Absorbents, compositions, absorbing films, solid-state image sensors, optical filters, and infrared sensors

Abstract

To provide an organic absorbent which offers superior compatibility or solubility with various solvents and resin components and superior heat resistance, and thus allows its optical properties to be stably maintained even when kept in a high temperature condition or high temperature / high humidity condition, and to provide an absorption membrane with desired optical properties using the absorbent.SOLUTION: An absorbent comprising a cation represented by formula below is provided, where A1 through A3 in the formula may independently represent an alkyl group, alkynyl group, alkenyl group, or alkoxy group.SELECTED DRAWING: Figure 4

Description

Technical Field

[0001] This specification discloses an absorbent and its uses.

Background Art

[0002] Absorbents, for example, absorbents capable of absorbing light in the infrared region, may be applied to various uses.

[0003] For example, in imaging devices using CCD (Charge-Coupled Device) or CMOS (complementary metal-oxide-semiconductor) image sensors, infrared sensors, etc., since they include silicon photodiodes having sensitivity to the near-infrared region, the absorbent may be used.

[0004] Although there are various ways to apply such absorbents, usually, a method using a coating liquid obtained by mixing an absorbent dissolved in a solvent and a resin component is applied.

[0005] Therefore, it is necessary for the absorbent to exhibit excellent solubility or compatibility with both the solvent and the resin component.

[0006] When the solubility or compatibility of the absorbent with the solvent or resin component decreases, desired spectral characteristics may not be obtained for the absorption film to which the absorbent is applied, or the light characteristics may deteriorate due to phenomena such as precipitation of the absorbent in the absorption film.

[0007] However, it is a difficult problem to ensure an absorbent that exhibits excellent solubility or compatibility with various types of solvents and resin components at the same time.

[0008] Absorbents can be classified into inorganic absorbents and organic absorbents. In the case of organic absorbents, they are easy to apply and it is also easy to control the wavelength of the absorbed light, so the transmittance of the desired light can be efficiently reduced.

[0009] However, organic absorbents are less heat-resistant than inorganic absorbents, so the optical properties of the absorber or the film containing the absorber may deteriorate after exposure to high-temperature or high-humidity conditions. [Overview of the Initiative] [Problems that the invention aims to solve]

[0010] This specification discloses absorbents and their applications. This specification aims to disclose organic absorbents that exhibit excellent compatibility or solubility with various solvents and resin components, have excellent heat resistance, and can stably maintain their optical properties even when held under high temperature or high temperature and high humidity conditions.

[0011] This specification also aims to disclose how the absorbent can be applied to ensure desired optical properties.

[0012] This specification further aims to disclose applications of absorbents. [Means for solving the problem]

[0013] Among the physical properties mentioned herein, those whose results are affected by the measurement temperature are those measured at room temperature unless otherwise specified.

[0014] The term "room temperature" refers to the natural temperature without heating or cooling, meaning, for example, any temperature within the range of 10°C to 30°C, or approximately 23°C or 25°C. Furthermore, unless otherwise specified, the unit of temperature in this specification is Celsius (°C).

[0015] Among the physical properties mentioned in this specification, those whose results are affected by the measurement pressure are based on measurements taken at normal pressure unless otherwise specified.

[0016] The term "atmospheric pressure" refers to the natural pressure that is not pressurized or depressurized, and typically means a pressure of approximately 740 mmHg to 780 mmHg, which is the level of atmospheric pressure.

[0017] Where humidity affects the results of any physical properties mentioned herein, unless otherwise specified, such physical properties are those measured at standard humidity conditions. Standard humidity conditions mean any humidity within the range of 40% to 60% relative humidity, for example, approximately 40% or 60% relative humidity.

[0018] Where an optical property (e.g., refractive index) referred to herein differs with wavelength, unless otherwise specified, the optical property is defined as a property for light with a wavelength of 520 nm.

[0019] In this specification, unless otherwise specified, the terms transmittance, reflectance, or absorptiveness refer to the actual transmittance (measured transmittance), actual reflectance (measured reflectance), or actual absorptiveness (measured absorptiveness) observed within a specific wavelength or a predetermined wavelength range.

[0020] In this specification, unless otherwise specified, the terms transmittance, reflectance, or absorptiveness refer to transmittance, reflectance, or absorptiveness with respect to an incident angle of 0 degrees.

[0021] In this specification, unless otherwise specified, the term "average transmittance" refers to the result obtained by measuring the transmittance at each wavelength while increasing the wavelength by 1 nm from the shortest wavelength within a given wavelength range, and then calculating the arithmetic mean of the measured transmittances. For example, the average transmittance in the wavelength range of 350 nm to 360 nm is the arithmetic mean of the transmittances measured at wavelengths of 350 nm, 351 nm, 352 nm, 353 nm, 354 nm, 355 nm, 356 nm, 357 nm, 358 nm, 359 nm, and 360 nm.

[0022] In this specification, the term "maximum transmittance" refers to the highest transmittance measured at each wavelength while increasing the wavelength by 1 nm from the shortest wavelength within a given wavelength range. For example, the maximum transmittance in the wavelength range of 350 nm to 360 nm is the highest transmittance among the transmittances measured at wavelengths of 350 nm, 351 nm, 352 nm, 353 nm, 354 nm, 355 nm, 356 nm, 357 nm, 358 nm, 359 nm, and 360 nm.

[0023] In this specification, unless otherwise specified, the term "average reflectance" refers to the result of calculating the arithmetic mean of the reflectances measured at each wavelength, starting from the shortest wavelength within a given wavelength range and increasing the wavelength by 1 nm increments. For example, the average reflectance in the wavelength range of 350 nm to 360 nm is the arithmetic mean of the reflectances measured at wavelengths of 350 nm, 351 nm, 352 nm, 353 nm, 354 nm, 355 nm, 356 nm, 357 nm, 358 nm, 359 nm, and 360 nm.

[0024] In this specification, the term "maximum reflectance" refers to the highest reflectance measured at each wavelength while increasing the wavelength by 1 nm from the shortest wavelength within a given wavelength range. For example, the maximum reflectance in the wavelength range of 350 nm to 360 nm is the highest reflectance among the reflectances measured at wavelengths of 350 nm, 351 nm, 352 nm, 353 nm, 354 nm, 355 nm, 356 nm, 357 nm, 358 nm, 359 nm, and 360 nm.

[0025] In this specification, unless otherwise specified, the term "average absorptivity" refers to the result of calculating the arithmetic mean of the measured absorptivity after measuring the absorptivity at each wavelength, starting from the shortest wavelength within a given wavelength range and increasing the wavelength by 1 nm increments. For example, the average absorptivity in the wavelength range of 350 nm to 360 nm is the arithmetic mean of the absorptivity measured at wavelengths of 350 nm, 351 nm, 352 nm, 353 nm, 354 nm, 355 nm, 356 nm, 357 nm, 358 nm, 359 nm, and 360 nm.

[0026] In this specification, the term "maximum absorptivity" refers to the highest absorptivity measured at each wavelength while increasing the wavelength by 1 nm from the shortest wavelength within a given wavelength range. For example, the maximum absorptivity in the wavelength range of 350 nm to 360 nm is the highest absorptivity among those measured at wavelengths of 350 nm, 351 nm, 352 nm, 353 nm, 354 nm, 355 nm, 356 nm, 357 nm, 358 nm, 359 nm, and 360 nm.

[0027] In this specification, the angle of incidence is the angle relative to the normal of the surface being evaluated. For example, the transmittance of an optical filter at an angle of incidence of 0 degrees means the transmittance for light incident in a direction substantially parallel to the normal of the surface of the optical filter. Also, for example, an angle of incidence of 40 degrees is the value for incident light that forms a substantially 40-degree angle with the normal in a clockwise or counterclockwise direction. This definition of the angle of incidence applies similarly to other properties such as transmittance.

[0028] In this specification, the term alkyl group means an alkyl group having 1 to 20 carbon atoms, 1 to 16 carbon atoms, 1 to 12 carbon atoms, 1 to 8 carbon atoms, or 1 to 4 carbon atoms. Such alkyl groups may be linear, branched, or cyclic. Such alkyl groups may optionally be substituted with at least one substituent. Such provisions apply to all alkyl groups referred to herein unless otherwise specified.

