Liquid source vaporization system

Abstract

A liquid source vaporization system, which is applied to a semiconductor process device and comprises: a vaporization apparatus (20), a liquid source pipeline (10), a purging pipeline (40), a first control unit (50), an output pipeline (30), a tail gas treatment pipeline (62) and a second control unit (70), wherein the first control unit (50) is used for selectively controlling the purging pipeline (40) or the liquid source pipeline (10) to communicate with the vaporization apparatus (20); and the second control unit (70) is used for selectively controlling the tail gas treatment pipeline (62) or the output pipeline (30) to communicate with the vaporization apparatus (20). The system can solve the problem in the prior art of there being a liquid process medium left in a pipeline after each use.

Description

Liquid source vaporization system Technical Field

[0001] The present application relates to the field of semiconductor manufacturing, and in particular, to a liquid source vaporization system. Background Art

[0002] During the integrated circuit manufacturing process, silicon wafers must be placed in a process chamber with a specific temperature, pressure, and process gas atmosphere to ensure they meet certain process characteristics, such as forming different insulating and dielectric layers on their surfaces. In some advanced manufacturing processes, specialized process media are required. These media are typically stored in liquid form, but during the manufacturing process, they need to be converted into a gaseous state and transferred into the process chamber.

[0003] In the prior art, in the process of conveying fluids with high flow control accuracy and stability, there are usually two different ways to convert the liquid state of the process medium into the gas state, namely, the vapor pressure difference control method and the liquid phase direct control method.

[0004] The vapor pressure differential control method, also known as the baking method, utilizes the pressure differential between the vapor pressure of the liquid material and the process chamber pressure, along with a gas mass flowmeter, to control the conversion of the process medium from liquid to gas. However, because the vapor pressure differential control method vaporizes the liquid in the container by heating it to its saturated vapor pressure, the pressure after vaporization is low. Therefore, the process chamber must be vacuum to meet transmission requirements. Furthermore, the amount of vaporized gas is relatively small, making it difficult to meet high process gas flow requirements. Furthermore, because the gas mass flowmeter is located in the outlet pipeline, the measured gas temperature is relatively high. Due to its limited temperature resistance, it cannot meet measurement requirements when the baking temperature is too high, thus limiting its applicability to liquids. Furthermore, the baking device used to bake the liquid medium is large and heavy, and is typically placed at the bottom of the equipment. The distance from the baking device to the process chamber is long, requiring temperature management of the pipelines and components along the way. If it encounters a cold spot, the vaporized gas will re-liquefy into a liquid.

[0005] The direct liquid phase control method, also known as direct vaporization, uses a mass flow meter and a vaporizer to vaporize the liquid process medium. This method primarily utilizes a vaporizer, which introduces a carrier gas into the vaporizer, atomizing the liquid process medium and spraying it into a vaporizer chamber. The vaporizer chamber is heated externally, and the heat radiation emitted by the heated chamber vaporizes the atomized process medium. The partially vaporized liquid spray then vaporizes completely through heat conduction from the chamber's inner walls and is then discharged.

[0006] Although the above method can solve many problems of the vapor pressure difference control method, new problems still exist. Since a carrier gas is required to atomize the liquid process medium, liquid process medium will remain in the pipeline after each use, affecting the next use. Therefore, how to clean the process medium residue in the pipeline is an urgent problem to be solved in this field.

[0007] Summary of the Invention

[0008] The present application aims to solve at least one of the technical problems existing in the prior art and proposes a liquid source vaporization system, which can solve the problem in the prior art that liquid process medium will remain in the pipeline after each use.

[0009] To achieve the purpose of this application, a liquid source vaporization system is provided, which is applied to semiconductor process equipment, including:

[0010] A vaporizing device, used for vaporizing liquid process medium into gaseous process medium;

[0011] a liquid source pipeline for providing liquid process medium to the vaporization device;

[0012] a purge pipeline for providing purge gas to the vaporization device;

[0013] a first control unit, configured to selectively control the purge pipeline or the liquid source pipeline to communicate with the vaporization device;

[0014] an output pipeline for delivering the vaporized gaseous process medium to a process chamber of the semiconductor process equipment;

[0015] an exhaust gas treatment pipeline for conveying pollutants blown out from the vaporization device by the purge gas to an exhaust gas treatment device;

[0016] The second control unit is used to selectively control the exhaust gas treatment pipeline or the output pipeline to be connected to the vaporization device.

[0017] In some embodiments, the liquid source vaporization system has a working state and a first cleaning state;

[0018] In the working state, the first control unit controls the liquid source pipeline to be connected to the vaporization device, and the second control unit controls the output pipeline to be connected to the vaporization device;

[0019] In the first cleaning state, the first control unit controls the purge pipeline to communicate with the vaporization device, and the second control unit controls the exhaust gas treatment pipeline to communicate with the vaporization device.

[0020] In some embodiments, the vaporization device comprises:

[0021] a vaporizer having a vaporization chamber for vaporizing the liquid process medium;

[0022] a liquid inlet pipeline, wherein the outlet end of the liquid inlet pipeline is in communication with the vaporization chamber, and the inlet end of the liquid inlet pipeline is in communication with the outlet end of the liquid source pipeline and the outlet end of the purge pipeline respectively;

[0023] An air outlet pipeline, wherein the inlet end of the air outlet pipeline is communicated with the vaporization chamber, and the outlet end of the air outlet pipeline is communicated with the inlet end of the output pipeline and the inlet end of the tail gas treatment pipeline respectively.

[0024] In some embodiments, the liquid source vaporization system has a working state and a first cleaning state;

[0025] In the working state, the first control unit controls the liquid source pipeline to be connected to the liquid inlet pipeline, and the second control unit controls the output pipeline to be connected to the gas outlet pipeline;

[0026] In the first cleaning state, the first control unit controls the purge pipeline to communicate with the liquid inlet pipeline, and the second control unit controls the exhaust gas treatment pipeline to communicate with the gas outlet pipeline.

[0027] In some embodiments, the first control unit includes:

[0028] a first control valve, the first control valve being provided on the liquid source pipeline and being used for controlling the on-off of the liquid source pipeline;

[0029] A second control valve is provided on the purge pipeline and is used to control the on-off of the purge pipeline; and

[0030] The second control unit includes:

[0031] a third control valve, the third control valve being arranged on the output pipeline and being used for controlling the on-off of the output pipeline;

[0032] A fourth control valve is provided on the exhaust gas treatment pipeline and is used to control the on-off of the exhaust gas treatment pipeline.

[0033] In some embodiments, the vaporization device further comprises:

[0034] a carrier gas pipeline, wherein the inlet end of the carrier gas pipeline is used to communicate with a carrier gas source, and the outlet end of the carrier gas pipeline is communicated with the vaporization chamber;

[0035] A carrier gas control valve is provided on the carrier gas pipeline and is used to control the on-off of the carrier gas pipeline.

[0036] In some embodiments, in the working state, the carrier gas control valve is open;

[0037] In the first cleaning state, the carrier gas control valve is closed.

[0038] In some embodiments, the liquid source vaporization system further has a second clean state;

[0039] In the second cleaning state, the first control unit controls the purge pipeline to communicate with the liquid inlet pipeline, the second control unit controls the gas outlet pipeline to communicate with the exhaust gas treatment pipeline, and the carrier gas control valve is opened.

[0040] In some embodiments, the liquid source vaporization system further comprises:

[0041] a first flow meter, the first flow meter being disposed on the liquid inlet pipeline and being used to control the flow of the liquid process medium;

[0042] a first bypass line, wherein an inlet end of the first bypass line is communicated with the liquid inlet line, the inlet end of the first bypass line is located between the first flow meter and the vaporizer, and an outlet end of the first bypass line is communicated with the exhaust gas treatment line;

[0043] A bypass control unit is used to selectively control the first flow meter to communicate with the vaporization chamber or the first flow meter to communicate with the first bypass line.

[0044] In some embodiments, the liquid source vaporization system has a working state and a third cleaning state;

[0045] In the working state, the first control unit controls the liquid source pipeline to be connected to the liquid inlet pipeline, the bypass control unit controls the first flow meter to be connected to the vaporization chamber, and the second control unit controls the output pipeline to be connected to the gas outlet pipeline;

[0046] In the third cleaning state, the first control unit controls the purge pipeline to communicate with the liquid inlet pipeline, and the bypass control unit controls the first flow meter to communicate with the first bypass pipeline.

[0047] In some embodiments, the bypass control unit includes a first bypass valve and a second bypass valve, the first bypass valve is arranged on the first bypass line, and is used to control the on-off of the first bypass line; the second bypass valve is arranged on the liquid inlet line and is located between the inlet end of the first bypass line and the vaporizer, and is used to control the on-off of the liquid inlet line.

[0048] In some embodiments, the liquid source vaporization system further comprises:

[0049] a first flow meter, the first flow meter being disposed on the liquid inlet pipeline and being used to control the flow of the liquid process medium;

[0050] a second bypass line, wherein an inlet end of the second bypass line is connected to a purge gas source, an outlet end of the second bypass line is connected to the liquid inlet line, and the outlet end of the second bypass line is located between the first flow meter and the vaporization chamber;

[0051] A fifth control valve is provided on the second bypass line and is used to control the on-off of the second bypass line.

[0052] In some embodiments, in the working state, the carrier gas control valve is open and the fifth control valve is closed;

[0053] The liquid source vaporization system also has a fourth clean state;

[0054] In the fourth cleaning state, the first control unit controls the liquid source pipeline and the purge pipeline to be disconnected from the liquid inlet pipeline, the carrier gas control valve and the fifth control valve are opened, and the second control unit controls the exhaust gas treatment pipeline to be connected to the outlet pipeline.

[0055] In some embodiments, the liquid source vaporization system further comprises:

[0056] A residual liquid collector, which is used to recover residual liquid process medium;

[0057] a residual liquid recovery pipeline, wherein the outlet end of the residual liquid recovery pipeline is connected to the residual liquid collector, and the inlet end of the residual liquid recovery pipeline is connected to the liquid inlet pipeline;

[0058] a sixth control valve, the sixth control valve being arranged on the residual liquid recovery pipeline and being used for controlling the on-off of the residual liquid recovery pipeline;

[0059] The vaporization device further comprises:

[0060] The seventh control valve is arranged on the liquid inlet pipeline. The seventh control valve is located between the inlet end of the residual liquid recovery pipeline and the vaporizer, and is used to control the connection and disconnection between the vaporizer and the liquid inlet pipeline.

