Pulse wave measurement device

Abstract

This pulse wave measurement device comprises a sensor unit, and an attachment unit that is connected to the outside of the sensor unit and can be attached to a subject. The sensor unit has: a fixed part that includes a cylindrical part; a movable part that is accommodated inside the cylindrical part; and a rotation part that closes one opening of the cylindrical part, the rotation part rotating relative to the fixed part using the central axis of the cylindrical part as a rotation axis. The movable part has: a sensor-holding part; a pulse wave sensor provided with a housing, a strain-generating body provided to one side of the housing, and a facing part provided to the other side of the housing, the strain-generating body being held inside the sensor-holding part so as to be exposed from one axial end side of the sensor-holding part; and a lid part that is fixed to the other axial end side of the sensor-holding part and is connected to the rotating part. A pivot part is provided to one of mutually opposing surfaces of the facing part and the lid part, and a recess into which the pivot part can be inserted is provided to the other of the mutually opposing surfaces. When the pivot part and the recess come into contact with each other, the pulse wave sensor can swing using a contact portion between the pivot part and the recess as a fulcrum, the strain body is exposed from the other opening of the cylindrical part, and the movable part moves in a reciprocating manner in the axial direction of the cylindrical part in association with rotation of the rotating part without rotating relative to the fixed part.

Description

Pulse wave measuring device

[0001] The present invention relates to a pulse wave measuring device.

[0002] Pulse wave measuring devices are known that include a pulse wave sensor that detects pulse waves generated when the heart pumps blood. Such pulse wave measuring devices are configured to be worn on the wrist of a subject, for example (see, for example, Patent Document 1).

[0003] Patent No. 5094131

[0004] Because pulse wave sensors must detect minute signals, they must be placed in close contact with the subject to improve measurement accuracy. In such pulse wave sensors, the flexure element that comes into contact with the subject is thin, which can lead to damage to the flexure element when attaching or detaching the pulse wave sensor to or from the wrist.

[0005] The present invention has been made in view of the above points, and has an object to provide a pulse wave measuring device in which the amount of protrusion of the pulse wave sensor is adjustable.

[0006] A pulse wave measuring device according to an embodiment of the present disclosure includes a sensor unit and a mounting unit connected to the outside of the sensor unit and mountable on a subject, the sensor unit including a fixed unit including a cylindrical portion, a movable unit housed inside the cylindrical portion, and a rotating unit that closes one opening of the cylindrical portion and rotates relative to the fixed unit around a central axis of the cylindrical portion as a rotation axis, the movable unit including a sensor holding unit, a housing, a strain generating body provided on one side of the housing, and an opposing unit provided on the other side of the housing, the movable unit being mounted on the sensor holding unit so that the strain generating body is exposed from one axial end side of the sensor holding unit. The device has a pulse wave sensor held inside, and a lid portion fixed to the other axial end of the sensor holding portion and connected to the rotating portion, and a pivot portion is provided on one of the opposing surfaces of the opposing portion and the lid portion, and a recess into which the pivot portion can be inserted is provided on the other, and when the pivot portion and the recess come into contact with each other, the pulse wave sensor can swing around the contact point between the pivot portion and the recess as a fulcrum, the strain element is exposed from the other opening of the tubular portion, and the movable portion does not rotate relative to the fixed portion, but moves back and forth in the axial direction of the tubular portion as the rotating portion rotates.

[0007] According to the disclosed technique, it is possible to provide a pulse wave measuring device in which the amount of protrusion of the pulse wave sensor can be adjusted.

[0008] 1 is a perspective view (part 1) illustrating a pulse wave measurement device according to a first embodiment; FIG. 2 is a perspective view (part 2) illustrating a pulse wave measurement device according to a first embodiment; FIG. 3 is a side view illustrating a pulse wave measurement device according to a first embodiment; FIG. 4 is a perspective view illustrating a first bending member; FIG. 5 is an exploded perspective view illustrating a movable portion; FIG. 6 is an exploded perspective view illustrating a fixed portion and a movable portion; FIG. 7 is an exploded perspective view illustrating a sensor portion; FIG. 8 is a cross-sectional view illustrating a sensor portion; FIG. 9 is a cross-sectional view (part 1) illustrating a pivot portion; FIG. 10 is a cross-sectional view (part 2) illustrating a pivot portion; FIG. 11 is a plan view illustrating a pulse wave sensor according to a first embodiment; FIG. 12 is a cross-sectional view (part 1) illustrating a pulse wave sensor according to a first embodiment; FIG. 13 is a cross-sectional view (part 2) illustrating a strain gauge according to a first embodiment; FIG. 14 is a cross-sectional view (part 1) illustrating a strain gauge according to a first embodiment; FIG. 15 is a view (part 1) illustrating a biasing member; FIG. 16 is a view (part 2) illustrating a biasing member; FIG. 17 is a cross-sectional view (part 1) showing a state in which a cover member is attached to a pulse wave sensor. FIG. 10 is a cross-sectional view (part 2) showing the state in which the cover member is attached to the pulse wave sensor.

[0009] DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The following describes the preferred embodiments of the present invention with reference to the accompanying drawings. In the drawings, the same components are designated by the same reference numerals, and redundant explanations may be omitted.

[0010] First Embodiment [Pulse Wave Measurement Device 1] Fig. 1 is a perspective view (part 1) illustrating a pulse wave measurement device according to a first embodiment, and schematically illustrates a state in which the pulse wave measurement device is worn on a subject's wrist. Fig. 2 is a perspective view (part 2) illustrating the pulse wave measurement device according to the first embodiment. Fig. 3 is a side view illustrating the pulse wave measurement device according to the first embodiment.

[0011] 1 to 3, the pulse wave measuring device 1 is a wearable device that can be worn by a subject, and mainly includes a sensor unit 10 and a wearing unit 80.

[0012] 1 , pulse wave measuring device 1 is attached to the wrist of a subject via attachment unit 80 so that pulse wave sensor 20 (described later) comes into contact with skin 310 above radial artery 300 of the subject. A pulse wave is a waveform representing changes in the volume of blood vessels that occur as the heart pumps blood, and pulse wave measuring device 1 can monitor these changes in volume of blood vessels.

[0013] The sensor unit 10 includes a pulse wave sensor that detects the pulse wave of the subject. The sensor unit 10 has a movable part 30, a fixed part 40, a connecting part 50, and a rotating part 60. The sensor unit 10 will be described in detail later.

[0014] The wearing unit 80 is connected to the outside of the sensor unit 10 and can be worn by the subject. The wearing unit 80 has a first bending member 81 and a second bending member 82 that are curved in opposite directions and face each other so that it can be worn on the wrist of the subject. A lid portion 83 is provided on the first bending member 81. The first bending member 81, the second bending member 82, and the lid portion 83 can be made of, for example, resin or the like.

[0015] The first curved member 81 and the second curved member 82 are biased by biasing members 84 and 85 that are bent into a substantially V-shape, and are supported by a swing shaft 86 so as to be able to transition between a closed state and an open state. In the example shown, one end of the biasing members 84 and 85 is attached to a spring mounting portion 83x provided on the lid portion 83, and the other end is attached to a spring mounting portion 82x provided on the second curved member 82. The biasing members 84 and 85 can be made of, for example, metal. The biasing members 84 and 85 are, for example, torsion springs, but may also be leaf springs or the like.

[0016] The sensor unit 10 is disposed at one end of the first bending member 81 in the longitudinal direction, and the swing shaft 86 is disposed at the other end of the first bending member 81 in the longitudinal direction. The sensor unit 10 is attached to the first bending member 81 by, for example, screws. The swing shaft 86 may be formed integrally with the first bending member 81, or may be a separate piece joined thereto.

