Semiconductor device, power conversion device, and method of manufacturing the semiconductor device

Abstract

To improve reliability and extend the lifespan of a semiconductor device while suppressing increases in production costs.SOLUTION: A semiconductor device 100 includes a semiconductor element 41, a top electrode formed on the top surface of the semiconductor element 41, and a conductive metal plate 22 mainly made of copper bonded to the top electrode of the semiconductor element 41. The conductive metal plate 22 is mainly made of copper and is solid-phase diffusion bonded onto the upper electrode of the semiconductor element 41.SELECTED DRAWING: Figure 2

Description

[Technical Field]

[0001] The present disclosure relates to a semiconductor device, a power conversion device, and a method for manufacturing a semiconductor device. [Background technology]

[0002] For example, a known structure of a semiconductor device for power control is one in which a Cu electrode made of copper (Cu) is provided on the top electrode of a semiconductor element, and a wire made of a metal such as Al is bonded to the Cu electrode. Patent Document 1 listed below discloses a technology for reducing the resistance of the top electrode and improving heat dissipation by providing a Cu electrode on the top electrode of a semiconductor element. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Japanese Patent Application Laid-Open No. 2006-86378 Summary of the Invention [Problem to be solved by the invention]

[0004] In recent years, the applications of power control semiconductor devices have expanded, and the current capacity of these devices has been increasing. Furthermore, because power control semiconductor devices are used all over the world, they must be able to withstand harsh environments. Therefore, further improving the reliability and extending the lifespan of semiconductor devices are major challenges.

[0005] In structures in which metal wires are directly bonded to the top electrodes of semiconductor elements, wire lift-off (peeling) often causes disconnection, which poses a problem when trying to improve reliability and extend life.

[0006] This problem can be solved by providing a Cu electrode on the top electrode of the semiconductor element, as in Patent Document 1. However, forming a Cu electrode thick enough for wire bonding requires Cu plating, which takes a long time, resulting in productivity issues. Furthermore, plating technology requires a large number of processes (cleaning, drying, resist processing, etc.), which poses challenges such as capital investment and securing space for equipment installation. Furthermore, plating technology also presents challenges such as uneven plating film thickness and uneven appearance, necessitating detailed control of processes and quality. These challenges increase production costs.

[0007] The present disclosure has been made to solve the above-mentioned problems, and aims to improve reliability and extend life while suppressing increases in the production costs of semiconductor devices. [Means for solving the problem]

[0008] A semiconductor device according to the present disclosure includes a semiconductor element, an upper surface electrode formed on an upper surface of the semiconductor element, and a conductive metal plate containing copper as a main component and bonded to the upper surface electrode of the semiconductor element by solid-state diffusion bonding. The upper electrode has an Al layer or an AlSi layer on the surface of the conductive metal plate to be solid-phase diffusion bonded. do. [Effects of the Invention]

[0009] According to the present disclosure, it is possible to form a metal member on the top electrode of a semiconductor element with superior productivity, a stable production process, and low production costs compared to plating methods. Furthermore, the conductive metal plate does not require any exterior coating such as other metals or plating. [Brief explanation of the drawings]

[0010] [Figure 1] 1 is a cross-sectional view showing a configuration of a semiconductor device according to a first embodiment. [Figure 2] 1 is a cross-sectional view of a semiconductor element according to a first embodiment. [Figure 3] 1 is a diagram showing an example of the configuration of the upper surface of a semiconductor element according to a first embodiment. [Figure 4]1 is a diagram showing an example of the configuration of the upper surface of a semiconductor element according to a first embodiment. [Figure 5] 1 is a diagram showing an example of the configuration of the upper surface of a semiconductor element according to a first embodiment. [Figure 6] 4 is a flowchart showing a process of solid-state diffusion bonding a conductive metal plate to a semiconductor element in the manufacture of the semiconductor device according to the first embodiment. [Figure 7] 10 is a flowchart showing a modified example of the process of solid-state diffusion bonding a conductive metal plate to a semiconductor element. [Figure 8] FIG. 1 is a cross-sectional view of a semiconductor element that is a PN junction diode. [Figure 9] 1 is a cross-sectional view of a semiconductor element that is a planar gate MOSFET. [Figure 10] 1 is a diagram showing a state in which a cooler is attached to the semiconductor device according to the first embodiment. FIG. [Figure 11] FIG. 10 is a cross-sectional view of a semiconductor element according to a second embodiment. [Figure 12] FIG. 10 is a cross-sectional view of a semiconductor element according to a third embodiment. [Figure 13] FIG. 10 is a cross-sectional view of a portion of a semiconductor device according to a third embodiment. [Figure 14] FIG. 10 is a block diagram showing a configuration of a power conversion system to which a power conversion device according to a fourth embodiment is applied. DETAILED DESCRIPTION OF THE INVENTION

[0011] <First Embodiment> FIG. 1 is a cross-sectional view showing the configuration of a semiconductor device 100 according to the first embodiment.

[0012] The semiconductor device 100 includes at least one semiconductor element 41 mounted on an insulating substrate 43. The number of semiconductor elements 41 may be any number, and only the required number may be mounted depending on the specifications of the semiconductor device 100. In this embodiment, the semiconductor element 41 is made of silicon (Si) and is a so-called power semiconductor element that controls power. Typical examples of power semiconductor elements include an IGBT (Insulated Gate Bipolar Transistor), a MOSFET (Metal Oxide Semiconductor Field Effect Transistor), and an FWD (Free Wheeling Diode). Each side of the semiconductor element 41 is approximately 1 mm to 20 mm.

[0013] The material of the semiconductor element 41 is not limited to Si, but may be a wide bandgap semiconductor such as silicon carbide (SiC) or gallium nitride (GaN). When a wide bandgap semiconductor is used, the semiconductor device 100 can be obtained that is superior in operation at high voltages, large currents, and high temperatures compared to a semiconductor device using Si.

[0014] The insulating substrate 43 has a layered structure in which a base plate 43c, an insulating layer 43b, and a circuit pattern 43a are layered in this order from the bottom, and the semiconductor element 41 is mounted on the circuit pattern 43a of the insulating substrate 43 via a bonding material 42. The bonding material 42 is a conductive metal containing Sn, known as solder. Note that, because the semiconductor element 41 generates heat, the bonding material 42 may be a sintered material that has a higher thermal conductivity than solder and high heat dissipation properties, such as a sintered material using fine particles of Ag or Cu.

