Openable and closable support mechanism and reticle container using the same.

Abstract

To provide an openable / closable support mechanism and a reticle container using the same.SOLUTION: The present invention provides an openable support mechanism suitable for an inner pod base of a dual reticle container. A switch (open / close function) for a static electricity dissipation conduction path is established between the openable support mechanism and the inner pod base. When a support of the openable support mechanism is pressed down by the reticle and contacts the inner pod base, the static electricity dissipation conduction path is closed, allowing static electricity accumulated on a front surface of the reticle to be conducted and dissipated. Conversely, when the support does not contact the inner pod base, the static electricity dissipation conduction path is opened. In this way, many problems, such as carbon contamination (C-burst) and damage, caused by an arcing phenomenon due to a voltage difference between the static electricity of the reticle and a conventional support mechanism, which causes electrical breakdown of the support mechanism, can be prevented.SELECTED DRAWING: Figure 3

Description

Technical Field

[0001] The present invention relates to a support mechanism for a reticle container, and more particularly, to an open / close support mechanism and a reticle container applying the same.

Background Art

[0002] Current extreme ultraviolet (EUV) reticles are charged with residual static electricity (e.g., positive charge) on the front surface during exposure. Conventional reticle supports are fixed within the inner pod (EIP) of the reticle container and are configured to provide electrostatic discharge (ESD). When the inner pod is placed and opened within the scanner, an electrical conduction path is formed when the support, the inner pod base, and the robot arm are electrically connected to each other and connected to ground. In this case, at the moment when the reticle is returned to the inner pod base and contacts the support, the static electricity remaining on the reticle surface is diffused via the electrical conduction path.

[0003] In the case of a reticle exposed multiple times, since charges continue to accumulate, there is a significant amount of charge on the reticle surface. During the return of such a reticle to the inner pod base having electrostatic diffusibility, due to the excessive voltage between the reticle and the support and the principle that positive and negative charges attract each other, an arcing phenomenon is likely to occur when the reticle approaches the support, resulting in electrical breakdown of the support and related problems such as carbon contamination (C-Burst) and damage to the support.

[0004] When the entire support is made of an insulating material (without electrostatic diffusion ability), the static electricity accumulated on the reticle cannot be diffused via any path, and a significant potential difference occurs between the reticle and the support. In this case, if a substance of the metal plating layer of the reticle remains on the surface of the support, arcing is likely to occur, and the damage caused thereby is much more serious than that of a support using an electrostatic diffusible material. Therefore, how to solve the problem of arcing and effectively diffuse the static electricity on the reticle is an urgent issue.

Summary of the Invention

[0005] In view of the above problems, the present invention proposes an openable and closable support mechanism suitable for the inner pod base of a dual reticle container, which includes a seat provided on the inner pod base, a support made of an electrostatic dissipative material that penetrates through the seat to near the inner pod base, and an insulating spacer that isolates the seat so as not to contact the support, and causes the support to reciprocate relative to the seat to contact the inner pod base and establish a conductive path for electrostatic dissipation, or maintains a pitch between the support and the inner pod base to prevent the establishment of the conductive path for electrostatic dissipation.

[0006] In a specific embodiment, when the support is not subjected to an external force, it separates from the inner pod base, maintaining the pitch between the support and the inner pod base and not establishing the conductive path for electrostatic dissipation; when the support is subjected to an external force, it comes into contact with the inner pod base and establishes the conductive path for electrostatic dissipation.

[0007] In a specific embodiment, the seat body includes a mounting portion and a mounting hole that penetrates the mounting portion and the seat body, and the insulating spacer includes a contact portion that abuts against and is supported on the upper surface of the mounting portion and a connecting portion that fixes the insulating spacer to the mounting portion through the mounting hole.

[0008] In a specific embodiment, the support includes a mounting portion, a contact portion, and a pin portion located between the mounting portion and the contact portion, the insulating spacer having a through hole communicating with the mounting hole, the pin portion being provided through the through hole and the mounting hole, and the mounting portion being positioned on the upper surface of the contact portion such that the contact portion is adjacent to the inner pod base.

