Resin compositions, films, optical filters, solid-state image sensors, and image display devices.

Abstract

A resin composition containing a coloring material A and a resin B, wherein: the coloring material A contains a pigment; the resin B contains a resin b1 that comprises a repeating unit b1-1 having an acid group, a repeating unit b1-2 having a functional group b selected from among a group containing two or more aromatic rings, a group containing a heterocyclic group, and a group containing a fused ring, and a repeating unit b1-3 differing from the repeating units b1-1 and b1-2; and the content of the coloring material A in the total solid content of the resin composition is 55 mass% or more. A film, an optical filter, a solid-state imaging element and an image display device, each using the resin composition.

Description

[Technical Field]

[0001] This invention relates to a resin composition containing a colorant. Furthermore, this invention relates to a film, optical filter, solid-state image sensor, and image display device using the resin composition. [Background technology]

[0002] Optical filters, such as color filters, are manufactured using resin compositions containing colorants.

[0003] For example, Patent Document 1 describes manufacturing a color filter using a resin composition comprising organic pigment nanoparticles having a primary particle number average particle size of 50 nm or less and a ratio of number average particle size to volume average particle size ([volume average particle size] / [number average particle size]) of 1.0 to 2.0, a graft polymer having repeating units containing at least organic dye residues in its stem chain, a polymerizable compound, and a photopolymerization initiator. [Prior art documents] [Patent Documents]

[0004] [Patent Document 1] Japanese Patent Publication No. 2009-084418 [Overview of the project] [Problems that the invention aims to solve]

[0005] In recent years, there has been a strong demand for miniaturization and thinner films in solid-state image sensors. Therefore, films containing colorants, such as color filters used in solid-state image sensors, are also increasingly desired to be thinner. To achieve thinner films while maintaining the desired spectral performance, it is necessary to increase the colorant concentration in the resin composition used for film formation.

[0006] However, when using a colorant containing pigments, increasing the colorant concentration in the resin composition relatively reduces the proportion of materials that can adsorb pigments, such as resins. As a result, pigments tend to aggregate during storage or application of the resin composition, and pigment aggregates may form in the film obtained using the resin composition. When such pigment aggregates form in the film, the variation in particle size of the pigments present in the film increases, such as the presence of pigments with larger particle sizes in some areas, which can easily lead to uneven coloring.

[0007] Therefore, an object of the present invention is to provide a resin composition capable of forming a film with suppressed color unevenness. Furthermore, the present invention is to provide a film, an optical filter, a solid-state image sensor, and an image display device. [Means for solving the problem]

[0008] Through the inventors' research, it was discovered that the above objective can be achieved by the resin composition described later, and thus the present invention was completed. Therefore, the present invention provides the following.

[0009] <1> A resin composition comprising colorant A and resin B, The above colorant A contains a pigment, The above resin B contains a resin b1 comprising repeating units b1-1 having an acid group, repeating units b1-2 having a functional group b selected from a group containing two or more aromatic rings, a group containing a heterocyclic group, and a group containing a fused ring, and repeating units b1-3 other than the above repeating units b1-1 and b1-2. A resin composition wherein the content of the above-mentioned colorant A in the total solid content of the resin composition is 55% by mass or more. <2> The above colorant A contains phthalocyanine pigment. <1> The resin composition described above. <3> The above colorant A further contains a dye. <1> or <2> The resin composition described above. <4> The above functional group b is a naphthalimide structure, acridone structure, thioxanthone structure, xanthone structure, anthron structure, benzimidazole structure, benzothiazole structure, benzoxazole structure, benzotriazole structure, benzoxadiazole structure, benzothiadiazole structure, benzothiazine structure, benzoxazine structure, benzoleinurea structure, isothiazolinone structure, phenoxazine structure, phenothiazine structure, dihydroacridine structure, phenoxatiin structure, dibenzopyran structure, fluorene structure, carbazole structure, carboline structure, dibenzothiophene structure, dibenzofuran structure, pyrimidine structure, pyrazine structure, quinazoline structure, quinoxaline structure, quinoline structure, imidazole structure, thia The group includes zole structures, indole structures, benzothiophene structures, benzopyran structures, quinolinone structures, thiochromanone structures, chroman structures, benzimidazolone structures, phthalimide structures, naphthalene-2,3-dicarboximide structures, pyrazole structures, pyrazolone structures, isoindoline structures, isoindolinone structures, anthraquinone structures, tetrazole structures, benzophenone structures, triazine structures, azobenzene structures, benzalaniline structures, phenazine structures, barbiturate structures, perylene structures, perinone structures, quinophthalone structures, caprolactam structures, saccharin structures, biphenyl structures, triarylbenzene structures, triarylamine structures, benzothiazolon structures, or benzoxazolinone structures. <1> ~ <3> A resin composition as described in any one of the following. <5> The above functional group b is a group containing a naphthalimide structure, acridone structure, xanthone structure, benzimidazole structure, benzothiazole structure, benzoxazole structure, benzotriazole structure, benzoxadiazole structure, benzothiadiazole structure, phenoxazine structure, phenothiazine structure, phenoxatiin structure, phthalimide structure, pyrazolone structure, tetrazole structure, benzothiazolon structure, or benzoxazolinone structure. <1> ~ <3> A resin composition as described in any one of the following. <6> The content of the above unit b1-2 in the above resin b1 is 10 to 35% by mass. <1> ~ <5> A resin composition as described in any one of the following. <7> The repeating units b1-3 described above include repeating units having graft chains of polyester or polyether structure. <1> ~ <6> A resin composition as described in any one of the following. <8> The above resin B further includes a resin b2 that is different from the above resin b1. <1> ~ <7> A resin composition as described in any one of the following. <9> The above resin b2 includes a resin having an acid group different from that of the above resin b1. <8> The resin composition described above. <10> The above resin b2 has acid groups with a pKa smaller than the acid groups of the above resin b1. <9> The resin composition described above. <11> The above resin b2 includes at least one selected from graft polymers, star polymers, block copolymers, and resins in which at least one end of the polymer chain is encapsulated with an acid group. <8> ~ <10> A resin composition as described in any one of the following. <12> Furthermore, it includes a polymerizable compound and a photopolymerization initiator. <1> ~ <11> A resin composition as described in any one of the following. <13> <1> ~ <12> A film obtained from any one of the resin compositions described in that statement. <14> <13> An optical filter having the film described above. <15> <13> A solid-state image sensor having the film described above. <16> <13> An image display device having the film described above. [Effects of the Invention]

[0010] According to the present invention, it is possible to provide a resin composition that can form a film with suppressed color unevenness. Furthermore, it is possible to provide a film, an optical filter, a solid-state image sensor, and an image display device. [Modes for carrying out the invention]

[0011] The details of the present invention will be described in detail below. In this specification, "~" is used to mean that the numbers before and after it include the lower and upper limits, respectively. In this specification, when groups (atomic groups) are not specified as substituted or unsubstituted, the notation includes both groups (atomic groups) with and without substituents. For example, "alkyl group" includes not only unsubstituted alkyl groups but also substituted alkyl groups. In this specification, "exposure" includes not only exposure using light but also drawing using particle beams such as electron beams and ion beams, unless otherwise specified. Examples of light used for exposure include the emission spectrum of mercury lamps, far ultraviolet light represented by excimer lasers, extreme ultraviolet (EUV) light, X-rays, electron beams, and other active light or radiation. In this specification, "(meth)acrylate" refers to both acrylate and methacrylate, or either of them; "(meth)acrylic" refers to both acrylic and methacrylic, or either of them; and "(meth)acryloyl" refers to both acryloyl and methacryloyl, or either of them. In this specification, Me in the structural formula represents a methyl group, Et represents an ethyl group, Bu represents a butyl group, and Ph represents a phenyl group. In this specification, the weight-average molecular weight and number-average molecular weight are polystyrene-equivalent values ​​measured by GPC (gel permeation chromatography). In this specification, total solids refers to the total mass of the components of the composition excluding the solvent. In this specification, "pigment" means a colorant that is poorly soluble in solvents. In this specification, the term "process" includes not only independent processes but also any process that cannot be clearly distinguished from other processes, as long as its intended function is achieved.

[0012] <Resin composition> The present invention is a resin composition comprising a colorant A and a resin B, The above colorant A contains a pigment, The above resin B contains a resin b1 comprising repeating units b1-1 having an acid group, repeating units b1-2 having a functional group b selected from a group containing two or more aromatic rings, a group containing a heterocyclic group, and a group containing a fused ring, and repeating units b1-3 other than repeating units b1-1 and b1-2. The resin composition is characterized by having a colorant A content of 55% by mass or more in the total solid content.

[0013] According to the resin composition of the present invention, by including the above-mentioned resin b1, it is possible to form a film with suppressed color unevenness even though the content of colorant A in the total solid content of the resin composition is 55% by mass or more.

[0014] The resin composition of the present invention is preferably used as a resin composition for optical filters. Examples of optical filters include color filters, near-infrared transmission filters, and near-infrared cut filters, with color filters being preferred. Furthermore, the resin composition of the present invention is preferably used for solid-state image sensors. More specifically, it is preferably used as a resin composition for optical filters used in solid-state image sensors, and more preferably as a resin composition for forming colored pixels in color filters used in solid-state image sensors.

[0015] Examples of color filters include filters having colored pixels that transmit light of a specific wavelength. Examples of colored pixels include red pixels, green pixels, blue pixels, magenta pixels, cyan pixels, and yellow pixels, with green, blue, or cyan pixels being preferred, and green pixels being more preferred. The colored pixels of the color filter can be formed using a resin composition containing a chromatic colorant.

[0016] The maximum absorption wavelength of the near-infrared cut filter is preferably in the range of 700 to 1800 nm, more preferably in the range of 700 to 1300 nm, and even more preferably in the range of 700 to 1000 nm. Furthermore, the transmittance of the near-infrared cut filter over the entire range of wavelengths from 400 to 650 nm is preferably 70% or more, more preferably 80% or more, and even more preferably 90% or more. Furthermore, the transmittance at at least one point in the range of wavelengths from 700 to 1800 nm is preferably 20% or less. In addition, the ratio of the absorbance Amax at the maximum absorption wavelength of the near-infrared cut filter to the absorbance A550 at a wavelength of 550 nm (absorbance Amax / absorbance A550) is preferably 20 to 500, more preferably 50 to 500, even more preferably 70 to 450, and particularly preferably 100 to 400. The near-infrared cut filter can be formed using a resin composition containing a near-infrared absorbing colorant.

[0017] A near-infrared transmission filter is a filter that transmits at least a portion of near-infrared light. Preferably, a near-infrared transmission filter is a filter that blocks at least a portion of visible light and transmits at least a portion of near-infrared light. Preferred near-infrared transmission filters include filters that satisfy spectral characteristics such as a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 640 nm and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1100 to 1300 nm. Preferably, a near-infrared transmission filter is a filter that satisfies any of the following spectral characteristics (1) to (5). (1) A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 640 nm, and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 800 to 1500 nm. (2) A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 750 nm, and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 900 to 1500 nm. (3) A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 830 nm, and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1000 to 1500 nm. (4) A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 950 nm, and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1100 to 1500 nm. (5) A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 1050 nm, and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1200 to 1500 nm.

[0018] The resin composition of the present invention can also be used in light-shielding films and the like.

[0019] The solid content concentration of the resin composition of the present invention is preferably 5 to 30% by mass. The lower limit is preferably 7.5% by mass or more, and more preferably 10% by mass or more. The upper limit is preferably 25% by mass or less, more preferably 20% by mass or less, and even more preferably 15% by mass or less.

[0020] The following describes each component used in the resin composition of the present invention.

[0021] <<Colorant A>> The resin composition of the present invention contains a colorant A (hereinafter referred to as "colorant"). Examples of colorants include white colorants, black colorants, chromatic colorants, and near-infrared absorbing colorants. Pigment derivatives can also be used as colorants. In this invention, the white colorant includes not only pure white but also light gray colorants that are close to white (e.g., off-white, light gray, etc.).

[0022] The colorant used in the resin composition of the present invention contains a pigment. The pigment may be either an inorganic pigment or an organic pigment, but an organic pigment is preferred from the viewpoint of a wide range of color variations, ease of dispersion, and safety. Furthermore, the pigment preferably contains at least one selected from chromatic pigments and near-infrared absorbing pigments, and more preferably contains a chromatic pigment.

[0023] Furthermore, the colorant preferably contains at least one selected from phthalocyanine pigments, dioxazine pigments, quinacridone pigments, anthraquinone pigments, perylene pigments, azo pigments, azomethine pigments, diketopyrrolopyrrole pigments, pyrrolopyrrole pigments, isoindoline pigments, and quinophthalone pigments, more preferably contains at least one selected from phthalocyanine pigments, diketopyrrolopyrrole pigments, and pyrrolopyrrole pigments, and even more preferably contains phthalocyanine pigments for the reason that the effects of the present invention are more significantly exhibited. Furthermore, the phthalocyanine pigment is preferably a phthalocyanine pigment without a central metal, or a phthalocyanine pigment having copper or zinc as the central metal, and more preferably a phthalocyanine pigment having copper or zinc as the central metal. Furthermore, the phthalocyanine pigment is preferably a halogenated phthalocyanine pigment.

[0024] The average primary particle diameter of the pigment is preferably 1 to 200 nm. The lower limit is preferably 5 nm or more, and more preferably 10 nm or more. The upper limit is preferably 180 nm or less, more preferably 150 nm or less, and even more preferably 100 nm or less. If the average primary particle diameter of the pigment is within the above range, the dispersion stability of the pigment in the resin composition is good. In this invention, the primary particle diameter of the pigment can be determined by observing the primary particles of the pigment with a transmission electron microscope and obtaining a photograph. Specifically, the projected area of ​​the primary particles of the pigment is determined, and the corresponding equivalent circle diameter is calculated as the primary particle diameter of the pigment. In this invention, the average primary particle diameter is the arithmetic mean of the primary particle diameters of 400 primary particles of the pigment. Primary particles of the pigment refer to independent particles that are not aggregated.

[0025] The crystallite size of organic pigments and pigment derivatives is preferably 0.1 to 50 nm, more preferably 0.5 to 30 nm, and even more preferably 1 to 15 nm. The crystallite size can be determined from the full width at half maximum of the diffraction angle peak using an X-ray diffractometer, and is calculated using Scherrer's formula. The crystallite size of organic pigments and pigment derivatives can be adjusted by known methods such as adjusting the manufacturing conditions or grinding after manufacturing.

[0026] The colorant contained in the resin composition of the present invention preferably comprises a pigment and a pigment derivative. Examples of pigment derivatives include compounds having a structure in which an acidic group or a basic group is bonded to a pigment skeleton. Details of pigment derivatives will be described later. The content of the pigment derivative is preferably 1 to 30 parts by mass, and more preferably 3 to 20 parts by mass, per 100 parts by mass of pigment. Only one type of pigment derivative may be used, or two or more types may be used in combination.

[0027] The colorant contained in the resin composition of the present invention may further contain a dye. When a dye is included, the dye content is preferably 10 to 100 parts by mass per 100 parts by mass of pigment. The upper limit is preferably 80 parts by mass or less, and more preferably 70 parts by mass or less. The lower limit is preferably 20 parts by mass or more, more preferably 30 parts by mass or more, and even more preferably 40 parts by mass or more. Only one type of dye may be used, or two or more types may be used in combination. Furthermore, it is preferable that the colorant contained in the resin composition of the present invention is substantially free of dyes. According to this embodiment, a film with excellent light resistance and heat resistance can be formed. Substantially free of dyes means that the dye content in the colorant is 0.1% by mass or less, preferably 0.01% by mass or less, and even more preferably no dyes at all.

[0028] (Chromatic color materials) Examples of chromatic colorants include those having a maximum absorption wavelength in the range of 400 to 700 nm. Examples include yellow, orange, red, green, purple, and blue colorants. From the viewpoint of heat resistance, chromatic colorants are preferably pigments (chromatic pigments), more preferably red pigments, yellow pigments, and blue pigments, and even more preferably red and blue pigments. Specific examples of chromatic pigments are shown below.

[0029] Examples of red colorants include diketopyrrolopyrrole compounds, anthraquinone compounds, azo compounds, naphthol compounds, azomethine compounds, xanthene compounds, quinacridone compounds, perylene compounds, and thioindigo compounds. Diketopyrrolopyrrole compounds, anthraquinone compounds, and azo compounds are preferred, and diketopyrrolopyrrole compounds are more preferred. Furthermore, the red colorant is preferably a pigment.

[0030] Specific examples of red pigments include CI (Color Index) Pigment Red 1, 2, 3, 4, 5, 6, 7, 9, 10, 14, 17, 22, 23, 31, 38, 41, 48:1, 48:2, 48:3, 48:4, 49, 49:1, 49:2, 52:1, 52:2, 53:1, 57:1, 60:1, 63:1, 66, 67, 81:1, 81:2, 81:3, 83, 88, 90, 105, 112, 119, 122, 123, 144, Examples of red pigments include 146, 149, 150, 155, 166, 168, 169, 170, 171, 172, 175, 176, 177, 178, 179, 184, 185, 187, 188, 190, 200, 202, 206, 207, 208, 209, 210, 216, 220, 224, 226, 242, 246, 254, 255, 264, 269, 270, 272, 279, 291, 294, 295, 296, and 297. Furthermore, as red colorants, diketopyrrolopyrrole compounds in which at least one bromine atom is substituted in the structure described in Japanese Patent Publication No. 2017-201384, diketopyrrolopyrrole compounds described in paragraphs 0016-0022 of Japanese Patent No. 6248838, diketopyrrolopyrrole compounds described in International Publication No. 2012 / 102399, diketopyrrolopyrrole compounds described in International Publication No. 2012 / 117965, brominated diketopyrrolopyrrole compounds described in Japanese Patent Publication No. 2020-085947, naphthol azo compounds described in Japanese Patent Publication No. 2012-229344, and Japanese Patent No. 65 Red colorants described in Japanese Patent Publication No. 16119, red colorants described in Japanese Patent Publication No. 6525101, brominated diketopyrrolopyrrole compounds described in paragraph 0229 of Japanese Patent Application Publication No. 2020-090632, anthraquinone compounds described in Korean Published Patent Publication No. 10-2019-0140741, anthraquinone compounds described in Korean Published Patent Publication No. 10-2019-0140744, perylene compounds described in Japanese Patent Application Publication No. 2020-079396, and diketopyrrolopyrrole compounds described in paragraphs 0025 to 0041 of Japanese Patent Application Publication No. 2020-066702 can also be used as red colorants. Furthermore, compounds having a structure in which an aromatic ring group, to which an oxygen atom, sulfur atom, or nitrogen atom is bonded to the aromatic ring, is bonded to a diketopyrrolopyrrole skeleton can also be used as red colorants.

[0031] As for the red colorants, CI Pigment Red 122, 177, 254, 255, 264, 269, and 272 are preferred, CI Pigment Red 254, 264, and 272 are more preferred, and CI Pigment Red 254 and 264 are even more preferred.

[0032] Examples of green colorants include phthalocyanine compounds and squarylium compounds, with phthalocyanine compounds being preferred and phthalocyanine pigments being more preferred. Furthermore, it is preferable that the green colorant be a pigment.

[0033] Specific examples of green colorants include CI Pigment Green 7, 10, 36, 37, 58, 59, 62, 63, 64, 65, and 66. Alternatively, zinc phthalocyanine halides, which have an average of 10-14 halogen atoms, 8-12 bromine atoms, and 2-5 chlorine atoms per molecule, can also be used as green colorants. Specific examples include the compounds described in International Publication No. 2015 / 118720. Furthermore, as a green coloring agent, compounds described in Chinese Patent Application No. 106909027, phthalocyanine compounds having a phosphate ester as a ligand as described in International Publication No. 2012 / 102395, phthalocyanine compounds described in Japanese Patent Publication No. 2019-008014, phthalocyanine compounds described in Japanese Patent Publication No. 2018-180023, compounds described in Japanese Patent Publication No. 2019-038958, aluminum phthalocyanine compounds described in Japanese Patent Publication No. 2020-070426, and core-shell type dyes described in Japanese Patent Publication No. 2020-076995 can also be used.

[0034] As for the green colorants, CI Pigment Green 7, 36, 58, 62, and 63 are preferred, and CI Pigment Green 36 and 58 are more preferred. It is used.

[0035] Specific examples of orange colorants include CI Pigment Orange 2, 5, 13, 16, 17:1, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, 64, 71, and 73.

[0036] Examples of yellow colorants include azo compounds, azomethine compounds, isoindoline compounds, pteridine compounds, quinophthalone compounds, and perylene compounds. Specific examples of yellow pigments include CI Pigment Yellow 1, 2, 3, 4, 5, 6, 10, 11, 12, 13, 14, 15, 16, 17, 18, 20, 24, 31, 32, 34, 35, 35:1, 36, 36:1, 37, 37:1, 40, 42, 43, 53, 55, 60, 61, 62, 63, 65, 73, 74, 77, 81, 83, 86, 93, 94, 95, 97, 98, 100, 101, 104, 106, 108, 109, 110, 113, 114, 115, 116, 117, 118, 119, 120 Examples of yellow pigments include 123, 125, 126, 127, 128, 129, 137, 138, 139, 147, 148, 150, 151, 152, 153, 154, 155, 156, 161, 162, 164, 166, 167, 168, 169, 170, 171, 172, 173, 174, 175, 176, 177, 179, 180, 181, 182, 185, 187, 188, 193, 194, 199, 213, 214, 215, 228, 231, 232, 233, 234, 235, and 236.

[0037] Furthermore, a nickel azobarbiturate complex with the following structure can also be used as a yellow coloring agent. [ka]

[0038] Furthermore, as a yellow coloring agent, the compounds described in Japanese Patent Publication No. 2017-201003, Japanese Patent Publication No. 2017-197719, Japanese Patent Publication No. 2017-171912 (paragraphs 0011-0062, 0137-0276), Japanese Patent Publication No. 2017-171913 (paragraphs 0010-0062, 0138-0295), Japanese Patent Publication No. 2017-171914 (paragraphs 0011-0062, 0139-0190), and Japanese Patent Publication No. 2017-171915 (paragraphs 0010-0065, 0142-0222) The following are examples of the following compounds: quinophthalone compounds described in paragraphs 0011-0034 of JP 2013-054339, quinophthalone compounds described in paragraphs 0013-0058 of JP 2014-026228, isoindoline compounds described in JP 2018-062644, quinophthalone compounds described in JP 2018-203798, quinophthalone compounds described in JP 2018-062578, quinophthalone compounds described in Japanese Patent No. 6432076, quinophthalone compounds described in JP 2018-155881, and JP 2018-1117 Quinophthalone compounds described in Japanese Patent Publication No. 57, Quinophthalone compounds described in Japanese Patent Publication No. 2018-040835, Quinophthalone compounds described in Japanese Patent Publication No. 2017-197640, Quinophthalone compounds described in Japanese Patent Publication No. 2016-145282, Quinophthalone compounds described in Japanese Patent Publication No. 2014-085565, Quinophthalone compounds described in Japanese Patent Publication No. 2014-021139, Quinophthalone compounds described in Japanese Patent Publication No. 2013-209614, Quinophthalone compounds described in Japanese Patent Publication No. 2013-209435, Quinophthalone compounds described in Japanese Patent Publication No. 2013-181015 Quinophthalone compounds, quinophthalone compounds described in Japanese Patent Publication No. 2013-061622, quinophthalone compounds described in Japanese Patent Publication No. 2013-032486, quinophthalone compounds described in Japanese Patent Publication No. 2012-226110, quinophthalone compounds described in Japanese Patent Publication No. 2008-074987, quinophthalone compounds described in Japanese Patent Publication No. 2008-081565, quinophthalone compounds described in Japanese Patent Publication No. 2008-074986, quinophthalone compounds described in Japanese Patent Publication No. 2008-074985, quinophthalone compounds described in Japanese Patent Publication No. 2008-050420,Quinophthalone compounds described in Japanese Patent Publication No. 2008-031281, Quinophthalone compounds described in Japanese Patent Publication No. 48-032765, Quinophthalone compounds described in Japanese Patent Publication No. 2019-008014, Quinophthalone compounds described in Japanese Patent Publication No. 6607427, Methine dyes described in Japanese Patent Publication No. 2019-073695, Methine dyes described in Japanese Patent Publication No. 2019-073696, The methine dye described in Japanese Patent Publication No. 2019-073697, the methine dye described in Japanese Patent Publication No. 2019-073698, the compound described in Korean Published Patent No. 10-2014-0034963, the compound described in Japanese Patent Publication No. 2017-095706, the compound described in Taiwan Patent Application Publication No. 201920495, the compound described in Japanese Patent No. 6607427, and Japanese Patent Publication No. 2020-03352 The following compounds may also be used: compounds described in Japanese Patent Publication No. 5, compounds described in Japanese Patent Publication No. 2020-033524, compounds described in Japanese Patent Publication No. 2020-033523, compounds described in Japanese Patent Publication No. 2020-033522, compounds described in Japanese Patent Publication No. 2020-033521, compounds described in International Publication No. 2020 / 045200, compounds described in International Publication No. 2020 / 045199, compounds described in International Publication No. 2020 / 045197, azo compounds described in Japanese Patent Publication No. 2020-093994, perylene compounds described in Japanese Patent Publication No. 2020-083982, perylene compounds described in International Publication No. 2020 / 105346, quinophthalone compounds described in Japanese Patent Publication No. 2020-517791, compounds represented by the following formula (QP1), and compounds represented by the following formula (QP2). Furthermore, polymerized forms of these compounds are also preferably used from the viewpoint of improving color value. [ka]

[0039] In formula (QP1), X 1 ~X 16 Each of these independently represents a hydrogen atom or a halogen atom, Z 1 represents an alkylene group having 1 to 3 carbon atoms. A specific example of a compound represented by formula (QP1) is the compound described in paragraph 0016 of Japanese Patent Publication No. 6443711. [ka]

[0040] In formula (QP2), Y 1 ~Y 3 Each of these independently represents a halogen atom. n and m are integers from 0 to 6, and p is an integer from 0 to 5. (n+m) is 1 or greater. Specific examples of compounds represented by formula (QP2) include those described in paragraphs 0047 to 0048 of Japanese Patent Publication No. 6432077.

