Method for monitoring colloids in developer solutions, lithographic apparatus, and antifouling compositions

Abstract

SOLUTION: An embodiment of the present invention provides a monitoring method of colloid in a developer that sends a warning message to change a developer based on a change in the zeta potential distribution and a change in the particle size distribution of the colloid in the developer, and the warning message stops the development process and provides a method for monitoring colloids in the developer that can be used as a reference index to determine whether or not to perform cleaning and changing the developer. Embodiments of the present invention provide an antifouling composition that can extend the working time of the developer by suppressing colloidal aggregation and increasing size in the developer.EFFECT: By using a monitoring method of colloids in the developing solution of the present invention and the anti-fouling composition in the developing process, not only can the effective use of the developing solution be achieved, but also the minimization of stoppage frequency, reduction of cleaning frequency, decrease in the use of chemicals, and most importantly, the conservation of water for the developing process and reduction of carbon emissions can be realized.SELECTED DRAWING: None

Description

[Technical Field]

[0001] The present invention relates to a method for monitoring a development process, and in particular to a method for monitoring colloids in developer solutions, and to an antifouling composition for the development process. [Background technology]

[0002] Resist materials are commonly used as masks in lithography processes and have applications in the manufacture of printed wiring boards, display panels, and integrated circuit substrates. Resist materials are generally composed of photosensitive resin compositions and are classified into negative resists, in which the unexposed portions are dissolved and removed, and positive resists, in which the exposed portions are dissolved and removed.

[0003] During the production of products using resist materials, in order to maintain excellent product quality and high yield while also complying with the spirit of sustainability, it is necessary to strictly control the operation accuracy of units in the development process and reduce the amount of chemicals used, the amount of chemical wastewater treated, and, most importantly, the amount of water used for treatment when a unit produces a certain number of substrates. One ideal method would be to optimize or maximize the recovery of used developer so that it can be recovered and used in the next development process, extending the working time of the developer tank. It is hoped that such planned adjustments will significantly reduce carbon emissions. However, implementing this idea is extremely challenging.

[0004] Taking the production of printed wiring boards as an example, U.S. Pat. No. 5,853,963 proposes that adding hydroxide to the developer tank to control the hydrogen index (pH value) can maintain the development activity of the carbonate group and extend the working time of the developer. However, the more precise the circuit design, the more difficult it is to maintain development activity by controlling the pH value in the development process. Therefore, development activity must be maintained by nonionic or ionic surfactants to enhance development efficiency in the process. The surfactant generates a protective space in the developer solution to enclose the resist composition dissolved in the basic carbonate group. Ideally, the addition of a surfactant contributes to the expression of development efficiency and can further improve the development efficiency, but the used developer needs to be recovered and reused, and the production line encounters the following operational problems:

[0005] I. In the development process unit, the surfactant generates bubbles at the gas-liquid interface, and in severe cases, the bubbles continue to generate and overflow from the development tank, causing the development process to stop. II. Fresh developer is added to the developing tank, and after the first action dissolves the resist composition, it is recovered and reused. In this process, resist components accumulate and aggregate in the developer over time, forming a colloidal suspension and beginning to produce stains. The resulting stains adhere to the solid surfaces of the development system when the developer is reused, and furthermore, they re-adhere to the substrate, causing damage to the substrate and reducing the product yield. [Prior art documents] [Patent documents]

[0006] [Patent Document 1] U.S. Patent No. 5,853,963 Summary of the Invention [Problem to be solved by the invention]

[0007] The above movement disorders often occur together. Typically, control measures involve adding an antifoaming agent or adjusting the pH value, but adding an inappropriate antifoaming agent can have the opposite effect, causing the resist composition to aggregate and become contaminated, accelerating adhesion and sticking to the substrate, reducing product yield and causing production line shutdowns. This requires the use of more chemicals and water to clean the lithographic apparatus. In order to avoid the above-mentioned problems in achieving the desired product yield, the developer working time and stop / cleaning time on the production line must be determined based on operational experience, and usually the line must be stopped and cleaned every 8 or 16 hours. This results in the use of more chemicals and water, which goes against the spirit of sustainability.

[0008] In view of the above, an object of the present invention is to provide a method for optimizing the working time of a developer, which is a ground for stopping a production line, and to provide an antifouling composition that can be added to a developer or resist so as to suppress the aggregation of colloids and reduce the occurrence of stains. [Means for solving the problem]

[0009] One embodiment of the present invention is a method for monitoring colloids in a developer solution, comprising the steps of: To determine the change in zeta potential distribution of colloids in the developer; To determine the change in particle size distribution of colloids in the developer, and sending a warning message to change the developer based on the zeta potential distribution change and the particle size distribution change; The developer is used to develop the exposed substrate and remove a portion of the resist. A method for monitoring colloids in developer solutions is provided.

[0010] Another embodiment of the present invention comprises: a development tank where the substrate undergoes a development reaction; a nozzle disposed in the developing tank for dispersing the developing solution onto the substrate; a developer tank for connecting to the nozzle and holding the developer; a transport unit disposed within the developing tank for transporting substrates to and from the developing tank; a control unit connected to the developer tank, the nozzle and the developer tank for controlling the injection, release or recovery of the developer; a detection unit connected to the developer tank for detecting the zeta potential or particle size of colloids in the developer solution and generating a corresponding signal; and a computing unit connected to the detection unit for performing a computation based on the signal; and wherein the method for monitoring colloids in a developer is performed.

[0011] Yet another embodiment of the present invention comprises: 0 to 99.5% by weight of water, a basic substance or mixture containing 0.5 to 1.5% by weight of tetramethylammonium hydroxide, tetra-n-butylammonium hydroxide, potassium carbonate, sodium carbonate or ammonium carbonate; 0.001 to 0.5 wt. % of a dispersant; 0.001 to 0.5 wt. % of a wetting agent; 0.001 to 0.5 wt. % of a foam suppressor, and 0.001 to 0.5 wt. % of an antifoaming agent, The present invention provides an antifouling composition comprising:

[0012] Yet another embodiment of the present invention provides a developer composition comprising a developer and the antifouling composition described above.

[0013] Yet another embodiment of the present invention provides a resist composition comprising a resist and the antifouling composition.

