Surface treatment method

Atmospheric pressure plasma cleaning addresses oxide film and flux residue issues in semiconductor soldering, enhancing IGBT reliability by reducing porosity and voids while avoiding vacuum costs.

JP7843321B2Active Publication Date: 2026-04-09LAIR LIQUIDE SA POUR LETUDE & LEXPLOITATION DES PROCEDES GEORGES CLAUDE
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Patent Information

Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
Filing Date
2024-08-31
Publication Date
2026-04-09

AI Technical Summary

Technical Problem

Current soldering processes for semiconductor devices, particularly in IGBTs, face issues such as oxide film formation leading to bonding defects, flux residue corrosion, internal voids, and high equipment costs due to vacuum requirements, which affect reliability and void ratios.

Method used

A surface treatment method using atmospheric pressure plasma to clean metal surfaces without flux, reducing residual oxygen levels to less than 10 ppm, and sweeping the surface at speeds of 10-300 mm/s to achieve porosity less than 1% and eliminate oxide films.

Benefits of technology

This method reduces porosity and voids, eliminates flux residue hazards, and integrates seamlessly into existing assembly lines, ensuring high reliability and low void ratios without the need for vacuum equipment.

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Abstract

To provide a surface treatment method.SOLUTION: Disclosed herein is a surface treatment method. Atmospheric plasma is provided, and an object to be treated is placed in the atmospheric plasma atmosphere, where a residual oxygen level in the atmospheric plasma atmosphere is lower than a prescribed value. A soldering process is integrated into an atmospheric plasma treatment system without any flux protection, and it is ensured that the oxygen level in the atmosphere is reduced to an extremely low level, which can meet the high requirements for surface soldering performance.SELECTED DRAWING: Figure 1
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Description

Technical Field

[0001] This application belongs to the field of semiconductor manufacturing. This application relates to a surface treatment method, particularly to a method for performing surface cleaning by using plasma.

Background Art

[0002] The manufacturing process of semiconductor devices requires the use of soldering technology. The general objects to be processed are often several metal materials, and these metal materials are easily oxidized in the presence of oxygen. The oxide film formed after oxidation can lead to bonding defects such as poor wetting spreadability, poor bonding performance, and increased voids. Furthermore, when the metal material melts under high-temperature conditions, the oxide film becomes thicker. The thickened oxide film is mixed between the joined objects after joining, resulting in poor conductivity.

[0003] Currently, the commonly used soldering process is flux soldering. Flux can reduce the surface tension of the object to be processed and can remove the oxide film on the surface of the object to be processed, but various types of flux still have inevitable drawbacks. One drawback of flux soldering is the formation of corrosive flux residues around the solder spots, which can lead to long-term reliability issues and is disadvantageous from the perspective of heat exchange. Another drawback of flux soldering is the problem of internal voids. Due to the evaporation and vaporization of flux, internal voids are almost inevitable. To reduce internal voids and flux residues, a vacuum reflow oven is used to suck away the flux residues. However, the vacuum process has the following drawbacks: First, some components will degas excessively in a vacuum, so the target vacuum pressure needs to be reached very slowly. Second, heat can only be transferred in a vacuum via infrared radiation or heat conduction, not via convection. Third, the price of vacuum equipment is very high. For example, according to the quotation of "Torch Technology Co., Ltd.", the price of vacuum equipment is 6 to 7 times that of non-vacuum equipment.

[0004] Soldering requires high soldering activity on metal surfaces, so the treatment of metal surfaces is particularly important. Insulated gate bipolar transistors (IGBTs) are an example, widely used in many high-power scenarios such as wind power generation, high-speed rail, electric vehicles, and ships. Trends in IGBT applications are towards greater power density, higher switching frequencies, and smaller volumes. Therefore, IGBT reliability is extremely important. Furthermore, air gaps that inevitably appear during the soldering process can seriously affect IGBT reliability during operation. A typical IGBT package module is shown in Figure 1. In this figure, 101 represents the primary solder layer, 102 represents the DBC, 103 represents the secondary solder layer, 104 represents the insulating layer, 105 represents the junction copper, and 106 represents the heat sink substrate. The main function of the heat sink substrate is to rapidly transfer the heat generated during the IGBT switching process. The heat sink substrate is usually made of copper. The thickness of the heat sink substrate is typically 3-8 mm. The primary function of direct bond copper (DBC) is to ensure electrical insulation, heat conduction, and current transfer capabilities between the chip and the heat sink substrate. Soldering between the chip and the DBC is called primary soldering. Due to further heat dissipation requirements, the DBC may be soldered directly onto the heat sink substrate; this is called secondary soldering. Secondary soldering has a larger soldering area than primary soldering and therefore can generate more voids. For some extremely demanding industries, such as the new energy sector, the individual void ratio of IGBTs should be less than 1%, and the overall void ratio should be less than 1.5%. Ensuring stable and low void ratios can be seen as an urgent requirement for IGBT module packaging.

