Composition for forming wavelength conversion film and use thereof

Abstract

Provided is a composition that, even when developed after being exposed in air, can form a wavelength conversion film having a high residual film rate and a high conversion efficiency.　This composition for forming a wavelength conversion film contains (A) a fluorophore and (B) a binder. The binder (B) contains a compound represented by general formula (1). [In general formula (1), R1 and R2 each independently represent any one selected from the group consisting of a hydrogen atom, alkyl groups having 1-6 carbon atoms, alkenyl groups having 2-6 carbon atoms, aryl groups, and aralkyl groups, R3 represents any one selected from the group consisting of alkyl groups having 1-6 carbon atoms, alkenyl groups having 2-6 carbon atoms, aryl groups, and aralkyl groups, R4 represents any one selected from the group consisting of (meth)acryloyl groups, styryl groups, and alkenyl groups having 2-6 carbon atoms, and X represents NH or O. n represents an arbitrarily defined integer of 1-5.]

Description

Wavelength conversion film forming composition and its use

[0001] The present invention relates to a composition for forming a wavelength-converting film and uses thereof (for example, a composition for forming a wavelength-converting film for a display or a wavelength-converting film containing the composition for forming a wavelength-converting film).

[0002] Micro LED displays are expected to be the next generation display following LCDs and OLED displays, as they offer high contrast and brightness, and have a wide range of applications, including large screens and transparent displays. Micro LED displays typically have a tiny LED chip placed in each pixel. While the RGB-LED method, which uses three color LEDs, presents challenges with this method, including the complexity of LED light emission control and the low performance of the red LED. Wavelength conversion methods, which can solve these challenges, are gaining attention. Wavelength conversion methods use only blue LED chips, extracting red and green light using wavelength conversion materials, offering the advantage of being able to produce the three primary colors using only blue LED chips.

[0003] Conventionally, techniques using organic light-emitting materials have been proposed as wavelength conversion materials, and for example, techniques using pyridine-phthalimide condensates (Patent Document 1, etc.), techniques using coumarin derivatives (Patent Document 2, etc.), techniques using perylene derivatives (Patent Document 3, etc.), techniques using rhodamine derivatives (Patent Document 4), and techniques using pyrromethene derivatives (Patent Documents 5 and 6, etc.) have been disclosed.

[0004] These wavelength conversion materials are generally required to have properties such as good wavelength conversion efficiency, color purity, and light resistance. In this regard, for example, Patent Document 7 discloses that a composition containing a binder resin made of a specific methacrylic polymer, a specific fluorescent dye, and a photopolymerizable acrylic acid ester serves as a high-performance, light-resistant red conversion material. Furthermore, a technology for adding a light stabilizer to prevent deterioration of organic light-emitting materials and improve durability has also been disclosed (Patent Document 8, etc.). Furthermore, it is known that adding fine particles to wavelength conversion materials increases the optical path length due to light scattering within the color conversion layer, improving the blue light absorption rate, and also improves the luminous efficiency by re-scattering light reflected at the interface (Patent Documents 9, 10, etc.).

[0005] JP 2002-348568 A JP 2007-273440 A JP 2002-317175 A JP 2001-164245 A JP 2011-241160 A JP 2014-136771 A JP 2006-89724 A JP 2011-149028 A International Publication No. 2020 / 189678 International Publication No. 2019 / 181698

[0006] However, when a wavelength conversion film formed using a conventional wavelength converting material is exposed and developed in the atmosphere, the thickness of the wavelength conversion film becomes thin, and the desired properties of the wavelength conversion film cannot be effectively exhibited. On the other hand, to maintain a sufficient thickness of the wavelength conversion film, a material design that maintains the thickness must be performed at the expense of the desired properties of the wavelength conversion film (particularly, conversion efficiency) (e.g., while emphasizing the relationship with development conditions such as the type of developer). In other words, when a wavelength conversion film formed using a conventional wavelength converting material is exposed and developed in the atmosphere, it is difficult to sufficiently maintain the thickness of the wavelength conversion film and effectively exhibit the desired properties of the wavelength conversion film (particularly, conversion efficiency). Therefore, there is a need for the development of a wavelength converting material that can sufficiently maintain the original thickness (i.e., the thickness before development) even after exposure in the atmosphere and can effectively exhibit the properties of a wavelength conversion film (particularly, conversion efficiency). Specifically, even when a development process is performed after exposure under atmospheric pressure, the ratio (%) of the film thickness after development to the film thickness immediately before development (the original film thickness) (also referred to as the "residual film ratio") is desirably 50% or more, preferably 70% or more. Furthermore, when a wavelength conversion film formed from a conventional wavelength converting material using a photoradical polymerization initiator as a photopolymerization initiator is developed in a developer after exposure under atmospheric pressure, there is a problem that the curing process during the formation of the wavelength conversion film is insufficient due to oxygen inhibition (i.e., termination of the polymerization reaction by oxygen in the atmosphere), and the formed wavelength conversion film dissolves in the developer. The present invention has been made in view of the above circumstances, and aims to provide a composition (i.e., a composition for forming a wavelength conversion film) capable of forming a wavelength conversion film having a high residual film ratio (specifically, 50% or more, preferably 70% or more) and a high conversion efficiency (specifically, 30% or more, preferably 35% or more) even when developed after exposure under atmospheric pressure.Another object of the present invention is to provide a composition (i.e., a composition for forming a wavelength-conversion film) that can form a wavelength-conversion film that has excellent insolubility in a developer in development treatment after exposure under atmospheric pressure, even when the wavelength-conversion film is formed using a photoradical polymerization initiator as the photopolymerization initiator.

[0007] As a result of extensive research into solving the above problems, the present inventors have found that the above problems can be solved by a composition for forming a wavelength conversion film containing a phosphor and a predetermined binder, and have completed the present invention.

[0008] That is, the present invention provides the following compositions for forming a wavelength conversion film, etc.: [1] A composition for forming a wavelength conversion film, comprising (A) a phosphor and (B) a binder, wherein the binder (B) contains a compound represented by the following general formula (1): [In general formula (1), R １ and R ２ each independently represents a group selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, an aryl group, and an aralkyl group; R ３ represents any one selected from the group consisting of an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, an aryl group, and an aralkyl group; R ４ represents any one selected from the group consisting of a (meth)acryloyl group, a styryl group, and an alkenyl group having 2 to 6 carbon atoms, and X represents NH or O. n represents any integer from 1 to 5.] [2] R in the above general formula (1) １ and R ２ is a hydrogen atom, and R ３ is a methyl group, n is 1 to 4, and R ４ is a (meth)acryloyl group or a styryl group, and X is O. [3] The composition for forming a wavelength conversion film according to [1] or [2], wherein the general formula (1) is the following general formula (2): [In the formula, R ５represents a hydrogen atom or a methyl group.] [4] The composition for forming a wavelength conversion film according to any one of [1] to [3], wherein the (B) binder contains: (B-1) a photopolymerization initiator; (B-2) a compound represented by the general formula (1); and (B-3) a compound having two or more polymerizable functional groups in the molecule, and different from the compound represented by the general formula (1). [5] The composition for forming a wavelength conversion film according to [4], wherein the polymerizable functional group in (B-3) is a (meth)acryloyl group. [6] The composition for forming a wavelength conversion film according to [4] or [5], wherein the (B) binder contains: (B-4) a compound having one polymerizable functional group in the molecule. [7] The composition for forming a wavelength conversion film according to [6], wherein the polymerizable functional group in (B-4) is a (meth)acryloyl group. [8] The composition for forming a wavelength conversion film according to any one of [4] to [7], wherein the (B) binder contains a (B-5) resin. [9] The composition for forming a wavelength conversion film according to [8], wherein the (B-5) resin contains an alkali-soluble resin.

[10] The composition for forming a wavelength conversion film according to any one of [1] to [9], further containing (C) light-scattering particles.

[11] The composition for forming a wavelength conversion film according to

[10] , wherein the (C) light-scattering particles are titanium oxide particles.

[12] The composition for forming a wavelength conversion film according to any one of [1] to

[11] , further containing a (D) thermal crosslinking agent.

[13] The composition for forming a wavelength conversion film according to

[12] , wherein the (D) thermal crosslinking agent is an epoxy-based crosslinking agent.

[14] The composition for forming a wavelength conversion film according to any one of [1] to

[13] , wherein the content of the (A) phosphor is 0.1 mass % or more of the solid content.

[15] The composition for forming a wavelength conversion film according to any one of

[10] to

[14] , wherein the content of the (C) light-scattering particles is 1 mass % or more in the solid content.

[16] The composition for forming a wavelength conversion film according to any one of [1] to

[15] , wherein a film formed from the composition has a haze value of 18% or more.

[17] The composition for forming a wavelength conversion film according to any one of [1] to

[16] , which is a composition for forming a wavelength conversion film for a display.

[18] A wavelength conversion film made from the composition for forming a wavelength conversion film according to any one of [1] to

[17] .

[0009] According to the present invention, it is possible to provide a composition (i.e., a composition for forming a wavelength-converting film) capable of forming a wavelength-converting film having a high film residual rate (specifically, 50% or more, preferably 70% or more) and a high conversion efficiency (specifically, 30% or more, preferably 35% or more), and the wavelength-converting film. Furthermore, according to the present invention, when a wavelength-converting film formed using a photoradical polymerization initiator as a photopolymerization initiator is exposed to light under atmospheric pressure and then developed, the problem of insufficient curing due to oxygen inhibition in the curing process of the wavelength-converting film, resulting in dissolution in the developer, can be avoided. That is, according to the present invention, it is possible to provide a composition (i.e., a composition for forming a wavelength-converting film) capable of forming a wavelength-converting film having suitable curability that can avoid the above problem, even when a photoradical polymerization initiator is used as a photopolymerization initiator, and the wavelength-converting film. Furthermore, according to the present invention, it is possible to provide a composition for forming a wavelength-converting film capable of forming a wavelength-converting film having a large amount of light absorbed by a phosphor, and the wavelength-converting film. For example, it is possible to provide a composition for forming a wavelength-converting film capable of forming a wavelength-converting film having a haze value of 18% or more, and the wavelength-converting film. The present invention also provides compositions for forming wavelength-converting films for various applications, such as compositions for forming wavelength-converting films for displays (particularly, micro LED displays).

[0010] The present invention will be described in more detail below. The composition for forming a wavelength conversion film of the present invention contains (A) a phosphor and (B) a binder, and the binder (B) contains a compound represented by the following general formula (1): [In general formula (1), R １ and R ２ each independently represents a group selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, an aryl group, and an aralkyl group; R ３ represents any one selected from the group consisting of an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, an aryl group, and an aralkyl group; R ４represents any one selected from the group consisting of a (meth)acryloyl group, a styryl group, and an alkenyl group having 2 to 6 carbon atoms, and X represents NH or O. n represents any integer from 1 to 5.] In the following description, the solid content means the components other than the solvent that constitute the composition for forming a wavelength conversion film.

[0011] [(A) Phosphor] The (A) phosphor is not particularly limited as long as it can achieve the object of the present invention. It is sufficient if the phosphor is suitable as a phosphor while maintaining the desired film remaining ratio even when a wavelength conversion film is formed, exposed to air, and developed. Phosphors that can exhibit better properties as a phosphor are preferred. For example, when forming a wavelength conversion film for a micro LED display, it is preferred that the wavelength conversion film be exposed to air and developed while maintaining the desired film remaining ratio and exhibiting better wavelength conversion efficiency, color purity, light resistance, and other properties as a micro LED display.

[0012] The (A) phosphor can be appropriately selected from conventionally known inorganic phosphors, organic dyes, quantum dots, etc., but organic dyes are preferred. Examples of organic dyes include compounds having a condensed aryl ring such as naphthalene, anthracene, phenanthrene, pyrene, chrysene, naphthacene, triphenylene, perylene, fluoranthene, fluorene, and indene, and derivatives thereof; furan, pyrrole, thiophene, silole, 9-silafluorene, 9,9'-spirobisilafluorene, benzothiophene, benzofuran, indole, dibenzothiophene, dibenzofuran, imidazopyridine, phenanthroline, pyridine, pyrazine, naphthacene, and the like. Compounds having a heteroaryl ring such as pyridine, quinoxaline, and pyrrolopyridine, and derivatives thereof; stilbene compounds such as 1,4-distyrylbenzene, 4,4'-bis(2-(4-diphenylaminophenyl)ethenyl)biphenyl, and 4,4'-bis(N-(stilben-4-yl)-N-phenylamino)stilbene; aromatic acetylene compounds; tetraphenylbutadiene compounds; aldazine compounds; pyrromethene compounds; diketopyrrolo[3,4-c]pyrrole compounds; and coumarin. Coumarin-based compounds such as Coumarin 6, Coumarin 7, Coumarin 153, and compounds disclosed in Patent Document 7; azole-based compounds such as imidazole, thiazole, thiadiazole, carbazole, oxazole, oxadiazole, and triazole, and metal complexes thereof; cyanine-based compounds such as indocyanine green; xanthene-based compounds and thioxanthene-based compounds such as fluorescein, eosin, and rhodamine; polyphenylene-based compounds, naphthalimide-based compounds, phthalocyanine-based compounds, and metal complexes thereof complexes, porphyrin compounds and metal complexes thereof; oxazine compounds such as Nile Red and Nile Blue; helicene compounds; aromatic amine compounds such as N,N'-diphenyl-N,N'-di(3-methylphenyl)-4,4'-diphenyl-1,1'-diamine; and organometallic complex compounds such as iridium (Ir), ruthenium (Ru), rhodium (Rh), palladium (Pd), platinum (Pt), osmium (Os), and rhenium (Re), but are not limited to these.

[0013] Furthermore, perylene-based compounds can also be suitably used as the organic dye used as the phosphor (A) in the wavelength conversion film-forming composition of the present invention. A perylene-based compound is a compound having perylene as a skeleton, and preferred perylene-based compounds include, but are not limited to, the compound represented by the following formula (2) (Oracet (registered trademark) FL Red 305, manufactured by BASF), Lumogen (registered trademark) F Yellow 083 (manufactured by BASF), Solvent Green 5, and the compound represented by the following formula (Y1). The compound represented by the following formula (2) (Oracet (registered trademark) FL Red 305, manufactured by BASF) and the compound represented by the following formula (Y1) are more preferred.

[0014]

[0015] A compound represented by the following formula (Y1): [In the formula, R Ａ and R Ｂ are each independently a group represented by the following formula (2) or (3): (G １ is O or NR Ｅ and A １ is an ethylene group or a propylene group, n is an integer from 1 to 10, and R Ｃ is a hydrogen atom, an optionally substituted alkyl group, an optionally substituted cycloalkyl group, an optionally substituted alkenyl group, an optionally substituted aryl group, an optionally substituted heteroaryl group, an optionally substituted alkylcarbonyl group, an optionally substituted alkenylcarbonyl group, an optionally substituted arylcarbonyl group or an optionally substituted heteroarylcarbonyl group, and R Ｅ represents a hydrogen atom, an optionally substituted alkyl group, an optionally substituted cycloalkyl group, an optionally substituted alkenyl group, an optionally substituted aryl group, or an optionally substituted heteroaryl group, and the dashed line represents a bond. (G ２ is O or NR Ｅand L ２ is a single bond or an alkylene group which may have a substituent, R Ｄ represents a hydrogen atom, an optionally substituted alkyl group, an optionally substituted cycloalkyl group, an optionally substituted alkenyl group, an optionally substituted aryl group, an optionally substituted heteroaryl group, an optionally substituted alkylcarbonyl group, an optionally substituted alkenylcarbonyl group, an optionally substituted arylcarbonyl group, an optionally substituted heteroarylcarbonyl group, or OR Ｆ and R Ｅ is a hydrogen atom, an optionally substituted alkyl group, an optionally substituted cycloalkyl group, an optionally substituted alkenyl group, an optionally substituted aryl group or an optionally substituted heteroaryl group, R Ｆ is a hydrogen atom, an optionally substituted alkyl group, an optionally substituted alkenyl group, an optionally substituted aryl group, an optionally substituted heteroaryl group, an optionally substituted alkylcarbonyl group, an optionally substituted alkenylcarbonyl group, an optionally substituted arylcarbonyl group or an optionally substituted heteroarylcarbonyl group, and G ２ NR Ｅ Katsu L ２ When is a single bond, R Ｄ and R Ｅ may be bonded to each other to form a ring together with the nitrogen atom, ２ is a single bond, R Ｄ is OR Ｆ It will not be like this, ２ When R is an alkylene group which may have a substituent, Ｄ cannot be a hydrogen atom, and R Ｄ is an alkyl group which may have a substituent, L ２ is a single bond, and the dashed line is a bond.)

[0016] G １ is preferably O. １is preferably an ethylene group. n is preferably an integer of 1 to 8, more preferably an integer of 1 to 6.

[0017] R Ｃ The alkyl group represented by the formula (I) may be either linear or branched, and specific examples thereof include alkyl groups having 1 to 40 carbon atoms such as a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, a tert-butyl group, an n-pentyl group, an n-hexyl group, an n-octyl group, a decyl group, and an eicosanyl group, and an alkyl group having 1 to 20 carbon atoms is preferred.

[0018] The above R Ｃ The alkyl group represented by the formula (I) may have a substituent. Examples of the substituent include a halogen atom, a cycloalkyl group, an aryl group, a heteroaryl group, a hydroxy group, a cyano group, and a nitro group, which will be described later. When the alkyl group has a substituent, the number of the substituents is preferably 1 to 6, and more preferably 1 to 3.

[0019] Halogen atoms include fluorine atoms, chlorine atoms, bromine atoms and iodine atoms.

[0020] R Ｃ Examples of the cycloalkyl group represented by the formula (I) include cycloalkyl groups having 3 to 10 carbon atoms, such as cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, and cycloheptyl groups, and preferably cycloalkyl groups having 3 to 8 carbon atoms.

[0021] The above R Ｃ The cycloalkyl group represented by the following formula (I) may have a substituent. Examples of the substituent include the above-mentioned halogen atoms, the above-mentioned alkyl groups, the alkenyl groups described below, the alkynyl groups described below, the aryl groups described below, the heteroaryl groups described below, a hydroxy group, a cyano group, and a nitro group. When the cycloalkyl group has a substituent, the number of the substituents is preferably 1 to 6, and more preferably 1 to 3.

[0022] Examples of the alkynyl group include an ethynyl group, a 1-propynyl group, a 2-propynyl group, a butynyl group, an isobutynyl group, an s-butynyl group, and a t-butynyl group.

[0023] R ＣExamples of the alkenyl group represented by the formula (I) include a vinyl group, a 1-propenyl group, a 2-propenyl group, an isopropenyl group, a butenyl group, an isobutenyl group, an s-butenyl group, and a t-butenyl group.

[0024] The above R Ｃ The alkenyl group represented by the formula (I) may have a substituent. Examples of the substituent include the above-mentioned halogen atoms, the aryl group described below, the heteroaryl group described below, a hydroxy group, a cyano group, and a nitro group. When the alkenyl group has a substituent, the number of the substituents is preferably 1 to 6, and more preferably 1 to 3.

[0025] R Ｃ The aryl group represented by the formula (I) may be any of a monocyclic aryl group, a fused ring aryl group, and a polycyclic aryl group, and specific examples thereof include a phenyl group as the monocyclic aryl group, a naphthyl group, an anthracenyl group, a phenanthrenyl group, a fluorenyl group, a pyrenyl group, a triphenylenyl group, and the like as the fused ring aryl group, and an aryl group having 6 to 18 carbon atoms such as a biphenyl group and a terphenyl group as the polycyclic aryl group, and an aryl group having 6 to 14 carbon atoms is preferred.

[0026] The above R Ｃ The aryl group represented by the formula (I) may have a substituent. Examples of the substituent include the halogen atoms, alkyl groups, halogenated alkyl groups described below, alkenyl groups, alkynyl groups, aryl groups, heteroaryl groups described below, hydroxy groups, cyano groups, and nitro groups. When the aryl group has a substituent, the number of substituents is preferably 1 to 6, and more preferably 1 to 3.

