Fully automatic photoresist coating and baking equipment for scientific research

Abstract

To improve process reproducibility and stability, scientific research efficiency, avoid waste of photoresist, and ensure safety of scientific researchers.SOLUTION: A fully automatic photoresist application baking apparatus for scientific researches, comprises: an apparatus main body; a first loading apparatus; a second loading apparatus; a manipulator apparatus; a spin coating apparatus; a baking apparatus; a pipette apparatus; a vision apparatus; and a control apparatus. The manipulator apparatus grips pieces from the first loading apparatus based on positioning recognition of a vision apparatus under a control of the control apparatus. After it is placed in a vacuum suction hole of the spin coating apparatus, the pipette apparatus sucks the photoresist from the second loading apparatus and drips it onto the small pieces. Then the spin coating apparatus performs spin coating processing on the small pieces. The manipulator apparatus grips the small pieces from the spin coating apparatus and places them on the baking apparatus. The baking apparatus performs baking, and then the manipulator apparatus returns the small pieces to the first loading apparatus.SELECTED DRAWING: Figure 2

Description

[Technical Field]

[0001] The present application relates to the field of semiconductor photoresist coating and baking technology, and in particular to a fully automatic photoresist coating and baking equipment for scientific research. [Background technology]

[0002] Photoresist coating and baking equipment is one of the important equipment in semiconductor micro-nano processing manufacturing, which is used in combination with lithography machines to realize the coating and baking of photoresist on the wafer surface.

[0003] Although there are automated photoresist coating and baking equipment in the past, they were all developed for industrial applications and cannot be applied to scientific research scenarios. In scientific research facilities such as universities, when it comes to scientific research on semiconductor photoresist coating and baking, the most commonly used wafer sizes are 1cm x 1cm and 2cm x 2cm (hereinafter referred to as "small pieces"), taking into account the flexibility and cost-saving aspects of scientific research.

[0004] In the conventional scientific research on semiconductor photoresist coating and baking, there are two methods to achieve coating and baking of photoresist on small pieces:

[0005] 1. Using a separate manual spin coater and hot plate. The specific process flow is as follows: a researcher manually uses tweezers to pick up a small piece, places it on the vacuum suction hole of the manual spin coater, manually uses a dropper to dispense photoresist onto the piece, and sets the spin coater parameters to coat the photoresist. The researcher then uses tweezers to transfer the small piece to the hot plate for baking, and removes the small piece after baking is complete. The disadvantages of this method are that the small pieces are very small, making it very difficult to manually remove them with tweezers and prone to fragmentation, resulting in sample waste. Furthermore, when placing the small piece, it is impossible to visually determine whether the small piece is properly placed on the vacuum suction hole of the photoresist coater and ensure that it is in the same position each time. This results in poor reproducibility of the photoresist coating process, which reduces the efficiency of scientific research. Furthermore, direct contact with the photoresist poses a health risk to researchers.

[0006] 2. Using conventional fully automatic photoresist coating and baking equipment. The specific process flow is as follows: Conventional fully automatic photoresist coating equipment is mainly used in semiconductor factories, and the minimum compatible wafer size is 2 inches. Therefore, researchers must first attach small pieces to 2-inch wafers with double-sided tape, then operate the equipment to coat and bake the photoresist, and then remove the small pieces from the 2-inch wafer after baking is complete. The disadvantage of this method is that it is not possible to ensure that the small pieces are attached to the 2-inch wafer in the same position each time, which results in poor reproducibility of the photoresist coating process and poor scientific research efficiency.

[0007] To sum up, the prior art lacks photoresist coating and baking equipment that can be applied to scientific research scenarios. Traditional scientific research into semiconductor coating and baking still has technical problems such as poor process reproducibility, low efficiency, sample waste, and health hazards. Solutions to these problems need to be provided. Summary of the Invention [Problem to be solved by the invention]

[0008] In view of this, the purpose of this application is to provide a fully automatic photoresist coating and baking equipment for scientific research to solve the technical problems that still exist in conventional semiconductor coating and baking scientific research, such as poor reproducibility, low efficiency, easy sample waste, and health hazards. [Means for solving the problem]

[0009] In order to achieve the above technical objectives, the present application provides a fully automatic photoresist coating and baking equipment for scientific research, the equipment including: an equipment body, a first loading device, a second loading device, a manipulator device, a spin coating device, a baking device, a pipette device, a visual device, and a control device; the first loading device is attached to the device body for loading small pieces; the second loading device is attached above the main body of the device to load a photoresist thereon; the spin coater is attached to the main body of the device in order to perform a spin coat process on the small pieces onto which the photoresist has been dropped; the baking device is attached to the device body in order to perform a baking process on the small pieces after the spin coating process; the manipulator device is attached to the equipment body and includes a manipulator body and a manipulator displacement drive device; the manipulator body is capable of grasping a small piece; the manipulator device is configured to transport the pieces between the first loading device, the spin coating device, and the baking device; the pipette device is connected to the manipulator displacement drive device, and is capable of sucking up the photoresist liquid from the second loading device and dropping it onto the small piece by driving the manipulator device; the vision device is connected to the manipulator displacement drive for locating a target object and providing feedback to the control device; The control device is electrically connected to the manipulator device, the spin coating device, the baking device, the pipetting device, and the vision device.

[0010] Further, the first loading device includes a first loading body structure; The top of the first loading body structure is provided with several first loading grooves for storing small pieces of a first type having a predetermined specification; a second loading groove is formed in the center of each of the first loading grooves for storing small pieces of a second type having predetermined specifications; A push rod is movably provided in the center of the second loading groove along the vertical direction, Each of the push rods is connected to a lifting drive unit, respectively, or both are connected to a lifting drive unit, so as to lift the pieces located in the first loading groove or the second loading groove to a preset height.

[0011] Furthermore, the first loading body structure includes a box body and a box cover detachably mounted on the box body; the first loading groove and the second loading groove are provided at the top of the box cover, further including a pre-treatment device and a fork tool; The pretreatment device is attached to the device body, The fork tool is placed on the device body, the manipulator body is also capable of gripping the fork tool; An insertion opening for inserting the fork tool is provided on the box cover, the manipulator device is further configured to grasp the fork tool and transport the box cover between the first loading device and the pre-processing device via the fork tool; The pre-treatment device is used to pre-treat the small pieces on the box cover that are transported thereto.

[0012] Furthermore, the number of the first loading devices is two.

[0013] Further, the second loading device includes a second loading body structure; A number of container fixing grooves are drilled on the second loading body structure for fixing container bottles in which photoresist is stored.

[0014] Furthermore, the container bottle is fitted with a loosenable bottle cap; The manipulator body is further configured to be able to twist the bottle cap to open and close the container bottle.

[0015] the second loading device further includes a bottle fixing device; the manipulator device is further configured to transport the container bottles between the second loading body structure and the bottle securing device; The bottle fixing device is used to clamp and fix the container bottle that has been transported, The pipetting device can suck up photoresist from the container bottle clamped to the bottle fixing device.

[0016] Furthermore, the container bottle is fitted with a loosenable bottle cap; further comprising a bottle opening device; The bottle opening device is attached to the device body and can open and close the container bottle by twisting the bottle cap.

