Equipment and method for drying electrode substrate including screein for flow distribution

Abstract

The present invention relates to an electrode substrate drying facility and method comprising a shield that distributes the flow rate of hot air, and enables uniform drying in the width direction of the electrode substrate.

Description

Technology Field

[0001] The present invention relates to an electrode substrate drying facility and method comprising a shield that distributes the flow rate of hot air. Background Technology

[0003] Recently, with the technological development and increasing demand for mobile devices, the demand for secondary batteries as an energy source is rapidly increasing.

[0004] Depending on the type of external device, secondary batteries may be used in the form of a single battery cell or in the form of a battery module in which multiple unit cells are electrically connected. For example, while small devices such as mobile phones can operate for a certain period of time with the output and capacity of a single battery cell, medium or large devices such as laptop computers, portable DVDs, small PCs, electric vehicles, and hybrid electric vehicles require the use of battery modules containing multiple battery cells due to output and capacity issues.

[0005] Meanwhile, secondary batteries are manufactured through a process of assembling battery cells and activating the batteries. At this time, the battery activation process is typically carried out by a charging and discharging device equipped with positive and negative contact pins applying the necessary current to the battery cell to be charged or discharged.

[0006] Figures 1 and 2 are profiles of the electrode substrate surface temperature measured immediately after drying following top coating and back coating when a conventional electrode substrate drying method is applied, respectively.

[0007] Referring to FIG. 1, the surface temperature of the electrode substrate was measured in the width direction (TD direction) after a composite layer was formed on one side of the electrode substrate and a drying process was performed in a conventional manner. In FIG. 1, the temperature of the center of the electrode substrate is approximately 24°C. In contrast, the temperature of both side portions (DS, OS) is approximately 28°C. It can be seen that the electrode substrate in FIG. 1 shows a temperature difference of approximately 4°C between the center and the side portions.

[0008] In addition, referring to FIG. 2, the surface temperature of the electrode substrate was measured in the width direction (TD direction) after a drying process in a conventional manner following back coating, in which a composite layer is formed on one side of the electrode substrate and then a composite layer is formed on the other side of the electrode substrate after drying. In FIG. 2, the temperature of the center of the electrode substrate is approximately 40.7°C. In contrast, the temperature of both side parts (DS, OS) is approximately 43.3°C. It can be seen that the electrode substrate in FIG. 2 shows a temperature difference of approximately 3°C between the center and the side parts.

[0009] As confirmed in Figures 1 and 2, when drying an electrode substrate in a conventional manner, a temperature difference of at least 2°C and up to 6°C occurs in the width direction of the electrode substrate. This temperature difference causes a decrease in adhesion between the current collector and the composite layer or cracks on the electrode surface due to over-drying of the side portions of the electrode substrate.

[0010] Therefore, there is a need to develop a technology that enables uniform drying during the drying process of electrode substrates without excessively modifying conventional equipment. Prior art literature

[0012] Republic of Korea Published Patent No. 2013-0083919 The problem to be solved

[0013] The present invention aims to solve the above-mentioned problems and provides an electrode substrate drying facility and method comprising a shield that distributes hot air flow. means of solving the problem

[0015] The present invention provides an electrode substrate drying facility. In one example, the electrode substrate drying facility according to the present invention comprises: a drying oven for drying an electrode substrate being transported along a transport line; a hot air discharge unit for discharging hot air through a nozzle located at the top of the drying oven; and a shield located on the hot air discharge line of the hot air discharge unit for controlling the hot air discharged from the nozzle. Additionally, the shield is divided into a center portion and a side portion based on the width direction length of the electrode substrate, satisfying the following condition 1.

[0016] [Condition 1]

[0017] D center 1.3xD side

[0018] Under the above condition 1,

[0019] D center represents the average aperture ratio in the center region based on the width direction length of the electrode substrate, and

[0020] D side represents the average opening ratio of the side portions formed on both sides of the center portion based on the width direction length of the electrode substrate.

[0021] In one example, in the electrode substrate drying apparatus according to the present invention, the formation ratio (C:S) of the center portion (C) and the side portions (S) of the closed structure formed on both sides of the center portion is in the range of 15 to 60 : 40 to 85 based on the width direction length of the electrode substrate.

