Display panel and display apparatus
By setting a light sensing unit and a binding electrode in the peripheral area of the display panel and connecting a dimming chip, the problem of the light sensing detection function affecting the display effect in the prior art is solved, and the effect of automatically adjusting the brightness and reducing power consumption is achieved.
Patent Information
- Application Number
- PCT/CN2024/093230
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2023-06-29
- Filing Date
- 2024-05-14
- Publication Date
- 2025-02-20
AI Technical Summary
When the existing display screen integrates the light sensing detection function, it is difficult to reduce power consumption without affecting the display effect.
A display panel is designed, including a display area and a peripheral area, and a light sensing unit is provided in the surrounding area, including a light shielding unit and a light leakage unit, and the light output brightness of the backlight module is adjusted by connecting the dimming chip through a binding electrode.
It realizes automatic adjustment of the display panel brightness according to the ambient light brightness, reducing the power consumption of the display and improving the visual effect.
Smart Images

Figure CN2024093230_20022025_PF_FP_ABST
Abstract
Description
Display panel and display device
[0001] This application claims priority to Chinese patent application No. 202310786841.9 filed on June 29, 2023, the entire contents of which are incorporated herein by reference. Technical Field
[0002] The present disclosure relates to the field of display technology, and in particular to a display panel and a display device. Background Art
[0003] With the development of display technology and the tightening of industry energy consumption standards, the demand for display screen functions, such as light sensing, is also increasing. How to apply light sensing functions to displays and reduce power consumption without affecting the display quality has become a hot topic in current research.
[0004] Summary of the Invention
[0005] In one aspect, a display panel is provided. The display panel includes a display area and a peripheral area surrounding the display area. The peripheral area includes a first area, a second area, a third area, and a fourth area. The first area and the second area are respectively located on either side of the display area along a first direction, and the third area and the fourth area are respectively located on either side of the display area along a second direction, with the first direction and the second direction being perpendicular. The second area includes a binding area. The display panel includes a photosensitive unit and a plurality of binding electrodes. The photosensitive unit is disposed in the peripheral area of the display panel. The photosensitive unit includes a light shielding unit and a light leakage unit. The light shielding unit includes a plurality of light shielding transistors, and the light leakage unit includes a plurality of light leakage transistors. The photosensitive unit is disposed in at least one of the first area, the second area, the third area, and the fourth area. The plurality of binding electrodes are disposed in the binding area of the display panel and are configured to connect to a dimming chip. The plurality of binding electrodes include a first electrode, a second electrode, a third electrode, and a fourth electrode. Among them, the control electrodes of the multiple light-shielding transistors are electrically connected in sequence and electrically connected to the first electrode, the first electrodes of the multiple light-shielding transistors are electrically connected in sequence and electrically connected to the second electrode, and the second electrodes of the multiple light-shielding transistors are electrically connected in sequence and electrically connected to the third electrode; the control electrodes of the multiple leakage transistors are electrically connected in sequence and electrically connected to the first electrode, the first electrodes of the multiple leakage transistors are electrically connected in sequence and electrically connected to the third electrode, and the second electrodes of the multiple leakage transistors are electrically connected in sequence and electrically connected to the fourth electrode.
[0006] In some embodiments, the photosensitive unit further includes a virtual unit, which includes a plurality of virtual transistors; the plurality of light-shielding transistors are arranged along the same direction, the plurality of light-leaking transistors are arranged along the same direction, and at least some of the plurality of virtual transistors are arranged along the same direction; the plurality of light-shielding transistors and at least one of the plurality of light-leaking transistors and the at least some of the virtual transistors are arranged along the same direction; the plurality of binding electrodes further include a plurality of virtual electrodes, and the plurality of binding electrodes are arranged at intervals along the second direction.
[0007] In some embodiments, the photosensitive unit is located in the second area; the multiple light-shielding transistors are arranged along the second direction, the multiple light-leaking transistors are arranged along the second direction, and the multiple dummy transistors are arranged along the second direction; the light-shielding unit, the dummy unit and the light-leaking unit are arranged along the second direction, and the dummy unit is located between the light-shielding unit and the light-leaking unit.
[0008] In some embodiments, multiple groups of fan-out routing lines are arranged between the display area and the binding area, and there is a spacing area between two adjacent groups of fan-out routing lines. The spacing area includes a first spacing area, a second spacing area and a third spacing area. The shading unit is located in the first spacing area, the light leakage unit is located in the second spacing area, and the virtual unit is located in the third spacing area.
[0009] In some embodiments, the first electrode includes a first sub-electrode and a second sub-electrode, and the second electrode includes a third sub-electrode and a fourth sub-electrode; the control electrodes of the multiple light-shielding transistors are electrically connected in sequence through a first gate line, and the first gate line is electrically connected to the first sub-electrode, the first electrodes of the multiple light-shielding transistors are electrically connected in sequence through a first drain line, and the first drain line is electrically connected to the third sub-electrode; the control electrodes of the multiple leakage transistors are electrically connected in sequence through a second gate line, and the second gate line is electrically connected to the second sub-electrode, the first electrodes of the multiple leakage transistors are electrically connected in sequence through a second drain line, and the second drain line is electrically connected to the fourth sub-electrode.
[0010] In some embodiments, the control electrodes of the multiple virtual transistors are electrically connected in sequence through virtual gate lines, and the virtual gate lines are electrically connected to a virtual electrode, the second electrodes of the multiple virtual transistors are electrically connected in sequence through virtual source lines, and the virtual source lines are electrically connected to a virtual electrode, and the first electrodes of the multiple virtual transistors are electrically connected in sequence through virtual drain lines, and the virtual drain lines are electrically connected to a virtual electrode.
[0011] In some embodiments, the photosensitive unit is located in the first area; the multiple light-shielding transistors are arranged along the second direction, the multiple light-leaking transistors are arranged along the second direction, and the multiple dummy transistors are arranged along the second direction; the light-shielding unit, the dummy unit and the light-leaking unit are arranged along the second direction, and the dummy unit is located between the light-shielding unit and the light-leaking unit.
[0012] In some embodiments, the control electrodes of the multiple light-shielding transistors and the control electrodes of the multiple light-leaking transistors are electrically connected in sequence through gate signal lines, and the gate signal lines are electrically connected to the first electrode, and the first electrodes of the multiple light-shielding transistors and the first electrodes of the multiple light-leaking transistors are electrically connected in sequence through drain signal lines, and the drain signal lines are electrically connected to the second electrode.
[0013] In some embodiments, the control electrodes of the plurality of dummy transistors are electrically connected in sequence; and the second electrodes of the plurality of dummy transistors are electrically connected in sequence.
[0014] In some embodiments, the light shading unit is located in the third area, and the light leakage unit is located in the fourth area; the multiple virtual transistors of the virtual unit include multiple first virtual transistors and multiple second virtual transistors; the multiple first virtual transistors are located in the third area, and the multiple second virtual transistors are located in the fourth area; the multiple light shading transistors are arranged along the first direction, the multiple light leakage transistors are arranged along the first direction, the multiple first dummy transistors are arranged along the first direction, and the multiple second dummy transistors are arranged along the first direction; the light shading unit and the multiple first dummy transistors are arranged along the first direction, and the light leakage unit and the multiple second dummy transistors are arranged along the first direction.
[0015] In some embodiments, the first electrode includes a first sub-electrode and a second sub-electrode, and the second electrode includes a third sub-electrode and a fourth sub-electrode; the control electrodes of the multiple light-shielding transistors are electrically connected in sequence through a first gate line, and the first gate line is electrically connected to the first sub-electrode, the first electrodes of the multiple light-shielding transistors are electrically connected in sequence through a first drain line, and the first drain line is electrically connected to the third sub-electrode; the control electrodes of the multiple leakage transistors are electrically connected in sequence through a second gate line, and the second gate line is electrically connected to the second sub-electrode, the first electrodes of the multiple leakage transistors are electrically connected in sequence through a second drain line, and the second drain line is electrically connected to the fourth sub-electrode.
[0016] In some embodiments, the control electrodes of the multiple first virtual transistors are electrically connected in sequence, the second electrodes of the multiple first virtual transistors are electrically connected in sequence, and the first electrodes of the multiple first virtual transistors are electrically connected in sequence; the control electrodes of the multiple second virtual transistors are electrically connected in sequence, the second electrodes of the multiple second virtual transistors are electrically connected in sequence, and the first electrodes of the multiple second virtual transistors are electrically connected in sequence.
[0017] In some embodiments, the plurality of first dummy transistors are farther away from the plurality of binding electrodes relative to the plurality of light-shielding transistors; and the plurality of second dummy transistors are farther away from the plurality of binding electrodes relative to the plurality of light-leaking transistors.
[0018] In some embodiments, the second poles of the plurality of light-shielding transistors are electrically connected to a first source line, the first source line has at least one first cutting position, and the first cutting position is located between the second poles of any two adjacent light-shielding transistors; and / or, the second poles of the plurality of light-leaking transistors are electrically connected to a second source line, the second source line has at least one second cutting position, and the second cutting position is located between the second poles of any two adjacent light-leaking transistors.
[0019] In some embodiments, the photosensitive unit is located in the first area; the control electrodes of the multiple virtual transistors are electrically connected to the control electrodes of the multiple light-shielding transistors and the control electrodes of the multiple light-leaking transistors; the first electrodes of the multiple virtual transistors are electrically connected in sequence, and are electrically connected to the first electrodes of the multiple light-shielding transistors and the first electrodes of the multiple light-leaking transistors; the second electrodes of the multiple virtual transistors are all electrically connected to the virtual source line; there is a first welding position between the first source line and the virtual source line, and the first source line and the virtual source line can be electrically connected at the first welding position under the action of external force; and / or there is a second welding position between the second source line and the virtual source line, and the second source line and the virtual source line can be electrically connected at the second welding position under the action of external force.
[0020] In some embodiments, the virtual source line includes at least two disconnected virtual source sub-lines, each virtual source sub-line is electrically connected to the source of at least one virtual transistor, and there is a third welding position between two adjacent virtual source sub-lines. The two adjacent virtual source sub-lines can be electrically connected at the third welding position under the action of external force.
[0021] In some embodiments, the shading unit is located in the third area, and the light leakage unit is located in the fourth area; the control electrodes of the multiple first virtual transistors are electrically connected to the control electrodes of the multiple light shading transistors, and the first electrodes of the multiple first virtual transistors are electrically connected to the first electrodes of the multiple light shading transistors; the second electrodes of the multiple first virtual transistors are all electrically connected to the light shading virtual source line; there is a fourth welding position between the first source line and the light shading virtual source line, and the first source line and the light shading virtual source line can be electrically connected at the fourth welding position under the action of external force; and / or, the control electrodes of the multiple second virtual transistors are electrically connected to the control electrodes of the multiple light leakage transistors, and the first electrodes of the multiple second virtual transistors are electrically connected to the first electrodes of the multiple light leakage transistors; the second electrodes of the multiple second virtual transistors are all electrically connected to the light leakage virtual source line; there is a fifth welding position between the second source line and the light leakage virtual source line, and the second source line and the light leakage virtual source line can be electrically connected at the fifth welding position under the action of external force.
[0022] In some embodiments, the light-shielding virtual source line includes at least two disconnected light-shielding virtual source sub-lines, each light-shielding virtual source sub-line is electrically connected to at least one first virtual transistor; there is a sixth welding position between two adjacent light-shielding virtual source sub-lines, and the two adjacent light-shielding virtual source sub-lines can be electrically connected at the sixth welding position under the action of external force; and / or, the light-leaking virtual source line includes at least two disconnected light-leaking virtual source sub-lines, each light-leaking virtual source sub-line is electrically connected to at least one second virtual transistor; there is a seventh welding position between two adjacent light-leaking virtual source sub-lines, and the two adjacent light-leaking virtual source sub-lines can be electrically connected at the seventh welding position under the action of external force.
[0023] In some embodiments, the display panel further includes: a base substrate; a gate layer disposed on the base substrate, the gate layer including a first connecting line; an insulating layer disposed on a side of the gate layer away from the base substrate; an active layer disposed on a side of the insulating layer away from the base substrate; a metal layer disposed on a side of the active layer away from the base substrate, the metal layer including first and second electrodes of a plurality of transistors, and a plurality of signal lines, the plurality of signal lines including: a first source line, a second source line, a virtual source line, a light-shielding virtual source line, and a light-leaking virtual source line; a passivation layer disposed on a side of the metal layer away from the base substrate; a passivation layer disposed on the passivation layer A connection layer away from one side of the substrate; the connection layer includes a second connection line; two signal lines that need to be electrically connected under the action of external force are a first signal line and a second signal line, the second connection line is electrically connected to the first signal line through a first via hole penetrating the passivation layer, and the second connection line is electrically connected to the first connection line through a second via hole penetrating the passivation layer and the insulating layer; the first connection line and the second signal line at least partially overlap, and the overlapping position of the two is the welding position; the welding positions include a first welding position, a second welding position, a third welding position, a fourth welding position, a fifth welding position, a sixth welding position and a seventh welding position.
[0024] In some embodiments, the display panel includes a base substrate and a light-shielding layer arranged on the side of the photosensitive unit away from the base substrate; the light-shielding layer is provided with a plurality of openings arranged at intervals, and each of the plurality of openings exposes a light-leaking transistor.
[0025] In some embodiments, the light-leaking transistor includes an active layer pattern, the active layer pattern includes a channel region; an orthographic projection of the channel region on the base substrate is located in the middle of an orthographic projection of the opening on the base substrate.
[0026] In some embodiments, the distance between the boundary of the orthographic projection of the channel region and the boundary of the orthographic projection of the opening on the same side in the third direction is a first distance, and the first distance is 5um to 6um; the distance between the boundary of the orthographic projection of the channel region and the boundary of the orthographic projection of the opening on the same side in the fourth direction is a second distance, and the second distance is 5um to 6um; the fourth direction is the direction from the second pole of the light-leaking transistor to the first pole, and the third direction is perpendicular to the fourth direction.
[0027] In some embodiments, the light shielding layer further includes at least one light shielding strip disposed in the opening, and the light shielding strip at least partially overlaps with the second electrode and the first electrode of the light leakage transistor.
[0028] In some embodiments, the light-shielding layer includes at least two light-shielding strips, and the at least two light-shielding strips are arranged in parallel.
[0029] In some embodiments, the shading layer includes at least two shading strips, the width of the at least two shading strips is the first width, and the spacing between two adjacent shading strips, the spacing between the shading strip near the first boundary of the opening and the first boundary of the opening, and the spacing between the shading strip near the second boundary of the opening and the second boundary of the opening are the first spacing.
