Substrate processing apparatus and substrate processing method

Abstract

To provide a substrate processing device capable of highly accurately acquiring the state of a cup member and a substrate processing method.SOLUTION: The substrate processing device includes a substrate for inspection which includes a base part and an imaging part arranged in the base part, a holding part which is configured so as to hold a substrate or the substrate for inspection, a driving part which is configured so as to rotationally drive the holding part, a processing liquid supply part which is configured so as to supply a processing liquid to the substrate held by the holding part, the cup member which is configured so as to surround the holding part from outside, and a control part. The control part is configured so as to execute first processing for rotating the holding part by controlling the driving part in such a state that the substrate for inspection is held by the holding part, to adjust the position of the imaging part with respect to the cup member to a predetermined first imaging position and second processing for controlling the imaging part, to image an imaging object located in a space closer to the side of the cup member than the outer peripheral edge of the base part in the first imaging position, after the first processing.SELECTED DRAWING: Figure 2

Description

[Technical Field]

[0001] The present disclosure relates to a substrate processing apparatus and a substrate processing method. [Background technology]

[0002] Patent Document 1 discloses a substrate processing apparatus including a holding section for holding a substrate, a splash prevention cup arranged around the holding section, a processing liquid supply nozzle for supplying processing liquid to the substrate held in the holding section, an imaging means arranged above the processing liquid supply nozzle and the splash prevention cup for imaging the processing liquid supply path between the processing liquid supply nozzle and the substrate surface, and a control means for performing a predetermined operation if the supply state of the processing liquid imaged by the imaging means is abnormal. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Japanese Patent Application Publication No. 11-329936 Summary of the Invention [Problem to be solved by the invention]

[0004] The present disclosure describes a substrate processing apparatus and a substrate processing method that are capable of accurately acquiring the state of a cup member. [Means for solving the problem]

[0005] An example of a substrate processing apparatus includes a base portion and a testing substrate including an imaging unit disposed on the base portion, a holding portion configured to hold a substrate or the testing substrate, a drive portion configured to rotate the holding portion, a processing liquid supply portion configured to supply a processing liquid to the substrate held in the holding portion, a cup member configured to surround the holding portion from the outside, and a control unit. The control unit is configured to perform a first process of adjusting the position of the imaging unit relative to the cup member to a predetermined first imaging position by controlling the drive portion to rotate the holding portion while the testing substrate is held in the holding portion, and a second process of controlling the imaging unit after the first process to capture an image of an imaging object located in a space closer to the cup member than the outer periphery of the base portion at the first imaging position. [Effects of the Invention]

[0006] According to the substrate processing apparatus and substrate processing method of the present disclosure, it is possible to acquire the state of the cup member with high accuracy. [Brief explanation of the drawings]

[0007] [Figure 1] FIG. 1 is a plan view schematically illustrating an example of a substrate processing system. [Figure 2] FIG. 2 is a side view schematically illustrating an example of the liquid processing unit. [Figure 3] FIG. 3 is a block diagram showing an example of a main part of a substrate processing system. [Figure 4] FIG. 4 is a schematic diagram illustrating an example of a hardware configuration of the controller. [Figure 5] FIG. 5 is a flowchart illustrating an example of a procedure for inspecting the state of the cup member. [Figure 6] FIG. 6 is a top view of the inspection substrate for explaining an example of adjusting the imaging position. [Figure 7]7A and 7B are diagrams for explaining a method for calculating the height of the cup member, in which FIG. 7A is a side view schematically showing a part of the liquid processing unit, and FIG. 7B is a diagram showing an example of an image obtained by expanding an image of the cup member captured over substantially the entire circumference onto a plane. [Figure 8] Figure 8 is a diagram for explaining a method for calculating the inclination of the cup member, where Figure 8(a) is a side view schematically showing a part of the liquid processing unit, and Figure 8(b) is a diagram showing an example of an image obtained by expanding an image captured over substantially the entire circumference of the cup member onto a plane. [Figure 9] FIG. 9 is a diagram for explaining a method for calculating an abnormality in a cup member, and shows an example of an image obtained by developing a captured image of the cup member over substantially the entire circumference onto a plane. [Figure 10] FIG. 10 is a top view showing another example of the testing substrate. DETAILED DESCRIPTION OF THE INVENTION

[0008] In the following description, the same elements or elements having the same functions will be designated by the same reference numerals, and redundant explanations will be omitted. Note that in this specification, when referring to the top, bottom, right, and left of a figure, the directions of the reference numerals in the figure will be used as the reference.

[0009] [Substrate processing system] 1, a substrate processing system 1 (substrate processing apparatus) configured to process a substrate W will be described. The substrate processing system 1 includes a loading / unloading station 2, a processing station 3, and a controller Ctr (controller). The loading / unloading station 2 and the processing station 3 may be aligned in a horizontal line, for example.

[0010] The substrate W may be disk-shaped or may be a non-circular plate-shaped such as a polygon. The substrate W may have a cutout portion cut out of a portion. The cutout portion may be, for example, a notch (a U-shaped, V-shaped groove, or the like) or a linear portion extending linearly (so-called orientation flat). The substrate W may be, for example, a semiconductor substrate (silicon wafer), a glass substrate, a mask substrate, an FPD (Flat Panel Display) substrate, or any other type of substrate. The diameter of the substrate W may be, for example, approximately 200 mm to 450 mm.

[0011] The loading / unloading station 2 includes a mounting section 4, a loading / unloading section 5, and a shelf unit 6 (accommodation chamber). The mounting section 4 includes a plurality of mounting tables (not shown) arranged in the width direction (the vertical direction in FIG. 1). Each mounting table is configured to be able to mount a carrier 7 thereon. The carrier 7 is configured to accommodate at least one substrate W in a sealed state. The carrier 7 includes an opening / closing door (not shown) for loading and unloading the substrate W.

[0012] The loading / unloading section 5 is disposed adjacent to the mounting section 4 in the direction in which the loading / unloading stations 2 and the processing stations 3 are lined up (the left-right direction in FIG. 1). The loading / unloading section 5 includes an opening / closing door (not shown) provided for the mounting section 4. When the carrier 7 is placed on the mounting section 4, the opening / closing door of the carrier 7 and the opening / closing door of the loading / unloading section 5 are both opened, thereby connecting the inside of the loading / unloading section 5 and the inside of the carrier 7.

[0013] The loading / unloading section 5 incorporates a transport arm A1 and a shelf unit 6. The transport arm A1 is configured to be able to move horizontally in the width direction of the loading / unloading section 5, move up and down in the vertical direction, and rotate around a vertical axis. The transport arm A1 is configured to take out a substrate W from a carrier 7 and pass it to the shelf unit 6, and also to receive a substrate W from the shelf unit 6 and return it to the carrier 7. The shelf unit 6 is located near the processing station 3, and is configured to store substrates W and inspection substrates J (described in detail below).

[0014] The processing station 3 includes a transport section 8 and a plurality of liquid processing units U. The transport section 8 extends horizontally, for example, in the direction in which the loading / unloading station 2 and the processing station 3 are lined up (the left-right direction in FIG. 1). The transport section 8 incorporates a transport arm A2 (transport section). The transport arm A2 is configured to be able to move horizontally in the longitudinal direction of the transport section 8, move up and down in the vertical direction, and pivot about a vertical axis. The transport arm A2 is configured to take out a substrate W or a substrate J for testing from the shelf unit 6 and pass it to the liquid processing unit U, and to receive a substrate W or a substrate J for testing from the liquid processing unit U and return it to the shelf unit 6.

