Integrated substrate metrology system for improved manufacturing process performance

Abstract

To provide a method for determining whether to modify an integrated substrate measurement system manufacturing process recipe for improving manufacturing process performance.SOLUTION: A method comprises: generating an instruction to transfer a substrate to a substrate measurement subsystem to obtain a first set of measurements for the substrate to be received from the substrate measurement subsystem; generating an instruction to transfer the substrate from the substrate measurement subsystem to a processing chamber, to be received from one or more sensors of the processing chamber; generating a first mapping between the first set of measurements and a second set of measurements for the substrate; storing the first set of measurements mapped to the second set of measurements for the substrate; and determining, based on the first set of measurements mapped to the second set of measurements for the substrate, whether to modify a first process recipe or a second process recipe for the substrate.SELECTED DRAWING: Figure 7

Description

[Technical Field]

[0001] FIELD OF THE DISCLOSURE

[0001] Embodiments of the present disclosure relate generally to manufacturing systems, and more particularly to an integrated substrate metrology system for improving manufacturing process performance. [Background technology]

[0002]

[0002] The processing of a substrate in a manufacturing system generally includes multiple processing operations performed on the substrate according to a predetermined process recipe. In some examples, one or more conditions in the manufacturing system may change unexpectedly during the processing of the substrate. When a change in manufacturing conditions occurs, if the substrate is processed according to a predetermined process recipe, errors may occur during the process, causing the finished substrate to be defective. In some examples, the operations of the process recipe may be modified to account for the changed conditions to prevent errors from occurring during the processing of the substrate. However, it may be difficult for an operator of the manufacturing system to identify which operations of the process recipe should be modified. Summary of the Invention

[0003] Some of the described embodiments involve a method that includes identifying a process to be performed in a manufacturing system according to a process recipe. The method further includes generating instructions to transfer the substrate to a substrate measurement subsystem to obtain a first set of measurements for the substrate. The method further includes receiving the first set of measurements for the substrate from the substrate measurement subsystem. The method further includes generating instructions to transfer the substrate from the substrate measurement subsystem to a processing chamber. The method further includes receiving a second set of measurements for the substrate from one or more sensors in the processing chamber. The method further includes generating a first mapping between the first set of measurements and the second set of measurements for the substrate. The method further includes determining whether to modify the recipe for the substrate based on the first set of measurements mapped to the second set of measurements for the substrate.

[0004] In some embodiments, a manufacturing system includes a substrate measurement subsystem configured to generate data related to substrates processed in the manufacturing system; processing chambers configured to process substrates in the manufacturing system, the processing chambers including one or more sensors; one or more transfer robots configured to transfer substrates between the substrate measurement subsystem and the processing chambers; and a controller operably coupled to the substrate measurement subsystem, the processing chambers, and the one or more transfer robots. The controller identifies substrates to be processed in the manufacturing system according to a process recipe. The controller further generates instructions to cause the one or more transfer robots to transfer the substrates to the substrate measurement subsystem to obtain a first set of measurements for the substrates. The controller further receives the first set of measurements for the substrates from the substrate measurement subsystem. The controller further generates instructions to cause the one or more transfer robots to transfer the substrates from the substrate measurement subsystem to the processing chambers. The controller further receives a second set of measurements for the substrates from the one or more sensors in the processing chambers. The controller further generates a first mapping between the first set of measurements for the substrates and the second set of measurements for the substrates. The controller further determines whether to modify a recipe for the substrate based on the first set of measurements mapped to the second set of measurements for the substrate.

[0005] In some embodiments, a non-transitory computer-readable storage medium includes instructions that, when executed by a processing device, cause the processing device to identify a substrate to be processed in a manufacturing system according to a process recipe. The instructions further cause the processing device to generate instructions to transfer the substrate to a substrate measurement subsystem to obtain a first set of measurements for the substrate. The instructions further cause the processing device to receive the first set of measurements for the substrate from the substrate measurement subsystem. The instructions further cause the processing device to generate instructions to transfer the substrate from the substrate measurement subsystem to a processing chamber. The instructions further cause the processing device to receive a second set of measurements for the substrate from one or more sensors in the processing chamber. The instructions further cause the processing device to generate a first mapping between the first set of measurements and the second set of measurements for the substrate. The instructions further cause the processing device to determine whether to modify the recipe for the substrate based on the first set of measurements mapped to the second set of measurements for the substrate.

[0006]

[0006] The present disclosure is illustrated by way of example, and not limitation, in the accompanying drawings, in which like reference numerals indicate like elements. It should be noted that different references to "an" or "one" embodiment in the present disclosure are not necessarily to the same embodiment, and such references mean at least one. [Brief explanation of the drawings]

[0007] [Figure 1]

[0007] FIG. 1 is a top view schematic diagram of an exemplary manufacturing system according to an aspect of the present disclosure. [Figure 2]

[0008] FIG. 1 is a cross-sectional schematic side view of a substrate measurement subsystem according to aspects of the present disclosure. [Figure 3]

[0009] 1 is a cross-sectional schematic side view of a processing chamber according to aspects of the present disclosure. [Figure 4]

[0010] FIG. 2 is a block diagram illustrating a system controller according to an aspect of the present disclosure. [Figure 5]

[0011] 1 illustrates an exemplary graphical user interface for providing notifications to an operator of a manufacturing system, according to aspects of the present disclosure. [Figure 6]

[0012] 1 shows spectral data collected on a substrate according to an aspect of the present disclosure. [Figure 7]

[0013] 1 is a flowchart of a method for determining whether to modify a process recipe for a wafer, in accordance with an aspect of the present disclosure. [Figure 8]

[0014] 10 is a flowchart of another method for determining whether to modify a process recipe for a wafer, in accordance with an aspect of the present disclosure. [Figure 9]

[0015] 1 is a flowchart of a method for acquiring spectral data of a substrate in a substrate measurement subsystem according to an aspect of the present disclosure. [Figure 10]

[0016] 1 is a flowchart of a method for determining position data of a substrate in a substrate measurement subsystem, according to an aspect of the present disclosure. [Figure 11]

[0017] 1 shows a schematic diagram of a machine, in the example form of a computing device, capable of executing a set of instructions to cause the machine to perform any one or more of the methodologies discussed herein. DETAILED DESCRIPTION OF THE INVENTION

[0008]

[0018] The embodiments described herein provide an integrated substrate measurement system for improving manufacturing process performance. Various components of the integrated substrate measurement system can be operably coupled to a system controller configured to control a process for substrates in the manufacturing system. The system controller can be configured to receive data from various portions of the manufacturing system and store the data in a dedicated data store that stores data collected by the integrated substrate measurement system. The system controller can receive data from one or more portions of the manufacturing system (e.g., processing chambers, load locks, etc.) before, during, or after processing of a substrate. The system controller can also receive data from a substrate measurement subsystem included within the integrated substrate measurement system. The substrate measurement subsystem can be integrated within one or more portions of the manufacturing system (e.g., at a factory interface). The substrate measurement subsystem can be configured to generate data related to a substrate before or after substrate processing in another portion of the system.

[0009]

[0019] The substrate measurement subsystem may be configured to generate one or more types of data for a substrate, including spectral data, positional data, substrate property data, etc. The substrate measurement subsystem may generate the data for a substrate in response to a request to obtain one or more measurements for the substrate before or after the substrate is processed in the manufacturing system. The substrate measurement subsystem may include one or more components that facilitate generating the data for the substrate. For example, the substrate measurement subsystem may include a spectral sensing component for sensing one or more spectra from a portion of the substrate and generating spectral data for the substrate. In some embodiments, the spectral sensing component may be an interchangeable component that may be configurable based on the type of process being performed in the manufacturing system or the target type of measurements to be obtained by the substrate measurement subsystem. For example, one or more components of the spectral sensing component may be replaced in the substrate measurement subsystem to enable collection of reflectometry spectral data, ellipsometry spectral data, hyperspectral imaging data, chemical imaging (e.g., X-ray photoelectron spectroscopy (XPS), energy dispersive X-ray spectroscopy (EDX), X-ray fluorescence (XRF), etc.) data, etc. The substrate measurement subsystem may also include a position component configured to correct the position and / or orientation of the substrate within the substrate measurement subsystem. The position component may also generate position data associated with the substrate. The substrate measurement subsystem may correlate the generated position data and spectral data for a portion of the substrate. The substrate measurement subsystem may transmit the generated data (e.g., spectral data, position data, etc.) to a system controller of the manufacturing system.

[0010]

[0020] In response to the system controller receiving data from the substrate measurement subsystem and the portion of the manufacturing system, the system controller can determine whether to modify a process recipe for the substrate. The system controller can generate a mapping between a first set of data received from the substrate measurement component and a second set of data received from the portion of the manufacturing system. In response to generating the mapping between the first set of data and the second set of data, the system controller can determine whether to modify the process recipe for the substrate based on the mapping. In some embodiments, in response to determining to modify the process recipe for the substrate, the system controller can send a notification to a user of the manufacturing system recommending that a modification be made to the process recipe. The system controller can modify the process recipe in response to receiving a notification from a user of the manufacturing system that the process recipe should be modified according to the recommendation. In other or similar embodiments, the system controller can modify the process recipe without prompting a user of the manufacturing system.