[0030] In some embodiments, the plurality of openings include at least one dummy opening, wherein the dummy opening exposes at least one dummy transistor adjacent to the light-leaking transistor among the plurality of dummy transistors.
[0031] In some embodiments, the plurality of transistors included in the photosensitive unit are oxide transistors.
[0032] In another aspect, a display device is provided. The display device includes: a display panel as described in any of the above embodiments; a backlight module disposed on one side of the display panel; and a dimming chip; the dimming chip is electrically connected to the display panel and the backlight module, and is configured to receive a first current generated by the light shielding unit and a second current generated by the light leakage unit, and adjust the brightness of light output from the backlight module based on the first current and the second current. BRIEF DESCRIPTION OF THE DRAWINGS
[0033] To more clearly illustrate the technical solutions of the present disclosure, the following briefly introduces the drawings required for use in some embodiments of the present disclosure. Obviously, the drawings described below are only drawings of some embodiments of the present disclosure, and those skilled in the art can also derive other drawings based on these drawings. Furthermore, the drawings described below are schematic diagrams and are not intended to limit the actual dimensions of the products, actual processes of the methods, actual timing of signals, and the like involved in the embodiments of the present disclosure.
[0034] FIG1 is a structural diagram of a display panel according to some embodiments;
[0035] FIG2A is another structural diagram of a display panel according to some embodiments;
[0036] FIG2B is another structural diagram of a display panel according to some embodiments;
[0037] FIG2C is another structural diagram of a display panel according to some embodiments;
[0038] FIG3 is a diagram illustrating a connection structure of light sensing units of a display panel according to some embodiments;
[0039] FIG4A is a diagram illustrating another connection structure of light sensing units of a display panel according to some embodiments;
[0040] FIG4B is a diagram illustrating another connection structure of light sensing units of a display panel according to some embodiments;
[0041] FIG5 is a diagram illustrating another connection structure of light sensing units of a display panel according to some embodiments;
[0042] FIG6 is a diagram illustrating another connection structure of light sensing units of a display panel according to some embodiments;
[0043] FIG7 is a structural diagram of a light shielding unit of a display panel according to some embodiments;
[0044] FIG8 is a structural diagram of a light leakage unit of a display panel according to some embodiments;
[0045] FIG9 is a structural diagram of a light sensing unit of a display panel according to some embodiments;
[0046] FIG10A is a diagram illustrating a welding structure of a light sensing unit in a display panel according to some embodiments;
[0047] FIG10B is a diagram illustrating another welding structure of a light sensing unit in a display panel according to some embodiments;
[0048] FIG10C is a diagram illustrating another welding structure of a light sensing unit in a display panel according to some embodiments;
[0049] FIG10D is a diagram illustrating another welding structure of a light sensing unit in a display panel according to some embodiments;
[0050] FIG11A is a diagram illustrating another welding structure of a light sensing unit in a display panel according to some embodiments;
[0051] FIG11B is a diagram illustrating another welding structure of a light sensing unit in a display panel according to some embodiments;
[0052] FIG11C is a diagram illustrating another welding structure of a light sensing unit in a display panel according to some embodiments;
[0053] FIG12A is a diagram illustrating another welding structure of a light sensing unit in a display panel according to some embodiments;
[0054] FIG12B is a diagram illustrating another welding structure of a light sensing unit in a display panel according to some embodiments;
[0055] FIG12C is a diagram illustrating another welding structure of a light sensing unit in a display panel according to some embodiments;
[0056] FIG13A is a diagram illustrating a welding structure of a light sensing unit in a display panel according to some embodiments;
[0057] FIG13B is a cross-sectional structural diagram obtained by making a cross section along the cross-sectional line FF' according to FIG13A;
[0058] FIG13C is another cross-sectional structural diagram obtained by making a cross section along the cross-sectional line FF' according to FIG13A;
[0059] FIG14 is a structural diagram of a light shielding layer in a display panel according to some embodiments;
[0060] FIG15 is a partial enlarged structural diagram at point A according to FIG14 ;
[0061] FIG16 is another structural diagram of a light shielding layer in a display panel according to some embodiments;
[0062] FIG17 is another structural diagram of a light shielding layer in a display panel according to some embodiments;
[0063] FIG. 18 is a structural diagram of a display device according to some embodiments. DETAILED DESCRIPTION
[0064] The following will be combined with the accompanying drawings to clearly and completely describe the technical solutions in some embodiments of the present disclosure. Obviously, the embodiments described are only some embodiments of the present disclosure, not all embodiments. Based on the embodiments provided by the present disclosure, all other embodiments obtained by ordinary technicians in this field are within the scope of protection of the present disclosure.
[0065] Unless the context requires otherwise, throughout the specification and claims, the term "comprise" and its other forms, such as the third person singular form "comprises" and the present participle form "comprising", are to be interpreted as open and inclusive, that is, "including, but not limited to". In the description of the specification, the terms "one embodiment", "some embodiments", "exemplary embodiments", "example", "specific example" or "some examples" are intended to indicate that the particular features, structures, materials or characteristics associated with the embodiment or example are included in at least one embodiment or example of the present disclosure. The schematic representation of the above terms does not necessarily refer to the same embodiment or example. In addition, the particular features, structures, materials or characteristics may be included in any one or more embodiments or examples in any appropriate manner.
[0066] In the following, the terms "first" and "second" are used for descriptive purposes only and should not be understood to indicate or imply relative importance or implicitly specify the number of the technical features indicated. Therefore, a feature defined as "first" or "second" may explicitly or implicitly include one or more of the features. In the description of the embodiments of the present disclosure, unless otherwise specified, "plurality" means two or more.
[0067] When describing some embodiments, the expressions "coupled" and "connected" and their derivatives may be used. The term "connected" should be understood in a broad sense. For example, "connected" can be a fixed connection, a detachable connection, or an integral connection; it can be directly connected or indirectly connected through an intermediate medium. The term "coupled" indicates, for example, that two or more components are in direct physical or electrical contact. The term "coupled" or "communicatively coupled" may also refer to two or more components that are not in direct contact with each other, but still cooperate or interact with each other. The embodiments disclosed herein are not necessarily limited to the contents of this document.
[0068] “At least one of A, B, and C” has the same meaning as “at least one of A, B, or C” and both include the following combinations of A, B, and C: only A, only B, only C, the combination of A and B, the combination of A and C, the combination of B and C, and the combination of A, B, and C.
[0069] "Group A and / or Group B, including the following three combinations: A only, B only, and a combination of A and B.
[0070] As used herein, the term "if" is optionally interpreted to mean "when" or "upon" or "in response to determining" or "in response to detecting," depending on the context. Similarly, the phrases "if it is determined that" or "if [stated condition or event] is detected" are optionally interpreted to mean "upon determining" or "in response to determining that" or "upon detecting [stated condition or event]" or "in response to detecting [stated condition or event]," depending on the context.
[0071] The use of "adapted to" or "configured to" herein is intended to be open and inclusive language that does not exclude devices adapted or configured to perform additional tasks or steps.
[0072] Additionally, the use of “based on” is meant to be open and inclusive, as a process, step, calculation, or other action “based on” one or more stated conditions or values may, in practice, be based on additional conditions or values beyond those stated.
[0073] As used herein, "about," "substantially," or "approximately" includes the stated value and an average value that is within an acceptable range of deviation from the particular value as determined by one of ordinary skill in the art taking into account the measurements in question and the errors associated with the measurement of the particular quantity (i.e., the limitations of the measurement system).
[0074] As used herein, "parallel", "perpendicular", and "equal" include the situations described and situations similar to the situations described, and the range of the similar situations is within an acceptable deviation range, wherein the acceptable deviation range is as determined by a person of ordinary skill in the art taking into account the measurement in question and the errors associated with the measurement of the specific quantity (i.e., the limitations of the measurement system). For example, "parallel" includes absolute parallelism and approximate parallelism, wherein the acceptable deviation range for approximate parallelism can be, for example, a deviation within 5 brackets; "perpendicular" includes absolute perpendicularity and approximate perpendicularity, wherein the acceptable deviation range for approximate perpendicularity can also be, for example, a deviation within 5 brackets. "Equal" includes absolute equality and approximate equality, wherein the acceptable deviation range for approximate equality can be, for example, that the difference between the two equals is less than or equal to 5% of either one.
[0075] It will be understood that when a layer or element is referred to as being on another layer or substrate, it can be directly on the other layer or substrate, or intervening layers may be present therebetween.
[0076] Exemplary embodiments are described herein with reference to cross-sectional and / or plan views that are idealized exemplary drawings. In the drawings, the thickness of layers and the area of regions are exaggerated for clarity. Therefore, variations in shape relative to the drawings due to, for example, manufacturing techniques and / or tolerances are contemplated. Therefore, the exemplary embodiments should not be construed as limited to the shapes of the regions shown herein, but rather include deviations in shape due to, for example, manufacturing. For example, an etched region shown as a rectangle will typically have curved features. Therefore, the regions shown in the drawings are schematic in nature, and their shapes are not intended to illustrate the actual shape of regions of the device and are not intended to limit the scope of the exemplary embodiments.
[0077] Currently, with rising energy consumption standards, displays are moving towards low power consumption. To reduce display power consumption, methods such as reducing the internal load on the screen and increasing the display panel's transmittance are often used. In some embodiments, backlight brightness adjustment is employed to reduce power consumption. Specifically, a light sensor is positioned on the display panel to detect changes in ambient light. By detecting ambient light, the display brightness is adjusted accordingly, thereby reducing power consumption. Related technologies restrict the placement of light sensors to fixed locations on the display panel, hindering optimal use of space.
[0078] Based on this, some embodiments of the present disclosure provide a display panel and a display device to automatically adjust the brightness of the display panel according to changes in ambient light brightness, thereby reducing the power consumption of the display panel and bringing better visual effects to users.
[0079] In the present disclosure, FIG1 is a structural diagram of a display panel according to some embodiments. FIG1 only illustrates the regional division of the display panel. FIG2A to FIG2C illustrate the specific layout of the photosensitive units in the display panel, but do not illustrate the connection relationship of the photosensitive units in the display panel. In order to facilitate a clear description of the connection method of the photosensitive units, FIG3 to FIG6 are connection structural diagrams of the photosensitive units of the display panel according to some embodiments, illustrating the specific connection methods corresponding to the photosensitive units arranged in different areas in some embodiments; FIG7 to FIG9 illustrate the specific methods of setting cutting positions of the photosensitive units in the light-shielding units and the light-leaking units in some embodiments; FIG10A to FIG12C are welding structural diagrams of the photosensitive units in the display panel according to some embodiments; FIG13A to FIG13C show plan views and cross-sectional views of the photosensitive units in the display panel at the welding positions in some embodiments; FIG14 to FIG17 are structural diagrams of the light-shielding layer in the display panel according to some embodiments; and FIG18 is a structural diagram of the display device 1000 according to some embodiments.
[0080] It should be noted that, in the drawings of this disclosure, references to 1 to 10 indicate that component 1 belongs to component 10, and references to 1 to 10 indicate that light shielding unit 1 belongs to light sensing unit 10. The above descriptions apply to other similar reference numerals in the drawings. References to 1051 / SB in the drawings of this disclosure indicate first signal line 1051 and first source line SB, for example. References to the structures indicated by these reference numerals apply to other similar reference numerals in the drawings.
[0081] As shown in Figure 1, some embodiments of the present disclosure provide a display panel 100, which includes a display area AA and a peripheral area BB surrounding the display area, wherein the peripheral area BB includes a first area B1, a second area B2, a third area B3 and a fourth area B4, the first area B1 and the second area B2 are respectively located on both sides of the display area AA along a first direction Y, the third area B3 and the fourth area B4 are respectively located on both sides of the display area AA along a second direction X, the first direction Y and the second direction X are perpendicular, and the second area B2 includes a binding area CC.
[0082] It should be noted that the display panel 100 includes a display surface and a non-display surface. The above descriptions of the display area AA and the peripheral area BB are all descriptions of the display surface of the display panel 100, wherein the first direction Y and the second direction X are both parallel to the display surface of the display panel 100.
[0083] As shown in Figures 2A to 2C, the display panel 100 includes a light sensing unit 10 disposed in the peripheral area BB and a plurality of bonding electrodes 20 disposed in the bonding area CC. The light sensing unit 10 includes a light shielding unit 1 and a light leakage unit 2. The light shielding unit 1 includes a plurality of light shielding transistors 11, and the light leakage unit 2 includes a plurality of light leakage transistors 12. The light sensing unit 10 is disposed in at least one of the first area B1, the second area B2, the third area B3, or the fourth area B4.
[0084] It can be understood that the photosensitive unit 10 can be set in one of the first area B1, the second area B2, the third area B3 or the fourth area B4, for example, the photosensitive unit is located in the first area B2; the photosensitive unit 10 can also be set in any two of the first area B1, the second area B2, the third area B3 and the fourth area B4, for example, a part of the photosensitive unit 10 is set in the first area B1, and the other part is set in the third area B3; similarly, the photosensitive unit 10 can also be set in any three of the first area B1, the second area B2, the third area B3 and the fourth area B4, for example, a part of the photosensitive unit 10 is set in the first area B1, another part is set in the third area B3, and a part is set in the fourth area B4; the photosensitive unit 10 can also be set in the first area B1, the second area B2, the third area B3 and the fourth area B4, for example, the photosensitive unit is divided into four parts, and the four parts are respectively set in the first area B1, the second area B2, the third area B3 and the fourth area B4.
[0085] For example, as shown in FIG2A , the light sensing unit 10 is disposed in the first area B1 , or, as shown in FIG2B , the light sensing unit 10 is located in the second area B2 , or, as shown in FIG2C , the light shielding unit 1 and the light leakage unit 2 are located in the third area B3 and the fourth area B4 , respectively. Multiple binding electrodes 20 are configured to connect to the dimming chip, and the multiple binding electrodes 20 include a first electrode 21 , a second electrode 22 , a third electrode 23 , and a fourth electrode 24 .
[0086] The photosensitive unit 10 described above can detect changes in ambient light brightness. By setting a shading unit 1 and a light leakage unit 2, during the operation of the light leakage unit 2, the leakage transistor 12 in the light leakage unit 2 is affected by light and will generate a large photosensitive current, while the shading transistor 11 in the shading unit 1 is not affected by ambient light. The generated dark current can be used as a reference current. The photosensitive current and the reference current are respectively transmitted to the corresponding binding electrodes 20, and the current signal is transmitted to the dimming chip through the binding electrode 20. The dimming chip can detect the ambient light according to the difference in the current signal, and then complete the adjustment of the display panel brightness according to the change in ambient light brightness.