[0029] In this specification, the term "alkoxy group" means an alkoxy group having 1 to 20 carbon atoms, 1 to 16 carbon atoms, 1 to 12 carbon atoms, 1 to 8 carbon atoms, or 1 to 4 carbon atoms. The alkoxy group may be linear, branched, or cyclic. The alkoxy group may optionally be substituted with at least one substituent. Such provisions apply to all alkoxy groups referred to herein unless otherwise specified.

[0030] In this specification, the term "alkenyl group" means an alkenyl group having 2 to 20 carbon atoms, 2 to 16 carbon atoms, 2 to 12 carbon atoms, 2 to 8 carbon atoms, or 2 to 4 carbon atoms. The alkenyl group may be linear, branched, or cyclic. The alkenyl group may optionally be substituted with at least one substituent. Such provisions apply to all alkenyl groups referred to herein unless otherwise specified.

[0031] In this specification, the term "alkynyl group" means an alkynyl group having 2 to 20 carbon atoms, 2 to 16 carbon atoms, 2 to 12 carbon atoms, 2 to 8 carbon atoms, or 2 to 4 carbon atoms. The alkynyl group may be linear, branched, or cyclic. The alkynyl group may optionally be substituted with at least one substituent. Such provisions apply to all alkynyl groups referred to herein unless otherwise specified.

[0032] In this specification, the term "aryl group" means a monovalent residue derived from an aromatic hydrocarbon, and the aryl group may be an aryl group having 6 to 36 carbon atoms, 6 to 30 carbon atoms, 6 to 24 carbon atoms, 6 to 18 carbon atoms, or 6 to 12 carbon atoms, for example, a phenyl group, a tolyl group, a xylyl group, or a naphthyl group. The aryl group may also be optionally substituted with at least one substituent. This provision applies to all aryl groups referred to herein unless otherwise specified.

[0033] In this specification, the term "arylalkyl group" means an alkyl group substituted with at least one of the aforementioned aryl groups, where the specific types of alkyl group and aryl group are as described above. These provisions apply to all arylalkyl groups referred to herein unless otherwise specified.

[0034] In this specification, the term alkylidene group means a divalent functional group obtained by removing two hydrogen atoms from an alkane, wherein the hydrogen atoms are removed from one carbon atom of the alkane. Such alkylidene groups may have 1 to 20 carbon atoms, 1 to 16 carbon atoms, 1 to 12 carbon atoms, 1 to 8 carbon atoms, or 1 to 4 carbon atoms. The alkylidene group may be linear, branched, or cyclic. The alkylidene group may optionally be substituted with at least one substituent. This description applies to all alkylidene groups referred to herein unless otherwise specified.

[0035] In this specification, the term alkylene group means a divalent functional group obtained by removing two hydrogen atoms from an alkane, wherein the hydrogen atoms are removed one each from two different carbon atoms of the alkane. Such alkylene groups may have 2 to 20 carbon atoms, 2 to 16 carbon atoms, 2 to 12 carbon atoms, 2 to 8 carbon atoms, or 2 to 4 carbon atoms. The alkylene group may be linear, branched, or cyclic. The alkylene group may optionally be substituted with at least one substituent. This description applies to all alkylene groups referred to herein unless otherwise specified.

[0036] In this specification, the term "alkenylene group" may refer to an alkenylene group having 2 to 20 carbon atoms, 2 to 16 carbon atoms, 2 to 12 carbon atoms, 2 to 8 carbon atoms, or 2 to 4 carbon atoms. The alkenylene group may be linear, branched, or cyclic. The alkenylene group may optionally be substituted with at least one substituent. This applies to all alkenylene groups referred to herein unless otherwise specified.

[0037] In this specification, the term "alkynylene group" may refer to an alkynylene group having 2 to 20 carbon atoms, 2 to 16 carbon atoms, 2 to 12 carbon atoms, 2 to 8 carbon atoms, or 2 to 4 carbon atoms. The alkynylene group may be linear, branched, or cyclic. The alkynylene group may optionally be substituted with at least one substituent. This applies to all alkynylene groups referred to herein unless otherwise specified.

[0038] This specification discloses absorbers. In the terminology, an absorber means a compound capable of absorbing light within any wavelength range.

[0039] The absorbent may contain a cation represented by the following chemical formula 1, or a compound containing a cation that includes a moiety represented by the following chemical formula 1.

[0040] In Chemical Formula 1 below, the silyl group linked to the nitrogen atom enables the absorbent to exhibit excellent heat resistance and desired optical properties, and to show excellent compatibility with the resin component and / or the solvent.

[0041]

Chemical Formula

[0042] In Chemical Formula 1, A1 to A3 may each independently be hydrogen, halogen, an alkyl group, an alkenyl group, an alkynyl group, an alkoxy group, an aryl group or an arylalkyl group.

[0043] In Chemical Formula 1, L1 may be a divalent functional group represented by -U 1- T 1- U 2- T 2- U 3- In the divalent functional group, T1 and T2 may each independently be an oxygen atom or may not exist, and U1 to U3 may each independently be an alkylene group, an alkylidene group, an alkenylene group or an alkynylene group or may not exist. In the above, the fact that a certain symbol does not exist means that the atoms on both sides of the symbol are directly linked. For example, in the above, other elements other than T1 exist and T1 does not exist, and the divalent functional group is -U 1- U[[ID=3l]] 2- T 2- U 3- represented by.

[0044] In Chemical Formula 1, R1 and R2 form an absorption edge, and among R3 to R8, R3 to R6 or R5 to R8 may form an absorption edge.

[0045] In the above, the fact that an absorption edge is formed means that the absorbent has a structure that can exhibit the property of absorbing light of a desired wavelength as a whole due to the structure formed by the substituent or the structure formed at the position where the substituent exists.

[0046] The aforementioned absorption end will be described later.

[0047] In chemical formula 1, among R3 to R8, the other substituents that do not form the absorption edge may independently be hydrogen, halogen, hydroxyl group, cyano group, nitro group, carboxyl group, alkyl group, alkoxy group, aryl group, arylalkyl group, alkylcarbonylamino group, arylalkylcarbonylamino group, alkylsulfonylamino group, haloalkylsulfonylamino group, arylalkylsulfonylamino group, or amino group.

[0048] In Chemical Formula 1, the dotted line indicates either a single bond between nitrogen and carbon, or a double bond between nitrogen and carbon.

[0049] When the dotted line in Formula 1 represents a double bond between nitrogen and carbon, R2 is absent from R1 and R2, and R1 forms the absorption edge. Also, when the dotted line represents a double bond between nitrogen and carbon, the nitrogen atom in Formula 1 becomes the cation site.

[0050] The absorbent edge refers to a region that gives the absorbent a structure capable of absorbing light of a desired wavelength as a whole. For example, the absorbent edge may be a skeleton or structure having a so-called resonance structure and / or conjugated bond.

[0051] Light absorption by absorbers, particularly organic absorbers, is known to be due to the energy difference (ΔE) between the ground state and the excited state, and this difference can also be explained by the energy difference between the HOMO (Highest Occupied Molecular Orbital) and the LUMO (Lowest Unoccupied Molecular Orbital).

[0052] Generally, organic absorbers include resonance structures and / or conjugated bonds as absorption edges capable of exhibiting a light absorption effect, thereby connecting R1 and R2 (R1 when the dotted line in Chemical Formula 1 is a double bond) and R3-R6 or R5-R8 to a framework, or forming such a framework together, which allows the absorber as a whole to exhibit desired light absorption properties, including the resonance structures and / or conjugated bonds.

[0053] The specific type of the absorption edge or skeleton is not particularly limited. As is well known, the resonance effect refers to the interaction between lone pairs of electrons in a molecule and adjacent π-bonding pairs, and substituents or skeletons that cause such resonance effects are well known. Furthermore, a conjugated bond is a system in which two or more double bonds are sandwiched between a single bond, and it is known that as the number of such conjugated bonds increases, the energy difference decreases and the absorption band shifts to the longer wavelength side.