[0009] In a specific embodiment, the insulating spacer includes at least one mounting structure located outside the connecting portion, the mounting structure passing through the extension hole of the mounting hole and then being fixed to the lower surface of the mounting portion.

[0010] In a specific embodiment, a mounting groove is provided on the upper surface of the mounting portion, the connecting portion of the insulating spacer is provided within the mounting groove, and the contact portion contacts and supports the upper surface of the periphery of the mounting groove, thereby fixing the insulating spacer within the mounting portion.

[0011] In a specific embodiment, the insulating spacer is made of an elastic material, and when an external force is applied to the support or when it is released from the external force, the insulating spacer is elastically compressed and deformed or elastically returned to its original shape, causing the support to reciprocate.

[0012] In a specific embodiment, the present invention further includes an insulating retaining element positioned between the seat and the support to prevent the support from coming out of the space between the seat and the insulating spacer.

[0013] In a specific embodiment, the support includes a mounting portion, a contact portion, and a pin portion located between the mounting portion and the contact portion, and the insulating retaining element is fitted onto the pin portion.

[0014] In a specific embodiment, the seat body includes a mounting portion and a mounting hole that penetrates the mounting portion and the seat body, and a mounting groove is provided on the upper surface of the mounting portion; the support body includes a mounting portion, a contact portion, and a pin portion located between the mounting portion and the contact portion; the insulating spacer is provided in the mounting groove and has a through hole communicating with the mounting hole; the pin portion is provided through the through hole and the mounting hole, and the lower surface of the mounting portion is positioned on the upper surface of the insulating spacer so that the contact portion is adjacent to the inner pod base.

[0015] In a specific embodiment, electrostatic dissipation elements are further provided at the top and / or bottom of the support.

[0016] In a specific embodiment, the support and the inner pod base establish a conductive path for static electricity dissipation, and the conductive path for static electricity dissipation is connected to a robot arm, which discharges static electricity from the robot arm to the ground.

[0017] The present invention can be better understood by referring to the following drawings and description. Non-limiting and non-exclusive embodiments are depicted with reference to the drawings below. The components in the drawings do not necessarily have to be of actual size, but are intended to illustrate the structure and principle. [Brief explanation of the drawing]

[0018] [Figure 1] This is a perspective view of an inner pod base provided with an embodiment of the present invention. [Figure 2] This is a magnified view of area A in Figure 1. [Figure 3] This is an exploded view of a support mechanism according to the first embodiment of the present invention. [Figure 4A] This is a schematic cross-sectional view along line aa in Figure 2 of the support mechanism according to the first embodiment of the present invention when the conductive path for electrostatic dissipation is open. [Figure 4B] This is a schematic cross-sectional view along line aa in Figure 2 of the support mechanism according to the first embodiment of the present invention when the conductive path for electrostatic dissipation is closed. [Figure 5] This is an exploded view of a support mechanism according to a second embodiment of the present invention. [Figure 6A] This is a schematic cross-sectional view of a support mechanism according to a second embodiment of the present invention when a conductive path for electrostatic dissipation is open. [Figure 6B] This is a schematic cross-sectional view of a support mechanism according to a second embodiment of the present invention when the conductive path for electrostatic dissipation is closed. [Figure 7] This is an exploded view of a support mechanism according to a third embodiment of the present invention. [Figure 8A] This is a schematic cross-sectional view of a support mechanism according to a third embodiment of the present invention when a conductive path for electrostatic dissipation is open. [Figure 8B] Schematic cross-sectional view of the support mechanism according to the third embodiment of the present invention when the conduction path for electrostatic diffusion is closed. [Figure 9A] Schematic cross-sectional view of the support mechanism according to the first modification of the present invention when the conduction path for electrostatic diffusion is open. [Figure 9B] Schematic cross-sectional view of the support mechanism according to the first modification of the present invention when the conduction path for electrostatic diffusion is closed. [Figure 10A] Schematic cross-sectional view of the support mechanism according to the second modification of the present invention when the conduction path for electrostatic diffusion is open. [Figure 10B] Schematic cross-sectional view of the support mechanism according to the second modification of the present invention when the conduction path for electrostatic diffusion is closed. [Figure 11A] Schematic cross-sectional view of the support mechanism according to the third modification of the present invention when the conduction path for electrostatic diffusion is open. [Figure 11B] Schematic cross-sectional view of the support mechanism according to the third modification of the present invention when the conduction path for electrostatic diffusion is closed.