[0027] Examples of the halogenated alkyl group include a trifluoromethyl group and a pentafluoroethyl group.

[0028] R ＣThe heteroaryl group represented by the formula (I) may be either a monocyclic heteroaryl group or a fused-ring heteroaryl group. Examples of the monocyclic heteroaryl group include a pyrrolyl group, a thienyl group, a furanyl group, an imidazolyl group, a pyrazolyl group, a thiazolyl group, an oxazolyl group, a pyridyl group, and a pyrazyl group. Examples of the fused-ring heteroaryl group include an indolyl group, an isoindolyl group, a benzimidazolyl group, a quinolyl group, an isoquinolyl group, and a quinoxalyl group.

[0029] The above R Ｃ The heteroaryl group represented by the formula (I) may have a substituent. Examples of the substituent include the halogen atoms, alkyl groups, halogenated alkyl groups, alkenyl groups, alkynyl groups, aryl groups, heteroaryl groups, cyano groups, and nitro groups. When the heteroaryl group has a substituent, the number of the substituents is preferably 1 to 6, and more preferably 1 to 3.

[0030] R ＣExamples of the alkylcarbonyl group represented by the formula (I) include a methylcarbonyl group, an ethylcarbonyl group, an n-propylcarbonyl group, an i-propylcarbonyl group, a c-propylcarbonyl group, an n-butylcarbonyl group, an i-butylcarbonyl group, an s-butylcarbonyl group, a t-butylcarbonyl group, a c-butylcarbonyl group, a 1-methyl-c-propylcarbonyl group, a 2-methyl-c-propylcarbonyl group, an n-pentylcarbonyl group, a 1-methyl-n-butylcarbonyl group, a 2-methyl-n-butylcarbonyl group, a 3-methyl-n-butylcarbonyl group, a 1,1-dimethyl-n-butylcarbonyl group, a 2- ... Methyl-n-propylcarbonyl group, 1,2-dimethyl-n-propylcarbonyl group, 2,2-dimethyl-n-propylcarbonyl group, 1-ethyl-n-propylcarbonyl group, c-pentylcarbonyl group, 1-methyl-c-butylcarbonyl group, 2-methyl-c-butylcarbonyl group, 3-methyl-c-butylcarbonyl group, 1,2-dimethyl-c-propylcarbonyl group, 2,3-dimethyl-c-propylcarbonyl group, 1-ethyl-c-propylcarbonyl group, 2-ethyl-c-propylcarbonyl group, n-hexylcarbonyl group, 1-methyl-n -pentylcarbonyl group, 2-methyl-n-pentylcarbonyl group, 3-methyl-n-pentylcarbonyl group, 4-methyl-n-pentylcarbonyl group, 1,1-dimethyl-n-butylcarbonyl group, 1,2-dimethyl-n-butylcarbonyl group, 1,3-dimethyl-n-butylcarbonyl group, 2,2-dimethyl-n-butylcarbonyl group, 2,3-dimethyl-n-butylcarbonyl group, 3,3-dimethyl-n-butylcarbonyl group, 1-ethyl-n-butylcarbonyl group, 2-ethyl-n-butylcarbonyl group, 1,1,2-trimethyl-n-propyl carbonyl group, 1,2,2-trimethyl-n-propylcarbonyl group, 1-ethyl-1-methyl-n-propylcarbonyl group, 1-ethyl-2-methyl-n-propylcarbonyl group, c-hexylcarbonyl group, 1-methyl-c-pentylcarbonyl group, 2-methyl-c-pentylcarbonyl group, 3-methyl-c-pentylcarbonyl group, 1-ethyl-c-butylcarbonyl group, 2-ethyl-c-butylcarbonyl group, 3-ethyl-c-butylcarbonyl group, 1,2-dimethyl-c-butylcarbonyl group, 1,3-dimethyl-c-butylcarbonyl group, 2,2-dimethyl-c-butylcarbonyl group, 2,3-dimethyl-c-butylcarbonyl group, 2,4-dimethyl-c-butylcarbonyl group, 3,3-dimethyl-c-butylcarbonyl group, 1-n-propyl-c-propylcarbonyl group, 2-n-propyl-c-propylcarbonyl group, 1-i-propyl-c-propylcarbonyl group, 2-i-propyl-c-propylcarbonyl group, 1,2,2-trimethyl-c-propylcarbonyl group, 1 Examples of alkylcarbonyl groups include alkylcarbonyl groups having 2 to 11 carbon atoms, such as a 2,3-trimethyl-c-propylcarbonyl group, a 2,2,3-trimethyl-c-propylcarbonyl group, a 1-ethyl-2-methyl-c-propylcarbonyl group, a 2-ethyl-1-methyl-c-propylcarbonyl group, a 2-ethyl-2-methyl-c-propylcarbonyl group, and a 2-ethyl-3-methyl-c-propylcarbonyl group, and alkylcarbonyl groups having 2 to 6 carbon atoms are preferred.

[0031] The above R Ｃ The alkylcarbonyl group represented by the following formula (I) may have a substituent. Examples of the substituent include the above-mentioned halogen atoms, cycloalkyl groups, aryl groups, heteroaryl groups, hydroxy groups, cyano groups, and nitro groups. When the alkylcarbonyl group has a substituent, the number of the substituents is preferably 1 to 6, and more preferably 1 to 3.

[0032] R ＣExamples of the alkenylcarbonyl group represented by the formula (I) include an ethenylcarbonyl group, a 1-propenylcarbonyl group, a 2-propenylcarbonyl group, a 1-methyl-1-ethenylcarbonyl group, a 1-butenylcarbonyl group, a 2-butenylcarbonyl group, a 3-butenylcarbonyl group, a 2-methyl-1-propenylcarbonyl group, a 2-methyl-2-propenylcarbonyl group, a 1-ethylethenylcarbonyl group, a 1-methyl-1-propenylcarbonyl group, a 1-methyl-2-propenylcarbonyl group, a 1-pentenylcarbonyl group, a 2-pentenylcarbonyl group, a 3-pentenylcarbonyl group, a 4-pentenylcarbonyl group, a 1-n -propylethenylcarbonyl group, 1-methyl-1-butenylcarbonyl group, 1-methyl-2-butenylcarbonyl group, 1-methyl-3-butenylcarbonyl group, 2-ethyl-2-propenylcarbonyl group, 2-methyl-1-butenylcarbonyl group, 2-methyl-2-butenylcarbonyl group, 2-methyl-3-butenylcarbonyl group, 3-methyl-1-butenylcarbonyl group, 3-methyl-2-butenylcarbonyl group, 3-methyl-3-butenylcarbonyl group, 1,1-dimethyl-2-propenylcarbonyl group, 1-i-propylethenylcarbonyl group, 1,2-dimethyl-1-propenylcarbonyl group, 1,2-dimethyl-2-propenylcarbonyl group, 1-c-pentenylcarbonyl group, 2-c-pentenylcarbonyl group, 3-c-pentenylcarbonyl group, 1-hexenylcarbonyl group, 2-hexenylcarbonyl group, 3-hexenylcarbonyl group, 4-hexenylcarbonyl group, 5-hexenylcarbonyl group, 1-methyl-1-pentenylcarbonyl group, 1-methyl-2-pentenylcarbonyl group, 1-methyl-3-pentenylcarbonyl group, 1-methyl-4-pentenylcarbonyl group, 1-n-butylethenylcarbonyl group, 2-methyl-1-pentenylcarbonyl group, 2-methyl-2-pentenylcarbonyl group, 2-methyl-3-pentenylcarbonyl group, 2-methyl-4-pentenylcarbonyl group, 2-n-propyl-2-propenylcarbonyl group, 3-methyl-1-pentenylcarbonyl group, 3-methyl-2-pentenylcarbonyl group, 3-methyl-3-pentenylcarbonyl group, 3-methyl-4-pentenylcarbonyl group, 3-ethyl-3-butenylcarbonyl group nyl group, 4-methyl-1-pentenylcarbonyl group, 4-methyl-2-pentenylcarbonyl group, 4-methyl-3-pentenylcarbonyl group, 4-methyl-4-pentenylcarbonyl group, 1,1-dimethyl-2-butenylcarbonyl group, 1,1-dimethyl-3-butenylcarbonyl group, 1,2-dimethyl-1-butenylcarbonyl group, 1,2-dimethyl-2-butenylcarbonyl group, 1,2-dimethyl-3-butenylcarbonyl group, 1-methyl-2-ethyl-2-propenylcarbonyl a 1-s-butylethenylcarbonyl group, a 1,3-dimethyl-1-butenylcarbonyl group, a 1,3-dimethyl-2-butenylcarbonyl group, a 1,3-dimethyl-3-butenylcarbonyl group, a 1-i-butylethenylcarbonyl group, a 2,2-dimethyl-3-butenylcarbonyl group, a 2,3-dimethyl-1-butenylcarbonyl group, a 2,3-dimethyl-2-butenylcarbonyl group, a 2,3-dimethyl-3-butenylcarbonyl group, a 2-i-propyl-2-propenylcarbonyl group, a 3,3-dimethyl-1-butenylcarbonyl group, 1-ethyl-1-butenylcarbonyl group, 1-ethyl-2-butenylcarbonyl group, 1-ethyl-3-butenylcarbonyl group, 1-n-propyl-1-propenylcarbonyl group, 1-n-propyl-2-propenylcarbonyl group, 2-ethyl-1-butenylcarbonyl group, 2-ethyl-2-butenylcarbonyl group, 2-ethyl-3-butenylcarbonyl group, 1,1,2-thiazolinone trimethyl-2-propenylcarbonyl group, 1-t-butylethenylcarbonyl group, 1-methyl-1-ethyl-2-propenylcarbonyl group, 1-ethyl-2-methyl-1-propenylcarbonyl group, 1-ethyl-2-methyl-2-propenylcarbonyl group, 1-i-propyl-1-propenylcarbonyl group, 1-i-propyl-2-propenylcarbonyl group, 1-methyl-2-c-pentenylcarbonyl group, 1-methyl -3-c-pentenylcarbonyl group, 2-methyl-1-c-pentenylcarbonyl group, 2-methyl-2-c-pentenylcarbonyl group, 2-methyl-3-c-pentenylcarbonyl group, 2-methyl-4-c-pentenylcarbonyl group, 2-methyl-5-c-pentenylcarbonyl group, 2-methylene-c-pentylcarbonyl group, 3-methyl-1-c-pentenylcarbonyl group, 3-methyl-2-c-pentenylcarbonyl group Examples of alkenylcarbonyl groups include alkenylcarbonyl groups having 3 to 11 carbon atoms, such as an alkenyl group, a 3-methyl-3-c-pentenylcarbonyl group, a 3-methyl-4-c-pentenylcarbonyl group, a 3-methyl-5-c-pentenylcarbonyl group, a 3-methylene-c-pentylcarbonyl group, a 1-c-hexenylcarbonyl group, a 2-c-hexenylcarbonyl group, and a 3-c-hexenylcarbonyl group, and alkenylcarbonyl groups having 3 to 6 carbon atoms are preferred.

[0033] The above R Ｃ The alkenylcarbonyl group represented by the following formula (I) may have a substituent. Examples of the substituent include the above-mentioned halogen atoms, aryl groups, heteroaryl groups, hydroxy groups, cyano groups, and nitro groups. When the alkenylcarbonyl group has a substituent, the number of the substituents is preferably 1 to 6, and more preferably 1 to 3.

[0034] R ＣExamples of the arylcarbonyl group represented by the formula (I) include arylcarbonyl groups having 7 to 16 carbon atoms, such as a benzoyl group, a naphthoyl group, and an anthracenyl group, and an arylcarbonyl group having 7 to 11 carbon atoms is preferred.

[0035] The above R Ｃ The arylcarbonyl group represented by the following formula (I) may have a substituent. Examples of the substituent include the halogen atoms, alkyl groups, halogenated alkyl groups, alkenyl groups, alkynyl groups, aryl groups, heteroaryl groups, cyano groups, and nitro groups. When the arylcarbonyl group has a substituent, the number of the substituents is preferably 1 to 6, and more preferably 1 to 3.

[0036] R Ｃ Examples of the heteroarylcarbonyl group represented by the formula (I) include heteroarylcarbonyl groups having 4 to 12 carbon atoms, such as a pyrrolylcarbonyl group, a thienylcarbonyl group, a furanylcarbonyl group, an imidazolylcarbonyl group, a pyrazolylcarbonyl group, a thiazolylcarbonyl group, an oxazolylcarbonyl group, a pyridylcarbonyl group, a pyrazylcarbonyl group, an indolylcarbonyl group, an isoindolylcarbonyl group, a benzimidazolylcarbonyl group, a quinolylcarbonyl group, an isoquinolylcarbonyl group, and a quinoxalylcarbonyl group, and a heteroarylcarbonyl group having 4 to 10 carbon atoms is preferred.

[0037] The heteroarylcarbonyl group may have a substituent. Examples of the substituent include the halogen atom, the alkyl group, the halogenated alkyl group, the alkenyl group, the alkynyl group, the aryl group, the heteroaryl group, a cyano group, and a nitro group. When the heteroarylcarbonyl group has a substituent, the number of the substituents is preferably 1 to 6, and more preferably 1 to 3.

[0038] R Ｅ The alkyl group represented by the formula (I) may be either linear or branched, and specific examples thereof include alkyl groups having 1 to 10 carbon atoms such as a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, and a tert-butyl group, and an alkyl group having 1 to 6 carbon atoms is preferred.

[0039] The above RＥ The alkyl group represented by the formula (I) may have a substituent. Examples of the substituent include the above-mentioned halogen atoms, the cycloalkyl group described below, the aryl group described below, the heteroaryl group described below, a hydroxy group, a cyano group, and a nitro group. When the alkyl group has a substituent, the number of the substituents is preferably 1 to 6, and more preferably 1 to 3.

[0040] R Ｅ Examples of the cycloalkyl group represented by the formula (I) include cycloalkyl groups having 3 to 10 carbon atoms, such as cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, and cycloheptyl groups, and preferably cycloalkyl groups having 3 to 8 carbon atoms.

[0041] The above R Ｅ The cycloalkyl group represented by the following formula (I) may have a substituent. Examples of the substituent include the above-mentioned halogen atoms, the above-mentioned alkyl groups, the alkenyl groups described below, the alkynyl groups described below, the aryl groups described below, the heteroaryl groups described below, a hydroxy group, a cyano group, and a nitro group. When the cycloalkyl group has a substituent, the number of the substituents is preferably 1 to 6, and more preferably 1 to 3.

[0042] R Ｅ Examples of the alkenyl group represented by the formula (I) include a vinyl group, a 1-propenyl group, a 2-propenyl group, an isopropenyl group, a butenyl group, an isobutenyl group, an s-butenyl group, and a t-butenyl group.

[0043] The above R Ｅ The alkenyl group represented by the formula (I) may have a substituent. Examples of the substituent include a halogen atom, an aryl group, a heteroaryl group, a hydroxy group, a cyano group, and a nitro group, which will be described later. When the alkenyl group has a substituent, the number of the substituents is preferably 1 to 6, and more preferably 1 to 3.

[0044] R ＥThe aryl group represented by the formula (I) may be any of a monocyclic aryl group, a fused ring aryl group, and a polycyclic aryl group, and specific examples thereof include a phenyl group as the monocyclic aryl group, a naphthyl group, an anthracenyl group, a phenanthrenyl group, a fluorenyl group, a pyrenyl group, a triphenylenyl group, and the like as the fused ring aryl group, and an aryl group having 6 to 18 carbon atoms such as a biphenyl group and a terphenyl group as the polycyclic aryl group, and an aryl group having 6 to 14 carbon atoms is preferred.

[0045] The above R Ｅ The aryl group represented by the formula (I) may have a substituent. Examples of the substituent include the halogen atoms, alkyl groups, halogenated alkyl groups, alkenyl groups, alkynyl groups, aryl groups, heteroaryl groups described below, hydroxy groups, cyano groups, nitro groups, and pentafluorosulfanyl groups. When the aryl group has a substituent, the number of substituents is preferably 1 to 6, and more preferably 1 to 3.

[0046] R Ｅ The heteroaryl group represented by the formula (I) may be either a monocyclic heteroaryl group or a fused-ring heteroaryl group. Examples of the monocyclic heteroaryl group include a pyrrolyl group, a thienyl group, a furanyl group, an imidazolyl group, a pyrazolyl group, a thiazolyl group, an oxazolyl group, a pyridyl group, and a pyrazyl group. Examples of the fused-ring heteroaryl group include an indolyl group, an isoindolyl group, a benzimidazolyl group, a quinolyl group, an isoquinolyl group, and a quinoxalyl group.

[0047] The above R Ｅ The heteroaryl group represented by the formula (I) may have a substituent. Examples of the substituent include the halogen atoms, alkyl groups, halogenated alkyl groups, alkenyl groups, alkynyl groups, aryl groups, heteroaryl groups, cyano groups, nitro groups, and pentafluorosulfanyl groups. When the heteroaryl group has a substituent, the number of substituents is preferably 1 to 6, and more preferably 1 to 3.

[0048] G ２ is O or NR Ｅ and O or NH is preferred.

[0049] L２ The alkylene group represented by the formula (I) may be linear, branched, or cyclic, and specific examples include alkylene groups having 1 to 20 carbon atoms such as methylene, methylmethylene, dimethylmethylene, ethylene, 1,2-dimethylethylene, tetramethylethylene, trimethylene, propylene, tetramethylene, pentamethylene, hexamethylene, 1,2-cyclohexylene, 1,3-cyclohexylene, and 1,4-cyclohexylene, with alkylene groups having 1 to 14 carbon atoms being preferred.

[0050] The above L ２ The alkylene group represented by the formula (I) may have a substituent. Examples of the substituent include the halogen atoms, cycloalkyl groups, aryl groups, heteroaryl groups, alkylcarbonyloxy groups described below, hydroxy groups, cyano groups, nitro groups, and oxo groups. When the alkylene group has a substituent, the number of the substituents is preferably 1 to 6, and more preferably 1 to 3.