[0054] For example, the absorption edge may be a skeleton or structure that causes the compound of this application to exhibit an absorption maximum in the wavelength range of 600 nm to 950 nm. That is, the compound can exhibit an absorption maximum wavelength in the range of 600 nm to 950 nm. The lower limit of the absorption maximum wavelength may be approximately 600nm, 610nm, 620nm, 630nm, 640nm, 650nm, 660nm, 670nm, 680nm, 690nm, 700nm, 710nm, 720nm, 730nm, 740nm, 750nm, 760nm, 770nm, 780nm, 790nm, 800nm, or 810nm, and the upper limit may be approximately 950nm, 940nm, 930nm, 920nm, 910nm, 900nm, 890nm, 880nm, 870nm, 860nm, 850nm, 840nm, 830nm, 820nm, 810nm, 800nm, 790nm, 780nm, or 770nm. The absorption maximum wavelength may be within the range of any lower limit above or above any of the lower limits mentioned above, or within the range of any upper limit above or below any of the upper limits mentioned above, or it may be above or above any lower limit above or below any of the upper limits mentioned above.

[0055] As described above, resonance structures and conjugated bonds determine the energy difference (ΔE) between the ground state and the excited state of a compound, or the energy difference between the HOMO (Highest Occupied Molecular Orbital) and the LUMO (Lowest Unoccupied Molecular Orbital). Since the absorption maximum wavelength is determined by this energy difference, the structure of the absorption edge may be determined such that the compound has an absorption maximum wavelength within the range described above.

[0056] The alkyl, alkenyl, alkynyl, alkoxy, aryl, arylalkyl, alkylene, alkylidene, alkenyl, alkynyl, alkylcarbonylamino, arylalkylcarbonylamino, haloalkylsulfonylamino, arylalkylsulfonylamino, alkylsulfonylamino, and amino groups in Formula 1 may be optionally substituted with at least one substituent. Examples of substituents that may be substituted include, but are not limited to, halogens such as fluorine and chlorine, alkyl groups, alkenyl groups, alkynyl groups, alkoxy groups, aryl groups, arylalkyl groups, hydroxyl groups, cyano groups, nitro groups, carboxyl groups, alkylcarbonylamino, arylalkylcarbonylamino, arylalkylsulfonylamino, alkylsulfonylamino, or amino groups.

[0057] In Chemical Formula 1, A1 to A3 may, in appropriate examples, be independently an alkyl group, an alkynyl group, an alkenyl group, or an alkoxy group, or they may be an alkyl group, but are not limited thereto.

[0058] In chemical formula 1, -U 1- T 1- U 2- T 2- U 3- The divalent functional group represented by can satisfy any of the following conditions 1 to 3 in appropriate examples.

[0059] For example, the divalent functional group may be a functional group in which T1, T2, U1, and U3 are absent, and U2 is an alkylene group, alkylidene group, alkenylene group, or alkynylene group (Condition 1). In this case, the divalent functional group is -U 2- It is represented as follows.

[0060] In other examples, the divalent functional group may be a functional group in which U1 and U3 are absent, one of T1 and T2 is oxygen and the other is absent, and U2 is an alkylene group, alkylidene group, alkenylene group or alkynylene group (condition 2). In this case, the divalent functional group is -OU 2- or -U 2- This functional group is represented by O-.

[0061] In other examples, the divalent functional group may be a functional group in which U3 and T2 are absent, T1 is an oxygen atom, and U1 and U2 are independently an alkylene group, an alkylidene group, an alkenylene group, or an alkynylene group (condition 3). In this case, the functional group is -U 1- OU 2- This represents a functional group.

[0062] In chemical formula 1, the substituents R3 to R8 that do not form or are not connected to the absorption end may, in appropriate examples, be independently hydrogen, halogen, hydroxyl group, cyano group, nitro group, carboxyl group, alkyl group, alkoxy group, alkylsulfonylamino group or amino group, or hydrogen, alkyl group, alkylsulfonylamino group or amino group, but are not limited thereto.

[0063] The compound (absorbent) may have an appropriate level of molar weight. For example, the lower limit of the molar weight may be around 400 g / mol, 450 g / mol, 500 g / mol, 550 g / mol, 600 g / mol, 650 g / mol, 700 g / mol, or 750 g / mol. The upper limit of the molar weight may be around 2,000 g / mol, 1,900 g / mol, 1,800 g / mol, 1,700 g / mol, 1,600 g / mol, 1,500 g / mol, 1,400 g / mol, 1,300 g / mol, 1,200 g / mol, 1,100 g / mol, 1,000 g / mol, 950 g / mol, 900 g / mol, 850 g / mol, or 800 g / mol. The molar mass may be within the range of any lower limit above or above any of the lower limits mentioned above, or within the range of any upper limit above or below any of the upper limits mentioned above, or within the range of any lower limit above or below any of the lower limits mentioned above, while being within the range of any upper limit above or below any of the upper limits mentioned above.

[0064] The absorbent can have excellent heat resistance. For example, the 5% thermal decomposition temperature (hereinafter, "Td 5%") of the absorbent may be within a predetermined range. For example, the lower limit of Td 5% of the absorbent may be around 190°C, 200°C, 210°C, 220°C, or 230°C, and the upper limit may be around 400°C, 380°C, 360°C, 340°C, 320°C, 300°C, 280°C, 275°C, 270°C, 265°C, 260°C, 255°C, 240°C, 235°C, 230°C, 225°C, 220°C, or 215°C. The Td 5% may be within the range of being above or above any of the lower limits mentioned above, or below or below any of the upper limits mentioned above, or above or above any of the lower limits mentioned above, while being below or below any of the upper limits mentioned above.

[0065] The aforementioned Td 5% is a value obtained through TGA (Thermogravimetric analysis), with a temperature range of 25°C to 800°C, a heating rate of 10°C / min, and a length of 60cm². 3 This is the value (Td 5%) of the weight loss observed under conditions of a nitrogen (N2) atmosphere per minute.

[0066] In one example, the absorbent may be a compound represented by the following chemical formula 2.

[0067] [ka] 2

[0068] In the structure of chemical formula 2, the conjugated structure formed between nitrogen atoms may be the absorption edge skeleton formed by R1 and R2 in chemical formula 1.

[0069] In chemical formula 2, R9 and R 10 Each of these may independently be hydrogen, an alkyl group, or a substituent of the following chemical formula 3. In one example, R9 and R of chemical formula 2 10 At least one of them may be a substituent in the following formula 3, and R9 and R 10 These can all be substituents of the following chemical formula 3.

[0070] In chemical formula 2, R 11 ~R 13 R 11 and R 12 They either form an absorption edge together, or R 12 and R 13 These may together form the absorption edge.

[0071] In chemical formula 2, R 14 ~R 16 R 14 and R 15 They either form an absorption edge together, or R 15 and R 16 These may together form the absorption edge.

[0072] In chemical formula 2, R 11 ~R 16 The specific types of substituents that do not form an absorption edge are the same as those of substituents that do not form an absorption edge among R3 to R8 in Chemical Formula 1.

[0073] In equation 2, n is any number. The lower limit of n may be, for example, 0 or 1, and its upper limit may be 10, 9, 8, 7, 6, 5, 4, 3, 2, or 1. n may be within the range of being greater than or exceeding any of the lower limits mentioned above, or within the range of being less than or equal to any of the upper limits mentioned above, or greater than or exceeding any of the lower limits mentioned above, while being within the range of being less than or equal to any of the upper limits mentioned above.

[0074] [ka] 3

[0075] In formula 3, L1 is bonded to the nitrogen atom in formula 2. The specific type of L1 in formula 3 is the same as that of L1 in formula 1.

[0076] Furthermore, the specific types of A1 to A3 in Formula 3 are the same as A1 to A3 in Formula 1.

[0077] This specification further discloses absorbent compositions comprising the absorbent. The term "absorbent composition" means a mixture comprising an absorbent and other components, or a mixture comprising two or more absorbents.

[0078] Such an absorbent composition basically comprises the absorbent of formula 1 or 2, and may further contain other necessary components.

[0079] For example, the composition may further contain a resin component that functions as a binder. There are no particular restrictions on the type of resin component used in this case, and known resin components used to form absorbent films, such as near-infrared absorbent films, may be used. In this application, the absorbent component can exhibit appropriate compatibility or solubility with the various known resin components.

[0080] Examples of resin components include, but are not limited to, at least one of various organic resins or organic-inorganic hybrid resins, such as cyclic olefin (COP) resins, polyester resins, polyarylate resins, polysulfone resins, polyethersulfone resins, poly-p-phenylene resins, polyarylene etherphosphine oxide resins, polyimide resins, polyetherimide resins, polyamideimide resins, acrylic resins, polycarbonate resins, polyethylene naphthalate resins, or silicone resins.

