Horizontal buffing module

Abstract

To provide a horizontal pre-clean (HPC) module for a chemical mechanical polishing (CMP) processing system.SOLUTION: An HPC module 200 includes a chamber 210 having a basin 214 and a lid 216 which collectively define a processing area 212, and a rotatable vacuum table 230 disposed in the processing area. The rotatable vacuum table includes an array of channels defined in a supporting surface thereof. The HPC module also includes: a pad conditioning station 280 disposed proximate to the rotatable vacuum table; a pad carrier positioning arm 300 coupled to a pad carrier assembly 304; and an actuator 324 that is coupled to the pad carrier positioning arm and that allows the pad carrier assembly to swing between a first position over the rotatable vacuum table and a second position over the pad conditioning station.SELECTED DRAWING: Figure 2A

Description

Technical Field

[0001]

[0001] Embodiments described herein generally relate to apparatuses used in the manufacture of electronic devices, and more particularly, to a horizontal buffing and polishing module that can be used to clean the surface of a substrate in a semiconductor device manufacturing process.

Background Art

[0002]

[0002] Chemical mechanical polishing (CMP) is commonly used in the manufacture of high density integrated circuits to planarize or polish a layer of material deposited on a substrate. In a typical CMP process, the substrate is held within a carrier head that presses the back surface of the substrate against a rotating polishing pad in the presence of a polishing fluid. The material is removed across the entire surface of the material layer of the substrate that contacts the polishing pad by a combination of the chemical and mechanical activity provided by the polishing fluid and the relative movement of the substrate and the polishing pad. Typically, after one or more CMP processes are completed, the polished substrate is further processed in one or more post-CMP substrate processing steps. For example, the polished substrate may be further processed using one or a combination of cleaning, inspection, and measurement steps. Once the post-CMP steps are completed, the substrate can be sent from the CMP processing area to the next device manufacturing process, such as a lithography, etching, or deposition process.

[0003]

[0003] To save valuable manufacturing floor space and reduce labor costs, CMP systems generally include a first portion, such as a front portion, that includes one or a combination of post-CMP cleaning, inspection, and / or metrology stations before or after CMP, and a second portion, such as a rear portion, that is integrated with the first portion to form a single polishing system. The second portion can include a plurality of polishing stations.

[0004]

[0004] The first part may comprise one or more vertical buffing modules for cleaning the substrate after CMP. Each vertical buffing module has a rotating chuck assembly for holding the substrate and a rotating buffing pad for cleaning the substrate surface. Unfortunately, the orientation of the vertical buffing module limits the outer diameter of the buffing pad, and as a result, only a limited area of ​​the substrate can be cleaned in a given time. Therefore, the substrate processing throughput is undesirably reduced according to the longer buffing time associated with the limited cleaning area of ​​the buffing pad.

[0005]

[0005] Furthermore, since the vertical buffing module holds the substrate in a vertical orientation, the vertical orientation of the substrate loaded into the vertical buffing module requires a large overhead clearance for inserting and removing the substrate. As a result, the overall size and / or footprint of the CMP system increases undesirably according to the larger overhead clearance requirements associated with the vertical orientation of the buffing module. Thus, the throughput density of the CMP system (substrates processed per unit time per unit area of ​​manufacturing floor space) is undesirably limited by the buffing module configuration of the system.

[0006]

[0006] Therefore, an apparatus and method for solving the above-mentioned problems is needed in the art. [Overview of the project]

[0007]

[0007] Embodiments described herein generally relate to apparatus used in the manufacture of electronic devices, and more particularly to horizontal buffing modules that may be used to clean the surface of a substrate in a semiconductor device manufacturing process.

[0008]

[0008] In one embodiment, the substrate processing module includes a chamber having a container and a lid that jointly define a processing area. The module includes a rotatable vacuum table positioned within the processing area, the rotatable vacuum table includes a plurality of annular channels defined within its substrate receiving surface. The module includes a pad conditioning station positioned adjacent to the rotatable vacuum table. The module includes a pad carrier positioning arm having a first end and a second end distal to the first end, the first end being connected to a pad carrier assembly, and the second end being connected to an actuator configured to swing the pad carrier assembly between a first position on the rotatable vacuum table and a second position on the pad conditioning station.

[0009]

[0009] In another embodiment, a method for processing a substrate includes positioning the substrate on a vacuum table of a substrate processing module. The vacuum table includes a plurality of annular channels defined within its substrate receiving surface. The substrate receiving surface of the vacuum table is substantially perpendicular to the direction of gravity. The grip area provided by the plurality of annular channels is between about 5% and about 30% of the surface area of ​​the substrate positioned thereon. The grip area includes the effective area occupied by the plurality of channels within the substrate receiving surface of the vacuum table. The method includes pressing a buffing pad against the surface of the substrate while rotating the vacuum table beneath it. The buffing pad has a diameter of about 67 mm or more, and the pressure applied between the buffing pad and the surface of the substrate is about 3 psi or more.

[0010]

[0010] In yet another embodiment, the modular substrate processing system includes a substrate processing module. The module includes a chamber including a container and a lid. The lid includes a plurality of side panels, which together with the container define a processing area. The module includes a rotatable vacuum table positioned within the processing area. The module includes a first substrate handler access door positioned within a first side panel of the plurality of side panels. The substrate handler access door is used to position a substrate on the rotatable vacuum table using the first substrate handler. The module includes a second substrate handler access door positioned within a second side panel of the plurality of side panels. The second substrate handler access door is used to remove a substrate from the rotatable vacuum table using the second substrate handler. The module includes a pad conditioning station positioned adjacent to the rotatable vacuum table. The module includes a pad carrier positioning arm having a first end and a second end distal to the first end. The first end is connected to a pad carrier assembly, and the second end is connected to an actuator configured to swing the pad carrier assembly between a first position on a rotatable vacuum table and a second position on a pad conditioning station.

