Substrate transport system and substrate transport device
The substrate transport system addresses the challenge of achieving high accuracy and reduced dust generation by using a levitation unit supported by non-contact forces, ensuring stable and accurate substrate transport while minimizing dust.
Patent Information
- Application Number
- JP2022569793
- Authority / Receiving Office
- JP · JP
- Patent Type
- Patents
- Current Assignee / Owner
- Priority Date
- 2020-12-14
- Filing Date
- 2021-11-16
- Publication Date
- 2025-05-22
- Estimated Expiration
- 2041-11-16
AI Technical Summary
Existing substrate transport systems face challenges in achieving both high transfer accuracy and reduced dust generation, particularly in levitated transport mechanisms where position and posture variability can affect conveying accuracy and dust suppression.
A substrate transport system incorporating a linear transport device with a levitation unit supported by non-contact forces generated by actuators, allowing the levitation unit to follow the movement of a moving base along a transport line while maintaining high positional accuracy and minimizing dust generation.
The system effectively achieves high transfer accuracy and reduced dust generation by stabilizing the levitation unit's position relative to the moving base, ensuring consistent non-contact forces and maintaining cleanliness within the transport environment.
Smart Images

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Abstract
Description
[Technical field]
[0001] The present disclosure relates to a substrate transport system and a substrate transport apparatus. [Background technology]
[0002] Patent Document 1 discloses a substrate processing apparatus that transports substrates using a mobile robot that moves within a transport chamber by being driven by a linear motor. [Prior art documents] [Patent documents]
[0003] [Patent Document 1] JP 2008-028179 A Summary of the Invention [Problem to be solved by the invention]
[0004] The present disclosure provides a substrate transfer system that is effective in achieving both high transfer accuracy and reduced dust generation. [Means for solving the problem]
[0005] A substrate transport system according to one aspect of the present disclosure includes a linear transport device that transports a substrate along a transport line, and a robot that receives the substrate from the linear transport device and transports it into a processing unit and transports the substrate from the processing unit to the linear transport device. The linear transport device includes a first moving body that moves along the transport line, a second moving body that supports the substrate, and a non-contact force generating unit that applies a non-contact force from the first moving body to the second moving body so as to levitate the second moving body relative to the first moving body and cause the second moving body to follow the movement of the first moving body.
[0006] A substrate transport apparatus according to another aspect of the present disclosure includes a first moving body that moves along a transport line, a second moving body that supports a substrate, and a non-contact force generating unit that generates a non-contact force between the first and second moving bodies so as to levitate the second moving body relative to the first moving body and cause the second moving body to follow the movement of the first moving body, wherein the non-contact force generating unit has a first actuator that faces the second moving body along a first intersecting line that intersects the transport line and applies a non-contact force to the second moving body, and a second actuator that faces the second moving body along a second intersecting line that intersects the transport line and the first intersecting line and applies a non-contact force to the second moving body, wherein the first actuator applies a first non-contact force parallel to the transport line to the second moving body, and the second actuator applies a second non-contact force parallel to the transport line to the second moving body. Effect of the Invention
[0007] According to the present disclosure, it is possible to provide a substrate transfer system that is effective in achieving both transfer accuracy and dust suppression. [Brief description of the drawings]
[0008] [Figure 1] FIG. 1 is a schematic diagram illustrating a schematic configuration of a substrate transport system. [Diagram 2] FIG. 2 is a cross-sectional view taken along line II-II in FIG. [Diagram 3] FIG. 3 is a cross-sectional view taken along line III-III in FIG. [Figure 4] FIG. 3 is a cross-sectional view taken along line IV-IV in FIG. [Diagram 5] FIG. 3 is a cross-sectional view taken along line VV in FIG. [Figure 6] FIG. 1 is a schematic diagram summarizing non-contact forces and positioning lines. [Figure 7] 13 is a schematic diagram showing a modified example of the non-contact force generating unit and the position / posture detecting unit. [Figure 8] 13 is a flowchart illustrating a force control procedure. [Figure 9] FIG. 2 is a diagram illustrating an example of a hardware configuration of a controller. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS
[0009] Hereinafter, the embodiments will be described in detail with reference to the drawings. In the description, the same elements or elements having the same functions are denoted by the same reference numerals, and duplicated description will be omitted.
[0010] [Substrate transport system] 1 is a system for transporting a substrate to be processed in a substrate processing system PS. Specific examples of the substrate to be processed include a semiconductor substrate, a glass substrate, a mask substrate, and an FPD (Flat Panel Display) substrate.
[0011] The substrate transport system 1 includes a linear transport device 2, a robot 3, and a controller 100. The linear transport device 2 (substrate transport device) transports a substrate W to be processed along a transport line. The robot 3 receives the substrate W from the linear transport device 2 and transports it into a processing unit PU of the substrate processing system PS, and then transports the substrate W from the processing unit PU to the linear transport device 2. The controller 100 controls the linear transport device 2 and the robot 3.
[0012] The robot 3 has a base 7, a hand 5, an articulated arm 4, and a lifting and lowering drive unit 6. The base 7 is fixed between the processing unit PU and the linear transport device 2. The hand 5 supports the substrate W approximately horizontally. The articulated arm 4 changes the position and posture of the hand 5 relative to the base 7 along a horizontal plane. The lifting and lowering drive unit 6 raises and lowers the articulated arm 4 and the hand 5 relative to the base 7.
[0013] The substrate processing system PS may include a plurality of processing units PU. Correspondingly, the substrate transfer system 1 may include a plurality of robots 3. For example, the substrate processing system PS includes a plurality of processing units PU arranged along a horizontal unit arrangement line L31. The substrate transfer system 1 includes a plurality of robots 3 arranged along a robot arrangement line L32 parallel to the unit arrangement line L31.
[0014] 1 illustrates four processing units PU and two robots 3, but the number of processing units PU and the number of robots 3 are not limited to this. As an example, the substrate transfer system 1 includes four processing units PU1, PU2, PU3, and PU4 and two robots 3A and 3B. The processing units PU1, PU2, PU3, and PU4 are arranged in order along a unit arrangement line L31.
[0015] The base 7 of the robot 3A is disposed so as to correspond to the processing units PU1 and PU2, and the base 7 of the robot 3B is disposed so as to correspond to the processing units PU3 and PU4. The robot 3A receives the substrate W from the linear transport device 2 and carries it into the processing unit PU1 or PU2, and unloads the substrate W from the processing unit PU1 or PU2 and passes it to the linear transport device 2. The robot 3B receives the substrate W from the linear transport device 2 and carries it into the processing unit PU3 or PU4, and unloads the substrate W from the processing unit PU3 or PU4 and passes it to the linear transport device 2.