[0011]

[0021] Embodiments of the present disclosure address the above-mentioned deficiencies of the prior art by providing a system for determining whether modifications should be made to a process recipe for a substrate. By generating measurements for a substrate before or after the substrate is processed in the manufacturing system, a system controller can determine whether changes have occurred in the manufacturing system that may affect the process for the substrate. In response to determining that a change has occurred in the manufacturing system, the system controller can determine modifications to be made to the process recipe to prevent errors from occurring during substrate processing as a result of the changes to the manufacturing system. By modifying the process recipe for the substrate, the system controller reduces the likelihood that a processed substrate will be defective, thus increasing the overall throughput of the manufacturing system. Furthermore, integrating a substrate metrology subsystem within the manufacturing system increases the overall sampling rate for each substrate in the manufacturing system.

[0012]

[0022] 1 is a top schematic view of an exemplary manufacturing system 100 according to an embodiment of the present disclosure. The manufacturing system 100 may perform one or more processes on a substrate 102. The substrate 102 may be any suitable rigid, fixed-dimensional, planar article suitable for fabricating electronic devices or circuit components thereon, such as, for example, a silicon-containing disk or wafer, a patterned wafer, a glass plate, or the like.

[0013]

[0023] The manufacturing system 100 may include a process tool 104 and a factory interface 106 coupled to the process tool 104. The process tool 104 may include a housing 108 having a transfer chamber 110 therein. The transfer chamber 110 may include one or more processing chambers (also referred to as process chambers) 114, 116, 118 disposed around and coupled thereto. The processing chambers 114, 116, 118 may be coupled to the transfer chamber 110 through respective ports, such as slit valves.

[0014]

[0024] The processing chambers 114, 116, 118 may be adapted to perform any number of processes on the substrate 102. The same or different substrate processes may be performed in each processing chamber 114, 116, 118. The substrate processes may include atomic layer deposition (ALD), physical vapor deposition (PVD), chemical vapor deposition (CVD), etching, annealing, hardening, pre-cleaning, metal or metal oxide removal, etc. In some embodiments, the substrate processes may include a combination of two or more of atomic layer deposition (ALD), physical vapor deposition (PVD), chemical vapor deposition (CVD), etching, annealing, hardening, pre-cleaning, metal or metal oxide removal, etc. In one example, a PVD process may be performed in one or both process chambers 114, an etching process may be performed in one or both process chambers 116, and an annealing process may be performed in one or both process chambers 118. Other processes may be performed on the substrate therein. The processing chambers 114, 116, 118 may each include one or more sensors configured to capture data about the substrate 102 and / or the environment within the processing chambers 114, 116, 118 before, after, or during substrate processing. In some embodiments, the one or more sensors may be configured to capture data including one or more values ​​of one or more of a spectrum (e.g., an optical spectrum), a temperature (e.g., a heater temperature), a spacing (SP), a pressure, a high frequency radio frequency (HFRF), an electrostatic chuck (ESC) voltage, a current, a flow, a power, a voltage, a capacitance, etc. Further details regarding the processing chambers 114, 116, 118 are provided in connection with FIG. 3 .

[0015]

[0025] The transfer chamber 110 may also include a transfer chamber robot 112. The transfer chamber robot 112 may include one or more arms. Each arm may include one or more end effectors at the end of the arm. The end effectors may be configured to handle a particular object, such as a wafer. Alternatively, or additionally, the end effectors may be configured to handle an object, such as a process kit ring. In some embodiments, the transfer chamber robot 112 may be a Selective Compliance Assembly Robot Arm (SCARA) robot, such as a two-link SCARA robot, a three-link SCARA robot, a four-link SCARA robot, etc.

[0016]

[0026] The load lock 120 may also be coupled to the housing 108 and the transfer chamber 110. The load lock 120 may be configured to interface with and be coupled to the transfer chamber 110 on one side and the factory interface 106 on the other. The load lock 120 may have an environmentally controlled atmosphere that may be changed from a vacuum environment (where substrates may be transferred to and from the transfer chamber 110) to an inert gas environment at or near atmospheric pressure (where substrates may be transferred to and from the factory interface 106). In some embodiments, the load lock 120 may be a stacked load lock having a pair of upper internal chambers and a pair of lower internal chambers located at different vertical levels (e.g., one above the other). In some embodiments, the pair of upper internal chambers may be configured to receive processed substrates from the transfer chamber 110 for removal from the process tool 104, while the pair of lower internal chambers may be configured to receive substrates from the factory interface 106 for processing in the process tool 104. In some embodiments, the load lock 120 may be configured to perform a substrate process (eg, an etch or a pre-clean) on one or more substrates 102 received therein.

[0017]

[0027] The factory interface 106 may be any suitable enclosure, such as, for example, a front-end equipment module (EFEM). The factory interface 106 may be configured to receive substrates 102 from substrate carriers 122 (e.g., front-opening unified pods (FOUPs)) docked to various load ports 124 of the factory interface 106. A factory interface robot 126 (shown in dotted lines) may be configured to transfer substrates 102 between the substrate carriers (also referred to as containers) 122 and the load locks 120. In other and / or similar embodiments, the factory interface 106 may be configured to receive replacement parts from a replacement parts storage container 123. The factory interface robot 126 may include one or more robot arms and may be or include a SCARA robot. In some embodiments, the factory interface robot 126 may have more links and / or more degrees of freedom than the transfer chamber robot 112. The factory interface robot 126 may include an end effector on the end of each robot arm. The end effector may be configured to pick up and handle a particular object, such as a wafer. Alternatively, or additionally, the end effector may be configured to handle an object, such as a process kit ring.

[0018]

[0028] Any conventional robot type may be used for the factory interface robot 126. Transfers may be performed in any order or direction. The factory interface 106 may, in some embodiments, be maintained in a non-reactive gas environment (e.g., using nitrogen as the non-reactive gas), for example, at a slight positive pressure.

[0019]

[0029] In some embodiments, the transfer chamber 110, the process chambers 114, 116, and 118, and the load lock 120 may be maintained at a vacuum level. The manufacturing system 100 may include one or more vacuum ports coupled to one or more stations of the manufacturing system 100. For example, a first vacuum port 130a may couple the factory interface 106 to the load lock 120. A second vacuum port 130b may be coupled to the load lock 120 and disposed between the load lock 120 and the transfer chamber 110. In other or similar embodiments, the transfer chamber 110, the process chambers 114, 116, and 118, and / or the load lock 120 may not be maintained at a vacuum level.

[0020]

[0030] The manufacturing system 100 may also be connected to client devices (not shown) configured to provide information about the manufacturing system 100 to a user (e.g., an operator). The client devices may include computing devices such as personal computers (PCs), laptops, mobile phones, smartphones, tablet computers, netbook computers, network-connected televisions, etc. In some embodiments, the client devices may provide information to a user of the manufacturing system 100 via one or more graphical user interfaces (GUIs). For example, the client devices may provide information about one or more modifications to be made to a process recipe for the substrate 102 via the GUI.

[0021]

[0031] The manufacturing system 100 may also include a system controller 128. The system controller 128 may be and / or include a computing device such as a personal computer, a server computer, a programmable logic controller (PLC), a microcontroller, etc. The system controller 132 may include one or more processing devices, which may be general-purpose processing devices such as a microprocessor, a central processing unit, etc. More specifically, the processing device may be a complex instruction set computing (CISC) microprocessor, a reduced instruction set computing (RISC) microprocessor, a very long instruction word (VLIW) microprocessor, or other instruction set or processor implementing a combination of instruction sets. The processing device may also be one or more special-purpose processing devices, such as an application-specific integrated circuit (ASIC), a field-programmable gate array (FPGA), a digital signal processor (DSP), a network processor, etc. The system controller 128 may include a data storage device (e.g., one or more disk drives and / or solid-state drives), a main memory, a static memory, a network interface, and / or other components. The system controller 128 may execute instructions to perform any one or more of the methods and / or embodiments described herein. In some embodiments, the system controller 128 may execute instructions to perform one or more operations on the manufacturing system 100 according to a process recipe. The process recipe includes a sequence of operations to be performed on the manufacturing system 100 in a particular order. The instructions may be stored (during execution of the instructions) in a computer-readable storage medium, which may include a main memory, a static memory, a secondary storage, and / or a processing device.

[0022]

[0032] The system controller 128 may receive data from sensors contained on or within various portions of the manufacturing system 100 (e.g., processing chambers 114, 116, 118, transfer chamber 110, load lock 120, etc.). Data received by the system controller 128 may include data related to the substrate 102 and / or the environment surrounding the substrate 102 within a portion of the manufacturing system 100. For purposes of this description, the system controller 128 is described as receiving data from sensors contained within the processing chambers 114, 116, 118. However, the system controller 128 may receive data from any portion of the manufacturing system 100 and use the data received from that portion in accordance with embodiments described herein. In an illustrative example, the system controller 128 may receive data from one or more sensors for the processing chambers 114, 116, 118 before, after, or during substrate processing in the processing chambers 114, 116, 118. In such an example, data received from the processing chambers 114, 116, 118 may be related to the substrate 102, including temperature data, positional data (e.g., the position and / or orientation of the substrate 102 within the processing chambers 114, 116, 118), etc. Data received by the system controller 128 may also be related to the environment of the processing chambers 114, 116, 118, including data indicative of the temperature or internal pressure of the processing chambers 114, 116, 118, the amount of radiation within the processing chambers 114, 116, 118, etc. Data received from sensors in various portions of the manufacturing system 100 may be stored in a data store 150. The data store 150 may be included as a component within the system controller 128 or may be a separate component from the system controller 128. Further details regarding the data store 150 are provided with respect to FIG. 4 .

