Dynamic vacuum seal system for physical vapor deposition sputter applications

Abstract

A vacuum seal and sealing system comprising a corresponding insulating ring and a corresponding sputtering target is provided. The seal and sealing system may be used in PVD sputtering applications. The seal may include a compressible portion and a rigid portion. The compressible portion may include two or more higher-profile protrusions and two or more lower-profile recesses that facilitate the formation of the vacuum seal through compression between the insulating ring and the sputtering target and by the insulating ring and sputtering. The seal may further include a removable and replaceable plasma shield attachable to a first end of the seal. The seal may further include a rim at a second end that optionally engages with a corresponding step-out portion of the insulating ring. The sputtering target may have a continuous peripheral flange surface. In one embodiment, the seal and sealing system is self-centering.

Description

Technology Field

[0001] Cross-reference related to applications

[0002] This application claims priority to U.S. Patent Application No. 63 / 367,914, filed July 8, 2022, titled “Dynamic vacuum sealing system for physical vapor deposition sputtering applications,” the entire contents of which are incorporated herein by reference.

[0003] The present disclosure generally relates to dynamic vacuum sealing systems for physical vapor deposition sputtering applications, and more specifically, to vacuum seals and sealing systems comprising an O-ring and a corresponding insulating ring that does not include a corresponding groove or any vent slot or scallop and a corresponding sputtering target. Background Technology

[0004] Physical Vapor Deposition (PVD) is a thin film deposition technique used in manufacturing processes to create coatings and coating patterns on desired surface substrates. This technique utilizes a sputtering method to transfer material from a solid source, for example, a sputtering target, to a substrate surface in a vacuum environment. PVD can be used to deposit thin film layers in various applications, such as semiconductor manufacturing, glass coating, optical coating, solar cell coating, and nanotechnology. Sputtering in a vacuum environment can also be used to provide sputter cleaning, such as in ion plating.

[0005] For example, PVD may involve impacting a sputtering target with high-energy particles, such as ions or plasma, to release atoms or molecules from the target surface, which can then become vapor within a vacuum chamber. The vaporized particles then travel through the vacuum chamber and are deposited on the substrate surface to form a thin film layer. The sputtering target is consumed and has a finite lifespan depending on its erosion characteristics and available materials. The composition of the deposited film is determined by the material composition of the sputtering target and can be selected to provide desired properties such as conductivity, optical properties, and adhesion.

[0006] PVD processes generally require a high vacuum environment to minimize gas interference and unwanted reactions, but achieving and maintaining a high vacuum environment can be technically challenging and costly. Additionally, the presence of residual gases or contaminants can affect the quality and properties of the deposited film. Appropriate seals are required to maintain vacuum integrity, prevent air or other gases from entering or escaping the vacuum chamber and disrupting the control environment, minimize system contamination, and provide system stability for the accuracy and reliability of processes performed in a high vacuum environment, as well as to meet other considerations such as safety assurance and energy efficiency.

[0007] The following implies a summary of the disclosure to provide a basic understanding of some aspects. This summary is not intended to identify essential or important elements or to define any limitations of the embodiments or claims. Additionally, this summary may provide a simplified overview of some aspects that may be described in more detail in other parts of the disclosure. Any described aspect may be separated or combined with other described aspects without limitation to have the same effect as described individually and in all expressly possible combinations.

[0008] A vacuum seal and sealing system comprising a corresponding insulating ring and a corresponding sputtering target is disclosed. The seal and sealing system may be used in PVD sputtering applications. In the embodiments, the seal and sealing system does not include an O-ring and a corresponding groove or any vent slot or scallop, or other shapes or features having a similar function. The seal may include a compressible portion and a rigid portion. The compressible portion may include two or more higher-profile protrusions and two or more lower-profile recesses that facilitate the formation of the vacuum seal through compression between the insulating ring and the sputtering target and by the insulating ring and sputtering. The rigid portion may be encapsulated by the same material as the compressible portion. The seal may further include a removable and replaceable plasma shield attachable to a first end of the seal. The seal may further include a rim at a second end that optionally interfaces with a corresponding step-out portion of the insulating ring. The sputtering target may have a continuous peripheral flange surface. In one embodiment, the seal and sealing system is self-centering. In one embodiment, the seal and sealing system provides an increased sealing surface or interface. In one embodiment, the seal and sealing system provides a buffer between the sputtering target and the insulating ring.

[0009] In an exemplary embodiment of the present invention, a sealing ring for a physical vapor deposition (PVD) vacuum chamber is disclosed to have a compressible portion—the compressible portion comprises at least one protrusion and at least one recess—; a rigid portion adjacent to the compressible portion—the rigid portion has a rib substantially encapsulated by a secondary material—; a rim extending from a first surface of the sealing ring and configured to be optionally coupled to an insulating ring; and a removable shield configured to be optionally coupled to a first end of the compressible portion and configured to isolate the compressible portion from the interior of the vacuum chamber.

[0010] In a further embodiment, the compressible part is made of a fluorocarbon, fluoroelastomer, and / or fluorine kauchuk material. In a further embodiment, the secondary material is the same material as the compressible part and the rim. In a further embodiment, at least one protrusion extends past the first surface and the second opposite surface of the sealing ring. In a further embodiment, at least one recess terminates prior to the first surface and the second opposite surface of the sealing ring. In a further embodiment, each of the at least one protrusion and each of the at least one recess alternates. In a further embodiment, the compressible material and at least one recess are configured to capture particulates.

[0011] In an additional embodiment, the ribs of the rigid portion are made of aluminum. In an additional embodiment, the compressible portion and the rigid portion are nearly the same length. In an additional embodiment, the shield is configured to snap-fit ​​with the first end of the compressible portion. In an additional embodiment, the shield is configured to suppress thermal degradation and plasma arcing of the compressible portion. In an additional embodiment, the shield comprises polytetrafluoroethylene. In an additional embodiment, the rim further comprises a plurality of retention tabs. In an additional embodiment, the sealing ring is configured to optionally interface with the insulating ring by means of an interference fit, thereby forming a seal between the sealing ring and the insulating ring when installed in a PVD vacuum chamber.

[0012] In a further aspect, the sealing ring is configured to self-center with the insulating ring using a plurality of retention tabs of the rim and a step-out portion of the insulating ring cut at approximately 90 degrees. In a further aspect, a second surface of the sealing ring is configured to optionally interface with a sputtering target to form a seal between the sealing ring and the sputtering target when installed in a PVD vacuum chamber. In a further aspect, the sputtering target is free of any grooves, vent slots, and scallops and is configured to contact the sealing ring with a flat surface. In a further aspect, the sealing ring is configured to provide a buffer between the sputtering target and the insulating ring.