[0087] The light sensing unit 10 can be specifically arranged according to the actual spatial layout of the display panel 100 . In some embodiments of the present disclosure, there is no limitation on the specific location of the light sensing unit 10 .
[0088] It should be noted that the first electrode 21, the second electrode 22, the third electrode 23 and the fourth electrode 24 in the multiple binding electrodes 20 are all electrically connected to the dimming chip. The photosensitive unit 10 transmits different electrical signals to the binding electrodes 20 connected to the dimming chip, and transmits the electrical signals to the dimming chip through the binding electrodes 20. The dimming chip analyzes the relationship between the electrical signals and the ambient light through simulation calculations, and further realizes the adjustment of the brightness of the display panel 100.
[0089] In some embodiments, referring to Figures 3, 5 and 6, the control electrodes 1k of multiple light-shielding transistors 11 are electrically connected in sequence and electrically connected to the first electrode 21, the first electrodes 1d of multiple light-shielding transistors 11 are electrically connected in sequence and electrically connected to the second electrode 22, and the second electrodes 1s of multiple light-shielding transistors 11 are electrically connected in sequence and electrically connected to the third electrode 23; the control electrodes 2k of multiple leakage transistors 12 are electrically connected in sequence and electrically connected to the first electrode 21, the first electrodes 2d of multiple leakage transistors 12 are electrically connected in sequence and electrically connected to the second electrode 22, and the second electrodes 2s of multiple leakage transistors 12 are electrically connected in sequence and electrically connected to the fourth electrode 24.
[0090] It should be noted that, as shown in Figure 3, the control electrodes 1k of the multiple light-shielding transistors 11 are all electrically connected to the gate signal line GL, the gate signal line GL is electrically connected to the first electrode 21, and the multiple light-shielding transistors 11 receive the gate signal provided by the first electrode 21; the first electrodes 1d of the multiple light-shielding transistors 11 are all connected to the drain signal line DL, the drain signal line DL is electrically connected to the second electrode 22, and the multiple light-shielding transistors 11 receive the drain signal provided by the second electrode 22; the second electrodes 1s of the multiple light-shielding transistors 11 are all electrically connected to the first source line SB, the first source line SB is electrically connected to the third electrode 23, and the multiple light-shielding transistors 11 transmit the generated dark current to the third electrode 23 through the first source line SB.
[0091] The control electrodes 2k of the multiple leakage transistors 12 are all electrically connected to the gate signal line GL, the gate signal line GL is electrically connected to the first electrode 21, and the multiple leakage transistors 12 receive the gate signal provided by the first electrode 21; the first electrodes 2d of the multiple leakage transistors 12 are all electrically connected to the drain signal line DL, the drain signal line DL is electrically connected to the second electrode 22, and the multiple leakage transistors 12 receive the drain signal provided by the second electrode 22; the second electrodes 2s of the multiple leakage transistors 12 are all electrically connected to the second source line SW, the second source line SW is electrically connected to the fourth electrode 24, and the multiple leakage transistors 12 transmit the generated light-sensitive current to the fourth electrode 24.
[0092] In the embodiment of the present disclosure, the position of the light sensing unit 10 in the display panel is flexible. The light sensing unit 10 can be set in any area of the first area B1, the second area B2, the third area B3 and the fourth area B4 in the peripheral area BB of the display panel, and has a corresponding connection scheme with the binding electrode 20. Its arrangement position can be reasonably selected according to the spatial layout of the display panel 100, thereby improving the space utilization of the display panel 100 and enhancing practicality.
[0093] In some embodiments, referring to Figure 3, the photosensitive unit 10 also includes a virtual unit 3, the virtual unit 3 includes multiple virtual transistors 13, multiple virtual transistors 13; multiple light-shielding transistors 11 are arranged along the same direction, multiple light-leaking transistors 12 are arranged along the same direction, and at least some of the multiple dummy transistors 13 are arranged along the same direction; at least one of the multiple light-shielding transistors 11 and the multiple light-leaking transistors 12 and at least some of the dummy transistors 13 are arranged along the same direction; and multiple binding electrodes 20 are arranged at intervals along the second direction X.
[0094] It can be understood that at least some of the multiple virtual transistors 13 are arranged along the same direction, that is, some of the multiple virtual transistors 13 are arranged along the same direction, and another part of the virtual transistors 13 are arranged along another direction, or, all of the multiple virtual transistors 13 are arranged along the same direction.
[0095] The arrangement of the plurality of light-shielding transistors 11 and at least one of the plurality of light-leaking transistors 12 and at least part of the dummy transistors 13 along the same direction can be divided into the following multiple examples. Specifically, for example, the plurality of light-shielding transistors 11 and part of the dummy transistors 13 are arranged along the same direction, or the plurality of light-leaking transistors 12 and part of the dummy transistors 13 are arranged along the same direction, or the plurality of light-shielding transistors 11 and multiple dummy transistors 13 are arranged along the same direction, or the plurality of light-leaking transistors 12 and multiple dummy transistors 13 are arranged along the same direction, or the plurality of light-shielding transistors 11 and multiple light-leaking transistors 12 are all arranged along the same direction with part of the dummy transistors 13, and the plurality of light-shielding transistors 11 and multiple light-leaking transistors 12 are all arranged along the same direction with the plurality of dummy transistors 13.
[0096] The same direction here can be the first direction Y or the second direction X, and the multiple dummy transistors 13 can be arranged between the multiple shading transistors 11 and the multiple leakage transistors 12, or can be arranged on the side of the multiple shading transistors 11 and the multiple leakage transistors 12 away from the binding electrode 20.
[0097] For example, the spacing between any two adjacent light-shielding transistors in the plurality of light-shielding transistors 11 along their arrangement direction is equal, the spacing between any two adjacent light-leaking transistors 12 in the plurality of light-leaking transistors 12 along their arrangement direction is equal, and the spacing between any two adjacent dummy transistors 13 in the plurality of dummy transistors 13 along their arrangement direction is equal. Furthermore, the spacing between any two adjacent transistors in the plurality of dummy transistors 13, the plurality of light-shielding transistors 11, and the plurality of light-leaking transistors 12 along their arrangement direction is equal, so that the plurality of transistors are evenly arranged and neatly arranged.
[0098] Exemplarily, the film layer structure of each transistor is consistent, and each transistor includes a gate pattern, an active layer pattern, a source pattern and a drain pattern. The patterns of the virtual transistor 13 are arranged on the same layer and have the same shape as the corresponding patterns of the light-shielding transistor 11 and / or the light-leaking transistor 12. For example, the gate pattern of the virtual transistor 13 is located on the same layer as the gate pattern of the light-shielding transistor 11, and has the same shape, thereby further ensuring that the film layer environment of multiple transistors is consistent.
[0099] In the manufacturing process of the display panel 100, a rubbing process is often used. Due to the number limitation of the multiple photosensitive transistors (leakage transistors) and the multiple light-shielding transistors in the photosensitive unit 10, the multiple photosensitive transistors (leakage transistors) and the multiple light-shielding transistors 11 cannot fill a region in the peripheral area along their arrangement direction (for example, the photosensitive unit cannot fill the first region). This causes uneven arrangement of the transistors in the photosensitive unit (leakage unit), resulting in different film layer environments at different positions. There is a risk of rubbing, resulting in the phenomenon of moiré fringes. By providing a dummy unit 3 in the photosensitive unit 10, and ensuring that the arrangement of each dummy transistor 13 in the dummy unit 3 is consistent with the arrangement of each light-shielding transistor 11 and the light-leaking transistor 12, each pattern of the dummy transistor 13 is arranged in the same layer and has the same shape as the corresponding patterns of the light-shielding transistor 11 and / or the light-leaking transistor 12, that is, the film layer environment of the multiple transistors in the photosensitive unit 10 is consistent, which can reduce the phenomenon of moiré fringes generated by the rubbing process in the manufacturing process of the display product, thereby ensuring uniform brightness and color of the display product.
[0100] The following describes in detail the spatial layout of the multiple dummy transistors 13 in the light sensing unit 10 , the multiple light shielding transistors 11 , and the multiple light leakage transistors 12 in the display panel 100 , and the specific connection methods with the binding electrodes 20 .
[0101] In some embodiments, referring to Figures 3 and 4A to 4B, the light sensing unit 10 is located in the first area B1, a plurality of light-shielding transistors 11 are arranged along the second direction X, a plurality of light-leaking transistors 12 are arranged along the second direction X, and a plurality of dummy transistors 13 are arranged along the second direction X. The light sensing unit 10 includes a light-shielding unit 1, a light-leaking unit 2, and a dummy unit 3. The light-shielding unit 1, the dummy unit 3, and the light-leaking unit 2 are arranged along the second direction X, wherein the dummy unit 3 is disposed between the light-shielding unit 1 and the light-leaking unit 2. The control electrodes 1k of the plurality of light-shielded transistors 11, the control electrodes 3k of the plurality of dummy transistors 13, and the control electrodes 2k of the plurality of light-leaking transistors 12 are electrically connected in sequence via a gate signal line GL, which is electrically connected to the first electrode 21. The first electrodes 1d of the plurality of light-shielded transistors 11 and the first electrodes 2d of the plurality of light-leaking transistors 12 are electrically connected in sequence via a drain signal line DL, which is electrically connected to the second electrode 22. The second electrodes 1s of the plurality of light-shielded transistors 11 are electrically connected to a first source line SB, which is electrically connected to a third electrode 23. The second electrodes 2s of the plurality of light-leaking transistors 12 are electrically connected to a second source line SW, which is electrically connected to a fourth electrode 24. The second electrodes 3s and first electrodes of the plurality of dummy transistors 13 are not connected to the second electrodes 1s and first electrodes of the plurality of light-shielded transistors 11, nor to the second electrodes 2s and first electrodes of the plurality of light-leaking transistors 12, respectively.
[0102] For example, referring to FIG4A , the second electrodes 3s of the plurality of dummy transistors 13 in the figure are electrically connected via a dummy source line XS, wherein the dummy source line XS is electrically isolated from the first source line SB and the second source line SW, and the first electrodes 3d of the plurality of dummy transistors 13 are not connected and are in a floating state.
[0103] For example, referring to FIG4B , the first electrodes 3 d of the plurality of dummy transistors 13 are electrically connected via a dummy drain line XD, wherein the dummy drain line XD is electrically isolated from the drain signal line DL, and the second electrodes 3 s of the plurality of dummy transistors 13 are not connected and are in a floating state.
[0104] For example, referring to Figure 3, there is no connection between the first poles 3d of the multiple virtual transistors 13 in the figure, and the first poles 3d of the multiple virtual transistors 13 are electrically isolated from the first source line SB and the second source line SW; there is no connection between the second poles 3s of the multiple virtual transistors 13, and the second poles 3s of the multiple virtual transistors 13 are electrically isolated from the first source line SB and the second source line SW.
[0105] The operating process of the above-mentioned light sensing unit 10 is as follows: the dimming chip outputs an electrical signal to multiple electrodes. The first electrode 21 transmits a gate control signal, which is transmitted to the multiple light-shielding transistors 11 and the multiple light-leaking transistors 12 via the gate signal line GL, turning on the multiple light-shielding transistors 11 and the multiple light-leaking transistors 12. The second electrode 22 transmits a drain signal, which is transmitted to the multiple light-shielding transistors 11 and the multiple light-leaking transistors 12 via the drain signal line DL. Under the influence of light, the multiple light-leaking transistors 12 generate a large light-sensing current, which is transmitted to the fourth electrode 24 via the second source line SW. The multiple light-shielding transistors 11 are not affected by light and generate a dark current. The dark current is transmitted to the third electrode 23 via the first source line SB. The light-sensing current and the dark current are then transmitted to the light sensing chip. The dummy transistor does not participate in the operation.
[0106] In the above-mentioned layout, a dummy unit 3 is simultaneously provided in the first area B1, so that the transistors in the photosensitive unit 10 can be arranged in the first area along the second direction X, which can ensure that the film layer environment of the transistors in the photosensitive unit 10 is consistent, thereby reducing the phenomenon of moiré fringes generated in the rubbing process (Rubbing Mura) during the manufacturing process of the display product, and ensuring uniform brightness and color of the display product. For example, in a display panel with a high-transmittance display mode (HADS, High Transmittance Advanced Super Dimension Switch), the direction of the rubbing process is along the short side direction of the display panel (i.e., the first direction Y). Since the transistors in the photosensitive unit 10 are arranged uniformly in the second direction X, the risk of rubbing can be reduced. At the same time, since there is no electrical connection between the dummy transistor 13 in the dummy unit 3 and the light-shielding transistor 11 and the light-leaking transistor 12, no signal is input to the dummy transistor 13, which will not affect the normal operation of the light-shielding transistor 11 and the light-leaking transistor 12.
[0107] In some examples, as shown in Figures 3 to 4B , the dummy unit 3 is disposed between the light shielding unit 1 and the light leakage unit 2. A plurality of light shielding transistors 11 are arranged along the second direction X, a plurality of light leakage transistors 12 are arranged along the second direction X, and a plurality of dummy transistors 13 are arranged along the second direction X. The light shielding unit 1, the dummy unit 3, and the light leakage unit 2 are arranged along the second direction X. Correspondingly, the third electrode 23 and the fourth electrode 24 are respectively disposed at the two ends of the plurality of binding electrodes 20 along the second direction X. This arrangement allows the plurality of light shielding transistors 11 to be disposed close to the third electrode 23, and the plurality of light leakage transistors 12 to be disposed close to the fourth electrode 24. This facilitates the arrangement of the first source line SB and the second source line SW. For example, the first source line SB connects the second electrodes 1s of the plurality of light shielding transistors 11 and connects to the third electrode 23 via the third region B3. The second source line SW connects the second electrodes 2s of the plurality of light leakage transistors 12 and connects to the fourth electrode 24 via the fourth region B4. This avoids unnecessary wiring and reduces wiring complexity.
