Method, device and use of the device for producing plasma activated liquids

Abstract

A method for producing a plasma activation liquid (202) is proposed, in which a first working gas (94, 112, 152, 194) is supplied to a first plasma source (72, 102, 132, 172), and the first plasma source (72, 102, 132, 172) generates plasma in the first working gas (94, 112, 152, 194), thereby providing a first reactive gas stream (90, 120, 156, 176). A further working gas (96, 114, 154, 196) is supplied to a further plasma source (74, 104, 134, 174), and the further plasma source (74, 104, 134, 174) generates plasma in the further working gas (96, 114, 154, 196), thereby providing a further reactive gas stream (92, 122, 158, 178). The plasma activation liquid (202) is produced using the first reactive gas stream and the further reactive gas stream (90, 120, 156, 176, 92, 122, 158, 178), and the composition of the first working gas (94, 112, 152, 194) is different from the composition of the further working gas (96, 114, 154, 196). An apparatus (70, 100, 130, 170) configured accordingly, and the use of such an apparatus for producing a plasma activation liquid (202) are also described.

Description

[Technical Field]

[0001] The present invention relates to a method and apparatus for producing plasma activated liquids and the use of such an apparatus. [Background technology]

[0002] It is known from the state of the art to introduce a working gas, such as air, into a plasma source to produce a plasma-activated liquid, and to introduce into the starting liquid a reactive gas resulting from the reaction of the working gas with the plasma. Plasma sources which generate a plasma in the working gas by means of a dielectrically hindered or arc-like discharge are usually used for this purpose.

[0003] This procedure has the disadvantage that the composition of the reactive gas stream, and particularly the composition of the reactive species therein, cannot be easily controlled, and in particular, unwanted and uncontrolled reactions can occur in the gas mixture exposed to the plasma.

[0004] These reactions are in part due to the high temperature gas mixture in the plasma (e.g. several tens of thousands of volts) that prevails when using arc discharges, e.g. arc discharges generated by pulsed alternating current. 3 This occurs due to temperatures on the order of K, especially in the range of 6000-8000 K. Thus, a relatively large amount of split nitrogen molecules can be found in an air stream activated by creating a plasma jet with an arc-type discharge. In a plasma created in air by a dielectrically hindered discharge, lower temperatures are reached, and therefore fewer excited particles are available to split the nitrogen. Nevertheless, plasma activation of air produces nitrogen oxides, although in lower concentrations than with an arc-type discharge.

[0005] Additionally, formation of unwanted species or decomposition of desired species may occur in the plasma activated working gas, e.g., by reaction with undesired species. Overall, it is difficult or impossible to produce plasma activated liquids having desired compositions using known methods.

[0006] Methods for providing plasma-activated liquids are known, for example, from US Pat. No. 5,629,499, in which two gas products are mixed in a mixing chamber. In addition, US Pat. No. 5,629,499 discloses two plasma sources for the parallel generation of reactive gas streams, which are used to pressurize the liquid only after they have first been mixed. [Prior art documents] [Patent documents]

[0007] [Patent Document 1] European Patent Application Publication No. 3 346 808(A1) [Patent Document 2] German Patent Application Publication No. 10 2020 119222(A1) Summary of the Invention [Means for solving the problem]

[0008] The invention is based on the object of improving previously known methods and devices.

[0009] This problem is solved by a method for producing a plasma activated liquid, in which the method includes: supplying a first working gas to a first plasma source, whereby plasma is generated in the first working gas by the first plasma source, whereby the first plasma source provides a first reactive gas flow; supplying a further working gas to a further plasma source, whereby plasma is generated in the further working gas by the further plasma source, whereby the further plasma source provides a further reactive gas flow; producing the plasma activated liquid using the first reactive gas flow and the further reactive gas flow, whereby a composition of the first working gas differs from a composition of the further working gas; and producing the plasma activated liquid by reacting a first starting liquid with the first reactive gas flow to provide a first working liquid; Further Starting solution Further It is produced by providing a further working liquid in interaction with a reactive gas flow and obtaining a plasma activated liquid by mixing the first working liquid and the further working liquid.