[0011]

[0011] In another embodiment, the substrate processing module includes a rotatable vacuum table located within the processing area of ​​the substrate processing module, the rotatable vacuum table includes a support surface including an array of channels. The module includes a pad conditioning station located adjacent to the rotatable vacuum table. The module includes a pad carrier positioning arm connected to a pad carrier assembly. The module includes an actuator connected to the pad carrier positioning arm and configured to position the pad carrier assembly on a first position located on the support surface of the rotatable vacuum table and on a second position located on the pad conditioning station.

[0012]

[0012] In another embodiment, a method for processing a substrate includes positioning the substrate on a vacuum table of a substrate processing module. The vacuum table includes an array of channels defined within its support surface. The support surface of the vacuum table is substantially perpendicular to the direction of gravity. The grip area provided by the array of channels is between about 5% and about 30% of the surface area of ​​the substrate positioned thereon. The grip area includes the effective area occupied by the array of channels within the support surface of the vacuum table. The method includes pressing a buffing pad against the surface of the substrate while rotating the vacuum table beneath it. The buffing pad has a diameter of about 67 mm or more, and the pressure applied between the buffing pad and the surface of the substrate is about 3 psi or more.

[0013]

[0013] In another embodiment, the modular substrate processing system includes a substrate processing module. The module includes a chamber including a container and a lid. The lid includes a plurality of side panels, which together with the container define a processing area. The module includes a rotatable vacuum table positioned within the processing area. The module includes a first substrate handler access door positioned within a first side panel of the plurality of side panels. The substrate handler access door is used to position a substrate on the rotatable vacuum table using the first substrate handler. The module includes a second substrate handler access door positioned within a second side panel of the plurality of side panels. The second substrate handler access door is used to remove a substrate from the rotatable vacuum table using the second substrate handler. The module includes a pad conditioning station positioned adjacent to the rotatable vacuum table. The module includes a pad carrier positioning arm connected to a pad carrier assembly. The module includes an actuator connected to a pad carrier positioning arm and configured to position the pad carrier assembly on a first position located on the support surface of a rotatable vacuum table, and on a second position located on a pad conditioning station.

[0014]

[0014] In order to allow for a more detailed understanding of the above-mentioned features of the Disclosure, a more specific description of the Disclosure, which has been briefly summarized above, is given by reference to embodiments, some of which are shown in the accompanying drawings. However, it should be noted that the accompanying drawings only show typical embodiments of the Disclosure and should therefore not be considered to limit its scope, and the Disclosure may allow for other equally valid embodiments. [Brief explanation of the drawing]

[0015] [Figure 1A] This is a schematic plan view of an exemplary chemical mechanical polishing (CMP) treatment system using the horizontal pre-cleaning (HPC) module described herein, according to one or more embodiments. [Figure 1B] This is an isometric view of an exemplary CMP processing system, corresponding to the schematic diagram shown in Figure 1A, according to one or more embodiments. [Figure 1C] This is a top view of the CMP processing system shown in Figure 1B, which may correspond to the schematic diagram shown in Figure 1A, according to one or more embodiments. [Figure 2A] This is a top isometric view of one side of an exemplary HPC module that may be used in the CMP processing system described herein. [Figure 2B] This is another top isometric view of the side of the HPC module shown in Figure 2A. [Figure 2C] Figure 2A is a top isometric view of another side of the HPC module. [Figure 3A] This is a side cross-section along the cutting line 3A-3A in Figure 2C. [Figure 3B] Figure 3A is an isometric view of the bottom of an exemplary rotatable vacuum table that may be used in the HPC module. [Figure 3C] Figure 3A is an isometric view of the top of an exemplary rotatable vacuum table that may be used in the HPC module. [Figure 3D] Figures 3B and 3C are plan views of an exemplary carrier film that may be used with the rotatable vacuum table shown. [Figure 3E]It is an enlarged plan view of a part of FIG. 3D. [Figure 4A] It is a plan view of the HPC module of FIG. 3A. [Figure 4B] It is a side cross-sectional view of an exemplary pad conditioning station that can be used within the HPC module of FIG. 3A. [Figure 4C] It is a side cross-sectional view of an exemplary pad carrier positioning arm that can be used within the HPC module of FIG. 3A.

Mode for Carrying Out the Invention

[0016]

[0028] For ease of understanding, wherever possible, the same reference numbers are used to indicate the same elements common to the figures. It is assumed that the elements and features of one embodiment can be beneficially incorporated into other embodiments without further explanation.

[0017]

[0029] The embodiments described herein generally relate to apparatuses used in the manufacture of electronic devices, and more particularly to a horizontal buffing module that can be used to clean the surface of a substrate in a semiconductor device manufacturing process.

[0018]

[0030] FIG. 1A is a schematic plan view of an exemplary chemical mechanical polishing (CMP) processing system 100 using the horizontal pre-cleaning (HPC) module described herein according to one or more embodiments. FIG. 1B is an upper isometric view of an exemplary CMP processing system 100 that may correspond to the schematic shown in FIG. 1A according to one or more embodiments. FIG. 1C is a top view of the CMP processing system 100 of FIG. 1B that may correspond to the schematic shown in FIG. 1A according to one or more embodiments. In FIGS. 1B and 1C, certain portions of the housing as well as certain other internal and external components are omitted to more clearly show the HPC module within the CMP processing system 100. Here, the processing system 100 includes a first portion 105 and a second portion 106 connected to and integrated with the first portion 105. The first portion 105 is a substrate polishing section characterized by a plurality of polishing stations (not shown).