[0023]

[0033] The manufacturing system 100 may include a substrate measurement subsystem 140. The substrate measurement subsystem 140 may obtain measurements of one or more portions of the substrate 102 before or after the substrate 102 is processed in the manufacturing system 100. In some embodiments, the substrate measurement subsystem 140 may obtain measurements of one or more portions of the substrate 102 in response to receiving a request for measurements from the system controller 128. The substrate measurement subsystem 140 may be integrated within a portion of the manufacturing system 100. In some embodiments, the substrate measurement subsystem 140 may be integrated within the factory interface 106. In such an embodiment, the factory interface robot 126 may be configured to transfer the substrate 102 between the substrate carrier 122 and the substrate measurement subsystem 140 and / or between the substrate measurement subsystem 140 and the load lock 120. In other or similar embodiments, the substrate measurement subsystem 140 may not be integrated with any portion of the manufacturing system 100 and may instead be a stand-alone component. In such an embodiment, the substrate 102 measured by the substrate measurement subsystem 140 may be transferred to or from a portion of the manufacturing system 100 before or after the substrate 102 is processed in the manufacturing system 100 .

[0024]

[0034] The substrate measurement subsystem 140 may obtain measurements of the portion of the substrate 102 by generating data related to the portion of the substrate 102. In some embodiments, the substrate measurement subsystem 140 is configured to generate spectral data, position data, and other substrate property data for the substrate 102. In some embodiments, the substrate measurement subsystem 140 may include one or more reflectance measurement sensors (i.e., reflectometers). In such embodiments, the spectral data generated by the substrate measurement subsystem 140 may refer to the reflected light intensity of each wavelength of waves reflected from the portion of the substrate 102. In other or similar embodiments, the substrate measurement subsystem 140 may include one or more ellipsometry sensors (i.e., ellipsometers). In such embodiments, the spectral data generated by the substrate measurement subsystem 140 may refer to the reflected light intensity of each wavelength of polarized waves reflected from the portion of the substrate 102. In other or similar embodiments, the spectral data may refer to spectral data collected from a thermal spectral sensor, or the like. As described above, the substrate measurement subsystem 140 may generate other substrate property data (i.e., non-spectral data) for the substrate 102. For example, the substrate measurement subsystem 140 may generate data based on signals collected from eddy current (ie, inductive) sensors, capacitive sensors, and the like.

[0025]

[0035] After generating the data for the substrate 102, the substrate measurement subsystem 140 may transmit the generated data to the system controller 128. In response to receiving the data from the substrate measurement subsystem 140, the system controller 128 may store the data in a data store 150.

[0026]

[0036] In some embodiments, data received by the system controller 128 from the substrate measurement subsystem 140 may be associated with data received from one or more sensors in the processing chambers 114, 116, and 118. For example, a first set of data for the substrate 102 may be generated in the substrate measurement subsystem 140. In response to the system controller 128 receiving the first set of data, the substrate 102 may be transferred to the processing chambers 114, 116, and 118 for processing. In the processing chambers 114, 116, and 118, a second set of data may be generated for the substrate 102 and transferred to the system controller 128. In response to determining that the first set of data is associated with the second set of data, the system controller 128 may generate a mapping between the first set of data and the second set of data and store the generated mapping in the data store 150. Based on the mapping between the first set of data and the second set of data, the system controller 128 may determine whether to modify the process recipe for the substrate 102. Further details regarding the system controller 128 determining whether to modify the process recipe for the substrate 102 are provided with respect to FIG.

[0027]

[0037] In some embodiments, in response to determining to modify the process recipe, the system controller 128 may provide a notification to an operator of the manufacturing system 100 indicating that the process recipe should be modified. In some examples, the notification may be provided via a GUI displayed via a client device, such as GUI 500 of FIG. 5 . The notification may provide a recommendation for modifying one or more operations of the process recipe along with GUI elements that allow the operator to accept or reject the modification to the process recipe. In other or similar embodiments, the notification may provide multiple alternative recommendations for modifications to one or more operations of the process recipe along with one or more GUI elements that allow the operator to select one recommendation over other alternative recommendations. In some embodiments, the system controller 128 may not provide a notification to the operator of the manufacturing system 100 and may instead modify the process recipe based on identifying the best modification to the process recipe.

[0028]

[0038] 2 is a cross-sectional schematic side view of a substrate measurement subsystem 200 according to aspects of the present disclosure. The substrate measurement subsystem 200 may be configured to obtain measurements of one or more portions of a substrate, such as the substrate 102 of FIG. 1 , before or after processing of the substrate 102 in a processing chamber. The substrate measurement subsystem 200 may obtain the measurements of the portions of the substrate 102 by generating data associated with the portions of the substrate 102. In some embodiments, the substrate measurement subsystem 200 may be configured to generate spectral data, positional data, and / or other characteristic data associated with the substrate 102. The substrate measurement subsystem 200 may include a controller 230 configured to execute one or more instructions to generate data associated with the portions of the substrate 102.

[0029]

[0039] The substrate measurement subsystem 200 may include a substrate sensing component 214 configured to detect when the substrate 102 is transferred to the substrate measurement subsystem 200. The substrate sensing component 214 may include any component configured to detect when the substrate 102 is transferred to the substrate measurement subsystem 200. For example, the substrate sensing component 214 may include an optical sensing component that transmits an optical beam across an entrance to the substrate measurement subsystem 200. The substrate sensing component 214 may detect that the substrate 102 has been transferred to the substrate measurement subsystem 200 in response to the substrate 102 breaking the optical beam transmitted across the entrance to the substrate measurement subsystem 200 when the substrate 102 is positioned within the substrate measurement subsystem 200. In response to detecting that the substrate 102 has been transferred to the substrate measurement subsystem 200, the substrate sensing component 214 may send an indication to the controller 230 indicating that the substrate 102 has been transferred to the substrate measurement subsystem 200.

[0030]

[0040] In some embodiments, the substrate sensing component 214 may be further configured to detect identification information associated with the substrate 102. In some embodiments, the substrate 102 may be embedded in a substrate carrier (not shown) when transferred to the substrate measurement subsystem 200. The substrate carrier may include one or more registration features that enable identification of the substrate 102. For example, the optical sensing component of the substrate sensing component 214 may detect that the substrate 102 embedded in the substrate carrier breaks a light beam transmitted across an entrance to the substrate measurement subsystem 200. The optical sensing component may further detect one or more registration features included on the substrate carrier. In response to detecting the one or more registration features, the optical sensing component may generate an optical signature associated with the one or more registration features. The substrate sensing component 214 may transmit the optical signature generated by the optical sensing component to the controller 230 along with an indication that the substrate has been placed in the substrate measurement subsystem 200. In response to receiving the optical signature from the sensing component 214, the controller 230 may analyze the optical signature to determine identification information associated with the substrate 102. The identification information associated with the substrate 102 may include an identifier for the substrate 102, an identifier for the process of the substrate 102 (e.g., a batch number or a process run number), an identifier for the type of substrate 102 (e.g., a wafer), etc.

[0031]

[0041] The substrate measurement subsystem 200 may include one or more components configured to determine the position and / or orientation of the substrate 102 within the substrate measurement subsystem 200. The position and / or orientation of the substrate 102 may be determined based on identifying a reference position of the substrate 102. The reference position may be a portion of the substrate 102 that includes an identifying feature associated with the particular portion of the substrate 102. For example, the substrate 102 may have a reference tag embedded in a center of the substrate 102. In another example, the substrate 102 may have one or more structural features included on a surface of the substrate 102 at the center of the substrate 102. The controller 230 may determine the identifying feature associated with the particular portion of the substrate 102 based on the determined identification information of the substrate 102. For example, in response to determining that the substrate 102 is a wafer, the controller 230 may determine one or more identifying features typically included on a portion of a wafer.

[0032]

[0042] The controller 230 may identify a reference position for the substrate 102 using one or more camera components 250 configured to capture image data for the substrate 102. The camera components 250 may generate image data for one or more portions of the substrate 102 and transmit the image data to the controller 230. The controller 230 may analyze the image data to identify identifying features associated with the reference position of the substrate 102. The controller 230 may further determine a position and / or orientation of the substrate 102 as indicated in the image data based on the identified identifying features of the substrate 102. The controller 230 may determine a position and / or orientation of the substrate 102 based on the identified identifying features of the substrate 102 and the determined position and / or orientation of the substrate 102 as indicated in the image data.

