Substrate processing apparatus management system, substrate processing apparatus management method, and substrate processing apparatus management program

Abstract

To enable an administrator to easily and properly grasp priority levels of investigation in a short time when there is a plurality of requests to investigate a plurality of substrate processing devices.SOLUTION: A substrate processing device management system 2 gathers a plurality of pieces of processing information representing operations or states related to processing on substrates from each of a plurality of substrate processing devices 1. For each substrate processing device 1, a degree of abnormality of the substrate processing device 1 is calculated as an abnormality score based upon invariant relation among the plurality of pieces of processing information and the plurality of pieces of processing information gathered from the substrate processing device 1. A management device 4 accepts a request to investigate abnormality from each substrate processing device 1. When two or more requests to investigate are accepted, abnormality scores of the substrate processing devices which correspond to the requests to investigate are acquired. Based upon the plurality of acquired abnormality scores, priority level information, associated with priority levels, to be replied to the two or more requests to investigate are presented to the administrator.SELECTED DRAWING: Figure 1

Description

[Technical Field]

[0001] The present invention relates to a substrate processing apparatus management system, a substrate processing apparatus management method, and a substrate processing apparatus management program used to manage a plurality of substrate processing apparatuses. [Background technology]

[0002] Substrate processing apparatuses are used to perform various processes on various substrates, such as substrates for FPDs (Flat Panel Displays) used in liquid crystal displays or organic EL (Electro Luminescence) displays, semiconductor substrates, substrates for optical disks, substrates for magnetic disks, substrates for magneto-optical disks, substrates for photomasks, ceramic substrates, or substrates for solar cells. In the substrate processing apparatus, a series of processes are performed on the substrates according to, for example, a predetermined processing procedure (recipe). In order to prevent substrate processing defects caused by an abnormality in the substrate processing apparatus, a data processing system for determining an abnormality in the substrate processing apparatus has been proposed (see, for example, Patent Document 1).

[0003] In the data processing system, a plurality of physical quantities related to the substrate processing apparatus are measured during substrate processing, and the measurement results are arranged in chronological order to generate a plurality of time-series data. The plurality of time-series data includes data on physical quantities such as the flow rate of the processing liquid discharged from the nozzle and the pressure inside the chamber. Each time-series data is compared with predetermined reference data to calculate an evaluation value. Whether or not there is an abnormality in the time-series data is determined based on the calculated evaluation value. [Prior art documents] [Patent documents]

[0004] [Patent Document 1] Japanese Patent Publication No. 2020-47847 Summary of the Invention [Problem to be solved by the invention]

[0005] The plurality of substrate processing apparatuses may be installed in, for example, a plurality of locations around the world. Maintenance work for each substrate processing apparatus is performed by a local maintenance worker in charge of that substrate processing apparatus. The maintenance worker can determine whether an abnormality has occurred in the substrate processing apparatus based on the abnormality determination result obtained by the data processing system.

[0006] When an abnormality occurs in a substrate processing apparatus, a maintenance worker may be unable to identify the cause of the abnormality. In this case, the maintenance worker requests a manager who manages multiple substrate processing apparatuses to conduct a detailed investigation of the substrate processing apparatus under his / her responsibility. The manager, upon receiving the investigation request, conducts various investigations of the substrate processing apparatus to be investigated. The manager also provides specific work instructions based on the investigation results to the maintenance worker who requested the investigation.

[0007] When multiple maintenance workers request multiple investigations of multiple substrate processing apparatuses, it is difficult for the manager to investigate the multiple substrate processing apparatuses in parallel. In this case, the manager must determine the investigation priorities for the multiple substrate processing apparatuses. In order to appropriately determine the investigation priorities, it is necessary to understand the extent of abnormalities in the multiple substrate processing apparatuses being investigated. In order to understand the extent of abnormalities in the multiple substrate processing apparatuses, a primary investigation must be conducted for each of the multiple substrate processing apparatuses. This primary investigation may include, for example, an analysis of past time-series data and interviews with maintenance workers. As such, the primary investigation is cumbersome. Therefore, after receiving multiple investigation requests, the manager must spend a long time before actually starting the investigations for each investigation request.

[0008] The object of the present invention is to provide a substrate processing apparatus management system, a substrate processing apparatus management method, and a substrate processing apparatus management program that enable an administrator to easily and appropriately determine the priority of investigations in a short period of time when multiple investigation requests are made for multiple substrate processing apparatuses. [Means for solving the problem]

[0009] (1) A substrate processing apparatus management system according to one aspect of the present invention is a substrate processing apparatus management system used to manage a plurality of substrate processing apparatuses, and includes: an information collection unit that collects a plurality of pieces of processing information indicating operations or states related to substrate processing from each substrate processing apparatus; a score calculation unit that calculates, for each substrate processing apparatus, an abnormality score representing the degree of abnormality of the substrate processing apparatus based on an invariant relationship between the plurality of pieces of processing information and the plurality of pieces of processing information collected from the substrate processing apparatus; a request reception unit that receives an investigation request for the abnormality from each substrate processing apparatus; a score acquisition unit that acquires two or more abnormality scores calculated for two or more substrate processing apparatuses that have sent investigation requests to the request reception unit; and a priority presentation unit that presents priority information regarding the priority in which to respond to the two or more investigation requests based on the two or more abnormality scores acquired by the score acquisition unit.

[0010] In the substrate processing apparatus management system, the degree of abnormality of each of the plurality of substrate processing apparatuses is calculated as an abnormality score. When two or more requests for investigation are made for two or more substrate processing apparatuses, priority order information based on the abnormality scores of the two or more substrate processing apparatuses for which investigations have been requested is presented. The abnormality score is calculated based on an invariant relationship between the plurality of pieces of processing information. Therefore, the manager of the plurality of substrate processing apparatuses can easily and appropriately grasp the investigation priority for the plurality of substrate processing apparatuses for which investigations have been made in a short period of time.

[0011] (2) The priority order information may include two or more abnormality scores acquired by the score acquisition unit, and the priority order presentation unit may present the two or more abnormality scores acquired by the score acquisition unit in association with two or more substrate processing apparatuses, respectively. In this case, a manager of the substrate processing apparatuses can easily understand the degree of abnormality in the two or more substrate processing apparatuses for which an investigation has been requested, based on the presented abnormality scores.

[0012] (3) The substrate processing apparatus management system may further include a score transmitting unit that transmits the abnormality score calculated by the score calculating unit to the substrate processing apparatus corresponding to the abnormality score. In this case, the abnormality score can be stored in each substrate processing apparatus. This allows each substrate processing apparatus to analyze an abnormality based on the abnormality score.

[0013] (4) The substrate processing apparatus management system may further include an alarm transmitting unit that determines whether the abnormality score calculated for each substrate processing apparatus exceeds a predetermined threshold, and, if the abnormality score exceeds the threshold, transmits an alarm to the substrate processing apparatus corresponding to the abnormality score. In this case, occurrence of an abnormality exceeding a predetermined level can be easily detected in each substrate processing apparatus.

[0014] (5) The information collecting unit may repeatedly add and reset the plurality of pieces of processing information collected at regular intervals, and the score calculating unit may calculate, for each substrate processing apparatus, an abnormality score representing the degree of abnormality of the substrate processing apparatus based on the invariant relationships between the plurality of pieces of processing information and the plurality of pieces of processing information generated by the substrate processing apparatus and added up by the information collecting unit. In this case, the abnormality score is less affected by noise, etc., generated when collecting each piece of processing information.

[0015] (6) For the plurality of pieces of processing information, a plurality of combinations of two pieces of processing information different from each other are determined, and each combination includes first processing information and second processing information. The score calculation unit generates, for each combination, first processing information predicted under predetermined conditions based on the second processing information collected under predetermined conditions as first predicted processing information, and calculates a score for the generated first predicted processing information. Information Gathering Department The degree of deviation from the first processing information actually collected by the method is calculated as a first deviation degree, and for each combination, second processing information predicted under predetermined conditions is generated as second predicted processing information based on the first processing information collected under predetermined conditions, and the generated second predicted processing information is compared with Information Gathering DepartmentThe degree of deviation from the second processing information actually collected by the method may be calculated as the second deviation degree, and the anomaly score may be calculated based on the plurality of first deviation degrees and the plurality of second deviation degrees calculated for each of the plurality of combinations. In this case, it becomes possible to calculate the anomaly score for each piece of actually collected processing information based on the invariant relationship with other processing information.