[0014] A method for monitoring colloids in a developer according to an embodiment of the present invention sends a warning message to change the developer based on changes in the zeta potential distribution and particle size distribution of colloids in the developer, and the warning message can be used as a reference indicator to determine whether to stop the development process and perform cleaning or change the developer. In contrast to the known technology of monitoring the hydrogen index as the basis for stopping the development process, the present invention uses the change in the physicochemical properties of the colloid in the developer as a reference indicator, which can better reflect the changes in the properties and content of the colloid that cause contamination in the developer, ensuring that the developer can be used most effectively before changing or cleaning the developer tank. The antifouling composition according to the embodiment of the present invention can inhibit the aggregation and size increase of colloids in the developer, thereby inhibiting the generation of stains, thereby extending the working time of the developer. By using the method for monitoring colloids in a developer solution according to an embodiment of the present invention and the antifouling composition according to an embodiment of the present invention in the development process, not only can developer solution be utilized more efficiently, but also the number of stoppages can be minimized, cleaning frequency can be reduced, chemical usage can be reduced, and most importantly, water savings and reduced carbon emissions can be achieved in the development process. The method for monitoring colloids in a developer according to an embodiment of the present invention and the antifouling composition according to an embodiment of the present invention can be applied to various resist development processes, and can also be applied to lithography processes for printed wiring boards, solder resist printing, panels, and integrated circuit surfaces. [Brief explanation of the drawings]

[0015] [Figure 1] FIG. 1 depicts a schematic diagram of a lithographic apparatus;

[0016] [Figure 2] 1 is a flowchart of a method for monitoring colloids in a developer according to an embodiment of the present invention.

[0017] [Figure 3] 1 is a flowchart for determining a change in zeta potential distribution according to an embodiment of the present invention.

[0018] [Figure 4] 1 is a flowchart for determining a change in particle size distribution according to an embodiment of the present invention.

[0019] [Figure 5] 10 is a flowchart for determining a change in particle size distribution according to another embodiment of the present invention.

[0020] [Figure 6]1 is a flowchart illustrating a method for sending a warning message based on a change in zeta potential distribution and a change in particle size distribution according to an embodiment of the present invention.

[0021] [Figure 7A] This is the detection result of the zeta potential distribution. [Figure 7B] This is the detection result of the zeta potential distribution. [Figure 7C] This is the detection result of the zeta potential distribution.

[0022] [Figure 8A] This shows the particle size distribution detection results for the control. [Figure 8B] This shows the particle size distribution detection results for the control. [Figure 8C] This shows the particle size distribution detection results for the control.

[0023] [Figure 9A] 1 shows the results of particle size distribution detection in an example. [Figure 9B] 1 shows the results of particle size distribution detection in an example. [Figure 9C] 1 shows the results of particle size distribution detection in an example. DETAILED DESCRIPTION OF THE INVENTION

[0024] Detailed features and advantages are described in detail in the following implementation modes. The contents are sufficient for any person skilled in the art to understand the technical contents of the present invention and to carry out the present invention based on the contents, claims, and drawings disclosed in this specification, and any person skilled in the art can easily understand the objects and advantages of the present invention. The following examples further illustrate aspects of the present invention, but are not intended to limit the scope of the invention in any respect.

[0025] FIG. 1 is a schematic diagram of a lithographic apparatus. The lithographic apparatus 100 may include a developer tank 101 , a nozzle 102 , a developer tank 103 , a transport unit 104 , a control unit 105 , a detection unit 106 , and a computing unit 107 . The developing tank 101 is where the substrate S undergoes a development reaction. The nozzle 102 may be disposed within the developer tank 101 and used to dispense the developer D onto the substrate S. The transport unit 104 is disposed in the developing tank 101 and is used to transport the substrate S to or from the developing tank 101, and the transport unit 104 may be, for example, a conveyor belt or rollers. A control unit 105 may be connected to the developer tank 101, the nozzle 102 and the developer tank 103 and used to control the injection, release or recovery of the developer D, for example, injecting fresh developer D or recovering used developer D. The detection unit 106 may be connected to the developer tank 101 and used to detect the state of the developer D, generate a corresponding signal, and transmit the signal to the calculation unit 107; for example, the detection unit 106 may detect the pH value, basic component, colloid particle size, or colloid zeta potential of the developer D. The sampling point of the detection unit 106 may be a location where the used developer D accumulates, for example, the bottom of the developer tank 101, or may be a circulation pump or a filter element for recovering the developer D. The calculation unit 107 is connected to the detection unit 106 and is used to perform calculations based on the signal detected from the detection unit 106, and send a warning message recommending stopping and cleaning and changing to a new developer D based on the calculation result.

[0026] For example, the development process can be carried out as described below. The substrate S to be developed is placed from the substrate feeder into the developing tank 101 by the transport unit 104, undergoes a development process in the developing tank 101, and is then carried out from the developing tank 101. In the developing tank 101, fresh or used developer D is dispersed onto the substrate S by a nozzle 102, so that the resist on the substrate S can be dissolved and removed. The type of resist is not limited. If the resist is a positive resist, the exposed portions of the resist are dissolved and removed. If the resist is a negative resist, the unexposed portions of the resist are dissolved and removed. After the resist is dissolved, the used developer D flows by gravity to the bottom of the developing tank 101 and accumulates there, and is then collected by the circulation bump for reuse. During the reuse process, the dissolved resist gradually accumulates in the used developer D and aggregates to form colloids C. The calculation unit 107 performs calculations based on the signal detected by the detection unit 106, and sends a warning message recommending stopping and cleaning and changing to a new developer D based on the calculation results.

[0027] The development process can be tailored to the needs of the lithography process. In practice, a standard development process may use only one or two or more developer baths connected in series, which may be connected to a residual resist wash bath. The development transport line may be designed to transport two or more substrates in parallel through the development tank. The development process can be batch, semi-batch or continuous, with the substrate being transported from the start of the development tank to the end of the development tank by a conveyor belt. The conveyor belt may be a horizontal mechanical type or a vertical mechanical type. The development residence time of the substrate can be roughly calculated by dividing the length of the transport path in the development tank by the transport speed. In a manufacturing line, the throughput of substrates is typically the load time that can be operated in the development process, for example, 500, 1000, 2000, 3000 or 5000 sheets, or the length of a work shift is typically the load time that can be operated in the development process, for example, 8 hours, 16 hours or 24 hours.