[0061] In some embodiments, the liquid source vaporization system further comprises:

[0062] An exhaust pipeline, wherein the residual liquid collector has an exhaust port, and the exhaust port is connected to the exhaust gas treatment pipeline through the exhaust pipeline;

[0063] An eighth control valve is disposed on the exhaust pipe and is used to control the on-off state of the exhaust pipe.

[0064] In some embodiments, in the working state, the seventh control valve is open and the sixth control valve is closed;

[0065] The liquid source vaporization system also has a first residual liquid recovery state. In the first residual liquid recovery state, the first control unit controls the purge pipeline to be connected to the liquid inlet pipeline, the seventh control valve is closed, and the sixth control valve and the eighth control valve are opened.

[0066] In some embodiments, the liquid source vaporization system further comprises:

[0067] a ninth control valve, the ninth control valve being disposed on the residual liquid recovery pipeline and being located between the sixth control valve and an outlet end of the residual liquid recovery pipeline;

[0068] a purge branch, wherein the inlet end of the purge branch is connected to the purge gas source, the outlet end of the purge branch is connected to the residual liquid recovery pipeline, and the outlet end of the purge branch is located between the ninth control valve and the sixth control valve;

[0069] A tenth control valve is provided on the purge branch and is used to control the on-off of the purge branch.

[0070] In some embodiments, in the working state, the sixth control valve and the tenth control valve are closed, and the seventh control valve is opened;

[0071] The liquid source vaporization system also has a second residual liquid recovery state. In the second residual liquid recovery state, the first control unit controls the liquid source pipeline and the purge pipeline to be disconnected from the liquid inlet pipeline, the sixth control valve is closed, and the tenth control valve, the ninth control valve, and the eighth control valve are opened.

[0072] In some embodiments, the liquid source vaporization system further comprises:

[0073] a residual gas discharge pipeline, wherein the inlet end of the residual gas discharge pipeline is connected to the residual liquid recovery pipeline, the inlet end of the residual gas discharge pipeline is located between the sixth control valve and the ninth control valve, and the outlet end of the residual gas discharge pipeline is connected to the tail gas treatment pipeline;

[0074] The residual gas control valve is arranged on the residual gas discharge pipeline and is used to control the on-off of the residual gas discharge pipeline.

[0075] In some embodiments, the liquid source vaporization system further has a pipeline residual gas discharge state;

[0076] In the residual gas discharge state of the pipeline, the first control unit controls the purge pipeline to be connected to the liquid inlet pipeline, the tenth control valve, the ninth control valve, and the seventh control valve are closed; and the sixth control valve and the residual gas control valve are opened.

[0077] In some embodiments, the vaporization device further comprises:

[0078] a carrier gas pipeline, wherein the carrier gas pipeline inlet end is used to communicate with the carrier gas source, and the carrier gas pipeline outlet end is communicated with the vaporization chamber;

[0079] A carrier gas control valve, the carrier gas control valve is arranged on the carrier gas pipeline, and the carrier gas control valve is used to control the on-off of the carrier gas pipeline;

[0080] a first flow meter, the first flow meter being disposed on the liquid inlet pipeline and being used to calculate the flow rate of the liquid process medium;

[0081] a second bypass line, wherein an inlet end of the second bypass line is connected to the purge gas source, an outlet end of the second bypass line is connected to the liquid inlet line, and the outlet end of the second bypass line is located between the first flow meter and the vaporization chamber;

[0082] A fifth control valve is provided on the second bypass line and is used to control the on-off of the second bypass line.

[0083] In some embodiments, in the working state, the carrier gas control valve is open and the fifth control valve is closed; or

[0084] In the first cleaning state, the seventh control valve is opened, and the carrier gas control valve, the fifth control valve, the sixth control valve, and the tenth control valve are closed; or

[0085] The liquid source vaporization system also has a second clean state;

[0086] In the second cleaning state, the first control unit controls the purge pipeline to be connected to the liquid inlet pipeline, the fifth control valve, the sixth control valve, and the tenth control valve are closed, and the seventh control valve is opened; or

[0087] The liquid source vaporization system also has a fourth clean state;

[0088] In the fourth cleaning state, the first control unit controls the liquid source pipeline and the purge pipeline to be disconnected from the liquid inlet pipeline, the tenth control valve and the sixth control valve are closed, the carrier gas control valve and the fifth control valve are opened, and the second control unit controls the exhaust gas treatment pipeline to be connected to the gas outlet pipeline; or

[0089] The liquid source vaporization system also has a first residual liquid recovery state;

[0090] In the first residual liquid recovery state, the fifth control valve and the tenth control valve are closed; or

[0091] In the second residual liquid recovery state, the fifth control valve and the residual gas control valve are closed; or

[0092] The liquid source vaporization system also has a pipeline residual gas discharge state;

[0093] In the residual gas discharge state of the pipeline, the first control unit controls the purge pipeline to be connected to the liquid inlet pipeline, the fifth control valve, the tenth control valve, the ninth control valve, and the seventh control valve are closed; the sixth control valve and the residual gas control valve are opened.

[0094] This application has the following beneficial effects:

[0095] The liquid source vaporization system of the present application is provided with a purge pipeline, a first control unit, an exhaust gas treatment pipeline and a second control unit. It can not only vaporize the liquid process medium through the vaporization device, but also control the purge pipeline and the exhaust gas treatment pipeline to be connected to the vaporization device through the first control unit and the second control unit, respectively, to pass the purge gas into the vaporization device, clean the interior of the vaporization device through the purge gas, and blow out the process medium residue in the corresponding pipeline through which the purge gas flows, thereby reducing the process medium residue in the pipeline and avoiding affecting the next use. In addition, since the exhaust gas treatment pipeline is provided, the pollutants blown out of the vaporization device by the purge gas can be transported to the exhaust gas treatment device through the exhaust gas treatment pipeline for treatment, thereby avoiding pollution of the environment by the pollutants. BRIEF DESCRIPTION OF THE DRAWINGS

[0096] FIG1 is a schematic structural diagram of a liquid source vaporization system according to Example 1 of the present application;

[0097] FIG2 is a schematic diagram of the working state of the liquid source vaporization system of Example 1 of the present application;

[0098] FIG3 is a schematic diagram of a first cleaning state of the liquid source vaporization system according to the first embodiment of the present application;

[0099] FIG4 is a schematic diagram of a second cleaning state of the liquid source vaporization system according to the first embodiment of the present application;

[0100] FIG5 is a schematic diagram of a third cleaning state of the liquid source vaporization system of Example 2 of the present application;

[0101] FIG6 is a schematic diagram of a fourth cleaning state of the liquid source vaporization system of Example 3 of the present application;

[0102] FIG7 is a schematic diagram of a first residual liquid recovery state of the liquid source vaporization system of Example 4 of the present application;

[0103] FIG8 is a schematic diagram of a second residual liquid recovery state of the liquid source vaporization system of Example 5 of the present application;

[0104] FIG9 is a schematic diagram of the residual gas discharge state of the pipeline of the liquid source vaporization system of Example 6 of the present application;

[0105] FIG10 is a schematic diagram of the working state of the liquid source vaporization system of Example 7 of the present application;

[0106] FIG11 is a schematic diagram of a first cleaning state of a liquid source vaporization system according to a seventh embodiment of the present application;

[0107] FIG12 is a schematic diagram of a second cleaning state of the liquid source vaporization system of Example 7 of the present application;

[0108] FIG13 is a schematic diagram of a third cleaning state of the liquid source vaporization system according to Example 7 of the present application;

[0109] FIG14 is a schematic diagram of a first residual liquid recovery state of the liquid source vaporization system of Example 7 of the present application;

[0110] FIG15 is a schematic diagram of a second residual liquid recovery state of the liquid source vaporization system of Example 7 of the present application;

[0111] FIG16 is a schematic diagram of the residual gas discharge state of the pipeline of the liquid source vaporization system of Example 7 of the present application;

[0112] FIG17 is a schematic diagram of the residual gas discharge state of the pipeline of the liquid source vaporization system of Example 8 of the present application.

[0113] List of reference numerals: 10, liquid source pipeline; 20, vaporization device; 21, vaporizer; 22, liquid inlet pipeline; 23, gas outlet pipeline; 24, carrier gas pipeline; 25, carrier gas control valve; 26, seventh control valve; 30, output pipeline; 40, purge pipeline; 50, first control unit; 51, first control valve; 52, second control valve; 60, exhaust gas treatment unit; 61, exhaust gas treatment device; 62, exhaust gas treatment pipeline; 70, second control unit; 71, third control valve; 72, fourth control valve; 80, first flow 90. First bypass line; 100. Bypass control unit; 101. First bypass valve; 102. Second bypass valve; 110. Second bypass line; 120. Fifth control valve; 130. Residual liquid recovery device; 131. Residual liquid collector; 132. Residual liquid recovery line; 133. Sixth control valve; 134. Exhaust line; 135. Eighth control valve; 136. Ninth control valve; 137. Residual gas exhaust line; 138. Residual gas control valve; 140. Purge branch; 150. Tenth control valve. DETAILED DESCRIPTION

[0114] In order to enable those skilled in the art to better understand the technical solution of the present application, the liquid source vaporization system provided in the present application is described in detail below with reference to the accompanying drawings.

[0115] As shown in Figure 1, Example 1 discloses a liquid source vaporization system for use in semiconductor process equipment. The liquid source vaporization system includes a liquid source pipeline 10, a vaporization device 20, an output pipeline 30, a purge pipeline 40, a first control unit 50, an exhaust gas treatment unit 60, and a second control unit 70.

[0116] The liquid source pipeline 10, vaporizer 20, and output pipeline 30 are sequentially connected. Specifically, the inlet of the liquid source pipeline 10 is connected to a liquid source, and the outlet of the liquid source pipeline 10 is connected to the vaporizer 20, allowing the liquid source pipeline 10 to supply a liquid process medium to the vaporizer 20. After the liquid process medium enters the vaporizer 20, the vaporizer 20 vaporizes the liquid process medium into a gaseous process medium. The output pipeline 30 then transports the vaporized gaseous process medium to a process chamber of a semiconductor processing device, thereby performing the corresponding semiconductor process.