[0081] While not particularly limited, the absorbent may be mixed with a silicone resin from among the known binder-functioning resin components to form an absorbent film exhibiting excellent performance. Therefore, in one example, the resin component may be a cyclic silicone resin.

[0082] When a resin component is applied, there are no particular restrictions on its proportion. For example, the resin component may be present in such a way that its weight ratio to 100 parts by weight of the resin component is in the range of 0.001 to 10 parts by weight. In other examples, the lower limit of the weight ratio of the absorbent to 100 parts by weight of the resin component may be approximately 0.001, 0.005, 0.01, 0.05, 0.1, 0.5, 1, 1.1, 1.2, 1.3, or 1.4 parts by weight, and the upper limit may be approximately 10, 9, 8, 7, 6, 5, 4, 3, 2, or 1.5 parts by weight. The proportion may be within the range of any lower limit among the lower limits mentioned above and any upper limit among the upper limits mentioned above.

[0083] For example, the absorbent composition may further include a solvent in which the absorbent and / or the resin component is dispersed. There are no particular restrictions on the type of solvent used in this case, and known solvents used to form absorbent films, such as near-infrared absorbent films, may be used. In this application, the absorbent component can exhibit appropriate compatibility or solubility with a variety of known solvents.

[0084] Examples of solvents include, but are not limited to, methylene chloride, cyclohexanone, toluene, methyl ethyl ketone, methyl isobutyl ketone, propylene glycol methyl ether acetate, diethylene glycol monoethyl ether 3-methoxybutanol, ethylene glycol monobutyl ether acetate, 4-hydroxy-4-methyl-2-pentanone, γ-butyrolactone, cyclohexanone, pyridone, chloroform, 1,4-dioxane, cyclohexanone, ortho-dichlorobenzene, chlorobenzene, aliphatic alcohols with 2 or more carbon atoms (e.g., isobutyl alcohol, isopropyl alcohol, ethanol, isopropanol, butanol, etc.), butyl acetate, tetrahydrofuran, or xylene.

[0085] If a solvent is used, there are no particular restrictions on its proportion, and the proportion may be adjusted within a range that allows for proper dispersion of the absorbent and / or resin components.

[0086] The absorbent composition may also contain other necessary components in addition to the components described above, such as an absorbent of a different type than the absorbent in Chemical Formula 1 or Chemical Formula 2.

[0087] This specification further discloses uses of the absorbent composition or the absorbent.

[0088] For example, the invention may relate to the absorbent composition or an absorbent film to which the absorbent is applied.

[0089] Such an absorbent film may contain at least a resin component and the absorbent.

[0090] In this case, the specific types of resin components and the ratio of the resin components to the absorbent are as described in the section on the absorbent composition.

[0091] The absorbing film may be a film capable of absorbing light within a predetermined wavelength range. For example, the absorbing film may be an infrared absorbing film or a near-infrared absorbing film. Such an absorbing film can exhibit absorption characteristics in at least a portion of the wavelength range, for example, within the range of approximately 600 nm to 950 nm.

[0092] For example, the absorption film can exhibit an absorption maximum wavelength in the range of 600 nm to 950 nm. In other examples, the lower limit of the absorption maximum wavelength may be approximately 600 nm, 610 nm, 620 nm, 630 nm, 640 nm, 650 nm, 660 nm, 670 nm, 680 nm, 690 nm, 700 nm, 710 nm, 720 nm, 730 nm, 740 nm, 750 nm, 760 nm, 770 nm, 780 nm, 790 nm, 800 nm, or 810 nm. Furthermore, the upper limit of the absorption maximum wavelength may be approximately 950nm, 940nm, 930nm, 920nm, 910nm, 900nm, 890nm, 880nm, 870nm, 860nm, 850nm, 840nm, 830nm, 820nm, 810nm, 800nm, 790nm, 780nm, 770nm, 760nm, 750nm, 740nm, 730nm, 720nm, 710nm, 700nm, 690nm, 680nm, 670nm, 660nm, 650nm, 640nm, 630nm, 620nm, or 610nm. The absorption maximum wavelength may also be within the range of any lower limit among the lower limits mentioned above and any upper limit among the upper limits mentioned above.

[0093] Due to these characteristics, the absorption film may have excellent optical properties, such as being able to prevent shift phenomena due to the angle of incidence when applied to various optical filters and infrared sensors, and may also have excellent physical properties such as heat resistance.

[0094] For example, the absolute value of ΔA in the following formula 1 may be within a predetermined range.

[0095] [Formula 1] ΔA = 100 × (A f -A i ) / A i

[0096] In Equation 1, A f This is the transmittance at the wavelength of absorption maximum of the absorption film held at 85°C and 85% relative humidity for 120 hours, and A iThis is the transmittance at the absorption maximum wavelength of the absorption film before it is held at 85°C and 85% relative humidity for 120 hours, and the absorption maximum wavelength is within the wavelength range of 600 nm to 950 nm.

[0097] In Equation 1, the upper limit of the absolute value of ΔA may be approximately 20%, 19%, 18%, 17%, 16%, 15%, 14%, 13%, 12%, 11%, 10%, 9%, 8%, 7%, 6%, 5%, or 4.5%, and its lower limit may be approximately 0%, 0.5%, 1%, 1.5%, 2%, 2.5%, 3%, 3.5%, 4%, 4.5%, 5%, 5.5%, 6%, 6.5%, or 7%. The absolute value of ΔA may be within the range of being less than or equal to any of the upper limits mentioned above, or greater than or equal to any of the lower limits mentioned above, while being within the range of being less than or equal to any of the upper limits mentioned above.

[0098] In the above formula 1, A f and A i The upper limits for each of these may be approximately 40%, 35%, 30%, 25%, 20%, 19%, 18%, 17%, 16%, 15%, 14%, 13%, 12%, 11%, 10%, 9%, 8%, or 7%, and the lower limits may be approximately 0%, 0.5%, 1%, 1.5%, 2%, 2.5%, 3%, 3.5%, 4%, 4.5%, 5%, 5.5%, 6%, 6.5%, 7%, 7.5%, or 8%. f and A i Each of these may be less than or equal to any of the upper limits mentioned above, or greater than or equal to any of the lower limits mentioned above, while still being less than or equal to any of the upper limits mentioned above.

[0099] The absorption film may have an absolute value of Δλ in the following equation 2 that is 10% or less.

[0100] [Formula 2] Δλ = 100 × (λ f -λ i ) / λ i

[0101] In equation 2, λ f λ is the absorption maximum wavelength of the absorption film held at 85°C and 85% relative humidity for 120 hours. i This is the maximum absorption wavelength of the absorption film before it is held at 85°C and 85% relative humidity for 120 hours, and this maximum absorption wavelength is within the wavelength range of 600 nm to 950 nm.

[0102] In Equation 2, the upper limit of the absolute value of Δλ may be approximately 10%, 9%, 8%, 7%, 6%, 5%, 4%, 3%, 2%, 1%, or 0.5% in other examples, and its lower limit may be approximately 0%, 0.5%, or 1%. The absolute value of Δλ may be within the range of being greater than or equal to any of the lower limits mentioned above and less than or equal to any of the upper limits mentioned above.

[0103] In the above equation 2, λ f and λ i Each of these may be within the range of 600 nm to 950 nm. f and λ i The lower limit of each of these may, in other examples, be 600nm, 610nm, 620nm, 630nm, 640nm, 650nm, 660nm, 670nm, 680nm, 690nm, 700nm, 710nm, 720nm, 730nm, 740nm, 750nm, 760nm, 770nm, 780nm, or 790nm. Also, the λ f and λ i The upper limits for each of these may be approximately 950nm, 940nm, 930nm, 920nm, 910nm, 900nm, 890nm, 880nm, 870nm, 860nm, 850nm, 840nm, 830nm, 820nm, 810nm, 800nm, 790nm, 780nm, 770nm, 760nm, 750nm, 740nm, 730nm, 720nm, 710nm, 700nm, 690nm, 680nm, 670nm, 660nm, 650nm, 640nm, 630nm, 620nm, or 610nm. f and λ iEach of these may be within the range of any lower limit among the aforementioned lower limits and any upper limit among the aforementioned upper limits.

[0104] Through the aforementioned absorption characteristics, the absorption film can be applied to various devices such as optical filters and infrared sensors, efficiently achieving desired characteristics.