[0015] [Liquid processing unit] Next, the liquid processing unit U will be described in detail with reference to Fig. 2. The liquid processing unit U includes a chamber 10, an air blower 20, a flow rectifier 30, a rotary holder 40, a collection cup 50 (cup member, outer cup body), a cleaning cup 60 (cup member), a mist guard 70 (cup member), an upper supply unit 80 (processing liquid supply unit, cleaning liquid supply unit), and a lower supply unit 90.

[0016] The chamber 10 is configured so that a substrate W is processed therein using a processing liquid or the like. A loading / unloading port (not shown) is formed in a side wall of the chamber 10. The substrate W is transported into the chamber 10 and transported out of the chamber 10 through the loading / unloading port by the transport arm A2.

[0017] The blower 20 is attached so as to cover an opening 10a formed in the ceiling wall of the chamber 10. ,Ko The flow control unit 11 is configured to generate a downward flow in the chamber 10 based on a signal from the controller Ctr.

[0018] The rectifying unit 30 is disposed at the top of the chamber 10 and extends horizontally so as to divide the interior space of the chamber 10 into upper and lower sections. The rectifying unit 30 is a plate-like body with a large number of holes formed therein, and may be made of, for example, punched metal, expanded metal, or wire mesh. The rectifying unit 30 is configured to rectify the downward flow formed by the blower unit 20 and adjust the distribution of the downward flow within the chamber 10 below the rectifying unit 30.

[0019] The rotary holder 40 includes a rotary shaft 41, a drive unit 42, a support plate 43 (holding unit), a plurality of support pins 44 (holding unit), and an inner cup body 45 (cup member). The rotary shaft 41 is a hollow tubular member extending in the vertical direction. The rotary shaft 41 is configured to be rotatable around a central rotation axis Ax.

[0020] The drive unit 42 is connected to the rotary shaft 41. The drive unit 42 is configured to operate based on an operation signal from the controller Ctr and rotate the rotary shaft 41. The drive unit 42 may be a power source such as an electric motor.

[0021] The support plate 43 is, for example, a flat plate having an annular shape and extends horizontally. That is, a through-hole 43a is formed in the center of the support plate 43. The inner periphery of the support plate 43 is connected to the tip of the rotating shaft 41. Therefore, the support plate 43 is configured to rotate around the central rotation axis Ax of the rotating shaft 41 in conjunction with the rotation of the rotating shaft 41.

[0022] The multiple support pins 44 are provided on the support plate 43 so as to protrude upward from the upper surface 43b of the support plate 43. The multiple support pins 44 are configured to support the substrate W approximately horizontally by abutting their tips against the back surface of the substrate W. The multiple support pins 44 may have, for example, a cylindrical shape or a frustum shape. The multiple support pins 44 may be arranged at approximately equal intervals near the outer periphery of the support plate 43 so as to form a circle as a whole when viewed from above. For example, when there are 12 multiple support pins 44, the multiple support pins 44 may be arranged at intervals of approximately 30°.

[0023] The inner cup body 45 has an annular (e.g., circular) shape and is connected to the support plate 43 by a plurality of connecting members 46 so as to be spaced apart from and positioned above the support plate 43. The inner cup body 45 is arranged so as to surround from the outside the substrate W that is supported by the plurality of support pins 44. Therefore, the inner cup body 45 is configured to rotate around the central rotation axis Ax of the rotation shaft 41 in conjunction with the rotation of the rotation shaft 41. Because a gap exists between the inner cup body 45 and the support plate 43, the liquid supplied to the substrate W flows through the gap to the outside of the inner cup body 45 and the support plate 43.

[0024] The collection cup 50 is disposed so as to surround the rotating holder 40 from the outside. While the rotating holder 40 is configured to be rotatable, the collection cup 50 does not rotate but remains stationary. The collection cup 50 may be fixed to the drive unit 42, as illustrated in FIG. 2. The collection cup 50 includes a drainage cup 51 located inside and an exhaust cup 52 disposed so as to surround the drainage cup 51 from the outside.

[0025] The drainage cup 51 includes an inner circumferential portion 51a, a drainage cup body 51b, a movable cup 51c, and a movable cup 51d. The inner circumferential portion 51a is located below the support plate 43 and extends along the lower surface of the support plate 43. The drainage cup body 51b forms a cylindrical space that communicates with the gap between the inner cup body 45 and the support plate 43. The movable cups 51c and 51d are disposed within the cylindrical space.

[0026] The movable cup 51c is located inside the drainage cup body 51b, and a cylindrical liquid reservoir RE1 is formed between the movable cup 51c and the drainage cup body 51b. The liquid reservoir RE1 is configured to collect and store the processing liquid that has splashed from the surface of the substrate W during substrate processing. A pipe is connected to the bottom end of the liquid reservoir RE1 for discharging the collected processing liquid to the outside of the liquid processing unit U.

[0027] The movable cup 51c is connected to a drive source (not shown) and is configured to be able to move up and down. When the movable cup 51c is in the raised position (see FIG. 2), the upper part of the movable cup 51c abuts against the upper part of the drainage cup body 51b, closing the liquid reservoir RE1. On the other hand, when the movable cup 51c is in the lowered position (not shown), the upper part of the movable cup 51c is separated from the upper part of the drainage cup body 51b, and the liquid reservoir RE1 communicates with the outside.

[0028] Movable cup 51d is located inside movable cup 51c, and forms a cylindrical liquid reservoir RE2 between itself and movable cup 51c, and also forms a cylindrical liquid reservoir RE3 between itself and inner peripheral portion 51a. Liquid reservoirs RE2 and RE3 are each configured to collect and store the processing liquid that has splashed from the surface of substrate W during substrate processing. Pipes are connected to the lower ends of liquid reservoirs RE2 and RE3, respectively, for discharging the collected processing liquid to the outside of liquid processing unit U.

[0029] Movable cup 51d is connected to a drive source (not shown) and is configured to be able to move up and down. When movable cups 51c, 51d are both in the raised position (see FIG. 2), the upper part of movable cup 51d abuts against the upper part of movable cup 51c, closing liquid reservoir RE2 and connecting liquid reservoir RE3 to the outside. On the other hand, when movable cup 51c is in the raised position and movable cup 51d is in the lowered position (not shown), the upper part of movable cup 51d separates from the upper part of movable cup 51c, connecting liquid reservoir RE2 to the outside and connecting liquid reservoir RE3 to the outside.

[0030] A cylindrical space is formed between exhaust cup 52 and drainage cup 51, and the space is adjusted to a negative pressure. A pipe is connected to the lower end of exhaust cup 52 to suck the atmosphere near inner cup body 45 and exhaust it to the outside of liquid processing unit U.

