Electrochemical apparatus and electrical equipment

Abstract

The present application discloses an electrochemical device and an electric appliance, comprising a housing and a sealing pin. The housing is provided with a through hole. The sealing pin is provided in the housing and covers and seals the through hole. The sealing pin includes a weak area, the thickness of the weak area is smaller than the thickness of the sealing pin, and the weak area includes a start end and an end end that are spaced apart from each other. The thickness of the housing is H1, and the thickness of the sealing pin is H2, where 0.1≦H2 / H1≦0.7. The electrochemical device described above can not only break through the weak area to exhaust and release pressure when the internal air pressure increases, but also reduce the amount of shell removal when processing the weak area, saving processing costs.

Description

Technical Field

[0001] This application relates to the field of energy storage technologies, and particularly to electrochemical devices and electrical equipment.

Background Art

[0002] Currently, in order to improve the safety of hard-case batteries, usually a weak area is formed by processing in the case. When the air pressure inside the battery is high, the gas inside the battery can break through this weak area, and the battery can exhaust and release the pressure. Since the shell of the hard-case battery is thick, when processing the weak area, the removal amount of the shell during processing is large, leading to a high processing cost. Also, the shell of the hard-case battery has a lot of punching material, and the variation in its thickness is large, resulting in poor accuracy of the remaining thickness of the weak area, thereby affecting the pressure release effect.

Summary of the Invention

Problems to be Solved by the Invention

[0003] In view of such a situation, it is necessary to provide an electrochemical device capable of reducing the removal amount of the shell when processing the weak area.

Means for Solving the Problems

[0004] An embodiment of the present invention provides an electrochemical device including a housing and a sealing pin. The housing is provided with a through hole. The sealing pin is provided on the housing and shields and seals the through hole. The sealing pin includes a weak area. The weak area has a thickness smaller than the thickness of the sealing pin and includes a starting end and a tail end. The starting end and the ending end are spaced apart from each other. If the thickness of the housing is H1 and the thickness of the sealing pin is H2, then 0.1 ≦ H2 / H1 ≦ 0.7.

[0005] In the electrochemical apparatus described above, the thickness of the sealing pin is less than the thickness of the housing, and the thin region of the open loop is provided on the sealing pin. The thickness of the thin region is less than the thickness of the sealing pin, and the ratio of the sealing pin thickness to the housing thickness is between 0.1 and 0.7. This not only allows the electrochemical apparatus to release pressure by venting through the thin region when the internal pressure increases, but also reduces the amount of shell removed when processing the thin region, thereby saving processing costs, provided that the same pressure release requirement is met.

[0006] In some embodiments of this application, 1 / 3 ≤ H2 / H1 ≤ 1 / 2.

[0007] The ratio of the thickness of the sealing pin to the thickness of the housing is between 1 / 3 and 1 / 2. Assuming that the structural strength of the sealing pin is guaranteed and the sealing effect is ensured, the amount of shell removed when processing the thin area can be reduced, thereby saving processing costs.

[0008] In some embodiments of the present application, the housing includes a top wall, side walls and a bottom wall, the side walls being connected to the top wall and bottom wall, and through holes being provided in the top wall, side walls or bottom wall.

[0009] In some embodiments of the present application, if the thickness of the thin region is H3, then 0.2 ≤ H3 / H2 ≤ 0.9.

[0010] The ratio of the thickness of the thin region to the thickness of the sealing pin is between 0.2 and 0.9. When the air pressure inside the electrochemical apparatus increases, the thin region can rupture before the sealing pin to release the pressure, while also reducing the difficulty of processing the thin region and improving the processing quality of the thin region.

[0011] In some embodiments of this application, 0.2 ≤ H3 / H2 ≤ 0.5.

[0012] The ratio of the thickness of the thin region to the thickness of the sealing pin is between 0.2 and 0.5, which can lower the pressure threshold during pressure leakage in the electrochemical apparatus and further improve the safety of the electrochemical apparatus.

[0013] In some embodiments of the present application, if the circumference of the sealing pin is L1 and the length of the weakened region is L2, then 0.25 ≤ L2 / L1 ≤ 1.4, and the length of the weakened region L2 is the total length from the start end to the end end of the weakened region.

[0014] The ratio of the length of the thin region to the circumference of the sealing pin is between 0.25 and 1.4. When the air pressure inside the electrochemical apparatus increases, the thin region is damaged before the sealing pin, thereby achieving exhaust and pressure leakage effects.

