Transmission member and method for manufacturing transmission member

Abstract

The present invention improves resistance of an antireflection film to high-strength peeling, while suppressing low-strength peeling of the antireflection film. This transmission member (20) is provided with: a base material (30) that is mainly composed of M which is Si or Ge; an adhesion layer (50) that is provided on the base material and contains, as a main component, at least one of ZrOx, TiOx, ZnO, AlxOy, and NbxOy; and an antireflection film (40) that is provided on the adhesion layer (50). When measurement by XPS is performed on the surface of the base material (30), the ratio of the peak intensity of an M-O bond to the peak intensity of an M-M bond is 7.5% or less, and when a tape test, in which a tape having an adhesion strength of 10 N ± 1 N per a width of 25 mm is stuck to five locations on the surface of the transmission member 20 and subsequently peeled off, is performed in accordance with IEC 60454-2, the surface of the transmission member (20) is not peeled away.

Description

Transparent member and method for manufacturing the same

[0001] The present invention relates to a transmission member and a method for manufacturing the transmission member.

[0002] In order to transmit light appropriately, an anti-reflection film may be provided on a substrate. For example, Patent Document 1 describes a transparent member in which a functional film including a low refractive index layer containing MgO as a main component is formed on a substrate that transmits far infrared rays.

[0003] International Publication No. 2022 / 045011

[0004] When forming an antireflective film on a substrate in this manner, it is necessary to suppress low-strength peeling of the antireflective film while improving resistance to high-strength peeling that involves scratches. Here, low-strength peeling refers to peeling of the antireflective film caused by the application of a low-strength external force that does not cause scratches. Moreover, high-strength peeling refers to peeling of the antireflective film caused by the application of a high-strength external force that causes scratches.

[0005] An object of the present invention is to provide a transmissive member and a method for manufacturing the transmissive member that can improve resistance to high-strength peeling while suppressing low-strength peeling of an antireflection film.

[0006] The transmitting member according to the present disclosure includes a substrate containing Si or Ge as a main component, and a ZrO ｘ , TiO ｘ , ZnO, Al ｘ O ｙ , and Nb ｘ O ｙ and an anti-reflection film provided on the adhesive layer, wherein when the surface of the substrate is measured by XPS, the ratio of the peak intensity of an M-O bond to the peak intensity of an M-M bond is 7.5% or less, and when a tape test is conducted in accordance with the provisions of IEC 60454-2 in which a tape having an adhesive strength of 10 N±1 N per 25 mm width is attached to five points on the surface of the transparent member and then peeled off, the surface of the transparent member does not peel off.

[0007] The transmitting member according to the present disclosure includes a substrate containing Si or Ge as a main component, and a ZrO ｘ , TiO ｘ , ZnO, Al ｘ O ｙ , and Nb ｘ O ｙ and an anti-reflection film provided on the adhesion layer, wherein the substrate includes a base material layer mainly composed of M and an oxide layer which is an oxide of M and is formed on the surface of the base material layer, and the oxide layer has a thickness of less than 5 nm, and when a tape test is conducted in accordance with the provisions of IEC 60454-2 in which a tape having an adhesive strength of 10 N±1 N per 25 mm width is attached to five points on the surface of the transparent member and then peeled off, the surface of the transparent member does not peel off.

[0008] A method for producing a transmission member according to the present disclosure includes plasma cleaning a surface of a substrate containing Si or Ge as a main component, using Ar ions, and depositing ZrO ｘ , TiO ｘ , ZnO, Al ｘ O ｙ , and Nb ｘ O ｙ and an antireflection film, laminated in this order, to produce a transparent member, wherein when the surface of the substrate is measured by XPS, the ratio of the peak intensity of the M-O bond to the peak intensity of the M-M bond is 7.5% or less, and when a tape test is conducted in accordance with the provisions of IEC 60454-2 in which a tape having an adhesive strength of 10 N±1 N per 25 mm width is attached to five points on the surface of the transparent member and then peeled off, the surface of the transparent member does not peel off.

[0009] A method for producing a transmission member according to the present disclosure includes plasma cleaning a surface of a substrate containing Si or Ge as a main component, using Ar ions, and depositing ZrO ｘ , TiO ｘ , ZnO, Al ｘ O ｙ , and Nb ｘO ｙ and manufacturing a transparent member by laminating, in this order, an adhesion layer mainly composed of at least one of the above and an anti-reflection film, wherein the substrate includes a base material layer mainly composed of M, and an oxide layer which is a layer of an oxide of M formed on the surface of the base material layer, the oxide layer having a thickness of less than 5 nm, and when a tape test is conducted in accordance with the provisions of IEC 60454-2 in which a tape having an adhesive strength of 10 N±1 N per 25 mm width is attached to five points on the surface of the transparent member and then pulled off, the surface of the transparent member does not peel off.

[0010] According to the present invention, it is possible to improve resistance to high-strength peeling while suppressing low-strength peeling of the antireflection film.

[0011] FIG. 1 is a schematic diagram showing a state in which a vehicle glass according to this embodiment is mounted on a vehicle. FIG. 2 is a schematic plan view of the vehicle glass according to this embodiment. FIG. 3 is a cross-sectional view taken along line A-A in FIG. 2. FIG. 4 is a cross-sectional view taken along line B-B in FIG. 2. FIG. 5 is a schematic cross-sectional view of a transmitting member according to this embodiment. FIG. 6 is a graph showing an example of measurement results by XPS. FIG. 7 is a schematic diagram illustrating layers of a substrate. FIG. 8 is a schematic cross-sectional view of a transmitting member according to another example of this embodiment.

[0012] Preferred embodiments of the present invention will be described in detail below with reference to the accompanying drawings. Note that the present invention is not limited to these embodiments, and when there are multiple embodiments, the present invention also includes configurations that are made by combining the respective embodiments. Furthermore, numerical values ​​include the range of rounding.

[0013] (Vehicle) Fig. 1 is a schematic diagram showing a state in which a vehicle glass according to this embodiment is mounted on a vehicle. As shown in Fig. 1, the vehicle glass 1 according to this embodiment is mounted on a vehicle V. The vehicle glass 1 is a window member that is applied to the windshield of the vehicle V. That is, the vehicle glass 1 is used as the front window of the vehicle V, in other words, as a windshield. A far-infrared camera CA1 and a visible light camera CA2 are mounted inside (interior of) the vehicle V. Note that the inside (interior of) the vehicle V refers to, for example, the interior of the vehicle where the driver's seat is located.