[0033]

[0043] In response to determining the position and / or orientation of the substrate 102, the controller 230 may generate position data associated with one or more portions of the substrate 102. In some embodiments, the position data may include one or more coordinates (e.g., Cartesian coordinates, polar coordinates, etc.) each associated with a portion of the substrate 102, where each coordinate is determined based on a distance from a reference position for the substrate 102. For example, in response to determining the position and / or orientation of the substrate 102, the controller 230 may generate first position data associated with a portion of the substrate 102 that includes the reference position. The first position data includes a Cartesian coordinate of (0,0). The controller 230 may generate second position data associated with a second portion of the substrate 102 relative to the reference position. For example, a portion of the substrate 102 located approximately 2 nanometers (nm) due east of the reference position may be assigned a Cartesian coordinate of (0,1). In another example, a portion of the substrate 102 located 5 nm due north of the reference position may be assigned a Cartesian coordinate of (1,0).

[0034]

[0044] The controller 230 may determine one or more portions of the substrate 102 to measure based on the position data determined for the substrate 102. In some embodiments, the controller 230 may receive one or more operations of a process recipe associated with the substrate 102. In such embodiments, the controller 230 may further determine one or more portions of the substrate 102 to measure based on the one or more operations of the process recipe. For example, the controller 230 may receive an indication that an etching process was performed on the substrate 102 that resulted in several structural features being etched on the surface of the substrate 102. As a result, the controller 230 may determine one or more structural features to measure and the expected locations of the features in various portions of the substrate 102.

[0035]

[0045] The substrate measurement subsystem 200 may include one or more measurement components for measuring the substrate 102. In some embodiments, the substrate measurement subsystem 200 may include one or more spectral sensing components 220 configured to generate spectral data for one or more portions of the substrate 102. As described above, the spectral data may correspond to the detected wave intensity (i.e., the intensity or amount of energy) for each wavelength of the detected wave. Further details regarding the collected spectral data are provided with respect to FIG. 6 . The measurement components for measuring the substrate 102 may also include non-spectral sensing components (not shown) configured to collect and generate non-spectral data. For example, the measurement components may include eddy current sensors or capacitive sensors. While some embodiments herein may refer to the collection and use of spectral data for the substrate 102, embodiments herein may be applicable to non-spectral data collected for the substrate 102.

[0036]

[0046] The spectral sensing component 220 may be configured to detect energy waves reflected from the portion of the substrate 102 and generate spectral data associated with the detected waves. The spectral sensing component 220 may include a wave generator 222 and a reflected wave receiver 224. In some embodiments, the wave generator 222 may be a light wave generator configured to generate a beam of light toward the portion of the substrate 102. In such embodiments, the reflected wave receiver 224 may be configured to receive a reflected light beam from the portion of the substrate 102. The wave generator 222 may be configured to generate an energy stream 226 (e.g., a light beam) and transmit the energy stream 226 to the portion of the substrate 102. A reflected energy wave 228 may be reflected from the portion of the substrate 102 and received by the reflected wave receiver 224. Although FIG. 3A shows a single energy wave reflected from the surface of the substrate 102, multiple energy waves may be reflected from the surface of the substrate 102 and received by the reflected wave receiver 224.

[0037]

[0047] In response to the reflected wave receiver 224 receiving the reflected energy waves 228 from the portion of the substrate 102, the spectral sensing component 220 may measure the wavelength of each wave included in the reflected energy waves 228. The spectral sensing component 220 may further measure the intensity of each measured wavelength. In response to measuring each wavelength and each wavelength intensity, the spectral sensing component 220 may generate spectral data for the portion of the substrate 102. The spectral sensing component 220 may transmit the generated spectral data to the controller 230. In response to receiving the generated spectral data, the controller 230 may generate a mapping between the received spectral data and position data for the measured portion of the substrate 102.

[0038]

[0048] The substrate measurement subsystem 200 may be configured to generate a particular type of spectral data based on the type of measurements to be taken by the substrate measurement subsystem 200. In some embodiments, the spectral sensing component 220 may be a first spectral sensing component configured to generate one type of spectral data. For example, the spectral sensing component 220 may be configured to generate reflectometry spectral data, ellipsometry spectral data, hyperspectral imaging data, chemical imaging data, thermal spectral data, or conductivity spectral data. In such embodiments, the first spectral sensing component may be removed from the substrate measurement subsystem 200 and replaced with a second spectral sensing component configured to generate a different type of spectral data (e.g., reflectometry spectral data, ellipsometry spectral data, hyperspectral imaging data, or chemical imaging data).

[0039]

[0049] The controller 230 may determine the type of data (i.e., spectral data, non-spectral data) to be generated about the substrate 102 based on the type of measurements to be obtained about one or more portions of the substrate 102. In some embodiments, the controller 230 may determine the one or more types of measurements based on a notification received from the system controller 128. In other or similar embodiments, the controller 230 may determine the one or more types of measurements based on instructions to generate measurements of a portion of the substrate 102. In response to determining the one or more types of measurements to be obtained, the controller 230 may determine the type of data to be generated about the substrate 102. For example, the controller 230 may determine that spectral data will be generated about the substrate 102 and that a second spectral sensing component is the optimal sensing component for obtaining the determined types of measurements about one or more portions of the substrate 102. In response to determining that the second sensing component is the optimal sensing component, the controller 230 may send a notification to the system controller indicating that the first spectral sensing component should be replaced with the second spectral sensing component and that the second spectral sensing component should be used to obtain one or more types of measurements on one or more portions of the substrate 102. The system controller 128 may send the notification to a client device connected to the manufacturing system. The client device may provide the notification to a user (e.g., an operator) of the manufacturing system via a GUI.

[0040]

[0050] In other or similar embodiments, the spectral sensing component 220 may be configured to generate multiple types of spectral data. In such embodiments, the controller 230 may cause the spectral sensing component 220 to generate a particular type of spectral data based on the type of measurement to be taken for one or more portions of the substrate 102, in accordance with the previously described embodiments. In response to determining the type of measurement to be taken, the controller 230 may determine that a first type of spectral data is to be generated by the spectral sensing component 220. Based on the determination that the first type of spectral data is to be generated by the spectral sensing component 220, the controller 230 may cause the spectral sensing component 220 to generate the first type of spectral data for one or more portions of the substrate 102.

[0041]

[0051] As described above, the controller 230 may determine one or more portions of the substrate 102 to measure with the substrate measurement subsystem 200. In some embodiments, one or more measurement components, such as the spectral sensing component 220, may be stationary components within the substrate measurement subsystem 200. In such embodiments, the substrate measurement subsystem 200 may include one or more position components 240 configured to modify the position and / or orientation of the substrate 102 relative to the spectral sensing component 220. In some embodiments, the position component 240 may be configured to translate the substrate 102 along a first axis and / or a second axis relative to the spectral sensing component 220. In other or similar embodiments, the position component 240 may be configured to rotate the substrate 102 about a third axis relative to the spectral sensing component 220.

[0042]

[0052] Once the spectral sensing component 220 generates spectral data for one or more portions of the substrate 102, the position component 240 may modify the position and / or orientation of the substrate 102 according to the one or more determined portions measured for the substrate 102. For example, before the spectral sensing component 220 generates spectral data for the substrate 102, the position component 240 may position the substrate 102 at Cartesian coordinate (0,0), and the spectral sensing component 220 may generate first spectral data for the substrate 102 at Cartesian coordinate (0,0). In response to the spectral sensing component 220 generating the first spectral data for the substrate 102 at Cartesian coordinate (0,0), the position component 240 may translate the substrate 102 along a first axis such that the spectral sensing component 220 is configured to generate second spectral data for the substrate 102 at Cartesian coordinate (0,1). In response to the spectral sensing component 220 generating second spectral data for the substrate 102 at Cartesian coordinate (0,1), the controller 230 may rotate the substrate 102 along the second axis such that the spectral sensing component 220 is configured to generate third spectral data for the substrate 102 at Cartesian coordinate (1,1). This process may be performed multiple times until spectral data has been generated for each determined portion of the substrate 102.

[0043]

[0053] In some embodiments, one or more layers 212 of material may be included on the surface of the substrate 102. The one or more layers 212 may include an etching material, a photoresist material, a mask material, a deposition material, etc. In some embodiments, the one or more layers 212 may include an etching material that is to be etched according to an etching process performed in a processing chamber. In such embodiments, spectral data may be collected for one or more portions of unetched material of the layer 212 deposited on the substrate 102 according to previously disclosed embodiments. In other or similar embodiments, the one or more layers 212 may include an etching material that has already been etched according to an etching process in a processing chamber. In such embodiments, one or more structural features (e.g., lines, columns, openings, etc.) may be etched into the one or more layers 212 of the substrate 102. In such embodiments, spectral data may be collected for one or more structural features etched into the one or more layers 212 of the substrate 102.

[0044]

[0054] In some embodiments, the substrate measurement subsystem 200 may include one or more additional sensors configured to capture additional data about the substrate 102. For example, the substrate measurement subsystem 200 may include additional sensors configured to determine the thickness of the substrate 102, the thickness of a film deposited on the surface of the substrate 102, etc. Each sensor may be configured to transmit the captured data to the controller 230.