[0015] In some embodiments of the present application, 0.35 ≤ L2 / L1 ≤ 0.8.

[0016] The ratio of the length of the thin region to the circumference of the sealing pin is between 0.35 and 0.8, which improves the accuracy of pressure relief within the electrochemical apparatus and enhances safety control over atmospheric pressure within the electrochemical apparatus.

[0017] In some embodiments of the present application, the sealing pin is provided with a first recess formed by a depression in the surface of the sealing pin, and the bottom wall of the first recess constitutes part of the surface of the thin region. When viewed along the thickness direction of the sealing pin, the projection of the first recess overlaps with the projection of the thin region.

[0018] The first recess constitutes a thin region in the sealing pin, and when the air pressure inside the electrochemical apparatus increases, the internal gas can break through the thin region, exhaust the electrochemical apparatus, and release the pressure, thereby enhancing the safety of the electrochemical apparatus.

[0019] In some embodiments of the present application, if W1 is the width of the opening of the first recess and W2 is the width of the bottom wall of the first recess, then W1 / W2 ≥ 1.1.

[0020] In some embodiments of the present application, the housing is provided with a second recess, the second recess is formed by the surface of the housing being recessed, the through hole penetrates the second recess, and at least a part of the sealing pin is accommodated in the second recess and connected to the bottom wall of the second recess.

[0021] The above sealing pin is partially accommodated in the second recess and connected to the bottom wall of the second recess. Thereby, the influence of the volume of the sealing pin on the volume of the electrochemical device can be reduced, and the influence of the sealing pin on the energy density of the electrochemical device can be reduced.

[0022] In some embodiments of the present application, the sealing pin is fixedly connected to the bottom wall of the second recess, the portion of the sealing pin in contact with the bottom wall of the second recess forms a closed-loop connection region, and along the thickness direction of the sealing pin, the projection of the connection region surrounds the projection of the weak region.

[0023] The above sealing pin is fixedly connected to the bottom wall of the second recess, and the projection of the connection region between the sealing pin and the second recess surrounds the projection of the weak region, so that the gas in the electrochemical device acts on the weak region and may break through the weak region.

[0024] In some embodiments of the present application, if the depth of the second recess is H4, then H4≥H2.

[0025] The depth of the second recess is not less than the thickness of the sealing pin. When the sealing pin connects the bottom wall of the second recess, by ensuring that all of the sealing pin is located within the second recess and does not protrude from the second recess, the influence of the thickness of the sealing pin on the volume or outer volume of the electrochemical device can be reduced, and the energy density of the electrochemical device can be increased.

[0026] In some embodiments of the present application, 10μm≤H2≤60μm, 50μm≤H1≤300μm.

[0027] The thickness ranges of the side wall and the sealing pin described above can reduce the removal amount of the shell during the processing of the weak area and improve the accuracy of the remaining thickness after the processing of the weak area, on the premise of ensuring the structural strength of the side wall and the sealing pin.

[0028] In some embodiments of the present application, 60μm ≦ W1 ≦ 200μm and W2 ≧ 0.

[0029] The dimensional ranges of the opening part and the bottom wall width of the first recess can form a weak area, reduce the removal amount of the shell during the processing of the first recess, and save costs.

[0030] Embodiments of the present application also provide an electrical equipment including the electrochemical device described in any of the above embodiments.

[0031] In the above-described electrical equipment, the electrochemical device can break through the weak area to exhaust and release pressure when the internal air pressure increases, and can also reduce the removal amount of the shell during the processing of the weak area. Furthermore, when enhancing the safety of the electrochemical device, the cost of the electrochemical device can be saved, the influence on the electrical equipment caused by the excessive internal air pressure of the electrochemical device can be reduced, and the cost of the electrical equipment can be saved.