[0031] The cleaning cup 60 is configured to be able to store the cleaning liquid therein. The cleaning cup 60 has a cylindrical shape that surrounds the exhaust cup 52 from the outside and extends so as to connect the lower end of the chamber 10 and the exhaust cup 52. For example, the internal space of the cleaning cup 60 (the cleaning liquid storage space) may be a space surrounded by the cleaning cup 60 and the upper end of the exhaust cup 52. As illustrated in FIG. 2 , the cleaning cup 60 may include a cylindrical peripheral wall portion 61 that extends vertically and an annular bottom wall portion 62 that extends horizontally from the lower end of the peripheral wall portion 61 radially inward (toward the collection cup 50). A pipe is connected to the lower end of the cleaning cup 60 to drain the used cleaning liquid to the outside of the liquid processing unit U.

[0032] The mist guard 70 is disposed so as to surround the collection cup 50 from the outside. That is, the rotary holder 40 and the collection cup 50 are located inside the mist guard 70. As illustrated in Fig. 2, the mist guard 70 may include a cylindrical portion 71 extending in the vertical direction, and an annular protruding portion 72 extending horizontally from the upper end of the cylindrical portion 71 radially inward (toward the collection cup 50 side).

[0033] The mist guard 70 is connected to a drive unit 73 and is configured to be movable up and down. The mist guard 70 can move up and down, for example, between a lowered position (see FIG. 2 ) in which at least a lower portion of the cylindrical portion 71 is located within the cleaning cup 60 and an elevated position (not shown) in which the entire or almost entire cylindrical portion 71 is exposed from the cleaning cup 60. In the lowered position, at least a lower portion of the cylindrical portion 71 is immersed in the cleaning liquid while the cleaning liquid is stored in a storage space within the cleaning cup 60. In the elevated position, mist generated by the processing liquid (described below) supplied to the substrate W splashing around adheres to the inner circumferential surface 70a of the mist guard 70. Therefore, the mist guard 70 prevents the mist from adhering to the inner wall of the chamber 10.

[0034] The upper supply unit 80 is configured to supply a plurality of different types of processing liquids to the surface of the substrate W. The upper supply unit 80 includes supply units 81 to 83, nozzles 84 to 86, an arm 87 (holding arm), and a drive unit 88.

[0035] The supply unit 81 includes a liquid source, a valve, a pump, etc. (not shown), and is configured to supply the liquid L1 downward from the nozzle 84 based on a signal from the controller Ctr. The liquid L1 may be an alkaline liquid. The liquid L1 may be used, for example, as a chemical liquid for processing the substrate W (for example, a process for removing dirt or foreign matter, an etching process, etc.), or as a cleaning liquid for cleaning the inner circumferential surface 70a of the mist guard 70 and the inner wall surface of the chamber 10. The alkaline chemical liquid may include, for example, an SC-1 liquid (a mixture of ammonia, hydrogen peroxide, and pure water), hydrogen peroxide solution, etc.

[0036] The supply unit 82 includes a liquid source, a valve, a pump, etc. (not shown), and is configured to supply the liquid L2 downward from the nozzle 85 based on a signal from the controller Ctr. The liquid L2 may be an acidic liquid. The liquid L2 may be used, for example, as a chemical liquid for processing the substrate W (e.g., removal of dirt and foreign matter, etching, etc.), or as a cleaning liquid for cleaning the inner circumferential surface 70a of the mist guard 70 and the inner wall surface of the chamber 10. The acidic chemical liquid may include, for example, an SC-2 liquid (a mixture of hydrochloric acid, hydrogen peroxide, and pure water), an SPM (a mixture of sulfuric acid, hydrogen peroxide, and pure water), an HF liquid (hydrofluoric acid), a DHF liquid (dilute hydrofluoric acid), an HF / HNO3 liquid (a mixture of hydrofluoric acid and nitric acid), or sulfuric acid.

[0037] The supply unit 83 includes a liquid source, a valve, a pump, etc. (not shown), and is configured to supply the liquid L3 downward from the nozzle 86 based on a signal from the controller Ctr. The liquid L3 may be used, for example, as a cleaning liquid for cleaning the substrate W or the inner circumferential surface 70a of the mist guard 70. The liquid L3 may be water. The water may contain, for example, pure water (DIW: deionized water), ozone water, carbonated water (CO2 water), ammonia water, etc. The water may be cold water (for example, about 10°C or below), room temperature water (for example, about 10°C to 30°C), or warm water (for example, about 30°C or above).

[0038] The nozzles 84 to 86 are attached to an arm 87 at a predetermined interval. The arm 87 is located in the space above the spin holder 40. A drive unit 88 is connected to the arm 87 and is configured to raise and lower the arm 87 based on a signal from the controller Ctr, and to move the arm 87 in the horizontal direction above the spin holder 40. When the liquids L1 to L3 are ejected from the nozzles 84 to 86 onto the surface of the substrate W, the nozzles 84 to 86 may move together with the arm 87 and be positioned above the substrate W so that their ejection outlets are directed toward the surface of the substrate W.

[0039] The lower supply unit 90 includes supply units 91 and 92 and a nozzle 93. The supply unit 91 includes a liquid source, a valve, a pump, etc. (not shown), and is configured to supply a liquid L4 upward through a flow path 93a formed inside the nozzle 93 based on a signal from the controller Ctr. The liquid L4 may be any of the liquids L1 to L3 described above. The supply unit 92 includes a gas source, a valve, a pump, etc. (not shown), and is configured to supply a dry gas G upward through a flow path 93b formed inside the nozzle 93 based on a signal from the controller Ctr. The dry gas G may be, for example, an inert gas (e.g., nitrogen gas).

[0040] [Test board] The inspection board J is configured to inspect the state of the inner cup body 45 and the collection cup 50 (hereinafter simply referred to as the "cup member N"). As illustrated in FIG. 2, the inspection board J includes a base portion J1, an imaging portion J2, an illumination portion J3, a battery J4, and a communication portion J5. The base portion J1 may be disk-shaped, similar to the board W, or may be a non-circular plate-shaped portion such as a polygon. The base portion J1 holds the imaging portion J2, the illumination portion J3, the battery J4, and the communication portion J5.

[0041] The imaging unit J2 is configured to operate based on an operation signal from the controller Ctr and capture an image of the cup member N. The imaging unit J2 may be, for example, a CCD camera or a CMOS camera. The imaging unit J2 is disposed on the base unit J1 and faces the outer periphery of the base unit J1. The imaging unit J2 may be configured so that its elevation angle can be changed by a driving unit (not shown). The elevation angle may be, for example, 0° to 90°.

[0042] The illumination unit J3 operates based on an operation signal from the controller Ctr, and is configured to irradiate light onto the cup member N when the imaging unit J2 captures an image of the cup member N. The illumination unit J3 is disposed on the base unit J1. The illumination unit J3 may also be disposed near the imaging unit J2.

[0043] The battery J4 is configured to supply power to electronic devices provided on the test board J. To charge the battery J4, a charging port may be provided, for example, on the shelf unit 6. In this case, the battery J4 is charged through the charging port while the test board J is retracted to the shelf unit 6 and held thereon. The charging method for the battery J4 may be contact charging, in which charging is performed by contacting a metal terminal of the charging port, or contactless charging, in which power is transmitted without passing through a metal terminal or the like.