[0117] In this embodiment, the inlet end of the purge line 40 is connected to a purge gas source, and the outlet end of the purge line 40 is connected to the vaporizer 20. The purge line 40 is used to provide purge gas to the vaporizer 20. The first control unit 50 is used to selectively control the purge line 40 to be connected to the vaporizer 20 or the liquid source line 10 to be connected to the vaporizer 20. It is easy to understand that when the purge line 40 is connected to the vaporizer 20, the purge gas provided by the purge gas source can be delivered to the vaporizer 20 through the purge line 40; when the liquid source line 10 is connected to the vaporizer 20, the liquid process medium provided by the liquid source can be delivered to the vaporizer 20 through the liquid source line 10. The first control unit 50 is used to switch between providing the purge gas to the vaporizer 20 and providing the liquid process medium to the vaporizer 20.

[0118] The exhaust gas treatment unit 60 includes an exhaust gas treatment pipeline 62, the inlet end of which is in communication with the vaporization device 20, and the outlet end of the exhaust gas treatment pipeline 62 is configured to be in communication with the exhaust gas treatment device 61. The exhaust gas treatment pipeline 62 is configured to transport pollutants blown out of the vaporization device 20 by the purge gas to the exhaust gas treatment device 61, so that the pollutants are treated by the exhaust gas treatment device 61. The second control unit 70 is configured to selectively control the exhaust gas treatment pipeline 62 to be in communication with the vaporization device 20 or the output pipeline 30 to be in communication with the vaporization device 20. It is easy to understand that when the exhaust gas treatment pipeline 62 is in communication with the vaporization device 20, the pollutants blown out of the vaporization device 20 by the purge gas can be transported to the exhaust gas treatment device 61 through the exhaust gas treatment pipeline 62; when the output pipeline 30 is in communication with the vaporization device 20, the gaseous process medium vaporized by the vaporization device 20 can be transported to the process chamber through the output pipeline 30. The second control unit 70 is used to switch between delivering pollutants to the tail gas treatment device 61 and delivering gaseous process medium to the process chamber.

[0119] The liquid source vaporization system provided in the embodiment of the present application, by providing a purge line 40, a first control unit 50, an exhaust gas treatment line 62 and a second control unit 70, can not only vaporize the liquid process medium through the vaporization device 20, but also control the purge line 40 and the exhaust gas treatment line 62 to be connected to the vaporization device 20 by controlling the first control unit 50 and the second control unit 70, so as to pass the purge gas into the vaporization device 20, clean the interior of the vaporization device 20 by the purge gas, and blow out the process medium residue in the corresponding pipeline through which the purge gas flows, thereby reducing the process medium residue in the pipeline and avoiding affecting the next use. In addition, since the exhaust gas treatment line 62 is provided, the pollutants blown out from the vaporization device 20 by the purge gas can be transported to the exhaust gas treatment device 61 through the exhaust gas treatment line 62 for treatment, thereby avoiding pollution of the environment by the pollutants.

[0120] As shown in Figures 2 and 3 , during use, the liquid source vaporization system has a working state and a first cleaning state. The liquid source vaporization system switches between the working state and the first cleaning state through the first control unit 50 and the second control unit 70 .

[0121] As shown in Figure 2, in operation, the first control unit 50 controls the liquid source line 10 to communicate with the vaporizer 20, and the second control unit 70 controls the output line 30 to communicate with the vaporizer 20. Liquid process medium enters the vaporizer 20 through the liquid source line 10. The vaporizer 20 vaporizes the liquid process medium and then delivers the vaporized gaseous process medium to the process chamber of the semiconductor processing equipment through the output line 30, thereby performing the corresponding semiconductor process.

[0122] As shown in Figure 3, in the first cleaning state, the first control unit 50 controls the purge line 40 to communicate with the vaporizer 20, and the second control unit 70 controls the exhaust gas treatment line 62 to communicate with the vaporizer 20. The purge gas passes through the purge line 40, the vaporizer 20, the exhaust gas treatment line 62, and the exhaust gas treatment device 61 in sequence, clearing air, moisture, and particles from the lines through which it flows. At the same time, pollutants blown out of the vaporizer 20 by the purge gas can be transported through the exhaust gas treatment line 62 to the exhaust gas treatment device 61 for treatment, thereby preventing pollutants from contaminating the environment.

[0123] It should be noted that in addition to cleaning the vaporization device 20 after the liquid source vaporization system vaporizes the liquid process medium, the first cleaning state can also be performed before the liquid source vaporization system vaporizes the process medium, to blow away the air, moisture, particles, etc. in the pipeline or vaporization device 20 to prepare for the process.

[0124] Furthermore, in this embodiment, the vaporization device 20 includes a vaporizer 21, a liquid inlet pipeline 22, a gas outlet pipeline 23, a carrier gas pipeline 24, and a carrier gas control valve 25. The vaporizer 21 has a vaporization chamber for vaporizing the liquid process medium. The outlet end of the liquid inlet pipeline 22 is connected to the vaporization chamber, and the inlet end of the liquid inlet pipeline 22 is connected to the outlet end of the liquid source pipeline 10 and the outlet end of the purge pipeline 40 respectively. The inlet end of the gas outlet pipeline 23 is connected to the vaporization chamber, and the outlet end of the gas outlet pipeline 23 is connected to the inlet end of the output pipeline 30 and the inlet end of the exhaust gas treatment pipeline 62 respectively. The inlet end of the carrier gas pipeline 24 is used to communicate with the carrier gas source, and the outlet end of the carrier gas pipeline 24 is connected to the vaporization chamber. The carrier gas control valve 25 is provided on the carrier gas pipeline 24 and is used to control the on-off of the carrier gas pipeline 24.

[0125] The exhaust gas treatment unit 60 also includes a vacuum pump. The inlet end of the exhaust gas treatment pipeline 62 is connected to the outlet end of the exhaust pipeline 23, and the outlet end of the exhaust gas treatment pipeline 62 is connected to the exhaust gas treatment device 61. The vacuum pump is set on the exhaust gas treatment pipeline 62.

[0126] The first control unit 50 includes a first control valve 51 and a second control valve 52. The first control valve 51 is provided on the liquid source pipeline 10 for controlling the on-off of the liquid source pipeline 10; the second control valve 52 is provided on the purge pipeline 40 for controlling the on-off of the purge pipeline 40.

[0127] The second control unit 70 includes a third control valve 71 and a fourth control valve 72. The third control valve 71 is arranged on the output pipeline 30 for controlling the on-off of the output pipeline 30; the fourth control valve 72 is arranged on the exhaust gas treatment pipeline 62 for controlling the on-off of the exhaust gas treatment pipeline 62. The vacuum pump is located between the fourth control valve 72 and the exhaust gas treatment device 61 for providing power for the gas in the exhaust gas treatment pipeline 62 to flow to the exhaust gas treatment device 61.

[0128] The liquid source vaporization system has a working state, a first cleaning state and a second cleaning state.

[0129] As shown in Figure 2, in the operating state, the first control valve 51 is open, the second control valve 52 is closed, the third control valve 71 is open, the fourth control valve 72 is closed, and the carrier gas control valve 25 is open. The liquid source line 10, the liquid inlet line 22, the vaporizer 21, the gas outlet line 23, and the output line 30 are sequentially connected. Liquid process medium enters the vaporizer 21 through the liquid source line 10 and the liquid inlet line 22. The vaporizer 21 vaporizes the liquid process medium. The vaporized gaseous process medium then enters the process chamber of the semiconductor processing equipment through the gas outlet line 23 and the output line 30, thereby performing the corresponding semiconductor process.

[0130] As shown in Figure 3, in the first cleaning state, second control valve 52 is open, first control valve 51 is closed, fourth control valve 72 is open, third control valve 71 is closed, and carrier gas control valve 25 is closed. The purge gas sequentially passes through purge line 40, liquid inlet line 22, vaporizer 21, gas outlet line 23, and tail gas treatment line 62, thereby purging residual liquid, air, moisture, and particles from the lines and vaporizer 21. Simultaneously, pollutants blown out of vaporizer 20 by the purge gas pass through tail gas treatment line 62 and enter tail gas treatment device 61, where they are then treated and protected from environmental contamination.

[0131] As shown in Figure 4, in the second cleaning state, the second control valve 52 is open, the first control valve 51 is closed, the fourth control valve 72 is open, the third control valve 71 is closed, and the carrier gas control valve 25 is open. The second cleaning state is primarily intended to completely discharge residual liquid and gas from the pipeline and vaporizer 21 after the process is completed. The purge gas passes through the purge line 40, the liquid inlet line 22, the vaporizer 21, the gas outlet line 23, and the exhaust gas treatment line 62 in sequence. At the same time, due to the open carrier gas control valve 25, the liquid inside the vaporizer 21 is vaporized into gas under the action of the carrier gas, and then blown out together with the purge gas, thereby purging the residual liquid and gas in the pipeline and vaporizer 21. At the same time, the pollutants blown out of the vaporizer 20 by the purge gas enter the exhaust gas treatment line 62 and enter the exhaust gas treatment device 61, where they are treated and prevented from polluting the environment.

[0132] It should be noted that, in the above-mentioned first embodiment, the liquid source vaporization system further includes a first flow meter 80 . The first flow meter 80 is provided on the liquid inlet pipeline 22 . The first flow meter 80 is used to control the flow rate of the liquid process medium.

[0133] It should also be noted that in the above-mentioned embodiment 1, the first control unit 50 includes a first control valve 51 and a second control valve 52, but this is not restrictive. For example, in some other embodiments not shown in the figure, the first control unit 50 can also be a three-way valve, the first end of the three-way valve is connected to the liquid inlet line 22, the second end of the three-way valve is connected to the liquid source line 10, and the third end of the three-way valve is connected to the purge line 40, so that the purge line 40 can be selectively connected to the liquid inlet line 22 or the liquid source line 10 can be selectively connected to the liquid inlet line 22 through the three-way valve. In other words, without violating the working principle of the present application, as long as the structure can switch between the connection between the purge line 40 and the liquid inlet line 22 and the connection between the liquid source line 10 and the liquid inlet line 22, it is within the scope of protection of the present application. Similarly, in the above-mentioned embodiment 1, the second control unit 70 can also be a three-way valve, which will not be repeated here.