[0010] The above object is further achieved by an apparatus for producing a plasma activated liquid according to the present invention, the apparatus having a first plasma source and a second plasma source, in which a first activation chamber having a first liquid and a second activation chamber having a second liquid are provided, each activation chamber including an activation device, the first plasma source being fluidly connected to the first activation chamber or the activation device of the first activation chamber, the second plasma source being fluidly connected to the second activation chamber or the activation device of the second activation chamber, the first plasma source and the second plasma source being fluidly connected to generate a reactive gas flow by arc-like discharge in a working gas. The apparatus is configured such that a first working gas is supplied to a first plasma source, and in parallel a second working gas is supplied to a second plasma source, the first plasma source generates plasma in the first working gas, the resulting first reactive gas flow flows from the first plasma source to the working device and mixes with the liquid in the first activation chamber, and in parallel and simultaneously the second plasma source generates a second reactive gas flow by discharge in the second working gas, the second reactive gas flow is sent to the second activation chamber of the working device and supplied to the liquid present in the second activation chamber, thereby generating the first reactive gas flow reacted with the first reactive gas flow in the first activation chamber. working fluid is provided, and in parallel with a second reactive gas flow in a second activation chamber, working fluid and the apparatus is designed in such a way that it has a mixing vessel fluidly connected to the first activation chamber and the second activation chamber, whereby the first working liquid and the second working liquid are delivered to the mixing vessel and mixed therein to form a plasma-activated liquid. a first working gas source is provided and configured to supply a first working gas to the first plasma source; and a further working gas source is provided and configured to supply a further working gas to the further plasma source, wherein the composition of the first working gas is different from the composition of the further working gas. It is characterized by:

[0011] P Apparatus for producing plasma activation liquid Also disclosedThe apparatus includes a first plasma source configured to generate plasma in a first working gas supplied to the first plasma source so as to provide a first reactive gas flow, a further plasma source configured to generate plasma in a further working gas supplied to the further plasma source so as to provide a further reactive gas flow, an activation chamber for receiving a liquid, and an impingement device configured to impinge (German: beaufschlagen, English: impinge) the liquid present in the activation chamber with the first reactive gas flow and the second reactive gas flow.

[0012] According to the invention, the above object is also achieved by using the above described device or an embodiment thereof for producing a plasma activated liquid, in particular according to the above described method or an embodiment thereof.

[0013] The described methods, devices, and uses can prevent uncontrolled reactions in working gas or reactive gas streams, for example, at least reduce the production of nitrogen oxides. For example, reactive gas streams that are carriers of O or N, or have oxidizing or reducing properties, can be treated separately from one another so that they may come into contact with and react with one another only in the liquid to which they are applied.

[0014] Additionally, a desired reaction in the working gas can be established by using a working gas having a known composition that is adjusted before the working gas is introduced into the individual plasma source to provide corresponding characteristics to the reactive gas flow, and a suitable plasma source or plasma parameters can be selected for each individual working gas in this manner.

[0015] In particular, this allows the individual gas flows to be temperature regulated separately, for example by appropriately adjusting the respective plasma source used, which represents a particular advantage since temperature is known to affect the kinetics of chemical reactions, especially in the high-temperature plasmas used here.

[0016] A plasma-activated liquid can be understood as a liquid activated by the action of a reactive gas stream emerging from an atmospheric plasma source. In particular, the liquid can be directly exposed to an atmospheric plasma, such as an atmospheric plasma jet, i.e., a working gas emerging from the plasma source that is at least partially still in a plasma state. Alternatively, the liquid can be exposed to a working gas emerging from the plasma source after the working gas has already recombined, i.e., no longer in a plasma state. It has been found that such a recombined working gas still contains sufficient reactive species, such as ozone or nitrogen oxides, which in water form relatively long-lived reactive species, such as hydroxyl radicals, hydrogen peroxide, nitric acid, or nitrous acid.

[0017] Thus, plasma activated liquids can be produced by exposing the liquid to the working gas leaking from an atmospheric plasma source.

[0018] The apparatus can have more than two plasma sources, each of which provides a reactive gas flow by generating a plasma in a working gas, each of which has a different working gas composition.

[0019] The apparatus comprises an activation chamber for holding a volume of liquid, and a plasma source for generating a reactive gas flow by discharge in a working gas, the plasma source being connected to the activation chamber in such a way that the reactive gas flow generated by the plasma source is introduced into the activation chamber, in this way an initial liquid, for example liquid water or an aqueous solution, in the activation chamber can accumulate reactive species therein by interacting with the reactive gas flow, and in this way a plasma activated liquid is produced.

[0020] Various embodiments of the method, device and use are described below, each of which applies individually to the method, device and use, and in addition, the individual embodiments may be combined with one another.

[0021] In one embodiment, the plasma-activated liquid is produced by interacting an initial liquid with a first reactive gas flow and an additional reactive gas flow. In this manner, several reactive gas flows generated by separate plasma sources can be made to react with each other in a predictable and controllable manner within the interacting liquid. Thus, a plasma-activated liquid with specific properties can be provided.

[0022] The starting liquid can be water, an aqueous solution, a solvent, an alcohol-containing solution, or the like.

[0023] In one embodiment, the starting liquid is reacted with the first and additional reactive gas streams separately. This ensures that the individual reactive gas streams do not react with each other before being introduced into the starting liquid. In addition, it can be achieved that the reaction of the components of the individual reactive gas streams occurs only within the reacting liquid.

