Coating control using forward parameter correction and enhanced reverse engineering.
By using forward parameter correction and enhanced reverse engineering, coating systems can maintain accurate coating rates despite drifts, improving efficiency and reducing the need for calibration runs.
Patent Information
- Application Number
- JP2021514425
- Authority / Receiving Office
- JP · JP
- Patent Type
- Patents
- Current Assignee / Owner
- Filing Date
- 2018-09-28
- Publication Date
- 2025-08-15
- Estimated Expiration
- 2038-09-28
AI Technical Summary
Coating systems face challenges in maintaining accurate coating rates due to unpredictable drifts caused by environmental conditions and target degradation, leading to inefficiencies and reduced throughput.
Implementing forward parameter correction and enhanced reverse engineering based on expected deterministic process parameter drift, which adjusts run parameters in real-time using historical data and relationships between parameters and observed values to maintain coating accuracy.
This approach improves coating rate accuracy, allows frequent leapfrogging, reduces reliance on calibration runs, and enhances overall campaign consistency and throughput.
Smart Images

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Abstract
Description
[Background technology]
[0001] (background) Coating systems can be used to coat substrates with specific materials. For example, sputtering systems can be used to deposit thin film layers, thick film layers, etc. Optical elements can be formed based on depositing a set of layers. For example, thin films can be used to form filters, such as optical interference filters. Summary of the Invention [Means for solving the problem]
[0002] (Abstract) According to some implementations, the device includes one or more memories and a device communicatively coupled to the one or more memories for receiving design information, the design information comprising desired values for a set of layers of optical elements to be produced during one or more runs. identification determining a relationship between parameters for the one or more runs and observations associated with the one or more runs or the optical element; identification determining tier information for the one or more runs based on the historical information, the tier information defining run parameters for the set of tiers to achieve the desired values; identification and causing the one or more runs to be performed based on the layer information.
[0003] According to some implementations, a method includes receiving, by a coating control device, design information, the design information representing desired values for a set of layers of an optical element to be produced during one or more runs. identification and receiving, by the coating control device, a relationship between parameters for the one or more runs and observations related to the one or more runs or the optical element. identificationdetermining, by the coating control device, layer information for the one or more runs based on the historical information, the layer information defining run parameters for the set of layers to achieve the desired values; identification causing the coating control device to perform the one or more runs based on the layer information; and determining the results of the one or more runs by the coating control device. identification determining information that corresponds to the result; identification the information indicating the value of the observation for the one or more runs identification determining, by the coating control device, the run parameters of the run; identification This may include modifying the information based on the information.
[0004] According to some implementations, a non-transitory computer-readable medium, when executed by one or more processors, receives design information to the one or more processors, the design information representing desired values for a set of layers of optical elements to be produced during one or more runs. identification determining a relationship between parameters for the one or more runs and observations associated with the one or more runs or the optical element; identification determining tier information for the one or more runs based on the historical information, the tier information defining run parameters for the set of tiers to achieve the desired values; identification and causing the one or more runs to be performed based on the layer information. [Brief explanation of the drawings]
[0005] [Figure 1] FIG. 1 is a schematic diagram of an exemplary implementation of coating control using forward parameter correction based on expected deterministic process parameter drift and enhanced reverse engineering. [Figure 2A] FIG. 2A is a schematic diagram of an exemplary coating system. [Figure 2B] FIG. 2B is a schematic diagram of an example environment in which the systems and / or methods described herein may be implemented. [Figure 3] FIG. 3 is a schematic diagram of exemplary components of one or more of the devices of FIGS. 2A and 2B. [Figure 4A] FIG. 4A is a chart of exemplary results of a coating process without forward parameter correction and enhanced reverse engineering based on expected deterministic process parameter drift. [Figure 4B] FIG. 4B is a chart of exemplary results of a coating process using forward parameter correction and augmented reverse engineering based on expected deterministic process parameter drift. [Figure 5] FIG. 5 is a flow chart of an example process for coating control using forward parameter correction and augmented reverse engineering based on expected deterministic process parameter drift. DETAILED DESCRIPTION OF THE INVENTION
[0006] (Detailed explanation) The following detailed description of exemplary implementations refers to the accompanying drawings, in which the same reference numbers in different drawings indicate the same or similar elements. identification possible.
[0007] A coating system may deposit material from a target onto a substrate to form an element, such as an optical element (e.g., an interference filter, a bandpass filter, etc.). For example, a coating system may perform sputtering of a target over a coating run (referred to herein as a "run") in which a layer of material is deposited on a substrate. A series of runs to create a set of elements may be referred to herein as a campaign. In some cases, multiple targets are used. A campaign may extend for the lifetime of the target or targets.
[0008] The coating system may perform a run based on various run parameters, such as gas flow rates, power supply set points, run length, etc. Some parameters may be static and remain static from run to run. Some parameters may be dynamic and configurable from run to run. These run parameters may be configurable with the goal of achieving a desired coating thickness for each run. Thus, the coating rate may be observed based on the run length and the coating thickness deposited during the run. In some cases, the coating system may determine the outcome of a run that is not directly observed using the coating thickness. For example, certain spectral measurements may provide information about the outcome of the run.
[0009] It should be noted that because many runs use multiple layers of two or more materials, the implementations described herein may use multiple coating speeds and multiple coating thicknesses, as described in more detail elsewhere herein. In some cases, a single coating speed is described herein for brevity or clarity. Where a single coating speed is described, it should be understood that multiple coating speeds are also contemplated.
[0010] A coating system may adjust run parameters to achieve a desired value (e.g., coating thickness or another value) for each run. For example, a controller may adjust parameters from run to run so that the run meets targets for spectral performance, refractive index, bandwidth, layer thickness, etc. Ideally, a coating system would have a perfectly stable coating rate and a stable coating chamber, resulting in accurately predictable coating thicknesses. For example, when specific run parameters are applied, an ideal coating system would result in a predictable and stable coating thickness for each run, meaning that a stable coating rate would be achieved. However, in practice, coating rates are not perfectly stable. For example, environmental conditions (e.g., moisture content in the coating chamber, temperature), changes in the target over time (e.g., target shape at the end of a campaign compared to the beginning of a campaign), stray coating buildup on the coating system shield, etc., can cause the coating rate (singular) or coating rates (plural) to drift from the expected value over time.