Embodiments for Carrying Out the Invention

[0019] Referring to FIG. 1, the present invention provides a reticle container having a reticle support mechanism capable of opening and closing a path for electrostatic diffusion. The reticle container is a reticle dual pod including an outer pod and an inner pod housed in the outer pod. The reticle support mechanism of the present invention is suitable for the base of the inner pod, and in the embodiment of FIG. 1, only the inner pod base 100 included in the inner pod is shown, and the lid of the inner pod is omitted. A plurality of support mechanisms 20 for placing the reticle R are provided on the inner pod base 100.

[0020] Referring to Figure 2, the four corners of the reticle R correspond to four support mechanisms 20, respectively. The inner pod base 100 in this embodiment has grooves, and the support mechanisms 20 are arranged in the grooves. The present invention is not limited to the inner pod base 100 having grooves, and the area on which the reticle is placed and the area on which the support mechanisms 20 are provided may be on the same plane. The support mechanism 20 includes a seat 21, an insulating spacer 22, and a support body 23. The seat 21 is provided on the inner pod base 100 of the reticle container, the insulating spacer 22 is provided on the seat 21, and the support body 23 is provided adjacent to the inner pod base 100 via the insulating spacer 22 and functions as a switch for the electrostatic discharge path. The reticle R is placed on the support body 23. The insulating spacer 22 is located between the support body 23 and the seat 21 and is used to isolate the seat 21 from contact with the support body 23 and to prevent the seat 21 and the support body 23 from being electrically connected. The insulating spacer 22 determines whether the support 23 and the inner pod base 100 come into contact. When the insulating spacer 22 is not deformed, the support 23 and the inner pod base 100 do not come into direct contact. When the insulating spacer 22 is deformed, the support 23 and the inner pod base 100 come into direct contact, but this will be described in detail later. Referring to Figure 3, this is an exploded view of the support mechanism 20 of the first embodiment of the present invention. The seat body 21 includes a base 215, a restricting portion 212, and a mounting portion 211. In this embodiment, the base 215 includes two restricting portions 212 that extend upward from both ends. The mounting portion 211 protrudes upward from the base 215. The mounting portion 211 has a mounting hole 213 in the center that penetrates the base 215 and the mounting portion 211, and the insulating spacer 22 is placed in the mounting hole 213.

[0021] The insulating spacer 22 is basically made of a material that has electrical insulating and elastic properties. When an external force is applied to the support 23 or when it is released from an external force, the insulating spacer 22 is elastically compressed and deformed or elastically returned to its original shape, causing the support 23 to reciprocate. The insulating spacer 22 includes a contact portion 221 and a connecting portion 222. The connecting portion 222 can connect the insulating spacer 22 and the seat 21 through a mounting hole 213. At this time, the contact portion 221 is supported in contact with the upper surface of the mounting portion 211, and the contact portion 221 is positioned between the mounting portion 211 and a part of the support 23. The insulating spacer 22 further includes through holes 225 that penetrate the upper and lower surfaces of the insulating spacer 22. The through holes 225 correspond to the positions of the mounting holes 213 and are in communication with each other, and a part of the support 23 is inserted through the through holes 225 and the mounting holes 213. In this embodiment, the insulating spacer 22 further includes a mounting structure 224 that protrudes outward from the surface of the connecting portion 222. The mounting hole 213 has an extension hole 214 corresponding to the mounting structure 224, through which the mounting structure 224 passes and which is used to mount the insulating spacer 22 into the mounting hole 213. Preferably, the lower edge of the insulating spacer 22 further includes an interlocking portion 223 for interlocking the support 23 and the insulating spacer 22 to prevent the support 23 from coming off upward.