[0015] The circuit pattern 43a is made of a conductive metal containing either copper (Cu) or aluminum (Al). The thickness of the circuit pattern 43a is set according to the current density and heat generation temperature when current is applied, and is, for example, approximately 0.2 mm to 0.5 mm. The insulating layer 43b is made of epoxy resin to which a filler with excellent thermal conductivity, such as BN or Al2O3, has been added. The thickness of the insulating layer 43b is approximately 0.2 mm to 1.0 mm. The base plate 43c is made of a metal with excellent thermal conductivity, such as Cu or Al. The thickness of the base plate 43c is approximately 1 mm to 5 mm. The insulating substrate 43 is required to have a thermal conductivity of at least several tens of W / (m·K). The materials of the circuit pattern 43a, the insulating layer 43b, and the base plate 43c are selected to obtain an appropriate thermal conductivity according to the heat dissipation specifications required for the semiconductor element 41.

[0016] The circuit pattern 43a and insulating layer 43b of the insulating substrate 43 may be a so-called DBC (Direct Bonded Copper) substrate. That is, the insulating layer 43b may be made of a ceramic such as Al2O3, AlN, or Si3N4, the circuit pattern 43a and the insulating layer 43b may be integrated, and a metal plate (not shown) may be provided on the lower surface of the insulating layer 43b. In this case, the metal plate on the lower surface of the insulating layer 43b and the base plate 43c are joined by a joining material such as solder.

[0017] A case 44 that houses the semiconductor element 41 is adhered and fixed to the periphery of the insulating layer 43b of the insulating substrate 43 with an adhesive 45. Examples of materials for the case 44 include PPS (Poly Phenylene Sulfide) resin and PBT (Poly Butylene Terephthalate) resin.

[0018] The case 44 is provided with an electrode terminal 46. The electrode terminal 46 is insert-molded together with the case 44 and is embedded within the case 44. As shown in FIG. 1 , the electrode terminal 46 is bent, and one end of the electrode terminal 46 protrudes from the case 44 for connection to the outside. The other end of the electrode terminal 46 is exposed inside the case 44.

[0019] Within the case 44, the semiconductor element 41, the circuit pattern 43a, and the electrode terminals 46 are electrically connected by metal wires 47. As shown in FIG. 1, the metal wires 47 include a metal wire 47a that connects the electrode terminals 46 to the circuit pattern 43a, and a metal wire 47b that connects the semiconductor element 41 to the circuit pattern 43a. The metal wires 47 are made of a material containing Al or Cu. The diameter of the metal wires 47 is approximately 0.1 mm to 0.5 mm. The metal wires 47 are not limited to typical linear (wire-like) wires, but may be flat ribbon wires that can handle large currents.

[0020] The inside of the case 44, i.e., the space defined by the case 44 and the insulating substrate 43, is filled with sealing resin 48, and the semiconductor element 41 and the metal wires 47 are sealed with the sealing resin 48. The sealing resin 48 is a gel-like silicone resin or a thermosetting epoxy resin to which a filler containing SiO2 has been added. The material of the sealing resin 48 is not limited to these, and any resin having the required elastic modulus, thermal conductivity, heat resistance, insulating properties, and adhesive properties may be used, for example, a phenolic resin, a polyimide resin, or the like.

[0021] The adhesive 45 is a silicone-based adhesive. Alternatively, the adhesive 45 may be made of the same material as the sealing resin 48. The adhesive 45 bonds the insulating layer 43b and the case 44, thereby preventing the sealing resin 48 from leaking from the case 44.

[0022] FIG. 2 is a cross-sectional view of a semiconductor element 41. Here, the semiconductor element 41 is assumed to be an IGBT. The semiconductor element 41 has a cell region in which an IGBT cell is formed and a termination region provided outside the cell region, and FIG. 2 shows a cross-section of the boundary between the cell region and the termination region. In the following description, the first conductivity type is defined as N-type and the second conductivity type as P-type, but the first conductivity type may alternatively be defined as P-type and the second conductivity type as N-type.

[0023] The semiconductor element 41 is formed using a semiconductor substrate 30 having a first main surface 31 and a second main surface 32. A drift layer 1 of a first conductivity type is formed in the semiconductor substrate 30 between the first main surface 31 and the second main surface 32. The material of the semiconductor substrate 30 may be general silicon (Si) or a wide bandgap semiconductor such as silicon carbide (SiC).

[0024] In the cell region, a carrier accumulation layer 2 of a first conductivity type having a higher peak impurity concentration than the drift layer 1 is formed on the first main surface 31 side of the drift layer 1, and further, a base layer 3 of a second conductivity type is formed in the surface layer portion on the first main surface 31 side of the semiconductor substrate 30. In the surface layer portion of the base layer 3, an emitter layer 5 of the first conductivity type and a contact layer 6 of the second conductivity type having a higher peak impurity concentration than the base layer 3 are selectively formed.

[0025] An active trench 10 is formed in a first main surface 31 of the semiconductor substrate 30, the active trench 10 penetrating the emitter layer 5, the base layer 3, and the carrier accumulation layer 2 to reach the drift layer 1, and a dummy trench 13 is formed in the first main surface 31 of the semiconductor substrate 30, the active trench 10 penetrating the base layer 3 and the carrier accumulation layer 2 in an area where the emitter layer 5 is not present to reach the drift layer 1. The dummy trench 13 is arranged to surround the active trench 10. A gate electrode 12 is buried in each of the active trench 10 and the dummy trench 13 via a gate insulating film 11. The gate electrode 12 in the dummy trench 13 is a dummy electrode that does not contribute to switching the IGBT on and off.

[0026] An interlayer insulating film 4 is formed on the first main surface 31 of the semiconductor substrate, covering the active trenches 10 and the dummy trenches 13. A barrier metal 23 is formed on the interlayer insulating film 4, and an emitter electrode 14, which is a metal electrode made of a metal such as aluminum (Al) or AlSi, is formed on the barrier metal 23. The emitter electrode 14 is connected to the emitter layer 5 and the contact layer 6 via contact holes formed in the interlayer insulating film 4, via the barrier metal 23.