[0011] One approach to dealing with drift coating rates is to perform measurements on the elements after a run has been performed, determine the results of the run based on the measurements, and use the results to derive run parameters for the next run. In some cases, this may be referred to as "reverse engineering." For example, the results may include a spectral response indicating the thickness of the optical element, and the coating system may adjust the run parameters (e.g., time length, etc.) for the next run depending on the difference between the observed thickness and the desired value.
[0012] In some cases, reverse engineering may be performed for two consecutive runs. This may improve the accuracy of the run parameters (and therefore the corresponding coating rate), but may take a significant amount of time and reduce utilization of the coating system. In some cases, reverse engineering may be performed in a staggered manner, where run parameters for a third run are determined based on the parameters (singular) and observations for the first run while the second run is being performed, run parameters for a fourth run are determined based on the parameters (singular) and observations for the second run while the third run is being performed, and so on. This technique may be referred to as "leapfrogging." Leapfrogging may improve utilization of the coating system, thereby increasing throughput.
[0013] However, reverse engineering and leapfrogging can present challenges over the duration of a campaign. For example, the coating rate may not be fixed over the life of the target due to changes in target geometry, changing conditions in the coating chamber, and / or other factors. Furthermore, leapfrogging can increase the time between runs in which results are determined and runs in which run parameters are determined based on the results, which increases the likelihood that later runs will be inaccurate with respect to the desired values, especially considering drift in the coating rate. In some cases, the coating system may need to stop the campaign and perform a calibration coating to determine the observed coating thickness or coating rate, further reducing throughput and utilization. For more information on coating rate accuracy in light of reverse engineering and leapfrogging, see Figure 4A below.
[0014] Some implementations described herein may provide coating thickness and / or rate control using forward parameter correction and enhanced backward engineering based on expected deterministic process parameter drift. For example, changes in a parameter (singular), such as coating rate, may be related to an observed value, such as coating target lifespan. As used herein, coating target lifespan (sometimes referred to as coating target lifespan, coating target lifespan, target lifespan, target lifespan, etc.) may refer to a measure of the total usage of a target. In some cases, coating target lifespan may be expressed as a function of power and time (e.g., if 15 kW of power is applied to a target for 600 seconds, the coating target lifespan of the target may increase by 2.5 kWh (15 kW * 600 s / 3600 s / h)); however, other expressions of coating target lifespan are possible and are contemplated herein. In some implementations, coating target lifespan may be tracked by a controller or the like.
[0015] In this example, over the life of the coating target, the coating speed may drift or change in a specific (e.g., predictable) manner. Some implementations described herein may use the relationship between the parameter and the observed value to determine run parameters for a run of the coating system. For example, this may allow the implementations described herein to adjust the run parameters as the run is performed to account for a changing parameter, such as the coating speed, to keep the run accurate with respect to the desired value.
[0016] Some implementations described herein also provide enhanced reverse engineering, particularly for linked reverse engineering. Linked reverse engineering can be used when two or more processes are performed (e.g., two or more materials are sputtered from one or more targets). In such cases, when the spectral response does not provide useful feedback for both processes, a linked relationship between the two processes is assumed, and feedback for one process is used to determine parameter (singular) adjustments for both processes. This may be done in some legacy implementations that assumed a 1:1 link between two or more processes, which may or may not be accurate in practice and may degrade over time if the two or more processes are associated with different drift rates for one or more parameters.
[0017] Some implementations described herein determine the link between two or more processes based on their respective relationships (e.g., the rate of change of coating speed compared to a target lifetime, or other configurations described herein). For example, if one process changes twice as fast as another process during a target lifetime, reverse engineering can be performed using a 1:2 relationship between these processes. Thus, the accuracy of reverse engineering of such processes is improved compared to assuming a 1:1 link between the processes.
[0018] In this way, coating rate accuracy can be improved based on expected deterministic process parameter drift, which allows for more frequent and consistent use of leapfrogging, reduces the rate of unacceptable process output, and reduces reliance on calibration runs.
[0019] Some implementations described herein use coating target life and / or points in coating target life as observations for determining run parameters. However, other observations besides coating target life may be used and are contemplated herein. For example, if a coating system performs runs in a predictable or systematic manner, time or elapsed time may be used in place of coating target life. Similarly, if coatings are performed repeatedly on the same or similar products, a sequential batch number or run number may be used in place of coating target life. In other words, coating target life is one of many possible values that may be used to quantify coating rate drift over time / target life / batch sequence. It should be understood that "coating target life" may refer to any of the values described in this paragraph. Additionally, some observations are not based on a time parameter (singular). For example, spectral measurements, refractive index, or absorption index may be used as observations.
[0020] 1 is a schematic diagram of an example implementation 100 for coating control using forward parameter correction and augmented reverse engineering based on expected deterministic process parameter drift. More specifically, FIG. 1 shows a control loop for coating thickness control based on augmented reverse engineering based forward parameter correction using run time as an adjustable parameter (singular) based on spectral observations of optical elements.
[0021] FIG. 1 illustrates the input of various information into a control device. These are indicated by reference numerals 105, 110, 115, 120, and 125. FIG. 1 further illustrates the determination of run parameters for the coating process by the control device (e.g., based on forward parameter correction at reference numeral 130). The run parameters are indicated by reference numeral 135. The coating system (or control device) may perform a run based on the run parameters (indicated by reference numeral 140), and the spectrometer may perform a scan of the elements produced by the run to determine results (indicated by reference numeral 145). As indicated by reference numeral 150, the control device may derive information (e.g., results) based on the scan. identification The control device may receive inputs from the control device (information related to the execution of the run). The control device may perform reverse engineering based on the results and modify run parameters for later execution based on the reverse engineering (as indicated by the circular arrows in Figure 1). Each of the above inputs and operations is described in more detail below.