[0017] the second loading device further includes a bottle fixing device; The bottle opening device includes a bottle opening displacement drive device and a bottle opening mechanism, The bottle opening mechanism is capable of gripping the container bottle, the bottle opening displacement drive device is connected to the bottle opening mechanism for driving the bottle opening mechanism to transport the container bottle between the second loading body structure and the bottle fixing device; The bottle fixing device is used to clamp and fix the container bottle that has been transported, The bottle opening mechanism can also twist the bottle cap to open and close the container bottle, The pipetting device can suck up photoresist from the container bottle clamped to the bottle fixing device.

[0018] Further comprising a liquid separation device, a stock solution tank, and a liquid separation carrier; The concentrate tank is attached to the device body and is provided with a twistable tank cover, The bottle opening mechanism can also open and close the concentrate tank by twisting the tank cover, the liquid separating device is connected to the bottle opening displacement driving device, and is capable of sucking up the photoresist from the concentrate tank by driving the bottle opening displacement driving device and dropping it into the container bottle in the bottle fixing device; The separation carrier is attached to the main body of the device to hold the container bottle after separation is completed.

[0019] Furthermore, the spin coater includes a spin coater body and a spin coater opening / closing cover mechanism, a spin coater mounting cavity for mounting the spin coater body is provided on the device body; The spin coat opening / closing cover mechanism is attached to the top of the spin coat mounting cavity for controlling the opening and closing of the spin coat mounting cavity.

[0020] Furthermore, the baking device includes a baking machine body and a baking opening and closing cover mechanism, The device body is provided with a baking mounting cavity for mounting the baking machine body, The baking opening and closing cover mechanism is attached to the top of the baking mounting cavity for controlling the opening and closing of the baking mounting cavity.

[0021] Furthermore, the pipetting device is a pipettor.

[0022] further comprising a cleaning device; the cleaning device is used to provide dust-free paper; The manipulator device is further configured to grip the dust-free paper and perform a pre-defined cleaning wiping action.

[0023] The cleaning device further includes a discharge mechanism, a traction mechanism, and a cutting mechanism; the discharge mechanism includes a reel and a reel drive motor connected to the reel; The reel is wound with dust-free paper, the traction mechanism is used to pull and release the dust-free paper on the reel; The cutting mechanism is installed on one side of the discharge end of the pulling mechanism to cut the released dust-free paper.

[0024] Furthermore, the traction mechanism includes a roller drive motor and two discharge rollers; The two discharge rollers are installed in a rotating manner, separated vertically, and a conveying gap is formed between them to draw and convey the dust-free paper. The roller drive motor is connected to at least one of the discharge rollers and rotates the discharge roller connected thereto.

[0025] The cleaning device further includes an alcohol spray device; The alcohol spray device is used to spray alcohol onto the dust-free paper that has been conveyed and passed through.

[0026] Further including a guide roller group, The alcohol spray device includes a spray pump and a support base; The support table is used to support the dust-free paper that has been conveyed and passed through, A spray chamber is provided within the support base, and a spray hole communicating with the spray chamber is provided on the top surface of the support base; the spray pump is in communication with the spray chamber; the guide roller group is attached between the support table and the cutting mechanism so that the dust-free paper that has been conveyed and passed through the support table adheres to the support table; The manipulator device is further configured to grasp the spin-coated strip and contact the backside of the strip with the dust-free paper on the support table.

[0027] Further including a paper holding mechanism, The paper pressing mechanism is installed on one side of the support table to press the dust-free paper on the support table onto the support table.

[0028] further comprising a paper winding mechanism; The paper winding mechanism is installed on the side of the cutting mechanism remote from the pulling mechanism for winding the released dust-free paper.

[0029] Furthermore, the device body includes a machine base and a protective cover, the protective cover covers the top of the machine base; the first loading device and the second loading device are attached to the top of the machine base and are located within the protective cover; a spin coater mounting cavity for mounting the spin coater in the protective cover is provided on the top of the machine base; a baking mounting cavity for mounting the baking device in the protective cover is provided on the top of the machine base; the manipulator device is mounted at the top within the protective cover; The control device is mounted within the machine base. [Effects of the Invention]

[0030] As can be seen from the above technical solution, the fully automatic photoresist coating and baking equipment for scientific research designed in this application has a control device that accurately controls the manipulator device to grasp the small pieces from the first loading device based on the positioning recognition of the vision device, and then controls the manipulator device to work with the pipette device to suck up photoresist from the second loading device and accurately drop it onto the suction-fixed small pieces, and then controls the spin coating device to perform a spin coating process on the small pieces with the dropped photoresist. After the spin coating process is completed, the manipulator device is controlled to grasp the small pieces from the spin coating device and place them on the baking device, and then controls the baking device to bake them. After baking is completed, the manipulator device is controlled to grasp the small pieces from the baking device and return them to the first loading device. The fully automatic photoresist coating and baking equipment for scientific research designed in this application can realize fully automatic semiconductor coating and baking scientific research work, has a high accuracy rate for clamping and leaving small pieces, reduces sample waste, and ensures good process reproducibility, reduces the work intensity of scientific researchers, greatly improves scientific research efficiency and process stability, effectively promotes the development of the semiconductor field and the popularization of scientific research work, prevents scientific researchers from coming into contact with photoresist, successfully solves the health hazards caused by contact with photoresist, and protects the safety of scientific researchers.

[0031] In order to more clearly describe the technical solutions in the embodiments of the present application or the prior art, the following briefly introduces the drawings that need to be used in the description of the embodiments or the prior art. It is obvious that the drawings in the following description are only some embodiments of the present application, and those skilled in the art can also obtain other drawings based on these drawings without exerting any creative efforts. [Brief explanation of the drawings]

[0032] [Figure 1]FIG. 1 is a perspective view of a fully automated photoresist coating and baking equipment for scientific research provided in the present application. [Figure 2] FIG. 1 is a perspective view of the fully automatic photoresist coating and baking equipment for scientific research provided in the present application, with the protective cover omitted. [Figure 3] 1 is a structural schematic diagram of the cooperation between the manipulator device and the pipette device of the fully automatic photoresist coating and baking equipment for scientific research provided in the present application; FIG. [Figure 4] FIG. 1 is a perspective view of a first loading device with several small pieces of the fully automatic photoresist coating and baking equipment for scientific research provided in the present application. [Figure 5] FIG. 1 is a perspective view of a second loading device of the fully automatic photoresist coating and baking equipment for scientific research provided in the present application. [Figure 6] 1 is a first partial structural schematic diagram of the fully automatic photoresist coating and baking equipment for scientific research provided in the present application; FIG. [Figure 7] FIG. 1 is a partially enlarged schematic view of a fully automated photoresist coating and baking equipment for scientific research provided in the present application. [Figure 8] FIG. 2 is a second partial structural schematic diagram of the fully automatic photoresist coating and baking equipment for scientific research provided in the present application. [Figure 9] 1 is a schematic diagram of the local structure of the baking device of the fully automatic photoresist coating and baking equipment for scientific research provided in this application; FIG. [Figure 10] FIG. 1 is a perspective view of a cleaning device of a fully automatic photoresist coating and baking equipment for scientific research provided in the present application. [Figure 11] 1 is a schematic diagram of the local structure of the cleaning device of the fully automatic photoresist coating and baking equipment for scientific research provided in the present application; FIG. DETAILED DESCRIPTION OF THE INVENTION

[0033] The technical solutions of the embodiments of the present application are described below clearly and completely with reference to the drawings. Obviously, the described embodiments are only some of the embodiments of the present application, but not all of them. All other embodiments obtained by those skilled in the art based on the embodiments of the present application without any creative efforts fall within the scope of protection of the embodiments of the present application.