[0017] A first operating unit 87 is provided on the opposite side of the swing shaft 86 of the first bending member 81 from the sensor unit 10. A second operating unit 88 is provided on the opposite side of the swing shaft 86 of the second bending member 82 from the sensor unit 10. The first operating unit 87 and the second operating unit 88 can be formed from, for example, resin or the like. The first operating unit 87 may be formed integrally with the first bending member 81, or may be a separate piece joined thereto. The second operating unit 88 may be formed integrally with the second bending member 82, or may be a separate piece joined thereto.

[0018] When attaching the pulse wave measuring device 1 to the subject, the subject or an assistant assisting the subject pinches the first operating unit 87 and the second operating unit 88 and brings them close to each other, which opens the sensor unit 10 sides of the first bending member 81 and the second bending member 82, allowing the pulse wave measuring device 1 to be attached to the subject.

[0019] 4 is a perspective view illustrating the first bending member, showing the pulse wave measurement device 1 with the cover 83 removed. As shown in FIG. 4, the first bending member 81 may have a wiring board 90 disposed between one end and the other end in the longitudinal direction. The wiring board 90 can be disposed in the gap between the first bending member 81 and the cover 83. The wiring board 90 is electrically connected to the pulse wave sensor 20 (described below) via wires 25.

[0020] For example, components 91 that contribute to pulse wave detection are arranged on the wiring board 90. Examples of the components 91 include an amplifier circuit that amplifies the output of the strain gauge 100, an AD converter that converts the output of the amplifier circuit into a digital signal, a semiconductor for signal processing that processes the digital signal, and a semiconductor for wireless communication that transmits the results of signal processing to the outside. A connector 92 that is connected to an external circuit by wire may be arranged on the wiring board 90. The connector 92 may be used for supplying power and inputting and outputting signals.

[0021] Fig. 5 is an exploded perspective view illustrating the movable part. As shown in Fig. 5, the movable part 30 has the pulse wave sensor 20, a sensor holding part 31, a lid part 32, and a male thread part 33. The sensor holding part 31, the lid part 32, and the male thread part 33 can be made of, for example, metal or resin.

[0022] The pulse wave sensor 20 includes, for example, a housing 21, a strain element 22 provided on one side of the housing 21, and an opposing portion 23 provided on the other side of the housing 21. The housing 21 is, for example, a cylindrical member with both ends open. The housing 21 can be made of, for example, metal, resin, or the like.

[0023] The flexure element 22 is substantially disk-shaped and is fixed to the housing 21 with an adhesive or the like so as to cover one side of the housing 21. As will be described later, the flexure element 22 is a portion where, for example, a strain gauge is disposed to detect the pulse wave. A detailed example of the structure of the pulse wave sensor 20 including the flexure element 22 will be described later.

[0024] The facing portion 23 has a substantially circular plate shape and is fixed to the housing 21 so as to close the other side of the housing 21. The facing portion 23 has, for example, a through hole 23x, and is threadedly engaged with a groove 21x provided in the housing 21 by a screw 24 inserted into the through hole 23x. The facing portion 23 faces the flexure element 22 across the space inside the housing 21. The facing surfaces of the facing portion 23 and the flexure element 22 are, for example, parallel to each other.

[0025] The facing portion 23 has a first surface 23a that is the surface opposite to the surface facing the strain body 22. The first surface 23a of the facing portion 23 is, for example, a flat surface. A pivot portion 23p that protrudes toward the opposite side from the strain body 22 is provided at approximately the center of the first surface 23a of the facing portion 23. The pivot portion 23p is, for example, a substantially cylindrical member. The central axis of the pivot portion 23p is, for example, perpendicular to the first surface 23a of the facing portion 23.

[0026] The facing portion 23 has, for example, a flange portion 23f that protrudes radially outward from the outer surface of the housing 21. The flange portion 23f is, for example, ring-shaped. The facing portion 23 may have one or more notches 23y that can be used for preventing rotation, etc. The notches 23y are recessed, for example, from the outer periphery of the facing portion 23 toward the center.

[0027] The facing portion 23 can be made of, for example, metal, resin, etc. The pivot portion 23p may be formed integrally with other portions of the facing portion 23, or may be a separate piece joined together.

[0028] The pulse wave sensor 20 has a wire 25 that inputs and outputs electrical signals between the inside and outside of the housing 21. A plurality of wires that are insulated from one another may be arranged inside the wire 25. One end of each of the plurality of wires is electrically connected to an electrode of a strain gauge, which will be described later. The pulse wave sensor 20 may have a flexible substrate or the like instead of the wire 25.

[0029] Alternatively, one or more wiring boards 26 may be fixed to the inner surface of the housing 21, and a pair of electrodes of the strain gauge may be electrically connected to the wiring boards 26 with thin wires. The wiring boards 26 may then be electrically connected to the wires 25. This structure makes it difficult for the force from the wires 25 to be transmitted to the strain element 22, improving the accuracy of detecting the pulse wave.

[0030] The sensor holding portion 31 is, for example, a cylindrical member with both ends open. The inner surface of the sensor holding portion 31 has, for example, a stepped surface 31a that protrudes toward the central axis (toward the center of the sensor unit 10). The stepped surface 31a is, for example, perpendicular to the axial direction of the sensor holding portion 31. The stepped surface 31a is, for example, ring-shaped.

[0031] The sensor holder 31 has a positioning portion 31b that is provided above the stepped surface 31a and protrudes from the inner surface toward the central axis. In the illustrated example, two positioning portions 31b are provided facing each other. Each positioning portion 31b is provided with a groove 31x. Note that there may be one or more positioning portions 31b.

[0032] Pulse wave sensor 20 is held inside sensor holding portion 31 with notch 23y aligned with positioning portion 31b, and is prevented from rotating relative to sensor holding portion 31. However, pulse wave sensor 20 is not fixed to sensor holding portion 31, and has a gap that allows it to move relative to sensor holding portion 31. When pulse wave measuring device 1 is not worn by a subject, flange 23f contacts step surface 31a.

[0033] The sensor holding portion 31 has a groove 31y recessed from the outer surface toward the center. The groove 31y is elongated with its longitudinal direction aligned with the axial direction of the sensor holding portion 31. The groove 31y is provided so as to reach the lower end of the outer surface of the sensor holding portion 31, but not to reach the upper end. For example, two grooves 31y can be arranged facing each other across the center of the sensor holding portion 31 in a plan view. It is sufficient to have one or more grooves 31y.

[0034] The lid portion 32 has a through hole 32x. The lid portion 32 is fixed to the other axial end side of the sensor holding portion 31 by, for example, threading a screw 34 inserted through the through hole 32x into a groove 31x provided in the positioning portion 31b. The male thread portion 33 is provided in the center of the upper surface of the lid portion 32 and protrudes from the upper surface of the lid portion 32 in the opposite direction to the strain element 22. The male thread portion 33 may be formed integrally with the lid portion 32, or may be a separate piece joined together.

[0035] In this way, the pulse wave sensor 20 is held inside the sensor holding part 31 so that the strain element 22 is exposed from one axial end of the sensor holding part 31. The cover part 32 is fixed to the other axial end of the sensor holding part 31.

[0036] 6 is an exploded perspective view illustrating the fixed portion and the movable portion, and for convenience, two views of the fixed portion 40 are shown, each viewed from a different direction.

[0037] The fixing portion 40 has a tubular portion 41 and a flange portion 42. The tubular portion 41 is, for example, a cylindrical member with both ends open. The flange portion 42 is a member that protrudes radially outward from at least a portion of the outer surface of the tubular portion 41. The flange portion 42 may have a cutout portion. The fixing portion 40 can be formed from, for example, metal, resin, or the like. The flange portion 42 may be formed integrally with the tubular portion 41, or may be a separate member joined thereto.

[0038] The cylindrical portion 41 has, for example, a stepped surface 41a that protrudes toward the central axis (toward the center of the cylindrical portion 41). The stepped surface 41a is, for example, perpendicular to the axial direction of the cylindrical portion 41. The stepped surface 41a is, for example, ring-shaped. The cylindrical portion 41 has two protruding portions 41c that protrude from the inner surface 41b toward the central axis. The protruding portions 41c are, for example, cylindrical. For example, two protruding portions 41c can be arranged opposite each other across the center of the cylindrical portion 41 in a plan view. It is sufficient that there is one or more protruding portions 41c.