[0108] Exemplarily, the second electrode 22 is close to the third area B3, and the first electrode 21 is close to the fourth area B4, so that the drain signal line DL and the gate signal line GL are respectively arranged in the third area B3 and the fourth area B4. For example, the drain signal line DL connects the first electrodes 2d of multiple light-shielding transistors 11 and multiple light-leakage transistors 12, and is connected to the second electrode 22 through the third area B3. The gate signal line GL connects the control electrodes 2k of multiple light-shielding transistors 11 and multiple light-leakage transistors 12, and is connected to the first electrode 21 through the fourth area B4, avoiding unnecessary winding and reducing the difficulty of wiring.
[0109] In other embodiments, referring to FIG. 5 , a light sensing unit 10 is located in a second area B2, a plurality of light shielding transistors 11 are arranged along a second direction X, a plurality of light leakage transistors 12 are arranged along the second direction X, and a plurality of dummy transistors 13 are arranged along the second direction X. The light sensing unit 10 includes a light shielding unit 1, a light leakage unit 2, and a dummy unit 3. The light shielding unit 1, the dummy unit 3, and the light leakage unit 2 are arranged along the second direction X, wherein the dummy unit 3 is disposed between the light shielding unit 1 and the light leakage unit 2. Multiple groups of fan-out traces 40 are disposed between the display area AA and the bonding area CC. An interval Q is defined between adjacent groups of fan-out traces 40. The interval Q includes a first interval Q1, a second interval Q2, and a third interval Q3. The light shielding unit 1 is located in the first interval Q1, the light leakage unit 2 is located in the second interval Q2, and the dummy unit 3 is located in the third interval Q3. The first electrode 21 includes a first sub-electrode 21a and a second sub-electrode 21b, and the second electrode 22 includes a third sub-electrode 22a and a fourth sub-electrode 22b. The gate signal lines GL include a first gate line GL1 , a second gate line GL2 , and a dummy gate line XG; the drain signal lines DL include a first drain line DL1 , a second drain line DL2 , and a dummy drain line XD.
[0110] Among them, the control electrodes 1k of the plurality of light-shielding transistors 11 are electrically connected in sequence through the first gate line GL1, and the first gate line GL1 is electrically connected to the first sub-electrode 21a, the first electrodes 1d of the plurality of light-shielding transistors 11 are electrically connected in sequence through the first drain line DL1, and the first drain line DL1 is electrically connected to the third sub-electrode 22a; the control electrodes 2k of the plurality of leakage transistors 12 are electrically connected in sequence through the second gate line GL2, and the second gate line GL2 is electrically connected to the second sub-electrode 21b, the first electrodes 2d of the plurality of leakage transistors 12 are electrically connected in sequence through the second drain line DL1. DL2 are electrically connected in sequence, and the second drain line DL2 is electrically connected to the fourth sub-electrode 22b; the control electrodes 3k of multiple virtual transistors 13 are electrically connected in sequence through the virtual gate line XG, and the virtual gate line XG is electrically connected to a virtual electrode 25, the second electrodes 3s of multiple virtual transistors 13 are electrically connected in sequence through the virtual source line XS, and the virtual source line XS is electrically connected to a virtual electrode 25, and the first electrodes 3d of multiple virtual transistors 13 are electrically connected in sequence through the virtual drain line XD, and the virtual drain line XD is electrically connected to a virtual electrode 25.
[0111] As a possible implementation, the first electrodes 3d of the plurality of dummy transistors 13 are not connected to each other and are in a floating state, and / or the second electrodes 3s of the plurality of dummy transistors 13 are not connected to each other and are in a floating state.
[0112] The working process of the above-mentioned photosensitive unit 10 is, for example, as follows: the dimming chip outputs an electrical signal to multiple electrodes, the first sub-electrode 21a and the second sub-electrode 21b transmit gate control signals, and the gate control signals are respectively transmitted to multiple light-shielding transistors 11 and multiple leakage transistors 12 through the first gate line GL1 and the second gate line GL2, so that the multiple light-shielding transistors 11 and the multiple leakage transistors 12 are turned on, the third sub-electrode 22a and the fourth sub-electrode 22b transmit drain signals, and the drain signals are respectively transmitted to the multiple light-shielding transistors 11 and the multiple leakage transistors 12 through the first drain line DL1 and the second drain line DL2, wherein the multiple leakage transistors 12 generate a large photosensitive current under the influence of light, and the photosensitive current is transmitted to the fourth electrode 24 through the second source line SW, and the multiple photosensitive transistors 11 are not affected by the light and generate dark current, which is transmitted to the third electrode 23 through the first source line SB, and then the photosensitive current and the dark current are transmitted to the photosensitive chip.
[0113] It should be noted that the virtual electrode 25 does not provide an electrical signal during the above-mentioned working process. That is, there is no electrical connection between the virtual transistor 13 connected to the virtual electrode 25 through the virtual gate line XG, the virtual drain line XD and the virtual source line XS, and there is no input of electrical signals. Therefore, the virtual transistor 13 does not participate in the work.
[0114] Exemplarily, the display area AA is provided with a plurality of sub-pixels arranged in an array, a plurality of data lines, and a plurality of gate lines. The plurality of data lines extend, for example, along a first direction Y. A plurality of groups of fan-out traces 40 are used to connect the plurality of data lines and the binding electrodes, so that the source driver chip provides data signals to the data lines through the binding electrodes and the fan-out traces. Each group of fan-out traces 40 includes a plurality of fan-out traces, and the plurality of fan-out traces 40 narrow inward in a direction from the display area AA to the binding area CC, forming a fan shape.
[0115] The aforementioned layout of the photosensitive units 10, where the photosensitive units 10 are disposed in the spacer region Q of the second region B2, and each of the photosensitive units 10 is disposed in the gap between two adjacent sets of fan-out traces 40, makes the wiring and device configuration of the second region B2 more compact, thereby avoiding wasted space on the display panel 100 and improving the space utilization of the display panel 100. Furthermore, the provision of the dummy units 3 ensures a consistent film environment for the transistors in the photosensitive units 10, thereby reducing the moiré effect caused by the rubbing process during the display product manufacturing process and ensuring uniform brightness and color of the display product. Furthermore, since the dummy transistors 13 in the dummy units 3 are not electrically connected to the light-shielding transistors 11 and the light-leaking transistors 12, no signal is input to the dummy transistors 13, which does not affect the normal operation of the light-shielding transistors 11 and the light-leaking transistors 12.
[0116] In some examples, as shown in FIG5 , a plurality of light-shielding transistors 11 are arranged along a second direction X, a plurality of light-leaking transistors 12 are arranged along the second direction X, and a plurality of dummy transistors 13 are arranged along the second direction X. The light-sensing unit 10 includes a light-shielding unit 1, a light-leaking unit 2, and a dummy unit 3. The light-shielding unit 1, the dummy unit 3, and the light-leaking unit 2 are arranged along the second direction X, and the dummy unit 3 is disposed between the light-shielding unit 1 and the light-leaking unit 2. The plurality of dummy transistors 13, the plurality of light-shielding transistors 11, and the plurality of light-leaking transistors 12 are arranged along the second direction X, and the light-shielding unit 1, the light-leaking unit 2, and the dummy unit 3 are all located in an interval Q between two adjacent sets of fan-out traces 40. Correspondingly, binding electrodes 20 electrically connected to the light-shielding unit 1, the light-leaking unit 2, and the dummy unit 3 are respectively disposed near the first interval Q1, the second interval Q2, and the third interval Q3 and on both sides along the second direction X. This arrangement facilitates the connection between the light-shielding unit 1, the light-leaking unit 2, and the dummy unit 3 in the light-sensing unit 10 and their corresponding binding electrodes 20, avoiding unnecessary wiring and reducing wiring difficulty.
[0117] Exemplarily, the third sub-electrode 22a and the third electrode 23 are arranged near the first spacing area Q1, and the fourth sub-electrode 22b and the fourth electrode 24 are arranged near the second spacing area Q2, so that the first drain line DL1, the first gate line GL1 and the first source line SB are all arranged in the first spacing area Q1, and the second drain line DL2, the second gate line GL2 and the second source line SW are all arranged in the second spacing area Q2. For example, the first drain line DL1 is connected to the first electrodes 1d of multiple light-shielding transistors 11, and the second drain line DL2 is connected to the first electrodes 2d of multiple light-leaking transistors 12. The virtual electrode 25 is arranged near the third spacing area Q3, and the virtual gate line XG, the virtual drain line XD and the virtual source line XS are all arranged in the third spacing area Q3. In the process of connecting the above-mentioned signal lines with the corresponding binding electrodes 20, it is equivalent to shortening the length of the signal lines, avoiding unnecessary winding, and reducing the difficulty of wiring.
[0118] In some further embodiments, referring to FIG6 , the light shielding unit 1 is located in the third area B3, and the light leakage unit 2 is located in the fourth area B4, wherein the multiple dummy transistors 13 of the dummy unit 3 include multiple first dummy transistors 131 and multiple second dummy transistors 132; the multiple first dummy transistors 131 are located in the third area B3, the multiple second dummy transistors 132 are located in the fourth area B4, the multiple light shielding transistors 11 are arranged along the first direction Y, the multiple light leakage transistors 12 are arranged along the first direction Y, the multiple first dummy transistors 131 are arranged along the first direction Y, and the multiple second dummy transistors 132 are arranged along the first direction Y; the light shielding unit 1 and the multiple first dummy transistors 131 are arranged along the first direction Y, the light leakage unit 2 and the multiple second dummy transistors 132 are arranged along the first direction Y; the multiple first dummy transistors 131 are arranged along the first direction Y Relative to the multiple light-shielding transistors 11, they are far away from the multiple binding electrodes 20; relative to the multiple leakage transistors 12, the multiple second virtual transistors 132 are far away from the multiple binding electrodes 20; the first electrode 21 includes a first sub-electrode 21a and a second sub-electrode 21b, and the second electrode 22 includes a third sub-electrode 22a and a fourth sub-electrode 22b; the gate signal line GL includes a first gate line GL1, a second gate line GL2 and a virtual gate line XG; the drain signal line DL includes a first drain line DL1, a second drain line DL1 and a virtual drain line XD; the virtual gate line XG includes a first virtual gate line XG1 and a second virtual gate line XG2, the virtual drain line XD includes a first virtual drain line XD1 and a second virtual drain line XD2, and the virtual source line XD includes a first virtual source line XS1 and a second virtual source line XS2.
[0119] Among them, the control electrodes 1k of multiple light-shielding transistors 11 are electrically connected in sequence through the first gate line GL1, and the first gate line GL1 is electrically connected to the first sub-electrode 21a, and the first electrodes 1d of multiple light-shielding transistors 11 are electrically connected in sequence through the first drain line DL1, and the first drain line DL1 is electrically connected to the third sub-electrode 22a; the control electrodes 2k of multiple leakage transistors 12 are all electrically connected to the second gate line GL2, and the second gate line GL2 is electrically connected to the second sub-electrode 21b, the first electrodes 2d of multiple leakage transistors 12 are all electrically connected to the second drain line DL2, and the second drain line DL2 is electrically connected to the fourth sub-electrode 22b.
[0120] In some examples, the control electrodes 4k of the plurality of first dummy transistors 131 are sequentially electrically connected via a first dummy gate line XG1, the second electrodes 4d of the plurality of first dummy transistors 131 are sequentially electrically connected via a first dummy source line XS1, and the first electrodes 4s of the plurality of first dummy transistors 131 are sequentially electrically connected via a first dummy drain line XD1. The control electrodes 5k of the plurality of second dummy transistors 132 are sequentially electrically connected via a second dummy gate line XG2, the second electrodes 5d of the plurality of second dummy transistors 132 are sequentially electrically connected via a second dummy source line XS2, and the first electrodes 5s of the plurality of second dummy transistors 132 are sequentially electrically connected via a second dummy drain line XD2. For example, the plurality of first dummy transistors 131 have no electrical relationship with the plurality of light-shielding transistors 11, and the plurality of second dummy transistors 132 have no electrical relationship with the plurality of light-leaking transistors 12. Alternatively, the first virtual drain line XD1 is electrically connected to the first drain line DL1, and the first virtual gate line XG1 is electrically connected to the first gate line GL1, that is, there is an electrical relationship between the first poles 4s / control poles of the multiple first virtual transistors 131 and the first poles 1d / control poles 1k of the multiple light-shielding transistors 11, but since the second poles of the first virtual transistors 131 are not connected to the electrode, the first virtual transistor 131 does not participate in the work; the second virtual transistor 132 refers to the connection method of the multiple first virtual transistors 131 and will not be repeated here.
[0121] As a possible implementation, the first electrodes 4s of the plurality of first dummy transistors 131 are not connected to each other and are in a floating state, and / or the second electrodes of the plurality of first dummy transistors 13 are not connected to each other and are in a floating state. Alternatively, the first electrodes 5s of the plurality of second dummy transistors 132 are not connected to each other and are in a floating state, and / or the second electrodes 5d of the plurality of second dummy transistors 132 are not connected to each other and are in a floating state.
[0122] The working process of the above-mentioned photosensitive unit is, for example, as follows: the dimming chip outputs an electrical signal to multiple electrodes, the first sub-electrode 21a and the second sub-electrode 21b transmit gate control signals, and the gate control signals are respectively transmitted to multiple light-shielding transistors 11 and multiple leakage transistors 12 through the first gate line GL1 and the second gate line GL2, so that the multiple light-shielding transistors 11 and the multiple leakage transistors 12 are turned on, the third sub-electrode 22a and the fourth sub-electrode 22b transmit drain signals, and the drain signals are respectively transmitted to the multiple light-shielding transistors 11 and the multiple leakage transistors 12 through the first drain line DL1 and the second drain line DL2, wherein the multiple leakage transistors 12 generate a large photosensitive current under the influence of light, and the photosensitive current is transmitted to the fourth electrode 24 through the second source line SW, and the multiple photosensitive transistors 11 are not affected by the light and generate dark current, which is transmitted to the third electrode 23 through the first source line SB, and then the photosensitive current and the dark current are transmitted to the photosensitive chip.
[0123] It should be noted that, referring to Figure 6, it can be seen from the figure that the multiple first virtual transistors 131 have no electrical relationship with the multiple light-shielding transistors 11, or the two have an electrical relationship but the second pole of the first virtual transistor 131 is not connected to the electrode, and the multiple second virtual transistors 132 have no electrical relationship with the multiple light-leaking transistors 12, or the two have an electrical relationship but the second pole of the second virtual transistor 132 is not connected to the electrode. The multiple first virtual transistors 131 and the multiple second virtual transistors 132 have no input and output of electrical signals. Therefore, in the above working process, the multiple first virtual transistors 131 and the multiple second virtual transistors 132 do not participate in the work.