Brief Description of the Drawings

[0032] [Figure 1] It is the first figure of the electrochemical device in an embodiment of the present application. [Figure 2] It is an exploded view of the electrochemical device in an embodiment of the present application. [Figure 3] It is the second figure of the electrochemical device in an embodiment of the present application. [Figure 4] It is a partial configuration diagram of the IV-IV cross section in FIG. 3. [Figure 5] It is a schematic structural diagram of the sealing pin in an embodiment of the present application. [Figure 6] It is a configuration diagram of an extended embodiment of the sealing pin shown in FIG. 5. [Figure 7] Figure 5 is a diagram illustrating an extended embodiment of the sealing pin shown. [Figure 8] This is a schematic diagram of the sealing pin structure in Comparative Example 4. [Figure 9] This is a diagram showing the configuration of an electrical device in one embodiment of the present invention. [Modes for carrying out the invention]

[0033] The present application will be further described with reference to the drawings described above, with respect to the following specific embodiments. The following describes the technical aspects of the embodiments of the present application with reference to the drawings of the embodiments. However, it is clear that the embodiments described are only a part of the embodiments of the present application and not all embodiments.

[0034] When one component is referred to as being “connected” to another component, it may be directly connected to the other component or connected via other elements. Similarly, when one component is referred to as being “mounted” to another component, it may be directly mounted to the other component or simultaneously be in the presence of an intermediate medium. Unless otherwise defined, all technical and scientific terms used herein have the same meaning as those generally understood by those skilled in the art of this application. The terms used in this specification are for the sole purpose of describing specific embodiments and are not intended to limit this application.

[0035] An electrochemical apparatus according to an embodiment of the present invention includes a housing and a sealing pin. The housing is provided with a through hole. The sealing pin is installed in the housing and seals the through hole by shielding it. The sealing pin includes a thin region. The thickness of the thin region is less than the thickness of the sealing pin. The thin region includes a start end and an end end that are spaced apart from each other. If the thickness of the housing is H1 and the thickness of the sealing pin is H2, then 0.1 ≤ H2 / H1 ≤ 0.7.

[0036] In the electrochemical apparatus described above, the thickness of the sealing pin is smaller than the thickness of the housing, and the thin region of the open loop is provided on the sealing pin. The thickness of the thin region is smaller than the thickness of the sealing pin, and the ratio of the thickness of the sealing pin to the thickness of the housing is between 0.1 and 0.7. This allows the electrochemical apparatus to release pressure by puncturing the thin region when the internal pressure increases, and also reduces the amount of shell removed when processing the thin region, thereby saving processing costs, provided that the same pressure release requirement is met.

[0037] The embodiments of this application will be further described below with reference to the drawings.

[0038] As shown in Figures 1 and 2, the electrochemical apparatus 100 according to an embodiment of the present invention includes a housing 10, a sealing pin 20 provided in the housing 10, and an electrode assembly 30 provided inside the housing 10. The housing 10 is provided with a through hole 111, the sealing pin 20 is provided in the housing 10, the sealing pin 20 shields and seals the through hole 111, the sealing pin 20 includes a thin region 21, the thickness of the thin region 21 is less than the thickness of the sealing pin 20, and the thin region 21 includes a start end 211 and an end end 212 that are spaced apart from each other. If the thickness of the housing 10 is H1 and the thickness of the sealing pin 20 is H2, then 0.1 ≤ H2 / H1 ≤ 0.7.

[0039] In the electrochemical apparatus 100 described above, the sealing pin 20 is provided in the housing 10, and the thickness of the sealing pin 20 is smaller than the thickness of the housing 10. The thinning region 21 is provided on the sealing pin 20, and the thickness of the thinning region 21 is smaller than the thickness of the sealing pin 20. The ratio of the thickness of the sealing pin 20 to the thickness of the housing 10 is between 0.1 and 0.7. This allows the electrochemical apparatus 100 to release pressure by venting through the thinning region 21 when the internal pressure increases. Furthermore, assuming that the same pressure release requirement is met, the amount of shell removed when processing the thinning region 21 can be reduced, thereby saving processing costs. In addition, the starting end 211 and ending end 212 of the thinning region 21 are spaced apart from each other, and the region surrounded by the thinning region 21 has an open loop structure. In this case, when the gas inside the electrochemical apparatus 100 penetrates the weak region 21, the damaged portion of the weak region 21 forms an opening structure. However, the portion between the starting end 211 and the ending end 212 can be a connecting structure, preventing the portion surrounded by the weak region 21 from detaching from the sealing pin 20, and preventing the impact on the external environment, such as injury to a person due to the impact, caused by the internal gas blowing off the partial structure of the sealing pin 20.