[0016] (7) The score calculation unit may calculate the abnormality score by summing the first deviations and the second deviations calculated for the plurality of combinations, respectively. In this case, the degree of abnormality of each substrate processing apparatus can be easily calculated.

[0017] (8) Each of the multiple combinations may be assigned a predetermined weight depending on the association between the combination and multiple types of abnormal conditions of the substrate processing apparatus, and the score calculation unit may calculate multiple first deviation degrees and multiple second deviation degrees based on the multiple combinations and the multiple weights.

[0018] In this case, by referring to the abnormality score calculated based on the plurality of first deviation degrees and the plurality of second deviation degrees, the degree of abnormality of each substrate processing apparatus can be more appropriately grasped.

[0019] (9) The plurality of pieces of processing information may include at least one physical quantity among a supply amount of a fluid supplied to the substrate, a temperature of the fluid supplied to the substrate, a concentration of a processing liquid supplied to the substrate, a temperature inside the processing chamber in which the substrate is accommodated, a pressure inside the processing chamber in which the substrate is accommodated, a pressure of a gas exhausted from the processing chamber in which the substrate is accommodated, and a moving speed of the substrate transported by the robot. In this case, the anomaly score is calculated based on one or more physical quantities acquired in the substrate processing apparatus.

[0020] (10) The plurality of pieces of processing information may include information on at least one of a drive pulse signal for driving a robot that transports the substrate, an output signal from a detector provided on the robot that transports the substrate, and an open / close signal given to a control valve. In this case, the anomaly score is calculated based on one or more signals used in the substrate processing apparatus.

[0021] (11) Each substrate processing apparatus may be a substrate cleaning apparatus that cleans substrates using a cleaning liquid, and the plurality of processing information may include at least one of the amount of cleaning liquid supplied to the substrate, the temperature of the cleaning liquid supplied to the substrate, and the concentration of the cleaning liquid supplied to the substrate. In this case, when multiple inspection requests are made for multiple substrate cleaning apparatuses, the inspection priorities are appropriately determined.

[0022] (12) A substrate processing apparatus management method according to another aspect of the present invention is a substrate processing apparatus management method used to manage a plurality of substrate processing apparatuses, and includes the steps of: collecting a plurality of pieces of processing information indicating operations or states related to substrate processing from each substrate processing apparatus; calculating, for each substrate processing apparatus, an abnormality score representing the degree of abnormality of the substrate processing apparatus based on an invariant relationship between the plurality of pieces of processing information and the plurality of pieces of processing information collected from the substrate processing apparatus; accepting an investigation request for the abnormality from each substrate processing apparatus; acquiring two or more abnormality scores calculated for two or more substrate processing apparatuses that have sent an investigation request; and presenting priority information regarding the priority order in which to respond to the two or more investigation requests based on the two or more abnormality scores acquired in the acquiring step.

[0023] In the substrate processing apparatus management method, the degree of abnormality of each of the plurality of substrate processing apparatuses is calculated as an abnormality score. When two or more inspection requests are made for two or more substrate processing apparatuses, priority order information based on the abnormality scores of the two or more substrate processing apparatuses for which inspection requests have been made is presented. The abnormality score is calculated based on an invariant relationship between the plurality of pieces of processing information. Therefore, the manager of the plurality of substrate processing apparatuses can easily and appropriately grasp the inspection priority order for the plurality of substrate processing apparatuses for which inspection requests have been made in a short period of time.

[0024] (13) A substrate processing apparatus management program according to yet another aspect of the present invention is a substrate processing apparatus management program that causes a computer to execute a process of managing a plurality of substrate processing apparatuses using an information analysis device, wherein the information analysis device includes an information collection unit that collects a plurality of pieces of processing information indicating operations or states related to substrate processing from each substrate processing apparatus, and a score calculation unit that calculates, for each substrate processing apparatus, an abnormality score representing the degree of abnormality of the substrate processing apparatus based on an invariant relationship between the plurality of pieces of processing information and the plurality of pieces of processing information collected from the substrate processing apparatus, and the process of managing the plurality of substrate processing apparatuses includes a process of accepting an investigation request for an abnormality from each substrate processing apparatus, a process of acquiring two or more abnormality scores calculated for two or more substrate processing apparatuses that have sent the investigation requests, and a process of presenting priority information regarding the priority of responses to the two or more investigation requests based on the two or more abnormality scores acquired by the acquiring process.

[0025] According to the substrate processing apparatus management program, when two or more inspection requests are made for two or more substrate processing apparatuses, priority order information based on abnormality scores of the two or more substrate processing apparatuses for which inspections have been requested is presented. The abnormality scores are calculated based on invariant relationships between the multiple pieces of processing information. Therefore, a manager of the multiple substrate processing apparatuses can easily and appropriately grasp the inspection priorities for the multiple substrate processing apparatuses for which inspections have been requested in a short period of time. [Effects of the Invention]

[0026] According to the present invention, when there are multiple inspection requests for multiple substrate processing apparatuses, the manager can easily and appropriately grasp the priority order of the inspections in a short time. [Brief explanation of the drawings]

[0027] [Figure 1] FIG. 1 is a diagram illustrating a configuration of a substrate processing apparatus management system according to a first embodiment. [Figure 2] 1 is a block diagram for explaining a functional configuration of a substrate processing apparatus management system according to a first embodiment. [Figure 3] FIG. 10 is a diagram for explaining a specific example of calculating the degree of deviation. [Figure 4] FIG. 10 is a diagram for explaining a specific example of calculation of an abnormality score. [Figure 5] 2 is a flowchart showing an example of processing executed in each of the plurality of substrate processing apparatuses shown in FIG. [Figure 6] 2 is a flowchart showing an example of processing executed in the information analysis device of FIG. 1. [Figure 7] 2 is a flowchart showing an example of processing executed in the management device of FIG. 1; [Figure 8] FIG. 10 is a diagram illustrating a functional configuration of a substrate processing apparatus management system according to a second embodiment. [Figure 9] FIG. 9 is a diagram showing an example of a plurality of weights stored in a weight storage unit in FIG. 8. DETAILED DESCRIPTION OF THE INVENTION

[0028] A substrate processing apparatus management system, a substrate processing apparatus management method, and a substrate processing apparatus management program according to an embodiment of the present invention will be described below with reference to the drawings. In the following description, the term "substrate" refers to a semiconductor substrate, a substrate for an FPD (Flat Panel Display) such as a liquid crystal display device or an organic EL (Electro Luminescence) display device, a substrate for an optical disk, a substrate for a magnetic disk, a substrate for a magneto-optical disk, a substrate for a photomask, a ceramic substrate, a substrate for a solar cell, or the like.

[0029] 1. First embodiment <1> Configuration and operation of substrate processing apparatus management system (1) Overall structure Fig. 1 is a diagram illustrating the configuration of a substrate processing apparatus management system according to a first embodiment. As shown in Fig. 1, a substrate processing apparatus management system 2 according to this embodiment is mainly composed of an information analysis device 3 and a management device 4, and is used to manage a plurality of (five in this example) substrate processing apparatuses 1. In the following description, when distinguishing between the five substrate processing apparatuses 1 shown in Fig. 1, the five substrate processing apparatuses 1 will be referred to as substrate processing apparatuses 1A, 1B, 1C, 1D, and 1E, respectively. In this embodiment, the substrate processing apparatuses 1A to 1E have the same configuration.

[0030] (2) An Example of the Configuration of the Substrate Processing Apparatus 1A 1, substrate processing apparatus 1A is a so-called batch-type substrate cleaning apparatus, and includes a processing tank 11, a substrate holder 12, a lifting device 13, a cleaning liquid generator 14, a concentration meter 20, a transfer robot 30, and a control device 40. In addition to the above-mentioned components, substrate processing apparatus 1A is also provided with a display device, an audio output device, and an operation unit, all of which are not shown.

[0031] The substrate holder 12 is configured to be able to hold a plurality of substrates W. The processing tank 11 is configured to be able to accommodate a plurality of substrates W held by the substrate holder 12. A cleaning liquid for cleaning the substrates W is stored in the processing tank 11.

