the surface is wet after being subjected to chemical mechanical polishing, which is a wet process, is conveyed directly to the first cleaning unit 16 without drying the surface, the substrate W cleaned by the first cleaning unit 16 is conveyed directly to the second cleaning unit 18 without drying, the substrate W cleaned by the second cleaning unit 18 is conveyed directly to the drying unit 20 without drying, and the substrate W is dried for the first time in the drying unit 20.

[0041] In the region surrounded by the load port 12, the polishing unit 14a located on the load port 12 side, and the drying unit 20, a first transfer robot 22 is arranged. Further, between the region where the polishing units 14a to 14d are arranged and the region where the cleaning units 16 and 18 and the drying unit 20 are arranged, a transfer unit 24 is arranged parallel to the longitudinal direction of the housing 10. The first transfer robot 22 receives the substrate W before polishing from the load port 12 and delivers it to the transfer unit 24, or receives the dried substrate W taken out from the drying unit 20 from the transfer unit 24.

[0042] Between the first cleaning unit 16 and the second cleaning unit 18, a second transfer robot 26 for transferring the substrate W between the first cleaning unit 16 and the second cleaning unit 18 is arranged. Further, between the second cleaning unit 18 and the drying unit 20, a third transfer robot 28 for transferring the substrate W between the second cleaning unit 18 and the drying unit 20 is arranged.

[0043] Furthermore, the substrate processing apparatus 1 is provided with a control device 30 for controlling the movements of the respective devices 14a to 14d, 16, 18, 20, 22, 24, 26, 28. As the control device 30, for example, a programmable logic controller (PLC) is used. In the aspect shown in FIG. 1, the control device 30 is arranged inside the housing 10, but it is not limited thereto, and the control device 30 may be arranged outside the housing 10.

[0044] In the example shown in FIG. 1A, as the first cleaning unit 16, a roll cleaning device is used which contacts a roll cleaning member extending in the horizontal direction with the surface of the substrate W in the presence of a cleaning liquid and scrubs the surface of the substrate W while rotating the roll cleaning member. As the second cleaning unit 18, a pencil cleaning device is used which contacts a columnar pencil cleaning member extending in the vertical direction with the surface of the substrate W in the presence of a cleaning liquid, rotates the pencil cleaning member, and moves it in one direction parallel to the surface of the substrate W to scrub the surface of the substrate W. Also, as the drying unit 20, a spin drying device is used which ejects isopropyl alcohol (IPA) vapor from an injection nozzle moving in one direction parallel to the surface of the substrate W toward the rotating substrate W to dry the substrate W, and further rotates the substrate W at high speed to dry the substrate W by centrifugal force.

[0045] Note that in this example, a roll cleaning device is used as the first cleaning unit 16. However, a pencil cleaning device similar to the second cleaning unit 18 may be used as the first cleaning unit 16. Alternatively, in the presence of a cleaning liquid, a buff cleaning and polishing member having a rotation axis extending in the vertical direction may be brought into contact with the surface of the substrate W, and while the buff cleaning and polishing member is rotated, it may be moved in one direction parallel to the surface of the substrate W to scrub, clean, and polish the surface of the substrate W using a buff polishing and cleaning device. A two-fluid jet cleaning device that cleans the surface of the substrate W by a two-fluid jet may also be used. Further, in this example, a pencil cleaning device is used as the second cleaning unit 18. However, a roll cleaning device similar to the first cleaning unit 16 may be used as the second cleaning unit 18, or a buff polishing and cleaning device may be used, or a two-fluid jet cleaning device may be used.

[0046] The cleaning liquid includes a rinsing liquid such as pure water (DIW) and chemical liquids such as an ammonia hydrogen peroxide water mixture (SC1), a hydrochloric acid hydrogen peroxide water mixture (SC2), sulfuric acid hydrogen peroxide (SPM), sulfuric acid added water, and hydrofluoric acid. Unless otherwise specified in this embodiment, the cleaning liquid means either a rinsing liquid or a chemical liquid.

[0047] Next, with reference to FIGS. 2 to 4, a substrate cleaning device 40 according to an embodiment will be described. The substrate cleaning device 40 according to an embodiment can be applied to both the first cleaning unit 16 and the second cleaning unit 18.

[0048] FIG. 2 is a plan view showing a schematic configuration of a substrate cleaning device 40 according to an embodiment. FIG. 3 is a side view of the substrate cleaning device 40 according to an embodiment as viewed from the front direction in FIG. 2. FIG. 4 is a side view of the substrate cleaning device 40 according to an embodiment as viewed from the right direction in FIG. 2.

[0049] As shown in FIGS. 2 to 4, the substrate cleaning apparatus 40 includes a substrate rotation support unit 41 that supports and rotates a substrate W, a roll holding unit 45 that rotatably holds a first roll cleaning member 42a and a second roll cleaning member 42b having a length substantially the same as the radius of the substrate W, a roll rotation driving unit 43 that rotates the first roll cleaning member 42a and the second roll cleaning member 42b, a roll pressing unit 46 that presses the first roll cleaning member 42a and the second roll cleaning member 42b against the surface of the substrate W, a roll parallel movement unit 47 that moves the first roll cleaning member 42a and the second roll cleaning member 42b parallel to the surface of the substrate W, and a cleaning liquid nozzle 44 that supplies a cleaning liquid to the surface of the substrate W.

[0050] Among these, as the substrate rotation support unit 41, for example, a plurality (four in the illustrated example) of spin chucks that rotate while supporting the outer periphery of the substrate W are used. The substrate W is held by the substrate rotation support unit 41 with its surface facing upward. When the substrate rotation support unit 41 supports and rotates the substrate W, the rotational force of the substrate rotation support unit 41 is transmitted to the outer surface of the substrate W, and the substrate W rotates about its central axis (an axis perpendicular to the surface of the substrate W passing through the center O) as the rotation axis.