[0028] A method for monitoring colloids in a developer according to one embodiment of the present invention will now be described with reference to FIG. FIG. 2 is a flowchart of a method for monitoring colloids in a developer according to one embodiment of the present invention. A method for monitoring colloids in a developer according to one embodiment of the present invention includes determining a change in the zeta potential distribution of colloids in the developer (step S210), determining a change in the particle size distribution of colloids in the developer (step S220), and sending a warning message to change the developer based on the change in the zeta potential distribution and the change in particle size distribution (step S230).

[0029] The developer solution described above is used to develop the exposed substrate and remove some of the resist. For example, the exposed substrate S is developed using a developer D to remove a portion of the resist. As described above, in the developing tank 101, fresh or used developer D is dispersed onto the substrate S by the nozzle 102, and the resist on the substrate S can be dissolved and removed. After the resist is dissolved, the used developer D flows by gravity to the bottom of the developing tank 101 and accumulates there, and the dissolved resist gradually accumulates in the used developer D and aggregates to form colloid C.

[0030] In step S210, the change in the zeta potential distribution of the colloid C in the developer D is determined. As described above, the detection unit 106 samples and detects the zeta potential of the colloid C in the developer D, and the calculation unit 107 can calculate the result. The method for detecting the zeta potential is not limited, and the potential can be detected by a DC electric field, an AC electric field, a pressure difference, electroosmosis, electrical conductivity, or the like. In the examples described below, the zeta potential is determined by detection using a DC electric field.

[0031] Referring to FIG. 3, FIG. 3 is a flowchart for determining the zeta potential distribution change according to one embodiment of the present invention. Step S210 further includes detecting a first zeta potential distribution of colloids in the developer at a first time point and calculating the integral of the first zeta potential distribution (step S211), detecting a second zeta potential distribution of colloids in the developer at a second time point after the first time point and calculating the integral of the second zeta potential distribution (step S212), and determining a change in zeta potential distribution based on the integral of the first zeta potential distribution and the integral of the second zeta potential distribution (step S213).

[0032] The first point in time may be a point in time before the development process has taken place, or may be any point in time during the development process. The second time point is a time point after the first time point. The interval between the first time point and the second time point may be set arbitrarily according to the needs of the production line. The interval between the first time point and the second time point may be set to a fixed time interval. For example, sampling and detection is preferably performed at intervals of 1 minute to 24 hours, more preferably at intervals of 15 minutes to 8 hours, and even more preferably at intervals of 30 minutes to 2 hours. Alternatively, the interval between the first time point and the second time point may be set to the number of developed substrates as a unit interval. For example, it is preferable to sample and detect 100 sheets / tank to 10,000 sheets / tank at each unit interval, more preferably 200 sheets / tank to 3,000 sheets / tank at each unit interval, and even more preferably 500 sheets / tank to 2,500 sheets / tank at each unit interval. Alternatively, the interval between the first and second time points may be set as the area of ​​the substrate divided by the volume of the developer, for example, in square feet per gallon.

[0033] The zeta potential distribution of colloids in the developer is detected at a first time point, and the integral of the first zeta potential distribution is calculated. The zeta potential distribution of colloids in the developer is detected at a second time point, and the integral of the second zeta potential distribution is calculated. When the first time point is a time point before the development process has yet to be performed, the integral of the first zeta potential distribution obtained at this time is, but is not limited to, the integral of the zeta potential distribution of colloids in the developer before the development process has yet to be performed. When the first time point is any time point during the development process, the integral of the first zeta potential distribution obtained at this time is the integral of the zeta potential distribution of the colloid in the developer used.

[0034] The integral of the first zeta potential distribution and the integral of the second zeta potential distribution are calculated by the following formula. Integral of zeta potential distribution = absolute value of integrating zeta potential signal intensity over zeta potential

[0035] The integration interval may be a zeta potential of 0 to +50 mV or 0 to -150 mV, and more preferably a zeta potential of 0 to +30 mV or 0 to -130 mV, but is not limited to these. The integral interval of the zeta potential distribution can be determined by the components of the resist dissolved in the developer, and can be adjusted according to the characteristics of the colloid formed by dissolving the resist in the developer, and can also be adjusted according to the needs of the product, production line, equipment, and environment. The integration method is not limited, and may be Riemann sum, trapezoidal rule, rectangular rule, or any other mathematical integration calculation method.

[0036] The change in zeta potential distribution is calculated by the following formula. Change in zeta potential distribution = (absolute value of the difference between the integral of the second zeta potential distribution and the integral of the first zeta potential distribution / integral of the first zeta potential distribution) × 100%

[0037] In step S220, the change in particle size distribution of colloid C in developer D is determined. As described above, the detection unit 106 samples and detects the particle size of the colloid C in the developer D, and the calculation unit 107 can calculate the particle size. The method for detecting the particle size is not limited, and the particle size can be detected by an optical method.

[0038] Please refer to FIG. 4, which is a flow chart for determining the particle size distribution change according to one embodiment of the present invention. Step S220 further includes detecting a first particle size distribution of colloids in the developer at a first time point and calculating an integral of the first particle size distribution (step S221), detecting a second particle size distribution of colloids in the developer at a second time point after the first time point and calculating an integral of the second particle size distribution (step S222), and determining a change in particle size distribution based on the integral of the first particle size distribution and the integral of the second particle size distribution (step S223).

[0039] As mentioned above, the first and second points in time will not be described here. The particle size distribution of the colloid in the developer is detected at a first time point and the integral of the first particle size distribution is calculated, and the particle size distribution of the colloid in the developer is detected at a second time point and the integral of the second particle size distribution is calculated. When the first time point is a time point before the development process has yet to be performed, the integral of the first particle size distribution obtained at this time is, but is not limited to, the integral of the particle size distribution of the colloid in the developer before the development process has yet to be performed. When the first time point is any time point during the development process, the integral of the first particle size distribution obtained at this time is the integral of the particle size distribution of the colloid in the developer used.

[0040] The first and second time points for detecting the zeta potential distribution may be the same as or different from the first and second time points for detecting the particle size distribution, and the order thereof is not limited. For convenience of sampling, the first and second time points for detecting the zeta potential distribution are preferably the same as the first and second time points for detecting the particle size distribution.

