Semiconductor devices with reduced carbon vacancy concentrations and methods for manufacturing semiconductor devices - Patents.com

Abstract

The present disclosure relates to a semiconductor device (1) comprising at least one epitaxial layer (2) made of a first semiconductor material comprising carbon and having a [0001] crystallographic axis. At least one implanted region (4) is formed in a sidewall (3a) of the epitaxial layer (2), the normal direction of the sidewall (3a) being perpendicular to the [0001] crystallographic axis. At least one portion of the epitaxial layer (2) is implanted with carbon vacancies (V C The present disclosure further relates to a method for manufacturing a semiconductor device (1), in which ions are implanted through at least one sidewall (3a) of at least one epitaxial layer (2).

Description

[Technical Field]

[0001] statement The present disclosure relates to a semiconductor device including at least one epitaxial layer fabricated from a first semiconductor material comprising carbon, particularly silicon carbide, at least a portion of the epitaxial layer having a reduced concentration of carbon vacancies relative to the first semiconductor material of the at least one epitaxial layer as grown. The present disclosure also relates to a method for fabricating such a semiconductor device. [Background technology]

[0002] US Pat. No. 7,754,589 relates to a method for improving the quality of SiC layers by effectively reducing or eliminating carrier trapping centers in as-grown SiC crystals. Summary of the Invention [Means for solving the problem]

[0003] Embodiments of the present disclosure relate to improved semiconductor devices and methods for fabricating them. For example, there is a need for semiconductor devices that have improved lifetimes, low defect densities, and / or can be flexibly fabricated using conventional semiconductor processing steps.

[0004] According to a first aspect, there is provided a semiconductor device comprising at least one epitaxial layer fabricated from a first semiconductor material comprising carbon, in particular silicon carbide, and having a 0001 crystallographic axis. At least one implanted region is formed in a sidewall of the epitaxial layer, the normal to the sidewall being perpendicular to the 0001 crystallographic axis. At least one portion of the epitaxial layer has a reduced concentration of carbon vacancies relative to the as-grown first semiconductor material of the at least one epitaxial layer.

[0005] By providing implanted regions on the sidewalls of the epitaxial layer, the implantation can be performed, typically parallel to the 0001 crystallographic axis, independently of other processing steps that may be performed on or through the front surface of the epitaxial layer, for example. At the same time, the mobility of the implanted species is improved, thereby simplifying subsequent annealing of at least one epitaxial layer and consequently reducing the concentration of carbon vacancies therein.

[0006] According to at least one embodiment, at least one implanted region is formed on one of a plurality of sidewalls of at least one semiconductor chip including at least one epitaxial layer. By implanting species through the sidewall of the semiconductor chip, carbon vacancies can be reduced on an already isolated and substantially completed semiconductor circuit component.

[0007] According to at least one embodiment, a semiconductor device includes at least one trench having two sidewalls formed in at least one epitaxial layer. At least one implantation region is formed on at least one of the two sidewalls of the at least one trench. At least one portion of the epitaxial layer corresponds to a sublayer extending in a plane perpendicular to the 0001 crystallographic axis, the thickness of the sublayer corresponding to or exceeding the depth of the at least one trench. The use of the trench allows for the implantation of species onto the vertical sidewalls of the epitaxial layer with a relatively large spatial extent.

[0008] In at least one embodiment, the semiconductor device further comprises at least one electrode formed on a top or bottom surface of the at least one epitaxial layer, thereby forming an electroactive region, and the at least one implanted region is formed outside the electroactive region. For example, the at least one implanted region may be formed in spatial proximity to the electroactive region of the semiconductor device. Such a spatial arrangement allows for the reduction of carbon vacancies in the electroactive region without interfering with any elements within the electroactive region that perform the function of the semiconductor device.

[0009] For example, the first semiconductor material may include one of an n-type 4H—SiC semiconductor material or an n-type 6H—SiC semiconductor material. For example, the at least one implanted region may include an implant species including at least one of carbon ions, aluminum ions, and silicon ions. For example, the at least one implanted region may include an implant defect region including amorphous silicon. For example, at least one portion of the epitaxial layer may include a 10 10 / cm 3 Concentration of carbon vacancies less than Z 1 / 2 may have

[0010] According to different embodiments, the semiconductor device may include different power electronic components such as a PIN diode, a BJT, an IGBT, or a JBS diode.

[0011] According to a second aspect of the present disclosure, there is provided a method for manufacturing a semiconductor device, the method comprising the steps of growing at least one epitaxial layer made from a first semiconductor material comprising carbon, in particular silicon carbide, and having a 0001 crystallographic axis, and implanting ions through at least one sidewall of the at least one epitaxial layer to form at least one implanted region in a plane perpendicular to the 0001 crystallographic axis, thereby reducing a concentration of carbon vacancies in the first semiconductor material relative to the as-grown at least one epitaxial layer.

[0012] The above steps allow for the fabrication of semiconductor devices according to the first aspect. They allow for an improved degree of flexibility during fabrication. In particular, the ion implantation step can be performed towards the end of the fabrication process, after other steps that adversely affect carbon vacancies in at least one epitaxial layer have been completed.

[0013] According to at least one embodiment, the method further includes annealing or proton irradiating the at least one epitaxial layer after ion implantation to further reduce the concentration of carbon vacancies in the first semiconductor material, the annealing or proton irradiating serving to diffuse the generated interstitial carbon.

[0014] According to at least one embodiment, prior to implanting ions through the at least one sidewall, the method further includes performing a plurality of processing steps to form at least one semiconductor circuit component including at least a portion of the at least one epitaxial layer, and separating the at least one semiconductor circuit component to obtain a semiconductor chip having a top surface perpendicular to a crystal axis and a plurality of sidewalls perpendicular to the top surface. Implanting ions through the sidewall of the semiconductor chip can reduce carbon vacancies in the separated, essentially completed semiconductor component.