[0014] The vehicle glass 1, the far-infrared camera CA1, and the visible light camera CA2 constitute the camera unit 100 according to this embodiment. The far-infrared camera CA1 is a camera that detects far-infrared rays and captures a thermal image of the exterior of the vehicle V by detecting far-infrared rays from outside the vehicle V. The visible light camera CA2 is a camera that detects visible light and captures an image of the exterior of the vehicle V by detecting visible light from outside the vehicle V. In addition to the far-infrared camera CA1 and the visible light camera CA2, the camera unit 100 may further include, for example, LiDAR or millimeter-wave radar. Here, far-infrared rays refer to, for example, electromagnetic waves with a wavelength of 8 μm to 13 μm, and visible light refers to, for example, electromagnetic waves with a wavelength of 360 nm to 830 nm. Here, 8 μm to 13 μm and 360 nm to 830 nm refer to 8 μm or more and 13 μm or less, and 360 nm or more and 830 nm or less, respectively, and the same applies hereinafter. The far infrared rays may be electromagnetic waves having a wavelength in the range of 8 μm to 12 μm.

[0015] (Vehicle Glass) FIG. 2 is a schematic plan view of a vehicle glass according to this embodiment. FIG. 3 is a cross-sectional view taken along line A-A in FIG. 2. FIG. 4 is a cross-sectional view taken along cross section B-B in FIG. 2. As shown in FIG. 2, hereinafter, the upper edge of the vehicle glass 1 will be referred to as an upper edge portion 1a, the lower edge as a lower edge portion 1b, one side edge as a side edge portion 1c, and the other side edge as a side edge portion 1d. The upper edge portion 1a is an edge portion located on the upper side in the vertical direction when the vehicle glass 1 is installed in a vehicle V. The lower edge portion 1b is an edge portion located on the lower side in the vertical direction when the vehicle glass 1 is installed in a vehicle V. The side edge portion 1c is an edge portion located on one side when the vehicle glass 1 is installed in a vehicle V. The side edge portion 1d is an edge portion located on the other side when the vehicle glass 1 is installed in a vehicle V.

[0016] Hereinafter, among directions parallel to the surface of the vehicle glass 1, the direction from the upper edge 1a to the lower edge 1b is referred to as the Y direction, and the direction from the side edge 1c to the side edge 1d is referred to as the X direction. In this embodiment, the X direction and the Y direction are perpendicular to each other. The direction perpendicular to the surface of the vehicle glass 1, i.e., the thickness direction of the vehicle glass 1, is referred to as the Z direction. For example, when the vehicle glass 1 is installed in a vehicle V, the Z direction is the direction from the exterior side to the interior side of the vehicle V. The X direction and the Y direction run along the surface of the vehicle glass 1. However, if the surface of the vehicle glass 1 is curved, for example, the X direction and the Y direction may be directions tangent to the surface of the vehicle glass 1 at the center point O of the vehicle glass 1. The center point O is the center position of the vehicle glass 1 when the vehicle glass 1 is viewed from the Z direction.

[0017] The vehicle glass 1 is formed with a light-transmitting region A1 and a light-shielding region A2. The light-transmitting region A1 is a region that occupies the central part of the vehicle glass 1 when viewed from the Z direction. The light-transmitting region A1 is a region that ensures the driver's field of vision. The light-transmitting region A1 is a region that transmits visible light. The light-shielding region A2 is a region that is formed around the light-transmitting region A1 when viewed from the Z direction. The light-shielding region A2 is a region that blocks visible light. Within the light-shielding region A2a, which is the portion of the light-shielding region A2 on the upper edge portion 1a side, a far-infrared light-transmitting region B and a visible light-transmitting region C are formed.

[0018] The far-infrared transmitting region B is a region that transmits far-infrared rays and is a region where the far-infrared camera CA1 is provided. That is, the far-infrared camera CA1 is provided at a position that overlaps with the far-infrared transmitting region B when viewed from the optical axis direction of the far-infrared camera CA1. The visible light transmitting region C is a region that transmits visible light and is a region where the visible light camera CA2 is provided. That is, the visible light camera CA2 is provided at a position that overlaps with the visible light transmitting region C when viewed from the optical axis direction of the visible light camera CA2.

[0019] In this way, the light-shielding region A2 has the far-infrared transmitting region B and the visible light transmitting region C formed therein, so that the light-shielding region A2 blocks far-infrared rays except in the region where the far-infrared transmitting region B is formed, and blocks visible light except in the region where the visible light transmitting region C is formed. The far-infrared transmitting region B and the visible light transmitting region C are surrounded by the light-shielding region A2a. Providing the light-shielding region A2a around the periphery in this way is preferable because it protects the various sensors from sunlight. It is also preferable from the viewpoint of design because the wiring of the various sensors is not visible from outside the vehicle.

[0020] 3 , the vehicle glass 1 includes a glass substrate 12 (first glass substrate), a glass substrate 14 (second glass substrate), an intermediate layer 16, and a light-shielding layer 18. The vehicle glass 1 has the glass substrate 12, the intermediate layer 16, the glass substrate 14, and the light-shielding layer 18 laminated in this order in the Z direction. The glass substrate 12 and the glass substrate 14 are fixed (bonded) to each other via the intermediate layer 16.

[0021] The glass substrates 12, 14 may be made of, for example, soda-lime glass, borosilicate glass, aluminosilicate glass, or the like. The intermediate layer 16 is an adhesive layer that bonds the glass substrates 12, 14 together. The intermediate layer 16 may be made of, for example, a modified polyvinyl butyral (hereinafter also referred to as PVB) material, an ethylene-vinyl acetate copolymer (EVA)-based material, a urethane resin material, or a vinyl chloride resin material. More specifically, the glass substrate 12 includes one surface 12A and another surface 12B, and the other surface 12B is in contact with one surface 16A of the intermediate layer 16 and fixed (adhered) to the intermediate layer 16. The glass substrate 14 includes one surface 14A and another surface 14B, and the one surface 14A is in contact with the other surface 16B of the intermediate layer 16 and fixed (adhered) to the intermediate layer 16. As described above, the vehicle glass 1 is a laminated glass in which the glass substrate 12 and the glass substrate 14 are laminated together. However, the vehicle glass 1 is not limited to a laminated glass, and may be configured to include, for example, only one of the glass substrate 12 and the glass substrate 14. In this case, the intermediate layer 16 may not be provided. Hereinafter, when there is no need to distinguish between the glass substrates 12 and 14, they will be referred to as the glass substrate 10.