[0032] The lifting device 13 supports the substrate holding part 12 so that it can move up and down, and moves the substrate holding part 12 up and down under the control of the control device 40. This allows the lifting device 13 to immerse the plurality of substrates W held by the substrate holding part 12 in the cleaning liquid stored in the processing bath 11, and to lift the plurality of substrates W immersed in the cleaning liquid from the processing bath 11. The plurality of substrates W are cleaned by being immersed in the cleaning liquid. The lifting device 13 is also provided with a motor (not shown) as a power source for moving the substrate holding part 12 up and down.

[0033] The cleaning liquid generating device 14 includes a storage tank 14a and an agitator (such as a bubbling device) (not shown). A chemical supply pipe 91, a pure water supply pipe 92, an additional chemical supply pipe 93, and a drain pipe 94 are connected to the storage tank 14a. Each of the multiple pipes (91 to 94) is provided with a valve. Each valve is a control valve whose opening can be adjusted under the control of the control device 40.

[0034] The chemical liquid supply pipe 91 guides the chemical liquid supplied from a chemical liquid supply system (not shown) to the storage tank 14a by opening a valve provided in the chemical liquid supply pipe 91. The flow rate (amount supplied per unit time) of the chemical liquid supplied to the storage tank 14a through the chemical liquid supply pipe 91 varies depending on the opening degree of the valve provided in the chemical liquid supply pipe 91.

[0035] The pure water supply pipe 92 guides pure water supplied from a pure water supply system (not shown) to the storage tank 14a by opening a valve provided on the pure water supply pipe 92. The flow rate (amount supplied per unit time) of pure water supplied to the storage tank 14a through the pure water supply pipe 92 varies depending on the opening degree of the valve provided on the pure water supply pipe 92.

[0036] In this way, predetermined amounts of chemical solution and pure water are stored in the storage tank 14a of the cleaning solution generator 14. Furthermore, in the storage tank 14a, the stored chemical solution and pure water are mixed by a stirring mechanism (not shown) to generate the cleaning solution to be stored in the processing tank 11. As the chemical solution, BHF (buffered hydrofluoric acid), DHF (dilute hydrofluoric acid), hydrofluoric acid, hydrochloric acid, sulfuric acid, nitric acid, phosphoric acid, acetic acid, oxalic acid, ammonia, or the like is used.

[0037] The additional chemical liquid supply pipe 93 guides the chemical liquid supplied from a chemical liquid supply system (not shown) to the storage tank 14a when a valve provided in the chemical liquid supply pipe 91 is opened. The supply of the chemical liquid to the storage tank 14a through the additional chemical liquid supply pipe 93 will be described later. The drain pipe 94 discharges part or all of the cleaning liquid stored in the cleaning liquid generating device 14 to the outside of the substrate processing apparatus 1A when a valve provided in the drain pipe 94 is opened.

[0038] A liquid supply pipe 15 is further connected to the storage tank 14a. The liquid supply pipe 15 is provided to connect the processing tank 11 and the cleaning liquid generating device 14. A pump 16 and a valve 17 are also provided in the liquid supply pipe 15. The valve 17 is a control valve whose opening can be adjusted under the control of the control device 40. When the valve 17 is opened while the pump 16 is operating, the cleaning liquid stored in the storage tank 14a is supplied into the processing tank 11. The flow rate (amount supplied per unit time) of the cleaning liquid supplied from the storage tank 14a to the processing tank 11 changes depending on the opening of the valve 17.

[0039] A liquid discharge pipe 18 is connected to the bottom of the processing tank 11. A valve 19 is provided in the liquid discharge pipe 18. The valve 19 is a control valve whose opening can be adjusted under the control of the control device 40. When the valve 19 is opened, a portion of the cleaning liquid stored in the processing tank 11 is discharged from the substrate processing apparatus 1A through the liquid discharge pipe 18. The flow rate (amount discharged per unit time) of the cleaning liquid discharged from the processing tank 11 changes depending on the opening of the valve 19. When multiple substrates W are being cleaned, the cleaning liquid is supplied from the cleaning liquid generator 14 to the processing tank 11, and the cleaning liquid inside the processing tank 11 is discharged through the liquid discharge pipe 18.

[0040] The concentration meter 20 detects the chemical concentration of the cleaning liquid stored in the storage tank 14a in response to a command from the control device 40, and provides the detection result to the control device 40. The transfer robot 30 is located above the processing bath 11 and transfers a plurality of substrates W held by the substrate holder 12. The control device 40 is composed of, for example, a CPU (Central Processing Unit) and a memory, and controls the operation of the lifting device 13, the operation of the transfer robot 30, the opening degrees of the valves 17 and 19, etc. A first management program, which will be described later, is stored in the memory of the control device 40.

[0041] Furthermore, the control device 40 performs feedback control of the amount of chemical liquid supplied to the storage tank 14a so that the chemical liquid concentration of the cleaning liquid stored in the storage tank 14a falls within a predetermined range, based on the detection result of the chemical liquid concentration provided by the concentration meter 20. For example, when the chemical liquid concentration of the cleaning liquid detected by the concentration meter 20 is lower than the predetermined range, the control device 40 supplies additional chemical liquid from a chemical liquid supply system (not shown) to the cleaning liquid generating device 14 through an additional chemical liquid supply pipe 93.

[0042] Furthermore, the control device 40 has an emergency stop function that stops the operation of the substrate processing device 1A when a person enters a specified space inside the substrate processing device 1A or when a specified detector (e.g., concentration meter 20) installed inside the substrate processing device 1A is not functioning.

[0043] (3) Processing information Each substrate processing apparatus 1 is provided with a plurality of pieces of processing information indicating operations or states related to the processing of substrates W in the substrate processing apparatus, as information for managing abnormalities in the substrate processing apparatus 1. The processing information is transmitted from the control device 40 of each substrate processing apparatus 1 to the information analysis device 3 of the substrate processing apparatus management system 2 at predetermined intervals, as indicated by the thick solid arrows in FIG.

[0044] As shown in the speech bubble in Figure 1, the processing information transmitted from the substrate processing apparatus 1A to the information analysis apparatus 3 includes "a. Chemical concentration," "b. Chemical supply amount," "c. Concentration detection input signal," "d. Concentration detection output signal," "e. Motor rotation speed," "f. Power supplied to the motor," "g. Amount of chemical added," "h. Chemical supply valve opening," and "i. Cleaning liquid discharge valve opening."

[0045] "a. Chemical concentration" indicates the chemical concentration of the cleaning liquid in the storage tank 14a detected by the concentration meter 20. "b. Chemical supply amount" indicates the flow rate (amount supplied per unit time) of the cleaning liquid supplied from the chemical supply pipe 91 to the storage tank of the cleaning liquid generating device 14. "b. Chemical supply amount" can be detected, for example, by providing a flow meter in the chemical supply pipe 91.

[0046] In the substrate processing apparatus 1A, the concentration of the cleaning liquid is detected by a command from the control device 40 to the concentration meter 20 to detect the concentration. "c. Concentration detection input signal" is a concentration detection command signal given from the control device 40 to the concentration meter 20. "d. Concentration detection output signal" is a signal indicating the detection result of the chemical concentration output from the concentration meter 20 in response to the command from the control device 40.

[0047] "e. Motor rotation speed" is the rotation speed of the motor provided in the lifting device 13, and can be calculated by detecting the rotation speed of the motor using, for example, a rotation speed sensor. "f. Power supplied to motor" is the amount of power supplied to the motor provided in the lifting device 13, and can be calculated by detecting the current supplied to the motor using, for example, an ammeter.

[0048] "g. Amount of added chemical liquid" indicates the amount of chemical liquid per unit time that is additionally supplied from the additional chemical liquid supply pipe 93 to the storage tank 14a so that the chemical liquid concentration of the cleaning liquid stored in the storage tank 14a falls within a predetermined range. "g. Amount of added chemical liquid" can be detected, for example, by providing a flow meter in the additional chemical liquid supply pipe 93. "h. Chemical liquid supply valve opening" indicates the opening of the valve provided in the chemical liquid supply pipe 91. "i. Cleaning liquid discharge valve opening" indicates the opening of the valve provided in the drain pipe 94.

[0049] (4) Basic operation of the information analysis device 3 The information analyzing device 3 is, for example, a server, and includes a CPU and a memory. The information analyzing device 3 collects a plurality of pieces of processing information transmitted from each substrate processing apparatus 1. In the information analyzing device 3, a plurality of combinations of two different pieces of processing information are predefined for the plurality of pieces of processing information transmitted from each substrate processing apparatus 1 to the information analyzing device 3.