[0105] The absorbent film may be formed by known methods, as long as the absorbent composition or absorbent is applied. For example, the absorbent composition may be coated in an appropriate manner, and a curing or drying process may be performed as necessary to form the absorbent film.

[0106] There are no particular limitations on the thickness of the absorption film, and the thickness may be adjusted considering the desired characteristics. For example, the absorption film may have a thickness in the range of about 0.5 μm to 20 μm.

[0107] This specification further discloses optical filters, which may include a substrate layer and the absorption film formed on one or both sides of the substrate layer.

[0108] Figure 1 shows an example of the optical filter in which the absorption film 200 is formed on one side of the substrate layer 100.

[0109] Such optical filters can exhibit superior performance by including the aforementioned absorption film. For example, the optical filter can efficiently and accurately block unwanted infrared light while providing a visible light transmission band with high transmittance.

[0110] There are no particular restrictions on the type of transparent substrate used in the optical filter; known transparent substrates for optical filters may be used.

[0111] In one example, the substrate layer may be a so-called infrared absorbing substrate. An infrared absorbing substrate is a substrate that exhibits absorption characteristics in at least a portion of the infrared region. So-called blue glass, which exhibits the above characteristics including copper, is a typical example of an infrared absorbing substrate. Such an infrared absorbing substrate is useful for constructing an optical filter that blocks light in the infrared region, but it is disadvantageous in terms of ensuring high transmittance in the visible light region due to its absorption characteristics, and also in terms of durability. In this application, by selecting an infrared absorbing substrate and combining it with a specific absorption film, it is possible to provide an optical filter that efficiently blocks desired light, exhibits high transmittance characteristics in the visible light region, and has excellent durability.

[0112] As the infrared absorbing substrate, a substrate exhibiting an average transmittance of 75% or more in the range of 425 nm to 560 nm may be used. In other examples, the average transmittance may be within the range of 77% or more, 79% or more, 81% or more, 83% or more, 85% or more, 87% or more, or 89% or more and / or within the range of 98% or less, 96% or less, 94% or less, 92% or less, or 90% or less.

[0113] As the infrared absorbing substrate, a substrate exhibiting a maximum transmittance of 80% or more in the range of 425 nm to 560 nm may be used. In other examples, the maximum transmittance may be in the range of 82% or more, 84% or more, 86% or more, 88% or more, or 90% or more and / or in the range of 100% or less, 98% or less, 96% or less, 94% or less, 92% or less, or 90% or less.

[0114] As the infrared absorbing substrate, a substrate exhibiting an average transmittance of 75% or more in the range of 350 nm to 390 nm may be used. In other examples, the average transmittance may be in the range of 77% or more, 79% or more, 81% or more, or 83% or more, and / or in the range of 98% or less, 96% or less, 94% or less, 92% or less, 90% or less, 88% or less, 86% or less, or 84% or less.

[0115] As the infrared absorbing substrate, a substrate exhibiting a maximum transmittance of 80% or more in the range of 350 nm to 390 nm may be used. In other examples, the maximum transmittance may be in the range of 82% or more, 84% or more, 86% or more, or 87% or more, and / or in the range of 100% or less, 98% or less, 96% or less, 94% or less, 92% or less, 90% or less, or 88% or less.

[0116] As the infrared absorbing substrate, a substrate having a transmittance of 10% to 45% at a wavelength of 700 nm may be used. In other examples, the transmittance may be approximately 43% or less, 41% or less, 39% or less, 37% or less, 35% or less, 33% or less, 31% or less, or 29% or less, or approximately 12% or more, 14% or more, 16% or more, 18% or more, 20% or more, 22% or more, 24% or more, 26% or more, or 28% or more.

[0117] As the infrared absorbing substrate, a substrate exhibiting an average transmittance in the range of 5% to 30% within the range of 700nm to 800nm ​​may be used. In other examples, the average transmittance may be within the range of 7% or more, 9% or more, 11% or more, 13% or more, 15% or more, 15.5% or more, 16% or more or 16.5% or more and / or within the range of 28% or less, 26% or less, 24% or less, 22% or less, 20% or less, 18% or less or 17% or less.

[0118] As the infrared absorbing substrate, a substrate exhibiting a maximum transmittance of 10% to 45% in the range of 700nm to 800nm ​​may be used. In other examples, the maximum transmittance may be within the range of 12% or more, 14% or more, 16% or more, 18% or more, 20% or more, 22% or more, 24% or more, 26% or more or 28% or more and / or within the range of 43% or less, 41% or less, 39% or less, 37% or less, 35% or less, 33% or less, 31% or less or 29% or less.

[0119] As the infrared absorbing substrate, a substrate exhibiting an average transmittance in the range of 3% to 20% within the range of 800 nm to 1000 nm may be used. In other examples, the average transmittance may be further adjusted within the range of 5% or more, 7% or more, 9% or more, or 11% or more and / or within the range of 18% or less, 16% or less, 14% or less, or 12% or less.

[0120] As the infrared absorbing substrate, a substrate exhibiting a maximum transmittance in the range of 5% to 30% within the range of 800nm ​​to 1000nm may be used. In other examples, the maximum transmittance may be in the range of 7% or more, 9% or more, 11% or more, 13% or more, or 15% or more, and / or in the range of 28% or less, 26% or less, 24% or less, 22% or less, 20% or less, 18% or less, or 16% or less.

[0121] As the infrared absorbing substrate, a substrate exhibiting an average transmittance in the range of 10% to 50% within the range of 1000 nm to 1200 nm may be used. In other examples, the average transmittance may be further adjusted within the range of 12% or more, 14% or more, 16% or more, 18% or more, 20% or more, 22% or more, 24% or more, or 25% or more and / or within the range of 48% or less, 46% or less, 44% or less, 42% or less, 40% or less, 38% or less, 36% or less, 34% or less, 32% or less, 30% or less, 28% or less, or 26% or less.

[0122] The infrared absorbing substrate may have a transmission band that exhibits a maximum transmittance in the range of 10% to 70% within the range of 1000 nm to 1200 nm. In other examples, the maximum transmittance may be within the range of 12% or more, 14% or more, 16% or more, 18% or more, 20% or more, 22% or more, 24% or more, 26% or more, 28% or more, 30% or more, 32% or more, 34% or more, or 36% or more and / or within the range of 68% or less, 66% or less, 64% or less, 62% or less, 60% or less, 58% or less, 56% or less, 54% or less, 52% or less, 50% or less, 48% or less, 46% or less, 44% or less, 42% or less, 40% or less, 38% or less, or 37% or less.

[0123] The infrared absorbing substrate may be combined with the absorbing film to form a desired optical filter.

[0124] As such a substrate, a substrate known as infrared absorbing glass may be used. Such glass is an absorbing glass manufactured by adding CuO or the like to phosphate fluoride glass or phosphate glass. Therefore, in one example, in this application, a CuO-containing phosphate fluoride glass substrate or a CuO-containing phosphate glass substrate may be used as the infrared absorbing substrate. The phosphate glass also includes K-phosphate glass in which part of the glass skeleton consists of SiO2. Such absorbing glasses are publicly known, and for example, the glass disclosed in Korean Patent Registration No. 10-2056613 or other commercially available absorbing glasses (for example, commercially available products from Hoya, Short, PTOT, etc.) may be used.

[0125] Such infrared absorbing substrates contain copper. In this application, substrates having a copper content in the range of 1% to 7% by weight may be used. In other examples, the copper content may be approximately 1.5% or more by weight, 2% or more by weight, 2.5% or more by weight, 2.6% or more by weight, 2.7% or more by weight, or 2.8% or more by weight, and may be approximately 6.5% or less by weight, 6% or less by weight, 5.5% or less by weight, 5% or less by weight, 4.5% or less by weight, 4% or less by weight, 3.5% or less by weight, 3% or less by weight, or 2.9% or less by weight. Substrates having such a copper content tend to exhibit the optical properties described above and can be combined with the absorption film to form an optical filter with desired properties.

[0126] The copper content can be confirmed using an X-ray fluorescence spectrometer (WD XRF, Wavelength Dispersive X-Ray Fluorescence Spectrometry). When a specimen (substrate layer) is irradiated with X-rays using the apparatus, characteristic secondary X-rays are generated from the individual elements of the specimen, and the apparatus detects these secondary X-rays according to the wavelength of each element. The intensity of the secondary X-rays is proportional to the elemental content, and therefore, quantitative analysis may be performed through the intensity of the secondary X-rays measured according to the wavelength of each element.