[0022] The support 23 is made of an electrostatic dissipative material. The support 23 includes a mounting portion 231, a contact portion 234, and a pin portion 232 positioned between the mounting portion 231 and the contact portion 234. The mounting portion 231 is used to mount the reticle R. The mounting portion 231 may have an arc or a pattern, which reduces the contact area with the reticle R by making point contact between the mounting portion 231 and the reticle R, thereby reducing dust generation. The pin portion 232 is provided so that the support 23 is adjacent to the insulating spacer 22 through a through hole 225 in the insulating spacer 22, the contact portion 234 of the support 23 is inserted into a mounting hole 213 and positioned adjacent to the inner pod base 100, and the mounting portion 231 is located on the upper surface of the contact portion 221.

[0023] The support mechanism 20 further includes an insulating retaining element 233 provided between the seat body 21 and the support body 23. In this embodiment, the insulating retaining element 233 is provided on the pin portion 232 of the support body 23 and engages with the engagement portion 223 of the insulating spacer 22 to prevent the support body 23 from detaching from the insulating spacer 22. Furthermore, since the insulating spacer 22 is fixed to the seat body 21 by the contact portion 221 and the mounting structure 224, the support body 23 can be prevented from detaching from the seat body 21 and the insulating spacer 22 by a tight coupling method. The insulating retaining element 233 is suitable for any form of insulating spacer, can be combined or coupled as desired, and is not limited to the form disclosed in this embodiment.

[0024] Continuing the above description of the support mechanism 20, when the support mechanism 20 is used on the inner pod base 100, the seat body 21 can be fixed to the inner pod base 100 in any known way. Next, the mounting structure 224 of the insulating spacer 22 is aligned with the extension hole 214 of the mounting hole 213 of the seat body 21 and inserted, and then the insulating spacer 22 is rotated so that there is a mismatch between the mounting structure 224 and the extension hole 214, so that the insulating spacer 22 is fixed to the seat body 21. Finally, the support body 23 is inserted into the through hole 225 of the insulating spacer 22, and a small external force is applied to pass the insulating retaining element 233 through the lower edge of the insulating spacer 22 and engage with the engagement portion 223, at which point the contact portion 234 of the support body 23 protrudes from the mounting hole 213 of the seat body 21 and is adjacent to the inner pod base 100. The mounting sequence includes, but is not limited to, the steps described above, and the mounting sequence of each element can be adjusted according to the needs.

[0025] In this embodiment, the support 23 and the seat 21 have an electrostatic dissipation function and can be made of, for example, an electrostatic dissipative material or have an electrostatic dissipative plating layer formed on their surface, and the insulating spacer 22 is made of an insulating material or has an insulating plating layer formed on its surface. Preferably, the surface resistivity of the support 23 and the seat 21 is 10 4 Ω / sq~10 10 The resistance is Ω / sq, and the surface resistivity of the insulating spacer 22 is 10 10The impedance is Ω / sq or greater. In this embodiment, the material for the insulating spacer 22 may be PE (polyethylene), PP (polypropylene), PET (polyethylene terephthalate), TPR (thermoplastic elastomer), TPEE (polyester-based thermoplastic elastomer), FKM (fluororubber), or a combination thereof. The material for the support 23 and the seat 21 may be Peek (polyether ether ketone) or Pi (polyimide), or a combination thereof.

[0026] The insulating spacer 22 has an elastic structure, and when downward pressure (or external force) generated by leaving the reticle unattended is applied to the support 23, the insulating spacer 22 is supported in contact with the seat 21 and the support 23, causing elastic structural deformation, such as elastic compression deformation, which allows the support 23 to reciprocate relative to the seat 21, and the support 23 moves downward relative to the seat 21 until the contact portion 234 contacts the inner pod base 100, thereby establishing a conductive path for static electricity dissipation. Static electricity on the reticle can be dissipated from the support 23 to the inner pod base 100. If the inner pod base 100 is inside the scanner, the scanner has a robotic arm and is grounded, and after the inner pod base 100 contacts the robotic arm, it becomes one of the conductive paths for static electricity dissipation via the robotic arm and ground, thus having a static electricity dissipation function.