[0022] The light-shielding layer 18 includes one surface 18A and the other surface 18B, and the one surface 18A is in contact with and fixed to the other surface 14B of the glass substrate 14. The light-shielding layer 18 is a layer that blocks visible light. For example, a ceramic light-shielding layer or a light-shielding film can be used as the light-shielding layer. For example, a ceramic layer made of a conventionally known material, such as a black ceramic layer, can be used as the ceramic light-shielding layer. For example, a light-shielding polyethylene terephthalate (PET) film, a light-shielding polyethylene naphthalate (PEN) film, a light-shielding polymethyl methacrylate (PMMA) film, etc. can be used as the light-shielding film.

[0023] In the present embodiment, the side of the vehicle glass 1 on which the light-shielding layer 18 is provided is the interior side of the vehicle V (inside of the vehicle), and the side on which the glass substrate 12 is provided is the exterior side of the vehicle V (outside of the vehicle), but this is not limiting, and the light-shielding layer 18 may be on the exterior side of the vehicle V. When the vehicle glass 1 is configured as a laminated glass of the glass substrates 12, 14, the light-shielding layer 18 may be formed between the glass substrate 12 and the glass substrate 14.

[0024] (Light-shielding region) The light-shielding region A2 is formed by providing the light-shielding layer 18 on the glass base 10. That is, the light-shielding region A2 is a region in which the glass base 10 is provided with the light-shielding layer 18. That is, the light-shielding region A2 is a region in which the glass base 12, the intermediate layer 16, the glass base 14, and the light-shielding layer 18 are laminated. On the other hand, the light-transmitting region A1 is a region in which the glass base 10 is not provided with the light-shielding layer 18. That is, the light-transmitting region A1 is a region in which the glass base 12, the intermediate layer 16, and the glass base 14 are laminated, and the light-shielding layer 18 is not laminated.

[0025] (Far-infrared ray transmitting region) As shown in FIG. 3 , the vehicle glass 1 has an opening 19 formed therein, penetrating from one surface (here, surface 12A) to the other surface (here, surface 14B) in the Z direction. A transparent member 20 is provided within the opening 19. The region where the opening 19 is formed and the transparent member 20 is provided is the far-infrared ray transmitting region B. That is, the far-infrared ray transmitting region B is a region where the opening 19 and the transparent member 20 disposed within the opening 19 are provided. Because the light-shielding layer 18 does not transmit far-infrared rays, the light-shielding layer 18 is not provided in the far-infrared ray transmitting region B. That is, the glass base 12, the intermediate layer 16, the glass base 14, and the light-shielding layer 18 are not provided in the far-infrared ray transmitting region B, and the transparent member 20 is provided in the formed opening 19. The transparent member 20 will be described later.

[0026] 4, the visible light transmitting region C, like the light-transmitting region A1, is a region in the Z direction where the glass base 10 does not include the light-shielding layer 18. In other words, the visible light transmitting region C is a region where the glass base 12, the intermediate layer 16, and the glass base 14 are laminated, and where the light-shielding layer 18 is not laminated.

[0027] As shown in FIG. 2 , the visible light transmission region C is preferably located near the far-infrared transmission region B. Specifically, the center of the far-infrared transmission region B as viewed from the Z direction is defined as center point OB, and the center of the visible light transmission region C as viewed from the Z direction is defined as center point OC. If the shortest distance between the far-infrared transmission region B (opening 19) and the visible light transmission region C as viewed from the Z direction is defined as distance L, distance L is preferably greater than 0 mm and less than 100 mm, and more preferably greater than 10 mm and less than 80 mm. Positioning the visible light transmission region C within this range relative to the far-infrared transmission region B enables the far-infrared camera CA1 and the visible light camera CA2 to capture images at nearby positions, while suppressing the amount of perspective distortion in the visible light transmission region C, allowing the visible light camera CA2 to capture appropriate images. Capturing images at nearby positions with the far-infrared camera CA1 and the visible light camera CA2 reduces the load when processing the data obtained from each camera and also optimizes the routing of power and signal cables.

[0028] As shown in Fig. 2, the visible light transmitting region C and the far-infrared transmitting region B are preferably positioned side by side in the X direction. That is, the visible light transmitting region C is preferably not positioned on the Y direction side of the far-infrared transmitting region B, but is preferably aligned with the far-infrared transmitting region B in the X direction. By arranging the visible light transmitting region C next to the far-infrared transmitting region B in the X direction, the visible light transmitting region C can be positioned near the upper edge portion 1a. Therefore, the driver's field of view in the light transmitting region A1 can be appropriately ensured.

[0029] (Transmitting Member) The transmitting member 20 provided in the far-infrared transmitting region B will now be described in detail. Fig. 5 is a schematic cross-sectional view of the transmitting member according to this embodiment. As shown in Fig. 5, the transmitting member 20 has a substrate 30, an adhesion layer 50 formed on the substrate 30, and an anti-reflection film 40 formed on the adhesion layer 50. That is, the transmitting member 20 is configured such that the adhesion layer 50 is provided between the substrate 30 and the anti-reflection film 40 in the Z direction, and the adhesion layer 50 bonds the substrate 30 and the anti-reflection film 40 together.

[0030] In this embodiment, the anti-reflection coating 40 and the adhesion layer 50 are provided on both the one main surface 30a and the other main surface 30b of the substrate 30. That is, as shown in FIG. 5 , in this embodiment, the adhesion layer 50A is formed on the main surface 30a of the substrate 30, and the anti-reflection coating 40A is formed on the adhesion layer 50A. In addition, in this embodiment, the adhesion layer 50B is formed on the main surface 30b of the substrate 30, and the anti-reflection coating 40B is formed on the adhesion layer 50B. The main surface 30a is the surface of the substrate 30 facing away from the direction Z and will face the exterior side when mounted on the vehicle glass 1. The main surface 30b is the surface of the substrate 30 facing the direction Z and will face the interior side when mounted on the vehicle glass 1.