[0019]

[0031] The second portion 106 includes one or more post-CMP cleaning systems 110, a plurality of system loading stations 130, one or more substrate handlers, such as a first robot 124 and a second robot 150, one or more measurement stations 140, one or more localized polishing (LSP) modules 142, one or more HPC modules 200, and one or more drying units 170. The HPC module 200 is configured to process a substrate 120 disposed in a substantially horizontal orientation (i.e., within the x-y plane). In some embodiments, the second portion 106 optionally includes one or more vertical cleaning modules 112 configured to process a substrate 120 disposed in a substantially vertical orientation (i.e., within the z-y plane).

[0020]

[0032] Each LSP module 142 is typically configured to polish only a portion of the substrate surface using a polishing member (not shown) having a surface area smaller than the surface area of ​​the substrate 120 being polished. The LSP modules 142 are often used to finish relatively small portions of the substrate after the substrate 120 has been polished by the polishing module, for example, to remove additional material.

[0021]

[0033] The measurement station 140 is used to measure the thickness of the material layer placed on the substrate 120 before and / or after polishing, to inspect the substrate 120 after polishing to determine whether the material layer has been removed from its field surface, and / or to inspect the substrate surface for defects before and / or after polishing. In those embodiments, the substrate 120 may be returned to the polishing pad for further polishing and / or sent to a different substrate processing module or station, such as a polishing module in the first section 105, or to the LSP module 142, based on the measurements or surface inspection results obtained using the measurement station 140. As shown in Figure 1A, the measurement station 140 and the LSP module 142 are located in the region of the second section 106 above (in the Z direction) a portion of one cleaning system 110.

[0022]

[0034] The first robot 124 is positioned to transport the substrate 120 to and from a plurality of system loading stations 130, for example, between the plurality of system loading stations 130 and the second robot 150, and / or between the cleaning system 110 and the plurality of system loading stations 130. In some embodiments, the first robot 124 is positioned to transport the substrate 120 between any system loading station 130 and a processing system located nearby therein. For example, in some embodiments, the first robot 124 may be used to transport the substrate 120 between one of the system loading stations 130 and the measurement station 140.

[0023]

[0035] The second robot 150 is used to transfer the substrate 120 between the first section 105 and the second section 106. For example, the second robot 150 is positioned to transfer the substrate 120 to be polished, received from the first robot 124, to the first section 105 for polishing. The polished substrate 120 is then transferred from the first section 105, for example, from a transfer station (not shown) within the first section 105, to one of the HPC modules 200, and / or between different stations and modules located within the second section 106. Alternatively, the second robot 150 transfers the substrate 120 from a transfer station within the first section 105 to one of the LSP modules 142 or the measurement station 140. The second robot 150 can also transfer the substrate 120 from either the LSP module 142 or the measurement station 140 to the first section 105 for further polishing.

[0024]

[0036] The CMP processing system 100 in Figure 1A features two cleaning systems 110 positioned on either side of a second robot 150. In Figure 1A, at least some modules of one of the cleaning systems 110, for example, one or more vertical cleaning modules 112, are located below (in the Z direction) the measurement station 140 and the LSP module 142 and are therefore not shown. The measurement station 140 and the LSP module 142 are not shown in Figure 1C. In some other embodiments, the processing system 100 features only one cleaning system 110, where each cleaning system 110 includes an HPC module 200, one or more wet cleaning modules 112, for example, a brush or spray box, a drying unit 170, and a substrate handler 180 for transferring the substrate 120 between them, where each HPC module 200 is positioned within the second section 106, adjacent to the first section 105.

[0025]

[0037] Typically, the HPC module 200 receives the polished substrate 120 from the second robot 150 through a first opening (not shown) formed in the side panel of the HPC module 200, for example, through a door or slit valve located in the side panel. The substrate 120 is received by the HPC module 200 in a horizontal orientation to be positioned on a substrate support surface located horizontally therein. The HPC module 200 then performs a pre-cleaning process on the substrate 120, such as a buffing process, before the substrate 120 is transported therefrom using the substrate handler 180.

[0026]

[0038] The substrate 120 is transferred from the HPC module 200 through a second opening, in this case a second substrate handler access door 224 (Figure 1B), which is typically a horizontal slot located through a second side panel of the HPC module 200, which can be closed with a door, e.g., a slit valve. Thus, the substrate 120 is still in a horizontal orientation when transferred from the pre-cleaning module 200. After the substrate 120 has been transferred from the pre-cleaning module 200, the substrate handler 180 positions the substrate 120 in a vertical position for further processing within the vertical cleaning module 112 of the cleaning system 110. For example, the substrate handler 180 can swing the substrate 120 to a vertical position.

[0027]

[0039] In this example, the HPC module 200 has a first end 202 facing the first portion 105 of the processing system 100, a second end 204 facing the opposite side of the first end 202, a first side 206 facing the second robot 150, and a second side facing the opposite side of the first side 206. The first side 206 and the second side 208 extend perpendicularly between the first end 202 and the second end 204.