[0005] From this perspective, it is an urgent issue for those skilled in the art to design new surface treatment methods to eliminate the aforementioned defects and shortcomings of the prior art and to meet the high requirements for soldering quality in several technical fields. [Overview of the project] [Means for solving the problem]

[0006] This application relates to a surface treatment method. In particular, this application relates to an improved method for cleaning a metal surface without using flux and organic solderability preservatives (OSP) so that the workpiece satisfies reliability requirements after soldering. This improved method of this application includes using atmospheric pressure plasma to treat the metal surface.

[0007] To achieve the above-mentioned objectives of the present invention, a surface treatment method comprising the following steps is disclosed in this application: providing atmospheric pressure plasma, and placing an object to be treated in the atmospheric pressure plasma atmosphere, wherein the residual oxygen level in the atmospheric pressure plasma atmosphere is lower than a predetermined value.

[0008] According to another aspect of this application, atmospheric pressure plasma is generated by supplying argon, helium, hydrogen, nitrogen, or a combination thereof.

[0009] According to another aspect of this application, atmospheric pressure plasma is generated by supplying argon and hydrogen, or nitrogen and hydrogen.

[0010] According to another aspect of this application, hydrogen accounts for 1% to 10% of the volume of the atmospheric pressure plasma, and preferably 1% to 4% of the volume of the atmospheric pressure plasma.

[0011] According to another aspect of this application, the predetermined value is 200 ppm, preferably 100 ppm, more preferably 50 ppm, and most preferably 10 ppm.

[0012] According to another aspect of this application, the surface of the workpiece is not coated with an organic solderable preservative.

[0013] According to another aspect of this application, the surface treatment method further includes the step of placing the workpiece into a soldering system after atmospheric pressure plasma treatment: in which no flux is used in the soldering system.

[0014] According to another aspect of this application, the atmospheric pressure plasma sweeps the workpiece at a speed of 10 mm / s to 300 mm / s, preferably 25 mm / s to 150 mm / s, and more preferably 25 mm / s to 100 mm / s.

[0015] According to another aspect of this application, the treatment method reduces the porosity of the surface of the workpiece to less than 1%.

[0016] According to another aspect of this application, atmospheric pressure plasma is generated by an atmospheric pressure plasma generator, which includes a plasma jet torch having a series of nozzles arranged such that an object to be processed can be covered by an atmospheric pressure plasma atmosphere.

[0017] According to another aspect of this application, atmospheric pressure plasma is emitted perpendicularly or obliquely to the surface of the workpiece.

[0018] The technical solution provided in this application is particularly applicable to large-area metal surface soldering in demanding fields such as IGBTs, and has the following advantages: (1) This is an "environmentally friendly" solution that does not require the use of flux and formic acid or other compounds that are unenvironmentally harmful and endanger health. (2) Plasma treatment leaves no residue and avoids reliability hazards caused by flux or formic acid residue. (3) Plasma treatment of the surface can significantly reduce the porosity and drastically reduce the internal porosity on the metal surface. (4) Compared with the vacuum plasma method, the method of the present application enables the process flow to be integrated into the same assembly line without causing interruption of the assembly line. Furthermore, the vacuum plasma method requires that the DBC and the heat dissipation substrate be placed into the vacuum chamber in batches. This process will inevitably expose the cleaned DBC surface to an oxygen atmosphere, deteriorate the surface oxidation, and cause interruption of the assembly line.

[0019] The advantages and spirit of the present application can be further understood from the following detailed description of the present invention and the accompanying drawings.

Brief Description of the Drawings

[0020] [Figure 1] FIG. 1 shows a typical IGBT package module. [Figure 2] FIG. 2 shows a flowchart of processing the surface by atmospheric pressure plasma in an embodiment of the present application. [Figure 3a-3c] FIGS. 3a - 3c respectively show schematic diagrams of solder spots on the DBC of the plasma injection torch in an embodiment of the present application at various sweeping speeds and various ROLs. [Figures 4a-4d] FIGS. 4a - 4d respectively show schematic diagrams of solder spots with voids obtained after flux soldering and atmospheric pressure plasma treatment.