[0124] In the above-mentioned layout, multiple light-shielding transistors 11 are arranged along the first direction Y, multiple light-leaking transistors 12 are arranged along the first direction Y, multiple first dummy transistors 131 are arranged along the first direction Y, and multiple second dummy transistors 132 are arranged along the first direction Y. The multiple dummy transistors 13 are divided into multiple first dummy transistors 131 and multiple second dummy transistors 132. In the third area B3, the multiple first dummy transistors 131 and the light-shielding unit 1 all extend along the first direction Y. In the fourth area B4, the multiple second dummy transistors 132 and the light-leaking unit 2 all extend along the first direction Y. This can ensure that the film layer environment of the transistors in the photosensitive unit 10 is consistent, thereby reducing the phenomenon of moiré fringes generated in the friction process (Rubbing) during the preparation process of the display product, and ensuring uniform brightness and color of the display product. For example, when the display panel adopts the ADS (Advanced Super Dimension Switch) display mode, the rubbing direction of the rubbing process is along the long side direction of the display panel 100 (i.e., the second direction X). Since the transistors in the photosensitive unit 10 are arranged uniformly in the first direction Y, the risk of rubbing can be reduced.
[0125] In some examples, as shown in FIG6 , the plurality of first dummy transistors 131 are away from the plurality of binding electrodes 20 relative to the plurality of light-shielding transistors 11, and the plurality of second dummy transistors 132 are away from the plurality of binding electrodes 20 relative to the plurality of light-leaking transistors 12; correspondingly, the binding electrodes 20 connected to the plurality of light-shielding transistors 11 and the binding electrodes connected to the plurality of light-leaking transistors 12 are respectively arranged at the two ends of the plurality of binding electrodes 20 along the second direction X. This arrangement facilitates the wiring of the signal lines connecting the transistors and the corresponding binding electrodes 20, shortens their length, avoids unnecessary winding or crossing, and reduces the difficulty of wiring.
[0126] Exemplarily, the third sub-electrode 22a and the third electrode 23 are arranged close to the third area B3, and the fourth sub-electrode 22b and the fourth electrode 24 are arranged close to the fourth area B4. In this way, the first drain line DL1, the first gate line GL1 and the first source line SB connecting the multiple light-shielding transistors 11 are close to the corresponding binding electrodes. At the same time, the second drain line DL2, the second gate line GL2 and the second source line SW connecting the multiple leakage transistors 12 are close to the corresponding binding electrodes. In the process of connecting the above-mentioned signal lines with the corresponding binding electrodes 20, the length of the signal lines is shortened, and unnecessary winding or crossing can be avoided, while reducing the difficulty of wiring.
[0127] Typically, when detecting ambient light, phototransistors are often used as light-sensing elements. The number of phototransistors on a display panel needs to be determined by simulating the current size and combining it with actual measurements of the characteristics of the phototransistors. At the same time, the current monitoring of the matching circuit needs to be matched. Therefore, after the number of phototransistors on the display panel is determined, there may be an impact of improper matching during the subsequent circuit debugging process. Based on this, the following embodiments of the present disclosure provide a specific solution for reasonably selecting the number of phototransistors by laser cutting / welding during the debugging stage of the light-sensing screen circuit.
[0128] The following describes a method for changing the number of light-shielding transistors / light-leakage transistors by laser cutting.
[0129] In some embodiments, referring to Figure 7, on the basis that the control electrodes 1k of multiple light-shielding transistors 11 are electrically connected to the gate signal line GL, the first electrodes 1d of multiple light-shielding transistors 11 are electrically connected to the drain signal line DL, the second electrodes 1s of multiple light-shielding transistors 11 are electrically connected to the first source line SB, and there is at least one first cutting position G1 on the first source line SB, and the first cutting position G1 is located between the second electrodes of any two light-shielding transistors 11.
[0130] In other embodiments, referring to Figure 8, on the basis that the control electrodes 2k of multiple leakage transistors 12 are electrically connected to the gate signal line GL, the first electrodes 2d of multiple leakage transistors 12 are electrically connected to the drain signal line DL, the second electrodes 2s of multiple leakage transistors 12 are electrically connected to the second source line SW, and there is at least one second cutting position G2 on the second source line SW, and the second cutting position G2 is located between the second electrodes of any two adjacent leakage transistors 12.
[0131] In some other embodiments, referring to Figure 9, on the basis that the control electrodes 1k of multiple light-shielding transistors 11 are electrically connected to the gate signal line GL, and the first electrodes 1d of multiple light-shielding transistors 11 are electrically connected to the drain signal line DL, on the basis that the control electrodes 2k of multiple leakage transistors 12 are electrically connected to the gate signal line GL, and the first electrodes 2d of multiple leakage transistors 12 are electrically connected to the drain signal line DL, the second electrodes 1s of multiple light-shielding transistors 11 are electrically connected to the first source line SB, and the first source line SB has at least one first cutting position G1, and the first cutting position G1 is located between the second electrodes of any two light-shielding transistors 11; the second electrodes 2s of multiple leakage transistors 12 are electrically connected to the second source line SW, and the second source line SW has at least one second cutting position G2, and the second cutting position G2 is located between the second electrodes of any two adjacent leakage transistors 12.
[0132] The above-mentioned setting of the first cutting position G1 and the second cutting position G1 is mainly used for selecting the number of working light-shielding transistors 11 and light-leaking transistors 12 in the photosensitive unit 10. If, during the circuit debugging process, it is found that the number of designed light-shielding transistors 11 is too many, or the number of designed light-leaking transistors 12 is too many, the first cutting position G1 on the first source line SB connecting multiple light-shielding transistors 11 can be laser cut, or the second cutting position G2 connecting multiple light-leaking transistors 12 can be laser cut to change the number of actually working light-shielding transistors 11 and light-leaking transistors 12. For example, referring to Figure 9, the laser cutting is performed at the first cutting position G1, that is, the first cutting position G1 is used as the critical position, and the shading transistors 11 close to the virtual transistor 13 among the multiple shading transistors 11 will not participate in the work, and the shading transistors 11 on the side away from the virtual transistor 13 are retained and continue to work, which is equivalent to reducing the number of shading transistors 11; and the laser cutting is performed at the second cutting position G2, that is, the second cutting position G2 is used as the critical position, and the shading transistors 11 close to the virtual transistor 13 among the multiple leakage transistors 12 will not participate in the work, and the leakage transistors 12 on the side away from the virtual transistor 13 are retained and continue to work, which is equivalent to reducing the number of leakage transistors 12; by selecting laser cutting at an appropriate position, it is ensured that in the process of the dimming chip adjusting the light brightness, the number of shading transistors 11 and leakage transistors 12 in the light sensing unit 10 is set within a reasonable range.
[0133] It should be noted that setting the first cutting position G1 on the first source line SB and setting at least one second cutting position G2 on the second source line SW is applicable to the solution corresponding to any one of FIG. 3 to FIG. 6 .
[0134] The following describes a method for changing the number of light-shielding transistors and light-leaking transistors by laser welding.
[0135] In some embodiments, as shown in Figures 10A to 10C, the photosensitive unit 10 is located in the first area B1, and the control electrodes 3k of the multiple dummy transistors 13 are electrically connected to the control electrodes 1k of the multiple light-shielding transistors 11 and the control electrodes 2k of the multiple leakage transistors 12, for example, they are all electrically connected to the gate signal line GL; the first electrodes 3d of the multiple dummy transistors 13 are electrically connected in sequence, and are electrically connected to the first electrodes 1d of the multiple light-shielding transistors 11 and the first electrodes 2d of the multiple leakage transistors 12, for example, they are all electrically connected to the drain signal line DL; the second electrodes 3s of the multiple dummy transistors 13 are all electrically connected to the virtual source line XS.
[0136] In some examples, referring to FIG. 10A , a first welding position R1 is defined between the first source line SD and the dummy source line XS. The first source line SD and the dummy source line XS can be electrically connected at the first welding position R1 under an external force.
[0137] In other examples, referring to FIG. 10B , a second welding position R2 is defined between the second source line SW and the dummy source line XS. The second source line SW and the dummy source line XS can be electrically connected at the second welding position R2 under the action of an external force.
[0138] In some other examples, as shown in Figure 10C, there is a first welding position R1 between the first source line SD and the virtual source line XS, and a second welding position R2 between the second source line SW and the virtual source line XS. During the actual debugging process, one of the first welding position R1 and the second welding position R2 is selected for welding as needed.
[0139] It should be noted that, in the above-mentioned photosensitive unit 10, there is no electrical connection between the first source line SD and the virtual source line XS, there is no electrical connection between the second source line SW and the virtual source line XS, and the virtual transistor does not participate in the work. During the circuit debugging process, it is necessary to use external force (such as laser) to enable the first source line SD and the virtual source line XS to be welded, or the second source line SW and the virtual source line XS to be welded, so that each virtual transistor 13 in the virtual unit 3 can access the electrical signal.
[0140] The above-mentioned setting of the first welding position R1 and the second welding position R2 can regulate the number of light-shielding transistors and / or light-leaking transistors that are actually working. If, during the circuit debugging process, it is found that the number of designed light-shielding transistors is too small, or the number of designed light-leaking transistors 12 is too small, the first source line SD and the virtual source line XS are welded at the first welding position R1 by laser action between the first source line SD and the virtual source line XS to achieve electrical connection. At this time, in the virtual unit 3, multiple virtual transistors 13 and multiple light-shielding transistors 11 can receive the same signal, and the virtual transistors 13 can play the role of light-shielding transistors 11, which is equivalent to converting all virtual transistors 13 into light-shielding transistors 11, thereby increasing the number of light-shielding transistors 11. Similarly, by acting on the second source line SW and the virtual The second welding position R2 of the source line XS enables the second source line SW and the virtual source line XS to be welded at the second welding position R2 to achieve electrical connection. At this time, in the virtual unit 3, multiple virtual transistors 13 and multiple leakage transistors 12 can receive the same signal, and the virtual transistors 13 can also play the role of leakage transistors 12, which is equivalent to converting all virtual transistors 13 into leakage transistors 12, thereby increasing the number of leakage transistors 12. Therefore, the above-mentioned setting of the first welding position R1 and the second welding position R2 can ensure that when the dimming chip is adjusting the light brightness, the number of the light-shielding transistors 11 and the light-leaking transistors 12 in the light-sensing unit 10 is controlled to be within a reasonable range.
[0141] 10D , the virtual source line XS includes at least two disconnected virtual source sub-lines XSa, with a third welding position R3 between two adjacent virtual source sub-lines XSa. The two adjacent virtual source sub-lines XSa can be electrically connected at the third welding position R3 under the action of external force.
[0142] Exemplarily, referring to Figure 10D, the virtual source line XS in the figure includes three disconnected virtual source sub-lines XSa, and there is a third welding position R3 between two adjacent virtual source sub-lines XSa. Figure 10C also includes a first welding position R1 and a second welding position R2. Multiple virtual transistors 13 are divided into three groups according to multiple welding positions, and each group includes two virtual transistors. Hereinafter, the two virtual transistors between the first welding position R1 and the third welding position R3 close to the side of the shading unit 1 are referred to as the first group of virtual transistors, the two virtual transistors between the two adjacent third welding positions R3 are referred to as the second group of virtual transistors, and the two virtual transistors between the third welding position R3 close to the side of the leakage unit 2 and the second welding position R2 are referred to as the third group of virtual transistors. The first welding position R1 is position a, the third welding position R3 close to the side of the shading unit 1 is position b, the third welding position R3 close to the side of the leakage unit 2 is position c, and the second welding position R2 is position d.
[0143] As shown in FIG10D , when the laser welding process is used to weld the first welding position R1 (position a) between the first source line SD and the dummy source line XS, the first group of dummy transistors and the multiple light-shielding transistors 11 can receive the same signal, and the first group of dummy transistors can also play the role of the light-shielding transistors 11, that is, the number of light-shielding transistors 11 is increased. On this basis, if the number of light-shielding transistors 11 is still insufficient when the dimming chip is adjusting the light brightness, the laser welding process can be used to further electrically connect the dummy source sub-lines XSa at both ends of the third welding position R3 (position b) close to the side of the light-shielding unit 1. At this time, the second group of dummy transistors also receives the source signal of the first source line SB to increase the number of light-shielding transistors 11. Similarly, the third welding position R3 (position c) close to the side of the light-leakage unit 2 is electrically connected. At this time, the third group of dummy transistors can also receive the source signal of the first source line SB, further increasing the number of light-shielding transistors and achieving a reasonable adjustment of the number of light-shielding transistors.
[0144] Continuing with reference to FIG10D , when the laser welding process is used to weld the second welding position R2 between the second source line SW and the virtual source line XS (position d), the third group of virtual transistors and the multiple leakage transistors 12 can receive the same signal, and the third group of virtual transistors can also play the role of the leakage transistor 12, that is, the number of leakage transistors 12 is increased; on this basis, if the number of leakage transistors 12 is still insufficient in the process of adjusting the light brightness of the dimming chip, the virtual source sub-lines XSa at both ends of the third welding position R3 (position c) close to the side of the leakage unit 2 can be further electrically connected through the laser welding process. At this time, the second group of virtual transistors also receives the source signal of the second source line SW to increase the number of shading transistors. Similarly, the third welding position R3 (position b) close to the side of the shading unit 1 is electrically connected, and the first group of virtual transistors can also receive the source signal of the second source line SW at this time, further increasing the number of shading transistors 11, so as to reasonably adjust the number of shading transistors 11.
[0145] In some other examples, a laser welding process is used to weld the first welding position R1 (position a) between the first source line SD and the dummy source line XS, so that the first group of dummy transistors and the plurality of light-shielding transistors 11 can receive the same signal, and the first group of dummy transistors are converted into light-shielding transistors 11. Simultaneously, a laser welding process is used to weld the second welding position R2 (position d) between the second source line SW and the dummy source line XS, so that the third group of dummy transistors and the plurality of light-leaking transistors 12 can receive the same signal, and the third group of dummy transistors are converted into light-shielding transistors 11. No welding is done at the two third welding positions R3, that is, there is no electrical connection between the dummy source sub-line XSa electrically connected to the second group of dummy transistors and other signal lines, and the second group of dummy transistors are not connected to any electrical signals and remain non-functional.
[0146] The above only gives several examples of the first welding position R1, the second welding position R2 and the third welding position R3 during use. The number of third welding positions R3 can be more, and multiple choices can be made as needed during the actual debugging process. The above setting of the third welding position R3 can be more reasonable according to the need to adjust the light brightness, and can accurately adjust the number of shading transistors 11 and light leakage transistors 12.