[0044] The communication unit J5 is configured to be able to communicate with a controller Ctr (for example, a processing unit M3 described later). The communication unit J5 can receive operation signals for operating the image capture unit J2 and the illumination unit J3 from the controller Ctr. The communication unit J5 can transmit data of images captured by the image capture unit J2 to the controller Ctr. The communication method between the communication unit J5 and the controller Ctr is not particularly limited, and may be, for example, wireless communication or wired (communication cable) communication. Examples of wireless communication methods that may be used include LTE (Long Term Evolution), LTE-A (LTE-Advanced), SUPER3G, IMT-Advanced, 4G, 5G, FRA (Future Radio Access), W-CDMA (registered trademark), GSM (registered trademark), CDMA2000, UMB (Ultra Mobile Broadband), IEEE 802.11 (Wi-Fi), IEEE 802.16 (WiMAX), IEEE 802.20, UWB, Bluetooth (registered trademark), and other communication methods.

[0045] [Controller Details] The controller Ctr is configured to partially or entirely control the substrate processing system 1. As illustrated in FIG. 3, the controller Ctr has functional modules including a reading unit M1, a memory unit M2, a processing unit M3, an instruction unit M4, and a communication unit M5. These functional modules merely divide the functions of the controller Ctr into a plurality of modules for convenience, and do not necessarily mean that the hardware constituting the controller Ctr is divided into such modules. Each functional module is not limited to being realized by executing a program, but may also be realized by a dedicated electric circuit (e.g., a logic circuit) or an integrated circuit (ASIC: Application Specific Integrated Circuit) that integrates such circuits.

[0046] The reading unit M1 is configured to read a program from a computer-readable recording medium RM. The recording medium RM records a program for operating each unit of the substrate processing system 1. The recording medium RM may be, for example, a semiconductor memory, an optical recording disk, a magnetic recording disk, or a magneto-optical recording disk. Note that, hereinafter, each unit of the substrate processing system 1 may include the blower 20, the drive units 42, 73, 88, the supply units 81 to 83, 91, 92, the imaging unit J2, the illumination unit J3, and the communication unit J5.

[0047] The memory unit M2 is configured to store various data. The memory unit M2 may store, for example, a program read from a recording medium RM by the reading unit M1, setting data input by an operator via an external input device (not shown), etc. The memory unit M2 may store, for example, data on processing conditions (processing recipes) for processing the substrate W. The memory unit M2 may store, for example, data on images captured by the imaging unit J2 transmitted via the communication units J5, M5.

[0048] The processing unit M3 is configured to process various types of data. The processing unit M3 may generate signals for operating each unit of the substrate processing system 1 based on, for example, various types of data stored in the memory unit M2. The processing unit M3 may generate, for example, an operation signal for causing the imaging unit J2 to start or stop imaging. The processing unit M3 may generate, for example, an operation signal for adjusting the elevation angle or focus of the imaging unit J2. The processing unit M3 may generate, for example, an operation signal for causing the illumination unit J3 to start or stop irradiating light.

[0049] The processing unit M3 may calculate the state of the cup member N based on, for example, data of the captured image captured by the imaging unit J2. The state of the cup member N may include, for example, the posture of the cup member (the height of the cup member N, the tilt of the cup member N, etc.) and any abnormalities in the surface of the cup member N. When there is an abnormality in the surface of the cup member N, the processing unit M3 may issue an alarm from an alarm unit (not shown) (for example, the alarm may be displayed on a display, or an alarm sound or alarm guide may be issued from a speaker).

[0050] The instruction unit M4 is configured to transmit the operation signal generated in the processing unit M3 to each unit of the substrate processing system 1. As described above, the communication unit M5 is configured to be able to communicate with the communication unit J5. When the communication unit M5 performs wireless communication with the communication unit J5, the communication unit M5 may be configured similarly to the communication unit J5.

[0051] The hardware of the controller Ctr may be configured, for example, by one or more control computers. The controller Ctr may include a circuit C1 as a hardware configuration, as exemplified in Fig. 4. The circuit C1 may be configured by electric circuit elements. The circuit C1 may include, for example, a processor C2, a memory C3, a storage C4, a driver C5, and an input / output port C6.

[0052] The processor C2 may be configured to execute a program in cooperation with at least one of the memory C3 and the storage C4 and to implement each of the above-mentioned functional modules by inputting and outputting signals via the input / output port C6. The memory C3 and the storage C4 may function as the storage unit M2. The driver C5 may be a circuit configured to drive each component of the substrate processing system 1. The input / output port C6 may be configured to mediate the input and output of signals between the driver C5 and each component of the substrate processing system 1.

[0053] The substrate processing system 1 may include one controller Ctr, or may include a controller group (controller) composed of multiple controllers Ctr. When the substrate processing system 1 includes a controller group, each of the above-mentioned functional modules may be realized by one controller Ctr, or may be realized by a combination of two or more controllers Ctr. When the controller Ctr is composed of multiple computers (circuits C1), each of the above-mentioned functional modules may be realized by one computer (circuit C1), or may be realized by a combination of two or more computers (circuits C1). The controller Ctr may include multiple processors C2. In this case, each of the above-mentioned functional modules may be realized by one processor C2, or may be realized by a combination of two or more processors C2.

[0054] [Method for inspecting the condition of the cup component] Next, an example of a method for inspecting the state of the cup member N will be described with reference to Figures 5 to 9. Note that the following describes an example in which the inspection is started in a state in which the inspection board J is placed on the shelf unit 6. Furthermore, the image captured by the imaging unit J2 may be a grayscale image or a color image.

[0055] First, the controller Ctr controls the transport arm A2 to transport the test substrate J from the shelf unit 6 to the liquid processing unit U. Next, the test substrate J is held by the rotation holder 40 of the liquid processing unit U (see step S1 in FIG. 5).

[0056] Next, the controller Ctr controls the rotation holding unit 40 to rotate the inspection substrate J via the rotation holding unit 40 so that the imaging unit J2 is positioned at a predetermined imaging position P1 (see FIG. 6) relative to the cup member N (see step S2 in FIG. 5). Note that if the imaging unit J2 is positioned at the imaging position when the inspection substrate J is held by the rotation holding unit 40 from the transport arm A2, the processing of step S2 does not need to be executed.

[0057] Next, the controller Ctr controls the imaging unit J2 and the illumination unit J3 via the communication units M5 and J5, and while the illumination unit J3 irradiates light onto the cup member N, the imaging unit J2 captures an image of the cup member N (see step S3 in FIG. 5). FIG. 7(a) shows an example of imaging of the cup member N by the imaging unit J2. As illustrated in FIG. 7(a), the imaging unit J2 captures an image of the space closer to the cup member N than the outer periphery of the base part J1, so as to include the upper edge Na of the cup member N. Data of the captured image is transmitted to the controller Ctr via the communication units M5 and J5. Note that before capturing an image of the cup member N, the controller Ctr may control the imaging unit J2 via the communication units M5 and J5 to adjust the elevation angle and focus of the imaging unit J2.

[0058] Steps S2 and S3 may be repeated as necessary for inspection, and the cup member N may be imaged by the imaging unit J2 from different directions while changing the imaging position. For example, as illustrated in FIG. 6, the cup member N may be imaged by the imaging unit J2 from imaging positions P1 to P4 that are different by approximately 90°. In this case, four images are obtained by imaging from each of the imaging positions P1 to P4. Alternatively, although not shown, the cup member N may be imaged by the imaging unit J2 from imaging positions that are different by approximately 15°. In this case, 24 images are obtained by imaging from each imaging position. Alternatively, although not shown, the cup member N may be imaged continuously by the imaging unit J2 while rotating the test substrate J. In this case, images of the entire circumference of the cup member N (so-called panoramic images) are obtained. Note that when the cup member N is imaged from different directions while changing the imaging position, these multiple imaging positions may be spaced apart from each other at approximately equal intervals in the rotation direction of the test substrate J (i.e., they may be spaced apart by a predetermined angle), or the spacing may not be equal.