[0134] As shown in Figure 5, Example 2 of the present application also discloses a liquid source vaporization system, which is basically the same as Example 1, except that, in this embodiment, the liquid source vaporization system also includes: a first bypass line 90 and a bypass control unit 100, the inlet end of the first bypass line 90 is connected to the liquid inlet line 22, the inlet end of the first bypass line 90 is located between the first flow meter 80 and the vaporizer 21, and the outlet end of the first bypass line 90 is connected to the exhaust gas treatment line 62. Specifically, the outlet end of the first bypass line 90 is connected to the exhaust gas treatment line 62 and is located between the fourth control valve 72 and the vacuum pump; the bypass control unit 100 is used to selectively control the first flow meter 80 to be connected to the vaporization chamber or the first flow meter 80 to be connected to the first bypass line 90.

[0135] Among them, the bypass control unit 100 includes a first bypass valve 101 and a second bypass valve 102. The first bypass valve 101 is arranged on the first bypass line 90 and is used to control the on-off of the first bypass line 90; the second bypass valve 102 is arranged on the liquid inlet line 22 and is located between the inlet end of the first bypass line 90 and the vaporizer 21, and is used to control the on-off of the liquid inlet line 22.

[0136] The liquid source vaporization system has a working state and a third cleaning state.

[0137] In operation, the first control unit 50 connects the liquid source line 10 to the liquid inlet line 22, the bypass control unit 100 connects the first flowmeter 80 to the vaporizer, and the second control unit 70 connects the output line 30 to the gas outlet line 23. Specifically, the first control valve 51 is opened and the second control valve 52 is closed; the third control valve 71 is opened and the fourth control valve 72 is closed; the second bypass valve 102 is opened and the first bypass valve 101 is closed; and the carrier gas control valve 25 is opened. In operation, the liquid source line 10, first flowmeter 80, liquid inlet line 22, vaporizer 21, gas outlet line 23, and output line 30 are connected in sequence. The liquid process medium enters the vaporizer 21 through the liquid source pipeline 10, the first flowmeter 80, and the liquid inlet pipeline 22 in sequence. The vaporizer 21 vaporizes the liquid process medium. The vaporized gaseous process medium then enters the process chamber of the semiconductor process equipment through the gas outlet pipeline 23 and the output pipeline 30 in sequence, thereby performing the corresponding semiconductor process.

[0138] As shown in Figure 5, in the third cleaning state, the first control unit 50 controls the purge line 40 to connect to the liquid inlet line 22, and the bypass control unit 100 controls the first flowmeter 80 to connect to the first bypass line 90. Specifically, the second control valve 52 is opened and the first control valve 51 is closed; the first bypass valve 101 is opened, the second bypass valve 102 is closed, and the carrier gas control valve 25 is closed. This connects the purge line 40, the first flowmeter 80, the liquid inlet line 22, the first bypass line 90, the exhaust gas treatment line 62, the vacuum pump, and the exhaust gas treatment device 61 in sequence. Because commonly used liquid process media may have hazardous properties such as pyrophoricity, corrosiveness, and toxicity, when the first flowmeter 80 needs maintenance or replacement, it must be thoroughly purged to ensure personnel safety and prevent residues in components and pipelines. When the liquid source vaporization system is in the third cleaning state, the purge gas passes through the purge pipeline 40, the first flow meter 80, the liquid inlet pipeline 22, the first bypass pipeline 90, the exhaust gas treatment pipeline 62, the vacuum pump and the exhaust gas treatment device 61 in sequence, blowing the pollutants and residual liquid therein to the exhaust gas treatment device 61, thereby ensuring the safety of the operator during the maintenance and replacement of the first flow meter 80.

[0139] It should be noted that in the above-mentioned second embodiment, the bypass control unit 100 includes a first bypass valve 101 and a second bypass valve 102, but this is not restrictive. For example, in some other embodiments not shown in the figures, the first control unit 50 can also be a three-way valve, with a first end of the three-way valve communicating with the liquid inlet line 22, a second end of the three-way valve communicating with the first bypass line 90, and a third end of the three-way valve communicating with the vaporizer 21. Thus, the three-way valve enables communication between the liquid inlet line 22 and the first bypass line 90, or between the liquid inlet line 22 and the vaporizer 21. In other words, as long as the structure can achieve switching between the vaporizer 21 and the first bypass line 90 without violating the working principle of the present application, it is within the scope of protection of the present application.

[0140] As shown in Figure 6, embodiment three of the present application also discloses a liquid source vaporization system, which is basically the same as embodiment one, except that, in this embodiment, the liquid source vaporization system also includes: a second bypass line 110 and a fifth control valve 120, the inlet end of the second bypass line 110 is connected to the purge gas source, the outlet end of the second bypass line 110 is connected to the liquid inlet line 22, and the outlet end of the second bypass line 110 is located between the first flowmeter 80 and the vaporization chamber; the fifth control valve 120 is arranged on the second bypass line 110, for controlling the on and off of the second bypass line 110.

[0141] The liquid source vaporization system has a working state and a fourth cleaning state.

[0142] In the operating state, the first control valve 51 is open, the second control valve 52 is closed, the fifth control valve 120 is closed, the third control valve 71 is open, the fourth control valve 72 is closed, and the carrier gas control valve 25 is open. The liquid source pipeline 10, the liquid inlet pipeline 22, the vaporizer 21, the gas outlet pipeline 23, and the output pipeline 30 are sequentially connected. Liquid process medium enters the vaporizer 21 through the liquid source pipeline 10 and the liquid inlet pipeline 22. The vaporizer 21 vaporizes the liquid process medium. The vaporized gaseous process medium then enters the process chamber of the semiconductor processing equipment through the gas outlet pipeline 23 and the output pipeline 30, thereby performing the corresponding semiconductor process.

[0143] As shown in FIG6 , in the fourth cleaning state, the fifth control valve 120 is open, the first control valve 51 is closed, the second control valve 52 is closed, the carrier gas control valve 25 is open, the fourth control valve 72 is open, and the third control valve 71 is closed.

[0144] The fourth clean state is mainly used when the first flowmeter 80 fails and cannot pass liquid. When the liquid source vaporization system is in the fourth clean state, the purge gas source, the second bypass line 110, the liquid inlet line 22, the vaporizer 21, the gas outlet line 23, the exhaust gas treatment line 62, the vacuum pump, and the exhaust gas treatment device 61 are connected in sequence. The purge gas bypasses the first flowmeter 80 through the second bypass line 110 and then enters the vaporizer 21 through the liquid inlet line 22. At the same time, with the assistance of the carrier gas, the vaporizer 21 vaporizes the residual liquid inside. Then, under the action of the purge gas, the residual liquid, air, moisture, particles, etc. in the pipeline and the vaporizer 21 are purged clean, and the vaporized gas and pollutants are discharged into the exhaust gas treatment device 61 through the gas outlet line 23 and the exhaust gas treatment line 62. Finally, the pollutants are treated by the exhaust gas treatment device 61 to prevent the pollutants from polluting the environment. By providing the second bypass line 110 , when the first flow meter 80 fails and cannot pass liquid, the residual liquid in the rear end pipeline of the first flow meter 80 can be drained first, thereby ensuring overall safety.

[0145] In the prior art, if a heating failure occurs in the vaporizer 21 and the vaporizer 21 is unable to continue vaporizing the liquid process medium, it becomes difficult to discharge the residual liquid process medium in the pipeline. To solve this problem, as shown in Figure 7, the fourth embodiment of the present application also discloses a liquid source vaporization system, which is basically the same as the first embodiment, except that, in this embodiment, the liquid source vaporization system also includes: a residual liquid recovery device 130, which is connected to the liquid inlet pipeline 22 and is used to recover the residual process medium.

[0146] The liquid source vaporization system of the fourth embodiment of the present application adds a residual liquid recovery device 130 on the basis of the first embodiment, which can recover the residual liquid in the pipeline, thereby reducing the loss of liquid process medium and lowering material costs.

[0147] Specifically, in the fourth embodiment, as shown in Figure 7, the residual liquid recovery device 130 includes: a residual liquid collector 131, a residual liquid recovery pipeline 132 and a sixth control valve 133. The residual liquid collector 131 is used to recover residual liquid process medium; the outlet end of the residual liquid recovery pipeline 132 is connected to the residual liquid collector 131, and the inlet end of the residual liquid recovery pipeline 132 is connected to the liquid inlet pipeline 22; the sixth control valve 133 is arranged on the residual liquid recovery pipeline 132, and is used to control the on and off of the residual liquid recovery pipeline 132.

[0148] In order to cooperate with the residual liquid recovery device 130 to recover residual liquid, the vaporization device 20 also includes: a seventh control valve 26, which is arranged on the liquid inlet pipeline 22, and the seventh control valve 26 is located between the inlet end of the residual liquid recovery pipeline 132 and the vaporizer 21, and is used to control the connection and disconnection between the vaporization chamber of the vaporizer 21 and the liquid inlet pipeline 22.

[0149] Furthermore, the residual liquid recovery device 130 also includes an exhaust line 134 and an eighth control valve 135. The residual liquid collector 131 has an exhaust port connected to the exhaust gas treatment pipeline 62 via the exhaust line 134. The eighth control valve 135 is disposed on the exhaust line 134 and is used to control the on / off state of the exhaust line 134. The provision of the exhaust line 134 allows excess gas and pressure in the container of the residual liquid collector 131 to be discharged into the exhaust gas treatment pipeline 62, thereby facilitating the collection of the residual liquid.

[0150] In this embodiment, the liquid source vaporization system has a working state and a first residual liquid recovery state.

[0151] In the operating state, the first control valve 51 is open and the second control valve 52 is closed; the third control valve 71 is open and the fourth control valve 72 is closed; the seventh control valve 26 is open and the sixth control valve 133 is closed; and the carrier gas control valve 25 is open. In the operating state, the liquid source pipeline 10, the first flowmeter 80, the liquid inlet pipeline 22, the vaporizer 21, the gas outlet pipeline 23, and the output pipeline 30 are sequentially connected. Liquid process medium enters the vaporizer 21 through the liquid source pipeline 10, the first flowmeter 80, and the liquid inlet pipeline 22. The vaporizer 21 vaporizes the liquid process medium. The vaporized gaseous process medium then enters the process chamber of the semiconductor processing equipment through the gas outlet pipeline 23 and the output pipeline 30, thereby performing the corresponding semiconductor process.