[0051] The first roll cleaning member 42a and the second roll cleaning member 42b are, for example, roll sponges having a cylindrical shape made of PVA (polyvinyl alcohol). As shown in FIGS. 2 and 3, rotation shafts 42a1 and 42b1 extend coaxially with the respective central axes from both axial ends of the first roll cleaning member 42a and the second roll cleaning member 42b, and both ends of each of the rotation shafts 42a1 and 42b1 are rotatably held by the roll holding unit 45. In the illustrated example, the first roll cleaning member 42a and the second roll cleaning member 42b are held by the same roll holding unit 45, but the present invention is not limited thereto, and the first roll cleaning member 42a and the second roll cleaning member 42b may be held by different roll holding units.

[0052] As shown in FIGS. 2 and 3, the first roll cleaning member 42a and the second roll cleaning member 42b each have a length substantially the same as the radius of the substrate W. The first roll cleaning member 42a and the second roll cleaning member 42b are configured to be arranged so as to cover different radius portions of the surface of the substrate W in a state where their respective central axes are oriented parallel to the surface of the substrate W.

[0053] In the illustrated example, the central axis of the first roll cleaning member 42a and the central axis of the second roll cleaning member 42b are parallel to each other, and the first roll cleaning member 42a and the second roll cleaning member 42b are arranged so as to cover the radius portions on opposite sides of the surface of the substrate W. Since the central axis of the first roll cleaning member 42a and the central axis of the second roll cleaning member 42b are parallel to each other, it becomes easy to hold the first roll cleaning member 42a and the second roll cleaning member 42b in the same roll holding portion 45, and the device configuration becomes simpler compared to a configuration in which they are held in different roll holding portions.

[0054] The roll rotation driving unit 43 rotates the first roll cleaning member 42a and the second roll cleaning member 42b around their respective central axes parallel to the surface of the substrate W. The roll rotation driving unit 43 may rotate the first roll cleaning member 42a and the second roll cleaning member 42b at different rotational speeds.

[0055] In the example shown in FIGS. 2 and 3, the roll rotation driving unit 43 includes a first motor 431 that rotates the first roll cleaning member 42a, and a power transmission unit 432 that transmits the rotation of the first roll cleaning member 42a to the second roll cleaning member 42b.

[0056] Among these, the first motor 431 is connected to one end of the rotation shaft 42a1 of the first roll cleaning member 42a, and directly transmits a rotational force to the rotation shaft 42a1 of the first roll cleaning member 42a to rotate the first roll cleaning member 42a around its central axis.

[0057] FIG. 10 is a diagram showing an enlarged configuration of the power transmission unit 432. FIG. 11 is a view of the power transmission unit 432 as seen from the right direction in FIG. 10 and is a diagram for explaining the operation of the power transmission unit 432.

[0058] As shown in FIGS. 10 and 11, the power transmission unit 432 includes first to third pulleys 41 to 53, a belt 50 wound around the first to third pulleys 51 to 53, and first and second gears 54, 55.

[0059] Among these, the first pulley 51 is provided coaxially with the rotation shaft 42a1 of the first roll cleaning member 42a and is rotatable integrally with the first roll cleaning member 42a. The belt 50 is wound around the first to third pulleys 51 to 53. When the first roll cleaning member 42a is rotated integrally with the first pulley 51 by the rotational force from the first motor 431, the rotational force is transmitted to the second and third pulleys 52, 53 via the belt 50, and the second and third pulleys 52, 53 are rotated. The first gear 54 is provided coaxially with the second pulley 52 and is rotatable integrally with the second pulley 52. The second gear 55 is provided coaxially with the rotation shaft 42a1 of the second roll cleaning member 42a and is rotatable integrally with the second roll cleaning member 42a. Also, the second gear 55 meshes with the first gear 54. When the rotational force of the first roll cleaning member 42a is transmitted to the second pulley 52 via the belt 50, the second pulley 52 is rotated together with the first gear 54, and the rotational force of the first gear 54 is transmitted to the second gear 55, and the second gear 55 is rotated together with the second roll cleaning member 42b. Since the roll rotation drive unit 43 includes the first motor 431 and the power transmission unit 432, power can be transmitted to the two roll cleaning members 42a, 42b without installing two motors. As a result, for example, space can be saved and the weight of the device can be reduced.

[0060] In this embodiment, the second pulley 52 is a variable pulley. The V-groove width of the second pulley 52 is movable. When there is no load, it is narrowed by a spring force or the like and is substantially large in diameter (refer to the shapes of the second pulley 52 and the belt 60 shown by the broken line in FIG. 11). The third pulley 53 is a position-movable tension pulley. When the third pulley 53 is displaced upward in FIG. 11, the belt 60 overcomes the spring force of the second pulley 52 and expands the V-groove width, and the pulley path is reduced (refer to the shapes of the second pulley 52 and the belt 60 shown by the solid line in FIG. 11). As the diameter of the second pulley 52 is reduced, the rotational speeds of the second pulley 52 and the first gear 54 increase, and thereby, the rotational speeds of the second gear 55 and the second roll cleaning member 42b increase (the rotational speed becomes faster). Therefore, the rotational speed of the first roll cleaning member 42a and the rotational speed of the second roll cleaning member 42b can be made different from each other.

