High-speed FOUP exchange in a FOUP handler

The dual cassette handler arms and elevator mechanism in the vertical batch furnace assembly enable simultaneous wafer and cassette handling, addressing inefficiencies and enhancing processing capacity by eliminating idle times.

JP7772509B2Active Publication Date: 2025-11-18ASM IP HLDG BV
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Patent Information

Application Number
JP2021074882
Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
Priority Date
2020-05-01
Filing Date
2021-04-27
Publication Date
2025-11-18
Estimated Expiration
2041-04-27

AI Technical Summary

Technical Problem

Existing vertical batch furnace assemblies experience inefficiencies due to idle times when wafer handlers and cassette handlers cannot operate simultaneously, affecting overall processing capacity.

Method used

A vertical batch furnace assembly with dual cassette handler arms and an elevator mechanism that allows simultaneous movement of wafer cassettes between storage and transfer positions, enabling continuous operation without idle times.

Benefits of technology

Enhances processing capacity by allowing simultaneous handling of wafer cassettes and wafers, reducing idle times and improving operational efficiency.

✦ Generated by Eureka AI based on patent content.

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Patent Text Reader

Abstract

To provide a vertical batch furnace assembly (10) for processing wafers having a cassette handling space (12), a wafer handling space (14), and a first wall (16) separating the cassette handling space (12) from the wafer handling space (14).SOLUTION: A first wall (16) has at least one wafer transfer opening (20) in front thereof, and a wafer transfer position (22) for a wafer cassette (60) is provided at a side of the first wall (16) directed to a cassette handling space (12). The cassette handling space (12) comprises a cassette storage having a plurality of cassette storage positions (24), and a cassette handler (26, 28, 30) configured to transfer wafer cassettes (60) between the cassette storage positions (24) and the wafer transfer position (22). The cassette handler (26, 28, 30) has a first cassette handler arm (28) and a second cassette handler arm (30).SELECTED DRAWING: Figure 1
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Description

[Technical Field]

[0001] SUMMARY The present disclosure generally relates to a vertical batch furnace assembly with a cassette handler. [Background technology]

[0002] A vertical batch furnace assembly for processing wafers includes a cassette handling space, a wafer handling space, and a wall separating the two spaces. The wall has a wafer transfer opening provided with a cassette door opener device, in front of which is a wafer transfer position for wafer cassettes. The cassette handling space includes a cassette handler that can transport wafer cassettes between the wafer transfer position and a cassette storage box in which the wafer cassettes can be stored. The wafer handling space of the vertical batch furnace assembly can also include a wafer handler that removes wafers from the wafer cassette in the wafer transfer position and moves them through the wafer transfer opening to a wafer boat for processing in the process chamber. After processing the wafers as described above, the wafer handler can also return the wafers to the wafer cassette in the wafer transfer position. The cassette handler can then transfer the wafer cassette to the cassette storage box and exchange it for another wafer cassette from the cassette storage box. Summary of the Invention [Problem to be solved by the invention]

[0003] This Summary is provided to introduce a selection of concepts in a simplified form that are described in more detail below in the Detailed Description of the exemplary embodiments of this disclosure. This Summary is not intended to identify key features or essential features of the claimed subject matter, nor is it intended to be used to limit the scope of the claimed subject matter.

[0004] It can be appreciated that to fill an entire wafer boat, multiple wafer cassettes typically must be unloaded, and while the wafer cassettes are being moved to and from the wafer transfer position, the wafer handler may be unable to move wafers and may remain idle. Also, while the wafer handler is transferring wafers to and / or from the cassette at the wafer transfer position, the cassette handler may be unable to move the wafer cassette to or from the wafer transfer position and may remain idle. These idle times can adversely affect the efficiency of the vertical batch furnace assembly.

[0005] Therefore, it may be an object to provide a vertical batch furnace assembly with improved capacity. [Means for solving the problem]

[0006] To that end, there may be provided a vertical batch furnace assembly as set forth in claim 1. More specifically, there may be provided a vertical batch furnace assembly for processing wafers. The vertical batch furnace assembly may include a cassette handling space, a wafer handling space, and a first wall separating the cassette handling space from the wafer handling space. The first wall may include , small may have at least one wafer transfer opening; In front of the at least one wafer transfer opening, The first wall facing the cassette handling space side A wafer transfer position for a wafer cassette is provided in the cassette handling space. The cassette storage box may include a cassette storage box and a cassette handler. The cassette storage box may have a plurality of cassette storage positions configured to store wafer cassettes each having a plurality of wafers. The cassette handler may be configured to move the wafer cassettes between the cassette storage positions and the wafer transfer position. The cassette handler may include a first cassette handler arm and a second cassette handler arm.