[0041] Specific examples of purple pigments include CI Pigment Violet 1, 19, 23, 27, 32, 37, 42, 60, and 61.

[0042] Specific examples of blue colorants include blue pigments such as CI Pigment Blue 1, 2, 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 22, 29, 60, 64, 66, 79, 80, 87, and 88. In addition, aluminum phthalocyanine compounds having a phosphorus atom can be used as blue colorants. Specific examples include the compounds described in paragraphs 0022 to 0030 of Japanese Patent Publication No. 2012-247591 and paragraph 0047 of Japanese Patent Publication No. 2011-157478.

[0043] Furthermore, diarylmethane compounds described in Japanese Patent Publication No. 2020-504758 can be used as green or blue colorants.

[0044] Regarding the diffraction angles that various pigments preferably possess, refer to the descriptions in Japanese Patent Publication No. 6561862, Japanese Patent Publication No. 6413872, Japanese Patent Publication No. 6281345, Japanese Unexamined Patent Publication No. 2020-026503, and Japanese Unexamined Patent Publication No. 2020-033526, and these contents are incorporated herein by reference. Furthermore, it is also preferable to use a pyrrolopyrrole pigment in which the crystallite size in the plane direction corresponding to the maximum peak in the X-ray diffraction pattern among the eight (±1±1±1) planes of the crystal lattice is 140 Å or less. Furthermore, it is also preferable to set the physical properties of the pyrrolopyrrole pigment as described in paragraphs 0028 to 0073 of Japanese Unexamined Patent Publication No. 2020-097744.

[0045] Furthermore, using a zinc halide phthalocyanine pigment having a Raman spectrum as described in Japanese Patent No. 6744002 is also preferable from the viewpoint of improving spectral characteristics. Additionally, using a dioxazine pigment with a controlled contact angle as described in International Publication No. 2019 / 107166 is also preferable from the viewpoint of viscosity adjustment.

[0046] Dyes can also be used as chromatic colorants. There are no particular restrictions on the dyes used, and known dyes can be used. Examples of dyes include pyrazole azo, anilino azo, triarylmethane, anthraquinone, anthrapyridone, benzylidene, oxonol, pyrazolotriazole azo, pyridone azo, cyanine, phenothiazine, pyrrolopyrazole azomethine, xanthene, phthalocyanine, benzopyran, indigo, and pyromethene dyes.

[0047] Chromatic pigments can also be made from pigment polymers. The pigment polymer is preferably a dye that is dissolved in a solvent. The pigment polymer may also form particles. When the pigment polymer is in particle form, it is usually used in a dispersed state in a solvent. Particle-form pigment polymers can be obtained, for example, by emulsion polymerization, and the compound and manufacturing method described in Japanese Patent Publication No. 2015-214682 are specific examples. The pigment polymer has two or more pigment structures in one molecule, preferably three or more. There is no particular upper limit, but it can be 100 or less. The multiple pigment structures in one molecule may be the same pigment structure or different pigment structures. The weight-average molecular weight (Mw) of the pigment polymer is preferably 2000 to 50000. The lower limit is more preferably 3000 or more, and even more preferably 6000 or more. The upper limit is more preferably 30000 or less, and even more preferably 20000 or less. The pigment polymer can also be a compound described in Japanese Patent Publication No. 2011-213925, Japanese Patent Publication No. 2013-041097, Japanese Patent Publication No. 2015-028144, Japanese Patent Publication No. 2015-030742, International Publication No. 2016 / 031442, etc.

[0048] Furthermore, as chromatic colorants, the following are used: the triarylmethane dye polymer described in Korean Published Patent No. 10-2020-0028160, the xanthene compound described in Japanese Patent Application Publication No. 2020-117638, the phthalocyanine compound described in International Publication No. 2020 / 174991, the isoindoline compound described in Japanese Patent Application Publication No. 2020-160279 or salts thereof, the compound represented by Formula 1 described in Korean Published Patent No. 10-2020-0069442, and Korean Published Patent No. 10-2020-00 The following compounds can be used: the compound represented by formula 1 described in Japanese Patent Publication No. 69730, the compound represented by formula 1 described in Korean Published Patent No. 10-2020-0069070, the compound represented by formula 1 described in Korean Published Patent No. 10-2020-0069067, the compound represented by formula 1 described in Korean Published Patent No. 10-2020-0069062, the zinc halide phthalocyanine pigment described in Japanese Patent No. 6809649, and the isoindoline compound described in Japanese Patent Publication No. 2020-180176. The chromatic colorant may be a rotaxane, and the pigment skeleton may be used in a cyclic structure of the rotaxane, in a rod-like structure, or in both structures.

[0049] Two or more chromatic colorants may be used in combination. Furthermore, when two or more chromatic colorants are used in combination, the combination of two or more chromatic colorants may form black. Examples of such combinations include the following embodiments (1) to (7). When the resin composition contains two or more chromatic colorants and exhibits black color through a combination of two or more chromatic colorants, the resin composition of the present invention can be preferably used as a resin composition for forming near-infrared transmission filters. (1) An embodiment containing a red colorant and a blue colorant. (2) An embodiment containing a red colorant, a blue colorant, and a yellow colorant. (3) A form containing a red colorant, a blue colorant, a yellow colorant, and a purple colorant. (4) An embodiment containing a red colorant, a blue colorant, a yellow colorant, a purple colorant, and a green colorant. (5) An embodiment containing a red colorant, a blue colorant, a yellow colorant, and a green colorant. (6) An embodiment containing a red colorant, a blue colorant, and a green colorant. (7) An embodiment containing a yellow colorant and a purple colorant.

[0050] (white color material) Examples of white colorants include inorganic pigments (white pigments) such as titanium dioxide, strontium titanate, barium titanate, zinc oxide, magnesium oxide, zirconium oxide, aluminum oxide, barium sulfate, silica, talc, mica, aluminum hydroxide, calcium silicate, aluminum silicate, hollow resin particles, and zinc sulfide. White pigments are preferably particles containing titanium atoms, with titanium dioxide being more preferred. Furthermore, white pigments are preferably particles with a refractive index of 2.10 or higher for light at a wavelength of 589 nm. The aforementioned refractive index is preferably between 2.10 and 3.00, and more preferably between 2.50 and 2.75.

[0051] Additionally, the white pigment can be titanium dioxide as described in "Titanium Dioxide: Physical Properties and Applied Technologies" by Manabu Seino, pages 13-45, published June 25, 1991, by Gihodo Publishing.

[0052] White pigments may consist not only of a single inorganic substance but also of particles compounded with other materials. For example, it is preferable to use particles having voids or other materials inside, particles with many inorganic particles attached to a core particle, or core-shell composite particles consisting of a core particle made of polymer particles and a shell layer made of inorganic nanoparticles. As for the core-shell composite particles consisting of a core particle made of polymer particles and a shell layer made of inorganic nanoparticles, for example, the description in paragraphs 0012 to 0042 of Japanese Patent Application Publication No. 2015-047520 can be referenced, and this content is incorporated herein.

[0053] White pigments can also be made using hollow inorganic particles. Hollow inorganic particles are inorganic particles with a structure that has a cavity inside, and are defined as inorganic particles that have a cavity surrounded by an outer shell. Examples of hollow inorganic particles include those described in Japanese Patent Publication No. 2011-075786, International Publication No. 2013 / 061621, and Japanese Patent Publication No. 2015-164881, and the contents of these publications are incorporated herein by reference.

[0054] (Black coloring agent) The black colorant is not particularly limited, and known materials can be used. For example, inorganic black colorants include inorganic pigments (black pigments) such as carbon black, titanium black, and graphite, with carbon black and titanium black being preferred, and titanium black being more preferred. Titanium black refers to black particles containing titanium atoms, with lower-order titanium oxide and titanium oxynitride being preferred. Titanium black can be modified on the surface as needed for purposes such as improving dispersibility and suppressing aggregation. For example, the surface of titanium black can be coated with silicon oxide, titanium oxide, germanium oxide, aluminum oxide, magnesium oxide, or zirconium oxide. Treatment with water-repellent substances, as shown in Japanese Patent Application Publication No. 2007-302836, is also possible. Examples of black pigments include CI Pigment Black 1 and 7. It is preferable that both the primary particle diameter and the average primary particle diameter of individual titanium black particles are small. Specifically, it is preferable that the average primary particle diameter is 10 to 45 nm. Titanium black can also be used as a dispersion. For example, a dispersion containing titanium black particles and silica particles, in which the ratio of Si atoms to Ti atoms in the dispersion is adjusted to the range of 0.20 to 0.50, is an example. Regarding the above dispersion, reference can be made to paragraphs 0020 to 0105 of Japanese Patent Application Publication No. 2012-169556, and this content is incorporated herein by reference. Examples of commercially available titanium black products include Titanium Black 10S, 12S, 13R, 13M, 13M-C, 13R-N, 13M-T (product name: manufactured by Mitsubishi Materials Corporation), and Tilack D (product name: manufactured by Ako Chemical Co., Ltd.).

[0055] Examples of organic black colorants include bisbenzofuranone compounds, azomethine compounds, perylene compounds, and azo compounds. Examples of bisbenzofuranone compounds include those described in Japanese Patent Publication No. 2010-534726, Japanese Patent Publication No. 2012-515233, and Japanese Patent Publication No. 2012-515234, and are available, for example, as "Irgaphor Black" manufactured by BASF. Examples of perylene compounds include those described in paragraphs 0016 to 0020 of Japanese Patent Publication No. 2017-226821, as well as CI Pigment Black 31 and 32. Examples of azomethine compounds include those described in Japanese Patent Publication No. 01-170601 and Japanese Patent Publication No. 02-034664, and are available, for example, as "Chromofine Black A1103" manufactured by Dainichi Seika Co., Ltd.

[0056] The colorant used in the resin composition of the present invention may consist only of the black colorant described above, or it may further contain a chromatic colorant. According to this embodiment, a resin composition that can form a film with excellent light-shielding properties in the visible region is easily obtained. When a black colorant and a chromatic colorant are used in combination as colorants, the mass ratio of the two is preferably black colorant:chromatic colorant = 100:10 to 300, and more preferably 100:20 to 200.

[0057] Preferred combinations of black pigments and chromatic pigments include, for example, the following: (A-1) An embodiment containing an organic black colorant and a blue colorant. (A-2) An embodiment containing an organic black colorant, a blue colorant, and a yellow colorant. (A-3) An embodiment containing an organic black colorant, a blue colorant, a yellow colorant, and a red colorant. (A-4) An embodiment containing an organic black colorant, a blue colorant, a yellow colorant, and a purple colorant.

[0058] In the embodiment (A-1) described above, the mass ratio of the organic black pigment to the blue pigment is preferably 100:1 to 70, more preferably 100:5 to 60, and even more preferably 100:10 to 50. In the aspect of (A-2) above, the mass ratio of the organic black colorant, blue colorant, and yellow colorant is preferably organic black colorant:blue colorant:yellow colorant = 100:10 to 90:10 to 90, more preferably 100:15 to 85:15 to 80, and even more preferably 100:20 to 80:20 to 70. In the aspect of (A-3) above, the mass ratio of the organic black colorant, blue colorant, yellow colorant, and red colorant is preferably organic black colorant:blue colorant:yellow colorant:red colorant = 100:20 to 150:1 to 60:10 to 100, more preferably 100:30 to 130:5 to 50:20 to 90, and even more preferably 100:40 to 120:10 to 40:30 to 80. In the aspect of (A-4) above, the mass ratio of the organic black colorant, blue colorant, yellow colorant, and purple colorant is preferably organic black colorant:blue colorant:yellow colorant:purple colorant = 100:20 to 150:1 to 60:10 to 100, more preferably 100:30 to 130:5 to 50:20 to 90, and even more preferably 100:40 to 120:10 to 40:30 to 80.

[0059] (Near-infrared absorbing colorant) The near-infrared absorbing colorant is preferably a compound having a maximum absorption wavelength on the longer wavelength side than 700 nm. The infrared absorber is preferably a compound having a maximum absorption wavelength in the range exceeding 700 nm and not exceeding 1800 nm, more preferably a compound having a maximum absorption wavelength in the range exceeding 700 nm and not exceeding 1400 nm, even more preferably a compound having a maximum absorption wavelength in the range exceeding 700 nm and not exceeding 1200 nm, and particularly preferably a compound having a maximum absorption wavelength in the range exceeding 700 nm and not exceeding 1000 nm. Also, the absorbance A at 500 nm of the near-infrared absorbing colorant 1 and the absorbance A at the maximum absorption wavelength 2 and the ratio A 1 / A 2 is preferably 0.08 or less, and more preferably 0.04 or less. Also, the near-infrared absorbing colorant is preferably a pigment, and more preferably an organic pigment.

[0060] Examples of near-infrared absorbing colorants include pyrrolopyrrole compounds, cyanine compounds, squarylium compounds, phthalocyanine compounds, naphthalocyanine compounds, quaterylene compounds, merocyanine compounds, crokonium compounds, oxonol compounds, iminium compounds, dithiol compounds, triarylmethane compounds, pyromethene compounds, azomethine compounds, anthraquinone compounds, dibenzofuranone compounds, dithiolene metal complexes, metal oxides, and metal borides. Examples of pyrrolopyrrole compounds include those described in paragraphs 0016 to 0058 of Japanese Patent Publication No. 2009-263614, those described in paragraphs 0037 to 0052 of Japanese Patent Publication No. 2011-068731, and those described in paragraphs 0010 to 0033 of International Publication No. 2015 / 166873. Examples of squarylium compounds include the compounds described in paragraphs 0044 to 0049 of Japanese Patent Publication No. 2011-208101, the compounds described in paragraphs 0060 to 0061 of Japanese Patent No. 6065169, the compounds described in paragraph 0040 of International Publication No. 2016 / 181987, the compounds described in Japanese Patent Publication No. 2015-176046, and the compounds described in paragraph 0072 of International Publication No. 2016 / 190162. Examples include compounds, compounds described in paragraphs 0196 to 0228 of Japanese Patent Publication No. 2016-074649, compounds described in paragraph 0124 of Japanese Patent Publication No. 2017-067963, compounds described in International Publication No. 2017 / 135359, compounds described in Japanese Patent Publication No. 2017-114956, compounds described in Japanese Patent No. 6197940, and compounds described in International Publication No. 2016 / 120166. Examples of cyanine compounds include those described in paragraphs 0044 to 0045 of Japanese Patent Publication No. 2009-108267, those described in paragraphs 0026 to 0030 of Japanese Patent Publication No. 2002-194040, those described in Japanese Patent Publication No. 2015-172004, those described in Japanese Patent Publication No. 2015-172102, those described in Japanese Patent Publication No. 2008-088426, those described in paragraph 0090 of International Publication No. 2016 / 190162, and those described in Japanese Patent Publication No. 2017-031394. Examples of croconium compounds include those described in Japanese Patent Publication No. 2017-082029.Examples of iminium compounds include the compounds described in Japanese Patent Publication No. 2008-528706, the compounds described in Japanese Patent Application Publication No. 2012-012399, the compounds described in Japanese Patent Application Publication No. 2007-092060, and the compounds described in paragraphs 0048 to 0063 of International Publication No. 2018 / 043564. Examples of phthalocyanine compounds include the compound described in paragraph 0093 of Japanese Patent Publication No. 2012-077153, oxytitanium phthalocyanine described in Japanese Patent Publication No. 2006-343631, the compounds described in paragraphs 0013 to 0029 of Japanese Patent Publication No. 2013-195480, the vanadium phthalocyanine compound described in Japanese Patent No. 6081771, the vanadium phthalocyanine compound described in International Publication No. 2020 / 071486, and the phthalocyanine compound described in International Publication No. 2020 / 071470. Examples of naphthalocyanine compounds include the compound described in paragraph 0093 of Japanese Patent Publication No. 2012-077153. Examples of dithiolene metal complexes include the compound described in Japanese Patent No. 5733804. Examples of metal oxides include indium tin oxide, antimony tin oxide, zinc oxide, Al-doped zinc oxide, fluorine-doped tin dioxide, niobium-doped titanium dioxide, and tungsten oxide. For details on tungsten oxide, refer to paragraph 0080 of Japanese Patent Publication No. 2016-006476, which is incorporated herein by reference. Examples of metal borides include lanthanum boride. Commercially available lanthanum boride products include LaB6-F (manufactured by Nippon Shinkinzoku Co., Ltd.). Compounds described in International Publication No. 2017 / 119394 can also be used as metal borides. Commercially available indium tin oxide products include F-ITO (manufactured by DOWA Hitech Co., Ltd.).

[0061] Furthermore, as near-infrared absorbing colorants, the following are used: the squarylium compound described in Japanese Patent Publication No. 2017-197437, the squarylium compound described in Japanese Patent Publication No. 2017-025311, the squarylium compound described in International Publication No. 2016 / 154782, the squarylium compound described in Japanese Patent No. 5884953, the squarylium compound described in Japanese Patent No. 6036689, and the squarylium compound described in Japanese Patent No. 5810604. The squarylium compounds described in International Publication No. 2017 / 213047, paragraphs 0090-0107, the pyrrole ring-containing compounds described in Japanese Patent Publication No. 2018-054760, paragraphs 0019-0075, the pyrrole ring-containing compounds described in Japanese Patent Publication No. 2018-040955, paragraphs 0078-0082, and paragraphs 0043-006 of Japanese Patent Publication No. 2018-002773. The pyrrole ring-containing compounds described in 9, the squarylium compounds having an aromatic ring at the amide α position described in paragraphs 0024 to 0086 of JP 2018-041047, the amide-linked squarylium compounds described in JP 2017-179131, the compounds having a pyrrole-bis-type squarylium skeleton or crokonium skeleton described in JP 2017-141215, the dihydrocarbazole-bis-type squarylium compounds described in JP 2017-082029, the asymmetric-type compounds described in paragraphs 0027 to 0114 of JP 2017-068120, the pyrrole ring-containing compounds (carbazole type) described in JP 2017-067963, the phthalocyanine compounds described in Japanese Patent No. 6251530, the squarylium compounds described in JP 2020-075959, Copper complexes, etc., as described in Korean Published Patent No. 10-2019-0135217 can also be used.

[0062] (Pigment derivatives) In the present invention, pigment derivatives can also be used as colorants. In the present invention, it is preferable to use pigments and pigment derivatives in combination. Examples of pigment derivatives include compounds having a structure in which an acidic group or a basic group is bonded to the pigment skeleton.

[0063] Examples of pigment skeletons that constitute pigment derivatives include quinoline pigment skeleton, benzimidazolone pigment skeleton, benzoisoindole pigment skeleton, benzothiazole pigment skeleton, iminium pigment skeleton, squarylium pigment skeleton, crokonium pigment skeleton, oxonol pigment skeleton, pyrrolopyrrole pigment skeleton, diketopyrrolopyrrole pigment skeleton, azo pigment skeleton, azomethine pigment skeleton, phthalocyanine pigment skeleton, naphthalocyanine pigment skeleton, anthraquinone pigment skeleton, quinacridone pigment skeleton, dioxazine pigment skeleton, perinone pigment skeleton, perylene pigment skeleton, thioindigo pigment skeleton, isoindoline pigment skeleton, isoindolinone pigment skeleton, quinophthalone pigment skeleton, iminium pigment skeleton, dithiol pigment skeleton, triarylmethane pigment skeleton, and pyromethene pigment skeleton.

[0064] Examples of acidic groups include carboxyl groups, sulfo groups, phosphate groups, boronic acid groups, carboxylic acid amide groups, sulfonic acid amide groups, imido acid groups, and salts thereof. Examples of atoms or groups of atoms constituting the salt include alkali metal ions (Li + kaNa + , K + (e.g.), alkaline earth metal ions (Ca 2+ Mg 2+ Examples include ammonium ions, imidazolium ions, pyridinium ions, and phosphonium ions. Examples of carboxylic acid amide groups include -NHCOR X1 A group represented by is preferred. As a sulfonic acid amide group, -NHSO2R X2 A group represented by is preferred. As an imido acid group, -SO2NHSO2R X3 -CONHSO2R X4 -CONHCOR X5 or -SO2NHCOR X6 A group represented by -SO2NHSO2R is preferred. X3 R is more preferable. X1 ~R X6 Each of these independently represents an alkyl group or an aryl group. X1 ~R X6The alkyl and aryl groups represented by may have substituents. The substituents are preferably halogen atoms, and more preferably fluorine atoms.

[0065] Basic groups include amino groups, pyridinyl groups and their salts, ammonium groups, and phthalimidomethyl groups. Atoms or groups of atoms that make up the salts include hydroxide ions, halogen ions, carboxylate ions, sulfonate ions, and phenoxide ions.

[0066] Specific examples of pigment derivatives include the compounds described in the examples below, the compounds described in Japanese Patent Publication No. 56-118462, the compounds described in Japanese Patent Publication No. 63-264674, the compounds described in Japanese Patent Publication No. 01-217077, the compounds described in Japanese Patent Publication No. 03-009961, the compounds described in Japanese Patent Publication No. 03-026767, the compounds described in Japanese Patent Publication No. 03-153780, the compounds described in Japanese Patent Publication No. 03-045662, and Japanese Patent Publication No. 04-285669. Compounds described in, Japanese Patent Publication No. 06-145546, Japanese Patent Publication No. 06-212088, Japanese Patent Publication No. 06-240158, Japanese Patent Publication No. 10-030063, Japanese Patent Publication No. 10-195326, Compounds described in paragraphs 0086-0098 of International Publication No. 2011 / 024896, Compounds described in paragraphs 0063-0094 of International Publication No. 2012 / 102399, International Publication The compound described in paragraph 0082 of JP 2017 / 038252, the compound described in paragraph 0171 of JP 2015-151530, the compound described in paragraphs 0162-0183 of JP 2011-252065, the compound described in JP 2003-081972, the compound described in Patent No. 5299151, the compound described in JP 2015-172732, the compound described in JP 2014-199308, JP 2014-08 Examples include compounds described in Japanese Patent Publication No. 5562, compounds described in Japanese Patent Application Publication No. 2014-035351, compounds described in Japanese Patent Application Publication No. 2008-081565, compounds described in Japanese Patent Application Publication No. 2019-109512, compounds described in Japanese Patent Application Publication No. 2019-133154, diketopyrrolopyrrole compounds having thiol linking groups described in International Publication No. 2020 / 002106, benzimidazolone compounds described in Japanese Patent Application Publication No. 2018-168244, or salts thereof.

[0067] The colorant content in the total solids of the resin composition is 55% by mass or more, preferably 57.5% by mass or more, more preferably 60% by mass or more, and even more preferably 62.5% by mass or more. The upper limit is preferably 80% by mass or less, more preferably 77.5% by mass or less, and even more preferably 75% by mass or less.