[0015] According to another embodiment, the method further includes forming at least one trench having two sidewalls in the at least one epitaxial layer, and the step of implanting ions through the at least one sidewall includes plasma immersion ion implantation (PIII) of at least one of boron (B) ions, carbon (C) ions, aluminum (Al) ions, germanium (Ge) ions, nitrogen (N) ions, phosphorus (P) ions, arsenic (As) ions, oxygen (O) ions, sulfur (S) ions, hydrogen (H) ions, argon (Ar) ions, or silicon (Si) ions through the two sidewalls of the at least one trench.

[0016] Further aspects, embodiments and advantages of the present invention are disclosed in the following detailed description of the embodiments and the appended claims.

[0017] The method for manufacturing a semiconductor device according to the second aspect described above is particularly suitable for manufacturing a semiconductor device according to the first aspect, and therefore features and advantages described in relation to the semiconductor device can be used in the manufacturing method, and vice versa.

[0018] Thus, all features described with respect to one of the embodiments are also disclosed herein with respect to the other embodiments, even if the respective feature is not explicitly mentioned in the context of a particular embodiment.

[0019] The accompanying drawings are included to provide a further understanding. In the drawings, elements of the same structure and / or function may be referenced by the same reference numerals. It should be understood that the embodiments shown in the drawings are illustrative representations and are not necessarily drawn to scale. [Brief explanation of the drawings]

[0020] [Figure 1] 1 is a schematic diagram of a semiconductor device according to one embodiment of the present disclosure. [Figure 2] 1 is a schematic diagram of a method for manufacturing a semiconductor device according to one embodiment of the present disclosure. [Figure 3] FIG. 2 shows DLTS spectra of the epitaxial layer according to FIG. 1 before and after implantation and annealing. [Figure 4] 1A-1D illustrate steps for fabricating a PIN diode according to one embodiment of the present disclosure. [Figure 5] 1A-1D illustrate steps for fabricating a PIN diode according to one embodiment of the present disclosure. [Figure 6] 1A-1D illustrate steps for fabricating a PIN diode according to one embodiment of the present disclosure. [Figure 7] 1A-1D illustrate steps for fabricating a BJT diode according to one embodiment of the present disclosure. [Figure 8] 1A-1D illustrate steps for fabricating a BJT diode according to one embodiment of the present disclosure. [Figure 9]1A-1D illustrate steps for fabricating a BJT diode according to one embodiment of the present disclosure. [Figure 10] 1A-1D illustrate steps for fabricating a BJT diode according to one embodiment of the present disclosure. [Figure 11] 1A-1D illustrate steps for manufacturing an IGBT according to one embodiment of the present disclosure. [Figure 12] 1A-1D illustrate steps for manufacturing an IGBT according to one embodiment of the present disclosure. [Figure 13] 1 is a schematic diagram of a semiconductor device including a trench according to one embodiment of the present disclosure. [Figure 14] FIG. 14 shows DLTS spectra of the epitaxial layer according to FIG. 13 before and after implantation and annealing. [Figure 15] 10A-10C illustrate steps for fabricating a JBS diode according to another embodiment of the present disclosure. [Figure 16] 10A-10C illustrate steps for fabricating a JBS diode according to another embodiment of the present disclosure. [Figure 17] 10A-10C illustrate steps for fabricating a JBS diode according to another embodiment of the present disclosure. [Figure 18] 10A-10C illustrate steps for fabricating a JBS diode according to another embodiment of the present disclosure. [Figure 19] 10A-10C illustrate steps for fabricating a JBS diode according to another embodiment of the present disclosure. [Figure 20] 10A-10C illustrate steps for fabricating a BJT diode according to another embodiment of the present disclosure. [Figure 21] 10A-10C illustrate steps for fabricating a BJT diode according to another embodiment of the present disclosure. [Figure 22] 10A-10C illustrate steps for fabricating a BJT diode according to another embodiment of the present disclosure. [Figure 23] 10A-10C illustrate steps for manufacturing an IGBT diode according to another embodiment of the present disclosure. [Figure 24]10A-10C illustrate steps for manufacturing an IGBT diode according to another embodiment of the present disclosure. [Figure 25] 10A-10C illustrate steps for manufacturing an IGBT diode according to another embodiment of the present disclosure. [Figure 26] FIG. 1 is a schematic diagram of a method for producing a semiconductor device according to one embodiment of the present disclosure. [Figure 27] 1 is a schematic diagram of the removal of carbon vacancies through the top surface of a semiconductor device. DETAILED DESCRIPTION OF THE INVENTION

[0021] While the present disclosure is susceptible to various modifications and alternative forms, specifics thereof have been shown by way of example in the drawings and have been described in detail. It should be understood, however, that the intention is not to limit the disclosure to the particular embodiments described. On the contrary, the intention is to cover all modifications, equivalents, and alternatives falling within the scope of the present disclosure as defined by the appended claims.

[0022] Before describing various embodiments of the present disclosure in more detail, we will first discuss conventional silicon carbide semiconductor materials and some of the challenges encountered in their processing.

[0023] The so-called carbon vacancies (V C ) is a technologically important electrically active point defect in n-type 4H silicon carbide (4H-SiC). The presence of carbon vacancies increases the conduction band edge (E C ) located 0.65 eV and 1.6 eV below Z 1 / 2 and E.H. 6 / 7 This gives rise to two levels in the bandgap of the semiconductor material called Z. 1 / 2 Because the defect level is particularly close to the conduction band edge, it acts as a recombination center, affecting the lifetime of unipolar devices and the forward voltage drop and leakage current of bipolar devices formed from such semiconductor materials.

[0024] In principle, it is possible to remove carbon vacancies from the as-grown epitaxial layer, as shown in FIG.

[0025] The semiconductor device 1 comprises a 4H—SiC epitaxial layer 2 grown on the surface of a substrate 5 with a 0001 crystallographic axis direction X as defined by the Miller-Bravais index. The 0001 crystallographic axis typically corresponds to the normal to the surface of the substrate 5. As grown, the epitaxial layer 2 contains a plurality of carbon vacancies V throughout the 4H—SiC epitaxial layer 2. C Contains carbon vacancies V C To reduce the concentration of interstitial carbon (C), the upper surface region 4a is oxidized at a temperature of 1050 to 1400°C. Alternatively, shallow carbon ion implantation may be performed on the upper surface region 4a of the SiC epitaxial layer 2. Either method is effective for implanting interstitial carbon (C) into the 4H—SiC epitaxial layer 2. I Next, the epitaxial layer 2 is annealed at a temperature exceeding 1500°C to introduce interstitial carbon C throughout the epitaxial layer 2. I Then, the interstitial carbon C I is the carbon vacancy V C As a result, the epitaxial layer 2 has a reduced carbon vacancy concentration.