[0022] As indicated by reference numeral 105, the controller may receive or determine information regarding static process parameters of the coating process. A static process parameter may include a parameter that is configured to be static or semi-static and is unlikely to change over the course of a run or campaign. Examples of static process parameters include argon gas flow rate values, power supply operating modes, etc. It should be noted that a particular parameter may be static in some cases and dynamic in other cases. For example, gas flow rate may be held constant in some cases (e.g., when run time varies between runs to achieve a desired thickness) and may vary in other cases (e.g., when the observable for reverse engineering is a refractive index or absorptivity related to gas flow rate).
[0023] As indicated by reference numeral 110, the controller determines the relationship between coating speed and coating target life. identification More generally, the controller may receive or determine historical information relating to the relationship between the parameter and the observed value. identification The control device may receive historical information that indicates the coating rate that is expected at a particular point in the life of the coating target for a given parameter. The historical information may specify (or enable the control device to specify) the coating rate that is expected at a particular point in the life of the coating target. For example, the observed coating rate may change or drift over the course of the life of the coating target.
[0024] In some implementations described herein, the control device may define the relationship between the parameter(s) and the observed value using a nonlinear relationship. For example, the control device may define the relationship between the parameter(s) and the observed value using a quadratic or higher order function or a polynomial. In some embodiments, the control device may define the value of the relationship between the coating speed and the coating target life as identification For example, the controller may receive or store information that indicates the coating speeds that correspond to different coating target life values. identification In some embodiments, the controller may use a linear relationship between the parameter(s) and the observed value.
[0025] The relationship between a parameter and an observed value may be a predetermined value and therefore may be viewed as a static parameter. For example, in this case, the relationship may be determined based on observations of past campaigns. In some implementations, the relationship may be adjusted based on reverse engineering. For example, if the control device determines that the results of a run deviate from the expected value associated with the relationship using reverse engineering, the control device may adjust the relationship to improve the accuracy of future runs.
[0026] In some implementations, two or more materials may be produced by the same target. For example, in some cases, SiO2, Si, Si3N4, and SiOx may all be produced from one target. In such cases, one target may include multiple processes. The target life counter of a single target may be shared among all processes. For example, if a coating system coats SiO2, the target may be partially depleted and the target life counter may be incremented. Subsequent Si layers from the same target then begin with this higher (e.g., more advanced, more depleted, increased) target life rate assumption. Thus, depletion of a multi-process target may be taken into account when performing reverse engineering.
[0027] In some implementations, the relationship identification The information may relate to multiple different targets, such as when a substrate is coated with materials from multiple different targets. For example, each target may be associated with a respective function that defines the relationship between the coating rate of each target and the lifetime of each coating target. The controller may determine coating rate parameters based on the respective functions. This may improve coating accuracy compared to determining the parameters for multiple targets based on an assumption that the coating rates of the multiple targets are linked (e.g., based on a fixed relationship, etc.).
[0028] As indicated by reference numeral 115, the controller may receive or determine one or more dynamic process parameters. Dynamic process parameters may include values (e.g., run parameters) that may change from one run to another (e.g., based on static process parameters, such as reverse engineering and / or parameter-observation relationships). In some implementations, the control device may determine an observed coating thickness or velocity for a particular run (e.g., using spectroscopic measurements and reverse engineering techniques) and use the observed coating thickness or velocity and stored information to determine parameters for subsequent runs. For example, the controller may adjust run parameters based on whether the observed coating thickness or velocity matches an expected coating velocity (e.g., based on machine learning techniques, etc.). In this manner, the controller iteratively adjusts coating velocity parameters based on the observed coating thickness or velocity, thereby further improving the accuracy of coating velocity determination.
[0029] The controller is described herein as determining the observed coating thickness or rate. However, in some cases, the controller may determine another parameter related to the coating thickness or rate. For example, the controller may determine whether the spectral response of the optical element matches the spectral response associated with the desired coating thickness. Thus, direct measurement of the coating thickness is not necessary, which may reduce reliance on expensive and complex measurement techniques and thereby increase throughput.
[0030] As indicated by reference numeral 120, the control device controls the layer sequence. identification For example, a run may include the deposition of one or more layers onto a substrate. Each layer may have a desired material thickness. The controller may determine the layers (e.g., the material from which each layer is formed, the order or sequence of the layers, etc.) and the thickness to be achieved for each layer. identificationThe control device may receive design information for a run to deposit a layer on a substrate. As described in more detail below, the control device may use this information to determine run parameters for a run to deposit a layer on a substrate.
[0031] As indicated by reference numeral 125, the controller sets the starting target life value for the next run. identification For example, as successive runs are performed, a target may be depleted. The target may start with a particular target life value (e.g., which may be expressed in kilowatt-hours (kWh), time values, etc.) before the first run is performed. With each run, material may be depleted from the target. The controller may determine a starting target life for each target for each run performed. The control device may use the starting target life to determine run parameters for each run (e.g., to determine the relationship between parameters and observed values, as described in more detail below). identification (based on the information provided).
[0032] As indicated by reference numeral 130, the controller may determine run parameters for the run. For example, the controller may determine the parameters using the final known coating rates of all layers associated with the run (e.g., using the relationship indicated by reference numeral 110 and the results of reverse engineering described below). In some implementations, the run parameters may include run time. For example, the run parameters may indicate the length of time that deposition or sputtering is performed for a particular target or layer. identification possible.
[0033] In some implementations, the control device may determine run parameters for the layer based on the starting target life of the layer (indicated by reference numeral 125), the layer thickness (indicated by reference numeral 120), the reverse-engineered results, the layer or another dynamic process parameter (indicated by reference numeral 115), and the reverse-engineered coating rate as the determined run target life (also indicated by reference numeral 115). For example, the controller may determine a run time for the layer using a reverse-engineered coating rate adjusted based on the difference between the reverse-engineered coating rate determined run target life and the starting target life for the layer. The controller may adjust the reverse-engineered coating rate (as indicated by reference numeral 110) based on the relationship between the coating rate and the target life.
