90 results about "Silicon interposer" patented technology

An improved integrated circuit package for providing built-in heating or cooling to a semiconductor chip is provided. The improved integrated circuit package provides increased operational bandwidth between different circuit devices, e.g. logic and memory chips. The improved integrated circuit package does not require changes in current CMOS processing techniques. The structure includes the use of a silicon interposer. The silicon interposer can consist of recycled rejected wafers from the front-end semiconductor processing. Micro-machined vias are formed through the silicon interposer. The micro-machined vias include electrical contacts which couple various integrated circuit devices located on the opposing surfaces of the silicon interposer. The packaging includes a Peltier element.

Scalable silicon (Si) interposer configurations that support low voltage, low power operations are provided. In one aspect, a Si interposer is provided which includes a plurality of through-silicon vias (TSVs) within a first plane thereof adapted to serve as power, ground and signal interconnections throughout the first plane such that the TSVs that serve as the power and ground interconnections are greater in number and / or size than the TSVs that serve as the signal interconnections; and a plurality of lines within a second plane of the interposer in contact with one or more of the TSVs in the first plane, the second plane being adjacent to the first plane, adapted to serve as power, ground and signal interconnections throughout the second plane such that the lines that serve as the power and the ground interconnections are greater in number and / or size than the lines that serve as the signal interconnections.

An electronic device and method of making the device. The device includes: a carrier; a silicon interposer connected to a top surface of the carrier, the interposer having wires extending from a top surface of the interposer, through the interposer, to a bottom surface of the interposer, the wires at the bottom surface of the interposer electrically connected to wires in a top surface of the carrier; an integrated circuit chip connected to the top surface of the interposer, wires at a surface of the integrated circuit chip electrically connected to the wires in the top surface of the interposer; and a stress relief structure attached to the interposer, the stress relief structure either (i) not electrically connected to the wires of the interposer or integrated circuit chip or (ii) electrically connected to ground by wires of the interposer or wires of the integrated circuit chip.

A standard memory chip (150) is vertically assembled with two processor chips (130, 140) of split architecture by means of a small silicon interposer (120) stacked onto a large silicon interposer (110); both interposers include through-silicon vias (TSVs), while the chips are free of TSVs. The TSVs of small interposer (120) connect to the memory chip (150) and to the bottom interposer (110). Symmetrically positioned relative to interposer (120), and connected to it by short signal traces, chips (130, 140) are attached to the TSVs of interposer 110, which in turn is attached to a substrate (160) with supply connections.

In a wiring substrate according to the present invention, a base wiring board is constructed by stacking a plurality of unit wiring boards each having wiring patterns which enable an electrical connection between upper and lower sides, in a state that the plurality of unit wiring boards are connected to each other via a connection terminal, and a silicon interposer is stacked on the base wiring board via a connection terminal, and a resin portion is filled in a gap between the plurality of unit wiring boards as well as a gap between the base wiring board and the silicon interposer, and a resin portion serves as a substrate which integrates the base wiring board and the silicon interposer.

A semiconductor package device includes a first interconnection structure, a non-silicon interposer and a first die. The first interconnection structure has a first pitch. The non-silicon interposer surrounds the first interconnection structure. The non-silicon interposer includes a second interconnection structure having a second pitch. The second pitch is larger than the first pitch. The first die is above the first interconnection structure and is electrically connected to the first interconnection structure.