Embodiments for Carrying Out the Invention

[0021] Specific embodiments of the present application are described in detail below with reference to the accompanying drawings. However, it should be understood that the present application is not limited to the implementation forms described below, and the technical concept of the present application can be implemented in combination with other well-known technologies having the same functions as those well-known technologies or other technologies.

[0022] In the following description of specific embodiments, many directional terms will be used for the purpose of explanation to clearly show the structure and manner of operation of the present application. However, terms such as "front", "rear", "left", "right", "outer", "inner", "outward", "inward", "axial direction", "radial direction", etc. should be understood as terms for convenience rather than restrictive terms.

[0023] In the description of the following specific embodiments, the positional or positional relationships indicated by terms such as "length", "width", "upper", "lower", "front", "rear", "left", "right", "vertical", "top", "bottom", "inner", and "outer" are based on the positional or positional relationships shown in the accompanying drawings, and it is only intended to facilitate and simplify the description of the present application without indicating or implying that the referenced device or element must have a specific orientation or must be constructed or operated in a specific orientation. Therefore, it should be understood that it should not be construed as a limitation of the present application.

[0024] In addition, the terms “First” and “Second” are used solely for descriptive purposes, rather than to restrict chronological order, quantity, or importance, and should not be interpreted as indicating or implying relative importance or implicitly defining the number of indicated technical features, but merely intended to distinguish one technical feature from another technical feature of the current technical solution. Accordingly, features defined by “First” and “Second” may explicitly or implicitly include one or more features. In the specification of this application, “plural” means two or more unless otherwise explicitly and specifically expressed. Similarly, modifiers such as “a” appearing herein do not indicate a definition of quantity, but describe technical features that did not appear in prior text. Likewise, unless modified by a specific quantitative measure, nouns herein should be considered to include both singular and plural; that is, a technical solution may include only one of the technical features, or it may include multiple of the technical features. Similarly, modifiers such as "approximately" and "about" that appear before numbers in this specification usually include the number itself, and their specific meaning should be understood in light of the context.

[0025] In this application, it should be understood that “at least one (item)” means one or more, and “multiple” means two or more. The expression “and / or” is used to describe a relational relationship between related objects and indicates that there may be three types of relationships; for example, “A and / or B” may mean the following three situations: only A exists, only B exists, and both A and B exist, where A and B may be singular or plural. The symbol (" / ") generally means that the preceding related object and the subsequent related object have an “or” relationship. The expression “at least one of the following (items)” etc. means any combination of these items (including any combination of a single (item) or multiple (items)). For example, at least one (item) of a, b or c may mean: a, b, c, “a and b”, “a and c”, “b and c”, or “a and b and c”, where a, b and c may be singular or plural.

[0026] In this specification, “unit,” “member,” “object,” and “module” refer to a unit used to perform at least one function and operation, and may be implemented by hardware components or software components or combinations thereof.

[0027] Unless otherwise explicitly indicated, each aspect or embodiment defined herein may be combined with any other aspect or embodiment. In particular, any indicated preferred or advantageous feature may be combined with any other indicated preferred or advantageous feature.

[0028] Explanation of terms As used herein, plasma, also called electrical plasma, is an ionized gaseous substance consisting of positive and negative ions produced by the ionization of atoms and groups of atoms after some electrons have been stripped away. The motion of the plasma is primarily governed by electromagnetic forces and exhibits significant behavior as a group. Atmospheric pressure plasma refers to electrical plasma produced at or near one atmosphere. Both atmospheric pressure plasma and vacuum plasma have high-energy particles, but atmospheric pressure plasma does not require the installation of a closed reaction chamber and vacuum pump system like vacuum plasma. Therefore, atmospheric pressure plasma has a significant advantage over vacuum plasma in terms of equipment costs, as it eliminates the need for a large vacuum chamber and vacuum pump. The surface treatment temperature in this application may be in the range of approximately 25°C to approximately 150°C. The plasma may optionally contain at least one gas selected from argon, helium, nitrogen, hydrogen, or a combination thereof. In some non-restrictive implementations, hydrogen may occupy 1% to 10%, preferably about 2% to 8%, and more preferably 4% to 7%, of the volume of the atmospheric pressure plasma.