[0050] Here, it is assumed that the substrate processing apparatus 1 is ideally operating in accordance with a predetermined processing procedure (recipe), in which a predetermined invariant relationship (hereinafter referred to as the invariant relationship) is maintained between the two pieces of processing information that make up each combination.

[0051] On the other hand, it is assumed that unintended substrate processing is performed as a result of substrate processing being performed while an abnormality has occurred in the substrate processing apparatus 1. In this case, the relationship between two pieces of processing information constituting at least one combination among the plurality of combinations deviates from the invariant relationship.

[0052] Therefore, the information analyzing device 3 calculates, as a plurality of deviation degrees, the degree of deviation between the relationships between a plurality of combinations of a plurality of pieces of processing information that have actually been collected and a plurality of predetermined invariant relationships for the plurality of pieces of processing information. Furthermore, the information analyzing device 3 calculates, based on the calculated plurality of deviation degrees, the degree of abnormality of the substrate processing apparatus 1 as an abnormality score. A specific example of a method for calculating the abnormality score will be described later.

[0053] 1, the information analyzing device 3 transmits the calculated abnormality score to each substrate processing apparatus 1. The abnormality score is transmitted each time an abnormality score is calculated by the information analyzing device 3. At this time, the abnormality score transmitted from the information analyzing device 3 is stored in each substrate processing apparatus 1.

[0054] Furthermore, the information analyzing device 3 determines whether the abnormality score for each substrate processing apparatus 1 exceeds a predetermined first threshold value. If the abnormality score exceeds the first threshold value, the information analyzing device 3 transmits an alarm to the substrate processing apparatus 1 corresponding to the abnormality score. In the example of FIG. 1, the information analyzing device 3 transmits an alarm to the substrate processing apparatuses 1D and 1E among the substrate processing apparatuses 1A to 1E, as indicated by the wavy dotted arrows. At this time, an alarm is output in the substrate processing apparatuses 1D and 1E that receive the alarm.

[0055] In this embodiment, the anomaly score (degree of anomaly) is lower the less prompt a maintenance worker is required to respond, and higher the more prompt a maintenance worker is required to respond. An example of a state in which the anomaly score is low is a state in which all of the multiple processing conditions fall within a range predicted to be normal based on the invariant relationships corresponding to each of the multiple combinations described above.

[0056] On the other hand, a state with a high abnormality score includes, for example, a state in which the change over time in "a. chemical liquid concentration" is significantly larger than the change over time predicted based on the change over time in "b. chemical liquid supply amount" (hereinafter referred to as a first abnormal state). Continuation of the first abnormal state causes poor processing of substrates W, generation of harmful gases, and damage to components of the substrate processing apparatus 1 due to an inability to adjust the chemical liquid concentration of the cleaning liquid.

[0057] Furthermore, a state with a high abnormality score includes, for example, a state (hereinafter referred to as a second abnormal state) in which there is an extremely long time between the time when the concentration meter 20 is instructed to detect the concentration and the time when the concentration meter 20 outputs the chemical liquid concentration. Continuing the second abnormal state causes poor processing of the substrate W, generation of harmful gases, and damage to components of the substrate processing apparatus 1 due to an inability to properly control the chemical liquid concentration through feedback.

[0058] Furthermore, a state with a high abnormality score includes, for example, a state in which "f. Power supplied to the motor" is significantly greater than the predicted value (hereinafter referred to as the third abnormal state). In the third abnormal state, there is a high possibility that an unexpected load is acting on the motor. Therefore, the continuation of the third abnormal state may cause a breakdown of the operating parts including the motor, a failure to transport the substrate W, and damage to the components of the substrate processing apparatus 1.

[0059] Furthermore, a state with a high abnormality score includes, for example, a state in which "g. Amount of added chemical liquid" fluctuates beyond the predicted range (hereinafter referred to as the fourth abnormal state). In the fourth state, it is difficult to maintain a constant concentration of the cleaning liquid. Therefore, the continuation of the fourth abnormal state causes processing defects of the substrate W.

[0060] Furthermore, a state with a high abnormality score includes, for example, a state in which the temporal changes in "h. chemical liquid supply valve opening" and "i. cleaning liquid discharge valve opening" are significantly different from the temporal changes predicted from "a. chemical liquid concentration" and "b. chemical liquid supply amount" (hereinafter referred to as a fifth abnormal state). When the substrate processing apparatus 1A is in the fifth abnormal state, the substrate processing apparatus 1A is in a stopped state due to an emergency stop function, or original It is considered that the system is in a state where it should be stopped immediately.

[0061] (5) Basic Operation of the Management Device 4 The management device 4 is, for example, a personal computer, and includes a CPU and a memory. The management device 4 also includes a display unit 4a and an operation unit 4b, and is used by an administrator who manages a plurality of substrate processing apparatuses 1.

[0062] A plurality of maintenance workers who are respectively in charge of a plurality of substrate processing apparatuses 1 can easily understand the degree of abnormality in the substrate processing apparatus 1 that they are in charge of by checking the abnormality scores transmitted from the information analysis device 3. Furthermore, when the substrate processing apparatus 1 that they are in charge of receives an alarm, each maintenance worker can understand that a serious abnormality has occurred in that substrate processing apparatus 1.

[0063] However, even if each maintenance worker is able to grasp the degree of abnormality in the substrate processing apparatus 1, there are cases where the maintenance worker is unable to identify the cause of the abnormality in the substrate processing apparatus 1. In this case, the maintenance worker requests a manager to conduct a detailed investigation of the substrate processing apparatus 1.

[0064] 1, for example, some (in this example, substrate processing apparatuses 1A, 1C, and 1E) or all of the substrate processing apparatuses 1 transmit an investigation request to the management apparatus 4. Furthermore, as shown by the thick dashed arrow in FIG. 1, an abnormality score is transmitted to the management apparatus 4 from one or more substrate processing apparatuses 1 (in this example, substrate processing apparatuses 1A, 1C, and 1E) that transmitted the investigation request.

[0065] As a result, the management device 4 can easily and quickly determine the priority of the investigation based on the abnormality scores received together with the investigation requests, even when, for example, investigation requests are received from multiple substrate processing apparatuses 1 at the same time. That is, the manager can determine the priority of the investigation based on the multiple abnormality scores of the substrate processing apparatuses 1A, 1C, and 1E for which investigation requests have been made.

[0066] In addition, in the management device 4, each of the investigation requests received from one or more substrate processing apparatuses 1 is excluded from the targets for determining priority each time a detailed investigation is conducted on the substrate processing apparatus 1 corresponding to the investigation request.

[0067] <2> Functional configuration of substrate processing apparatus management system 2 2 is a block diagram illustrating the functional configuration of a substrate processing apparatus management system 2 according to a first embodiment. As shown in FIG. 2, an information analysis device 3 includes an information collection unit 31, a score calculation unit 32, a score transmission unit 33, and an alarm transmission unit 34. A second management program for managing a plurality of substrate processing apparatuses 1 is stored in the memory of the information analysis device 3. The components (31 to 34) of the information analysis device 3 in FIG. 2 are realized by a CPU of the information analysis device 3 executing the second management program stored in the memory. Note that some or all of the components (31 to 34) of the information analysis device 3 may be realized by hardware such as electronic circuits.

[0068] The management device 4 also includes a request receiving unit 41, a score obtaining unit 42, and a score presenting unit 43. A third management program for managing a plurality of substrate processing apparatuses 1 is stored in the memory of the management device 4. The components (41 to 43) of the management device 4 in FIG. 2 are realized by the CPU of the management device 4 executing the third management program stored in the memory. Note that some or all of the components (41 to 43) of the management device 4 may be realized by hardware such as electronic circuits.

[0069] As described above, a plurality of pieces of processing information are transmitted from each of the plurality of substrate processing apparatuses 1 to the information analyzing apparatus 3 at predetermined intervals (see the thick solid arrows in FIG. 2). The information collecting unit 31 of the information analyzing apparatus 3 collects the plurality of pieces of processing information transmitted from each of the substrate processing apparatuses 1 and provides the collected information to the score calculating unit 32.

[0070] The score calculation unit 32 of the information analysis device 3 calculates an abnormality score for each substrate processing device 1 based on multiple pieces of processing information corresponding to that substrate processing device 1, and provides the calculated abnormality score to the score transmission unit 33 and the alarm transmission unit 34.