[0068] The pigment content in the total solid content of the resin composition is preferably 30% by mass or more, more preferably 45% by mass or more, and even more preferably 55% by mass or more. The upper limit is preferably 80% by mass or less, more preferably 77.5% by mass or less, and even more preferably 75% by mass or less. According to the resin composition of the present invention, even when the pigment content is high, a film with suppressed color unevenness can be formed, so the effects of the present invention are more pronounced when the pigment content is high.

[0069] The pigment content in the colorant is preferably 20 to 100% by mass, more preferably 50 to 100% by mass, and even more preferably 70 to 100% by mass. Furthermore, the total content of pigment and pigment derivative in the colorant is preferably 25 to 100% by mass, more preferably 55 to 100% by mass, and even more preferably 75 to 100% by mass.

[0070] <<Resin B>> The resin composition of the present invention contains a resin (hereinafter referred to as "resin"). The resin is used, for example, to disperse pigments and the like in the resin composition, or as a binder. A resin used primarily to disperse pigments and the like in a resin composition is also called a dispersant. However, such uses of the resin are just examples, and the resin can also be used for purposes other than those mentioned above.

[0071] (Specific resin) The resin included in the resin composition of the present invention comprises a resin b1 (hereinafter also referred to as a specific resin) which includes repeating units b1-1 having an acid group, repeating units b1-2 having a functional group b selected from a group containing two or more aromatic rings, a group containing a heterocyclic group, and a group containing a fused ring, and repeating units b1-3 other than repeating units b1-1 and b1-2.

[0072] [Repeating unit b1-1] The specific resin contains repeating units b1-1 (hereinafter also referred to as repeating units b1-1) having acidic groups. Examples of acidic groups include carboxyl groups, phosphate groups, sulfol groups, and phenolic hydroxyl groups, with carboxyl groups being preferred.

[0073] The number of acid groups in the repeating unit b1-1 may be one or two or more. Preferably, the number of acid groups in the repeating unit b1-1 is 1 to 4, and more preferably 1 or 2.

[0074] The repeating unit b1-1 can be represented by the following formula (bb-1). [ka]

[0075] R in equation (bb-1) b1 ~R b3 Each of these independently represents a hydrogen atom or an alkyl group. b1 ~R b3 The number of carbon atoms in the alkyl group represented is preferably 1 to 10, more preferably 1 to 3, and even more preferably 1.

[0076] L in equation (bb-1) b1 represents a single bond or an n1+1 valent linking group. However, if n1 is 2 or more, L b1 This is an n1+1 valent linking group. L b1Examples of n1+1 valent linking groups represented by include aliphatic hydrocarbon groups, aromatic hydrocarbon groups, -NH-, -SO-, -SO2-, -CO-, -O-, -COO-, OCO-, -S-, and groups formed by combining two or more of these. Aliphatic hydrocarbon groups and aromatic hydrocarbon groups may have substituents. Examples of substituents include hydroxyl groups and halogen atoms.

[0077] A in equation (bb-1) b1 represents an acid group. b1 The acid group represented by can be a carboxyl group, a phosphate group, a sulfo group, or a phenolic hydroxyl group, with a carboxyl group being preferred.

[0078] In equation (bb-1), n1 represents an integer greater than or equal to 1, preferably an integer between 1 and 4, and more preferably 1 or 2.

[0079] A specific example of repeating unit b1-1 is a repeating unit with the following structure. [ka]

[0080] The content of repeating units b1-1 in the specific resin is preferably 5 to 50% by mass, more preferably 5 to 40% by mass, and even more preferably 10 to 35% by mass. The lower limit is preferably 12% by mass or more, and more preferably 14% by mass or more.

[0081] [Repeating units b1-2] The specified resin contains repeating units b1-2 (hereinafter also referred to as repeating units b1-2) having a functional group b selected from a group containing two or more aromatic rings, a group containing a heterocyclic group, and a group containing a fused ring.

[0082] The functional group b of the repeating unit b1-2 is preferably a group containing a ketone structure. When functional group b contains a ketone structure, a film with more suppressed color unevenness can be formed when a phthalocyanine pigment is used as a colorant.

[0083] Furthermore, functional group b is preferably a group having 2 to 4 ring structures. In this embodiment, the number of ring structures included in functional group b is preferably 2 to 3.

[0084] Furthermore, functional group b is preferably a group containing 2 to 5 heteroatoms. In this embodiment, the number of heteroatoms contained in functional group b is preferably 2 to 4.

[0085] In particular, functional group b is preferably a group having 2 to 4 ring structures and containing 2 to 5 heteroatoms, and more preferably a group having 2 to 3 ring structures and containing 2 to 4 heteroatoms. In particular, functional group b is preferably a group containing a ketone structure and having 2 to 4 ring structures (preferably 2 to 3 ring structures) and containing 2 to 5 heteroatoms (preferably 2 to 4). By using a group with such a structure as functional group b, when a phthalocyanine pigment is used as a colorant, a film with more suppressed color unevenness can be formed.

[0086] Functional group b is a naphthalimide structure, acridone structure, thioxanthone structure, xanthone structure, anthrone structure, benzimidazole structure, benzothiazole structure, benzoxazole structure, benzotriazole structure, benzoxadiazole structure, benzothiadiazole structure, benzothiazine structure, benzoxazine structure, benzoinurea structure, isothiazolinone structure, phenoxazine structure, phenothiazine structure, dihydroacridine structure, phenoxatiin structure, dibenzopyran structure, fluorene structure, carbazole structure, carboline structure, dibenzothiophene structure, dibenzofuran structure, pyrimidine structure, pyrazine structure, quinazoline structure, quinoxaline structure, quinoline structure, imidazole structure, thiazole structure Preferably, the group includes an indole structure, a benzothiophene structure, a benzopyran structure, a quinolinone structure, a thiochromanone structure, a chroman structure, a benzimidazolone structure, a phthalimide structure, a naphthalene-2,3-dicarboximide structure, a pyrazole structure, a pyrazolone structure, an isoindoline structure, an isoindolinone structure, anthraquinone structure, a tetrazole structure, a benzophenone structure, a triazine structure, azobenzene structure, a benzalaniline structure, a phenazine structure, a barbituric acid structure, a perylene structure, a perinone structure, a quinophthalone structure, a caprolactam structure, a saccharin structure, a biphenyl structure, a triarylbenzene structure, a triarylamine structure, a benzothiazolon structure, or a benzoxazolinone structure. Naphthalimide structure, acridone structure, xanthone structure, anthron structure, benzimidazole structure, benzothiazole structure, benzoxazole structure, benzotriazole structure, benzooxodiazole structure, benzothiadiazole structure, phenoxazine structure, phenothiazine structure, dihydroacridine structure, phenoxatiin structure, dibenzopyran structure, carbazole structure, carboline structure, dibenzothiophene structure, dibenzofuran structure, pyrimidine structure, pyrazine structure, quinazoline structure, quinoxaline structure, imidazole structure, thiazole structure, indole structure, benzothiophene structure, ben It is more preferable that the group includes a zopyran structure, a quinolinone structure, a thiochromanone structure, a chroman structure, a phthalimide structure, a naphthalene-2,3-dicarboximide structure, a pyrazole structure, a pyrazolone structure, an isoindoline structure, an isoindolinone structure, anthraquinone structure, a tetrazole structure, a benzophenone structure, a triazine structure, an azobenzene structure, a benzalaniline structure, a phenazine structure, a barbiturate structure, a perylene structure, a perinone structure, a saccharin structure, a biphenyl structure, a triarylbenzene structure, a triarylamine structure, a benzothiazolon structure, or a benzoxazolinone structure. It is more preferable that the group includes a naphthalimide structure, acridone structure, xanthone structure, anthron structure, benzimidazole structure, benzothiazole structure, benzoxazole structure, benzotriazole structure, benzooxodiazole structure, benzothiadiazole structure, phenoxazine structure, phenothiazine structure, dihydroacridine structure, phenoxatiin structure, dibenzopyran structure, carboline structure, dibenzothiophene structure, dibenzofuran structure, pyrimidine structure, pyrazine structure, quinazoline structure, quinoxaline structure, thiochromanone structure, chroman structure, phthalimide structure, pyrazolone structure, isoindolinone structure, tetrazoline structure, benzalaniline structure, benzothiazolon structure, or benzoxazolinone structure. It is more preferably a group comprising a naphthalimide structure, acridone structure, xanthone structure, benzimidazole structure, benzothiazole structure, benzoxazole structure, benzotriazole structure, benzoxadiazole structure, benzothiadiazole structure, phenoxazine structure, phenothiazine structure, phenoxatiin structure, phthalimide structure, pyrazolone structure, tetrazole structure, benzothiazolon structure, or benzoxazolinone structure. It is more preferable that the group includes a naphthalimide structure, an acridone structure, a benzimidazole structure, a benzothiazole structure, a benzoxazole structure, a phenoxazine structure, a phenothiazine structure, a phenoxatiin structure, a phthalimide structure, a pyrazolone structure, or a tetrazole structure. It is particularly preferable that the group contains a naphthalimide structure or an acridone structure because it is easier to form a film with less color unevenness.

[0087] Specific examples of functional group b include the groups with the structures shown below and groups with substituents attached to these groups. Examples of substituents include those listed as substituent T later. In the following formulas, * represents a linkage, and R represents a hydrogen atom or substituent. Examples of substituents include those listed as substituent T later. [ka] [ka] [ka] [ka]

[0088] The following groups can be considered as substituents T as described above: halogen atoms (e.g., fluorine atoms, chlorine atoms, bromine atoms, iodine atoms), alkyl groups (preferably alkyl groups having 1 to 30 carbon atoms), alkenyl groups (preferably alkenyl groups having 2 to 30 carbon atoms), alkynyl groups (preferably alkynyl groups having 2 to 30 carbon atoms), aryl groups (preferably aryl groups having 6 to 30 carbon atoms), heterocyclic groups (preferably heterocyclic groups having 1 to 30 carbon atoms), amino groups (preferably amino groups having 0 to 30 carbon atoms), alkoxy groups (preferably alkoxy groups having 1 to 30 carbon atoms), aryloxy groups (preferably aryloxy groups having 6 to 30 carbon atoms) Aryloxy group), heterocyclic oxy group (preferably a heterocyclic oxy group having 1 to 30 carbon atoms), acyl group (preferably an acyl group having 2 to 30 carbon atoms), alkoxycarbonyl group (preferably an alkoxycarbonyl group having 2 to 30 carbon atoms), aryloxycarbonyl group (preferably an aryloxycarbonyl group having 7 to 30 carbon atoms), heterocyclic oxycarbonyl group (preferably a heterocyclic oxycarbonyl group having 2 to 30 carbon atoms), acyloxy group (preferably an acyloxy group having 2 to 30 carbon atoms), acylamino group (preferably an acyl group having 2 to 30 carbon atoms) Amino group), aminocarbonylamino group (preferably an aminocarbonylamino group having 2 to 30 carbon atoms), alkoxycarbonylamino group (preferably an alkoxycarbonylamino group having 2 to 30 carbon atoms), aryloxycarbonylamino group (preferably an aryloxycarbonylamino group having 7 to 30 carbon atoms), sulfamoyl group (preferably a sulfamoyl group having 0 to 30 carbon atoms), sulfamoylamino group (preferably a sulfamoylamino group having 0 to 30 carbon atoms), carbamoyl group (preferably a carbamoyl group having 1 to 30 carbon atoms), alkyl Thio group (preferably an alkylthio group having 1 to 30 carbon atoms), arylthio group (preferably an arylthio group having 6 to 30 carbon atoms), heterocyclic thio group (preferably a heterocyclic thio group having 1 to 30 carbon atoms), alkylsulfonyl group (preferably an alkylsulfonyl group having 1 to 30 carbon atoms), alkylsulfonylamino group (preferably an alkylsulfonylamino group having 1 to 30 carbon atoms), arylsulfonyl group (preferably an arylsulfonyl group having 6 to 30 carbon atoms), arylsulfonylamino group (preferably an arylsulfonylamino group having 6 to 30 carbon atoms),Heterocyclic sulfonyl groups (preferably heterocyclic sulfonyl groups having 1 to 30 carbon atoms), heterocyclic sulfonylamino groups (preferably heterocyclic sulfonylamino groups having 1 to 30 carbon atoms), alkylsulfinyl groups (preferably alkylsulfinyl groups having 1 to 30 carbon atoms), arylsulfinyl groups (preferably arylsulfinyl groups having 6 to 30 carbon atoms), heterocyclic sulfinyl groups (preferably heterocyclic sulfinyl groups having 1 to 30 carbon atoms), ureido groups (preferably ureido groups having 1 to 30 carbon atoms), hydroxyl groups, nitro groups, carboxylic acid amide groups, sulfonic acid amide groups, imide groups, phosphino groups, mercapto groups, cyano groups, alkylsulfino groups, arylsulfino groups, arylazo groups, heterocyclic azo groups, phosphinyl groups, phosphinyloxy groups, phosphinylamino groups, silyl groups, hydrazino groups, imino groups. These groups may have further substituents if they are further substituted groups.

[0089] Examples of repeating units b1-2 include the repeating unit represented by the following formula (bb-2). [ka]

[0090] R in equation (bb-2) b11 ~R b13 Each of these independently represents a hydrogen atom or an alkyl group. b11 ~R b13 The number of carbon atoms in the alkyl group represented is preferably 1 to 10, more preferably 1 to 3, and even more preferably 1.

[0091] L in equation (bb-2) b11 L represents a single bond or a divalent linking group. b11 Examples of divalent linking groups represented by include aliphatic hydrocarbon groups, aromatic hydrocarbon groups, -NH-, -SO-, -SO2-, -CO-, -O-, -COO-, OCO-, -S-, and groups formed by combining two or more of these. Aliphatic hydrocarbon groups and aromatic hydrocarbon groups may have substituents. Examples of substituents include hydroxyl groups and halogen atoms.

[0092] A in equation (bb-2) b11 This represents the functional group b described above.

[0093] Specific examples of repeating units b1-2 include repeating units A-1 to A-57 described in the examples below.

[0094] The content of repeating units b1-2 in the specific resin is preferably 5 to 50% by mass, more preferably 5 to 40% by mass, and even more preferably 10 to 35% by mass. The lower limit is preferably 12% by mass or more, and more preferably 14% by mass or more.

[0095] [Repeating units b1-3] The specified resin includes repeating units b1-3 other than repeating units b1-1 and b1-2.

[0096] Examples of repeating units b1-3 include repeating units having a crosslinking group (hereinafter also referred to as repeating unit b1-3a), repeating units having a graft chain (hereinafter also referred to as repeating unit b1-3b), and repeating units having an acid group, a crosslinking group, and a functional group other than the functional group b described above (hereinafter also referred to as other functional groups) (hereinafter also referred to as repeating unit b1-3c). It is also preferable that repeating unit b1-3 is a repeating unit having a urea structure.

[0097] Examples of crosslinkable groups in repeating units b1-3a include ethylenically unsaturated bond-containing groups and cyclic ether groups. Examples of ethylenically unsaturated bond-containing groups include vinyl groups, styrene groups, (meth)allyl groups, and (meth)acryloyl groups. Examples of cyclic ether groups include epoxy groups and oxetanyl groups, with epoxy groups being preferred. The epoxy group may also be an alicyclic epoxy group. An alicyclic epoxy group refers to a monovalent functional group having a cyclic structure in which an epoxy ring and a saturated hydrocarbon ring are fused.

[0098] Examples of repeating units b1-3a include the repeating unit represented by the following formula (bb-3a). [ka]

[0099] R in equation (bb-3a) b21 ~R b23 Each of these independently represents a hydrogen atom or an alkyl group. b21 ~R b23 The number of carbon atoms in the alkyl group represented is preferably 1 to 10, more preferably 1 to 3, and even more preferably 1.

[0100] L in equation (bb-3a) b21 L represents a single bond or a divalent linking group. b21 Examples of divalent linking groups represented by include aliphatic hydrocarbon groups, aromatic hydrocarbon groups, -NH-, -SO-, -SO2-, -CO-, -O-, -COO-, OCO-, -S-, and groups formed by combining two or more of these. Aliphatic hydrocarbon groups and aromatic hydrocarbon groups may have substituents. Examples of substituents include hydroxyl groups and halogen atoms.

[0101] A in equation (bb-3a) b21 This represents a crosslinking group.

[0102] Specific examples of repeating units b1-3a include repeating units with the following structures. [ka]

[0103] The graft chains of the repeating units b1-3b include graft chains containing at least one structure selected from polyester, polyether, polystyrene, and poly(meth)acrylic structures. It is preferable that the graft chains be of polyester or polyether structure, and more preferably polyester structure, because they can form films with less color unevenness and more effectively suppress the generation of coarse particles.

[0104] The terminal structure of the graft chain is not particularly limited. It may be a hydrogen atom or a substituent. Examples of substituents include alkyl groups, alkoxy groups, and alkylthioether groups. Among these, from the viewpoint of improving the dispersibility of the pigment, groups that have a steric repulsion effect are preferred, and alkyl or alkoxy groups having 5 to 30 carbon atoms are preferred. The alkyl and alkoxy groups may be linear, branched, or cyclic, with linear or branched being preferred.

[0105] A graft chain refers to a molecular chain that branches off from the main chain. The main chain, on the other hand, refers to the molecular chain with the most branching points.

[0106] The weight-average molecular weight of the graft chain is preferably 500 to 30,000, more preferably 1,000 to 20,000, and even more preferably 2,000 to 10,000.

[0107] Examples of repeating units b1-3b include the repeating unit represented by the following formula (bb-3b). [ka]

[0108] R in equation (bb-3b) b31 ~R b33 Each of these independently represents a hydrogen atom or an alkyl group. b31 ~R b33 The number of carbon atoms in the alkyl group represented is preferably 1 to 10, more preferably 1 to 3, and even more preferably 1.

[0109] L in equation (bb-3b) b31 L represents a single bond or a divalent linking group. b31 Examples of divalent linking groups represented by include aliphatic hydrocarbon groups, aromatic hydrocarbon groups, -NH-, -SO-, -SO2-, -CO-, -O-, -COO-, OCO-, -S-, and groups formed by combining two or more of these. Aliphatic hydrocarbon groups and aromatic hydrocarbon groups may have substituents. Examples of substituents include hydroxyl groups and halogen atoms.

[0110] A in equation (bb-3b) b31 represents a graft chain. A b31 The graft chain represented by is preferably a graft chain comprising at least one structure selected from polyester, polyether, polystyrene, and poly(meth)acrylic structures, and more preferably a graft chain of polyester or polyether structure. The preferred range of the graft chain is the same as described above.

[0111] Specific examples of repeating units b1-3b include repeating units with the following structures. [ka]

[0112] Other functional groups that may be present in the repeating units b1-3c include alkyl groups, phenyl groups, amino groups, hydroxyl groups, and cyano groups.

[0113] Examples of repeating units b1-3c include the repeating unit represented by the following formula (bb-3c). [ka]

[0114] R in equation (bb-3c) b41 ~R b43 Each of these independently represents a hydrogen atom or an alkyl group. b41 ~R b43 The number of carbon atoms in the alkyl group represented is preferably 1 to 10, more preferably 1 to 3, and even more preferably 1.

[0115] L in equation (bb-3c) b41 L represents a single bond or a divalent linking group. b41Examples of divalent linking groups represented by include aliphatic hydrocarbon groups, aromatic hydrocarbon groups, -NH-, -SO-, -SO2-, -CO-, -O-, -COO-, OCO-, -S-, and groups formed by combining two or more of these. Aliphatic hydrocarbon groups and aromatic hydrocarbon groups may have substituents. Examples of substituents include hydroxyl groups and halogen atoms.

[0116] A in equation (bb-3c) b41 The symbol represents other functional groups. Examples of other functional groups include alkyl groups, phenyl groups, amino groups, hydroxyl groups, and cyano groups.

[0117] Specific examples of repeating units b1-3c include repeating units with the following structures. [ka]

[0118] Specific examples of repeating units b1-3 include repeating units F-1 to F-7, which are described in the examples below.

[0119] The specified resin may contain only one type of repeating unit b1-3, or it may contain two or more types.

[0120] One preferred embodiment of the specific resin is one in which repeating units b1-3 include repeating units having graft chains (repeating units b1-3b). According to this embodiment, a film with more suppressed color unevenness can be formed. Furthermore, the generation of coarse particles can be suppressed and the time-dependent stability of the resin composition can be further improved. In this embodiment, repeating units b1-3b are preferably repeating units having graft chains of a polyester structure or a polyether structure, and more preferably repeating units having graft chains of a polyester structure.

[0121] Another preferred embodiment of the specific resin is one in which repeating units b1-3 do not contain repeating units having graft chains (repeating units b1-3b). In this embodiment, it is preferable to further use resins other than the specific resin (other resins described later), and it is more preferable to use at least one selected from graft polymers, star polymers, block copolymers, and resins in which at least one end of the polymer chain is sealed with an acid group. This embodiment also makes it possible to form a film with more suppressed color unevenness. Furthermore, it is possible to suppress the generation of coarse particles and further improve the time-dependent stability of the resin composition.

[0122] The content of repeating units b1-3 in the specific resin is preferably 10 to 85% by mass. The upper limit is preferably 80% by mass or less, more preferably 75% by mass or less, and even more preferably 70% by mass or less. The lower limit is preferably 15% by mass or more, and more preferably 20% by mass or more.

[0123] When a specific resin contains repeating units b1-3a having crosslinkable groups, the content of repeating units b1-3a in the specific resin is preferably 1 to 30% by mass. The upper limit is preferably 25% by mass or less, and more preferably 15% by mass or less. The lower limit is preferably 3% by mass or more, and more preferably 5% by mass or more.

[0124] When a specific resin contains repeating units b1-3, which are repeating units having graft chains (repeating units b1-3b), the content of repeating units b1-3b in the specific resin is preferably 1 to 80% by mass. The upper limit is preferably 70% by mass or less, and more preferably 60% by mass or less. The lower limit is preferably 3% by mass or more, and more preferably 5% by mass or more.

[0125] When a specific resin contains repeating units b1-3, which are repeating units having other functional groups (repeating unit b1-3c), the content of repeating unit b1-3c in the specific resin is preferably 1 to 80% by mass. The upper limit is preferably 70% by mass or less, and more preferably 60% by mass or less. The lower limit is preferably 3% by mass or more, and more preferably 5% by mass or more.

[0126] [Specific examples of specific resins] Specific examples of the specific resins include resins P1 to P188, PP1, PP2, and PP101 to PP136, as shown in the examples described later.

[0127] [Physical properties of specific resins] The acid value of the specific resin is preferably 10 to 250 mg KOH / g. The upper limit is preferably 220 mg KOH / g or less, and more preferably 200 mg KOH / g or less. The lower limit is preferably 30 mg KOH / g or more, and more preferably 50 mg KOH / g or more. If the acid value of the specific resin is within the above range, the dispersibility of the pigment in the resin composition is good, and a film with more suppressed color unevenness can be formed. Furthermore, the generation of coarse particles in the resin composition can be more effectively suppressed. Moreover, when pattern formation is performed by photolithography, the generation of development residue can be more effectively suppressed.

[0128] The weight-average molecular weight of the specific resin is preferably between 1,000 and 100,000. The lower limit is preferably 2,000 or more, and more preferably 4,000 or more. The upper limit is preferably 60,000 or less, and more preferably 40,000 or less. If the weight-average molecular weight of the specific resin is within the above range, a film with more suppressed color unevenness can be formed. Furthermore, the time-dependent stability of the resin composition can be further improved. Moreover, when pattern formation is performed by photolithography, the generation of development residue can be more effectively suppressed.

[0129] The following formula for a specific resin (A λThe specific absorbance, represented by ), is preferably 3 or less, more preferably 2 or less, and even more preferably 1 or less. E = A / (c × l) ... (A λ ) Formula (A λ In this expression, E represents the specific absorbance of the resin at the maximum absorption wavelength between 400 and 800 nm. A represents the absorbance of a specific resin at the maximum absorption wavelength between 400 and 800 nm. l represents the cell length, expressed in units of cm. c represents the concentration of a specific resin in a solution, expressed in units of mg / ml.

[0130] When a specific resin has crosslinkable groups, the amount of crosslinkable groups in the specific resin is preferably 0.01 to 2.5 mmol / g. The lower limit is preferably 0.2 mmol / g or more, and more preferably 0.5 mmol / g or more. The upper limit is preferably 2 mmol / g or less, and more preferably 1.5 mmol / g or less. If the amount of crosslinkable groups in the specific resin is within the above range, the dispersibility of the pigment in the resin composition and the curability of the resin composition are good. The amount of crosslinkable groups in the specific resin is a numerical value representing the molar amount of crosslinkable groups per gram of solid content of the specific resin.