[0061] As a modification, as shown in FIG. 12, the roll rotation driving unit 43 may include a first motor 431 that rotates the first roll cleaning member 42a and a second motor 431b that rotates the second roll cleaning member 42b. The first motor 431 is connected to one end of the rotation shaft 42a1 of the first roll cleaning member 42a, and directly transmits a rotational force to the rotation shaft 42a1 of the first roll cleaning member 42a to rotate the first roll cleaning member 42a around its central axis. Further, the second motor 431b is connected to one end of the rotation shaft 42b1 of the second roll cleaning member 42b, and directly transmits a rotational force to the rotation shaft 42b1 of the second roll cleaning member 42b to rotate the second roll cleaning member 42b around its central axis. Also with such a configuration, it is possible to make the rotational speed of the first roll cleaning member 42a and the rotational speed of the second roll cleaning member 42b different from each other.

[0062] The roll pressing unit 46 makes the rotating first roll cleaning member 42a and the second roll cleaning member 42b slidably contact the surface of the substrate W.

[0063] In the example shown in FIGS. 2 and 3, the roll pressing portion 46 has a first pressing portion 461 and a second pressing portion 462.

[0064] The first pressing portion 461 presses the first roll cleaning member 42a and the second roll cleaning member 42b against the surface of the substrate W in sliding contact by applying a load in a direction perpendicular to the surface of the substrate W to the roll holding portion 45.

[0065] In the illustrated example, the first pressing portion 461 is an actuator and is connected to the base end portion of the first arm portion 481 extending in the horizontal direction. The distal end portion of the first arm portion 481 supports the second arm portion 482 so as to be suspended, and the second arm portion 482 holds the roll holding portion 45. When the first pressing portion 461 applies a vertically downward load to the first arm portion 471, the load is transmitted from the first arm portion 481 to the roll holding portion 45 via the second arm portion 482, and the first roll cleaning member 42a and the second roll cleaning member 42b are pressed against the surface of the substrate W and brought into sliding contact.

[0066] As shown in FIG. 3, a pressing load detection portion 463 is provided between the first arm portion 481 and the second arm portion 482. The pressing load detection portion 463 detects the pressing loads of the first roll cleaning member 42a and the second roll cleaning member 42b against the surface of the substrate W. The above-described control device 30 adjusts the pressing load of the first pressing portion 461 based on the detection result of the pressing load detection portion 463.

[0067] The second pressing portion 462 tilts the roll holding portion 45 with respect to the surface of the substrate W, thereby making the pressing loads of the first roll cleaning member 42a and the second roll cleaning member 42b against the surface of the substrate W different from each other.

[0068] FIG. 5 is a view showing a cross section of the substrate cleaning device 40 cut along the line A-A shown in FIG. 2. FIG. 6 is a view showing a cross section of the substrate cleaning device 40 cut along the line B-B shown in FIG. 3.

[0069] In the examples shown in FIGS. 5 and 6, the second pressing portion 462 is a telescopic actuator, and is provided so as to be able to expand and contract vertically at a position displaced from the rotation axis of the first roll cleaning member 42a in the roll holding portion 45. As shown in FIG. 7, before the second pressing portion 462 contracts, the roll holding portion 45 is not inclined with respect to the surface of the substrate W, and the load received by the roll holding portion 45 from the first pressing portion 461 is evenly distributed to the first roll cleaning member 42a and the second roll cleaning member 42b, and the first roll cleaning member 42a and the second roll cleaning member 42b are pressed against the surface of the substrate W with the same pressing load. On the other hand, as shown in FIG. 8, when the second pressing portion 462 contracts, the right end portion of the roll holding portion 45 is pulled upward by the second pressing portion 462, and the distance of the right end portion (the first end portion) of the roll holding portion 45 from the substrate increases. At this time, the left end portion (the second end portion) of the roll holding portion 45 is pushed down, and the roll holding portion 45 is inclined with respect to the surface of the substrate W. The pressing load of the second roll cleaning member 42b disposed relatively on the left side becomes larger than the pressing load of the first roll cleaning member 42a. By being able to make the pressing loads of the first roll cleaning member 42a and the second roll cleaning member 42b with respect to the surface of the substrate W different from each other, it is possible to realize a removal action according to the adhesion force of particles due to the difference in the pressing loads of the roll cleaning members 42a and 42b with respect to the substrate W, or to immediately remove the particles reattached from the roll cleaning members 42a and 42b to the substrate, and the particle removal ability can be improved. That is, the inventors have found that particles with relatively large adhesion force are easily removed under high load and low rotation speed conditions, and particles with relatively small adhesion force are easily removed under low load and high rotation speed conditions. In this specification, tilting the roll holding portion 45 with respect to the surface of the substrate W means creating a state in which the distance of the right end portion or the left end portion (the first end portion) of the roll holding portion 45 from the substrate increases, and at the same time, the distance of the other end portion (the second end portion) of the roll holding portion 45 from the substrate decreases.

[0070] Referring to FIG. 2, the control device 30 automatically controls, within the control device 30, the voltage applied to the motor so that the first motor 431 maintains a constant motor rotation speed even with respect to minute fluctuations in the load torque. Therefore, for example, the first motor 431 is provided with a torque calculator (not shown) that calculates the load torque of the motor from the drive current of the motor, and the control device 30 receives the signal of the load torque of the motor output from the torque calculator. The control device 30 also has a storage unit (not shown) that stores upper and lower limit values predetermined for the load torque of the first motor 431, and a calculation unit (not shown) that reads data from the storage unit and performs calculations. When the control device 30 receives the signal of the load torque of the first motor 431 (from the torque calculator), it compares it with the upper and lower limit values stored in the storage unit. When the load torque of the first motor 431 exceeds the preset upper limit value, the control device 30 calculates, according to a predetermined calculation formula or table, the distance corresponding to the difference between the upper limit value and the load torque of the first motor 431, and controls the roll pressing unit 46 so as to separate the first roll cleaning member 42a and the second roll cleaning member 42b from the substrate W by that distance. On the other hand, when the load torque of the first motor 431 falls below the preset lower limit value, the control device 30 calculates, according to a predetermined calculation formula or table, the distance corresponding to the difference between the lower limit value and the load torque of the first motor 431, and controls the roll pressing unit 46 so as to bring the first roll cleaning member 42a and the second roll cleaning member 42b closer to the substrate W by that distance. Thereby, by keeping the load torque of the first motor 431 within a certain predetermined range, the pressing state of the roll cleaning members 42a and 42b against the surface of the substrate W can be kept within a certain range, and stable cleaning performance can be maintained.