[0013] In another embodiment, the sputtering target is disclosed to have a first surface configured to optionally interface with a sealing ring on a PVD vacuum chamber, wherein the first surface is free of any grooves, vent slots, and scallops and is configured to bring the sealing ring into contact with a flat surface. In another aspect, the first surface is configured to be isolated from an insulating ring, and the insulating ring is configured to optionally interface with the opposite side of the sealing ring on the vacuum chamber when installed in the PVD vacuum chamber.

[0014] In a further embodiment, an insulating ring is provided, comprising a first surface configured to optionally interface with the compressible and rigid portions of a sealing ring when installed in a PVD vacuum chamber—the first surface is generally flat—; and a step-out portion configured to optionally interface with the rim of a sealing ring when installed in a PVD vacuum chamber. In another aspect, the step-out portion has a cut-out of about 90 degrees.

[0015] In additional embodiments, a sealing kit for a vacuum chamber is provided, which includes the following.

[0016] Sealing ring - The sealing ring comprises a compressible portion, a rigid portion adjacent to the compressible portion, and a rim extending vertically from the rigid portion -. Insulating ring configured to optionally interface with a first mating surface of an insulating ring comprising a rim - The insulating ring comprises a cutout configured to optionally receive and contact the rim of the sealing ring, thereby forming a seal between the insulating ring and the sealing ring when installed in a PVD vacuum chamber -. A sputtering target comprising a substantially flat first mating surface configured to optionally interface with a second mating surface of the sealing ring, thereby forming a seal between the sputtering target and the sealing ring when installed in a PVD vacuum chamber.

[0017] In another aspect, the first mating surface of the sputtering target is free of any O-ring grooves, vent slots, and scallops. In another aspect, the compressible part comprises at least one protrusion and at least one recess, and each of the at least one protrusion and each of the at least one recess alternates. In another aspect, the ribs of the rigid part are suspended from the same material constituting the compressible material and the rim. In another aspect, the sealing ring further comprises a plasma shield configured to be attached to the inner circumference side of the compressible part.

[0018] In an additional aspect, the sputtering target and the insulating ring each form a seal with a sealing ring. In another aspect, the sputtering target and the insulating ring are isolated from each other by a sealing ring.

[0019] In another embodiment, a method for assembling a sealing kit is provided, comprising: placing an insulating ring in a PVD vacuum chamber—the insulating ring comprises a step-out on a mating surface—; placing a sealing ring on the mating surface of the insulating ring—the sealing ring has a first mating surface and a second mating surface on the opposite side of the first mating surface, the first mating surface of the sealing ring comprises a rim configured to optionally engage with the step-out of the insulating ring and the first mating surface of the sealing ring contacts the mating surface of the insulating ring—; placing a sputtering target on the second mating surface of the sealing ring—the sealing ring comprises a compressible part and a shield, and the sputtering target is configured to compress the compressible part and the shield of the sealing ring, and when installed in a PVD vacuum chamber, the insulating ring and the sealing ring form a seal, and when installed in a PVD vacuum chamber, the sealing ring and the sputtering target form a seal. In another aspect, the sputtering target and the insulating ring are isolated from each other by a sealing ring.

[0020] Additionally, a sealing kit for a physical vapor deposition (PVD) vacuum chamber is disclosed, comprising: a sealing ring for a PVD vacuum chamber having a compressible part—the compressible part comprises at least one protrusion and at least one recess—; a rigid part adjacent to the compressible part—the rigid part has a lip substantially encapsulated by a secondary material—; a rim extending from a first surface of the sealing ring and configured to be optionally coupled to an insulating ring; and a removable shield configured to be optionally coupled to a first end of the compressible part and configured to isolate the compressible part from the interior of the vacuum chamber.

[0021] An insulating ring having a first surface configured to optionally interface with the compressible and rigid portions of a sealing ring when installed in a PVD vacuum chamber—the first surface is generally flat—; a step-out portion configured to optionally interface with the rim of a sealing ring when installed in a PVD vacuum chamber. A sputtering target having a first surface with a peripheral flange surface configured to interface with a sealing ring when installed in a PVD vacuum chamber—the peripheral flange surface of the first surface is free of any O-ring grooves, vent slots, and scallops and is configured to bring the sealing ring into contact with a flat surface—.

[0022] The following description and drawings disclose various exemplary aspects. Some improvements and new aspects may be explicitly identified, while others may be apparent from the description and drawings. Brief explanation of the drawing

[0023] This instruction may be better understood by referring to the following detailed description taken in relation to the following drawings, wherein the same reference characters refer to the same parts as a whole: FIG. 1a shows an example of a conventional vacuum chamber and seal comprising an O-ring inserted into a dovetail groove machined with a sputtering target; FIG. 1b shows an enlarged view of the conventional vacuum chamber and seal of FIG. 1a, which constitute an O-ring inserted into a dovetail groove machined with a sputtering target; FIGS. 1C-F show embodiments of a conventional vacuum chamber and seal comprising an O-ring inserted within a dovetail groove machined with a sputtering target, further including an inner vent slot (i), a scallop slot (ii), a cross gland vent slot (iii), and an outer vent slot (iv); FIGS. 2a-f show examples of arcing events, oxidation, nodule formation, wear, and redeposition that may occur in the conventional vacuum chamber and seal of FIGS. 1a-c; FIG. 3a shows an example of a seal and sealing system comprising an insulating ring and a sputtering target assembled on a vacuum chamber according to the aspects disclosed herein; FIG. 3b shows an example of a seal and sealing system comprising an insulating ring and a sputtering target assembled on a vacuum chamber according to the aspects disclosed herein; FIG. 4a shows a top view of an embodiment of a seal according to an aspect disclosed herein, and FIG. 4b shows a bottom view of an embodiment of a seal according to an aspect disclosed herein; FIG. 5a shows an enlarged top view of an embodiment of a seal according to an aspect disclosed herein, and FIG. 5b shows an enlarged bottom view of an embodiment of a seal according to an aspect disclosed herein; FIG. 6a shows a cross-sectional plan view of an embodiment of a seal according to an aspect disclosed herein, FIG. 6b shows a cross-sectional bottom view of an embodiment of a seal according to an aspect disclosed herein, and FIG. 6c shows a cross-sectional side view of an embodiment of a seal according to an aspect disclosed herein; FIG. 7 shows a perspective view of an embodiment of a sputtering target according to the aspects disclosed herein; FIG. 8a shows a plan view of an embodiment of an insulating ring according to an aspect disclosed herein, FIG. 8b shows a cross-sectional side view of an embodiment of an insulating ring according to an aspect disclosed herein, and FIG. 8c shows an enlarged cross-sectional side view of an embodiment of an insulating ring according to an aspect disclosed herein; FIGS. 9a-b show an example of an insulating ring assembled on a vacuum chamber according to the aspects disclosed herein; FIGS. 10a-b show an example of a seal assembled on an insulating ring and a vacuum chamber according to the aspects disclosed herein; FIG. 11 shows an example of a sputtering target assembled on a seal, an insulating ring, and a vacuum chamber according to the aspects disclosed herein; FIG. 12a shows an example of a vacuum chamber according to the aspects disclosed herein, and FIG. 12b shows an example of a sputtering target according to the aspects disclosed herein; FIGS. 13a-b show examples of end-of-life sputtering targets using seal and sealing systems described according to aspects disclosed herein; FIGS. 14a-b show examples of end-of-life sputtering targets using seal and sealing systems described according to aspects disclosed herein; FIGS. 15a-e show experimental data using a seal and sealing system described according to the aspects disclosed herein; The present invention may be embodied in various forms without departing from its spirit or essential characteristics. The scope of the present invention is defined by the appended claims, rather than by the preceding specific description. All embodiments falling within the meaning and scope of equivalence of the claims are therefore intended to be encompassed by the claims. Specific details for implementing the invention