[0027] The barrier metal 23 is a Ti layer or a W layer. The thickness of the barrier metal 23 is about 10 nm to 300 nm. The barrier metal 23 may also have a two-layer structure consisting of a Ti layer and a W layer, or may be made of TiW. Furthermore, the barrier metal 23 may also be made of Ta, TaN, or TiN.

[0028] A buffer layer 7 of a first conductivity type, which has a higher peak impurity concentration than the drift layer 1, is formed on the second main surface 32 side of the drift layer 1. Furthermore, a collector layer 8 of a second conductivity type is formed in a surface layer portion on the second main surface 32 side of the semiconductor substrate 30. A collector electrode 9 connected to the collector layer 8 is formed on the second main surface 32 of the semiconductor substrate. The buffer layer 7, collector layer 8, and collector electrode 9 are formed not only in the cell region but also in the peripheral region.

[0029] Meanwhile, in the termination region, a well layer 15 of a second conductivity type formed deeper than the active trenches 10 and the dummy trenches 13, and a resurf layer 16 of the second conductivity type disposed outside the well layer 15 are formed in a surface layer portion on the first main surface 31 side of the semiconductor substrate 30. A field oxide film 17 is formed on the first main surface 31 of the semiconductor substrate 30 so as to cover the well layer 15 and the resurf layer 16. A gate wiring 18 disposed above the well layer 15 is formed on the field oxide film 17.

[0030] The gate wiring 18 is covered with an interlayer insulating film 4 extending from the cell region, and a gate runner 19 is formed on the interlayer insulating film 4 covering the gate wiring 18 via a barrier metal 23. The gate runner 19 is connected to the gate wiring 18 via a contact hole formed in the interlayer insulating film 4 via the barrier metal 23.

[0031] A first passivation film 20 made of a material other than organic resin is formed so as to cover a portion of the emitter electrode 14, which is a metal electrode, and the gate runner 19. A second passivation film 21 made of organic resin is formed on the first passivation film 20 so as to cover a portion of the emitter electrode 14 via the first passivation film 20. The first passivation film 20 is made of a material that does not easily diffuse copper. In this embodiment, a silicon nitride film (SiN) is used as the material for the first passivation film 20. However, the material for the first passivation film 20 is not limited to this, and may be, for example, a semi-insulating film containing nitrogen (N) or an oxide film containing silicon (Si).

[0032] A Ni layer 24 made of nickel (Ni) is formed on the emitter electrode 14. The Ni layer 24 is connected to a portion of the emitter electrode 14 that is not covered with the first passivation film 20, and an end of the Ni layer 24 overlaps the first passivation film 20. However, the second passivation film 21 and the Ni layer 24 are spaced apart. Furthermore, an Au layer 25 made of gold (Au) is provided above the Ni layer 24. In this embodiment, the top electrode of the semiconductor element 41 is formed by a layered structure made of the emitter electrode 14, the Ni layer 24, and the Au layer 25. That is, the top electrode of this embodiment includes a layered structure in which, from the top surface side (the surface side to which the conductive metal plate 22 described below is bonded), the Au layer 25, the Ni layer 24, and the emitter electrode 14, which is an Al layer or an AlSi layer, are arranged in this order.

[0033] The thickness of the Ni layer 24 (the vertical dimension on the paper surface of FIG. 2) is approximately 2 μm to 15 μm. The thickness of the Au layer 25 is approximately 30 nm to 70 nm. The thickness of the emitter electrode 14 is approximately 3 μm to 10 μm. The Ni layer 24 and the Au layer 25 are formed by, for example, chemical vapor deposition (CVD), physical vapor deposition (PVD) such as sputtering, or plating.

[0034] Figure 2 shows an example in which the first passivation film 20 and the second passivation film 21 are provided at the boundary between the cell region and the termination region of the semiconductor element 41, but the first passivation film 20 and the second passivation film 21 may also be provided, for example, between multiple IGBT cells within the cell region.

[0035] A conductive metal plate 22 is solid-phase diffusion bonded onto the Au layer 25, which is the top layer of the upper electrode. The conductive metal plate 22 is flat and made of Cu or a conductive metal containing Cu as a main component, such as copper, a copper alloy, or a copper composite (CIC structure: copper / inver / copper). The thickness of the conductive metal plate 22 is approximately 0.01 mm to 1.0 mm. The surface (exterior) of the conductive metal plate 22 is made of copper or a copper alloy, and is not plated, so that no metal other than copper or a copper alloy is present on the surface of the conductive metal plate 22. However, the surface of the conductive metal plate 22 may be covered with an anti-rust material obtained by anti-rust treatment.

[0036] The metal wire 47b is wire-bonded to the upper surface of the conductive metal plate 22. From the viewpoint of high reliability and long life, the metal wire 47b is preferably made of the same material as the conductive metal plate 22.

[0037] The planar size (area) of conductive metal plate 22 is smaller than the size of the upper electrode. Here, the planar size of conductive metal plate 22 is smaller than the planar size of Au layer 25, which is the uppermost layer of the upper electrode (the layer to which conductive metal plate 22 is bonded). In other words, conductive metal plate 22 is provided so as not to protrude outside the upper electrode. This is to facilitate positioning of conductive metal plate 22 with respect to Au layer 25 when conductive metal plate 22 is bonded to Au layer 25 by solid-state diffusion bonding, and also to prevent conductive metal plate 22 from contacting (becoming conductive with) other electrodes on semiconductor element 41.

[0038] FIG. 3 shows an example of the configuration of the top surface of a semiconductor element 41. The semiconductor element 41 shown in FIG. 3 has two Au layers 25 as top electrodes, and a conductive metal plate 22 is connected to each of the two Au layers 25 so that the conductive metal plate 22 overlaps the Au layer 25. Solid-state diffusion bonding between the Au layer 25 and the conductive metal plate 22 is achieved by bringing an ultrasonic tool (not shown) into contact with the top surface of the conductive metal plate 22 placed on the Au layer 25, and applying ultrasonic vibrations while applying a load, thereby generating friction between the conductive metal plate 22 and the Au layer 25. FIG. 3 shows an example in which the entire contact surface between the conductive metal plate 22 and the Au layer 25 becomes a bonded portion 33 by using an ultrasonic tool with a size (area) larger than that of the conductive metal plate 22.