[0152] As shown in FIG7 , in the first residual liquid recovery state, the second control valve 52 is open, the first control valve 51 is closed, the sixth control valve 133 is open, the seventh control valve 26 is closed, the eighth control valve 135 is open, and the carrier gas control valve 25 is closed.

[0153] The first residual liquid recovery state is primarily used when the vaporizer 21 fails and is unable to perform vaporization, allowing the residual liquid in the pipeline to enter the residual liquid collector 131 for recovery along with the purge gas. When the liquid source vaporization system is in the first residual liquid recovery state, the purge gas source, purge pipeline 40, liquid inlet pipeline 22, residual liquid recovery pipeline 132, and residual liquid collector 131 are sequentially connected, and the exhaust port of the residual liquid collector 131, exhaust pipeline 134, exhaust gas treatment pipeline 62, and exhaust gas treatment device 61 are sequentially connected. The purge gas enters the residual liquid collector 131 through the purge pipeline 40, liquid inlet pipeline 22, and residual liquid recovery pipeline 132, and then enters the exhaust gas treatment device 61 through the exhaust port of the residual liquid collector 131, exhaust pipeline 134, and exhaust gas treatment pipeline 62. During this process, the residual liquid in the pipeline enters the residual liquid collector 131 for recovery along with the purge gas, and the gaseous process medium or other waste gas in the pipeline can enter the exhaust gas treatment device 61 together with the purge gas for treatment, thereby ensuring the collection of residual liquid while avoiding environmental pollution.

[0154] The liquid source vaporization system of the fourth embodiment of the present application is provided with a residual liquid collector 131, a residual liquid recovery line 132 and a sixth control valve 133, and a seventh control valve 26 is provided on the liquid inlet line 22 between the inlet end of the residual liquid recovery line 132 and the vaporizer 21. The sixth control valve 133 and the seventh control valve 26 can selectively control the connection between the liquid inlet line 22 and the residual liquid recovery line 132 or the connection between the liquid inlet line 22 and the vaporizer 21, so that when the liquid inlet line 22 is connected to the residual liquid recovery line 132, the residual liquid in the line can be recovered, thereby reducing the loss of liquid process medium and reducing material costs. In addition, by providing an exhaust line 134, the excess gas and pressure in the container of the residual liquid collector 131 can be discharged into the exhaust gas treatment line 62, and the gaseous process medium or other waste gas in the line can be introduced into the exhaust gas treatment device 61 together with the purge gas for treatment, thereby facilitating the collection of residual liquid while avoiding environmental pollution, which is a typical multi-purpose product.

[0155] As shown in Figure 8, the fifth embodiment of the present application also discloses a liquid source vaporization system, which is basically the same as the fourth embodiment, except that, in this embodiment, the liquid source vaporization system also includes: a ninth control valve 136, the ninth control valve 136 is arranged on the residual liquid recovery pipeline 132, and the ninth control valve 136 is located between the sixth control valve 133 and the outlet end of the residual liquid recovery pipeline 132.

[0156] The liquid source vaporization system also includes: a purge branch 140 and a tenth control valve 150. The inlet end of the purge branch 140 is connected to the purge gas source, and the outlet end of the purge branch 140 is connected to the residual liquid recovery pipeline 132. The outlet end of the purge branch 140 is located between the ninth control valve 136 and the sixth control valve 133; the tenth control valve 150 is arranged on the purge branch 140 to control the on and off of the purge branch 140.

[0157] In this embodiment, the liquid source vaporization system has a working state and a second residual liquid recovery state.

[0158] In the operating state, the first control valve 51 is open, the second control valve 52 is closed, and the tenth control valve 150 is closed; the third control valve 71 is open, the fourth control valve 72 is closed, the seventh control valve 26 is open, the sixth control valve 133 is closed, and the carrier gas control valve 25 is open. In the operating state, the liquid source pipeline 10, the first flowmeter 80, the liquid inlet pipeline 22, the vaporizer 21, the gas outlet pipeline 23, and the output pipeline 30 are sequentially connected. The liquid process medium enters the vaporizer 21 through the liquid source pipeline 10, the first flowmeter 80, and the liquid inlet pipeline 22. The vaporizer 21 vaporizes the liquid process medium. The vaporized gaseous process medium then enters the process chamber of the semiconductor processing equipment through the gas outlet pipeline 23 and the output pipeline 30, thereby performing the corresponding semiconductor process.

[0159] As shown in Figure 8, in the second residual liquid recovery state, the tenth control valve 150 is open, the first control valve 51 is closed, the second control valve 52 is closed, the ninth control valve 136 is open, the sixth control valve 133 is closed, the seventh control valve 26 is closed, the eighth control valve 135 is open, and the carrier gas control valve 25 is closed.

[0160] The second residual liquid recovery state is primarily used to purge the pipeline after residual liquid collection is complete to expel impurities such as air and moisture from the pipeline and residual liquid collector 131. When the liquid source vaporization system is in the second residual liquid recovery state, the purge gas source, purge branch 140, residual liquid recovery pipeline 132, and residual liquid collector 131 are sequentially connected, and the exhaust port of residual liquid collector 131, exhaust pipeline 134, exhaust gas treatment pipeline 62, and exhaust gas treatment device 61 are sequentially connected. The purge gas enters the residual liquid collector 131 through the purge branch 140 and residual liquid recovery pipeline 132, and then enters the exhaust gas treatment device 61 through the exhaust port of the residual liquid collector 131, exhaust pipeline 134, and exhaust gas treatment pipeline 62. During this process, impurities such as air and water vapor in the pipeline and the residual liquid collector 131 are discharged from the residual liquid collector 131 along with the purge gas, and enter the exhaust gas treatment device 61 together with the purge gas for treatment, thereby ensuring that the collected residual liquid will not react with the gas impurities and is in a relatively stable state; at the same time, it can also avoid environmental pollution caused by the discharged exhaust gas.

[0161] As shown in Figure 9, embodiment six of the present application also discloses a liquid source vaporization system, which is basically the same as embodiment five, except that, in this embodiment, the residual liquid recovery device 130 also includes: a residual gas exhaust pipeline 137 and a residual gas control valve 138, the inlet end of the residual gas exhaust pipeline 137 is connected to the residual liquid recovery pipeline 132, the inlet end of the residual gas exhaust pipeline 137 is located between the sixth control valve 133 and the ninth control valve 136, the outlet end of the residual gas exhaust pipeline 137 is connected to the exhaust gas treatment pipeline 62, and the outlet end of the residual gas exhaust pipeline 137 is located between the fourth control valve 72 and the vacuum pump; the residual gas control valve 138 is arranged on the residual gas exhaust pipeline 137 to control the on and off of the residual gas exhaust pipeline 137.

[0162] In this embodiment, the liquid source vaporization system has a working state and a pipeline residual gas discharge state.

[0163] In the operating state, the first control valve 51 is open, the second control valve 52 is closed, and the tenth control valve 150 is closed; the third control valve 71 is open, the fourth control valve 72 is closed, the seventh control valve 26 is open, the sixth control valve 133 is closed, and the carrier gas control valve 25 is open. In the operating state, the liquid source pipeline 10, the first flowmeter 80, the liquid inlet pipeline 22, the vaporizer 21, the gas outlet pipeline 23, and the output pipeline 30 are sequentially connected. The liquid process medium enters the vaporizer 21 through the liquid source pipeline 10, the first flowmeter 80, and the liquid inlet pipeline 22. The vaporizer 21 vaporizes the liquid process medium. The vaporized gaseous process medium then enters the process chamber of the semiconductor processing equipment through the gas outlet pipeline 23 and the output pipeline 30, thereby performing the corresponding semiconductor process.

[0164] As shown in Figure 9, in the state of residual gas discharge from the pipeline, the second control valve 52 is open, the first control valve 51 is closed, the tenth control valve 150 is closed, the sixth control valve 133 is open, the residual gas control valve 138 is open, the seventh control valve 26 is closed, the ninth control valve 136 is closed, and the carrier gas control valve 25 is closed.

[0165] The pipeline residual gas discharge state is mainly used to purge the pipeline with purge gas when the residual liquid collector 131 needs to be dismantled after the residual liquid collection is completed, so as to discharge the residual gaseous process medium and impurities such as air and moisture inside the pipeline.

[0166] When the liquid source vaporization system is in the residual gas discharge state, the purge gas source, purge pipeline 40, liquid inlet pipeline 22, residual liquid recovery pipeline 132, residual gas discharge pipeline 137, tail gas treatment pipeline 62, and tail gas treatment device 61 are connected in sequence. The purge gas enters the tail gas treatment device 61 through the purge pipeline 40, liquid inlet pipeline 22, residual liquid recovery pipeline 132, residual gas discharge pipeline 137, and tail gas treatment pipeline 62 in sequence. During this process, the purge gas carries the gaseous process medium, as well as air, moisture, and other impurities in the pipeline, into the tail gas treatment device 61 for treatment, thereby removing the gaseous process medium, air, moisture, and other impurities in the pipeline, ensuring the safety of the residual liquid collector 131 removal process. At the same time, it can also prevent the discharged waste gas from polluting the environment.

[0167] As shown in Figures 10 to 16, Example 7 of the present application also discloses a liquid source vaporization system, which is basically the same as Example 6, except that, in this embodiment, the liquid source vaporization system also includes: a second bypass line 110 and a fifth control valve 120, the inlet end of the second bypass line 110 is connected to the purge gas source, the outlet end of the second bypass line 110 is connected to the liquid inlet line 22, and the outlet end of the second bypass line 110 is located between the first flowmeter 80 and the vaporization chamber; the fifth control valve 120 is arranged on the second bypass line 110, for controlling the on and off of the second bypass line 110.

[0168] In this embodiment, the liquid source vaporization system has a working state, a first cleaning state, a second cleaning state, a fourth cleaning state, a first residual liquid recovery state, a second residual liquid recovery state, and a pipeline residual gas discharge state.