[0041] The integral of the first particle size distribution and the integral of the second particle size distribution are calculated by the following formula. Integral of particle size distribution = absolute value of integrating particle size signal intensity over particle size

[0042] The integral intervals are particle sizes of 0 to 5000 nm and 5000 to 1 × 10 6 nm or 0 to 1×10 6 The thickness may be, but is not limited to, nm. The integral interval of the particle size distribution can be determined by the components of the resist dissolved in the developer, and can be adjusted according to the characteristics of the colloid formed by dissolving the resist in the developer, and can also be adjusted according to the needs of the product, production line, equipment, and environment. The integration method is not limited, and may be Riemann sum, trapezoidal rule, rectangular rule, or any other mathematical integration calculation method.

[0043] The change in particle size distribution is calculated by the following formula. Change in particle size distribution = (absolute value of the difference between the integral of the second particle size distribution and the integral of the first particle size distribution / integral of the first particle size distribution) x 100%

[0044] Please refer to FIG. 5, which is a flow chart for determining particle size distribution change according to another embodiment of the present invention. In another embodiment, step S220 further includes detecting a first particle size distribution of colloids in the developer at a first time point and obtaining a first particle size distribution signal peak (step S221′), detecting a second particle size distribution of colloids in the developer at a second time point after the first time point and obtaining a second particle size distribution signal peak (step S222′), and determining a particle size distribution change based on the first particle size distribution signal peak and the second particle size distribution signal peak (step S223′).

[0045] As mentioned above, the first and second points in time are omitted here. The particle size distribution of colloids in the developer is detected at a first time point and a first particle size distribution signal peak is obtained, and the particle size distribution of colloids in the developer is detected at a second time point and a second particle size distribution signal peak is obtained. If the first time point is a time point before the development process has yet to be performed, the first particle size distribution signal peak obtained at this time is, but is not limited to, the particle size distribution signal peak of the colloid in the developer before the development process has yet to be performed. When the first time point is any time point during the development process, the first particle size distribution signal peak obtained at this time is the particle size distribution signal peak of the colloid in the developer used.

[0046] The change in particle size distribution is calculated by the following formula. Particle size distribution change = absolute value of the difference between the position or number of peaks in the second particle size distribution signal and the position or number of peaks in the first particle size distribution signal

[0047] If the number of peaks in the first particle size distribution signal is not equal to the number of peaks in the second particle size distribution signal, i.e., if the particle size distribution change is greater than 0, this indicates that a change has occurred in the particle size distribution of the colloid, for example, from a single distribution to a multi-layered distribution. Alternatively, if the position of the first particle size distribution signal peak and the position of the second particle size distribution signal peak are not equal, i.e., if the particle size distribution change is greater than 0, this indicates that the particle size distribution of the colloid has undergone a change, for example, such that a shift occurs in the particle size distribution signal peak.

[0048] In step S230, a warning message is sent to change the developer D based on the change in zeta potential distribution and the change in particle size distribution. As mentioned above, based on the zeta potential distribution change and particle size distribution change determined by the arithmetic unit 107, a warning message can be sent recommending stopping, cleaning and changing to a new developer D.

[0049] Please refer to FIG. 6, which is a flowchart of sending a warning message based on the zeta potential distribution change and the particle size distribution change according to one embodiment of the present invention. Step S230 further includes sending a warning message recommending stopping the development process and changing the developer if the zeta potential distribution change exceeds a first warning value or the particle size distribution change exceeds a second warning value, and not sending a warning message recommending stopping the development process and changing the developer if the zeta potential distribution change does not exceed the first warning value and the particle size distribution change does not exceed the second warning value. That is, step S230 further includes determining whether the change in zeta potential distribution exceeds a first warning value or whether the change in particle size distribution exceeds a second warning value (S2301), and if at least one of them is YES, sending a warning message recommending stopping the development process and changing the developer (S2302), and if both are NO, not sending a warning message recommending stopping the development process and changing the developer (S2303).

[0050] When the zeta potential distribution change is obtained from the integral of the first zeta potential distribution and the integral of the second zeta potential distribution, the first warning value is preferably 9%, more preferably 9% to 100%, and even more preferably 9% to 50%. If the change in zeta potential distribution exceeds the first warning value, it is inferred that the colloid in the developer may cause contamination, and a warning message is sent at this point to recommend stopping the development process and changing the developer, so that the operator can consider the need to stop, clean, and change to a new developer based on the warning message.

[0051] When the change in particle size distribution is obtained from the integral of the first particle size distribution and the integral of the second particle size distribution, the second warning value is preferably 20%, more preferably 20% to 300%, and even more preferably 20% to 100%. The second warning value may be 0% if a particle size distribution change is obtained from the first particle size distribution signal peak and the second particle size distribution signal peak, i.e., there is a change in the position or number of particle size distribution signal peaks, indicating that the colloid in the developer is unstable. If the change in particle size distribution exceeds the second warning value, it is inferred that the colloids in the developer may cause contamination, and a warning message is sent at this point recommending stopping the development process and changing the developer, so that the operator can consider the need to stop, clean, and change to a new developer based on the warning message.

[0052] The first warning value and the second warning value are not limited to the above numerical values. For example, a calibration curve of the change in particle size and zeta potential of colloids in the developer over time can be created, and a first warning value and a second warning value can be set corresponding to the first and second time points to be detected. Alternatively, the first warning value and the second warning value can be determined based on the components of the resist dissolved in the developer, and can be adjusted according to the characteristics of the colloid formed when the resist is dissolved in the developer, and can also be adjusted according to the needs of the product, production line, equipment, and environment.

[0053] If the change in zeta potential distribution does not exceed the first warning value and the change in particle size distribution does not exceed the second warning value, it is inferred that the colloids in the developer are stable and have not accumulated to the extent that staining occurs, and at this point no warning message is sent to advise stopping the development process and changing the developer, and the operator can recover the developer and use it for the next development process.

[0054] A method for monitoring colloids in a developer according to an embodiment of the present invention sends a warning message for changing the developer based on changes in the zeta potential distribution and particle size distribution of colloids in the developer, and the warning message can be used as a reference indicator for determining whether to stop the development process and perform cleaning or change the developer. In contrast to the known technology of monitoring the hydrogen index as the basis for stopping the development process, the present invention uses the change in the physicochemical properties of the colloid in the developer as a reference indicator, which can better reflect the changes in the properties and content of the colloid that cause contamination in the developer, ensuring that the developer can be used most effectively before changing or cleaning the developer tank. This not only maximizes the efficient use of developer, but also minimizes stoppages, reduces cleaning frequency, reduces chemical usage and, most importantly, saves water and reduces carbon emissions during the development process.