[0022] In another example, in the electrode substrate drying facility according to the present invention, the wind speed of the hot air applied to each area of ​​the electrode substrate corresponding to the shield satisfies the following condition 2.

[0023] [Condition 2]

[0024] 1.5 ≤ (WS center ) / (WS side ) ≤ 10

[0025] In the above condition 2,

[0026] WS center represents the wind speed (m / s) of hot air applied to the electrode substrate corresponding to the center area of ​​the shield, and

[0027] WS side represents the average wind speed (m / s) of hot air applied to the electrode substrate corresponding to the side area of ​​the shield.

[0028] In one example, the center portion is an open structure, and the side portion is a closed structure.

[0029] In another example, the center portion includes an open area and boundary areas located on both sides of the open area with a plurality of through holes formed therein, and the side portion is a closed structure.

[0030] In another example, the center portion and the side portion each have a structure in which a plurality of through holes are formed, and each through hole formed in the center portion and the side portion satisfies the following condition 3.

[0031] [Condition 3]

[0032] 4 ≤ D1 / D2 ≤ 20

[0033] In the above condition 3, D1 means the average diameter of the through hole formed in the center part, and D2 means the average diameter of the through hole formed in the side part.

[0034] In a specific example, the average diameter (D1) of the through hole formed in the center portion is in the range of 9 to 20 mm.

[0035] In a specific example, the structure is such that the diameter of the through hole in the side portion decreases continuously or sequentially in the direction of the center portion.

[0036] In one example, the electrode substrate drying facility having an ideal profile according to the present invention has an average opening rate (D) of the center portion center ) is over 35% on average.

[0037] In one example, the hot air discharge unit includes an inlet to which hot air is supplied; and a blower fan that blows the hot air supplied through the inlet.

[0038] In another example, the electrode substrate drying facility according to the present invention includes a temperature sensor for measuring the surface temperature of the electrode substrate to be dried.

[0040] In addition, the present invention provides a method for drying an electrode substrate using the electrode substrate drying facility described above. In one example, the electrode substrate drying method according to the present invention includes the step of drying the electrode substrate through the drying facility with respect to the electrode substrate being transported along a transport line.

[0041] In a specific example, in the step of drying the electrode substrate, the electrode substrate has a structure in which a composite layer is coated on one side of a current collector, and the process is performed by irradiating hot air onto the side of the current collector coated with the composite layer, or the electrode substrate has a structure in which a composite layer is coated on both sides of a current collector, and the process is performed by irradiating hot air onto the side of the current collector coated with the composite layer.

[0042] In a specific example, the electrode substrate is an electrode substrate for a pouch-type secondary battery. Effects of the invention

[0044] The electrode substrate drying facility and method according to the present invention enables uniform drying in the width direction of the electrode substrate by applying a shield that distributes the hot air flow rate. Brief explanation of the drawing

[0046] Figure 1 is a profile showing the surface temperature of the electrode substrate measured immediately after drying following top coating when a conventional electrode substrate drying method is applied. Figure 2 is a profile showing the surface temperature of the electrode substrate measured immediately after drying following back coating when a conventional electrode substrate drying method is applied. FIGS. 3 to 5 are schematic diagrams illustrating a shield according to one embodiment of the present invention. Figure 4 is a profile showing the surface temperature of the electrode substrate at top coating when the electrode substrate drying method according to one embodiment of the present invention is applied. FIG. 5 is a profile of the electrode substrate surface temperature measured during back coating when the electrode substrate drying method according to one embodiment of the present invention is applied. FIG. 6 is a profile of the electrode substrate surface temperature measured immediately after drying following top coating when the electrode substrate drying method according to one embodiment of the present invention is applied. FIG. 7 is a profile of the electrode substrate surface temperature measured immediately after drying following back coating when the electrode substrate drying method according to one embodiment of the present invention is applied. Specific details for implementing the invention

[0047] The present invention will be described in detail below. Prior to this, terms or words used in this specification and claims should not be interpreted as being limited to their ordinary or dictionary meanings. Instead, based on the principle that the inventor may appropriately define the concepts of terms to best describe their invention, they must be interpreted in a meaning and concept consistent with the technical spirit of the present invention.