[0071] As a modified example, as shown in FIG. 12, when the roll rotation driving unit 43 includes a first motor 431 that rotates the first roll cleaning member 42a and a second motor 431b that rotates the second roll cleaning member 42b, torque calculators (not shown) for calculating the load torque of the motors from the driving currents of the motors are provided for the first motor 431 and the second motor 431b, respectively. The control device 30 stores a first upper limit value and a first lower limit value predetermined for the load torque of the first motor 431, and a second upper limit value and a second lower limit value predetermined for the load torque of the second motor 431b, and may include a storage unit (not shown) and an arithmetic unit (not shown) that reads data from the storage unit and performs arithmetic operations. In this case, the control device 30 receives signals of the load torques of the first motor 431 and the second motor 431b (from the torque calculators), compares the load torque of the first motor 431 with the first upper limit value and the first lower limit value stored in the storage unit, and compares the load torque of the second motor 431b with the second upper limit value and the second lower limit value stored in the storage unit. When the load torque of the first motor 431 exceeds the preset first upper limit value, the control device 30 calculates, according to a preset calculation formula or table, the distance corresponding to the difference between the first upper limit value and the load torque of the first motor 431, and controls the roll pressing unit 46 to separate the first roll cleaning member 42a from the substrate W by that distance. On the other hand, when the load torque of the first motor 431 is below the preset first lower limit value, the control device 30 calculates, according to a preset calculation formula or table, the distance corresponding to the difference between the first lower limit value and the load torque of the first motor 431, and controls the roll pressing unit 46 to bring the first roll cleaning member 42a closer to the substrate W by that distance. Also, when the load torque of the second motor 431b exceeds the preset second upper limit value, the control device 30 calculates, according to a preset calculation formula or table, the distance corresponding to the difference between the second upper limit value and the load torque of the second motor 431b, and controls the roll pressing unit 46 to separate the second roll cleaning member 42b from the substrate W by that distance.When the load torque of the other party, the second motor 431b, falls below a preset second lower limit value, the control device 30 calculates according to a preset calculation formula or table the distance corresponding to the difference between the second lower limit value and the load torque of the second motor 431b, and controls the roll pressing portion 46 so that the second roll cleaning member 42b approaches the substrate W by that distance. Thereby, by keeping the load torques of the first motor 431 and the second motor 431b within a certain predetermined range, the pressing conditions of the roll cleaning members 42a and 42b against the surface of the substrate W can be kept within a certain range, and stable cleaning performance can be maintained.

[0072] Although not shown, a third roll cleaning member having a normal length (i.e., substantially the same length as the diameter of the substrate W) is disposed on the back side of the substrate W. While the front surface of the substrate W is contact-cleaned by the first roll cleaning member 42a and the second roll cleaning member 42b, the back surface of the substrate W may be contact-cleaned by the third roll cleaning member. In that case, the pressing load of the third roll cleaning member may be configured to be adjusted based on the value of the load torque of the third motor that rotates the third roll cleaning member.

[0073] As shown in FIG. 2, the roll rotation driving unit 43 rotates the first roll cleaning member 42a and the second roll cleaning member 42b in such a direction that the sliding directions at the sliding contact portions between the first roll cleaning member 42a and the substrate W are opposite to each other, and the sliding directions at the sliding contact portions between the second roll cleaning member 42b and the substrate W are opposite to each other. For example, when the substrate W is rotated clockwise about its central axis as viewed from above by the substrate rotation support unit 41, the roll rotation driving unit 43 rotates the first roll cleaning member 42a and the second roll cleaning member 42b clockwise about their respective central axes as viewed from the center side of the substrate W. Conversely, when the substrate W is rotated counterclockwise about its central axis as viewed from above by the substrate rotation support unit 41, the roll rotation driving unit 43 rotates the first roll cleaning member 42a and the second roll cleaning member 42b counterclockwise about their respective central axes as viewed from the center side of the substrate W.

[0074] As a comparative example, when the sliding directions at the sliding contact portions between the roll cleaning member and the substrate W are the same, the roll cleaning member acts to scrape up the particles on the substrate W moving away, and acts to entrain the particles on the approaching substrate W into the substrate. Thus, it hardly contributes to the cleaning of the substrate, and conversely, there is an influence of reattaching particles from the roll cleaning member to the substrate W. On the other hand, when the sliding directions at the sliding contact portions between the first roll cleaning member 42a and the substrate W are opposite to each other, and the sliding directions at the sliding contact portions between the second roll cleaning member 42b and the substrate W are opposite to each other, the first roll cleaning member 42a and the second roll cleaning member 42b act to catch and scrape up the particles on the approaching substrate W, so that the particle removing ability can be improved.