[0039] The cylindrical portion 41 has through holes 41x that penetrate from the outer surface to the inner surface. For example, two through holes 41x can be arranged facing each other across the center of the cylindrical portion 41 in a plan view. The cylindrical portion 41 may have a cutout portion 41y for passing the wire 25 through. The flange portion 42 has through holes 42x. For example, four through holes 42x can be arranged at positions that are symmetrical about the center of the cylindrical portion 41 in a plan view.

[0040] The movable part 30 is disposed inside the cylindrical part 41 of the fixed part 40 so that the two grooves 31y fit into the two protrusions 41c. The movable part 30 is movable in the axial direction of the cylindrical part 41. Because the protrusions 41c fit into the grooves 31y, the movable part 30 hardly moves in the circumferential direction of the cylindrical part 41. In other words, the protrusions 41c fit into the grooves 31y, preventing the sensor holding part 31 from rotating relative to the cylindrical part 41. Furthermore, the downward movement range of the movable part 30 is limited to the range in which the protrusions 41c can fit into the grooves 31y, i.e., the range of the longitudinal length of the grooves 31y.

[0041] Fig. 7 is an exploded perspective view illustrating the sensor unit. As shown in Fig. 7, the sensor unit 10 has a movable unit 30, a fixed unit 40, a connecting unit 50, and a rotating unit 60. The connecting unit 50 and the rotating unit 60 can be made of, for example, metal or resin. For convenience, Fig. 7 shows two views of the first disk unit 61 viewed from different directions.

[0042] The rotating part 60 closes one opening of the cylindrical part 41 and rotates relative to the fixed part 40 around the central axis of the cylindrical part 41. The strain element 22 is exposed from the other opening of the cylindrical part 41.

[0043] The rotating part 60 has a first disk part 61 with a female thread part 61x in the center that protrudes toward the strain body 22, and a second disk part 62 with a smaller diameter than the first disk part 61. The outer surface of the first disk part 61 has an uneven structure to prevent slipping when a subject or the like rotates the rotating part 60. The female thread part 61x is a cylindrical member with a female thread cut on its inner surface. The first disk part 61 has a through hole 61y.

[0044] The second disk portion 62 has a through-hole 62x in the center. The second disk portion 62 also has a ring-shaped protrusion 62y that surrounds the through-hole 62x in a plan view, and the outside of the protrusion 62y forms a ring-shaped stepped surface 62a. The stepped surface 62a is, for example, perpendicular to the axial direction of the second disk portion 62. The second disk portion 62 has a through-hole 62z.

[0045] The connecting portion 50 is, for example, a cylindrical member with both ends open. The connecting portion 50 has a ring-shaped flange portion 50f that protrudes radially inward from the outer surface at the end on the first disk portion 61 side. The connecting portion 50 has a through hole 50x on the side surface. For example, two through holes 50x can be arranged facing each other across the center of the connecting portion 50 in a plan view.

[0046] The second disk portion 62 is housed in the connecting portion 50 and is fixed to the first disk portion 61 with the flange portion 50f sandwiched between them. Specifically, the first disk portion 61 and the second disk portion 62 are screwed together with a screw 63 with the flange portion 50f of the connecting portion 50 sandwiched between the lower surface of the first disk portion 61 and the step surface 62a of the second disk portion 62. This structure prevents the connecting portion 50 from coming off the rotating portion 60, which is made up of the first disk portion 61 and the second disk portion 62. The rotating portion 60 is rotatable relative to the connecting portion 50.

[0047] The structure including the connecting portion 50 and the rotating portion 60 is placed on the fixed portion 40. At this time, the female thread portion 61x of the first disk portion 61 and the male thread portion 33 of the movable portion 30 are rotatably threaded together. This connects the cover portion 32 to the rotating portion 60. Then, the through hole 41x of the fixed portion 40 and the through hole 50x of the connecting portion 50 are aligned and threaded together with the screw 64, and the connecting portion 50 is fixed to the cylindrical portion 41. This allows the rotating portion 60 to rotate freely relative to the fixed portion 40.

[0048] 8 is a cross-sectional view illustrating the sensor unit. As shown in FIG. 8 , the movable unit 30 does not rotate relative to the fixed unit 40, but moves back and forth in the axial direction of the cylindrical unit 41 as the rotating unit 60 rotates. That is, when the rotating unit 60, including the first disk unit 61 and the second disk unit 62, rotates in the direction of arrow A, the engagement state between the female threaded portion 61 x and the male threaded portion 33 changes, and the movable unit 30, including the pulse wave sensor 20, moves back and forth in the axial direction of the cylindrical unit 41 (the direction of arrow B). The movable unit 30 can be configured to be movable from a position where the strain element 22 protrudes from the lower end of the fixed unit 40 to a position above the lower end of the fixed unit 40.

[0049] With this structure, when the pulse wave measuring device 1 is not worn by the subject, the position of the movable part 30 can be adjusted so that the strain body 22 is located above the lower end of the fixed part 40. As a result, when the pulse wave measuring device 1 is worn by the subject, the strain body 22 does not come into contact with the subject, making it possible to suppress plastic deformation of the strain body 22.

[0050] Furthermore, after attaching the pulse wave measuring device 1 to the subject, the rotating unit 60 can be rotated to change the position of the movable unit 30, thereby applying an appropriate amount of pressure to the subject's radial artery. In this case, for example, the rotating unit 60 may be rotated while monitoring the pulse wave signal obtained from the pulse wave sensor 20, and the amplitude of the pulse wave signal may be adjusted to be as large as possible. Alternatively, an audio or optical signal may be generated to notify the subject that the amplitude of the pulse wave signal has fallen within a predetermined range, thereby informing the subject of the optimal adjustment position of the movable unit 30.

[0051] FIG. 9 is a cross-sectional view (part 1) illustrating the pivot portion. As shown in FIG. 9, the lid portion 32 has a first surface 32a and a second surface 32b opposite the first surface 32a. The first surface 32a and the second surface 32b are, for example, parallel to each other. A recess 32y that opens toward the first surface 32a is provided at approximately the center of the first surface 32a of the lid portion 32. The inner surface of the recess 32y is, for example, a single curved surface that is inclined with respect to the axial direction of the male thread portion 33. In a cross-sectional view, the inner surface of the recess 32y may be partially or entirely curved.

[0052] The recess 32y is, for example, conical or truncated conical. The recess 32y may also be cylindrical with a diameter larger than that of the pivot portion 23p. From the viewpoint of reducing the play between the pivot portion 23p and the recess 32y and facilitating centering, it is preferable that the inner surface of the recess 32y be a single curved surface that is inclined with respect to the axial direction of the sensor unit 10, such as a conical or truncated conical shape.

[0053] The recess 32y is arranged at a position overlapping the male thread portion 33 when viewed in the axial direction of the movable portion 30 (the vertical direction in FIG. 9 ), and a portion of the recess 32y may be arranged within the male thread portion 33. In this way, the cover portion 32 can be made thinner in part.

[0054] The first surface 23a of the facing portion 23 and the first surface 32a of the lid portion 32 face each other. In the facing portion 23, the tip side of the pivot portion 23p (the recess 32y side) is, for example, dome-shaped. Here, the dome-shaped shape refers to a shape in which, with the first surface 23a as the reference, the height is greatest near the central axis and decreases toward the periphery. The tip side of the pivot portion 23p may be part of a spherical surface or part of an aspherical surface.

[0055] The flange portion 23f of the facing portion 23 is disposed between the stepped surface 31a of the sensor holding portion 31 and the first surface 32a of the lid portion 32. With this structure, the flange portion 23f acts as a stopper that prevents the pulse wave sensor 20 from falling downward from the sensor holding portion 31.