[0016] The linear transport device 2 moves the substrate W along the transport line TL in a levitated state by a levitation unit that supports the substrate W. In the following, a case where the transport line TL is horizontal will be illustrated as an example, but the transport line TL may be inclined relative to the horizontal.
[0017] The linear transport device 2 is provided so as to sandwich the robot arrangement line L32 between itself and the unit arrangement line L31 when viewed from above, and moves the levitation unit along a transport line TL parallel to the unit arrangement line L31 and the robot arrangement line L32. For example, the linear transport device 2 has a levitation unit 10 and a drive unit 40.
[0018] The levitation unit 10 (second moving body) has a bottom frame 11, a side frame 12, a first support 13, and a second support 14. The bottom frame 11 constitutes the bottom of the levitation unit 10. The bottom frame 11 has side edges 11a and 11b along the longitudinal direction and end edges 11c and 11d along the lateral direction. The levitation unit 10 is disposed substantially horizontally on the drive unit 40 such that the side edges 11a and 11b are aligned with the transport line TL. When viewed from above, the side edge 11a is located opposite the robot arrangement line L32 with respect to the side edge 11b.
[0019] 2, the side frame 12 extends upward from a side edge 11a of the bottom frame 11 and constitutes a side of the floating unit 10. The side frame 12 has an edge 12a facing in the same direction as the edge 11c, an edge 12b facing in the same direction as the edge 11d, and an upper edge 12c. The first support 13 and the second support 14 are fixed to the upper edge 12c of the side frame 12 so as to be aligned along the transport line TL, and each supports the substrate W.
[0020] The first support 13 has support beams 13a, 13b aligned along the transport line TL. Each of the support beams 13a, 13b extends from the upper edge 12c of the side frame 12 toward the robot arrangement line L32 and supports the substrate W above the bottom frame 11. With the side frame 12 as a reference, the support beams 13a, 13b extend distally beyond the side edge 11b of the bottom frame 11. The distance between the support beams 13a, 13b is greater than the width of the hand 5. This allows the hand 5 to support the substrate W between the support beams 13a, 13b.
[0021] The second support 14 has support beams 14a, 14b aligned along the transport line TL. Each of the support beams 14a, 14b extends from the upper edge of the side frame 12 to above the bottom frame 11, and supports the substrate W. With the side frame 12 as a reference, the support beams 14a, 14b extend distally beyond the side edge 11b of the bottom frame 11. The distance between the support beams 14a, 14b is greater than the width of the hand 5. This allows the hand 5 to support the substrate W between the support beams 14a, 14b.
[0022] The levitation unit 10 has a first mover 21 and a second mover 22. The first mover 21 and the second mover 22 are parts on which a non-contact force from the drive unit 40 acts. As shown in FIG. 3, a first non-contact force F01 parallel to at least the conveying line TL acts on the first mover 21. For example, the first mover 21 is fixed to the lower surface of a portion of the bottom frame 11 near the side edge 11a. The first mover 21 has a plurality of permanent magnets 21m arranged along an arrangement line L01 parallel to the conveying line TL, and a yoke 21c that holds the plurality of permanent magnets 21m. The first non-contact force F01 acts on the first mover 21 along the arrangement line L01.
[0023] As shown in Fig. 4, a second non-contact force F02 parallel to at least the transport line TL acts on the second mover 22. For example, the second mover 22 is fixed to the outer surface of the side frame 12. The outer surface of the side frame 12 faces in the opposite direction to the direction in which the first support 13, the second support 14, and the bottom frame 11 protrude from the side frame 12 (toward the robot arrangement line L32). The second mover 22 has a plurality of permanent magnets 22m arranged along an arrangement line L02 parallel to the transport line TL, and a yoke 22c that holds the plurality of permanent magnets 22m. The second non-contact force F02 acts on the second mover 22 along the arrangement line L02.
[0024] The levitation unit 10 may further include a third mover 23. The third mover 23 is also a part on which the non-contact force of the drive unit 40 acts. As shown in FIG. 5, the third mover 23 is at least subjected to a third non-contact force F03 parallel to the conveying line TL. For example, the third mover 23 is fixed to the lower surface of a portion of the bottom frame 11 near the side edge 11b. The third mover 23 has a plurality of permanent magnets 23m arranged along an arrangement line L03 parallel to the conveying line TL, and a yoke 23c that holds the plurality of permanent magnets 23m. The third non-contact force F03 acts on the third mover 23 along the arrangement line L03. In this configuration, the second mover 22 is spaced upward from the imaginary plane VP1 including the arrangement lines L01 and L03.
[0025] The levitation unit 10 further includes one or more positioning targets 30 to be subjected to displacement detection. For example, the one or more positioning targets 30 include a first positioning target 31, a second positioning target 32, a third positioning target 33, a fourth positioning target 34, a fifth positioning target 35, and a sixth positioning target 36.
[0026] The first positioning target 31 is fixed to the underside of the bottom frame 11 at a portion between the edge 11c and the first mover 21. For example, the first positioning target 31 is a target for positioning by a linear sensor 82 described later, and includes a magnet for generating magnetostriction. The second positioning target 32 is fixed to the underside of the bottom frame 11 at a portion between the edge 11d and the first mover 21. For example, the second positioning target 32 is a target for positioning by a gap sensor 83a described later, and includes a conductive member through which an eddy current flows.
[0027] The third positioning target 33 is fixed to the underside of the bottom frame 11, between the edge 11c and the third mover 23. For example, the third positioning target 33 is a positioning target by a gap sensor 83c, which will be described later, and includes a conductive member through which an eddy current flows. The fourth positioning target 34 is fixed to the underside of the bottom frame 11, between the edge 11d and the third mover 23. For example, the fourth positioning target 34 is a positioning target by a gap sensor 83d, which will be described later, and includes a conductive member through which an eddy current flows.
[0028] The fifth positioning target 35 is fixed to the outer surface of the side frame 12, between the edge 12a and the second mover 22. For example, the fifth positioning target 35 is a target for positioning by a gap sensor 83b, which will be described later, and includes a conductive member through which an eddy current flows. The sixth positioning target 36 is fixed to the outer surface of the side frame 12, between the edge 12b and the second mover 22. For example, the sixth positioning target 36 is a target for positioning by a gap sensor 83e, which will be described later, and includes a conductive member through which an eddy current flows.