[0075] Referring to FIGS. 2 and 9, the roll translation unit 47 moves the first roll cleaning member 42a and the second roll cleaning member 42b integrally in a direction parallel to the surface of the substrate W. The roll translation unit 47 may move the first roll cleaning member 42a and the second roll cleaning member 42b in a direction orthogonal to their respective central axes (the vertical direction in FIGS. 2 and 9), or may move them in a direction parallel to their respective central axes (the horizontal direction in FIGS. 2 and 9), or may move them in a direction orthogonal to their respective central axes (the vertical direction in FIGS. 2 and 9) while also moving them in a direction parallel to their respective central axes (the horizontal direction in FIGS. 2 and 9) so as to move in a circular path.

[0076] Referring to FIG. 2, the cleaning liquid nozzle 44 supplies the cleaning liquid to the surface of the substrate W. In the example shown in FIG. 2, the cleaning liquid nozzle 44 includes a first cleaning liquid nozzle 44a that supplies the cleaning liquid to the sliding contact portion between the first roll cleaning member 42a and the substrate W, a second cleaning liquid nozzle 44b that supplies the cleaning liquid to the sliding contact portion between the second roll cleaning member 42b and the substrate W, and a third cleaning liquid nozzle 44c that supplies the cleaning liquid to the central portion of the substrate W.

[0077] As shown in FIG. 2, the first cleaning liquid nozzle 44a may supply a cleaning liquid from the upstream side in the rotation direction of the substrate W to the sliding contact portion between the first roll cleaning member 42a and the substrate W. Further, the second cleaning liquid nozzle 44b may supply a cleaning liquid from the upstream side in the rotation direction of the substrate W to the sliding contact portion between the second roll cleaning member 42b and the substrate W.

[0078] In the example shown in FIG. 2, the first cleaning liquid nozzle 44a has a first chemical liquid nozzle 44a1 that supplies a chemical liquid to the sliding contact portion between the first roll cleaning member 42a and the substrate W, and a first rinse liquid nozzle 44a2 that supplies a rinse liquid. The first chemical liquid nozzle 44a1 and the first rinse liquid nozzle 44a2 may each be a spray nozzle or a single-tube nozzle. Further, the second cleaning liquid nozzle 44b has a second chemical liquid nozzle 44b1 that supplies a chemical liquid to the sliding contact portion between the second roll cleaning member 42b and the substrate W, and a second rinse liquid nozzle 44b2 that supplies a rinse liquid. The second chemical liquid nozzle 44b1 and the second rinse liquid nozzle 44b2 may each be a spray nozzle or a single-tube nozzle. Further, the third cleaning liquid nozzle 44c has a third chemical liquid nozzle 44c1 that supplies a chemical liquid to the central portion of the substrate W, and a third rinse liquid nozzle 44c2 that supplies a rinse liquid. The third chemical liquid nozzle 44c1 and the third rinse liquid nozzle 44c2 may each be a spray nozzle or a single-tube nozzle. In this specification, the "spray nozzle" refers to a nozzle having a large number of supply ports and discharging the cleaning liquid so as to spread spatially, and the "single-tube nozzle" refers to a nozzle having a single supply port and ejecting the cleaning liquid from the supply port in a relatively straight line, different from the spray nozzle.

[0079] Next, an example of a substrate cleaning method by the substrate cleaning apparatus 40 having such a configuration will be described.

[0080] First, the substrate W to be cleaned is held by the substrate rotation support portion 41 with its surface facing up. Next, the first roll cleaning member 42a and the second roll cleaning member 42b are arranged so as to cover different radius portions of the surface of the substrate W.

[0081] Then, the substrate rotation support part 41 rotates the substrate W around its central axis, and the roll rotation drive part 43 rotates the first roll cleaning member 42a and the second roll cleaning member 42b around their respective central axes parallel to the surface of the substrate W.

[0082] Next, while the cleaning liquid nozzle 44 supplies the cleaning liquid to the surface of the substrate W, the roll pressing part 46 presses the first roll cleaning member 42a and the second roll cleaning member 42b against the surface of the substrate W and makes them in sliding contact. Since the surface of the substrate W is cleaned twice by the first roll cleaning member 42a and the second roll cleaning member 42b during one rotation, the particle removal ability can be improved at each stage as compared with the configuration disclosed in Japanese Patent Application Laid-Open No. 2002-313767 (Patent Document 1).

[0083] The roll rotation drive part 43 may rotate the first roll cleaning member 42a and the second roll cleaning member 42b in such a direction that the sliding directions at the sliding contact parts between the first roll cleaning member 42a and the substrate W are opposite to each other, and the sliding directions at the sliding contact parts between the second roll cleaning member 42b and the substrate W are opposite to each other. In this case, the rotating first roll cleaning member 42a and second roll cleaning member 42b act so as to meet the particles on the approaching substrate W and scrape them up, so that the particle removal ability can be further improved.

[0084] The roll rotation drive part 43 may rotate the first roll cleaning member 42a and the second roll cleaning member 42b at different rotational speeds. In this case, the relative speed at the sliding contact part between the first roll cleaning member 42a and the substrate W can be made different from the relative speed at the sliding contact part between the second roll cleaning member 42b and the substrate W. Thereby, it becomes possible to realize a removal action according to the size of the particles or to immediately remove the particles reattached from the roll cleaning members 42a and 42b to the substrate W, so that the particle removal ability can be further improved.

[0085] The roll pressing part 46 may make the roll holding part 42 tilt with respect to the surface of the substrate W by the operation of the second pressing part 462, so that the pressing load of the first roll cleaning member 42a and the pressing load of the second roll cleaning member 42b with respect to the surface of the substrate W are different from each other. In this case, due to the difference in the pressing loads of the roll cleaning members 42a and 42b on the substrate W, it is possible to realize a removal action according to the size of the particles, or to immediately remove the particles reattached from the roll cleaning members 42a and 42b to the substrate W. Therefore, the particle removal ability can be further improved.