[0024] In a corresponding embodiment, the action device is configured to act separately on the liquid present in the activation chamber with the first reactive gas flow and the further reactive gas flow.

[0025] Preferably, the first and further reactive gas streams are at least partially introduced into the starting liquid at the same time but at different spatial locations, thereby resulting in spatially separated action of the same starting liquid. Alternatively or additionally, the first and further reactive gas streams can be introduced into the starting liquid with a time delay, thereby causing the starting liquid to be acted on separately in terms of time.

[0026] For separate action of the starting liquid with the first and further reactive gas streams, it can be provided that the action device has a first action element configured to act on the liquid present in the activation chamber with the first reactive gas stream, and that the action device has a further action element configured to act on the liquid present in the activation chamber with the further reactive gas stream. In this way, separate actions of the starting liquid can be easily designed and suitable action parameters, such as flow rates or flow speeds and time synchronization, can be set.

[0027] In a further embodiment, the first and further reactive gas streams are first mixed to form a common reactive gas stream, and then the starting liquid is subjected to this common reactive gas stream. In this manner, reaction of the components of the individual reactive gas streams can be caused in a targeted manner before being introduced into the starting liquid.

[0028] In a further embodiment, a gas mixing device is connected upstream of the activation device, the mixing device being configured to mix the first reactive gas stream and the additional reactive gas stream into a common reactive gas stream, and the activation device being configured to interact with the common reactive gas stream with a liquid present in the activation chamber. The gas mixing device can be used to set the mixing conditions, such as the mixing ratio, mixing speed, or the like, of the reactive gas streams. This allows for control of the reaction of the individual components of the first reactive gas stream and the additional reactive gas stream.

[0029] Preferably, the gas mixing device is conveniently arranged in the gas flow between the first plasma source and the working device or between the further plasma source and the working device.

[0030] In a further embodiment, the application device is configured to mix the first reactive gas stream with the further reactive gas stream and to apply the mixed reactive gas stream to the starting liquid. In this way, a separate gas mixing device can be eliminated and the overall device can be designed compactly.

[0031] In a further embodiment, the operating device has operating elements configured to operate the starting liquid present in the activation chamber with the mixture of the first and second reactive gas flows. If necessary, the operating device can have a modular design, thereby simplifying its maintenance and replacement of individual operating elements.

[0032] In a further embodiment, the first reactive gas stream and the further reactive gas stream are contacted with the starting liquid separately or as a common reactive gas stream by an operating device, the operating device comprising a disk aerator, which is an aeration element made of a porous material.

[0033] In a corresponding embodiment, the aerator comprises a disc aerator, which is an aeration element made of a porous material.

[0034] Disk aerators typically have a gas-permeable membrane, e.g., a membrane with many, especially hundreds or thousands, of small openings through which the reactive gas stream enters the liquid in the form of small bubbles with a correspondingly large surface area relative to its volume, thereby strongly interacting with the liquid. Similar strong interactions are achieved by using aeration elements made of porous materials, e.g., porous ceramics with large internal surface areas.

[0035] Suitable production units with disc aerators are known, for example, from EP 3 470 364 A1.

[0036] The plasma activated liquid may be prepared by reacting a first starting liquid with a first reactive gas flow to provide a first working liquid; Further Starting solution Further The plasma-activated liquid is prepared by reacting the reactive gas flow with the working liquid to provide a further working liquid, and by mixing the first working liquid with the further working liquid. In this manner, a plasma-activated liquid can be provided that has properties based on the composition of several working liquids.

[0037] The first and other starting liquids may be of the same type, for example water.

[0038] this thing also offers the advantage that the plasma-activated liquid can be made available with a time and / or spatial delay relative to the generation of the reactive gas flow. For this purpose, for example, the first working liquid and the further working liquid can be stored separately from each other for a certain period of time and then mixed. For example, a first working liquid having oxidizing properties and a further working liquid having reducing properties can be stored or transported separately, and then mixed and reacted with each other at the point of use to provide a plasma-activated liquid having the properties of the reactive components of the individual working liquids.

[0039] In a further embodiment, the first working gas and / or the further working gas is a predetermined industrial gas. In this manner, the composition of the working gas and its reaction can also be controlled. In addition, since industrial gases are readily available on the market, the apparatus or method in this embodiment can be easily modeled at least with respect to the supply of the working gas.

[0040] In certain embodiments, the first working gas and / or the further working gas are the result of gas separation upstream of the individual plasma sources, for example by a separation device, which then supplies the corresponding working gas to the individual plasma sources.

[0041] Industrial gases are gases that are produced and used on an industrial scale. In particular, industrial gases have a high purity, as determined by standards, which is achieved by gas treatment. Such purity can be, for example, 10 -6.0 or a maximum proportion of foreign gases on the order of 1 ppm. Industrial gases can be single element gases or gas mixtures of these pure gases. Industrial gases are typically not gases extracted from natural deposits without further processing.