[0131] (Other resins) The resin composition of the present invention may contain a resin other than the specific resin described above (hereinafter also referred to as "other resin").

[0132] Other resins include, for example, (meth)acrylic resins, epoxy resins, (meth)acrylamide resins, ene-thiol resins, polycarbonate resins, polyether resins, polyarylate resins, polysulfone resins, polyethersulfone resins, polyphenylene resins, polyarylene etherphosphine oxide resins, polyimide resins, polyamide-imide resins, polyolefin resins, cyclic olefin resins, polyester resins, styrene resins, and siloxane resins. Furthermore, the resins include the resin described in the examples of International Publication No. 2016 / 088645, the resin described in JP 2017-057265, the resin described in JP 2017-032685, the resin described in JP 2017-075248, the resin described in JP 2017-066240, the resin described in JP 2017-167513, the resin described in JP 2017-173787, the resin described in paragraphs 0041 to 0060 of JP 2017-206689, the resin described in paragraphs 0022 to 0071 of JP 2018-010856, and JP 2016-22 You may also use the block polyisocyanate resin described in Japanese Patent Publication No. 2891, the resin described in Japanese Patent Application Publication No. 2020-122052, the resin described in Japanese Patent Application Publication No. 2020-111656, the resin described in Japanese Patent Application Publication No. 2020-139021, the resin described in Japanese Patent Application Publication No. 2017-138503 which includes a structural unit having a ring structure in the main chain and a structural unit having a biphenyl group in the side chain, the resin described in paragraphs 0199 to 0233 of Japanese Patent Application Publication No. 2020-186373, the alkali-soluble resin described in Japanese Patent Application Publication No. 2020-186325, or the resin represented by formula 1 described in Korean Published Patent No. 10-2020-0078339.

[0133] The weight-average molecular weight (Mw) of the other resin is preferably between 3,000 and 2,000,000. The upper limit is preferably 1,000,000 or less, and more preferably 500,000 or less. The lower limit is preferably 4,000 or more, and more preferably 5,000 or more.

[0134] As for other resins, it is preferable to use resins having acidic groups. Examples of acidic groups include carboxyl groups, phosphate groups, sulfo groups, and phenolic hydroxyl groups. The type of acidic group in the other resin may be the same as or different from the acidic group in the specific resin described above. For the reason that the long-term stability of the resin composition can be further improved, it is preferable that the other resin includes a resin (hereinafter also referred to as resin X) having an acidic group with a smaller pKa than the acidic group in the specific resin. Furthermore, the difference between the pKa of the acidic group in the specific resin and the pKa of the acidic group in resin X (pKa of the acidic group in the specific resin - pKa of resin X) is preferably 1.0 or more, more preferably 1.5 or more, and even more preferably 2.0 or more. A preferred combination of the acidic group in the specific resin and the acidic group in resin X is a combination in which the acidic group in the specific resin is a carboxyl group and the acidic group in resin X is a sulfo group or a phosphate group (preferably a phosphate group).

[0135] The acid value of the resin containing acid groups is preferably 30 to 500 mg KOH / g. The lower limit is more preferably 40 mg KOH / g or more, and particularly preferably 50 mg KOH / g or more. The upper limit is more preferably 400 mg KOH / g or less, even more preferably 300 mg KOH / g or less, and particularly preferably 200 mg KOH / g or less. The weight-average molecular weight (Mw) of the resin containing acid groups is preferably 5000 to 100000, and more preferably 5000 to 50000. The number-average molecular weight (Mn) of the resin containing acid groups is preferably 1000 to 20000.

[0136] Resins having acidic groups preferably contain repeating units having acidic groups in their side chains, and more preferably contain repeating units having acidic groups in their side chains in an amount of 5 to 70 mol% of the total repeating units of the resin. The upper limit of the content of repeating units having acidic groups in their side chains is preferably 50 mol% or less, and more preferably 30 mol% or less. The lower limit of the content of repeating units having acidic groups in their side chains is preferably 10 mol% or more, and more preferably 20 mol% or more.

[0137] Regarding resins having acid groups, reference can be made to paragraphs 0558-0571 of Japanese Patent Application Publication No. 2012-208494 (paragraphs 0685-0700 of the corresponding US Patent Application Publication No. 2012 / 0235099) and paragraphs 0076-0099 of Japanese Patent Application Publication No. 2012-198408, the contents of which are incorporated herein by reference. Furthermore, commercially available resins having acid groups can also be used. There are no particular restrictions on the method of introducing acid groups into the resin, but for example, the method described in Japanese Patent No. 6349629 can be cited. In addition, as a method of introducing acid groups into the resin, a method can be cited in which an acid anhydride is reacted with a hydroxyl group produced by a ring-opening reaction of an epoxy group to introduce an acid group.

[0138] Other resins that may be used include resins having basic groups. The resin having basic groups is preferably a resin containing repeating units having basic groups in their side chains, more preferably a copolymer having repeating units having basic groups in their side chains and repeating units without basic groups, and even more preferably a block copolymer having repeating units having basic groups in their side chains and repeating units without basic groups. The resin having basic groups can also be used as a dispersant. The amine value of the resin having basic groups is preferably 5 to 300 mgKOH / g. The lower limit is preferably 10 mgKOH / g or more, and more preferably 20 mgKOH / g or more. The upper limit is preferably 200 mgKOH / g or less, and more preferably 100 mgKOH / g or less.

[0139] Commercially available resins containing basic groups include DISPERBYK-161, 162, 163, 164, 166, 167, 168, 174, 182, 183, 184, 185, 2000, 2001, 2050, 2150, 2163, 2164, BYK-LPN6919 (all manufactured by Bic Chemie Co., Ltd.), and Solspers 112. Examples include 00, 13240, 13650, 13940, 24000, 26000, 28000, 32000, 32500, 32550, 32600, 33000, 34750, 35100, 35200, 37500, 38500, 39000, 53095, 56000, 7100 (all manufactured by Lubrizol Japan), Efka PX 4300, 4330, 4046, 4060, 4080 (all manufactured by BASF), etc. Furthermore, the resin having basic groups may also be the block copolymer (B) described in paragraphs 0063 to 0112 of Japanese Patent Publication No. 2014-219665, the block copolymer A1 described in paragraphs 0046 to 0076 of Japanese Patent Publication No. 2018-156021, or the vinyl resin having basic groups described in paragraphs 0150 to 0153 of Japanese Patent Publication No. 2019-184763, and these details are incorporated herein by reference.

[0140] It is also preferable to use a resin having acidic groups and a resin having basic groups as other resins. According to this embodiment, the time-dependent stability of the resin composition can be further improved. When a resin having acidic groups and a resin having basic groups are used in combination, the content of the resin having basic groups is preferably 20 to 500 parts by mass, more preferably 30 to 300 parts by mass, and even more preferably 50 to 200 parts by mass, per 100 parts by mass of the resin having acidic groups.

[0141] As for other resins, it is also preferable to use resins that contain repeating units derived from monomer components including the compound represented by the following formula (ED1) and / or the compound represented by the following formula (ED2) (hereinafter, these compounds may also be referred to as "ether dimers").

[0142] [ka]

[0143] In formula (ED1), R 1 and R 2 Each of these independently represents a hydrocarbon group having 1 to 25 carbon atoms, which may have a hydrogen atom or a substituent. [ka] In formula (ED2), R represents a hydrogen atom or an organic group having 1 to 30 carbon atoms. For details of formula (ED2), please refer to the description in Japanese Patent Application Publication No. 2010-168539, which is incorporated herein by reference.

[0144] For specific examples of ether dimers, see, for example, the description in paragraph 0317 of Japanese Patent Publication No. 2013-029760, which is incorporated herein by reference.

[0145] As for other resins, it is also preferable to use resins that contain repeating units derived from the compound represented by formula (X). [ka] In the formula, R 1 R represents a hydrogen atom or a methyl group. 21 and R 22 Each of these independently represents an alkylene group, and n is an integer from 0 to 15. 21 and R 22 The number of carbon atoms in the alkylene group represented by is preferably 1 to 10, more preferably 1 to 5, even more preferably 1 to 3, and particularly preferably 2 or 3. n represents an integer from 0 to 15, preferably an integer from 0 to 5, more preferably an integer from 0 to 4, and even more preferably an integer from 0 to 3.

[0146] Compounds represented by formula (X) include ethylene oxide or propylene oxide-modified (meth)acrylates of paracumylphenol. Commercially available products include Aronics M-110 (manufactured by Toagosei Co., Ltd.).

[0147] As for other resins, it is also preferable to use resins having crosslinkable groups. Examples of crosslinkable groups include ethylenically unsaturated bond-containing groups and cyclic ether groups. Examples of ethylenically unsaturated bond-containing groups include vinyl groups, styrene groups, (meth)allyl groups, and (meth)acryloyl groups. Examples of cyclic ether groups include epoxy groups and oxetanyl groups, with epoxy groups being preferred. The epoxy group may also be an alicyclic epoxy group. An alicyclic epoxy group refers to a monovalent functional group having a cyclic structure in which an epoxy ring and a saturated hydrocarbon ring are fused.

[0148] As another resin, it is also preferable to use a resin having aromatic carboxyl groups (hereinafter also referred to as resin Ac). In resin Ac, aromatic carboxyl groups may be included in the main chain of the repeating unit or in the side chain of the repeating unit. It is preferable that aromatic carboxyl groups are included in the main chain of the repeating unit. In this specification, an aromatic carboxyl group is a group having a structure in which one or more carboxyl groups are bonded to an aromatic ring. In an aromatic carboxyl group, the number of carboxyl groups bonded to the aromatic ring is preferably 1 to 4, and more preferably 1 to 2.

[0149] The resin Ac is preferably a resin containing at least one repeating unit selected from the repeating units represented by formula (Ac-1) and the repeating units represented by formula (Ac-2). [ka] In formula (Ac-1), Ar 1 L represents a group containing an aromatic carboxyl group. 1 represents -COO- or -CONH-, L 2 This represents a divalent linking group. In formula (Ac-2), Ar 10 L represents a group containing an aromatic carboxyl group. 11 represents -COO- or -CONH-, L 12 represents a trivalent linking group, P 10 represents a polymer chain.

[0150] In equation (Ac-1), Ar 1 Groups containing aromatic carboxyl groups represented by include structures derived from aromatic tricarboxylic acid anhydrides and structures derived from aromatic tetracarboxylic acid anhydrides. Examples of aromatic tricarboxylic acid anhydrides and aromatic tetracarboxylic acid anhydrides include compounds with the following structures. [ka]

[0151] In the above formula, Q 1 This represents a single bond, -O-, -CO-, -COOCH2CH2OCO-, -SO2-, -C(CF3)2-, a group represented by the following formula (Q-1), or a group represented by the following formula (Q-2). [ka]

[0152] Ar 1 The aromatic carboxyl group represented by may have a crosslinking group. The crosslinking group is preferably an ethylenically unsaturated bond-containing group and a cyclic ether group, and more preferably an ethylenically unsaturated bond-containing group. 1 Specific examples of groups containing aromatic carboxyl groups represented by the formula (Ar-11), the group represented by formula (Ar-12), and the group represented by formula (Ar-13) are examples of such groups. [ka]

[0153] In formula (Ar-11), n1 represents an integer from 1 to 4, and is preferably 1 or 2, and more preferably 2. In formula (Ar-12), n² represents an integer between 1 and 8, preferably between 1 and 4, more preferably 1 or 2, and even more preferably 2. In formula (Ar-13), n3 and n4 each independently represent an integer from 0 to 4, preferably an integer from 0 to 2, more preferably 1 or 2, and even more preferably 1. However, at least one of n3 and n4 is an integer of 1 or more. In formula (Ar-13), Q 1 represents a single bond, -O-, -CO-, -COOCH2CH2OCO-, -SO2-, -C(CF3)2-, a group represented by the above formula (Q-1) or a group represented by the above formula (Q-2). In formulas (Ar-11) to (Ar-13), *1 represents the bonding position with L 1 and.

[0154] In formula (Ac-1), L 1 represents -COO- or -CONH-, and preferably represents -COO-.

[0155] In formula (Ac-1), examples of the divalent linking group represented by L 2 include an alkylene group, an arylene group, -O-, -CO-, -COO-, -OCO-, -NH-, -S-, and a group formed by combining two or more of these. The number of carbon atoms of the alkylene group is preferably 1 to 30, more preferably 1 to 20, and even more preferably 1 to 15. The alkylene group may be linear, branched, or cyclic. The number of carbon atoms of the arylene group is preferably 6 to 30, more preferably 6 to 20, and even more preferably 6 to 10. The alkylene group and the arylene group may have a substituent. Examples of the substituent include a hydroxy group. The divalent linking group represented by L 2 is preferably a group represented by -L 2a -O-. L 2aExamples of alkylene groups include alkylene groups, arylene groups, groups combining alkylene and arylene groups, and groups combining at least one selected from alkylene and arylene groups with at least one selected from -O-, -CO-, -COO-, -OCO-, -NH-, and -S-, with alkylene groups being preferred. The number of carbon atoms in the alkylene group is preferably 1 to 30, more preferably 1 to 20, and even more preferably 1 to 15. The alkylene group may be linear, branched, or cyclic. The alkylene and arylene groups may have substituents. Examples of substituents include hydroxyl groups.

[0156] In equation (Ac-2), Ar 10 The group containing the aromatic carboxyl group represented by is the Ar of formula (Ac-1). 1 This is synonymous with the same thing, and the preferred range is also similar.

[0157] In equation (Ac-2), L 11 This represents -COO- or -CONH-, and is preferably -COO-.

[0158] In equation (Ac-2), L 12 The trivalent linking group represented by includes hydrocarbon groups, -O-, -CO-, -COO-, -OCO-, -NH-, -S-, and groups combining two or more of these. Hydrocarbon groups include aliphatic hydrocarbon groups and aromatic hydrocarbon groups. The number of carbon atoms in the aliphatic hydrocarbon group is preferably 1 to 30, more preferably 1 to 20, and even more preferably 1 to 15. The aliphatic hydrocarbon group may be linear, branched, or cyclic. The number of carbon atoms in the aromatic hydrocarbon group is preferably 6 to 30, more preferably 6 to 20, and even more preferably 6 to 10. The hydrocarbon group may have substituents. Examples of substituents include hydroxyl groups. 12 The trivalent linking group represented by is preferably the group represented by formula (L12-1), and more preferably the group represented by formula (L12-2). [ka]

[0159] In formula (L12-1), L 12b represents a trivalent linking group, X 1 represents S, *1 represents the bonding position with L of formula (Ac-2) 11 and *2 represents the bonding position with P of formula (Ac-2) 10 . The trivalent linking group represented by L 12b includes a hydrocarbon group; a group obtained by combining a hydrocarbon group with at least one selected from -O-, -CO-, -COO-, -OCO-, -NH- and -S-, etc., and it is preferably a hydrocarbon group or a group obtained by combining a hydrocarbon group with -O-.

[0160] In formula (L12-2), L 12c represents a trivalent linking group, X 1 represents S, *1 represents the bonding position with L of formula (Ac-2) 11 and *2 represents the bonding position with P of formula (Ac-2) 10 . The trivalent linking group represented by L 12c includes a hydrocarbon group; a group obtained by combining a hydrocarbon group with at least one selected from -O-, -CO-, -COO-, -OCO-, -NH- and -S-, etc., and it is preferably a hydrocarbon group.

[0161] In formula (Ac-2), P 10 represents a polymer chain. The polymer chain represented by P 10 preferably has at least one structure selected from a polyester structure, a polyether structure, a polystyrene structure and a poly(meth)acrylic structure. The weight-average molecular weight of the polymer chain P 10 is preferably 500 to 20000. The lower limit is preferably 1000 or more. The upper limit is preferably 10000 or less, more preferably 5000 or less, and still more preferably 3000 or less. If the weight-average molecular weight of P 10 is within the above range, the dispersibility of the pigment in the composition is good. When the resin having an aromatic carboxy group is a resin having a repeating unit represented by formula (Ac-2), this resin is preferably used as a dispersant.

[0162] P10 The polymer chain represented by may contain crosslinkable groups. Examples of crosslinkable groups include ethylenically unsaturated bond-containing groups and cyclic ether groups.

[0163] As other resins, it is preferable to use at least one selected from graft polymers, star polymers, block copolymers, and resins in which at least one end of the polymer chain is encapsulated with an acid group. Such resins are preferably used as dispersants.

[0164] Examples of graft polymers include resins having repeating units with graft chains and resins having repeating units represented by the formula (Ac-2) described above. Examples of graft chains include graft chains containing at least one structure selected from polyester structures, polyether structures, polystyrene structures, and poly(meth)acrylic structures. The terminal structure of the graft chain is not particularly limited. It may be a hydrogen atom or a substituent. Examples of substituents include alkyl groups, alkoxy groups, alkylthioether groups, etc. Among these, from the viewpoint of improving the dispersibility of pigments, groups having a steric repulsion effect are preferred, and alkyl groups or alkoxy groups having 5 to 30 carbon atoms are preferred. Alkyl groups and alkoxy groups may be linear, branched, or cyclic, with linear or branched being preferred.

[0165] Specific examples of graft polymers include the resins described in paragraphs 0025 to 0094 of Japanese Patent Publication No. 2012-255128, paragraphs 0022 to 0097 of Japanese Patent Publication No. 2009-203462, and paragraphs 0102 to 0166 of Japanese Patent Publication No. 2012-255128.

[0166] Examples of star-shaped polymers include resins with a structure in which multiple polymer chains are bonded to a core. Specific examples of star-shaped polymers include polymer compounds C-1 to C-31 described in paragraphs 0196 to 0209 of Japanese Patent Publication No. 2013-043962.

[0167] Preferably, the block copolymer is a block copolymer of a polymer block having repeating units containing acidic or basic groups (hereinafter also referred to as block A) and a polymer block having repeating units not containing acidic or basic groups (hereinafter also referred to as block B). The block copolymer may also be the block copolymer (B) described in paragraphs 0063 to 0112 of Japanese Patent Application Publication No. 2014-219665, or the block copolymer A1 described in paragraphs 0046 to 0076 of Japanese Patent Application Publication No. 2018-156021, the details of which are incorporated herein by reference.

[0168] Resins in which at least one end of a polymer chain is encapsulated with an acid group include resins in which at least one end of a polymer chain is encapsulated with an acid group, including at least one structure selected from polyester, polyether, and poly(meth)acrylic structures. Examples of acid groups that encapsulate the ends of polymer chains include carboxyl groups, sulfo groups, and phosphate groups.

[0169] Other resins can also be used as dispersants. Examples of dispersants include acidic dispersants (acidic resins) and basic dispersants (basic resins). Here, an acidic dispersant (acidic resin) refers to a resin in which the amount of acidic groups is greater than the amount of basic groups. As an acidic dispersant (acidic resin), it is preferable that the amount of acidic groups is 70 mol% or more when the total amount of acidic groups and basic groups is set to 100 mol%. The acidic group of the acidic dispersant (acidic resin) is preferably a carboxyl group. The acid value of the acidic dispersant (acidic resin) is preferably 10 to 105 mg KOH / g. Furthermore, a basic dispersant (basic resin) refers to a resin in which the amount of basic groups is greater than the amount of acidic groups. As a basic dispersant (basic resin), it is preferable that the amount of basic groups exceeds 50 mol% when the total amount of acidic groups and basic groups is set to 100 mol%. The basic group of the basic dispersant is preferably an amino group.

[0170] Dispersants are also available commercially. Specific examples include the Disperbyk series from Bic Chemie (e.g., Disperbyk-111, 161, 2001, etc.), the Solspers series from Lubrizol Nippon Co., Ltd. (e.g., Solspers 20000, 76500, etc.), the Azisper series from Ajinomoto Fine Techno Co., Ltd., A208F (manufactured by Daiichi Kogyo Seiyaku Co., Ltd.), H-3606 (manufactured by Daiichi Kogyo Seiyaku Co., Ltd.), and Sandet ET (manufactured by Sanyo Chemical Industries, Ltd.). Additionally, the products described in paragraph 0129 of Japanese Patent Publication No. 2012-137564 and paragraph 0235 of Japanese Patent Publication No. 2017-194662 can also be used as dispersants.

[0171] The resin content in the total solids of the resin composition is preferably 1 to 50% by mass. The upper limit is preferably 40% by mass or less, and more preferably 30% by mass or less. The lower limit is preferably 5% by mass or more, and more preferably 10% by mass or more.

[0172] The content of the specific resin in the total solids of the resin composition is preferably 1 to 50% by mass. The upper limit is preferably 40% by mass or less, and more preferably 30% by mass or less. The lower limit is preferably 5% by mass or more, and more preferably 10% by mass or more.

[0173] The content of a specific resin in the resin composition is preferably 10 to 100% by mass, more preferably 25 to 100% by mass, and even more preferably 45 to 100% by mass.

[0174] The resin composition of the present invention may contain only one type of resin, or it may contain two or more types of resins. When it contains two or more types of resins, it is preferable that their total amount is within the above range.

[0175] <<Polymerizable compounds>> The resin composition of the present invention preferably contains a polymerizable compound. Examples of the polymerizable compound include compounds having an ethylenically unsaturated bond-containing group. Examples of the ethylenically unsaturated bond-containing group include a vinyl group, a (meth)allyl group, a (meth)acryloyl group, etc. The polymerizable compound used in the present invention is preferably a radically polymerizable compound.

[0176] The polymerizable compound may be in any chemical form such as a monomer, a prepolymer, an oligomer, etc., but a monomer is preferred. The molecular weight of the polymerizable compound is preferably 100 to 2500. The upper limit is preferably 2000 or less, more preferably 1500 or less. The lower limit is preferably 150 or more, more preferably 250 or more.

[0177] The ethylenically unsaturated bond-containing group value (hereinafter referred to as the C=C value) of the polymerizable compound is preferably 2 to 14 mmol / g from the viewpoint of the stability of the resin composition over time. The lower limit is preferably 3 mmol / g or more, more preferably 4 mmol / g or more, and still more preferably 5 mmol / g or more. The upper limit is preferably 12 mmol / g or less, more preferably 10 mmol / g or less, and still more preferably 8 mmol / g or less. The C=C value of the polymerizable compound is a value calculated by dividing the number of ethylenically unsaturated bond-containing groups contained in one molecule of the polymerizable compound by the molecular weight of the polymerizable compound.

[0178] The polymerizable compound preferably contains three or more ethylenically unsaturated bond-containing groups, more preferably four or more ethylenically unsaturated bond-containing groups. From the viewpoint of the stability of the resin composition over time, the upper limit of the ethylenically unsaturated bond-containing group is preferably 15 or less, more preferably 10 or less, and even more preferably 6 or less. Further, the polymerizable compound is preferably a trifunctional or higher (meth)acrylate compound, more preferably a 3- to 15-functional (meth)acrylate compound, even more preferably a 3- to 10-functional (meth)acrylate compound, and particularly preferably a 3- to 6-functional (meth)acrylate compound. Specific examples of the polymerizable compound include the compounds described in paragraph numbers 0095 to 0108 of JP-A-2009-288705, paragraph 0227 of JP-A-2013-029760, paragraph numbers 0254 to 0257 of JP-A-2008-292970, paragraph numbers 0034 to 0038 of JP-A-2013-253224, paragraph number 0477 of JP-A-2012-208494, JP-A-2017-048367, Patent No. 6057891, and Patent No. 6031807, and the contents of these are incorporated herein.

[0179] Examples of the polymerizable compound include dipentaerythritol tri(meth)acrylate, dipentaerythritol tetra(meth)acrylate, dipentaerythritol penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate, and modified products of these compounds. Examples of the modified product include ethoxylated dipentaerythritol hexa(meth)acrylate and compounds having a structure in which the (meth)acryloyl group of the above compounds is bonded via an alkyleneoxy group. Specific examples include the compound represented by formula (Z-4) and the compound represented by formula (Z-5).

[0180]

Chemical formula

[0181] In equations (Z-4) and (Z-5), E is independently -((CH2) y CH2O)-, or -((CH2) y In formula (Z-4), the total number of (meth)acryloyl groups is 3 or 4, each m is an integer from 0 to 10, and each X is an integer from 0 to 40. In formula (Z-5), the total number of (meth)acryloyl groups is 5 or 6, each n is an integer from 0 to 10, and each n is an integer from 0 to 60.