[0028]

[0040] Multiple vertical cleaning modules 112 are located within the second section 106. One or more vertical cleaning modules 112 are any one or a combination of contact and non-contact cleaning systems (e.g., spray boxes and / or brush boxes) for removing polishing byproducts from the substrate surface.

[0029]

[0041] The drying unit 170 is used to dry the substrate 120 after it has been processed by the cleaning module 112 and before it is transferred to the system loading station 130 by the first robot 124. Here, the drying unit 170 is a horizontal drying unit and is configured to receive the substrate 120 through an opening (not shown) while the substrate 120 is positioned in a horizontal orientation.

[0030]

[0042] Here, the substrate 120 is moved between the HPC module 200 and the vertical cleaning module 112, between the individual cleaning modules 112, and between the cleaning modules 112 and the drying unit 170 using the substrate handler 180.

[0031]

[0043] In embodiments of this specification, the operation of the CMP processing system 100, including the substrate handler 180, is directed by a system controller 160. The system controller 160 includes a programmable central processing unit (CPU) 161 that can operate together with memory 162 (e.g., non-volatile memory) and support circuitry 163. The support circuitry 163 is conventionally coupled to the CPU 161 and includes caches, clock circuits, input / output subsystems, power supplies, and combinations thereof, which are coupled to various components of the CMP processing system 100 to facilitate their control. The CPU 161 is one of any form of general-purpose computer processor used in an industrial environment, such as a programmable logic controller (PLC), for controlling various components and subprocessors of the processing system. The memory 162 coupled to the CPU 161 is non-temporary and is typically one or more readily available memories, such as random access memory (RAM), read-only memory (ROM), floppy disk drives, hard disks, or any other form of local or remote digital storage.

[0032]

[0044] Typically, memory 162 is in the form of a non-temporary computer-readable storage medium (e.g., non-volatile memory) containing instructions that, when executed by the CPU 161, facilitate the operation of the CMP processing system 100. The instructions in memory 162 are in the form of a program product, such as a program that implements the method of the present disclosure. The program code follows one of a number of different programming languages. In one example, the present disclosure can be implemented as a program product stored on a computer-readable storage medium for use with a computer system. The program of the program product defines the function of the embodiments (including the method of the present specification).

[0033]

[0045] Exemplary non-temporary computer-readable storage media include, but are not limited to, (i) non-writable storage media on which information can be permanently stored (e.g., CD-ROM disks readable by a CD-ROM drive, flash memory, ROM chips, or any type of solid-state non-volatile semiconductor memory device, such as a read-only memory device in a computer, e.g., a solid-state drive (SSD)), and (ii) writable storage media on which modifiable information is stored (e.g., floppy disks in a diskette drive, or hard disk drives, or any type of solid-state random-access semiconductor memory). Such computer-readable storage media is an embodiment of the present disclosure when it stores computer-readable instructions that direct the functionality of the methods described herein. In some embodiments, the methods described herein, or parts thereof, are performed by one or more application-specific integrated circuits (ASICs), field-programmable gate arrays (FPGAs), or other types of hardware embodiments. In some other embodiments, the substrate processing and / or handling methods described herein are performed by a combination of software routines, ASICs, FPGAs, and / or other types of hardware embodiments. One or more system controllers 160 may be used with one or any combination of the various modular polishing systems described herein, and / or with their individual polishing modules.

[0034]

[0046] Figure 2A is an isometric top view of the second side 208 of an exemplary HPC module 200 that can be used in the CMP processing system 100 described herein. In Figure 2A, the maintenance access panel is omitted to more clearly show the internal components of the HPC module 200. Figure 2B is another isometric top view of the second side 208 of the HPC module 200 in Figure 2A. In Figure 2B, the top panel of the cover 216 is further omitted to more clearly show the internal components of the HPC module 200. Figure 2C is an isometric top view of the first side 206 of the HPC module 200 in Figure 2A. In Figure 2C, the cover 216 is omitted to more clearly show the internal components of the HPC module 200.

[0035]

[0047] Generally, the HPC module 200 includes a chamber 210 (here, a container 214 and a lid 216) formed from a plurality of side panels that jointly define the processing area 212.

[0036]

[0048] A first side panel 218 is formed on the first side 206 of the HPC module 200 facing the second robot 150. The first side panel 218 includes a first substrate handler access door 220 used to position the substrate 120 on a rotatable vacuum table 230 using the second robot 150. A second side panel 222 is formed on the second end 204 of the HPC module 200 facing away from the first portion 105. The second side panel 222 includes a second substrate handler access door 224 used to remove the substrate 120 from the rotatable vacuum table 230 using the substrate handler 180. A third side panel 226 is formed on the second side 208 of the HPC module 200. The third side panel 226 includes a maintenance access panel opening 228. The symmetry of the first substrate handler access door 220 and the maintenance access panel opening 228 formed on the opposing side panels of the HPC module 200 advantageously provides a horizontal buffing module that can be installed on either side of the processing system 100, as shown in Figure 1C.

[0037]

[0049] A rotatable vacuum table 230 may be located within the processing area 212 of the HPC module 200 and used to vacuum chucking the substrate 120. Additionally, an annular substrate lift mechanism 270 located radially outside the rotatable vacuum table 230, a pad conditioning station 280 located adjacent to the rotatable vacuum table 230, and a pad carrier positioning arm 300 movable between a first position on the rotatable vacuum table 230 and a second position on the pad conditioning station 280 may be located within the processing area 212. For example, the pad carrier positioning arm 300 can position a pad carrier assembly 304 on a first position located on the support surface of the rotatable vacuum table 230 and on a second position located on the pad conditioning station 280.