[0045]

[0055] In response to receiving at least one of spectral data, positional data, or property data for the substrate 102, the controller 230 may transmit the received data to the system controller 128 for processing and analysis in accordance with embodiments described herein.

[0046]

[0056] 3 shows a cross-sectional schematic side view of a processing chamber 300 according to an embodiment of the present disclosure. The processing chamber 300 may be used for a process in which a corrosive plasma environment is provided. For example, the processing chamber 300 may be a chamber for a plasma etcher or plasma etch reactor, a plasma cleaner, etc. In alternative embodiments, other processing chambers may be used that may or may not be exposed to a corrosive plasma environment. Some examples of chamber components include a chemical vapor deposition (CVD) chamber, a physical vapor deposition (PVD) chamber, an atomic layer deposition (ALD) chamber, an ion-assisted deposition (IAD) chamber, an etch chamber, and other types of processing chambers.

[0047]

[0057] In one embodiment, the processing chamber 300 includes a chamber body 302 and a showerhead 330 that surrounds an interior space 306. The chamber body 302 generally includes a sidewall 308 and a bottom 310. The showerhead 330 may include a showerhead base and a showerhead gas distribution plate 332. Alternatively, the showerhead 330 may be replaced by a lid and a nozzle in some embodiments, or by multiple pie-shaped showerhead sections and plasma generation units in other embodiments. An exhaust port 326 may be defined in the chamber body 302 and connect the interior space 306 to a pumping system 328. The pumping system 328 may include one or more pumps and a throttle valve that are utilized to evacuate and adjust the pressure of the interior space 306 of the processing chamber 300.

[0048]

[0058] The showerhead 330 may be supported on a sidewall 308 of the chamber body 302. The showerhead 330 (or lid) may be opened to allow access to the interior volume 306 of the processing chamber 300 and may provide a seal for the processing chamber 300 while closed. A gas panel (not shown) may be coupled to the processing chamber 300 to provide processing and / or cleaning gases to the interior volume 306 through the showerhead 330 or the lid and nozzles (e.g., through apertures in the showerhead or lid and nozzles).

[0049]

[0059] A substrate support assembly 348 is disposed in the interior space 306 of the processing chamber 300 below the showerhead 330. The substrate support assembly 348 holds a substrate, such as the substrate 102 of FIG. 1, during processing. In one embodiment, the substrate support assembly 348 includes a pedestal 352 that supports an electrostatic chuck 350. The electrostatic chuck 350 further includes a thermally conductive base and an electrostatic puck bonded to the thermally conductive base. The thermally conductive base and / or the electrostatic puck of the electrostatic chuck 350 may include one or more optional embedded heating elements, embedded thermal insulation, and / or conduits to control the lateral temperature profile of the substrate support assembly 348. The electrostatic chuck 350 may include at least one clamping electrode controlled by a chucking power supply.

[0050]

[0060] The processing chamber 300 may include one or more sensors 360 configured to generate data about the substrate 102 and / or the environment surrounding the substrate 102 before, after, or during processing of the substrate 102. Each sensor 360 may be configured to transmit data to a controller, such as the system controller 128. In some embodiments, the one or more sensors 360 may be embedded within components of the processing chamber 300 and configured to capture data related to the function of the components. For example, sensor 360A may be embedded within the substrate support assembly 348 and / or the electrostatic chuck 350. During operation of the processing chamber 300, sensor 360A may generate data related to the temperature of one or more heating elements embedded within the electrostatic chuck 350, the lateral temperature profile of the substrate support assembly 348, the amount of power supplied by the chucking power supply, etc. In another example, sensor 360B may be embedded within the gas panel and / or the showerhead 330. In such an example, the sensor 360B may be configured to generate data related to the composition, flow rate, and temperature of the process gas and / or cleaning gas provided to the interior space 306 through the showerhead 330. In other or similar embodiments, one or more sensors 360 may be embedded within the interior space 306 of the processing chamber 300 to capture data related to the environment surrounding the substrate 102 during processing. For example, the sensor 360C may be embedded in a surface (e.g., the sidewall 308) of the chamber body 302. In such an example, the sensor 360C may be configured to generate data related to the pressure in the interior space 306, the temperature in the interior space 306, the amount of radiation in the interior space 306, etc.

[0051]

[0061] In some embodiments, one or more sensors 360 outside the processing chamber 300 may be configured to generate data for the substrate 102 and / or the environment surrounding the substrate 102 before, after, or during processing of the substrate 344. For example, the sensor 360D may be configured to generate data associated with one or more portions of a surface of the substrate 102. The transparent window 370 may be embedded within at least one of the showerhead 330 or the sidewall 308. The sensor 360D may be a light-emitting device including a light source component and a light-reflecting component. The light source component may be configured to transmit light through the transparent window 370 onto a portion of the substrate 102. The reflected light is transmitted from the portion of the substrate 102, passes through the transparent window 370, and is received by the light-reflecting component of the sensor 360D. The sensor 360D may generate spectral data associated with the reflected light received by the light-reflecting component and transmit the generated spectral data to a controller, such as the system controller 128. In some embodiments, sensor 360D may be configured to generate spectral data associated with a central portion of substrate 102, as shown. In other or similar embodiments, sensor 360D may be configured to generate spectral data associated with another portion of substrate 102 (e.g., an outer diameter of substrate 102).

[0052]

[0062] 4 is a block diagram illustrating a system controller according to aspects of the present disclosure. In some embodiments, the system controller may be the system controller 128 described with respect to FIG. 1. The system controller 128 may include a substrate data collection agent 410 and a data store 420.

[0053]

[0063] As shown, the substrate data collection agent 410 may include a substrate metrology subsystem data module 412 (referred to herein as an SMS data module 412), a sensor data module 414, a data mapping module 416, and a process recipe modification module 418. The substrate data collection agent 410 may communicate with a data store 420 that stores SMS data 422, sensor data 424, data mapping 426, process recipes 428, and modified process recipes 430.

[0054]

[0064] Data store 420 may be configured to store data that is not accessible to users of the manufacturing system. In some embodiments, all data stored in data store 420 may be inaccessible to users (e.g., operators) of the manufacturing system. In other or similar embodiments, some of the data stored in data store 420 may be inaccessible to users, while other portions of the data stored in data store 420 may be accessible to users. In some embodiments, one or more portions of the data stored in data store 420 may be encrypted using an encryption mechanism unknown to the users (e.g., the data is encrypted using a private encryption key). In other or similar embodiments, data store 420 may include multiple data stores, where data inaccessible to users is stored in one or more first data stores and data accessible to users is stored in one or more second data stores.

[0055]

[0065] The SMS data module 412 may be configured to receive data from a substrate measurement subsystem, such as the substrate measurement subsystem 200 of Figure 2. As described above, the system controller 128 may generate instructions to transfer a substrate to the substrate measurement subsystem 200 to obtain one or more measurements of the substrate before or after processing of the substrate in the manufacturing system. In response to the system controller 128 receiving an indication that a substrate has been transferred to the substrate measurement subsystem 200, the SMS data module 412 may send a request to the substrate measurement subsystem 200 to obtain measurements of one or more portions of the substrate.

[0056]

[0066] As described above, the system controller 128 may control the processing of substrates in the manufacturing system according to the process recipe 428. In some embodiments, the SMS data module 412 may determine one or more portions of the substrate to be measured by the substrate measurement subsystem 200 based on the process recipe. For example, operation of the process recipe may include etching a layer of material deposited on a surface of the substrate in a processing chamber. Based on operation of the process recipe, the SMS data module 412 may determine one or more portions of the surface of the substrate to monitor before and after the etching process in the processing chamber. In such embodiments, the SMS data module 412 may include an indication of the determined one or more portions of the substrate to be measured by the substrate measurement subsystem 200 in a request to obtain measurements with the substrate measurement subsystem 200. In such embodiments, a controller of the substrate measurement subsystem 200, such as the controller 230, may determine one or more portions of the substrate to be measured by the substrate measurement subsystem 200 according to embodiments described herein.

[0057]

[0067] In response to sending a request to obtain measurements, the SMS data module 412 may receive SMS data 422 from the substrate measurement subsystem 200. The SMS data 422 may include spectral data, location data, property data, etc. In some embodiments, the SMS data 422 may further include information related to the substrate (e.g., a substrate identifier) ​​or a process associated with the substrate (e.g., a batch number or process run number). In response to receiving the SMS data 422 from the substrate measurement subsystem 200, the SMS data module 412 may store the SMS data 422 in the data store 420.

[0058]

[0068] The sensor data module 414 may be configured to receive data from one or more portions of the manufacturing system, such as the processing chamber 300, before, during, or after a process is performed on a substrate. In response to a substrate being transferred to the processing chamber 300, the sensor data module 414 may send a request to the processing chamber 300 to obtain measurements about one or more portions of the substrate before, during, or after a substrate process is performed in the processing chamber 300. In some embodiments, the sensor data module 414 may receive data generated by one or more sensors in the processing chamber 300 without sending a request to obtain measurements in the processing chamber 300. In some embodiments, measurements of the substrate obtained in the processing chamber 300 may correspond to measurements obtained in the substrate measurement subsystem 200. According to the embodiments described with respect to the SMS data module 412, the sensor data module 414 may determine one or more measurements obtained in the processing chamber 300. For example, the sensor data module 414 may determine one or more portions of the substrate that are measured in the processing chamber 300 .