[0034] The controller may use the adjusted coating speed and material thickness to determine layer run parameters (indicated by reference numeral 135), where the parameters are indicated as par1 and par2, and the run times for each layer are indicated as time1 and time2. For example, if the adjusted coating speed indicates that the previous run was thinner than desired, the controller may increase time1 and / or time2. As another example, if the adjusted coating speed indicates that the previous run was thicker than desired, the controller may decrease time1 and / or time2. In this way, the control device determines the run parameters (singular) for the layer using the reverse engineered coating rate, which is adjusted based on the relationship between the coating rate and the target lifetime, and using the starting target lifetime for the layer, which improves the accuracy of the parameters, reduces the effects of changes in the target geometry, etc. In some implementations, the control device may perform the above operations for each layer in a run (e.g., for each target deposited in a run) using information specific to each layer and each target.
[0035] In some implementations, the control device may determine run parameters other than or in addition to run time. As one example, the controller may determine a power supply setpoint based on observed values (e.g., coating thickness, coating speed, or target life). The power supply setpoint may allow the controller to increase or decrease the coating speed, which may allow the control device to keep the coating speed constant over the life of the sample. As a second example, the control device may determine a bias based on observed values. The bias may be a measure of the start or end delay in the run, which may affect the layer thickness. For example, the layer time may be based on the following relationship: (target thickness + bias) / coating rate.
[0036] As a third example, the controller can determine a rotary drive height, which can allow the controller to adjust the runoff across the substrate. For example, if the target-to-substrate distance is large, the coating rate at the center of the rotary drive can be higher than the coating rate at the edge of the rotary drive. In this case, the controller can perform reverse engineering based on multiple spectral measurements at different locations on the optical element. This can enable enhanced reverse engineering using multiple different rates. For example, the controller can track each change in multiple spectral measurements and use the relationship between the changes to determine the rotary drive height for future runs.
[0037] In some implementations, the control device can determine a geometric relationship between the target or source and the substrate. For example, the rotational drive height can be one such geometric relationship. The geometric relationship can affect the coating rate, runoff, etc. Other examples of configuring a geometric relationship include raising or lowering the target, moving or translating a component in space, changing the geometry or position of a mask, etc.
[0038] In some implementations, the controller may determine a gas flow rate (e.g., oxygen flow rate, etc.). For example, the gas flow rate may affect the coating rate and / or desired material properties (e.g., refractive index, absorption, etc.). In some implementations, the control device may determine the above parameters based on measurements performed on one or more layers or runs, as described in connection with reference numeral 150 below.
[0039] In some implementations, the control device may repeatedly determine the value of one of the above run parameters using a control loop similar to that described herein for coating speed. For example, the control device may determine the parameter value by analyzing spectral scans from measurements (e.g., at one or more locations across the coated substrate). The controller may determine the deviation of the parameter from an expected value in a given run and adjust the run parameter for the next run based on the deviation and / or based on the observed value (e.g., based on the next run and the target life for a given particular run, and according to the relationship between the parameter and the target life).
[0040] In some implementations, the control device may store historical information (e.g., information about past runs, target life values, etc.) identification Historical information, such as historical data, may be used to determine values for one or more of the above parameters. As one example, as the target progresses through its target life, the controller may determine to lower the rotary drive to reduce runoff. In such a case, the controller may determine the rotary drive height based on the target life. As another example, assuming the controller is to maintain a constant coating speed throughout the target life, the controller may increase the power supply setpoint based on the target life. Thus, the determination of the above parameters may take into account historical information, thereby improving the accuracy of the determination of the above parameters and improving the accuracy of the coating.
[0041] As indicated by reference numeral 140, the coating system may perform a run using the run parameters determined in connection with reference numeral 130 above. In some implementations, a controller may cause the coating system to perform a run. For example, the controller may configure the coating system to perform a run using the run parameters. In some implementations, a control device may perform the run.
[0042] As indicated by reference numeral 145, a spectrometer may perform a scan of the coated element to determine the results. For example, The spectrometer may perform one or more measurements to determine whether a parameter (e.g., coating speed, power supply setpoint, bias, rotary drive height, gas flow, spectral response, etc.) matches an expected value (e.g., based on a relationship between the parameter and an observed value such as a target lifetime). In some implementations, and as shown, the spectrometer may provide information related to the one or more measurements to a controller. In some implementations, the spectrometer may be part of the coating system. In some implementations, the spectrometer may be separate from the coating system.
[0043] As indicated by reference numeral 150, the control device may perform reverse engineering to determine the change in coating rate for a target life associated with one or more targets. More generally, the control device may perform reverse engineering to determine whether a parameter fits a relationship between the parameter and an observed value, or to determine the drift of the parameter relative to the observed value. For example, the control device may determine the observed coating rate for a layer. Using the observed coating rate, the control device may determine the change in coating rate over multiple runs, which may be referred to as a coating rate gradient (e.g., using the difference between the starting and ending target lives). The change in coating rate may allow the control device to more accurately predict the performance of the next run, thereby improving the coating success rate.
[0044] In some implementations, the control device may perform enhanced reverse engineering using historical information. For example, many runs may use multiple different materials to perform coatings. In some cases, spectral analysis of the optical element provides information useful for reverse engineering all of the materials. For example, each material may cause a different effect on the spectral response of the optical element. In such cases, the controller may perform reverse engineering for each material and store the results of the reverse engineering along with corresponding observations (e.g., target life, etc.). The control device may use the results and observations to modify run parameters for future runs, as described in more detail elsewhere herein. This may be referred to as unlinked reverse engineering, because the results of reverse engineering one material do not depend on the results of reverse engineering another material.
[0045] In some embodiments, the controller may perform linked reverse engineering. Linked reverse engineering may be used when measurements of an optical element do not lend themselves to reverse engineering of all materials. For example, measurements of spectral response may only provide information about other materials in an optical element because one or more materials may not affect the spectral response. In such cases, a link between the results of a first reverse engineering of a first material and the results of a second reverse engineering of a second material may be assumed. In some cases, this link is assumed to be 1:1, meaning that the parameter drift of X for the first material corresponds to the parameter drift of X for the second material. However, in some cases, different materials may be associated with different parameter drifts. For example, a first material may be associated with a first relationship between target lifetime and coating thickness, and a second material may be associated with a different second relationship between target lifetime and coating thickness. In this case, a 1:1 link between the results of reverse engineering of the first and second materials may be seen to increase in accuracy over the target lifetime.