[0127] The thickness of the infrared absorbing substrate may be adjusted, for example, within a range of approximately 0.03 mm to 5 mm, but is not limited thereto.

[0128] The optical filter may further include other known components necessary for the substrate layer and the absorption film.

[0129] For example, the optical filter may further include a dielectric film. The dielectric film may further include, for example, a so-called dielectric film on one or both sides of the substrate layer.

[0130] Figures 2 and 3 illustrate an example of an optical filter with a dielectric film 300 added, showing the case where the dielectric film 300 is formed on one or both sides of a laminated structure including a substrate layer 100 and an absorption film 200.

[0131] Such dielectric films are constructed by repeatedly stacking a low refractive index dielectric material and a high refractive index dielectric material, and are used to form so-called IR reflective layers and AR (Anti-reflection) layers. In this application, such known dielectric films for forming IR reflective layers and AR layers may also be applied.

[0132] Therefore, the dielectric film may be a multilayer structure comprising at least two sublayers, each with a different refractive index, or it may include a multilayer structure in which the two sublayers are repeatedly stacked.

[0133] The type of material used to form the dielectric film, i.e., the material used to form each of the sublayers, is not particularly limited, and known materials may be used. Typically, SiO2 or fluorides such as Na5Al3Fl4, Na3AlF6, or MgF2 are used to produce low-refractive-index sublayers, and amorphous silicon, TiO2, Ta2O5, Nb2O5, ZnS, or ZnSe may be used to produce high-refractive-index sublayers, but the materials used in this application are not limited to those mentioned above.

[0134] The method for forming the dielectric film described above is not particularly limited, and for example, it may be formed by applying a known deposition method. In the industry, there is a known method for controlling the reflection or transmission characteristics of the dielectric film by taking into account the deposition thickness and number of sublayers, and in this application, the dielectric film may be formed by such a known method.

[0135] In one example, the dielectric film included in the optical filter may have a minimum wavelength of 710 nm or greater that exhibits a 50% reflectance within the wavelength range of 600 nm to 900 nm, or the minimum wavelength may not exist. If the minimum wavelength does not exist, the maximum reflectance of the dielectric film in the wavelength range of 600 nm to 900 nm is less than 50%. If such a wavelength exists, the minimum wavelength exhibiting a 50% reflectance may, in other examples, be 715 nm or greater, 720 nm or greater, 725 nm or greater, 730 nm or greater, 735 nm or greater, 740 nm or greater, 745 nm or greater, 750 nm or greater, or 754 nm or greater, or it may be approximately 900 nm or less, 850 nm or less, 800 nm or less, 790 nm or less, 780 nm or less, 770 nm or less, or 760 nm or less. The minimum wavelength exhibiting a 50% reflectance may be within the range of any of the lower and upper limits mentioned above, in which case the upper limit may be 900 nm.

[0136] As described above, controlling the reflective properties of the dielectric film can prevent the so-called petal flare phenomenon. The petal flare phenomenon refers to the phenomenon in which red lines or other patterns that were not visible to the naked eye appear in photographs of light-emitting objects, and these red lines often take on a shape resembling flower petals relative to the light-emitting object, hence the name petal flare. The frequency of petal flare occurrences has increased due to the increased sensitivity of sensors included in imaging devices and the increased transmittance of optical filters, etc., in order to obtain clearer photographs.

[0137] One possible cause of the petal flare phenomenon is the repeated reflection of near-infrared light within an imaging device equipped with an optical filter. Typically, the dielectric film formed on an optical filter, particularly the so-called IR film, is formed to block near-infrared light by reflection. Therefore, the shortest wavelength at which this dielectric film exhibits a 50% reflectivity is close to the visible light spectrum, which is usually less than 710 nm. However, such a dielectric film accelerates the reflection of near-infrared light within the imaging device, resulting in the petal flare phenomenon.

[0138] However, in this application, even when the shortest wavelength at which the dielectric film exhibits a reflectivity of 50% is adjusted to 710 nm or higher through the application of the absorption film, infrared light can be effectively blocked, and the petal flare phenomenon can also be prevented. The design method for adjusting the reflective properties of the dielectric film is known.

[0139] The optical filter may further include an absorption film that exhibits absorption characteristics for ultraviolet light (hereinafter referred to as an ultraviolet absorption film), which is distinct from the absorption film. However, such an absorption film is not an essential component, and for example, an ultraviolet absorber described later may be introduced into a single absorption film together with the absorber in formula 1.

[0140] In one example, the ultraviolet absorbing film may be designed to exhibit an absorption maximum in the wavelength range of approximately 300 nm to 390 nm.

[0141] The aforementioned ultraviolet absorbing film may contain only an ultraviolet absorber, or may contain two or more ultraviolet absorbers as needed.

[0142] For example, as the UV absorber, a known absorber that exhibits an absorption maximum in the wavelength range of approximately 300 nm to 390 nm may be used. Examples include Exiton's ABS 407; QCR Solutions Corp's UV381A, UV381B, UV382A, UV386A, VIS404A; and HWSands' ADA1225, ADA3209, ADA3216, ADA3217, ADA3218, ADA3230, ADA5205, ADA3217, ADA2055, ADA6798, ADA3102, ADA3204, ADA3210, ADA2041, ADA3201, ADA3202, ADA3215, ADA3219, ADA3225, A Examples include DA3232, ADA4160, ADA5278, ADA5762, ADA6826, ADA7226, ADA4634, ADA3213, ADA3227, ADA5922, ADA5950, ADA6752, ADA7130, ADA8212, ADA2984, ADA2999, ADA3220, ADA3228, ADA3235, ADA3240, ADA3211, ADA3221, ADA5220, ADA7158; and CRYSTALYN's DLS 381B, DLS 381C, DLS 382A, DLS 386A, DLS 404A, DLS 405A, DLS 405C, DLS 403A, etc., but are not limited to these.

[0143] The materials and construction methods for such an ultraviolet absorbing film are not particularly limited, and known materials and construction methods may be applied.

[0144] Typically, an ultraviolet absorbing film is formed using a material that combines an ultraviolet absorber, which allows it to exhibit a desired absorption maximum, with a transparent resin. In this case, the transparent resin may be a resin component that is applied to the absorber composition.

[0145] In addition to the layers mentioned above, various other necessary layers may be added to the optical filter, as long as they do not impair the desired effect.

[0146] This specification further discloses an imaging device including the optical filter. In this case, the configuration of the imaging device and the method of applying the optical filter are not particularly limited, and known configurations and application methods may be applied.

[0147] Furthermore, the use of the optical filter is not limited to the imaging device, but may be applied to various other applications requiring near-infrared filtering (for example, display devices such as PDPs).

[0148] This specification further discloses an infrared sensor including the absorbing film. The configuration of the infrared sensor is not particularly limited as long as it includes the absorbing film, and may be configured, for example, by introducing the absorbing film of this application into a known motion sensor, proximity sensor, or gesture sensor.

[0149] The uses of the absorbent composition or absorbent film are not limited to the optical filter, infrared sensor and / or imaging device, but may be applied to various other applications requiring infrared filtering (e.g., display devices such as PDPs). [Effects of the Invention]

[0150] This specification discloses absorbents and their applications. The absorbents, as organic absorbents, exhibit excellent compatibility or solubility with various solvents and resin components, have excellent heat resistance, and can stably maintain their optical properties even when held under high-temperature or high-temperature / high-humidity conditions. By applying the absorbents, it is possible to provide absorption films that ensure desired optical properties. This specification further discloses applications of the absorbents or absorption films. [Brief explanation of the drawing]

[0151] [Figure 1] This figure shows an exemplary configuration of an optical filter disclosed herein. [Figure 2] This figure shows an exemplary configuration of an optical filter disclosed herein. [Figure 3]This figure shows an exemplary configuration of an optical filter disclosed herein. [Figure 4] This figure shows the absorbance characteristics of the absorption film containing the absorbent of Example 1 before and after high-temperature and high-humidity evaluation. [Figure 5] This figure shows the absorbance characteristics of the absorption film containing the absorbent of Example 2 before and after high-temperature and high-humidity evaluation. [Figure 6] This figure shows the absorbance characteristics of the absorption film containing the absorbent of Example 3 before and after high-temperature and high-humidity evaluation. [Figure 7] This figure shows the absorbance characteristics of the absorption film containing the absorbent of Comparative Example 1 before and after high-temperature and high-humidity evaluation. [Figure 8] This figure shows the absorbance characteristics of the absorption film containing the absorbent of Comparative Example 2 before and after high-temperature and high-humidity evaluation. [Figure 9] This figure shows the absorbance characteristics of the absorption film containing the absorbent of Comparative Example 3 before and after high-temperature and high-humidity evaluation. [Modes for carrying out the invention]

[0152] The absorbent and the like will be described in detail below through examples, but the range of the absorbent and the like is not limited by the examples below.