[0007] For purposes of summarizing the invention and the advantages achieved over the prior art, certain objects and advantages of the invention have been described hereinabove. It is, of course, to be understood that not necessarily all such objects or advantages may be achieved in accordance with any particular embodiment of the invention. Thus, for example, those skilled in the art will recognize that the invention may be embodied or carried out in a manner to achieve or optimize one advantage or group of advantages as taught or suggested herein, without necessarily achieving other objects or advantages that may be taught or suggested herein.

[0008] Various embodiments are claimed in the dependent claims and will be further elucidated with reference to the examples shown in the figures. The embodiments may be combined or applied separately from each other.

[0009] All of these embodiments are intended to be within the scope of the invention disclosed herein. These and other embodiments will be readily apparent to those skilled in the art from the following Detailed Description of Certain Embodiments, which refers to the accompanying drawings, and the invention is not limited to any particular embodiment disclosed.

[0010] While this specification concludes with claims particularly pointing out and distinctly claiming what are regarded as embodiments of the present disclosure, the advantages of embodiments of the present disclosure may be more readily apparent from the following description of certain specific examples of embodiments of the present disclosure when read in conjunction with the accompanying drawings. [Brief explanation of the drawings]

[0011] [Figure 1] 1 shows an example of the relevant components of an illustrative vertical batch furnace assembly. [Figure 2] 1 shows an example of an illustrative cassette handler arm. [Figure 3] An example is shown in Figure 1, where the cassette handler arm has moved the cassette. [Figure 4] 10 shows a schematic diagram of another example of a vertical batch furnace assembly in accordance with the description; DETAILED DESCRIPTION OF THE INVENTION

[0012] In this application, similar or corresponding features are indicated by similar or corresponding reference numerals. The description of various embodiments is not limited to the examples shown in the figures, and the reference numerals used in the detailed description and claims are not intended to limit the description of the embodiments, but are included for a clear understanding of the embodiments.

[0013] Although certain embodiments and examples are disclosed below, it will be understood by those skilled in the art that the present invention extends beyond the specifically disclosed embodiments and / or uses of the present invention, as well as obvious modifications and equivalents thereof. Therefore, it is intended that the scope of the disclosed invention should not be limited by the specific disclosed embodiments described below. The figures shown herein are not meant to be actual illustrations of any particular materials, structures, or devices, but are merely idealized representations used to describe embodiments of the present disclosure.

[0014] As used herein, the term "wafer" may refer to any underlying material or materials that may be used or upon which a device, circuit, or film may be formed.

[0015] Most generally, the present disclosure may provide a vertical batch furnace assembly 10 for processing wafers. One example of the relevant components of the vertical batch furnace assembly 10 is shown in Figures 1, 3, and 4, referenced below, by way of non-limiting example. The vertical batch furnace assembly 10 may include a cassette handling space 12, a wafer handling space 14, and a first wall 16 separating the cassette handling space 12 from the wafer handling space 14. The first wall 16 may include a , small may have at least one wafer transfer opening 20; In front of the at least one wafer transfer opening 20, The first wall 16 facing the cassette handling space 12 sideA wafer transfer position 22 for a wafer cassette 60 is provided at the cassette handling space 12. The cassette handling space 12 may include a cassette storage box and cassette handlers 26, 28, 30. The cassette storage box may have a plurality of cassette storage locations 24 configured to store wafer cassettes 60 each having a plurality of wafers. The cassette handlers 26, 28, 30 may be configured to move the wafer cassettes 60 between the cassette storage locations 24 and the wafer transfer position 22. The cassette handlers 26, 28, 30 may include a first cassette handler arm 28 and a second cassette handler arm 30. In one embodiment, the cassette handlers 26, 28, 30 may further include an elevator mechanism configured to reach wafer cassettes placed on cassette storage locations at different vertical heights within the cassette handling space.