[0046] The controller may perform enhanced reverse engineering based on historical information related to the first and second samples. For example, assume that a first material is associated with a coating rate-target life relationship defined by X, and a second material is associated with a coating rate-target life relationship defined by Y. Further, assume that spectral measurements provide useful information about the first material but not the second material. In that case, the controller may perform linked reverse engineering, for example, using an X:Y link. Thus, the accuracy of the reverse engineering of the first and second materials is improved based on the historical information (e.g., based on forward parameter correction), which improves yield and reduces or eliminates the need for calibration runs. It can be seen that the above procedure can be generalized to any number of materials, links, and / or targets.
[0047] In this way, the accuracy of the coating procedure is improved by allowing the desired values to be maintained, which allows for more accurate deposition of layers to match layer thickness targets. Furthermore, some implementations described herein may enable more consistent leapfrogging because the relationship between parameters and observed values can be used to accurately determine run parameters for runs that do not immediately follow the run in which reverse engineering is performed. Furthermore, some implementations described herein may improve the degradation of spectral shape visible across multiple runs of a filter using multiple processes with different variations in coating rate. For example, because the rate correction is specific to each process or target, some implementations described herein may more accurately represent the actual coating rate of multiple processes or targets than linked coating rate determination techniques. Still further, some implementations described herein may improve the consistency of the coating procedure across an entire campaign. For example, a decrease in coating rate as the target depletes can be offset by an increase in deposition time based on the target's lifetime, thereby improving the consistency of the coating thickness across an entire campaign.
[0048] As noted above, Figure 1 is provided as an example only. Other examples are possible and may differ from those described with respect to Figure 1.
[0049] 2A is a schematic diagram of an exemplary coating system 210. As shown, the coating system 210 includes a process chamber 211, a substrate 212, a target 213, a magnet 214, a rotational motion system 215, a uniformity mask 216, a process gas intake 217, and a process chamber exhaust 218.
[0050] A coating process may occur within the process chamber 211. For example, material may be sputtered from the target 213 onto the substrate 212. To accomplish this, a voltage may be applied to the target 213 (e.g., at a particular power setpoint), which may cause a plasma-based effect at the surface of the target 213. The plasma-based effect may cause material from the target 213 to sputter toward the substrate 212. As the target is depleted, material may be lost from the surface of the target 213 opposite the magnet 214. This increases the distance between the surface of the target 213 and the substrate 212, typically reducing the coating rate. This may also change the magnetic field strength at the surface of the target 213, affecting the plasma formation process. Thus, the coating rate may change (e.g., decrease or increase, decrease and then increase, increase and then decrease, fluctuate, etc.) over the target 213's target life. The rotary motion system 215 may be associated with a rotary drive height, which may move the substrate 212 closer to or farther from the target 213, thereby affecting the coating rate. Gases may enter the process chamber 211 at a process gas inlet 217 and exit the process chamber 211 at a process chamber exhaust 218. In some embodiments, the coating system 210 may include a spectrometer and / or the like (not shown) to perform measurements to determine the observed coating rate or other parameters.
[0051] As noted above, Figure 2A is provided as an example. Other examples are possible and may differ from those described with respect to Figure 2A.
[0052] 2B is a schematic diagram of an example environment 200 in which the systems and / or methods described herein may be implemented. As shown in FIG. 2B, environment 200 may include a coating system 210, a control device 220, and a network 230. The devices of environment 200 may be interconnected via wired connections, wireless connections, or a combination of wired and wireless connections.
[0053] Coating system 210 is described in more detail in connection with FIG. 2A above.
[0054] Control device 220 includes one or more devices capable of receiving, storing, generating, processing, and / or providing information related to the control or configuration of coating system 210. For example, control device 220 may include a server, a computer, a wearable device, a cloud computing device, etc. In some implementations, control device 220 may receive information from and / or provide information to one or more other devices in environment 200, such as coating system 210.
[0055] Network 230 may include one or more wired and / or wireless networks. For example, network 230 may include a cellular network (e.g., a Long Term Evolution (LTE) network, a Code Division Multiple Access (CDMA) network, a 3G network, a 4G network, a 5G network, another type of next generation network, etc.), a Public Land Mobile Network (PLMN), a Local Area Network (LAN), a Wide Area Network (WAN), a Metropolitan Area Network (MAN), a telephone network (e.g., a Public Switched Telephone Network (PSTN)), a private network, an ad hoc network, an intranet, the Internet, a fiber optic-based network, a cloud computing network, etc., and / or a combination of these or other types of networks.
[0056] The number and arrangement of devices and networks shown in Figure 2B are provided as an example. In practice, there may be additional, fewer, different, or differently arranged devices and / or networks than those shown in Figure 2B. Furthermore, two or more devices shown in Figure 2B may be implemented within a single device, or a single device shown in Figure 2B may be implemented as multiple distributed devices. Additionally, or alternatively, a set of devices (e.g., one or more devices) of environment 200 may perform one or more functions described as being performed by another set of devices of environment 200.
[0057] 3 is a schematic diagram of exemplary components of device 300. Device 300 may correspond to coating system 210 and / or control device 220. In some implementations, coating system 210 and / or control device 220 may include one or more devices 300 and / or one or more components of device 300. As shown in FIG. 3, device 300 may include a bus 310, a processor 320, a memory 330, a storage component 340, an input component 350, an output component 360, and a communication interface 370.
[0058] The bus 310 includes components that enable communication between the components of the device 300. The processor 320 is implemented in hardware, firmware, or a combination of hardware and software. The processor 320 is a central processing unit (CPU), a graphics processing unit (GPU), an accelerated processing unit (APU), a microprocessor, a microcontroller, a digital signal processor (DSP), a field programmable gate array (FPGA), an application specific integrated circuit (ASIC), or another type of processing component. In some implementations, the processor 320 includes one or more processors that are programmable to perform functions. The memory 330 includes one or more memories, such as random access memory (RAM), read-only memory (ROM), and / or another type of dynamic or static storage device (e.g., flash memory, magnetic memory, and / or optical memory), that store information and / or instructions for use by the processor 320.