[0029] As used herein, contact between atmospheric pressure plasma and the surface to be treated can be achieved by any suitable means (such as using a plasma jet to sweep the surface). The sweep rate can be varied as needed to target the efficiency required for a particular process. For example, the sweep rate may be within the range of about 1 to about 500 mm / s (including all ranges and subranges in between, such as about 10 to about 300 mm / s, 25 to 300 mm / s, 25 to 250 mm / s, 25 to 150 mm / s, 50 to 150 mm / s, and 50 to 100 mm / s).

[0030] Similarly, the length of time the atmospheric pressure plasma is in contact with the surface being treated (which may be called the residence time) can vary depending on the sweep rate and the desired surface properties. As a non-limiting example, the residence time can be within a range of 1 second to several minutes (approximately 1 second to 20 minutes, approximately 10 seconds to 10 minutes, approximately 30 seconds to 9 minutes, approximately 1 minute to 8 minutes, approximately 2 minutes to 7 minutes, approximately 3 minutes to 6 minutes, or approximately 4 minutes to 5 minutes, etc.) (including all ranges and subranges in between).

[0031] As used herein, the device used to generate plasma in this application is OpenAir TM Plasma jet torch or Atomflo TM A plasma machine can be used. Specifically, the processing parameters to be reconstructed can be precisely evaluated according to the sweep rate and the distance from the plasma torch to the surface to be processed.

[0032] As used herein, natural oxidation (NO) refers to exposing a workpiece to air at room temperature for two weeks to simulate the effects of natural oxidation on the workpiece during the transfer process.

[0033] As used herein, deep oxidation (DO) refers to placing a DBC that has been cleaned with citrate in a nitrogen atmosphere at 250°C and 50 ppm for 10 minutes to simulate the surface condition of the DBC after the first soldering during IGBT packaging.

[0034] In one implementation, atmospheric pressure plasma is generated by supplying argon, helium, hydrogen, nitrogen, or a combination thereof (such as argon and hydrogen, nitrogen and hydrogen, or helium and hydrogen).

[0035] As used herein, "clean surface," "surface cleaning," "cleaning," etc., refer to cleaning organic and inorganic contaminants from a surface to be treated so that a more effective and stronger mechanical and electrical connection is created between the metal materials.

[0036] As used herein, solder spot analysis can be performed by using X-ray inspection techniques known in the art. X-rays can penetrate into the package and directly inspect the quality of the solder spots.

[0037] The following embodiments address, as an example, the treatment of contaminants and oxide films on the DBC surface during the IGBT packaging process. In a nitrogen atmosphere, this embodiment uses atmospheric pressure plasma to treat the DBC surface instead of other chemical methods.

[0038] The solder used in flux soldering is Sn3O5, and its melting point is 217°C.

[0039] Since the surface of DBC is typically copper, it is easily oxidized. Organic solderability preservatives are a common protective measure in the prior art. OSP is a layer of organic copper composite film grown on the surface of copper using chemical methods. OSP is inexpensive and initially has good solderability, but after a certain period of use, its solderability deteriorates significantly, its lifespan is insufficient, and OSP is vulnerable to surface discoloration, uneven film thickness, excessive (too thick or too thin) film thickness, and other issues. If there are holes in the OSP directly above the copper surface, the copper surface will begin to oxidize from the holes, resulting in poor assembly. Furthermore, the thicker the OSP, the better it protects the copper foil. However, this also requires a more active flux to remove the OSP.

[0040] In this embodiment, assuming that the surface of the DBC is not coated with any flux or any organic solderable preservative, atmospheric pressure plasma is used to surface-treat the workpiece, and the requirements for wettability and porosity are met.

[0041] In this embodiment, a surface treatment process using atmospheric pressure plasma is shown in Figure 2. The workpiece is moved toward the reflow soldering device by a conveyor device. An atmospheric pressure plasma treatment chamber is placed in front of the reflow soldering device and can provide an atmospheric pressure plasma atmosphere. Here, any known plasma generator (such as a plasma jet torch) can be used to provide the atmospheric pressure plasma atmosphere. A typical plasma jet torch includes a series of nozzles arranged in such a manner that it can be ensured that the workpiece area is covered by the plasma atmosphere. The arrangement of the nozzles can be freely selected by those skilled in the art.