[0016] While the first wafer cassette 60 is at the wafer transfer position 22, a wafer handler (not shown) may load or unload wafers from the first wafer cassette 60, e.g., by transferring the wafers to a wafer boat to which the wafers may be attached during processing within the process chamber of the vertical batch furnace. In the illustrated vertical batch furnace assembly 10 including cassette handlers 26, 28, 30 having first and second cassette handler arms 28, 30, the cassette handlers 26, 28, 30 may retrieve the second wafer cassette 60 from the cassette storage box and move it to a position near the wafer transfer position 22 while the wafer handler is loading or unloading wafers from the first wafer cassette 60. The cassette handlers 26, 28, 30 may use one of the first or second cassette handler arms 28, 30 to hold the second wafer cassette 60 while the other cassette handler arm 28, 30 is idle. As soon as the wafer handler is ready to load / unload a first wafer cassette 60, the cassette handlers 26, 28, 30 can remove the first wafer cassette 60 from the wafer transfer location 22 with an unused cassette handler arm 28, 30, and then immediately place a second wafer cassette 60 at the wafer transfer location 22 with the other cassette handler arm 28, 30. Because the cassette handlers 26, 28, 30 do not need to move the first wafer cassette 60 to the cassette storage location 24 and the second wafer cassette 60 from another cassette storage location 24 to the wafer transfer location 22, the travel path is shortened, thereby saving time that the wafer handler would otherwise remain idle.

[0017] In one embodiment, cassette handlers 26, 28, 30 may further include a movable carriage 26 that is movable in a first direction 32. Both first cassette handler arm 28 and second cassette handler arm 30 may be connected to movable carriage 26 at their respective first ends.

[0018] Due to the fact that a single carriage 26 may carry both cassette handler arms 28, 30, only one drive may be required to move both arms along a first direction.

[0019] In one embodiment, first cassette handler arm 28 and second cassette handler arm 30 may each have a respective second end, and each arm 28, 30 may be configured to move its second end away from and toward its first end, respectively.

[0020] Such an embodiment allows the cassette handler arms 28, 30 to extend and retract.

[0021] In further detail, both the first and second cassette handler arms 28, 30 may be pivotally connected at or near a first end thereof to the movable carriage 26 of the cassette handler 26, 30. Each cassette handler arm 28, 30 may include a cassette gripper 34 at or near a second end thereof configured to grip a wafer cassette 60. The cassette gripper 34 of the first cassette handler arm 28 may be pivotally connected to the first cassette handler arm 28. The cassette gripper 34 of the second cassette handler arm 30 may be pivotally connected to the second cassette handler arm 30.

[0022] The mobile carriage 26 provides a base for the simultaneous movement of two cassette handler arms 28, 30. When mounted on the mobile carriage 26, both arms 28, 30 can move with the mobile carriage 26. In this manner, both arms can be near the wafer transfer location 22, or both can be near the cassette storage location 24.

[0023] In one embodiment, the first direction may be substantially vertical, and the cassette handlers 26, 28, 30 may further include an elevator mechanism that may be configured to move the movable carriage 26 up and down so that the first and second cassette handler arms 28, 30 can reach wafer cassettes positioned on cassette storage positions at different vertical levels within the cassette handling space.

[0024] In this embodiment, movement in a plane perpendicular to first direction 32 may be performed by cassette handler arms 28, 30 themselves, e.g., pivotally connected to movable carriage 26. Alternatively, a guide 36 on which movable carriage 26 may be mounted for movement along the first direction may be rotatable about an axis extending in the first direction. Also, movable carriage 26 may be rotatable about guide 36 along an axis extending in the first direction. That same guide 36 may also function as a guide 36 for movement of movable carriage 26 along the first direction.

[0025] In one embodiment, the elevator mechanisms 36, 38, 40 may include at least one first directional guide 36, 38 extending in the first direction 32. The movable carriage 26 may be movably mounted on the at least one first directional guide 36, 38 and may be movable along the first direction 32. Thus, the at least one first directional guide 36, 38 provides for movement of the movable carriage 26 in the first direction 32.