[0051] Examples of the alkylcarbonyloxy group include a methylcarbonyloxy group, an ethylcarbonyloxy group, an n-propylcarbonyloxy group, an i-propylcarbonyloxy group, a c-propylcarbonyloxy group, an n-butylcarbonyloxy group, an i-butylcarbonyloxy group, an s-butylcarbonyloxy group, a t-butylcarbonyloxy group, a c-butylcarbonyloxy group, a 1-methyl-c-propylcarbonyloxy group, a 2-methyl-c-propylcarbonyloxy group, an n-pentylcarbonyloxy group, an ethyl ... nyloxy group, 1-methyl-n-butylcarbonyloxy group, 2-methyl-n-butylcarbonyloxy group, 3-methyl-n-butylcarbonyloxy group, 1,1-dimethyl-n-propylcarbonyloxy group, 1,2-dimethyl-n-propylcarbonyloxy group, 2,2-dimethyl-n-propylcarbonyloxy group, 1-ethyl-n-propylcarbonyloxy group, c-pentylcarbonyloxy group, 1-methyl-c-butylcarbonyloxy group, 2-methyl-c-butylcarbonyloxy group oxy group, 3-methyl-c-butylcarbonyloxy group, 1,2-dimethyl-c-propylcarbonyloxy group, 2,3-dimethyl-c-propylcarbonyloxy group, 1-ethyl-c-propylcarbonyloxy group, 2-ethyl-c-propylcarbonyloxy group, n-hexylcarbonyloxy group, 1-methyl-n-pentylcarbonyloxy group, 2-methyl-n-pentylcarbonyloxy group, 3-methyl-n-pentylcarbonyloxy group, 4-methyl-n-pentylcarbonyloxy group dimethyl-n-butylcarbonyloxy group, 1,1-dimethyl-n-butylcarbonyloxy group, 1,2-dimethyl-n-butylcarbonyloxy group, 1,3-dimethyl-n-butylcarbonyloxy group, 2,2-dimethyl-n-butylcarbonyloxy group, 2,3-dimethyl-n-butylcarbonyloxy group, 3,3-dimethyl-n-butylcarbonyloxy group, 1-ethyl-n-butylcarbonyloxy group, 2-ethyl-n-butylcarbonyloxy group, 1,1,2-trimethyl-n-propylcarbonyloxy group, 1,2,2-trimethyl-n-propylcarbonyloxy group, 1-ethyl-1-methyl-n-propylcarbonyloxy group, 1-ethyl-2-methyl-n-propylcarbonyloxy group, c-hexylcarbonyloxy group, 1-methyl-c-pentylcarbonyloxy group, 2-methyl-c-pentylcarbonyloxy group, 3-methyl-c-pentylcarbonyloxy group, 1-ethyl-c-butylcarbonyloxy group, 2-ethyl-c-butylcarbonyloxy group, 3-ethyl-c-butylcarbonyloxy group, 1,2-dimethyl-c-butylcarbonyloxy group, 1,3-dimethyl-c-butylcarbonyloxy group, 2,2-dimethyl-c-butylcarbonyloxy group, 2,3-dimethyl-c-butylcarbonyloxy group, 2,4-dimethyl-c-butylcarbonyloxy group, 3,3-dimethyl-c-butyl Examples of alkylcarbonyloxy groups having 2 to 11 carbon atoms include a carbonyloxy group, a 1-n-propyl-c-propylcarbonyloxy group, a 2-n-propyl-c-propylcarbonyloxy group, a 1-i-propyl-c-propylcarbonyloxy group, a 2-i-propyl-c-propylcarbonyloxy group, a 1,2,2-trimethyl-c-propylcarbonyloxy group, a 1,2,3-trimethyl-c-propylcarbonyloxy group, a 2,2,3-trimethyl-c-propylcarbonyloxy group, a 1-ethyl-2-methyl-c-propylcarbonyloxy group, a 2-ethyl-1-methyl-c-propylcarbonyloxy group, a 2-ethyl-2-methyl-c-propylcarbonyloxy group, and a 2-ethyl-3-methyl-c-propylcarbonyloxy group, and alkylcarbonyloxy groups having 2 to 6 carbon atoms are preferred.

[0052] R Ｄ The alkyl group represented by the formula (I) may be either linear or branched, and specific examples thereof include alkyl groups having 1 to 40 carbon atoms such as a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, a tert-butyl group, an n-pentyl group, an n-hexyl group, an n-octyl group, a decyl group, and an eicosanyl group, and an alkyl group having 1 to 20 carbon atoms is preferred.

[0053] The above R ＤThe alkyl group represented by the formula (I) may have a substituent. Examples of the substituent include a halogen atom, a cycloalkyl group, an aryl group, a heteroaryl group, a hydroxy group, a cyano group, a nitro group, an oxo group, and an epoxy group. When the alkyl group has a substituent, the number of the substituents is preferably 1 to 6, and more preferably 1 to 3.

[0054] Halogen atoms include fluorine atoms, chlorine atoms, bromine atoms and iodine atoms.

[0055] R Ｄ Examples of the cycloalkyl group represented by the formula (I) include cycloalkyl groups having 3 to 10 carbon atoms, such as cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, and cycloheptyl groups, and preferably cycloalkyl groups having 3 to 8 carbon atoms.

[0056] The above R Ｄ The cycloalkyl group represented by the following formula (I) may have a substituent. Examples of the substituent include the above-mentioned halogen atoms, the above-mentioned alkyl groups, the alkenyl groups described below, the alkynyl groups described below, the aryl groups described below, the heteroaryl groups described below, a hydroxy group, a cyano group, and a nitro group. When the cycloalkyl group has a substituent, the number of the substituents is preferably 1 to 6, and more preferably 1 to 3.

[0057] Examples of the alkynyl group include an ethynyl group, a 1-propynyl group, a 2-propynyl group, a butynyl group, an isobutynyl group, an s-butynyl group, and a t-butynyl group.

[0058] R Ｄ Examples of the alkenyl group represented by the formula (I) include a vinyl group, a 1-propenyl group, a 2-propenyl group, an isopropenyl group, a butenyl group, an isobutenyl group, an s-butenyl group, and a t-butenyl group.

[0059] The above R Ｄ The alkenyl group represented by the formula (I) may have a substituent. Examples of the substituent include the above-mentioned halogen atoms, the aryl group described below, the heteroaryl group described below, a hydroxy group, a cyano group, and a nitro group. When the alkenyl group has a substituent, the number of the substituents is preferably 1 to 6, and more preferably 1 to 3.

[0060] R ＤThe aryl group represented by the formula (I) may be any of a monocyclic aryl group, a fused ring aryl group, and a polycyclic aryl group, and specific examples thereof include a phenyl group as the monocyclic aryl group, a naphthyl group, an anthracenyl group, a phenanthrenyl group, a fluorenyl group, a pyrenyl group, a triphenylenyl group, and the like as the fused ring aryl group, and an aryl group having 6 to 18 carbon atoms such as a biphenyl group and a terphenyl group as the polycyclic aryl group, and an aryl group having 6 to 14 carbon atoms is preferred.

[0061] The above R Ｄ The aryl group represented by the formula (I) may have a substituent. Examples of the substituent include the halogen atoms, the alkyl groups, the halogenated alkyl groups described below, the alkenyl groups, the alkynyl groups, the aryl groups, the heteroaryl groups described below, a hydroxy group, a cyano group, a nitro group, and a pentafluorosulfanyl group. When the aryl group has a substituent, the number of the substituents is preferably 1 to 6, and more preferably 1 to 3.

[0062] Examples of the halogenated alkyl group include a trifluoromethyl group and a pentafluoroethyl group.

[0063] R Ｄ The heteroaryl group represented by the formula (I) may be either a monocyclic heteroaryl group or a fused-ring heteroaryl group. Examples of the monocyclic heteroaryl group include a pyrrolyl group, a thienyl group, a furanyl group, an imidazolyl group, a pyrazolyl group, a thiazolyl group, an oxazolyl group, a pyridyl group, and a pyrazyl group. Examples of the fused-ring heteroaryl group include an indolyl group, an isoindolyl group, a benzimidazolyl group, a quinolyl group, an isoquinolyl group, and a quinoxalyl group.

[0064] The above R Ｄ The heteroaryl group represented by the formula (I) may have a substituent. Examples of the substituent include the halogen atoms, alkyl groups, halogenated alkyl groups, alkenyl groups, alkynyl groups, aryl groups, heteroaryl groups, cyano groups, and nitro groups. When the heteroaryl group has a substituent, the number of the substituents is preferably 1 to 6, and more preferably 1 to 3.

[0065] R ＤExamples of the alkylcarbonyl group represented by the formula (I) include a methylcarbonyl group, an ethylcarbonyl group, an n-propylcarbonyl group, an i-propylcarbonyl group, a c-propylcarbonyl group, an n-butylcarbonyl group, an i-butylcarbonyl group, an s-butylcarbonyl group, a t-butylcarbonyl group, a c-butylcarbonyl group, a 1-methyl-c-propylcarbonyl group, a 2-methyl-c-propylcarbonyl group, an n-pentylcarbonyl group, a 1-methyl-n-butylcarbonyl group, a 2-methyl-n-butylcarbonyl group, a 3-methyl-n-butylcarbonyl group, a 1,1-dimethyl-n-butylcarbonyl group, a 2- ... Methyl-n-propylcarbonyl group, 1,2-dimethyl-n-propylcarbonyl group, 2,2-dimethyl-n-propylcarbonyl group, 1-ethyl-n-propylcarbonyl group, c-pentylcarbonyl group, 1-methyl-c-butylcarbonyl group, 2-methyl-c-butylcarbonyl group, 3-methyl-c-butylcarbonyl group, 1,2-dimethyl-c-propylcarbonyl group, 2,3-dimethyl-c-propylcarbonyl group, 1-ethyl-c-propylcarbonyl group, 2-ethyl-c-propylcarbonyl group, n-hexylcarbonyl group, 1-methyl-n -pentylcarbonyl group, 2-methyl-n-pentylcarbonyl group, 3-methyl-n-pentylcarbonyl group, 4-methyl-n-pentylcarbonyl group, 1,1-dimethyl-n-butylcarbonyl group, 1,2-dimethyl-n-butylcarbonyl group, 1,3-dimethyl-n-butylcarbonyl group, 2,2-dimethyl-n-butylcarbonyl group, 2,3-dimethyl-n-butylcarbonyl group, 3,3-dimethyl-n-butylcarbonyl group, 1-ethyl-n-butylcarbonyl group, 2-ethyl-n-butylcarbonyl group, 1,1,2-trimethyl-n-propyl carbonyl group, 1,2,2-trimethyl-n-propylcarbonyl group, 1-ethyl-1-methyl-n-propylcarbonyl group, 1-ethyl-2-methyl-n-propylcarbonyl group, c-hexylcarbonyl group, 1-methyl-c-pentylcarbonyl group, 2-methyl-c-pentylcarbonyl group, 3-methyl-c-pentylcarbonyl group, 1-ethyl-c-butylcarbonyl group, 2-ethyl-c-butylcarbonyl group, 3-ethyl-c-butylcarbonyl group, 1,2-dimethyl-c-butylcarbonyl group, 1,3-dimethyl-c-butylcarbonyl group, 2,2-dimethyl-c-butylcarbonyl group, 2,3-dimethyl-c-butylcarbonyl group, 2,4-dimethyl-c-butylcarbonyl group, 3,3-dimethyl-c-butylcarbonyl group, 1-n-propyl-c-propylcarbonyl group, 2-n-propyl-c-propylcarbonyl group, 1-i-propyl-c-propylcarbonyl group, 2-i-propyl-c-propylcarbonyl group, 1,2,2-trimethyl-c-propylcarbonyl group, 1 Examples of alkylcarbonyl groups include alkylcarbonyl groups having 2 to 11 carbon atoms, such as a 2,3-trimethyl-c-propylcarbonyl group, a 2,2,3-trimethyl-c-propylcarbonyl group, a 1-ethyl-2-methyl-c-propylcarbonyl group, a 2-ethyl-1-methyl-c-propylcarbonyl group, a 2-ethyl-2-methyl-c-propylcarbonyl group, and a 2-ethyl-3-methyl-c-propylcarbonyl group, and alkylcarbonyl groups having 2 to 6 carbon atoms are preferred.

[0066] The above R Ｄ The alkylcarbonyl group represented by the following formula (I) may have a substituent. Examples of the substituent include the above-mentioned halogen atoms, cycloalkyl groups, aryl groups, heteroaryl groups, hydroxy groups, cyano groups, and nitro groups. When the alkylcarbonyl group has a substituent, the number of the substituents is preferably 1 to 6, and more preferably 1 to 3.

[0067] R ＤExamples of the alkenylcarbonyl group represented by the formula (I) include an ethenylcarbonyl group, a 1-propenylcarbonyl group, a 2-propenylcarbonyl group, a 1-methyl-1-ethenylcarbonyl group, a 1-butenylcarbonyl group, a 2-butenylcarbonyl group, a 3-butenylcarbonyl group, a 2-methyl-1-propenylcarbonyl group, a 2-methyl-2-propenylcarbonyl group, a 1-ethylethenylcarbonyl group, a 1-methyl-1-propenylcarbonyl group, a 1-methyl-2-propenylcarbonyl group, a 1-pentenylcarbonyl group, a 2-pentenylcarbonyl group, a 3-pentenylcarbonyl group, a 4-pentenylcarbonyl group, a 1-n -propylethenylcarbonyl group, 1-methyl-1-butenylcarbonyl group, 1-methyl-2-butenylcarbonyl group, 1-methyl-3-butenylcarbonyl group, 2-ethyl-2-propenylcarbonyl group, 2-methyl-1-butenylcarbonyl group, 2-methyl-2-butenylcarbonyl group, 2-methyl-3-butenylcarbonyl group, 3-methyl-1-butenylcarbonyl group, 3-methyl-2-butenylcarbonyl group, 3-methyl-3-butenylcarbonyl group, 1,1-dimethyl-2-propenylcarbonyl group, 1-i-propylethenylcarbonyl group, 1,2-dimethyl-1-propenylcarbonyl group, 1,2-dimethyl-2-propenylcarbonyl group, 1-c-pentenylcarbonyl group, 2-c-pentenylcarbonyl group, 3-c-pentenylcarbonyl group, 1-hexenylcarbonyl group, 2-hexenylcarbonyl group, 3-hexenylcarbonyl group, 4-hexenylcarbonyl group, 5-hexenylcarbonyl group, 1-methyl-1-pentenylcarbonyl group, 1-methyl-2-pentenylcarbonyl group, 1-methyl-3-pentenylcarbonyl group, 1-methyl-4-pentenylcarbonyl group, 1-n-butylethenylcarbonyl group, 2-methyl-1-pentenylcarbonyl group, 2-methyl-2-pentenylcarbonyl group, 2-methyl-3-pentenylcarbonyl group, 2-methyl-4-pentenylcarbonyl group, 2-n-propyl-2-propenylcarbonyl group, 3-methyl-1-pentenylcarbonyl group, 3-methyl-2-pentenylcarbonyl group, 3-methyl-3-pentenylcarbonyl group, 3-methyl-4-pentenylcarbonyl group, 3-ethyl-3-butenylcarbonyl group nyl group, 4-methyl-1-pentenylcarbonyl group, 4-methyl-2-pentenylcarbonyl group, 4-methyl-3-pentenylcarbonyl group, 4-methyl-4-pentenylcarbonyl group, 1,1-dimethyl-2-butenylcarbonyl group, 1,1-dimethyl-3-butenylcarbonyl group, 1,2-dimethyl-1-butenylcarbonyl group, 1,2-dimethyl-2-butenylcarbonyl group, 1,2-dimethyl-3-butenylcarbonyl group, 1-methyl-2-ethyl-2-propenylcarbonyl a 1-s-butylethenylcarbonyl group, a 1,3-dimethyl-1-butenylcarbonyl group, a 1,3-dimethyl-2-butenylcarbonyl group, a 1,3-dimethyl-3-butenylcarbonyl group, a 1-i-butylethenylcarbonyl group, a 2,2-dimethyl-3-butenylcarbonyl group, a 2,3-dimethyl-1-butenylcarbonyl group, a 2,3-dimethyl-2-butenylcarbonyl group, a 2,3-dimethyl-3-butenylcarbonyl group, a 2-i-propyl-2-propenylcarbonyl group, a 3,3-dimethyl-1-butenylcarbonyl group, 1-ethyl-1-butenylcarbonyl group, 1-ethyl-2-butenylcarbonyl group, 1-ethyl-3-butenylcarbonyl group, 1-n-propyl-1-propenylcarbonyl group, 1-n-propyl-2-propenylcarbonyl group, 2-ethyl-1-butenylcarbonyl group, 2-ethyl-2-butenylcarbonyl group, 2-ethyl-3-butenylcarbonyl group, 1,1,2-thiazolinone trimethyl-2-propenylcarbonyl group, 1-t-butylethenylcarbonyl group, 1-methyl-1-ethyl-2-propenylcarbonyl group, 1-ethyl-2-methyl-1-propenylcarbonyl group, 1-ethyl-2-methyl-2-propenylcarbonyl group, 1-i-propyl-1-propenylcarbonyl group, 1-i-propyl-2-propenylcarbonyl group, 1-methyl-2-c-pentenylcarbonyl group, 1-methyl -3-c-pentenylcarbonyl group, 2-methyl-1-c-pentenylcarbonyl group, 2-methyl-2-c-pentenylcarbonyl group, 2-methyl-3-c-pentenylcarbonyl group, 2-methyl-4-c-pentenylcarbonyl group, 2-methyl-5-c-pentenylcarbonyl group, 2-methylene-c-pentylcarbonyl group, 3-methyl-1-c-pentenylcarbonyl group, 3-methyl-2-c-pentenylcarbonyl group Examples of alkenylcarbonyl groups include alkenylcarbonyl groups having 3 to 11 carbon atoms, such as an alkenyl group, a 3-methyl-3-c-pentenylcarbonyl group, a 3-methyl-4-c-pentenylcarbonyl group, a 3-methyl-5-c-pentenylcarbonyl group, a 3-methylene-c-pentylcarbonyl group, a 1-c-hexenylcarbonyl group, a 2-c-hexenylcarbonyl group, and a 3-c-hexenylcarbonyl group, and alkenylcarbonyl groups having 3 to 6 carbon atoms are preferred.

[0068] The above R Ｄ The alkenylcarbonyl group represented by the following formula (I) may have a substituent. Examples of the substituent include the above-mentioned halogen atoms, aryl groups, heteroaryl groups, hydroxy groups, cyano groups, and nitro groups. When the alkenylcarbonyl group has a substituent, the number of the substituents is preferably 1 to 6, and more preferably 1 to 3.

[0069] R ＤExamples of the arylcarbonyl group represented by the formula (I) include arylcarbonyl groups having 7 to 16 carbon atoms, such as a benzoyl group, a naphthoyl group, and an anthracenyl group, and an arylcarbonyl group having 7 to 11 carbon atoms is preferred.

[0070] The above R Ｄ The arylcarbonyl group represented by the following formula (I) may have a substituent. Examples of the substituent include the halogen atoms, alkyl groups, halogenated alkyl groups, alkenyl groups, alkynyl groups, aryl groups, heteroaryl groups, cyano groups, and nitro groups. When the arylcarbonyl group has a substituent, the number of the substituents is preferably 1 to 6, and more preferably 1 to 3.

[0071] R Ｄ Examples of the heteroarylcarbonyl group represented by the formula (I) include heteroarylcarbonyl groups having 4 to 12 carbon atoms, such as a pyrrolylcarbonyl group, a thienylcarbonyl group, a furanylcarbonyl group, an imidazolylcarbonyl group, a pyrazolylcarbonyl group, a thiazolylcarbonyl group, an oxazolylcarbonyl group, a pyridylcarbonyl group, a pyrazylcarbonyl group, an indolylcarbonyl group, an isoindolylcarbonyl group, a benzimidazolylcarbonyl group, a quinolylcarbonyl group, an isoquinolylcarbonyl group, and a quinoxalylcarbonyl group, and a heteroarylcarbonyl group having 4 to 10 carbon atoms is preferred.

[0072] The heteroarylcarbonyl group may have a substituent. Examples of the substituent include the halogen atom, the alkyl group, the halogenated alkyl group, the alkenyl group, the alkynyl group, the aryl group, the heteroaryl group, a cyano group, and a nitro group. When the heteroarylcarbonyl group has a substituent, the number of the substituents is preferably 1 to 6, and more preferably 1 to 3.

[0073] R Ｅrepresents a hydrogen atom, an alkyl group which may have a substituent, a cycloalkyl group which may have a substituent, an alkenyl group which may have a substituent, an aryl group which may have a substituent, or a heteroaryl group which may have a substituent, and examples of these alkyl groups, cycloalkyl groups, alkenyl groups, aryl groups, and heteroaryl groups, as well as the substituents of these groups, include R Ｅ Examples of the groups include the same as those exemplified in the above.

[0074] R Ｆ represents a hydrogen atom, an optionally substituted alkyl group, an optionally substituted alkenyl group, an optionally substituted aryl group, an optionally substituted heteroaryl group, an optionally substituted alkylcarbonyl group, an optionally substituted alkenylcarbonyl group, an optionally substituted arylcarbonyl group or an optionally substituted heteroarylcarbonyl group, and examples of these alkyl groups, cycloalkyl groups, alkenyl groups, aryl groups, heteroaryl groups, alkylcarbonyl groups, alkenylcarbonyl groups, arylcarbonyl groups and heteroarylcarbonyl groups, as well as the substituents of these groups, include those listed above for R Ｄ The groups include the same as those exemplified in the above.

[0075] In addition, in formula (2), G ２ NR Ｅ Katsu L ２ is a single bond, R Ｄ and R Ｅ may be bonded to each other to form a ring together with the nitrogen atom, and L ２ is a single bond, R ２ is OR Ｆ It will not become L ２ When R is an alkylene group which may have a substituent, Ｄ cannot be a hydrogen atom, and R Ｄ is an alkyl group which may have a substituent, L ２ is a single bond.