[0031] However, the antireflection coating 40 and the adhesion layer 50 are not limited to being provided on both the main surface 30a and the main surface 30b of the substrate 30, and may be provided on only one of the main surface 30a and the main surface 30b. In this case, the antireflection coating 40 and the adhesion layer 50 are preferably provided on at least the main surface 30a. Hereinafter, when there is no need to distinguish between the adhesion layer 50A and the adhesion layer 50B, they will be referred to as the adhesion layer 50, and when there is no need to distinguish between the antireflection coating 40A and the antireflection coating 40B, they will be referred to as the antireflection coating 40.

[0032] In this embodiment, the transparent member 20 is provided in the light-blocking area A2 of the vehicle glass 1, which is a window member of the vehicle V, but is not limited thereto and may be provided in any exterior member of the vehicle V, such as an exterior member for a pillar of the vehicle V. Furthermore, the transparent member 20 is not limited to being provided in the vehicle V, and may be used for any purpose.

[0033] (Substrate) The substrate 30 is primarily composed of M, which is Si or Ge. That is, the substrate 30 may be primarily composed of Si or Ge. However, it is more preferable that the substrate 30 be primarily composed of Si. Here, the term "primary component" refers to a content of M relative to the entire substrate 30 of 50% by mass or more. The content of the main component M in the substrate 30 is 50% by mass or more and 100% by mass or less, preferably 70% by mass or more and 100% by mass or less, and more preferably 90% by mass or more and 100% by mass or less, relative to the entire substrate 30. More preferably, the content of the main component M in the substrate 30 is 100% by mass, i.e., excluding unavoidable impurities. Using such a material for the substrate 30 can adequately transmit far infrared rays, suppress low-strength peeling of the anti-reflection coating 40, and improve resistance to high-strength peeling when scratched. Here, low-strength peeling refers to peeling of the anti-reflection film 40 due to the application of a low-strength external force that does not cause scratches to the anti-reflection film 40. High-strength peeling refers to peeling of the anti-reflection film 40 due to the application of a high-strength external force that causes scratches to the anti-reflection film 40. When both low-strength peeling and high-strength peeling are included, the term "peeling" is used.

[0034] The base material 30 may contain a secondary component other than the primary component. For example, when the primary component M is Si, the base material 30 may contain Ge as a secondary component. For example, when the primary component M is Ge, the base material 30 may contain Si as a secondary component.

[0035] (Oxide Ratio of Substrate) Here, when the surface of the substrate 30 is measured by XPS (X-ray Photoelectron Spectroscopy), the ratio of the peak intensity of the M-O bond to the peak intensity of the M-M bond (M-O bond peak intensity / M-M bond peak intensity) is defined as the oxide ratio. The oxide ratio can be measured by the method shown below.

[0036] FIG. 6 is a graph showing an example of the results of XPS measurement. When measuring the oxide ratio, the surface of the substrate 30 is measured by XPS to obtain a measurement spectrum (a waveform showing peak intensity for each binding energy) that is the result of the XPS measurement. Waveform L1 in FIG. 6 shows an example of the measurement spectrum (raw data) of Si when the main component M is Si. The XPS measurement conditions may be as follows. If other films such as an anti-reflection coating 40 are stacked on the substrate 30, the other films on the substrate 30 are gradually removed by Ar sputtering to expose the surface of the substrate 30, and then the XPS measurement is performed. Measurement device: ESCA (manufactured by ULVAC-PHI, Inc.) Excitation X-ray source: Monochromated Al, dual anode (Mg / Zr) X-ray output: 100 μm, 25 W, 15 kV

[0037] Next, the background signal is removed from the obtained measured spectrum to obtain a corrected spectrum. That is, a spectrum obtained by removing unnecessary background signals such as noise from the measured spectrum, which is raw data, is obtained as the corrected spectrum. In this embodiment, software called Multipak is used to approximate the shape of the background signal using truncate (trapezoidal method), and the approximated background signal is subtracted from the measured spectrum to obtain a corrected spectrum. Waveform L2 in FIG. 6 is an example of a corrected spectrum calculated using waveform L1, which is the measured spectrum. Note that this process may be performed for each element contained in the substrate 30.

[0038] Next, the corrected spectrum is fitted by the least squares method to obtain the spectrum of the M-M bond and the spectrum of the M-O bond. In other words, the spectrum of the M-M bond and the spectrum of the M-O bond are extracted from the corrected spectrum. In this embodiment, the bimodal Voigt function shown in the following equations (2) to (4) may be used as a model to fit the corrected spectrum by the least squares method to obtain the spectrum of the M-M bond and the spectrum of the M-O bond. Waveform L3 in FIG. 6 is an example of the spectrum of the Si—Si bond (spectrum of the M-M bond) extracted using waveform L2, which is the corrected spectrum, and waveform L4 is an example of the spectrum of the Si—O bond (spectrum of the M-O bond) extracted using waveform L2, which is the corrected spectrum.

[0039]

[0040] where wi is the solution of the convolution integral of Lorenztian and Gaussian (Faddeeva function, complex error function), erfc is the error function, A is the peak intensity of each bond, ε ｉ is the central energy, σ is the Lorentzian spread, g ｖ is the Gaussian spread.

[0041] The oxide ratio was calculated from the M-M bond spectrum and the M-O bond spectrum obtained by performing measurements while gradually removing the film by Ar sputtering. Specifically, the ratio of the maximum intensity in the M-O bond spectrum to the maximum intensity in the M-M bond spectrum (maximum M-O bond peak intensity / maximum M-M bond peak intensity) was calculated as the oxide ratio.

[0042] The oxide ratio of the substrate 30 is preferably 7.5% or less, more preferably 1.0% or less, and even more preferably 0.1% or less. The oxide ratio of the substrate 30 is preferably 0.0001% or more and 7.5% or less, preferably 0.0001% or more and 5.0% or less, more preferably 0.0001% or more and 1.0% or less, and even more preferably 0.001% or more and 0.1% or less. By setting the upper limit of the oxide ratio within this range, the content of oxides as the main component of the substrate 30 can be reduced, thereby improving resistance to high-strength peeling. Furthermore, by setting the lower limit of the oxide ratio within this range, it can be seen that the substrate 30 is properly cleaned and the C (carbon) content is reduced, and low-strength peeling of the anti-reflection coating 40 can be appropriately suppressed.