[0169] As shown in Figure 10, in the working state, the first control valve 51 is open, the second control valve 52 is closed, the fifth control valve 120 is closed, the tenth control valve 150 is closed, the seventh control valve 26 is open, the sixth control valve 133 is closed, the carrier gas control valve 25 is open, the third control valve 71 is open, and the fourth control valve 72 is closed.

[0170] In operation, the liquid source pipeline 10, first flowmeter 80, liquid inlet pipeline 22, vaporizer 21, gas outlet pipeline 23, and output pipeline 30 are sequentially connected. Liquid process medium flows sequentially through the liquid source pipeline 10, first flowmeter 80, and liquid inlet pipeline 22 into vaporizer 21. Vaporizer 21 vaporizes the liquid process medium, and the vaporized gaseous process medium then flows sequentially through gas outlet pipeline 23 and output pipeline 30 into the process chamber of the semiconductor processing equipment, thereby performing the corresponding semiconductor process.

[0171] As shown in Figure 11, in the first cleaning state, the second control valve 52 is open, the first control valve 51 is closed, the fifth control valve 120 is closed, the tenth control valve 150 is closed, the seventh control valve 26 is open, the sixth control valve 133 is closed, the carrier gas control valve 25 is closed, the fourth control valve 72 is open, and the third control valve 71 is closed.

[0172] The purge gas passes through the purge pipeline 40, the liquid inlet pipeline 22, the vaporizer 21, and the gas outlet pipeline 23 in sequence, thereby clearing out the residual liquid, air, moisture, particles, etc. in the pipeline and the vaporizer 21. At the same time, the pollutants blown out by the purge gas from the vaporization device 20 enter the exhaust gas treatment device 61 through the exhaust gas treatment pipeline 62, so that the pollutants are treated by the exhaust gas treatment device 61 to avoid pollution of the environment by the pollutants.

[0173] As shown in Figure 12, in the second cleaning state, the second control valve 52 is open, the first control valve 51 is closed, the fifth control valve 120 is closed, the tenth control valve 150 is closed, the seventh control valve 26 is open, the sixth control valve 133 is closed, the carrier gas control valve 25 is open, the fourth control valve 72 is open, and the third control valve 71 is closed.

[0174] The second cleaning state is primarily for discharging residual liquid and gas from the pipelines and vaporizer 21 after the process is completed. The purge gas sequentially passes through the purge pipeline 40, the liquid inlet pipeline 22, the vaporizer 21, and the gas outlet pipeline 23. Simultaneously, with the carrier gas control valve 25 open, the liquid inside the vaporizer 21 is vaporized into gas under the action of the carrier gas, which is then blown out along with the purge gas, thereby purging the residual liquid and gas from the pipelines and vaporizer 21. Simultaneously, the pollutants blown out of the vaporizer 20 by the purge gas enter the exhaust gas treatment device 61 through the exhaust gas treatment pipeline 62, where they are then treated by the exhaust gas treatment device 61, preventing them from contaminating the environment.

[0175] As shown in Figure 13, in the fourth cleaning state, the fifth control valve 120 is open, the first control valve 51 is closed, the second control valve 52 is closed, the tenth control valve 150 is closed, the seventh control valve 26 is open, the sixth control valve 133 is closed, the carrier gas control valve 25 is open, the fourth control valve 72 is open, and the third control valve 71 is closed.

[0176] The fourth clean state is primarily used when the first flowmeter 80 malfunctions and is unable to pass liquid. When the liquid source vaporization system is in the fourth clean state, the purge gas source, second bypass line 110, liquid inlet line 22, vaporizer 21, outlet line 23, tail gas treatment line 62, vacuum pump, and tail gas treatment device 61 are sequentially connected. The purge gas bypasses the first flowmeter 80 through the second bypass line 110 and then enters the vaporizer 21 through the liquid inlet line 22. Simultaneously, with the assistance of the carrier gas, the vaporizer 21 vaporizes the residual liquid inside. The purge gas then purges the residual liquid, air, moisture, and particles in the pipeline and vaporizer 21. The vaporized gas and pollutants are then discharged into the tail gas treatment device 61 through the outlet line 23 and tail gas treatment line 62. Finally, the pollutants are treated by the tail gas treatment device 61 to prevent them from contaminating the environment. By providing the second bypass line 110 , when the first flow meter 80 fails and cannot pass liquid, the residual liquid in the rear end pipeline of the first flow meter 80 can be drained first, thereby ensuring overall safety.

[0177] As shown in Figure 14, in the first residual liquid recovery state, the second control valve 52 is open, the first control valve 51 is closed, the fifth control valve 120 is closed, the tenth control valve 150 is closed, the sixth control valve 133 is open, the ninth control valve 136 is open, the seventh control valve 26 is closed, the residual gas control valve 138 is closed, the eighth control valve 135 is open, the carrier gas control valve 25 is closed, the third control valve 71 is closed, and the fourth control valve 72 is closed.

[0178] The first residual liquid recovery state is primarily used when the vaporizer 21 fails and is unable to perform vaporization, allowing the residual liquid in the pipeline to enter the residual liquid collector 131 for recovery along with the purge gas. When the liquid source vaporization system is in the first residual liquid recovery state, the purge gas source, purge pipeline 40, liquid inlet pipeline 22, residual liquid recovery pipeline 132, and residual liquid collector 131 are sequentially connected, and the exhaust port of the residual liquid collector 131, exhaust pipeline 134, exhaust gas treatment pipeline 62, and exhaust gas treatment device 61 are sequentially connected. The purge gas enters the residual liquid collector 131 through the purge pipeline 40, liquid inlet pipeline 22, and residual liquid recovery pipeline 132, and then enters the exhaust gas treatment device 61 through the exhaust port of the residual liquid collector 131, exhaust pipeline 134, and exhaust gas treatment pipeline 62. During this process, the residual liquid in the pipeline enters the residual liquid collector 131 for recovery along with the purge gas, and the gaseous process medium or other waste gas in the pipeline can enter the tail gas treatment device 61 for treatment along with the purge gas, thereby ensuring the collection of residual liquid while avoiding environmental pollution.

[0179] The liquid source vaporization system of the seventh embodiment of the present application is provided with a residual liquid collector 131, a residual liquid recovery line 132 and a sixth control valve 133, and a seventh control valve 26 is provided on the liquid inlet line 22 between the inlet end of the residual liquid recovery line 132 and the vaporizer 21. The sixth control valve 133 and the seventh control valve 26 can selectively control the connection between the liquid inlet line 22 and the residual liquid recovery line 132 or the connection between the liquid inlet line 22 and the vaporizer 21, so that when the liquid inlet line 22 is connected to the residual liquid recovery line 132, the residual liquid in the line can be recovered, thereby reducing the loss of the liquid process medium and reducing the material cost. In addition, by providing an exhaust line 134, the excess gas and pressure in the container of the residual liquid collector 131 can be discharged into the exhaust gas treatment line 62, and the gaseous process medium or other waste gas in the line can be introduced into the exhaust gas treatment device 61 together with the purge gas for treatment, thereby facilitating the collection of residual liquid while avoiding environmental pollution, which is a typical multi-purpose product.

[0180] As shown in Figure 15, in the second residual liquid recovery state, the tenth control valve 150 is opened, the first control valve 51 is closed, the second control valve 52 is closed, and the fifth control valve 120 is closed; the ninth control valve 136 is opened, the sixth control valve 133 is closed, the seventh control valve 26 is closed, and the residual gas control valve 138 is closed; the eighth control valve 135 is opened, the carrier gas control valve 25 is closed, the third control valve 71 is closed, and the fourth control valve 72 is closed.

[0181] The second residual liquid recovery state is primarily used to purge the pipeline after residual liquid collection is complete to expel impurities such as air and moisture from the pipeline and residual liquid collector 131. When the liquid source vaporization system is in the second residual liquid recovery state, the purge gas source, purge branch 140, residual liquid recovery pipeline 132, and residual liquid collector 131 are sequentially connected, and the exhaust port of residual liquid collector 131, exhaust pipeline 134, exhaust gas treatment pipeline 62, and exhaust gas treatment device 61 are sequentially connected. The purge gas enters the residual liquid collector 131 through the purge branch 140 and residual liquid recovery pipeline 132, and then enters the exhaust gas treatment device 61 through the exhaust port of the residual liquid collector 131, exhaust pipeline 134, and exhaust gas treatment pipeline 62. During this process, impurities such as air and water vapor in the pipeline and the residual liquid collector 131 are discharged from the residual liquid collector 131 along with the purge gas, and enter the exhaust gas treatment device 61 together with the purge gas for treatment, thereby ensuring that the collected residual liquid will not react with the gas impurities and is in a relatively stable state; at the same time, it can also avoid environmental pollution caused by the discharged exhaust gas.

[0182] As shown in Figure 16, in the state of residual gas discharge from the pipeline, the second control valve 52 is opened, the first control valve 51 is closed, the fifth control valve 120 is closed, the tenth control valve 150 is closed, the sixth control valve 133 is opened, the residual gas control valve 138 is opened, the seventh control valve 26 is closed, the ninth control valve 136 is closed, the eighth control valve 135 and the carrier gas control valve 25 are closed, the third control valve 71 is closed, and the fourth control valve 72 is closed.

[0183] The pipeline residual gas discharge state is mainly used to purge the pipeline with purge gas when the residual liquid collector 131 needs to be dismantled after the residual liquid collection is completed, so as to remove the residual gaseous process medium and impurities such as air and moisture inside the pipeline.

[0184] When the liquid source vaporization system is in the residual gas discharge state, the purge gas source, purge pipeline 40, liquid inlet pipeline 22, residual liquid recovery pipeline 132, residual gas discharge pipeline 137, tail gas treatment pipeline 62, and tail gas treatment device 61 are connected in sequence. The purge gas enters the tail gas treatment device 61 through the purge pipeline 40, liquid inlet pipeline 22, residual liquid recovery pipeline 132, residual gas discharge pipeline 137, and tail gas treatment pipeline 62 in sequence. During this process, the purge gas carries the gaseous process medium, as well as air, moisture, and other impurities in the pipeline, into the tail gas treatment device 61 for treatment, thereby removing the gaseous process medium, air, moisture, and other impurities in the pipeline, ensuring the safety of the residual liquid collector 131 removal process. At the same time, it can also prevent the discharged waste gas from polluting the environment.