[0024] Hereinafter, exemplary embodiments of this teaching will be referenced in detail, as described in the attached drawings, and similarly numbered aspects refer to features that are common to the whole. It should be understood that other embodiments may be utilized and that structural and functional changes may be made without departing from the scope of this teaching. Furthermore, features of various embodiments may be combined or modified without departing from the scope of this teaching. Accordingly, the following description is provided by way of example only and should not limit in any way various alternatives and modifications that may be made to the exemplified embodiments and should remain within the spirit and scope of this teaching.

[0025] In this disclosure, numerous specific details provide a complete understanding of the present application disclosure. It should be understood that aspects of this disclosure may be practiced in other embodiments, such as those that do not necessarily include all aspects described herein.

[0026] As used herein, the words “yes” and “exemplary” mean instances or examples. The words “yes” or “exemplary” do not represent essential or desirable aspects or embodiments. The word “or” is intended to be inclusive rather than exclusive unless the context implies otherwise. For example, the phrase “A uses B or C” includes any inclusive permutation (e.g., A uses B; A uses C; or A uses both B and C). As another matter, unless the context implies otherwise, the articles “a” and “an” are generally intended to mean “one or more.”

[0027] Additionally, unless the context implies otherwise, a description of a shape (e.g., circle, rectangle, triangle, etc.) refers to a shape that satisfies the definition of the shape and the general representation of the shape. For example, a triangular shape or a triangular shape in general may include shapes that generally represent a triangle, such as a shape having three sides and three vertices, a shape having three principal sides with or without straight edges, a triangle with rounded vertices, etc.

[0028] A vacuum seal and sealing system comprising a corresponding insulating ring and a corresponding sputtering target is disclosed. The seal and sealing system can be used in PVD sputtering applications. PVD sputtering applications utilize a sputtering target to provide material transfer under vacuum conditions. Material from the sputtering target can be vaporized by impacting the sputtering target with high-energy particles, and the vaporized material can be deposited as a thin film layer on the surface of a substrate. During this process, the sputtering target may be consumed.

[0029] For semiconductor applications, for example, the sputtering target may be a material suitable for deposition on a substrate, such as, but not limited to, vaporization and copper. A vacuum chamber may be used to vaporize the material from the sputtering target and deposit it onto the substrate, such as by forming copper traces on a wafer. The material transferred from the sputtering target to the substrate may be used to create conductive paths, insulating layers, or provide barrier properties, or it may be used to fabricate circuit boards or other electrical components. Vacuum conditions and a seal between the sputtering target and the vacuum chamber are useful for performing PVD and providing a viable end product.

[0030] As illustrated in FIGS. 1a-f, conventional sealing in a PVD sputtering process typically involves an O-ring (13) inserted into an O-ring groove, such as but not limited to a dovetail groove machined into the flange of the sputtering target (255). This O-ring may be twisted and rotated within the groove during assembly and the PVD process, resulting in the seal of the vacuum chamber (5) becoming inadequate and unreliable during the life and use of the sputtering target (255) and before the sputtering target (255) is consumed. Additionally, referring to FIGS. 1c-1f, which shows examples of an internal vent slot (21), a scallop slot (22), a cross gland vent slot (23), and an external vent slot (24), the flange of the sputtering target (255) may generally include a vent slot and / or scallop, or other shape having a similar function, across the seal surface.

[0031] However, these conventional features can weaken the flange of the sputtering target (255), especially under high and continuous pressure, and provide a source of leakage between the atmosphere and the sputtering environment within the vacuum chamber (5). As the sputtering target is consumed and its mass decreases, the physical properties of the assembly may also be compromised. For example, referring to FIGS. 2a-f, arcing events, oxidation, nodule formation, degradation, wear, redeposition, and particle generation often occur near or adjacent to the O-ring seal, vent slot, and / or scallop, which can lead to inefficiency and failure of the system seal. Additionally, a single O-ring (13) relying on a single individual contact point can cause a single-point fulcrum effect with the bottom contact surface (15a) of the insulating ring (15) during the dynamic cycling of the sputtering target (A), which can induce single-point stress, resulting in a seal that may consequently be susceptible to wear and malfunction.

[0032] An improved vacuum sealing mechanism is required for vacuum chambers and sputtering applications. An improved vacuum seal is required that provides one or more (or all) of the following: preventing leakage and maintaining the vacuum seal during the lifetime and use of the sputtering target; minimizing or preventing arcing events, oxidation, nodule formation, degradation, wear, redeposition, and / or particle generation (and associated PVD failures resulting from these events) during the lifetime and use of the sputtering target; not being susceptible to changes or fluctuations (e.g., twisting) during use; providing consistent application and stabilization of components; achieving self-leveling and self-centering during assembly; minimizing or eliminating vent slots and / or scallops; minimizing or eliminating grooves on the sputtering target surface; eliminating the single-point support effect of conventional systems; providing an increased seal surface or interface; and including an inherent occlusion mechanism to trap and remove potential particles that may occur during dynamic cycling from entering the vacuum chamber; Including an integrated plasma shield to protect the seal from high-energy ionizing gas (plasma) attack and thermal degradation; providing a buffer between the sputtering target and the insulating ring; etc.