[0040] In one embodiment, 1 / 3 ≤ H2 / H1 ≤ 1 / 2, and assuming that the structural strength of the sealing pin 20 is guaranteed and the sealing effect is ensured, the amount of shell removed when processing the thin region 21 can be reduced, saving processing costs. Furthermore, since the thickness of the sealing pin 20 is thinner and more uniform than that of the housing 10, the accuracy of the remaining thickness of the sealing pin 20 after processing the thin region 21 is also high, which is advantageous for improving the pressure leakage effect. Optionally, H2 / H1 = 0.4.

[0041] In one embodiment, the material of the housing 10 is stainless steel, and while ensuring the structural strength of the housing 10, the thickness of the housing 10 can be reduced to decrease the influence of the housing 10's thickness on the energy density of the electrochemical apparatus 100. In one embodiment, 50 μm ≤ H1 ≤ 300 μm. The thickness range of the housing 10 can ensure that its structural strength meets the design requirements of the electrochemical apparatus 100, while minimizing the influence of its thickness on the energy density of the electrochemical apparatus 100. In one embodiment, 100 μm ≤ H1 ≤ 200 μm. Optionally, H1 = 150 μm.

[0042] In one embodiment, the material of the sealing pin 20 is stainless steel. While ensuring the structural strength of the sealing pin 20, the thickness of the sealing pin 20 can be reduced, thereby reducing the amount of shell removed when processing the weak region 21 and saving costs. Furthermore, the smaller thickness of the sealing pin 20 allows for increased thickness accuracy, further improving the accuracy of the residual thickness of the weak region 21 and enhancing the pressure relief accuracy of the electrochemical apparatus 100. In one embodiment, the thickness range is 10 μm ≤ H2 ≤ 60 μm. The thickness range of the sealing pin 20 not only ensures that its structural strength meets the design requirements of the electrochemical apparatus 100, but also reduces the amount of shell removed when processing the weak region 21, saving costs. In one embodiment, the thickness range is 20 μm ≤ H2 ≤ 40 μm. Optionally, H2 = 30 μm.

[0043] The housing 10 includes a top wall 11 and a housing 12. The housing 12 has an opening. The top wall 11 can connect to the housing 12 and close the opening of the housing 12. This forms a housing space 13 in which an electrode assembly 30 can be housed. In one embodiment, the top wall 11 and the housing 12 are connected by welding. In one embodiment, the material of the housing 12 is stainless steel, and while ensuring the structural strength of the housing 12, the thickness of the housing 12 can be reduced, and furthermore, the influence of the thickness of the housing 12 on the energy density of the electrochemical apparatus 100 can be reduced.

[0044] The housing 12 comprises a side wall 121 connecting the top wall 11 and the bottom wall 122, and the bottom wall 122. The top wall 11, the side wall 121, and the bottom wall 122 surround each other to form a housing space 13. In one embodiment, the side wall 121 and the bottom wall 122 are connected by welding. In one embodiment, the side wall 121 and the bottom wall 122 are integrally molded structures formed by pressing. In one embodiment, the top wall 11 and the bottom wall 122 are integral structures formed by pressing, and the side wall 121 and the bottom wall 122 are connected by welding.

[0045] In one embodiment, the through-hole 111 penetrates the top wall 11, and the sealing pin 20 is provided on the top wall 11. In another embodiment, the through-hole 111 penetrates the bottom wall 122, and the sealing pin 20 is provided on the bottom wall 122 (not shown). For illustrative purposes, the following explanation will further describe the case where the through-hole 111 penetrates the top wall 11 and the sealing pin 20 is provided on the top wall 11.

[0046] In the present invention, the thickness of the top wall 11 is H1. Optionally, the thickness of the side walls 121 and the bottom wall 122 is also H1.

[0047] In one embodiment, the sealing pin 20 includes a base plate 23 connected to the top wall 11. A thin region 21 is provided on the base plate 23, and the thickness H2 of the sealing pin 20 is the thickness of the base plate 23. In other embodiments, the sealing pin 20 includes other structures (not shown) provided on the base plate 23, such as rubber protrusions.

[0048] In one embodiment, the electrode assembly 30 includes a first electrode sheet, a second electrode sheet, and a separator (not shown). The separator is provided between the first electrode sheet and the second electrode sheet. The first electrode sheet, the separator, and the second electrode sheet are laminated or wound to form the electrode assembly 30. Optionally, the first electrode sheet, the separator, and the second electrode sheet are arranged to be laminated sequentially.

[0049] In one embodiment, one of the first electrode sheet and the second electrode sheet is a positive electrode sheet, and the other of the first electrode sheet and the second electrode sheet is a negative electrode sheet.