[0185] It should be noted that, in this embodiment, the pipeline residual gas discharge state can also realize the function of the third cleaning state in Example 2. That is to say, when the first flow meter 80 needs maintenance and replacement, in order to ensure the safety of personnel, the liquid source vaporization system of this embodiment can be adjusted to the pipeline residual gas discharge state, and the pollutants and residual liquid therein can be blown to the exhaust gas treatment system for treatment, thereby ensuring the safety of the operating personnel during the maintenance and replacement of the first flow meter 80. It is a typical multi-purpose device.

[0186] In the prior art, the atomizer and the flow meter in the vaporizer 21 both have small aperture structures, which can easily cause blockage when the liquid source is viscous. Therefore, the vaporizer 21 and the flow meter need to be replaced and maintained.

[0187] To address the above-mentioned issues, the liquid source vaporization system of this embodiment also has a first flushing state. The first flushing state is substantially the same as the first residual liquid recovery state, except that, in the first flushing state, the first control valve 51 is open and the second control valve 52 is closed. Furthermore, the liquid introduced into the liquid source is no longer a process medium, but is replaced by an organic solvent, such as n-octane. The organic solvent is used to flush the pipelines and components. The residual liquid and organic solvent after pipeline flushing pass sequentially through the purge line 40, the liquid inlet line 22, and the residual liquid recovery line 132 into the residual liquid collector 131, where the waste liquid after flushing is collected, thereby completing the flushing of the pipeline. Afterwards, the system can enter the first residual liquid recovery state, where the residual liquid in the pipeline is recovered by the purge gas, completing the pipeline cleaning process.

[0188] In addition, the liquid source vaporization system of this embodiment also has a second flushing state. The second flushing state is substantially the same as the second cleaning state, except that in the second flushing state, the first control valve 51 is open and the second control valve 52 is closed. Furthermore, the liquid introduced into the liquid source is no longer a process medium, but instead an organic solvent, such as n-octane. The organic solvent sequentially passes through the purge line 40, the liquid inlet line 22, the vaporizer 21, and the gas outlet line 23. Simultaneously, due to the open carrier gas control valve 25, the vaporizer 21, under the action of the carrier gas, vaporizes the liquid organic solvent within into a gas, dissolving the residual process medium within the vaporizer 21 and then blowing it out. This flushes the residual process medium in the lines and the vaporizer 21, and then enters the exhaust gas treatment device 61 through the exhaust gas treatment line 62. The exhaust gas treatment device 61 then treats the pollutants, preventing environmental contamination. Afterwards, the system can enter the second cleaning state, where the residual liquid in the lines is recovered by the purge gas, completing the line cleaning process.

[0189] The difference between the first flushing state and the second flushing state is that the first flushing state flushes the pipeline before the vaporizer 21 , while the second flushing state can flush the inside of the vaporizer 21 .

[0190] As shown in Figure 17 , the eighth embodiment of the present application also discloses a liquid source vaporization system, which is substantially the same as the seventh embodiment, except that, in this embodiment, the exhaust line 134 does not pass through a vacuum pump but is directly connected to the exhaust gas treatment device 61. This structure is primarily used to allow the liquid source vaporization system to be directly adjusted to the second residual liquid recovery state after installation. Since this is the first purge of the residual liquid collector 131, there is no special gas or liquid in the pipeline. Therefore, the liquid can be directly purged into the exhaust gas treatment system without passing through a vacuum pump.

[0191] It should be noted that, in the above embodiment, in order to prevent the carrier gas from causing fluctuations in the original temperature after entering the vaporizer 21, the vaporization device 20 also includes a heat exchanger, which is arranged on the carrier gas pipeline 24. The heat exchanger is used to heat the carrier gas so as to increase the temperature of the carrier gas to the required temperature in a shorter time, thereby improving the vaporization effect.

[0192] In the above embodiment, the first flowmeter 80 is a mass flowmeter that can precisely control the flow rate of the liquid. Furthermore, to precisely control the flow rate of the carrier gas, a gas flowmeter is provided on the carrier gas line 24. This gas flowmeter is a mass flowmeter that can precisely control the flow rate of the gas. However, this is not intended to be limiting. Any device that can precisely measure the flow rate of a liquid or gas, provided it does not violate the inventive concept of this application, is within the scope of this application.

[0193] It should also be noted that in order to monitor the state of the liquid or gas in the pipeline, a pressure detection device can be installed on the pipeline to confirm the overall transmission performance and safety.

[0194] A first pressure detection device may be provided on the liquid inlet pipeline 22, located between the inlet end of the residual liquid recovery pipeline 132 and the first flow meter 80, for detecting the pressure of the fluid entering the vaporizer 21 and confirming the stability of the liquid source supply pressure.

[0195] A second pressure detection device can also be set on the outlet pipe 23 to detect the outlet pressure at the rear end of the vaporizer 21. If the outlet pressure is too low, the carrier gas pressure and carrier gas volume can be appropriately increased to increase the outlet pressure to ensure the positive transmission of the fluid. At the same time, the sealing of the pipeline can also be confirmed.

[0196] A third pressure detection device may also be provided on the residual gas discharge pipeline 137. The third pressure detection device is located between the inlet end of the third pressure detection device and the residual gas control valve 138, and can confirm the sealing of the pipeline.

[0197] A fourth pressure detection device may also be provided at the inlet of the vacuum pump to confirm whether the vacuum pump is operating normally and whether the pipeline is in a vacuum state.

[0198] It should also be noted that in the above embodiment, a vacuum pump is used to utilize negative pressure to extract the gas in the pipeline and discharge it into the exhaust gas treatment device, but this is not restrictive. It can also be an air pump, fan or other device. As long as it can generate air flow and discharge the air flow into the exhaust gas treatment device, the device is within the scope of protection of this application.

[0199] It is understood that the above embodiments are merely exemplary embodiments for illustrating the principles of the present application, and the present application is not limited thereto. Those skilled in the art may make various modifications and improvements without departing from the spirit and substance of the present application, and such modifications and improvements are also considered to be within the scope of protection of the present application.

Claims

1. A liquid source vaporization system, applied to semiconductor process equipment, characterized in that: include: A vaporizing device (20) for vaporizing a liquid process medium into a gaseous process medium; A liquid source pipeline (10) for providing liquid process medium to the vaporizing device (20); a purge pipeline (40) for providing purge gas to the vaporization device (20); a first control unit (50) for selectively controlling the purge pipeline (40) or the liquid source pipeline (10) to communicate with the vaporization device (20); An output pipeline (30) for transporting the vaporized gaseous process medium to a process chamber of the semiconductor process equipment; An exhaust gas treatment pipeline (62) is used to transport pollutants blown out from the vaporization device (20) by the purge gas to an exhaust gas treatment device (61); The second control unit (70) is used to selectively control the exhaust gas treatment pipeline (62) or the output pipeline (30) to communicate with the vaporization device (20).

2. The liquid source vaporization system according to claim 1, characterized in that: The liquid source vaporization system has a working state and a first cleaning state; In the working state, the first control unit (50) controls the liquid source pipeline (10) to be connected to the vaporizing device (20), and the second control unit (70) controls the output pipeline (30) to be connected to the vaporizing device (20); In the first cleaning state, the first control unit (50) controls the purge pipeline (40) to be in communication with the vaporization device (20), and the second control unit (70) controls the exhaust gas treatment pipeline (62) to be in communication with the vaporization device (20).

3. The liquid source vaporization system according to claim 1, characterized in that: The vaporization device (20) comprises: A vaporizer (21) having a steam generator for vaporizing the liquid process medium. Chemical chamber; A liquid inlet pipeline (22), wherein the outlet end of the liquid inlet pipeline (22) is in communication with the vaporization chamber, and the inlet end of the liquid inlet pipeline (22) is in communication with the outlet end of the liquid source pipeline (10) and the outlet end of the purge pipeline (40) respectively; An air outlet pipeline (23), wherein the inlet end of the air outlet pipeline (23) is connected to the vaporization chamber, and the outlet end of the air outlet pipeline (23) is respectively connected to the inlet end of the output pipeline (30) and the inlet end of the tail gas treatment pipeline (62).

4. The liquid source vaporization system according to claim 3, characterized in that: The liquid source vaporization system has a working state and a first cleaning state; In the working state, the first control unit (50) controls the liquid source pipeline (10) to be in communication with the liquid inlet pipeline (22), and the second control unit (70) controls the output pipeline (30) to be in communication with the gas outlet pipeline (23); In the first cleaning state, the first control unit (50) controls the purge pipeline (40) to communicate with the liquid inlet pipeline (22), and the second control unit (70) controls the exhaust gas treatment pipeline (62) to communicate with the gas outlet pipeline (23).

5. The liquid source vaporization system according to claim 3, characterized in that: The first control unit (50) comprises: a first control valve (51), the first control valve (51) being arranged on the liquid source pipeline (10) and used for controlling the on-off of the liquid source pipeline (10); a second control valve (52), the second control valve (52) being arranged on the purge pipeline (40) and used for controlling the on-off of the purge pipeline (40); and The second control unit (70) comprises: a third control valve (71), the third control valve (71) being arranged on the output pipeline (30) and used for controlling the on-off of the output pipeline (30); A fourth control valve (72), the fourth control valve (72) being arranged on the exhaust gas treatment pipeline (62) and being used for controlling the on-off of the exhaust gas treatment pipeline (62).

6. The liquid source vaporization system according to claim 4, characterized in that: The vaporization device (20) further comprises: A carrier gas pipeline (24), wherein the inlet end of the carrier gas pipeline (24) is used to communicate with a carrier gas source, and the outlet end of the carrier gas pipeline (24) is communicated with the vaporization chamber; A carrier gas control valve (25), wherein the carrier gas control valve (25) is arranged on the carrier gas pipeline (24), and the carrier gas control valve (25) is used to control the on-off of the carrier gas pipeline (24).

7. The liquid source vaporization system according to claim 6, characterized in that: In the working state, the carrier gas control valve (25) is opened; In the first cleaning state, the carrier gas control valve (25) is closed.