[0059] Next, the controller Ctr processes the data of the panoramic image of the cup member N to calculate the orientation of the cup member N (see step S4 in FIG. 5). Here, the orientation of the cup member N is calculated based on (A) the height of the cup member N, and (B) the inclination of the cup member N. of An example of calculation will be described.

[0060] (A) Height of cup member N First, the upper edge Na (see FIG. 7(b)) of the cup member N is identified in the panoramic image. Methods for identifying the upper edge Na of the cup member N include, for example, a method in which an operator observes the captured image and specifies the upper edge Na of the cup member N, and a method in which the controller Ctr processes the captured image using a known edge detection technique and detects the upper edge Na of the cup member N based on the processed image.

[0061] Next, the linear distance between the upper edge Na of the cup member N in the panoramic image and the surface of the base portion J1 is calculated to obtain the height of the cup member N. Specifically, the controller Ctr may calculate the number of pixels between the upper edge Na of the cup member N in the panoramic image and the surface of the base portion J1, and multiply this by the length per pixel (mm / pixel) obtained in advance to calculate the height (mm) of the upper edge Na of the cup member N. Alternatively, as illustrated in FIG. 7(b), a panoramic image in which the scale SC is captured simultaneously with the cup member N may be used, and the operator may read the height of the upper edge Na of the cup member N using the scale SC to obtain the height of the cup member N. The scale SC may be located near the cup member N and provided on the base portion J1 so as to extend upward from the surface of the base portion J1, or may be provided in front of the lens of the imaging unit J2.

[0062] (B) Inclination of cup member N First, the upper edge Na (see FIG. 8(b)) of the cup member N is identified in the panoramic image. The method for identifying the upper edge Na of the cup member N may be the same as that described for the height of the cup member N.

[0063] Here, when the cup member N is not tilted as shown in Fig. 7(a), the upper edge Na of the cup member N is represented in the panoramic image as a straight line extending horizontally. On the other hand, when the cup member N is tilted as shown in Fig. 8(a), the upper edge Na of the cup member N is represented in the panoramic image as a curved line. That is, the position showing the minimum value of the curved line is the side where the inclination of the cup member N is low, and the position showing the maximum value of the curved line is the side where the inclination of the cup member N is high.

[0064] Therefore, the controller Ctr identifies the imaging position X1 (imaging angle) that indicates the minimum value of the curved line and the imaging position X2 (imaging angle) that indicates the maximum value of the curved line (see FIG. 8(b)). In this case, it can be determined that the cup member N is tilted downward in the direction from the imaging position X2 to the imaging position X1. This allows the tilt direction of the cup member N to be calculated. The controller Ctr also finds the number of pixels of the difference ΔX between the maximum value and the minimum value of the curved line and multiplies this by the length per pixel (mm / pixel) obtained in advance, thereby calculating the amount of tilt of the cup member N.

[0065] Next, the controller Ctr determines whether the posture of the cup member N calculated in step S4 (e.g., the height of the cup member N, the inclination of the cup member N, etc.) is within a predetermined tolerance range (step S5 in FIG. 5). If the determination in step S5 shows that the posture of the cup member N is not within the tolerance range (NO in step S5 in FIG. 5), the process proceeds to step S8, where an alarm is issued to notify the user that adjustment of the cup member N is necessary. Based on the alarm, an operator may manually adjust the cup member N, or the controller Ctr may automatically adjust the cup member N by controlling each component of the liquid processing unit U (e.g., a cup control unit (not shown) configured to adjust the posture (height, inclination, etc.) of the cup member N). In this case, maintenance of the cup member N can be efficiently performed. Thereafter, the controller Ctr controls the transport arm A2 to transport the test substrate J from the liquid processing unit U and to the shelf unit 6 (see step S9 in FIG. 5).

[0066] On the other hand, if the result of the determination in step S5 is that the posture of the cup member N is within the allowable range (YES in step S5 in FIG. 5), the controller Ctr detects whether or not there is an abnormality in the cup member N (see step S6 in FIG. 5). Below, an example of detecting whether or not there is an abnormality in the cup member N based on a panoramic image of the cup member N, as exemplified in FIG. 9, will be described.

[0067] First, a panoramic image of a cup member N without an abnormality is acquired as a reference image. Next, the controller Ctr subtracts the brightness value for each pixel located at corresponding coordinates between the reference image and the panoramic image of the inspection target to calculate a corrected image. Next, the controller Ctr processes the corrected image using a known edge detection technique to calculate the size of an area where edges are enhanced. Next, the controller Ctr determines whether the size of the area is within a predetermined tolerance. If the size of the area is not within the predetermined tolerance, the controller Ctr determines that an abnormality Ab (see FIG. 9) exists in the cup member N. Note that the reference image may be obtained by averaging the brightness values ​​of all pixels in the panoramic image of the inspection target. Alternatively, the panoramic image of the inspection target may be directly processed using a known edge detection technique without using the reference image.

[0068] When the controller Ctr determines that an abnormality Ab exists in the cup member N (NO in step S7 of FIG. 5), the process proceeds to step S8, where it issues an alarm to notify the operator that an abnormality exists in the cup member N. When an alarm is issued, the operator may replace the cup member N with a new cup member N. Alternatively, when the abnormality Ab in the cup member N is an attachment attached to the cup member N, the controller Ctr may control each part of the liquid processing unit U to supply at least one of the liquids L1 to L4 to the cup member N and remove the attachment from the cup member N.

[0069] On the other hand, if the result of the determination in step S7 is that no abnormality Ab exists in the cup member N (YES in step S7 in FIG. 5), the process proceeds to step S9, where the controller Ctr controls the transport arm A2 to transport the test substrate J out of the liquid processing unit U and to transport the test substrate J to the shelf unit 6. This completes the inspection of the state of the cup member N.

[0070] Note that, after inspection of the state of the cup member N of one liquid processing unit U is completed, the inspection substrate J may be transported to another liquid processing unit U to inspect the state of the cup member N of that other liquid processing unit U, without returning the inspection substrate J to the shelf unit 6. Alternatively, the inspection substrate may be periodically transported into the liquid processing unit U every time a predetermined number of substrates W are processed in the liquid processing unit U, to inspect the state of the cup member N of the liquid processing unit U. In this case, the controller Ctr may compare data on the current state of the cup member N with data on the previous state of the cup member N, and determine whether the current state of the cup member N is within a predetermined tolerance range. If it is not within the tolerance range, the controller Ctr may issue an alarm as in step S10.

[0071] [Effect] According to the above example, with the inspection substrate J held by the rotational holding unit 40, the position of the imaging unit J2 relative to the cup member N is adjusted to a predetermined imaging position by rotating the rotational holding unit 40. Therefore, there is no obstruction between the imaging unit J2 and the cup member N, which is the imaging target, and the cup member N is imaged from an appropriate position. Therefore, it is possible to accurately obtain the state of the cup member N.

[0072] According to the above example, the cup member N is imaged from a plurality of imaging positions, so that the state of the cup member N can be acquired with higher accuracy.