[0071] The score transmitting unit 33 of the information analyzing device 3 transmits the abnormality score calculated by the score calculating unit 32 to the substrate processing apparatus 1 corresponding to the abnormality score (see the thick dashed arrow in FIG. 2). In each substrate processing apparatus 1, the abnormality score transmitted from the score transmitting unit 33 is stored in association with a time, such as the calculation time, transmission time, or reception time of the abnormality score.

[0072] The alarm transmitting unit 34 of the information analyzing device 3 determines whether the abnormality score calculated for each substrate processing apparatus 1 exceeds the first threshold value. If the abnormality score exceeds the first threshold value, the alarm transmitting unit 34 transmits an alarm to the substrate processing apparatus 1 corresponding to the abnormality score (substrate processing apparatuses 1D and 1E in the example of FIG. 2) (see the wavy dotted arrow in FIG. 2).

[0073] In each substrate processing apparatus 1, a request for investigation regarding an abnormality in the substrate processing apparatus 1 is transmitted to the management apparatus 4 based on an operation by a maintenance worker. In addition, the abnormality score stored in the substrate processing apparatus 1 is transmitted to the management apparatus 4.

[0074] The request receiving unit 41 of the management device 4 receives investigation requests transmitted from one or more substrate processing apparatuses 1 (substrate processing apparatuses 1A, 1C, and 1E in the example of FIG. 2) (see the thick, two-dot chain arrow in FIG. 2). The score acquiring unit 42 of the management device 4 acquires the abnormality scores transmitted together with the investigation requests from one or more substrate processing apparatuses 1 (substrate processing apparatuses 1A, 1C, and 1E in the example of FIG. 2) (see the thick, dotted arrow in FIG. 2). The score presenting unit 43 of the management device 4 displays each of the one or more abnormality scores acquired by the score acquiring unit 42 on the display unit 4a in association with the substrate processing apparatus 1 corresponding to the abnormality score.

[0075] In the example of Figure 2, the abnormality scores for the substrate processing apparatuses 1A, 1C, and 1E for which an investigation request has been made are "264," "210," and "322," respectively. This allows the administrator to easily grasp the degree of abnormality in the substrate processing apparatuses 1E, 1A, and 1C. The administrator also knows that a detailed investigation should be carried out in the order of substrate processing apparatuses 1E, 1A, and 1C.

[0076] In addition, when multiple abnormality scores are calculated for multiple uninspected substrate processing apparatuses 1 that have sent an investigation request, the score presentation unit 43 may determine an investigation priority based on those abnormality scores and display the determined priority on the display unit 4a.

[0077] <3> Specific example of anomaly score calculation As described above, the substrate processing apparatus management system 2 defines a plurality of combinations of two different pieces of processing information. To calculate the anomaly score, a deviation is calculated for each combination. FIG. 3 is a diagram for explaining a specific example of calculating the deviation. Here, an example of calculating the deviation corresponding to the combination of "e. Motor rotation speed" and "f. Power supplied to motor" in FIG. 1 will be explained. In the following explanation, the data for "e. Motor rotation speed" will be referred to as "e" data as appropriate, and the data for "f. Power supplied to motor" will be referred to as "f" data as appropriate.

[0078] To calculate the deviation, reference data based on the invariant relationship between "e. motor rotation speed" and "f. power supplied to motor" is required. Therefore, before each substrate W is actually processed in the substrate processing apparatus 1, the information analyzing apparatus 3 stores "e" data and "f" data when the substrate processing apparatus 1 is ideally operating in accordance with the recipe.

[0079] These ideal "e" data and "f" data are obtained, for example, based on a plurality of pieces of processing information transmitted from each substrate processing apparatus 1 when the substrate processing apparatus 1 is actually operating normally. Alternatively, the ideal "e" data and "f" data may be generated by simulation or the like.

[0080] An example of ideal time-dependent changes in "e" data and "f" data is shown in the graph at the top of Figure 3. In the graph of "e" data, the horizontal axis represents time, and the vertical axis represents the number of rotations of the motor. In the graph of "f" data, the horizontal axis represents time, and the vertical axis represents the amount of power (supplied power) supplied to the motor provided in the lifting device 13 of Figure 1. The horizontal axis (time axis) is common between the graph of "e" data and the graph of "f" data.

[0081] 3, it can be seen that as the rotation speed of the motor increases, the power supplied to the motor also increases at a substantially constant rate. These relationships are maintained invariantly under conditions where the substrate processing apparatus 1 operates ideally. Therefore, these relationships (invariant relationships) are stored in advance in the information analyzing apparatus 3 as correlation information.

[0082] In this state, the substrate W is processed in each substrate processing apparatus 1, and the actual "e" data and "f" data are collected by the information collecting unit 31 of the information analyzing apparatus 3. An example of the time-dependent changes in the actually collected "e" data and "f" data is shown in the graph in the middle part of Fig. 3.

[0083] When actual "e" data is collected, the score calculation unit 32 predicts "f" data based on pre-stored correlation information. Also, when actual "f" data is collected, the score calculation unit 32 predicts "e" data based on pre-stored correlation information. The lower part of Figure 3 shows a graph illustrating an example of changes over time in "e" data and "f" data predicted based on correlation information. In the graph at the bottom of Figure 3, the predicted "e" data and "f" data are shown by solid lines, and the actually collected "e" data and "f" data are shown by dotted lines.

[0084] When the substrate processing apparatus 1 is operating ideally, the actual "e" data and the predicted "e" data will match or nearly match. Also, the actual "f" data and the predicted "f" data will match or nearly match. However, when an abnormality occurs in the substrate processing apparatus 1, there is a high possibility that the actual "e" data will deviate from the predicted "e" data. Also, there is a high possibility that the actual "f" data will deviate from the predicted "f" data. It is considered that the degree of this deviation is greater as the degree of abnormality occurring in the substrate processing apparatus 1 is greater, and is smaller as the degree of abnormality occurring in the substrate processing apparatus 1 is smaller.

[0085] Therefore, in this embodiment, the difference value between the actually collected processing information data and the predicted processing information data is calculated as the deviation. In the example of Fig. 3, when calculating the deviation at a certain point in time, the score calculation unit 32 calculates the difference value between the actual "e" data and the predicted "e" data as the deviation. In addition, the score calculation unit 32 calculates the difference value between the actual "f" data and the predicted "f" data as the deviation.

[0086] Fig. 4 is a diagram for explaining a specific example of calculating the anomaly score. The score calculation unit 32 calculates the above-mentioned deviation degrees for all combinations of a plurality of pieces of processing information. Fig. 4 shows multiple deviation degrees calculated for all combinations of a plurality of pieces of processing information. After all deviation degrees have been calculated, the score calculation unit 32 calculates the sum of the calculated multiple deviation degrees as the anomaly score.

[0087] <4> A series of processes executed in each of the substrate processing apparatuses 1 Fig. 5 is a flowchart showing an example of processing executed in each of the substrate processing apparatuses 1 of Fig. 1. The series of processing shown in Fig. 5 is started when each substrate processing apparatus 1 is powered on and the CPU of the control device 40 executes a first management program.

[0088] First, the control device 40 transmits a plurality of pieces of processing information acquired inside the substrate processing apparatus 1 to the information analysis device 3 at a predetermined cycle (step S10). The transmission process of the plurality of pieces of processing information started in step S10 is repeated at the predetermined cycle until the power supply of the substrate processing apparatus 1 is turned off. When transmitting the plurality of pieces of processing information, the control device 40 may store the transmitted plurality of pieces of processing information in association with the transmission time.

[0089] Next, the control device 40 determines whether or not an abnormality score has been received from the information analysis device 3 (step S11). If the control device 40 has not received an abnormality score, the control device 40 proceeds to the processing of step S13, which will be described later. On the other hand, if the control device 40 has received an abnormality score, the control device 40 stores the received abnormality score in association with the time of reception (step S12).

[0090] Next, the control device 40 determines whether or not an alarm has been received from the information analysis device 3 (step S13). If the control device 40 has not received an alarm, the control device 40 proceeds to the processing of step S15, which will be described later. On the other hand, if an alarm has been received, the control device 40 outputs the alarm via a display device or audio output device of the substrate processing apparatus 1 (step S14). The processing of steps S11 and S12 described above may be performed after the processing of step S14.