[0059] Storage component 340 stores information and / or software related to the operation and use of device 300. For example, storage component 340 may include a hard disk (e.g., a magnetic disk, an optical disk, a magneto-optical disk, and / or a solid-state disk), a compact disk (CD), a digital versatile disk (DVD), a floppy disk, a cartridge, a magnetic tape, and / or another type of non-transitory computer-readable medium and a corresponding drive.
[0060] Input components 350 include components that enable device 300 to receive information, for example, via user input (e.g., a touchscreen display, a keyboard, a keypad, a mouse, buttons, switches, and / or a microphone). Additionally or alternatively, input components 350 may include sensors for sensing information (e.g., a global positioning system (GPS) component, an accelerometer, a gyroscope, and / or an actuator). Output components 360 include components that provide output information from device 300 (e.g., a display, a speaker, and / or one or more light-emitting diodes (LEDs)).
[0061] Communications interface 370 includes transceiver-like components (e.g., a transceiver and / or a separate receiver and transmitter) that enable device 300 to communicate with other devices, such as via a wired connection, a wireless connection, or a combination of wired and wireless connections. Communications interface 370 may enable device 300 to receive information from and / or provide information to another device. For example, communications interface 370 may include an Ethernet interface, an optical interface, a coaxial interface, an infrared interface, a radio frequency (RF) interface, a Universal Serial Bus (600) interface, a Wi-Fi interface, a cellular network interface, etc.
[0062] The device 300 may perform one or more processes described herein. The device 300 may perform these processes based on the processor 320 executing software instructions stored by a non-transitory computer-readable medium, such as the memory 330 and / or the storage component 340. A computer-readable medium is defined herein as a non-transitory memory device. A memory device includes memory space within a single physical storage device or memory space spanning multiple physical storage devices.
[0063] The software instructions may be read into memory 330 and / or storage component 340 from another computer-readable medium or from another device via communication interface 370. When executed, the software instructions stored in memory 330 and / or storage component 340 may cause processor 320 to perform one or more processes described herein. Additionally, or alternatively, hardwired circuitry may be used in place of or in combination with software instructions to perform one or more processes described herein. Thus, implementations described herein are not limited to any specific combination of hardware circuitry and software.
[0064] The number and arrangement of components shown in Figure 3 are provided as an example. In practice, device 300 may include additional, fewer, different, or differently arranged components than those shown in Figure 3. Additionally or alternatively, a set of components (e.g., one or more components) of device 300 may perform one or more functions that are described as being performed by another set of components of device 300.
[0065] FIG. 4A is a chart of example results 405 of a coating campaign that cannot use forward parameter correction and augmented reverse engineering based on expected deterministic process parameter drift. In FIG. 4A, calibration runs are indicated by larger black dots, as indicated by reference numerals 410 and 415. The vertical axis shows the spectral offset (e.g., design offset) of each coating run. The horizontal axis shows the target lifetime in kWh. For example, at 0 kWh, the target is new, and at 2000 kWh, the target is replaced. It is desirable to have a spectral offset that is constant throughout the life of the target. Ideally, the offset is consistently zero.
[0066] As can be seen, the spectral offset tends to be negative. This may be a result of the change in coating rate over time, as discussed in connection with Figure 1 above. Furthermore, some runs produce particularly deviant results. Examples of these runs are shown at 420 and 425. Note that the runs with the most negative spectral offset coincide with leapfrogging runs (shown by the diamonds at the bottom of the graph). This is because, when using traditional approaches, reverse-engineering measurements on non-consecutive runs exacerbates inaccuracies in coating rate over the target lifetime. Therefore, leapfrogging may not be possible or beneficial when using traditional approaches. Furthermore, many calibration runs are performed (shown by the large black dots), which is resource-intensive and disrupts the campaign.
[0067] FIG. 4B is a chart of example results 430 of a coating process using forward parameter correction and augmented reverse engineering based on expected deterministic process parameter drift (e.g., using the techniques described herein). As shown, the spectral offset does not drift significantly up or down during the campaign, remaining between −0.2 and approximately +0.2. This means that fewer filters violate the required value specifications, resulting in improved yield. Furthermore, using the techniques described herein, leapfrogging does not correlate with a significant decrease in coating speed accuracy, so leapfrogging can be performed more frequently than in the campaign of FIG. 4A, thereby improving throughput. Furthermore, only a single calibration run (e.g., the initial run) is performed, thereby further improving throughput.
[0068] As noted above, Figures 4A and 4B are provided as examples only, and other examples are possible and may differ from those described with respect to Figures 4A and 4B.
[0069] 5 is a flowchart of an example process 500 for coating control using forward parameter correction and augmented reverse engineering based on expected deterministic process parameter drift. In some implementations, one or more process blocks of FIG. 5 may be run by a control device (e.g., control device 220). In some implementations, one or more process blocks of FIG. 5 may be performed by another device or group of devices separate from or including the control device, such as a coating system (e.g., coating system 210).
[0070] As shown in FIG. 5, process 500 can include receiving design information, where the design information includes desired values for a set of layers of optical elements to be produced during one or more runs. identification (block 510). For example, a controller (e.g., using processor 320, communication interface 370, etc.) may receive design information (e.g., as shown by reference numeral 120 in FIG. 1). The design information may include one or more desired values for a set of layers of optical elements. identification For example, the optical element may include a filter and / or another optical element. The optical element may be generated during one or more runs.