[0039] The upper surface of conductive metal plate 22 is subjected to the load and ultrasonic vibration from the ultrasonic tool, and ultrasonic energy is applied to the extent that traces of the ultrasonic tool are left behind. As a result, atoms in conductive metal plate 22 and Au layer 25 diffuse, resulting in sufficient bonding strength at joint 33 between conductive metal plate 22 and Au layer 25, resulting in a highly reliable joint 33. Note that metal wire 47 may also be bonded using a similar method.

[0040] The size of the joint 33 between the conductive metal plate 22 and the Au layer 25 varies depending on the size of the ultrasonic tool. FIG. 4 shows an example in which a semiconductor element 41 has one Au layer 25 as an upper electrode, and the conductive metal plate 22 is joined to the Au layer 25. In FIG. 4, the joint 33 between the conductive metal plate 22 and the Au layer 25 is smaller than the conductive metal plate 22 and is located in the center of the conductive metal plate 22. This is because the solid-state diffusion bonding between the conductive metal plate 22 and the Au layer 25 is performed by bringing an ultrasonic tool smaller than the conductive metal plate 22 into contact with the center of the conductive metal plate 22.

[0041] 5 shows an example in which a semiconductor element 41 has two Au layers 25 as upper electrodes, and a conductive metal plate 22 is bonded to each of the two Au layers 25. In Fig. 5, bonding portions 33 between the conductive metal plate 22 and the Au layer 25 are located at five locations: the center and four corners of the conductive metal plate 22. This is because solid-state diffusion bonding between the conductive metal plate 22 and the Au layer 25 is performed at five locations: the center and four corners of the conductive metal plate 22, using an ultrasonic tool that is smaller than the size of the conductive metal plate 22.

[0042] The ultrasonic tool applies ultrasonic vibrations horizontally to the contact surface between the conductive metal plate 22 and the Au layer 25. The ultrasonic tool can apply ultrasonic vibrations in either the horizontal (X) or vertical (Y) directions in the plane of the paper in Figures 3, 4, and 5. Because the ultrasonic tool can apply ultrasonic vibrations in one or two directions, it is possible to apply ultrasonic energy in a rectangular or circular shape by combining the X and Y directions, similar to the trajectory of laser bonding irradiation. Alternatively, ultrasonic energy can be applied in one or two directions from the ultrasonic tool while rotating the stage holding the semiconductor element 41 or the insulating substrate 43 to which the semiconductor element 41 is bonded. Combining ultrasonic vibrations in various vibration directions in this way minimizes damage to the semiconductor element 41 caused by ultrasonic vibrations and facilitates the diffusion of atoms between the conductive metal plate 22 and the Au layer 25, which is the electrode on the semiconductor element 41, thereby achieving higher bonding strength at the bonded portion 33 between the conductive metal plate 22 and the Au layer 25.

[0043] As described above, according to the semiconductor device 100 of the first embodiment, the conductive metal plate 22 is solid-phase diffusion bonded to the top electrode of the semiconductor element 41, rather than Cu plating, thereby suppressing increases in production costs. Furthermore, since the metal wire 47 is bonded to the conductive metal plate 22, wire breakage due to lift-off (peeling) is less likely to occur compared to direct bonding of the metal wire to the top electrode, contributing to improved reliability and longer life. Furthermore, because the conductive metal plate 22 is a plate-like member whose thickness is easy to control, there is no unevenness in thickness or uneven appearance, as occurs with Cu plating.

[0044] Next, a method for manufacturing the semiconductor device 100 according to the first embodiment, in particular, the step of solid-phase diffusion bonding the conductive metal plate 22 to the semiconductor element 41 will be described with reference to the flowchart of FIG.

[0045] First, an ultrasonic tool is attached to an ultrasonic bonding device, and a semi-finished product in which semiconductor elements 41 are bonded to insulating substrates 43 and conductive metal plates 22 are prepared (step S101). At this time, the number of conductive metal plates 22 prepared corresponds to the number of upper surface electrodes of semiconductor elements 41.

[0046] An insulating substrate 43 carrying a semiconductor element 41 is fixed to a stage of an ultrasonic bonding apparatus by suction or a holding jig, and a conductive metal plate 22 is placed on the upper surface electrodes of the semiconductor element 41. An ultrasonic tool is then lowered in a direction perpendicular to the conductive metal plate 22 (Z direction) and pressed against the conductive metal plate 22 to apply a load, thereby fixing and holding the upper surface electrodes of the semiconductor element 41 and the conductive metal plate 22 together (step S102). If the ultrasonic bonding apparatus has a camera and image recognition function and can use them to monitor and automatically control the operation of the ultrasonic tool or the stage, step S102 can also be performed automatically.

[0047] Thereafter, an ultrasonic tool is used to apply ultrasonic vibrations to the conductive metal plate 22 while applying a load, thereby solid-state diffusion bonding the upper electrode of the semiconductor element 41 and the conductive metal plate 22 (step S103). Step S103 may be performed while heating the conductive metal plate 22. In this case, the bonding energy applied to the conductive metal plate 22 increases, resulting in a stronger bonded portion 33. However, since heating can accelerate oxidation, when step S103 is performed while overheating the conductive metal plate 22, it is preferable to perform the step while spraying an inert gas such as nitrogen or in an inert gas atmosphere.

[0048] As shown in FIG. 3 or 5, when there are a plurality of locations where solid phase diffusion bonding is to be performed, step S103 is repeated a plurality of times.

[0049] After the solid-state diffusion bonding is completed, the ultrasonic tool is raised and separated from the conductive metal plate 22, and metal chips scattered on the insulating substrate 43, the semiconductor element 41, and the conductive metal plate 22 are removed by air blowing (step S104). The metal chips are minute metal chips generated when the ultrasonic tool ultrasonically vibrates the conductive metal plate 22 while applying a load to it. For example, if the conductive metal plate 22 is made of Cu, minute Cu chips are generated.

[0050] The load and ultrasonic vibration may be applied to the conductive metal plate 22 in two stages, such as in a step waveform. For example, ultrasonic vibration may be applied with a small load in the first half of the solid-state diffusion bonding process, and ultrasonic vibration may be applied with a large load in the second half.