[0033] In one embodiment, the seal and sealing system eliminates the need for a backing plate of a non-monolithic sputtering target or a flange of a monolithic sputtering target for the O-ring and corresponding groove or any vent slot or scallop of the sputtering target. The sputtering target may have a continuous peripheral flange surface. In one embodiment, the seal and sealing system is self-centering. In one embodiment, the seal and sealing system provides an increased sealing surface or interface. In one embodiment, the seal and sealing system provides a buffer between the sputtering target and the insulating ring.

[0034] The disclosed seal and sealing system may provide one or more (or all) of the following: preventing leakage and maintaining a vacuum seal during the lifetime and use of a sputtering target; minimizing or preventing arcing events, oxidation, nodule formation, degradation, wear, redeposition, and / or particle generation (and associated failure of PVD due to these events) during the lifetime and use of a sputtering target; not being susceptible to changes or variations (e.g., twisting) during use; providing consistent application and stabilization of components; achieving self-leveling and self-centering during assembly; minimizing or eliminating vent slots and / or scallops; minimizing or eliminating grooves on the surface of the sputtering target; eliminating the single-point support effect of conventional systems; providing an increased seal surface or interface; including an inherent occlusion mechanism to trap and remove potential particles that may occur during dynamic cycling from entering the vacuum chamber; and including an integrated plasma shield to protect the seal from high-energy ionized gas (plasma) attack and thermal degradation. Providing a buffer between the sputtering target and the insulating ring; etc.

[0035] Referring to FIG. 3-6, a sealing ring (100) is shown, comprising a corresponding insulating ring (210) and / or a corresponding sputtering target (255) that can be used as part of a sealing system (400). The insulating ring (210) may optionally interface with a vacuum chamber (5). The sealing ring (100) may optionally interface with the insulating ring (210). The sputtering target (255) may optionally interface with the sealing ring (100). Assembly of the insulating ring (210), the sealing ring (100), and the sputtering target (255) (including the sealing system (400)) to the vacuum chamber (5) provides a vacuum seal between the sputtering target (255) and the vacuum chamber (5), thereby allowing a PVD process to be performed while containing plasma within the vacuum chamber (5).

[0036] FIG. 9-11 shows, for example, the assembly of an insulating ring (210) to a vacuum chamber (5), followed by the assembly of a sealing ring (100) to the insulating ring (210), followed by the assembly of a sputtering target (255) to the sealing ring (100). In one embodiment, the sealing ring (100), the insulating ring (210), and the sputtering target (255) are each generally concentric and may be sized and shaped to fit a vacuum chamber such as the vacuum chamber (5). In one embodiment, the sealing ring (100), the insulating ring (210), and the sputtering target (255) may each be attached by interference or friction fit. It is noted that other attachment mechanisms may also be used. The assembly of the sealing ring (100), the insulating ring (210), and the sputtering target (255) is fast and may be achieved, for example, within 5 minutes, within 1 minute, within 30 seconds, etc. Components of the sealing ring (100), insulating ring (210), and sputtering target (255), such as the rim (140) having a retention tab (144), can facilitate quick assembly and functions such as self-centering and self-leveling.

[0037] The sealing ring (100) may generally include a flat portion (148) and a rim portion (140). The flat portion (148) has a first side (or surface) (102) and a second side (or surface) (104). In one embodiment, the first side (102) of the sealing ring (100) may be understood as an insulating ring-facing side that can be optionally coupled with a corresponding side of the insulating ring (210). In one embodiment, the second side (104) of the sealing ring (100) may be understood as a sputtering target-facing side that can be optionally interfaced with a corresponding side of the sputtering target (255). It is noted that the first side (102) may also be referred to as the lower side of the sealing ring (100) and the second side (104) may also be referred to as the upper side of the sealing ring (100). When assembled, the first side (or surface) (102) may come into contact (interface) with the insulating ring (210) and the second side (or surface) (104) may come into contact (interface) with the sputtering target (255). In one embodiment, the sealing ring (100) may act as a buffer and separation between the insulating ring (210) and the sputtering target (255), so that the insulating ring (210) and the sputtering target (255) do not come into contact with each other when assembled in the vacuum chamber (5).

[0038] A flat portion (148) of the sealing ring (100) may include a compressible portion (110) extending toward the center of the sealing ring (100). In one embodiment, the compressible portion (110) may include one or more higher profile protrusions, for example, protrusions (113), extending away from the horizontal axis (150) of the sealing ring (100). The flat portion (148) includes the horizontal axis (150). In one embodiment, the horizontal axis (150) is located midway between the peak of the protrusion (113) of the first side (102) and the peak of the protrusion (113) of the second side (104), and one or more lower profile recesses, for example, recesses (116), narrowing toward the horizontal axis (150) of the sealing ring (100). In one embodiment, the compressible portion (110) may include two or more higher profile protrusions (113). For example, the compressible part (110) may include higher profile protrusions (113) such as 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 15, 20, etc. In one embodiment, the compressible part (110) may include two or more lower profile recesses (116). For example, the compressible part (110) may include lower profile recesses (116) such as 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 15, 20, etc. The protrusions (113) and recesses (116) may alternate. In one embodiment, the compressible part (110) may include n protrusions (113) and n-1 recesses (116). For example, the compressible part (110) may include two protrusions (113) and one recess (116). The one recess (116) may be located between the two protrusions (113). In one embodiment, the compressible part (110) may include n protrusions (113) and n+1 recesses (116). For example, the compressible part (110) may include two protrusions (113) and three recesses (116).One recess (116) can be positioned between two protrusions (113) and each of the other two recesses (116) can be positioned on the opposite side of each protrusion (113), so the resulting pattern is similar to a recess, protrusion, recess, protrusion, recess. It is noted that different amounts, positions, and patterns of the protrusions (113) and recesses (116) can also be used in the compressible part (110).