[0043] The substrate 30 is a member capable of transmitting far-infrared rays. The substrate 30 preferably has an internal transmittance of 50% or more for light with a wavelength of 10 μm (far-infrared rays), more preferably 60% or more, and even more preferably 70% or more. Furthermore, the substrate 30 preferably has an average internal transmittance of 50% or more for light with a wavelength of 8 μm to 12 μm (far-infrared rays), more preferably 60% or more, and even more preferably 70% or more. By setting the internal transmittance at 10 μm and the average internal transmittance at 8 μm to 12 μm of the substrate 30 within these numerical ranges, far-infrared rays can be appropriately transmitted, thereby enabling the performance of, for example, the far-infrared camera CA1 to be fully demonstrated. The average internal transmittance here refers to the average value of the internal transmittance for light of each wavelength in that wavelength band (here, 8 μm to 12 μm).

[0044] The internal transmittance of the substrate 30 is the transmittance excluding the surface reflection loss on the incident side and the exit side, and is well known in the art, and may be measured by a commonly used method. The measurement is performed, for example, as follows.

[0045] A pair of flat samples (a first sample and a second sample) are prepared, each made of a substrate of the same composition but with a different thickness. Both surfaces of the flat samples are parallel to each other and optically polished. The external transmittance including surface reflection loss of the first sample is T1, the external transmittance including surface reflection loss of the second sample is T2, the thickness of the first sample is Td1 (mm), and the thickness of the second sample is Td2 (mm), where Td1 < Td2. The internal transmittance τ at a thickness Tdx (mm) can be calculated using the following formula (1):

[0046] τ = exp[-Tdx×(lnT1-lnT2) / ΔTd] ...(1)

[0047] The external transmittance of infrared light can be measured, for example, by a Fourier transform infrared spectrometer (manufactured by ThermoScientific, trade name: Nicolet iS10).

[0048] The refractive index of the substrate 30 for light with a wavelength of 10 μm is preferably 1.5 to 4.0, more preferably 2.0 to 4.0, and even more preferably 2.2 to 3.5. Furthermore, the average refractive index of the substrate 30 for light with a wavelength of 8 μm to 12 μm is preferably 1.5 to 4.0, more preferably 2.0 to 4.0, and even more preferably 2.2 to 3.5. Having the refractive index and average refractive index of the substrate 30 within these numerical ranges allows for appropriate transmission of far-infrared light, enabling the performance of, for example, the far-infrared camera CA1 to be fully demonstrated. The average refractive index here refers to the average value of the refractive index for light of each wavelength in the wavelength band (here, 8 μm to 12 μm). The refractive index can be determined, for example, by fitting an optical model using polarization information obtained from an infrared spectroscopic ellipsometer (IR-VASE-UT, manufactured by J.A. Woollam) and a spectral transmission spectrum obtained from a Fourier transform infrared spectrometer.

[0049] The thickness D1 of the substrate 30 is preferably 0.3 mm to 5 mm, more preferably 1 mm to 4 mm, and even more preferably 1.5 mm to 3 mm. When the thickness D1 is within this range, the strength can be ensured while allowing far-infrared rays to pass through appropriately. The thickness D1 can also be considered as the length in the Z direction from the main surface 30a to the main surface 30b of the substrate 30.

[0050] (Substrate Layer) Fig. 7 is a schematic diagram illustrating the substrate layer. As shown in Fig. 7, in this embodiment, the substrate 30 preferably has a base material layer 30A and an oxide layer 30B. The base material layer 30A is a layer containing M, which is Si or Ge, as a main component. The base material layer 30A preferably contains the main component alone, i.e., the content of the main component M, excluding unavoidable impurities, is preferably 100 mass%.

[0051] The oxide layer 30B is a layer formed on the surface of the base material layer 30A. That is, the oxide layer 30B is formed between the base material layer 30A and the adhesion layer 50. The oxide layer 30B is provided on both the surface of the base material layer 30A facing in the Z direction and the surface opposite to the Z direction. However, without being limited thereto, the oxide layer 30B may be provided only on either the surface of the base material layer 30A facing in the Z direction or the surface opposite to the Z direction.

[0052] The oxide layer 30B is a layer of an oxide of M. That is, when the substrate 30 (base material layer 30A) is mainly composed of Si, the oxide layer 30B is a layer of silicon oxide, i.e., SiOx (x is any positive number). When the substrate 30 (base material layer 30A) is mainly composed of Ge, the oxide layer 30B is a layer of germanium oxide, i.e., GeOx (x is any positive number). It is preferable that the oxide layer 30B is an amorphous layer.

[0053] The oxide layer 30B can be identified by XPS or EELS (Electron Energy Loss Spectroscopy).

[0054] The thickness D1A of the oxide layer 30B is preferably less than 5.0 nm, more preferably 0.0 nm to 4.0 nm, and even more preferably 1.0 nm to 3.0 nm. The thickness D1A can also be considered the length in the Z direction from the surface of the oxide layer 30B on the Z direction side to the surface opposite the Z direction. By setting the upper limit of the thickness D1A within this range, the oxide layer 30B can be improved in resistance to high-strength peeling caused by being too thick. Furthermore, by setting the lower limit of the thickness D1A within this range, it can be seen that the substrate 30 is properly cleaned and the C (carbon) content is reduced, and low-strength peeling of the anti-reflection coating 40 can be appropriately suppressed.

[0055] The thickness D1A of the oxide layer 30B can be measured using a cross-sectional transmission electron microscope (TEM) image. For example, the cross section of the base material 30 may be imaged using a TEM under the conditions of a probe size of 3, an OL aperture of 2, and a pixel count of 4096 × 4096. The thickness D1A of the oxide layer 30B may be determined by measuring the thickness of the region between the adhesion layer and the substrate from the TEM image.

[0056] (Anti-Reflection Film) The anti-reflection film 40A is a film that suppresses reflection of far-infrared rays. The anti-reflection film 40A may have any configuration. In this embodiment, the anti-reflection film 40A includes an outermost layer 42 and a functional layer 44. The outermost layer 42 is the layer of the anti-reflection film 40A that is located farthest from the substrate 30, i.e., located on the outermost side of the vehicle in this embodiment. In other words, the outermost layer 42 is the outermost layer of the transparent member 20 (in this embodiment, on the outermost side of the vehicle) and is exposed to the outside. The functional layer 44 is the layer of the anti-reflection film 40A that is located closer to the substrate 30 than the outermost layer 42 (in this embodiment, on the innermost side of the vehicle) and is further located on the side of the anti-reflection film 40A closest to the substrate (inside the vehicle). The functional layer 44 is in contact with an adhesion layer 50A that is located on the substrate 30.