[0055] In addition, in the method for monitoring colloids in a developer according to an embodiment of the present invention, determining the change in the zeta potential distribution of colloids in the developer (step S210) and determining the change in the particle size distribution of colloids in the developer (step S220) may be considered as steps for quantifying the change in colloids in the developer. The change in zeta potential distribution and particle size distribution of colloids in the developer may be the basis for a decision to send a warning message to change the developer, as well as the result of quantifying the colloid change. Quantification of colloidal changes can be applied not only to monitoring the development process, but also to the design of developer solutions, resist designs, process designs, cost evaluation, and so on.

[0056] In another embodiment, in the method for monitoring colloids in a developer of the present invention, in addition to sending a warning message to change the developer based on changes in the zeta potential distribution and particle size distribution (step S230), it is also possible to send a warning message to change the developer based on changes in the zeta potential distribution and particle size distribution. For example, as described above, the zeta potential distribution and particle size distribution of the colloid are detected at a first time point and a second time point, and the change in the zeta potential distribution and the change in the particle size distribution are calculated, which are defined as the first change in the zeta potential distribution and the first change in the particle size distribution, respectively. Next, referring to the above, the zeta potential distribution and particle size distribution of the colloid are detected at the third and fourth time points, and the change in zeta potential distribution and the change in particle size distribution are calculated, which are referred to as the second zeta potential distribution change and the second particle size distribution change, respectively. The change in zeta potential distribution change is the difference between the first zeta potential distribution change and the second zeta potential distribution change, and the change in particle size distribution change is the difference between the first particle size distribution change and the second particle size distribution change. It is possible to set warning values ​​for changes in the zeta potential distribution and changes in the particle size distribution, and the warning values ​​can be determined based on the components of the resist dissolved in the developer, and can be adjusted according to the characteristics of the colloid formed when the resist dissolves in the developer, and can also be adjusted according to the needs of the product, production line, equipment, and environment.

[0057] An antifouling composition according to one embodiment of the present invention will be described below. The antifouling composition contains 0 to 99.5% by weight of water, 0.5 to 1.5% by weight of a basic substance or mixture including tetramethylammonium hydroxide, tetra-n-butylammonium hydroxide, potassium carbonate, sodium carbonate, or ammonium carbonate, 0.001 to 0.5% by weight of a dispersant, 0.001 to 0.5% by weight of a wetting agent, 0.001 to 0.5% by weight of a foam suppressor, and 0.001 to 0.5% by weight of an antifoaming agent. In another embodiment, the antifouling composition can include 98.45 to 98.65 wt. % water, 1 wt. % basic material or mixture including tetramethylammonium hydroxide, tetra-n-butylammonium hydroxide, potassium carbonate, sodium carbonate, or ammonium carbonate, 0.1 to 0.2 wt. % dispersant; 0.015 to 0.03 wt. % wetting agent, 0.1 to 0.25 wt. % foam suppressor, and 0.03 to 0.2 wt. % antifoaming agent.

[0058] More preferably, the water is deionized water. Water serves as a vehicle to disperse the other ingredients in water to form a solution for ease of addition.

[0059] A basic substance or mixture can maintain the pH value of the solution and has a basic hydroxyl group OH - or carbonate group CO3 2- supply. Basic hydroxyl group OH - or carbonate group CO3 2- is used to promote the aggregation of resist components and residual materials into aggregates to form electric double layer colloids and stably suspend them in the developer. The basic substance or mixture can include tetramethylammonium hydroxide, tetra-n-butylammonium hydroxide, potassium carbonate, sodium carbonate, or ammonium carbonate.

[0060] Dispersants are used to control the interfacial stability of the developer, resist components and residual material ions. The dispersant preferably contains an organic active substance having a carbon-carbon triple bond with a Griffin hydrophilic-lipophilic balance (HLB) of 4 to 18, an organic active substance having a carbon-carbon double bond with an HLB of 3 to 18 and an aromatic ring structure, or a polycarboxylate polymer having a quaternary ammonium salt functional group, and more preferably contains an organic active substance having a carbon-carbon triple bond with an HLB of 4 to 18. Specifically, the dispersant may be 2,4,7,9-tetramethyl-5-decene-4,7-diol polyoxyethylene ether (HLB of 4 to 18, more preferably HLB of 8 to 15), 2-butyne-1,4-diol polyoxyethylene ether (HLB of 4 to 18, more preferably HLB of 8 to 15), 2,4,7,9-tetramethyl-5-decene-4,7-diol polyoxyethylene / polyoxypropylene polyether polyol (HLB of 4 to 18, more preferably HLB of 8 to 15), 2-butyne-1,4-diol polyoxyethylene / polyoxypropylene polyether polyol (HLB of 4 to 18, more preferably HLB of 8 to 15), or 2-butyne-1,4-diol polyoxyethylene / polyoxypropylene polyol. The composition contains at least one selected from the group consisting of propylene polyether polyol (HLB of 4 to 18, more preferably HLB of 8 to 15), bio-derived cardanol polyoxyethylene ether (HLB of 3 to 18, more preferably HLB of 8 to 15), nonylphenol polyoxyethylene ether (HLB of 3 to 18, more preferably HLB of 8 to 15), alkylphenol polyoxyethylene ether (HLB of 3 to 18, more preferably HLB of 8 to 15), and polycarboxylate polymers having a quaternary ammonium salt functional group.

[0061] Wetting agents are used to improve the expression of dispersants. The wetting agent includes at least one selected from the group consisting of monoethylene glycol, diethylene glycol, triethylene glycol, polyethylene glycol (number average molecular weight of 100 to 600), monoethylene glycol butyl ether, diethylene glycol butyl ether, triethylene glycol butyl ether, polyethylene glycol butyl ether, ethylene carbonate, propylene carbonate, an ethylene oxide adduct of 2 to 3 molecules of a C8 to 10 aliphatic alcohol, a copolymer adduct of ethylene oxide and propylene oxide (having less than 11 carbon atoms and an HLB of 4 to 10), an ethylene oxide adduct of a linear secondary alcohol (HLB of 4 to 10), and an ethylene oxide adduct of a branched secondary alcohol (HLB of 4 to 10).