[0034] In describing the embodiments of the present application, the orientations or positional relationships indicated by terms such as "center," "top," "bottom," "left," "right," "vertical," "horizontal," "inside," and "outside" are orientations or positional relationships shown based on the drawings, and are intended only to facilitate and simplify the description of the embodiments of the present application. They do not indicate or imply that the referenced devices or elements must have a specific orientation or be configured and operated in a specific orientation, and should not be understood as limitations on the embodiments of the present application. In addition, the terms "first," "second," and "third" are intended only for descriptive purposes and should not be understood as indicating or implying relative importance.

[0035] In the description of the embodiments of the present application, unless otherwise clearly defined or limited, the terms "attached," "connected," and "connected" should be understood in a broad sense, and may refer to, for example, a fixed connection, an exchangeable connection, an integral connection, a mechanical connection, an electrical connection, a direct connection, an indirect connection via an intermediate medium, or internal communication between two elements. Those skilled in the art may understand the specific meanings of the above terms in the embodiments of the present application according to specific circumstances.

[0036] An embodiment of the present application discloses a fully automated photoresist coating and baking equipment for scientific research.

[0037] Referring to FIGS. 1 to 4, one embodiment of a fully automatic photoresist coating and baking equipment for scientific research provided in the present application includes: The device includes an apparatus main body 100, a first loading device 200, a second loading device 300, a manipulator device 400, a spin coating device 700, a baking device 600, a pipette device 501, a visual device 502, and a control device.

[0038] The first loading device 200 is attached to the main body 100 to load the small pieces 207, which are square wafers with dimensions of 1 cm x 1 cm and 2 cm x 2 cm. The second loading device 300 is attached above the main body 100 to load the photoresist.

[0039] The spin coater 700 is attached to the device body 100 in order to perform a spin coat process on the pieces 207 onto which the photoresist has been dropped. The baking device 600 is attached to the device body 100 in order to perform a baking process on the pieces 207 after the spin coat process.

[0040] The manipulator device 400 is attached to the device body 100 and includes a manipulator body 402 and a manipulator displacement drive device 401 .

[0041] The manipulator body 402 may be an electric gripper that enables it to grip the small piece 207 .

[0042] The manipulator displacement drive device 401 is connected to the manipulator body 402 to drive the manipulator body 402 to transport the small piece 207 between the first loading device 200, the spin coating device 700, and the baking device 600. The manipulator displacement drive device 401 may be a multi-axis robot arm, for example, a six-axis robot arm, to drive the manipulator body 402 to complete operations such as grasping and placing the small piece 207.

[0043] The pipette device 501 is connected to the manipulator displacement drive device 401, and is driven by the manipulator device 400 to suck up the photoresist liquid from the second loading device 300 and drip it onto the small pieces 207. The pipette device 501 is installed on one side of the manipulator body 402 and is moved together with the manipulator body 402 by the manipulator displacement drive device 401. It sucks up a certain amount of photoresist and then drips it, thereby achieving the dripping of several small pieces 207 with one suction, which effectively improves efficiency.

[0044] The vision device 502 is connected to the manipulator displacement drive device 401 to identify the position of the target object and provide feedback to the control device. The vision device 502 is an image acquisition device such as a CCD camera, and its function is to recognize the positions of the small piece 207, the adsorption station on the spin coating device 700, the baking station on the baking device 600, etc., so that the manipulator displacement drive device 401 can accurately move the manipulator to the corresponding position to achieve accurate positioning. The design of arranging the vision device 502 on the manipulator is an existing design, such as a collaborative manipulator design, and detailed description will be omitted.

[0045] The control device is electrically connected to the manipulator device 400, the spin coating device 700, the baking device 600, the pipette device 501 and the visual device 502, and serves as a control center to perform control functions.

[0046] The control device accurately controls the manipulator device 400 to grasp the small pieces 207 from the first loading device 200 based on the positioning recognition of the vision device 502, and then accurately places the grasped small pieces 207 in the position of the vacuum suction hole of the spin coating device 700, and then controls the manipulator device 400 to work in conjunction with the pipette device 501 to suck up photoresist from the second loading device 300 and accurately drip it onto the suction-fixed small pieces 207, and then controls the spin coating device 700 to perform a spin coating process on the small pieces 207 on which the photoresist has been dripped, and after the spin coating process is completed, controls the manipulator device 400 to grasp the small pieces 207 from the spin coating device 700 and place them on the baking device 600, and then controls the baking device 600 to perform baking, and after baking is completed, controls the manipulator device 400 to grasp the small pieces 207 from the baking device 600 and return them to the first loading device 200. The fully automatic photoresist coating and baking equipment for scientific research designed in this application can realize fully automatic semiconductor coating and baking scientific research work, has a high accuracy rate for clamping and leaving the small pieces 207, reduces sample waste, and ensures good process reproducibility, reduces the work intensity of scientific researchers, greatly improves scientific research efficiency and process stability, effectively promotes the development of the semiconductor field and the popularization of scientific research work, prevents scientific researchers from coming into contact with photoresist, properly solves the health hazards caused by contact with photoresist, and protects the safety of scientific researchers.

[0047] The above is embodiment 1 of the fully automatic photoresist coating and baking equipment for scientific research according to an embodiment of the present application. The following is embodiment 2 of the fully automatic photoresist coating and baking equipment for scientific research according to an embodiment of the present application. Specifically, refer to Figures 1 to 11.

[0048] Based on the solution of the above embodiment 1, Further, as shown in FIGS. 3 and 4, the first loading device 200 includes a first loading body structure 203 .

[0049] The top of the first loading body structure 203 is provided with several first loading grooves 205 for accommodating small pieces 207 of a first type of preset specification, which may be 2 cm x 2 cm.

[0050] A second loading groove 206 is provided in the center of each first loading groove 205 for receiving small pieces 207 of a second predetermined specification, and this second predetermined specification may be 1 cm x 1 cm. This nested double groove design allows for compatibility of small pieces 207 of two specifications in one station area, making the overall structure more compact. Of course, the number of grooves can be continuously increased as needed, and those skilled in the art can modify the design without restriction according to actual needs.

[0051] A push rod 204 is movably drilled in the vertical direction at the center of the second loading groove 206, and each push rod 204 is connected to a lifting drive unit (not shown) or both are connected to a lifting drive unit so as to lift the small pieces 207 located in the first loading groove 205 or the second loading groove 206 to a predetermined height. The lifting drive unit may be a vertical displacement drive module such as an electric push rod or a telescopic cylinder, and is not limited as long as it can drive the jacking movement of the push rods 204.

[0052] The control device is connected to the lifting drive unit to realize automated control of the lift-out drive. When the researcher loads the small pieces 207 into the corresponding loading grooves and the manipulator device 400 picks them up, the lifting drive unit drives the small pieces 207 that need to be picked up first to rise to a certain height, ensuring that the manipulator body 402 can grasp the small pieces 207 without interference and improving grasping efficiency.