[0027] When the reticle is removed from the support 23, or when the reticle is not yet placed on the support 23, the insulating spacer 22 is not in contact with the seat 21 and the support 23. At this time, it is released from external force and returns to its original elastic height, maintaining a pitch d between the contact portion 234 of the support 23 and the inner pod base 100, thus not establishing a conductive path for electrostatic dissipation. Therefore, by isolating the seat 21 from contact with the support 23 via the insulating spacer 22, and by determining whether the support 23 and the inner pod base 100 are in contact with each other depending on whether the support 23 is subjected to an external force, the technical effect and purpose of the switch (on / off) for establishing a conductive path for electrostatic dissipation between the support mechanism 20 and the inner pod base 100 are achieved.

[0028] As mentioned above, referring to Figure 4A, after exposure, residual static electricity, such as positive charge, is present on the front surface of the reticle R. When the support 23 is not subjected to an external force pressing from the reticle R, there is a pitch d between the support 23 and the inner pod base 100. In this case, the support 23 does not have the ability to attract the static electricity on the front surface of the reticle R and cannot conduct through the ground GND, so it cannot induce static electricity. In other words, the support 23 cannot attract the positive charge of the reticle R from the ground side to the ground GND, so a conductive path for static electricity dissipation is not established at this time.

[0029] Referring to Figure 4B, when the reticle R is placed on the support 23, the support 23 is subjected to an external force and pushed downward, causing the insulating spacer 22 to elastically deform until the contact portion 234 of the support 23 contacts the surface of the inner pod base 100. At this time, a conductive path for electrostatic discharge is established. At this time, the support 23 has the ability to attract the electrostatic discharge from the front of the reticle R, establishing a conductive path for electrostatic discharge between the support 23, the inner pod base 100, and the ground GND, thereby dissipating the electrostatic discharge from the reticle R.

[0030] The present invention aims to solve many problems, such as carbon contamination (C-burst) and damage to the support mechanism caused by an arcing phenomenon due to voltage difference when approaching a support mechanism while a large amount of static electricity has accumulated on the reticle surface, thereby causing electrical destruction of the support mechanism, by establishing the opening and closing of a conductive path for static electricity dissipation. Furthermore, it allows for the rapid dissipation of static electricity remaining on the reticle surface after exposure.

[0031] (Second embodiment) Figure 5 shows a support mechanism 30 according to a second embodiment of the present invention. Since the elements and reference numerals of the support mechanism 30 are the same as those of the support mechanism 20 of the first embodiment and have the same function, only the structural differences will be described here. The support mechanism 30 includes a seat body 21, an insulating spacer 22, an insulating anti-detachment element 34, and a support body 23. A groove 314 is provided around the upper surface of the mounting hole 213. The through hole 225 of the insulating spacer 22 penetrates the upper and lower surfaces of the insulating spacer 22, corresponds to the position of the mounting hole 213, and communicates with each other, with a part of the support body 23 passing through the through hole 225 and the mounting hole 213.

[0032] The insulating spacer 22 has an electrically insulating contact portion 221 made of an elastic material at its top, which allows the support 23 to reciprocate relative to the seat 21 when an external force is applied to or released from the support 23. The connecting portion 222 of the insulating spacer 22 corresponds to the shape of the groove 314, and the insulating spacer 22 and the seat 21 can be fitted and fixed together. The insulating retaining element 34 in this embodiment is a ring-shaped member made of an elastic material, and the pin portion 232 of the support 23 has a groove 333 surrounding its surface so that the insulating retaining element 34 is fitted into the groove 333.