[0056] FIG. 10 is a cross-sectional view (part 2) illustrating the pivot portion. In both of FIGS. 10A and 10B, the attachment portion 80 of the pulse wave measuring device 1 is attached to a subject. 300 is a schematic representation of the subject's radial artery. When the attachment portion 80 is attached to the subject, as shown in FIG. 10A, the strain element 22 of the pulse wave sensor 20 contacts the skin 310 above the subject's radial artery 300, pushing the pulse wave sensor 20 toward the cover portion 32, and the pivot portion 23p comes into contact with the recessed portion 32y. The pivot portion 23p and the recessed portion 32y are in line contact, for example. This reduces play between the pivot portion 23p and the recessed portion 32y, facilitating centering. However, this is not limited thereto, and the pivot portion 23p and the recessed portion 32y may be in point contact or surface contact.

[0057] In this way, when the attachment part 80 is not attached to the subject, the pulse wave measurement device 1 is in a first state in which the pivot part 23p and the recess 32y are not in contact with each other (see FIG. 9 ). Then, when the attachment part 80 is attached to the subject, the state switches to a second state in which the pivot part 23p and the recess 32y are in contact with each other (see FIG. 10 ).

[0058] 10, when the pivot portion 23p and the recessed portion 32y come into contact with each other, the pulse wave sensor 20 can swing in all directions of 360 degrees around the contact point between the pivot portion 23p and the recessed portion 32y as a fulcrum. In other words, the detection surface of the strain element 22 of the pulse wave sensor 20 can be tilted at any angle along the radial artery 300 of the subject.

[0059] This allows the angle of the detection surface of the flexure element 22 of the pulse wave sensor 20 to follow the radial artery 300 of the subject, so that the detection surface of the flexure element 22 can be brought into contact with the radial artery 300 of the subject at an appropriate angle. In other words, the detection surface of the flexure element 22 of the pulse wave sensor 20 can be positioned approximately parallel to the radial artery 300 of the subject. As a result, it becomes possible to detect minute pulse wave signals, improving the accuracy of pulse wave measurement.

[0060] Furthermore, in the pulse wave measuring device 1, the pulse wave sensor 20 can be easily positioned on the radial artery by operating the first operating unit 87 and the second operating unit 88 to transition between the open state and the closed state multiple times and fine-tuning the position of the pulse wave sensor 20. At this time, it is preferable to monitor the output signal of the pulse wave sensor 20 and find the position where the amplitude of the output signal is as large as possible.

[0061] Furthermore, in the pulse wave measuring device 1, a wiring board 90 is provided in the free space of the first curved member 81, and components that contribute to detecting pulse waves are arranged on the wiring board 90, thereby realizing a compact pulse wave measuring device equipped with the necessary components.

[0062] Furthermore, since the pulse wave measuring device 1 is provided with the biasing members 84 and 85, it is possible to apply an appropriate amount of pressure to the subject's radial artery.

[0063] [Pulse Wave Sensor] Here, a pulse wave sensor having a plurality of strain gauges will be described as an example of the pulse wave sensor 20. Duplicate descriptions of the components of the pulse wave sensor 20 that have already been described will be omitted.

[0064] Fig. 11 is a plan view illustrating the pulse wave sensor according to the first embodiment. Fig. 12 is a cross-sectional view illustrating the pulse wave sensor according to the first embodiment, taken along line A-A in Fig. 11.

[0065] 11 and 12, the pulse wave sensor 20 includes a housing 21, a strain element 22, an opposing portion 23, a wire 25, and a plurality of strain gauges (strain gauges 100). １ , 100 ２ , 100 ３ , 100 ４ The opposing portion 23 and the wire rod 25 are as described above. In addition, when there is no particular need to distinguish them, they are referred to as the strain gauge 100. １ , 100 ２ , 100 ３ , 100 ４ may be collectively referred to as strain gauge 100.

[0066] The flexure element 22 has a base portion 22a, a beam portion 22b, a load portion 22c, and an extension portion 22d. The flexure element 22 is flat. The flexure element 22 has a first main surface 22m and a second main surface 22n located on the opposite side of the first main surface 22m. The first main surface 22m faces the subject.

[0067] The material of the flexure element 22 may be, for example, metal, ceramic, glass, etc. Examples of metals used for the material of the flexure element 22 include SUS (stainless steel), copper, and aluminum. The flexure element 22 may be formed as a single unit by, for example, press working. The thickness t of the flexure element 22 excluding the load portion 22c is constant. The thickness t may be, for example, 0.03 mm or more and 0.3 mm or less.

[0068] 11 and 12, for convenience, the side of the pulse wave sensor 20 on which the load portion 22c of the flexure body 22 is provided will be referred to as the "upper side," and the side on which the load portion 22c of the flexure body 22 is not provided will be referred to as the "lower side." Furthermore, the surface located on the upper side of each part will be referred to as the "upper surface," and the surface located on the lower side of each part will be referred to as the "lower surface." However, the pulse wave sensor 20 can also be used upside down. The pulse wave sensor 20 can also be positioned at any angle. Furthermore, a planar view refers to viewing an object in a normal direction from above to below the first main surface 22m of the flexure body 22. Furthermore, a planar shape refers to the shape of the object when viewed in the normal direction.

[0069] In the pulse wave sensor 20, the housing 21 is a portion that holds the strain element 22. The housing 21 can be made of, for example, metal or resin.

[0070] In the flexure element 22, the base 22a is a circular frame-shaped (ring-shaped) region outside the circular broken line shown in Fig. 11. The region inside the circular broken line may be referred to as a circular opening. In other words, the base 22a of the flexure element 22 has a circular opening. The width w of the base 22a １ The inner diameter d of the base 22a (i.e., the diameter of the circular opening) is, for example, 10 mm or more and 15 mm or less.

[0071] The beam portion 22b is provided so as to bridge the inside of the base portion 22a. The beam portion 22b has, for example, two beams that intersect in a cross shape in a plan view, and the intersecting region of the two beams includes the center of the circular opening. In the example of FIG. 11, one beam constituting the cross has its longitudinal direction in the X direction, and the other beam constituting the cross has its longitudinal direction in the Y direction, and the two are perpendicular to each other. Each of the two perpendicular beams is preferably located inside the inner diameter d of the base portion 22a (diameter of the circular opening) and is as long as possible. In other words, the length of each beam is preferably approximately equal to the diameter of the circular opening. In each beam constituting the beam portion 22b, the width w outside the intersecting region is ２ is constant, for example, 1 mm or more and 5 mm or less. ２ It is not necessary that is constant, but the width w ２ It is preferable to keep the value constant in that the strain can be detected linearly.

[0072] The load portion 22c is provided on the beam portion 22b. The load portion 22c is provided, for example, in the region where the two beams that make up the beam portion 22b intersect. The load portion 22c protrudes from the upper surface of the beam portion 22b. The amount of protrusion of the load portion 22c based on the upper surface of the beam portion 22b is, for example, approximately 0.1 mm. The beam portion 22b is flexible and elastically deforms when a load is applied to the load portion 22c. The upper surface of the beam portion 22b is part of the first main surface 22m of the strain generating body 22.

[0073] The four extensions 22d are fan-shaped portions that extend from the inside of the base 22a toward the beams 22b in a plan view. A gap of approximately 1 mm is provided between each extension 22d and the beams 22b. The extensions 22d do not contribute to the sensing of the pulse wave sensor 20 and may therefore not be provided.

[0074] The output signal of the pulse wave sensor 20 is generated based on the outputs of a plurality of strain gauges. In the illustrated example, the pulse wave sensor 20 includes a pair of strain gauges 100 arranged on a beam extending in the Y direction on the second main surface 22 n of the strain generating element 22 so as to face each other across the load portion 22 c in a plan view. １ and 100 ２ Also, a pair of strain gauges 100 １ and 100 ２Another pair of strain gauges 100 are arranged on a beam extending in the X direction intersecting the beam on which the load portion 22c is arranged, facing each other across the load portion 22c in a plan view. ３ and 100 ４ It has the following characteristics.