[0147] In some embodiments, referring to Figure 11A, the shading unit 1 is located in the third area B3, the light leakage unit 2 is located in the fourth area B4, and the control electrodes 4k of the multiple first virtual transistors 131 and the control electrodes 1k of the multiple light-shielding transistors 11 are electrically connected, for example, they are all electrically connected to the first gate line GL1; the first electrodes 4s of the multiple first virtual transistors 131 and the first electrodes 1d of the multiple light-shielding transistors 11 are electrically connected, for example, they are all electrically connected to the first drain line DL1; the second electrodes 4d of the multiple first virtual transistors 131 are all electrically connected to the light-shielding virtual source line ZXS; there is a fourth welding position R4 between the first source line SB and the light-shielding virtual source line ZXS, and the first source line SB and the light-shielding virtual source line ZXS can be electrically connected at the fourth welding position R4 under the action of external force.
[0148] In other embodiments, referring to Figure 11B, the shading unit 1 is located in the third area B3, the light leakage unit 2 is located in the fourth area B4, the control electrodes 5k of the multiple second dummy transistors 132 and the control electrodes 2k of the multiple leakage transistors 12 are electrically connected, for example, they are all electrically connected to the second gate line GL2; the first electrodes 5s of the multiple second dummy transistors 132 and the first electrodes 2d of the multiple leakage transistors 12 are electrically connected, for example, they are all electrically connected to the second drain line DL2; the second electrodes 5d of the multiple second dummy transistors 132 are all electrically connected to the leakage virtual source line LXS; there is a fifth welding position R5 between the second source line SW and the leakage virtual source line LXS, and the second source line SW and the leakage virtual source line LXS can be electrically connected at the fifth welding position R5 under the action of external force.
[0149] In some other embodiments, referring to FIG11C , the light shielding unit 1 is located in the third area B3, the light leakage unit 2 is located in the fourth area B4, the control electrodes 4k of the plurality of first dummy transistors 131 are electrically connected to the control electrodes 1k of the plurality of light shielding transistors 11, the first electrodes 4s of the plurality of first dummy transistors 131 are electrically connected to the first electrodes 1d of the plurality of light shielding transistors 11; the second electrodes 4d of the plurality of first dummy transistors 131 are all electrically connected to the light shielding virtual source line ZXS; a fourth welding position R4 is provided between the first source line SB and the light shielding virtual source line ZXS, and the first source line SB and the light shielding virtual source line ZXS can Under the action of external force, they are electrically connected at the fourth welding position R4; the control electrodes 5k of the multiple second virtual transistors 132 are electrically connected to the control electrodes 2k of the multiple leakage transistors 12, and the first electrodes 5s of the multiple second virtual transistors 132 are electrically connected to the first electrodes 2d of the multiple leakage transistors 12; the second electrodes 5d of the multiple second virtual transistors 132 are all electrically connected to the leakage virtual source line LXS; there is a fifth welding position R5 between the second source line SW and the leakage virtual source line LXS, and the second source line SW and the leakage virtual source line LXS can be electrically connected at the fifth welding position R5 under the action of external force.
[0150] It should be noted that the fourth welding position R4 and the fifth welding position R5 set above can regulate the number of light-shielding transistors and / or light-leaking transistors actually in operation. If, during the circuit debugging process, it is found that the number of designed light-shielding transistors is too small, or the number of designed light-leaking transistors is too small, the laser is applied to the fourth welding position R4 between the first source line SD and the light-shielding virtual source line ZXS, so that the first source line SD and the light-shielding virtual source line ZXS are welded at the fourth welding position R4 to achieve electrical connection. At this time, in the virtual unit 3, the multiple first virtual transistors 131 and the multiple light-shielding transistors 11 can receive the same signal, and the first virtual transistors 131 can also play the role of the light-shielding transistor 11, which is equivalent to converting all the first virtual transistors 131 into light-shielding transistors 11, that is, increasing the number of light-shielding transistors 11; similarly, the laser is applied to the second source line SW and the light-leaking virtual source line ZXS. The fifth welding position R5 of the optical virtual source line LXS enables the second source line SW and the light leakage virtual source line LXS to be welded at the fifth welding position R5 to achieve electrical connection. At this time, in the virtual unit 3, multiple second virtual transistors 132 and multiple light leakage transistors 12 can receive the same signal, and the second virtual transistors 132 can play the role of the light leakage transistor 12, which is equivalent to converting all the second virtual transistors 132 into light leakage transistors 12, that is, increasing the number of light leakage transistors 12; therefore, the above-mentioned setting of the fourth welding position R4 and the fifth welding position R5 can also ensure that in the process of the dimming chip adjusting the light brightness, the number of light shielding transistors 11 and light leakage transistors 12 in the light sensing unit 10 is controlled within a reasonable range.
[0151] In some embodiments, referring to Figure 12A, the shading virtual source line ZXS includes at least two disconnected shading virtual source sub-lines ZXS1, each shading virtual source sub-line ZXS1 is electrically connected to at least one first virtual transistor 131; there is a sixth welding position R6 between two adjacent shading virtual source sub-lines ZXS1, and the two adjacent shading virtual source sub-lines ZXS1 can be electrically connected at the sixth welding position R6 under the action of external force.
[0152] For example, referring to FIG12A, the light-shielding virtual source line ZXS includes two disconnected light-shielding virtual source sub-lines ZXS1, and there is a sixth welding position R6 between the two adjacent light-shielding virtual source sub-lines ZXS1. Taking the virtual unit 3 as an example, in which two first virtual transistors 131 are included, each first virtual transistor 131 is electrically connected to a light-shielding virtual source sub-line ZXS1. Referring to the description in the foregoing part, when the laser welding process is used to weld the first source line SB and the light-shielding virtual source sub-line ZXS1 close to the light-shielding unit 1 at the fourth welding position R4, at this time, the two first virtual transistors 131 close to the light-shielding unit 1 are connected. The first virtual transistor 131 on one side of unit 1 receives the signal transmitted by the first source line SB, which is equivalent to the first virtual transistor 131 being converted into a light-shielding transistor, and the other first virtual transistor 131 does not receive the signal; on this basis, if the number of light-shielding transistors is still insufficient, the sixth welding position R6 between the two light-shielding virtual source sub-lines ZXS1 is laser-welded, and the two first virtual transistors 131 can both receive the signal transmitted by the first source line SB. Through the above-mentioned laser welding process and the setting of the corresponding welding position, a more refined control of the number of light-shielding transistors 11 can be achieved to keep it within a reasonable range.
[0153] In some embodiments, referring to Figure 12B, the light-leaking virtual source line LXS includes at least two disconnected light-leaking virtual source sub-lines LXS1, each light-leaking virtual source sub-line ZXS1 is electrically connected to at least one second virtual transistor 132; there is a seventh welding position R7 between two adjacent light-leaking virtual source sub-lines LXS1, and the two adjacent light-leaking virtual source sub-lines LXS1 can be electrically connected at the seventh welding position R7 under the action of external force.
[0154] For example, referring to FIG12B, the light-leaking virtual source line LXS includes two disconnected light-leaking virtual source sub-lines LXS1, and there is a seventh welding position R7 between the two adjacent light-leaking virtual source sub-lines LXS1. Taking the virtual unit 3 as an example, in which two second virtual transistors 132 are included, each second virtual transistor 132 is electrically connected to one light-leaking virtual source sub-line LXS1. Referring to the description in the foregoing part, when the laser welding process is used to weld the fifth welding position R5 between the first source line SB and the light-leaking virtual source sub-line LXS1 on the side of the light-shielding unit 1, at this time, the second virtual transistor 132 on the side of the light-leaking unit 1 is connected to the light-leaking virtual source sub-line LXS1. 2 receives the signal transmitted by the second source line SW, which is equivalent to the second dummy transistor 132 being converted into a light-leaking transistor 12, and the other second dummy transistor 132 is not connected to the signal; on this basis, if the number of light-leaking transistors 12 is still insufficient, after laser welding the seventh welding position R7 between the two light-leaking dummy source sub-lines LXS1, both second dummy transistors 132 can receive the signal transmitted by the second source line SW. Through the above-mentioned laser welding process and the setting of the corresponding welding positions, more refined control of the number of light-leaking transistors 12 can be achieved, so that it is kept within a reasonable range.
[0155] In some embodiments, referring to Figure 12C, the light-shielding virtual source line ZXS includes at least two disconnected light-shielding virtual source sub-lines ZXS1, each light-shielding virtual source sub-line ZXS1 is electrically connected to at least one first virtual transistor 131; there is a sixth welding position R6 between two adjacent light-shielding virtual source sub-lines ZXS1, and the two adjacent light-shielding virtual source sub-lines ZXS1 can be electrically connected at the sixth welding position R6 under the action of external force; the light-leaking virtual source line LXS includes at least two disconnected light-leaking virtual source sub-lines LXS1, each light-leaking virtual source sub-line ZXS1 is electrically connected to at least one second virtual transistor 132; there is a seventh welding position R7 between two adjacent light-leaking virtual source sub-lines LXS1, and the two adjacent light-leaking virtual source sub-lines LXS1 can be electrically connected at the seventh welding position R7 under the action of external force.
[0156] Exemplarily, referring to Figure 12C, the light-shielding virtual source line ZXS includes two disconnected light-shielding virtual source sub-lines ZXS1, and there is a sixth welding position R6 between the two adjacent light-shielding virtual source sub-lines ZXS1. Taking the virtual unit 3 as an example including two first virtual transistors 131, each first virtual transistor 131 is electrically connected to a light-shielding virtual source sub-line ZXS1; the light-leaking virtual source line LXS includes two disconnected light-leaking virtual source sub-lines LXS1, and there is a seventh welding position R7 between the two adjacent light-leaking virtual source sub-lines LXS1. Taking the virtual unit 3 as an example including two second virtual transistors 132, each second virtual transistor 132 is electrically connected to a light-leaking virtual source sub-line LXS1; this setting method has the same beneficial effects as the aforementioned part, and can more finely regulate the number of light-shielding transistors 11 and light-leaking transistors 12 to remain within a reasonable range, which will not be elaborated here.
[0157] The following describes the film structure of the display panel, the structure of the welding position and the method for achieving the welding.
[0158] In some embodiments, referring to FIG13A, FIG13B and FIG13C, the display panel 100 further includes a base substrate 101, a gate layer 102, an insulating layer 103, an active layer 104, a metal layer 105, a passivation layer 106 and a connection layer 107. The gate layer 102 is disposed on one side of the base substrate 101, and the gate layer 102 includes a first connection line 1021; the insulating layer 103 is disposed on a side of the gate layer 102 away from the base substrate 101; the active layer 104 is disposed on a side of the insulating layer 103 away from the base substrate 101, and includes a plurality of active patterns 104. 1; the metal layer 105 is arranged on the side of the active layer 104 away from the base substrate 101, the metal layer 105 includes the first and second electrodes of multiple transistors T, and multiple signal lines L, the multiple signal lines L include: a first source line SB, a second source line SW, a virtual source line XS, a light-shielding virtual source line ZXS, and a light-leaking virtual source line LXS; the passivation layer 106 is arranged on the side of the metal layer 105 away from the base substrate 101; the connection layer 107 is arranged on the side of the passivation layer 106 away from the base substrate 101; the connection layer 107 includes a second connection line 1071.
[0159] Among them, the two signal lines that need to be electrically connected under the action of external force are the first signal line 1051 and the second signal line 1052, the second connecting line 1071 is electrically connected to the first signal line 1051 through the first via O1 penetrating the passivation layer 106, and the second connecting line 1071 is electrically connected to the first connecting line 1021 through the second via O2 penetrating the passivation layer 106 and the insulating layer 103; the first connecting line 1021 and the second signal line 1052 at least partially overlap, and the overlapping position of the two is the welding position R; the welding position R includes the first welding position R1, the second welding position R2, the third welding position R3, the fourth welding position R4, the fifth welding position R5, the sixth welding position R6 and the seventh welding position R7.
[0160] It should be noted that the first signal line 1051 and the second signal line 1052 are both arranged in the metal layer 105, wherein the first signal line 1051 can be the first source line SB, the second source line SW or the virtual source line XS, and the second signal line 1052 can be the light-shielding virtual source line ZXS or the light-leaking virtual source line LXS; the first connecting line 1021 and the second signal line 1052 at least partially overlap, that is, the first connecting line 1021 and the second signal line 1052 at least partially overlap in the orthographic projection of the base substrate 101, and the position where the orthographic projections of the two overlap is the welding position R, that is, the laser welding process can be used to electrically connect the second signal line 1052 located in the metal layer 105 and the first connecting line 1021 located in the gate layer 102. The above Figures 13A and 13B show the structural diagrams of the mutual welding between the light-shielding transistor 11 and the virtual transistor 13. For the welding structures between other transistors, refer to Figures 13A, 13B and 13C.
[0161] For example, referring to FIG13A, FIG13B and FIG13C, FIG13A is a structural diagram showing the electrical connection between the first signal line 1051 and the second signal line 1052 at the welding position R, for example, the first welding position R1, and FIG13B and FIG13C are cross-sectional views of FIG13A at the cross-sectional line FF'. FIG13B is a structural diagram before the electrical connection between the first signal line 1051 and the second signal line 1052, and FIG13C is a structural diagram before the electrical connection between the first signal line 1051 and the second signal line 1052. 52 is a structural diagram after electrical connection, in which the first signal line 1051 is the first source line SB, the second signal line 1052 is the virtual source line XS, the first source line SB and the virtual source line XS are located in the same layer and extend in the same direction, a first connecting line 1021 and a second connecting line 1071 are provided between the first source line SB and the virtual source line XS, the first connecting line 1021 and the virtual source line XS partially overlap with the orthographic projection of the base substrate 101, and the second connecting line 1071 is provided between the first source line SB and the virtual source line XS. 71 overlaps with the orthographic projection of the first source line SB on the base substrate 101, and the second connecting line 1071 located in the connecting layer 107 is electrically connected to the first signal line 1051 through the first via O1 penetrating the passivation layer 106. At the same time, the second connecting line 1071 is electrically connected to the first connecting line 1021 located in the gate layer 102 through the second via O2 penetrating the passivation layer 106 and the insulating layer 103. That is to say, the second connecting line 1071 can transfer the signal transmitted by the first source line SB to the first connecting line 1021, and through the action of external force, the first connecting line 1021 and the virtual source line XS are further welded in the overlapping part (welding position R) of the orthographic projection of the base substrate 101, such as the area G, to achieve electrical connection between the first signal line 1051 and the virtual source line XS, and then achieve electrical connection between the first source line SB and the virtual source line XS, ensuring that the first source line SB and the virtual source line XS transmit the same electrical signal.