[0086] In a state where the first roll cleaning member 42a and the second roll cleaning member 42b are in sliding contact with the surface of the substrate W, the roll parallel movement part 47 may move the first roll cleaning member 42a and the second roll cleaning member 42b integrally in a direction parallel to the surface of the substrate. In this case, even if the central axes of the roll cleaning members 42a and 42b are not arranged so as to overlap the diameter of the substrate W in a plan view, by reciprocatingly moving the roll cleaning members 42a and 42b in a direction orthogonal to the central axes of the roll cleaning members 42a and 42b while cleaning, the roll cleaning members 42a and 42b can be brought into sliding contact with the central portion of the substrate W, and the central portion of the substrate W can be evenly cleaned.

[0087] In a conventional apparatus, cleaning is performed only in an arrangement where the central axis of the roll cleaning member overlaps with the diameter of the substrate W in a plan view. Therefore, the position of the nozzles (concavities and convexities) provided on the outer periphery of the surface of the roll cleaning member becomes a fixed position with respect to the radial distance from the center of the substrate W, and there is a distribution of the contact times of the nozzles depending on the radial position. As a result, there is a variation in the particle removal ability depending on the radial distance from the center of the substrate W. In contrast, in the present embodiment, the roll translation unit 47 reciprocates the roll cleaning members 42a and 42b in a direction orthogonal to the central axis of the roll cleaning members 42a and 42b while cleaning, so that the position of the nozzles provided on the outer periphery of the surface of the roll cleaning members 42a and 42b becomes a variable position with respect to the radial distance from the center of the substrate W, the distribution of the contact times of the nozzles depending on the radial position is suppressed, and the time until the end of cleaning can be relatively shortened.

[0088] When the cleaning liquid nozzle 44 supplies the cleaning liquid to the surface of the substrate W, the first cleaning liquid nozzle 44a may supply the cleaning liquid from the upstream side in the rotation direction of the substrate W with respect to the sliding contact portion between the first roll cleaning member 42a and the substrate W, and the second cleaning liquid nozzle 44b may supply the cleaning liquid from the upstream side in the rotation direction of the substrate W with respect to the sliding contact portion between the second roll cleaning member 42b and the substrate W. In this case, the cleaning liquid can be supplied more efficiently to the sliding contact portions between the respective roll cleaning members 42a and 42b and the substrate W, and the particle removal ability can be further improved.

[0089] After the cleaning is completed, the control device 30 controls the roll pressing unit 46 so as to separate the first roll cleaning member 42a and the second roll cleaning member 42b from the surface of the substrate W. Here, when separating the cleaning member from the substrate, if the two cleaning members are separated simultaneously, there is a concern that reverse contamination may occur. In such a case, for example, the control device 30 first separates the roll cleaning member with the longer cumulative usage time among the first roll cleaning member 42a and the second roll cleaning member 42b from the first surface (front surface) of the substrate W, and then controls the roll pressing unit 46 so as to separate the roll cleaning member with the shorter cumulative usage time from the first surface (front surface) of the substrate W next. By performing such processing, concerns such as reverse contamination on the substrate W can be reduced. Also, as described above, when the surface of the substrate W is contact-cleaned by the first roll cleaning member 42a and the second roll cleaning member 42b, and at the same time, the back surface of the substrate W is contact-cleaned by the third roll cleaning member, and there is a concern that particles from the surface of the substrate W may migrate to the back surface side, etc., after the cleaning is completed, the control device 30 first separates the roll cleaning member with the longer cumulative usage time among the first roll cleaning member 42a and the second roll cleaning member 42b from the first surface (front surface) of the substrate W, then separates the roll cleaning member of the second surface (back surface) of the substrate W (the above-described third roll cleaning member) from the substrate W, and finally controls the roll pressing unit 46 so as to separate the roll cleaning member with the relatively shorter cumulative usage time on the first surface (front surface) from the first surface (front surface) of the substrate. Thereby, while ensuring the cleanability on the first surface (front surface) side, the cleanability on the second surface (back surface) side can also be ensured.

[0090] In order to separate one of the first roll cleaning member 42a and the second roll cleaning member 42b from the first surface (front surface) of the substrate W first, for example, it can be realized by extending or contracting the second pressing unit 462 of the roll pressing unit 46.

[0091] As one form of the substrate cleaning method, the first roll cleaning member 42a may be pressed against the substrate W with a relatively high load while rotating at a relatively low speed, and the second roll cleaning member 42b may be pressed against the substrate W with a relatively low load while rotating at a relatively high speed. Generally, contaminants with a large adhesion force (for example, particles composed of highly adhesive components) have been found in the inventors' studies to be well cleaned at a low rotation speed and a high pressing load. On the other hand, this condition may increase the reverse contamination from the roll cleaning member. By doing so as described above, while enabling the first roll cleaning member 42a to exhibit a high contaminant removal ability, it is possible to remove particles that are about to reattach to the substrate W by the second roll cleaning member 42b or particles that have already reattached. Furthermore, by separating the first roll cleaning member 42a from the substrate W first and then separating the second roll cleaning member 42b later, it is possible to finish the cleaning under cleaning conditions with a low risk of particle reattachment, which is advantageous. Alternatively, before separating the roll cleaning members from the substrate W at the end of the cleaning process, both roll cleaning members may be rotated at a high rotation speed and a low pressing load for a short time to suppress reverse contamination.