[0029] The driving unit 40 moves the levitating unit 10 in a levitated state. For example, the driving unit 40 has a moving base 50, a base driving section 60, a non-contact force generating section 70, a position / posture detecting section 80, and a housing 90.
[0030] The moving base 50 (first moving body) is located below the levitation unit 10, and moves along the transfer line TL. The moving base 50 has a bottom plate 51 and a side plate 52.
[0031] The bottom plate 51 constitutes the bottom of the movable base 50. The bottom plate 51 has side edges 51a, 51b along the longitudinal direction and end edges 51c, 51d along the lateral direction. The bottom plate 51 is disposed substantially horizontally such that the side edge 51a faces in the same direction as the side edge 11a of the bottom frame 11, the side edge 51b faces in the same direction as the side edge 11b of the bottom frame 11, the end edge 51c faces in the same direction as the end edge 11c of the bottom frame 11, and the end edge 51d faces in the same direction as the end edge 11d of the bottom frame 11.
[0032] The side plate 52 extends upward from the side edge 51a of the bottom plate 51 and constitutes a side of the movable base 50. The side plate 52 has an edge 52a that faces in the same direction as the edge 51c, and an edge 52b that faces in the same direction as the edge 51d.
[0033] The base driving unit 60 moves the movable base 50 along the transfer line TL. The base driving unit 60 has a base stage 61, linear guides 62 and 63, and a linear actuator 64. The base stage 61 extends below the movable base 50 along the transfer line TL.
[0034] The linear guides 62, 63 guide the moving base 50 so that it moves parallel to the transfer line TL. The linear guides 62, 63 are aligned in a direction perpendicular to the transfer line TL. The linear guide 62 has a rail 62r and a block 62b. The rail 62r extends parallel to the transfer line TL below a portion of the bottom plate 51 closer to the side edge 51a, and is fixed to the upper surface of the base stage 61. The block 62b is fixed to the lower surface of the portion of the bottom plate 51 closer to the side edge 51a. The block 62b is attached to the rail 62r via rolling elements such as balls so that it can move parallel to the transfer line TL.
[0035] The linear guide 63 has a rail 63r and a block 63b. The rail 63r extends parallel to the transfer line TL below a portion of the bottom plate 51 closer to the side edge 51b, and is fixed to the upper surface of the base stage 61. The block 63b is fixed to the lower surface of the portion of the bottom plate 51 closer to the side edge 51b. The block 63b is attached to the rail 63r via rolling elements such as balls so that it can move parallel to the transfer line TL.
[0036] The linear actuator 64 has a stator 64f and a mover 64m. The mover 64m is fixed to the lower surface of the bottom plate 51 between the block 62b and the block 63b. The stator 64f extends parallel to the transfer line TL facing the mover 64m, and is fixed to the upper surface of the base stage 61. The stator 64f applies a thrust along the transfer line TL to the mover 64m.
[0037] As an example, the mover 64m has one or more permanent magnets. The stator 64f has a plurality of coils arranged in a direction parallel to the transfer line TL, and generates a moving magnetic field that moves parallel to the transfer line TL in response to the supply of power. The thrust acts on the mover 64m due to this moving magnetic field and the magnetic field of the permanent magnet.
[0038] As long as a thrust force parallel to the conveying line TL can be applied to the movable base 50, the configuration of the linear actuator 64 is not particularly limited and can be modified as appropriate. For example, the linear actuator 64 may be configured to apply a thrust force to the movable base 50 by a rotary motor and a ball screw.
[0039] The non-contact force generating section 70 levitates the levitation unit 10 relative to the moving base 50 , while applying a non-contact force from the moving base 50 to the levitation unit 10 so that the levitation unit 10 follows the movement of the moving base 50 .
[0040] A non-contact force means a force acting between two objects even if the two objects are not in contact with each other. Specific examples of non-contact forces include magnetic force, gravity, and Coulomb force. For example, the non-contact force generating unit 70 generates a magnetic force from the moving base 50 to the levitation unit 10. The non-contact force generating unit 70 may be configured to change the position of the levitation unit 10 relative to the moving base 50 at least along the conveying line TL. The non-contact force generating unit 70 may also be configured to change the attitude of the levitation unit 10 relative to the moving base 50. Although a non-contact force does not necessarily act by concentrating on one point, the "non-contact force" in the following means a force expressed as a set of non-contact forces concentrated on one point of action.
[0041] The non-contact force generating section 70 may be configured to generate six mutually independent non-contact forces between the moving base 50 and the levitation unit 10. Here, three or more non-contact forces being independent of one another means that, among the three or more non-contact forces, each non-contact force cannot be compounded with the remaining two or more non-contact forces. A specific example of a case where three or more non-contact forces are not independent of one another is when the three non-contact forces are parallel to one another in the same plane. In this case, two of the three non-contact forces Non By adjusting the contact force, the remaining Non It is possible to substitute contact force.
[0042] The non-contact force generating unit 70 includes one or more actuators, and the one or more actuators may include one actuator that generates two or more of the six non-contact forces. As an example, the non-contact force generating unit 70 includes a first actuator 71 and a second actuator 72.
[0043] The first actuator 71 faces the levitation unit 10 along a first intersection line that intersects (e.g., perpendicular to) the transport line TL, and applies a non-contact force to the levitation unit 10. "Intersection" also includes cases where there is a twisted relationship, such as a so-called three-dimensional intersection. The same applies below. The first actuator 71 may apply a first non-contact force parallel to the transport line TL to the levitation unit 10. The first actuator 71 may further apply a first intersecting non-contact force along the first intersection line to the levitation unit 10.
[0044] The first actuator 71 may be provided so as to face the levitation unit 10 from below. For example, the first actuator 71 is fixed to the upper surface of a portion of the bottom plate 51 near the side edge 51a, and faces the first mover 21 from below along a vertical intersecting line L11 (first intersecting line) perpendicular to the transfer line TL. The first actuator 71 applies a first non-contact force F01 to the first mover 21 parallel to the transfer line TL and along the arrangement line L01, and further applies a first intersecting non-contact force F11 along the intersecting line L11 to the first mover 21.
[0045] The first actuator 71 may be a linear motor that displaces the levitation unit 10 along the conveyor line TL. For example, the first actuator 71 has a plurality of coils 71c arranged along an arrangement line L04 parallel to the conveyor line TL. The plurality of coils 71c generate a moving magnetic field that moves parallel to the conveyor line TL along the arrangement line L01 in response to the supply of power. This moving magnetic field and the magnetic field of the plurality of permanent magnets 21m of the first mover 21 cause a first non-contact force F01 and a first intersecting non-contact force F11 to act on the first mover 21.