8. The liquid source vaporization system according to claim 6, characterized in that: The liquid source vaporization system also has a second clean state; In the second cleaning state, the first control unit (50) controls the purge pipeline (40) to be connected to the liquid inlet pipeline (22), the second control unit (70) controls the gas outlet pipeline (23) to be connected to the exhaust gas treatment pipeline (62), and the carrier gas control valve (25) is opened.

9. The liquid source vaporization system according to claim 3, characterized in that: The liquid source vaporization system also includes: a first flow meter (80), the first flow meter (80) being arranged on the liquid inlet pipeline (22), the first flow meter (80) being used to control the flow rate of the liquid process medium; a first bypass pipeline (90), wherein an inlet end of the first bypass pipeline (90) is in communication with the liquid inlet pipeline (22), the inlet end of the first bypass pipeline (90) is located between the first flow meter (80) and the vaporizer (21), and an outlet end of the first bypass pipeline (90) is in communication with the exhaust gas outlet. The management pipeline (62) is connected; A bypass control unit (100) is used to selectively control the first flow meter (80) to be in communication with the vaporization chamber or the first flow meter (80) to be in communication with the first bypass line (90).

10. The liquid source vaporization system according to claim 9, characterized in that: The liquid source vaporization system has a working state and a third cleaning state; In the working state, the first control unit (50) controls the liquid source pipeline (10) to be connected to the liquid inlet pipeline (22), the bypass control unit (100) controls the first flow meter (80) to be connected to the vaporization chamber, and the second control unit (70) controls the output pipeline (30) to be connected to the gas outlet pipeline (23); In the third cleaning state, the first control unit (50) controls the purge pipeline (40) to be connected to the liquid inlet pipeline (22), and the bypass control unit (100) controls the first flow meter (80) to be connected to the first bypass pipeline (90).

11. The liquid source vaporization system according to claim 9, characterized in that: The bypass control unit (100) comprises a first bypass valve (101) and a second bypass valve (102); the first bypass valve (101) is arranged on the first bypass pipeline (90) and is used to control the on-off of the first bypass pipeline (90); the second bypass valve (102) is arranged on the liquid inlet pipeline (22) and is located between the inlet end of the first bypass pipeline (90) and the vaporizer (21) and is used to control the on-off of the liquid inlet pipeline (22).

12. The liquid source vaporization system according to claim 6, characterized in that: The liquid source vaporization system also includes: a first flow meter (80), the first flow meter (80) being arranged on the liquid inlet pipeline (22), the first flow meter (80) being used to control the flow rate of the liquid process medium; A second bypass pipeline (110), the inlet end of the second bypass pipeline (110) is connected to a purge gas source The outlet end of the second bypass pipeline (110) is in communication with the liquid inlet pipeline (22), and the outlet end of the second bypass pipeline (110) is located between the first flow meter (80) and the vaporization chamber; A fifth control valve (120), wherein the fifth control valve (120) is arranged on the second bypass pipeline (110) and is used to control the opening and closing of the second bypass pipeline (110).

13. The liquid source vaporization system according to claim 12, characterized in that: In the working state, the carrier gas control valve (25) is opened and the fifth control valve (120) is closed; The liquid source vaporization system also has a fourth cleaning state; In the fourth cleaning state, the first control unit (50) controls the liquid source pipeline (10) and the purge pipeline (40) to be disconnected from the liquid inlet pipeline (22), the carrier gas control valve (25) and the fifth control valve (120) are opened, and the second control unit (70) controls the exhaust gas treatment pipeline (62) to be connected to the gas outlet pipeline (23).

14. The liquid source vaporization system according to claim 4, characterized in that: The liquid source vaporization system also includes: A residual liquid collector (131), wherein the residual liquid collector (131) is used to recover residual liquid process medium; a residual liquid recovery pipeline (132), wherein the outlet end of the residual liquid recovery pipeline (132) is in communication with the residual liquid collector (131), and the inlet end of the residual liquid recovery pipeline (132) is in communication with the liquid inlet pipeline (22); a sixth control valve (133), the sixth control valve (133) being arranged on the residual liquid recovery pipeline (132) and being used for controlling the on-off of the residual liquid recovery pipeline (132); The vaporization device (20) further comprises: A seventh control valve (26), the seventh control valve (26) being arranged in the liquid inlet pipeline (22) The seventh control valve (26) is located between the inlet end of the residual liquid recovery pipeline (132) and the vaporizer (21), and is used to control the connection and disconnection between the vaporizer (21) and the liquid inlet pipeline (22).

15. The liquid source vaporization system according to claim 14, characterized in that: The liquid source vaporization system also includes: An exhaust pipeline (134), the residual liquid collector (131) having an exhaust port, the exhaust port being in communication with the exhaust gas treatment pipeline (62) through the exhaust pipeline (134); An eighth control valve (135), the eighth control valve (135) is disposed on the exhaust pipeline (134) and is used to control the on-off of the exhaust pipeline (134).

16. The liquid source vaporization system according to claim 15, characterized in that: In the working state, the seventh control valve (26) is opened and the sixth control valve (133) is closed; The liquid source vaporization system also has a first residual liquid recovery state. In the first residual liquid recovery state, the first control unit (50) controls the purge pipeline (40) to be connected to the liquid inlet pipeline (22), the seventh control valve (26) is closed, and the sixth control valve (133) and the eighth control valve (135) are opened.

17. The liquid source vaporization system according to claim 15, characterized in that: The liquid source vaporization system also includes: a ninth control valve (136), the ninth control valve (136) being arranged on the residual liquid recovery pipeline (132), the ninth control valve (136) being located between the sixth control valve (133) and an outlet end of the residual liquid recovery pipeline (132); A purge branch (140), wherein the inlet end of the purge branch (140) is in communication with a purge gas source, the outlet end of the purge branch (140) is in communication with the residual liquid recovery pipeline (132), and the outlet end of the purge branch (140) is located between the ninth control valve (136) and the sixth control valve (133). between; A tenth control valve (150), the tenth control valve (150) is arranged on the purge branch (140) and is used to control the on-off of the purge branch (140).

18. The liquid source vaporization system according to claim 17, characterized in that: In the working state, the sixth control valve (133) and the tenth control valve (150) are closed, and the seventh control valve (26) is opened; The liquid source vaporization system also has a second residual liquid recovery state. In the second residual liquid recovery state, the first control unit (50) controls the liquid source pipeline (10) and the purge pipeline (40) to be disconnected from the liquid inlet pipeline (22), the sixth control valve (133) is closed, and the tenth control valve (150), the ninth control valve (136), and the eighth control valve (135) are opened.

19. The liquid source vaporization system according to claim 18, characterized in that: The liquid source vaporization system also includes: a residual gas discharge pipeline (137), wherein an inlet end of the residual gas discharge pipeline (137) is communicated with the residual liquid recovery pipeline (132), the inlet end of the residual gas discharge pipeline (137) is located between the sixth control valve (133) and the ninth control valve (136), and the outlet end of the residual gas discharge pipeline (137) is communicated with the tail gas treatment pipeline (62); A residual gas control valve (138), wherein the residual gas control valve (138) is arranged on the residual gas discharge pipeline (137) and is used to control the on-off of the residual gas discharge pipeline (137).

20. The liquid source vaporization system according to claim 19, characterized in that: The liquid source vaporization system also has a pipeline residual gas discharge state; In the residual gas discharge state of the pipeline, the first control unit (50) controls the purge pipeline (40) to be connected to the liquid inlet pipeline (22), the tenth control valve (150), the ninth control valve (136), and the seventh control valve (26) are closed; and the sixth control valve (133) and the residual gas control valve (138) are opened.

21. The liquid source vaporization system according to claim 19, characterized in that: The vaporization device (20) further comprises: A carrier gas pipeline (24), wherein an inlet end of the carrier gas pipeline (24) is used to communicate with a carrier gas source, and an outlet end of the carrier gas pipeline (24) is communicated with the vaporization chamber; A carrier gas control valve (25), the carrier gas control valve (25) being arranged on the carrier gas pipeline (24), the carrier gas control valve (25) being used to control the on-off of the carrier gas pipeline (24); A first flow meter (80), the first flow meter (80) being arranged on the liquid inlet pipeline (22), the first flow meter (80) being used to calculate the flow rate of the liquid process medium; a second bypass pipeline (110), wherein an inlet end of the second bypass pipeline (110) is connected to the purge gas source, an outlet end of the second bypass pipeline (110) is connected to the liquid inlet pipeline (22), and the outlet end of the second bypass pipeline (110) is located between the first flow meter (80) and the vaporization chamber; A fifth control valve (120), wherein the fifth control valve (120) is arranged on the second bypass pipeline (110) and is used to control the opening and closing of the second bypass pipeline (110).

22. The liquid source vaporization system according to claim 21, characterized in that: In the working state, the carrier gas control valve (25) is opened and the fifth control valve (120) is closed; or In the first cleaning state, the seventh control valve (26) is opened, and the carrier gas control valve (25), the fifth control valve (120), the sixth control valve (133) and the tenth control valve (150) are closed; or The liquid source vaporization system also has a second clean state; In the second cleaning state, the first control unit (50) controls the purge pipeline (40) to be connected to the liquid inlet pipeline (22), the fifth control valve (120), the sixth control valve (133) and the tenth control valve (150) to be closed, and the seventh control valve (26) to be opened; or The liquid source vaporization system also has a fourth cleaning state; In the fourth cleaning state, the first control unit (50) controls the liquid source pipeline (10) and the purge pipeline (40) to be disconnected from the liquid inlet pipeline (22), the tenth control valve (150) and the sixth control valve (133) to be closed, the carrier gas control valve (25) and the fifth control valve (120) to be opened, and the second control unit (70) controls the exhaust gas treatment pipeline (62) to be connected to the gas outlet pipeline (23); or The liquid source vaporization system also has a first residual liquid recovery state; In the first residual liquid recovery state, the fifth control valve (120) and the tenth control valve (150) are closed; or In the second residual liquid recovery state, the fifth control valve (120) and the residual gas control valve (138) are closed; or The liquid source vaporization system also has a pipeline residual gas discharge state; In the residual gas discharge state of the pipeline, the first control unit (50) controls the purge pipeline (40) to be connected to the liquid inlet pipeline (22), the fifth control valve (120), the tenth control valve (150), the ninth control valve (136), and the seventh control valve (26) are closed; and the sixth control valve (133) and the residual gas control valve (138) are opened.

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