[0092] According to the above-described embodiment, since the first roll cleaning member 42a and the second roll cleaning member 42b having lengths substantially the same as the radius of the substrate W are arranged to cover different radius portions of the surface of the substrate W, while rotating the substrate W, the first roll cleaning member 42a, and the second roll cleaning member 42b, respectively, by bringing the first roll cleaning member 42a and the second roll cleaning member 42b into sliding contact with the surface of the substrate W, the surface of the substrate W is cleaned twice by the first roll cleaning member 42a and the second roll cleaning member 42b during one rotation. Therefore, the particle removal ability can be improved at each stage.

[0093] Further, according to the present embodiment, the sliding directions at the sliding contact portions between the first roll cleaning member 42a and the substrate W are opposite to each other, and the sliding directions at the sliding contact portions between the second roll cleaning member 42b and the substrate W are opposite to each other. The first roll cleaning member 42a and the second roll cleaning member 42b are rotated so that the rotating first roll cleaning member 42a and the second roll cleaning member 42b act to face the particles on the approaching substrate W and scrape them up. Thereby, the particle removing ability can be further improved.

[0094] Further, according to the present embodiment, since the first roll cleaning member 42a and the second roll cleaning member 42b are rotated at different rotational speeds, the relative speed at the sliding contact portion between the first roll cleaning member 42a and the substrate W can be made different from the relative speed at the sliding contact portion between the second roll cleaning member 42b and the substrate W. Thereby, it becomes possible to realize a removing action according to the size of the particles, or to immediately remove the particles reattached from the roll cleaning members 42a and 42b to the substrate W, and the particle removing ability can be further improved.

[0095] Further, according to the present embodiment, by tilting the roll holding portion 45 with respect to the surface of the substrate W, the pressing loads of the first roll cleaning member 42a and the second roll cleaning member 42b on the surface of the substrate W are made different from each other, and then scrub cleaning can be performed with the first roll cleaning member and the second roll cleaning member. Thereby, a removing action according to the magnitude of the adhesion force of the particles on the substrate surface can be realized due to the difference in the pressing loads of the roll cleaning members 42a and 42b on the substrate W. Also, for example, it can be expected that the particles reattached to the substrate due to the strong pressing load of the first roll cleaning member are removed by the second roll cleaning member having a pressing load smaller than that of the first roll cleaning member. As a result, it becomes possible to immediately remove the particles reattached from the roll cleaning members 42a and 42b to the substrate W without providing another cleaning process, and an improved particle removing ability can be achieved without reducing the throughput.

[0096] Also, according to the present embodiment, by cleaning while reciprocating the roll cleaning members 42a and 42b in a direction orthogonal to their central axes, even if the central axes of the roll cleaning members 42a and 42b are not arranged to overlap the diameter of the substrate W in a plan view, the roll cleaning members 42a and 42b can be brought into sliding contact with the central portion of the substrate W, and the central portion of the substrate W can be evenly cleaned. Further, since the positions of the nozzles provided on the outer periphery of the surfaces of the roll cleaning members 42a and 42b are variable positions in the radial direction from the center of the substrate W, uneven distribution of the contact times of the nozzles due to the radial positions is suppressed, and the time until the cleaning is completed can be relatively shortened.

[0097] As described above, the embodiments and modification examples of the present invention have been described by way of example. However, the scope of the present invention is not limited to these, and it can be changed and modified according to the purpose within the scope described in the claims. Further, each embodiment and modification example can be appropriately combined as long as the processing contents do not conflict with each other.

Explanation of Reference Numerals

[0098] 1 Substrate processing apparatus 10 Housing 12 Load port 14a to 14d Polishing unit (substrate polishing apparatus) 16 Cleaning apparatus 16 First cleaning unit (substrate cleaning apparatus) 18 Second cleaning unit (substrate cleaning apparatus) 20 Drying unit 22 First transfer robot 24 Transfer unit 26 Second transfer robot 28 Third transfer robot 30 Control device 40 Substrate cleaning apparatus 41 Substrate rotation support portion 42a First roll cleaning member 42b Second roll cleaning member 43 Roll rotation drive portion 431 First motor 431b Second motor 432 Power transmission section 44 Cleaning liquid nozzle 44a First cleaning liquid nozzle 44a1 First chemical liquid nozzle 44a2 First rinse liquid nozzle 44b Second cleaning liquid nozzle 44b1 Second chemical liquid nozzle 44b2 Second rinse liquid nozzle 44c Third cleaning liquid nozzle 44c1 Third chemical liquid nozzle 44c2 Third rinse liquid nozzle 45 Roll holding section 46 Roll pressing section 461 First pressing section 462 Second pressing section 463 Pressing load detection section 47 Roll parallel movement section 481 First arm section 482 Second arm section 50 Belt 51 First pulley 52 Second pulley 53 Third pulley 54 First gear 55 Second gear W Substrate

Claims

1. a substrate rotation support section that supports and rotates the substrate; a roll holder that rotatably holds a first roll cleaning member and a second roll cleaning member having a length substantially equal to the radius of the substrate; a roll rotation drive unit that rotates the first roll cleaning member and the second roll cleaning member about their respective central axes parallel to the surface of the substrate; a roll pressing unit that causes the rotating first roll cleaning member and the second roll cleaning member to come into sliding contact with the surface of the substrate; Equipped with the first roll cleaning member and the second roll cleaning member are configured to be arranged to cover different radial portions of the surface of the substrate; The roll pressing unit includes: a first pressing unit that applies a load to the roll holding unit in a direction perpendicular to the surface of the substrate, thereby causing the first roll-type cleaning member and the second roll-type cleaning member to come into sliding contact with the surface of the substrate; a second pressing unit that tilts the roll holding unit with respect to the surface of the substrate to make a pressing load of the first roll-type cleaning member and a pressing load of the second roll-type cleaning member with respect to the surface of the substrate different from each other; have A substrate cleaning apparatus comprising:

2. the roll rotation drive unit rotates the first roll cleaning member and the second roll cleaning member in such orientations that sliding directions at a sliding contact portion between the first roll cleaning member and the substrate are opposite to each other, and that sliding directions at a sliding contact portion between the second roll cleaning member and the substrate are opposite to each other.