[0051] After the air blowing is completed, an appearance inspection is performed to visually check whether there are any cracks in the semiconductor element 41 or whether any metal scraps remain (step S105). If the ultrasonic bonding device has a camera and an image recognition function and is capable of performing an appearance inspection using these, step S105 can be performed automatically. Alternatively, an automatic appearance inspection device separate from the ultrasonic bonding device may be used.

[0052] 7 shows a flowchart of a modified example of the process of solid-state diffusion bonding a conductive metal plate 22 to a semiconductor element 41. In the flow of FIG. 6, in step S101, a semi-finished product, that is, a semiconductor element 41 bonded to an insulating substrate 43, is prepared, but in the flow of FIG. 7, in step S101, a semiconductor element 41 before being bonded to an insulating substrate 43 is prepared. Also, in the flow of FIG. 7, each of the processes from step S102 to S105 is performed on the semiconductor element 41 before being bonded to an insulating substrate 43. Other than that, the process is the same as the flow of FIG. 6.

[0053] 6, if any one of the semiconductor elements 41 is damaged and becomes defective in the solid-state diffusion bonding process (step S103), all of the semiconductor elements 41 on the insulating substrate 43 cannot proceed to the next process. In the flow of FIG. 7, the solid-state diffusion bonding process (step S103) is performed on each individual semiconductor element 41, which has the advantage of improving yield because only the defective semiconductor elements 41 need to be removed. This advantage is particularly effective when the semiconductor elements 41 are made of expensive SiC.

[0054] 6 or 7 is completed, the metal wire 47b is wire-bonded to the conductive metal plate 22, the case 44 is adhered and fixed onto the insulating substrate 43 with adhesive 45, the metal wire 47a is wire-bonded to complete the internal wiring, and the case 44 is sealed by filling the sealing resin 48 into the case 44. The wire bonding of the metal wire 47a and the wire bonding of the metal wire 47b may be performed simultaneously after the case 44 is adhered and fixed to the insulating substrate 43.

[0055] In this embodiment, since no bonding material or plating is interposed between the upper surface electrode of semiconductor element 41 and conductive metal plate 22, conductive metal plate 22 is disposed parallel to the upper surface electrode of semiconductor element 41. This facilitates bonding of metal wire 47b, thereby achieving effects such as suppressing damage to the semiconductor element and preventing wire peeling.

[0056] In FIG. 2, a trench-gate IGBT is shown as an example of the semiconductor element 41. However, as described above, the semiconductor element 41 is not limited to an IGBT, and may be, for example, a MOSFET or an FWD. FIG. 8 shows a configuration example of the semiconductor element 41, which is a PN junction diode used as an FWD. FIG. 9 shows a configuration example of the semiconductor element 41, which is a planar-gate MOSFET. In FIGS. 8 and 9, elements corresponding to those shown in FIG. 2 are assigned the same reference numerals. Note that FIGS. 8 and 9 show cross sections of a cell region.

[0057] 8, when the semiconductor element 41 is a PN junction diode, an anode layer 52 of a second conductivity type is formed on a surface portion of the semiconductor substrate 30 on the first main surface 31 side, and an anode electrode 51 connected to the anode layer 52 is formed on the first main surface 31. A cathode layer 54 of a first conductivity type is formed on a surface portion of the semiconductor substrate 30 on the second main surface 32 side, and a cathode electrode 53 connected to the cathode layer 54 is formed on the second main surface 32. A Ni layer 24 and an Au layer 25 are provided on the anode electrode 51. That is, in the configuration of FIG. 8, the anode electrode 51, the Ni layer 24, and the Au layer 25 form an upper electrode. A conductive metal plate 22 is solid-state diffusion bonded to the Au layer 25, which is the uppermost layer of the upper electrode.

[0058] As shown in FIG. 9 , when the semiconductor element 41 is a planar-gate MOSFET, a well layer 15 of a second conductivity type is selectively formed in a surface portion on the first main surface 31 side of the semiconductor substrate 30, and a source layer 56 of a first conductivity type is selectively formed in a surface portion of the well layer 15. Furthermore, a gate insulating film 11 and a gate electrode 12 are formed on the first main surface 31 of the semiconductor substrate 30, and are provided so as to face the well layer 15 between the source layer 56 and the drift layer 1 in the surface portion of the semiconductor substrate 30. The gate electrode 12 is covered with an interlayer insulating film 4, and a barrier metal 23 and a source electrode 55 are formed on the interlayer insulating film 4. The source electrode 55 is connected to the source electrode 55 and the well layer 15 via the barrier metal 23 through a contact hole formed in the interlayer insulating film 4. Furthermore, a drain layer 57 of a first conductivity type is formed in a surface portion on the second main surface 32 side of the semiconductor substrate 30, and a drain electrode 58 connected to the drain layer 57 is formed on the second main surface 32. The Ni layer 24 and the Au layer 25 are provided on the source electrode 55. That is, in the configuration of FIG. 9, the source electrode 55, the Ni layer 24, and the Au layer 25 form an upper electrode. The conductive metal plate 22 is solid-state diffusion bonded to the Au layer 25, which is the uppermost layer of the upper electrode. The conductive metal plate 22 is solid-state diffusion bonded to the Au layer 25, which is the uppermost layer of the upper electrode.

[0059] 2, 8, and 9 are merely examples of the configuration of the semiconductor element 41, and the configuration of the semiconductor element 41 is not limited thereto. For example, the semiconductor element 41 may be an RC-IGBT (Reverse Conducting IGBT) in which an IGBT and an FWD are integrated on a single semiconductor chip. The RC-IGBT can reduce the mounting area of ​​the semiconductor element 41, thereby contributing to the miniaturization of the semiconductor device 100. The RC-IGBT also has the advantage of being able to reduce the number of manufacturing steps (for example, the number of steps for solid-state diffusion bonding the conductive metal plate 22 to the upper electrode of the semiconductor element 41 can be reduced), thereby significantly improving productivity and production takt time.

[0060] In Figure 1, the package configuration of semiconductor device 100 is shown as one in which semiconductor element 41 is housed in case 44, but for example, the package configuration of semiconductor device 100 may also be one in which semiconductor element 41 is molded with a thermosetting sealing resin (a so-called transfer mold type package).