[0073] According to the above example, the cup member N can be imaged from a plurality of imaging positions spaced apart at approximately equal intervals in the rotation direction of the test substrate J. In this case, the outer peripheral surface of the cup member N is imaged over approximately the entire circumference. Therefore, the state of the cup member N can be obtained with even greater accuracy.

[0074] According to the above example, the presence or absence of an abnormality in the cup member N is detected by processing the image captured by the imaging unit J2. Therefore, it is possible to detect the presence or absence of adhesions or scratches on the cup member N, and the presence or absence of deformation of the cup member N. Therefore, by adjusting (e.g., replacing or cleaning) the cup member N based on the detection results, it is possible to eliminate in advance the influence of the abnormality in the cup member N on the substrate processing.

[0075] According to the above example, the presence or absence of an abnormality in the cup member N is detected by comparing an image of the cup member N taken by the imaging unit J2 before the substrate W is treated with the treatment liquid (an image of the cup member N without an abnormality) with an image of the cup member N taken by the imaging unit J2 after the substrate W is treated with the treatment liquid. Therefore, by comparing the two images, the location of the abnormality in the cup member N becomes more prominent. This makes it possible to more accurately detect the presence or absence of an abnormality in the cup member N.

[0076] According to the above example, when an abnormality is detected in the cup member N, the liquids L1 to L4 can be supplied to the cup member N. In this case, the abnormality (e.g., deposits) in the cup member N is removed by the liquids L1 to L4. Therefore, it is possible to remove in advance the influence of the abnormality (e.g., deposits) in the cup member N on the substrate processing.

[0077] According to the above example, the captured image captured by the imaging unit J2 is subjected to image processing to detect the height or tilt of the cup member N. Therefore, it is possible to identify the posture of the cup member N based on the detection result.

[0078] According to the above example, an alarm is issued when it is determined that the height or tilt of the cup member N is outside a predetermined allowable range. Therefore, it is possible to prevent the influence of an abnormal posture of the cup member on the substrate processing in advance.

[0079] According to the above example, when the imaging unit J2 captures an image of the cup member N, the illumination unit J3 irradiates the cup member N with light. This makes it possible to capture an image of the cup member N more clearly.

[0080] According to the above example, the imaging unit J2 and the controller Ctr can be connected to each other wirelessly so that they can communicate with each other. In this case, there is no need to connect a communication cable to the testing board J, so the rotation of the testing board J by the rotation holding unit 40 is less likely to be hindered. This allows for greater freedom in the imaging position of the cup member N.

[0081] According to the above example, the inspection board J includes a battery J4 that supplies power to the imaging unit J2 and is configured to be rechargeable. This eliminates the need to connect a power cable to the inspection board J, making it less likely that the rotation of the inspection board J by the rotation holder 40 will be hindered. This allows for greater freedom in the imaging position of the cup member N.

[0082] According to the above example, the test substrate J is transported by the transport arm A2 between the liquid processing unit U and the shelf unit 6. Therefore, when the substrate is processed by the liquid processing unit U, the test substrate J can be retracted to the shelf unit 6.

[0083] [Variations] The disclosure in this specification should be considered to be illustrative in all respects and not restrictive. Various omissions, substitutions, modifications, etc. may be made to the above examples without departing from the scope and spirit of the claims.

[0084] (1) In the above example, the substrate processing system 1 is a substrate cleaning apparatus, but the substrate processing system 1 may also be a coating / developing apparatus. That is, the processing liquid supplied to the surface of the substrate W may be, for example, a coating liquid for forming a film on the surface of the substrate W, or a developing liquid for developing a resist film.

[0085] (2) The testing board J may not include the illumination unit J3. Alternatively, the testing board J may include multiple illumination units J3. In this case, as illustrated in FIG. 10, the multiple illumination units J3 may be spaced apart from one another at approximately equal intervals in the rotation direction of the testing board J.

[0086] (3) The inspection board J may include multiple imaging units J2. In this case, as illustrated in FIG. 10, the multiple imaging units J2 may be spaced apart from one another at approximately equal intervals in the rotation direction of the inspection board J. When the cup member N is imaged by multiple imaging units J2, multiple locations on the cup member N can be simultaneously imaged simply by adjusting the positions of the multiple imaging units J2 relative to the cup member N to predetermined imaging positions. Therefore, it is possible to accurately and quickly obtain the state of the cup member N.

[0087] (4) The imaging unit J2 may be disposed on the surface of the base unit J1, or may be built into the base unit J1.

[0088] (5) The spin holder 40 may be configured to hold the substrate W by suction.

[0089] (6) The controller Ctr may generate three-dimensional shape data of the cup member N by image processing a plurality of images obtained by imaging the cup member N from different directions with the imaging unit J2 while changing the imaging position. In this case, the cup member N can be observed in more detail based on the generated three-dimensional shape data. Therefore, it is possible to obtain the state of the cup member N with higher accuracy. Note that the three-dimensional shape data of the cup member N may be obtained using a non-contact 3D scanner instead of the imaging unit J2.

[0090] (7) The height or tilt of the mist guard 70 may be calculated or an abnormality in the mist guard 70 may be detected by imaging the mist guard 70 using the inspection substrate J. In this case, the mist guard 70 may be positioned in a raised position. Furthermore, if an abnormality (e.g., an attached substance) in the mist guard 70 is detected, liquids L1 to L4 may be supplied to the mist guard 70. In this case, the abnormality (e.g., an attached substance) in the mist guard 70 is removed by the liquids L1 to L4. This makes it possible to prevent the abnormality (e.g., an attached substance) in the mist guard 70 from affecting substrate processing. Note that the imaging unit J2 may image the mist guard 70 simultaneously with the inner cup body 45 and the collection cup 50, or separately from the inner cup body 45 and the collection cup 50 while changing the focus.

[0091] (8) An abnormality in the inner wall surface of the chamber 10 may be detected by imaging the inner wall surface of the chamber 10 using the inspection substrate J. In this case, the mist guard 70 may be positioned in the lowered position. When an abnormality (e.g., an attachment) in the inner wall surface of the chamber 10 is detected, the liquids L1 to L4 may be supplied to the inner wall surface of the chamber 10. In this case, the abnormality (e.g., an attachment) in the inner wall surface of the chamber 10 is removed by the liquids L1 to L4. This makes it possible to prevent the abnormality (e.g., an attachment) in the inner wall surface of the chamber 10 from affecting substrate processing. Note that the imaging unit J2 may image the inner wall surface of the chamber 10 simultaneously with the inner cup body 45 and the collection cup 50, or separately from the inner cup body 45 and the collection cup 50 while changing the focus.