[0049] In this application, terms such as "comprising" or "having" are intended to specify the existence of the features, numbers, steps, actions, components, parts, or combinations thereof described in the specification, and should be understood as not precluding the existence or addition of one or more other features, numbers, steps, actions, components, parts, or combinations thereof. Furthermore, when a part such as a layer, film, region, or plate is described as being "on" another part, this includes not only cases where it is "immediately above" the other part, but also cases where there is another part in between. Conversely, when a part such as a layer, film, region, or plate is described as being "under" another part, this includes not only cases where it is "immediately below" the other part, but also cases where there is another part in between. Additionally, in this application, being placed "on" may include cases where it is placed on the lower part as well as on the upper part.

[0051] The present invention relates to an electrode substrate drying facility equipped with a shield for distributing hot air flow. In one embodiment, the electrode substrate drying method according to the present invention comprises: a drying oven for drying an electrode substrate transported along a transport line; a hot air discharge unit for discharging hot air through a nozzle located at the top of the drying oven; and a shield located on the hot air discharge line of the hot air discharge unit for controlling the hot air discharged from the nozzle. Furthermore, the shield is divided into a center portion and a side portion based on the width direction length of the electrode substrate, satisfying the following condition 1.

[0052] [Condition 1]

[0053] D center 1.3xD side

[0054] In the above condition 1, D center represents the average aperture ratio in the center region based on the width direction length of the electrode substrate, and D siderepresents the average opening ratio of the side portions formed on both sides of the center portion based on the width direction length of the electrode substrate.

[0055] The shield according to the present invention forms a structure in which the center portion is relatively open and the side portion is relatively closed. The shield is positioned on the hot air discharge line of the hot air discharge section to control the flow rate of the hot air reaching the electrode substrate to be dried. Typically, during the process of drying an electrode substrate using a drying oven, drying of the side portion proceeds more rapidly due to the flow of hot air. As a result, there is a difference in the drying level between the center portion and the side portion of the electrode substrate, and this leads to a decrease in adhesion between the current collector and the composite layer or cracking of the electrode surface due to over-drying of the side portion. In the present invention, by applying the shield described above, the hot air is controlled to be concentrated toward the center portion of the electrode substrate. Through this, when the electrode substrate drying equipment according to the present invention is applied, the entire area of ​​the electrode substrate is induced to be dried at a uniform speed.

[0056] The shield according to the present invention is positioned on the hot air discharge line of the hot air discharge section and is arranged in the width direction (TD direction, Traverse Direction) of the electrode substrate to be dried. The shield is divided into a center section and two side sections. In one embodiment, the formation ratio (C:S) of the center section (C) and the side sections (S) with a closed structure formed on both sides of the center section is in the range of 15 to 60 : 40 to 85 based on the width direction length of the electrode substrate. Specifically, the formation ratio (C:S) is in the range of 15 to 55 : 45 to 85, 20 to 50 : 50 to 80, or 20 to 40 : 60 to 80. The formation ratio is intended to ensure even drying of the electrode substrate through the distribution of hot air. If the formation ratio of the side sections is excessive, the drying efficiency for the electrode substrate is reduced, and if the formation ratio of the center section is excessive, the flow rate distribution effect due to the formation of the shield is reduced.

[0057] The formation ratio of the above-mentioned side portions is the sum of the formation areas of the side portions formed on both sides relative to the center portion. In addition, the above-mentioned formation ratio is classified based on the length of the area in which each area is formed. For example, the total length (TD direction) of the above-mentioned shield is 1400 mm, the formation length of the above-mentioned center portion is 300 mm or 500 mm, and the side portions are formed with equal lengths on both sides of the above-mentioned center portion.

[0058] In one embodiment, in the electrode substrate drying facility according to the present invention, the wind speed of the hot air applied to each area of ​​the electrode substrate corresponding to the shield satisfies the following condition 2.

[0059] [Condition 2]

[0060] 1.5 ≤ (WS center ) / (WS side ) ≤ 10

[0061] In the above condition 2, WS center represents the wind speed (m / s) of hot air applied to the electrode substrate corresponding to the center area of ​​the shield, and WS side represents the average wind speed (m / s) of hot air applied to the electrode substrate corresponding to the side area of ​​the shield.