[0162] It should be noted that the region G is only a part of the welding position R. Within the welding position R, the position where the first signal line 1051 and the second signal line 1052 can be electrically connected can be called the region G, that is, the specific action position under the action of external force.
[0163] In some embodiments, as shown in Figure 14, the display panel 100 includes a base substrate and also includes a light-shielding layer 108 arranged on the side of the photosensitive unit 10 away from the base substrate 101; the light-shielding layer 108 is provided with a plurality of openings K arranged at intervals, and each opening K of the plurality of openings K exposes a light-leakage transistor 12.
[0164] It should be noted that, on the light-shielding layer 108 above the orthographic projection of the corresponding leakage transistor 12, an opening K is set at the corresponding position of each leakage transistor 12, which can prevent other areas around the leakage transistor 12 from reflecting metal light under the irradiation of ambient light, presenting a bright edge phenomenon, and affecting the visual effect of the display panel 100. This setting method is suitable for small-sized display panels, ensuring that each leakage transistor 12 can receive sufficient ambient light, thereby improving the current generated by the leakage unit 2 to be more accurate, and thereby making the signal transmitted by the dimming chip more accurate and effective.
[0165] 14 , the light-draining transistor 12 includes an active layer pattern 121 . The active layer pattern 121 includes a channel region 121 a . The orthographic projection of the channel region 121 a on the base substrate 101 is located in the middle of the orthographic projection of the opening K on the base substrate 101 .
[0166] In some embodiments, referring to Figure 15, the distance between the boundary of the orthographic projection of the channel region 121a and the boundary of the orthographic projection of the opening K on the same side in the third direction Z1 is a first distance H1, and the first distance H1 is 5 to 6 um; the distance between the boundary of the orthographic projection of the channel region 121a and the boundary of the orthographic projection of the opening K on the same side in the fourth direction Z2 is a second distance H2, and the second distance H2 is 5 to 6 um; the fourth direction Z2 is the direction from the second pole 12a of the leakage transistor 12 to the first pole 12b, and the third direction Z1 is perpendicular to the fourth direction Z2.
[0167] For example, referring to Figures 14 and 15, the orthographic projection of the channel region 121a on the base substrate 101 is located in the middle position of the orthographic projection of the opening K on the base substrate 101, that is, the center of the orthographic projection of the channel region 121a on the base substrate 101 coincides with the center position of the orthographic projection of the opening K on the base substrate 101. 15 , the orthographic projection boundaries of the channel region 121a in the third direction Z1 are the first channel boundary a1 and the second channel boundary a2, the orthographic projection boundaries of the channel region 121a in the fourth direction Z2 are the third channel boundary a3 and the fourth channel boundary a4, the orthographic projection boundaries of the opening K in the third direction Z1 are the first opening boundary b1 and the second opening boundary b2, the orthographic projection boundaries of the channel region 121a in the fourth direction Z2 are the third opening boundary b3 and the fourth opening boundary b4, the first distance H1 is the distance between the first channel boundary a1 and the first opening boundary b1, or the distance between the second channel boundary a2 and the second opening boundary b2, the second distance H2 is the distance between the third channel boundary a3 and the third opening boundary b3, or the distance between the fourth channel boundary a4 and the fourth opening boundary b4.
[0168] In some embodiments, referring to FIG. 16 and FIG. 17 , the light shielding layer 108 further includes at least one light shielding strip 1081 disposed in the opening K. The light shielding strip 1081 at least partially overlaps the second electrode 12 a and the first electrode 12 b of the light leakage transistor 12 .
[0169] For example, referring to Figures 16 and 17, the light shielding layer 108 shown in Figures 16 and 17 includes two light shielding strips 1081 disposed within the opening K. One of the two light shielding strips 1081 overlaps with the second electrode 12a of the leakage transistor 12, and the other light shielding strip 1081 overlaps with both the second electrode 12a and the first electrode 12b of the leakage transistor. By providing the light shielding strips 1081, at least a portion of the second electrode 12a and the first electrode 12b of the leakage transistor 12 can be covered to reduce the degree of exposure, thereby reducing the risk of reflections on the surface of the second electrode 12a and the first electrode 12b of the leakage transistor 12 in a light environment, thereby affecting the appearance of the display product.
[0170] In some embodiments, referring to FIG. 16 and FIG. 17 , the light shielding layer 108 includes at least two light shielding strips 1081 , and the at least two light shielding strips 1081 are arranged in parallel.
[0171] For example, referring to Figures 16 and 17, two shading strips 1081 are provided in an opening K in the figure, wherein the two shading strips 1081 are arranged in parallel to each other, which can avoid the reflection phenomenon that occurs in the same direction under the influence of the light environment.
[0172] For example, the two shading strips 1081 located in the same opening K are not parallel to each other, which can reduce the reflection phenomenon at a side viewing angle to a certain extent.
[0173] It should be noted that the directions of the at least two shading strips 1081 set in the same opening K are not limited, and the directions of the at least two shading strips 1081 in different openings K are also not limited, which can better avoid reflection.
[0174] In some embodiments, continuing to refer to Figures 16 and 17, the light-shielding layer 108 includes at least two light-shielding strips 1081, the width of the at least two light-shielding strips 1081 is the first width W1, and the spacing d1 between two adjacent light-shielding strips 1081, the spacing d2 between the light-shielding strip 1081 near the first boundary J1 of the opening K and the first boundary of the opening K, and the spacing d3 between the light-shielding strip 1081 near the second boundary of the opening K and the second boundary J2 of the opening K are all the first spacing S.
[0175] Exemplarily, referring to Figure 16, the shading layer 108 includes two shading strips 1081 arranged parallel to each other, and each shading strip 1081 is parallel to the first boundary J1 and the second boundary J2 of the opening K, wherein the two shading strips 1081 are arranged at equal intervals in the opening K, that is, the spacing d1 between two adjacent shading strips 1081, the spacing d2 between the shading strip 1081 close to the first boundary J1 of the opening K and the first boundary of the opening K, and the spacing d3 between the shading strip 1081 close to the second boundary of the opening K and the second boundary J2 of the opening K are all the first spacing S, that is, d1=d2=d3=S, and the two shading strips 1081 evenly divide the opening K into three parts.
[0176] Exemplarily, referring to Figure 17, the shading layer 108 includes two shading strips 1081 arranged parallel to each other, and each shading strip 1081 is not parallel to the first boundary J1 and the second boundary J2 of the opening K, wherein the two shading strips 1081 are arranged at equal intervals in the opening K, that is, the spacing d1 between two adjacent shading strips 1081, the maximum spacing d2 between the shading strip 1081 close to the first boundary J1 of the opening K and the first boundary J1 of the opening K, and the maximum spacing d3 between the shading strip 1081 close to the second boundary of the opening K and the second boundary J2 of the opening K are all the first spacing S, that is, d1=d2=d3=S, and the two shading strips 1081 separate the opening K into three parts.
[0177] In some embodiments, with continued reference to FIG. 16 and FIG. 17 , the first width W1 is 8 um to 10 um, and the first spacing S is 8 um to 10 um.
[0178] For example, the first width W1 may be set to 8um, 9um, or 10um, and the first spacing S may be set to 8um, 9um, or 10um, that is, W1 and S1 are set to be equal.
[0179] In some embodiments, the plurality of openings K include at least one dummy opening, which exposes at least one dummy transistor 13 adjacent to the light-leaking transistor 12 among the plurality of dummy transistors 13 .
[0180] For example, referring to Figures 10B, 10C, 11B, 11C, 12B and 12C, after the corresponding laser welding positions are welded, when the virtual transistor 13 and the leakage transistor 12 can receive the same signal, the light-shielding layer 108 on the virtual transistor 13 does not completely shield the virtual transistor 13, but a plurality of virtual openings are provided on the light-shielding layer 108. Each virtual opening exposes the virtual transistor 13 among the multiple virtual transistors 13 that is adjacent to the leakage transistor 12 and receives the same signal, ensuring that each virtual transistor 13 can receive sufficient ambient light, so that the dimming chip can be more accurate during the adjustment process.
[0181] In some embodiments, the plurality of transistors included in the photosensitive unit 10 are oxide transistors.
[0182] Exemplarily, the oxide transistor can be a P-type transistor or an N-type transistor. The oxide transistor is used because the current it generates is greater than the current generated by the amorphous silicon transistor, which is conducive to the detection of light-sensitive signals, and has strong charge retention ability and good stability.
[0183] The transistors used in the embodiments of the present disclosure can all be thin film transistors or field effect transistors or other devices with the same characteristics. In this embodiment, the coupling mode of the drain and source of each transistor can be interchangeable. Therefore, the drain and source of each transistor in the embodiments of the present disclosure are actually the same. Here, only in order to distinguish the two poles of the transistor other than the control electrode (i.e., the gate), one of the poles is called the drain and the other pole is called the source. The thin film transistor used in the embodiments of the present disclosure can be an N-type transistor or a P-type transistor. In the embodiments of the present disclosure, when an N-type thin film transistor is used, its first pole can be the drain and the second pole can be the source. The description is made by taking the thin film transistor as an N-type transistor as an example, that is, when the signal of the control electrode is a high level, the thin film transistor is turned on. It can be imagined that when a P-type transistor is used, the timing change of the drive signal needs to be adjusted accordingly. The specific details are not repeated here, but should also be within the scope of protection of the present invention.
[0184] As shown in FIG18 , some embodiments of the present disclosure further provide a display device 1000 comprising the display panel 100 provided in any of the above embodiments, the display device 1000 comprising the above display panel 100, a backlight module 200, and a dimming chip 300. The backlight module 200 is disposed on one side of the display panel 100.
[0185] Exemplarily, referring to FIG. 18 , the display panel 100 is stacked on the light-emitting side of the backlight module 200 .
[0186] In some embodiments, referring to Figure 18, the dimming chip 300 is electrically connected to the display panel 100 and the backlight module 200. The dimming chip 300 is configured to receive a first current generated by the shading unit and a second current generated by the light leakage unit, and adjust the light output brightness of the backlight module 200 according to the first current and the second current.
[0187] For example, referring to FIG. 18 , the display device 1000 further includes a flexible circuit board 400, which is disposed on one side of the display panel 100 and the backlight module 200. The flexible circuit board 400 is electrically connected to the display panel 100 and the backlight module 200. Specifically, one end of the flexible circuit board 400 is electrically connected to a plurality of binding electrodes located in the binding area, and the other end is electrically connected to the dimming chip 300. The flexible circuit board 400 is configured to transmit signals emitted by the dimming chip 300 to the plurality of binding electrodes.
[0188] Exemplarily, the first current is a reference current, and the second current is a light-sensing current, wherein the dimming chip can receive and compare the first current and the second current, convert the first current and the second current into an analog signal difference, and output a dimming signal to the backlight module 200 to control the light output brightness of the backlight module 200, thereby adjusting the backlight brightness as the ambient light changes, reducing power consumption while improving the display effect.
[0189] Exemplarily, the display device 1000 may be a liquid crystal display (LCD), such as an ADS (Advanced Super Dimension Switch) type liquid crystal display. The display device provided in this embodiment may also be a TN (Twisted Nematic) type, an MVA (Multi-domain Vertical Alignment) type, a PVA (Patterned Vertical Alignment) type, an IPS (In-Plane Switching) type, an FFS (Fringe Field Switching) type, or an ADS type liquid crystal display.
[0190] Exemplarily, the display panel is a liquid crystal display panel. The liquid crystal display panel may include an array substrate and a color filter substrate in a cell-to-cell configuration. A liquid crystal layer is provided between the column substrate and the color filter substrate. The liquid crystal layer is filled with liquid crystal molecules. The array substrate includes a plurality of pixel electrodes and a drive circuit. The opposing substrate includes a common electrode, etc. The pixel electrode and the common electrode are arranged relative to each other to form a capacitor. Under the control of the drive circuit, an electric field is formed between the pixel electrode and the common electrode, and the liquid crystal molecules can be deflected in the electric field. Specifically, each drive circuit corresponds to a pixel point and is used to control the display of the pixel point (whether the pixel point emits light and the brightness of the light); the drive circuit can control the intensity of the electric field formed between the pixel electrode and the common electrode, thereby controlling the angle at which the liquid crystal molecules between the pixel electrode and the common electrode rotate, thereby changing the transmittance of the pixel point. The peripheral areas of the array substrate and the color filter substrate are sealed by providing a sealant, and also include a light shielding layer on the array substrate located between the array substrate and the sealant, wherein the light shielding layer completely covers the peripheral circuits provided on the array substrate and located outside the display area.
[0191] Exemplarily, the material of the light-shielding layer is preferably an opaque metal material such as molybdenum (Mo), copper (Cu) or aluminum (Al), or an opaque resin material, such as the black matrix (BM) material for making a color filter substrate CF (Color Filter, CF) or other opaque color-resistance resin materials.
[0192] Exemplarily, the display device 1000 may be any device that displays images, whether in motion (e.g., video) or stationary (e.g., still images), and whether textual or tangible. More specifically, it is contemplated that the embodiments described may be implemented in or associated with a variety of electronic devices, such as, but not limited to, mobile phones, wireless devices, personal digital assistants (PDAs), handheld or portable computers, GPS receivers / navigators, cameras, MP4 video players, camcorders, game consoles, watches, clocks, calculators, television monitors, flat-panel displays, computer monitors, automotive displays (e.g., speedometer displays), navigation systems, augmented reality (AR) devices, virtual reality (VR) devices, cockpit controls and / or displays, displays of camera views (e.g., displays of rearview cameras in vehicles), electronic photographs, electronic billboards or signs, projectors, architectural structures, packaging, and aesthetic structures (e.g., displays of images of a piece of jewelry), and the like.
[0193] The embodiments of the present disclosure do not impose any special restrictions on the specific form of the above-mentioned display device 1000. The display device 1000 adopts the display panel 100 provided by the above-mentioned embodiments. Therefore, the display device 1000 provided by the present disclosure has all the beneficial effects of the display panel 100 provided by any of the above embodiments, which will not be repeated here.