[0042] In one embodiment, the first working gas and / or the further working gas comprises one or more species or gas mixtures of predetermined composition selected from the following list: O2, N2, an inert gas such as Ar, CO2, Cl2, forming gas, N2 mixed with one or more inert gases, H2 mixed with one or more inert gases.

[0043] In a further embodiment, the first reactive gas stream is generated in the first working gas by an electrical discharge. Alternatively or additionally, the further reactive gas stream is generated by an electrical discharge in a further working gas, the electrical discharge being a dielectrically hindered discharge, a high frequency arc-like discharge, a direct current arc discharge, or an electrical discharge generated by a microwave jet nozzle.

[0044] In a corresponding embodiment, the first plasma source and / or the further plasma source is configured to generate plasma by an electrical discharge in the working gas, the discharge being a dielectrically hindered discharge, a high frequency arc-like discharge, a direct current arc discharge, or a discharge generated by a microwave jet nozzle.

[0045] In this way, plasma sources already available on the market can be used.

[0046] By providing or using a plasma source configured to generate a reactive gas stream by an arc-like discharge, particularly a high frequency arc-like discharge, in a working gas, high concentrations of certain reactive species, particularly fully or partially ionized or excited atoms or molecules, can be generated within the gas stream.

[0047] In order to generate a reactive gas flow by a high-frequency arc-like discharge in a working gas, a plasma source having a conductive nozzle tube with a downstream nozzle opening from which a reactive gas flow emerges during operation is preferably used, and it has a working gas inlet on the upstream side, the working gas inlet being connected to the nozzle opening through a flow path, an internal electrode being arranged in the flow path, and a high-frequency high voltage can be applied between the internal electrode and the nozzle tube.

[0048] To operate this arc-type plasma source, a working gas is introduced into the working gas inlet, and a high-frequency high voltage is applied between the inner electrode and the nozzle tube, forming an arc-like discharge between the inner electrode and the nozzle tube. The working gas stream interacts with the arc-like discharge, converting the working gas at least partially into a plasma state, resulting in a reactive gas stream emerging from the nozzle opening of the plasma nozzle in the form of an atmospheric plasma jet. A high-frequency high voltage having a voltage strength of 1 to 100 kV, preferably 1 to 50 kV, and more preferably 10 to 50 kV, and a frequency of 1 to 300 kHz, particularly 1 to 100 kHz, preferably 10 to 100 kHz, and more preferably 10 to 50 kHz, is preferably applied between the inner electrode and the nozzle tube.

[0049] Alternatively or additionally, a plasma source configured to generate a reactive gas stream by dielectrically hindered discharge in a working gas can be provided or used. The dielectrically hindered discharge can generate very high concentrations of certain reactive species, particularly ozone, in the gas stream. By using such a reactive gas stream to produce a plasma-activated liquid, hydroxyl radicals, which have good sterilizing effects, can be formed in the liquid.

[0050] To generate a reactive gas stream by a dielectrically hindered discharge in a working gas, a plasma source is preferably used that has a conductive nozzle tube with a downstream nozzle opening through which the reactive gas stream emerges during operation and an upstream working gas inlet connected to the nozzle opening via a flow passage that preferably extends at least partially between the nozzle tube and the DBD electrode, thereby disposing a dielectric between the nozzle tube and the DBD electrode and allowing a high-frequency high voltage to be applied between the DBD electrode and the nozzle tube.

[0051] To operate this DBD plasma source, a working gas is introduced into the working gas inlet, and a high-frequency high voltage is applied between the DBD electrode and the nozzle tube. Because the dielectric prevents a direct discharge between the DBD electrode and the nozzle tube, a dielectrically hindered discharge occurs in the portion of the flow path extending between the DBD electrode and the nozzle tube. As a result, the working gas flow conducted through the flow path is excited and / or enhanced by reactive species, resulting in the emergence of a reactive gas stream from the nozzle opening. Preferably, a high-frequency high voltage having a voltage in the range of 5 to 15 kV and a frequency in the range of 7.5 to 25 kHz, particularly 13 to 14 kHz, is applied between the DBD electrode and the nozzle tube.

[0052] A DC arc discharge can be generated, for example using a plasma spray nozzle, where the discharge is not pulsed but is applied over a predetermined time window, and the temperatures in the working gas or in the immediate vicinity of the discharge are typically several thousand Kelvin.

[0053] In a further embodiment, a first working gas source is provided and configured to supply a first working gas to the first plasma source, and a further working gas source is provided and configured to supply a further working gas to the further plasma source, wherein the composition of the first working gas is different from the composition of the further working gas.

[0054] This means that not only can the parameters of the plasma source itself be individually set for each working gas, but also the composition and therefore the properties of each working gas itself can be set. For example, a first working gas and another working gas that may react with each other if premixed can be treated with plasma separately according to their respective inherent properties.