[0026] As shown in Figure 27, carbon implantation is performed parallel to the

[0001] crystal axis. Interstitial carbon C I After the diffusion of C, reactive ion etching (RIE) or chemical mechanical polishing (CMP) is used to remove the C implanted layer formed in the top surface region 4a. The oxide layer contains carbon vacancies V that need to be removed using hydrofluoric acid (HF). C A similar situation occurs when oxidation is used for reduction.

[0027] Therefore, the above-described methods for reducing carbon vacancies can be performed relatively early in the manufacturing process, for example, only on the as-received epitaxial layer 2. As a result, the carbon vacancies V can be reduced toward the start of manufacturing the semiconductor device 1. CAlthough a 4H-SiC epitaxial layer 2 is obtained with a reduced concentration of carbon vacancies V, subsequent processing steps, such as activation of the heavily doped p+ regions or annealing of electrodes of semiconductor circuit components, can remove carbon vacancies V within the epitaxial layer 2. C This results in the regeneration of carbon vacancies V C If the carbon ion implantation is regenerated, a second carbon ion implantation cannot be performed because this would require implanting carbon into electrically active areas of the semiconductor device, such as the anode region or electrode. Furthermore, for relatively thick epitaxial layers 2, e.g., epitaxial layers 2 having a thickness of 100 μm or more, oxidation cannot be performed because it would consume portions of the active circuit structure.

[0028] The present disclosure aims to describe alternative methods and devices with reduced carbon vacancy concentrations compared to as-grown epitaxial layers.

[0029] 1 shows a semiconductor device 1 according to one embodiment of the present disclosure. FIG. 2 shows a carbon vacancy V in an epitaxial layer 2 of the semiconductor device 1. C Steps S1 to S3 of the method for reducing the noise are shown.

[0030] In step S1, an epitaxial layer 2 is grown on a substrate 5 or other epitaxial layer (not shown). Initially, the epitaxial layer 2 contains a relatively high concentration of carbon vacancies V C For example, the untreated n-type 4H—SiC semiconductor material of the epitaxial layer 2 contains cm 3 10 per 12 Z 1 / 2 It may have defects.

[0031] Thus, in step S2, ions, for example carbon (C), aluminum (Al) or silicon (Si) ions, are implanted through the sidewall 3a to form implanted regions 4 in the semiconductor material. In contrast to the situation shown in Figure 27, in the embodiment shown in Figure 1, ions are implanted through the sidewall 3a to form implanted regions 4 in a plane perpendicular to the top surface of the semiconductor device, i.e., the implantation direction is perpendicular to the

[0001] crystallographic axis direction X of the epitaxial layer 2. This lateral implantation can be performed at room temperature.

[0032] In the embodiment shown in FIG. 1, carbon ions are implanted through two opposing sidewalls 3 a to form interstitial carbon C I It is also possible to implant ions through a single sidewall 3a to form a single implanted region 4, or to implant ions through three or four sidewalls 31, for example all sidewalls of a rectangular semiconductor chip. In the described embodiment, ions are implanted through 3-5×10 16 cm -3 Lateral implantation of carbon into the N-doped epitaxial layer 2 was performed. One or more lateral implant energies can be chosen so that the implant profile is outside the active electrical region of the semiconductor device 1. For example, three different implantation stages with energies in the range of 10 keV to 200 keV may be used. The lateral implant dose is 10 10 ~10 16 cm -2 The range may be:

[0033] 1, step S2 may be performed immediately after growing epitaxial layer S1. However, it is also possible to form implanted region 4 towards the end of the fabrication of semiconductor device 1, as described below with respect to various specific semiconductor devices.

[0034] After the lateral implantation, an optional separate diffusion step S3 can be performed. For example, the epitaxial layer 2 may be annealed at a temperature above 1000°C for a period of 1 minute to 10 hours depending on the thickness of the epitaxial layer 2. The thickness of the epitaxial layer 2 may be, for example, in the range of 5 μm to 150 μm. In the described embodiment, a relatively short annealing step of the epitaxial layer 2a is carried out at a temperature of 1500°C for a period of 5 minutes. During this period, the generated interstitial carbon C I The carbon atoms further diffuse throughout the epitaxial layer 2. Alternatively or additionally, proton irradiation can be used to generate interstitial carbon atoms, C I For example, proton irradiation of 10 keV or less may be used.

[0035] Alternatively, lateral implantation can be performed on a completed semiconductor component without a subsequent diffusion step. For example, carbon implantation with energies above 300 keV can be followed by the implantation of interstitial carbon (C) without an additional diffusion step. I Sufficient diffusion of

[0036] It has been found that point defects in the crystalline structure of the epitaxial layer 2 can move rapidly and thus travel relatively long distances perpendicular to the

[0001] crystal axis direction X. For example, interstitial carbon can diffuse long distances perpendicular to the

[0001] direction after 10 keV proton irradiation even at room temperature. This results in the formation of carbon vacancies V throughout the epitaxial layer 2. C For example, using the above parameters, a lateral diffusion length of several mm can be achieved, resulting in carbon vacancies V across the entire width of the epitaxial layer 2 of a semiconductor chip with an edge length of, for example, 5 mm. C For example, carbon vacancies V C The concentration of can be reduced by more than two orders of magnitude compared to the as-grown epitaxial layer 2.