2. The substrate cleaning apparatus according to claim 1.

3. The central axis of the first roll cleaning member and the central axis of the second roll cleaning member are parallel to each other, and the first roll cleaning member and the second roll cleaning member are disposed so as to cover radial portions of the surface of the substrate that are opposite each other across the center of the substrate.

3. The substrate cleaning apparatus according to claim 1, wherein the cleaning apparatus is a cleaning device for cleaning a substrate.

4. The roll rotation drive unit rotates the first roll cleaning member and the second roll cleaning member at different rotation speeds.

3. The substrate cleaning apparatus according to claim 1, wherein the cleaning apparatus is a cleaning device for cleaning a substrate.

5. the roll rotation drive unit has a motor that rotates the first roll cleaning member and the second roll cleaning member, the substrate cleaning apparatus has a control device that controls the roll pressing unit, The control device receives a signal of the load torque of the motor, and controls the roll pressing unit so that, when the load torque of the motor exceeds a preset upper limit value, the first roll cleaning member and the second roll cleaning member are separated from the substrate by a distance corresponding to the difference between the upper limit value and the load torque of the motor, and, when the load torque of the motor falls below a preset lower limit value, the first roll cleaning member and the second roll cleaning member are brought closer to the substrate by a distance corresponding to the difference between the lower limit value and the load torque of the motor.

3. The substrate cleaning apparatus according to claim 1.

6. the roll rotation drive unit includes a first motor that rotates the first roll cleaning member and a second motor that rotates the second roll cleaning member; 3. The substrate cleaning apparatus according to claim 1, wherein the cleaning apparatus is a cleaning device for cleaning a substrate.

7. a control device that receives signals of the load torques of the first motor and the second motor, and controls the roll pressing unit so as to separate the first roll cleaning member from the substrate by a distance corresponding to a difference between the first upper limit value and the load torque of the first motor when the load torque of the first motor exceeds a predetermined first upper limit value, to bring the first roll cleaning member closer to the substrate by a distance corresponding to a difference between the first lower limit value and the load torque of the first motor when the load torque of the first motor falls below a predetermined first lower limit value, to separate the second roll cleaning member from the substrate by a distance corresponding to a difference between the second upper limit value and the load torque of the second motor when the load torque of the second motor exceeds a predetermined second upper limit value, and to bring the second roll cleaning member closer to the substrate by a distance corresponding to a difference between the second lower limit value and the load torque of the second motor when the load torque of the second motor falls below a predetermined second lower limit value.

7. The substrate cleaning apparatus according to claim 6.

8. the roll rotation drive unit includes a first motor that rotates the first roll cleaning member, and a power transmission unit that transmits the rotation of the first roll cleaning member to the second roll cleaning member.

3. The substrate cleaning apparatus according to claim 1, wherein the cleaning apparatus is a cleaning device for cleaning a substrate.

9. The cleaning device further includes a roll translation unit that moves the first roll cleaning member and the second roll cleaning member together in a direction parallel to the surface of the substrate.

3. The substrate cleaning apparatus according to claim 1, wherein the cleaning apparatus is a cleaning device for cleaning a substrate.

10. A cleaning liquid nozzle for supplying a cleaning liquid to the surface of the substrate.

3. The substrate cleaning apparatus according to claim 1, wherein the cleaning apparatus is a cleaning device for cleaning a substrate.

11. the cleaning liquid nozzle includes a first cleaning liquid nozzle that supplies a cleaning liquid to a sliding contact portion between the first roll cleaning member and the substrate, and a second cleaning liquid nozzle that supplies a cleaning liquid to a sliding contact portion between the second roll cleaning member and the substrate. The substrate cleaning apparatus according to claim 10 .

12. the first cleaning liquid nozzle supplies a cleaning liquid to a sliding contact portion between the first roll cleaning member and the substrate from an upstream side in a rotation direction of the substrate; the second cleaning liquid nozzle supplies a cleaning liquid to a sliding contact portion between the second roll cleaning member and the substrate from an upstream side in a rotation direction of the substrate. The substrate cleaning apparatus according to claim 11 .

13. the cleaning liquid nozzle has a third cleaning liquid nozzle that supplies a cleaning liquid to a central portion of the substrate; The substrate cleaning apparatus according to claim 10 .

14. a substrate polishing apparatus for polishing a substrate; 3. The substrate cleaning apparatus according to claim 1 or 2, which cleans a substrate after polishing; A substrate processing apparatus comprising:

15. a first roll-type cleaning member and a second roll-type cleaning member each having a length substantially equal to a radius of a substrate, the first roll-type cleaning member and the second roll-type cleaning member being disposed so as to cover different radius portions of the surface of the substrate; while rotating the substrate and rotating the first roll cleaning member and the second roll cleaning member about their respective central axes parallel to the surface of the substrate, a load is applied to a roll holding part that rotatably holds the first roll cleaning member and the second roll cleaning member in a direction perpendicular to the surface of the substrate, thereby bringing the first roll cleaning member and the second roll cleaning member into sliding contact with the surface of the substrate, and the roll holding part is tilted with respect to the surface of the substrate, thereby making the pressing load of the first roll cleaning member and the pressing load of the second roll cleaning member with respect to the surface of the substrate different from each other. A method for cleaning a substrate comprising the steps of:

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