[0076] The above R Ａ and R Ｂmay be the same or different, but are preferably the same group.

[0077] The above R Ａ and R Ｂ The bonding positions of the above to the perylene structure are not particularly limited, but the bonding positions are preferably those represented by the following formulae (Y1a) to (Y1c).

[0078] (In the formula, R Ａ and R Ｂ is the same as above.)

[0079] The group represented by the above formula (2) is preferably a group represented by any one of the following formulae (2-1) to (2-4). (In the formula, R Ｃ and n is the same as above.)

[0080] The group represented by the above formula (3) is preferably a group represented by any one of the following formulas (3-1) to (3-2). (wherein m is an integer from 1 to 20. R Ｄ is the same as above.)

[0081] Specific examples of the phosphor represented by the above formula (Y1) include phosphors represented by the following formulas (Y1-1) to (Y1-13).

[0082]

[0083]

[0084] The compound represented by the formula (Y1) can be synthesized by referring to known methods, but the synthesis method is not particularly limited as long as the target compound can be obtained.

[0085] The content of the (A) phosphor in the present invention (i.e., the content of the phosphor that is the (A) component of the composition for forming a wavelength conversion film of the present invention) is preferably 0.1% by mass or more of the solid content, more preferably 0.3% by mass or more, and even more preferably 0.5% by mass or more, taking into consideration the wavelength conversion efficiency of the resulting wavelength conversion film. On the other hand, the upper limit of the content of the (A) phosphor is not particularly limited, but taking into consideration the decrease in fluorescence quantum yield when the phosphor is highly concentrated, it is preferably 30% by mass or less of the solid content, more preferably 10% by mass or less, even more preferably 7% by mass or less, and even more preferably 5% by mass or less. The above phosphors may be used alone or in combination of two or more.

[0086] [(B) Binder (and (B-2) Compound Represented by General Formula (1)] The (B) binder (i.e., the binder which is the component (B) of the composition for forming a wavelength conversion film of the present invention) contains a compound represented by the following general formula (1): [In general formula (1), R １ and R ２ each independently represents a group selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, an aryl group, and an aralkyl group; R ３ represents any one selected from the group consisting of an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, an aryl group, and an aralkyl group; R ４ represents any one selected from the group consisting of a (meth)acryloyl group, a styryl group, and an alkenyl group having 2 to 6 carbon atoms, X represents NH or O, and n represents an integer of 1 to 5.

[0087] R １ , R ２ and R ３ Examples of the alkyl group having 1 to 6 carbon atoms represented by include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, a tert-butyl group, an n-pentyl group, an isopentyl group, a neopentyl group, an n-hexyl group, a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, and a cyclohexyl group.

[0088] R１ , R ２ and R ３ Examples of the alkenyl group having 2 to 6 carbon atoms represented by include a vinyl group, an allyl group, a propenyl group, an isopropenyl group, a butenyl group, an isobutenyl group, a pentenyl group, a hexenyl group (such as a cis-3-hexenyl group), and a cyclohexenyl group.

[0089] R １ , R ２ and R ３ Examples of the aryl group represented by include a phenyl group, a tolyl group, a xylyl group, and a naphthyl group.

[0090] R １ , R ２ and R ３ Examples of the aralkyl group represented by include a benzyl group, a 2-phenylethyl group, a 2-naphthylethyl group, and a diphenylmethyl group.

[0091] R １ and R ２ are each preferably any one selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, and an alkenyl group having 2 to 6 carbon atoms, more preferably a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, even more preferably a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and particularly preferably a hydrogen atom or a methyl group. １ and R ２ are preferably both hydrogen atoms.

[0092] Also R ３ is preferably any one selected from the group consisting of an alkyl group having 1 to 6 carbon atoms and an alkenyl group having 2 to 6 carbon atoms, more preferably an alkyl group having 1 to 6 carbon atoms, even more preferably an alkyl group having 1 to 4 carbon atoms, and particularly preferably a methyl group.

[0093] R ４represents any one selected from the group consisting of a (meth)acryloyl group, a styryl group, and an alkenyl group having 2 to 6 carbon atoms. In this specification, the term "(meth)acryloyl group" refers to either an acryloyl group or a methacryloyl group. This also applies to (meth)acrylic acid, (meth)acrylate, and (meth)acryloyloxy group.

[0094] R ４ Examples of the alkenyl group having 2 to 6 carbon atoms represented by the formula (I) include a vinyl group, an allyl group, a propenyl group, an isopropenyl group, a butenyl group, an isobutenyl group, a pentenyl group, a hexenyl group (such as a cis-3-hexenyl group), and a cyclohexenyl group, and an alkenyl group having 2 to 5 carbon atoms is preferred.

[0095] Among these, R ４ is preferably a (meth)acryloyl group or a styryl group, and more preferably a (meth)acryloyl group, because it can effectively function as a polymerizable group and the effects of the present invention can be more effectively achieved.

[0096] In general formula (I), n represents any integer from 1 to 5. Preferably, n is any integer from 1 to 4, more preferably 1 or 2, and even more preferably 1. The compound of general formula (I) has a plurality of polymerizable functional groups, and therefore can be cured by polymerization. In addition, the effect of intermolecular interactions is kept low, and therefore the compound is characterized by being less likely to become viscous.

[0097] X may be either NH or O, but is preferably O.

[0098] Specific examples of the compound represented by the general formula (1) include the following compounds.

[0099]

[0100] The compound represented by the above general formula (1) is preferably a compound represented by the following general formula (II), in view of the ease of availability of raw materials and the like, and from the viewpoint of more efficiently and / or effectively achieving the effects of the present invention.

[0101]

[0102] In general formula (II), R ５ represents a hydrogen atom or a methyl group. ５ When is a methyl group, it is IPEMA (isoprenyl methacrylate).

[0103] The composition for forming a wavelength conversion film of the present invention may contain only one type of compound represented by the above general formula (1), or may contain two or more types of compounds.

[0104] In the composition for forming a wavelength conversion film of the present invention, the content of the compound represented by the general formula (1) is not particularly limited, but from the viewpoint of more effectively exerting the effects of the present invention, it is preferably 10% by mass or more, more preferably 20% by mass or more, and even more preferably 30% by mass or more of the solid content, and is preferably 99.9% by mass or less, more preferably 95% by mass or less, and even more preferably 90% by mass or less of the solid content.

[0105] The (B) binder may contain, in addition to the compound represented by the general formula (1), a compound having two or more polymerizable functional groups in the molecule and different from the compound represented by the general formula (1), a compound having one polymerizable functional group in the molecule, a photopolymerization initiator, and a resin. In this case, for convenience, in the present application, the photopolymerization initiator may be referred to as "(B-1) photopolymerization initiator" or simply "(B-1)," the compound represented by the above general formula (1) as "(B-2) compound represented by the above general formula (1)" or simply "(B-2)," the compound having two or more polymerizable functional groups in the molecule and different from the compound represented by the above general formula (1) as "(B-3) compound having two or more polymerizable functional groups in the molecule and different from the compound represented by the above general formula (1)" or simply "(B-3)," the compound having one polymerizable functional group in the molecule as "(B-4) compound having one polymerizable functional group in the molecule" or simply "(B-4)," and the resin as "(B-5) resin (base polymer)" or simply "(B-5)."

[0106] In the composition for forming a wavelength conversion film of the present invention, the content of the compound represented by the general formula (1) is not particularly limited, but from the viewpoint of more effectively achieving the effects of the present invention, it is preferably 10% by mass or more, more preferably 20% by mass or more, and even more preferably 30% by mass or more, relative to 100% by mass of the total of the components (B-2), (B-3), and (B-4). Also, it is preferably 90% by mass or less, more preferably 80% by mass or less, and even more preferably 70% by mass or less, relative to 100% by mass of the total of the components (B-2), (B-3), and (B-4).

[0107] [(B-3) Compound Having Two or More Polymerizable Functional Groups in the Molecule and Different from the Compound Represented by General Formula (1)] Here, (B-3) a compound having two or more polymerizable functional groups in the molecule and different from the compound represented by General Formula (1) refers to a compound having two or more polymerizable functional groups in the molecule (excluding the compound represented by General Formula (1)). The polymerizable functional group is preferably a radically polymerizable functional group. The radically polymerizable functional group is particularly preferably a radically polymerizable functional group that undergoes a polymerization reaction due to radicals from a photopolymerization initiator. Specific examples include radically polymerizable functional groups such as a (meth)acryloyl group and a vinyl group. Of these, a (meth)acryloyl group is preferred. Examples of (B-3) include polyvalent (meth)acrylic acid esters having two or more (meth)acryloyloxy groups in the molecule. The polyvalent (meth)acrylic acid ester may be a hydroxyl group-containing polyvalent (meth)acrylic acid ester. The composition of the present invention may contain only one type of (B-3) or two or more types of (B-3).

[0108] As the polyhydric (meth)acrylic acid ester, a (meth)acrylic acid ester of a polyhydric alcohol such as a diol or triol can be used, and more specifically, ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, dipropylene glycol di(meth)acrylate, tripropylene glycol di(meth)acrylate, 1,3-butanediol di(meth)acrylate, 1,4-butanediol di(meth)acrylate, 1,6-hexamethylene di(meth)acrylate, neopentyl glycol di(meth)acrylate, Examples of the di(meth)acrylate include 1,9-nonanediol di(meth)acrylate, 1,10-decanediol di(meth)acrylate, tricyclodecane dimethanol di(meth)acrylate, glycerin di(meth)acrylate, hydrogenated bisphenol A or hydrogenated bisphenol F di(meth)acrylate, polyethylene glycol di(meth)acrylate, polypropylene glycol di(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol hexa(meth)acrylate, and trimethylolpropane tri(meth)acrylate.

[0109] Examples of hydroxyl group-containing polyvalent (meth)acrylic acid esters include glycerol di(meth)acrylate, trimethylolpropane di(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol di(meth)acrylate, and dipentaerythritol monohydroxypenta(meth)acrylate.

[0110] Among these, from the viewpoint of more effectively achieving the effects of the present invention, polyhydric (meth)acrylic acid esters are preferred as (B-3), and 1,6-hexamethylene di(meth)acrylate, 1,9-nonanediol di(meth)acrylate, pentaerythritol tri(meth)acrylate, and dipentaerythritol hexa(meth)acrylate are more preferred.

[0111] The content of (B-3) in the composition of the present invention is not particularly limited, but from the viewpoint of more effectively achieving the effects of the present invention, it is preferably 10% by mass or more, more preferably 20% by mass or more, and even more preferably 30% by mass or more, relative to 100% by mass of the total of the components (B-2), (B-3), and (B-4). The upper limit of the content can be set appropriately depending on the use of the composition, and is, for example, preferably 90% by mass or less, more preferably 80% by mass or less, and even more preferably 70% by mass or less, relative to 100% by mass of the total of the components (B-2), (B-3), and (B-4).

[0112] [(B-4) Compound Having One Polymerizable Functional Group in the Molecule] When the above (B-1), (B-2), and (B-3) are blended as the (B) binder, a compound having one polymerizable functional group in the molecule (also referred to in the present application as "(B-4) Compound Having One Polymerizable Functional Group in the Molecule") may be optionally blended.

[0113] The polymerizable functional group in the compound (B-4) having one polymerizable functional group in the molecule is preferably a radically polymerizable functional group. The radically polymerizable functional group is particularly preferably a radically polymerizable functional group that undergoes a polymerization reaction due to radicals from a photopolymerization initiator. Specific examples include radically polymerizable functional groups such as a (meth)acryloyl group and a vinyl group. Of these, a (meth)acryloyl group is preferred. Examples of (B-4) include (meth)acrylic acid esters having a (meth)acryloyloxy group in the molecule. The composition of the present invention may contain only one type of (B-4), or two or more types of (B-4).

[0114] Specific examples of compounds having one polymerizable functional group in the molecule include methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, butyl (meth)acrylate, amyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, octyl (meth)acrylate, nonyl (meth)acrylate, dodecyl (meth)acrylate, hexadecyl (meth)acrylate, octadecyl (meth)acrylate, cyclohexyl (meth)acrylate, methoxyethyl (meth)acrylate, butoxyethyl (meth)acrylate, phenoxyethyl (meth)acrylate, nonylphenoxyethyl (meth)acrylate, glycidyl (meth)acrylate, dimethylaminoethyl (meth)acrylate, acrylate, diethylaminoethyl (meth)acrylate, ethoxyethoxyethyl (meth)acrylate, isobornyl (meth)acrylate, dicyclopentanyl (meth)acrylate, dicyclopentenyl (meth)acrylate, dicyclopentenyloxyethyl (meth)acrylate, 2-hydroxy-3-phenoxypropyl (meth)acrylate, tetrahydrofurfuryl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, benzyl (meth)acrylate, phenylbenzyl (meth)acrylate, mono(2-acryloyloxyethyl) succinate, N-[2-(acryloyloxy)ethyl]phthalimide, N-[2-(acryloyloxy)ethyl]tetrahydrophthalimide, and the like.

[0115] Among these, ethoxyethoxyethyl (meth)acrylate is more preferred as (B-4) above, from the viewpoint of more effectively achieving the effects of the present invention.

[0116] When the composition contains component (B-4), there are no particular restrictions on the amount of (B-4), but from the viewpoint of more effectively achieving the effects of the present invention, the amount of (B-4) in the composition of the present invention is preferably 10% by mass or more, more preferably 20% by mass or more, and even more preferably 30% by mass or more, relative to 100% by mass of the total of components (B-2), (B-3), and (B-4). The upper limit of the amount can be set appropriately depending on the use of the composition, and is, for example, preferably 90% by mass or less, more preferably 80% by mass or less, and even more preferably 70% by mass or less, relative to 100% by mass of the total of components (B-2), (B-3), and (B-4).

[0117] The total content of the above components (B-2), (B-3), and (B-4) in the composition of the present invention is not particularly limited, but from the viewpoint of more effectively achieving the effects of the present invention, it is preferably 10% by mass or more, more preferably 20% by mass or more, and even more preferably 30% by mass or more of the solid content. The upper limit of this content can be appropriately set depending on the use of the composition, and is, for example, preferably 99% by mass or less, more preferably 95% by mass or less, and even more preferably 90% by mass or less of the solid content.

[0118] [(B-1) Photopolymerization Initiator] The photopolymerization initiator (B-1) is not particularly limited as long as the object of the present invention can be achieved. In the present invention, it is preferable to use a photoradical polymerization initiator as the (B-1). This is also suitable as a general method for producing wavelength conversion members. Furthermore, according to the present invention, even when a photoradical polymerization initiator is used as the (B-1), a cured film with excellent insolubility in a developer can be formed as a wavelength conversion film without being subject to oxygen inhibition in the curing process.

[0119] As the photoradical polymerization initiator, a molecular cleavage type or hydrogen abstraction type photoradical polymerization initiator is preferably used.

[0120] Examples of molecular cleavage type photoradical polymerization initiators include benzoin isobutyl ether, 2,4-diethylthioxanthone, 2-isopropylthioxanthone, 2,4,6-trimethylbenzoyldiphenylphosphine oxide, ethyl phenyl(2,4,6-trimethylbenzoyl)phosphinate, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butan-1-one, bis(2,6-dimethoxybenzoyl)-2,4,4-trimethylpentylphosphine oxide, bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide, and (2,4,6-trimethylbenzoyl)ethoxyphenylphosphine oxide. Other molecular cleavage type photoradical polymerization initiators that may be used in combination include, for example, 1-hydroxycyclohexyl phenyl ketone, benzoin ethyl ether, benzyl dimethyl ketal, 2-hydroxy-2-methyl-1-phenylpropan-1-one, 2,2-dimethoxy-1,2-diphenylethan-1-one, 2,2-dimethoxy-2-phenylacetophenone, 1-(4-isopropylphenyl)-2-hydroxy-2-methylpropan-1-one, and 2-methyl-1-(4-methylthiophenyl)-2-morpholinopropan-1-one.

[0121] Examples of the hydrogen abstraction type photoradical polymerization initiator include benzophenone, 4-phenylbenzophenone, isophthalphenone, and 4-benzoyl-4'-methyl-diphenyl sulfide. A molecular cleavage type photoradical polymerization initiator and a hydrogen abstraction type photoradical polymerization initiator may be used in combination.

[0122] The photoradical polymerization initiator can also be obtained as a commercially available product. Examples of such commercially available products include acylphosphine oxide compounds such as Omnirad (registered trademark; the same applies hereinafter) TPO-H, Omnirad TPO-L, and Omnirad 819 manufactured by IGM Resin; alkylphenone compounds such as Omnirad 651, Omnirad 184, Omnirad 1173, Omnirad 2959, Omnirad 127, Omnirad 907, Omnirad 369, Omnirad 369E, and Omnirad 379EG; intramolecular hydrogen abstraction compounds such as Omnirad MBF and Omnirad 754; and Irgacure (registered trademark; the same applies hereinafter) manufactured by BASF Japan Ltd. OXE01, Irgacure OXE02, Irgacure OXE03, Irgacure OXE04, TR-PBG-304 and TR-PBG-305 manufactured by Changzhou Strong Electronic New Materials Co., Ltd., and NCI-730, NCI-831, and NCI-930 manufactured by ADEKA Corporation.

[0123] In addition to these, the oxime ester compounds include oxime ester compounds such as those described in JP-T-2004-534797, JP-A-2000-80068, WO 2012 / 45736, WO 2015 / 36910, JP-A-2006-36750, JP-A-2008-179611, WO 2009 / 131189, WO 2012-526185, WO 2012-519191, WO 2006 / 18973, WO 2008 / 78678, and WO 2011-132215.

[0124] When a photoradical polymerization initiator is used as (B-1), a chain transfer agent may be used in combination. The use of a chain transfer agent can increase the reaction rate of the photoradical reaction.

[0125] Chain transfer agents are defined on pages 683-684 of the Third Edition of the Polymer Dictionary (edited by the Society of Polymer Science, 2005). Examples of chain transfer agents include compounds having SH, PH, SiH, and GeH groups in the molecule. These donate hydrogen to low-activity radical species to generate radicals, or can generate radicals by being oxidized and then deprotonated. Thiol compounds (e.g., 2-mercaptobenzimidazoles, 2-mercaptobenzothiazoles, 2-mercaptobenzoxazoles, 3-mercaptotriazoles, 5-mercaptotetrazoles, etc.) are particularly preferred, with polyfunctional thiol compounds being particularly preferred. Polyfunctional thiols may be compounds having two or more thiol (SH) groups. Examples of polyfunctional thiol compounds include ethylene glycol bisthiopropionate (EGTP), butanediol bisthiopropionate (BDTP), trimethylolpropane tristhiopropionate (TMTP), pentaerythritol tetrakisthiopropionate (PETP), tetraethylene glycol bis(3-mercaptopropionate), dipentaerythritol hexakis(3-mercaptopropionate), pentaerythritol tetrakis(thioglycolate), Karenz (registered trademark, the same applies hereinafter) MT BD1, Karenz MT PE1, Karenz MT NR1 (all manufactured by Resonac Corporation), and the like.

[0126] The content of (B-1) is not particularly limited, but from the viewpoint of more effectively achieving the effects of the present invention, it is preferably 0.1% by mass or more, more preferably 0.5% by mass or more, and even more preferably 1% by mass or more, of the solid content. Furthermore, from the viewpoint of more effectively achieving the effects of the present invention, the upper limit of the content is preferably 40% by mass or less, more preferably 30% by mass or less, and even more preferably 20% by mass or less, of the solid content.

[0127] [(B-5) Resin (Base Polymer)] When the (B) binder is made up of the above (B-1), (B-2), and (B-3), a base polymer (also referred to as "(B-5) resin" in the present application) may be further blended. In the composition for forming a wavelength conversion film of the present invention, it is preferable to blend an alkali-soluble resin as the (B-5) resin. By further blending an alkali-soluble resin, the composition can also be used as a composition for forming a resist film.