[0053] The first loading body structure 203 includes a box body 201 and a box cover 202 that is detachably mounted on the box body 201, and the first loading groove 205 and the second loading groove 206 are installed on the box cover 202, and sufficient mounting space can be formed between the box body 201 and the box cover 202 for mounting the push rod 204 and the lifting drive unit.

[0054] Taking advantage of the separation design of the box cover 202 and the box body 201, the present application also designs a pre-treatment device 107 and a fork tool 108.

[0055] The pretreatment device 107 is attached to the device body 100, and the pretreatment device 107 may be a HMDS (hexamethyldisilamine) pretreatment device. The specific design can be changed according to actual needs, and the description will be omitted.

[0056] The fork tool 108 is mounted on the machine body 100 and may be a structure such as a Y-tool or the tines of a forklift.

[0057] The manipulator body 402 can also hold the fork tool 108, and an insertion opening for inserting the fork tool 108 is provided on the box cover 202.

[0058] The manipulator device 400 is further configured to hold the fork tool 108 and transport the box cover 202 between the first loading device 200 and the pre-processing device 107 via the fork tool 108. The pre-processing device 107 is used to pre-process small pieces 207 on the transported box cover 202.

[0059] The pre-processing process is as follows:

[0060] The control device controls the manipulator device 400 to grasp the fork tool 108, and then uses the fork tool 108 to fork up the box cover 202 with the small pieces 207, transports the box cover 202 to the pre-processing device 107, controls the pre-processing device 107 to pre-process the small pieces 207 on the box cover 202 together, and then controls the manipulator device 400 to transport the processed small pieces 207 back to the first loading device 200, and returns the fork tool 108 to its original position.

[0061] Furthermore, as shown in FIG. 2, there are preferably two first loading devices 200, one of which is used to store pieces 207 to be processed, and the other first loading device 200 is used to store pieces 207 after processing.

[0062] Of course, in the case where the pre-treatment device 107 is provided, the first of the two first loading devices 200 may be used to store the pieces 207 for the pre-treatment process and the spin-coating process, i.e., the pieces 207 placed on the first first loading device 200 have undergone the pre-treatment and spin-coating operations. On the other hand, the second first loading device 200 may be used to store the pieces 207 for the spin-coating process, i.e., the pieces 207 placed on the second first loading device 200 have undergone only the spin-coating process, thereby realizing separation and storage.

[0063] Furthermore, as shown in FIG. 5, the second loading device 300 includes a second loading body structure 301, which may be a seat structure.

[0064] The second loading body structure 301 has a number of container fixing grooves 302 for fixing container bottles 303 storing photoresist. Here, the container fixing grooves 302 may have a stepped groove design, which allows fixing container bottles 303 of different diameters and provides better versatility.

[0065] 5, taking the design in which a loosenable bottle cap 304 is attached to the container bottle 303 as an example, the manipulator body 402 may be configured to further twist the bottle cap 304 to open or close the container bottle 303. Specifically, a rotation module is further disposed in the manipulator body 402, and after the manipulator body 402 grasps the bottle cap 304, the bottle cap 304 can be twisted by the action of the rotation module to realize the loosening or tightening operation of the bottle cap 304.

[0066] Furthermore, as shown in Figures 6 and 7, the second loading device 300 is designed to further include a bottle fixing device 305 to ensure that the container bottle 303 does not move when the bottle cap 304 is screwed on.

[0067] The manipulator device 400 is further configured to transport the container bottle 303 between the second loading body structure 301 (the manipulator displacement drive device 401 is further used to move the manipulator body 402) and the bottle fixing device 305, which is used to clamp and fix the transported container bottle 303.

[0068] The control device is connected to the bottle fixing device 305. When the bottle cap 304 needs to be loosened or screwed on, the control device controls the manipulator device 400 to grasp the container bottle 303 and place it on the bottle fixing device 305, drives the bottle fixing device 305 to clamp and fix the container bottle 303, and then controls the manipulator device 400 to complete the screwing or loosening operation of the bottle cap 304. The bottle fixing device 305 may be a general clamping and fixing device that fixes the container bottle 303 by clamping.

[0069] The pipette device 501 can suck up photoresist from a container bottle 303 that is clamped to a bottle holder 305 .

[0070] Furthermore, taking the example of a container bottle 303 having a bottle cap 304, in addition to the manipulator device 400 being designed to be able to open the bottle cap 304, as shown in Figures 1 and 5, an independent bottle opening device 801 may also be installed.

[0071] The bottle opening device 801 is attached to the device body 100 and can open and close the container bottle 303 by twisting the bottle cap 304.

[0072] Furthermore, as shown in Figures 6 and 7, taking the bottle fixing device 305 as an example, the bottle opening device 801 may be designed to include a bottle opening displacement drive device 802 and a bottle opening mechanism 803, and the control device is connected to the bottle opening device 801, and the second loading device 300 is also designed to include the bottle fixing device 305.

[0073] The bottle opening mechanism 803 can grip the container bottle 303. The bottle opening displacement driving device 802 is connected to the bottle opening mechanism 803 to drive the bottle opening mechanism 803 to transport the container bottle 303 between the second stacking body structure 301 and the bottle fixing device 305. The bottle fixing device 305 is used to clamp and fix the transported container bottle 303. The bottle opening mechanism 803 can also twist the bottle cap 304 to open or close the container bottle 303. The pipette device 501 can suck photoresist from the container bottle 303 clamped and fixed to the bottle fixing device 305.

[0074] Specifically, the control device first controls the bottle opening device 801 to grasp the container bottle 303 and place it on the bottle fixing device 305, then controls the bottle fixing device 305 to clamp and fix the container bottle 303, and then controls the bottle opening device 801 to loosen the bottle cap 304, and then controls the manipulator to move onto the container bottle 303, and controls the pipette device 501 to insert the tip of the pipette device 501 into the container bottle 303 and suck up the photoresist.

[0075] Such a method of adding an independent bottle opening device 801 to realize bottle opening can synchronize the bottle opening with the operation of the manipulator device 400, further increasing efficiency.

[0076] The bottle opening mechanism 803 may be an electric jaw, to which a rotation module is connected, and when gripping the bottle cap 304, the rotation module can be driven to complete the twisting of the bottle cap 304. The bottle opening displacement drive device 802 may be, for example, a three-axis displacement module consisting of an X-axis linear slide, a Y-axis linear slide, and a Z-axis linear slide, and is not specifically limited.

[0077] 6 and 7, the apparatus further includes a liquid separation device 804, a raw liquid tank 806, and a liquid separation carrier 805.

[0078] The concentrate tank 806 is attached to the device body 100 and is provided with a twistable tank cover 807, which can store a larger amount of photoresist than the container bottle 303, so that when a certain amount of photoresist is needed, a certain amount of liquid can be dispensed from the concentrate tank 806.

[0079] The bottle opening mechanism 803 designed as described above is configured so that the concentrate tank 806 can be opened and closed by twisting the tank cover 807, and the concentrate tank 806 body is fixed by a corresponding fixing mechanism so as to avoid affecting the opening and closing operation of the tank cover 807.