[0038]

[0050] A rotatable vacuum table 230, an annular substrate lift mechanism 270, a pad conditioning station 280, and a pad carrier positioning arm 300 are each independently mounted to the container 214. The HPC module 200 further includes a rinse manifold 290 mounted to the container 214. A central substrate rinse bar 292 and one or more substrate spray bars 294 extend from the sides of the rinse manifold 290. The central substrate rinse bar 292 is used to direct a rinse fluid, such as cleaning fluid or water, toward the central region of the rotatable vacuum table 230. The substrate spray bars 294 are used to direct a spray toward one or more other regions of the rotatable vacuum table 230, such as the peripheral region or sides of the vacuum table 230. The rinse manifold 290 is positioned toward the corner of the container 214, and the rinse bar 292 and spray bar 294 extend along the second end 204 of the HPC module 200 inside the second side panel 222. In some embodiments, the rinse manifold 290 is adjacent to the second side 208 (Figures 2A-2B). In some other embodiments, the rinse manifold 290 is adjacent to the first side 206 (Figure 2C). The HPC module 200 further includes a brush rinse 296 attached to the container 214. The brush rinse 296 is positioned adjacent to the pad conditioning station 280, near the first end 202 of the HPC module 200, for rinsing one or more components of the pad conditioning station 280.

[0039]

[0051] In embodiments of this specification, the HPC module 200 includes a rotary chuck assembly having a carrier film disposed thereon and fixed thereto. The chuck assembly holds the substrate in place during rotation using vacuum pressure applied through a plurality of channels formed through the carrier film. In some embodiments, the plurality of channels are formed in an array. This structural configuration of channels used in a typical carrier film can result in substrate slippage at higher torques and local deformation of the substrate surface. For example, a region of the substrate at the same location as the array of vacuum channels may be deformed compared to an adjacent region of the substrate that is positioned on a rigid portion of the carrier film. Locally deformed regions of the substrate reduce the buffing pad pressure applied thereto, leading to uneven substrate cleaning. Therefore, the embodiments described below reduce and / or substantially eliminate local deformation of the carrier film.

[0040]

[0052] Figure 3A is a side cross-sectional view along the cutting line 3A-3A of Figure 2C. Figures 3B and 3C are bottom and top isometric views, respectively, of an exemplary rotatable vacuum table 230 that may be used in the HPC module 200 of Figure 3A. Figure 3D is a plan view of an exemplary carrier film that may be used with the rotatable vacuum table 230 of Figures 3B and 3C. Figure 3E is an enlarged plan view of a portion of Figure 3D.

[0041]

[0053] The vacuum table 230 includes a chuck plate 232 having a top surface 234. The top surface 234 of the chuck plate 232 is substantially perpendicular to the direction of gravity. The chuck plate 232 is a cylindrical plate having a longitudinal axis c1 aligned with the direction of gravity. The chuck plate 232 includes a central hole 236 connecting a plurality of radial channels 238 (formed, for example, in a radial array). Here, the chuck plate 232 has six channels 238 that are equally spaced circumferentially. In some other embodiments, the chuck plate 232 includes 3 to 12 channels, e.g., 5 to 10 channels, e.g., 6 to 8 channels. Each of the channels in the array of radial channels 238 extends from the central hole 236 to a plurality of ports 240 formed in the top surface 234. Here, each of the array of radial channels 238 includes five ports 240. In some other embodiments, each radial channel 238 includes 3 to 7 ports, for example, 4 to 6 ports. Here, the multiple ports 240 are radially spaced equally apart from each other along one of the arrays of channels 238. In some other embodiments, the multiple ports 240 are unevenly spaced. The central hole 236, the array of radial channels 238, and the multiple ports 240 are configured to provide pressure and fluid communication from a vacuum source 359 to the upper surface 234 of the chuck plate 232, thereby vacuum chucking the substrate 120 thereon. In some embodiments, the vacuum pressure is about -8 psi to about -4.5 psi relative to atmospheric pressure, for example, about -7 psi to about -5.5 psi relative to atmospheric pressure. Thus, the substrate 120 is secured to the upper surface 234 by applying vacuum negative pressure through the multiple ports 240. To remove the substrate 120 from the chuck plate 232, the vacuum pressure is vented and an optional positive pressure nitrogen purge is applied.

[0042]

[0054] The bottom surface of the chuck plate 232 is connected to the chuck adapter 244. The chuck adapter 244 is a cylindrical plate positioned between the chuck plate 232 and the chuck motor 248, connecting the chuck plate 232 to the chuck motor 248. The chuck motor 248 is configured to rotate the chuck plate 232 and the chuck adapter 244 around a longitudinal axis c1. The longitudinal motor hole 250 of the chuck motor 248 houses a rotatable manifold 252 having a flange 254 at its proximal end. The flange 254 is connected to the chuck adapter 244 so that the rotatable manifold 252 is rotated by the rotation of the chuck adapter 244. The chuck plate 232, the chuck adapter 244, and the rotatable manifold 252 are removable from the motor hole 250 as a subassembly. In some embodiments, the chuck plate 232, chuck adapter 244, rotatable manifold 252, the threads and alignment pins between the chuck plate 232 and the chuck adapter 244, and the threads between the flange 254 and the chuck adapter 244 are formed from plastic or polymer, such as polyetheretherketone (PEEK). By using plastic parts throughout the subassembly instead of metal parts, such as stainless steel, trace metal contamination of the substrate 120 is reduced. To center the rotatable manifold 252 within the motor hole 250, a bearing 256 is positioned within the motor hole 250 at the distal end of the rotatable manifold 252. The bearing 256 has an outer diameter and an inner diameter for rotatably connecting to the rotatable manifold 252 to facilitate relative rotation between the rotatable manifold 252 and the motor hole 250. A rotating elbow 258 is connected to the distal end of the rotatable manifold 252 by a jam nut 260. The rotating elbow 258 provides pressure and fluid communication between the stationary vacuum source 359 and the rotatable manifold 252.