[0055] Preferably, the first plasma source is connected to the first working gas source, and the further plasma source is connected to the further working gas source, so that the first working gas source and the further working gas source are separated from each other. In this way, the compositions of the first working gas and the further working gas can be easily controlled.

[0056] In a further embodiment, the device comprises a controller configured to control operation of the device, in particular the controller may comprise a memory having commands, execution of which commands in at least one microprocessor of the controller controls the device.

[0057] Further features and advantages of the method, device and use are set out in the following description of embodiments, in which reference is made to the accompanying drawings. [Brief explanation of the drawings]

[0058] [Figure 1] FIG. 1 shows a plasma source in the form of a plasma nozzle for generating an atmospheric plasma jet by arc-like discharge. [Figure 2] FIG. 1 shows a plasma source in the form of a nozzle for generating a reactive gas flow by means of a dielectrically hindered discharge. [Figure 3] 1 is a schematic diagram illustrating a first embodiment of an apparatus for producing a plasma activated liquid. [Figure 4] FIG. 1 is a schematic diagram illustrating a second embodiment of an apparatus for producing a plasma activated liquid. [Figure 5] FIG. 10 is a schematic diagram illustrating a third embodiment of an apparatus for producing a plasma activated liquid. [Figure 6] FIG. 10 is a schematic diagram illustrating a fourth embodiment of an apparatus for producing a plasma activated liquid. DETAILED DESCRIPTION OF THE INVENTION

[0059] FIG. 1 shows a schematic cross-sectional view of a plasma source 2 in the form of a plasma nozzle for generating a reactive gas flow 26 in the form of an atmospheric plasma jet by means of an arc-like discharge.

[0060] The plasma nozzle 2 has a metal nozzle tube 4 that tapers conically towards a nozzle opening 6. At the end opposite the nozzle opening 6, the nozzle tube 4 has a swirl device 8 with an inlet 10 for a gas flow, in particular a working gas such as air or nitrogen.

[0061] The intermediate wall 12 of the swirl device 8 has a ring of circumferentially angled holes 14 through which the gas flow is swirled. Thus, a gas flow in the form of a vortex 16 flows through the downstream conical tapered section of the nozzle tube, the core of which runs along the longitudinal axis of the nozzle tube. An internal electrode 18 is centrally located on the underside of the intermediate wall 12 and projects coaxially into the nozzle tube toward the tapered section. The electrode 18 is electrically connected to the intermediate wall 12 and the rest of the swirl device 8. The swirl device 8 is electrically insulated from the nozzle tube 4 by a ceramic or quartz glass tube 20. A high-frequency high voltage, generated by a transformer 22, is applied to the electrode 18 via the swirl device 8. A gas flow 23 is supplied to the inlet 10 via a line (not shown). The nozzle tube 4 is grounded. The applied voltage generates a high-frequency discharge in the form of an arc 24 between the electrode 18 and the nozzle tube 4.

[0062] The terms "arc," "arc discharge," or "arc-like discharge" are used herein to describe the phenomenon of discharge, since discharge occurs in the form of an arc. Elsewhere, the term "arc" is also used to describe a form of discharge, as opposed to a DC discharge with an essentially constant voltage value. However, in this case, reference is made to a high-frequency discharge in the form of an arc, i.e., a high-frequency arc-like discharge.

[0063] However, the swirling flow of the working gas directs this arc into a vortex core on the axis of the nozzle tube 4, so that it only spreads towards the wall of the nozzle tube 4 in the area of ​​the nozzle opening 6. The working gas is rotating at a high flow rate in the area of ​​the vortex core, i.e., in the immediate vicinity of the arc 24, and is partially converted into a plasma state due to intimate contact with the arc, so that an atmospheric plasma jet 26 emerges from the plasma nozzle 2 through the nozzle opening 6.

[0064] FIG. 2 shows in a perspective view a schematic cross-section of a further plasma source 32 in the form of a nozzle for generating a reactive gas flow by means of a dielectrically hindered discharge.

[0065] Nozzle 32 has a metal nozzle tube 34 at the upstream end 35 of which is disposed a distribution head 36 having an inlet 37 for a gas stream 38, e.g., air, and an annular distribution channel 40. At the opposite downstream end 42 of nozzle tube 34 is disposed an outlet nozzle 44 having a nozzle opening 46 from which emerges reactive gas stream 38, enriched with reactive species, during operation.

[0066] A ceramic tube 48 extends from the distribution head 36 through the nozzle tube 34 and into the outlet nozzle 44, so that an annular discharge channel 50 extends from the distribution channel 40 between the nozzle tube 34 and the ceramic tube 48 to the outlet nozzle 44. Instead of a ceramic tube, a tube made of, for example, quartz glass is also conceivable.