[0153] 1. Method for measuring absorption maximum Absorption maxima were evaluated using a standard method. Specifically, the sample was dissolved in chloroform solvent for approximately 10 minutes. -5 After dissolving at concentration M, the sample was evaluated using a measuring device (Agilent, Varian Cary 4000).

[0154] 2. Evaluation of the transmittance spectrum The transmittance spectrum was measured using a spectrophotometer (manufacturer: Perkin Elmer, product name: Lambda 750 spectrophotometer) on specimens obtained by cutting the object to be measured (e.g., an absorption film) so that the width and height were 10 mm and 10 mm respectively. The transmittance spectrum was measured at each wavelength according to the manual of the instrument. The specimen was placed on a straight line between the measurement beam and the detector of the spectrophotometer, and the transmittance spectrum was confirmed with the incident angle of the measurement beam set to 0 degrees. An incident angle of 0 degrees is a direction substantially parallel to the normal direction of the surface of the specimen. In the transmittance spectrum, the average transmittance within a given wavelength range is the result of calculating the arithmetic mean of the measured transmittances after measuring the transmittance at each wavelength while increasing the wavelength by 1 nm from the shortest wavelength in the wavelength range. The maximum transmittance is the highest transmittance among the transmittances measured while increasing the wavelength by 1 nm, and the minimum transmittance is the lowest transmittance among the transmittances measured while increasing the wavelength by 1 nm. For example, the average transmittance in the wavelength range of 350nm to 360nm is the arithmetic mean of the transmittances measured at wavelengths of 350nm, 351nm, 352nm, 353nm, 354nm, 355nm, 356nm, 357nm, 358nm, 359nm, and 360nm, and the maximum transmittance in the wavelength range of 350nm to 360nm is the maximum transmittance at 350nm, 351nm, 352nm, 353nm, 354nm, and 355nm. The highest transmittance among those measured at wavelengths of 350nm, 356nm, 357nm, 358nm, 359nm, and 360nm is the lowest transmittance among those measured at wavelengths of 350nm, 351nm, 352nm, 353nm, 354nm, 355nm, 356nm, 357nm, 358nm, 359nm, and 360nm.

[0155] 3. Solubility measurement method The solubility of the absorbent was evaluated. Solubility was assessed by evaluating the solubility of the absorbent in the solvent (MC, Methylene Chloride) at room temperature (approximately 25°C) and judged according to the following criteria. <Solubility criteria> A: When the solubility is 1% by mass or more B: When the solubility is 0.5% by mass or more and less than 1% by mass. C: When the solubility is 0.2% by mass or more and less than 0.5% by mass. D: When the solubility is less than 0.2% by mass

[0156] 4.Thermal decomposition temperature (Td 5%) analysis Thermogravimetric analysis (TGA) was performed using a Scinco TGA N-1000 instrument. Approximately 3 mg of the sample (absorbent) was used for the analysis, with a temperature range of 25°C to 800°C, a heating rate of 10°C / min, and a 60cm² temperature range. 3 The analysis was performed under a nitrogen (N2) atmosphere at a rate of [number] minutes. The Td decomposition temperature used was the value at a weight loss of 5% (Td 5%).

[0157] 5.Mass analysis (LC-Mass) Mass analysis of the synthesized compounds was performed using a liquid chromatograph / mass spectrometer (Thermo Fisher Scientific).

[0158] Example 1. An ionic compound (A1) containing the cation of formula A below and the anion of formula B below was synthesized by the following reaction formula 1.

[0159] [ka] Chemical A

[0160] [ka] B

[0161] [ka] Reaction Equation 1

[0162] 1.1 g (1.62 mmol) of compound A from reaction formula 1 and 0.56 g (1.94 mmol) of lithium bis(trifluoromethanesulfonyl)imide were dissolved in 30 mL of dichloromethane, and 30 mL of water was added. The mixture was then reacted at room temperature (approximately 25°C) for about 2 hours. After the reaction, the dichloromethane layer and the aqueous layer were separated using an extractor, concentrated, and 100 mL of ethanol was added. The mixture was then filtered under reduced pressure to obtain the target compound (ionic compound A1) (0.4 g, 29.7%) (LC-MS(+) m / z 553.8, LC-MS(-) m / z 279.9).

[0163] Example 2. The ionic compound (A2) containing the cation of formula C below and the anion of formula B below was synthesized by the following reaction formula 2.

[0164] [ka] cation C

[0165] [ka] B

[0166] [ka] Reaction Equation 2

[0167] 1.0 g (1.28 mmol) of compound B from reaction formula 2 and 0.56 g (1.94 mmol) of lithium bis(trifluoromethanesulfonyl)imide were dissolved in 30 mL of dichloromethane, and 30 mL of water was added. The mixture was then reacted at room temperature (approximately 25°C) for about 2 hours. After the reaction, the dichloromethane layer and the aqueous layer were separated using an extractor, concentrated, and 100 mL of ethanol was added. The mixture was then filtered under reduced pressure to obtain the target compound (ionic compound A2) (0.5 g, 41.8%) (LC-MS(+) m / z 653.8, LC-MS(-) m / z 280.1).

[0168] Example 3. The ionic compound (A3) containing the cation of formula D below and the anion of formula B below was synthesized by the following reaction formula 3.

[0169] [ka] D

[0170] [ka] B

[0171] [ka] Reaction Equation 3

[0172] Compound C (1.48 mmol) from reaction formula 3 and lithium bis(trifluoromethanesulfonyl)imide (0.56 g, 1.94 mmol) were dissolved in 30 mL of dichloromethane, and 30 mL of water was added. The mixture was then reacted at room temperature (approximately 25°C) for about 2 hours. After the reaction, the dichloromethane layer and the aqueous layer were separated using an extractor, concentrated, and 100 mL of ethanol was added. The mixture was then filtered under reduced pressure to obtain the target compound (ionic compound A3) (0.3 g, 22.6%) (LC-MS(+) m / z 614.1, LC-MS(-) m / z 280.1).

[0173] Comparative Example 1. The ionic compound (A4) containing the cation of formula E below and the anion of formula B below was synthesized by the following reaction formula 4.

[0174] [ka] Chemical E

[0175] [ka] B

[0176] [ka] Reaction Equation 4

[0177] Compound D2.1g (3.38 mmol) of reaction formula 3 and lithium bis(trifluoromethanesulfonyl)imide 0.56g (1.94 mmol) were dissolved in 30 mL of dichloromethane, and 30 mL of water was added. The mixture was then reacted at room temperature (approximately 25°C) for about 2 hours. After the reaction, the dichloromethane layer and the aqueous layer were separated using an extractor, concentrated, and 100 mL of ethanol was added. The mixture was then filtered under reduced pressure to obtain the target compound (ionic compound A4) (1.1g, 42.0%) (LC-MS(+)m / z 493.4, LC-MS(-)m / z 280.0).

[0178] Comparative Example 2. The ionic compound (A2) containing the cation of formula F below and the anion of formula B below was synthesized by the following reaction formula 5.

[0179] [ka] F [ka] B

[0180] [ka] Reaction Equation 5

[0181] Compound E (3.47 mmol) from reaction formula 5 and lithium bis(trifluoromethanesulfonyl)imide (1.94 mmol) were dissolved in 30 mL of dichloromethane, and 30 mL of water was added. The mixture was then reacted at room temperature (approximately 25°C) for about 2 hours. After the reaction, the dichloromethane layer and the aqueous layer were separated using an extractor, concentrated, and 100 mL of ethanol was added. The mixture was then filtered under reduced pressure to obtain the target compound (ionic compound A5) (1.5 g, 49.5%) (LC-MS(+) m / z 593.5, LC-MS(-) m / z 280.0).