[0091] Next, the control device 40 determines whether or not it has received a command to send an investigation request to the management device 4 (step S15). The command to send the investigation request is given to the control device 40, for example, by a maintenance worker operating an operation unit of the substrate processing apparatus 1. If the control device 40 does not receive a command to send an investigation request, it proceeds to the processing of step S17, which will be described later. On the other hand, if the control device 40 has received a command to send an investigation request, it transmits the investigation request and the abnormality score stored at the most recent time from the current time to the management device 4 (step S16). In step S16, the control device 40 may transmit to the management device 4 a plurality of abnormality scores stored up to a predetermined time (e.g., several hours) before the current time, together with the times at which they were received.

[0092] Next, the control device 40 determines whether or not a work instruction to perform a specific work on the substrate processing apparatus 1 has been received from the management device 4 (step S17). If the control device 40 has not received a work instruction, the control device 40 proceeds to the processing of step S19, which will be described later. On the other hand, if the control device 40 has received a work instruction, the control device 40 presents the received work instruction to a maintenance worker, for example, on a display device provided in the substrate processing apparatus 1 (step S18).

[0093] Thereafter, the control device 40 determines whether or not an end command to stop the operation of the substrate processing apparatus 1 has been received (step S19). If the control device 40 has not received an end command, the control device 40 proceeds to the process of step S11. On the other hand, if the control device 40 has received an end command, the control device 40 ends the series of processes.

[0094] <5> A series of processes executed in the information analysis device 3 Fig. 6 is a flowchart showing an example of processing executed in the information analysis device 3 of Fig. 1. The series of processing shown in Fig. 6 is started when the power of the information analysis device 3 is turned on and the CPU of the information analysis device 3 executes the second management program.

[0095] 2 starts collecting a plurality of pieces of processing information transmitted from each of the plurality of substrate processing apparatuses 1 (step S20). The process of collecting the plurality of pieces of processing information started in step S20 is repeated at predetermined intervals until the power of the information analyzing apparatus 3 is turned off.

[0096] Next, the score calculation unit 32 in FIG. 2 selects one substrate processing apparatus 1 for which no abnormality score has been calculated from among one or more substrate processing apparatuses 1 for which multiple pieces of processing information have been collected in the processing of step S20 (step S21).

[0097] Next, the score calculation unit 32 calculates a plurality of deviations from the collected plurality of pieces of processing information for the selected one of the substrate processing apparatuses 1 (step S22). Furthermore, the score calculation unit 32 calculates an abnormality score for the one of the substrate processing apparatuses 1 based on the calculated plurality of deviations, and transmits the calculated abnormality score to the one of the substrate processing apparatuses 1 (step S23).

[0098] 2 determines whether the abnormality score calculated in step S23 exceeds a first threshold value (step S24). If the abnormality score does not exceed the first threshold value, the alarm transmitting unit 34 proceeds to the processing of step S26, which will be described later. On the other hand, if the abnormality score exceeds the first threshold value, the alarm transmitting unit 34 transmits an alarm to one of the substrate processing apparatuses 1 (step S25).

[0099] Next, the score calculation unit 32 determines whether there is any substrate processing apparatus 1 for which a plurality of pieces of processing information have been collected but for which an abnormality score has not been calculated (step S26). If there is any substrate processing apparatus 1 for which an abnormality score has not been calculated, the score calculation unit 32 proceeds to the process of step S21. On the other hand, if there is no substrate processing apparatus 1 for which an abnormality score has not been calculated, the score calculation unit 32 determines whether an end command to stop the operation of the information analysis apparatus 3 has been received (step S27). If the end command has not been received, the score calculation unit 32 proceeds to the process of step S21. On the other hand, if the end command has been received, the score calculation unit 32 ends the series of processes.

[0100] <6> A series of processes executed in the management device 4 Fig. 7 is a flowchart showing an example of processing executed in the management device 4 of Fig. 1. The series of processing shown in Fig. 7 is started when the power of the management device 4 is turned on and the CPU of the management device 4 executes the third management program.

[0101] 2 determines whether an investigation request has been received from at least one of the substrate processing apparatuses 1 (step S30). If the request receiving unit 41 has not received an investigation request, the process proceeds to step S33, which will be described later. On the other hand, if the request receiving unit 41 has received an investigation request from at least one of the substrate processing apparatuses 1, the request receiving unit 41 accepts the received investigation request (step S31).

[0102] As described above, when the substrate processing apparatus 1 transmits an investigation request to the management apparatus 4, the substrate processing apparatus 1 transmits the abnormality score together with the investigation request to the management apparatus 4. As a result, the score acquisition unit 42 in Fig. 2 receives and acquires the abnormality score transmitted together with the investigation request (step S32). The investigation request and abnormality score acquired at this time are stored in the memory of the management apparatus 4.

[0103] 2 determines whether or not a command to start an investigation of the substrate processing apparatus 1 has been received (step S33). The command to start the investigation is given to the score presenting unit 43, for example, by an administrator operating the operation unit 4b of the management device 4. If the score presenting unit 43 has not received a command to start the investigation, it proceeds to the processing of step S30. On the other hand, if the score presenting unit 43 has received a command to start the investigation, it determines whether or not there are multiple substrate processing apparatuses 1 to be investigated (step S34).

[0104] When there is only one substrate processing apparatus 1 to be inspected, the score presenting unit 43 proceeds to the processing of step S36, which will be described later. On the other hand, when there are multiple substrate processing apparatuses 1 to be inspected (uninspected substrate processing apparatuses 1), the score presenting unit 43 causes the display unit 4a to display the abnormality score of each of the inspected substrate processing apparatuses 1 in association with the substrate processing apparatus 1 (step S35). When there is only one substrate processing apparatus 1 to be inspected, the score presenting unit 43 may cause the display unit 4a to display the abnormality score of the substrate processing apparatus 1. Furthermore, the score presenting unit 43 may determine an inspection priority order for multiple uninspected substrate processing apparatuses 1 for which an inspection request has been received, based on the multiple abnormality scores. In this case, the score presenting unit 43 may cause the display unit 4a to display the determined priority order.

[0105] Thereafter, in response to an operation of the operation unit 4b by the administrator, the CPU of the management device 4 performs an investigation process for one of the one or more substrate processing apparatuses 1 to be investigated (step S36). Furthermore, the CPU of the management device 4 transmits a work instruction to a maintenance worker to the one substrate processing apparatus 1 based on the result of the investigation process (step S37).

[0106] Next, the CPU of the management device 4 determines whether or not it has received a termination command to stop the operation of the management device 4 (step S38). If the CPU of the management device 4 has not received a termination command, it proceeds to the processing of step S30. On the other hand, if the CPU of the management device 4 has received a termination command, it ends the series of processes.

[0107] In step S36, the investigation request and the abnormality score for the substrate processing apparatus 1 for which the investigation process has been performed are erased from the memory of the management apparatus 4 upon completion of the investigation process. Alternatively, in step S36, the substrate processing apparatus 1 for which the investigation process has been performed is excluded from candidates for investigation targets.

[0108] In step S38, if there is a substrate processing apparatus 1 that has not been inspected among the one or more substrate processing apparatuses 1 that have been inspected, the inspection request is held in a stored state in the memory of the management apparatus 4. Alternatively, in step S38, the substrate processing apparatus 1 that has been inspected but has not undergone inspection processing remains as a candidate for inspection.

[0109] <7> Effects of the First Embodiment In the above-described management device 4, when two or more requests for investigation are made for two or more substrate processing apparatuses 1, the degree of abnormality of the two or more substrate processing apparatuses 1 for which investigation has been requested is displayed on the display unit 4a as an abnormality score. In this case, the manager can easily grasp the degree of abnormality of the two or more substrate processing apparatuses 1 for which investigation has been requested based on the displayed abnormality score. Furthermore, the abnormality score is calculated based on the invariant relationship between multiple pieces of processing information. Therefore, the manager can easily and appropriately grasp the investigation priority for the multiple substrate processing apparatuses 1 for which investigation has been requested in a short period of time.

[0110] Furthermore, in the substrate processing apparatus management system 2, the abnormality scores calculated by the information analysis device 3 are transmitted to the substrate processing apparatus 1 corresponding to the abnormality scores. In each substrate processing apparatus 1, the abnormality scores corresponding to the substrate processing apparatus 1 are stored in chronological order. This allows the maintenance worker in charge of each substrate processing apparatus 1 to easily check the change over time in the abnormality scores stored in the substrate processing apparatus 1.