[0050] For illustrative purposes, the following will further describe an example in which the first electrode sheet, separator, and second electrode sheet are sequentially stacked and arranged.

[0051] In one embodiment, the electrode assembly 30 includes a plurality of first electrode sheets, separators, and second electrode sheets. The separators are provided between adjacent first electrode sheets and second electrode sheets.

[0052] In one embodiment, the electrochemical apparatus 100 further includes an electrode column (not shown) provided on the top wall 11. A portion of the electrode column is exposed on the top wall 11. At least one of a plurality of first electrode sheets is electrically connected to the housing 12. At least one of a plurality of second electrode sheets is electrically connected to the electrode column. The housing 12 and the electrode column constitute the positive and negative electrodes of the electrochemical apparatus 100, respectively. In one embodiment, the electrochemical apparatus 100 is a button cell.

[0053] In one embodiment, the electrochemical apparatus 100 further includes an insulating member (not shown). A portion of the pole column is located inside the housing 10. The insulating member provides an insulating connection between the pole column and the top wall 11, reducing the risk of short circuits in the electrochemical apparatus 100 caused by the pole column being electrically connected to the top wall 11.

[0054] In one embodiment, all first electrode sheets are electrically connected to the housing 12, and all second electrode sheets are electrically connected to the electrode poles.

[0055] In one embodiment, a second recess 112 is provided in the top wall 11, which is formed by a depression in the surface of the top wall 11, the through hole 111 penetrates the second recess 112, at least a portion of the sealing pin 20 is located within the second recess 112, and the sealing pin 20 is connected to the bottom wall of the second recess 112. The sealing pin 20 is partially housed in the second recess 112 and connected to the bottom wall of the second recess 112. This reduces the influence of the volume of the sealing pin 20 on the volume of the electrochemical apparatus 100 and reduces the influence of the sealing pin 20 on the energy density of the electrochemical apparatus 100. In one embodiment, the bottom plate 23 is located within the second recess 112.

[0056] In one embodiment, the second recess 112 is located on the side of the top wall 11 away from the accommodating space 13, and the sealing pin 20 is located outside the accommodating space 13. In another embodiment, the second recess 112 is located on the side of the top wall 11 closer to the accommodating space 13 (not shown), and a portion of the sealing pin 20 is located inside the accommodating space 13.

[0057] As shown in Figures 2, 3, and 4, in one embodiment, the bottom plate 23 is fixedly connected to the bottom wall of the second recess 112, and the portion where the bottom plate 23 and the bottom wall of the second recess 112 come into contact forms a closed-loop connection region 113. Along the thickness direction of the bottom plate 23, the projection of the connection region 113 surrounds the projection of the weak region 21, allowing the gas in the electrochemical apparatus 100 to act on the weak region 21 and penetrate through it. In one embodiment, along the thickness direction of the bottom plate 23, the projection of the weak region 21 is located within the projection of the through hole 111.

[0058] In one embodiment, the bottom plate 23 is fixed and connected to the bottom wall of the second recess 112 by welding, and the welded area between the bottom plate 23 and the bottom wall of the second recess 112 constitutes a connection area 113, which not only provides fixing and connection effects but also serves a sealing role, thereby reducing the risk of substances inside the housing 10 leaking out through the gap between the bottom plate 23 and the second recess 112.

[0059] In one embodiment, the depth of the second recess 112 is H4, H4 ≥ H2, and when the bottom plate 23 is connected to the bottom wall of the second recess 112, the entire bottom plate 23 is located within the second recess 112 and does not protrude from the second recess 112, thereby reducing the influence of the thickness of the bottom plate 23 on the volume and outer volume of the electrochemical apparatus 100 and increasing the energy density of the electrochemical apparatus 100. Optionally, H4 > H2.

[0060] In one embodiment, if the circumference of the bottom plate 23 is L1 and the length of the thinned region 21 is L2, then 0.25 ≤ L2 / L1 ≤ 1.4, and when the air pressure inside the electrochemical apparatus 100 increases, the thinned region 21 can be damaged before the other parts of the bottom plate 23, thereby achieving exhaust and pressure leakage. Here, the length L2 of the thinned region 21 is the total length from the starting end 211 to the ending end 212 of the thinned region 21.