[0182] In equation (Z-4), m is preferably an integer between 0 and 6, and more preferably an integer between 0 and 4. The sum of each m is preferably an integer between 2 and 40, more preferably an integer between 2 and 16, and particularly preferably an integer between 4 and 8. In equation (Z-5), n is preferably an integer between 0 and 6, and more preferably an integer between 0 and 4. Furthermore, the sum of each n is preferably an integer between 3 and 60, more preferably an integer between 3 and 24, and particularly preferably an integer between 6 and 12. Also, E in equation (Z-4) or equation (Z-5), i.e., -((CH2) y CH2O)- or -((CH2) y The CH(CH3)O)- group is preferably formed with the oxygen atom end bonded to X.

[0183] Furthermore, as a polymerizable compound, polypentaerythritol poly(meth)acrylate as shown in formula (Z-6) below can also be used. [ka] In formula (Z-6), X 1 ~X 6 Each of these independently represents a hydrogen atom or a (meth)acryloyl group, and n represents an integer from 1 to 10. However, X 1 ~X 6 At least one of them is a (meth)acryloyl group.

[0184] The polymerizable compound used in the present invention is preferably at least one selected from the group consisting of dipentaerythritol hexa(meth)acrylate, dipentaerythritol penta(meth)acrylate, polypentaerythritol poly(meth)acrylate, and modified versions thereof. Examples of commercially available products include KAYARAD D-310, DPHA, DPEA-12 (all manufactured by Nippon Kayaku Co., Ltd.), NK ester A-DPH-12E, and TPOA-50 (manufactured by Shin Nakamura Chemical Industry Co., Ltd.).

[0185] In addition, polymerizable compounds such as diglycerin EO (ethylene oxide) modified (meth)acrylate (commercially available as M-460; manufactured by Toagosei), pentaerythritol tetra(meth)acrylate (manufactured by Shin-Nakamura Chemical Industry Co., Ltd., NK Ester A-TMMT), 1,6-hexanediol diacrylate (manufactured by Nippon Kayaku Co., Ltd., KAYARAD HDDA), RP-1040 (manufactured by Nippon Kayaku Co., Ltd.), Aronics TO-2349 (manufactured by Toagosei Co., Ltd.), NK Oligo UA-7200 (manufactured by Shin-Nakamura Chemical Industry Co., Ltd.), 8UH-1006, 8UH-1012 (manufactured by Taisei Fine Chemical Co., Ltd.), Light Acrylate POB-A0 (manufactured by Kyoeisha Chemical Co., Ltd.), and EBECRYL80 (manufactured by Daicel Ornex, amine-containing tetrafunctional acrylate) can also be used.

[0186] Furthermore, it is also preferable to use trifunctional (meth)acrylate compounds such as trimethylolpropane tri(meth)acrylate, trimethylolpropanepropylene oxide-modified tri(meth)acrylate, trimethylolpropaneethylene oxide-modified tri(meth)acrylate, isocyanurate ethylene oxide-modified tri(meth)acrylate, and pentaerythritol tri(meth)acrylate as polymerizable compounds. Commercially available trifunctional (meth)acrylate compounds include Aronics M-309, M-310, M-321, M-350, M-360, M-313, M-315, M-306, M-305, M-303, M-452, M-450 (manufactured by Toagosei Co., Ltd.), NK Ester A9300, A-GLY-9E, A-GLY-20E, A-TMM-3, A-TMM-3L, A-TMM-3LM-N, A-TMPT, TMPT (manufactured by Shin-Nakamura Chemical Industry Co., Ltd.), and KAYARAD GPO-303, TMPTA, THE-330, TPA-330, PET-30 (manufactured by Nippon Kayaku Co., Ltd.).

[0187] Furthermore, polymerizable compounds can also be compounds having acidic groups such as carboxyl groups, sulfo groups, and phosphate groups. Examples of commercially available such compounds include Arronix M-305, M-510, M-520, and Arronix TO-2349 (manufactured by Toagosei Co., Ltd.).

[0188] Furthermore, as polymerizable compounds, compounds having a caprolactone structure can also be used. Regarding compounds having a caprolactone structure, reference can be made to paragraphs 0042 to 0045 of Japanese Patent Publication No. 2013-253224, the contents of which are incorporated herein by reference. Examples of compounds having a caprolactone structure include DPCA-20, DPCA-30, DPCA-60, DPCA-120, etc., which are commercially available from Nippon Kayaku Co., Ltd. as the KAYARAD DPCA series.

[0189] Furthermore, polymerizable compounds having a fluorene skeleton can also be used as polymerizable compounds. Commercially available examples include Ogusol EA-0200 and EA-0300 (manufactured by Osaka Gas Chemical Co., Ltd., (meth)acrylate monomers having a fluorene skeleton).

[0190] Furthermore, it is preferable to use polymerizable compounds that are substantially free of environmentally regulated substances such as toluene. Examples of commercially available such compounds include KAYARAD DPHA LT and KAYARAD DPEA-12 LT (manufactured by Nippon Kayaku Co., Ltd.).

[0191] Furthermore, suitable polymerizable compounds include urethane acrylates as described in Japanese Patent Publication No. 48-041708, Japanese Unexamined Patent Publication No. 51-037193, Japanese Unexamined Patent Publication No. 02-032293, and Japanese Unexamined Patent Publication No. 02-016765, as well as urethane compounds having an ethylene oxide-based skeleton as described in Japanese Patent Publication No. 58-049860, Japanese Patent Publication No. 56-017654, Japanese Patent Publication No. 62-039417, and Japanese Patent Publication No. 62-039418. It is also preferable to use polymerizable compounds having an amino structure or sulfide structure in the molecule as described in Japanese Unexamined Patent Publication No. 63-277653, Japanese Unexamined Patent Publication No. 63-260909, and Japanese Unexamined Patent Publication No. 01-105238. In addition, commercially available polymerizable compounds such as UA-7200 (manufactured by Shin-Nakamura Chemical Industry Co., Ltd.), DPHA-40H (manufactured by Nippon Kayaku Co., Ltd.), UA-306H, UA-306T, UA-306I, AH-600, T-600, AI-600, and LINC-202UA (manufactured by Kyoeisha Chemical Co., Ltd.) can also be used.

[0192] The content of polymerizable compounds in the total solid content of the resin composition is preferably 1 to 35% by mass. The upper limit is preferably 30% by mass or less, and more preferably 25% by mass or less. The lower limit is preferably 2% by mass or more, and more preferably 5% by mass or more. The resin composition of the present invention may contain only one polymerizable compound or two or more polymerizable compounds. If two or more polymerizable compounds are included, it is preferable that their total amount falls within the above range.

[0193] <<Photopolymerization initiator>> The resin composition of the present invention may contain a photopolymerization initiator. If the resin composition of the present invention contains a polymerizable compound, it is preferable that the resin composition of the present invention further contains a photopolymerization initiator. There are no particular restrictions on the photopolymerization initiator, and it can be appropriately selected from known photopolymerization initiators. For example, compounds that are photosensitive to light in the ultraviolet to visible regions are preferred. The photopolymerization initiator is preferably a photoradical polymerization initiator.

[0194] Examples of photopolymerization initiators include halogenated hydrocarbon derivatives (e.g., compounds having a triazine skeleton, compounds having an oxadiazole skeleton, etc.), acylphosphine compounds, hexaarylbiimidazole compounds, oxime compounds, organic peroxides, thio compounds, ketone compounds, aromatic onium salts, α-hydroxyketone compounds, and α-aminoketone compounds. From the viewpoint of exposure sensitivity, the photopolymerization initiator is preferably a trihalomethyltriazine compound, benzyldimethylketal compound, α-hydroxyketone compound, α-aminoketone compound, acylphosphine compound, phosphine oxide compound, metallocene compound, oxime compound, hexaarylbiimidazole compound, onium compound, benzothiazole compound, benzophenone compound, acetophenone compound, cyclopentadiene-benzene-iron complex, halomethyloxadiazole compound, and 3-arylsubstituted coumarin compound, more preferably a compound selected from oxime compounds, α-hydroxyketone compounds, α-aminoketone compounds, and acylphosphine compounds, and even more preferably an oxime compound. Furthermore, as photopolymerization initiators, the compounds described in paragraphs 0065-0111 of Japanese Patent Publication No. 2014-130173, the compounds described in Japanese Patent No. 6301489, and MATERIAL STAGE Examples include peroxide-based photopolymerization initiators described in pp. 37-60, Vol. 19, No. 3, 2019; photopolymerization initiators described in International Publication No. 2018 / 221177; photopolymerization initiators described in International Publication No. 2018 / 110179; photopolymerization initiators described in Japanese Patent Publication No. 2019-043864; photopolymerization initiators described in Japanese Patent Publication No. 2019-044030; peroxide-based initiators described in Japanese Patent Publication No. 2019-167313; aminoacetophenone-based initiators having an oxazolidine group described in Japanese Patent Publication No. 2020-055992; oxime-based photopolymerization initiators described in Japanese Patent Publication No. 2013-190459; polymers described in Japanese Patent Publication No. 2020-172619; and compounds represented by Formula 1 described in International Publication No. 2020 / 152120, the contents of which are incorporated herein by reference.

[0195] Specific examples of the hexaarylbiimidazole compound include 2,2’,4-tris(2-chlorophenyl)-5-(3,4-dimethoxyphenyl)-4,5-diphenyl-1,1’-biimidazole and the like.

[0196] Commercially available products of the α-hydroxyketone compound include Omnirad 184, Omnirad 1173, Omnirad 2959, Omnirad 127 (manufactured by IGM Resins B.V. as above), Irgacure 184, Irgacure 1173, Irgacure 2959, Irgacure 127 (manufactured by BASF as above), and the like. Commercially available products of the α-aminoketone compound include Omnirad 907, Omnirad 369, Omnirad 369E, Omnirad 379EG (manufactured by IGM Resins B.V. as above), Irgacure 907, Irgacure 369, Irgacure 369E, Irgacure 379EG (manufactured by BASF as above), and the like. Commercially available products of the acylphosphine compound include Omnirad 819, Omnirad TPO (manufactured by IGM Resins B.V. as above), Irgacure 819, Irgacure TPO (manufactured by BASF as above), and the like.

[0197] Examples of oxime compounds include the compounds described in Japanese Patent Publication No. 2001-233842, the compounds described in Japanese Patent Publication No. 2000-080068, the compounds described in Japanese Patent Publication No. 2006-342166, the compounds described in JCSPerkin II (1979, pp. 1653-1660), the compounds described in JCSPerkin II (1979, pp. 156-162), and the Journal of Photopolymer Science and Examples include compounds described in Technology (1995, pp. 202-232), compounds described in Japanese Patent Publication No. 2000-066385, compounds described in Japanese Patent Publication No. 2004-534797, compounds described in Japanese Patent Publication No. 2006-342166, compounds described in Japanese Patent Publication No. 2017-019766, compounds described in Japanese Patent Publication No. 6065596, compounds described in International Publication No. 2015 / 152153, compounds described in International Publication No. 2017 / 051680, compounds described in Japanese Patent Publication No. 2017-198865, compounds described in paragraphs 0025-0038 of International Publication No. 2017 / 164127, and compounds described in International Publication No. 2013 / 167515. Specific examples of oxime compounds include 3-benzoyloxyiminobutan-2-one, 3-acetoxyiminobutan-2-one, 3-propionyloxyiminobutan-2-one, 2-acetoxyiminopentan-3-one, 2-acetoxyimino-1-phenylpropane-1-one, 2-benzoyloxyimino-1-phenylpropane-1-one, 3-(4-toluenesulfonyloxy)iminobutan-2-one, 2-ethoxycarbonyloxyimino-1-phenylpropane-1-one, and 1-[4-(phenylthio)phenyl]-3-cyclohexyl-propane-1,2-dione-2-(O-acetyloxime). Examples of commercially available products include Irgacure OXE01, Irgacure OXE02, Irgacure OXE03, Irgacure OXE04 (all manufactured by BASF), TR-PBG-304, TR-PBG-327 (manufactured by Tronley), and ADEKA Optomer N-1919 (manufactured by ADEKA Corporation, photopolymerization initiator 2 described in Japanese Patent Publication No. 2012-014052).Furthermore, it is preferable to use oxime compounds that do not produce color or compounds that are highly transparent and resistant to discoloration. Examples of commercially available products include ADEKA Arclus NCI-730, NCI-831, and NCI-930 (all manufactured by ADEKA Corporation).

[0198] As a photopolymerization initiator, an oxime compound having a fluorene ring can also be used. Specific examples of oxime compounds having a fluorene ring include the compound described in Japanese Patent Publication No. 2014-137466, the compound described in Japanese Patent No. 6636081, and the compound described in Korean Published Patent No. 10-2016-0109444.

[0199] As a photopolymerization initiator, an oxime compound having a skeleton in which at least one benzene ring of the carbazole ring is replaced by a naphthalene ring can also be used. Specific examples of such oxime compounds include those described in International Publication No. 2013 / 083505.

[0200] As a photopolymerization initiator, an oxime compound containing a fluorine atom can also be used. Specific examples of oxime compounds containing a fluorine atom include the compound described in Japanese Patent Publication No. 2010-262028, compounds 24, 36-40 described in Japanese Patent Publication No. 2014-500852, and compound (C-3) described in Japanese Patent Publication No. 2013-164471.

[0201] As a photopolymerization initiator, an oxime compound having a nitro group can be used. The oxime compound having a nitro group is preferably in dimer form. Specific examples of oxime compounds having a nitro group include the compounds described in paragraphs 0031 to 0047 of Japanese Patent Publication No. 2013-114249, paragraphs 0008 to 0012 and 0070 to 0079 of Japanese Patent Publication No. 2014-137466, the compounds described in paragraphs 0007 to 0025 of Japanese Patent No. 4223071, and ADEKA Arclus NCI-831 (manufactured by ADEKA Corporation).

[0202] Oxime compounds having a benzofuran skeleton can also be used as photopolymerization initiators. Specific examples include OE-01 to OE-75, described in International Publication No. 2015 / 036910.

[0203] As photopolymerization initiators, oxime compounds in which a substituent having a hydroxyl group is attached to a carbazole skeleton can also be used. Examples of such photopolymerization initiators include the compounds described in International Publication No. 2019 / 088055.

[0204] As a photopolymerization initiator, an aromatic ring group Ar, in which an electron-withdrawing group is introduced to the aromatic ring, is used. OX1 An oxime compound having the above aromatic ring group Ar (hereinafter also referred to as oxime compound OX) can also be used. OX1 Examples of electron-withdrawing groups include acyl groups, nitro groups, trifluoromethyl groups, alkylsulfinyl groups, arylsulfinyl groups, alkylsulfonyl groups, arylsulfonyl groups, and cyano groups, with acyl and nitro groups being preferred, acyl groups being more preferred, and benzoyl groups being even more preferred. The benzoyl group may have substituents. Preferred substituents are halogen atoms, cyano groups, nitro groups, hydroxyl groups, alkyl groups, alkoxy groups, aryl groups, aryloxy groups, heterocyclic groups, heterocyclic oxy groups, alkenyl groups, alkylsulfanyl groups, arylsulfanyl groups, acyl groups, or amino groups, with alkyl groups, alkoxy groups, aryl groups, aryloxy groups, heterocyclic oxy groups, alkylsulfanyl groups, arylsulfanyl groups, or amino groups being even more preferred, and alkoxy groups, alkylsulfanyl groups, or amino groups being even more preferred.

[0205] The oxime compound OX is preferably at least one selected from the compounds represented by formula (OX1) and the compounds represented by formula (OX2), and more preferably the compound represented by formula (OX2). [ka] In the formula, R X1 This represents an alkyl group, alkenyl group, alkoxy group, aryl group, aryloxy group, heterocyclic group, heterocyclicoxy group, alkylsulfanyl group, arylsulfanyl group, alkylsulfinyl group, arylsulfinyl group, alkylsulfonyl group, arylsulfonyl group, acyl group, acyloxy group, amino group, phosphinoyl group, carbamoyl group, or sulfamoyl group. R X2 This represents an alkyl group, alkenyl group, alkoxy group, aryl group, aryloxy group, heterocyclic group, heterocyclicoxy group, alkylsulfanyl group, arylsulfanyl group, alkylsulfinyl group, arylsulfinyl group, alkylsulfonyl group, arylsulfonyl group, acyloxy group, or amino group. R X3 ~R X14 Each of these independently represents a hydrogen atom or a substituent; However, R X10 ~R X14 At least one of them is an electron-withdrawing group.

[0206] Examples of electron-withdrawing groups include acyl groups, nitro groups, trifluoromethyl groups, alkylsulfinyl groups, arylsulfinyl groups, alkylsulfonyl groups, arylsulfonyl groups, and cyano groups. Acyl and nitro groups are preferred, acyl groups are more preferred, and benzoyl groups are even more preferred.

[0207] In the above formula, R X12 R is an electron-withdrawing group, X10 , R X11 , R X13 , R X14 It is preferable that it is a hydrogen atom.

[0208] Specific examples of oxime compounds OX include the compounds described in paragraphs 0083 to 0105 of Japanese Patent Publication No. 4600600.

[0209] Specific examples of oxime compounds that are preferably used in the present invention are shown below, but the present invention is not limited to these.

[0210] [ka] [ka] [ka]

[0211] The oxime compound is preferably one having a maximum absorption wavelength in the range of 350 to 500 nm, and more preferably one having a maximum absorption wavelength in the range of 360 to 480 nm. Furthermore, from the viewpoint of sensitivity, the molar extinction coefficient of the oxime compound at a wavelength of 365 nm or 405 nm is preferably high, more preferably 1,000 to 300,000, even more preferably 2,000 to 300,000, and particularly preferably 5,000 to 200,000. The molar extinction coefficient of the compound can be measured using known methods. For example, it is preferable to measure it using a spectrophotometer (Cary-5 spectrophotometer, Varian) with ethyl acetate solvent at a concentration of 0.01 g / L.

[0212] As a photopolymerization initiator, it is also preferable to use a combination of Irgacure OXE01 (BASF) and / or Irgacure OXE02 (BASF) and Omnirad 2959 (IGM Resins BV).

[0213] As the photopolymerization initiator, a bifunctional or trifunctional or more photoradical polymerization initiator may be used. By using such a photoradical polymerization initiator, two or more radicals are generated from one molecule of the photoradical polymerization initiator, thus providing good sensitivity. Furthermore, when an asymmetric compound is used, the crystallinity decreases and solubility in solvents improves, making precipitation less likely over time and improving the long-term stability of the resin composition. Specific examples of bifunctional or trifunctional or more photoradical polymerization initiators include the dimers of oxime compounds described in JP 2010-527339, JP 2011-524436, International Publication No. 2015 / 004565, paragraphs 0407-0412 of JP 2016-532675, and paragraphs 0039-0055 of International Publication No. 2017 / 033680, as well as compounds (E) and (G) described in JP 2013-522445, and International Publication No. Examples include Cmpd1-7 described in Patent Publication No. 2016 / 034963, oxime ester photoinitiators described in paragraph 0007 of Japanese Patent Publication No. 2017-523465, photoinitiators described in paragraphs 0020-0033 of Japanese Patent Publication No. 2017-167399, photopolymerization initiators (A) described in paragraphs 0017-0026 of Japanese Patent Publication No. 2017-151342, and oxime ester photoinitiators described in Japanese Patent Publication No. 6469669.

[0214] The content of the photopolymerization initiator in the total solid content of the resin composition is preferably 0.1 to 30% by mass. The lower limit is preferably 0.5% by mass or more, and more preferably 1% by mass or more. The upper limit is preferably 20% by mass or less, and more preferably 15% by mass or less. In the resin composition of the present invention, only one type of photopolymerization initiator may be used, or two or more types may be used. When two or more types are used, it is preferable that their total amount is within the above range.

[0215] <<Solvent>> The resin composition of the present invention preferably contains a solvent. Examples of solvents include organic solvents. The type of solvent is not particularly limited as long as it satisfies the solubility of each component and the applicability of the composition. Examples of organic solvents include ester solvents, ketone solvents, alcohol solvents, amide solvents, ether solvents, and hydrocarbon solvents. For further details, please refer to paragraph 0223 of International Publication No. 2015 / 166779, which is incorporated herein by reference. In addition, ester solvents and ketone solvents substituted with cyclic alkyl groups can also be preferably used. Specific examples of organic solvents include polyethylene glycol monomethyl ether, dichloromethane, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, 2-pentanone, 3-pentanone, 4-heptanone, cyclohexanone, 2-methylcyclohexanone, 3-methylcyclohexanone, 4-methylcyclohexanone, cycloheptanone, cyclooctanone, cyclohexyl acetate, cyclopentanone, ethyl carbitol acetate, butyl carbitol acetate, propylene glycol monomethyl ether, propylene Examples include propylene glycol monomethyl ether acetate, 3-methoxy-N,N-dimethylpropanamide, 3-butoxy-N,N-dimethylpropanamide, propylene glycol diacetate, 3-methoxybutanol, methyl ethyl ketone, gamma butyrolactone, sulfolane, anisole, 1,4-diacetoxybutane, diethylene glycol monoethyl ether acetate, butane-1,3-diyl diacetate, dipropylene glycol methyl ether acetate, diacetone alcohol (also known as diacetone alcohol, 4-hydroxy-4-methyl-2-pentanone), 2-methoxypropyl acetate, 2-methoxy-1-propanol, and isopropyl alcohol.However, the amount of aromatic hydrocarbons used as organic solvents (benzene, toluene, xylene, ethylbenzene, etc.) may be reduced for environmental reasons (for example, it may be possible to reduce the amount to 50 ppm (parts per million) or less, 10 ppm or less, or 1 ppm or less relative to the total amount of organic solvent).

[0216] In the present invention, it is preferable to use an organic solvent with a low metal content. The metal content of the organic solvent is preferably, for example, 10 ppb (parts per billion) or less by mass. If necessary, an organic solvent at the ppt (parts per trillion) level by mass may be used, and such organic solvents are provided, for example, by Toyo Gosei Co., Ltd. (Chemical Daily, November 13, 2015).

[0217] Methods for removing impurities such as metals from organic solvents include, for example, distillation (molecular distillation, thin-film distillation, etc.) and filtration using filters. The pore size of the filter used for filtration is preferably 10 μm or less, more preferably 5 μm or less, and even more preferably 3 μm or less. The material of the filter is preferably polytetrafluoroethylene, polyethylene, or nylon.

[0218] Organic solvents may contain isomers (compounds with the same number of atoms but different structures). Furthermore, they may contain only one type of isomer or multiple types.

[0219] The peroxide content in the organic solvent is preferably 0.8 mmol / L or less, and more preferably substantially peroxide-free.

[0220] The solvent content in the resin composition is preferably 10 to 95% by mass, more preferably 20 to 90% by mass, and even more preferably 30 to 90% by mass.

[0221] Furthermore, from the viewpoint of environmental regulations, it is preferable that the resin composition of the present invention substantially does not contain environmentally regulated substances. In this invention, substantially free from environmentally regulated substances means that the content of environmentally regulated substances in the resin composition is 50 ppm by mass or less, preferably 30 ppm by mass or less, more preferably 10 ppm by mass or less, and particularly preferably 1 ppm by mass or less. Examples of environmentally regulated substances include benzene; alkylbenzenes such as toluene and xylene; and halogenated benzenes such as chlorobenzene. These are registered as environmentally regulated substances under the REACH (Registration Evaluation Authorization and Restriction of Chemicals) regulations, the PRTR (Pollutant Release and Transfer Register) law, and the VOC (Volatile Organic Compounds) regulations, and their usage and handling methods are strictly regulated. These compounds may be used as solvents when manufacturing the various components used in the resin composition, and may be mixed into the resin composition as residual solvents. From the viewpoint of human safety and consideration for the environment, it is preferable to reduce these substances as much as possible. One method for reducing environmentally regulated substances is to heat or reduce the pressure in the system to a temperature above the boiling point of the regulated substance, thereby removing it by distillation. Furthermore, when removing small amounts of regulated substances, azeotropic distillation with a solvent having a similar boiling point is useful to improve efficiency. Additionally, if the mixture contains compounds with radical polymerization properties, polymerization inhibitors may be added during reduced-pressure distillation to suppress the progression of radical polymerization reactions and the resulting crosslinking between molecules. These distillation methods can be implemented at any stage, including the raw material stage, the product stage (e.g., the polymerized resin solution or polyfunctional monomer solution), or the resin composition stage prepared by mixing these compounds.