[0062] In the present invention, by applying the shielding film described above, the wind speed (WS) of the hot air applied to the central part of the electrode substrate center ) The wind speed of the hot air (WS) applied to the side portion of the electrode substrate side It is controlled to be 1.5 to 10 times higher than ). Specifically, the ratio of wind speed defined in Condition 2 above is in the range of 1.5 to 8, 1.5 to 4, 3 to 8, 2 to 6, or 1.8 to 5.7. For example, when hot air is discharged from the hot air discharge section under a condition of 1,000 rpm, the wind speed of the hot air (WS) applied to the central part of the electrode substrate center) is 0.94 m / s, and the wind speed of the hot air applied to the side of the electrode substrate (WS side ) can be controlled to a level of 0.20 m / s.

[0063] In one embodiment, the shield has an open center and a closed side. Through this, the supplied hot air is guided to be supplied to the electrode substrate via the open center.

[0064] In another embodiment, the shielding includes a center portion and a side portion, wherein the center portion includes an open area and a boundary area located on both sides of the open area and having a plurality of through holes formed therein, and the side portion has a closed structure. This means that the center portion has an open structure, and the boundary between the center portion and the side portion has a structure in which a region with a plurality of through holes is formed. The boundary is, for example, a structure in which a plurality of holes with an average diameter in the range of 5 to 15 mm are formed therein.

[0065] In another embodiment, the shield is structured such that a plurality of through holes are formed in the center portion and the side portion, and each through hole formed in the center portion and the side portion satisfies the following condition 3.

[0066] [Condition 3]

[0067] 4 ≤ D1 / D2 ≤ 20

[0068] In the above condition 3, D1 means the average diameter of the through hole formed in the center part, and D2 means the average diameter of the through hole formed in the side part.

[0069] This shielding has a structure in which a through hole is formed on the front surface, wherein the diameter of the through hole is large on the center side and the diameter of the through hole is small on the side side. In a specific embodiment, the average diameter (D1) of the through hole formed on the center side is in the range of 9 to 20 mm. For example, the center side has a structure in which a through hole with an average diameter in the range of 9 to 20 mm, 9 to 15 mm, or 10 to 12 mm is formed, and the side side has a structure in which a through hole with an average diameter in the range of 4 to 11 mm, 5 to 10.5 mm, or 6 to 10 mm is formed.

[0070] In another specific embodiment, the shield is structured such that the diameter of the through hole in the side portion decreases continuously or sequentially toward the center portion. Through this, the supplied hot air passes through the shield, allowing a large amount of hot air to pass through the center portion and a relatively small amount of hot air to pass through the side portion. Furthermore, the formation of the shield can prevent abrupt changes in the hot air flow rate between the center portion and the side portion.

[0071] In one embodiment, the electrode substrate drying facility according to the present invention has an average opening rate (D) of the center portion. center ) is an average of 35% or more. Specifically, the average opening ratio (D of the above-mentioned center section) center ) is in the average range of 35 to 100%, the average range of 50 to 99%, or the range of 50 to 75%. An average opening ratio of 100% in the center section means the case where the center section is a completely open structure. Furthermore, the average opening ratio of the side section (D side ) is the average opening ratio of the center section (D center It is controlled to be at least 10% lower than ). Specifically, the average opening ratio (D of the side portion) side) is an average of 70% or less, an average of 50% or less, an average of 5 to 70%, or an average of 15 to 50%. An average opening rate of 0% for the side portion means that the side portion is a completely closed structure.

[0072] In one embodiment, the hot air discharge unit includes an inlet to which hot air is supplied; and a blower fan that blows the hot air supplied through the inlet. Hot air heated from the outside is supplied through the inlet, and the supplied hot air flows toward the electrode substrate through the blower fan.

[0073] In another embodiment, the electrode substrate drying facility according to the present invention includes a temperature sensor for measuring the surface temperature of an electrode substrate to be dried. The temperature sensor is intended to verify the drying state of the electrode substrate or the temperature uniformity by region. The temperature sensor may be a contact type sensor, but a non-contact type sensor is advantageous considering process efficiency. For example, the temperature sensor may include a thermal imaging camera and / or a processing unit for calculating the surface temperature of the electrode substrate from an image captured by the thermal imaging camera.

[0075] In addition, the present invention provides a method for drying an electrode substrate using the electrode drying facility described above. In one embodiment, the method for drying an electrode substrate according to the present invention includes the step of drying the electrode substrate through the drying facility described above with respect to the electrode substrate being transported along a transport line.