[0075] Strain gauge 100 １ and 100 ２ The strain gauge 100 detects the compressive strain of the strain generating element 22 that occurs in the beam extending in the Y direction when the load portion 22c is pressed. ３ and 100 ４ The strain gauge 100 detects the tensile strain of the strain generating element 22 that occurs in the beam extending in the X direction when the load portion 22c is pressed. １ and strain gauge 100 ２ The distance between the strain gauge 100 and the ３ and strain gauge 100 ４ By arranging the strain gauges 100 in this manner, compressive strain and tensile strain can be detected effectively, and a large output can be obtained from the bridge circuit that forms the full bridge.

[0076] Strain gauge 100 １ ~100 ４ are connected to form each side of a bridge circuit, and the output signal of the pulse wave sensor 20 (a signal indicating a pulse wave) can be generated by the bridge circuit. FIG. 13 shows an example of a bridge circuit. In the bridge circuit shown in FIG. 13, the strain gauges 100 １ constitutes one side of the upper left corner. ２ constitutes one side of the lower right corner. ３ constitutes one side of the upper right corner. ４ forms the lower left side.

[0077] 13, a DC voltage E is supplied between the connection between the upper left side and the lower left side and the connection between the upper right side and the lower right side. As a result, an analog voltage output signal S1 can be obtained between the connection between the upper left side and the upper right side and the connection between the lower left side and the lower right side. The wiring pattern that constitutes the bridge circuit can be provided on a wiring board 90, for example.

[0078] In pulse wave sensor 20, when load portion 22c contacts the subject's radial artery, a load is applied to load portion 22c in accordance with the subject's pulse wave, causing beam portion 22b to elastically deform and changing the resistance value of the resistor in strain gauge 100. Pulse wave sensor 20 can detect the pulse wave based on the change in resistance value of the resistor in strain gauge 100 that accompanies the deformation of beam portion 22b. The pulse wave is detected as a periodic voltage change and output as output signal S1 from the bridge circuit.

[0079] In the above example, the pulse wave sensor 20 has four strain gauges connected in a full bridge configuration to generate the output signal S1. However, the pulse wave sensor 20 may have two strain gauges connected in a half bridge configuration to generate the output signal S1.

[0080] [Strain gauge 100] Fig. 14 is a plan view illustrating the strain gauge according to the first embodiment. Fig. 15 is a cross-sectional view (part 1) illustrating the strain gauge according to the first embodiment, showing a cross section along line B-B in Fig. 14.

[0081] 14 and 15, the strain gauge 100 has a substrate 110, a resistor 130, wiring 140, electrodes 150, and a cover layer 160. That is, the strain gauge 100 has the resistor 130 as a detection element. The cover layer 160 can be provided as needed. For convenience, only the outer edge of the cover layer 160 is shown by a dashed line in FIGS. 14 and 15. First, each part of the strain gauge 100 will be described in detail.

[0082] Note that the definitions of the upper and lower surfaces in the explanation of the strain gauge using Figures 14 to 16 differ from those in the other figures. Specifically, in Figures 14 to 16, for convenience, the side of the strain gauge 100 on which the resistor 130 of the substrate 110 is provided is referred to as the "upper side," and the side on which the resistor 130 is not provided is referred to as the "lower side." Furthermore, the surface located on the upper side of each part is referred to as the "upper surface," and the surface located on the lower side of each part is referred to as the "lower surface." However, the strain gauge 100 can also be used upside down. The strain gauge 100 can also be positioned at any angle. Furthermore, a planar view refers to viewing an object in a normal direction from above to below the upper surface 110a of the substrate 110. Furthermore, a planar shape refers to the shape of the object when viewed in the normal direction. The strain gauge 100 is attached to the second main surface 22 n of the strain element 22 so that the substrate 110 faces the second main surface 22 n of the strain element 22 .

[0083] The substrate 110 is a member that serves as a base layer for forming the resistor 130 and the like. The substrate 110 is flexible. There are no particular limitations on the thickness of the substrate 110, and it may be determined appropriately depending on the intended use of the strain gauge 100, etc. For example, the thickness of the substrate 110 may be approximately 5 μm to 500 μm. From the standpoint of strain transmission from the second main surface 22n of the strain element 22 to the sensing part and dimensional stability against environmental changes, the thickness of the substrate 110 is preferably within the range of 5 μm to 200 μm. From the standpoint of insulation, the thickness of the substrate 110 is preferably 10 μm or more.

[0084] The substrate 110 is formed from an insulating resin film such as PI (polyimide) resin, epoxy resin, PEEK (polyether ether ketone) resin, PEN (polyethylene naphthalate) resin, PET (polyethylene terephthalate) resin, PPS (polyphenylene sulfide) resin, LCP (liquid crystal polymer) resin, polyolefin resin, etc. The term "film" refers to a flexible member having a thickness of approximately 500 μm or less.

[0085] When the base material 110 is formed from an insulating resin film, the insulating resin film may contain fillers, impurities, etc. For example, the base material 110 may be formed from an insulating resin film containing a filler such as silica or alumina.

[0086] Examples of materials other than resin for the substrate 110 include SiO ２ , ZrO ２ (including YSZ), Si, Si ２ N ３ , Al ２ O ３ (including sapphire), ZnO, perovskite ceramics (CaTiO ３ , BaTiO ３ ) and other crystalline materials. In addition to the above-mentioned crystalline materials, amorphous glass or the like may be used as the material of the base material 110. Metals such as aluminum, aluminum alloys (duralumin), and titanium may also be used as the material of the base material 110. When a metal base material 110 is used, an insulating film is provided so as to cover the upper surface 110a.

[0087] The resistor 130 is a thin film formed in a predetermined pattern on the upper side of the substrate 110. In the strain gauge 100, the resistor 130 is a sensing part that receives strain and generates a resistance change. The resistor 130 may be formed directly on the upper surface 110a of the substrate 110, or may be formed on the upper surface 110a of the substrate 110 via another layer. For convenience, the resistor 130 is shown in FIG. 14 as having a high-density matte pattern.

[0088] The resistor 130 has a structure in which a plurality of elongated portions are arranged at predetermined intervals with their longitudinal directions in the same direction (the direction of line B-B in the example of FIG. 14), and the ends of adjacent elongated portions are alternately connected, resulting in a zigzag fold as a whole. The longitudinal direction of the plurality of elongated portions is the grid direction, and the direction perpendicular to the grid direction is the grid width direction (the direction perpendicular to line B-B in the example of FIG. 14).

[0089] One end of the longitudinal direction of the two elongated portions located at the outermost sides in the grid width direction is bent in the grid width direction, and each end 130e of the resistor 130 in the grid width direction １ and 130e ２The ends 130e of the resistor 130 in the grid width direction are formed. １ and 130e ２ are electrically connected to the electrodes 150 via the wiring 140. In other words, the wiring 140 is connected to the ends 130e of the resistor 130 in the grid width direction. １ and 130e ２ and each electrode 150 are electrically connected.

[0090] The resistor 130 can be formed from, for example, a material containing Cr (chromium), a material containing Ni (nickel), or a material containing both Cr and Ni. That is, the resistor 130 can be formed from a material containing at least one of Cr and Ni. An example of a material containing Cr is a Cr mixed phase film. An example of a material containing Ni is Cu-Ni (copper-nickel). An example of a material containing both Cr and Ni is Ni-Cr (nickel-chromium).

[0091] Here, the Cr mixed phase film is a film made of Cr, CrN, and Cr ２ It is a film containing N and other mixed phases. The Cr mixed phase film may contain unavoidable impurities such as chromium oxide.

[0092] The thickness of the resistor 130 is not particularly limited and may be determined appropriately depending on the intended use of the strain gauge 100, etc. For example, the thickness of the resistor 130 may be approximately 0.05 μm to 2 μm. In particular, when the thickness of the resistor 130 is 0.1 μm or more, the crystallinity of the crystals constituting the resistor 130 (e.g., the crystallinity of α-Cr) is improved. Furthermore, when the thickness of the resistor 130 is 1 μm or less, (i) cracks in the film and (ii) warping of the film from the substrate 110 caused by internal stress of the film constituting the resistor 130 are reduced.