[0033] Referring simultaneously to Figures 6A and 6B, the base 31 is provided with a limiting structure 316 located inside the mounting hole 213, for contacting and supporting the insulating retaining element 34. After the pin portion 232 of the support 23 is inserted through the through hole 225 of the insulating spacer 22 and the mounting hole 213 of the base 31, the limiting structure 316 contacts and supports the insulating retaining element 34 to prevent the support 23 from coming off. Since the support 23 functions as a switch for the electrostatic discharge path, when an external force is applied to the support 23 or when it is released from an external force, the insulating spacer 22 is elastically compressed and deformed or elastically returned to its original state, causing the support 23 to reciprocate. As shown in Figure 6A, when the insulating spacer 22 is released from the external force, it returns to its original elastic height, maintaining a pitch d between the contact portion 234 of the support 23 and the inner pod base 100, and not establishing a conductive path for electrostatic discharge. To prevent the support body 23 from detaching upward from the seat body 31, the insulating spacer 22, or any of these, the limiting structure 316 contacts and supports the insulating retaining element 34, thereby restricting its movement and holding the insulating retaining element 34 within the mounting hole 213. This prevents the pin portion 232 from detaching from the mounting hole 213 due to excessive upward displacement of the support body 23.

[0034] As shown in Figure 6B, the insulating spacer 22 is configured to allow the support body 23 to move downward relative to the seat body 21 until the contact portion 234 contacts the inner pod base 100 and establishes a conductive path for electrostatic discharge. At this time, the limiting structure 316 does not contact and support the insulating retaining element 34 to restrict it. The insulating retaining element 34 is fitted into the groove 333, and since the insulating retaining element 34 moves downward together with the support body 23, it does not affect the smoothness of the reciprocating motion of the support body 23.

[0035] (Third embodiment) Figure 7 shows a support mechanism 40 according to a third embodiment of the present invention. Since the elements and reference numerals of the support mechanism 40 are the same as those of the support mechanism 20 of the first embodiment and the support mechanism 30 of the second embodiment and have the same function, only the structural differences will be described here. The insulating spacer 22 is an electrically insulating, elastic material, ring-shaped member. The upper surface of the insulating spacer 22 is defined as a contact portion 221, and the portion between the upper and lower surfaces is defined as a connecting portion 222. The connecting portion 222 of the insulating spacer 22 corresponds to the shape of the groove 414 and can be fitted and fixed to each other so as to connect the insulating spacer 22 and the seat body 21, and the contact portion 221 is positioned between the mounting portion 211 and the support body 23. The insulating retaining element 42 is a ring-shaped member made of an elastic material, and the pin portion 232 of the support body 23 has a groove 433 surrounding its surface so that the insulating retaining element 42 is fitted into the groove 433. The support 23 is inserted toward the seat 21 through the annular hollow portion of the insulating spacer 22, and a slight external force is applied to push the insulating retaining element 42 down to the lower part of the limiting structure 416, thereby connecting the support 23 and the seat 21 via the insulating spacer 22. When an external force is applied to or released from the support 23, the elastic deformation of the insulating spacer 22 causes the support 23 to reciprocate relative to the seat 21.

[0036] Referring to Figure 8A, when the reticle R is not yet placed on the support 23, the insulating spacer 22 is not compressed or deformed, and is in its original shape and height. The insulating retaining element 42 abuts against the lower part of the limiting structure 416, preventing the support 23 from moving upward. At this time, the support 23 is not in contact with the inner pod base 100. There is a pitch d between the contact portion 234 of the support 23 and the surface of the inner pod base 100, and at this time, no conductive path for electrostatic dissipation is established between the support 23 and the inner pod base 100. When no conductive path for electrostatic dissipation is established in the support mechanism 40, electrostatic charge remains on the surface of the reticle R after exposure, but even when the reticle R is brought close to the support 23, the phenomenon of arc discharge does not occur, and contamination by arc discharge can be prevented.

[0037] Referring to Figure 8B, when the reticle R is placed on the support 23, the support 23 is subjected to an external force from the reticle R and is pushed downward, compressing or deforming the insulating spacer 22 so that the support 23 can move downward relative to the seat 21, and the insulating retaining element 42 moves downward with the support 23 until the contact portion 234 of the support 23 and the surface of the inner pod base 100 come into contact. At this time, a conductive path for electrostatic dissipation is established between the bottom of the support 23 and the inner pod base 100. When the conductive path for electrostatic dissipation of the support mechanism 40 is established, the positive charge on the surface of the reticle R is diffused along the path from the support 23, the inner pod base 100, the robot arm, and the ground (not shown).