[0026] In one embodiment, an example of which is shown in FIGS. 1 and 3 , the movable carriage 26 is further movable in a second direction 42 perpendicular to the first direction 32. To that end, the elevator mechanisms 36, 38, 40 may include at least one first directional guide 36, 38 extending in the first direction 32 and a lateral guide 40 extending in the second direction 42. The movable carriage 26 may be movably mounted on the lateral guide 40 and may be movable along the second direction 42. The lateral guide 40 may be movably mounted on the at least one first directional guide 36, 38 and may be movable along the first direction 32. The at least one first directional guide 36, 38 may include a first guide 36 and a second guide 38. The lateral guide 40 may be mounted between the first guide 36 and the second guide 38. The at least one first directional guide 36, 38 and the lateral guide 40 therefore together provide movement along the first direction 32 and the second direction 42. Such an arrangement is highly stable and allows the carriage 26 to move at relatively high speeds in a plane of movement parallel to the first and second directions.

[0027] In an embodiment in which carriage 26 is movable only along a first direction, an example of which is shown in Figure 4, cassette storage locations 24 may be positioned at equal distances from line of motion 62 along which movable carriage 26 is movable in the first direction. Wafer transfer locations 22 may be positioned substantially the same distance from line of motion 62 as cassette storage locations 24. In such a configuration, cassette storage locations 24 may be positioned in a circle or circle segment around line of motion 62 at different vertical levels.

[0028] In one embodiment in which carriage 26 is movable along first and second directions that are perpendicular to one another, an example of which is shown in FIGS. 1 and 3 , cassette storage location 24 may be located at an equal distance from a plane 44 of movement of movable carriage 26. Plane 44 may be parallel to the first and second directions. Cassette storage location 24 may be on a first side of plane 44 and / or on a second side of plane 44 opposite the first side. Wafer transfer location 22 may be positioned on either the first or second side of plane 44 at substantially the same distance from plane 44 as cassette storage location 24.

[0029] In this embodiment, due to the fact that cassette storage locations 24 and wafer transfer locations 22 may be equidistant from plane 44, cassette handler arms 28, 30 only need to have one range of travel to be able to reach all of cassette storage locations 24 and wafer transfer locations 22. This means that a simpler design may be sufficient for these arms. For example, a design with three pivot points may be sufficient for cassette handler arms 28, 30. Therefore, cassette handler arms 28, 30 and their control may be relatively simple.

[0030] In one embodiment, an example of which is shown in FIG. 2 , both first cassette handler arm 28 and second cassette handler arm 30 may include first and second arm portions 46, 48 and a pivot joint 50 pivotally connecting said first and second arm portions 46, 48. First arm portion 46 may be pivotally connected to movable carriage 26 along pivot joint 64. Second arm portion 48 may be pivotally connected to cassette gripper 34 along pivot joint 66. In this manner, both cassette handler arms 28, 30 may pivot about their joints 64, 50, and 66, thereby decreasing or increasing the distance between the ends of the respective cassette handler arms 28, 30. Thus, a gripped wafer cassette 60 may be moved toward or away from movable carriage 26. Wafer cassette 60 can be moved away from mobile carriage 26 to place or remove said wafer cassette 60 in or from wafer transfer location 22 or onto or from cassette storage location 24. Gripper 34 with wafer cassette 60 can be moved towards mobile carriage 26 when movement of mobile carriage 26 along first direction and optionally second direction 32, 42 is desired.

[0031] In one embodiment, the wafer cassette 60 may be embodied as a FOUP. A FOUP is the industry standard wafer cassette 60 for wafers. The use of a FOUP is advantageous for the interchangeability of the wafer cassette 60 between the vertical batch furnace assembly 10 and other wafer processing machines.

[0032] In one embodiment, an example of which is shown in Figures 1 and 3, first cassette handler arm 28 and second cassette handler arm 30 may be positioned horizontally next to each other.

[0033] 4, first cassette handler arm 28 and second cassette handler arm 30 may be positioned perpendicular to one another. First cassette handler arm 28 and second cassette handler arm 30 may also be positioned in other orientations relative to one another, such as diagonally relative to one another, rather than horizontally adjacent to one another or vertically relative to one another. The optimal configuration for a particular vertical bath furnace assembly may depend on the configuration of cassette handling space 12.