[0080] The liquid separation device 804 is connected to the bottle opening displacement drive device 802, and by driving the bottle opening displacement drive device 802, it can suck up the photoresist from the original liquid tank 806 and drop it into the container bottle 303 in the bottle fixing device 305. The function of the liquid separation device 804 is the same as that of the pipette device 501, which may be the same pipette module and is not specifically limited.

[0081] The separation carrier 805 is attached to the device body 100 for carrying the container bottle 303 after separation has been completed, and may transfer it to the second loading body structure 301 when in use.

[0082] By installing the liquid separator 804, a fixed amount of liquid can be dispensed into the container bottle 303. In this way, the entire amount of photoresist in the container bottle 303 can be sucked up each time, so that the required amount of photoresist can be sucked up accurately and quantitatively, and excessive or insufficient suction can be avoided.

[0083] 6 and 7, the spin coater 700 of the present application is designed to include a spin coater body 701 and a spin coater opening / closing cover mechanism 702. Here, the spin coater body 701 is designed as an existing manual spin coater, and a detailed description thereof will be omitted.

[0084] The present application realizes a sunken mounting of the spin coater body 701 by providing a spin coat mounting cavity for mounting the spin coater body in the equipment body 100, which effectively reduces the height of the entire equipment and makes the structure more compact.

[0085] Meanwhile, the spin coater opening / closing cover mechanism 702 is attached to the top of the spin coater mounting cavity to control the opening and closing of the spin coater mounting cavity, thus preventing the photoresist from scattering during the spin coater process and reducing the difficulty of subsequent tidying and maintenance.

[0086] The spin coater opening and closing cover mechanism 702 may include a cover plate and a push-pull driver for pushing and moving the cover plate, the specifics of which refer to the electric sliding door design and are not described here.

[0087] 6 to 8, the baking device 600 includes a baking machine body 601 and a baking open / close cover mechanism 602. Here, the baking machine body 601 is of an existing hot plate design, and therefore, the description thereof will be omitted.

[0088] The equipment body 100 is provided with a baking mounting cavity for mounting the baking machine body 601, which in turn realizes a sunken mounting of the baking machine body 601, effectively reducing the height of the entire equipment and making the structure more compact.

[0089] The baking opening and closing cover mechanism 602 is mounted on the top of the baking mounting cavity to control the opening and closing of the baking mounting cavity, thus reducing heat loss during the baking process and improving baking efficiency.

[0090] After the small pieces 207 are clamped on the hot plate of the baking machine body 601, the hot plate is started according to the set baking temperature and time, and after the baking time is reached, the small piece removal operation can be quickly completed.

[0091] As shown in FIG. 9, in order to facilitate placing and removing the small pieces 207 on the hot plate, the positions on the hot plate for placing the small pieces 207 are provided with a plurality of ejection pins 603 that can eject the small pieces 207, and the ejection pins 603 are driven by corresponding jacking drive mechanisms to realize jacking control.

[0092] Furthermore, both the pipette device 501 and the liquid separation device 804 preferably use existing high-precision pipetters, more specifically, pipetters with automatic tip exchange functions may be used, so that when different photoresists are dispensed, the corresponding tips can be exchanged to avoid mixing of different photoresists. Specifically, the device body 100 is provided with two tip exchange boxes 109, one for the pipette device 501 and the other for the liquid separation device 804.

[0093] Furthermore, a cleaning device 900 is also designed in this application, as shown in FIG. 2 and FIG.

[0094] The cleaning device 900 is used to provide dust-free paper 902 .

[0095] The manipulator device 400 is further configured to grasp the dust-free paper 902 and perform a preset cleaning wiping action, for example, grasping the dust-free paper 902 and simulating a human hand to wipe the lining of the spin coating device 700 or wipe the surface of the heating part of the baking device 600.

[0096] Furthermore, as shown in FIG. 10, the cleaning device 900 specifically includes an ejection mechanism 908 , a traction mechanism 904 , and a cutting mechanism 905 .

[0097] The discharge mechanism 908 includes a reel 901 and a reel drive motor 907 connected to the reel 901 .

[0098] Dust-free paper 902 is wound around reel 901, and pulling mechanism 904 is used to pull and release the dust-free paper 902 on reel 901.

[0099] The cutting mechanism 905 is installed on one side of the discharge end of the pulling mechanism 904 to cut the released dust-free paper 902. The cutting mechanism 905 has an electric scissors structure design, and can be driven to cut the dust-free paper 902 every time a set length of the dust-free paper 902 is pulled out, and the manipulator device 400 grasps the cut dust-free paper 902 for use.

[0100] Furthermore, as shown in FIG. 10, the traction mechanism 904 includes a roller drive motor 909 and two discharge rollers 903; The two discharge rollers 903 are installed in a rotating manner and are separated vertically, forming a gap between them to pull and transport the dust-free paper 902. A roller drive motor 909 is connected to at least one of the discharge rollers 903 to rotate the connected discharge roller 903 and pull and release the dust-free paper 902.

[0101] Furthermore, as shown in FIG. 10, the cleaning device 900 further includes an alcohol spray device (not shown).

[0102] The alcohol spray device is used to spray alcohol onto the dust-free paper 902 that has been conveyed and passed through, and spraying alcohol onto the dust-free paper 902 can improve the cleaning effect of the dust-free paper 902. The alcohol spray device may include a pump, an alcohol bottle, and a nozzle, and the pump is connected to the alcohol bottle and the nozzle respectively via connecting pipes to achieve the spraying of alcohol.

[0103] In addition, during use, the jaw claw arms of the manipulator body 402 may also become contaminated with photoresist, so the jaw side walls of the manipulator body 402 can be lightly attached to a piece of dust-free paper 902 sprayed with alcohol, and the moving dust-free paper 902 can be used to wipe away the contaminated photoresist, thereby cleaning the jaws of the manipulator body 402.

[0104] Furthermore, the manipulator device 400 can grasp the small piece 207 after the photoresist has been applied, lightly attach the back surface of the small piece 207 to a portion of the dust-free paper 902 sprayed with alcohol, and use the moving dust-free paper 902 to wipe off any photoresist residue or the like on the back surface of the small piece 207.

[0105] Furthermore, as shown in FIGS. 10 and 11, a guide roller group 906 is further included.

[0106] The alcohol spray device may be designed to include a spray pump (not shown) and a support base 911 .

[0107] The support stand 911 is used to support the dust-free paper 902 that has been transported through it, and a spray chamber is provided within the support stand 911. A spray hole 913 that communicates with the spray chamber is provided on the top surface of the support stand 911. A spray pump is connected to the spray chamber, and the spray pump pumps the alcohol solution in the alcohol bottle into the spray chamber and sprays it out through the spray hole. That is, the support stand 911 is used as a spray head, which not only performs the spray function but also supports the dust-free paper 902.

[0108] The guide roller group 906 is attached between the support table 911 and the cutting mechanism 905 so that the dust-free paper 902 that has been conveyed and passed through the support table 911 sticks to the support table 911 .

[0109] The manipulator device 400 is further configured to grasp the spin-coated small piece 207 and bring the back surface of the small piece 207 into contact with the dust-free paper 902 on the support table, and the support table 911 provides a certain support function, allowing the small piece 207 to better adhere and rub against the dust-free paper 902, thereby cleaning the back surface. When the support table 911 is present, the small piece 207 can be grasped and the dust-free paper 902 on the support table 911 can be slid back and forth to complete the cleaning.