[0062] Since the dispersant and wetting agent in the antifouling composition are distributed at the gas-liquid interface between air and water, it is difficult to avoid the generation of bubbles. Excessive foam can cause the developer tank to overflow, risking stopping the development process. Therefore, the occurrence of the above problems can be controlled by adding a foam inhibitor or defoamer to the antifouling composition. Foam suppressors include 2-3 ethylene oxide adducts of natural C12-14 fatty alcohols, 2-3 ethylene oxide adducts of isotridecanol, 2-3 ethylene oxide adducts of isodecanol, 2-3 ethylene oxide adducts of oleyl alcohol, 2-3 ethylene oxide adducts of C16-18 fatty alcohols, ethylene oxide / propylene oxide triblock copolymers, random copolymers of C8-14 fatty alcohols and ethylene oxide / propylene oxide, block copolymers of C8-14 fatty alcohols and ethylene oxide / propylene oxide, random copolymers of natural C12-14 fatty alcohols and ethylene oxide / propylene oxide, and natural C12-14 fatty alcohols. The copolymer contains at least one selected from the group consisting of a block copolymer of an aliphatic alcohol and ethylene oxide / propylene oxide, a random copolymer of isotridecanol and ethylene oxide / propylene oxide, a block copolymer of isotridecanol and ethylene oxide / propylene oxide, a random copolymer of oleyl alcohol and ethylene oxide / propylene oxide, a block copolymer of oleyl alcohol and ethylene oxide / propylene oxide, a random copolymer of C16-18 aliphatic alcohol and ethylene oxide / propylene oxide, a block copolymer of C16-C18 aliphatic alcohol and ethylene oxide / propylene oxide, and polypropylene glycol having a number average molecular weight of less than 2000.

[0063] The antifoaming agent includes at least one selected from the group consisting of white mineral oil, palm kernel oil, palm stearin oil, horse oil, shea butter, and wax.

[0064] The antifouling composition according to the embodiment of the present invention may be used by being injected alone into a unit of a development process, or may be added to a developer or resist, but is not limited thereto. For example, the antifouling composition may be added to a chemical agent that comes into contact with a resist or a developer during the development process.

[0065] Another embodiment of the present invention provides a developer composition comprising a developer and the antifouling composition described above.

[0066] Yet another embodiment of the present invention provides a resist composition comprising a resist and the antifouling composition.

[0067] In the following experiment, the antifouling composition of the present invention is added to a developer, and a substrate having a dry film resist is subjected to the development process as described above with reference to FIG. 1, and the zeta potential distribution and particle size distribution of the colloids in the developer are detected using the method for monitoring colloids in the developer. The substrate used in this experiment is copper foil, and a dry film resist (model number 115T, Evergreen Materials, Taiwan) is provided on the copper foil. The components of the control, comparative and example antifouling compositions are shown in Table 1. The zeta potential and particle size are detected using a zeta potential particle size analyzer (model number ELSZ-2000, Otsuka Electronics).

[0068] [Table 1]

[0069] A specific area of ​​resist is dissolved using a developer containing the antifouling composition of the control, comparative example, or example, and the resist is sampled using the method for monitoring colloids in a developer of the present invention, and changes in the zeta potential distribution and particle size distribution of the colloids in the developer are detected. The experimental results are shown in Tables 2 and 3, where Unit 1 represents dissolving 1 square foot of dry film resist, Unit 2 represents dissolving 2 square feet of dry film resist, and Unit 3 represents dissolving 3 square feet of dry film resist. The experimental results show that the antifouling compositions of Examples 1 and 2 can suppress changes in zeta potential distribution and particle size distribution, and that the antifouling compositions of Examples 1 and 2 can suppress the aggregation and size increase of colloids in the developer.

[0070] [Table 2]

[0071] [Table 3]

[0072] The zeta potential distributions obtained from different integration intervals are compared. As can be seen from Table 4, when the zeta potential integral interval is 0 to +500 mV or 0 to -950 mV, the obtained change in zeta potential distribution is not significant, but when the zeta potential integral interval specified by the examples of the present invention is 0 to +50 mV or 0 to -150 mV, the change in zeta potential distribution is significant. This indicates that the method for monitoring colloids in a developer according to the examples of the present invention has higher sensitivity when the zeta potential integral interval specified is 0 to +50 mV or 0 to -150 mV.

[0073] [Table 4]

[0074] A development process is carried out using a developer containing the antifouling composition of the control, comparative example, or example. In this experiment, the first zeta potential distribution and the first particle size distribution were detected at time 0, which was set as the first time point, and the integral of the first zeta potential distribution and the integral of the first particle size distribution were calculated. The second zeta potential distribution and the second particle size distribution were detected at time points 8, 24, 36, and 48 hours, which were set as the second time point, and the integral of the second zeta potential distribution and the integral of the second particle size distribution were calculated. The changes in zeta potential distribution and particle size distribution were calculated using the parameters. The detection results of the zeta potential distribution are shown in FIGS. 7A to 7C and Table 5, and the detection results of the particle size distribution are shown in FIGS. 8A to 9C and Table 6.

[0075] 7A to 7C show the detection results of the zeta potential distribution, and the quantitative values ​​are shown in Table 5. As can be seen from Figures 7A to 7C and Table 5, the change in zeta potential distribution in the group using the control-containing developer had a difference of 15% from that at 0 hours at 8 hours, and a difference of 17% at 24 hours. With a first warning value of 9% as standard, the control sends a warning message at the 8th hour, allowing the operator to consider the need to stop, clean and change to fresh developer. On the other hand, the change in zeta potential distribution in the group using the developer containing the Example was less than 9% at 36 hours, at which point no warning message was sent and the operator could continue the development process. At 48 hours, only Example 2 reached 9%, at which point a warning message was sent and the operator could consider whether to continue the development process or stop it, wash it, and change to a new developer.

[0076] 8A to 8C show the results of detecting particle size distribution for the control, and FIGS. 9A to 9C show the results of detecting particle size distribution for the example. The quantitative values ​​are shown in Table 6. As can be seen from Figures 8A to 9C and Table 6, the change in particle size distribution in the group using the developer containing the control had a difference of 14% from that at 0 hours at 8 hours, and a difference of 1798% at 24 hours. With a second warning value of 20% as standard, the control sends a warning message at 24 hours, allowing the operator to consider the need to stop, clean, and change to fresh developer. On the other hand, the particle size distribution change in the group using the developer containing the example was less than 20% at 24 hours, so no warning message was sent and the operator could continue the development process. As can be seen from the above experiments, the antifouling compositions of Examples 1 and 2 can inhibit the aggregation and size increase of colloids in the developer. Incidentally, at 36 hours, the change in particle size distribution in Example 2 increases suddenly, and this can be used as a reference index to consider whether to stop the process, wash the system, and change the developer.