[0043]

[0055] Referring to Figure 3D, the carrier film 264 is positioned on the upper surface 234 of the chuck plate 232. In some embodiments, the carrier film 264 is fixed to the upper surface 234 using an adhesive. In some embodiments, the carrier film 264 is removablely attached to the upper surface 234 so that it can be replaced. The carrier film 264 has a support surface 266 (e.g., a substrate support surface) facing away from the upper surface 234 of the chuck plate 232. The support surface 266 is substantially perpendicular to the direction of gravity. In some embodiments, the carrier film 264 has a closed-cell porous structure to communicate with vacuum pressure and form a seal between the chuck plate 232 and the substrate 120. In some embodiments, the carrier film 264 is formed from a polymer or plastic, such as polyurethane. Beneficiently, the carrier film 264 improves the contact area between the chuck plate 232 and the substrate 120, reduces trace metal contamination, reduces scratch and defect formation by trapped particles between the chuck plate 232 and the substrate 120, and / or optimizes the distribution of vacuum pressure applied to the substrate 120. The carrier film 264 includes a plurality of channels 268 formed in an array within the support surface 266. The array of channels 268 is an opening in the carrier film 264, aligned with a corresponding annular channel located beneath it.

[0044]

[0056] Here, the array of channels 268 is annular channels surrounding a longitudinal axis c1. In some other embodiments, the array of channels 268 has a non-annular shape. Here, the innermost channels of the array of channels 268 are spaced radially at a distance r1 from the longitudinal axis c1 passing through the center of the carrier film 264. In some embodiments, the distance r1 is about 100 mm or more, e.g., about 100 mm to about 200 mm, e.g., about 150 mm. Here, the carrier film 264 includes five concentric channels 268 with equal radial spacing s1 between adjacent channels 268. In some other embodiments, the carrier film 264 includes 3 to 7 concentric channels, e.g., 4 to 6 concentric channels. In some other embodiments, the array of channels 268 is unevenly spaced. In some embodiments, the spacing s1 between channels 268 is about 50 mm or less, e.g., about 20 mm to about 50 mm, e.g., about 30 mm to about 40 mm. Here, each of the channel 268 arrays contains six arc-shaped segments. In some other embodiments, the channel 268 array contains 3 to 12 arc-shaped segments, for example, 5 to 10 arc-shaped segments, for example, 6 to 8 arc-shaped segments. In some embodiments, the circumferential spacing s2 between adjacent arc-shaped segments of the same channel 268 is about 50 mm or less, for example, about 20 mm to about 50 mm.

[0045]

[0057] Beneficiently, the array of channels 268 has a width w1 that prevents deformation of the substrate 120 when a vacuum is applied. In some embodiments, the width w1 is about 10 mm or less, e.g., about 5 mm or less, e.g., about 2 mm or less, e.g., about 1 mm or less, or e.g., about 1 mm to about 2 mm, e.g., about 1.5 mm. In some embodiments, by using narrower channels 268, it is possible to apply a higher vacuum pressure without causing deformation of the substrate 120. In some embodiments, the grip area provided by the array of channels 268 is about 5% or more of the surface area of ​​the substrate 120 to be processed placed thereon, e.g., about 5% to about 30%, e.g., about 10% to about 30%, e.g., about 15% to about 30%, e.g., about 15% to about 25%, e.g., about 20%. The grip area is defined as the effective area occupied by the array of channels 268 within the support surface 266 of the vacuum table 230. In some embodiments, the HPC module 200 uses higher torque compared to the vertical cleaning module 112. To handle higher torque compared to other designs, the array of channels 268 described herein has increased vacuum grip to prevent the substrate 120 from sliding off the vacuum table 230 without causing deformation of the substrate 120, and the increased vacuum grip is provided by a larger grip area, a higher vacuum pressure, or both.

[0046]

[0058] Figure 4A is a plan view of the HPC module 200 shown in Figure 2C. The annular substrate lift mechanism 270 is located radially outward from the vacuum table 230. The lift mechanism 270 includes a plurality of substrate contact points 272 located close to the periphery of the vacuum table 230. Each of the substrate contact points 272 is an upward-facing shoulder formed on the substrate hoop 274 surrounding the chuck plate 232. The lift mechanism 270 is configured such that when lifting the substrate 120 from the support surface 266 of the vacuum table 230, one of the plurality of substrate contact points 272 contacts the substrate 120 before the other substrate contact points 272. The annular substrate lift mechanism 270 works in conjunction with the aforementioned vacuum pressure vent and optional nitrogen purging to remove the substrate 120 from the chuck plate 232. Beneficial in that the use of the substrate lift mechanism 270 allows for faster dechucking of the substrate 120 compared to venting and optional nitrogen purging alone.