[0093] In consideration of preventing lateral sensitivity and preventing disconnection, the width of the resistor 130 is preferably 10 μm to 100 μm. More specifically, the width of the resistor 130 is preferably 10 μm to 70 μm, and more preferably 10 μm to 50 μm.

[0094] For example, if the resistor 130 is a Cr mixed-phase film, the stability of the gauge characteristics can be improved by using α-Cr (alpha chromium), which has a stable crystalline phase, as the main component. Furthermore, if the resistor 130 is a Cr mixed-phase film, the resistor 130 can have a gauge factor of 10 or more, and the temperature coefficient of gauge factor (TCS) and temperature coefficient of resistance (TCR) can be within the range of −1000 ppm / °C to +1000 ppm / °C. Here, “main component” refers to a component that accounts for 50% or more by weight of all materials constituting the resistor. From the perspective of improving the gauge characteristics, the resistor 130 preferably contains 80% or more by weight of α-Cr. Furthermore, from the same perspective, the resistor 130 preferably contains 90% or more by weight of α-Cr. Note that α-Cr is Cr with a bcc structure (body-centered cubic lattice structure).

[0095] In addition, when the resistor 130 is a Cr mixed phase film, CrN and Cr contained in the Cr mixed phase film ２ The N content is preferably 20% by weight or less. ２ By keeping the N content at 20% by weight or less, it is possible to suppress a decrease in the gauge factor of the strain gauge 100.

[0096] In addition, CrN and Cr in the Cr mixed phase film ２ The ratio of CrN to CrN is ２ Cr relative to the total weight of N ２ It is preferable that the ratio of N is 80% by weight or more and less than 90% by weight. ２ Cr relative to the total weight of N ２ It is more preferable that the ratio of N is 90% by weight or more and less than 95% by weight. ２ N has semiconductor properties. ２ By setting the ratio of N to 90% by weight or more and less than 95% by weight, the decrease in TCR (negative TCR) becomes more significant. ２ By setting the ratio of N to 90% by weight or more and less than 95% by weight, the resistor 130 is less likely to become ceramic, and the resistor 130 is less likely to be brittle fractured.

[0097] On the other hand, CrN has the advantage of being chemically stable. By including more CrN in the Cr mixed phase film, the possibility of unstable N being generated can be reduced, resulting in a stable strain gauge. Here, "unstable N" refers to trace amounts of N that may be present in the Cr mixed phase film. ２ This refers to atomic N. These unstable N atoms may escape from the film depending on the external environment (e.g., a high-temperature environment). When unstable N atoms escape from the film, the film stress of the Cr mixed-phase film may change.

[0098] In the strain gauge 100, when a Cr mixed-phase film is used as the material for the resistor 130, high sensitivity and miniaturization can be achieved. For example, while the output of a conventional strain gauge was approximately 0.04 mV / 2 V, an output of 0.3 mV / 2 V or more can be obtained when a Cr mixed-phase film is used as the material for the resistor 130. Furthermore, while the size (gauge length x gauge width) of a conventional strain gauge was approximately 3 mm x 3 mm, when a Cr mixed-phase film is used as the material for the resistor 130, the size (gauge length x gauge width) can be reduced to approximately 0.3 mm x 0.3 mm.

[0099] The wiring 140 is provided on the substrate 110. The wiring 140 is electrically connected to the resistor 130 and the electrode 150. The wiring 140 is not limited to being linear and can have any pattern. The wiring 140 can have any width and any length. For convenience, in FIG. 14 , the wiring 140 is shown with a matte pattern that is less dense than the resistor 130.

[0100] The electrodes 150 are provided on the substrate 110. The electrodes 150 are electrically connected to the resistor 130 via the wiring 140. In plan view, the electrodes 150 are formed in a generally rectangular shape, wider than the wiring 140. The electrodes 150 are a pair of electrodes for outputting changes in the resistance value of the resistor 130 caused by strain to the outside. Lead wires for external connection, for example, are bonded to the electrodes 150. A low-resistance metal layer, such as copper, or a metal layer with good solderability, such as gold, may be laminated on the upper surface of the electrode 150. Although the resistor 130, wiring 140, and electrode 150 are designated by different reference numerals for convenience, they can be integrally formed from the same material in the same process. Note that in FIG. 14, the electrodes 150 are shown with a matte pattern of the same density as the wiring 140 for convenience.

[0101] The cover layer 160 (protective layer) is provided on the upper surface 110a of the substrate 110 as needed, covering the resistor 130 and the wiring 140 and exposing the electrodes 150. Examples of materials for the cover layer 160 include insulating resins such as PI resin, epoxy resin, PEEK resin, PEN resin, PET resin, PPS resin, and composite resins (e.g., silicone resin and polyolefin resin). The cover layer 160 may contain fillers and pigments. The thickness of the cover layer 160 is not particularly limited and can be appropriately selected depending on the purpose. For example, the thickness of the cover layer 160 can be approximately 2 μm to 30 μm. Providing the cover layer 160 can prevent mechanical damage to the resistor 130. Providing the cover layer 160 also protects the resistor 130 from moisture and other factors.

[0102] [Method of Manufacturing Strain Gauge 100] In the strain gauge 100 according to this embodiment, the resistor 130, the wiring 140, the electrodes 150, and the cover layer 160 are formed on the substrate 110. Note that another layer (such as a functional layer, which will be described later) may be formed between the substrate 110 and the layers of these components.

[0103] A method for manufacturing the strain gauge 100 will now be described. To manufacture the strain gauge 100, first, a substrate 110 is prepared, and a metal layer (for convenience, referred to as metal layer A) is formed on the upper surface 110a of the substrate 110. Metal layer A is a layer that will ultimately be patterned to become the resistor 130, wiring 140, and electrodes 150. Therefore, the material and thickness of metal layer A are the same as the material and thickness of the resistor 130, wiring 140, and electrodes 150 described above.

[0104] The metal layer A can be formed by, for example, magnetron sputtering using a target made of a raw material capable of forming the metal layer A. Instead of magnetron sputtering, the metal layer A may be formed by reactive sputtering, vapor deposition, arc ion plating, pulsed laser deposition, or the like. After the metal layer A is formed on the upper surface 110a of the base material 110, the metal layer A is patterned by a well-known photolithography method into a planar shape similar to that of the resistor 130, the wiring 140, and the electrode 150 in FIG. 14 .

[0105] Alternatively, a base layer may be formed on the upper surface 110a of the substrate 110 before the metal layer A is formed. For example, a functional layer having a predetermined thickness may be vacuum-deposited by conventional sputtering on the upper surface 110a of the substrate 110. By providing a base layer in this manner, the gauge characteristics of the strain gauge 100 can be stabilized.

[0106] In this application, the functional layer refers to a layer having a function of promoting the crystal growth of at least the upper layer, the metal layer A (resistor 130). The functional layer preferably further has a function of preventing oxidation of the metal layer A due to oxygen or moisture contained in the substrate 110 and / or a function of improving adhesion between the substrate 110 and the metal layer A. The functional layer may further have other functions.

[0107] The insulating resin film constituting the substrate 110 may contain oxygen and moisture, and Cr may form a self-oxidized film. Therefore, particularly when the metal layer A contains Cr, it is preferable to form a functional layer having a function of preventing oxidation of the metal layer A.

[0108] In this way, by providing a functional layer below the metal layer A, it is possible to promote crystal growth in the metal layer A, and to produce a metal layer A consisting of a stable crystalline phase. As a result, the stability of the gauge characteristics of the strain gauge 100 is improved. Furthermore, the material constituting the functional layer diffuses into the metal layer A, thereby improving the gauge characteristics of the strain gauge 100.