[0111] 2. Second embodiment Among the plurality of combinations of the plurality of pieces of processing information, there are combinations that should be given special importance when grasping the degree of abnormality in the substrate processing apparatus 1, and combinations that do not need to be given special importance.

[0112] For example, when considering the first abnormal state, the combination of "a. Chemical solution concentration" and "b. Chemical solution supply amount" can be said to be a combination that is highly relevant in calculating the abnormality score in order to avoid the continuation of the first abnormal state. Also, when considering the second abnormal state, the combination of "c. Concentration detection input signal" and "d. Concentration detection output signal" can be said to be a combination that is highly relevant in calculating the abnormality score in order to avoid the continuation of the second abnormal state. On the other hand, the combinations of processing information that do not need to be considered for the first to fifth abnormal states can be said to be combinations that are less relevant in calculating the abnormality score.

[0113] In the substrate processing apparatus management system 2 according to the first embodiment, the deviation is a difference value between the actually collected processing information data and the predicted processing information data. Therefore, the deviation calculated in the above embodiment does not take into account multiple types of abnormal states of the substrate processing apparatus 1, which should essentially be emphasized when calculating the abnormality score. Therefore, the substrate processing apparatus management system according to the second embodiment has the following configuration.

[0114] The following describes differences between the substrate processing apparatus management system according to the second embodiment and the substrate processing apparatus management system 2 of FIG. 2 according to the first embodiment. FIG. 8 is a diagram for explaining the functional configuration of the substrate processing apparatus management system according to the second embodiment. As shown in FIG. 8, in the substrate processing apparatus management system 2 according to this embodiment, the information analysis device 3 includes, as a functional unit, a weight storage unit 39 in addition to the components (31 to 34) described in the first embodiment. The weight storage unit 39 is realized by the CPU of the information analysis device 3 according to the second embodiment executing a second management program stored in a memory. Note that the weight storage unit 39 may be realized by hardware such as an electronic circuit.

[0115] The weight storage unit 39 stores a plurality of weights respectively corresponding to a plurality of combinations of a plurality of pieces of processing information. FIG. 9 is a diagram showing an example of a plurality of weights stored in the weight storage unit 39 of FIG. 8. In this embodiment, six abnormality levels from "Level 1" to "Level 6" are set for a plurality of types of abnormal states that may occur in the substrate processing apparatus 1. The six abnormality levels are "Level 1", "Level 2", "Level 3", "Level 4", "Level 5" and "Level 6" in order of increasing degree of abnormality. become Furthermore, a weight corresponding to the abnormality level of each abnormal state is assigned to a combination of processing information that is highly related to each abnormal state.

[0116] Specifically, the fifth abnormal state is assigned the highest "Level 6." Then, a weight of "6" is assigned to eight combinations of "a. Chemical concentration," "b. Chemical supply amount," "h. Chemical supply valve opening," and "i. Cleaning solution discharge valve opening" that are highly related to the fifth abnormal state.

[0117] Furthermore, the second highest "fifth level" is set for the first abnormal condition. Furthermore, a weight of "5" is assigned to the combination (two combinations) of "a. chemical solution concentration" and "b. chemical solution supply amount" that are highly related to the first abnormal condition.

[0118] Furthermore, the third highest level, "fourth level," is set for the third abnormal state. Furthermore, a weight of "4" is assigned to the combination (two combinations) of "e. motor rotation speed" and "f. power supplied to the motor," which are highly related to the third abnormal state.

[0119] Furthermore, the fourth highest "third level" is set for the second abnormal state. Furthermore, a weight of "3" is assigned to the combination (two combinations) of "c. concentration detection input signal" and "d. concentration detection output signal" that are highly related to the second abnormal state.

[0120] Furthermore, the fourth abnormal state is set to the fifth highest level, "Level 2." Furthermore, a weight of "2" is assigned to the four combinations of "a. Chemical solution concentration," "b. Chemical solution supply amount," and "g. Chemical solution additional amount," which are highly related to the fourth abnormal state.

[0121] Furthermore, the lowest "first level" is set for abnormal conditions other than the first to fifth abnormal conditions. Then, a weight of "1" is assigned to multiple combinations of multiple pieces of processing information that are less related to multiple abnormal conditions including the first to fifth abnormal conditions.

[0122] 2, the score calculation unit 32 of Fig. 8 calculates a difference value between the data of actually collected processing information and the data of predicted processing information for each of a plurality of combinations of a plurality of pieces of processing information. Furthermore, the score calculation unit 32 of Fig. 8 calculates, as a deviation, a value (multiplication value) obtained by multiplying the calculated difference value by a weight assigned to the combination, based on a plurality of weights stored in the weight storage unit 39. Furthermore, when all deviation degrees have been calculated, the score calculation unit 32 of Fig. 8 calculates the sum of the calculated deviation degrees as an anomaly score.

[0123] As described above, in the substrate processing apparatus management system 2 according to the second embodiment, the abnormality score is calculated based on the deviation degree including the weighting amount according to the abnormality level, thereby allowing the manager of the multiple substrate processing apparatuses 1 to more appropriately grasp the degree of abnormality of each substrate processing apparatus 1 by referring to the calculated abnormality score.

[0124] 3. Other embodiments (1) In the substrate processing apparatus management system 2 according to the above embodiment, the information collecting unit 31 may repeatedly accumulate and reset the collected processing information every time a predetermined time elapses. Furthermore, the information collecting unit 31 may provide the score calculating unit 32 with the processing information accumulated up until just before being reset every time a predetermined time elapses. In this case, the score calculating unit 32 calculates an abnormality score based on the accumulated multiple pieces of processing information. This reduces the influence of noise, etc., that occurs when each piece of processing information is collected on the abnormality score.

[0125] (2) In the substrate processing apparatus management system 2 according to the above embodiment, the series of processes performed by the information analysis apparatus 3 may be performed by the management apparatus 4. Also, the series of processes performed by the information analysis apparatus 3 may be performed by any one of the substrate processing apparatuses 1. In this case, the information analysis apparatus 3 is not necessary.

[0126] (3) In the substrate processing apparatus management system 2 according to the above embodiment, the information analysis device 3 may receive investigation requests from multiple substrate processing apparatuses 1 and transmit the received investigation requests and the abnormality scores corresponding to the investigation requests to the management device 4.

[0127] (4) In the substrate processing apparatus management system 2 according to the above embodiment, the information analysis device 3 does not have to transmit the abnormality scores to the plurality of substrate processing apparatuses 1. In this case, the management device 4 that receives an investigation request from one of the plurality of substrate processing apparatuses 1 may obtain the abnormality score of the substrate processing apparatus 1 that received the investigation request from the information analysis device 3.

[0128] (5) In the above embodiment, the substrate processing apparatuses 1A-1E have the same configuration, but the present invention is not limited to this. Some or all of the substrate processing apparatuses 1A-1E may have different configurations. Furthermore, at least one of the substrate processing apparatuses 1A-1E may be a single-wafer substrate cleaning apparatus rather than a batch-type apparatus, or may be configured to perform processes other than cleaning processes.

[0129] (6) In addition to or instead of the multiple specific examples described in the above embodiments, the multiple processing information may include at least one physical quantity among the temperature of the fluid supplied to the substrate W, the temperature inside the processing chamber in which the substrate W is accommodated, the pressure inside the processing chamber in which the substrate W is accommodated, the pressure of the gas exhausted from the processing chamber in which the substrate W is accommodated, and the movement speed of the substrate transported by the robot.

[0130] Furthermore, the plurality of pieces of processing information may include information relating to at least one of a drive pulse signal for driving a robot that transports the substrate W and an output signal of a detector provided on the robot that transports the substrate W.

[0131] (7) In the substrate processing apparatus management system 2 according to the above embodiment, the score calculation unit 32 may further calculate an integral value of the abnormality score by repeatedly accumulating and resetting the abnormality score every time a predetermined time period elapses. In this case, the alarm transmission unit 34 may determine whether the integral value of the abnormality score exceeds a predetermined second threshold value. Furthermore, if the integral value of the abnormality score exceeds the second threshold value, the alarm transmission unit 34 may transmit an alarm to the substrate processing apparatus 1 corresponding to the integral value of the abnormality score. In this case, the maintenance worker of each substrate processing apparatus 1 can more accurately grasp the occurrence of an abnormality in the substrate processing apparatus 1 under his / her care.