[0194] The above description is merely a specific embodiment of the present disclosure, but the scope of protection of the present disclosure is not limited thereto. Any changes or substitutions that a person skilled in the art can conceive within the technical scope disclosed in the present disclosure should be included within the scope of protection of the present disclosure. Therefore, the scope of protection of the present disclosure should be based on the scope of protection of the claims.
Claims
1. A display panel, comprising: a display area and a peripheral area surrounding the display area; the peripheral area includes a first area, a second area, a third area and a fourth area, the first area and the second area are respectively located on both sides of the display area along a first direction, the third area and the fourth area are respectively located on both sides of the display area along a second direction, the first direction is perpendicular to the second direction; the second area includes a binding area; The display panel comprises: A light sensing unit disposed in a peripheral area of the display panel, the light sensing unit comprising a light shielding unit and a light leakage unit, the light shielding unit comprising a plurality of light shielding transistors, and the light leakage unit comprising a plurality of light leakage transistors; the light sensing unit is disposed in at least one of the first area, the second area, the third area, and the fourth area; The plurality of binding electrodes are disposed in a binding area of the display panel, and the plurality of binding electrodes are configured to be connected to a dimming chip; the plurality of binding electrodes include a first electrode, a second electrode, a third electrode, and a fourth electrode; Among them, the control electrodes of the multiple light-shielding transistors are electrically connected in sequence and electrically connected to the first electrode, the first electrodes of the multiple light-shielding transistors are electrically connected in sequence and electrically connected to the second electrode, and the second electrodes of the multiple light-shielding transistors are electrically connected in sequence and electrically connected to the third electrode; the control electrodes of the multiple leakage transistors are electrically connected in sequence and electrically connected to the first electrode, the first electrodes of the multiple leakage transistors are electrically connected in sequence and electrically connected to the second electrode, and the second electrodes of the multiple leakage transistors are electrically connected in sequence and electrically connected to the fourth electrode.
2. The display panel according to claim 1, wherein: The light sensing unit further includes a dummy unit, the dummy unit includes a plurality of dummy transistors; the plurality of light shielding transistors are arranged in the same direction, the plurality of light leaking transistors are arranged in the same direction, and at least some of the plurality of dummy transistors are arranged in the same direction; At least one of the plurality of light-shielding transistors and the plurality of light-leaking transistors and the at least part of the dummy transistors are arranged in the same direction; The plurality of binding electrodes further include a plurality of virtual electrodes, and the plurality of binding electrodes are arranged at intervals along the second direction.
3. The display panel according to claim 2, wherein: The light sensing unit is located in the second area; The plurality of light-shielding transistors are arranged along the second direction, the plurality of light-leaking transistors are arranged along the second direction, and the plurality of dummy transistors are arranged along the second direction; The light shielding unit, the virtual unit and the light leakage unit are arranged along the second direction, and the virtual unit is located between the light shielding unit and the light leakage unit.
4. The display panel according to claim 3, wherein: A plurality of groups of fan-out routings are arranged between the display area and the binding area, and a spacing area is provided between two adjacent groups of the plurality of groups of fan-out routings, and the spacing area includes a first spacing area, a second spacing area and a third spacing area, the shading unit is located in the first spacing area, the light leakage unit is located in the second spacing area, and the virtual unit is located in the third spacing area.
5. The display panel according to claim 3 or 4, wherein: The first electrode includes a first sub-electrode and a second sub-electrode, and the second electrode includes a third sub-electrode and a fourth sub-electrode; The control electrodes of the plurality of light shielding transistors are electrically connected in sequence through a first gate line, and the first gate line is electrically connected to the The first sub-electrode is electrically connected, the first electrodes of the multiple light-shielding transistors are electrically connected in sequence through the first drain line, and the first drain line is electrically connected to the third sub-electrode; the control electrodes of the multiple leakage transistors are electrically connected in sequence through the second gate line, and the second gate line is electrically connected to the second sub-electrode, the first electrodes of the multiple leakage transistors are electrically connected in sequence through the second drain line, and the second drain line is electrically connected to the fourth sub-electrode.
6. The display panel according to any one of claims 3 to 5, wherein: The control electrodes of the multiple virtual transistors are electrically connected in sequence through virtual gate lines, and the virtual gate lines are electrically connected to a virtual electrode, the second electrodes of the multiple virtual transistors are electrically connected in sequence through virtual source lines, and the virtual source lines are electrically connected to a virtual electrode, and the first electrodes of the multiple virtual transistors are electrically connected in sequence through virtual drain lines, and the virtual drain lines are electrically connected to a virtual electrode.
7. The display panel according to claim 2, wherein: The light sensing unit is located in the first area; The plurality of light-shielding transistors are arranged along the second direction, the plurality of light-leaking transistors are arranged along the second direction, and the plurality of dummy transistors are arranged along the second direction; The light shielding unit, the virtual unit and the light leakage unit are arranged along the second direction, and the virtual unit is located between the light shielding unit and the light leakage unit.
8. The display panel according to claim 7, wherein: The control electrodes of the multiple light-shielding transistors and the control electrodes of the multiple light-leaking transistors are electrically connected in sequence through gate signal lines, and the gate signal lines are electrically connected to the first electrode, and the first electrodes of the multiple light-shielding transistors and the first electrodes of the multiple light-leaking transistors are electrically connected in sequence through drain signal lines, and the drain signal lines are electrically connected to the second electrode.
9. The display panel according to claim 7 or 8, wherein: The control electrodes of the plurality of dummy transistors are electrically connected in sequence; and the second electrodes of the plurality of dummy transistors are electrically connected in sequence.
10. The display panel according to claim 2, wherein: The light shielding unit is located in the third area, and the light leakage unit is located in the fourth area; The plurality of dummy transistors of the dummy unit include a plurality of first dummy transistors and a plurality of second dummy transistors; the plurality of first dummy transistors are located in the third area, and the plurality of second dummy transistors are located in the fourth area; The plurality of light-shielding transistors are arranged along a first direction, the plurality of light-leaking transistors are arranged along a first direction, the plurality of first dummy transistors are arranged along a first direction, and the plurality of second dummy transistors are arranged along a first direction; The light shielding unit and the plurality of first dummy transistors are arranged along the first direction, and the light leakage unit and the plurality of second dummy transistors are arranged along the first direction.
11. The display panel according to claim 10, wherein: The first electrode includes a first sub-electrode and a second sub-electrode, and the second electrode includes a third sub-electrode and a fourth sub-electrode; The control electrodes of the plurality of light-shielding transistors are electrically connected in sequence through a first gate line, and the first gate line is electrically connected to the first sub-electrode, the first electrodes of the plurality of light-shielding transistors are electrically connected in sequence through a first drain line, and the first gate line is electrically connected to the first sub-electrode. A drain line is electrically connected to the third sub-electrode; the control electrodes of the multiple leakage transistors are electrically connected in sequence through a second gate line, and the second gate line is electrically connected to the second sub-electrode, the first electrodes of the multiple leakage transistors are electrically connected in sequence through a second drain line, and the second drain line is electrically connected to the fourth sub-electrode.
12. The display panel according to claim 10 or 11, wherein: The control electrodes of the plurality of first dummy transistors are electrically connected in sequence, the second electrodes of the plurality of first dummy transistors are electrically connected in sequence, and the first electrodes of the plurality of first dummy transistors are electrically connected in sequence; The control electrodes of the plurality of second dummy transistors are electrically connected in sequence, the second electrodes of the plurality of second dummy transistors are electrically connected in sequence, and the first electrodes of the plurality of second dummy transistors are electrically connected in sequence.
13. The display panel according to claim 10, wherein: The plurality of first dummy transistors are far away from the plurality of binding electrodes relative to the plurality of light-shielding transistors; and the plurality of second dummy transistors are far away from the plurality of binding electrodes relative to the plurality of light-leaking transistors.
14. The display panel according to any one of claims 1 to 13, wherein: The second electrodes of the plurality of light-shielding transistors are all electrically connected to the first source line, the first source line has at least one first cutting position, and the first cutting position is located between the second electrodes of any two adjacent light-shielding transistors; and / or the second electrodes of the plurality of light-leaking transistors are all electrically connected to the second source line, the second source line has at least one second cutting position, and the second cutting position is located between the second electrodes of any two adjacent light-leaking transistors.
15. The display panel according to claim 14, wherein: The photosensitive unit is located in the first area; the control electrodes of the multiple virtual transistors are electrically connected to the control electrodes of the multiple light-shielding transistors and the control electrodes of the multiple light-leaking transistors; the first electrodes of the multiple virtual transistors are electrically connected in sequence, and are electrically connected to the first electrodes of the multiple light-shielding transistors and the first electrodes of the multiple light-leaking transistors; the second electrodes of the multiple virtual transistors are electrically connected to the virtual source line; there is a first welding position between the first source line and the virtual source line, and the first source line and the virtual source line can be electrically connected at the first welding position under the action of external force; and / or there is a second welding position between the second source line and the virtual source line, and the second source line and the virtual source line can be electrically connected at the second welding position under the action of external force.
16. The display panel according to claim 15, wherein: The virtual source line includes at least two disconnected virtual source sub-lines, each virtual source sub-line is electrically connected to the source of at least one virtual transistor, and there is a third welding position between two adjacent virtual source sub-lines. The two adjacent virtual source sub-lines can be electrically connected at the third welding position under the action of external force.
17. The display panel according to claim 14, wherein: The light shielding unit is located in the third area, and the light leakage unit is located in the fourth area; The control electrodes of the plurality of first dummy transistors are electrically connected to the control electrodes of the plurality of light-shielding transistors, and the first electrodes of the plurality of first dummy transistors are electrically connected to the first electrodes of the plurality of light-shielding transistors; The second electrodes of the plurality of first virtual transistors are all electrically connected to the light-shielding virtual source line; There is a fourth welding position between the light-shielding virtual source lines, and the first source line and the light-shielding virtual source line can be electrically connected at the fourth welding position under the action of an external force; and / or, The control electrodes of the plurality of second dummy transistors are electrically connected to the control electrodes of the plurality of light-leaking transistors, and the first electrodes of the plurality of second dummy transistors are electrically connected to the first electrodes of the plurality of light-leaking transistors; The second electrodes of the plurality of second virtual transistors are all electrically connected to the light-leaking virtual source line; there is a fifth welding position between the second source line and the light-leaking virtual source line, and the second source line and the light-leaking virtual source line can be electrically connected at the fifth welding position under the action of external force.
18. The display panel according to claim 17, wherein: The light-shielding virtual source line includes at least two disconnected light-shielding virtual source sub-lines, each of which is electrically connected to at least one first virtual transistor; a sixth welding position is provided between two adjacent light-shielding virtual source sub-lines, and the two adjacent light-shielding virtual source sub-lines can be electrically connected at the sixth welding position under the action of an external force; and / or, The light-leaking virtual source line includes at least two disconnected light-leaking virtual source sub-lines, each of which is electrically connected to at least one second virtual transistor; there is a seventh welding position between two adjacent light-leaking virtual source sub-lines, and the two adjacent light-leaking virtual source sub-lines can be electrically connected at the seventh welding position under the action of external force.
19. The display panel according to any one of claims 15 to 17, wherein: The display panel further includes: substrate substrate; A gate layer is disposed on the base substrate; the gate layer includes a first connecting line; An insulating layer disposed on a side of the gate layer away from the base substrate; An active layer disposed on a side of the insulating layer away from the substrate; A metal layer disposed on a side of the active layer away from the base substrate, the metal layer comprising a plurality of signal lines, the plurality of signal lines comprising: a first source line, a second source line, a virtual source line, a light-shielding virtual source line, and a light-leaking virtual source line; A passivation layer disposed on a side of the metal layer away from the substrate; A connection layer disposed on a side of the passivation layer away from the substrate; the connection layer includes a second connection line; The two signal lines that need to be electrically connected under the action of an external force are a first signal line and a second signal line, the second connecting line is electrically connected to the first signal line through a first via hole penetrating the passivation layer, and the second connecting line is electrically connected to the first connecting line through a second via hole penetrating the passivation layer and the insulating layer; the first connecting line and the second signal line at least partially overlap, and the overlapping position of the two is the welding position; The welding positions include a first welding position, a second welding position, a third welding position, a fourth welding position, a fifth welding position, a sixth welding position and a seventh welding position.
20. The display panel according to any one of claims 1 to 19, wherein: The display panel includes a base substrate, and also includes a light shielding layer arranged on a side of the light sensing unit away from the base substrate; The light shielding layer is provided with a plurality of openings arranged at intervals, and each of the plurality of openings exposes a light leakage transistor.
21. The display panel according to claim 20, wherein: The light-draining transistor includes an active layer pattern, and the active layer pattern includes a channel region; the orthographic projection of the channel region on the base substrate is located at a middle position of the orthographic projection of the opening on the base substrate.
22. The display panel according to claim 21, wherein: The distances between the boundary of the orthographic projection of the channel region and the boundary of the orthographic projection of the opening on the same side in the third direction are both the first distance; the distances between the boundary of the orthographic projection of the channel region and the boundary of the orthographic projection of the opening on the same side in the fourth direction are both the second distance; the fourth direction is the direction in which the second pole of the source of the light-draining transistor points to the first pole, and the third direction is perpendicular to the fourth direction.
23. The display panel according to claim 21, wherein: The light shielding layer further includes at least one light shielding strip disposed in the opening, and the light shielding strip at least partially overlaps with the second electrode and the first electrode of the light leakage transistor.
24. The display panel according to claim 23, wherein: The shading layer includes at least two shading strips, and the at least two shading strips are arranged in parallel.
25. The display panel according to claim 24, wherein: The shading layer includes at least two shading strips, the widths of the at least two shading strips are all the first width, and the spacing between two adjacent shading strips, the spacing between the shading strip near the first boundary of the opening and the first boundary of the opening, and the spacing between the shading strip near the second boundary of the opening and the second boundary of the opening are the first spacing.
26. The display panel according to any one of claims 20 to 25, wherein: The plurality of openings include at least one dummy opening, and the dummy opening exposes at least one dummy transistor adjacent to the light-leaking transistor among the plurality of dummy transistors.
27. The display panel according to claim 1, wherein: The plurality of transistors included in the photosensitive unit are oxide transistors.
28. A display device comprising: The display panel according to any one of claims 1 to 27; A backlight module disposed on one side of the display panel; A dimming chip is electrically connected to the display panel and the backlight module, and is configured to receive a first current generated by the shading unit and a second current generated by the light leakage unit, and adjust the light output brightness of the backlight module according to the first current and the second current.