[0128] The alkali-soluble resin is a resin having an alkali-soluble group, such as a phenolic hydroxy group, a carboxy group, an acid anhydride group, an imide group, a sulfonyl group, a phosphoric acid group, a boronic acid group, or an active methylene group.

[0129] The active methylene group is a methylene group (-CH ２ -) that has a carbonyl group at the adjacent position and is reactive with nucleophiles.

[0130] The active methylene group is more preferably a group represented by the following formula (b1).

[0131] (In the formula, R ｂ represents an alkyl group, an alkoxy group, or a phenyl group, and the dashed line represents a bond.

[0132] In the above formula (b1), R ｂ Examples of the alkyl group represented by include alkyl groups having 1 to 20 carbon atoms, and alkyl groups having 1 to 5 carbon atoms are preferred. Specific examples of such alkyl groups include methyl, ethyl, n-propyl, and i-propyl groups. Of these, methyl, ethyl, and n-propyl groups are preferred.

[0133] In the above formula (b1), R ｂExamples of the alkoxy group represented by include alkoxy groups having 1 to 20 carbon atoms, and preferably alkoxy groups having 1 to 5 carbon atoms. Specific examples of such alkoxy groups include methoxy, ethoxy, n-propoxy, i-propoxy, n-butoxy, i-butoxy, s-butoxy, and t-butoxy groups. Of these, methoxy, ethoxy, and n-propoxy groups are preferred.

[0134] Specific examples of the group represented by formula (b1) above include, but are not limited to, groups represented by the following formulae (b1-1) to (b1-5): In the structural formula, dashed lines represent bonds.

[0135]

[0136] Among the above alkali-soluble groups, alkali-soluble resins having at least one organic group selected from the group consisting of a phenolic hydroxy group and a carboxy group and having a number average molecular weight of 2,000 to 50,000 are preferred.

[0137] As described above, the alkali-soluble resin preferably has a number-average molecular weight in the range of 2,000 to 50,000, but if the number-average molecular weight is 50,000 or less, development residues are less likely to be generated and the required sensitivity can be obtained, while if the number-average molecular weight is 2,000 or more, film loss in exposed areas is less likely to occur during development and sufficient curability can be obtained.

[0138] The alkali-soluble resin may have the above structure, and there are no particular limitations on the types of main chain skeleton and side chains of the polymer constituting the resin.

[0139] Examples of the alkali-soluble resin include acrylic resins, polyhydroxystyrene resins, polyimide precursors, polyimides, and polyesters.

[0140] In the present invention, an alkali-soluble resin made of a copolymer obtained by polymerizing a plurality of types of monomers can also be used. Furthermore, the alkali-soluble resin may be a blend of a plurality of types of alkali-soluble resins.

[0141] The alkali-soluble resin may be an acrylic polymer, which is an acrylic resin. In the present invention, the term "acrylic polymer" refers to a resin obtained by the polymerization reaction of a monomer having an unsaturated double bond group, resulting in the reaction of the unsaturated double bond group portion. Examples of alkali-soluble acrylic polymers include copolymers formed from monomers exhibiting alkali solubility, i.e., monomers having at least one alkali-soluble group selected from the above-mentioned group, and at least one monomer selected from the group of monomers copolymerizable with these monomers, as essential structural units. The number-average molecular weight of the alkali-soluble resin is preferably 2,000 to 50,000. A number-average molecular weight of 50,000 or less reduces the likelihood of residue formation.

[0142] The above-mentioned "monomer having at least one selected from alkali-soluble groups" includes a monomer having a carboxy group, a phenolic hydroxy group, and a monomer having an imide group. These monomers are not limited to those having one carboxy group or one phenolic hydroxy group, but may also have multiple carboxy groups or one phenolic hydroxy group.

[0143] Specific examples of the above-mentioned monomers are listed below, but are not limited to these. Examples of monomers having a carboxy group include acrylic acid, methacrylic acid, crotonic acid, mono-(2-(acryloyloxy)ethyl)phthalate, mono-(2-(methacryloyloxy)ethyl)phthalate, N-(carboxyphenyl)maleimide, N-(carboxyphenyl)methacrylamide, and N-(carboxyphenyl)acrylamide.

[0144] Examples of the monomer having a phenolic hydroxy group include hydroxystyrene, N-(hydroxyphenyl)acrylamide, N-(hydroxyphenyl)methacrylamide, N-(hydroxyphenyl)maleimide, and 4-hydroxyphenyl methacrylate.

[0145] Examples of the monomer having an imide group include maleimide.

[0146] In the production of the alkali-soluble acrylic polymer, the ratio of the monomer having an alkali-soluble group and an unsaturated double bond group to all the monomers used in the production of the alkali-soluble acrylic polymer is preferably 5 to 90 mol %, more preferably 10 to 60 mol %, and most preferably 10 to 40 mol %. When the ratio of the monomer having an alkali-soluble group and an unsaturated double bond group is 10 mol % or more, sufficient alkali solubility can be obtained.

[0147] The alkali-soluble acrylic polymer may be copolymerized with a monomer having a hydroxyalkyl group and an unsaturated double bond group in order to further stabilize the pattern shape after curing.

[0148] Specific examples of monomers having a hydroxyalkyl group and an unsaturated double bond group include 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, 4-hydroxybutyl acrylate, 2,3-dihydroxypropyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl methacrylate, 4-hydroxybutyl methacrylate, 2,3-dihydroxypropyl methacrylate, glycerin monomethacrylate, and 5-acryloyloxy-6-hydroxynorbornene-2-carboxylic-6-lactone.

[0149] In the production of the alkali-soluble acrylic polymer, the ratio of the monomer having a hydroxyalkyl group and an unsaturated double bond group is preferably 10 to 60% by mass, more preferably 15 to 50% by mass, and even more preferably 20 to 40% by mass. When the ratio of the monomer having a hydroxyalkyl group and an unsaturated double bond group is 10% by mass or more, the effect of stabilizing the pattern shape of the copolymer is obtained. When this ratio is 60% by mass or less, the content of the alkali-soluble group falls within an appropriate range, and sufficient properties such as developability are obtained.

[0150] The alkali-soluble acrylic polymer may be further copolymerized with an N-substituted maleimide compound in order to increase the Tg of the copolymer.

[0151] Specific examples of the N-substituted maleimide compound include N-methylmaleimide, N-ethylmaleimide, N-phenylmaleimide, N-cyclohexylmaleimide, etc. From the viewpoint of transparency, those not having an aromatic ring are preferred, and from the viewpoints of developability, transparency, and heat resistance, those having an alicyclic skeleton are more preferred, with cyclohexylmaleimide being even more preferred.

[0152] The ratio of N-substituted maleimide in the production of the alkali-soluble acrylic polymer is preferably 10 to 60% by mass, more preferably 15 to 50% by mass, and even more preferably 20 to 40% by mass. When the ratio of N-substituted maleimide is 10% by mass or more, the Tg of the copolymer becomes high, and therefore the Tg of the finally obtained wavelength conversion film also becomes high, and sufficient heat resistance and light resistance are obtained. When the ratio is 60% by mass or less, sufficient transparency is obtained.

[0153] In the present invention, the alkali-soluble acrylic polymer may also be a copolymer containing a monomer other than the above-mentioned monomers (hereinafter referred to as "other monomers") as a constituent unit. Specifically, the other monomer may be any monomer copolymerizable with at least one selected from the group consisting of the above-mentioned monomers having a carboxy group and the monomers having a phenolic hydroxy group, and is not particularly limited as long as it does not impair the properties of the alkali-soluble acrylic polymer. Specific examples of such monomers include acrylic acid ester compounds, methacrylic acid ester compounds, acrylamide compounds, acrylonitrile, styrene compounds, and vinyl compounds. Specific examples of the other monomers are listed below, but are not limited to these.

[0154] Specific examples of the acrylic acid ester compound include methyl acrylate, ethyl acrylate, isopropyl acrylate, benzyl acrylate, naphthyl acrylate, anthryl acrylate, anthrylmethyl acrylate, phenyl acrylate, glycidyl acrylate, phenoxyethyl acrylate, 2,2,2-trifluoroethyl acrylate, tert-butyl acrylate, cyclohexyl acrylate, isobornyl acrylate, 2-methoxyethyl acrylate, and methoxytriethylene glycol acrylate. acrylate, 2-ethoxyethyl acrylate, 2-aminoethyl acrylate, tetrahydrofurfuryl acrylate, 3-methoxybutyl acrylate, 2-methyl-2-adamantyl acrylate, 2-propyl-2-adamantyl acrylate, 8-methyl-8-tricyclodecyl acrylate, 8-ethyl-8-tricyclodecyl acrylate, diethylene glycol monoacrylate, caprolactone 2-(acryloyloxy)ethyl ester, poly(ethylene glycol) ethyl ether acrylate, and the like.

[0155] Specific examples of the methacrylic acid ester compound include methyl methacrylate, ethyl methacrylate, isopropyl methacrylate, benzyl methacrylate, naphthyl methacrylate, anthryl methacrylate, anthrylmethyl methacrylate, phenyl methacrylate, glycidyl methacrylate, phenoxyethyl methacrylate, 2,2,2-trifluoroethyl methacrylate, tert-butyl methacrylate, cyclohexyl methacrylate, isobornyl methacrylate, 2-methoxyethyl methacrylate, and methoxytriethylene glycol methacrylate. Examples of the methacrylate include 2-ethoxyethyl methacrylate, 2-aminomethyl methacrylate, tetrahydrofurfuryl methacrylate, 3-methoxybutyl methacrylate, 2-methyl-2-adamantyl methacrylate, γ-butyrolactone methacrylate, 2-propyl-2-adamantyl methacrylate, 8-methyl-8-tricyclodecyl methacrylate, 8-ethyl-8-tricyclodecyl methacrylate, diethylene glycol monomethacrylate, caprolactone 2-(methacryloyloxy)ethyl ester, and poly(ethylene glycol) ethyl ether methacrylate.

[0156] Specific examples of the acrylamide compound include N-methylacrylamide, N-methylmethacrylamide, N,N-dimethylacrylamide, N,N-dimethylmethacrylamide, N-methoxymethylacrylamide, N-methoxymethylmethacrylamide, N-butoxymethylacrylamide, and N-butoxymethylmethacrylamide.

[0157] Specific examples of the vinyl compound include methyl vinyl ether, benzyl vinyl ether, cyclohexyl vinyl ether, vinyl naphthalene, vinyl anthracene, vinyl carbazole, allyl glycidyl ether, 3-ethenyl-7-oxabicyclo[4.1.0]heptane, 1,2-epoxy-5-hexene, and 1,7-octadiene monoepoxide.

[0158] The styrene compound may be a styrene having no hydroxy group, specific examples of which include styrene, α-methylstyrene, chlorostyrene, and bromostyrene.

[0159] In the production of the alkali-soluble acrylic polymer, the ratio of the other monomers is preferably 80% by mass or less, more preferably 50% by mass or less, and even more preferably 20% by mass or less. When the ratio of the other monomers is 80% by mass or less, the effects of the present invention can be sufficiently obtained.

[0160] The method for obtaining the alkali-soluble acrylic polymer is not particularly limited, but can be, for example, by polymerizing a monomer having at least one selected from the group consisting of a carboxyl group, a phenolic hydroxyl group, a group that generates a carboxylic acid upon the action of heat or acid, and a phenolic hydroxyl group upon the action of heat or acid; a monomer having a hydroxyalkyl group; and, optionally, a monomer having at least one group selected from a crosslinkable group such as an N-alkoxymethyl group, an N-hydroxymethyl group, an alkoxysilyl group, an epoxy group, an oxetane group, a vinyl group, or a blocked isocyanate group, and a self-crosslinkable group such as an N-alkoxymethyl group, an N-hydroxymethyl group, an alkoxysilyl group, an epoxy group, a vinyl group, or a blocked isocyanate group, at a temperature of 50 to 110°C in a solvent containing, optionally, other copolymerizable monomers; and, optionally, a polymerization initiator. The solvent used in this process is not particularly limited, as long as it dissolves the monomers that constitute the alkali-soluble acrylic polymer and the alkali-soluble acrylic polymer. Specific examples include the following solvents.

[0161] Examples of the solvent used in the above reaction include ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, methyl cellosolve acetate, ethyl cellosolve acetate, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, propylene glycol, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, propylene glycol propyl ether acetate, toluene, xylene, methyl ethyl ketone, cyclopentanone, cyclohexanone, 2-butanone, and 3-methyl-2-pentanone. Examples of suitable solvents include ethanol, 2-pentanone, 2-heptanone, γ-butyrolactone, ethyl 2-hydroxypropionate, ethyl 2-hydroxy-2-methylpropionate, ethyl ethoxyacetate, ethyl hydroxyacetate, methyl 2-hydroxy-3-methylbutanoate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, ethyl 3-ethoxypropionate, methyl 3-ethoxypropionate, methyl pyruvate, ethyl pyruvate, ethyl acetate, butyl acetate, ethyl lactate, butyl lactate, N,N-dimethylformamide, N,N-dimethylacetamide, and N-methylpyrrolidone. Among these, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, 2-heptanone, propylene glycol propyl ether, propylene glycol propyl ether acetate, ethyl lactate, and butyl lactate are preferred from the viewpoints of good film-forming properties and high safety. These may be used alone or in combination of two or more.

[0162] The alkali-soluble acrylic polymer thus obtained is usually in the form of a solution dissolved in a solvent.

[0163] Furthermore, the solution of the specific copolymer obtained as described above can be reprecipitated by adding diethyl ether, water, or the like under stirring, and the resulting precipitate can be filtered and washed, and then dried at room temperature or by heating under normal or reduced pressure to obtain a powder of the specific copolymer. This procedure can remove polymerization initiators and unreacted monomers coexisting with the specific copolymer, resulting in a purified powder of the specific copolymer. If the specific copolymer cannot be sufficiently purified in a single procedure, the obtained powder can be redissolved in a solvent and the above procedure can be repeated. In the present invention, the powder of the specific copolymer may be used as is, or the powder may be redissolved in an appropriate solvent, such as the solvent used in the polymerization reaction, and used in the form of a solution.

[0164] In addition, as the alkali-soluble resin, polyimide precursors such as polyamic acid, polyamic acid ester, and partially imidized polyamic acid, and polyimides such as carboxylic acid group-containing polyimides can also be used, and the type of these resins is not particularly limited as long as they are alkali-soluble.

[0165] The polyamic acid, which is a polyimide precursor, can generally be obtained by polycondensation of (a) a tetracarboxylic dianhydride and (b) a diamine compound.

[0166] The (a) tetracarboxylic acid dianhydride is not particularly limited, and specific examples thereof include aromatic tetracarboxylic acids such as pyromellitic dianhydride, 3,3',4,4'-biphenyltetracarboxylic acid dianhydride, 3,3',4,4'-benzophenonetetracarboxylic acid dianhydride, 3,3',4,4'-diphenylethertetracarboxylic acid dianhydride, and 3,3',4,4'-diphenylsulfonetetracarboxylic acid dianhydride; 1,2,3,4-cyclobutanetetracarboxylic acid dianhydride; and 1,2-dimethyl-1,2,3,4-cyclopentanetetracarboxylic acid dianhydride. Examples of the dianhydride include alicyclic tetracarboxylic dianhydrides such as butane tetracarboxylic dianhydride, 1,2,3,4-tetramethyl-1,2,3,4-cyclobutane tetracarboxylic dianhydride, 1,2,3,4-cyclopentane tetracarboxylic dianhydride, 1,2,3,4-cyclohexane tetracarboxylic dianhydride, and 3,4-dicarboxy-1,2,3,4-tetrahydro-1-naphthalene succinic dianhydride, and aliphatic tetracarboxylic dianhydrides such as 1,2,3,4-butane tetracarboxylic dianhydride. These may be used alone or in combination of two or more.

[0167] The (b) diamine compound is not particularly limited, and specific examples thereof include 2,4-diaminobenzoic acid, 2,5-diaminobenzoic acid, 3,5-diaminobenzoic acid, 4,6-diamino-1,3-benzenedicarboxylic acid, 2,5-diamino-1,4-benzenedicarboxylic acid, bis(4-amino-3-carboxyphenyl)ether, bis(4-amino-3,5-dicarboxyphenyl)ether, bis(4-amino-3-carboxyphenyl)sulfone, bis(4-amino-3,5-dicarboxyphenyl)sulfone, 4,4'-diamino-3,3'-dicarboxybiphenyl, phenyl, 4,4'-diamino-3,3'-dicarboxy-5,5'-dimethylbiphenyl, 4,4'-diamino-3,3'-dicarboxy-5,5'-dimethoxybiphenyl, 1,4-bis(4-amino-3-carboxyphenoxy)benzene, 1,3-bis(4-amino-3-carboxyphenoxy)benzene, bis[4-(4-amino-3-carboxyphenoxy)phenyl]sulfone, bis[4-(4-amino-3-carboxyphenoxy)phenyl]propane, 2,2-bis[4-(4-amino-3-carboxyphenoxy)phenyl]hexafluoropropane; 2,4-diaminophenol, 3,5-diaminophenol, 2,5-diaminophenol, 4,6-diaminoresorcinol, 2,5-diaminohydroquinone, bis(3-amino-4-hydroxyphenyl)ether, bis(4-amino-3-hydroxyphenyl)ether, bis(4-amino-3,5-dihydroxyphenyl)ether, bis(3-amino-4-hydroxyphenyl)methane, bis(4-amino-3-hydroxyphenyl)methane, bis(4-amino-3,5-dihydroxyphenyl)methane, bis(3-amino bis(4-amino-3-hydroxyphenyl)sulfone, bis(4-amino-3,5-dihydroxyphenyl)sulfone, 2,2-bis(3-amino-4-hydroxyphenyl)hexafluoropropane, 2,2-bis(4-amino-3-hydroxyphenyl)hexafluoropropane, 2,2-bis(4-amino-3,5-dihydroxyphenyl)hexafluoropropane, 4,4'-diamino-3,3'-dihydroxybiphenyl, 4,4'-diamino-3,3'-dihydroxy-5,Diamine compounds having a phenolic hydroxy group, such as 5'-dimethylbiphenyl, 4,4'-diamino-3,3'-dihydroxy-5,5'-dimethoxybiphenyl, 1,4-bis(3-amino-4-hydroxyphenoxy)benzene, 1,3-bis(3-amino-4-hydroxyphenoxy)benzene, 1,4-bis(4-amino-3-hydroxyphenoxy)benzene, 1,3-bis(4-amino-3-hydroxyphenoxy)benzene, bis[4-(3-amino-4-hydroxyphenoxy)phenyl]sulfone, bis[4-(3-amino-4-hydroxyphenoxy)phenyl]propane, and 2,2-bis[4-(3-amino-4-hydroxyphenoxy)phenyl]hexafluoropropane; Examples of the diamine compound include diamine compounds having a thiophenol group such as 1,3-diamino-4-mercaptobenzene, 1,3-diamino-5-mercaptobenzene, 1,4-diamino-2-mercaptobenzene, bis(4-amino-3-mercaptophenyl)ether, and 2,2-bis(3-amino-4-mercaptophenyl)hexafluoropropane; and diamine compounds having a sulfonic acid group such as 1,3-diaminobenzene-4-sulfonic acid, 1,3-diaminobenzene-5-sulfonic acid, 1,4-diaminobenzene-2-sulfonic acid, bis(4-aminobenzene-3-sulfonic acid)ether, 4,4'-diaminobiphenyl-3,3'-disulfonic acid, and 4,4'-diamino-3,3'-dimethylbiphenyl-6,6'-disulfonic acid. Further, p-phenylenediamine, m-phenylenediamine, 4,4'-methylene-bis(2,6-ethylaniline), 4,4'-methylene-bis(2-isopropyl-6-methylaniline), 4,4'-methylene-bis(2,6-diisopropylaniline), 2,4,6-trimethyl-1,3-phenylenediamine, 2,3,5,6-tetramethyl-1,4-phenylenediamine, o-tolidine, m-tolidine, 3,3',5,5'-tetramethylbenzidine, bis[4-(3-aminophenoxy)phenyl]sulfone, 2,2-bis[4-(3-aminophenoxy)phenyl]propane, 2,2-bis[4-(3-aminophenoxy)phenyl]hexafluoropropane, 4,4'-diamino-3,3'-dimethyldicyclohexylmethane, 4,4'-diaminodiphenyl ether, 3,Examples of diamine compounds include 4-diaminodiphenyl ether, 4,4'-diaminodiphenylmethane, 2,2-bis(4-anilino)hexafluoropropane, 2,2-bis(3-anilino)hexafluoropropane, 2,2-bis(3-amino-4-toluyl)hexafluoropropane, 1,4-bis(4-aminophenoxy)benzene, 1,3-bis(4-aminophenoxy)benzene, bis[4-(4-aminophenoxy)phenyl]sulfone, 2,2-bis[4-(4-aminophenoxy)phenyl]propane, 2,2-bis[4-(4-aminophenoxy)phenyl]hexafluoropropane, and 2,2'-bis(trifluoromethyl)benzidine. These may be used alone or in combination of two or more.