[0037] 3 shows the results of a Deep Level Transient Spectroscopy (DLTS) analysis of the semiconductor device 1 according to FIG. 1. Therein, the curve with reference A shows the DLTS spectrum of the as-grown, untreated n-type 4H—SiC epitaxial layer 2 after step S1. The curve with reference B shows the DLTS spectrum of the epitaxial layer 2 after implantation of carbon ions in step S2 and annealing in step S3. As can be seen from the figure, after step S1, the untreated semiconductor device 1 contains a relatively high concentration of carbon vacancies. Illustratively, it is 10 12 / cm 3 About Z 1 / 2 Contains the density of the defect. As detailed above, the defect level Z 1 / 2 is the conduction band edge E C , and therefore adversely affect the performance of the completed semiconductor device 1.

[0038] After implantation of carbon ions in step S2 and annealing of the epitaxial layer in step S3, a detectable amount of Z 1 / 2 No defects are present in the semiconductor device 1. Furthermore, as can be seen in FIG. C One can detect the presence of so-called deep levels ON1 and ON2 peaks, which are located at 0.84 eV and 1.1 eV below the SiO2 peak, respectively. The ON1 and ON2 levels are associated with carbon diffusion and are typically detected after implantation of carbon ions as described above with respect to FIG. 27. Thus, lateral implantation of carbon ions through the sidewalls 3a of the semiconductor device creates carbon vacancies V in the same as-grown epitaxial layer 2. C For the concentration of carbon vacancies V in the epitaxial layer 2, C significantly reduces the concentration of

[0039] Below, a more detailed description is given of the manufacturing process for various semiconductor devices 1. The described processing steps will make clear that the lateral embodiment as described above with respect to Figures 1 and 2 offers a high degree of flexibility in the manufacturing of semiconductor devices 1.

[0040] First, the process steps for fabricating a PIN diode 20 are shown with reference to Figures 4-6. In the first process step shown in Figure 4, an n-type 4H-SiC epitaxial layer 2 is grown on a substrate 5. As mentioned above, the epitaxial layer 2 contains a relatively high concentration of carbon vacancies V C 5, epitaxial layer 2 is implanted with aluminum ions to form a highly doped p-type anode region 21. This is followed by a high temperature annealing step (not shown). During annealing, additional carbon vacancies V may be formed, even if carbon vacancies V C have previously been removed. C is generated.

[0041] 6 shows the final p+-in structure of PIN diode 20, further comprising an implanted field relief layer 22 formed by conventional ion implantation. Additionally, a metal anode electrode 23 and a metal cathode electrode 24 are formed on the top surface of anode region 21 and the bottom surface of substrate 5, respectively. Anode electrode 23 and cathode electrode 24 may be formed by electron beam evaporation. The formation of field relief layer 22, anode electrode 23, and cathode electrode 24 creates additional carbon vacancies V in epitaxial layer 2, which acts as the intrinsic drift layer for PIN diode 20. C This can result in the production of

[0042] To improve the performance of the PIN diode 20, and illustratively the n-type epitaxial layer 2, two implanted regions 4 are formed on the sidewalls 3a of the PIN diode 20 (also shown in FIG. 6). Implantation of carbon or other ions into the implanted regions 4 and optional subsequent annealing of the epitaxial layer 2 creates carbon vacancies V in the epitaxial layer 2, which act as a drift layer. C This results in a decrease in the concentration, which is indicated in FIG. 6 by the lighter shading of the epitaxial layer 2.

[0043] 3, lateral implantation and subsequent annealing also creates ON1 and ON2 levels, although the presence of ON1 and ON2 levels in epitaxial layer 2 does not affect the performance of PIN diode 20.

[0044] In the described embodiment, the formation of field relief region 22 is performed by front-side processing of epitaxial layer 2 on wafer or other substrate 5. Similarly, the formation of electrodes 23 and 24 is performed by conventional metallization procedures from the front and back sides of semiconductor device 1. For efficiency, a relatively large number of semiconductor devices 1, such as PIN diodes 20, are typically formed together on a common wafer or other substrate 5.

[0045] To implant ions into the vertical implantation region 4, the region of the wafer or other substrate 5 corresponding to the PIN diode 20 may be separated from similar semiconductor circuit components grown on the same wafer or other substrate 5 by dicing. Individual semiconductor chips are then formed, which can be mounted with their crystallographic axes pointing sideways into an ion implantation system to implant carbon ions through the sidewalls 3a of the individual semiconductor chips. For this purpose, a modified target holder carrying one or more semiconductor chips can be used. During implantation, a first implantation direction 25 for implanting ions into the field relief region 22 of the epitaxial layer 2 is perpendicular to a second implantation direction 26 for implanting ions into the implantation region 4. Furthermore, due to lateral implantation, the implantation region 4 extends across the entire side of the semiconductor material, including the substrate 5 and the epitaxial layer 2.

[0046] 7-10 illustrate processing steps for fabricating a bipolar junction transistor (BJT) 30, illustratively an NPN transistor, according to one embodiment of the present disclosure. In the first step, shown in FIG. 7, an n-type collector 31 made from a carbon-containing semiconductor material, such as 4H—SiC or 6H—SiC, is provided. Subsequently, a p-type base 32 is epitaxially grown on the n-type collector 31 (FIG. 8). Then, an n-type emitter layer 33 is epitaxially grown on the p-type base 32 (FIG. 9).

[0047] Selected regions of emitter 33 and the corresponding upper portion of base 32 are then etched to allow for the formation of a gate electrode as shown in Figure 10. At the base of the etched trench, a heavily doped p-type layer 34 is formed in p-type base 34. A gate electrode 35 is then formed on the top surface of heavily doped p-type layer 34, an emitter electrode 36 is formed on the top surface of n-type emitter 33, and a collector electrode 36 is formed on the bottom surface of n-type collector 31.

[0048] The semiconductor material of both the n-type collector 31 and the n-type emitter 33 is enriched with an increased concentration of carbon vacancies V present in the respective epitaxial layers 2 as grown and / or further processed during processing of the BJT 30. C Carbon vacancies V in the collector 31 and emitter 33 C To reduce this, implanted regions 4 are formed on the sidewalls 3a of the BJT 30 as described above. The presence of implanted regions 4 reduces the amount of interstitial carbon C I and thus the formation of carbon vacancies V C This results in a decrease in

[0049] Although the fabrication methods illustrated in FIGS. 7-10 have been described with respect to forming an NPN BJT, PNP BJTs may likewise be formed using the disclosed lateral implantation method, including an n-type base that has reduced carbon vacancies V after annealing to the epitaxial layer that subsequently forms the as-grown base.