[0222] <<Thermosetting agent>> The resin composition of the present invention may contain a thermosetting agent as a component other than the resin and polymerizable compound described above. Examples of thermosetting agents include compounds having a cyclic ether group. Examples of cyclic ether groups include epoxy groups and oxetanyl groups. The epoxy group may be an alicyclic epoxy group. An alicyclic epoxy group refers to a monovalent functional group having a cyclic structure in which an epoxy ring and a saturated hydrocarbon ring are fused. The compound having a cyclic ether group is preferably a compound having an epoxy group (hereinafter also referred to as an epoxy compound). Examples of epoxy compounds include compounds having one or more epoxy groups in one molecule, and compounds having two or more epoxy groups are preferred. The epoxy compound is preferably a compound having 1 to 100 epoxy groups in one molecule. The upper limit of the number of epoxy groups contained in the epoxy compound can be, for example, 10 or less, or 5 or less. The lower limit of the number of epoxy groups contained in the epoxy compound is preferably 2 or more. As epoxy compounds, compounds described in paragraphs 0034 to 0036 of Japanese Patent Publication No. 2013-011869, paragraphs 0147 to 0156 of Japanese Patent Publication No. 2014-043556, paragraphs 0085 to 0092 of Japanese Patent Publication No. 2014-089408, and compounds described in Japanese Patent Publication No. 2017-179172 may also be used. These contents are incorporated herein by reference.

[0223] The compound having a cyclic ether group may be a low molecular weight compound (e.g., molecular weight less than 2000, and even less than 1000) or a high molecular weight compound (macromolecule) (e.g., molecular weight of 1000 or more, or in the case of a polymer, a weight-average molecular weight of 1000 or more). The weight-average molecular weight of the compound having a cyclic ether group is preferably 200 to 100000, more preferably 500 to 50000. The upper limit of the weight-average molecular weight is more preferably 10000 or less, particularly preferably 5000 or less, and even more preferably 3000 or less.

[0224] Examples of commercially available compounds containing a cyclic ether group include EHPE3150 (manufactured by Daicel Corporation), EPICLON N-695 (manufactured by DIC Corporation), Marproof G-0150M, G-0105SA, G-0130SP, G-0250SP, G-1005S, G-1005SA, G-1010S, G-2050M, G-01100, and G-01758 (all manufactured by NOF Corporation, epoxy group-containing polymers). Furthermore, compounds described in the examples below can also be used as compounds containing a cyclic ether group.

[0225] The content of the thermosetting agent in the total solid content of the resin composition is preferably 0.1 to 20% by mass. The lower limit is more preferably 0.5% by mass or more, and even more preferably 1% by mass or more. The upper limit is more preferably 15% by mass or less, and even more preferably 10% by mass or less. Only one type of thermosetting agent may be used, or two or more types may be used. When two or more types are used, it is preferable that their total amount is within the above range.

[0226] <<Polyalkyleneimines>> The resin composition of the present invention may also contain polyalkyleneimines. Polyalkyleneimines are used, for example, as dispersing aids for pigments. A dispersing aid is a material used to improve the dispersibility of colorants such as pigments in a resin composition. A polyalkyleneimine is a polymer obtained by ring-opening polymerization of alkyleneimines. It is preferable that the polyalkyleneimine is a polymer having a branched structure containing primary amino groups, secondary amino groups, and tertiary amino groups. The number of carbon atoms in the alkyleneimine is preferably 2 to 6, more preferably 2 to 4, even more preferably 2 or 3, and particularly preferably 2.

[0227] The molecular weight of the polyalkyleneimine is preferably 200 or more, and more preferably 250 or more. The upper limit is preferably 100,000 or less, more preferably 50,000 or less, even more preferably 10,000 or less, and particularly preferably 2,000 or less. Regarding the molecular weight of the polyalkyleneimine, if the molecular weight can be calculated from the structural formula, the molecular weight of the polyalkyleneimine is the value calculated from the structural formula. On the other hand, if the molecular weight of a specific amine compound cannot be calculated from the structural formula, or is difficult to calculate, the number-average molecular weight measured by the boiling point elevation method is used. Furthermore, if measurement is not possible or difficult even with the boiling point elevation method, the number-average molecular weight measured by the viscosity method is used. Furthermore, if measurement is not possible or difficult even with the viscosity method, the number-average molecular weight in polystyrene equivalent, measured by GPC (gel permeation chromatography), is used.

[0228] The amine value of the polyalkyleneimine is preferably 5 mmol / g or higher, more preferably 10 mmol / g or higher, and even more preferably 15 mmol / g or higher.

[0229] Specific examples of alkyleneimines include ethyleneimine, propyleneimine, 1,2-butyleneimine, and 2,3-butyleneimine, with ethyleneimine or propyleneimine being preferred, and ethyleneimine being more preferred. Polyalkyleneimines are particularly preferably polyethyleneimine. Furthermore, polyethyleneimine preferably contains 10 mol% or more of primary amino groups relative to the total of primary, secondary, and tertiary amino groups, more preferably 20 mol% or more, and even more preferably 30 mol% or more. Commercially available polyethyleneimines include Epomin SP-003, SP-006, SP-012, SP-018, SP-200, and P-1000 (all manufactured by Nippon Shokubai Co., Ltd.).

[0230] The polyalkylene imine content in the total solids of the resin composition is preferably 0.1 to 5% by mass. The lower limit is preferably 0.2% by mass or more, more preferably 0.5% by mass or more, and even more preferably 1% by mass or more. The upper limit is preferably 4.5% by mass or less, more preferably 4% by mass or less, and even more preferably 3% by mass or less. Furthermore, the polyalkylene imine content is preferably 0.5 to 20 parts by mass per 100 parts by mass of pigment. The lower limit is preferably 0.6 parts by mass or more, more preferably 1 part by mass or more, and even more preferably 2 parts by mass or more. The upper limit is preferably 10 parts by mass or less, and even more preferably 8 parts by mass or less. Only one type of polyalkylene imine may be used, or two or more types may be used. When two or more types are used, it is preferable that their total amount is within the above range.

[0231] <<Curing accelerator>> The resin composition of the present invention may contain a curing accelerator. Examples of curing accelerators include thiol compounds, methylol compounds, amine compounds, phosphonium salt compounds, amidine salt compounds, amide compounds, base generators, isocyanate compounds, alkoxysilane compounds, and onium salt compounds. Specific examples of curing accelerators include the compounds described in paragraphs 0094 to 0097 of International Publication No. 2018 / 056189, the compounds described in paragraphs 0246 to 0253 of Japanese Patent Publication No. 2015-034963, the compounds described in paragraphs 0186 to 0251 of Japanese Patent Publication No. 2013-041165, the ionic compounds described in Japanese Patent Publication No. 2014-055114, the compounds described in paragraphs 0071 to 0080 of Japanese Patent Publication No. 2012-150180, the alkoxysilane compounds having epoxy groups described in Japanese Patent Publication No. 2011-253054, the compounds described in paragraphs 0085 to 0092 of Japanese Patent No. 5765059, and the carboxyl group-containing epoxy curing agents described in Japanese Patent Publication No. 2017-036379. The content of the curing accelerator in the total solid content of the resin composition is preferably 0.3 to 8.9% by mass, and more preferably 0.8 to 6.4% by mass.

[0232] <<UV absorber>> The resin composition of the present invention may contain an ultraviolet absorber. Examples of ultraviolet absorbers include conjugated diene compounds, aminodiene compounds, salicylate compounds, benzophenone compounds, benzotriazole compounds, acrylonitrile compounds, hydroxyphenyltriazine compounds, indole compounds, and triazine compounds. Specific examples of such compounds include those described in paragraphs 0038 to 0052 of Japanese Patent Publication No. 2009-217221, paragraphs 0052 to 0072 of Japanese Patent Publication No. 2012-208374, paragraphs 0317 to 0334 of Japanese Patent Publication No. 2013-068814, and paragraphs 0061 to 0080 of Japanese Patent Publication No. 2016-162946, the contents of which are incorporated herein by reference. Specific examples of ultraviolet absorbers include compounds with the following structures. Examples of commercially available UV absorbers include UV-503 (manufactured by Daito Chemical Co., Ltd.), the Tinuvin series and Uvinul series from BASF, and the Sumisorb series from Sumika Chemtex Co., Ltd. An example of a benzotriazole compound is the MYUA series from Miyoshi Oil & Fat Co., Ltd. (Chemical Daily, February 1, 2016). Furthermore, thioaryl-substituted benzotriazole-type UV absorbers described in paragraphs 0049-0059 of Japanese Patent No. 6268967, paragraphs 0059-0076 of International Publication No. 2016 / 181987, and International Publication No. 2020 / 137819 can also be used. [ka]

[0233] The content of the ultraviolet absorber in the total solid content of the resin composition is preferably 0.01 to 10% by mass, and more preferably 0.01 to 5% by mass. In the present invention, only one type of ultraviolet absorber may be used, or two or more types may be used. When two or more types are used, it is preferable that the total amount is within the above range.

[0234] <<Polymerization inhibitor>> The resin composition of the present invention may contain a polymerization inhibitor. Examples of polymerization inhibitors include hydroquinone, p-methoxyphenol, di-tert-butyl-p-cresol, pyrogallol, tert-butylcatechol, benzoquinone, 4,4'-thiobis(3-methyl-6-tert-butylphenol), 2,2'-methylenebis(4-methyl-6-t-butylphenol), and N-nitrosophenylhydroxyamine salts (ammonium salts, cerium salts, etc.). Among these, p-methoxyphenol is preferred. The content of the polymerization inhibitor in the total solid content of the resin composition is preferably 0.0001 to 5% by mass. There may be only one polymerization inhibitor or two or more. If there are two or more, it is preferable that the total amount is within the above range.

[0235] <<Silane coupling agent>> The resin composition of the present invention may contain a silane coupling agent. In the present invention, a silane coupling agent means a silane compound having a hydrolyzable group and other functional groups. A hydrolyzable group is a substituent that is directly bonded to a silicon atom and can form a siloxane bond by at least one of a hydrolysis reaction and a condensation reaction. Examples of hydrolyzable groups include halogen atoms, alkoxy groups, and acyloxy groups, with alkoxy groups being preferred. That is, the silane coupling agent is preferably a compound having an alkoxysilyl group. Examples of functional groups other than hydrolyzable groups include vinyl groups, (meth)allyl groups, (meth)acryloyl groups, mercapto groups, epoxy groups, oxetanyl groups, amino groups, ureido groups, sulfide groups, isocyanate groups, and phenyl groups, with amino groups, (meth)acryloyl groups, and epoxy groups being preferred. Specific examples of silane coupling agents include N-β-aminoethyl-γ-aminopropylmethyldimethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd., trade name KBM-602), N-β-aminoethyl-γ-aminopropyltrimethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd., trade name KBM-603), N-β-aminoethyl-γ-aminopropyltriethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd., trade name KBE-602), γ-aminopropyltrimethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd., trade name KBM-903), γ-aminopropyltriethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd., trade name KBE-903), 3-methacryloxypropylmethyldimethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd., trade name KBM-502), 3-methacryloxypropyltrimethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd., trade name KBM-503), etc. Furthermore, specific examples of silane coupling agents include the compounds described in paragraphs 0018 to 0036 of Japanese Patent Publication No. 2009-288703 and the compounds described in paragraphs 0056 to 0066 of Japanese Patent Publication No. 2009-242604, the contents of which are incorporated herein by reference. The content of the silane coupling agent in the total solid content of the resin composition is preferably 0.01 to 15.0% by mass, and more preferably 0.05 to 10.0% by mass. The silane coupling agent may be of one type or two or more types.If there are two or more types, it is preferable that the total amount falls within the above range.

[0236] <<Surfactants>> The resin composition of the present invention may contain a surfactant. Various surfactants can be used, such as fluorinated surfactants, nonionic surfactants, cationic surfactants, anionic surfactants, and silicone surfactants. The surfactant is preferably a silicone surfactant or a fluorinated surfactant. For surfactants, refer to the surfactants described in paragraphs 0238 to 0245 of International Publication No. 2015 / 166779, which are incorporated herein by reference.

[0237] The fluorine content in the fluorinated surfactant is preferably 3 to 40% by mass, more preferably 5 to 30% by mass, and particularly preferably 7 to 25% by mass. Fluorinated surfactants with a fluorine content within this range are effective in terms of uniformity of coating film thickness and liquid saving, and also have good solubility in resin compositions.

[0238] Examples of fluorinated surfactants include those described in paragraphs 0060 to 0064 of Japanese Patent Publication No. 2014-041318 (corresponding to paragraphs 0060 to 0064 of International Publication No. 2014 / 017669), those described in paragraphs 0117 to 0132 of Japanese Patent Publication No. 2011-132503, and those described in Japanese Patent Publication No. 2020-008634, the contents of which are incorporated herein by reference. Examples of commercially available fluorine-based surfactants include Megafac F-171, F-172, F-173, F-176, F-177, F-141, F-142, F-143, F-144, F-437, F-475, F-477, F-479, F-482, F-554, F-555-A, F-556, F-557, F-558, F-559, F-560, F-561, F-565, F-563, F-568, F-575, F-780, EXP, MFS-330, R-01, R- 40, R-40-LM, R-41, R-41-LM, RS-43, R-43, TF-1956, RS-90, R-94, RS-72-K, DS-21 (all manufactured by DIC Corporation), Florard FC430, FC431, FC171 (all manufactured by Sumitomo 3M Co., Ltd.), Surflon S-382, SC-101, SC-103, SC-104, SC-105, SC-1068, SC-381, SC-383, S-393, KH-40 (all manufactured by AGC Inc.), PolyFox Examples include the PF636, PF656, PF6320, PF6520, PF7002 (all manufactured by OMNOVA), the F-Tergent 208G, 215M, 245F, 601AD, 601ADH2, 602A, 610FM, 710FL, 710FM, 710FS, and the FTX-218 (all manufactured by NEOS Corporation).

[0239] Fluorine-based surfactants include acrylic compounds that have a molecular structure with a functional group containing a fluorine atom, and when heated, the fluorine-containing functional group is cleaved, causing the fluorine atom to volatilize. Examples of such fluorine-based surfactants include the MegaFac DS series manufactured by DIC Corporation (Chemical Daily (February 22, 2016), Nikkei Sangyo Shimbun (February 23, 2016)), such as MegaFac DS-21.

[0240] Fluorine-based surfactants may also preferably be polymers of a fluorine atom-containing vinyl ether compound having a fluorinated alkyl group or a fluorinated alkylene ether group and a hydrophilic vinyl ether compound. Examples of such fluorine-based surfactants include those described in Japanese Patent Application Publication No. 2016-216602, the details of which are incorporated herein by reference.

[0241] Block polymers can also be used as fluorine-based surfactants. Fluorine-based surfactants can also preferably be fluorine-containing polymer compounds that include repeating units derived from a (meth)acrylate compound having a fluorine atom and repeating units derived from a (meth)acrylate compound having two or more (preferably five or more) alkylene oxy groups (preferably ethylene oxy groups, propylene oxy groups). Furthermore, fluorine-containing surfactants described in paragraphs 0016 to 0037 of Japanese Patent Application Publication No. 2010-032698, and the following compounds are also examples of fluorine-based surfactants used in the present invention. [ka] The weight-average molecular weight of the above compounds is preferably 3,000 to 50,000, for example, 14,000. In the above compounds, the percentage indicating the proportion of repeating units is expressed as mole percent.

[0242] Furthermore, fluorinated surfactants can also be fluorinated polymers having ethylenically unsaturated bond-containing groups in their side chains. Specific examples include the compounds described in paragraphs 0050-0090 and 0289-0295 of Japanese Patent Publication No. 2010-164965, and Megafac RS-101, RS-102, RS-718K, RS-72-K, etc., manufactured by DIC Corporation. Additionally, fluorinated surfactants can also be compounds described in paragraphs 0015-0158 of Japanese Patent Publication No. 2015-117327.

[0243] Furthermore, using the surfactant described in International Publication No. 2020 / 084854 as a substitute for surfactants having a perfluoroalkyl group with 6 or more carbon atoms is also preferable from an environmental regulatory standpoint.

[0244] Furthermore, it is also preferable to use a fluorine-containing imide salt compound represented by formula (fi-1) as a surfactant. [ka] In equation (fi-1), m represents 1 or 2, n represents an integer from 1 to 4, a represents 1 or 2, and X a+ This refers to α-valent metal ions, primary ammonium ions, secondary ammonium ions, tertiary ammonium ions, quaternary ammonium ions, or NH4. + It represents.

[0245] Nonionic surfactants include glycerol, trimethylolpropane, trimethylolethane and their ethoxylates and propoxylates (e.g., glycerol propoxylate, glycerol ethoxylate, etc.), polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, polyoxyethylene oleyl ether, polyoxyethylene octylphenyl ether, polyoxyethylene nonylphenyl ether, polyethylene glycol dilaurate, polyethylene glycol distearate, and sorbitan fatty acids. Examples include esters, Pluronic L10, L31, L61, L62, 10R5, 17R2, 25R2 (manufactured by BASF), Tetronic 304, 701, 704, 901, 904, 150R1 (manufactured by BASF), Solspers 20000 (manufactured by Lubrizol Nippon Co., Ltd.), NCW-101, NCW-1001, NCW-1002 (manufactured by Fujifilm Wako Pure Chemical Industries Ltd.), Paionin D-6112, D-6112-W, D-6315 (manufactured by Takemoto Oil & Fat Co., Ltd.), Orfin E1010, Surfinol 104, 400, 440 (manufactured by Nisshin Chemical Industry Co., Ltd.).

[0246] Examples of silicone-based surfactants include DOWSIL SH8400, SH8400 FLUID, FZ-2122, 67 Additive, 74 Additive, M Additive, SF 8419 OIL (all manufactured by Dow Toray Industries, Inc.), TSF-4300, TSF-4445, TSF-4460, TSF-4452 (all manufactured by Momentive Performance Materials, Inc.), KP-341, KF-6000, KF-6001, KF-6002, KF-6003 (all manufactured by Shin-Etsu Chemical Co., Ltd.), BYK-307, BYK-322, BYK-323, BYK-330, BYK-333, BYK-3760, BYK-UV3510 (all manufactured by BIC Chemie Inc.).

[0247] Furthermore, silicone-based surfactants can also be compounds with the following structure. [ka]

[0248] The surfactant content in the total solids of the resin composition is preferably 0.001% to 5.0% by mass, and more preferably 0.005% to 3.0% by mass. The surfactant may be of one type or two or more types. If two or more types are used, the total amount is preferably within the above range.

[0249] <<Antioxidant>> The resin composition of the present invention may contain an antioxidant. Examples of antioxidants include phenol compounds, phosphite ester compounds, and thioether compounds. As the phenol compound, any phenol compound known as a phenolic antioxidant can be used. A preferred phenol compound is a hindered phenol compound. Compounds having a substituent at the ortho position adjacent to the phenolic hydroxyl group are preferred. As the substituent, substituted or unsubstituted alkyl groups having 1 to 22 carbon atoms are preferred. Furthermore, compounds having both a phenol group and a phosphite ester group in the same molecule are also preferred as antioxidants. In addition, phosphorus-based antioxidants can also be suitably used as antioxidants. Examples of phosphorus-based antioxidants include tris[2-[[2,4,8,10-tetrakis(1,1-dimethylethyl)dibenzo[d,f][1,3,2]dioxaphosfepin-6-yl]oxy]ethyl]amine, tris[2-[(4,6,9,11-tetra-tert-butyldibenzo[d,f][1,3,2]dioxaphosfepin-2-yl)oxy]ethyl]amine, and ethylbis(2,4-di-tert-butyl-6-methylphenyl) phosphate. Examples of commercially available antioxidants include ADEKA STAB AO-20, ADEKA STAB AO-30, ADEKA STAB AO-40, ADEKA STAB AO-50, ADEKA STAB AO-50F, ADEKA STAB AO-60, ADEKA STAB AO-60G, ADEKA STAB AO-80, and ADEKA STAB AO-330 (all manufactured by ADEKA Corporation). In addition, compounds described in paragraphs 0023 to 0048 of Japanese Patent No. 6268967, compounds described in International Publication No. 2017 / 006600, compounds described in International Publication No. 2017 / 164024, and compounds described in Korean Published Patent No. 10-2019-0059371 can also be used as antioxidants. The antioxidant content in the total solids of the resin composition is preferably 0.01 to 20% by mass, and more preferably 0.3 to 15% by mass. Only one type of antioxidant may be used, or two or more types may be used. If two or more types are used, it is preferable that the total amount falls within the above range.

[0250] <<Component B>> The resin composition of the present invention may optionally contain sensitizers, curing accelerators, fillers, thermosetting accelerators, plasticizers, and other auxiliary agents (e.g., conductive particles, defoamers, flame retardants, leveling agents, peel accelerators, fragrances, surface tension modifiers, chain transfer agents, etc.). By appropriately including these components, properties such as film properties can be adjusted. These components can be described, for example, in paragraphs 0183 onwards of Japanese Patent Application Publication No. 2012-003225 (paragraph 0237 of the corresponding US Patent Application Publication No. 2013 / 0034812), paragraphs 0101-0104, 0107-0109, etc., of Japanese Patent Application Publication No. 2008-250074, and these contents are incorporated herein. Furthermore, the resin composition of the present invention may optionally contain latent antioxidants. Examples of latent antioxidants include compounds in which the antioxidant portion is protected by a protecting group, and which function as antioxidants when heated at 100-250°C or at 80-200°C in the presence of an acid / base catalyst, thereby removing the protecting group. Examples of latent antioxidants include compounds described in International Publication No. 2014 / 021023, International Publication No. 2017 / 030005, and Japanese Patent Publication No. 2017-008219. Examples of commercially available latent antioxidants include ADEKA Arclus GPA-5001 (manufactured by ADEKA Corporation).

[0251] The resin composition of the present invention may contain a metal oxide to adjust the refractive index of the resulting film. Examples of metal oxides include TiO2, ZrO2, Al2O3, and SiO2. The primary particle size of the metal oxide is preferably 1 to 100 nm, more preferably 3 to 70 nm, and even more preferably 5 to 50 nm. The metal oxide may have a core-shell structure. In this case, the core portion may be hollow.

[0252] The resin composition of the present invention may also contain a lightfastness modifier. As lightfastness modifiers, the compounds described in paragraphs 0036 to 0037 of JP 2017-198787, the compounds described in paragraphs 0029 to 0034 of JP 2017-146350, the compounds described in paragraphs 0036 to 0037 and 0049 to 0052 of JP 2017-129774, the compounds described in paragraphs 0031 to 0034 and 0058 to 0059 of JP 2017-129674, the compounds described in paragraphs 0036 to 0037 and 0051 to 0054 of JP 2017-122803, the compounds described in paragraphs 0025 to 0039 of International Publication No. 2017 / 164127, and the compounds described in paragraphs 0025 to 0039 of JP 2017-186546 Examples include the compounds described in paragraphs 0034 to 0047, the compounds described in paragraphs 0019 to 0041 of Japanese Patent Publication No. 2015-025116, the compounds described in paragraphs 0101 to 0125 of Japanese Patent Publication No. 2012-145604, the compounds described in paragraphs 0018 to 0021 of Japanese Patent Publication No. 2012-103475, the compounds described in paragraphs 0015 to 0018 of Japanese Patent Publication No. 2011-257591, the compounds described in paragraphs 0017 to 0021 of Japanese Patent Publication No. 2011-191483, the compounds described in paragraphs 0108 to 0116 of Japanese Patent Publication No. 2011-145668, and the compounds described in paragraphs 0103 to 0153 of Japanese Patent Publication No. 2011-253174.

[0253] The resin composition of the present invention is preferably substantially free of terephthalate esters. Here, "substantially free" means that the terephthalate ester content is 1000 ppb by mass or less of the total amount of the resin composition, more preferably 100 ppb by mass or less, and particularly preferably zero.

[0254] From an environmental perspective, the use of perfluoroalkyl sulfonic acid and its salts, and perfluoroalkyl carboxylic acid and its salts may be restricted. In the resin composition of the present invention, when the content of the above-mentioned compounds is reduced, the content of perfluoroalkyl sulfonic acid (particularly perfluoroalkyl sulfonic acid with 6 to 8 carbon atoms in the perfluoroalkyl group) and its salts, and perfluoroalkyl carboxylic acid (particularly perfluoroalkyl carboxylic acid with 6 to 8 carbon atoms in the perfluoroalkyl group) and its salts is preferably in the range of 0.01 ppb to 1,000 ppb, more preferably in the range of 0.05 ppb to 500 ppb, and even more preferably in the range of 0.1 ppb to 300 ppb, relative to the total solid content of the resin composition. The resin composition of the present invention may substantially not contain perfluoroalkyl sulfonic acid and its salts, and perfluoroalkyl carboxylic acid and its salts. For example, a resin composition substantially free of perfluoroalkyl sulfonic acid and its salts, and perfluoroalkyl carboxylic acid and its salts, may be selected by using compounds that can substitute for perfluoroalkyl sulfonic acid and its salts, and compounds that can substitute for perfluoroalkyl carboxylic acid and its salts. Examples of compounds that can substitute for regulated compounds include compounds that have been excluded from regulation due to differences in the number of carbon atoms in the perfluoroalkyl group. However, the above does not preclude the use of perfluoroalkyl sulfonic acid and its salts, and perfluoroalkyl carboxylic acid and its salts. The resin composition of the present invention may contain perfluoroalkyl sulfonic acid and its salts, and perfluoroalkyl carboxylic acid and its salts, to the maximum permissible extent.