[0168] When the polyamic acid is produced from (a) a tetracarboxylic dianhydride and (b) a diamine compound, the compounding ratio of the two compounds, i.e., the total number of moles of (b) a diamine compound / the total number of moles of (a) a tetracarboxylic dianhydride, is preferably 0.7 to 1.2. As in a normal polycondensation reaction, the closer this molar ratio is to 1, the greater the degree of polymerization of the polyamic acid produced and the greater the molecular weight.

[0169] Furthermore, when polymerization is carried out using an excess diamine compound, the terminal amino groups of the remaining polyamic acid can be protected by reacting them with a carboxylic acid anhydride. Examples of such carboxylic acid anhydrides include phthalic anhydride, trimellitic anhydride, maleic anhydride, naphthalic anhydride, hydrogenated phthalic anhydride, methyl-5-norbornene-2,3-dicarboxylic anhydride, itaconic anhydride, and tetrahydrophthalic anhydride.

[0170] In the production of polyamic acid, the reaction temperature for the reaction between a diamine compound and a tetracarboxylic dianhydride can be selected from the range of typically -20 to 150°C, preferably -5 to 100°C. To obtain a high-molecular-weight polyamic acid, the reaction temperature is appropriately selected from the range of 5 to 40°C and the reaction time from 1 to 48 hours. To obtain a low-molecular-weight, partially imidized polyamic acid with high storage stability, it is more preferable to select a reaction temperature from 40 to 90°C and a reaction time from 10 hours or more. Furthermore, when protecting the terminal amino groups with an acid anhydride, the reaction temperature can be selected from the range of -20 to 150°C, preferably -5 to 100°C.

[0171] The reaction of the diamine compound with the tetracarboxylic dianhydride can be carried out in a solvent, and examples of the solvent that can be used include N,N-dimethylformamide, N,N-dimethylacetamide, N-methylpyrrolidone, N-vinylpyrrolidone, N-methylcaprolactam, dimethyl sulfoxide, tetramethylurea, pyridine, dimethyl sulfone, hexamethyl sulfoxide, m-cresol, γ-butyrolactone, ethyl acetate, butyl acetate, ethyl lactate, methyl 3-methoxypropionate, methyl 2-methoxypropionate, ethyl 3-methoxypropionate, ethyl 2-methoxypropionate, ethyl 3-ethoxypropionate, ethyl 2-ethoxypropionate, ethylene glycol dimethyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, Examples of suitable solvents include diethylene glycol methyl ethyl ether, propylene glycol dimethyl ether, dipropylene glycol dimethyl ether, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, propylene glycol monomethyl ether acetate, carbitol acetate, ethyl cellosolve acetate, cyclohexanone, methyl ethyl ketone, methyl isobutyl ketone, and 2-heptanone. These may be used alone or in combination of two or more. Furthermore, even if a solvent does not dissolve polyamic acid, it may be mixed with the above solvent to the extent that the polyamic acid produced by the polymerization reaction does not precipitate.

[0172] The polyamic acid solution thus obtained can be used as it is for preparing a negative-type photosensitive resin composition. Alternatively, the polyamic acid can be recovered and used by precipitation and isolation in a poor solvent such as water, methanol, or ethanol.

[0173] The alkali-soluble resin may be any polyimide. The polyimide used in the present invention is a polyimide precursor such as the polyamic acid described above that has been chemically or thermally imidized to 50% or more.

[0174] The polyimide preferably has a group selected from a carboxy group and a phenolic hydroxy group to impart alkali solubility. Methods for introducing the carboxy group or the phenolic hydroxy group into the polyimide include a method using a monomer having a carboxy group or a phenolic hydroxy group, a method of capping the amine end with an acid anhydride having a carboxy group or a phenolic hydroxy group, and a method of imidizing a polyimide precursor such as a polyamic acid to an imidization rate of 99% or less.

[0175] Such polyimides can be obtained by synthesizing a polyimide precursor such as the polyamic acid described above, followed by chemical imidization or thermal imidization. Chemical imidization is typically carried out by adding excess acetic anhydride and pyridine to a polyimide precursor solution and reacting the solution at room temperature to 100°C. Thermal imidization is typically carried out by heating a polyimide precursor solution at a temperature of 180 to 250°C while dehydrating it.

[0176] Furthermore, as the alkali-soluble resin, a phenol novolac resin can also be used.

[0177] Furthermore, polyester polycarboxylic acids can also be used as the alkali-soluble resin. Polyester polycarboxylic acids can be obtained from acid dianhydrides and diols by the method described in International Publication No. 2009 / 051186. Examples of acid dianhydrides include the above-mentioned (a) tetracarboxylic dianhydrides. Examples of diols include aromatic diols such as bisphenol A, bisphenol F, 4,4'-dihydroxybiphenyl, benzene-1,3-dimethanol, and benzene-1,4-dimethanol; alicyclic diols such as hydrogenated bisphenol A, hydrogenated bisphenol F, 1,4-cyclohexanediol, 1,3-cyclohexanedimethanol, and 1,4-cyclohexanedimethanol; and aliphatic diols such as ethylene glycol, propylene glycol, 1,4-butanediol, and 1,6-hexanediol.

[0178] In the present invention, the alkali-soluble resin may be a copolymer further having a self-crosslinkable group, or further having a group (hereinafter also referred to as a crosslinkable group) that reacts with at least one group selected from the group consisting of a hydroxy group, a carboxy group, an amide group, and an amino group.

[0179] Specific examples of the self-crosslinking group include an N-alkoxymethyl group, an N-hydroxymethyl group, an alkoxysilyl group, an epoxy group, an oxetanyl group, a vinyl group, and a blocked isocyanate group.

[0180] Specific examples of the crosslinkable group include an N-alkoxymethyl group, an N-hydroxymethyl group, an alkoxysilyl group, an epoxy group, an oxetanyl group, a vinyl group, and a blocked isocyanate group.

[0181] When such a self-crosslinking group or crosslinkable group is contained in the alkali-soluble resin, the content thereof is preferably 0.1 to 0.9 per repeating unit in the alkali-soluble resin, and from the viewpoints of developability and solvent resistance, it is more preferably 0.1 to 0.8.

[0182] When the alkali-soluble resin further has a repeating unit having at least one selected from the crosslinkable group and the self-crosslinkable group, for example, in the case of an alkali-soluble acrylic polymer, it is sufficient to copolymerize an unsaturated compound that has radical polymerizability and further has at least one selected from the crosslinkable group and the self-crosslinkable group.

[0183] Specific examples of the radically polymerizable unsaturated compound having an N-alkoxymethyl group include N-butoxymethyl acrylamide, N-isobutoxymethyl acrylamide, N-methoxymethyl acrylamide, N-methoxymethyl methacrylamide, and N-methylolacrylamide.

[0184] Specific examples of the radically polymerizable monomer having a hydroxymethylamide group include N-hydroxymethylacrylamide and N-hydroxymethylmethacrylamide.

[0185] Specific examples of the radically polymerizable monomer further having an alkoxysilyl group include 3-acryloyloxytrimethoxysilane, 3-acryloyloxytriethoxysilane, 3-methacryloyloxytrimethoxysilane, and 3-methacryloyloxytriethoxysilane.

[0186] Specific examples of radically polymerizable unsaturated compounds further having an epoxy group include glycidyl acrylate, glycidyl methacrylate, α-ethyl glycidyl acrylate, α-n-propyl glycidyl acrylate, α-n-butyl glycidyl acrylate, 3,4-epoxybutyl acrylate, 3,4-epoxybutyl methacrylate, 6,7-epoxyheptyl acrylate, 6,7-epoxyheptyl methacrylate, α-ethyl 6,7-epoxyheptyl acrylate, o-vinylbenzyl glycidyl ether, m-vinylbenzyl glycidyl ether, p-vinylbenzyl glycidyl ether, etc. Among these, glycidyl methacrylate, 6,7-epoxyheptyl methacrylate, o-vinylbenzyl glycidyl ether, m-vinylbenzyl glycidyl ether, p-vinylbenzyl glycidyl ether, and 3,4-epoxycyclohexyl methacrylate are preferred. These may be used alone or in combination of two or more.

[0187] Examples of the radically polymerizable unsaturated compound having an oxetanyl group include (meth)acrylic acid esters having an oxetanyl group. Specific examples of such monomers include 3-(methacryloyloxymethyl)oxetane, 3-(acryloyloxymethyl)oxetane, 3-(methacryloyloxymethyl)-3-ethyl-oxetane, 3-(acryloyloxymethyl)-3-ethyl-oxetane, 3-(methacryloyloxymethyl)-2-trifluoromethyloxetane, 3-(acryloyloxymethyl)-2-trifluoromethyloxetane, 3-(methacryloyloxymethyl)-2-phenyl-oxetane, 3-(acryloyloxymethyl)-2-phenyl-oxetane, 2-(methacryloyloxymethyl)oxetane, 2-(acryloyloxymethyl)oxetane, 2-(methacryloyloxymethyl)-4-trifluoromethyloxetane, and 2-(acryloyloxymethyl)-4-trifluoromethyloxetane. Among these, 3-(methacryloyloxymethyl)-3-ethyl-oxetane and 3-(acryloyloxymethyl)-3-ethyl-oxetane are preferred.

[0188] Specific examples of the radically polymerizable monomer further having a vinyl group include 2-(2-vinyloxyethoxy)ethyl acrylate and 2-(2-vinyloxyethoxy)ethyl methacrylate.

[0189] Specific examples of the radically polymerizable monomer having a blocked isocyanate group include 2-(0-(1'-methylpropylideneamino)carboxyamino)ethyl methacrylate and 2-(3,5-dimethylpyrazolyl)carbonylamino)ethyl methacrylate.

[0190] In the alkali-soluble resin of the present invention, the content of the structural unit derived from an unsaturated compound having radical polymerizability and having at least one group selected from the above-mentioned crosslinkable group and the above-mentioned self-crosslinkable group is preferably 10 to 70 mass %, more preferably 20 to 60 mass %, of all repeating units contained in the alkali-soluble resin. When the content of this structural unit is 10 mass % or more, the heat resistance and surface hardness of the cured film are improved. On the other hand, when the content of this structural unit is 70 mass % or less, the storage stability of the radiation-sensitive resin composition is improved.

[0191] When the alkali-soluble resin of the present invention is used in combination with the binder (B) containing the above-mentioned (B-1), (B-2), and (B-3), the alkali-soluble resin preferably has a substituent reactive with the above (B-2) and (B-3). Examples of the substituent reactive with the above (B-2) and (B-3) include radically polymerizable groups such as ethylenically unsaturated groups. Here, the radically polymerizable group refers to a group that initiates a polymerization reaction in the presence of a radical, and the reaction proceeds in a chain reaction.

[0192] The method for obtaining an alkali-soluble resin having a substituent reactive with (B-2) and (B-3) is not particularly limited as long as it can yield a resin with stable properties, and examples thereof include a method of copolymerizing a monomer having a substituent reactive with (B-2) and (B-3), and a method of synthesizing an alkali-soluble resin that does not have a substituent reactive with (B-2) and (B-3), and then adding a compound having a substituent reactive with (B-2) and (B-3) by thermal reaction. When the alkali-soluble resin is an alkali-soluble acrylic polymer and an ethylenically unsaturated group is incorporated, the former method may result in a reaction of the substituent reactive with (B-2) and (B-3) during the polymerization process, which may lead to gelation, and therefore the latter synthesis method is preferred.

[0193] Specific examples of methods for incorporating ethylenically unsaturated groups into alkali-soluble resins include adding glycidyl methacrylate, 3,4-epoxycyclohexylmethyl methacrylate, or the like to an alkali-soluble acrylic polymer synthesized using a radically polymerizable monomer having a carboxy group or a phenolic hydroxyl group. In this case, by reducing the molar ratio of the monomer to be added relative to the carboxy group or phenolic hydroxyl group in the resin, it is possible to introduce a substituent reactive with (B-2) and (B-3) above while maintaining the alkali-solubility of the resin derived from the carboxy group or phenolic hydroxyl group. Another example includes adding a monomer having a substituent reactive with (B-2) and (B-3) above, which can thermally react with the heat-reactive group in the resin, to an alkali-soluble acrylic polymer obtained by copolymerizing a radically polymerizable monomer having a heat-reactive group. Specifically, there is mentioned a method in which (meth)acrylic acid, 2-carboxyethyl (meth)acrylate, etc. are added to an alkali-soluble acrylic polymer in which glycidyl methacrylate, 3,4-epoxycyclohexylmethyl methacrylate, etc. are copolymerized.

[0194] In the alkali-soluble resin of the present invention, the proportion of repeating units having substituents reactive with (B-2) and (B-3) is preferably 5 to 60 mass%, more preferably 10 to 50 mass%, and even more preferably 10 to 40 mass%, of all repeating units contained in the alkali-soluble resin. When the content of this structural unit is 5 mass% or more, the heat resistance and chemical resistance of the cured film are improved. On the other hand, when the content of this structural unit is 60 mass% or less, the pattern formability of the radiation-sensitive resin composition is improved.

[0195] In the present invention, the alkali-soluble resin may be a mixture of a plurality of types of alkali-soluble resins.

[0196] When the alkali-soluble resin is used, its content is not particularly limited, but from the viewpoint of film-forming properties, it is preferably 10% by mass or more, more preferably 20% by mass or more, and even more preferably 30% by mass or more, relative to 100% by mass of the total of (B-2) and (B-3) and the alkali-soluble resin. Also, from the viewpoint of pattern formability, the upper limit of the content is preferably 90% by mass or less, more preferably 80% by mass or less, and even more preferably 70% by mass or less.

[0197] The content of the binder (B) is not particularly limited, but is preferably 70 to 99.9 mass % of the solid content, more preferably 85 to 99.7 mass %, and even more preferably 90 to 99 mass %.

[0198] [(C) Light-scattering particles] The composition for forming a wavelength-conversion film of the present invention may further contain (C) light-scattering particles. The light-scattering particles have the function of scattering light that has entered the wavelength-conversion film within the film, thereby essentially extending the optical path length within the wavelength-conversion film and improving the light absorptance, and of scattering again light that has been reflected at the interface of the wavelength-conversion film and returned to the wavelength-conversion film, thereby improving the luminous efficiency.

[0199] The light-scattering particles can be appropriately selected depending on the purpose, and may be organic or inorganic fine particles. Among these, inorganic fine particles with a high refractive index are preferred in terms of enhancing the scattering performance of the particles.

[0200] The light-scattering particles can be appropriately selected depending on the purpose, and may be organic or inorganic fine particles. Among these, inorganic fine particles with a high refractive index are preferred in terms of enhancing the scattering performance of the particles.

[0201] Examples of the organic fine particles include polymethyl methacrylate beads, acrylic-styrene copolymer beads, melamine beads, polycarbonate beads, styrene beads, cross-linked polystyrene beads, polyvinyl chloride beads, and benzoguanamine-melamine formaldehyde beads.

[0202] The inorganic fine particles include inorganic oxide particles made of at least one oxide selected from silicon, zirconium, titanium, indium, zinc, antimony, cerium, niobium, tungsten, etc. Specific examples of the inorganic oxide particles include SiO ２ , ZrO ２ , TiO ２ (In the present application, these may also be referred to as titanium oxide particles), BaTiO ３ , In ２ O ３ , ZnO, Sb ２ O ３ , ITO, CeO ２ , Nb ２ O ５ and W.O. ３ Among these, TiO ２ , BaTiO ３ , ZrO ２ , CeO ２ and Nb ２ O ５ is preferred, and TiO ２ More preferably, TiO ２ Among these, the rutile type is more preferable than the anatase type because it has a lower catalytic activity, which results in a higher durability of the film, and furthermore, it has a higher refractive index.

[0203] These particles may be surface-treated. When surface treatment is performed, specific examples of the surface treatment material include different inorganic oxides such as silicon oxide and zirconium oxide, metal hydroxides such as aluminum hydroxide, organosiloxanes, and organic acids such as stearic acid. These surface treatment materials may be used alone or in combination.

[0204] The average particle diameter of the light-scattering particles is more than 50 nm and less than 300 nm. From the viewpoint of wavelength conversion efficiency, the lower limit of the average particle diameter is preferably 60 nm or more, more preferably 70 nm or more. In addition to the viewpoint of wavelength conversion efficiency, when considering patterning characteristics, an average particle diameter of more than 100 nm is more preferable from the viewpoint of low total light reflectance at i-line (365 nm). If the average particle diameter is too large, sedimentation tends to occur, so from the viewpoint of storage stability of the composition, the upper limit of the average particle diameter is preferably 290 nm or less, more preferably 200 nm or less. The average particle diameter of the light-scattering particles is the average particle diameter determined by observation with a transmission electron microscope.

[0205] Commercially available light-scattering particles may be used, and specific examples of titanium oxide particles include, but are not limited to, PT-401M (rutile type, average particle diameter 70 nm), PT-401L (rutile type, average particle diameter 130 nm), and PT-501R (rutile type, average particle diameter 180 nm), all manufactured by Ishihara Sangyo Kaisha, Ltd. The average particle diameter of the light-scattering particles exemplified above may vary by ±10 nm.

[0206] In consideration of wavelength conversion efficiency, the content of the (C) light scattering particles is preferably 0.1 to 20 mass % of the solid content, more preferably 0.2 to 15 mass %, and even more preferably 0.3 to 10 mass %.

[0207] [(D) Thermal Crosslinking Agent] The wavelength conversion film-forming composition of the present invention may further contain a (D) thermal crosslinking agent. The (D) thermal crosslinking agent is a material that undergoes a curing reaction by heat. For example, it may be a compound having a structure that can form a crosslinked structure by thermal reaction with a thermally reactive site (e.g., a carboxyl group and / or a phenolic hydroxy group) that may be present in the alkali-soluble resin. The thermal crosslinking agent is not particularly limited as long as it can achieve the object of the present invention. Examples of the (D) thermal crosslinking agent include (D1) a crosslinkable compound having two or more substituents selected from alkoxymethyl groups and hydroxymethyl groups, and (D2) a compound selected from the crosslinkable compounds represented by formula (4) described below. These crosslinking agents may be used alone or in combination of two or more.

[0208] (D1) Crosslinkable Compound Having Two or More Substituents Selected from Alkoxymethyl Groups and Hydroxymethyl Groups The crosslinkable compound of component (D1) having two or more substituents selected from alkoxymethyl groups and hydroxymethyl groups is a compound that undergoes a crosslinking reaction via a dehydration condensation reaction when exposed to high temperatures during thermal curing. Examples of such compounds include compounds such as alkoxymethylated glycoluril, alkoxymethylated benzoguanamine, and alkoxymethylated melamine, as well as phenoplast-based compounds.