[0061] Depending on the operating conditions of the semiconductor device 100, the operating temperature of the semiconductor element 41 may exceed its rated value, degrading the switching performance of the semiconductor element 41 and, in the worst case, causing thermal runaway and destruction. Therefore, to prevent the operating temperature of the semiconductor element 41 from exceeding its rated value, it is preferable to use an insulating substrate 43 with excellent thermal conductivity. Furthermore, as shown in FIG. 10 , a cooler 50 having multiple fins may be attached to the underside of the insulating substrate 43 (i.e., the underside of the base plate 43c) via a heat dissipation material 49. The heat dissipation material 49 may be, for example, a bonding material, thermal grease, or a thermal interface material (TIM). The cooler 50 is made of a metal with excellent thermal conductivity, such as aluminum (Al) or copper (Cu), and the cooling method of the cooler 50 may be air-cooling or water-cooling.

[0062] The insulating substrate 43 and the cooler 50 may be integrated together. In this case, the heat dissipation material 49 can be omitted, and the thermal resistance between the insulating substrate 43 and the cooler 50 is reduced, thereby further improving the cooling performance of the semiconductor element 41.

[0063] <Embodiment 2> Fig. 11 is a cross-sectional view of a semiconductor element 41 mounted on a semiconductor device 100 according to embodiment 2. In Fig. 11, elements corresponding to those shown in Fig. 2 are given the same reference numerals, and therefore their description will be omitted here, and differences from Fig. 2 will be mainly described.

[0064] The configuration in Fig. 11 is the same as that in Fig. 2, except that the Ni layer 24 and the Au layer 25 are omitted. In Fig. 11, the emitter electrode 14 serves as the upper electrode of the semiconductor element 41, and the conductive metal plate 22 is solid-state diffusion bonded to the emitter electrode 14.

[0065] 11, the thickness of the emitter electrode 14 is preferably large, for example, approximately several hundred nanometers, so as not to damage the semiconductor element 41 when the conductive metal plate 22 is solid-state diffusion bonded to the emitter electrode 14. Conversely, the configuration of FIG. 11 is applicable when the energy required when solid-state diffusion bonding the conductive metal plate 22 to the emitter electrode 14 can be reduced to a level that does not damage the semiconductor element 41.

[0066] According to the second embodiment, the Ni layer 24 and the Au layer 25 are omitted, so that the number of manufacturing steps for the semiconductor device 100 can be reduced, and the number of materials and manufacturing costs can also be reduced.

[0067] The overall structure and manufacturing method of the semiconductor device 100 according to the second embodiment may be basically the same as those of the first embodiment.

[0068] <Third Embodiment> Fig. 12 is a cross-sectional view of a semiconductor element 41 mounted on a semiconductor device 100 according to embodiment 3. Fig. 13 is an enlarged cross-sectional view of the vicinity of the semiconductor element 41 in the semiconductor device 100 according to embodiment 3. In Figs. 12 and 13, elements corresponding to those shown in Fig. 1 or 2 are given the same reference numerals, and therefore, description thereof will be omitted here, and differences from Figs. 1 and 2 will be mainly described.

[0069] The third embodiment differs from the first embodiment in that the metal wire 47b connecting the upper electrode of the semiconductor element 41 and the electrode terminal 46 is omitted, and the electrode terminal 46 is directly bonded to the upper electrode of the semiconductor element 41, as shown in FIG. 13 . Also, as shown in FIG. 12 , the electrode terminal 46 also serves as the conductive metal plate 22 and is solid-state diffusion bonded to the Au layer 25, which is the uppermost layer of the upper electrode of the semiconductor element 41. Therefore, like the conductive metal plate 22 of the first embodiment, the electrode terminal 46 is made of Cu or a conductive metal containing Cu as a main component, such as sheet copper, a copper alloy, or a copper composite (CIC structure). While the electrode terminal 46 shown in FIG. 1 has one end protruding from the case 44, the electrode terminal 46 shown in FIGS. 12 and 13 may not protrude from the case 44 and may form internal wiring, or may be independent of the case 44 (not inserted into the case 44).

[0070] 13, the electrode terminal 46 is bent so as to form a bonding surface with the semiconductor element 41. In the example of FIG. 13, the electrode terminal 46 is L-shaped, and the lower surface of the L-shape is solid-state bonded to the Au layer 25, which is the uppermost layer of the upper surface electrode of the semiconductor element 41. The electrode terminal 46 may also have a bent shape, in which case stress generated in the environment in which the semiconductor device 100 is used can be alleviated. The thickness of the electrode terminal 46 is set according to the specifications and current flowing in the semiconductor device 100, and is, for example, approximately 0.4 mm to 1.5 mm.

[0071] The overall structure and manufacturing method of the semiconductor device 100 according to the third embodiment may be basically the same as those of the first embodiment.

[0072] <Fourth Embodiment> In the fourth embodiment, the semiconductor device 100 according to the first to third embodiments is applied to a power conversion device. Although the present embodiment is not limited to a specific power conversion device, the following will describe the fourth embodiment when applied to a three-phase inverter.

[0073] Fig. 14 is a block diagram showing the configuration of a power conversion system to which the power conversion device according to this embodiment is applied. The power conversion system shown in Fig. 14 is composed of a power supply 210, a power conversion device 220, and a load 230. The power supply 210 is a DC power supply and supplies DC power to the power conversion device 220. The power supply 210 can be composed of various things, such as a DC system, a solar cell, or a storage battery, or it may be composed of a rectifier circuit connected to an AC system or an AC / DC converter. Furthermore, the power supply 210 may be composed of a DC / DC converter that converts DC power output from the DC system into predetermined power.

[0074] The power conversion device 220 is a three-phase inverter connected between the power supply 210 and the load 230, and converts DC power supplied from the power supply 210 into AC power and supplies the AC power to the load 230. As shown in Fig. 14 , the power conversion device 220 includes a main conversion circuit 221 that converts DC power into AC power and outputs it, a drive circuit 222 that outputs drive signals that drive the switching elements of the main conversion circuit 221, and a control circuit 223 that outputs control signals to the drive circuit 222.

[0075] The load 230 is a three-phase electric motor driven by AC power supplied from the power conversion device 220. The load 230 is not limited to a specific application, but is an electric motor mounted on various electric devices, and is used as an electric motor for, for example, a hybrid vehicle, an electric vehicle, a railroad car, an elevator, or an air conditioning device.