[0047]

[0059] Figure 4B is a side cross-sectional view of an exemplary pad conditioning station 280 that may be used in the HPC module 200 of Figure 3A. The pad conditioning station 280 is positioned in close proximity to a rotatable vacuum table 230. The pad conditioning station 280 includes a conditioning brush 282 facing away from the container 214. In some embodiments, the brush 282 includes a fibrous material. In some embodiments, the fibers are formed from nylon or another similar material. The brush 282 is connected to a rotatable brush shaft 284. The brush shaft 284 extends through the container 214 and is fluidically connected to a conditioning fluid source (not shown). The brush shaft 284 is configured to deliver a conditioning fluid, such as deionized water, to a spray nozzle 286 positioned in close proximity to the brush 282. During operation of the pad conditioning station 280, the brush 282 is rotated by the brush shaft 284. During rotation, the conditioning fluid flows through the brush shaft 284 to the spray nozzle 286, thereby wetting the brush 282 and facilitating the conditioning process.

[0048]

[0060] Figure 4C is a side cross-sectional view of an exemplary pad carrier positioning arm 300 that may be used in the HPC module 200 of Figure 3A. The pad carrier positioning arm 300 is positioned in close proximity to the rotatable vacuum table 230 and the pad conditioning station 280. The distal end 302 of the pad carrier positioning arm 300 includes a pad carrier assembly 304, which is vertically movable for supporting a rotatable buffing pad 306 on a buffing pad support surface located at its lower end. In some embodiments, the pad carrier assembly 304 is sized to support a buffing pad 306 having a diameter of about 67 mm, for example, about 67 mm to about 150 mm, for example, about 67 mm, or about 134 mm. In some embodiments, the pad carrier positioning arm 300 of the present disclosure supports a larger buffing pad 306 compared to a conventional pre-cleaning module, and the larger buffing pad improves performance and reduces buffing time. The pad carrier assembly 304 includes a buffing pad 306 and a head motor 308 for rotating the buffing pad support surface around an axis c2 substantially aligned in the direction of gravity. The pad carrier assembly 304 includes a gimbal base 310 connected to the head motor 308 by a spherical bearing 312, allowing the buffing pad support surface of the pad carrier assembly 304 to pivot with respect to a plane perpendicular to axis c2. For the sake of simplicity of disclosure, the pad conditioning station 280, although not shown in Figure 4C for illustrative purposes, would be located within the cavity 480.

[0049]

[0061] After CMP, the HPC module 200 is configured to clean and remove polishing slurry and debris before the substrate 120 dries. In some embodiments, the HPC module 200 replaces one or more cleaning steps performed by multiple polishing stations in the first part 105 of the processing system 100. The buffing pad 306 of the HPC module 200 has a smaller form factor than the polishing surface of the polishing station, as it can perform localized cleaning in contrast to the removal of material by CMP, which is performed overall over the entire surface of the substrate 120. In other words, the buffing pad 306 is smaller in diameter than the substrate 120 and is only large enough to perform localized buffing, and is not designed to cover the entire surface of the substrate 120 at once.

[0050]

[0062] The pad carrier positioning arm 300 includes a linear actuator 314, such as a pneumatic cylinder, connected between the pad carrier assembly 304 and the proximal end 322 of the pad carrier positioning arm 300. The linear actuator 314 is configured to move the pad carrier assembly 304 up and down along axis c2 to position the buffing pad 306 so as to apply an effective downward force to it relative to the substrate 120 located on the rotatable vacuum table 230 or to the brushes 282 of the pad conditioning station 280. In some embodiments, the pressure applied between the buffing pad 306 and the surface of the substrate 120 is about 0.5 psi or more, for example about 0.5 psi to about 4 psi, for example about 3 psi or about 4 psi. In some embodiments, the thrust load of the downward force applied to the substrate 120 by the buffing pad 306 is proportional to the pressure. In some embodiments, the thrust load is approximately 0.5 lbf to approximately 100 lbf, for example, approximately 10 lbf to approximately 65 lbf. The lower side of the pad carrier positioning arm 300 includes a chemical manifold 316 having multiple spray nozzles for distributing chemicals (e.g., process fluids) onto the surface of the substrate 120.

[0051]

[0063] The proximal end 322 of the pad carrier positioning arm 300 is connected to an actuator 324, such as a motor, configured to swing the pad carrier assembly 304 between a first position on the rotatable vacuum table 230 and a second position on the pad conditioning station 280. The pad carrier positioning arm 300 is configured to swing the pad carrier assembly 304 through a maintenance access panel opening 228 to facilitate maintenance access.

[0052]

[0064] In some embodiments, the downward force of the pad carrier assembly 304, the torque of the buffing pad 306, the torque of the substrate 120, and the holding and gripping force of the vacuum table 230 through the carrier film 264 are adjusted and controlled to optimize performance. In some embodiments, the torque of the buffing pad 306 is about 2 Nm or more, for example, about 2 Nm to about 6 Nm, for example, about 3 Nm to about 5 Nm. In some embodiments, the torque of the substrate 120 is about 10 Nm or more, for example, about 10 Nm to about 30 Nm, for example, about 15 Nm to about 25 Nm. In some embodiments, the holding force for the wet substrate 120 is about 25 lbf or more, for example, about 30 lbf or more, for example, about 30 lbf to about 40 lbf, for example, about 30 lbf. In some embodiments, the edge lift grip force on a wet substrate is about 2 lbf or more, for example, about 2 lbf to about 3 lbf, for example, about 2 lbf to about 2.4 lbf.

[0053]

[0065] While the foregoing is directed toward embodiments of the present disclosure, other further embodiments of the present disclosure may be conceived without departing from its basic scope, the scope of which is determined by the following claims.