[0034] In one embodiment, the vertical batch furnace assembly 10 may further include at least one cassette entry / exit port 52 provided in the walls 16, 18 that bound the cassette handling space 12. The cassette handlers 26, 28, 30 may be configured to further move wafer cassettes 60 to or from the at least one cassette entry / exit port 52. The at least one cassette entry / exit port 52 may be provided in a second wall 18 that bounds the cassette handling space 12, opposite the first wall 16.

[0035] At least one cassette entry / exit port 52 may provide an entrance to and exit from the vertical batch furnace assembly 10 for the exchange of wafer cassettes 60 between the vertical batch furnace assembly 10 and the outside world, particularly a clean room environment.

[0036] In one embodiment, the vertical batch furnace assembly 10 may include a cassette door opener device 54 for each wafer transfer opening 20. The cassette door opener device 54 may be configured to open the cassette door of a wafer cassette 60 located in the wafer transfer position 22.

[0037] In one embodiment, the vertical batch furnace assembly 10 may further include a wafer handler, a process chamber, and a wafer boat handling apparatus. The wafer handler may be positioned within the wafer handling space 14 and configured to transfer wafers between the wafer cassette 60 and the wafer boat at the wafer transfer position 22. The process chamber may be configured to process wafers contained in the wafer boat. The wafer boat handling apparatus may be positioned below the process chamber and adjacent to the wafer handling space 14. The wafer boat handling apparatus may include a wafer boat at the wafer boat transfer position and be configured to transfer wafers between the wafer boat transfer position and the process chamber.

[0038] While illustrative embodiments of the invention have been described above, in part with reference to the accompanying drawings, it should be understood that the invention is not limited to these embodiments. Variations to the disclosed embodiments can be understood and effected by those skilled in the art in practicing the claimed invention, from a study of the drawings, the disclosure, and the appended claims.

[0039] Throughout this specification, a reference to "one embodiment" or "an embodiment" means that a particular feature, structure, or characteristic described in connection with an embodiment is included in at least one embodiment of the invention. Thus, the use of the phrase "in one embodiment" or "in an embodiment" in various places throughout this description do not necessarily refer to the same embodiment.

[0040] Furthermore, it should be noted that one or more specific features, structures, or characteristics of the various embodiments described above may be used or implemented independently of one another and may be combined in any suitable manner to form new embodiments not expressly described. Reference numbers used in the detailed description and claims do not limit the description of the embodiments or the claims. Reference numbers are used for clarity only. [Explanation of symbols]

[0041] 10-Vertical Batch Furnace Assembly 12-Cassette handling space 14-Wafer handling space 16-The First Wall 18-The Second Wall 20-wafer transfer opening 22-Wafer transfer position 24-Cassette storage location 26- Movable carriage 28-First cassette handler arm 30-Second cassette handler arm 32-First Direction 34-Cassette Gripper 36-First Guide 38-Second Guide 40-Lateral guide 42-Second Direction 44-plane 46-First arm part 48-Second arm part 50-joint 52-Cassette inlet / outlet port 54-Cassette door opener device 60-wafer cassette 62-Moving Line 64-Pivot joint 66-Pivot joint

Claims

1. A vertical batch furnace assembly (10) for processing wafers, comprising: a cassette handling space (12); a wafer handling space (14); a first wall separating the cassette handling space (12) from the wafer handling space (14) and having at least one wafer transfer opening (20), wherein a wafer transfer position (22) for a wafer cassette (60) is provided on a side of the first wall facing the cassette handling space (12) in front of the at least one wafer transfer opening (20); The cassette handling space (12) a cassette storage box having a plurality of cassette storage locations (24) configured to store wafer cassettes (60) each having a plurality of wafers; a cassette handler (26, 28, 30) configured to move wafer cassettes (60) between the cassette storage location (24) and the wafer transfer location (22); The cassette handler (26, 28, 30) a first cassette handler arm (28); a second cassette handler arm (30); the cassette handler (26, 28, 30) further comprises a movable carriage (26) movable in a first direction (32), the first cassette handler arm (28) and the second cassette handler arm (30) both connected at first ends to the movable carriage (26); the first direction is substantially vertical, and the cassette handler (26, 28, 30) further comprises an elevator mechanism (36, 38, 40) configured to move the movable carriage (26) up and down so that the first cassette handler arm (28) and the second cassette handler arm (30) can reach wafer cassettes placed in cassette storage positions at different vertical levels within the cassette handling space; the movable carriage (26) is further movable in a second direction (42) perpendicular to the first direction (32); the elevator mechanism (36, 38, 40) comprises at least one first directional guide (36, 38) extending in the first direction (32) and a lateral guide (40) extending in the second direction (42), the movable carriage (26) is movably mounted on the lateral guide (40) and is movable along the second direction (42), and the lateral guide (40) is movably mounted on the at least one first directional guide (36, 38) and is movable along the first direction (32).