[0057] The thickness D2 of the anti-reflection coating 40A is preferably 800 nm or more and 3000 nm or less, more preferably 1000 nm or more and 2000 nm or less, and even more preferably 1100 nm or more and 1500 nm or less. The thickness D2 can also be considered the length in the Z direction from the surface of the anti-reflection coating 40A on the Z direction side to the surface opposite the Z direction. The ratio of the thickness D2 of the anti-reflection coating 40A to the thickness D1 of the substrate 30 is preferably 0.016% or more and 1% or less, more preferably 0.02% or more and 0.67% or less, and even more preferably 0.022% or more and 0.5% or less. Having the thickness D2 within this range allows for appropriate transmission of far infrared rays and appropriately suppresses peeling of the anti-reflection coating 40.

[0058] (Outermost layer) The outermost layer 42 is made of ZrO ｘ , NiO ｘ , diamond-like carbon, ZnO, Si, Ge, ZnSe, ZnS, chalcogenide glass, SnO ２ , CeO ２ The outermost layer 42 preferably contains at least one of the following as a main component: ZrO ２It is more preferable that the main component is a compound represented by the formula (I). Here, the main component may refer to a content of 50% by mass or more relative to the entire outermost layer 42. The main component content of the outermost layer 42 is 50% by mass or more and 100% by mass or less, preferably 70% by mass or more and 100% by mass or less, and more preferably 90% by mass or more and 100% by mass or less relative to the entire outermost layer 42. Furthermore, it is preferable that the main component content of the outermost layer 42 is 100% by mass, i.e., excluding unavoidable impurities. When the main component content of the outermost layer 42 is in this range, far infrared rays can be appropriately transmitted and peeling can be appropriately suppressed. Note that "x" in the compound may be any number greater than 0.

[0059] The outermost layer 42 may contain a secondary component other than the main component. The secondary component is preferably an oxide that transmits far infrared rays, such as NiO. ｘ , ZnO, Bi ２ O ３ , and CuO ｘ At least one of the following can be mentioned.

[0060] The thickness D2A of the outermost layer 42 is preferably 20 nm or more, more preferably 50 nm or more and 300 nm or less, even more preferably 100 nm or more and 300 nm or less, and most preferably 150 nm or more and 250 nm or less. The thickness D2A can also be considered the length in the Z direction from the surface of the outermost layer 42 on the Z direction side to the surface opposite the Z direction. The ratio of the thickness D2A of the outermost layer 42 to the thickness D1 of the substrate 30 is preferably 0.002% or more and 0.030% or less, more preferably 0.005% or more and 0.020% or less, and even more preferably 0.008% or more and 0.013% or less. The ratio of the thickness D2A of the outermost layer 42 to the thickness D2 of the antireflection coating 40 is preferably 1% or more and 25% or less, more preferably 3% or more and 25% or less, even more preferably 5% or more and 25% or less, and most preferably 7% or more and 21% or less. When the thickness D2A is within this range, far infrared rays can be appropriately transmitted and peeling can be appropriately suppressed.

[0061] The surface of the outermost layer 42 opposite the substrate 30 is referred to as the surface 42a. The surface 42a is the surface exposed to the outside, and in this embodiment, it can be said to be the surface facing the vehicle exterior. In this case, the arithmetic mean roughness Ra (surface roughness) of the surface 42a of the outermost layer 42 is preferably 7.0 nm or less, more preferably 5.0 nm or less, even more preferably 4.0 nm or less, and most preferably 3.0 nm or less. By having the arithmetic mean roughness Ra of the surface 42a within this range, the dynamic friction coefficient and the change in surface roughness before and after abrasion can be reduced, and peeling can be more appropriately suppressed. Note that the arithmetic mean roughness Ra refers to the arithmetic mean roughness Ra specified in JIS B 0601:2001.

[0062] The outermost layer 42 is capable of transmitting far-infrared rays. The extinction coefficient of the outermost layer 42 with respect to light having a wavelength of 10 μm is preferably 0.10 or less, more preferably 0.05 or less, and even more preferably 0.04 or less. The extinction coefficient can be determined by fitting an optical model using, for example, polarization information obtained by an infrared spectroscopic ellipsometer (IR-VASE-UT, manufactured by J.A. Woollam Co.) and a spectral transmission spectrum obtained by a Fourier transform infrared spectrometer.

[0063] The refractive index of the outermost layer 42 with respect to light having a wavelength of 550 nm (visible light) is preferably 2.05 or more, more preferably 2.05 or more and 2.40 or less, even more preferably 2.10 or more and 2.30 or less, and particularly preferably 2.15 or more and 2.25 or less. When the refractive index of the outermost layer 42 with respect to visible light falls within this numerical range, the film density of the outermost layer 42 can be improved, and high-strength peeling can be more appropriately suppressed.

[0064] (Functional Layer) The functional layer 44 is capable of transmitting far infrared rays. In the example of the present embodiment, an example in which the functional layer 44 is composed of only one layer will be described, but the present invention is not limited thereto, and the functional layer 44 may be composed of a plurality of layers stacked one on top of the other.

[0065] The functional layer 44 is made of Si, Ge, MgO, ZnO, ZrO ｘ , NiO Ｘ and Bi ２ O３ It is preferable that at least one of the above is the main component. Here, the main component may refer to a content of 50 mass% or more relative to the entire functional layer 44. The content of the main component in the functional layer is 50 mass% or more and 100 mass% or less, preferably 70 mass% or more and 100 mass% or less, and more preferably 90 mass% or more and 100 mass% or less relative to the entire anti-reflection layer. Furthermore, it is preferable that the content of the main component in the functional layer 44 is 100 mass% of the main component alone, i.e., excluding unavoidable impurities. When the content of the main component in this range, the functional layer can suppress reflection of far-infrared rays and appropriately transmit far-infrared rays. Nickel oxide is known to have multiple compositions depending on the valence of nickel, and X can take any value from 0.5 to 2. Furthermore, the valence does not have to be single, and two or more valences may be mixed. In this embodiment, NiO ｘ It is preferable to use NiO as the oxide.