[0071] As further shown in FIG. 5, process 500 may include determining a relationship between one or more run parameters and observations associated with one or more runs or optical elements (block 520). identification For example, a control device (e.g., using processor 320, communication interface 370, etc.) may receive or obtain (e.g., determine) historical information (e.g., as shown by reference numeral 110 in FIG. 1). The historical information may include receiving or obtaining historical information relating to the relationship between parameters and observed values of one or more runs. identificationIn various examples described herein, the parameters may include coating speed, rotational drive height, supply power setpoint, gas flow rate, etc. In various examples described herein, the observed values may include target lifetime, spectral response, refractive index, coating speed, absorption index, etc. In some implementations, the historical information may be based on previous campaigns. In some implementations, the historical information may be based on previous runs of the current campaign. For example, the historical information may be based on reverse engineering results of the current campaign. In some implementations, the historical information may include multiple relationships (e.g., multiple different processes, multiple measurements at different parts of the optical element, etc.) that can be used to improve the accuracy of the reverse engineering. identification possible.
[0072] The implementation described here uses objective values, parameters, observed values, and run parameters. Run parameters (shown by reference numeral 135 in FIG. 1) may include values used to perform a run. These values may be adjusted based on historical values or reverse engineering results. Desired values may be determined by design information (shown by reference numeral 120 in FIG. 1). identification and determining the target thickness (e.g., the target thickness associated with the run), coating speed, spectral response, etc. identification Parameters may include values that are related to observations that can be described (e.g., using linear or non-linear polynomials). The relationship between the parameters and the observations can be used to predict the value of the parameters under various conditions (e.g., various points in the lifetime of the observations, various spectral measurements, etc.).
[0073] As further shown in FIG. 5, process 500 may include determining tier information for one or more runs based on historical information, where the tier information adjusts run parameters for a set of tiers to achieve desired values. identificationFor example, the control device (e.g., using the processor 320, the communication interface 370, etc.) may determine layer information, as indicated by reference numeral 135 in FIG. 1. The layer information may include run parameters that the control device determined based on design information, historical information, and / or reverse engineering results. identification For example, run parameters may include gas flow rates, power supply set points, run times, rotary drive heights, etc. In some implementations, the layer information determines the run parameters for the next run. identification In some implementations, the layer information may be used to determine the run parameters for the next N runs (N>1). identification In such cases, the control device may modify one or more run parameters of a future run based on reverse engineering runs of past or current runs, as described in more detail elsewhere herein.
[0074] 5, process 500 may include causing one or more runs to be performed based on the layer information (block 540). For example, a control device (e.g., using processor 320, communication interface 370, etc.) may cause one or more runs to be performed using the layer information (e.g., run parameters), as indicated by reference numeral 140 in the figure. In some implementations, the control device may perform one or more runs. In some implementations, the controller may cause the coating system to perform one or more runs.
[0075] As further shown in FIG. 5, the process 500 may include: identification The method may include determining information that identification The information is the value of the observations in one or more runs. identification For example, a control device (e.g., using processor 320, communication interface 370, etc.) may collect the results of one or more runs, as indicated by reference numerals 145 and 150. identificationAnother device (e.g., a spectrometer, etc.) may determine measurements or spectral responses of the optical elements. The measurements or spectral responses may indicate results of one or more runs (e.g., layer thicknesses, spectral characteristics, filter frequencies, runoff levels, etc.). The controller may determine whether the results deviate from desired values and / or values predicted using historical information (e.g., as indicated by reference numeral 150). Additionally, the results may indicate values of observed values (e.g., target lifetime, refractive index, absorption, etc.) that the control device may use to modify run parameters, as described in more detail below. This process block may, in some cases, be referred to as extended reverse engineering.
[0076] As further shown in FIG. 5, the process 500 converts the results into identification The process may include modifying a run parameter among the run parameters based on the information obtained (block 560). For example, a control device (e.g., using processor 320, communication interface 370, etc.) may transmit the results to a identification Based on the information, the control device may modify run parameters (indicated by reference numeral 130). identification In some implementations, the control device may determine run parameters for future runs based on historical information, design information, and / or results. identification In this way, the control device can dynamically adapt run parameters based on a combination of enhanced reverse engineering and forward parameter correction, which improves campaign accuracy and reduces reliance on costly calibration runs.
[0077] Process 500 may include additional implementations, such as any single implementation or any combination of implementations described below, and / or relate to one or more other processes described elsewhere herein.
[0078] In some implementations, the control device may display the results of one or more runs. identification The information you need to determine the results identification The information is the value of the observations in one or more runs. identification The results identification In some implementations, historical information is used to determine the results. identification In some implementations, the result includes at least part of the information identification The information obtained is based on spectral measurements of the optical elements. identification In some implementations, one or more runs use multiple materials, and the historical information identifies the relationship between each of the multiple materials. identification In some implementations, multiple materials are associated with a single target. In some implementations, the control device determines the result based on at least two of the multiple relationships. identification The information to be used can be determined.
[0079] In some implementations, the relationship is expressed as the rate of change of the parameter compared to the observed value. identification In some implementations, the parameter is a coating rate and the observed value is a target life. In some implementations, the run parameters include at least one of a gas flow rate, a supply power configuration, a supply power setpoint, or a rotary drive height.
[0080] In some implementations, the parameter is a rotational drive height, and the observed value is a target life or runoff value. In some implementations, the parameter is a supply power setpoint, and the observed value is a target life. In some implementations, the parameter is a gas flow rate, and the observed value is a refractive index or an absorption coefficient. In some implementations, the historical information relates to a first run, and the layer information relates to a second run, the first run and the second run being separated by at least one run. In some implementations, the desired value includes at least one of a layer thickness of a set of layers, a refractive index of an optical element, or an absorption index. In some implementations, the one or more runs are part of a coating campaign for producing an optical element using sputtering techniques.
[0081] 5 illustrates example blocks of process 500, in some implementations process 500 may include additional, fewer, different, or differently arranged blocks than those illustrated in FIG 5. Process 500 may be performed in parallel.
[0082] In this way, the control device 220 improves the accuracy of the deposition process by enabling the maintenance of desired and / or stable coating chambers. Furthermore, the control device 220 may use the relationship between parameters and observed values to accurately determine run parameters for runs that do not immediately follow the run in which reverse engineering is performed, thereby enabling more consistent leapfrogging. Furthermore, the control device 220 may improve the degradation of spectral shape visible across multiple runs of a filter using multiple processes or targets with different coating rate gradients. For example, because rate corrections can be specific to each process or target when using enhanced reverse engineering, the control device 220 may more accurately determine the actual coating rates of multiple processes or targets than linked coating rate determination techniques that assume a constant or 1:1 relationship. Furthermore, the control device 220 may improve the consistency of coating chambers across an entire campaign. For example, a decrease in coating rate as a target is depleted can be offset by an increase in run time based on the target's lifespan, thereby improving coating rate consistency across a campaign.