2. 2. The vertical batch furnace assembly of claim 1, wherein the first cassette handler arm (28) and the second cassette handler arm (30) each have a second end, and each cassette handler arm (28, 30) is configured to move the second end away from and toward the first end.

3. 3. The vertical batch furnace assembly of claim 2, wherein both the first cassette handler arm (28) and the second cassette handler arm (30) are pivotally connected at or near the first end to the movable carriage (26) of the cassette handler (26, 28, 30), and each cassette handler arm (28, 30) includes a cassette gripper (34) at or near the second end configured to grip a wafer cassette (60).

4. 4. The vertical batch furnace assembly of claim 3, wherein the cassette gripper (34) of the first cassette handler arm (28) is pivotally connected to the first cassette handler arm (28) and the cassette gripper (34) of the second cassette handler arm (30) is pivotally connected to the second cassette handler arm (30).

5. 5. The vertical batch furnace assembly of claim 1, wherein the at least one first directional guide comprises a first guide and a second guide, and the lateral guide is mounted between the first guide and the second guide.

6. 6. The vertical batch furnace assembly of claim 1, wherein the cassette storage locations are located at equal distances from a line of travel, the movable carriage is movable in the first direction along the line of travel, and the wafer transfer location is located at substantially the same distance from the line of travel as the cassette storage locations.

7. 7. The vertical batch furnace assembly of claim 1, wherein the cassette storage locations are located at equal distances from a plane of movement of the movable carriage, the plane being parallel to the first direction and the second direction, the cassette storage locations being on a first side of the plane and / or a second side of the plane opposite the first side, and the wafer transfer locations are located on either the first side or the second side of the plane at substantially the same plane distance as the cassette storage locations.

8. 8. The vertical batch furnace assembly of claim 1, wherein both the first cassette handler arm (28) and the second cassette handler arm (30) comprise a first arm portion (46) and a second arm portion (48) and a pivot joint (50) pivotally connecting the first arm portion (46) and the second arm portion (48), the first arm portion (46) being pivotally connected to the movable carriage (26) along a pivot joint (64), and the second arm portion (48) being pivotally connected to the cassette gripper (34) along a pivot joint (66).

9. 9. The vertical batch furnace assembly of claim 1, wherein the wafer cassette (60) is embodied as a FOUP.

10. 10. The vertical batch furnace assembly of claim 1, wherein the first cassette handler arm (28) and the second cassette handler arm (30) are positioned horizontally next to each other.

11. 11. The vertical batch furnace assembly of claim 1, wherein the first cassette handler arm (28) and the second cassette handler arm (30) are disposed perpendicular to each other.

12. 12. The vertical batch furnace assembly of claim 1, further comprising at least one cassette input / output port (52) provided in a wall (18) that partitions the cassette handling space (12), and wherein the cassette handler (26, 28, 30) is configured to move wafer cassettes (60) into and out of the at least one cassette input / output port (52).

13. 13. The vertical batch furnace assembly of claim 12, wherein the at least one cassette entry / exit port (52) is provided in a second wall (18) that separates the cassette handling space (12) opposite the first wall.

14. 14. The vertical batch furnace assembly (10) of claim 1, wherein each wafer transfer opening (20) is provided with a cassette door opener device (54) configured to open a cassette door of a wafer cassette (60) placed at the wafer transfer position (22).

15. The vertical batch furnace assembly (10) a wafer handler positioned within the wafer handling space (14) and configured to transfer wafers between a wafer cassette (60) at a wafer transfer position (22) and a wafer boat; a process chamber configured to process wafers contained in the wafer boat; a wafer boat handling device positioned below the process chamber and adjacent to the wafer handling space (14); 15. The vertical batch furnace assembly of claim 1, wherein the wafer boat handling device comprises the wafer boat in a wafer boat transfer position and is configured to transfer the wafer boat between the wafer boat transfer position and the process chamber.

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