[0039] In one embodiment, the protrusion (113) may extend beyond the rest of the profile of the sealing ring (100) on the second side (104). Alternatively, the protrusion (113) may extend further along the horizontal axis (150) than any other feature of the first side (102) of the sealing ring (100). Additionally, the protrusion (113) may extend beyond the rest of the profile of the sealing ring (100) on the first side (102), excluding the rim portion (140). Alternatively, the protrusion (113) may extend further along the horizontal axis (150) than any other feature of the second side (104) of the sealing ring (100), excluding the rim portion (140). In an exemplary embodiment, the protrusion (113) may have a greater height or diameter than the rest of the profile of the sealing ring (100) (excluding the rim portion (140)). In one embodiment, the recess (116) may be terminated before the rest of the profile of the sealing ring (100). In one embodiment, the recess (116) may have a height or diameter smaller than the rest of the profile of the sealing ring (100). In an exemplary embodiment, the protrusion (113) may extend past the first surface (102). In an exemplary embodiment, the protrusion (113) may extend past the second surface (104). In an exemplary embodiment, the protrusion (113) may extend past both the first surface (102) and the second surface (104). In an exemplary embodiment, the protrusion (113) may generally be round or circular. It is noted that other shapes may also be used unless the context or the present disclosure otherwise implies. In an exemplary embodiment, the recess (116) may be terminated before the first surface (102). In one example, the recess (116) may be terminated before the second surface (104). In an exemplary embodiment, the recess (116) may be terminated before both the first surface (102) and the second surface (104). Also, in an exemplary embodiment, the recess (116) may extend below the first surface (102) toward the horizontal axis (150) of the sealing ring (100).In an exemplary embodiment, the recess (116) may be terminated below the second surface (102) toward the horizontal axis (150) of the sealing ring (100). In an exemplary embodiment, the recess (116) may be terminated below both the first surface (102) and the second surface (102) toward the horizontal axis (150) of the sealing ring (100). In an exemplary embodiment, the recess (116) may generally be round or concave. It is noted that other shapes may also be used unless the context or the present disclosure otherwise implies.

[0040] The compressible part (110) may comprise any compressible material or combination of materials that may be suitable or desirable for a specific purpose or intended application. In one embodiment, the compressible part (110) may comprise a fluorocarbon, fluoroelastomer, or fluorine kauchuk material (FKM) composition. The material may be selected, for example, according to hardness. The material may be selected, for example, according to compressibility and / or recovery. The material may be selected, for example, according to heat resistance. Other materials may include, but are not limited to, polymers such as polyurethane, ethylene propylene diene monomer, styrene-butadiene rubber, thermoplastic elastomer, etc., other natural rubber or silicone rubber, foam materials such as neoprene, expanded polytetrafluoroethylene, polyurethane foam, combinations of two or more of these.

[0041] The protrusion (113) may serve as a contact or compression point that selectively contacts the corresponding surface of the insulating ring (210) and / or the corresponding surface of the sputtering target (255), and the corresponding surface of the insulating ring (210) and / or the corresponding surface of the sputtering target (255) selectively compresses the protrusion (113) until the corresponding surface of the insulating ring (210) and / or the corresponding surface of the sputtering target (255) contacts the rest of the body part of the sealing ring (100) (e.g., rigid part (130), shield (190), etc.). The recess (116) may generally provide a gap for the compressed protrusion (113) and allow the protrusion (113) to be compressed into the recess (116) to achieve a vacuum seal. The compressible part (110) can generally facilitate the formation of a vacuum seal through compression of the protrusion (113) by the insulating ring (210) and / or sputtering target (255) and between the insulating ring (210) and / or sputtering target (255).

[0042] The sealing ring (100) can provide a radial concentric seal capable of separating the high vacuum (sputter) environment from the atmosphere during dynamic cycling in the overall PVD process within the vacuum chamber (5) where sputtering occurs.

[0043] In one embodiment, the compressible portion (110) extends more significantly or longer toward the center of the sealing ring (100), and the more protrusions (113) or contact points there are, the larger the contact area becomes. The protrusions (113) may be semicircular in shape. A larger contact area can provide a longer lifespan for the vacuum seal and can provide additional rigidity and structure to the sealing ring (100). Multiple contact points, for example, multiple protrusions (113), provide duality to the vacuum seal, which can make the vacuum seal less susceptible to weaknesses such as leakage during the use and lifespan of the sputtering target (255). In an exemplary embodiment, the protrusions (113) may be spaced approximately .150" apart. Alternatively, the vertical axis (113a) of each of the consecutive protrusions (113) may be spaced approximately .150" apart when measured along the horizontal axis (150), such as when moving from the outer wall (147) to the center of the sealing ring (100) along the horizontal axis (150). Each of the protrusions (113a) has a vertical axis (113a). Additionally, in an exemplary embodiment, the innermost protrusion (113) (the protrusion closest to the center of the sealing ring (100)) may be located about 0.255" from the tip (190a) of the shield (190). Additionally, in an exemplary embodiment, the innermost protrusion (113) (the protrusion closest to the center of the sealing ring (100)) may be located about 0.255" from the inner diameter of the shield (190). In an exemplary embodiment, the protrusion (113) may have a height of about 0.114"-0.124" when measured vertically along the vertical axis (113a) from the top (113b) to the bottom (113c) of the protrusion (113).

[0044] Additionally, multiple contact points, for example, multiple protrusions (113), can provide a occlusion mechanism that traps gas and particulates within the annular and compressible portion (110) of the sealing ring (100) while allowing a contact force high enough to form a vacuum seal. The sealing ring (100) can increase the contact area on the flange portion of the sputtering target (255) while allowing sufficient contact force on the sealing ring (100), which can help reduce sputtering target flange movement over the life of the sputtering target (255). In one embodiment, a flat gasket-type seal may require an impractical contact force that cannot be provided by vacuum force alone to seal.

[0045] The sealing ring (100) may further include a rigid portion (130). In one embodiment, the rigid portion (130) may be located adjacent to the compressible portion (110). In one embodiment, the rigid portion (130) may be located further from the center of the sealing ring (100) compared to the location of the compressible portion (110) (e.g., toward the surrounding environment), and closer to the center of the sealing ring (100) compared to the location of the rigid portion (130) (e.g., toward the interior of the vacuum chamber (5)).

[0046] The rigid portion (130) may be more rigid than the compressible portion (110). Ribs (131) may be present in the rigid portion to provide rigidity. The ribs (131) may comprise any rigid material or combination of materials that may be suitable or desirable for a specific purpose or intended application. In one embodiment, the ribs (131) may comprise aluminum. It is noted that any other non-magnetic material having appropriate mechanical properties may also be used. The material may be selected, for example, according to hardness. The material may be selected, for example, according to rigidity, non-magnetic properties, conductivity properties, etc. Other materials may include, but are not limited to, specific grades of stainless steel, titanium, brass, carbon fiber reinforced polymer, ceramics such as alumina and zirconia, glass fiber, etc.