[0050] 11 and 12 show two stages in the fabrication of an insulated gate bipolar transistor (IGBT) 40. First, an n-type base 42 made from 4H—SiC or 6H—SiC is epitaxially grown on a p-type collector 41, as shown in FIG.

[0051] As shown in FIG. 12, two p-type base wells 43 are formed in the n-type base 42 by ion implantation through the top surface of the n-type base 42. A total of four n-type regions 44 are then formed therein by either plasma immersion ion implantation (PIII) or conventional ion implantation. An oxide layer 45, which acts as an electrical insulator, is then formed in the central region of the n-type base 42 between the right (inner) n-type region 44 of the left p-type base well 43 and the left (inner) n-type region 44 of the right p-type base well 43. An insulated gate electrode 46 is formed on the oxide layer 45. Furthermore, one or more emitter electrodes 47 are formed on the top surfaces of the n-type regions 44. A collector electrode 47 is formed on the back surface of the p-type collector 41. Electrodes 46, 47, and 48 may be formed by electron beam evaporation.

[0052] Although not shown in FIG. 12, a buffer layer may be present at the interface between the n-type base 42 and the p-type collector 41 .

[0053] As detailed above, the n-type base layer 42 has a high carbon vacancy V after the formation of the IGBT 40. C To reduce unwanted point defects, implanted regions 4 are formed on the sidewalls 3a of the IGBT 40 before annealing the n-type base 42. This allows carbon vacancies V to escape from the base 42, as described above. C is removed, generating ON1 and ON2 in n-type layers 42 and 44. However, the generated ON1 and ON2 are not detrimental to the fabricated semiconductor device, such as IGBT 40. Furthermore, although this process has been described for IGBT 40 including n-type base layer 42, it is similar for IGBTs fabricated starting with an n-type collector layer and having a p-type base layer.

[0054] Note that in the examples described above with reference to FIGS. 4-12, implanted regions 4 do not need to be removed after device fabrication. In either case, implanted regions 4 are located outside the electrically active areas of the respective semiconductor devices 1. Therefore, no additional RIE or CMP steps are required as part of the disclosed fabrication method, and the completed semiconductor devices 1 may contain high concentrations of implanted species, such as carbon, within implanted regions 4. Even if portions of implanted regions 4 containing implanted species are removed after annealing, for example, by RIE or CMP of the sidewalls 3a of the completed semiconductor chip, the remaining implant defect regions of implanted regions 4 still contain amorphous silicon, indicative of the previous lateral implant step. Similarly, long oxidation times and long HF etching times are not required compared to the oxidation method detailed above with reference to FIG. 27.

[0055] The described method and device have further advantages, for example, the ability to generate carbon vacancies V in an epitaxial layer 2 of any thickness. C This process is particularly suitable for very thick drift layers, with thicknesses exceeding 50 μm. The method can be applied to both unipolar and bipolar devices. Some processing steps, such as annealing, can be performed at lower temperatures compared to prior art methods.

[0056] The above steps for implanting ions through one or more sidewalls 3a of the individual semiconductor devices 1 are particularly useful when the electrically active area of ​​the completed device does not exceed the diffusion length of the implanted species. This is true for many typical power components, such as the PIN diodes 20, BJTs 30, and IGBTs 40 mentioned above. However, for relatively large electrically active areas, or when carbon vacancies V are to be eliminated prior to the separation of the individual semiconductor circuit components, C If removal of SiO 2 is required, as will be explained in more detail below, implantation through the sidewalls of epitaxial layer 2 can also be achieved using one or more trenches formed in epitaxial layer 2. This can also be used for semiconductor devices where trenches are formed throughout the normal manufacturing process.

[0057] 13 schematically illustrates a cross-sectional view of a semiconductor device 1 according to one embodiment of the present disclosure. The semiconductor device 1 comprises an epitaxial layer 2 having a reduced concentration of carbon vacancies Vc.

[0058] In addition to the epitaxial layer 2, the semiconductor device 1 comprises a trench 3 extending into the epitaxial layer 2. The trench 3 comprises an implanted layer 4 in the form of an implanted carbon layer, the implanted layer 4 being provided on the trench sidewalls 3 a and on the trench bottom 3 b. Instead of carbon (C), one of boron (B), aluminum (Al), germanium (Ge), nitrogen (N), phosphorus (P), arsenic (As), oxygen (O), sulfur (S), hydrogen (H), argon (Ar), or silicon (Si) may be implanted.

[0059] For example, implantation may be performed by plasma immersion ion implantation (PIII). PIII may also be performed on the upper surface of epitaxial layer 2, e.g., the main or front surface of epitaxial layer 2 where trench 3 opens. Thus, PIII may also be performed parallel to the 0001 crystallographic axis (not shown in FIG. 13). If PIII is applied to the front surface of epitaxial layer 2, the formed PIII sublayer must be subsequently removed by dry etching. However, as described in more detail below, this is not necessary for the surface within trench 3.

[0060] The epitaxial layer 2 includes an epitaxial sublayer 2a with a reduced concentration of carbon vacancies V. As shown, the epitaxial sublayer 2a with a reduced concentration of carbon vacancies V extends perpendicular to and parallel to the 0001 crystallographic axis, and the thickness of the epitaxial sublayer 2a with reduced carbon vacancies is at least as large as the depth D of the trench 3. T Corresponds to.