[0061] In one embodiment, 0.35 ≤ L2 / L1 ≤ 0.8, which improves the accuracy of the pressure during pressure release in the electrochemical apparatus 100 and enhances safety control over atmospheric pressure within the electrochemical apparatus 100. Optionally, L2 / L1 = 0.5.

[0062] In one embodiment, if the thickness of the weak region 21 is H3, then 0.2 ≤ H3 / H2 ≤ 0.9. When the air pressure inside the electrochemical apparatus 100 increases, the weak region 21 can rupture before the rest of the bottom plate 23 to release the pressure, and the difficulty of processing the weak region 21 can be reduced, while the processing quality of the weak region 21 can be improved.

[0063] In one embodiment, 0.2 ≤ H3 / H2 ≤ 0.5, which lowers the pressure drop threshold of the electrochemical apparatus 100 and further improves the safety performance of the electrochemical apparatus 100. Optionally, the value of H3 / H2 is one of 0.2, 0.3, 0.4, and 0.5.

[0064] In one embodiment, the bottom plate 23 is provided with a first recess 22 formed by a depression in the surface of the bottom plate 23. The bottom wall of the first recess 22 constitutes a partial surface of the thin region 21. When viewed along the thickness direction of the bottom plate 23, the projection of the first recess 22 overlaps with the projection of the thin region 21. The first recess 22 reduces the thickness of a partial region of the bottom plate 23, thereby forming the thin region 21. When the air pressure inside the electrochemical apparatus 100 increases, the internal gas can break through the thin region 21 and be exhausted into the electrochemical apparatus 100, releasing the pressure and enhancing the safety of the electrochemical apparatus 100.

[0065] In one embodiment, if the width of the opening of the first recess 22 is W1 and the width of the bottom wall of the first recess 22 is W2, then W1 / W2 ≥ 1.1, and the cross-section of the first recess 22 exhibits a recessed structure in which the opening is larger than the bottom. When the gas inside the electrochemical apparatus 100 penetrates the thin region 21, the bottom wall of the first recess 22 is damaged, and the gas flows out from the bottom of the first recess 22 through the opening of the first recess 22. The structure in which the opening of the first recess 22 is larger than the bottom reduces resistance to the gas flow, reduces the risk of gas accumulating in the first recess 22, and allows the gas to be discharged quickly. Optionally, W1 / W2 = 1.5. Optionally, the cross-section of the first recess 22 is trapezoidal.

[0066] In one embodiment, W1 ≤ 60 μm ≤ W1 ≤ 200 μm. The width dimension range at the opening of the first recess 22 can reduce the amount of shell removed when machining the first recess 22, thereby saving costs. In one embodiment, W1 ≤ 100 μm ≤ W1 ≤ 160 μm. Optionally, W1 = 120 μm.

[0067] In one embodiment, W2≧0, which allows a thin region 21 of the sealing pin 20 to be formed at the bottom of the first recess 22 so that it can be punctured and subsequently evacuated when the air pressure inside the electrochemical apparatus 100 increases.

[0068] In one embodiment, the opening of the first recess 22 faces away from the storage space 13. In another embodiment, the opening of the first recess 22 faces the storage space 13 and communicates with the storage space 13 (not shown).

[0069] In one embodiment, the first recess 22 is formed by laser etching.

[0070] In one embodiment, the electrochemical apparatus 100 injects an electrolyte into the housing 10 through a through hole 111, and the bottom wall connected to the second recess of the sealing pin 20 is used to seal the through hole 111.

[0071] In one embodiment, the bottom plate 23 has a plate-like structure and its thickness is relatively uniform, while the housing 12 has a pressed structure and the thickness error of the housing 12 is larger. Compared to providing a thin region 21 in the housing 12, providing a thin region 21 in the bottom plate 23 improves the dimensional accuracy of the residual thickness of the thin region 21 after processing and further enhances the pressure leakage effect of the electrochemical apparatus 100.

[0072] As shown in Figure 5, in one embodiment, when viewed along the thickness direction of the base plate 23, the trajectory shape of the thinning region 21 is approximately arc-shaped, and the central angle of the thinning region 21 between the starting end 211 and the ending end 212 is R1, where R1 > 180°. Optionally, R1 = 270°.

[0073] As shown in Figure 6, in one embodiment, R1 = 180°.

[0074] As shown in Figure 7, in one embodiment, when viewed along the thickness direction of the bottom plate 23, the trajectory shape of the thin region 21 is approximately e-shaped, and by extending the length of the thin region 21, the pressure threshold when releasing pressure through the thin region 21 in the electrochemical apparatus 100 can be further reduced.