[0083] The foregoing disclosure provides illustration and description, but is not intended to be exhaustive or to limit the implementations to the precise forms disclosed. Modifications and variations are possible in light of the above disclosure or may be acquired from practice of the implementations.
[0084] As used herein, the term component is intended to be broadly interpreted as hardware, firmware, or a combination of hardware and software.
[0085] Some implementations are described herein in relation to thresholds. As used herein, meeting a threshold may refer to greater than the threshold, more than the threshold, higher than the threshold, greater than or equal to the threshold, less than the threshold, less than the threshold, lower than the threshold, less than or equal to the threshold, equal to the threshold, etc.
[0086] It will be apparent that the systems and / or methods described herein may be implemented in different forms of hardware, firmware, or a combination of hardware and software. The actual specialized control hardware or software code used to implement these systems and / or methods is not intended to limit the implementation. Thus, the operations and behavior of the systems and / or methods are described herein without reference to specific software code—it will be understood that software and hardware may be designed to implement the systems and / or methods based on the description herein.
[0087] Although particular combinations of features are recited in the claims and / or disclosed in the specification, these combinations are not intended to limit the disclosure of possible implementations. Indeed, many of these features may be combined in ways not specifically recited in the claims and / or disclosed in the specification. Although each dependent claim listed below may depend directly on only one claim, the disclosure of possible implementations includes each dependent claim in combination with every other claim in the claim set.
[0088] No element, act, or instruction used herein should be construed as critical or required unless explicitly stated otherwise. Also, as used herein, the articles "a" and "an" are intended to include one or more items and may be used interchangeably with "one or more." Furthermore, as used herein, the term "set" is intended to include one or more items (e.g., related items, unrelated items, combinations of related and unrelated items, etc.) and may be used interchangeably with "one or more." Where only one item is intended, the term "one" or similar language is used. Also, as used herein, terms such as "has," "have," and "having" are intended to be open-ended terms. Furthermore, the phrase "based on" is intended to mean "based, at least in part, on," unless otherwise specified.
Claims
1. below: one or more memories; and one or more processors communicatively coupled to the one or more memories to: receiving design information, wherein the design information specifies desired values for a set of layers of optical elements to be produced during one or more runs; receiving or obtaining historical information indicating drift in coating rate over target life for a single target; determining tier information for the one or more runs based on the historical information, where the tier information specifies run parameters for the set of tiers to achieve the desired values; and performing the one or more runs based on the layer information; A device comprising: the one or more runs use multiple materials; the plurality of materials are associated with a single target; device.
2. The one or more processors include: determining information identifying an outcome of the one or more runs, wherein the information identifying the outcome identifies observations for the one or more runs; and modifying the run parameters based on the information identifying the outcome. The device of claim 1 , further comprising:
3. The device of claim 2 , wherein the information identifying the outcome is based on a spectral measurement of the optical element.
4. The device of claim 2 , wherein the information identifying the outcome is based on multiple spectral measurements of the optical element.
5. The device of claim 2 , wherein the historical information identifies respective relationships for the plurality of materials.
6. When the one or more processors determine the information identifying the outcome of the one or more runs, the one or more processors may: determining the information identifying the outcome based on at least two of the plurality of relationships; The device of claim 5 , further comprising:
7. The device of claim 1 , wherein the historical information further identifies a rate of change of a parameter for the one or more runs compared to an observed value for the one or more runs.
8. The run parameters are as follows: one or more run times for said set of layers; gas flow velocity, supply power configuration, or geometric composition The device of claim 1 , comprising at least one of:
9. below: receiving, by a coating control device, design information, wherein the design information specifies desired values for a set of layers of an optical element to be produced during one or more runs; receiving or acquiring, by said coating control device, historical information indicative of drift in coating rate over target life for a single target; determining, by the coating control device, layer information for the one or more runs based on the historical information, wherein the layer information specifies run parameters for the set of layers to achieve the desired values; causing the coating control device to perform the one or more runs based on the layer information; determining, by the coating control device, information specifying an outcome of the one or more runs, wherein the information specifying the outcome specifies observed values for the one or more runs; and modifying, by the coating control device, the run parameters based on the result-specifying information. A method comprising: the one or more runs use multiple materials; the plurality of materials are associated with a single target; method.
10. The method of claim 9 , wherein the historical information identifies respective relationships for the plurality of materials.
11. The method of claim 9 , wherein the run parameter is related to a geometric configuration and the observed value is the target lifetime.
12. The method of claim 9 , wherein the observed value is the target lifetime.
13. 10. The method of claim 9, wherein the run parameter is gas flow velocity and the observed value is refractive index or absorptivity.
14. 10. The method of claim 9, wherein the run parameter is gas flow rate and the observed value is target lifetime.
15. 1. A non-transitory computer-readable medium storing instructions that, when executed by one or more processors, cause the one or more processors to: receiving design information, wherein the design information specifies desired values for a set of layers of optical elements to be produced during one or more runs; receiving or obtaining historical information indicating drift in coating rate over target life for a single target; determining tier information for the one or more runs based on the historical information, where the tier information specifies run parameters for the set of tiers to achieve the desired values; and performing the one or more runs based on the layer information; Including, the one or more runs use multiple materials; the plurality of materials are associated with a single target; Non-transitory computer-readable medium.
16. 16. The non-transitory computer-readable medium of claim 15, wherein the history information is for a first run and the tier information is for a second run, and the first run and the second run are separated by at least one run.
17. The desired value is: the thickness of a layer of said set of layers; the refractive index of the optical element, or Absorption index 16. The non-transitory computer-readable medium of claim 15, comprising at least one of:
18. The non-transitory computer-readable medium of claim 15 , wherein the one or more runs are part of a coating campaign for producing the optical element using sputtering techniques.
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