[0255] The water content of the resin composition of the present invention is usually 3% by mass or less, preferably 0.01 to 1.5% by mass, and more preferably in the range of 0.1 to 1.0% by mass. The water content can be measured by the Karl Fischer method.

[0256] The resin composition of the present invention can be used by adjusting its viscosity for purposes such as adjusting the film surface (flatness, etc.) and adjusting the film thickness. The viscosity value can be appropriately selected as needed, but for example, 0.3 mPa·s to 50 mPa·s is preferred at 25°C, and 0.5 mPa·s to 20 mPa·s is more preferred. As a method for measuring viscosity, for example, a cone-plate type viscometer can be used and the measurement can be taken while the temperature has been adjusted to 25°C.

[0257] <<Container>> There are no particular limitations on the container used to house the resin composition, and any known container can be used. Furthermore, to suppress the incorporation of impurities into the raw materials and resin composition, it is preferable to use a multilayer bottle with an inner wall constructed of six types of resin in six layers, or a bottle with a seven-layer structure of six types of resin. Examples of such containers include the container described in Japanese Patent Publication No. 2015-123351. Additionally, the inner wall of the container may be made of glass, stainless steel, or other materials to prevent metal leaching from the inner wall, enhance the long-term stability of the resin composition, and suppress component deterioration.

[0258] <Method for preparing resin compositions> The resin composition of the present invention can be prepared by mixing the aforementioned components. When preparing the resin composition, all components may be dissolved and / or dispersed simultaneously in a solvent, or, if necessary, each component may be prepared as two or more solutions or dispersions and mixed at the time of use (coating) to prepare the resin composition.

[0259] Furthermore, it is preferable that the preparation of the resin composition includes a process for dispersing the pigment. Examples of mechanical forces used for dispersing the pigment in this process include compression, squeezing, impact, shearing, and cavitation. Specific examples of these processes include bead mills, sand mills, roll mills, ball mills, paint shakers, microfluidizers, high-speed impellers, sand grinders, flow jet mixers, high-pressure wet atomization, and ultrasonic dispersion. In addition, when grinding the pigment in a sand mill (bead mill), it is preferable to process under conditions that improve grinding efficiency, such as using beads with a small diameter or increasing the bead filling rate. Furthermore, it is preferable to remove coarse particles after the grinding process by filtration, centrifugation, etc. Furthermore, for the process and disperser used to disperse the pigment, the processes and dispersers described in "Complete Collection of Dispersion Technology, published by Joho Kiko Co., Ltd., July 15, 2005," "Comprehensive Data Collection on Dispersion Technology and Practical Industrial Applications, Centered on Suspension (Solid / Liquid Dispersion Systems), published by Keiei Kaihatsu Center Publishing Department, October 10, 1978," and paragraph 0022 of Japanese Patent Publication No. 2015-157893 can be suitably used. In addition, in the process of dispersing the pigment, particle refinement treatment may be performed in a salt milling step. For materials, equipment, and processing conditions used in the salt milling step, for example, refer to the descriptions in Japanese Patent Publication No. 2015-194521 and Japanese Patent Publication No. 2012-046629.

[0260] In preparing a resin composition, it is preferable to filter the resin composition with a filter for purposes such as removing foreign matter and reducing defects. Any filter that has been conventionally used for filtration purposes can be used without particular limitations. For example, filters made of materials such as fluororesins such as polytetrafluoroethylene (PTFE) and polyvinylidene fluoride (PVDF), polyamide resins such as nylon (e.g., nylon-6, nylon-6,6), and polyolefin resins such as polyethylene and polypropylene (PP) (including high-density and ultra-high molecular weight polyolefin resins) can be used. Among these materials, polypropylene (including high-density polypropylene) and nylon are preferred.

[0261] The pore size of the filter is preferably 0.01 to 7.0 μm, more preferably 0.01 to 3.0 μm, and even more preferably 0.05 to 0.5 μm. If the filter pore size is within the above range, fine foreign matter can be removed more reliably. The nominal value of the filter pore size can be referred to from the filter manufacturer. Various filters provided by Nippon Pall Co., Ltd. (DFA4201NXEY, DFA4201NAEY, DFA4201J006P, etc.), Advantec Toyo Co., Ltd., Nippon Integris Co., Ltd. (formerly Nippon Microlith Co., Ltd.), and KITZ Microfilter Corporation can be used.

[0262] Furthermore, it is also preferable to use fibrous filter media as a filter. Examples of fibrous filter media include polypropylene fiber, nylon fiber, and glass fiber. Commercially available products include the SBP type series (SBP008, etc.), TPR type series (TPR002, TPR005, etc.), and SHPX type series (SHPX003, etc.) from Rokitechno Co., Ltd.

[0263] When using filters, different filters (for example, a first filter and a second filter) may be combined. In this case, filtration with each filter may be performed only once or two or more times. Filters with different pore sizes within the range described above may also be combined. Furthermore, filtration with the first filter may be performed only on the dispersion, and then filtration with the second filter may be performed after mixing in other components. In addition, filters can be selected as appropriate according to the hydrophilicity and hydrophobicity of the composition.

[0264] <Membrane> The film of the present invention is obtained from the resin composition of the present invention described above. The film of the present invention can be used in optical filters such as color filters, near-infrared transmission filters, and near-infrared cut filters.

[0265] The film thickness of the present invention can be appropriately adjusted depending on the purpose. For example, the film thickness is preferably 20 μm or less, more preferably 10 μm or less, and even more preferably 5 μm or less. The lower limit of the film thickness is preferably 0.1 μm or more, more preferably 0.2 μm or more, and even more preferably 0.3 μm or more.

[0266] When the film of the present invention is used as a color filter, it is preferable that the film has a hue of green, red, blue, cyan, magenta, or yellow, more preferably a hue of green, blue, or cyan, and even more preferably a hue of green. Furthermore, the film of the present invention can be preferably used as a colored pixel of a color filter. Examples of colored pixels include red pixels, green pixels, blue pixels, magenta pixels, cyan pixels, and yellow pixels, with green pixels, blue pixels, or cyan pixels being preferred, and green pixels being more preferred.

[0267] <Memory manufacturing method> Next, a method for manufacturing the film of the present invention will be described. The film of the present invention can be manufactured by a step of applying the resin composition of the present invention. In the method for manufacturing the film, it is preferable to further include a step of forming a pattern (pixels). Examples of methods for forming the pattern (pixels) include photolithography and dry etching, with photolithography being preferred.

[0268] The pattern formation by photolithography preferably includes the steps of forming a resin composition layer on a support using the resin composition of the present invention, exposing the resin composition layer in a pattern, and developing and removing the unexposed parts of the resin composition layer to form a pattern (pixel). If necessary, a step of baking the resin composition layer (pre-bake step) and a step of baking the developed pattern (pixel) (post-bake step) may be provided.

[0269] In the step of forming the resin composition layer, the resin composition layer is formed on a support using the resin composition of the present invention. The support is not particularly limited and can be appropriately selected depending on the application. Examples include glass substrates and silicon substrates, with silicon substrates being preferred. A charge-coupled device (CCD), complementary metal-oxide-semiconductor (CMOS), transparent conductive film, etc., may be formed on the silicon substrate. A black matrix that isolates each pixel may also be formed on the silicon substrate. A base layer may be provided on the silicon substrate to improve adhesion with the upper layer, prevent diffusion of substances, or flatten the substrate surface. The base layer may be formed using a composition obtained by removing the colorant from the resin composition described herein, or a composition containing the resin, polymerizable compound, surfactant, etc., described herein. The surface contact angle of the base layer is preferably 20 to 70° when measured with diiodomethane. It is also preferably 30 to 80° when measured with water.

[0270] Known methods can be used for coating the resin composition. Examples include the drop method (drop casting); slit coating method; spray method; roll coating method; spin coating method; casting method; slit and spin method; pre-wetting method (for example, the method described in Japanese Patent Application Publication No. 2009-145395); various printing methods such as inkjet (for example, on-demand, piezo, and thermal), nozzle jet printing, flexographic printing, screen printing, gravure printing, reverse offset printing, and metal mask printing; transfer methods using molds, etc.; and nanoimprint methods. The application method for inkjet printing is not particularly limited, and examples include the method shown in "Expanding and Usable Inkjet Printing - Infinite Possibilities Seen in Patents," published February 2005 by Sumibe Techno Research (especially pages 115-133), as well as the methods described in Japanese Patent Publication Nos. 2003-262716, 2003-185831, 2003-261827, 2012-126830, and 2006-169325. Furthermore, regarding the method of coating the resin composition, reference can be made to the descriptions in International Publication Nos. 2017 / 030174 and 2017 / 018419, and these contents are incorporated herein by reference.

[0271] The resin composition layer formed on the support may be dried (pre-baked). Pre-baking is not necessary when manufacturing the film by a low-temperature process. If pre-baking is performed, the pre-baking temperature is preferably 150°C or lower, more preferably 120°C or lower, and even more preferably 110°C or lower. The lower limit can be, for example, 50°C or higher, and also 80°C or higher. The pre-baking time is preferably 10 to 300 seconds, more preferably 40 to 250 seconds, and even more preferably 80 to 220 seconds. Pre-baking can be performed using a hot plate, oven, etc.

[0272] Next, the resin composition layer is exposed in a patterned manner (exposure step). For example, the resin composition layer can be exposed in a patterned manner by using a stepper exposure machine or a scanner exposure machine, etc., through a mask having a predetermined mask pattern. This allows the exposed areas to be cured.

[0273] Examples of radiation (light) that can be used during exposure include g-rays and i-rays. Light with a wavelength of 300 nm or less (preferably light with a wavelength of 180 to 300 nm) can also be used. Examples of light with a wavelength of 300 nm or less include KrF rays (wavelength 248 nm) and ArF rays (wavelength 193 nm), with KrF rays (wavelength 248 nm) being preferred. Long-wave light sources with wavelengths of 300 nm or more can also be used.

[0274] Furthermore, exposure may be performed by continuously irradiating with light, or by irradiating in pulses (pulsed exposure). Pulsed exposure is an exposure method that involves repeatedly irradiating and pausing with light in short cycles (for example, at the millisecond level or less).

[0275] The irradiation dose (exposure dose) is, for example, 0.03 to 2.5 J / cm². 2 Preferably, 0.05 to 1.0 J / cm² 2 This is more preferable. The oxygen concentration during exposure can be appropriately selected. In addition to exposure in air, exposure may be carried out in a low-oxygen atmosphere with an oxygen concentration of 19 vol% or less (e.g., 15 vol%, 5 vol%, or substantially oxygen-free), or in a high-oxygen atmosphere with an oxygen concentration exceeding 21 vol% (e.g., 22 vol%, 30 vol%, or 50 vol%). Furthermore, the exposure intensity can be appropriately set, usually 1000 W / m². 2 ~100,000 W / m 2 (For example, 5000W / m 2 , 15000W / m 2 , or 35000W / m 2 The oxygen concentration and exposure intensity can be combined as appropriate; for example, an oxygen concentration of 10% by volume and an illuminance of 10,000 W / m². 2At an oxygen concentration of 35% by volume, the illuminance is 20,000 W / m². 2 This can be done as follows.

[0276] Next, the unexposed areas of the resin composition layer are developed and removed to form a pattern (pixels). The unexposed areas of the resin composition layer can be developed and removed using a developer. This causes the unexposed parts of the resin composition layer in the exposure process to dissolve into the developer, leaving only the photocured parts. The temperature of the developer is preferably, for example, 20 to 30°C. The development time is preferably 20 to 180 seconds. In addition, to improve the ability to remove residue, the developer may be emptied every 60 seconds, and the process of supplying fresh developer may be repeated several times.

[0277] Examples of developing solutions include organic solvents and alkaline developers, with alkaline developers being preferred. As the alkaline developer, an alkaline aqueous solution (alkaline developer) obtained by diluting an alkaline agent with pure water is preferred. Examples of alkaline agents include organic alkaline compounds such as ammonia, ethylamine, diethylamine, dimethylethanolamine, diglycolamine, diethanolamine, hydroxyamine, ethylenediamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropylammonium hydroxide, tetrabutylammonium hydroxide, ethyltrimethylammonium hydroxide, benzyltrimethylammonium hydroxide, dimethylbis(2-hydroxyethyl)ammonium hydroxide, choline, pyrrole, piperidine, and 1,8-diazabicyclo-[5.4.0]-7-undecene, as well as inorganic alkaline compounds such as sodium hydroxide, potassium hydroxide, sodium carbonate, sodium bicarbonate, sodium silicate, and sodium metasilicate. Alkaline agents with larger molecular weights are preferred from an environmental and safety perspective. The concentration of the alkaline agent in the alkaline aqueous solution is preferably 0.001 to 10% by mass, and more preferably 0.01 to 1% by mass. The developer may also contain a surfactant. For convenience of transport and storage, the developer may be manufactured as a concentrated solution and then diluted to the required concentration at the time of use. The dilution ratio is not particularly limited, but can be set in the range of 1.5 to 100 times, for example. It is also preferable to wash (rinse) with pure water after development. It is preferable to perform rinsing by supplying the rinsing solution to the resin composition layer after development while rotating the support on which the resin composition layer has been formed after development. It is also preferable to move the nozzle that discharges the rinsing solution from the center of the support to the periphery of the support. In this case, when moving the nozzle from the center to the periphery of the support, the speed of movement of the nozzle may be gradually reduced. By performing rinsing in this manner, in-plane variation of the rinse can be suppressed. A similar effect can be obtained by gradually reducing the rotation speed of the support while moving the nozzle from the center to the periphery of the support.

[0278] After development and drying, it is preferable to perform additional exposure or heat treatment (post-bake). Additional exposure and post-bake are curing treatments after development to ensure complete hardening. The heating temperature in post-bake is preferably 100 to 240°C, and more preferably 200 to 240°C. Post-bake can be performed continuously or in batches using heating means such as a hot plate, convection oven (hot air circulation dryer), or high-frequency heater to achieve the above conditions. When performing additional exposure, it is preferable that the light used for exposure has a wavelength of 400 nm or less. The additional exposure may also be performed using the method described in Korean Published Patent No. 10-2017-0122130.

[0279] The dry etching method for pattern formation preferably includes the steps of: forming a resin composition layer on a support using the resin composition of the present invention; curing the entire resin composition layer to form a cured product layer; forming a photoresist layer on the cured product layer; exposing the photoresist layer in a patterned manner, then developing it to form a resist pattern; and using the resist pattern as a mask to dry etch the cured product layer using an etching gas. In the formation of the photoresist layer, it is preferable to further perform a pre-bake treatment. In particular, as a photoresist layer formation process, it is desirable to perform a heat treatment after exposure and a heat treatment after development (post-bake treatment). For the dry etching method for pattern formation, refer to paragraphs 0010 to 0067 of Japanese Patent Application Publication No. 2013-064993, and this content is incorporated herein by reference.

[0280] <Optical filters> The optical filter of the present invention has the film of the present invention described above. Examples of types of optical filters include color filters, near-infrared cut filters, and near-infrared transmission filters, with color filters being preferred. The color filter preferably has the film of the present invention as its pixels, more preferably as its colored pixels, and even more preferably as its green pixels.

[0281] The optical filter may have a protective layer on the surface of the film of the present invention. By providing a protective layer, various functions such as oxygen blockage, reduced reflectivity, hydrophilicity, and shielding of light of specific wavelengths (ultraviolet rays, near-infrared rays, etc.) can be imparted. The thickness of the protective layer is preferably 0.01 to 10 μm, and more preferably 0.1 to 5 μm. Methods for forming the protective layer include applying a resin composition for forming the protective layer, chemical vapor deposition, and attaching molded resin with an adhesive. The components constituting the protective layer include (meth)acrylic resin, ene-thiol resin, polycarbonate resin, polyether resin, polyarylate resin, polysulfone resin, polyethersulfone resin, polyphenylene resin, polyarylene etherphosphine oxide resin, polyimide resin, polyamide-imide resin, polyolefin resin, cyclic olefin resin, polyester resin, styrene resin, polyol resin, polyvinylidene chloride resin, melamine resin, urethane resin, aramid resin, polyamide resin, alkyd resin, epoxy resin, modified silicone resin, fluororesin, polycarbonate resin, polyacrylonitrile resin, cellulose resin, Si, C, W, Al2O3, Mo, SiO2, Si2N4, etc. Two or more of these components may be included. For example, in the case of a protective layer intended for oxygen barrier protection, the protective layer preferably contains polyol resin, SiO2, and Si2N4. In the case of a protective layer intended for low reflectivity, the protective layer preferably contains (meth)acrylic resin and fluororesin.

[0282] When forming a protective layer by coating a resin composition, known methods such as spin coating, casting, screen printing, and inkjet printing can be used as the coating method for the resin composition. The organic solvent contained in the resin composition can be a known organic solvent (for example, propylene glycol 1-monomethyl ether 2-acetate, cyclopentanone, ethyl lactate, etc.). When forming the protective layer by chemical vapor deposition, known chemical vapor deposition methods (thermochemical vapor deposition, plasma chemical vapor deposition, photochemical vapor deposition) can be used.

[0283] The protective layer may contain additives such as organic and inorganic fine particles, light absorbers of specific wavelengths (e.g., ultraviolet, near-infrared, etc.), refractive index adjusters, antioxidants, adhesives, and surfactants, as needed. Examples of organic and inorganic fine particles include polymer fine particles (e.g., silicone resin fine particles, polystyrene fine particles, melamine resin fine particles), titanium dioxide, zinc oxide, zirconium oxide, indium oxide, aluminum oxide, titanium nitride, titanium oxynitride, magnesium fluoride, hollow silica, silica, calcium carbonate, and barium sulfate. Known light absorbers can be used for light absorbers of specific wavelengths. The content of these additives can be adjusted as appropriate, but is preferably 0.1 to 70% by mass, and more preferably 1 to 60% by mass, relative to the total mass of the protective layer.

[0284] Furthermore, as the protective layer, the protective layer described in paragraphs 0073 to 0092 of Japanese Patent Publication No. 2017-151176 can also be used.

[0285] The optical filter may have a structure in which each pixel is embedded in a space partitioned, for example, in a grid pattern by a partition wall.

[0286] <Solid-state image sensor> The solid-state image sensor of the present invention has the film of the present invention described above. The configuration of the solid-state image sensor is not particularly limited as long as it has the film of the present invention and functions as a solid-state image sensor, but for example, the following configuration can be given.

[0287] The substrate has multiple photodiodes and transfer electrodes made of polysilicon or the like that constitute the light-receiving area of ​​a solid-state image sensor (CCD (charge-coupled device) image sensor, CMOS (complementary metal-oxide-semiconductor) image sensor, etc.), and a light-shielding film with an opening only for the light-receiving portion of the photodiode is provided on the photodiode and transfer electrodes, and a device protection film made of silicon nitride or the like is provided on the light-shielding film so as to cover the entire surface of the light-shielding film and the light-receiving portion of the photodiode, and a color filter is provided on the device protection film. Furthermore, the device may have a configuration in which a light-gathering means (e.g., a microlens; the same applies hereinafter) is provided on the device protection film and below the color filter (on the side closer to the substrate), or a configuration in which the light-gathering means is provided on the color filter. In addition, the color filter may have a structure in which each colored pixel is embedded in a space partitioned by partitions, for example in a grid pattern. In this case, it is preferable that the partitions have a lower refractive index than each colored pixel. Examples of imaging devices having such a structure include those described in Japanese Patent Publication No. 2012-227478, Japanese Patent Publication No. 2014-179577, and International Publication No. 2018 / 043654. Furthermore, as shown in Japanese Patent Publication No. 2019-211559, the light resistance may be improved by providing an ultraviolet absorption layer within the structure of the solid-state image sensor. The imaging device equipped with the solid-state image sensor of the present invention can be used not only in digital cameras and electronic devices with imaging functions (such as mobile phones), but also in in-vehicle cameras and surveillance cameras.

[0288] <Image display device> The image display device of the present invention has the film of the present invention described above. Examples of image display devices include liquid crystal display devices and organic electroluminescent display devices. For definitions of image display devices and details of each image display device, see, for example, "Electronic Display Devices" (by Akio Sasaki, Kogyo Chosakai Co., Ltd., published in 1990) and "Display Devices" (by Yoshiaki Ibuki, Sangyo Tosho Co., Ltd., published in 1989). Liquid crystal display devices are described, for example, in "Next-Generation Liquid Crystal Display Technology" (edited by Tatsuo Uchida, Kogyo Chosakai Co., Ltd., published in 1994). There are no particular restrictions on the liquid crystal display devices to which the present invention can be applied; for example, it can be applied to various types of liquid crystal display devices described in the above-mentioned "Next-Generation Liquid Crystal Display Technology". [Examples]

[0289] The present invention will be described in more detail below with reference to examples. The materials, amounts used, proportions, processing content, and processing procedures shown in the following examples can be modified as appropriate, as long as they do not depart from the spirit of the present invention. Therefore, the scope of the present invention is not limited to the specific examples shown below.