[0110] Furthermore, to prevent the dust-free paper 902 from being displaced due to repeated contact of the small pieces 207 with the dust-free paper 902, a paper pressing mechanism 912 may be added to the design.

[0111] The paper pressing mechanism 912 is installed on one side of the support table 911 to press the dust-free paper 902 on the support table 911 onto the support table 911. The paper pressing mechanism 912 may include a telescopic cylinder and a presser bar, and the telescopic cylinder moves the presser bar to press the paper.

[0112] Furthermore, as shown in FIG. 10, it further includes a paper winding mechanism 910 .

[0113] The paper winding mechanism 910 is installed on the side of the cutting mechanism 905 away from the traction mechanism 904 to wind the released dust-free paper 902. The paper winding mechanism 910 may include a paper winding drive motor and a winding fork, and the paper winding drive motor rotates the winding fork to complete winding of the dust-free paper 902.

[0114] The single layer of dust-free paper 902 is used for wiping cleaning work, and the cleaning effect it achieves may not be very good. Therefore, in order to improve the cleaning effect, the dust-free paper 902 released by the paper winding mechanism 910 is wound up to the required number of layers / thickness, and then cut, and the manipulator device 400 grasps the wound dust-free paper 902 to perform the cleaning work.

[0115] Furthermore, as shown in FIG. 1, the device body 100 includes a machine base 101 and a protective cover 102, and the protective cover 102 covers the top of the machine base 101, forming an enclosed working space between the machine base 101 and the protective cover 102.

[0116] The first loading device 200 and the second loading device 300 are mounted on the top of the machine base 101 and are located within the protective cover 102, the top of the machine base 101 is provided with a spin coating mounting cavity for mounting the spin coating device 700 within the protective cover 102, the top of the machine base 101 is provided with a baking mounting cavity for mounting the baking device 600 within the protective cover 102, the manipulator device 400 is mounted on top within the protective cover 102, and the control device is mounted within the machine base 101.

[0117] The protective cover 102 may be fitted with an operation panel 103 that can be opened by a corresponding operation door and communicated with a control device, and may also be fitted with a buzzer warning light 104 that can issue an alarm.

[0118] Furthermore, the machine base 101 is further provided with a first waste collection port 106 and a second waste collection port 105, where the first waste collection port 106 may be used to collect waste chips, and the second waste collection port 105 may be used to collect discarded dust-free paper 902.

[0119] The machine base 101 is further provided with a stand (not shown) on which the bottle cap 304 and the tank cover 807 are placed.

[0120] All of the device structures related to electronic control in this application can be connected to a control device and controlled by the control device to achieve automation.

[0121] According to the cleaning device 900 designed as above, the following three types of cleaning execution operations can be realized.

[0122] 1. To achieve cleaning of the backside of the small piece 207.

[0123] 2. To provide cleaning of the jaws of the manipulator body 402.

[0124] 3. The manipulator body 402 grasps the dust-free paper 902 to perform wiping cleaning on several parts of the device.

[0125] The fully automatic photoresist coating and baking equipment for scientific research designed in this application has the following advantages:

[0126] 1. The manipulator device 400, which is compatible with small pieces 207 of sizes 1 cm x 1 cm and 2 cm x 2 cm, is combined with a vision device 502 to recognize the position, size, etc. of the small pieces 207, thereby enabling accurate grasping of the small pieces 207, avoiding damage to the small pieces 207, reducing waste rates, and saving costs.

[0127] 2. The vision device 502 recognizes the position of the suction holes on the spin coating device 700, compares it with the current position of the manipulator body 402, calculates data for fine-tuning the position of the manipulator body 402, and performs fine-tuning control to ensure that each small piece 207 can be placed accurately and aligned in the center of the suction hole, thereby ensuring process stability.

[0128] 3. After the pieces are placed on the spin coater 700, a precision pipette device 501 is used to dispense the photoresist, replacing the conventional photoresist head dropper. In contrast, the pipette device 501 can precisely control the amount of photoresist dispensed onto each piece 207, significantly reducing waste and contaminating other surrounding equipment modules with excess photoresist when discarding the photoresist. It also prevents scientists from directly contacting the photoresist, ensuring the health of personnel. Furthermore, when applying photoresist to a batch of pieces 207, the total amount of photoresist required is determined by first combining the number of pieces 207 and the amount of photoresist required for each piece 207, and then the pipette device 501 is used to suck up enough photoresist at once. After each piece 207 is placed, the photoresist can be dispensed into the center of the piece 207 using the image recognition of the vision device 502. In this way, the operation of absorbing the photoresist before applying it to each small piece 207 is avoided, which effectively improves the overall flow efficiency and ensures the accurate photoresist dropping position on each piece, improving the reproducibility of the process.

[0129] 4. The cleaning device 900 can be added to clean the backside of the small pieces 207 after photoresist coating, preventing excess photoresist from adhering to and contaminating the hot plate of the baking device 600. It can also clean the jaws of the manipulator body 402 and the lining of the spin-coating device 700. Cleaning the lining of the spin-coating device 700 prevents cross-contamination when multiple spin-coating processes are performed using different types of photoresist and ensures a clean environment inside the spin-coating device 700. This cleaning device 900 uses dust-free paper 902 that is towed and transported at a constant speed, and an alcohol spray device is installed to transfer the alcohol-soaked dust-free paper 902. The manipulator device 400 grasps the small pieces 207 that need to be cleaned and places them on the surface of the dust-free paper 902 conveyor belt, removing any remaining photoresist from the bottom of the small pieces 207. The self-cleaning of the jaws of the manipulator body 402 is similar to the cleaning operation of the small piece 207, and the cleaning is completed by wiping the side walls inside the jaws at a constant speed with the dust-free paper 902. To clean the lining of the spin coater 700, the dust-free paper 902 must first be cut off by the cutting mechanism 905, then pinched by the manipulator device 400, and the lining surface must be wiped off using a simulated human hand.

[0130] Overall, the equipment designed in this application can realize a fully automated small-piece 207 photoresist coating and baking process, allowing users to dynamically adjust different photoresist coating parameters, such as rotation speed, acceleration, and time, and baking parameters, such as baking temperature and time, according to different process flows, thereby improving the reproducibility and stability of the process, improving scientific research efficiency, avoiding photoresist waste, and ensuring the safety of scientific researchers.

[0131] The instrument workflow is as follows:

[0132] 1. After loading the small pieces 207 into the first loading device 200, the scientific researcher closes the operation door of the main body 100 of the instrument and starts up the instrument.

[0133] 2. The control device controls the operation of the manipulator device 400, during which the vision device 502 acquires image information from the first loading device 200 and recognizes the position where the small pieces 207 are placed and the size of the small pieces 207. After determining the position and size of the small pieces 207, the control device controls the manipulator device 400 so that the manipulator body 402 grasps the small pieces 207, and before grasping, the small pieces 207 are pushed up by the push-up column to a certain height. If pre-processing is required, before executing flow 2, the control device controls the manipulator device 400 to first grasp the fork tool 108 and transport the box cover 202 with the small pieces 207 placed on the first loading device 200 to the pre-processing device 107 for pre-processing.