[0077] [Table 5]

[0078] [Table 6]

[0079] The changes in the particle size distribution signal peaks are shown in FIGS. 8A to 9C and Table 7. As can be seen from FIGS. 8A to 8C and Table 7, at 8 hours and 48 hours, the control showed changes in the particle size distribution signal peak. At 0 hours, there are concentrated signal peaks, and at 8 hours and 48 hours, the number of signal peaks increases, there is a shift in their position, and there is a change in intensity. At 8 hours, a 1.2% signal peak appeared at 2500 nm, and at 24 hours, a 1.1% signal peak appeared at 5 × 10 5 nm, so at the 8th hour a warning message is sent indicating that the operator may need to stop, clean and change to a new developer. On the other hand, as can be seen from Figures 9A to 9C and Table 7, at 48 hours, neither the position nor the number of signal peaks of Example 1 changes, and at this time, no warning message is sent and the operator can continue the development process; at 48 hours, a 0.7% signal peak appears at 2500 nm of Example 2, and at this time, a warning message is sent and the operator can consider the need to stop, clean, and change to a new developer.

[0080] [Table 7]

[0081] The gas-liquid interface in the developing tank and the solid surfaces of the developing tank were visually observed to see whether or not any stains were formed. The results are shown in Table 8. As can be seen from Table 8, at 8 hours the control started to stain, and at 24 hours the stain started to aggregate, at which point it is recommended to stop, wash and change to a new developer. On the other hand, in Example 1, no stains appeared even after 48 hours, and in Example 2, stains appeared after 48 hours.

[0082] [Table 8]

[0083] As can be seen from the above experimental results, the antifouling composition of the embodiment of the present invention can suppress the aggregation and size increase of colloids in the developer, thereby extending the working time of the developer, reducing the number of stoppages, reducing the frequency of cleaning, reducing the use of chemicals, and most importantly, saving water for the development process and reducing carbon emissions.

[0084] In the following experiment, the antifouling composition of the embodiment of the present invention is added to a developer, and a developing process is carried out on a substrate having a resist ink as described above with reference to FIG. 1, and the zeta potential distribution and particle size distribution of the colloids in the developer are detected using the method for monitoring colloids in the developer. The substrate used in this experiment is copper foil, and resist ink is applied to the copper foil. The components of the control, comparative and example antifouling compositions are shown in Table 9. The zeta potential and particle size are detected using a zeta potential particle size analyzer (model number ELSZ-2000, Otsuka Electronics).

[0085] [Table 9]

[0086] A specific mass of resist is dissolved using a developer containing the antifouling composition of the control, comparative example, or example, and the resist is sampled using the method for monitoring colloids in a developer of the present invention, and changes in the zeta potential distribution and particle size distribution of the colloids in the developer are detected. The experimental results are shown in Tables 10 and 11, where 1g represents dissolving 1 gram of resist ink, 2g represents dissolving 2 grams of resist ink, and 4g represents dissolving 4 grams of resist ink. The experimental results show that the antifouling compositions of Examples 3 and 4 can suppress changes in zeta potential distribution and particle size distribution, indicating that the antifouling compositions of Examples 3 and 4 can suppress the aggregation and size increase of colloids in the developer.

[0087] [Table 10]

[0088] [Table 11]

[0089] As can be seen from the above experimental results, even in resist ink systems with more complex components, the antifouling composition of the present invention can also inhibit the aggregation and size increase of colloids in the inhibited developer, thereby extending the working time of the developer, reducing the number of stoppages, reducing the frequency of cleaning, reducing the use of chemicals, and most importantly, saving water for the development process and reducing carbon emissions.

[0090] The method for monitoring colloids in a developer according to an embodiment of the present invention sends a warning message to change the developer based on changes in the zeta potential distribution and particle size distribution of colloids in the developer, and the warning message can be used as a reference indicator to determine whether to stop the development process, perform cleaning, and change the developer. In contrast to the conventional technology of monitoring the hydrogen index as the basis for stopping the development process, the present invention uses the change in the physicochemical properties of the colloid in the developer as a reference index, which can better reflect the changes in the properties and content of the colloid that cause contamination in the developer, ensuring that the developer can be used most effectively before changing and cleaning the developer tank. The antifouling composition of the present invention can inhibit the aggregation and size increase of colloids in a developer, thereby inhibiting the generation of stains and extending the working time of the developer. The use of the method for monitoring colloids in a developer solution according to an embodiment of the present invention and the antifouling composition according to an embodiment of the present invention in the development process not only allows for efficient use of the developer solution, but also minimizes the number of stoppages, reduces cleaning frequency, reduces chemical usage, and most importantly, saves water and reduces carbon emissions in the development process.

Claims

1. 1. A method for monitoring colloids in a developer solution, comprising: determining a change in the zeta potential distribution of colloids in the developer; determining the change in particle size distribution of colloids in the developer; and sending a warning message to change the developer based on the change in zeta potential distribution and the change in particle size distribution; the change in zeta potential distribution is the difference between a first time point and a second time point; the change in particle size distribution is the difference between the first time point and the second time point; sending the warning message to change the developer if the change in zeta potential distribution exceeds a first warning value or if the change in particle size distribution exceeds a second warning value; not sending the warning message to change the developer if the change in zeta potential distribution does not exceed a first warning value and the change in particle size distribution does not exceed a second warning value; The developer is used to develop the exposed substrate and remove a portion of the resist. Methods for monitoring colloids in developers.

2. Obtaining a change in the zeta potential distribution of colloids in the developer includes: detecting a first zeta potential distribution of colloids in the developer solution at the first time point and calculating an integral of the first zeta potential distribution; detecting a second zeta potential distribution of colloids in the developer at a second time point after the first time point and calculating an integral of the second zeta potential distribution; and determining the change in zeta potential distribution based on an integral of the first zeta potential distribution and an integral of the second zeta potential distribution; The integral of the first zeta potential distribution and the integral of the second zeta potential distribution are expressed by the following equation: Integral of zeta potential distribution = absolute value obtained by integrating the zeta potential signal intensity with respect to the zeta potential (the integral interval is a zeta potential of 0 to +50 mV or 0 to -150 mV). It is calculated by The change in zeta potential distribution is expressed by the following formula: Change in zeta potential distribution = (absolute value of the difference between the integral of the second zeta potential distribution and the integral of the first zeta potential distribution / integral of the first zeta potential distribution) × 100% We obtain 10. The method of claim 1, wherein the colloid in a developer solution is monitored.