[0209] Specific examples of alkoxymethylated glycolurils include 1,3,4,6-tetrakis(methoxymethyl)glycoluril, 1,3,4,6-tetrakis(butoxymethyl)glycoluril, 1,3,4,6-tetrakis(hydroxymethyl)glycoluril, 1,3-bis(hydroxymethyl)urea, 1,1,3,3-tetrakis(butoxymethyl)urea, 1,1,3,3-tetrakis(methoxymethyl)urea, 1,3-bis(hydroxymethyl)-4,5-dihydroxy-2-imidazolinone, and 1,3-bis(methoxymethyl)-4,5-dimethoxy-2-imidazolinone. Commercially available products include glycoluril compounds (trade names: Cymel (registered trademark) 1170, Powderlink (registered trademark) 1174) manufactured by Mitsui Cytec Co., Ltd. (now Allnex Co., Ltd.), methylated urea resin (trade name: UFR (registered trademark) 65), butylated urea resin (trade name: UFR (registered trademark) 300, U-VAN10S60, U-VAN10R, U-VAN11HV); and urea / formaldehyde resins (high condensation type, trade names: Beckamin (registered trademark) J-300S, P-955, N) manufactured by DIC Corporation.

[0210] Specific examples of alkoxymethylated benzoguanamine include tetramethoxymethylbenzoguanamine, etc. Commercially available products include those manufactured by Mitsui Cytec Co., Ltd. (now Allnex Co., Ltd.) (trade name: Cymel (registered trademark) 1123) and those manufactured by Sanwa Chemical Co., Ltd. (trade names: Nikalac (registered trademark) BX-4000, BX-37, BL-60, BX-55H).

[0211] Specific examples of alkoxymethylated melamine include hexamethoxymethyl melamine, etc. Commercially available products include methoxymethyl type melamine compounds (trade names: Cymel (registered trademark) 300, 301, 303, 350) and butoxymethyl type melamine compounds (trade names: Mycoat (registered trademark) 506, 508) manufactured by Mitsui Cytec Co., Ltd. (now Allnex Co., Ltd.), and methoxymethyl type melamine compounds (trade names: Nikalac (registered trademark) MW-30, MW-22, MW-11, MW-100LM, MS-001, MX-002, MX-730, MX-750, MX-035) and butoxymethyl type melamine compounds (trade names: Nikalac (registered trademark) MX-45, MX-410, MX-302) manufactured by Sanwa Chemical Co., Ltd.

[0212] The compound may also be a compound obtained by condensing a melamine compound, a urea compound, a glycoluril compound, or a benzoguanamine compound in which the hydrogen atom of the amino group has been substituted with a methylol group or an alkoxymethyl group. For example, the compound may be a high molecular weight compound produced from a melamine compound or a benzoguanamine compound, as described in U.S. Patent No. 6,323,310. Commercially available melamine compounds include Cymel (registered trademark) 303 (manufactured by Mitsui Cytec Co., Ltd. (now Allnex Co., Ltd.)), and commercially available benzoguanamine compounds include Cymel (registered trademark) 1123 (manufactured by Mitsui Cytec Co., Ltd. (now Allnex Co., Ltd.)).

[0213] Specific examples of the phenoplast-based compounds include 2,6-bis(hydroxymethyl)phenol, 2,6-bis(hydroxymethyl)cresol, 2,6-bis(hydroxymethyl)-4-methoxyphenol, 3,3',5,5'-tetrakis(hydroxymethyl)biphenyl-4,4'-diol, 3,3'-methylenebis(2-hydroxy-5-methylbenzenemethanol), 4,4'-(1-methylethylidene)bis[2-methyl-6-hydroxymethylphenol], 4,4'-methylenebis[2-methyl-6-hydroxymethylphenol], 4,4'-(1-methylethylidene)bis[2,6-bis(hydroxymethyl)phenol], 4,4'-methylenebis[2,6-bis(hydroxmethyl)phenol], 2,6-bis(methoxymethyl)phenol], 2,6-bis(methoxymethyl)cresol, 2,6-bis(methoxymethyl)-4-methoxyphenol, 3,3',5,5'-tetrakis(methoxymethyl)biphenyl-4,4'-diol, 3,3'-methylenebis(2-methoxy-5-methylbenzenemethanol), 4,4'-(1-methylethylidene)bis[2-methyl-6-methoxymethylphenol], 4,4'-methylenebis[2-methyl-6-methoxymethylphenol], 4,4'-(1-methylethylidene)bis[2,6-bis(methoxymethyl)phenol], 4,4'-methylenebis[2,6-bis(methoxymethyl)phenol], and the like. These are also commercially available, and specific examples thereof include 26DMPC, 46DMOC, DM-BIPC-F, DM-BIOC-F, TM-BIP-A, BISA-F, BI25X-DF, and BI25X-TPA (all manufactured by Asahi Organic Chemicals Co., Ltd.).

[0214] Furthermore, as the component (D1), polymers produced using an acrylamide compound or methacrylamide compound substituted with a hydroxymethyl group or an alkoxymethyl group, such as N-hydroxymethylacrylamide, N-methoxymethylmethacrylamide, N-ethoxymethylacrylamide, or N-butoxymethylmethacrylamide, can also be used.

[0215] Examples of such polymers include poly(N-butoxymethylacrylamide), a copolymer of N-butoxymethylacrylamide and styrene, a copolymer of N-hydroxymethylmethacrylamide and methyl methacrylate, a copolymer of N-ethoxymethylmethacrylamide and benzyl methacrylate, and a copolymer of N-butoxymethylacrylamide, benzyl methacrylate, and 2-hydroxypropyl methacrylate. The weight-average molecular weight of such polymers is 1,000 to 50,000, preferably 1,500 to 20,000, and more preferably 2,000 to 10,000.

[0216] <<(D2) Crosslinkable Compound Represented by Formula (4)>> The photosensitive resin composition of the present invention may contain a crosslinkable compound represented by formula (4) as the component (D2). (wherein k is an integer of 2 to 10, m is an integer of 0 to 4, R １１ represents a k-valent organic group)

[0217] The component (D2) is not particularly limited as long as it is a compound having a cycloalkene oxide structure represented by formula (4). Specific examples include compounds represented by the following formulas D2-1 and D2-2, as well as the commercially available products shown below.

[0218] Commercially available products include Epolead (registered trademark) GT-401, GT-403, GT-301, GT-302, Celloxide (registered trademark) 2021, Celloxide 2021P, and Celloxide 3000 (trade names manufactured by Daicel Corporation), alicyclic epoxy resins such as Denacol (registered trademark) EX-252 (trade name manufactured by Nagase ChemteX Corporation), CY175, CY177, and CY179 (trade names manufactured by Huntsman Corporation), Araldite (registered trademark) CY-182, CY-192, and CY-184 (trade names manufactured by Huntsman Corporation), and Epiclon (registered trademark) 200 and 400 (trade names manufactured by DIC Corporation). Examples of suitable crosslinkable compounds include Epicoat (registered trademark), Epicoat 871 and Epicoat 872 (all of which are trade names manufactured by Mitsubishi Chemical Corporation, and "Epicoat" is a registered trademark of Solution Research Netherlands Besroten Vennoodschap), and ED-5661 and ED-5662 (all of which are trade names manufactured by Celanese Coatings Co., Ltd.). These crosslinkable compounds may be used alone or in combination of two or more.

[0219] Among these, from the viewpoints of process resistance such as heat resistance, solvent resistance, and long-term baking resistance, as well as transparency, compounds having a cyclohexene oxide structure and represented by formula D2-1 and formula D2-2, Epolead (registered trademark) GT-401, GT-403, GT-301, GT-302, Celloxide (registered trademark) 2021, Celloxide 2021P, and Celloxide 3000 are preferred.

[0220] In addition, as component D, compounds other than those shown as components (D1) and (D2) that can form a crosslinked structure by thermal reaction with the thermally reactive sites (e.g., carboxyl groups and / or phenolic hydroxy groups and amide groups) of the alkali-soluble resin can also be used. Specific examples of the epoxy compounds include ethylene glycol diglycidyl ether, polyethylene glycol diglycidyl ether, propylene glycol diglycidyl ether, tripropylene glycol diglycidyl ether, polypropylene glycol diglycidyl ether, neopentyl glycol diglycidyl ether, 1,6-hexanediol diglycidyl ether, glycerin diglycidyl ether, 2,2-dibromoneopentyl glycol diglycidyl ether, 1,3,5,6-tetraglycidyl-2,4-hexanediol, N,N,N',N'-tetraglycidyl-m-xylylenediamine, 1,3-bis(N,N-diglycidylaminomethyl)cyclohexane, and N,N,N',N'-tetraglycidyl-4,4'-diaminodiphenylmethane; VESTANAT (registered trademark) B1358 / 100; VESTAGON (registered trademark) BF; Examples of the isocyanate compound include TAKENATE (registered trademark) B-882N and TAKENATE (registered trademark) B-7075 (all isocyanurate-modified polyisocyanates, manufactured by Mitsui Chemicals, Inc.).

[0221] Furthermore, as the (D) thermal crosslinking agent, for example, a polymer having two or more structures capable of forming a crosslinked structure by a thermal reaction with a thermally reactive site (for example, a carboxyl group and / or a phenolic hydroxy group and an amide group) of the alkali-soluble resin can be used. Specific examples include polymers produced using compounds having an epoxy group such as glycidyl methacrylate and 3,4-epoxycyclohexylmethyl methacrylate; polymers produced using compounds having an alkoxysilyl group such as 3-methacryloxypropyltrimethoxysilane; compounds having an isocyanate group such as 2-isocyanatoethyl methacrylate (Karenz MOI [registered trademark], manufactured by Resonac Corporation) and 2-isocyanatoethyl acrylate (Karenz AOI [registered trademark], manufactured by Resonac Corporation); and polymers produced using compounds having a blocked isocyanate group such as 2-(0-[1'-methylpropylideneamino]carboxyamino)ethyl methacrylate (Karenz MOI-BM [registered trademark], manufactured by Resonac Corporation) and 2-[(3,5-dimethylpyrazolyl)carbonylamino]ethyl methacrylate (Karenz MOI-BP [registered trademark], manufactured by Resonac Corporation). These compounds may be used alone or in combination to produce a polymer, or may be combined with other compounds to produce a polymer.

[0222] When the alkali-soluble resin has a group that reacts with at least one group selected from the group consisting of groups represented by a hydroxy group, a carboxyl group, an amide group, and an amino group, a compound having two or more groups selected from the group consisting of groups represented by a hydroxy group, a carboxyl group, an amide group, and an amino group, i.e., groups that can thermally react with the alkali-soluble resin, can be used as component D.

[0223] These crosslinkable compounds may be used alone or in combination of two or more.

[0224] When the photosensitive resin composition of the present invention is selected to incorporate a crosslinking agent (component (D)), its content is 1 to 30 parts by mass, preferably 2 to 20 parts by mass, and more preferably 3 to 15 parts by mass, based on the solid content. If the content of the crosslinking agent (crosslinkable compound) is low, the density of the crosslinks formed by the crosslinkable compound may be insufficient, and the effect of improving heat resistance, solvent resistance, resistance to long-term baking, etc. after pattern formation may not be obtained. On the other hand, if the content exceeds 50 parts by mass, uncrosslinked crosslinkable compound may be present, reducing heat resistance, solvent resistance, resistance to long-term baking, etc. after pattern formation, and the storage stability of the photosensitive resin composition may also be impaired.

[0225] Furthermore, the composition for forming a wavelength conversion film of the present invention may contain, in addition to the (A) phosphor and the (B) binder, various known additives, such as the (C) light-scattering particles, the (D) thermal crosslinking agent, a light stabilizer, an antioxidant, a surfactant, a polymer dispersant, a flame retardant, a clarifying agent, an ultraviolet absorber, and a filler, as necessary.

[0226] Examples of antioxidants include hindered phenol-based antioxidants, phenol-based antioxidants, phosphorus-based antioxidants, and sulfur-based antioxidants. These may be used alone or in combination of two or more. Commercially available antioxidants may also be used, including Irganox 245 and Irganox 1010 manufactured by BASF Japan Ltd., and Adeka STAB AO-20, Adeka STAB AO-30, Adeka STAB AO-40, Adeka STAB AO-50, Adeka STAB AO-60, Adeka STAB AO-80, and Adeka STAB AO330 manufactured by ADEKA Corporation, but are not limited thereto. When an antioxidant is used, its amount is not particularly limited, but is preferably 0.1 to 5.0 mass %, more preferably 0.3 to 1.5 mass %, of the solid content of the composition for forming a wavelength conversion film.

[0227] The surfactant is preferably a fluorine-based surfactant, more preferably a nonionic fluorine-based surfactant. Specific examples thereof include, but are not limited to, the Ftergent series manufactured by Neos Corporation, such as 212M, 215M, 250, 222F, FTX-218, and DFX-18. When a surfactant is used, the amount thereof is not particularly limited, but is preferably 0.01 to 1 mass %, more preferably 0.01 to 0.5 mass %, of the solid content of the composition for forming a wavelength conversion film.

[0228] The polymer dispersant is a polymer compound having a weight-average molecular weight of 750 or more and having functional groups that have affinity for light-scattering particles. The polymer dispersant has the function of dispersing the light-scattering particles. The polymer dispersant adsorbs to the light-scattering particles via the functional groups that have affinity for the light-scattering particles, and disperses the light-scattering particles in the composition due to electrostatic and / or steric repulsion between the polymer dispersants. The polymer dispersant is preferably bonded to the surface of the light-scattering particles and adsorbed to the light-scattering particles, but may be free in the composition for forming a wavelength conversion film.

[0229] The functional group having affinity for the (C) light-scattering particles includes an acidic functional group, a basic functional group, and a nonionic functional group. The acidic functional group has a dissociable proton and may be neutralized with a base such as an amine or hydroxide ion, while the basic functional group may be neutralized with an acid such as an organic acid or an inorganic acid.

[0230] The acidic functional group includes a carboxy group (-COOH), a sulfo group (-SO ３ H), sulfate group (-OSO ３ H), phosphonic acid group (-PO(OH) ２ ), phosphate group (-OPO(OH) ２ ), a phosphinic acid group (—PO(OH)—), a mercapto group (—SH), etc.

[0231] Examples of basic functional groups include primary amino groups, secondary amino groups, tertiary amino groups, ammonium groups, and imino groups, as well as nitrogen-containing heterocyclic groups such as pyridine, pyrimidine, pyrazine, imidazole, and triazole.

[0232] The nonionic functional group includes a hydroxy group, an ether group, a thioether group, a sulfinyl group (-SO-), a sulfonyl group (-SO ２ -), carbonyl group, formyl group, ester group, carbonate ester group, amide group, carbamoyl group, ureido group, thioamide group, thioureido group, sulfamoyl group, cyano group, alkenyl group, alkynyl group, phosphine oxide group, phosphine sulfide group, etc.

[0233] The polymeric dispersant may be a polymer (homopolymer) of a single monomer or a copolymer (copolymer) of multiple types of monomers. The polymeric dispersant may be a random copolymer, a block copolymer, or a graft copolymer. When the polymeric dispersant is a graft copolymer, it may be a comb-shaped graft copolymer or a star-shaped graft copolymer. Specific examples of polymeric dispersants include acrylic resins, polyester resins, polyurethane resins, polyamide resins, polyethers, phenolic resins, silicone resins, polyurea resins, amino resins, epoxy resins, polyethyleneimines, polyallylamine, polyimides, and the like.

[0234] As the polymer dispersant, commercially available products can be used, such as the DISPERBYK series and BYK series manufactured by BYK, the Efka series manufactured by BASF, the Solsperse series manufactured by Lubrizol Corporation, the AJISPER PB series manufactured by Ajinomoto Fine-Techno Co., Ltd., the TEGO series manufactured by Evonik Chemicals, and the DISPARLON series manufactured by Kusumoto Chemicals Co., Ltd.

[0235] Specific examples of the commercially available products include DISPERBYK-130, DISPERBYK-161, DISPERBYK-162, DISPERBYK-163, DISPERBYK-164, DISPERBYK-166, DISPERBYK-167, DISPERBYK-168, DISPERBYK-170, DISPERBYK-171, DISPERBYK-174, DISPERBYK-180, DISPERBYK-182, DISPERBYK-183, and DISPERBYK-1, all manufactured by BYK. 84, DISPERBYK-185, DISPERBYK-2000, DISPERBYK-2001, DISPERBYK-2008, DISPERBYK-2009, DISPERBYK-2020, DISPERBYK-2022, DISPER BYK-2025, DISPERBYK-2050, DISPERBYK-2070, DISPERBYK-2096, DISPERBYK-2150, DISPERBYK-2155, DISPERBYK-2163, DISPERBYK-2164; EFKA4010, EFKA4015, EFKA4046, EFKA4047, EFKA4061, EFKA4080, EFKA4300, EFKA4310, EFKA4320, EFKA4330, EFKA4340, EFKA4560, EFKA4585, EFKA5207, EFKA1501, EFKA1502, EFKA1503, and EFKA PX-4701 manufactured by BASF;Solsperse 3000, Solsperse 9000, Solsperse 13240, Solsperse 13650, Solsperse 13940, Solsperse 11200, Solsperse 13940, Solsperse 16000, Solsperse 17000, Solsperse 18000, Solsperse 20000, Solsperse 21000, Solsperse 24000, Solsperse 26000, Solsperse 27000, and Solsperse 280 manufactured by Lubrizol 00, Solsperse 32000, Solsperse 32500, Solsperse 32550, Solsperse 32600, Solsperse 33000, Solsperse 34750, Solsperse 35100, Solsperse 35200, Solsperse 36000, Solsperse 37500, Solsperse 38500, Solsperse 39000, Solsperse 41000, Solsperse 54000, Solsperse 71000 and Solsperse 76500; Examples of such dispersants include Ajisper PB821, Ajisper PB822, Ajisper PB881, PN411, and PA111 manufactured by Ajinomoto Fine-Techno Co., Ltd.; TEGO Dispers 650, TEGO Dispers 660C, TEGO Dispers 662C, TEGO Dispers 670, TEGO Dispers 685, TEGO Dispers 700, TEGO Dispers 710, and TEGO Dispers 760W manufactured by Evonik Chemicals; and Disparlon AQ-320, Disparlon AQ-330, Disparlon AQ-340, Disparlon AQ-360, and Disparlon AQ-380 manufactured by Kusumoto Chemicals Co., Ltd.;

[0236] When a polymer dispersant is used, the amount of the polymer dispersant to be added is not particularly limited, but is preferably 1 to 100% by mass, more preferably 5 to 50% by mass, based on the light scattering particles.

[0237] Furthermore, the composition for forming a wavelength conversion film of the present invention may contain a solvent, if necessary.Specific examples thereof include aromatic or halogenated aromatic hydrocarbon solvents such as benzene, toluene, xylene, ethylbenzene, and chlorobenzene; aliphatic hydrocarbons such as n-heptane, n-hexane, and cyclohexane; ether solvents such as diethyl ether, tetrahydrofuran, 1,4-dioxane, and 1,2-dimethoxyethane; ketone solvents such as acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, and cyclopentanone; ethyl acetate, normal hexyl acetate, ethyl lactate, γ-butyrolactone, and propylene carbonate. ester-based solvents such as ethyl 3-ethoxypropionate, diisopropyl malonate, and ethyl 3-ethoxypropionate; halogenated hydrocarbon solvents such as methylene chloride, dichloromethane, 1,2-dichloroethane, and chloroform; amide-based solvents such as N,N-dimethylformamide, N,N-dimethylacetamide, N-methyl-2-pyrrolidone, and 1,3-dimethyl-2-imidazolidinone; alcohol-based solvents such as methanol, ethanol, isopropanol, n-propanol, cyclohexanol, diacetone alcohol, and 2-benzooxyethanol; ethylene glycol mononitrate, diisopropyl malonate, diisopropyl malonate, and ethyl 3-ethoxypropionate; Examples of suitable organic solvents include glycol ether solvents such as ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, ethylene glycol diglycidyl ether, propylene glycol monomethyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol diethyl ether, diethylene glycol dimethyl ether, triethylene glycol dimethyl ether, triethylene glycol monobutyl ether, diethylene glycol monoethyl ether acetate, diethylene glycol monobutyl ether acetate, dipropylene glycol monomethyl ether, and propylene glycol monomethyl ether acetate; glycol solvents such as ethylene glycol, propylene glycol, hexylene glycol, 3-octylene glycol, diethylene glycol, dipropylene glycol, triethylene glycol, tripropylene glycol, 1,3-butanediol, 2,3-butanediol, and 1,4-butanediol; nitrile solvents such as acetonitrile; and sulfur-containing solvents such as dimethyl sulfoxide.These may be used alone or in combination of two or more.