[0042] As shown in Figure 2, 201 and 206 represent transport platforms for placing and securing the workpiece. The entire atmospheric pressure plasma processing system includes transition chambers 202 and 205, an atmospheric pressure plasma processing chamber 203, and a reflow soldering chamber 204. Among these, transition chambers 202 and 205 and the atmospheric pressure plasma processing chamber 203 require the use of an inert gas (such as nitrogen) to replace the atmosphere in order to maintain the required residual oxygen level. The atmospheric pressure plasma processing chamber 203 is equipped with an atmospheric pressure plasma generator, which is connected to a gas source via a pipeline. The reflow soldering process is completed in the reflow soldering chamber 204. A specific reflow soldering process may be carried out according to a method well known to those skilled in the art, and is not limited in this application.

[0043] The atmospheric pressure plasma generator in the atmospheric pressure plasma treatment chamber 203 can generate any gas suitable for surface treatment (nitrogen, argon, helium, or a mixture of these with hydrogen).

[0044] It was unexpectedly discovered that the residual oxygen level (ROL) in the entire working environment of the atmospheric pressure plasma processing system described above must be lower than a predetermined value. Previous studies had not fully achieved the degree to which the residual oxygen level needed to be reduced. The lower the residual oxygen level, the more ideal it is expected to be: that is, the closer the residual oxygen level is to 0 ppm, the more ideal it is expected to be. Therefore, the residual oxygen level needs to be less than 300 ppm, preferably less than 200 ppm, more preferably less than 100 ppm, optimally less than 50 ppm, even less than 10 ppm, or even less than 5 ppm. An oxygen analyzer is configured within the atmospheric pressure plasma processing chamber to monitor the residual oxygen level. As an example, a fuel cell oxygen analyzer may be used.

[0045] As an example, a nitrogen atmosphere may be used to protect the entire work environment. Initially, the air in the work environment is replaced with nitrogen. After the ROL is reduced to about 200 ppm, the ROL can be rapidly reduced to, for example, 10 ppm or less by continuing to use nitrogen for replacement or by using the combustion of hydrogen-containing plasma to consume the remaining oxygen.

[0046] In this embodiment, the soldering temperature inside the reflow soldering chamber is set to 250°C.

[0047] The sweep speed range of a plasma jet torch can be estimated. A sweep speed that is too fast may not provide sufficient plasma intensity, while a sweep speed that is too slow may result in excessively high temperatures and too few units per hour (UPH). For example, the sweep speed of a plasma jet torch may range from 10 to 250 mm / second. In other words, the plasma processing time per unit area (inversely proportional to the sweep speed) should be optimized. Long processing times will rapidly increase the surface temperature of the DBC and cause re-oxidation. However, short processing times will not remove the oxide film on the DBC surface. Even a thin oxide film can cause undesirable soldering failures.

[0048] Surface wettability is an indicator of good soldering. If there are any firmly attached contaminants (such as oxide films) on the surface to be treated, these act as barriers to the metal connection and thus interfere with surface wettability. Since solder spots may not be standard circles, it is difficult to directly measure the contact angle of a solder spot on a metal surface. The area of ​​the solder spot is used to evaluate surface wettability as follows: The larger the area of ​​the solder spot, and the more sufficiently and uniformly the solder spot is, the better the surface wettability.

[0049] According to the process shown in Figure 2, DBC was processed at various sweep speeds and ROLs, and solder spot images were obtained in Figures 3a, 3b, and 3c. As shown in Figure 3a, the ROL in the atmospheric pressure plasma processing chamber was maintained at less than 5 ppm, and the sweep speed of the plasma jet torch was 25 mm / s. In Figure 3b, the ROL in the atmospheric pressure plasma processing chamber was in the range of approximately 130-180 ppm, and the sweep speed of the plasma jet torch was 25 mm / s. In Figure 3c, the ROL in the atmospheric pressure plasma processing chamber was maintained at less than 5 ppm, and the sweep speeds of the plasma jet torch were 150 mm / s, 100 mm / s, and 50 mm / s from left to right, respectively.

[0050] Lower sweep rates mean longer processing times and a higher likelihood of achieving better surface wettability. However, the solder spots in Figure 3b show significant shrinkage. A possible explanation is that a re-oxidation process occurred on the processed surface in Figure 3b due to a higher ROL. Unexpectedly, as shown in Figure 3c, the solder spots obtained at faster sweep rates are uniform and sufficient. It is usually assumed that excessively fast sweep rates result in insufficient processing time for the DBC surface. However, the results of this application show that the effect of sweep rate is not obvious because oxygen is always very thin when the ROL is sufficiently low.