[0076] The power conversion device 220 will be described in detail below. The main conversion circuit 221 includes switching elements and freewheel diodes (not shown). By switching the switching elements, the DC power supplied from the power supply 210 is converted into AC power and supplied to the load 230. There are various specific circuit configurations for the main conversion circuit 221. However, the main conversion circuit 221 according to this embodiment is a two-level three-phase full-bridge circuit that can be configured with six switching elements and six freewheel diodes connected in anti-parallel to each switching element. Each switching element of the main conversion circuit 221 is configured using the semiconductor device 100 according to any one of the first to third embodiments. Note that this description will be given for a configuration using the semiconductor device 100 according to the first embodiment. Two of the six switching elements are connected in series to form upper and lower arms, and each upper and lower arm forms one phase (U phase, V phase, W phase) of the full-bridge circuit. The output terminals of each upper and lower arm, i.e., the three output terminals of the main conversion circuit 221, are connected to the load 230.

[0077] The drive circuit 222 generates drive signals for driving the switching elements of the main conversion circuit 221 and supplies them to the control electrodes of the switching elements of the main conversion circuit 221. Specifically, in accordance with control signals from a control circuit 223 (described later), the drive circuit 222 outputs to the control electrodes of each switching element a drive signal that turns the switching element on and a drive signal that turns the switching element off. When maintaining a switching element in the on state, the drive signal is a voltage signal (on signal) that is equal to or higher than the threshold voltage of the switching element, and when maintaining a switching element in the off state, the drive signal is a voltage signal (off signal) that is equal to or lower than the threshold voltage of the switching element.

[0078] The control circuit 223 controls the switching elements of the main conversion circuit 221 so that the desired power is supplied to the load 230. Specifically, it calculates the time (on time) that each switching element of the main conversion circuit 221 should be in the on state based on the power to be supplied to the load 230. For example, the main conversion circuit 221 can be controlled by PWM control, which modulates the on time of the switching elements according to the voltage to be output. Then, it outputs a control command (control signal) to the drive circuit 222 so that an on signal is output to a switching element that should be in the on state at each point in time, and an off signal is output to a switching element that should be in the off state at each point in time. In accordance with this control signal, the drive circuit 222 outputs an on signal or an off signal as a drive signal to the control electrode of each switching element.

[0079] In the power conversion device 220 according to this embodiment, the power semiconductor devices according to the first to third embodiments are applied as switching elements of the main conversion circuit 221, and therefore reliability can be improved.

[0080] In this embodiment, a two-level power conversion device 220 has been described, but this embodiment is not limited to this and can be applied to various types of power conversion devices 220. In this embodiment, the two-level power conversion device 220 is described, but a three-level or multi-level power conversion device 220 may also be used, and when power is supplied to a single-phase load 230, the first to third embodiments may be applied to a single-phase inverter. Furthermore, when power is supplied to a DC load 230 or the like, the first to third embodiments may also be applied to a DC / DC converter or an AC / DC converter.

[0081] Furthermore, the power conversion device 220 to which the first to third embodiments are applied is not limited to the case where the load 230 described above is an electric motor, but can also be used, for example, as a power supply 210 device for an electric discharge machine, a laser processing machine, an induction heating cooker, or a non-contact power supply system, and can also be used as a power conditioner for a solar power generation system, a power storage system, etc.

[0082] It is possible to freely combine the embodiments, and to modify or omit the embodiments as appropriate.

[0083] <Additional Notes> Various aspects of the present disclosure are summarized below as appendices.

[0084] (Appendix 1) A semiconductor element; an upper surface electrode formed on an upper surface of the semiconductor element; a conductive metal plate containing copper as a main component and solid-state diffusion bonded onto the upper electrode of the semiconductor element; A semiconductor device comprising:

[0085] (Appendix 2) the upper electrode includes a laminated structure in which an Au layer, a Ni layer, and an Al layer or an AlSi layer are arranged in this order from the surface side to be solid-phase diffusion bonded to the conductive metal plate; 2. The semiconductor device according to claim 1.

[0086] (Appendix 3) the upper electrode is formed on an interlayer insulating film, a barrier metal containing Ti or W is provided between the Al layer or the AlSi layer of the upper electrode and the interlayer insulating film; 3. The semiconductor device according to claim 2.

[0087] (Appendix 4) the thickness of the Au layer is 30 nm or more and 70 nm or less, the thickness of the Ni layer is 2 μm or more and 15 μm or less, the thickness of the Al layer or the AlSi layer is 3 μm or more and 10 μm or less, and the thickness of the barrier metal is 10 nm or more and 300 nm or less; 4. The semiconductor device according to claim 3.

[0088] (Appendix 5) The upper electrode has an Al layer or an AlSi layer on the surface of the conductive metal plate to be solid-phase diffusion bonded. 2. The semiconductor device according to claim 1.

[0089] (Appendix 6) the upper electrode is formed on an interlayer insulating film, a barrier metal containing Ti or W is provided between the Al layer or the AlSi layer of the upper electrode and the interlayer insulating film; 6. The semiconductor device according to claim 5.

[0090] (Appendix 7) a planar size of the conductive metal plate is smaller than a planar size of the upper surface electrode, and the conductive metal plate is provided without protruding from the upper surface electrode; 7. The semiconductor device according to claim 1, wherein the semiconductor device is a semiconductor device having a first insulating layer.

[0091] (Appendix 8) The thickness of the conductive metal plate is 0.01 mm or more and 1.0 mm or less. 8. The semiconductor device according to claim 1, wherein the semiconductor device is a semiconductor device having a first insulating layer.

[0092] (Appendix 9) a plurality of the upper surface electrodes are formed on the upper surface of the semiconductor element, and the upper surface electrodes are provided on each of the plurality of conductive metal plates; 9. The semiconductor device according to claim 1, wherein the semiconductor device is a semiconductor device having a first insulating layer.

[0093] (Appendix 10) the conductive metal plate is solid-phase diffusion bonded to the upper surface electrode of the semiconductor element at a plurality of locations; 10. The semiconductor device according to claim 1, wherein the semiconductor device is a semiconductor device having a first insulating layer.