[0061] Without any treatment, the silicon carbide (SiC) based epitaxial layer 2 contains a level of electrical activity corresponding to a non-negligible concentration of carbon vacancies (Vc).C White circles are shown in the epitaxial layer to illustrate the occurrence of

[0062] The inventors have demonstrated that after plasma immersion ion implantation of suitable species such as B, Al, C, Si, Ge, N, P, As, O, S, F, H or Ar and annealing of the implanted region at 1600 °C, carbon vacancies V C It has been found that the carbon vacancies V can be removed in the region of the epitaxial layer 2 below the implanted surface, for example in a 100 μm thick sublayer along the <0001> crystallographic axis. However, as detailed above, in the direction perpendicular to the <0001> crystallographic axis, the carbon vacancies V C can be removed over much longer distances. For example, horizontal diffusion lengths of several millimeters can be achieved. PIII implant species are confined to relatively small spaces, e.g., sublayers with thicknesses of less than 50 nm. This is because C I This causes stress that releases

[0063] According to the exemplary embodiment of FIG. 13, the epitaxial layer 2 includes a trench 3 having an implanted layer 4. The thickness of the carbon layer 4 is, for example, less than 50 nm. As detailed above, the PIII carbon in the trench sidewalls 3 a and trench bottom 3 b is formed by interstitial carbon defects, C I , which can recombine with electrically active defects that move perpendicular to the <0001> crystallographic axis and provide carbon vacancies Vc as detailed above. In Figure 13, the black circles in epitaxial layer 2 represent interstitial carbon C I is shown to illustrate.

[0064] 13, trench 3 extends parallel to or along the 0001 crystallographic axis of epitaxial layer 2. Trench 3 may also extend at an angle α to the 0001 crystallographic axis. In such a case, the thickness of epitaxial sublayer 2a and the depth of trench 3 are defined by L=Dcos(α).

[0065] In this context, L is the length of the PIII carbon layer 4 from the trench entrance to the trench end. In the exemplary embodiment of FIG. 13, L is the trench depth D T D is the distance measured parallel to the 0001 crystal axis from the beginning of implanted layer 4 to the end of implanted layer 4 in trench 3. In the exemplary embodiment of FIG. 13, D corresponds to the trench depth D T where α is the angle between L and D. In the exemplary embodiment of FIG.

[0066] 14 shows a schematic diagram of a deep level transient spectroscopy (DLTS) spectrum of an epitaxial layer 2 that has been treated by a method according to an embodiment. The epitaxial layer 2 is made of 4H—SiC. DLTS spectra are shown for the epitaxial layer 2 with and without carbon diffusion perpendicular to the 0001 crystallographic axis. The curve indicated by reference A represents the DLTS spectrum for the untreated material, which is at level Z. 1 / 2 is 10 12 1 / cm 3 The curve indicated by reference letter B represents the DLTS spectrum after injection. Level Z 1 / 2 Therefore, as shown in Figure 14, after diffusion, the carbon vacancies V C Level Z, which means the negative charge state of the electrically active defects that provide 1 / 2 The concentration of is below the detection limit.

[0067] A manufacturing method according to one embodiment will be described based on the flow chart of Figure 26 and the specific embodiment shown in Figures 15-19. The manufacturing method is suitable for providing a semiconductor device 1 having an epitaxial layer 2 with reduced concentration levels of electroactive carbon within the epitaxial layer 2. The semiconductor device 1 produced according to the steps shown in Figures 3-7 is a junction barrier Schottky (JBS) diode 50.

[0068] According to step S12, the method comprises providing an epitaxial layer 2 on a substrate 5 (see FIG. 26 and FIG. 15). 14 1 / cm 3 ~10 16 1 / cm 3 The n-type 4H—SiC epitaxial layer 2 has a doping concentration in the range of 10 18 1 / cm 3 The epitaxial layer is grown on a 4H-SiC substrate with a doping concentration of 1000 . The thickness and doping of the epitaxial layer are selected depending on the voltage class of the semiconductor device 1.

[0069] According to step S12, the method includes providing a photoresist layer 51 on the epitaxial layer 2 (see Figures 26 and 16) and exposing the photoresist layer 51 by electromagnetic radiation using a mask (not depicted). For example, the photoresist layer 51, which has been deposited on the epitaxial layer surface, is patterned by photolithography according to the desired shape / dimensions of the trenches 3 to be provided in a subsequent step.

[0070] According to step S13, the method includes providing two trenches 3 in the epitaxial layer 2 (see FIG. 26 and FIG. 16). For example, the epitaxial layer 2 is etched by reactive ion etching (RIE) to form the trenches 3. The trenches 2 can have any cross section, such as a square, a circle, a rectangle, or a polygon. T is the depth of trench 3 and l is the width of the cross section, then deep trench 3 (D T >>l) can also be formed.

[0071] According to step S14, the method includes implanting carbon or another suitable species into each of the trenches 3 (see Figures 26 and 17). In the described example, the trench sidewalls 3a and the trench bottom 3b of the trenches 3 are implanted with carbon by plasma immersion ion implantation (PIII) to obtain a maximum doping concentration but not exceeding the solubility limit.

[0072] According to step S15, the method includes filling the trenches 3 with p-type polysilicon 52 (see FIGS. 26 and 18). Alternatively, the step of filling the trenches 3 with p-type polysilicon 52 may be performed after removing the photoresist layer 51 (see the description in the context of step S16 below). As will be explained in more detail below, filling the trenches 3 can assist in forming contacts and generally improves the mechanical stability of the completed semiconductor device 1.

[0073] According to step S16, the method comprises carrying out an annealing process to induce carbon ion diffusion from at least one trench 3 perpendicular and / or parallel to the crystalline 0001 axis of the at least one epitaxial layer 2 (see FIG. 26; the diffusion process is not illustrated in FIG. 18, and FIG. 13 illustrates the diffusion of interstitial carbon C I The carbon is diffused by annealing at a temperature below 1600° C. for a time period ranging from 5 minutes to 600 minutes. The photoresist layer 51 is then removed using, for example, oxygen plasma ashing.

[0074] Alternatively, the photoresist layer 51 can be removed after PIII in step S14, and then a graphite cap can be formed on the epitaxial layer surface to ensure low surface roughness on the trench walls 3a during activation. After annealing, the graphite cap can be removed by oxygen plasma ashing.

[0075] After carbon diffusion, epitaxial layer 2 exhibits a V below the detection limit. C It has a concentration. According to step S17, the method includes providing a contact layer 53 according to the function of the semiconductor device 1. In an exemplary embodiment, metal is deposited on the epitaxial layer surface and on the back surface for Schottky / ohmic contact formation.