[0046] The second actuator 72 faces the levitation unit 10 along a second intersecting line that intersects (e.g., perpendicular to) the transport line TL and the intersecting line L11, and applies a non-contact force to the levitation unit 10. The second actuator 72 may apply a second non-contact force parallel to the transport line TL to the levitation unit 10. The second actuator 72 may further apply a second intersecting non-contact force along the second intersecting line to the levitation unit 10.
[0047] The second actuator 72 may be provided so as to face the levitation unit 10 from the opposite direction to the direction in which the robot 3 is arranged with respect to the linear transport device 2. For example, the second actuator 72 is fixed to the inner surface of the side plate 52. The inner surface of the side plate 52 is a surface facing the direction in which the bottom plate 51 projects from the side plate 52 (a surface facing the robot arrangement line L32). The inner surface of the side plate 52 faces the outer surface of the side frame 12. The second actuator 72 faces the second mover 22 along a horizontal intersecting line L12 (second intersecting line). The second actuator 72 applies a second non-contact force F02 parallel to the transport line TL and along the arrangement line L02 to the second mover 22, and further applies a second intersecting non-contact force F12 along the intersecting line L12 to the second mover 22.
[0048] The second actuator 72 may be a linear motor that displaces the levitation unit 10 along the conveyor line TL. For example, the second actuator 72 has a plurality of coils 72c arranged along an arrangement line L05 parallel to the conveyor line TL. The plurality of coils 72c generate a moving magnetic field that moves parallel to the conveyor line TL along the arrangement line L02 in response to the supply of power. This moving magnetic field and the magnetic field of the plurality of permanent magnets 22m of the second mover 22 cause a second non-contact force F02 and a second intersecting non-contact force F12 to act on the second mover 22.
[0049] The non-contact force generating section 70 may further include a third actuator 73. The third actuator 73 faces the levitation unit 10 along a third intersecting line that intersects (e.g., perpendicular to) the second intersecting line and is parallel to the first intersecting line, and applies a non-contact force to the levitation unit 10. The third actuator 73 may apply a third non-contact force parallel to the transport line TL to the levitation unit 10. The third actuator 73 may further apply a third intersecting non-contact force along the third intersecting line to the levitation unit 10.
[0050] The third actuator 73 may be provided so as to face the levitation unit 10 from below. For example, the third actuator 73 is fixed to the upper surface of a portion of the bottom plate 51 near the side edge 51b, and faces the third mover 23 from below along a vertical intersecting line L13 (third intersecting line) perpendicular to the transport line TL. The third actuator 73 applies a third non-contact force F03 parallel to the transport line TL and along the arrangement line L03 to the third mover 23, and further applies a third intersecting non-contact force F13 along the intersecting line L13 to the third mover 23.
[0051] The third actuator 73 may be a linear motor that displaces the levitation unit 10 along the conveyor line TL. For example, the third actuator 73 has a plurality of coils 73c arranged along an arrangement line L06 parallel to the conveyor line TL. The plurality of coils 73c generate a moving magnetic field that moves parallel to the conveyor line TL along the arrangement line L03 in response to the supply of power. This moving magnetic field and the magnetic field of the plurality of permanent magnets 23m of the third mover 23 cause a third non-contact force F03 and a third intersecting non-contact force F13 to act on the third mover 23.
[0052] The first actuator 71 and the third actuator 73 may be configured to generate a larger non-contact force than the second actuator 72. As an example, the number of coils 71c of the first actuator 71 is greater than the number of coils 72c of the second actuator 72. The number of coils 73c of the third actuator 73 is also greater than the number of coils 72c of the second actuator 72. Accordingly, the first actuator 71 is longer than the second actuator 72, and the third actuator 73 is also longer than the second actuator 72.
[0053] In addition, the number of permanent magnets 21m of the first mover 21 is greater than the number of permanent magnets 22m of the second mover 22. The number of permanent magnets 23m of the third mover 23 is also greater than the number of permanent magnets 22m of the second mover 22. Accordingly, the first mover 21 is longer than the second mover 22, and the third mover 23 is also longer than the second mover 22.
[0054] The position / attitude detection unit 80 detects, in a non-contact manner, the relative position and attitude of the levitation unit 10 with respect to the mobile base 50. The position / attitude detection unit 80 may be configured to detect, in a non-contact manner, the displacement of the levitation unit 10 along six mutually independent positioning lines.
[0055] Here, three or more positioning lines being independent of each other means that, among the three or more positioning lines, a vector along each positioning line cannot be combined with vectors along the remaining two or more positioning lines. Note that a vector along a positioning line means a vector that is along the positioning line and is located on the positioning line.
[0056] A specific example of a case where three or more positioning lines are not independent of each other is a case where the three positioning lines are parallel to each other in the same plane. In this case, by adjusting the magnitude of vectors along two of the three positioning lines, it is possible to synthesize a vector along the remaining positioning line.
[0057] The position / posture detection unit 80 may include a linear sensor 82. The linear sensor 82 faces the levitation unit 10 along a sensing line that intersects with the transport line TL, and detects the relative displacement of the levitation unit 10 with respect to the moving base 50 along the transport line TL.
[0058] For example, the linear sensor 82 is fixed to the upper surface of the bottom plate 51 between the edge 51c and the first actuator 71, and faces the first positioning target 31 from below along a vertical sensing line L21 perpendicular to the transport line TL. The linear sensor 82 detects the displacement of the first positioning target 31 along an arrangement line L01 (positioning line) parallel to the transport line TL.
[0059] As an example, the linear sensor 82 is a magnetostrictive sensor and includes a magnetostrictive wire along the arrangement line L01. The linear sensor 82 detects the displacement of the first positioning target 31 based on the torsional distortion that the magnet of the first positioning target 31 generates in the magnetostrictive wire.
[0060] The position / posture detection unit 80 may include a gap sensor 83a. The gap sensor 83a faces the levitation unit 10 along a second sensing line that intersects (for example, perpendicular to) the transfer line TL, and detects the distance from the moving base 50 to the levitation unit 10.
[0061] The position / posture detection unit 80 may further include a gap sensor 83b. The gap sensor 83b faces the levitation unit 10 along a third sensing line that intersects (e.g., perpendicular to) the transfer line TL and the second sensing line, and detects the distance from the mobile base 50 to the levitation unit 10.