[0059]

[0069] The sensor data module 414 may receive sensor data 424 from the processing chamber 300 in response to sending a request for substrate data to the processing chamber 300. The sensor data 424 may include spectral data, temperature data, pressure data, etc. In some embodiments, the sensor data 424 may include information related to the substrate or a process related to the substrate (e.g., a substrate identifier or a process identifier) ​​in accordance with previously described embodiments. In response to receiving the sensor data 424 from the processing chamber 300, the sensor data module 414 may store the sensor data 424 in the data store 420.

[0060]

[0070] In response to the system controller 128 receiving the SMS data 422 and the sensor data 424, the data mapping module 416 may generate a mapping between the SMS data 422 associated with the sensor data 424. The data mapping module 416 may determine whether the received SMS data 422 for a given substrate is associated with the sensor data 424 for the given substrate (or vice versa). In some embodiments, the data mapping module 416 may determine that the SMS data 422 is associated with the sensor data 424 based on a common sensor identifier or a common lot identifier. In response to determining that the SMS data 422 for a given substrate is associated with the sensor data 424 for the given substrate, the data mapping module 416 may generate a mapping between the SMS data 422 and the sensor data 424 and store the mapping, identified as a data mapping 426, in the data store 420.

[0061]

[0071] It should be noted that, although embodiments of the present disclosure may describe the system controller 128 receiving the SMS data before receiving the sensor data 424, in some embodiments the system controller 128 may receive the sensor data 424 before receiving the SMS data 422. For example, a first measurement of the substrate 102 may be performed in the processing chamber 300, and the sensor data 424 may be sent to the system controller 128. After processing in the processing chamber 300, the substrate may be transferred to the substrate measurement subsystem 200 (e.g., using a transfer robot). The substrate measurement subsystem 200 may perform a second measurement of the substrate 102 and send the SMS data 422 to the system controller 128, according to the embodiments described above. It should also be noted that multiple measurements may be performed in the substrate measurement subsystem 200. For example, first SMS data 422 can be acquired during a first measurement in the substrate measurement subsystem 200, sensor data 424 can be acquired during a second measurement in the processing chamber 300, and second SMS data 422 can be acquired during a third measurement in the substrate measurement subsystem 200.

[0062]

[0072] In a similar or alternative embodiment, the substrate measurement subsystem 200 may perform a first measurement and a second measurement of the substrate 102. For example, the substrate measurement subsystem 200 may acquire first SMS data 422 (e.g., spectral data) about the substrate 102 and may acquire second SMS data 422 (e.g., non-spectral data) about the substrate 102. At least one of the first SMS data 422 or the second SMS data 422 may be acquired before or after the substrate 102 is processed in the processing chamber 300.

[0063]

[0073] The recipe modification module 418 may determine whether to modify the process recipe 428 based on the data mapping 426 generated by the data mapping module 416. The recipe modification module 418 may identify the SMS data 422 (e.g., first SMS data, second SMS data, etc.) and / or sensor data 424 that are mapped together by the data mapping 426. In some embodiments, the type of SMS data 422 corresponds to the type of sensor data 424. In such embodiments, the recipe modification module 418 may compare the SMS data 422 with the sensor data 424 to determine a difference between the SMS data 422 and the sensor data 424. In response to determining the difference between the SMS data 422 and the sensor data 424, the recipe modification module 418 may compare the determined difference with a difference threshold. In response to determining that the difference exceeds the difference threshold, the recipe modification module 418 may determine to modify the process recipe 428.

[0064]

[0074] In some embodiments, the recipe modification module 418 can determine a position of the substrate in the processing chamber 300 based on the mapping between the SMS data 422 and the sensor data 424. As described above, the SMS data 422 can include spectral data generated for one or more portions of the substrate in the substrate measurement subsystem 200. The SMS data 422 can further include position data associated with the generated spectral data (e.g., Cartesian coordinates for each portion of the substrate). Also, as described above, the sensor data 424 can include spectral data generated for one or more portions of the substrate in the processing chamber 300. The recipe modification module 418 can identify first spectral data in the SMS data 422 that corresponds to second spectral data in the sensor data 424. The recipe modification module 418 can determine a position of the substrate in the processing chamber 300 based on the position data in the SMS data 422 associated with the first spectral data in the SMS data 422. The recipe modification module can determine whether to modify a process recipe for the substrate in the processing chamber 300 based on the determined position of the substrate in the processing chamber 300.

[0065]

[0075] In some embodiments, the recipe modification module 418 can compare the SMS data 422 to target measurements 432. The target measurements 432 can include target measurements for one or more portions of the substrate. In response to determining that the difference between the SMS data 422 and the target measurements 432 exceeds a difference threshold, the recipe modification module 418 can determine to modify the process recipe 428.

[0066]

[0076] In some embodiments, the recipe modification module 418 may determine modifications to the process recipe 428 that are expected given the differences between the SMS data 422 and the sensor data 424 and / or the SMS data 422 and the target measurements 432. In some embodiments, the recipe modification module 418 may determine the modifications to the process recipe 428 by providing the differences between the SMS data 422 and the sensor data 424 and / or the SMS data 422 and the target measurements 432 to a modification determination component (not shown). In such embodiments, the modification determination component may provide the recipe modification module 418 with recommended modifications to make to the process recipe 428 based on the provided differences. In some embodiments, the modification determination component may be a rules database that includes one or more rules related to process recipe modifications that may be implemented given the differences between the SMS data 422 and the sensor data 424 and / or the SMS data 422 and the target measurements 432. In other or similar embodiments, the modification determination component may include a data structure that associates differences between the SMS data 422 and the sensor data 424 and / or the SMS data 422 and the target measurements 432 to process recipe modifications.

[0067]

[0077] In an illustrative example, the modification determination component may determine that a processing chamber used to process a substrate is associated with a non-uniform etch rate based on differences between the SMS data 422 and the sensor data 424 and / or the SMS data 422 and the target measurements 432. Based on a determination that the processing chamber is associated with a non-uniform etch rate, the modification determination component may identify one or more process parameter values ​​to modify to achieve a uniform etch rate for future substrates processed in the processing chamber. Examples of process parameter value modifications may include decreasing the temperature in a first zone of the substrate support assembly and increasing the temperature of the first zone of the substrate support assembly.

[0068]

[0078] In some embodiments, the recipe modification module 418 may send a notification to a client device connected to the manufacturing system. The notification indicates that a modification to the process recipe 428 is recommended. The client device may display the notification to a user of the client device via a GUI, such as GUI 500 in FIG. 5 . The recipe modification module 418 may receive an instruction to modify the process recipe 428 from the client device. In response to receiving the instruction to modify the process recipe 428, the recipe modification module 418 may modify the process recipe and store the modified process recipe 430 in the data store 420. In some embodiments, the recipe modification module 418 may not send a notification to the client device and may instead modify the process recipe.

[0069]

[0079] As described above, a first measurement of the substrate 102 may be performed in the processing chamber 300, and a second measurement of the substrate 102 may be performed in the substrate measurement subsystem 200. In such an embodiment, the substrate measurement subsystem 200 may determine the position of the substrate 102 at the substrate measurement subsystem 200 in accordance with the previously described embodiments. The recipe modification module 418 may determine the position of the substrate within the processing chamber 300 based on the mapping between the SMS data 422 (i.e., the second measurement) and the sensor data 424 (i.e., the first measurement). The recipe modification module 418 may compare the SMS data 422 with the sensor data 424 in accordance with the previously described embodiments and, based on the comparison, determine whether to modify the process recipe 428.

[0070]

[0080] In some embodiments, external metrology data for the substrate 102 may be collected by an external metrology tool (e.g., before and / or after the substrate 102 is processed in the process chamber 300). The system controller 128 may receive the external metrology data from the external metrology tool and store the received external metrology data in a data store according to the previously described embodiments. The data mapping module 416 may update the data mapping for the substrate 102 to include a mapping between the external metrology data and other data for the substrate 102 (e.g., SMS data 422, sensor data 424). The recipe modification module 418 may determine whether to modify the process recipe 428 based on the updated data mapping 426 for the substrate 102 according to the previously described embodiments.

[0071]

[0081] 5 illustrates an example graphical user interface (GUI) 500 for providing notifications to a user (e.g., an operator) of a manufacturing system, in accordance with aspects of the present disclosure. In some embodiments, the GUI 500 may be presented to a user via a client device connected to the manufacturing system.

[0072]

[0082] The GUI 500 may include one or more GUI elements for providing information to and receiving information from a user of a client device. The GUI 500 may include a substrate ID element 512 that provides an identifier for a substrate being processed in a fabrication system. For example, the substrate ID element 512 may indicate that substrate "S00-0001" is being processed in a fabrication system. The GUI 500 may further include a pending process recipe action element 514 that provides an indication of a process recipe action being performed on a substrate in a portion of the fabrication system. As shown in FIG. 5 , the element 514 may provide an indication that an etch operation is being performed on the substrate. In some embodiments, the element 514 may provide details about the action being performed on the substrate. For example, the element 514 may provide an indication that an etch operation is being performed on the substrate in a processing chamber and that the etch operation is being performed for 3 minutes and 0 seconds.