[0290] <Regarding resins P1-P188, PP1-PP23, PP101-PP136, and CP1-CP3> Resins P1-P188, PP1-PP23, PP101-PP136, and CP1-CP3 are resins containing the repeating units shown in the table below. The acid value and weight-average molecular weight (Mw) of the resins are listed together. Resins P1-P188, PP1, PP2, and PP101-PP136 are the specific resins mentioned above. [Table 1] [Table 2] [Table 3] [Table 4] [Table 5] [Table 6] [Table 7] [Table 8]

[0291] [Repeat Unit 1] A-1: Repeating unit with the following structure (repeating unit having a naphthalimide structure) A-2: Repeating units with the following structure (repeating units having a naphthalimide structure) A-3: Repeating units with the following structure (repeating units having an acridone structure) A-4: Repeating units with the following structure (repeating units having a benzothiazole structure) A-5: Repeating units with the following structure (repeating units having a benzimidazole structure) A-6: Repeating units with the following structure (repeating units having a benzoxazole structure) A-7: Repeating units with the following structure (repeating units having a benzotriazole structure) A-8: Repeating units with the following structure (repeating units having a tetrazole structure) A-9: Repeating units with the following structure (repeating units having a phthalimide structure) A-10: Repeating unit with the following structure (repeating unit having a phthalimide structure) A-11: Repeating unit with the following structure (repeating unit having a carbazole structure) A-12: Repeating unit with the following structure (repeating unit having a fluorene structure) A-13: Repeating unit with the following structure (repeating unit having a benzimidazolone structure) A-14: Repeating units with the following structure (repeating units having an anthraquinone structure) A-15: Repeating unit with the following structure (repeating unit having a benzothiazine structure) A-16: Repeating unit with the following structure (repeating unit having a benzoxazine structure) A-17: Repeating unit with the following structure (repeating unit having a benzoinurea structure) A-18: Repeating units with the following structure (repeating units having an isoindoline structure) A-19: Repeating unit with the following structure (repeating unit having an isoindrinone structure) A-20: Repeating unit with the following structure (repeating unit having a phenoxazine structure) A-21: Repeating unit with the following structure (repeating unit having a phenothiazine structure) A-22: Repeating unit with the following structure (repeating unit having a dihydroacridine structure) A-23: Repeating unit with the following structure (repeating unit having a benzothiazolone structure) A-24: Repeating unit with the following structure (repeating unit having a benzoxazolinone structure) A-25: Repeating unit with the following structure (repeating unit having an imidazole structure) A-26: Repeating units with the following structure (repeating units having a thiazole structure) A-27: Repeating units with the following structure (repeating units having a pyrimidine structure) A-28: Repeating unit with the following structure (repeating unit having a quinazoline structure) A-29: Repeating units with the following structure (repeating units having a pyrazine structure) A-30: Repeating unit with the following structure (repeating unit having a quinoxaline structure) A-31: Repeating unit with the following structure (a repeating unit having a naphthalene-2,3-dicarboximide structure) A-32: Repeating unit with the following structure (repeating unit having a quinoline structure) A-33: Repeating unit with the following structure (repeating unit having a benzophenone structure) A-34: Repeating units with the following structure (repeating units having a triazine structure) A-35: Repeating units with the following structure (repeating units having a thioxanthone structure) A-36: Repeating units with the following structure (repeating units having a chroman structure) A-37: Repeating units with the following structure (repeating units having a thiochromatone structure) A-38: Repeating unit with the following structure (repeating unit having an azobenzene structure) A-39: Repeating unit with the following structure (repeating unit having a dibenzopyran structure) A-40: Repeating unit with the following structure (repeating unit having a benzalaniline structure) A-41: Repeating unit with the following structure (repeating unit having a phenazine structure) A-42: Repeating unit of the following structure (repeating unit having a barbituric acid structure) A-43: Repeating units with the following structure (repeating units having a xanthone structure) A-44: Repeating units with the following structure (repeating units having a saccharin structure) A-45: Repeating unit with the following structure (repeating unit having a phenoxathiine structure) A-46: Repeating units with the following structure (repeating units having a pyrazole structure) A-47: Repeating unit with the following structure (repeating unit having a pyrazolone structure) A-48: Repeating units with the following structure (repeating units having a caprolactam structure) A-49: Repeating units with the following structure (repeating units having an indole structure) A-50: Repeating unit with the following structure (repeating unit having a biphenyl structure) A-51: Repeating unit with the following structure (repeating unit having a benzothiophene structure) A-52: Repeating unit with the following structure (repeating unit having a carboline structure) A-53: Repeating unit with the following structure (repeating unit having a benzoxadiazole structure) A-54: Repeating unit with the following structure (repeating unit having a benzothiadiazole structure) A-55: Repeating unit with the following structure (repeating unit having a triarylbenzene structure) A-56: Repeating units with the following structure (repeating units having a triarylamine structure) A-57: Repeating units with the following structure (repeating units having an isothiazolinone structure) [ka] [ka] [ka] [ka] [ka] [ka]

[0292] [Repeating Unit 2] B-2, B-3, B-6, B-7, B-9, B-11, B-14: Repeating units with the following structure (repeating units containing acid groups) [ka]

[0293] [Repeat unit 3] C-1, C-3, C-5, C-7, C-9, C-10, C-12, C-13, C-14, C-17, C-18, C-19: Repeating units of the structure described below [ka]

[0294] [Repeat Unit 4] D-1, D-3, D-5, D-7: Repeating units with the following structure (repeating units with graft chains) [ka]

[0295] [Repeat unit 5] E-2, E-3, E-6: Repeating units with the following structure (repeating units with crosslinkable groups) [ka]

[0296] [Repeating Unit 6] F-1~F-6: Repeating units of the following structure [ka]

[0297] [Repeating Unit 7] F-7: Repeating unit of the following structure [ka]

[0298] <Manufacturing of Pigment Dispersion> The mixture of materials listed in the table below was mixed and dispersed for 3 hours using a bead mill (using 0.1 mm diameter zirconia beads). Further dispersion was performed using a high-pressure disperser with a vacuum mechanism, NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.), at a pressure of 2000 MPa and a flow rate of 500 g / min. This dispersion process was repeated 10 times to obtain each pigment dispersion. The values ​​listed in the table below are in parts by mass. The average particle size (nm) and viscosity (mPa·s) of the pigment in each pigment dispersion are also listed. The average particle size of the pigment was measured using the dynamic light scattering method with nanoSAQLA (manufactured by Otsuka Electronics Co., Ltd.). The viscosity of the pigment dispersion was measured after adjusting the temperature of the pigment dispersion to 25°C. [Table 9] [Table 10] [Table 11] [Table 12] [Table 13] [Table 14] [Table 15] [Table 16] [Table 17] [Table 18] [Table 19] [Table 20]

[0299] The details of the materials listed using the abbreviations in the table above are as follows: (Colorants) PR254: CI Pigment Red 254 (Diketopyrrolopyrrole compound, red pigment) PR272: CI Pigment Red 272 (Diketopyrrolopyrrole compound, red pigment) PY139: CI Pigment Yellow 139 (isoindoline compound, yellow pigment) PG36: CI Pigment Green 36 (Phthalocyanine compound, green pigment) PG58: CI Pigment Green 58 (Phthalocyanine compound, green pigment) PB15:6 : CI Pigment Blue 15:6 (Phthalocyanine compound, blue pigment) PV23: CI Pigment Violet 23 (Dioxazine compound, purple pigment) PBk32: CI Pigment Black 32 (Perylene compound, organic black pigment) IR colorant 1: Compound with the following structure (near-infrared absorbing pigment) [ka]

[0300] Derivatives 1-3: Compounds with the following structures (pigment derivatives) [ka]

[0301] (resin) P1~P188, PP1~PP23, PP101~PP136, CP1, CP2, CP3: The resins mentioned above. CP11: Prysurf A208F (manufactured by Daiichi Kogyo Seiyaku Co., Ltd., resin with phosphate groups (pKa = approximately 2), terminal acid group type) CP12: Prysurf H-3606 (manufactured by Daiichi Kogyo Seiyaku Co., Ltd., resin with carboxyl groups (pKa = approximately 4.5), terminal acid group type) CP13: Resin with the following structure (resin having a sulfo group (pKa = approximately 2), terminal acid group type) [ka]

[0302] (solvent) Solvent 1: Propylene glycol monomethyl ether acetate Solvent 2: Cyclopentanone Solvent 3: 1-Methoxy-2-propanol

[0303] <Manufacturing of resin compositions> Each material was mixed in the proportions shown in Formulations 1 to 7 below, and the mixture was filtered through a nylon filter with a pore size of 0.45 μm (manufactured by Nippon Pall Co., Ltd.) to produce each resin composition. In the table below, the value of the colorant content in the total solids of the resin composition is indicated in the "Colorant Content" column.

[0304] (Prescription 1) Pigment dispersions listed in the table below: 520 parts by mass Polymerizable compound 1...6.6 parts by mass Polymerizable compound 2...12.6 parts by mass Resin solution 1...3 parts by mass Photopolymerization initiator 1...5 parts by mass Surfactant 1 ···0.1 parts by mass Thermosetting agent 1...2 parts by mass Solvent 1 ···200 parts by mass Solvent 2 ···100 parts by mass Solvent 3 ···21.96 parts by mass

[0305] (Prescription 2) Pigment dispersion listed in the table below: 566.4 parts by mass Polymerizable compound 1...6.6 parts by mass Polymerizable compound 2...6.1 parts by mass Resin solution 1...3 parts by mass Photopolymerization initiator 1...5 parts by mass Surfactant 1 ···0.1 parts by mass Thermosetting agent 1...2 parts by mass Solvent 1 ···200 parts by mass Solvent 2 ···100 parts by mass Solvent 3 ···21.96 parts by mass

[0306] (Prescription 3) Pigment dispersion listed in the table below: 603.6 parts by mass Polymerizable compound 1...6.6 parts by mass Polymerizable compound 2...1.9 parts by mass Resin solution 1...3 parts by mass Photopolymerization initiator 1...4 parts by mass Surfactant 1 ···0.1 parts by mass Thermosetting agent 1...2 parts by mass Solvent 1 ···200 parts by mass Solvent 2 ···100 parts by mass Solvent 3 ···21.96 parts by mass

[0307] (Prescription 4) Pigment dispersions listed in the table below: 650 parts by mass Polymerizable compound 1...6.6 parts by mass Polymerizable compound 2...1.4 parts by mass Resin solution 1...3 parts by mass Photopolymerization initiator 1...5 parts by mass Surfactant 1 ···0.1 parts by mass Thermosetting agent 1...2 parts by mass Solvent 1 ···200 parts by mass Solvent 2 ···100 parts by mass Solvent 3 ···21.96 parts by mass

[0308] (Prescription 5) Pigment dispersion listed in the table below: 566.4 parts by mass Polymerizable compound 1...3.9 parts by mass Polymerizable compound 2...15.9 parts by mass Resin solution 1...3 parts by mass Photopolymerization initiator 1...5 parts by mass Surfactant 1 ···0.1 parts by mass Thermosetting agent 1 ···1 parts by mass Solvent 1 ···200 parts by mass Solvent 2 ···100 parts by mass Solvent 3 ···21.96 parts by mass

[0309] (Prescription 6) Pigment dispersions listed in the table below: 371.4 parts by mass Dye 1...21 parts by mass Polymerizable compound 1...6.6 parts by mass Polymerizable compound 2...12.4 parts by mass Resin solution 1...3 parts by mass Photopolymerization initiator 1...5 parts by mass Surfactant 1 ···0.1 parts by mass Thermosetting agent 1...2 parts by mass Solvent 1 ···200 parts by mass Solvent 2 ···100 parts by mass Solvent 3 ···21.96 parts by mass

[0310] (Prescription 7) Pigment dispersion listed in the table below: 566.4 parts by mass Polymerizable compound 1...3.9 parts by mass Polymerizable compound 2...5.7 parts by mass Resin solution 1...3 parts by mass Photopolymerization initiator 1...3 parts by mass Surfactant 1 ···0.1 parts by mass Thermosetting agent 1 ···1 parts by mass Solvent 1 ···200 parts by mass Solvent 2 ···100 parts by mass Solvent 3 ···21.96 parts by mass

[0311] (Prescription 8) Pigment dispersions listed in the table below: 696.4 parts by mass Polymerizable compound 1...3.9 parts by mass Polymerizable compound 2...1.1 parts by mass Resin solution 1...3 parts by mass Photopolymerization initiator 1...3 parts by mass Surfactant 1 ···0.1 parts by mass Thermosetting agent 1 ···1 parts by mass Solvent 1 ···200 parts by mass Solvent 2 ···100 parts by mass Solvent 3 ···21.96 parts by mass

[0312] (Prescription 9) Pigment dispersion listed in the table below: 464.3 parts by mass Polymerizable compound 1...6.6 parts by mass Polymerizable compound 2...12.6 parts by mass Resin solution 1...3 parts by mass Photopolymerization initiator 1...5 parts by mass Surfactant 1 ···0.1 parts by mass Thermosetting agent 1...2 parts by mass Solvent 1 ···200 parts by mass Solvent 2 ···100 parts by mass Solvent 3 ···21.96 parts by mass

[0313] Dye 1: Compound with the following structure (m=3, n=3, weight-average molecular weight 7000) [ka] Polymerizable compound 1: KAYARAD DPHA (manufactured by Nippon Kayaku Co., Ltd.) Polymerizable compound 2: KAYARAD RP-1040 (manufactured by Nippon Kayaku Co., Ltd.) Resin Solution 1: A 30% by mass solution of propylene glycol monomethyl ether acetate containing a resin with the following structure (weight-average molecular weight 9000, the numerical values ​​attached to the repeating units are by mass ratio). [ka] Photopolymerization initiator 1: Irgacure OXE01 (BASF, oxime compound) Surfactant 1: KF6001 (manufactured by Shin-Etsu Chemical Co., Ltd., silicone-based surfactant) Thermosetting agent 1: Compound T-1 with the following structure [ka] Solvent 1: Propylene glycol monomethyl ether acetate Solvent 2: Cyclopentanone Solvent 3: 1-Methoxy-2-propanol

[0314] <Performance Evaluation> (Uneven coloring) A base layer-forming composition (CT-4000, manufactured by Fujifilm Electronic Materials Co., Ltd.) was applied to a glass substrate by spin coating to a thickness of 0.1 μm, and then heated on a hot plate at 220°C for 1 hour to form a base layer. Each resin composition was then applied to this base layer-equipped glass substrate by spin coating, and then heated on a hot plate at 100°C for 2 minutes to obtain a composition layer with a thickness of 0.5 μm. This composition layer was exposed to light at a wavelength of 365 nm at 500 mJ / cm using an i-line stepper exposure system FPA-3000i5+ (manufactured by Canon Inc.). 2 The substrate was exposed using the specified exposure dose. After exposure, the composition layer was paddle-developed at 23°C for 60 seconds using a 0.3% by mass aqueous solution of tetramethylammonium hydroxide. Subsequently, it was rinsed with water using a spin shower, and then washed again with pure water. After that, the water droplets were blown off with high-pressure air, and the glass substrate was air-dried. Then, post-bake was performed on a hot plate at 220°C for 300 seconds to form a film. The brightness distribution of the glass substrate (evaluation substrate) on which this film was formed was analyzed using the method described below, and color uniformity was evaluated based on the number of pixels whose deviation from the mean was ±10% or more. This section describes the method for measuring luminance distribution. An evaluation substrate was placed between the observation lens and light source of an optical microscope, and light was shone towards the observation lens. The transmitted light state was observed using an optical microscope MX-50 (manufactured by Olympus Corporation) equipped with a digital camera. Images of the film surface were taken for five arbitrarily selected regions. The luminance of the captured images was quantified and saved as a density distribution of 256 levels from 0 to 255. The luminance distribution was analyzed from these images, and color uniformity was evaluated at the number of pixels where the deviation from the mean exceeded ±10%. The evaluation criteria are as follows: A rating of A to C indicates that there are no practical problems. A: The number of pixels whose deviation from the average exceeds ±10% is 1000 or less. B: The number of pixels whose deviation from the average exceeds ±10% is between 1000 and 3000. C: The number of pixels whose deviation from the average exceeds ±10% is between 3000 and 5000. D: The number of pixels whose deviation from the average exceeds ±10% is greater than 5000.

[0315] (Coarse particles) A base layer-forming composition (CT-4000, manufactured by Fujifilm Electronic Materials Co., Ltd.) was applied to a glass substrate using a spin coater to a thickness of 0.1 μm after post-baking. The substrate was then heated on a hot plate at 220°C for 300 seconds to form a base layer, obtaining a glass substrate (support) with a base layer. Each resin composition was applied to this glass substrate with a base layer using the spin coating method, and then heated on a hot plate at 100°C for 2 minutes to form a film with a thickness of 0.5 μm. Foreign matter contained in this film was detected using a foreign matter evaluation device, Complus III (manufactured by Applied Materials Co., Ltd.). From all detected foreign matter, foreign matter with a maximum width of 1.0 μm or more (coarse particles) was visually classified, and the number of classified coarse particles with a maximum width of 1.0 μm or more (1 cm) was calculated. 2 The number of coarse particles per unit area was counted. A: Membrane 1cm 2 The number of coarse particles per unit is less than 10. B: Membrane 1cm 2 The number of coarse particles per unit is between 10 and 30. C: Membrane 1cm 2 The number of coarse particles per unit is between 30 and 100. D: Membrane 1cm 2 The number of coarse particles per unit area is 100 or more.

[0316] (Developability) An underlayer-forming composition (CT-4000, manufactured by Fujifilm Electronic Materials Co., Ltd.) was applied to an 8-inch (20.32 cm) silicon wafer using a spin coater to a thickness of 0.1 μm after post-baking. The underlayer was then formed by heating on a hot plate at 220°C for 300 seconds, obtaining a silicon wafer with an underlayer (support). Next, each resin composition was applied by spin coating to a post-baking film thickness of 0.62 μm. Then, it was heated on a hot plate at 100°C for 2 minutes. Next, using an i-line stepper exposure system FPA-3000i5+ (manufactured by Canon Inc.), light with a wavelength of 365 nm was applied at a rate of 1000 mJ / cm². 2The silicon wafer was exposed using a 1.0 μm square dot pattern mask with the specified exposure dose. Next, the silicon wafer with the exposed coating film was placed on the horizontal rotating table of a spin-shower developer (DW-30 model, manufactured by Chemitronics Co., Ltd.), and paddle development was performed at 23°C for 60 seconds using a 60% diluted solution of CD-2000 (manufactured by Fujifilm Electronic Materials Co., Ltd.). After that, the silicon wafer was fixed to the horizontal rotating table using a vacuum chuck system, and while the silicon wafer was rotated at a rotation speed of 50 rpm by a rotating device, pure water was supplied in a shower-like manner from a spray nozzle above the center of rotation to perform a rinsing treatment, and then spray-dried. Furthermore, a heat treatment (post-bake) was performed using a 200°C hot plate for 300 seconds to form the pattern (pixels). The silicon wafers on which pixels were formed were observed using a scanning electron microscope (SEM) (magnification 10,000x), and their developability was evaluated according to the following evaluation criteria. A: No residue was observed outside the pixel formation area (unexposed area). B: A very small amount of residue was observed outside the pixel formation area (unexposed area), but it was not at a level that would cause any practical problems. C: A small amount of residue was observed outside the pixel formation area (unexposed area), but it was not a practical problem. D: Significant residue was observed outside the pixel formation area (unexposed area).

[0317] (Stability over time) The viscosity (mPa·s) of the resin compositions of the examples and comparative examples was measured using the "RE-85L" manufactured by Toki Sangyo Co., Ltd. After the above measurement, the resin compositions were left to stand at 45°C, shielded from light, for 5 days, and the viscosity (mPa·s) was measured again. The time-dependent stability was evaluated from the viscosity difference (ΔVis) before and after the above standing period according to the evaluation criteria below. A smaller viscosity difference (ΔVis) indicates better time-dependent stability of the resin composition. All of the above viscosity measurements were performed in a laboratory where the temperature and humidity were controlled to 22±5°C and 60±20%, with the temperature of the resin composition adjusted to 25°C. Three measurements were taken for each measurement, and the average value was used. A: ΔVis was 0.2 mPa·s or less. B: ΔVis was greater than 0.2 mPa·s and less than or equal to 0.3 mPa·s. C:ΔVis was greater than 0.3 mPa·s and less than or equal to 0.5 mPa·s. D:ΔVis exceeded 0.5 mPa·s [Table 21] [Table 22] [Table 23] [Table 24] [Table 25] [Table 26] [Table 27] [Table 28] [Table 29] [Table 30]

[0318] As shown in the table above, the resin compositions of the examples were able to form films with suppressed color unevenness.

[0319] The films obtained from the resin compositions described in the examples can be suitably used in optical filters, solid-state image sensors, and image display devices.

[0320] In Example 43, the same effect was obtained even when polymerizable compound 2 was changed to compound M-2 or M-3 having the structure shown below. [ka]

[0321] In Example 43, the same effect was obtained even when the photopolymerization initiator 1 was changed to compounds I-2 to I-5 having the structures shown below. [ka]

[0322] In Example 43, the same effect was obtained even when the thermosetting agent 1 was changed to compound T-2 or T-3 having the structure shown below. [ka]

[0323] In Example 43, the same effect was obtained even when surfactant 1 was changed to a compound with the structure shown below (weight-average molecular weight 14,000, the % value indicating the percentage of repeating units is in mole percent, a fluorine-based surfactant) or PolyFox PF6320 (manufactured by OMNOVA, a fluorine-based surfactant). [ka]

[0324] Similar results were obtained when PG36 in Example 1 was replaced with CI Pigment Green 7, CI Pigment Green 58, or CI Pigment Green 59.

[0325] <Examples of image sensor manufacturing> [Manufacturing of partition wall compositions] The components were mixed to obtain the composition shown in the table below. The mixture was then filtered through a Protego Plus PRL00S1S1 filter (manufactured by Entegris), and then further filtered through a DFA4201J006 filter (manufactured by Pall) to obtain the septum composition. The numerical values ​​for the blending amounts listed in the table below are in parts by mass. The blending amount for silica particle liquid is the value of SiO2 in the silica particle liquid. The numerical values ​​for the solvent blending amount are the total amount of solvent contained in the silica particle liquid.

[0326] [Table 31]

[0327] The ingredients listed in the table above are as follows: (Silica particle liquid) P1: This is a solution of silica particles (beaded silica) in which multiple spherical silica particles with an average particle diameter of 10 nm are linked together in a bead-like manner by metal oxide-containing silica (binding material). P2: Through-Ria 4110: A solution of silica particles (hollow-structured silica particles) with an average particle size of 60 nm, manufactured by JGC Catalysts & Chemicals Co., Ltd. Solid content concentration (SiO2 equivalent): 20% by mass

[0328] (Surfactants) F1: Compound with the following structure (weight-average molecular weight = 3000) [ka] F2: Silwet L-7220 (manufactured by Momentive Performance Materials) F3: Paionin B-111 (manufactured by Takemoto Oil Co., Ltd., lauryltrimethylammonium chloride)

[0329] (Additives) A1: NOD-N (manufactured by Shin-Nakamura Chemical Industry Co., Ltd., a compound with the structure shown below) [ka]

[0330] (solvent) S1: 1,4-Butanediol diacetate S2: Propylene glycol monomethyl ether acetate S3: Propylene glycol monomethyl ether S4: Ethanol S5: Water

[0331] [Image sensor manufacturing] Partitions 40-43 shown in Figure 1 of Japanese Patent Publication No. 2017-028241 were fabricated on a silicon wafer using the partition composition manufactured above. Next, a pattern was formed on a silicon wafer partitioned by a partition wall using a photolithography method, employing a green pixel-forming composition, a red pixel-forming composition, and a blue pixel-forming composition to create green, red, and blue pixels, respectively, thereby manufacturing an image sensor. The resulting image sensor exhibited excellent sensitivity. The resin composition of Example 1 was used for the green pixel formation composition. The resin composition of Example 70 was used for the red pixel formation composition. The resin composition of Example 76 was used for the blue pixel formation composition.

[0332] In the manufacturing of each partition composition, the same effect as described above was obtained even when filtration was performed using IonKleen SL (manufactured by Pall) instead of Protego Plus PRL00S1S1 (manufactured by Entegris) as the filtration filter.

Claims

1. A resin composition comprising colorant A and resin B, The aforementioned colorant A includes a pigment, The resin B contains a resin b1 comprising repeating units b1-1 having an acid group, repeating units b1-2 having a functional group b selected from a group containing two or more aromatic rings, a group containing a heterocyclic group, and a group containing a fused ring, and repeating units b1-3 other than the repeating units b1-1 and b1-2. The resin b1 is a dispersant, The functional group b is a thioxanthone structure, xanthone structure, anthrone structure, benzotriazole structure, benzoxadiazole structure, benzothiadiazole structure, benzothiazine structure, benzoxazine structure, benzoleinurea structure, isothiazolinone structure, phenoxazine structure, phenothiazine structure, dihydroacridine structure, phenoxatiin structure, dibenzopyran structure, fluorene structure, carboline structure, dibenzothiophene structure, dibenzofuran structure, pyrazine structure, quinazoline structure, The group includes a quinoxaline structure, a benzothiophene structure, a benzopyran structure, a quinolinone structure, a thiochromanone structure, a chroman structure, a naphthalene-2,3-dicarboximide structure, a pyrazolone structure, a tetrazole structure, a benzophenone structure, azobenzene structure, a benzalaniline structure, a phenazine structure, a barbiturate structure, a caprolactam structure, a saccharin structure, a biphenyl structure, a triarylbenzene structure, a triarylamine structure, a benzothiazolon structure, or a benzoxazolinone structure. The repeating unit b1-3 includes a repeating unit b1-3a having a crosslinkable group and a repeating unit b1-3b having a graft chain of a polyether structure. The acid value of the aforementioned resin b1 is 50 to 200 mg KOH / g. The content of resin b1 in resin B contained in the resin composition is 45 to 100% by mass. A resin composition wherein the content of the colorant A in the total solid content of the resin composition is 55% by mass or more.

2. The resin composition according to claim 1, wherein the colorant A contains a phthalocyanine pigment.

3. The resin composition according to claim 1 or 2, wherein the colorant A further comprises a dye.

4. The resin composition according to any one of claims 1 to 3, wherein the content of the unit b1-2 in the resin b1 is 10 to 35% by mass.

5. The resin composition according to any one of claims 1 to 4, wherein the crosslinkable group of the repeating unit b1-3a is a (meth)acryloyl group.

6. The resin composition according to any one of claims 1 to 5, wherein the resin B further comprises a resin b2 different from the resin b1.

7. The resin composition according to claim 6, wherein the resin b2 comprises a resin having an acid group different from that of the resin b1.

8. The resin composition according to claim 7, wherein the resin b2 has acid groups with a pKa smaller than the acid groups of the resin b1.

9. The resin composition according to any one of claims 6 to 8, wherein the resin b2 comprises at least one selected from graft polymers, star polymers, block copolymers, and resins in which at least one end of a polymer chain is sealed with an acid group.

10. Furthermore, the resin composition according to any one of claims 1 to 9, comprising a polymerizable compound and a photopolymerization initiator.

11. A film obtained from the resin composition according to any one of claims 1 to 10.

12. An optical filter having the film described in claim 11.

13. A solid-state image sensor having the film described in claim 11.

14. An image display device having the film described in claim 11.

Images