[0075] Tests were conducted to verify the pressure relief effect of the electrochemical apparatus 100 in this application, and the specific information is as follows.

[0076] [Example 1] The electrochemical apparatus 100 described in any one embodiment of the present application is adopted. The material of the top wall 11, the housing 12 and the sealing pin 20 is all 316L stainless steel, the thickness of the top wall 11 and the housing 12 is 150 μm, the thickness of the bottom plate 23 is 45 μm, the circumference of the sealing pin 20 is 2.1 * π mm, the circumference of the connection region 113 is 1.6 * π mm, the width of the opening of the first recess 22 is 110 μm, the depth of the first recess 22 is 24 ± 6 μm, the trajectory of the thinning region 21 is the shape shown in Figure 5, and the trajectory length of the thinning region 21 is 1.2 * π mm.

[0077] The test environment is as follows: The electrochemical apparatus 100 is placed in a heated chamber in a fully charged state, the internal ambient temperature of the heated chamber is 180°C to 200°C, and the standing time is 30 minutes.

[0078] Ten identical electrochemical apparatuses 100 are placed in the above test environment, and upon completion of the test, the condition of the ten electrochemical apparatuses 100 and the condition and number of damaged weak areas 21 are recorded. Due to the large amount of gas and heat generated inside the electrochemical apparatus 100 under high temperature conditions (180°C to 200°C), if the electrochemical apparatus 100 does not explode and cracks occur in the weak area 21, it indicates that the electrochemical apparatus 100 can complete exhaust and pressure leakage, and the test result is considered a pass. If the electrochemical apparatus 100 explodes or the weak area 21 is not completely damaged, it indicates that the electrochemical apparatus 100 cannot exhaust and complete pressure leakage through the weak area 21, and the test result is considered a fail.

[0079] [Example 2] The only difference in the test conditions and environment from Example 1 is the shape and length of the thinning region 21. In Example 2, the trajectory of the thinning region 21 has the shape shown in Figure 6, and its length is π / 2 mm.

[0080] [Example 3] The only difference in the test conditions and environment from Example 1 is the shape and length of the thinning region 21. In Example 3, the trajectory of the thinning region 21 has the shape shown in Figure 7, and its length is (1.2*π+1.2) mm.

[0081] During the tests in Examples 1, 2, and 3, the number of damaged weak regions 21 in each of the 10 electrochemical apparatuses 100 was recorded.

[0082] [Comparative Example] The only difference in the test conditions and environment compared to Example 1 is the shape and length of the thinning region 21. In the comparative example, the trajectory of the thinning region 21 is a straight line as shown in Figure 8, and its length is 1.2 mm.

[0083] When testing with comparative examples, the number of failures in the weak regions 21 in 10 sets of electrochemical apparatus 100 is recorded.

[0084] As shown in the following table, we compare the four sets of data described above.

[0085] [Table 1]

[0086] From the table above, it can be seen that in the three examples, all electrochemical apparatuses 100 succeeded in releasing air pressure through the thin region 21, but the electrochemical apparatus 100 in the comparative example does not employ the examples of the present application, and therefore the electrochemical apparatus 100 in the comparative example is hardly able to release air pressure through the thin region 21.

[0087] As described above, in the electrochemical apparatus 100 of the present invention, the sealing pin 20 is provided in the housing 10, the thickness of the sealing pin 20 is smaller than the thickness of the housing 10, the thin region 21 of the open loop is provided in the sealing pin 20, the thickness of the thin region 21 is smaller than the thickness of the sealing pin 20, and the ratio of the thickness of the sealing pin 20 to the thickness of the housing 10 is between 0.1 and 0.7. As a result, the electrochemical apparatus 100 can not only release pressure by puncturing the thin region 21 and exhausting it when the internal pressure increases, but also reduce the amount of shell removed when processing the thin region, thereby saving processing costs, provided that the same pressure release requirement is met.

[0088] As shown in Figure 9, embodiments of the present invention further provide an electrical equipment 200 including an electrochemical apparatus 100 described in any of the embodiments described above. The electrochemical apparatus 100 can supply electrical energy to the electrochemical apparatus 200.

[0089] In one embodiment, the electrical equipment 200 includes electronic devices such as drones, mobile phones, watches, tablets, and laptop computers.