[0076] The manufacturing method according to the embodiment of Figure 26 will also be described with reference to Figures 20-22. The semiconductor device 1 produced according to the steps shown in Figures 20-22 is a bipolar junction transistor (BJT) 30. In an exemplary embodiment, the BJT 30 is an NPN transistor.

[0077] Figure 20 shows a schematic representation of the first step of a method for producing a BJT 30. Two epitaxial layers 2 are provided, which are grown on a substrate 5. 14 1 / cm 3 ~10 16 1 / cm 3 The upper n-type 4H—SiC epitaxial layer 2 has a doping concentration in the range of 10 18 1 / cm 3 on a 4H—SiC substrate 5 having a doping concentration of 10 14 1 / cm 3 ~10 16 1 / cm 3 An intermediate p-type epitaxial layer 2 having a doping concentration in the range of .05 to .05 mm is grown on the epitaxial layer 2. The layer thickness and doping concentration are selected according to the voltage class of the BJT 30.

[0078] FIG. 21 shows a schematic diagram of the second step of the method for producing a BJT 30. The epitaxial layer 2 is etched by reactive ion etching (RIE) to form two trenches 3. The trenches 3 can have any cross-section, such as square, circular, rectangular, or polygonal. Carbon is implanted into the trenches 3 by PIII and then diffused by annealing. After carbon diffusion, the upper epitaxial layer 2 corresponding to the n-type emitter 33 and the substrate 5 corresponding to the n-type collector 31 have a low carbon vacancy concentration. The trench sidewalls 3a and the top of the epitaxial layer can be protected by a graphite cap.

[0079] Figure 22 shows a schematic of the third step in the method for producing the BJT 30. In this step, oxygen plasma ashing is used to remove the graphite cap. Finally, a highly doped p-type layer 34 is formed, and metal is deposited to provide the gate electrode 35, emitter electrode 36, and collector electrode 37.

[0080] The manufacturing method according to the embodiment of Figure 26 will also be described with reference to Figures 11 to 13. The semiconductor device 1 produced according to the steps shown in Figures 23 to 25 is an insulated gate bipolar transistor (IGBT) 40.

[0081] FIG. 23 shows a schematic diagram of the first step of a method for producing an IGBT 40. 18 1 / cm 3 10 on a 4H-SiC substrate 5 with a doping concentration of 14 1 / cm 3 ~10 16 1 / cm 3 4 shows an n-type 4H—SiC epitaxial layer 2 with a doping concentration in the range of 0.05 V to 0.05 V. The thickness and doping concentration of the epitaxial layer and substrate are selected according to the voltage class of the IGBT 40.

[0082] 24 shows a schematic representation of a second step of the method for producing an IGBT 40. The epitaxial layer 2 is etched by reactive ion etching (RIE) to form two trenches 3. In this example, the depth D of the trenches 3 is T corresponds to the thickness of the epitaxial layer 2. A relatively deep trench 3, as shown in FIG. 24, helps remove carbon vacancies throughout the relatively thick epitaxial layer 2. The trench 3 can have any cross-section, such as a square, circle, rectangle, or polygon. Carbon is implanted into the trench 3 by PIII and later diffused by annealing. After carbon diffusion, the epitaxial layer 2, including the n-type base 42, has a low carbon vacancy concentration. The trench sidewalls 3a and the top of the epitaxial layer can be protected by a graphite cap.

[0083] FIG. 25 shows a schematic diagram of the third step of the method for producing an IGBT 40. In this step, oxygen plasma ashing is used to remove the graphite cap. Two p-type base wells 43 are formed by ion implantation, within which four n-type regions 44 are formed by PIII or ion implantation. The ion implantation is performed with the device fabrication in the state shown in FIG. 24. Finally, a gate electrode 46, an emitter electrode 47, and a collector electrode 48 are formed by electron beam evaporation. The gate electrode 48 is provided with an oxide layer 45 that insulates the gate from the epitaxial layer 2 in which the active electrical regions are formed. A buffer layer may also be provided at the base / collector interface (not shown in FIG. 25).

[0084] The embodiments illustrated in Figures 1-26 above represent exemplary embodiments of the improved semiconductor devices and methods for fabricating the same. Therefore, they do not constitute an exhaustive list of all embodiments of the improved methods. Actual devices and methods may differ from the illustrated embodiments, for example, with respect to the specific semiconductor materials, doped regions, and electrodes. In particular, while the above embodiments are based on n-type 4H—SiC or n-type 6H—SiC semiconductor materials, other crystalline types, such as 3C—SiC, or semiconductor types, such as p-type SiC, may also be used. [Explanation of symbols]

[0085] Reference sign 1. Semiconductor devices 2. Epitaxial layer 2a Epitaxial sublayer 3. Trench 3a side wall 3b Trench bottom 4 Injection area 4a Top area 5. Substrate 20 PIN diode 21 Anode region 22 Electric field relaxation region 23 Anode electrode 24 cathode electrode 25 First injection direction 26 Second injection direction 30 BJT 31 Collector 32 base 33 Emitter 34 Highly doped p-type layer 35 gate electrode 36 Emitter electrode 37 Collector electrode 40 IGBT 41 Collector 42 base 43 p-type base well 44 n-type region 45 oxide layer 46 gate electrode 47 Emitter electrode 48 Collector electrode 50 JBS diodes 51 Photoresist layer 52 p-type polysilicon 53 Contact layer A DLTS spectrum of the untreated epitaxial layer B DLTS spectrum of annealed epitaxial layer C I Interstitial carbon D T Trench Depth V C carbon vacancy X

[0001] Crystal axis direction

Claims

1. At least one epitaxial layer (2) made from silicon carbide semiconductor material and having a [0001] crystallographic axis; at least one implanted region (4) formed in a sidewall (3 a) of the at least one epitaxial layer (2), the normal direction of the sidewall (3 a) being perpendicular to the [0001] crystal axis, the at least one implanted region (4) containing an implanted species including at least one of carbon ions or silicon ions; Equipped with At least one portion of said at least one epitaxial layer (2) contains carbon vacancies (V Ｃ ) is reduced in concentration, and the concentration Z １／２ is 10 １０ / cm ３ A semiconductor device (1).