[0066] The thickness D2B of the functional layer 44 is preferably 800 nm to 3000 nm, more preferably 1000 nm to 2000 nm, and even more preferably 1100 nm to 1500 nm. Furthermore, the ratio of the thickness D2B of the functional layer 44 to the thickness D2 of the anti-reflection film is preferably 75% to 99%, more preferably 75% to 97%, even more preferably 75% to 95%, and most preferably 79% to 93%. Having the thickness D2B of the functional layer 44 within this range suppresses reflection of far-infrared rays and allows the far-infrared rays to be properly transmitted. The thickness D2B of the functional layer 44 can also be considered the length in the Z direction from the surface of the functional layer 44 on the Z-direction side to the surface opposite the Z-direction.

[0067] The functional layer 44 is capable of transmitting far-infrared rays. The functional layer preferably has an extinction coefficient of 0.05 or less, more preferably 0.03 or less, even more preferably 0.02 or less, and most preferably 0.01 or less, for light with a wavelength of 10 μm. When the extinction coefficient is in this range, far-infrared rays can be transmitted appropriately.

[0068] 5, the anti-reflection film 40A has a two-layer structure of the outermost layer 42 and the functional layer 44, but a hue adjustment layer may be provided between the outermost layer 42 and the functional layer 44. The hue adjustment layer will be described in detail below.

[0069] The hue-adjusting layer is a layer for ensuring design by reducing the difference in reflectance (reflectance dispersion) for visible light of different wavelengths and suppressing interference colors of the transmissive member 20 .

[0070] The hue-adjusting layer is capable of transmitting far-infrared rays. The hue-adjusting layer preferably has an extinction coefficient of 0.4 or less, more preferably 0.2 or less, and even more preferably 0.1 or less, for light with a wavelength of 10 μm. The extinction coefficient within this range allows the far-infrared rays to be transmitted appropriately.

[0071] The thickness of the hue adjustment layer is preferably 5 nm to 100 nm, more preferably 10 nm to 60 nm, and even more preferably 20 nm to 50 nm. Furthermore, the ratio of the thickness of the hue adjustment layer to the thickness D2A of the outermost layer 42 is preferably 2.5% to 100%, more preferably 5% to 50%, even more preferably 10% to 30%, and most preferably 10% to 25%. Having the thickness of the hue adjustment layer within this range allows for appropriate transmission of far infrared rays while suppressing the reflection and dispersion of visible light, making the transmissive member 20 less noticeable. The thickness of the hue adjustment layer can also be considered as the length in the Z direction from the surface of the hue adjustment layer facing the Z direction to the surface opposite the Z direction.

[0072] Fig. 8 is a schematic cross-sectional view of a transmissive member according to another example of this embodiment. While the hue-adjusting layer may have any structure, in this embodiment, as shown in Fig. 8, the hue-adjusting layer included in the anti-reflection film 40 includes a first layer 42a and a second layer 44a provided on the outermost layer 42 side of the first layer 42a (on the vehicle exterior side in the case of anti-reflection film 40A, and on the vehicle interior side in the case of anti-reflection film 40B).

[0073] In this embodiment, the first layer 42a is made of the same material and has the same characteristics as the outermost layer 42. However, the thickness of the first layer 42a is preferably 10 nm to 40 nm, more preferably 15 nm to 35 nm, and even more preferably 20 nm to 30 nm. Furthermore, the ratio of the thickness D2C of the first layer 42a to the thickness D2A of the outermost layer 42 is preferably 1.5% to 60%, more preferably 3% to 30%, even more preferably 6% to 20%, and most preferably 6% to 15%. In this embodiment, the second layer 44a is made of the same material and has the same characteristics as the functional layer 44. However, the thickness D2D of the second layer 44a is preferably 5 nm to 40 nm, more preferably 5 nm to 25 nm, and even more preferably 10 nm to 20 nm. Furthermore, the ratio of the thickness D2D of the second layer 44a to the thickness D2A of the outermost layer 42 is preferably 1% or more and 40% or less, more preferably 2% or more and 20% or less, even more preferably 4% or more and 12% or less, and most preferably 4% or more and 10% or less. In this example, the hue-adjusting layer is composed of two layers, the first layer 42a and the second layer 44a. However, this is not limited thereto; multiple laminates of the first layer 42a and the second layer 44a may be stacked. The hue-adjusting layer is preferably a layer in which the first layer 42a and the second layer 44a are alternately stacked in a number of 2n (n is a natural number greater than or equal to 1) layers from the substrate 30 side. The thickness ratio of each layer in the color-adjusting layer is preferably such that the layer with a lower refractive index for light with a wavelength of 550 nm (visible light) has a higher thickness. By ensuring that the stacking order and number of layers in the hue-adjusting layer fall within this range, reflection and dispersion of visible light can be suppressed, making the transparent member 20 less noticeable. However, the configuration of the hue adjustment layer is not limited to including a first layer 42a made of the same material as the outermost layer 42 and a second layer 44a made of the same material as the functional layer 44, and may be any configuration. In other words, the hue adjustment layer may be a layer whose refractive index with respect to light with a wavelength of 550 nm (visible light) is different from that of both the outermost layer 42 and the functional layer 44. The refractive index of the hue adjustment layer with respect to light with a wavelength of 550 nm (visible light) is preferably 2.2 or more and 2.5 or less, and more preferably 2.3 or more and 2.4 or less.When the refractive index of the hue-adjusting layer for visible light falls within this range, it is possible to suppress the reflection and dispersion of visible light, and make the transmissive member 20 less noticeable.

[0074] (Anti-reflection film on vehicle interior side) The above explanation has been made regarding the anti-reflection film 40A on the vehicle exterior side and the layers included therein (the outermost layer 42, the functional layer 44, and the hue-adjusting layer). In contrast, the anti-reflection film 40B on the vehicle interior side may have the same configuration as the anti-reflection film 40A. That is, for example, the anti-reflection film 40B may be formed by laminating the functional layer 44 and the outermost layer 42 in this order from the substrate 30 toward the vehicle interior side. Furthermore, the anti-reflection film 40B may have a hue-adjusting layer between the functional layer 44 and the outermost layer 42.