[0090] In the aforementioned electrical equipment 200, the electrochemical apparatus 100 can release pressure by venting through the weak region 21 when the internal pressure increases, and can also reduce the amount of shell removed when processing the weak region 21. Furthermore, while ensuring the safety of the electrochemical apparatus 100, the cost of the electrochemical apparatus 100 can be reduced, the impact on the electrical equipment 200 due to excessively high internal pressure in the electrochemical apparatus 100 can be reduced, and the cost of the electrical equipment 200 can be reduced.

[0091] Furthermore, a person skilled in the art may modify the present invention within the spirit of the present application, but of course, any such modifications made in accordance with the spirit of the present application should fall within the scope disclosed herein. [Explanation of symbols]

[0092] 100 Electrochemical apparatus 10 Housing 11. Summit Wall 111 Through hole 112 Second recess 113 Connection Area 12 containment units 121 Side wall 122 Bottom wall 13 Containment Space 20 sealing pins 21 Weak region 211 Starting end 212 Terminal 22 First recess 23 Bottom plate 30 Electrode Assembly 200 Electrical equipment

Claims

1. An electrochemical apparatus including a housing and a sealing pin, The housing is provided with a through hole, which is an injection hole. The sealing pin is provided in the housing, and blocks and seals the through hole, and has a thin region. The thickness of the thin region is less than the thickness of the sealing pin, and the thin region includes a start end and an end end that are spaced apart from each other. If the thickness of the housing is H1 and the thickness of the sealing pin is H2, then 0.1 ≤ H2 / H1 ≤ 0.

7. An electrochemical apparatus characterized in that the portion of the sealing pin surrounded by the thin region is flat.

2. The housing includes a top wall, side walls, and a bottom wall. The side wall connects the top wall and the bottom wall, The electrochemical apparatus according to claim 1, characterized in that the through hole is provided in any of the top wall, the side wall, or the bottom wall.

3. The electrochemical apparatus according to claim 1, characterized in that 1 / 3 ≤ H2 / H1 ≤ 1 / 2.

4. The electrochemical apparatus according to claim 1, characterized in that, if the thickness of the thin region is H3, then 0.2 ≤ H3 / H2 ≤ 0.

9.

5. The electrochemical apparatus according to claim 4, characterized in that 0.2 ≤ H3 / H2 ≤ 0.

5.

6. The electrochemical apparatus according to claim 1, characterized in that, if the circumference of the sealing pin is L1 and the length of the thinning region is L2, then 0.25 ≤ L2 / L1 ≤ 1.4, and the length L2 of the thinning region is the total length from the starting end to the ending end of the thinning region.

7. The electrochemical apparatus according to claim 6, characterized in that 0.35 ≤ L2 / L1 ≤ 0.

8.

8. The sealing pin is provided with a first recess, The first recess is formed by recessing the surface of the sealing pin. The bottom wall of the first recess constitutes a partial surface of the thin region, The electrochemical apparatus according to claim 1, characterized in that, when viewed along the thickness direction of the sealing pin, the projection of the first recess overlaps with the projection of the thin region.

9. The electrochemical apparatus according to claim 8, characterized in that W1 is the width of the opening of the first recess and W2 is the width of the bottom wall of the first recess, and W1 / W2 ≥ 1.

1.

10. The housing is provided with a second recess, The second recess is formed by a depression in the surface of the housing, The aforementioned through hole penetrates the second recess, The electrochemical apparatus according to claim 1, characterized in that at least a portion of the sealing pin is housed in the second recess and connected to the bottom wall of the second recess.

11. The sealing pin is fixedly connected to the bottom wall of the second recess. The contact portion between the sealing pin and the bottom wall of the second recess forms a closed-loop connection region. The electrochemical apparatus according to claim 10, characterized in that, in the thickness direction of the sealing pin, the projection of the connection region surrounds the projection of the thin region.

12. The electrochemical apparatus according to claim 10, characterized in that, if the depth of the second recess is H4, then H4 ≥ H2.

13. The electrochemical apparatus according to claim 1, characterized in that 10 μm ≤ H2 ≤ 60 μm and 50 μm ≤ H1 ≤ 300 μm.

14. The electrochemical apparatus according to claim 9, characterized in that 60 μm ≤ W1 ≤ 200 μm and W2 ≥ 0.

15. An electrical equipment characterized by comprising an electrochemical apparatus as described in any one of claims 1 to 14.

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