[0109] Examples of materials for the functional layer include one or more metals selected from the group consisting of Cr (chromium), Ti (titanium), V (vanadium), Nb (niobium), Ta (tantalum), Ni (nickel), Y (yttrium), Zr (zirconium), Hf (hafnium), Si (silicon), C (carbon), Zn (zinc), Cu (copper), Bi (bismuth), Fe (iron), Mo (molybdenum), W (tungsten), Ru (ruthenium), Rh (rhodium), Re (rhenium), Os (osmium), Ir (iridium), Pt (platinum), Pd (palladium), Ag (silver), Au (gold), Co (cobalt), Mn (manganese), and Al (aluminum), an alloy of any of the metals in this group, or a compound of any of the metals in this group.

[0110] 16 is a cross-sectional view (part 2) illustrating the strain gauge according to the first embodiment. Fig. 16 shows the cross-sectional shape of the strain gauge 100 when a functional layer 120 is provided as an underlying layer for the resistor 130, the wiring 140, and the electrodes 150.

[0111] The planar shape of the functional layer 120 may be patterned to be substantially the same as the planar shapes of the resistor 130, the wiring 140, and the electrodes 150, for example. However, the planar shapes of the functional layer 120, the resistor 130, the wiring 140, and the electrodes 150 do not have to be substantially the same. For example, when the functional layer 120 is formed from an insulating material, the functional layer 120 may be patterned to be different from the planar shapes of the resistor 130, the wiring 140, and the electrodes 150. In this case, the functional layer 120 may be formed in a solid shape in the region where the resistor 130, the wiring 140, and the electrodes 150 are formed, for example. Alternatively, the functional layer 120 may be formed in a solid shape over the entire upper surface of the substrate 110.

[0112] After forming the resistor 130, wiring 140, and electrodes 150, a cover layer 160 is formed on the upper surface 110a of the substrate 110 as needed. The cover layer 160 covers the resistor 130 and wiring 140, but the electrodes 150 may be exposed from the cover layer 160. For example, the cover layer 160 can be formed by laminating a semi-cured thermosetting insulating resin film on the upper surface 110a of the substrate 110 so as to cover the resistor 130 and wiring 140 and expose the electrodes 150, and then heating and curing the insulating resin film. Through the above steps, the strain gauge 100 is completed.

[0113] <Modification 1 of First Embodiment> In Modification 1 of the first embodiment, an example is shown in which a biasing member is disposed between the pulse wave sensor and the cover. Note that in Modification 1 of the first embodiment, descriptions of components that are the same as those in the previously described embodiments may be omitted.

[0114] Fig. 17 is a diagram (part 1) illustrating the biasing member, and is a partial cross-sectional view showing the sensor unit 10, the pulse wave sensor 20, and the cover unit 32. Fig. 17 differs from the structure shown in Fig. 9 in that a biasing member 400 is disposed inside the sensor unit 10 between the opposing surfaces of the facing portion 23 and the cover unit 32.

[0115] The biasing member 400 can be disposed between the first surface 23a of the facing portion 23 and the first surface 32a of the lid portion 32 so as to be in contact with the first surface 23a of the facing portion 23 and the first surface 32a of the lid portion 32. By disposing the biasing member 400, the pulse wave sensor 20 can be biased in a direction away from the first surface 32a of the lid portion 32.

[0116] FIG. 18 is a second diagram illustrating the biasing member, showing only the biasing member. As shown in FIG. 18, the biasing member 400 is, for example, a helical (spiral) leaf spring. The biasing member 400 can be disposed so that the pivot portion 23p is approximately centered in a plan view. The biasing member 400 can be formed from, for example, metal, resin, rubber, or the like.

[0117] The biasing member 400 may be a conical spring or a cylindrical spring, but a conical spring can reduce the height when compressed compared to a cylindrical spring, thereby enabling a low profile for the sensor unit 10. When the biasing member 400 is a conical spring, it is preferable to position the smaller diameter part of the conical spring toward the lid unit 32 in order to stably position the biasing member 400.

[0118] The shape and material of the biasing member 400 are not critical as long as it can bias the pulse wave sensor 20 in a direction away from the first surface 32 a of the cover portion 32 .

[0119] By arranging the biasing member 400 in this manner, even if vibrations or the like are applied when the pulse wave sensor 20 is not in contact with the subject's wrist or the like, the flange portion 23f can be maintained in contact with the stepped surface 31a, thereby preventing play from occurring between the pulse wave sensor 20 and the lid portion 32. This reduces the risk of abnormal noises occurring when the pulse wave measuring device 1 is carried, for example.

[0120] <Modification 2 of First Embodiment> In Modification 2 of the first embodiment, an example is shown in which a cover member is attached to the first main surface side of the strain body of the pulse wave sensor. Note that in Modification 2 of the first embodiment, descriptions of components that are the same as those in the previously described embodiments may be omitted.

[0121] A cover member may be provided so as to cover the entire flexure element 22 of the pulse wave sensor 20. For example, the flexure element 22 may be covered with a cover member made of a material such as silicone resin. It is also desirable that the cover member has a gap between it and the flexure element 22. The method of attaching the cover member to the pulse wave sensor 20 is not particularly limited.

[0122] Fig. 19 is a cross-sectional view (part 1) showing the state in which the cover member is attached to the pulse wave sensor. In Fig. 19, as an example, the cover member 500 has a gap 520 between it and the strain element 22, and the surface (the side that contacts the subject's skin) has a substantially hemispherical shape. Furthermore, a convex portion 510 is provided in the center of the cover member 500, and the convex portion 510 and the load portion 22c are arranged to face each other.

[0123] The convex portion 510 may be in contact with the flexure element 22 (loading portion 22c in the case of FIG. 19), or may be provided with a small gap therebetween as shown in FIG. 19. In either case, it is desirable that the convex portion 510 is designed so that the flexure element 22 and the convex portion 510 come into contact when pressure is applied to the cover member 500. By using such a design, the pressure applied to the cover member 500 can be concentrated at the portion of the flexure element 22 that is in contact with the convex portion 510. Therefore, stress can be concentrated in a specific area of ​​the flexure element 22.

[0124] Furthermore, by covering the strain body 22 with the cover member 500, it is possible to prevent dirt, dust, and the like from entering the circular opening of the strain body 22. Furthermore, even if the strain body 22 is made of metal, it is possible to prevent the subject from having a metal allergy.

[0125] Fig. 20 is a cross-sectional view (part 2) showing the state in which a cover member is attached to a pulse wave sensor. Cover member 530 shown in Fig. 20 differs from cover member 500 shown in Fig. 19 in that there is no clearly protruding portion such as convex portion 510 on the surface facing strain element 22. Note that cover member 530 may otherwise have the same configuration as cover member 500, or may be modified in the same way as cover member 500.

[0126] At least a portion of the surface of the cover member 530 facing the flexure element 22 is curved toward the flexure element 22. In the example of FIG. 20 , the center of the surface of the cover member 530 facing the flexure element 22 is a gently sloping curve. This design allows the pressure applied to the cover member 530 to be concentrated at the contact point between the cover member 530 and the flexure element 22 (e.g., the load point of the flexure element 22). Therefore, the cover member 530 allows the pulse wave sensor 20 to concentrate stress in a specific area of ​​the flexure element 22. Furthermore, as with the cover member 500, the use of the cover member 530 also prevents the intrusion of dirt, dust, and the like through the circular opening of the flexure element 22. Furthermore, even if the flexure element 22 is made of metal, it is possible to prevent the subject from developing a metal allergy.

[0127] Although the preferred embodiments have been described in detail above, the present invention is not limited to the above-described embodiments, and various modifications and substitutions can be made to the above-described embodiments without departing from the scope of the claims.