[0047] The ribs (131) of the rigid portion (130) may be encapsulated in the same material as the compressible portion (110) or suspended therein. The ribs (131) may be encapsulated in a material similar to the compressible portion (110) or suspended therein. The ribs (131) may be completely encapsulated in a compressible material. The ribs (131) may be substantially encapsulated in a compressible material. The ribs (131) may be partially encapsulated in a compressible material. The horizontal axis of the rigid portion (130) may be positioned along the horizontal axis (150) of the sealing ring (100). Additionally, the horizontal axis of the ribs (131) may be positioned along the horizontal axis (150) of the sealing ring (100). For example, the rib (131) may be completely encapsulated in a compressible material, excluding various cutouts or apertures (120) used to apply the compressible material by suspending the rib (131) in a mold. In one embodiment, the rib (131) may be exposed through cutouts or apertures (120) of the compressible material in the rigid portion (130). The coating or encapsulation may prevent or minimize arcing between the rigid portion (130) and the sputtering target (255). In one embodiment, the thickness of the coating or encapsulation in the rigid portion (130) (each on the upper and lower sides of the rib (131)) may be about .084”–.096”. In another embodiment, the thickness of the coating or encapsulation in the rigid portion may be about .080”–.010”. In an additional exemplary embodiment, the thickness of the coating or encapsulation in the rigid part may be about .076”-.014”.

[0048] In another embodiment, the thickness of the coating or encapsulation in the rigid portion (130) (each on the upper and lower sides of the rib (131)) may be about .014". In another embodiment, the thickness of the coating or encapsulation in the rigid portion (130) between the upper surface (131a) of the rib (131) and the second side (104) may be about .014", and the thickness of the coating or encapsulation in the rigid portion (130) between the lower surface (131b) of the rib (131) and the first side (102) may be about .013". In yet another exemplary embodiment, the thickness of the coating or encapsulation in the rigid portion (130) between the lower surface (131b) of the rib (131) and the first side (102) may be about .008"-.018". In another embodiment, the rear surface (131b) of the rib (131) and the sealing The thickness of the coating or encapsulation between the second end (108) of the ring (100) may be about .07". The coating or encapsulation may prevent or minimize wear from the insulating ring (210) and / or the sputtering target (255). In one embodiment, the rigid portion (130) may have a width approximately equal to that of the compressible portion (110). In one embodiment, the rigid portion (130) may be shorter in length than the compressible portion (110). In one embodiment, the rigid portion (130) may be longer in length than the compressible portion (110). The rib (131) may have a thickness of .063" (distance between the top surface (131a) and the bottom surface (131b) of the rib portion (131). The rib (131) may also have a width of about 0.45" (distance between the inner surface (131c) and the outer surface (131d) along the horizontal cross-section of the rigid portion (130) (or rib (131)), or alternatively, along the horizontal axis (150).

[0049] The rigidity portion (130) can provide support, rigidity, and / or stability to the sealing ring (100). The rigidity portion (130) can provide strength to the sealing ring (100) during dynamic sputtering cycling and can help eliminate movement from the flange sputtering target (255) to the insulation ring (210). The rigidity portion (130) can eliminate or minimize mechanical wear and particle generation caused by movement from the flange of the sputtering target (255) (the flange of the backing plate (260) of the sputtering target (255) of a non-monolithic target or the periphery flange of the sputtering target (255) of a monolithic target) and the insulation ring (210). In an exemplary embodiment, the inner diameter of the rib (131) measured at the inner surface (131c) of the rib (131) may be about 19.57”-19.63” and the outer diameter of the rib (131) measured at the outer surface (131d) of the rib (131) may be about 20.47”-20.53”.

[0050] A sealing ring (100) may generally include a first end (106) and a second end (108). In one embodiment, the first end (106) may be an inner circumferential end of the sealing ring (100) positioned toward the center of the sealing ring (100). In one embodiment, the second end (108) may be an outer circumferential end of the sealing ring (100) positioned opposite the first end (106) and away from the center of the sealing ring (100). The first end (106) may extend from the compressible portion (110) toward the center of the sealing ring (100). The first end (106) may be attached to and positioned adjacent to the compressible portion (110) of the sealing ring (100). The first end (106) may include the same or similar material as the compressible portion (110). In one embodiment, the compressible portion (110) may be positioned between the rigid portion (130) and the first end (106). The first end (106) may be configured to selectively receive a shield (190). The shield (190) may be configured to cover all or at least part of the first end (106). The shield (190) is configured to isolate and protect the compressible portion (110) and the rest of the sealing ring (100) from the vacuum environment of the vacuum chamber (5), such as providing protection from the plasma of the vacuum chamber (5). The shield (190) may be selectively removed from and replaced from the compressible portion (110) and the sealing ring (100). The first end (106) may be configured to selectively receive the shield (190) via a snap-fit ​​connection. It is noted that other connection mechanisms may also be utilized to suit or be desirable for specific purposes or intended applications. In one embodiment, the first end (106) of the sealing ring (100) may be tapered. In one embodiment, the first end (106) of the sealing ring (100) may be referred to as C-shaped. In one embodiment, the first end (106) of the sealing ring (100) may be referred to as snake-head shaped.In one example, the first end (106) of the sealing ring (100) may include a ramp-up portion having a progressively increasing slope and a slot. In one example, the shield (190) may include a snap finger configured to be inserted into a hollow portion and a slot, which are generally sized and shaped to correspond to the tapered or snake-head shape of the first end (106) of the sealing ring (100). The snap finger may be inserted over the ramp-up portion having a progressively increasing slope of the first end (106) of the sealing ring (100) until the snap finger is inserted into the slot and locked. The shape of the shield (190) may be configured so that the shield (190) is pinched against the first end (106) of the sealing ring (100) during the assembly of the sealing system (400) and under pressure from the sputtering target (255) and the insulating ring (210). In an exemplary embodiment, the shield (190) may have an inner diameter of approximately 18.585”–18.645” when measured at the tip (190a) of the shield (190). In an exemplary embodiment, the shield (190) may have an inner diameter of approximately 19.095”–19.155” when measured at the base (190b) of the shield (190).

[0051] As illustrated in FIG. 3a, the shield (190) may have a relatively thin profile and may have a curved or rounded c-shape with a size and shape determined to reflect the first end (106) of the sealing ring (100). As illustrated in FIG. 3b, the shield (190) may have an elongated teardrop shape extending into the interior of the vacuum chamber (5) toward the center of the sealing ring (100). In one embodiment, the elongated teardrop shape of the shield (190) may extend to the inner edge of the insulating ring (210). It is noted that other shapes, thicknesses, and sizes of the shield (190) may also be included. In an exemplary embodiment, the shield (190) may have a width of .130” along the horizontal axis (150) when measured from the tip (190a) to the base (190b). In another exemplary embodiment, the shield (190) may have a height of approximately .114”–.124” when measured in the vertical direction perpendicular to the horizontal axis (150) (parallel to the vertical axis (113a)).