[0092] [Other examples] Example 1. An example of a substrate processing apparatus includes a base portion and a test substrate including an imaging unit disposed on the base portion, a holding portion configured to hold a substrate or test substrate, a drive unit configured to rotate the holding portion, a processing liquid supply unit configured to supply a processing liquid to the substrate held in the holding portion, a cup member configured to surround the holding portion from the outside, and a control unit. The control unit is configured to perform a first process in which, while the test substrate is held in the holding portion, the control unit controls the drive unit to rotate the holding portion to adjust the position of the imaging unit relative to the cup member to a predetermined first imaging position, and, after the first process, controls the imaging unit to capture an image of an object located in a space closer to the cup member than the outer periphery of the base portion at the first imaging position. Meanwhile, in the substrate processing apparatus described in Patent Document 1, the imaging means is disposed above the processing liquid supply nozzle and the splash prevention cup. Therefore, when attempting to image the vicinity of the nozzle tip, these may function as an obstruction, blocking the area to be imaged or preventing light from reaching the area to be imaged evenly, which may result in the area not being clearly imaged. Also, it is necessary to avoid the processing liquid supply nozzle and the anti-splash cup when taking an image, and the image-taking direction is limited to an obliquely upward direction, which may limit the image-taking range. However, with the device of Example 1, while the test substrate is held in the holding part, the drive part is controlled to rotate the holding part, thereby adjusting the position of the image-taking part relative to the cup member to a predetermined first image-taking position. Therefore, there is no obstruction between the image-taking part and the cup member to be imaged, and it is possible to take an image from an appropriate position. Cup component Therefore, it is possible to obtain the state of the cup member with high accuracy.

[0093] Example 2: In the device of Example 1, the cup member may include an inner cup body provided in the holder, an outer cup body configured to surround the inner cup body from the outside, and a mist guard configured to surround the outer cup body from the outside and to be movable up and down. In this case, it becomes possible to accurately obtain the respective states of the inner cup body, the outer cup body, and the mist guard.

[0094] Example 3: In the device of Example 1 or Example 2, the control unit may be configured to execute a third process of adjusting the position of the imaging unit relative to the cup member to a second imaging position different from the first imaging position by controlling the drive unit to rotate the holding unit while the testing board is held by the holding unit after the second process, and a fourth process of controlling the imaging unit to capture an image of an imaging target located in a space closer to the cup member than the outer periphery of the base unit at the second imaging position after the third process. In this case, the cup member is imaged from multiple imaging positions. This makes it possible to obtain the state of the cup member with greater accuracy.

[0095] Example 4 In the device of Example 3, the control unit may be configured to sequentially perform the first process, the second process, the third process, and the fourth process while controlling the drive unit to rotate the holding unit.

[0096] Example 5 In the device of Example 3 or Example 4, the control unit is configured to execute a fifth process of adjusting the position of the imaging unit relative to the cup member to a third imaging position different from the first imaging position and the second imaging position by controlling the drive unit to rotate the holding unit while the testing board is held by the holding unit after the fourth process, and a sixth process of controlling the imaging unit to image an imaging target located in a space closer to the cup member than the outer periphery of the base unit at the third imaging position after the fifth process, and the first imaging position, the second imaging position, and the third imaging position may be spaced apart at approximately equal intervals in the rotation direction of the testing board. In this case, the cup member is imaged from three imaging positions spaced apart at approximately equal intervals in the rotation direction of the testing board. In other words, the outer periphery of the cup member is imaged over approximately the entire circumference. Therefore, Cup component This makes it possible to obtain the state of the object more accurately.

[0097] Example 6: In the apparatus of any of Examples 1 to 5, the control unit may be configured to execute a seventh process of detecting the presence or absence of an abnormality in the cup member by processing an image captured by the imaging unit. In this case, by adjusting (e.g., replacing or cleaning) the cup member based on the detection result, it is possible to eliminate in advance the influence of the abnormality in the cup member on the substrate processing.

[0098] Example 7: In the apparatus of Example 6, the seventh process may include detecting the presence or absence of an abnormality in the cup member by comparing an image captured by the imaging unit before the substrate is treated with the treatment liquid with an image captured by the imaging unit after the substrate is treated with the treatment liquid. In this case, the comparison of the two images makes the location of the abnormality in the cup member more prominent. Therefore, it is possible to more accurately detect the presence or absence of an abnormality in the cup member.

[0099] Example 8: The apparatus of Example 6 or Example 7 may include a cleaning liquid supply unit configured to supply a cleaning liquid, and the control unit may be configured to control the cleaning liquid supply unit to execute an eighth process of supplying a cleaning liquid to the cup member when an abnormality is detected by the seventh process. In this case, the abnormality (e.g., deposits) in the cup member is removed by the cleaning liquid. Therefore, it is possible to prevent the influence of the abnormality (e.g., deposits) in the cup member on the substrate processing.

[0100] Example 9: In any of the devices of Examples 1 to 8, the control unit may be configured to execute a ninth process of detecting the height or inclination of the cup member by image processing the image captured by the imaging unit. In this case, it is possible to identify the posture (height or inclination) of the cup member based on the detection result.

[0101] Example 10. In the apparatus of Example 9, the control unit may be configured to execute a tenth process of issuing an alarm when it is determined that the height or tilt of the cup member detected by the ninth process is outside a predetermined tolerance range. In this case, it is possible to prevent the influence of an abnormal posture of the cup member on substrate processing.

[0102] Example 11 The device of Example 9 or Example 10 further includes a cup drive unit configured to change the height of the cup member or the inclination of the cup member, and when the control unit determines that the height of the cup member or the inclination of the cup member detected in the ninth process is outside a predetermined tolerance range, the control unit controls the cup drive unit to change the height of the cup member or the inclination of the cup member so that the height of the cup member or the inclination of the cup member is within the tolerance range. The slope of In this case, when the deviation is outside the allowable range, the control unit automatically controls the attitude of the cup member, thereby making it possible to efficiently perform maintenance of the cup member.

[0103] Example 12. The apparatus of any of Examples 1 to 11 may include a processing chamber configured to accommodate the holder, the drive unit, and the cup member, and the control unit may be configured to execute a twelfth process of detecting the presence or absence of deposits on the inner wall surface of the processing chamber by image processing an image captured by the imaging unit. Here, since the inner wall surface of the processing chamber is located further outward from the cup member, when the imaging unit for the test substrate faces the cup member, the inner wall surface of the processing chamber is also included in the imaging range of the imaging unit. Therefore, the inner wall surface of the processing chamber can be imaged simultaneously with the cup member or separately from the cup member by changing the focus. In this case, by cleaning the inner wall surface of the processing chamber based on the detection results, it is possible to prevent the substrate processing from being affected by deposits on the inner wall surface of the processing chamber.

[0104] Example 13: In the device of any one of Examples 1 to 12, the testing board may include an illumination unit disposed in the base unit, and the illumination unit may be configured to irradiate light onto an object to be imaged located in a space closer to the cup member than the outer periphery of the base unit when the imaging unit images the object. In this case, the object to be imaged can be imaged more clearly.

[0105] Example 14: In any of the devices of Examples 1 to 13, the testing board may include another imaging unit arranged in a location on the base portion separate from the imaging unit. In this case, the cup member is imaged by the multiple imaging units. Therefore, by simply adjusting the positions of the multiple imaging units relative to the cup member to predetermined imaging positions, multiple locations on the cup member can be simultaneously imaged. Therefore, it is possible to accurately and quickly obtain the state of the cup member.

[0106] Example 15: In any of the devices of Examples 1 to 14, the imaging unit and the control unit may be connected to each other so that they can communicate with each other wirelessly. In this case, there are no cables around the testing board, so the rotation of the testing board by the holding unit is not hindered. This allows for greater freedom in the imaging position of the cup member.