[0182] Comparative Example 3. The ionic compound (A6) containing the cation of formula F below and the anion of formula B below was synthesized by the following reaction formula 6.

[0183] [ka] F

[0184] [ka] B

[0185] [ka] Reaction Equation 6

[0186] Compound F (1.8 g, 2.64 mmol) from reaction formula 6 and lithium bis(trifluoromethanesulfonyl)imide (0.56 g, 1.94 mmol) were dissolved in 30 mL of dichloromethane, and 30 mL of water was added. The mixture was then reacted at room temperature (approximately 25°C) for about 2 hours. After the reaction, the dichloromethane layer and the aqueous layer were separated using an extractor, concentrated, and 100 mL of ethanol was added. The mixture was then filtered under reduced pressure to obtain the target compound (ionic compound A6) (0.9 g, 40.8%) (LC-MS(+) m / z 553.7, LC-MS(-) m / z 280.1).

[0187] Table 1 below summarizes the characteristics of the absorbents in Examples 1-3 and Comparative Examples 1-6. In Table 1 below, Td 5% means the 5% thermal decomposition temperature.

[0188] [Table 1]

[0189] Test Example 1. A coating solution was prepared by mixing a silicone resin (Dow Chemical, RSN-0217) as the resin component, an absorbent, and a solvent (Cyclohexanone). The mixing ratio of the resin component, absorbent, and solvent was 69.3:0.99:29.7 by weight (resin:absorbent:solvent).

[0190] The aforementioned coating solution was coated onto a transparent substrate (a glass substrate made by SCHOTT), and held at 140°C for about 2 hours to form an absorption film with a thickness of approximately 6 μm.

[0191] In the above, the absorbent used was the absorbent of Example 1, 2, 3, Comparative Example 1, 2, or 3.

[0192] Tables 2 and 3 below summarize the transmittance of the absorption film before and after reliability evaluation in the ultraviolet and near-infrared regions. The reliability evaluation involved holding the absorption film at 85°C and 85% relative humidity for 120 hours. In Table 2 below, B represents the result before the reliability evaluation, and A represents the result after the reliability evaluation. Also, in Table 2 below, λmax represents the transmittance at the absorption maximum.

[0193] In Tables 2 and 3 below, Δ represents the percentage change (%) of each characteristic before and after the reliability evaluation, calculated as 100 × (AB) / B, where A is the numerical value represented by A in Table 2 below, and B is the numerical value represented by B in Table 2 below. max This is the highest transmittance within the relevant wavelength range, T ave This is the average transmittance within the relevant wavelength range, Tmin This represents the minimum transmittance within the corresponding wavelength range.

[0194] [Table 2]

[0195] [Table 3]

[0196] Test example 2. Figures 4-6 show the absorption spectra of absorption films produced in Test Example 1 using the absorbents of Examples 1-3, respectively, while Figures 7-9 show the absorption spectra of absorption films produced in Test Example 1 using the absorbents of Comparative Examples 1-3, respectively. In the figures, the graphs shown as "before reliability" represent the results immediately after the absorption film was produced, and the graphs shown as "after reliability" represent the results after high-temperature and high-humidity evaluation of the absorption film. The high-temperature and high-humidity evaluation involves holding the absorption film at a temperature of 85°C and a relative humidity of 85% for 120 hours.

[0197] From the drawings, it can be seen that the absorption films using the absorbents of Examples 1 to 3 maintain almost the same absorption characteristics before and after reliability testing, whereas when the absorbents of Comparative Examples 1 to 3 are applied, the absorption characteristics are almost completely lost after high temperature and high humidity.

[0198] The main contents of the aforementioned drawings are summarized in Tables 4 and 5 below. In Tables 4 and 5 below, A f λ is the transmittance at the wavelength of absorption maximum of the absorption film held at 85°C and 85% relative humidity for 120 hours, f This is the wavelength of the absorption maximum at this time, and A i λ is the transmittance at the wavelength of absorption maximum of the absorption film before it is held at 85°C and 85% relative humidity for 120 hours, i This is the wavelength of the absorption maximum at that time.

[0199] In Tables 4 and 5 below, ΔA is 100 × (A f -A i ) / A i The value is calculated as follows: Δλ is 100 × (λ f -λ i ) / λ i This is the value calculated using [the formula / method].

[0200] [Table 4]

[0201] [Table 5]

[0202] Comparing the drawings with the results in Tables 4 and 5, it can be seen that while the spectral characteristics of the absorbent in the example and the absorbent in the comparative example are similar, they show significant differences in absorption characteristics and absorption characteristics after high-temperature and high-humidity evaluation when applied to an absorption film. From this, it can be confirmed that the absorbent of this application has excellent compatibility with the resin component that forms the absorption film due to its unique structure, and also has excellent heat resistance, thus enabling the effective formation of an absorption film with superior performance. [Explanation of symbols]

[0203] 100 Base material layer 200 Absorption membrane 300 Dielectric film

Claims

1. An absorbent containing a cation represented by the formula shown in 2 below, which absorbs light in the near-infrared region. In Chemical Formula 2, R ９ and R １０ are substituents in Chemical Formula 3 below. R11 and R12 form a skeleton or structure having a resonance structure and / or a conjugated bond. R15 and R １６ form a skeleton or structure having a resonance structure and / or a conjugated bond. R １３ and R １４ are each independently a methyl group. R １７ and R １８ are each independently hydrogen, a halogen, or an alkyl group, or are linked to each other to form a cyclic structure. R １９ to R ２３ are each independently hydrogen or a halogen, and n is 1. 3 In chemical formula 3, L １ It is linked to the nitrogen atom in chemical formula 2, A １ ~A ３ Each of these is an alkyl group independently, and L １ This is an alkylene group.

2. The absorbent according to claim 1, which exhibits an absorption maximum in the wavelength range of 600 nm to 950 nm.

3. The absorbent according to claim 1, wherein the 5% thermal decomposition temperature is 190°C or higher.

4. A composition comprising a resin component and the absorbent described in claim 1.

5. The composition according to claim 4, wherein the resin component comprises at least one selected from the group consisting of cyclic olefin (COP) resins, polyester resins, polyarylate resins, polysulfone resins, polyethersulfone resins, polyparaphenylene resins, polyarylene etherphosphine oxide resins, polyimide resins, polyetherimide resins, polyamideimide resins, acrylic resins, polycarbonate resins, polyethylene naphthalate resins, and silicone resins.

6. The composition according to claim 4, further comprising a solvent.

7. An absorbent film comprising a resin component and the absorbent described in claim 1.

8. The absorbent film according to claim 7, wherein the resin component comprises at least one selected from the group consisting of cyclic olefin (COP) resins, polyester resins, polyarylate resins, polysulfone resins, polyethersulfone resins, polyparaphenylene resins, polyarylene etherphosphine oxide resins, polyimide resins, polyetherimide resins, polyamideimide resins, acrylic resins, polycarbonate resins, polyethylene naphthalate resins, and silicone resins.

9. The absorption film according to claim 7, which exhibits an absorption maximum in the wavelength range of 600 nm to 950 nm.

10. The absorption membrane according to claim 7, wherein the absolute value of ΔA in the following formula 1 is 10% or less. [Formula 1] ΔA=100×(A) ｆ -A ｉ ) / A ｉ In Equation 1, A ｆ A is the transmittance at the wavelength of absorption maximum of the absorption film held at 85°C and 85% relative humidity for 120 hours. ｉ This is the transmittance at the absorption maximum wavelength of the absorption film before it is held at 85°C and 85% relative humidity for 120 hours, and the absorption maximum wavelength is within the wavelength range of 600 nm to 950 nm.

11. The absorption film according to claim 7, wherein the absolute value of Δλ in the following formula 2 is 10% or less. [Formula 2] Δλ=100×(λ) ｆ -l ｉ ) / l ｉ In equation 2, λ ｆ λ is the maximum absorption wavelength of the absorption film held at 85°C and 85% relative humidity for 120 hours. ｉ This is the maximum absorption wavelength of the absorption film before it is held at 85°C and 85% relative humidity for 120 hours, and the maximum absorption wavelength is within the wavelength range of 600 nm to 950 nm.

12. A base layer and An optical filter comprising an absorption film according to claim 7 formed on one or both sides of the substrate layer.

13. A solid-state image sensor comprising the optical filter described in claim 12.

14. An infrared sensor comprising the absorption film described in claim 7.

Images