[0073]

[0083] The GUI 500 may further include a recommended process recipe element 516 that provides an indication of a recommended modification to one or more operations of the process recipe. As shown in FIG. 5 , element 516 may provide a recommended modification for an etch process for a substrate. The recommended modification may include etching the substrate for 4 minutes 0 seconds instead of etching the substrate for 3 minutes 0 seconds as included in the original process recipe. In some embodiments, the GUI 500 may also include a modification reason element 518 that provides a reason why a modification to one or more operations of the process recipe is recommended. As shown in FIG. 5 , element 518 may indicate that a recommended modification to the process recipe is provided based on a determination that a film deposited on the substrate is thicker than expected.

[0074]

[0084] The GUI 500 may further include one or more interactive elements that enable a user of a client device to accept or reject a modification to the recipe. As shown in FIG. 5 , a user may select the modification approval element 520A to accept the recommended modification to the process recipe indicated by element 516. In response to receiving an indication that the user has selected the modification approval element 520A, the client device may generate and send to the system controller a notification including instructions to modify the process recipe in accordance with the recommended modification. The user may also select the modification reject element 520B to reject the recommended modification to the process recipe. In response to receiving an indication that the user has selected the modification reject element 520B, the client device may generate and send to the system controller a notification including instructions not to modify the process recipe in accordance with the recommended modification.

[0075]

[0085] FIG. 6 illustrates exemplary spectral data 600 generated from reflected energy received by the substrate measurement subsystem 200 of FIG. 2 or the sensor 360D of FIG. 3 in accordance with aspects of the present disclosure. As illustrated, the reflected energy waves received by the substrate measurement subsystem 200 may include multiple wavelengths. Each reflected energy wave may be associated with a different portion of the substrate 102. In some embodiments, an intensity may be measured for each reflected energy wave received by the substrate measurement subsystem 200. As seen in FIG. 6 , an intensity may be measured for each wavelength of the reflected energy waves received by the substrate measurement subsystem 200. The association between each intensity and each wavelength may form the basis for forming the spectral data 600. In some embodiments, one or more wavelengths may be associated with intensity values ​​that are outside of an expected range of intensity values. For example, line 610 may be associated with intensity values ​​that are outside of an expected range of intensity values, as shown by line 620. In such embodiments, an intensity value that is outside of the expected range of intensity values ​​may be an indication that a defect is present in a portion of the substrate 102. According to the above-described embodiments, modifications may be made to the process recipe for the substrate 102 based on an indication of defects in a portion of the substrate 102 .

[0076]

[0086] 7-10 are flow diagrams of various embodiments of methods 700-1000 for determining whether to modify a process recipe for a substrate. Methods 700-1000 are performed by processing logic, which may include hardware (circuitry, dedicated logic, etc.), software (such as running on a general-purpose computer system or a dedicated machine), firmware, or some combination thereof. Some methods 700-800 may be performed by a computing device, such as the system controller 128 of FIG. 1. Some methods 900-1000 may be performed by a computing device, such as the controller 230 of FIG. 2.

[0077]

[0087] For ease of explanation, the methodologies are depicted and described as a series of acts. However, acts in accordance with the present disclosure may be performed in various orders and / or simultaneously, and with other acts not presented and described herein. Moreover, not all depicted acts may be performed to implement a methodology in accordance with the disclosed subject matter. In addition, those skilled in the art will understand and appreciate that a methodology could alternatively be represented as a series of interrelated states via a state diagram or events.

[0078]

[0088] FIG. 7 is a flowchart of a method 700 for determining whether to modify a process recipe for a substrate in accordance with aspects of the present disclosure. At block 710, processing logic identifies a substrate to be processed in a manufacturing system according to the process recipe. At block 720, processing logic generates instructions to transfer the substrate to a substrate measurement subsystem to obtain a first set of measurements for the substrate. In some embodiments, the first set of measurements may include spectral or non-spectral data for the substrate (e.g., eddy current data, capacitance data, etc.). At block 730, processing logic receives the first set of measurements for the substrate from the substrate measurement subsystem. At block 740, processing logic generates instructions to transfer the substrate from the substrate measurement subsystem to a processing chamber of the manufacturing system. At block 750, processing logic receives a second set of measurements for the substrate from one or more sensors in the processing chamber. In some embodiments, the second set of measurements for the substrate may include spectral or non-spectral data for the substrate (e.g., power data, temperature data, pressure data, etc.). At block 760, processing logic generates a mapping between the first set of measurements and the second set of measurements for the substrate. At block 770, processing logic stores the first set of measurements mapped to the second set of measurements. At block 780, processing logic determines to modify a process recipe for the substrate based on the first set of measurements mapped to the second set of measurements. At block 790, processing logic optionally provides recommendations for modifying the recipe for the substrate via a graphical user interface.

[0079]

[0089] As described above, in some embodiments, the processing logic may generate instructions to transfer the substrate to a substrate measurement subsystem to obtain a first set of measurements for the substrate, and may generate instructions to transfer the substrate from the substrate measurement subsystem to a processing chamber of the manufacturing system to receive a second set of measurements for the substrate before receiving the first set of measurements for the substrate from the substrate measurement subsystem.

[0080]

[0090] 8 is a flowchart of another method 800 for determining whether to modify a process recipe for a substrate in accordance with an embodiment of the present disclosure. At block 810, processing logic receives a first set of measurements of a substrate from one or more sensors in a processing chamber of a manufacturing system. At block 820, processing logic processes the substrate in the processing chamber according to the process recipe. At block 830, processing logic optionally receives a second set of measurements of the substrate from one or more sensors in the processing chamber. At block 840, processing logic generates instructions to transfer the substrate from the processing chamber to a substrate measurement subsystem to obtain a third set of measurements. At block 850, processing logic receives the third set of measurements of the substrate from the substrate measurement subsystem. At block 860, processing logic generates a mapping between the first set of measurements, the second set of measurements, and / or the third set of measurements. At block 840, processing logic stores the mapping between the first set of measurements, the second set of measurements, and / or the third set of measurements. At block 880, processing logic determines to modify a recipe for the substrate based on a mapping between the first set of measurements, the second set of measurements, and / or the third set of measurements. At block 890, processing logic optionally provides recommendations for modifying the recipe for the substrate via a graphical user interface.

[0081]

[0091] 9 is a flowchart of a method 900 for acquiring data about a substrate in a substrate measurement subsystem according to an embodiment of the present disclosure. At block 910, processing logic receives an indication that a substrate being processed in a manufacturing system has been loaded into the substrate measurement subsystem. At block 920, processing logic determines position data for the substrate in the substrate measurement subsystem. At block 930, processing logic receives a recipe for the substrate. At block 940, processing logic determines one or more portions of the substrate to be measured by one or more sensing components of the substrate measurement subsystem based on the substrate position data and the recipe. At block 950, processing logic acquires measurements for each determined portion of the substrate by one or more sensing components (e.g., spectral sensing components, non-spectral sensing components, etc.) of the substrate measurement subsystem. At block 960, processing logic transmits the acquired measurements for each determined portion of the substrate to a system controller.

[0082]

[0092] 10 is a flowchart of a method 1000 for determining position data for a substrate in a substrate measurement subsystem according to aspects of the present disclosure. At block 1010, processing logic determines an identifying feature contained on the substrate. In some embodiments, the identifying feature may correspond to a reference position of the substrate (e.g., the center of the substrate). At block 1020, processing logic identifies a portion of the substrate that includes the determined identifying feature. At block 1030, processing logic generates instructions to capture one or more images of the identified portion of the substrate. At block 1040, processing logic determines an orientation and / or position of the substrate in the substrate measurement subsystem based on the captured image or images. At block 1050, processing logic generates position data for the substrate based on the determined orientation and / or position of the substrate in the substrate measurement subsystem.

[0083]

[0093] 11 shows a schematic diagram of a machine in the example form of a computing device 1100 within which a set of instructions may be executed that causes the machine to perform any one or more of the methodologies discussed herein. In alternative embodiments, the machine may be connected (e.g., networked) to other machines in a local area network (LAN), an intranet, an extranet, or the Internet. The machine may operate in the role of a server or a client machine in a client-server network environment, or as a peer machine in a peer-to-peer (or distributed) network environment. The machine may be a personal computer (PC), a tablet computer, a set-top box (STB), a personal digital assistant (PDA), a mobile phone, a web appliance, a server, a network router, switch, or bridge, or any machine capable of executing a series of instructions (sequential or non-sequential) that specify operations to be performed by the machine. Furthermore, while only a single machine is illustrated, the term "machine" should be taken to include any collection of machines (e.g., computers) that individually or jointly execute a set of instructions (or multiple sets) to perform any one or more of the methodologies discussed herein. In an embodiment, computing device 1100 may correspond to system controller 128 of FIG. 1 or controller 320 of FIG. 3.