[0052] The shield (190) may comprise any plasma suppression material or combination of materials that may be suitable or desirable for a specific purpose or intended application. In one embodiment, the shield (190) may comprise a plasma suppression polytetrafluoroethylene (PTFE) material, which is a synthetic fluoropolymer of tetrafluoroethylene. It is noted that any other material that suppresses plasma and thermal damage may also be used. The material may be selected, for example, based on a low coefficient of friction. Other materials may include, but are not limited to, polyimide, ceramics such as alumina and boron nitride, molybdenum disulfide, fluorinated ethylene propylene, etc.

[0053] In one embodiment, the shield (190) may be referred to as a plasma shield. In one embodiment, the shield (190) can protect the vacuum seal by providing plasma arc suppression and suppressing plasma arcing and thermal degradation of the vacuum seal material.

[0054] Accordingly, the planar portion (148) of the sealing ring (100) has a shield (190), a compressible portion (110), and a rigid portion (130) when moving outward from the center of the sealing ring (100) along the horizontal axis (150).

[0055] The sealing ring (100) may also further include a rim portion (140) positioned on the first surface (102) and forming an “L” with a flat portion (148). The rim portion (140) has an inner wall (142) oriented toward the center of the sealing ring (100) perpendicular to the first surface (102), an outer wall (147) positioned on the outer perimeter of the sealing ring (100) perpendicular to the first surface, and a bottom wall (146) connecting the bottom (142A) of the inner wall (142) and the bottom (147A) of the outer wall (147). The inner wall (142) may be oriented toward the center of the sealing ring (100). The bottom wall (146) may be oriented perpendicular to the inner wall (142) and the outer wall (147) to form a “U”. The outer wall (147) and the second end (108) may form a continuous surface that is linearly equidistant from the first end (106) when measured along the horizontal axis (150) of the flat portion (148). In an exemplary embodiment, the rim portion (140) may be located adjacent to the rigid portion (130) of the flat portion (148). In an exemplary embodiment, the rim portion (140) may be located at the second end (108) of the sealing ring (100). In an exemplary embodiment, the rim portion (140) may extend vertically from the rigid portion (130) and the compressible portion (110) on the insulating ring toward the first surface (102) of the sealing ring (100). In an exemplary embodiment, the sealing ring (100) may have an L-shape. The rim portion (140), the rigid portion (130), and the compressible portion (110) may be provided as a single attached unit. The rim portion (140) may contain the same material as the compressible portion (110). The rim portion (140) may contain a material similar to the compressible portion (110). The rim portion (140) may be configured to optionally engage with the corresponding step-out portion (213) of the insulating ring (210). Both the inner wall (142) and the bottom wall (146) (or the inner wall (142), the retention tab (144), and / or the bottom wall (146)) may optionally engage with the corresponding wall of the step-out portion (213) of the insulating ring (210).

[0056] In an exemplary embodiment, the sealing ring (100) may have a thickness of about 0.270" when measured at the rim portion (140). Alternatively, in an exemplary embodiment, the distance between the bottom wall (146) of the sealing ring (100) and the second side (104) may be about 0.270". Also, in another exemplary embodiment, the sealing ring (100) may have a thickness of about .085"-.095" at the rigid portion (130). Alternatively, in an exemplary embodiment, the distance between the first side (102) and the second side (104) of the sealing ring (100) at the rigid portion (130) may be about .085"-.095". In an additional exemplary embodiment, the diameter of the second end (108) of the sealing ring (100) may be approximately 20.585”–20.645”. In another exemplary embodiment, in a location where the retention tab (144) is not present, the diameter of the inner wall (142) of the sealing ring (100) may be approximately 20.325”–20.385”.

[0057] The rim portion (140) may also further include one or more (or multiple) retention tabs (144) that are positioned and extend from the inner wall (142) toward the center of the sealing ring (100) along the inner circumference of the rim portion (140). In an exemplary embodiment, the multiple retention tabs (144) may be positioned at equal distances along the circumference of the inner wall (142). In an exemplary embodiment, the multiple retention tabs (144) may be positioned at varying distances along the circumference of the inner wall (142). In an exemplary embodiment, the rim portion (140) may include retention tabs (144) such as 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 15, 20, 30, etc. The retention tab (144) may be semicircular in shape and may extend from the bottom wall (146) (or the bottom of the inner wall (142A)) to the first side (102). The retention tab (144) may have a chamber near the bottom wall (146) (or the bottom of the inner wall (142A)) to assist in placement on the insulating ring (210) of the sealing ring (100). In an exemplary embodiment, the inner surface (144a) of the retention tab (144) may be about 10.10" from the center of the sealing ring (100). The inner surface (144a) is the surface of the tab (144) closest to the center of the sealing ring (100) while moving along the horizontal axis (150).

[0058] In an exemplary embodiment, the rim portion (140) may provide ease of alignment on the insulating ring (210) of the sealing ring (100) during assembly of the sealing system (400). In an exemplary embodiment, the retention tab (144) may provide self-centering on the insulating ring (210) of the sealing ring (100). In an exemplary embodiment, the retention tab (144) may be fixed on the insulating ring (210) and may secure the sealing ring (100) to the insulating ring (210). In an exemplary embodiment, the sealing ring (100) may be applied upside down, for example, to an insulating ring (210) on top of the sealing ring (100), and a retention tab (144) may support and secure the sealing ring (100) on the inverted insulating ring (210) (for example, the retention tab may support and secure the sealing ring (100) on the insulating ring (210) when the insulating ring (210) and the sealing ring (100) are inverted so that the insulating ring (210) is oriented on top of the sealing ring (100) and the sealing ring (100) is pulled from the insulating ring (210) by gravity).

[0059] Returning to FIG. 7, a sputtering target (255) including a seal mating surface (259) is illustrated. As described, the seal mating surface (259), also referring to FIG. 3a-b, may be a generally continuous and / or smooth flange surface, i.e., a surface without any grooves, vent slots, scallops, and other shapes or features having similar functions. In an exemplary embodiment, the flange (seal mating surface (259)) of the backing plate (260) of the sputtering target (255) is featureless. In one embodiment, the sputtering target (255) eliminates the conventional O-ring seal, groove, vent slot, scallop, and other shapes or features having similar functions shown in FIGS. 1a-f that may be susceptible to failures shown in FIGS. 2a-f, including arcing events, oxidation, nodule formation, degradation, wear, redeposition, and particle generation that often occur near or adjacent to the O-ring seal, vent slot, and / or scallop. In an exemplary embodiment, the sputtering target (255) also eliminates radial single-point fulcrums that may contribute to mechanical movement of the components during dynamic sputter cycling of the sputtering target (255) in a conventional sputtering target vacuum chamber assembly.