[0038] In a modified version of the present invention, in addition to the entire support 23 being made of an electrostatically dissipative material, it may also be made of a locally electrostatically dissipative material, for example, by further providing electrostatically dissipative elements on the top and / or bottom of the support 23. Figures 9A and 9B show a first modified version of the support mechanism of the present invention. The support 23 further includes an electrostatically dissipative element 24 provided on the top of the support 23. Specifically, the electrostatically dissipative element 24 is provided on the mounting portion 231 of the support 23 and is detachably connected to the support 23.

[0039] As shown in Figure 9B, when the reticle R is placed on the support 23, the reticle R first comes into contact with the electrostatic diffusion element 24, and then the electrostatic diffusion element 24 moves downward with the support 23 until the contact portion 234 of the support 23 comes into contact with the inner pod base 100. At this time, the positive charge on the surface of the reticle R is diffused along the path from the electrostatic diffusion element 24, the support 23, the inner pod base 100, the robot arm, and the ground (not shown).

[0040] Figures 10A and 10B show a support mechanism of a second modified example. The support 23 further includes an electrostatic dissipation element 25 provided at the bottom of the support 23, for example, the electrostatic dissipation element 25 is provided below the contact portion 234, or the electrostatic dissipation element 25 is provided above the pin portion 232 and the contact portion 234. Specifically, the electrostatic dissipation element 25 is provided on the support 23 and is detachably connected to the support 23.

[0041] As shown in Figure 10B, when the reticle R is placed on the support 23, the reticle R first makes contact with the support 23 and moves downward together, causing the electrostatic diffusion element 25 at the bottom of the support 23 to make contact with the inner pod base 100. At this time, the positive charge on the surface of the reticle R is diffused along the path from the support 23, the electrostatic diffusion element 25, the inner pod base 100, the robot arm, and the ground (not shown).

[0042] Figures 11A and 11B show a support mechanism of a third modified example. The support 23 further includes a first electrostatic dissipation element 24 and a second electrostatic dissipation element 25 provided at the top and bottom of the support 23, respectively. Specifically, the first electrostatic dissipation element 24 is provided on the mounting portion 231 of the support 23 and is detachably connected to the support 23. The second electrostatic dissipation element 25 is provided on the contact portion 234 of the support 23 and is detachably connected to the support 23.

[0043] As shown in Figure 11B, when the reticle R is placed on the support 23, the reticle R first comes into contact with the first electrostatic diffusion element 24, and then the first electrostatic diffusion element 24 moves downward with the support 23 until the second electrostatic diffusion element 25, located at the bottom of the support 23, comes into contact with the inner pod base 100. At this time, the positive charge on the surface of the reticle R is diffused along the path from the first electrostatic diffusion element 24, the support 23, the second electrostatic diffusion element 25, the inner pod base 100, the robot arm, and the ground (not shown).

[0044] According to the first to third modifications, by further providing electrostatic dissipation elements 24 and 25 on the support 23 and simply replacing the electrostatic dissipation elements 24 and 25, it is possible to prevent wear caused by contact between the reticle R and the mounting portion 231 of the support 23 and / or wear caused by contact between the bottom of the support 23 and the inner pod base 100 from affecting the conductivity effect of the electrical path. Regardless of changes in the structural design of the support 23, as long as it is used as an opening and closing function for the electrostatic dissipation path, it is within the scope of patent protection of the present invention. [Explanation of Symbols]