[0062] The gap sensor 83a may be provided so as to face the levitation unit 10 from below. For example, the gap sensor 83a is fixed to the upper surface of a portion of the bottom plate 51 between the end edge 51d and the first actuator 71, and faces the second positioning target 32 from below along a vertical sensing line L22 (second sensing line) perpendicular to the transfer line TL. The gap sensor 83a detects the distance to the second positioning target 32 along the sensing line L22 (positioning line).
[0063] The gap sensor 83b may be provided so as to face the levitation unit 10 from the opposite direction to the direction in which the robot 3 is disposed relative to the linear transport device 2. For example, the gap sensor 83b is fixed to the inner surface of a portion of the side plate 52 between the end edge 52a and the second actuator 72, and faces the fifth positioning target 35 along a horizontal sensing line L23 (third sensing line) perpendicular to the transport line TL. The gap sensor 83b detects the distance to the fifth positioning target 35 along the sensing line L23 (positioning line).
[0064] The position / posture detection section 80 may further include gap sensors 83c, 83d, and 83e. The gap sensors 83c and 83d may be provided so as to face the levitation unit 10 from below.
[0065] For example, the gap sensor 83c is fixed to the upper surface of the bottom plate 51 at a portion between the edge 51c and the third actuator 73, and faces the third positioning target 33 from below along a vertical sensing line L24 (second sensing line) perpendicular to the transfer line TL. The gap sensor 83c detects the distance to the third positioning target 33 along the sensing line L24 (positioning line).
[0066] The gap sensor 83d is fixed to the upper surface of the bottom plate 51 between the edge 51d and the third actuator 73, and faces the fourth positioning target 34 from below along a vertical sensing line L25 (second sensing line) perpendicular to the transfer line TL. The gap sensor 83d detects the distance to the fourth positioning target 34 along the sensing line L25 (positioning line).
[0067] The gap sensor 83e may be provided so as to face the levitation unit 10 from the opposite direction to the direction in which the robot 3 is disposed relative to the linear transport device 2. For example, the gap sensor 83e is fixed to the inner surface of a portion of the side plate 52 between the end edge 52b and the second actuator 72, and faces the sixth positioning target 36 along a horizontal sensing line L26 (third sensing line) perpendicular to the transport line TL. The gap sensor 83e detects the distance to the sixth positioning target 36 along the sensing line L26 (positioning line).
[0068] As an example, the gap sensors 83a, 83b, 83c, 83d, and 83e are eddy current sensors. The eddy current sensors include a coil that generates a magnetic flux at a high frequency, and detect the distance to the target based on a change in impedance of the coil according to an eddy current generated in a conductive member of the target.
[0069] Housing 90 houses moving base 50, base drive unit 60, non-contact force generating unit 70, and position / posture detection unit 80, and separates internal space 94 (first space) in which moving base 50 moves from external space 95 (second space) in which levitation unit 10 moves. In internal space 94, dust may be generated by linear guides 62, 63, etc., but since the generated dust is contained within internal space 94 by housing 90, external space 95 is kept clean.
[0070] The housing 90 includes a partition wall 91 made of a non-magnetic material such as reinforced plastic. The partition wall 91 separates an internal space 94 and an external space 95 between the levitation unit 10 and the moving base 50. The partition wall 91 may include a first partition wall 92 and a second partition wall 93.
[0071] The first partition 92 separates the first actuator 71 and the third actuator 73 from the levitation unit 10. The first actuator 71 applies a first non-contact force F01 and a first intersecting non-contact force F11 to the first mover 21 through the first partition 92. The third actuator 73 applies a third non-contact force F03 and a third intersecting non-contact force F13 to the third mover 23 through the first partition 92.
[0072] The first partition 92 also separates the linear sensor 82, the gap sensors 83a, 83c, 83d, and the levitation unit 10. The linear sensor 82 detects the displacement of the first positioning target 31 through the first partition 92, the gap sensor 83a detects the distance to the second positioning target 32 through the first partition 92, the gap sensor 83c detects the distance to the third positioning target 33 through the first partition 92, and the gap sensor 83d detects the distance to the fourth positioning target 34 through the first partition 92.
[0073] The second partition 93 stands relative to the first partition 92 and provides a partition between the second actuator 72 and the levitation unit 10. The second actuator 72 applies a second non-contact force F02 and a second cross non-contact force F12 to the second mover 22 through the second partition 93. The second partition 93 also provides a partition between the gap sensors 83b, 83e and the levitation unit 10. The gap sensor 83b detects the distance to the fifth positioning target 35 through the second partition 93, and the gap sensor 83e detects the distance to the sixth positioning target 36 through the second partition 93.
[0074] 6 is a schematic diagram summarizing the non-contact forces and the positioning lines. As shown in FIG. 6, the drive unit 40 applies six mutually independent non-contact forces, a first non-contact force F01, a second non-contact force F02, a third non-contact force F03, a first intersecting non-contact force F11, a second intersecting non-contact force F12, and a third intersecting non-contact force F13, to the levitation unit 10. This makes it possible to change all of the following: the relative position of the levitation unit 10 on the X-axis in the figure along the conveying line TL (relative position to the moving base 50), the relative position of the levitation unit 10 on the vertical Z-axis, the relative position of the levitation unit 10 on the Y-axis perpendicular to the X-axis and Z-axis, the relative attitude of the levitation unit 10 around the X-axis (relative attitude to the moving base 50), the relative attitude of the levitation unit 10 around the Y-axis, and the relative attitude of the levitation unit 10 around the Z-axis.
[0075] For example, by changing the sum of the first non-contact force F01, the second non-contact force F02, and the third non-contact force F03, the relative position of the levitation unit 10 on the X-axis can be changed. By changing the sum of the first intersecting non-contact force F11 and the third intersecting non-contact force F13, the relative position of the levitation unit 10 on the Z-axis can be changed. By changing the first intersecting non-contact force F11, the second intersecting non-contact force F12, and the third intersecting non-contact force F13, the relative position of the levitation unit 10 on the Y-axis can be changed.
[0076] By changing the relationship between the first intersecting non-contact force F11 and the third intersecting non-contact force F13, the relative attitude of the levitation unit 10 about the X-axis can be changed. By changing the relationship between the first non-contact force F01, the second non-contact force F02, and the third non-contact force F03, the relative attitude of the levitation unit 10 about the Y-axis can be changed. By changing the relationship between the first non-contact force F01 and the third non-contact force F03, the relative attitude of the levitation unit 10 about the Z-axis can be changed.