[0084]

[0094] The exemplary computing device 1100 includes a processing device 1102, a main memory 1104 (e.g., read-only memory (ROM), flash memory, dynamic random access memory (DRAM) (e.g., synchronous DRAM (SDRAM)), etc.), a static memory 1106 (e.g., flash memory, static random access memory (SRAM), etc.), and a secondary memory (e.g., a data storage device 1128), which communicate with each other via a bus 1108.

[0085]

[0095] The processing device 1102 may represent one or more general-purpose processors, such as a microprocessor, a central processing unit, etc. More specifically, the processing device 1102 may be a complex instruction set computing (CISC) microprocessor, a reduced instruction set computing (RISC) microprocessor, a very long instruction word (VLIW) microprocessor, a processor implementing other instruction sets, or a processor implementing a combination of instruction sets. The processing device 1102 may also be one or more special-purpose processing devices, such as an application-specific integrated circuit (ASIC), a field-programmable gate array (FPGA), a digital signal processor (DSP), a network processor, etc. The processing device 1102 may also be or include a system on a chip (SoC), a programmable logic controller (PLC), or other type of processing device. The processing device 1102 is configured to execute processing logic for performing the operations and steps discussed herein.

[0086]

[0096] Computing device 1100 may further include a network interface device 1122 for communicating with a network 1164. Computing device 1100 may also include a video display unit 1110 (e.g., a liquid crystal display (LCD) or a cathode ray tube (CRT)), an alphanumeric input device 1112 (e.g., a keyboard), a cursor control device 1114 (e.g., a mouse), and a signal generation device 1120 (e.g., a speaker).

[0087]

[0097] The data store 1128 may include a machine-readable storage medium (or, more specifically, a non-transitory computer-readable storage medium) 1124 on which is stored one or more sets of instructions 1126 that embody any one or more of the methods or functions described herein. Here, a non-transitory storage medium refers to a storage medium other than a carrier wave. The instructions 1126 may also reside, completely or at least partially, within the main memory 1104 and / or within the processing device 1102 during execution by the computing device 1100. The main memory 1104 and the processing device 1102 also constitute computer-readable storage media.

[0088]

[0098] Although the computer-readable storage medium 1124 is shown as a single medium in the exemplary embodiment, the term "computer-readable storage medium" should be understood to include a single medium or multiple media (e.g., a centralized or distributed database and / or associated caches and servers) that store one or more sets of instructions. The term "computer-readable storage medium" should also be taken to include any medium that is capable of storing or encoding a set of instructions that are executed by a machine, causing the machine to perform any one or more of the methods of the present disclosure. Thus, the term "computer-readable storage medium" should be taken to include, but is not limited to, solid-state memory, and optical and magnetic media.

[0089]

[0099] The foregoing description sets forth numerous specific details, such as examples of particular systems, components, methods, etc., to provide a thorough understanding of some embodiments of the present disclosure. However, it will be apparent to those skilled in the art that at least some embodiments of the present disclosure may be practiced without these specific details. In other instances, well-known components or methods are not described in detail or are presented in simple block diagram form to avoid unnecessarily obscuring the present disclosure. Thus, the specific details described are for illustrative purposes only. It is contemplated that particular implementations may vary from these example details and still be within the scope of the present disclosure.

[0090]

[0100] References throughout this specification to "one embodiment" or "an embodiment" mean that a particular feature, structure, or characteristic described in connection with an embodiment is included in at least one embodiment. Thus, the appearances of "in one embodiment" or "in an embodiment" in various places throughout this specification are not necessarily referring to the same embodiment. In addition, the term "or" is intended to mean an inclusive "or" rather than an exclusive "or." When the term "about" or "approximately" is used herein, it is intended to mean that the nominal value presented is accurate to within ±10%.

[0091]

[0101] Although the steps of the methods herein are illustrated and described in a particular order, the order of the steps of each method may be changed such that certain steps are performed in reverse order and certain steps are performed at least partially concurrently with other steps. In alternative embodiments, the order of separate steps or substeps may be intermittent and / or alternating.

[0092]

[0102] It should be understood that the above description is intended to be illustrative, and not limiting. Many other embodiments will become apparent to those skilled in the art upon reading and understanding the above description. The scope of the disclosure should, therefore, be determined with reference to the appended claims, along with the full scope of equivalents to which such claims are entitled.

Claims

1. identifying, in a manufacturing system, by a controller operably coupled to the manufacturing system, a process recipe associated with the substrate; obtaining a first set of measurements for the substrate from a substrate measurement subsystem; obtaining a second set of measurements for the substrate from one or more sensors in a chamber of the manufacturing system and generating a mapping between the first set of measurements and the second set of measurements for the substrate; storing a mapping between the first set of measurements and the second set of measurements; based on a mapping between the first set of measurements and the second set of measurements; Modifying the operation of the process recipe; or generating instructions to prevent completion of execution of one or more operations of the process recipe; determining whether to modify the process recipe by at least one of: providing a notification to modify the process recipe via a user interface of a client device connected to the manufacturing system; A method comprising:

2. 10. The method of claim 1, wherein the first set of measurements for the substrate includes at least one of spectral data, position data, or property data, and the second set of measurements for the substrate includes at least one of spectral data, temperature data, pressure data, or power data.

3. 3. The method of claim 2, wherein at least one of the spectral data of the first set of measurements or the spectral data of the second set of measurements comprises at least one of reflectometry spectral data, ellipsometry spectral data, hyperspectral imaging data, chemical imaging data, thermal spectral data, or conductivity spectral data.

4. 10. The method of claim 1, further comprising storing at least one of the first set of measurements or the second set of measurements in a data store for the manufacturing system, the data store being inaccessible to an operator of the manufacturing system.

5. determining whether to modify the process recipe based on a mapping between the first set of measurements and the second set of measurements includes: calculating a difference between a first measurement in the first set of measurements and a second measurement in the second set of measurements; determining whether the difference between the first measurement and the second measurement exceeds a difference threshold; The method of claim 1 , comprising:

6. determining whether to modify the process recipe based on a mapping between the first set of measurements and the second set of measurements includes: determining a target value associated with a first measurement of the first set of measurements; calculating a difference between the target value and the first measurement value; determining whether the difference between the target value and the first measurement value exceeds a difference threshold; The method of claim 1 , comprising:

7. The method of claim 1, wherein the notification to modify the process recipe includes a request to modify the process recipe. The method comprises: Detecting user interaction with the user interface in response to the request; modifying the process recipe according to the detected user interaction; The method of claim 1 further comprising:

8. The method of claim 1 , wherein the chamber is a process chamber of the manufacturing system.

9. identifying a first substrate in a manufacturing system by a controller operably coupled to the manufacturing system and identifying a second substrate in the manufacturing system by the controller, the first substrate being associated with a first process recipe and the second substrate being associated with a second process recipe; obtaining a first set of measurements for the first substrate from a substrate measurement subsystem; acquiring a second set of measurements for the first substrate from a chamber of the manufacturing system and generating a mapping between the first set of measurements and the second set of measurements for the first substrate; storing a mapping between the first set of measurements and the second set of measurements; based on a mapping between the first set of measurements and the second set of measurements; modifying the operation of the second process recipe; or generating instructions to prevent completion of execution of one or more operations of the second process recipe; determining whether to modify the second process recipe for the second substrate by at least one of: providing a notification to modify the one or more operations of the second process recipe via a user interface of a client device connected to the manufacturing system; A method comprising:

10. 10. The method of claim 9, wherein the first set of measurements for the first substrate includes at least one of spectral data, position data, or property data, and the second set of measurements for the first substrate includes at least one of spectral data, temperature data, pressure data, or power data.

11. 11. The method of claim 10, wherein at least one of the spectral data of the first set of measurements or the spectral data of the second set of measurements comprises at least one of reflectometry spectral data, ellipsometry spectral data, hyperspectral imaging data, chemical imaging data, thermal spectral data, or conductivity spectral data.

12. 10. The method of claim 9, further comprising storing at least one of the first set of measurements or the second set of measurements in a data store for the manufacturing system, the data store being inaccessible to an operator of the manufacturing system.

13. Determining whether to modify the second process recipe for the second substrate based on a mapping between the first set of measurements and the second set of measurements, comprising: calculating a difference between a first measurement in the first set of measurements and a second measurement in the second set of measurements; determining whether the difference between the first measurement and the second measurement exceeds a difference threshold; 10. The method of claim 9, comprising:

14. Determining whether to modify the second process recipe for the second substrate based on a mapping between the first set of measurements and the second set of measurements, comprising: determining a target value associated with a first measurement of the first set of measurements; calculating a difference between the target value and the first measurement value; determining whether the difference between the target value and the first measurement value exceeds a difference threshold; 10. The method of claim 9, comprising:

15. The method of claim 1, wherein the notification to modify the process recipe includes a request to modify the process recipe. The method comprises: Detecting user interaction with the user interface in response to the request; modifying the process recipe according to the detected user interaction; The method of claim 9 further comprising:

16. The method of claim 9 , wherein the chamber is a process chamber of the manufacturing system.

Images