[0094] (Appendix 11) A metal wire made of the same material as the conductive metal plate is solid-phase diffusion bonded to the conductive metal plate. 11. The semiconductor device according to claim 1.

[0095] (Appendix 12) the conductive metal plate is an electrode terminal having an L-shaped end, and a lower surface of the L-shaped end is solid-state diffusion bonded to the upper electrode; 11. The semiconductor device according to claim 1.

[0096] (Appendix 13) The semiconductor element is an RC-IGBT. 13. The semiconductor device according to claim 1.

[0097] (Appendix 14) The semiconductor element is formed of a wide band gap semiconductor. 14. The semiconductor device according to claim 1, wherein the semiconductor device is a semiconductor device having a first insulating layer.

[0098] (Appendix 15) a main conversion circuit having the semiconductor device according to any one of Supplementary Note 1 to Supplementary Note 14, which converts input power and outputs the converted power; a drive circuit that outputs a drive signal to the semiconductor device; a control circuit that outputs a control signal to the drive circuit to control the drive circuit; A power conversion device comprising:

[0099] (Appendix 16) providing an ultrasonic tool, a semiconductor element, and a conductive metal plate; placing the semiconductor element on a stage, placing the conductive metal plate on the upper electrode of the semiconductor element, and fixing and holding the conductive metal plate to the upper electrode using the ultrasonic tool; applying a load and ultrasonic vibrations to the conductive metal plate from the ultrasonic tool to solid-state diffusion bond the conductive metal plate to the upper electrode; a step of blowing air onto the semiconductor element to which the conductive metal plate is joined; a step of inspecting the appearance of the semiconductor element after the air blowing; A method for manufacturing a semiconductor device comprising:

[0100] (Appendix 17) In the step of preparing the semiconductor element, the semiconductor element is prepared in a state of being bonded to an insulating substrate. 17. A method for manufacturing a semiconductor device according to claim 16. [Explanation of symbols]

[0101] 1 drift layer, 2 carrier accumulation layer, 3 base layer, 4 interlayer insulating film, 5 emitter layer, 6 contact layer, 7 buffer layer, 8 collector layer, 9 collector electrode, 10 active trench, 11 gate insulating film, 12 gate electrode, 13 dummy trench, 14 emitter electrode, 15 well layer, 16 resurf layer, 17 field oxide film, 18 gate wiring, 19 gate runner, 20 first passivation film, 21 second passivation film, 22 conductive metal plate, 23 barrier metal, 24 Ni layer, 25 Au layer, 30 semiconductor substrate, 31 first main surface, 32 second main surface, 33 junction, 41 semiconductor element, 42 bonding material, 43 insulating substrate, 43a circuit pattern, 43b insulating layer, 43c base plate, 44 case, 45 adhesive, 46 electrode terminal, 47 Metal wire, 47a metal wire, 47b metal wire, 48 sealing resin, 49 heat dissipation material, 50 cooler, 51 anode electrode, 52 anode layer, 53 cathode electrode, 54 cathode layer, 55 source electrode, 56 source layer, 57 drain layer, 58 drain electrode, 100 semiconductor device, 210 power supply, 220 power conversion device, 221 main conversion circuit, 222 drive circuit, 223 control circuit, 230 load.

Claims

1. A semiconductor element; an upper surface electrode formed on an upper surface of the semiconductor element; a conductive metal plate containing copper as a main component and solid-state diffusion bonded onto the upper electrode of the semiconductor element; Equipped with the upper electrode has an Al layer or an AlSi layer on the surface of the conductive metal plate to be solid-phase diffusion bonded; Semiconductor device.

2. the upper electrode is formed on an interlayer insulating film, a barrier metal containing Ti or W is provided between the Al layer or the AlSi layer of the upper electrode and the interlayer insulating film; The semiconductor device according to claim 1 .

3. a planar size of the conductive metal plate is smaller than a planar size of the upper surface electrode, and the conductive metal plate is provided without protruding from the upper surface electrode; 3. The semiconductor device according to claim 1.

4. The thickness of the conductive metal plate is 0.01 mm or more and 1.0 mm or less.

3. The semiconductor device according to claim 1.

5. a plurality of the upper surface electrodes are formed on the upper surface of the semiconductor element, and the upper surface electrodes are provided on each of the plurality of conductive metal plates; 3. The semiconductor device according to claim 1.

6. the conductive metal plate is solid-phase diffusion bonded to the upper surface electrode of the semiconductor element at a plurality of locations; 3. The semiconductor device according to claim 1.

7. A metal wire made of the same material as the conductive metal plate is solid-phase diffusion bonded to the conductive metal plate.

3. The semiconductor device according to claim 1.

8. the conductive metal plate is an electrode terminal having an L-shaped end, and a lower surface of the L-shaped end is solid-state diffusion bonded to the upper electrode; 3. The semiconductor device according to claim 1.

9. The semiconductor element is an RC-IGBT.

3. The semiconductor device according to claim 1.

10. The semiconductor element is formed of a wide band gap semiconductor.

3. The semiconductor device according to claim 1.

11. a main conversion circuit including the semiconductor device according to claim 1 or 2, which converts input power and outputs the converted power; a drive circuit that outputs a drive signal to the semiconductor device; a control circuit that outputs a control signal to the drive circuit to control the drive circuit; A power conversion device comprising:

12. providing an ultrasonic tool, a semiconductor element, and a conductive metal plate; placing the semiconductor element on a stage, placing the conductive metal plate on the upper electrode of the semiconductor element, and fixing and holding the conductive metal plate to the upper electrode using the ultrasonic tool; applying a load and ultrasonic vibrations to the conductive metal plate from the ultrasonic tool to solid-state diffusion bond the conductive metal plate to the upper electrode; a step of blowing air onto the semiconductor element to which the conductive metal plate is joined; a step of inspecting the appearance of the semiconductor element after the air blowing; Equipped with The conductive metal plate is mainly composed of copper, the upper electrode has an Al layer or an AlSi layer on the surface of the conductive metal plate to be solid-phase diffusion bonded; A method for manufacturing a semiconductor device.

13. In the step of preparing the semiconductor element, the semiconductor element is prepared in a state of being bonded to an insulating substrate. The method for manufacturing a semiconductor device according to claim 12.

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