3. Determining the change in particle size distribution of colloids in the developer includes: detecting a first particle size distribution of colloids in the developer solution at the first time point and calculating an integral of the first particle size distribution; detecting a second particle size distribution of colloids in the developer at a second time point after the first time point and calculating an integral of the second particle size distribution; and determining the change in particle size distribution based on an integral of the first particle size distribution and an integral of the second particle size distribution; The integral of the first particle size distribution and the integral of the second particle size distribution are expressed by the following formula: It is calculated by Integral of particle size distribution = absolute value obtained by integrating the particle size signal intensity with respect to the particle size (integral intervals are particle sizes of 0 to 5000 nm and 5000 to 1 × 10 ６ nm or 0 to 1×10 ６ nm.) The particle size distribution change is calculated by the following formula: Change in particle size distribution=(absolute value of difference between integral of second particle size distribution and integral of first particle size distribution / integral of first particle size distribution)×100% We obtain 10. The method of claim 1, wherein the colloid in a developer solution is monitored.

4. Determining the change in particle size distribution of colloids in the developer includes: detecting a first particle size distribution of colloids in the developer at the first time point and obtaining a first particle size distribution signal peak; detecting a second particle size distribution of colloids in the developer at a second time point after the first time point and obtaining a second particle size distribution signal peak; and determining the particle size distribution change based on the first particle size distribution signal peak and the second particle size distribution signal peak; The particle size distribution change is calculated by the following formula: Particle size distribution change = absolute value of the difference between the position or number of peaks of the second particle size distribution signal and the position or number of peaks of the first particle size distribution signal We obtain 10. The method of claim 1, wherein the colloid in a developer solution is monitored.

5. 2. The method of monitoring colloids in developer solutions according to claim 1, wherein the first warning value is 9% and the second warning value is 20%.

6. 2. The method of monitoring colloids in developer solutions according to claim 1, wherein the first warning value is 9% and the second warning value is 0%.

7. the developer comprises an antifouling composition; The antifouling composition comprises: 0 to 99.5% by weight of water, a basic substance or mixture containing 0.5 to 1.5% by weight of tetramethylammonium hydroxide, tetra-n-butylammonium hydroxide, potassium carbonate, sodium carbonate or ammonium carbonate; 0.001 to 0.5 wt. % of a dispersing agent comprising an organic active material having a carbon-carbon triple bond with a Griffin hydrophilic-lipophilic balance (HLB) of 4 to 18, an organic active material having a carbon-carbon double bond with an HLB of 3 to 18 and an aromatic ring structure, or a polycarboxylate polymer having a quaternary ammonium salt functional group; 0.001 to 0.5 wt % of a wetting agent comprising at least one selected from the group consisting of monoethylene glycol, diethylene glycol, triethylene glycol, polyethylene glycol (number average molecular weight of 100 to 600), monoethylene glycol butyl ether, diethylene glycol butyl ether, triethylene glycol butyl ether, polyethylene glycol butyl ether, ethylene carbonate, propylene carbonate, an ethylene oxide adduct of 2 to 3 molecules of a C8-10 aliphatic alcohol, a copolymer adduct of ethylene oxide and propylene oxide (having less than 11 carbon atoms and an HLB of 4 to 10), an ethylene oxide adduct of a linear secondary alcohol (an HLB of 4 to 10), and an ethylene oxide adduct of a branched secondary alcohol (an HLB of 4 to 10); Ethylene oxide adducts of 2-3 molecules of natural C12-14 fatty alcohols, ethylene oxide adducts of 2-3 molecules of isotridecanol, ethylene oxide adducts of 2-3 molecules of isodecanol, ethylene oxide adducts of 2-3 molecules of oleyl alcohol, ethylene oxide adducts of 2-3 molecules of C16-18 fatty alcohols, ethylene oxide / propylene oxide triblock copolymers, random copolymers of C8-14 fatty alcohols and ethylene oxide / propylene oxide, block copolymers of C8-14 fatty alcohols and ethylene oxide / propylene oxide, random copolymers of natural C12-14 fatty alcohols and ethylene oxide / propylene oxide, copolymers of natural C12-14 fatty alcohols and ethylene 0.001 to 0.5 wt. % of a foam suppressor comprising at least one selected from the group consisting of a block copolymer of ethylene oxide and propylene oxide, a random copolymer of isotridecanol and ethylene oxide / propylene oxide, a block copolymer of isotridecanol and ethylene oxide / propylene oxide, a random copolymer of oleyl alcohol and ethylene oxide / propylene oxide, a block copolymer of oleyl alcohol and ethylene oxide / propylene oxide, a random copolymer of C16-18 aliphatic alcohol and ethylene oxide / propylene oxide, a block copolymer of C16-18 aliphatic alcohol and ethylene oxide / propylene oxide, and a polypropylene glycol having a number average molecular weight of less than 2000; and 0.001 to 0.5 wt. % of an antifoaming agent comprising at least one selected from the group consisting of white mineral oil, palm kernel oil, palm stearin oil, horse oil, shea butter, and wax; 2. A method for monitoring colloids in a developer solution according to claim 1, comprising:

8. 8. The method for monitoring colloids in a developer solution according to claim 7, wherein the dispersant comprises at least one selected from the group consisting of 2,4,7,9-tetramethyl-5-decene-4,7-diol polyoxyethylene ether (HLB 4 to 18), 2-butyne-1,4-diol polyoxyethylene ether (HLB 4 to 18), 2,4,7,9-tetramethyl-5-decene-4,7-diol polyoxyethylene / polyoxypropylene polyether polyol (HLB 4 to 18), 2-butyne-1,4-diol polyoxyethylene / polyoxypropylene polyether polyol (HLB 4 to 18), bio-derived cardanol polyoxyethylene ether (HLB 3 to 18), nonylphenol polyoxyethylene ether (HLB 3 to 18), alkylphenol polyoxyethylene ether (HLB 3 to 18), and polycarboxylate polymers having quaternary ammonium salt functional groups.

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