[0051] Internal voids are another important evaluation criterion for determining the quality of soldering. The following two indicators will be considered. The first is the void ratio, which represents the area of ​​all voids within the target area divided by the area of ​​all solder spots. The second indicator is the ratio of solder spots with voids, which is the number of solder spots with voids divided by the total number of solder spots.

[0052] To achieve this objective, the inventors compared the porosity of solder spots after flux soldering and after atmospheric pressure plasma treatment by using deeply oxidized DBC as the soldering substrate. The results are shown in Table 1 below. In flux soldering, the flux type was SAC305 (purchased from Shanghai Huaqing Welding Materials Tech Co., Ltd.), the flux ratio was 0.2% to 5%, and the activity level was ROL0. Atmospheric pressure plasma treatment was performed in air with an ROL of less than 50 ppm. Each group consisted of 75 solder spots. Among the solder spots with porosity, the solder spot with the least porosity and the solder spot with the most porosity were selected as examples, as shown in Figures 4a and 4d.

[0053] [Table 1]

[0054] Table 1 shows that atmospheric pressure plasma treatment can significantly reduce porosity and the proportion of solder spots with voids compared to flux soldering. After flux soldering, 100% of solder spots had voids, and the average porosity was 2.7%. However, DBC treated with atmospheric pressure plasma had a significantly reduced porosity, and the quality of the solder spots was higher.

[0055] Therefore, plasma treatment demonstrated better performance not only in terms of porosity but also in terms of the number of void solder spots. This means that flux soldering can lead to a rapid increase in voids as the soldering area increases (although this is not the case with atmospheric pressure plasma treatment). This application provides a novel surface treatment method in which the soldering process is integrated into an atmospheric pressure plasma treatment system without any flux protection, and it is guaranteed that "the oxygen level in the atmosphere is reduced to an extremely low level that can satisfy the high requirements for surface soldering performance."

[0056] Only preferred specific embodiments of the present application are described herein, and such embodiments are used solely to illustrate the technical solutions of the present application without limiting the present application. All technical solutions obtainable by those skilled in the art through logical analysis, reasoning or limited experimentation based on the concepts of the present application should be within the scope of the present application. [Explanation of symbols]

[0057] 101 Main Handa Formation 102 DBC 103 Second Handa Layer 104 Insulating layer 105 Bonded copper 106 Heat dissipation board 201 Transport Platform 202 Transition room 203 Atmospheric Pressure Plasma Processing Room 204 Reflow Soldering Room 205 Transition Room 206 Transport Platform

Claims

1. A surface treatment method used in an atmospheric pressure plasma treatment system, characterized by including the steps of providing atmospheric pressure plasma and placing a workpiece having a metal surface to be soldered into the atmospheric pressure plasma atmosphere, the system comprising a transport platform for placing and fixing the workpiece, a transition chamber, an atmospheric pressure plasma treatment chamber, and a reflow soldering chamber. The metal surface of the workpiece is not coated with an organic solderable preservative. The transition chamber and the atmospheric pressure plasma processing chamber are configured to replace the atmosphere with an inert gas and maintain the required residual oxygen level. The residual oxygen level in the atmospheric pressure plasma atmosphere is lower than a predetermined value, and the predetermined value is 50 ppm. The atmospheric pressure plasma sweeps the workpiece at a speed of 25 mm / s to 150 mm / s. The void ratio of solder spots formed on the metal surface of the workpiece after surface treatment is less than 1%. Surface treatment method.

2. The surface treatment method according to claim 1, characterized in that the atmospheric pressure plasma is generated by supplying argon, helium, hydrogen, nitrogen, or a combination thereof.

3. The surface treatment method according to claim 2, characterized in that the atmospheric pressure plasma is generated by supplying argon and hydrogen, or nitrogen and hydrogen.

4. The surface treatment method according to claim 3, characterized in that the hydrogen accounts for 1% to 4% of the volume of the atmospheric pressure plasma.

5. The surface treatment method according to any one of claims 1 to 4, characterized in that the predetermined value is 10 ppm.

6. A surface treatment method according to any one of claims 1 to 4, further comprising the step of placing the workpiece into the reflow soldering chamber after atmospheric pressure plasma treatment, wherein no flux is used in the reflow soldering chamber.

7. The surface treatment method according to any one of claims 1 to 4, characterized in that the atmospheric pressure plasma sweeps the workpiece at a speed of 25 mm / s to 100 mm / s.

8. The surface treatment method according to any one of claims 1 to 4, characterized in that the atmospheric pressure plasma is emitted perpendicularly or obliquely to the metal surface of the workpiece.

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