[0077] Furthermore, drive unit 40 detects the relative displacement of levitation unit 10 (relative displacement with respect to mobile base 50) along six mutually independent positioning lines. This makes it possible to detect all of the relative displacement of levitation unit 10 in the X-axis, the relative displacement of levitation unit 10 in the Z-axis, the relative displacement of levitation unit 10 in the Y-axis, the relative rotation of levitation unit 10 around the X-axis, the relative rotation of levitation unit 10 around the Y-axis, and the relative rotation of levitation unit 10 around the Z-axis.
[0078] For example, a relative displacement in the X-axis can be detected based on a relative displacement along the array line L01 (positioning line). A relative displacement in the Z-axis can be detected based on a relative displacement along the sensing lines L22, L24, and L25 (positioning lines). A relative displacement in the Y-axis can be detected based on a relative displacement along the sensing lines L23 and L26.
[0079] The relative orientation around the X-axis and the relative orientation around the Y-axis can be detected based on the relationship between the relative displacement along the sensing line L22, the relative displacement along the sensing line L24, and the relative displacement along the sensing line L25. The relative orientation around the Z-axis can be detected based on the relationship between the relative displacement along the sensing line L23 and the relative displacement along the sensing line L26.
[0080] The configuration of the drive unit 40 for generating six mutually independent non-contact forces is not limited to the above-mentioned exemplary configuration. There are countless possible configurations for generating six mutually independent non-contact forces.
[0081] As an example, FIG. 7 shows a configuration in which the second mover 22 provided on the side frame 12 and the second actuator 72 provided on the side plate 52 in the above-mentioned configuration are replaced with a second mover 22A provided on the bottom frame 11 and a second actuator 72A provided on the bottom plate 51.
[0082] The second mover 22A is fixed to the lower surface of the bottom frame 11 at a portion closer to the end edge 11c.
[0083] The second actuator 72A is fixed to the upper surface of the bottom plate 51 near the end edge 51c, and is located below the second mover 22A. The second actuator 72A applies a second non-contact force F22 along the Y-axis to the second mover 22A of the levitation unit 10. The second actuator 72A also applies a second intersecting non-contact force F32 along the Z-axis to the second mover 22A of the levitation unit 10.
[0084] Even with this configuration, it is possible to change all of the relative position of the levitation unit 10 on the X-axis, the relative position of the levitation unit 10 on the Z-axis, the relative position of the levitation unit 10 on the Y-axis, the relative attitude of the levitation unit 10 around the X-axis, the relative attitude of the levitation unit 10 around the Y-axis, and the relative attitude of the levitation unit 10 around the Z-axis.
[0085] The configuration of the drive unit 40 for detecting the relative displacement of the levitation unit 10 on the six mutually independent positioning lines is not limited to the configuration exemplified above. There are countless possible configurations for detecting the relative displacement of the levitation unit 10 on the six mutually independent positioning lines.
[0086] As an example, Figure 7 shows a configuration in which the third positioning target 33 and the sixth positioning target 36 provided on the side frame 12 and the gap sensors 83b, 83e provided on the side plate 52 in the above-mentioned configuration are replaced with the third positioning target 33A and the sixth positioning target 36A provided on the bottom frame 11 and linear sensors 84a, 84b provided on the bottom plate 51.
[0087] The third positioning target 33A is fixed to the lower surface of the bottom frame 11 between the edge 11c and the second mover 22A. The sixth positioning target 36A is fixed to the lower surface of the bottom frame 11 between the edge 11d and the first mover 21 and the third mover 23.
[0088] The linear sensor 84a is fixed to the upper surface of the bottom plate 51 between the edge 51c and the second actuator 72A. The linear sensor 84b is fixed to the upper surface of the bottom plate 51 between the edge 51d and the first and second actuators 71 and 72. The linear sensor 84a detects the relative displacement of the third positioning target 33A on the positioning line perpendicular to the transport line TL and the vertical line. The linear sensor 84b detects the relative displacement of the sixth positioning target 36A on the positioning line perpendicular to the transport line TL and the vertical line.
[0089] Even with this configuration, it is possible to detect all of the relative displacement of the levitation unit 10 in the X-axis, the relative displacement of the levitation unit 10 in the Z-axis, the relative displacement of the levitation unit 10 in the Y-axis, the relative rotation of the levitation unit 10 about the X-axis, the relative rotation of the levitation unit 10 about the Y-axis, and the relative rotation of the levitation unit 10 about the Z-axis. Note that in the configuration of Fig. 7, the side frame 12 and the side plate 52 can be omitted. Also, the second partition 93 located between the side frame 12 and the side plate 52 can be omitted.
[0090] The controller 100 (force control unit) controls the non-contact force generated by the non-contact force generating unit 70 based on the relative position of the levitation unit 10 with respect to the movement base 50. For example, the controller 100 controls the non-contact force generated by the non-contact force generating unit 70 based on at least the detection result by the linear sensor 82.
[0091] The controller 100 may control the non-contact force generated by the non-contact force generating unit 70 based on at least the detection result by the linear sensor 82 and the detection result by the gap sensor 83a. As an example, the controller 100 may control the non-contact force generated by the non-contact force generating unit 70 based on the detection result by the linear sensor 82 and the detection results by the gap sensors 83a, 83b, 83c, 83d, and 83e.
[0092] FIG. 8 is a flowchart illustrating a force control procedure by the controller 100. As shown in FIG. 8, the controller 100 executes steps S01, S02, and S03. Step S01 includes acquiring a detection result by the position / attitude detection unit 80. Step S02 includes generating target values of six non-contact forces so that the detection result by the position / attitude detection unit 80 approaches a target relative position and target relative attitude of the levitation unit 10 with respect to the mobile base 50. Step S03 includes controlling the first actuator 71, the second actuator 72, and the third actuator 73 so that the six non-contact forces are adjusted to the target values, respectively. The controller 100 repeats the above procedure at a predetermined control period.
[0093] 9 is a diagram illustrating an example of a hardware configuration of the controller 100. As shown in FIG. 9, the controller 100 has one or more processors 191, a memory 192, a storage 193, an input / output circuit 194, and a driver circuit 195. The storage 193 has a computer-readable storage medium such as a non-volatile semiconductor memory. The storage 193 stores a control program for the linear conveyance device 2 and the robot 3. The control program includes a program for causing the controller 100 to change the non-contact force generating unit 70 to three or more non-contact forces based on the detection result by the position / posture detection unit 80.
[0094] The memory 192 temporarily stores the program loaded from the storage medium of the storage 193 and the calculation results by the processor 191. The processor 191 executes the program in cooperation with the memory 192. The input / output circuit 194 inputs and outputs electrical signals between the linear sensor 82 and the gap sensors 83a, 83b, 83c, 83d, and 83e in accordance with instructions from the processor 191. The driver circuit 195 outputs drive power to the first actuator 71, the second actuator 72, and the third actuator 73 in accordance with instructions from the processor 191.