[0238] The (A) phosphor may exist as a solvate. The solvate is not particularly limited as long as it is a solvate of the (A) phosphor and a solvent. Examples of solvents that form solvates include dichloromethane, chloroform, acetonitrile, diethyl ether, ethyl acetate, methanol, ethanol, cyclohexane, toluene, acetone, N,N-dimethylformamide, dimethyl sulfoxide, and tetrahydrofuran.

[0239] When the composition for forming a wavelength-converting film contains a solvent, the solids concentration of the composition for forming a wavelength-converting film cannot be generally defined because it varies depending on the intended thickness of the wavelength-converting film, the coating method, etc., but is usually 10 to 70 mass %, preferably 15 to 60 mass %.

[0240] The upper limit of the viscosity of the wavelength-converting film-forming composition at 25°C is 10,000 mPa s or less, preferably 1,000 mPa s or less. In consideration of storage stability, the lower limit is preferably 5 mPa s or more, more preferably 10 mPa s or more. In the present invention, viscosity refers to a value measured with an EMS viscometer.

[0241] The composition for forming a wavelength conversion film of the present invention can be prepared by mixing the above-mentioned (A) phosphor and (B) binder, if necessary the above-mentioned (C) light-scattering particles, other additives such as a surfactant, and a solvent in any order.

[0242] The wavelength-converting film can be obtained by applying the wavelength-converting film-forming composition of the present invention to a substrate, evaporating the solvent by heating (this heating is also referred to as "pre-baking") as necessary, and further irradiating with active energy rays (e.g., ultraviolet light) as necessary. Examples of the application method include methods using a reverse roll coater, blade coater, slit die coater, direct gravure coater, offset gravure coater, kiss coater, natural roll coater, air knife coater, roll blade coater, barrier roll blade coater, two-stream coater, rod coater, wire bar coater, applicator, dip coater, curtain coater, spin coater, knife coater, inkjet, etc.

[0243] Heating can be carried out using a general heating device such as an oven, a hot plate, etc. The heating conditions are not particularly limited as long as a film can be formed, but heating at 60 to 200°C for 2 minutes to 2 hours is preferred, and heating at 80 to 200°C for 15 minutes to 1 hour is more preferred. Heat curing may also be carried out in stages.

[0244] The ultraviolet light irradiation is not particularly limited as long as it can form a film, but light sources such as mercury lamps, metal halide lamps, xenon lamps, and LEDs can be used, and light from which light other than the target exposure wavelength has been removed can be irradiated by combining a bandpass filter as needed. The wavelength of the irradiated light is preferably 200 to 440 nm, and particularly preferably includes light with a wavelength of 300 to 400 nm. The exposure dose is 10 to 4,000 mJ / cm. ２ is preferred.

[0245] The heating step and the ultraviolet light exposure step may be combined in any order, for example, heating may be performed before ultraviolet light irradiation, ultraviolet light irradiation may be performed before heating, or heating may be performed after ultraviolet light irradiation, and then heating may be performed again.

[0246] The thickness of the wavelength conversion film (i.e., the wavelength conversion film immediately before exposure to ultraviolet light) is not particularly limited, but is usually 1 to 1,000 μm, preferably 3 to 500 μm, and more preferably 5 to 100 μm. The haze of the wavelength conversion film is not particularly limited, but is preferably 18% or more, more preferably 30% or more, and more preferably 40% or more, from the viewpoint of increasing the amount of light that can be absorbed by the phosphor by scattering the incident light within the film. The upper limit of the haze value is not particularly limited, but is usually about 95%. The haze value in the present invention is a value measured in accordance with ASTM D1003-61. In addition, in the present invention, the haze value can be measured, for example, on a 10 μm-thick film formed from a composition containing 3% by mass of titanium oxide particles.

[0247] The substrate may be appropriately selected from those used as base substrates for forming this type of film, but a glass substrate or polymer plate having a transmittance of 50% or more for light in the visible region of 400 to 800 nm is preferred. Specific examples of glass include soda-lime glass, barium-strontium-containing glass, lead glass, aluminosilicate glass, borosilicate glass, barium borosilicate glass, and quartz. Specific examples of polymers include polycarbonate, acrylic, polyethylene terephthalate, polyether sulfide, and polysulfone.

[0248] In the present invention, a composition (so-called negative photosensitive resin composition) containing an alkali-soluble resin as the resin (B-5) in addition to the resins (B-1), (B-2), and (B-3) is used, and when a coating film is formed using this composition, a mask having a predetermined pattern is attached to the resulting coating film, and the coating film is irradiated with light such as ultraviolet light, and developed with an alkaline developer, whereby the unexposed areas are washed out, and the remaining patterned film is heated as needed at 80 to 140°C for 0.5 to 10 minutes, thereby obtaining a relief pattern with sharp edge surfaces.

[0249] Examples of the alkaline developer include aqueous solutions of alkali metal hydroxides such as potassium carbonate, sodium carbonate, potassium hydroxide, and sodium hydroxide; aqueous solutions of quaternary ammonium hydroxides such as tetramethylammonium hydroxide, tetraethylammonium hydroxide, and choline; and aqueous solutions of amines such as ethanolamine, propylamine, and ethylenediamine. Furthermore, surfactants known for use in developers can also be added to these developers.

[0250] Among the above, an aqueous solution of 0.1 to 2.58 mass % tetraethylammonium hydroxide is generally used as a developer for photoresists, and the composition of the present invention can also be developed satisfactorily using this alkaline developer without causing problems such as swelling.

[0251] The developing method may be any of the puddle method, dipping method, and swing immersion method, etc. The developing time is usually 15 to 180 seconds.

[0252] After development, the photosensitive resin film is washed with running water and then air-dried using compressed air or compressed nitrogen or by spinning, thereby removing moisture from the substrate and obtaining a patterned film. In the above, the washing time is usually about 20 to 120 seconds.

[0253] Subsequently, the pattern-forming film thus obtained is heated for thermal curing (this heating is also referred to as "post-baking"), thereby obtaining a film having a good relief pattern and excellent heat resistance, transparency, flattening properties, low water absorption, chemical resistance, etc. A hot plate, an oven, etc. can be used to heat the pattern-forming film.

[0254] A typical post-baking method involves treating the film at a heating temperature selected from the range of 140 to 270° C. for 5 to 30 minutes on a hot plate or for 30 to 90 minutes in an oven. Post-baking under these conditions allows a cured film having a good pattern shape to be obtained.

[0255] The wavelength conversion film formed by the composition for forming a wavelength conversion film of the present invention has excellent wavelength conversion efficiency and film retention rate, and can therefore be suitably used as a wavelength conversion film (color conversion film) for displays such as micro LED displays, organic EL displays, and liquid crystal displays, as well as for lighting.

[0256] EXAMPLES The present invention will be described in more detail below with reference to examples and comparative examples, but the present invention is not limited to the following examples.

[0257] [Molecular Weight Measurement] In the present examples, the molecular weight of the polymer was measured using a GPC system manufactured by JASCO Corporation as the apparatus and Shodex (registered trademark) KF-804L and 803L as the columns under the following conditions: Column oven: 40°C Flow rate: 1 mL / min Eluent: tetrahydrofuran

[0258] The abbreviations used in this example have the following meanings: MMA: methyl methacrylate MAA: methacrylic acid MAIB: 2,2'-azobis(isobutyrate) dimethyl [Organic fluorescent dye (component (A))] FL-305: Oracet (registered trademark) FL Red 305 (trade name) [Scattering particles (component (C))] PT-401L: high-purity titanium dioxide (rutile type, average particle size 130 nm) manufactured by Ishihara Sangyo Kaisha, Ltd. [Particle dispersant] AQ-320: Disparlon AQ-320 (trade name) manufactured by Kusumoto Chemicals Co., Ltd. [Component (B-2)] IPEMA: isoprenyl methacrylate manufactured by Kuraray Co., Ltd. [Photopolymerization initiator 1 (component (B-1))] NCI-930: NCI-930 (trade name) manufactured by ADEKA Corporation [Photopolymerization initiator 2 (component (B-1))] Omnirad 184: Omnirad 184 (trade name) manufactured by IGM Resin [Polymer] P1: Acrylic polymer (alkali-soluble resin) described in Reference Synthesis Example 1 below [Acrylic crosslinking agent 1 (component (B-3))] V260: Viscoat V260 (trade name) manufactured by Osaka Organic Chemical Industry Co., Ltd. [Epoxy crosslinking agent 1 (component (D))] GT-401: Epolead (registered trademark) GT-401 manufactured by Daicel Corporation [Other additives] PE-1: Karenz MT PE1 (trade name) [Surfactant] DFX-18: Futergent DFX-18 (trade name) manufactured by Neos Corporation [Solvent] CPN: Cyclopentanone PGMEA: Propylene glycol monomethyl ether acetate

[0259] Reference Synthesis Example 1 Synthesis of alkali-soluble resin P1 80.0 g of MMA, 20.0 g of MAA, and 7.0 g of MAIB were dissolved in 160.5 g of CPN, and the mixture was allowed to react at 100° C. for 20 hours to obtain an acrylic polymer P1 solution (solid content concentration: 40% by mass). The resulting acrylic polymer P1 had an Mn of 5,022 and an Mw of 8,070.

[0260] [Preparation Example 1] Preparation of Light-Scattering Particle Dispersion [CPN Dispersion of Component C] Light-scattering particles PT-401L and particle dispersant AQ-320 in an amount of 20% by weight in terms of solid content relative to the light-scattering particles PT-401L were added to a 1000 mL polypropylene container, and CPN was further added to adjust the solid content concentration to 36% by weight. A slurry was obtained by dispersing and stirring at 1,500 rpm for 30 minutes. Next, the entire amount of the slurry was transferred to a slurry tank, and then, using a bead mill device Labo Ministar DMS65 manufactured by Ashizawa Finetech Co., Ltd., the mixture was filled with 60% by volume of zirconia beads having a diameter of 0.2 mm. The mixture was subjected to 10 passes at a liquid feed rate of 60 mL / min and a disk peripheral speed of 8 m / s to obtain a light-scattering particle dispersion. The particle size distribution of the resulting dispersion was measured using a Nanotrac UPA (manufactured by Microtrac). CPN was used as the dilution liquid, and the 50% cumulative diameter (D50) of the particles in the dispersion liquid was calculated on a volume basis from the scattering that occurred when laser light was irradiated onto the diluted sample using analysis software Microtrac DMS manufactured by Nikkiso Co., Ltd., and was found to be 185 nm.

[0261] [Examples 1 to 3, Comparative Example 1, and Reference Examples 1 to 4] Preparation of compositions for forming wavelength conversion films Compositions for forming wavelength conversion films were prepared by mixing the components according to the compositions shown in Tables 1 to 3 and filtering the resulting mixtures using a polytetrafluoroethylene (PTFE) filter with a pore size of 5.0 μm. The composition ratios in Tables 1 to 3 represent mass ratios of the solid content.

[0262]

[0263]

[0264]

[0265] [Film Thickness Measurement] The film thickness of each wavelength conversion film formed using each of the compositions for forming a wavelength conversion film obtained in Examples 1 to 3, Comparative Example 1, and Reference Examples 1 to 4 was measured as follows: The film thickness of each coating film obtained by the methods described in the optical property evaluation and lithography property evaluation below was measured from the spectrum in the wavelength range from 1000 nm to 1600 nm using an interference film thickness meter F20-EXR manufactured by Filmetrics.

[0266] [Evaluation of Optical Properties] The optical properties of each wavelength conversion film formed using the wavelength conversion film-forming composition obtained in Examples 1 to 3, Comparative Example 1, and Reference Examples 1 to 4 were evaluated as follows: The wavelength conversion film-forming compositions of Examples 1 to 3, Comparative Example 1, and Reference Examples 1 to 4 were applied to a quartz substrate using a spin coater, and then prebaked on a hot plate at 110°C for 90 seconds to obtain a coating film sample with a film thickness of 11 µm. Thereafter, the composition was cured with 200 mJ / cm using an ultraviolet curing device manufactured by iGraphics Co., Ltd. ２ The coating film was irradiated with ultraviolet light having a wavelength of 480 nm or less, and then post-baked at 230°C for 10 minutes to obtain a coating film sample with a thickness of 10 μm. Next, the coating film sample was placed on a blue LED light (emission peak wavelength 450 nm) manufactured by CCS Inc., the LED light was turned on, and the light emitted through the coating film sample was measured using a USR-45 spectroradiometer manufactured by Ushio Inc., and the result was reported as Result (1). Similarly, the light emitted from only the LED light, excluding the coating film sample, was measured in the same manner, and the result was reported as Result (2). From the obtained spectral irradiance spectrum, the number of photons of light with a wavelength of 480 nm or less in Result (2) was taken as the "excitation light photon number." Similarly, the number of photons of light with a wavelength of 480 nm or less in Result (1) was taken as the "transmitted light photon number." Similarly, the number of photons of light with a wavelength exceeding 480 nm in Result (1) was taken as the "emission photon number." The "blue light absorptance" and "conversion efficiency" were calculated using the following formulas. Blue light absorption rate = (number of excitation light photons - number of transmitted light photons) ÷ number of excitation light photons Conversion efficiency = number of emitted photons ÷ number of excitation light photons

[0267] [Evaluation of Lithographic Properties] The lithographic properties of each wavelength conversion film formed using each wavelength conversion film-forming composition obtained in Examples 1 to 3, Comparative Example 1, and Reference Examples 1 to 4 were evaluated as follows. For Examples 1 to 3, Comparative Example 1, and Reference Examples 1 to 4, each composition was applied to a silicon substrate treated with hexamethyldisilazane using a spin coater, and then prebaked on a hot plate at a temperature of 110°C for 90 seconds to form a coating film with a thickness of 13 µm. After measuring the thickness of the coating film (film thickness after prebaking), the coating film was exposed to ultraviolet light with a PLA-600FA ultraviolet irradiation device manufactured by Canon Inc. at a light intensity of 3.4 mW / cm at 365 nm. 2 of ultraviolet light at 200 mJ / cm 2 The coating film was irradiated through a photomask having 5 mm x 6 mm square light-transmitting portions spaced 5 mm x 6 mm apart for an exposure dose of 1000 sq m. The coating film was immersed in a 0.045 mass % potassium hydroxide aqueous solution for 4 minutes and 30 seconds while being penetrated, and then washed with running ultrapure water for 30 seconds. The coating film was then dried by air blowing to obtain a coating film sample having a pattern formed thereon. In all of Examples 1 to 3, Comparative Example 1, and Reference Examples 1 to 4, no coating film was observed on the substrate in the light-shielded areas during ultraviolet light irradiation, and the film had been removed by the development treatment, while the coating film remained in the exposed areas. Next, the film thickness of the coating film sample after development was measured, and the "remaining film ratio" was calculated using the film thickness after development and the film thickness after pre-baking according to the following formula: Remaining film ratio = film thickness after development ÷ film thickness after pre-baking

[0268] The optical properties and lithography properties of the wavelength conversion films formed using the wavelength conversion film-forming compositions obtained in Examples 1 to 3, Comparative Example 1, and Reference Examples 1 to 4 are shown in Tables 4 and 5.

[0269]

[0270]

[0271] According to the results of Examples 1 to 3, which are embodiments of the present invention, it was found that in Examples 1 to 3, in which 12 to 24 mass% IPEMA was used as the composition for forming a wavelength conversion film, the conversion efficiency exceeded 30% and the residual film rate exceeded 50%. It was also found that in both Examples 1 and 2, the conversion efficiency exceeded 35% and the residual film rate exceeded 70%. Furthermore, in Comparative Example 1 and Reference Examples 1 to 3, in which 0 to 6 mass% IPEMA was used, and Reference Example 4, in which 30 mass% IPEMA was used, the coating film was completely dissolved after development, and none of the coating films had a conversion efficiency exceeding 30% and a residual film rate exceeding 50%. Furthermore, it was also confirmed that, because a photoradical polymerization initiator was used as the photopolymerization initiator in Examples 1 to 3, a composition capable of forming a wavelength conversion film having excellent insolubility in a developer in a development process after exposure under atmospheric pressure (i.e., a composition for forming a wavelength conversion film) and the wavelength conversion film can be provided.

[0272] According to the present invention, it is possible to provide a composition capable of forming a wavelength-converting film having a high film retention rate and a high conversion efficiency (i.e., a composition for forming a wavelength-converting film), and the wavelength-converting film, and therefore the composition can be used as a wavelength-converting film for a variety of applications, and is expected to be applicable to a wide variety of industrial fields requiring wavelength-converting films (particularly, the manufacture of displays such as micro LED displays).Furthermore, according to the present invention, the composition can be expected to be applicable as a wavelength-converting film for forming a wavelength-converting film by inkjet coating.

Claims

1. A composition for forming a wavelength conversion film comprising (A) a phosphor and (B) a binder, the binder containing a compound represented by the following general formula (1): [In general formula (1), R １ and R ２ each independently represents any one selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, an aryl group, and an aralkyl group; R ３ represents any one selected from the group consisting of an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, an aryl group, and an aralkyl group; R ４ represents any one selected from the group consisting of a (meth)acryloyl group, a styryl group, and an alkenyl group having 2 to 6 carbon atoms, and X represents NH or O. n represents any integer from 1 to 5.

2. R in the above general formula (1) １ and R ２ is a hydrogen atom, R ３ is a methyl group, n is 1 to 4, and R ４ 2. The composition for forming a wavelength conversion film according to claim 1, wherein: is a (meth)acryloyl group or a styryl group; and X is O.

3. The composition for forming a wavelength conversion film according to claim 1, wherein the general formula (1) is the following general formula (2): [In the formula, R ５ represents a hydrogen atom or a methyl group.

4. The composition for forming a wavelength conversion film according to claim 1, wherein the binder (B) contains: (B-1) a photopolymerization initiator; (B-2) a compound represented by the general formula (1); and (B-3) a compound having two or more polymerizable functional groups in the molecule and different from the compound represented by the general formula (1).

5. The composition for forming a wavelength conversion film according to claim 4, wherein the polymerizable functional group in (B-3) is a (meth)acryloyl group.

6. The composition for forming a wavelength conversion film according to claim 4, wherein the binder (B) contains (B-4) a compound having one polymerizable functional group in the molecule.

7. The composition for forming a wavelength conversion film according to claim 6, wherein the polymerizable functional group in (B-4) is a (meth)acryloyl group.

8. The composition for forming a wavelength conversion film according to claim 4, wherein the binder (B) contains a resin (B-5).

9. The composition for forming a wavelength conversion film according to claim 8, wherein the (B-5) resin contains an alkali-soluble resin.

10. The composition for forming a wavelength conversion film according to claim 1, further comprising (C) light scattering particles.

11. The composition for forming a wavelength conversion film according to claim 10, wherein the light scattering particles (C) are titanium oxide particles.

12. The composition for forming a wavelength conversion film according to claim 1, further comprising (D) a thermal crosslinking agent.

13. The composition for forming a wavelength conversion film according to claim 12, wherein the (D) thermal crosslinking agent is an epoxy-based crosslinking agent.

14. The composition for forming a wavelength conversion film according to claim 1, wherein the content of the phosphor (A) is 0.1 mass % or more in the solid content.

15. The composition for forming a wavelength conversion film according to claim 10, wherein the content of the light scattering particles (C) is 1 mass % or more in the solid content.

16. The composition for forming a wavelength conversion film according to claim 1, wherein a film formed from said composition has a haze value of 18% or more.

17. The composition for forming a wavelength conversion film according to claim 1, which is a composition for forming a wavelength conversion film for a display.

18. A wavelength conversion film produced from the composition for forming a wavelength conversion film according to any one of claims 1 to 17.

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