2. 2. The semiconductor device (1) of claim 1, comprising at least one semiconductor chip including the at least one epitaxial layer (2), wherein the at least one implanted region (4) is formed on at least one of a plurality of sidewalls (3 a) of the at least one semiconductor chip.

3. At least one trench (3) having two sidewalls (3a) formed in the at least one epitaxial layer (2), the at least one implanted region (4) is formed on at least one of the two sidewalls (3a) of the at least one trench (3); the at least one portion of the at least one epitaxial layer (2) corresponds to a sublayer (2a) extending in a plane perpendicular to the [0001] crystallographic axis, The thickness of the sublayer (2a) is equal to the depth (D) of the at least one trench (3). Ｔ 2. The semiconductor device (1) of claim 1, wherein the semiconductor device (1) corresponds to or exceeds .

4. 4. The semiconductor device (1) of claim 1, further comprising at least one electrode formed on a top or bottom surface of said at least one epitaxial layer (2), thereby forming an electrically active region, said at least one implanted region (4) being formed outside said electrically active region.

5. The semiconductor device (1) according to any one of claims 1 to 3, wherein the silicon carbide semiconductor material comprises at least one of an n-type 4H-SiC semiconductor material or an n-type 6H-SiC semiconductor material.

6. The semiconductor device (1) according to any one of claims 1 to 3, wherein the at least one implanted region (4) comprises an implanted defect region comprising amorphous silicon.

7. The at least one portion of the at least one epitaxial layer (2) is 10 １２ / cm ３ A semiconductor device (1) according to any one of claims 1 to 3, having a deep peak level concentration exceeding

8. The semiconductor device (1) A PIN diode (20) comprising a drift layer, wherein the at least one epitaxial layer (2) comprises the drift layer; A BJT (30) comprising an emitter (33), a collector (31), and a base (32), wherein the at least one epitaxial layer (2) includes at least one of the emitter (33), the collector (31), or the base (32). an IGBT (40) comprising a base (42) formed from said silicon carbide semiconductor material, said at least one epitaxial layer (2) comprising said base (42); or A JBS diode (50) comprising a semiconductor body formed from the silicon carbide semiconductor material, wherein the at least one epitaxial layer (2) comprises the semiconductor body. The semiconductor device (1) according to any one of claims 1 to 3, comprising at least one of:

9. growing at least one epitaxial layer (2), said at least one epitaxial layer (2) made of silicon carbide semiconductor material having a [0001] crystallographic axis; implanting ions including at least one of carbon ions and silicon ions through at least one sidewall (3 a) of said at least one epitaxial layer (2) to form at least one implanted region (4) in a plane perpendicular to said [0001] crystallographic axis, thereby implanting carbon vacancies (V) in said silicon carbide semiconductor material into said as-grown at least one epitaxial layer (2). Ｃ ) and the concentration Z of the carbon vacancies is reduced. １／２ is 10 １０ / cm ３ injecting, wherein the A method for manufacturing a semiconductor device (1), comprising:

10. After ion implantation, the carbon vacancies (V) in the silicon carbide semiconductor material are formed on the at least one epitaxial layer (2). Ｃ annealing said at least one epitaxial layer (2) to further reduce the concentration of After ion implantation, the carbon vacancies (V) in the silicon carbide semiconductor material are formed on the at least one epitaxial layer (2). Ｃ proton irradiation of said at least one epitaxial layer (2) to further reduce the concentration of The method of claim 9 , further comprising at least one of:

11. Prior to implanting ions through the at least one sidewall (3a), the method comprises: performing a plurality of processing steps to form at least one semiconductor circuit component comprising at least a portion of said at least one epitaxial layer (2); Separating the at least one semiconductor circuit component to obtain a semiconductor chip having a top surface perpendicular to the [0001] crystal axis and a plurality of sidewalls (3 a) perpendicular to the top surface; 11. The method of claim 9 or 10, further comprising:

12. forming a plurality of semiconductor circuit components on a carrier substrate (5) carrying said at least one epitaxial layer (2); separating the plurality of semiconductor circuit components by dicing the carrier substrate (5) carrying the at least one epitaxial layer (2) along at least one cutting plane parallel to the [0001] crystal axis; implanting the ions through the at least one cut surface; The method of claim 11 , comprising:

13. forming at least one semiconductor circuit component comprises implanting at least one first species through a surface of the at least one epitaxial layer (2) in a first implantation direction (25) parallel to the [0001] crystallographic axis before separating the at least one semiconductor circuit component; 12. The method of claim 11, wherein the step of implanting ions through at least one sidewall (3 a) comprises the step of implanting at least one second species through the at least one sidewall (3 a) of the at least one epitaxial layer (2) in a second implantation direction (26) perpendicular to the first implantation direction (25) after separating the at least one semiconductor circuit component.

14. The method further comprises forming at least one trench (3) having two sidewalls (3a) in the at least one epitaxial layer (2), 11. The method according to claim 9 or 10, wherein the step of implanting ions through at least one sidewall (3 a) comprises plasma immersion ion implantation (PIII) of at least one of carbon or silicon ions through the two sidewalls (3 a) of the at least one trench (3).

15. filling said at least one trench (3) after PIII; 15. The method of claim 14, further comprising the step of: forming at least one contact layer (53) on a top surface of the at least one epitaxial layer (2) after filling the at least one trench (3).

16. 15. The method according to claim 14, further comprising the step of forming at least one electrode on a bottom surface (3b) of said at least one trench (3).

17. Before implanting ions through said at least one sidewall (3a), said method comprises: depositing at least one metallic material on the surface of said at least one epitaxial layer (2); annealing the at least one metal material to form an electrode, thereby freeing the carbon vacancies (V) in the silicon carbide semiconductor material. Ｃ annealing, increasing the concentration of 11. The method of claim 9 or 10, further comprising:

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