[0095] [Effects of this embodiment] As described above, the substrate transport system 1 comprises a linear transport device 2 that transports the substrate W along the transport line TL, and a robot that receives the substrate W from the linear transport device 2 and transports it into the processing unit PU, and transports the substrate W from the processing unit PU and passes it over to the linear transport device 2. The linear transport device 2 comprises a moving base 50 (first moving body) that moves along the transport line TL, a levitation unit 10 (second moving body) that supports the substrate W, and a non-contact force generating unit 70 that applies a non-contact force from the moving base 50 to the levitation unit 10 so that the levitation unit 10 follows the movement of the moving base 50 while levitating the levitation unit 10 relative to the moving base 50.
[0096] In order to suppress dust generation, a conveying device that levitates a moving body and moves the levitated moving body without contact is effective. However, since the position and posture of a levitated moving body are easily variable, it may be difficult to achieve both conveying accuracy and suppression of dust generation. For example, the non-contact force acting on the moving body may vary depending on the position of the moving body, which may result in a decrease in conveying accuracy.
[0097] In contrast, in the present substrate transport system 1, a non-contact force is generated between the moving base 50 that moves along the transport line TL and the levitation unit 10 that moves following the moving base 50. The amount of relative displacement of the levitation unit 10 with respect to the moving base 50 remains within a small range compared to the amount of movement of the moving base 50 on the transport path. Therefore, the variation in the non-contact force according to the relative position of the levitation unit 10 with respect to the moving base 50 can be substantially ignored. Therefore, while levitating the levitation unit 10 with respect to the moving base 50, it is easy to maintain high accuracy in the relative position of the levitation unit 10 with respect to the moving base 50.
[0098] Since the levitation unit 10 is levitated relative to the moving base 50, it is possible to separate the space in which the levitation unit 10 moves from the space in which the moving base 50 moves. In the space in which the moving base 50 moves, positional accuracy is prioritized over dust suppression, and the positional accuracy of the moving base 50 can be increased. This is therefore effective in achieving both transport accuracy and dust suppression.
[0099] The linear transport device may have a partition wall 91 that separates an internal space 94 (first space) in which the moving base 50 moves from an external space 95 (second space) in which the levitation unit 10 moves. In this case, the configuration in which the levitation unit 10 is levitated relative to the moving base 50 is more effective in suppressing dust generation.
[0100] The non-contact force generating section 70 may have a first actuator 71 that faces the levitation unit 10 along an intersection line L11 (first intersection line) that intersects with the transport line TL and applies a non-contact force to the levitation unit 10, and a second actuator 72 that faces the levitation unit 10 along an intersection line L12 (second intersection line) that intersects with the transport line TL and the intersection line L11 and applies a non-contact force to the levitation unit 10. In this case, by having the first actuator 71 and the second actuator 72 face each other from different directions, it is easy to ensure space for arranging the actuators.
[0101] The first actuator 71 may apply a first non-contact force F01 parallel to the transport line TL to the levitation unit 10, and the second actuator 72 may apply a second non-contact force F02 parallel to the transport line TL to the levitation unit 10. In this case, double non-contact forces parallel to the transport line TL are applied, thereby improving the positioning accuracy of the levitation unit 10 along the transport line TL.
[0102] The first actuator 71 may further apply a first intersecting non-contact force F11 along the intersection line L11 to the levitation unit 10, and the second actuator 72 may further apply a second intersecting non-contact force F12 along the intersection line L12 to the levitation unit 10. In this case, the first actuator 71 and the second actuator 72 are also used for levitation, which can simplify the structure.
[0103] The first actuator 71 and the second actuator 72 may be linear motors that displace the levitation unit 10 along the transfer line TL. In this case, the positioning accuracy can be further improved.
[0104] The substrate transport system 1 may further include a third actuator 73 that faces the levitation unit 10 along an intersection line L13 (third intersection line) that intersects with the intersection line L12 and is parallel to the intersection line L11, and applies a non-contact force to the levitation unit 10. In this case, the positioning accuracy can be further improved.
[0105] The third actuator 73 may apply a third non-contact force F03 parallel to the transport line TL to the levitation unit 10. In this case, it is possible to further improve the positioning accuracy of the levitation unit 10 along the transport line TL.
[0106] The third actuator 73 may further apply a third intersecting non-contact force F13 along the intersecting line L13 (third intersecting line) to the levitation unit 10. In this case, the third actuator 73 is also used for levitation, which can simplify the structure.
[0107] The first actuator 71 and the third actuator 73 may face the levitation unit 10 from below, and the second actuator 72 may face the levitation unit 10 from the opposite direction to the direction in which the robot 3 is disposed relative to the linear transport device 2. In this case, gravity can also be effectively used to adjust the attitude of the levitation unit 10.
[0108] Non-contact force generating section 70 may generate six mutually independent non-contact forces between moving base 50 and levitation unit 10. In this case, the stability of the relative position of levitation unit 10 with respect to moving base 50 can be improved.
[0109] The substrate transport system 1 may further include a controller 100 (force control unit) that controls the non-contact force generated by the non-contact force generation unit 70 based on the relative position of the levitation unit 10 with respect to the moving base 50. In this case, by controlling the non-contact force based on the relative position, the substrate can be delivered to and from the robot 3 more accurately.
[0110] The substrate transport system 1 may further include a linear sensor 82 that faces the levitation unit 10 along a sensing line L21 that intersects the transport line TL and detects the relative displacement of the levitation unit 10 along the transport line TL with respect to the moving base 50, and the controller 100 may control the non-contact force generated by the non-contact force generating section 70 based on at least the detection result by the linear sensor 82. In this case, the relative displacement of the levitation unit 10 along the transport line TL can be accurately detected without impeding the movement of the levitation unit 10 along the transport line TL.
[0111] The substrate transport system 1 may further include gap sensors 83a, 83c, and 83d that face the levitation unit 10 along sensing lines L22, L24, and L25 (second sensing lines) that intersect the transport line TL and detect the distance from the moving base 50 to the levitation unit 10, and the controller 100 may control the non-contact force generated by the non-contact force generating unit 70 based on at least the detection results by the linear sensor 82 and the detection results by the gap sensors 83a, 83c, and 83d. In this case, the device configuration can be simplified by using the gap sensors 83a, 83c, and 83d for displacement in a direction intersecting the transport line TL.