[0128] For example, in the above embodiment, an example was shown in which the pivot portion 23p is provided on the first surface 23a of the facing portion 23, and a recess 32y into which the pivot portion 23p can be inserted is opened on the first surface 32a of the lid portion 32. However, the present invention is not limited to this, and a structure may also be used in which a pivot portion is provided on the first surface 32a of the lid portion 32, and a recess into which the pivot portion can be inserted is opened on the first surface 23a of the facing portion 23. In other words, it is sufficient that a pivot portion is provided on one of the opposing surfaces of the facing portion 23 and the lid portion 32, and a recess into which the pivot portion can be inserted is opened on the other surface.

[0129] The relationship between the female thread portion 61x of the first disk portion 61 and the male thread portion 33 of the movable portion 30 may be reversed. That is, a male thread portion may be provided on the first disk portion 61, and a female thread portion may be provided on the movable portion 30, and the two may be screwed together.

[0130] Furthermore, the attachment portion 80 may be a watch strap type or the like, rather than the clip type shown in Fig. 3 etc. For example, the first bending member 81 and the second bending member 82 may be formed from leather, rubber, etc., and the ends of the first bending member 81 and the second bending member 82 may be configured to be detachably connectable to each other using hook-and-loop fasteners or the like. Alternatively, the first bending member 81 and the second bending member 82 may be integrated into a single belt-like member made of a stretchable material.

[0131] The structure of the pulse wave sensor 20 is not limited to that shown in Fig. 11 and may be any structure. For example, a structure without slits around the beams may be used. The first surface of the strain generating element may be covered with resin or the like.

[0132] This international application claims priority based on Japanese Patent Application No. 2023-124910, filed on July 31, 2023, the entire contents of which are incorporated herein by reference.

[0133] 1 Pulse wave measuring device, 10 Sensor unit, 20 Pulse wave sensor, 21 Housing, 21x Groove, 22 Strain generating body, 22m First main surface, 22n Second main surface, 23 Opposing portion, 23a First surface, 23f Flange portion, 23p Pivot portion, 23x Through hole, 23y Notch portion, 30 Movable portion, 31 Sensor holding portion, 31a Step surface, 31b Positioning portion, 31x, 31y Groove, 32 Lid portion, 32x Through hole, 33 Male thread portion, 40 Fixed portion, 41 Cylindrical portion, 41a Step surface, 41b Inner surface, 41c Convex portion, 41x Through hole, 41y Notch portion, 42 Flange portion, 42x Through hole, 50 Connecting portion, 50f Flange portion, 50x Through hole, 60 Rotating portion, 61 first disk portion, 61x female screw portion, 61y through hole, 62 second disk portion, 62a step surface, 62x through hole, 62y protrusion portion, 80 mounting portion, 81 first bending member, 82 second bending member, 83 cover portion, 84, 85 biasing member, 86 swing shaft, 87 first operating portion, 88 second operating portion, 90 wiring board, 91 component, 100 １ , 100 ２ , 100 ３ , 100 ４ Strain gauge, 300 Radial artery, 310 Skin, 400 Pressurizing member, 500, 530 Cover member, 510 Convex portion, 520 Gap

Claims

1. A pulse wave sensor comprising a sensor unit and a mounting unit connected to the outside of the sensor unit and wearable by a subject, the sensor unit comprising a fixed unit including a cylindrical unit, a movable unit housed inside the cylindrical unit, and a rotating unit that closes one opening of the cylindrical unit and rotates relative to the fixed unit around a central axis of the cylindrical unit as an axis of rotation, the movable unit comprising: a sensor holding unit; a housing, a strain body provided on one side of the housing, and an opposing unit provided on the other side of the housing, the pulse wave sensor being held inside the sensor holding unit such that the strain body is exposed from one axial end side of the sensor holding unit; and a lid unit fixed to the other axial end side of the sensor holding unit and connected to the rotating unit, a pivot unit is provided on one of opposing surfaces of the opposing unit and the lid unit, and a recess into which the pivot unit can be inserted is provided on the other, and when the pivot unit and the recess come into contact with each other, the pulse wave sensor becomes swingable around a contact portion between the pivot unit and the recess as a fulcrum, the strain body is exposed from the other opening of the cylindrical portion, and the movable portion does not rotate with respect to the fixed portion, but moves back and forth in the axial direction of the cylindrical portion in association with rotation of the rotating portion.

2. The pulse wave measuring device of claim 1, wherein the movable part has a first threaded portion protruding from the cover part in a direction opposite to the strain body, the rotating part has a first disk part with a second threaded portion protruding towards the strain body, one of the first threaded portion and the second threaded portion is a male threaded portion and the other is a female threaded portion, the male threaded portion and the female threaded portion are screwed together to be able to rotate freely, and when the first disk part rotates, the screwed state between the male threaded portion and the female threaded portion changes, and the movable part moves back and forth in the axial direction of the tubular part.

3. The pulse wave measuring device of claim 2, wherein the rotating portion further has a second disk portion having a smaller diameter than the first disk portion, the fixed portion has a cylindrical connecting portion with both ends open, the connecting portion has a first flange portion at the end on the first disk portion side that protrudes radially inward from the outer surface, the second disk portion is accommodated in the connecting portion and is fixed to the first disk portion with the first flange portion sandwiched between them, and the connecting portion is fixed to the cylindrical portion.

4. A pulse wave measuring device as claimed in any one of claims 1 to 3, wherein the opposing portion has a second flange portion protruding radially outward from the outer surface of the housing, the sensor holding portion has a stepped surface protruding towards the central axis, the second flange portion is disposed between the stepped surface and the cover portion, and the second flange portion serves as a stopper to prevent the pulse wave sensor from falling off the sensor holding portion.

5. A pulse wave measuring device as described in claim 4, wherein the sensor holding portion has a positioning portion that is provided above the step surface and protrudes from the inner surface towards the central axis, the opposing portion has a cutout portion that is recessed from the outer periphery towards the center, and the pulse wave sensor is held inside the sensor holding portion with the cutout portion aligned with the positioning portion, and is prevented from rotating relative to the sensor holding portion.

6. A pulse wave measuring device as claimed in any one of claims 1 to 5, wherein the sensor holding portion has a groove recessed from the outer surface towards the center, the groove being elongated with its longitudinal direction being the axial direction of the sensor holding portion, and the tubular portion has a protrusion protruding from the inner surface towards the central axis, the protrusion and the groove being fitted together, so that the sensor holding portion is prevented from rotating relative to the tubular portion and its range of movement is restricted to the longitudinal length of the groove.

7. A pulse wave measuring device as described in any one of claims 1 to 6, wherein a first biasing member is disposed between the opposing surfaces of the opposing portion and the cover portion, biasing the pulse wave sensor in a direction away from the cover portion.

8. A pulse wave measuring device as claimed in any one of claims 1 to 7, wherein the strain generating body has a plurality of strain gauges, and the pulse wave sensor detects pulse waves based on changes in resistance values ​​of resistors in the plurality of strain gauges.

9. The pulse wave measuring device of claim 8, wherein the plurality of strain gauges include a pair of strain gauges that detects compressive strain of the strain body and another pair of strain gauges that detects tensile strain of the strain body, the pair of strain gauges and the other pair of strain gauges are connected to form each side of a bridge circuit, and the signal indicative of the pulse wave is generated by the bridge circuit.

10. A pulse wave measuring device as described in claim 8 or 9, wherein the strain gauge has a first main surface and a second main surface located opposite the first main surface, the plurality of strain gauges are arranged on the second main surface, and a cover member is attached to the first main surface side.

11. A pulse wave measuring device as claimed in any one of claims 1 to 10, wherein the attachment portion has a first curved member and a second curved member curved in opposite directions and facing each other so that it can be attached to the wrist of the subject, the first curved member and the second curved member are biased by a second biasing member and supported by a swinging shaft so as to be able to transition between a closed state and an open state, the sensor portion is disposed on one end side of the first curved member in the longitudinal direction, and the swinging shaft is disposed on the other end side of the first curved member in the longitudinal direction.

12. A pulse wave measuring device as described in claim 11, wherein the first curved member has a wiring board arranged between one end side and the other end side in the longitudinal direction, and components that contribute to detecting pulse waves are arranged on the wiring board.

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