[0134] 3. The manipulator body 402 is controlled to move above the vacuum suction hole of the spin coating device 700, during which the vision device 502 recognizes the position of the vacuum suction hole, and after determining the position of the vacuum suction hole, the manipulator body 402 is controlled to place the small piece 207 in the center of the vacuum suction hole.

[0135] 4. The pipette device 501 is controlled to move to the tip box 109 and add a 1 ml tip, then the pipette device 501 is controlled to move above the container bottle 303 on the bottle fixing device 305, and during or before the movement, the bottle opening device 801 is controlled to open the bottle cap 304 of the container bottle 303, and after the pipette device 501 moves to a predetermined position, the amount of photoresist in the container bottle 303 is sucked up (of course, before step 1, the bottle opening device 801 may be controlled to transport and fix the container bottle 303 to the bottle fixing device 305, and the bottle cap 304 may be opened and the pipette device 501 may wait for the suction), and the amount of photoresist sucked up is determined by the number and size of the small pieces 207 to be applied obtained by image recognition, and the amount of photoresist per piece that the user has already set in the system. After sucking up the photoresist, the pipette device 501 moves above the small piece 207 on the spin coater 700 and fine-tunes its position in accordance with the visual device 502 to ensure that the tip of the pipette device 501 is at the center of the small piece 207. After adjusting to the predetermined position, the pipette device 501 descends to the dispensing position and dispenses the photoresist. After dispensing is complete, the pipette device 501 moves upward and the spin coater opening and closing cover mechanism 702 of the spin coater 700 automatically closes.

[0136] 5. Control the operation of the spin coater 700 to complete the photoresist coating of the small pieces 207 according to the preset rotation speed and time.

[0137] 6. After the photoresist coating is completed, the spin coating opening / closing cover mechanism 702 opens, grasps the small piece 207, and controls the manipulator body 402 to transfer it to the cleaning device 900 and clean the back surface of the small piece 207, and then transfers it to the baking device 600. After the transfer is completed, the baking opening / closing cover mechanism 602 closes and controls the operation of the baking device 600 to achieve baking according to the set baking temperature and time parameters.

[0138] 7. During the baking period, the manipulator body 402 is controlled to move to the cleaning device 900 to clean the inner walls of the jaws, and after the cleaning is completed, the manipulator body 402 is moved above the baking device 600 and waits for the completion of baking. After the baking is completed, the baking open / close cover mechanism 602 opens, and then the manipulator body 402 is controlled to grasp the small piece 207 and transfer it back to the first loading device 200.

[0139] 8. Repeat steps 1 to 7 until all the pieces 207 to be processed in the first loading device 200 have completed the photoresist coating and baking operation, and finally control the manipulator body 402 to grasp the cut dust-free paper 902, simulating the action of a human hand to wipe and clean the lining of the spin coating device 700.

[0140] During use, scientists only need to place the container bottle 303 and the pieces 207 in the corresponding positions, and then set important process parameters on the operation panel 103, such as the amount of photoresist used for each piece 207, the rotation speed and time for photoresist coating, and the baking temperature / time, so that the photoresist coating and baking operation for the pieces 207 can be completed automatically, ensuring the reproducibility and stability of the process, improving the efficiency of scientific research, ensuring the safety of personnel, and reducing the waste of expensive photoresist.

[0141] The above provides a detailed introduction to the fully automated photoresist coating and baking equipment for scientific research according to the present application. However, those skilled in the art may find that there are changes in the form for carrying out the invention and the scope of application based on the concept of the embodiments of the present application. In summary, the contents of this specification should not be construed as limitations on the present application. [Explanation of symbols]

[0142] 100, machine body, 101, machine base, 102, protective cover, 103, operation panel, 104, buzzer warning light, 105, second waste collection port, 106, first waste collection port, 107, pre-treatment device, 108, fork tool, 109, tip box 200, first loading device, 201, box body, 202, box cover, 203, first loading body structure, 204, push rod, 205, first loading groove, 206, second loading groove, 207, small piece 300, second loading device, 301, second loading body structure, 302, container fixing groove, 303, container bottle, 304, bottle cap, 305, bottle fixing device 400, manipulator device, 401, manipulator displacement drive device, 402, manipulator body 501, pipette device, 502, visual device 600, baking device, 601, baking machine body, 602, baking opening and closing cover mechanism, 603, ejector pin 700, spin coater, 701, spin coater body, 702, spin coater opening / closing cover mechanism 801, bottle opening device, 802, bottle opening displacement drive device, 803, bottle opening mechanism, 804, liquid separation device, 805, liquid separation carrier, 806, concentrate tank, 807, tank cover 900, cleaning device, 901, reel, 902, dust-free paper, 903, discharge roller, 904, traction mechanism, 905, cutting mechanism, 906, guide roller group, 907, reel drive motor, 908, discharge mechanism, 909, roller drive motor, 910, paper winding mechanism, 911, support base, 912, paper pressing mechanism, 913, spray hole

Claims

1. A fully automatic photoresist coating and baking equipment for scientific research, comprising an equipment body (100), a first loading device (200), a second loading device (300), a manipulator device (400), a spin coating device (700), a baking device (600), a pipette device (501), a visual device (502), and a control device; The first loading device (200) is attached to the device body (100) for loading small pieces (207), The second loading device (300) is attached above the device body (100) to load a photoresist thereon; The spin coater (700) is attached to the main body (100) of the device in order to perform a spin coat process on the small piece (207) onto which the photoresist is dropped. The baking device (600) is attached to the device body (100) to perform a baking process on the small piece (207) after the spin coating process. The manipulator device (400) is attached to the equipment body (100) and includes a manipulator body (402) and a manipulator displacement drive device (401); The manipulator body (402) is capable of grasping a small piece (207), the manipulator device (400) is configured to transport the pieces (207) between the first loading device (200), the spin coating device (700) and the baking device (600); The pipette device (501) is connected to the manipulator displacement drive device (401), and can suck up the photoresist liquid from the second loading device (300) and drop it onto the small piece (207) by driving the manipulator device (400); the vision device (502) is connected to the manipulator displacement drive device (401) for identifying the position of a target object and providing feedback to the control device; the control device is electrically connected to the manipulator device (400), the spin-coating device (700), the baking device (600), the pipette device (501) and the vision device (502); Further comprising a cleaning device (900), The cleaning device (900) is used to provide dust-free paper (902), The manipulator device (400) is further configured to grip a dust-free paper (902) and perform a preset cleaning wiping action; The cleaning device (900) includes an ejection mechanism (908), a traction mechanism (904), and a cutting mechanism (905); The discharge mechanism (908) includes a reel (901) and a reel drive motor (907) connected to the reel (901); The reel (901) is wound with dust-free paper (902), The pulling mechanism (904) is used to pull and release the dust-free paper (902) on the reel (901); The cutting mechanism (905) is installed on one side of the discharge end of the pulling mechanism (904) to cut the released dust-free paper (902); The traction mechanism (904) includes a roller drive motor (909) and two discharge rollers (903); The two discharge rollers (903) are installed in a rotating manner, separated vertically, and a conveying gap is formed between them to pull and convey the dust-free paper (902). The roller drive motor (909) is connected to at least one of the discharge rollers (903) and rotates the discharge roller (903) connected thereto; The cleaning device (900) further comprises an alcohol spray device; The alcohol spray device is used to spray alcohol onto the dust-free paper (902) that has been conveyed and passed through; Further comprising a group of guide rollers (906); The alcohol spray device includes a spray pump and a support base (911); The support table (911) is used to support the dust-free paper (902) that has been conveyed and passed through. A spray chamber is provided in the support base (911), and a spray hole (913) communicating with the spray chamber is provided on the top surface of the support base (911); the spray pump is in communication with the spray chamber; The guide roller group (906) is attached between the support table (911) and the cutting mechanism (905) so that the dust-free paper (902) conveyed and passing through the support table (911) adheres to the support table (911); The manipulator device (400) is further configured to grasp the spin-coated piece (207) and bring the backside of the piece (207) into contact with the dust-free paper (902) on the support table (911); Further comprising a paper holding mechanism (912); The paper pressing mechanism (912) is installed on one side of the support table (911) to press the dust-free paper (902) on the support table (911) onto the support table (911).