[0112] The substrate transfer system 1 may further include gap sensors 83b, 83e (second gap sensors) that face the levitation unit 10 along sensing lines L23, L26 (third sensing lines) that intersect the transfer line TL and the sensing lines L22, L24, L25, and detect the distance from the moving base 50 to the levitation unit 10. In this case, the device configuration can be further simplified by using the gap sensors 83a, 83b, 83c, 83d, 83e for relative displacement in two intersecting directions, respectively.
[0113] Although the embodiments have been described above, the present disclosure is not necessarily limited to the above-described embodiments, and various modifications are possible without departing from the gist of the present disclosure. [Explanation of symbols]
[0114] 1...substrate transport system, 2...linear transport device (substrate transport device), 3...robot, 10...floating unit (second moving body), L21...sensing line, 50...moving base (first moving body), 70...non-contact force generating unit, 71...first actuator, 72...second actuator, 73...third actuator, 82...linear sensor, 83a, 83c, 83d...gap sensor, 83b, 83e...gap sensor (second gap sensor), 91...partition wall, 94...internal space (first space), 95...external space (second space), 100... Controller (force control section), F01...first non-contact force, F02...second non-contact force, F03...third non-contact force, F11...first intersecting non-contact force, F12...second intersecting non-contact force, F13...third intersecting non-contact force, L11...intersecting line (first intersecting line), L12...intersecting line (second intersecting line), L13...intersecting line (third intersecting line), L22, L24, L25...sensing line (second sensing line), L23, L26...sensing line (third sensing line), PU...processing unit, TL...transport line, W...substrate.
Claims
1. A linear transport device that transports the substrate along a transport line; a robot that receives the substrate from the linear transport device and transports it into a processing unit, and transports the substrate from the processing unit and passes it back to the linear transport device; The linear transport device is A first moving body that moves along the conveying line; A second moving body that supports the substrate; a non-contact force generating unit that applies a non-contact force from the first moving body to the second moving body so that the second moving body follows the movement of the first moving body while levitating the second moving body relative to the first moving body, the non-contact force generating unit has a plurality of coils arranged in a direction parallel to the conveying line, the coils generate a moving magnetic field that moves parallel to the conveying line in response to a supply of power; A substrate transport system, wherein the non-contact force includes a non-contact force acting on the second moving body by the moving magnetic field, the non-contact force being parallel to the transport line.
2. The linear transport device is 2. The substrate transfer system according to claim 1, further comprising a partition wall that separates a first space in which said first moving body moves from a second space in which said second moving body moves.
3. The non-contact force generating unit includes: a first actuator that faces the second moving body along a first intersecting line that intersects with the conveying line and applies a non-contact force to the second moving body; a second actuator that faces the second moving body along a second intersecting line that intersects the conveying line and the first intersecting line and applies a non-contact force to the second moving body; The substrate transport system according to claim 1 , wherein each of the first actuator and the second actuator has the plurality of coils.
4. the coils of the first actuator generate the moving magnetic field so as to apply a first non-contact force parallel to the conveying line to the second moving body; 4. The substrate transfer system according to claim 3, wherein the plurality of coils of the second actuator generate the moving magnetic field so as to apply a second non-contact force parallel to the transfer line to the second moving body.
5. the coils of the first actuator generate the moving magnetic field so as to further apply a first intersecting non-contact force along the first intersecting line to the second moving body; 5. The substrate transportation system according to claim 4, wherein the plurality of coils of the second actuator generate the moving magnetic field so as to further exert a second intersecting non-contact force along the second intersecting line on the second moving body.
6. 6. The substrate transfer system according to claim 5, wherein the first actuator and the second actuator are linear motors that displace the second moving body along the transfer line.
7. a third actuator that faces the second moving body along a third intersecting line that intersects with the second intersecting line and is parallel to the first intersecting line, and applies a non-contact force to the second moving body; The substrate transport system according to claim 5 , wherein each of the first actuator, the second actuator, and the third actuator has the plurality of coils.
8. 8. The substrate transfer system according to claim 7, wherein the plurality of coils of the third actuator generate the moving magnetic field so as to apply a third non-contact force parallel to the transfer line to the second moving body.
9. The substrate transportation system according to claim 8 , wherein the plurality of coils of the third actuator generate the moving magnetic field so as to further exert a third intersecting non-contact force along the third intersecting line on the second moving body.
10. the first actuator and the third actuator face the second moving body from below, The substrate transfer system according to claim 9 , wherein the second actuator faces the second moving body from a direction opposite to a direction in which the robot is disposed with respect to the linear transfer device.
11. 11. The substrate transport system according to claim 1, wherein the non-contact force generating unit generates six mutually independent non-contact forces between the first moving body and the second moving body.
12. A substrate transport system according to any one of claims 1 to 11, further comprising a force control unit that controls the non-contact force generated by the non-contact force generating unit based on the relative position of the second moving body with respect to the first moving body.
13. a linear sensor that faces the second moving body along a sensing line that intersects with the conveying line and detects a relative displacement of the second moving body with respect to the first moving body along the conveying line; The substrate transport system according to claim 12 , wherein the force control section controls the non-contact force generated by the non-contact force generating section based on at least a detection result by the linear sensor.
14. a gap sensor that faces the second moving body along a second sensing line that intersects with the conveying line and detects a distance from the first moving body to the second moving body; The substrate transport system according to claim 13 , wherein the force control unit controls the non-contact force generated by the non-contact force generation unit based on at least a detection result by the linear sensor and a detection result by the gap sensor.
15. The substrate transport system of claim 14 , further comprising a second gap sensor that faces the second movable body along a third sensing line that intersects the transport line and the second sensing line and detects the distance from the first movable body to the second movable body.
16. A first moving body that moves along a conveying line; A second moving body that supports the substrate; a non-contact force generating unit configured to generate a non-contact force between the first moving body and the second moving body so as to cause the second moving body to follow the movement of the first moving body while levitating the second moving body relative to the first moving body, The non-contact force generating unit includes: a first actuator that faces the second moving body along a first intersecting line that intersects with the conveying line and applies a non-contact force to the second moving body; a second actuator that faces the second moving body along a second intersecting line that intersects the conveying line and the first intersecting line and applies a non-contact force to the second moving body; each of the first actuator and the second actuator has a plurality of coils; the coils generate a moving magnetic field that moves parallel to the conveying line in response to a supply of power; the coils of the first actuator generate the moving magnetic field so as to apply a first non-contact force parallel to the conveying line to the second moving body; The plurality of coils of the second actuator generate the moving magnetic field so as to apply a second non-contact force parallel to the transfer line to the second moving body.
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