A method for functionalizing polymer-based substrates by chemical deposition of thin films.

JP7844433B2Active Publication Date: 2026-04-13INSTITUT NAT POLYTECHN DE GRENOBLE +2
5 Cites 0 Cited by

Patent Information

Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
INSTITUT NAT POLYTECHN DE GRENOBLE
Filing Date
2021-07-20
Publication Date
2026-04-13

Smart Images

  • Figure 0007844433000006
    Figure 0007844433000006
  • Figure 0007844433000007
    Figure 0007844433000007
  • Figure 0007844433000008
    Figure 0007844433000008
Patent Text Reader

Abstract

The present invention relates to a method for functionalizing a cellulosic substrate (2) by chemical deposition of at least one thin film (3) using a gaseous precursor. The method comprises the steps of providing a substrate (2) comprising at least one sheet (200) having a first surface (200a) and a second surface (200b) with a surface roughness of at least 0.1 μm. The first surface (200a) has sections (200c) overlapping with other sections (200c) belonging to the first surface (200a) or the second surface (200b). The gaps (201) between the sections (200c) are at least locally arranged to allow diffusion of the gaseous precursor. The method then comprises a chemical vapor deposition step of at least one thin film (3) on the substrate (2), such as by diffusion of the gaseous precursor, into at least each of the gaps (201).
Need to check novelty before this filing date? Find Prior Art

Citation Information

Patent Citations

  • Method for applying a coating to a roll-shaped substrate.

    JP2014535006A

  • High throughput surface treatment on coiled flexible substrates

    US20050186338A1

  • Film cassette for gaseous vapor deposition

    US20110048327A1

  • Method of applying atomic layer deposition coatings onto porous non-ceramic substrates

    US20120171376A1

  • Roll processing of film

    US20160152518A1