[0076] In one embodiment, the step of drying the electrode substrate is performed by irradiating hot air onto the surface of the current collector coated with a composite layer, i.e., a top-coated structure, where the electrode substrate has a structure in which a composite layer is coated on one side of the current collector. Alternatively, the electrode substrate has a structure in which a composite layer is coated on both sides of the current collector, i.e., a back-coated structure, where the electrode substrate has a structure in which a composite layer is coated later, where hot air is irradiated onto the surface coated with the composite layer. For example, in the case where the electrode substrate has a back-coated structure, it may be a case in which an electrode slurry is discharged onto the other side of the current collector, which has undergone the top-coating and drying processes, to form a coating layer.

[0077] In one specific embodiment, the electrode substrate is an electrode substrate for a pouch-type secondary battery. For example, the pouch-type secondary battery is a lithium secondary battery. Additionally, the electrode substrate is a positive electrode or a negative electrode substrate.

[0079] The present invention will be described in more detail below through drawings and the like. However, it should be understood that the configurations described in the drawings in this specification are merely one embodiment of the present invention and do not represent all of the technical ideas of the present invention, and that various equivalents and modifications that can replace them may exist.

[0081] [First Embodiment]

[0082] FIG. 3 is a schematic diagram illustrating a shield according to one embodiment of the present invention. Referring to FIG. 3, the shield (100) includes a center portion (110) with an open structure and two side portions (121, 122) with a closed structure. The total width of the shield (100) is 1,400 mm, the width of the center portion (110) is 300 mm, and the widths of the two side portions (121, 122) are each 550 mm. Hot air discharged from the hot air discharge portion passes through the shield (100) and is supplied to the electrode substrate through the open center portion (110). Thus, the phenomenon in which the side area dries first in the width direction of the electrode substrate can be prevented.

[0083] The airflow velocity of the hot air applied to each region of the electrode substrate corresponding to the shield (100) shown in FIG. 3 was measured. Specifically, in FIG. 3, measurements were taken on the surface of each region of the electrode substrate corresponding to points (A-1) to (A-3), respectively. The amount of hot air supplied was expressed in RPM units, and the measured airflow velocity at each location was in m / s units. The hot air velocity was measured using the Velocicalc 9565P product from TSI. The measurement results are shown in Table 1 below.

[0084] Airflow (RPM) Wind speed (m / s) by measurement location (A-1) (A-2) (A-3) 550 0.40 1.00 0.20 1,000 0.94 2.54 0.20 1,500 1.12 3.80 0.20

[0085] Referring to Table 1, under the condition of 1,000 RPM, the wind speed at the center corresponding point is 0.94 m / s, which is about 4.7 times the wind speed of 0.20 m / s at the side corresponding point.

[0087] [Second Embodiment]

[0088] FIG. 4 is a schematic diagram illustrating a shield according to another embodiment of the present invention. Referring to FIG. 4, the shield (200) includes a center portion (210) with a partially open structure and two side portions (221, 222) with a closed structure, wherein boundary portions (211, 212) with a plurality of through holes are formed on both sides of the center portion (210). The total width of the shield (200) is 1,400 mm, the width of the center portion (210) is 500 mm, and the widths of the two side portions (221, 222) are each approximately 450 mm. Additionally, the width of the fully open area of ​​the center portion (210) is 300 mm, and the width of the partially open boundary portions (211, 212) with through holes is each approximately 100 mm. The hot air discharged from the hot air discharge section passes through the shield (200) and is supplied to the electrode substrate through the center section (210).

[0089] The airflow velocity of the hot air applied to each region of the electrode substrate corresponding to the shield (200) shown in FIG. 4 was measured. Specifically, in FIG. 4, measurements were taken on the surface of each region of the electrode substrate corresponding to points (B-1) to (B-3), respectively. The amount of hot air supplied was expressed in RPM units, and the measured airflow velocity at each location was in m / s units. The hot air velocity was measured using the Velocicalc 9565P product from TSI. The measurement results are shown in Table 2 below.

[0090] Airflow (RPM) Wind speed (m / s) by measurement location (B-1) (B-2) (B-3) 550 1.13 0.59 0.20 1,000 1.90 0.66 0.29 1,500 3.10 1.10 0.63

[0091] Referring to Table 2, under the condition of 1,000 RPM, the wind speed at the center corresponding point is 1.90 m / s, which is approximately 6.7 times the wind speed of 0.29 m / s at the side corresponding point. When comparing the results of Table 2 with the results of Table 1, it can be seen that by forming a perforated hole area on the side of the center, the overall wind speed of the hot air increased, and the difference in wind speed between the center and the side also increased.