[0067] A tubular high-voltage electrode 52 made of metal is placed inside the ceramic tube 48 and connected via a high-voltage cable 54 to a transformer 56 so that a high-frequency high voltage can be applied between the high-voltage electrode 52 and the grounded nozzle tube 34, which acts as a counter electrode. Instead of the tubular high-voltage electrode 52, a high-voltage electrode of a different shape, for example in the form of a rolled metal sheet, is also conceivable.

[0068] An insulating plug 58 is disposed within the ceramic tube 48, which surrounds the high voltage electrode 52 to further prevent working gas from flowing into the area of ​​the high voltage electrode 52 or out the nozzle 32 through the ceramic tube 48. Additionally, a sealing ring 60 is inserted into an annular groove 62 in the dispensing head 36, which seals the dispensing head 36 against the ceramic tube 48.

[0069] A coolant line 64 may be provided around the nozzle tube 34, and a coolant may be routed through the coolant line 64 to cool the nozzle tube 34 during operation. As shown, the coolant line 64 may run around the nozzle tube 34, for example, in a helical manner.

[0070] During operation, a gas flow 38 is introduced into the dispensing head 36 through the inlet 37 , causing the gas flow 38 to flow through the annular discharge channel 50 .

[0071] By applying a high frequency high voltage between the high voltage electrode 52 and the nozzle tube 34 using a transformer 56, a dielectrically hindered discharge occurs within the discharge channel 50 in the area of ​​the high voltage electrode 52, thereby generating reactive species, particularly ozone, in the gas stream 38 flowing therethrough.

[0072] The reactive gas stream 38 , enriched with reactive species, exits the nozzle opening 46 .

[0073] 3 shows a first embodiment of an apparatus 70 for plasma activation of a liquid. The apparatus 70 has a first plasma source 72, a second plasma source 74, and an activation chamber 76 for receiving a liquid 78, in this case water.

[0074] The first plasma source 72 is designed as a nozzle for generating a reactive gas flow by a dielectrically hindered discharge. The second plasma source 74 is designed as a plasma nozzle for generating a reactive gas flow in the form of an atmospheric plasma jet by an arc-like discharge. The first plasma source 72 and the further plasma source 74 each have gas inlets 80, 82 configured to supply working gases 94, 96 to the corresponding plasma source 72, 74.

[0075] The activation chamber 76 has an operating device 84 with a first operating element 86 and a second operating element 88, both of which are designed as disk diffusers. The first operating element 86 is fluidly connected to the first plasma source 72, so that a first reactive gas flow 90 emerging from the first plasma source 72 can enter the activation chamber 76 via the first operating element 86. Similarly, the second operating element 88 is fluidly connected to the second plasma source 74, so that a second reactive gas flow 92 emerging from the second plasma source 74 can enter the activation chamber 76 via the second operating element 88. The first operating element 86 and the second operating element 88 are designed and arranged separately from each other, so that the first reactive gas flow 90 and the second reactive gas flow 92 first come into contact within the activation chamber 76.

[0076] The apparatus shown schematically in Figure 3 is operated as follows: a first working gas flow 94 is supplied to the first plasma source 72 via a first gas inlet 80, and a second working gas flow 96 is supplied to the second plasma source 74 via a second gas inlet 82. The supplies are parallel and continuous from separate working gas sources (not shown), where the first working gas 94 is a nitrogen-containing industrial gas and the second working gas 96 is an oxygen-containing industrial gas.

[0077] The first plasma source 72 generates a dielectrically hindered discharge in a nitrogen-containing first working gas 94. As a result, the first working gas 94 becomes a first reactive gas flow 90, which is directed to flow from the first plasma source 72 to the first working element 86. There, the first reactive gas flow 90 is introduced as microscopic bubbles 98 into the water 78 absorbed by the activation chamber 76 through the porous structure of the first working element 86, which is designed as a disk aerator.

[0078] In parallel with this, the second plasma source 74 generates an arc-like discharge in a second working gas 96 containing oxygen, which is then converted into a corresponding reactive gas stream 92 and sent to the second working element 88. There, the second reactive gas stream 92 is introduced into the water 78 of the activation chamber 76 separately from the first reactive gas stream 90 emerging from the first plasma source 72.

[0079] Within activation chamber 76, first reactive gas stream 90 and second reactive gas stream 92 react with water 78 and each other to produce plasma activated water.

[0080] 4 shows a schematic diagram of a second embodiment of an apparatus 100 for producing a plasma-activated liquid. Similar to FIG. 3, the apparatus 100 includes a first plasma source 102, a second plasma source 104, and an activation chamber 106 for holding a liquid 108, in this case an alcohol-containing solvent, with an operating device 110. However, the apparatus in the embodiment of FIG. 4 is designed such that the operating device 110 is a single venting element made of a porous material that is fluidly connected to both the first plasma source 102 and the second plasma source 104. Furthermore, both the first plasma source 102 and the second plasma source 104 are configured to generate a reactive gas flow by an arc-like discharge in a working gas.