2. The first loading device (200) includes a first loading body structure (203), The top of the first loading body structure (203) is provided with several first loading grooves (205) for storing small pieces (207) of a first type and a predetermined specification; A second loading groove (206) is formed in the center of each of the first loading grooves (205) for storing small pieces (207) of a second type having predetermined specifications; A push rod (204) is movably provided in the center of the second loading groove (206) along the vertical direction.

2. The fully automatic photoresist coating and baking equipment for scientific research according to claim 1, wherein each of the push rods (204) is connected to a lifting drive unit, respectively, or both of them are connected to a lifting drive unit, so as to lift the small pieces (207) located in the first loading groove (205) or the second loading groove (206) to a preset height.

3. The first loading body structure (203) includes a box body (201) and a box cover (202) detachably mounted on the box body (201); The first loading groove (205) and the second loading groove (206) are provided on the top of the box cover (202); further comprising a pre-treatment device (107) and a fork tool (108); The pretreatment device (107) is attached to the device body (100), The fork tool (108) is placed on the device body (100), The manipulator body (402) is also capable of gripping the fork tool (108); An insertion opening for inserting the fork tool (108) is provided on the box cover (202), the manipulator device (400) is further configured to grasp the fork tool (108) and transport the box cover (202) between the first loading device (200) and the pre-treatment device (107) via the fork tool (108); 3. The fully automatic photoresist coating and baking equipment for scientific research according to claim 2, wherein the pre-treatment device (107) is used to pre-treat small pieces (207) on the box cover (202) that have been transported.

4. 4. The fully automatic photoresist coating and baking equipment for scientific research according to claim 3, wherein the first loading device (200) is two.

5. The second loading device (300) includes a second loading body structure (301), 2. The fully automatic photoresist coating and baking equipment for scientific research according to claim 1, wherein the second loading body structure (301) is provided with several container fixing grooves (302) for fixing container bottles (303) in which photoresist is stored.

6. The container bottle (303) is fitted with a loosenable bottle cap (304); 6. The fully automatic photoresist coating and baking equipment for scientific research according to claim 5, wherein the manipulator body (402) is further configured to twist the bottle cap (304) to open and close the container bottle (303).

7. The second loading device (300) further includes a bottle fixing device (305); the manipulator device (400) is further configured to transport the container bottles (303) between the second loading body structure (301) and the bottle fixing device (305); The bottle fixing device (305) is used to clamp and fix the transported container bottle (303), 7. The fully automatic photoresist coating and baking equipment for scientific research according to claim 6, wherein the pipette device (501) is capable of sucking photoresist from the container bottle (303) clamped and fixed to the bottle fixing device (305).

8. The container bottle (303) is fitted with a loosenable bottle cap (304); Further comprising a bottle opening device (801); 6. The fully automatic photoresist coating and baking equipment for scientific research according to claim 5, wherein the bottle opening device (801) is attached to the equipment body (100) and can open and close the container bottle (303) by twisting the bottle cap (304).

9. The second loading device (300) further includes a bottle fixing device (305); The bottle opening device (801) includes a bottle opening displacement drive device (802) and a bottle opening mechanism (803), The bottle opening mechanism (803) is capable of gripping the container bottle (303); the bottle opening displacement drive device (802) is connected to the bottle opening mechanism (803) for driving the bottle opening mechanism (803) to transport the container bottle (303) between the second loading body structure (301) and the bottle fixing device (305); The bottle fixing device (305) is used to clamp and fix the transported container bottle (303), The bottle opening mechanism (803) can also twist the bottle cap (304) to open or close the container bottle (303); 9. The fully automatic photoresist coating and baking equipment for scientific research according to claim 8, wherein the pipette device (501) is capable of sucking photoresist from the container bottle (303) clamped and fixed to the bottle fixing device (305).

10. Further comprising a separation device (804), a stock solution tank (806), and a separation carrier (805); The concentrate tank (806) is attached to the device body (100) and is provided with a twistable tank cover (807); The bottle opening mechanism (803) can also open and close the concentrate tank (806) by twisting the tank cover (807), The liquid separating device (804) is connected to the bottle opening displacement driving device (802), and by driving the bottle opening displacement driving device (802), it can suck up the photoresist from the concentrate tank (806) and drop it into the container bottle (303) in the bottle fixing device (305); 10. The fully automatic photoresist coating and baking equipment for scientific research according to claim 9, wherein the liquid carrier (805) is attached to the main body (100) of the equipment to carry the container bottle (303) after liquid separation is completed.

11. The spin coater (700) includes a spin coater body (701) and a spin coater opening / closing cover mechanism (702), A spin coater mounting cavity for mounting the spin coater body (701) is provided on the device body (100); 2. The fully automatic photoresist coating and baking equipment for scientific research according to claim 1, wherein the spin coater opening and closing cover mechanism (702) is attached to the top of the spin coater mounting cavity to control the opening and closing of the spin coater mounting cavity.

12. The baking device (600) includes a baking machine body (601) and a baking opening / closing cover mechanism (602), The equipment body (100) is provided with a baking mounting cavity for mounting the baking machine body (601); 2. The fully automatic photoresist coating and baking equipment for scientific research according to claim 1, wherein the baking opening and closing cover mechanism (602) is attached to the top of the baking mounting cavity to control the opening and closing of the baking mounting cavity.

13. The fully automatic photoresist coating and baking equipment for scientific research according to claim 1, characterized in that the pipetting device (501) is a pipetter.

14. further comprising a paper winding mechanism (910); 2. The fully automatic photoresist coating and baking equipment for scientific research according to claim 1, wherein the paper winding mechanism (910) is installed on a side of the cutting mechanism (905) away from the pulling mechanism (904) to wind up the released dust-free paper (902).

15. The device body (100) includes a machine base (101) and a protective cover (102); The protective cover (102) covers the top of the machine base (101), The first loading device (200) and the second loading device (300) are attached to the top of the machine base (101) and are located within the protective cover (102); A spin coat mounting cavity is provided at the top of the machine base (101) for mounting the spin coater (700) in the protective cover (102); A baking mounting cavity is provided at the top of the machine base (101) for mounting the baking device (600) in the protective cover (102); The manipulator device (400) is mounted on top within the protective cover (102), 2. The fully automatic photoresist coating and baking equipment for scientific research according to claim 1, wherein the control device is installed in the machine base (101).

Images