[0093] [Third Embodiment]

[0094] FIG. 5 is a schematic diagram illustrating a shield according to another embodiment of the present invention. Referring to FIG. 5, the shield (300) includes a center portion having a through hole of a larger diameter and two side portions having through holes of a smaller diameter. The total width of the shield (300) is 1,400 mm. The diameter of the through hole formed in the center of the center portion is 12 mm, and the diameter of the through hole formed at the end of the side portion is 6 mm. In FIG. 5, the through holes are formed to decrease sequentially from the center of the center portion toward both side portions.

[0095] The airflow velocity of the hot air applied to each region of the electrode substrate corresponding to the shielding shown in Fig. 5 was measured. Specifically, measurements were taken on the surface of each region of the electrode substrate corresponding to points (C-1) to (C-7), respectively, in Fig. 5. The volume of the supplied hot air was expressed in RPM units, and the measured airflow velocity at each location was in m / s units. The hot air velocity was measured using the Velocicalc 9565P product from TSI. The measurement results are shown in Table 3 below.

[0096] Airflow (RPM) Wind speed (m / s) by measurement location (C-1) (C-2) (C-3) (C-4) (C-5) (C-6) (C-7) 550 0.30 0.36 0.33 0.46 0.48 0.52 0.57 1,000 0.73 0.83 1.06 1.20 0.84 1.32 1.60

[0097] In Table 3, (C-1) is an area where a through hole with a diameter of 6 mm is formed, (C-2) is an area where a through hole with a diameter of 7 mm is formed, (C-3) is an area where a through hole with a diameter of 8 mm is formed, (C-4) is an area where a through hole with a diameter of 9 mm is formed, (C-5) is an area where a through hole with a diameter of 10.5 mm is formed, (C-6) is an area where a through hole with a diameter of 11 mm is formed, and (C-7) is an area where a through hole with a diameter of 12 mm is formed.

[0098] Referring to Table 3, it can be seen that under the condition of 1,000 RPM, the wind speed sequentially increases from the side corresponding point (C-1) to the center corresponding point (C-7). However, the wind speed decreases slightly at point (C-5), but this is judged to be due to the influence of vortices inside the drying oven.

[0100] [Fourth Embodiment]

[0101] Figures 6 and 7 are profiles of the electrode substrate surface temperature measured immediately after drying following top coating and back coating when the electrode substrate drying method according to one embodiment of the present invention is applied, respectively.

[0102] Referring to FIG. 6, the surface temperature of the electrode substrate was measured in the width direction (TD direction) after a drying process was performed by applying a shielding film shown in FIG. 4 following a top coating that forms a composite layer on one side of the electrode substrate. In FIG. 6, the average temperature of the center of the electrode substrate is approximately 28.5°C. In contrast, the average temperature of the left side (DS) is 29.3°C, and the average temperature of the right side (OS) is 30.2°C. It can be seen that the electrode substrate in FIG. 6 shows a temperature difference of 0.8 to 1.7°C between the center and the side portions.

[0103] In addition, referring to FIG. 7, the surface temperature of the electrode substrate was measured in the width direction (TD direction) after a drying process was performed by applying the shielding film shown in FIG. 4 to the electrode substrate after back coating. In FIG. 7, the temperature of the center of the electrode substrate is approximately 45.1°C. In comparison, the average temperature of the left side (DS) is 45.6°C, and the average temperature of the right side (OS) is 45.9°C. It can be seen that the temperature difference between the center and the side of the electrode substrate in FIG. 7 is 0.8°C or less.

[0104] As shown in Figures 6 and 7, it can be seen that when the drying method according to the present invention is applied, the temperature in the width direction of the electrode substrate is controlled to a very uniform level.