[0107] Example 16: In any of the devices of Examples 1 to 15, the testing board may include a battery configured to supply power to the imaging unit and be rechargeable. In this case, there is no need to connect a power cable to the testing board, so that the rotation of the testing board by the holding unit is less likely to be hindered. This allows for greater freedom in the imaging position of the cup member.

[0108] Example 17. The apparatus of any one of Examples 1 to 16 may include a processing chamber configured to accommodate the holder, the drive unit, at least a part of the processing liquid supply unit, and the cup member, a storage chamber configured to accommodate a test substrate, and a transport unit configured to transport the test substrate between the processing chamber and the storage chamber. In this case, it is possible to retract the test substrate into the storage chamber during substrate processing in the processing chamber.

[0109] Example 18. An example of a substrate processing method includes a first step of holding a test substrate, which includes a base and an imaging unit arranged on the base, in a holding unit; a second step of adjusting the position of the imaging unit relative to a cup member configured to surround the holding unit from the outside to a predetermined first imaging position by rotating the holding unit after the first step; a third step of imaging an object located in a space closer to the cup member than the outer periphery of the base at the first imaging position after the second step; a fourth step of removing the test substrate from the holding unit after the third step; a fifth step of holding the substrate in the holding unit after the fourth step; and a sixth step of supplying a processing liquid to the substrate to process the substrate after the fifth step. In this case, the same effects as those of the device of Example 1 can be obtained. [Explanation of symbols]

[0110] 1...substrate processing system (substrate processing apparatus), 6...shelf unit (accommodation chamber), 10...chamber (processing chamber), 40...rotation holding section, 42...drive section, 43...support plate (holding section), 44...support pin (holding section), 45...inner cup body (cup member), 50...recovery cup (cup member, outer cup body), 60...cleaning cup (cup member), 70...mist guard (cup member), 80...upper supply section (processing liquid supply section, cleaning liquid supply section), A2...transport arm (transport section), Ax...rotation center axis, Ctr...controller (control section), J...inspection substrate, J1...base section, J2...imaging section, J3...illumination section, J4...battery, J5...communication section, U...liquid processing unit, W...substrate.

Claims

1. a testing substrate including a base portion and an imaging portion disposed on the base portion; a holding portion configured to hold a substrate or the test substrate; a drive unit configured to rotationally drive the holding unit; a processing liquid supply unit configured to supply a processing liquid to the substrate held by the holder; a cup member configured to surround the holding portion from the outside; a control unit; The control unit a first process of controlling the drive unit to rotate the holding unit while the testing board is held by the holding unit, thereby adjusting the position of the imaging unit with respect to the cup member to a predetermined first imaging position; The substrate processing apparatus is configured to, after the first process, control the imaging unit to perform a second process of imaging an object to be imaged that is located in a space closer to the cup member than the outer peripheral edge of the base unit at the first imaging position.

2. The cup member is an inner cup body provided in the holding portion; an outer cup body configured to surround the inner cup body from the outside; The device according to claim 1 , further comprising a mist guard that surrounds the outer cup body from the outside and is configured to be able to be raised and lowered.

3. The control unit a third process of adjusting a position of the imaging unit with respect to the cup member to a second imaging position different from the first imaging position by controlling the drive unit to rotate the holding unit while the testing board is held by the holding unit after the second process; 3. The device according to claim 1, wherein after the third process, the device is configured to control the imaging unit to perform a fourth process of imaging an object located in a space closer to the cup member than the outer peripheral edge of the base unit at the second imaging position.

4. The apparatus according to claim 3 , wherein the control unit is configured to sequentially perform the first process, the second process, the third process, and the fourth process while controlling the drive unit to rotate the holding unit.

5. The control unit a fifth process of adjusting a position of the imaging unit with respect to the cup member to a third imaging position different from the first imaging position and the second imaging position by controlling the drive unit to rotate the holding unit while the testing board is held by the holding unit after the fourth process; and and a sixth process of controlling the imaging unit to image an imaging target located in a space closer to the cup member than an outer circumferential edge of the base portion at the third imaging position after the fifth process, 5. The device according to claim 3, wherein the first imaging position, the second imaging position, and the third imaging position are spaced apart at substantially equal intervals in the rotation direction of the test board.

6. The device according to any one of claims 1 to 5, wherein the control unit is configured to perform a seventh process of detecting the presence or absence of an abnormality in the cup member by image processing the image captured by the imaging unit.

7. The apparatus of claim 6, wherein the seventh process includes detecting whether or not there is an abnormality in the cup member by comparing an image captured by the imaging unit before the substrate is processed with the processing liquid with an image captured by the imaging unit after the substrate is processed with the processing liquid.

8. a cleaning liquid supply configured to supply a cleaning liquid; 8. The apparatus according to claim 6, wherein the control unit is configured to control the cleaning liquid supply unit to execute an eighth process of supplying cleaning liquid to the cup member when an abnormality is detected by the seventh process.

9. The control unit is configured to perform a ninth process of detecting the height or inclination of the cup member by image processing the image captured by the imaging unit. The device described in any one of claims 1 to 8.

10. The device according to claim 9, wherein the control unit is configured to execute a tenth process of issuing an alarm when it determines that the height of the cup member or the inclination of the cup member detected by the ninth process is outside a predetermined tolerance range.

11. Further, a cup drive unit configured to change the height or the inclination of the cup member is provided, The device described in claim 9 or 10, wherein the control unit is configured to control the cup drive unit when it determines that the height or inclination of the cup member detected in the ninth process is outside a predetermined tolerance range, and to execute an eleventh process of adjusting the height or inclination of the cup member so that the height or inclination of the cup member is within the tolerance range.

12. a processing chamber configured to accommodate the holder, the drive, and the cup member; The apparatus according to any one of claims 1 to 11, wherein the control unit is configured to execute a 12th process of detecting the presence or absence of adhesions on the inner wall surface of the processing chamber by image processing the image captured by the imaging unit.

13. the testing board includes an illumination unit disposed on the base unit, The illumination unit is configured to irradiate light onto an object to be imaged, the object being positioned in a space closer to the cup member than the outer peripheral edge of the base portion, when the imaging unit images the object. The device according to any one of claims 1 to 12.

14. 14. The device according to claim 1, wherein the testing board includes another imaging unit disposed at a location on the base portion separate from the imaging unit.

15. The device according to any one of claims 1 to 14, wherein the imaging unit and the control unit are connected to each other wirelessly so as to be able to communicate with each other.

16. 16. The device according to claim 1, wherein the inspection board includes a battery configured to supply power to the imaging unit and to be rechargeable.

17. a processing chamber configured to accommodate the holder, the drive unit, at least a portion of the processing liquid supply unit, and the cup member; a receiving chamber configured to receive the test substrate; The apparatus according to any one of claims 1 to 16, further comprising: a transport section configured to transport the substrate for testing between the processing chamber and the receiving chamber.

18. a first step of holding a test board including a base portion and an imaging portion disposed on the base portion in a holding portion; a second step of adjusting a position of the imaging unit relative to a cup member configured to surround the holding unit from the outside by rotating the holding unit after the first step, to a predetermined first imaging position; a third step of capturing an image of an object located in a space closer to the cup member than an outer periphery of the base portion at the first imaging position after the second step; a fourth step of carrying out the test substrate from the holding unit after the third step; a fifth step of holding the substrate on the holder after the fourth step; a sixth step of supplying a processing liquid to the substrate to process the substrate after the fifth step.

Images