[0045] 20 Support mechanism 21 Seat 211 Mounting part 212 Regulatory Department 213 Mounting holes 214 Extension hole 215 base 22 Insulating Spacer 221 Contact part 222 Connecting part 223 Mating part 224 Mounting structure 225 Through hole 23 Support 231 Mounting section 232 Pin section 233 Insulation derailment prevention element 234 Contact area 24 Electrostatic Dissipation Element 25 Electrostatic Dissipation Element 30 Support mechanism 314 Groove 316 Restriction structure 34 Insulation derailment prevention element 333 Recessed groove 40 Support mechanism 414 Groove 416 Restriction Structure 42 Insulation retention element 433 groove d pitch R Reticle

Claims

1. An openable and closable support mechanism suitable for the inner pod base of a dual reticle container, The seat provided on the inner pod base, A support having an electrostatic dissipative material, which penetrates through the seat to near the inner pod base, The seat is isolated so as not to contact the support, and the support is moved back and forth relative to the seat to establish a conductive path for static electricity dissipation by contacting the inner pod base, or an insulating spacer is provided to maintain a pitch between the support and the inner pod base so as not to establish the conductive path for static electricity dissipation. A retractable support mechanism, including one.

2. The open / close support mechanism according to claim 1, wherein when the support is not subjected to an external force, it separates from the inner pod base and maintains the pitch between the support and the inner pod base, thus not establishing the conductive path for electrostatic dissipation; and when the support is subjected to an external force, it contacts the inner pod base to establish the conductive path for electrostatic dissipation.

3. The opening and closing support mechanism according to claim 1, wherein the seat body includes a mounting portion and a mounting hole that penetrates the mounting portion and the seat body, the insulating spacer includes a contact portion and a connecting portion, the contact portion is supported by contact with the upper surface of the mounting portion, and the connecting portion fixes the insulating spacer to the mounting portion via the mounting hole.

4. The support comprising a mounting portion, a contact portion, and a pin portion located between the mounting portion and the contact portion, wherein the insulating spacer has a through hole communicating with the mounting hole, the pin portion is provided through the through hole and the mounting hole, and the mounting portion is positioned on the upper surface of the contact portion such that the contact portion is adjacent to the inner pod base, according to claim 3.

5. The opening and closing support mechanism according to claim 3, wherein the insulating spacer includes at least one mounting structure located outside the connecting portion, the mounting structure passes through the extension hole of the mounting hole and is then fixed to the lower surface of the mounting portion.

6. The opening and closing support mechanism according to claim 3, wherein a mounting groove is provided on the upper surface of the mounting portion, the connecting portion of the insulating spacer is provided in the mounting groove, and the contact portion contacts and supports the upper surface of the periphery of the mounting groove to fix the insulating spacer in the mounting portion.

7. The opening and closing support mechanism according to claim 1, wherein the insulating spacer is made of an elastic material, and when an external force is applied to the support or when it is released from an external force, the insulating spacer is elastically compressed and deformed or elastically returned to its original shape, causing the support to reciprocate.

8. The open / close support mechanism according to claim 1, further comprising an insulating retaining element disposed between the seat and the support, which prevents the support from coming out of the space between the seat and the insulating spacer.

9. The open / close support mechanism according to claim 8, wherein the support comprises a mounting portion, a contact portion, and a pin portion located between the mounting portion and the contact portion, and the insulating anti-detachment element is fitted onto the pin portion.

10. The seat body includes a mounting portion and a mounting hole that penetrates the mounting portion and the seat body, and a mounting groove is provided on the upper surface of the mounting portion. The support includes a mounting portion, a contact portion, and a pin portion located between the mounting portion and the contact portion. The opening and closing support mechanism according to claim 1, wherein the insulating spacer is provided in the mounting groove and has a through hole communicating with the mounting hole, the pin portion is provided through the through hole and the mounting hole, and the lower surface of the aforementioned mounting portion is positioned on the upper surface of the insulating spacer so that the contact portion is adjacent to the inner pod base.

11. The open / close support mechanism according to claim 1, wherein an electrostatic dissipation element is further provided on the top and / or bottom of the support.

12. The open / close support mechanism according to claim 1, wherein the support and the inner pod base establish a conductive path for static electricity dissipation, the conductive path for static electricity dissipation is connected to a robot arm, and static electricity is discharged from the robot arm to ground.

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