[0106] The foregoing description is merely an illustrative explanation of the technical concept of the present invention, and those skilled in the art to which the present invention pertains will be able to make various modifications and variations within the scope of the essential characteristics of the present invention. Accordingly, the drawings disclosed in this invention are intended to explain, not limit, the technical concept of the present invention, and the scope of the technical concept of the present invention is not limited by these drawings. The scope of protection of the present invention shall be interpreted by the claims below, and all technical concepts within an equivalent scope shall be interpreted as being included within the scope of rights of the present invention. Explanation of the symbols

[0108] 100, 200, 300: Screen 110, 210: Center Department 211, 212: Boundary 121, 131, 221, 222: Side section (A-1), (A-2), (A-3), (B-1), (B-2), (B-3), (C-1), (C-2), (C-3), (C-4), (C-5), (C-6), (C-7): Hot air velocity measurement points

Claims

Claim 1 Electrode substrate drying equipment comprising: a drying oven for drying an electrode substrate transported along a transport line; a hot air discharge unit for discharging hot air through a nozzle located at the top of the drying oven; and a shield located on the hot air discharge line of the hot air discharge unit for controlling the hot air discharged from the nozzle, wherein the shield is divided into a center part and a side part based on the width direction length of the electrode substrate, satisfying the following condition 1, wherein the center part has an open structure and the side part has a closed structure, and the formation ratio (C:S) of the center part (C) and the side part (S) having a closed structure formed on both sides of the center part is in the range of 20~50 : 50~80 based on the width direction length of the electrode substrate: [Condition 1]D center 1.3xD side In the above condition 1, D center represents the average aperture ratio in the center region based on the width direction length of the electrode substrate, and D side represents the average opening ratio of the side portions formed on both sides of the center portion based on the width direction length of the electrode substrate. Claim 2 Electrode substrate drying apparatus comprising: a drying oven for drying an electrode substrate transported along a transport line; a hot air discharge unit for discharging hot air through a nozzle located at the top of the drying oven; and a shield located on the hot air discharge line of the hot air discharge unit for controlling the hot air discharged from the nozzle, wherein the shield is divided into a center portion and a side portion based on the width direction length of the electrode substrate, satisfying the following condition 1, wherein the center portion includes an open area and boundary areas located on both sides of the open area and having a plurality of through holes formed therein, and the side portion has a closed structure: [Condition 1]D center 1.3xD side In the above condition 1, D center represents the average aperture ratio in the center region based on the width direction length of the electrode substrate, and D side represents the average opening ratio of the side portions formed on both sides of the center portion based on the width direction length of the electrode substrate. Claim 3 An electrode substrate drying facility according to claim 2, characterized in that the formation ratio (C:S) of the center portion (C) and the side portions (S) of a closed structure formed on both sides of the center portion is in the range of 15 to 60 : 40 to 85 based on the width direction length of the electrode substrate. Claim 4 In claim 1 or 2, the wind speed of the hot air applied to each area of ​​the electrode substrate corresponding to the shield satisfies the following condition 2 for the electrode substrate drying equipment: [Condition 2] 1.5 ≤ (WS center ) / (WS side ) ≤ 10 In condition 2 above, WS center represents the wind speed (m / s) of hot air applied to the electrode substrate corresponding to the center area of ​​the shield, and WS side represents the average wind speed (m / s) of hot air applied to the electrode substrate corresponding to the side area of ​​the shield. Claim 5 An electrode substrate drying facility according to claim 1 or 2, wherein the hot air discharge unit comprises an inlet to which hot air is supplied; and a blower fan for blowing the hot air supplied through the inlet. Claim 6 An electrode substrate drying facility comprising a temperature sensor for measuring the surface temperature of an electrode substrate to be dried, in accordance with claim 1 or 2. Claim 7 A method for drying an electrode substrate, comprising the step of drying the electrode substrate through a drying facility according to claim 1 or 2, with respect to the electrode substrate being transported along a transport line. Claim 8 A method for drying an electrode substrate according to claim 7, wherein the step of drying the electrode substrate is performed by irradiating hot air onto the surface of the current collector coated with a composite layer, whereby the electrode substrate has a structure in which a composite layer is coated on one side of the current collector, or by irradiating hot air onto the surface of the current collector coated with a composite layer later, whereby the electrode substrate has a structure in which a composite layer is coated on both sides of the current collector. Claim 9 In claim 7, the electrode substrate is an electrode substrate for a pouch-type secondary battery, and the electrode substrate drying method. Claim 10 delete Claim 11 delete Claim 12 delete Claim 13 delete Claim 14 delete

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