[0081] During operation, a first working gas 112 is supplied to the first plasma source 102 and a second working gas 114 is supplied to the second plasma source 104 via respective gas inlets 116, 118. The first plasma source 102 generates a first reactive gas flow 120, while the second plasma source 104 generates a second reactive gas flow 122. The first reactive gas flow 120 and the second reactive gas flow 122 are then simultaneously delivered in parallel to the activation device 108, where they are introduced into the alcohol-containing solvent 110 in the activation chamber 106.

[0082] 5 shows a schematic diagram of a third embodiment of an apparatus 130 for producing a plasma-activated liquid. Again, a first plasma source 132, a second plasma source 134, and an activation chamber 136 containing a liquid 138 are shown. The first plasma source 132 and the second plasma source 134 are both designed to generate a reactive gas flow by a dielectrically hindered discharge in a working gas and are separated from each other by having gas inlets 140, 142, respectively. Additionally, the first plasma source 132 has a first gas outlet 144 fluidly connected to a gas mixer 146. Similarly, the second plasma source 134 is provided with a second gas outlet 148 fluidly connected to the gas mixer 146.

[0083] The gas mixing device 146 is in turn fluidly connected to the working device 150 of the activation chamber 136. The gas mixing device 146 is thus located upstream in the gas flow of the working device 150. The working device 150 is designed as a disc aerator.

[0084] For plasma activation of the liquid 138 received in the activation chamber, a first plasma source 132 and a second plasma source 134 are each supplied with a working gas 152, 154, where the respective working gases 152, 154 have different compositions. The first plasma source 132 and the second plasma source 134 also generate a first reactive gas flow 156 and a second reactive gas flow 158 by generating plasma in parallel in the first working gas 152 and the second working gas 154, respectively, each of which is supplied to the gas mixer 146.

[0085] In the gas mixing device 146, the first reactive gas stream 156 and the second reactive gas stream 158 are mixed together and then sent to the application device 150 as a common reactive gas stream 160. There, the common reactive gas stream 160 contacts the liquid 138 in the activation chamber 136 and mixes with the liquid 138 to provide a plasma-activated liquid. Thus, in this method, the first reactive gas stream 156 and the further reactive gas stream 158 are first mixed to form the common reactive gas stream 160, and then the initial liquid is applied with the common reactive gas stream 160.

[0086] 6 shows a schematic diagram of a fourth embodiment of an apparatus 170 for producing a plasma-activated liquid. A first plasma source 172 and a second plasma source 174 are provided, both configured to generate reactive gas streams 176, 178 by arc-like discharge in a working gas. Additionally, a first activation chamber 180 having a first liquid 182 and a second activation chamber 184 having a second liquid 186 are provided, each activation chamber 180, 182 having an activation device 188, 190.

[0087] The first plasma source 172 is fluidly connected to the first activation chamber 180 or an operating device 188 of the first activation chamber 180. Additionally, the second plasma source 174 is fluidly connected to the second activation chamber 184 or an operating device 190 of the second activation chamber 184.

[0088] The apparatus 170 further includes a mixing vessel 192 in fluid communication with the first activation chamber 180 and the second activation chamber 184 .

[0089] To provide the plasma-activated fluid, a first working gas 194 is supplied to a first plasma source 172, and simultaneously a second working gas 196 is supplied to a second plasma source 174. The first plasma source 172 generates a plasma in the first working gas 194, and the resulting first reactive gas stream 176 flows from the first plasma source 172 to an application device 188 where it mixes with the liquid 182 in the first activation chamber 180. Simultaneously, the second plasma source 174 generates a second reactive gas stream 178 by an electrical discharge in the second working gas 196, and the second reactive gas stream 178 is sent to an application device 190 of the second activation chamber 184 and supplied to the liquid 186 present in the second activation chamber 184.

[0090] Thus, in parallel, the first reactive gas flow in the first activation chamber 180 is reacted with the first reactive gas flow. working fluid 198 is provided and reacted with a second reactive gas flow in the second activation chamber 183. working fluid 200 is provided. In a further method step, the first working liquid 198 and the second working liquid 200 are delivered to a mixing vessel 192 where they are mixed to form a plasma activated liquid 202.

[0091] It is also possible to provide each of the three liquids 182, 186, and 202 in a container, reacting only two of them with the reactive gas flow, and then mixing these two reacted liquids with a third liquid.