[0132] 4. Correspondence between each element of the claims and each part of the embodiment Below, examples of correspondence between each element of the claims and each element of the embodiments will be described, but the present invention is not limited to the following examples. Various other elements having the configuration or function described in the claims can also be used as each element of the claims.

[0133] In the above embodiment, the substrate processing apparatuses 1, 1A to 1E are examples of multiple substrate processing apparatuses, the substrate processing apparatus management system 2 is an example of a substrate processing apparatus management system, the information collection unit 31 is an example of an information collection unit, the score calculation unit 32 is an example of a score calculation unit, and the request receiving unit 41 is an example of a request receiving unit.

[0134] Furthermore, the score acquisition unit 42 is an example of a score acquisition unit, the score presentation unit 43 is an example of a priority presentation unit, the multiple abnormality scores and investigation priorities of the multiple substrate processing apparatuses 1 are examples of priority information, the score transmission unit 33 is an example of a score transmission unit, the alarm transmission unit 34 is an example of an alarm transmission unit, and the information analysis device 3 is an example of an information analysis device. [Explanation of symbols]

[0135] 1, 1A to 1E... substrate processing apparatus, 2... substrate processing apparatus management system, 3... information analysis device, 4... management device, 4a... display unit, 4b... operation unit, 11... processing tank, 12... substrate holding unit, 13... lifting device, 14... cleaning liquid generating device, 14a: storage tank, 15... liquid supply pipe, 16... pump, 17, 19... valve, 18... liquid discharge pipe, 20... concentration meter, 30... transport robot, 31... information collection unit, 32... score calculation unit, 33... score transmission unit, 34... alarm transmission unit, 39... weight memory unit, 40... control device, 41... request reception unit, 42... score acquisition unit, 43... score presentation unit, 91... chemical liquid supply pipe, 92... pure water supply pipe, 93... additional chemical liquid supply pipe, 94... drain pipe, W... substrate

Claims

1. A substrate processing apparatus management system used to manage a plurality of substrate processing apparatuses, an information collecting unit that collects a plurality of pieces of processing information indicating operations or states related to substrate processing from each of the substrate processing apparatuses; a score calculation unit that calculates, for each substrate processing apparatus, a degree of abnormality of the substrate processing apparatus as an abnormality score based on the invariant relationship between the plurality of pieces of processing information and the plurality of pieces of processing information collected from the substrate processing apparatus; a request receiving unit that receives an investigation request for the abnormality from each substrate processing apparatus; a score acquiring unit that acquires two or more abnormality scores calculated for two or more substrate processing apparatuses that have sent investigation requests to the request receiving unit; a priority presentation unit that presents priority information regarding the priority order in which the two or more investigation requests should be responded to based on the two or more abnormality scores acquired by the score acquisition unit.

2. the priority order information includes two or more abnormality scores acquired by the score acquisition unit, 2 . The substrate processing apparatus management system according to claim 1 , wherein the priority order presenting unit presents the two or more abnormality scores acquired by the score acquiring unit in association with the two or more substrate processing apparatuses, respectively.

3. 3. The substrate processing apparatus management system according to claim 1, further comprising a score transmitting unit that transmits the abnormality score calculated by the score calculating unit to the substrate processing apparatus corresponding to the abnormality score.

4. A substrate processing apparatus management system as described in any one of claims 1 to 3, further comprising an alarm sending unit that determines whether the abnormality score calculated for each substrate processing apparatus exceeds a predetermined threshold value, and sends an alarm to the substrate processing apparatus corresponding to the abnormality score if the abnormality score exceeds the threshold value.

5. the information collecting unit repeatedly accumulates and resets the plurality of pieces of processing information collected every time a certain period of time elapses; A substrate processing apparatus management system as described in any one of claims 1 to 4, wherein the score calculation unit calculates, for each substrate processing apparatus, the degree of abnormality of the substrate processing apparatus as the abnormality score based on an invariant relationship between the multiple pieces of processing information and multiple pieces of processing information generated by the substrate processing apparatus and accumulated by the information collection unit.

6. A plurality of combinations of two different pieces of processing information are determined for the plurality of pieces of processing information; each combination includes first processing information and second processing information; The score calculation unit for each combination, based on the second processing information collected under predetermined conditions, the first processing information predicted under the predetermined conditions is generated as first predicted processing information, and a degree of deviation between the generated first predicted processing information and the first processing information actually collected by the information collecting unit is calculated as a first deviation degree; for each combination, based on the first processing information collected under the predetermined conditions, the second processing information predicted under the predetermined conditions is generated as second predicted processing information, and a degree of deviation between the generated second predicted processing information and the second processing information actually collected by the information collecting unit is calculated as a second deviation degree; 6. The substrate processing apparatus management system according to claim 1, wherein the abnormality score is calculated based on a plurality of first deviation degrees and a plurality of second deviation degrees calculated for each of the plurality of combinations.

7. The substrate processing apparatus management system according to claim 6 , wherein the score calculation unit calculates, as the abnormality score, a sum of the plurality of first deviation degrees and the plurality of second deviation degrees calculated for the plurality of combinations.

8. a predetermined weight is assigned to each of the plurality of combinations according to a relationship between the combination and a plurality of types of abnormal states of the substrate processing apparatus; 8. The substrate processing apparatus management system according to claim 6, wherein the score calculation unit calculates the plurality of first deviation degrees and the plurality of second deviation degrees based on the plurality of combinations and the plurality of weights.

9. 9. The substrate processing apparatus management system according to claim 1, wherein the plurality of processing information includes at least one physical quantity selected from the group consisting of a supply amount of fluid supplied to the substrate, a temperature of the fluid supplied to the substrate, a concentration of the processing liquid supplied to the substrate, a temperature inside the processing chamber in which the substrate is accommodated, a pressure inside the processing chamber in which the substrate is accommodated, a pressure of gas exhausted from the processing chamber in which the substrate is accommodated, and a moving speed of the substrate transported by a robot.

10. A substrate processing apparatus management system as described in any one of claims 1 to 9, wherein the plurality of processing information includes information regarding at least one of a drive pulse signal that drives a robot that transports a substrate, an output signal of a detector provided on the robot that transports the substrate, and an opening / closing signal given to a control valve.

11. Each substrate processing apparatus is a substrate cleaning apparatus that cleans a substrate using a cleaning liquid, A substrate processing apparatus management system according to any one of claims 1 to 10, wherein the plurality of processing information includes at least one of the amount of cleaning liquid supplied to the substrate, the temperature of the cleaning liquid supplied to the substrate, and the concentration of the cleaning liquid supplied to the substrate.

12. 1. A substrate processing apparatus management method used to manage a plurality of substrate processing apparatuses, comprising: collecting a plurality of pieces of processing information from each of the substrate processing apparatus indicative of operations or conditions related to processing of the substrate; calculating, for each substrate processing apparatus, a degree of abnormality of the substrate processing apparatus as an abnormality score based on the invariant relationships among the plurality of pieces of processing information and the plurality of pieces of processing information collected from the substrate processing apparatus; receiving a request for investigation of the abnormality from each substrate processing apparatus; acquiring two or more abnormality scores calculated for the two or more substrate processing apparatuses that have sent the investigation requests; and presenting priority information regarding the priorities for responding to the two or more investigation requests based on the two or more abnormality scores obtained by the obtaining step.

13. A substrate processing apparatus management program that causes a computer to execute a process for managing a plurality of substrate processing apparatuses using an information analysis apparatus, The information analysis device an information collecting unit that collects a plurality of pieces of processing information indicating operations or states related to substrate processing from each of the substrate processing apparatuses; a score calculation unit that calculates, for each substrate processing apparatus, a degree of abnormality of the substrate processing apparatus as an abnormality score based on the invariant relationship between the plurality of pieces of processing information and the plurality of pieces of processing information collected from the substrate processing apparatus; The process of managing the plurality of substrate processing apparatuses includes: A process of receiving an investigation request regarding an abnormality from each substrate processing apparatus; A process of acquiring two or more abnormality scores calculated for two or more substrate processing apparatuses that have sent an investigation request; and a process of presenting priority information regarding priorities for responding to the two or more investigation requests based on the two or more abnormality scores obtained by the obtaining process.

Images