Claims

1. A chemical mechanical polishing module, A rotatable vacuum table disposed within the processing area of ​​the chemical mechanical polishing module, the rotatable vacuum table including a support surface containing an array of arc-shaped concentric channels, An annular substrate lifting mechanism positioned radially outward from the vacuum table, Equipped with, A chemical mechanical polishing module comprising an annular substrate lifting mechanism having a plurality of substrate contact points arranged in close proximity to the periphery of the vacuum table, wherein when the annular substrate lifting mechanism lifts the substrate from the support surface of the vacuum table, one of the plurality of substrate contact points contacts the substrate before the other of the plurality of substrate contact points.

2. The chemical mechanical polishing module according to claim 1, wherein the width of each channel in the array of arc-shaped concentric channels is 10 mm or less.

3. The chemical mechanical polishing module according to claim 2, wherein the grip area provided by the array of arc-shaped concentric channels is between 5% and 30% of the surface area of ​​the substrate to be processed, and the grip area includes the effective area occupied by the array of arc-shaped concentric channels within the support surface of the vacuum table.

4. The chemical mechanical polishing module according to claim 1, further comprising a pad carrier assembly sized to support a buffing pad having a diameter of 67 mm or more.

5. The chemical mechanical polishing module according to claim 1, wherein the support surface of the vacuum table is substantially perpendicular to the direction of gravity.

6. A method for processing a substrate, Positioning a substrate on a vacuum table of a substrate processing module, wherein the vacuum table includes a support surface including an array of arc-shaped concentric channels, and a vacuum table film fixed to a chuck plate of the vacuum table using adhesive, the vacuum table film having the array of arc-shaped concentric channels formed through it, the support surface of the vacuum table being substantially perpendicular to the direction of gravity, the grip area provided by the array of arc-shaped concentric channels being between 5% and 30% of the surface area of ​​the substrate positioned thereon, and the grip area including the effective area occupied by the array of arc-shaped concentric channels within the support surface of the vacuum table, The process involves pressing a buffing pad against the surface of the substrate while rotating the vacuum table below, wherein the buffing pad has a diameter of 67 mm or more, and the pressure applied between the buffing pad and the surface of the substrate is 0.5 psi or more. Includes, The chuck plate has a plurality of openings located on its upper surface, the array of arc-shaped concentric channels in the vacuum table film is aligned with corresponding openings located below it, and the width of each channel in the array of arc-shaped concentric channels is 1 mm or more and 2 mm or less, in this method.

7. The vacuum table is placed within the processing area of ​​the substrate processing module, and the substrate processing module is A chamber including a container and lid that jointly define the aforementioned processing area, The vacuum table, arranged within the processing area, A pad conditioning station positioned adjacent to the vacuum table, A pad carrier positioning arm connected to the pad carrier, and An actuator connected to the pad carrier positioning arm, configured to position the pad carrier assembly on a first position located on the support surface of the vacuum table and on a second position located on the pad conditioning station, The method according to claim 6, comprising:

8. A modular substrate processing system comprising a substrate processing module, The aforementioned substrate processing module A chamber comprising a container and a lid, wherein the lid comprises a plurality of side panels that jointly define a processing area together with the container, A rotatable vacuum table disposed within the processing area, wherein the vacuum table comprises an array of arc-shaped concentric channels defined on its support surface, A first substrate handler access door, located within a first side panel of the plurality of side panels, which is used to position a substrate on the rotatable vacuum table using a first substrate handler. A second substrate handler access door, located within a second side panel of the plurality of side panels, is used to remove the substrate from the rotatable vacuum table using the second substrate handler. A pad conditioning station positioned adjacent to the rotatable vacuum table, and Pad carrier positioning arm connected to pad carrier assembly A modular substrate processing system comprising the above features.

9. The modular substrate processing system according to claim 8, wherein a third side panel among the plurality of side panels has a maintenance opening, and the pad carrier positioning arm is configured to position the pad carrier assembly through the maintenance opening to facilitate maintenance access.

10. A first substrate processing area including multiple polishing stations, and A second substrate processing area including the substrate processing module and the first substrate handler, wherein the first substrate handler is positioned to transfer a substrate from the first substrate processing area to the substrate processing module. The modular substrate processing system according to claim 8, further comprising:

11. The modular substrate processing system according to claim 10, wherein the second substrate processing area further includes a substrate cleaning system, and the substrate processing module is positioned above the substrate cleaning system.

12. The modular substrate processing system according to claim 11, wherein the second substrate handler is positioned to transfer substrates from the substrate processing module to a cleaning station of the substrate cleaning system located below it.

13. The modular substrate processing system according to claim 8, wherein the substrate processing module further comprises an annular substrate lift mechanism surrounding the vacuum table.

14. The modular substrate processing system according to claim 13, wherein the annular substrate lifting mechanism comprises a plurality of substrate contact points arranged in close proximity to the periphery of the vacuum table, and is configured such that when the annular substrate lifting mechanism lifts the substrate from the support surface of the vacuum table, one of the plurality of substrate contact points contacts the substrate before the other of the plurality of substrate contact points.

15. The modular substrate processing system according to claim 8, wherein the width of each channel in the array of arc-shaped concentric channels is 10 mm or less.

16. The modular substrate processing system according to claim 15, wherein the grip area provided by the array of arc-shaped concentric channels is between 5% and 30% of the surface area of ​​the substrate to be processed placed thereon, and the grip area includes the effective area occupied by the array of arc-shaped concentric channels within the support surface of the vacuum table.

17. The modular substrate processing system according to claim 16, wherein the pad carrier assembly is sized to support a buffing pad having a diameter of 67 mm or more.

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