Claims

1. A method for producing a plasma activated liquid (202), comprising: a first working gas (94, 112, 152, 194) is supplied to a first plasma source (72, 102, 132, 172), said first plasma source (72, 102, 132, 172) generating a plasma in said first working gas (94, 112, 152, 194), thereby said first plasma source (72, 102, 132, 172) providing a first reactive gas flow (90, 120, 156, 176); a further working gas (96, 114, 154, 196) is supplied to a further plasma source (74, 104, 134, 174), said further plasma source (74, 104, 134, 174) generating a plasma in said further working gas (96, 114, 154, 196), whereby said further plasma source (74, 104, 134, 174) provides a further reactive gas flow (92, 122, 158, 178); - said first reactive gas stream and further reactive gas streams (90, 120, 156, 176, 92, 122, 158, 178) are used to produce a plasma activated liquid (202); the composition of the first working gas (94, 112, 152, 194) is different from the composition of the further working gas (96, 114, 154, 196); 1. A method comprising: the plasma activated liquid (202) is produced by reacting a first starting liquid (182) with the first reactive gas flow (176) to provide a first working liquid (198), reacting a further starting liquid (186) with the further reactive gas flow (178) to provide a further working liquid (200), and obtaining the plasma activated liquid (202) by mixing the first working liquid (198) and the further working liquid (200). A method characterized by:

2. 2. The method of claim 1, wherein the first working gas (94, 112, 152, 194) and / or the further working gas (96, 114, 154, 196) is a predetermined industrial gas.

3. - said first reactive gas flow (90, 120, 156, 176) is produced by an electrical discharge in said first working gas (94, 112, 152, 194); and / or - the further reactive gas flow (92, 122, 158, 178) is produced by an electrical discharge in the further working gas (96, 114, 154, 196), the discharge is a dielectrically hindered discharge, a high frequency arc-like discharge, a DC arc discharge or a discharge produced by a microwave jet nozzle, The method according to claim 1 or 2.

4. 2. The method of claim 1, wherein the first reactive gas stream (90, 120, 156, 176) and the further reactive gas stream (92, 122, 158, 178) are separately contacted with the starting liquid (78, 110, 138, 182, 186) by an action device (84, 108, 150, 188, 190), the action device (84, 108, 150, 188, 190) comprising a disk aerator, which is an aeration element made of a porous material.

5. An apparatus (170) for producing a plasma activated liquid, comprising: - having a first plasma source (172) and a second plasma source (174); a first activation chamber (180) containing a first liquid (182) and a second activation chamber (184) containing a second liquid (186) are provided; each activation chamber (180, 182) contains an activation device (188, 190); - said first plasma source (172) is in fluid connection with said first activation chamber (180) or said working device (188) of said first activation chamber (180); - said second plasma source (174) is in fluid connection with said second activation chamber (184) or with said working device (190) of said second activation chamber (184); the first plasma source (172) and the second plasma source (174) are configured to generate reactive gas flows (176, 178) by arc-like discharges in a working gas; 1. An apparatus comprising: - said device - a first working gas (194) is supplied to the first plasma source (172) and, in parallel, a second working gas (196) is supplied to the second plasma source (174); the first plasma source (172) generates a plasma in the first working gas (194), and the resulting first reactive gas flow (176) flows from the first plasma source (172) to the working device (188) and mixes with the liquid (182) in the first activation chamber (180); and - simultaneously and in parallel, the second plasma source (174) generates a second reactive gas flow (178) by means of an electric discharge in the second working gas (196), and the second reactive gas flow (178) is sent to the second activation chamber (184) of the working device (190) and supplied to the liquid (186) present in the second activation chamber (184); whereby a first working liquid (198) is provided in the first activation chamber (180) which is reacted with the first reactive gas flow, and in parallel a second working liquid (200) is provided in the second activation chamber (183) which is reacted with the second reactive gas flow, and The device (170) has a mixing vessel (192) in fluid communication with the first activation chamber (180) and the second activation chamber (184), such that the first working liquid (198) and the second working liquid (200) are delivered to the mixing vessel (192) and mixed therein to form a plasma-activated liquid (202). It is designed in such a way, a first working gas source is provided and configured to supply a first working gas (194) to said first plasma source (172); a further working gas source is provided and configured to supply a further working gas (196) to said further plasma source (174); the composition of said first working gas (194) is different from the composition of said further working gas (196); 17. An apparatus (170).

6. the first plasma source (172) and / or the further plasma source (174) are configured to generate a plasma by an electrical discharge in a working gas (194, 196), the discharge is a dielectrically hindered discharge, a high frequency arc-like discharge, a DC arc discharge or a discharge produced by a microwave jet nozzle 6. The device (70, 100, 130, 170) according to claim 5.

7. 6. The device (70, 100, 130, 170) according to claim 5, characterized in that the working device (188, 190) comprises a disk aerator or an aeration element made of porous material.

8. Use of the device (170) according to claim 5 for producing a plasma activated liquid, in particular according to the method according to claim 1.

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