[0060] The seal mating surface (259) of the sputtering target (255) (e.g., the flange of the backing plate (260) of the sputtering target (255) of a non-monolithic target or the periphery flange of the monolithic sputtering target (255)) may be configured to optionally interface with the sealing ring (100). The seal mating surface (259) of the sputtering target (255) may be configured to optionally interface with the second side (104) of the sealing ring (100), which includes a compressible portion (110), a rigid portion (130) (encapsulated in a compressible material), and a shield (190). The sputtering target (255) may provide a vacuum seal to the sealing ring (100).

[0061] The sputtering target (255) may comprise any material or combination of materials that may be suitable or desirable for a specific purpose or intended application. In one embodiment, the sputtering target (255) may comprise copper, titanium, gold, etc. It is noted that any other metal, alloy, oxide, and nitride materials thereof may also be used. For example, the material may be selected according to its sputtering capability. Other materials may include, but are not limited to, aluminum, tungsten, nickel, silicon, germanium, etc.

[0062] Returning to FIG. 8a-c, an insulating ring (210) comprising a seal mating surface (216) and a rim mating step-out (213) is shown. As described, the seal mating surface (216) (top surface) may generally be a continuous and / or smooth surface, and the rim mating step-out (213) may provide a step-out (213) on the outer circumference of the insulating ring (210). The rim mating step-out (213) may be configured to optionally engage with both the inner wall (142) and the bottom wall (146) of the rim portion (140) (or the inner wall (142) and the retention tab (144)). The rim mating step-out (213) may generally have a cut-out of about 90 degrees. In an exemplary embodiment, the step-out (213) may be formed by cutting vertically and horizontally above the outer diameter of the insulating ring (210). Alternatively, in an exemplary embodiment, the step-out (213) may be formed on the mating surface (216) and the outer surface (217) of the insulating ring (210) to create the vertical plane (218) and the horizontal plane (219) of the step-out (213). In an exemplary embodiment, when the step-out (213) is formed on the insulating ring, the vertical plane (218) may be offset about 0.200” from the outer surface (217), and the horizontal plane (219) may be offset about 0.200” from the mating surface (216). In an exemplary embodiment, the inner diameter of the insulating ring (210) may be about 18.505" when measured at the inner surface (220) of the insulating ring (210). In a further exemplary embodiment, the outer diameter of the insulating ring (210) may be about 20.625" when measured at the outer surface (217) of the insulating ring (210). In a further exemplary embodiment, the diameter of the insulating ring (210) may be about 20.225" when measured at the vertical plane (218) of the step-out (213) of the insulating ring (210). In a further exemplary embodiment, the thickness of the insulating ring (210) may be about 0.538" when measured from the mating surface (216) to the bottom surface (221) of the insulating ring (210).In an additional exemplary embodiment, the thickness of the insulating ring (210) may be about 0.338" when measured from the horizontal plane (219) to the bottom surface (221) of the insulating ring (210). In another exemplary embodiment, the width of the insulating ring (210) may be about 1.06" when measured from the outer surface (217) to the inner surface (220). The outer surface (217) is located opposite the inner surface (220).

[0063] The seal mating surface (216) of the insulating ring (210) may be configured to optionally bond with the sealing ring (100). The seal mating surface (216) of the insulating ring (210) may be configured to optionally bond with the first side (102) of the sealing ring (100) by including a compressible portion (110), a rigid portion (130) (encapsulated in a compressible material), a shield (190), and a rim portion (140). The insulating ring (210) may provide a vacuum seal to the sealing ring (100). The sealing ring (100), the sputtering target (255), and the insulating ring (210) together may also provide an increased seal surface or interface and a buffer between the sputtering target (255) and the insulating ring (210).

[0064] The insulating ring (210) may comprise any material or combination of materials that may be suitable or desirable for a specific purpose or intended application. In one embodiment, the insulating ring (210) may comprise a highly polished ceramic dielectric material. It is noted that any other material capable of electrically isolating the sputtering target (255) from the vacuum chamber (5) may also be used. For example, the material may be selected based on electrical insulation properties. Other materials may include, but are not limited to, glass, plastics and polymers such as polyethylene (PE), polypropylene (PP), polycarbonate (PC), polyimide (PI), and polytetrafluoroethylene (PTFE), mica, epoxy resin, polyethylene terephthalate (PET), etc.

[0065] FIGS. 13a-b and 14a-d show an end-of-life sputtering target (255) using a sealing ring (100) and a sealing system (400). The resulting sputtering target (255) shows no signs of arcing, particles, or flange wear. Additionally, sidewall oxide formation is consistently controlled.

[0066] FIGS. 15a-e show various experimental data taken over the lifetime of a sputtering target (255) using a sealing ring (100) and a sealing system (400). For example, FIG. 15a shows the observed bake-out. FIG. 15b shows that no helium leakage was observed in the seal. FIG. 15c shows that the gas load was stable during the process of the sputtering target (255). FIG. 15d shows that no arc discharge events were captured over the lifetime of the sputtering target (255). FIG. 15e shows that the idle mode chamber pressure was stable throughout the lifetime of the sputtering target (255).

[0067] Although embodiments of the present teaching have been illustrated in the accompanying drawings and described in the foregoing detailed description, it should be understood that the present teaching is not limited to the disclosed embodiments, and that numerous rearrangements, modifications, and substitutions are possible for the present teaching described herein without departing from the scope of the claims. The following claims are intended to include all modifications and changes as long as they are within the scope of the claims or equivalents.

Claims

Claim 1 A sputtering target comprising a first surface configured to optionally interface with a sealing ring on a PVD vacuum chamber, wherein the first surface is free of any grooves, vent slots, and scallops and is configured to bring the sealing ring into contact with a flat surface. Claim 2 A sputtering target according to claim 1, wherein the first surface is configured to be isolated from an insulating ring, and the insulating ring is configured to selectively interface with the opposite side of the sealing ring on the vacuum chamber when installed in the PVD vacuum chamber. Claim 3 An insulating ring comprising: a first surface configured to selectively interface with a compressible portion and a rigid portion of a sealing ring when installed in a PVD vacuum chamber, wherein the first surface is generally flat; and a step-out portion configured to selectively interface with a rim of the sealing ring when installed in a PVD vacuum chamber. Claim 4 An insulating ring according to claim 3, wherein the step-out portion has a cut-out of about 90 degrees.

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