[0075] (Adhesion Layer) The adhesion layer 50A is provided between the antireflection film 40A and the substrate 30. The adhesion layer 50A is a film that adheres the antireflection film 40A to the substrate 30, in other words, a film that improves the adhesive strength between the antireflection film 40A and the substrate 30. In this embodiment, as shown in Figures 5 and 8, the adhesion layer 50A is provided between the functional layer 44 of the antireflection film 40A that is closest to the substrate 30 and the substrate 30, and adheres them together.

[0076] The adhesive layer 50A is made of ZrO ｘ , TiO ｘ , ZnO, Al ｘ O ｙ , and Nb ｘ O ｙ The adhesive layer 50A contains at least one of ZrO ２ Preferably, the main component is a ZnO-based material, and more preferably, ZnO is used as the main component. Here, the main component may refer to a content of 50% by mass or more relative to the entire adhesion layer 50A. The content of the main component in the adhesion layer 50A is 50% by mass or more and 100% by mass or less, preferably 70% by mass or more and 100% by mass or less, and more preferably 90% by mass or more and 100% by mass or less relative to the entire adhesion layer 50A. Furthermore, the adhesion layer 50A preferably contains the main component alone, i.e., the main component content excluding unavoidable impurities is 100% by mass. By including such a main component, the adhesion layer 50A can adequately transmit far infrared rays and suppress peeling of the anti-reflection film 40A.

[0077] The adhesive layer 50A may contain a secondary component other than the main component. The secondary component is preferably an oxide that transmits far infrared rays, such as MgO, CuO, or the like. ｘ , NiO ｘ , and B ２ O ３ At least one of the following can be mentioned.

[0078] The thickness D3 of the adhesion layer 50A is preferably 0.01 μm or more and 0.5 μm or less, more preferably 0.02 μm or more and 0.3 μm or less, and even more preferably 0.03 μm or more and 0.1 μm or less. Having the thickness of the adhesion layer 50A within this range allows for appropriate adhesion between the substrate 30 and the intermediate layer 34 while appropriately suppressing reflection of far infrared rays. The thickness D3 of the adhesion layer 50A can also be considered as the length in the Z direction from the surface of the adhesion layer 50A on the Z direction side to the surface opposite the Z direction. The ratio of the thickness D3 of the adhesion layer 50A to the thickness D1 of the substrate 30 is preferably 0.0002% or more and 0.1% or less, more preferably 0.0004% or more and 0.06% or less, and even more preferably 0.0006% or more and 0.02% or less. Furthermore, the ratio of the thickness D3 of the adhesion layer 50A to the thickness D2 of the anti-reflection film 40 is preferably 0.5% to 50%, more preferably 1.0% to 30%, and even more preferably 1.5% to 10%. When the thickness D3 is in this range, far infrared rays can be appropriately transmitted and peeling of the anti-reflection film 40A can be suppressed.

[0079] The adhesive layer 50A is capable of transmitting far-infrared rays. The adhesive layer 50A preferably has an extinction coefficient of 0.4 or less, more preferably 0.2 or less, and even more preferably 0.1 or less, for light with a wavelength of 10 μm. When the extinction coefficient is in this range, far-infrared rays can be transmitted appropriately.

[0080] (Interior Adhesion Layer) In the above description, the exterior adhesion layer 50A has been described. In contrast, the interior adhesion layer 50B may be made of the same material and have the same configuration as the exterior adhesion layer 50A.

[0081] (Characteristics of the Transmissive Member) The characteristics of the transmissive member 20 configured as above will be described below.

[0082] (Transmittance) The transmittance of the transparent member 20 to 10 μm light is preferably 50% or more, more preferably 65% ​​or more, and even more preferably 70% or more. Furthermore, the average transmittance of the transparent member 20 to light with a wavelength of 8 μm to 12 μm is preferably 50% or more, more preferably 65% ​​or more, and even more preferably 70% or more. When the transmittance and average transmittance are within this range, the function as an infrared transparent member can be appropriately exhibited.

[0083] (Reflectance) The reflectance of the transparent member 20 for 10 μm light is preferably 15% or less, more preferably 10% or less, and even more preferably 5% or less. Furthermore, the average reflectance of the transparent member 20 for light with wavelengths of 8 μm to 12 μm is preferably 15% or less, more preferably 10% or less, and even more preferably 5% or less. Having the reflectance and average reflectance within these ranges allows the member to properly function as an infrared transparent member. Note that the average reflectance is the average value of the reflectance for light of each wavelength in the wavelength band (here, 8 μm to 12 μm). The reflectance can be measured, for example, using a Fourier transform infrared spectrometer (Nicolet iS10, manufactured by ThermoScientific).

[0084] (Indentation Hardness) The indentation hardness of the surface 20A (i.e., the surface 42a of the outermost layer 42) on the vehicle exterior side of the transparent member 20 in a range of 90 to 110 nm in depth is preferably 9.0 GPa or more, more preferably 10.0 GPa or more, even more preferably 11.0 GPa or more, particularly preferably 12.0 GPa or more, and most preferably 13.0 GPa or more. Having the indentation hardness of the surface 20A in this range can appropriately suppress high-strength peeling. The indentation hardness of the surface 20A refers to the indentation hardness (indentation hardness) measured by a nanoindenter using a nanoindenter by a nanoindentation method (continuous stiffness measurement method) in a range of 90 to 110 nm in depth. More specifically, the indentation hardness is a value obtained from the displacement-load curve from loading to unloading of the measuring indenter, and is specified in ISO 14577. The indentation hardness can be measured as follows. Specifically, a KLA iMicro nanoindenter is used to continuously measure the indentation depth h (nm) corresponding to the indentation load P (mN) throughout the entire process from the start of loading to unloading at the measurement point, and a P-h curve is created. From the created P-h curve, the indentation hardness H (GPa) is calculated using the following equation (5).

[0085] H=P / A...(5)

[0086] In equation (5), P is the indentation load (mN), and A is the projected area of ​​the indenter (μm ２ In this embodiment, the indentation hardness H in the indentation depth range of 90 nm to 110 nm is defined as the indentation hardness of the surface 20A. That is, in this embodiment, it is preferable that the indentation hardness H satisfies the above range in the entire indentation depth range of 90 nm to 110 nm.

[0087] (Δa ＊ b ＊ ) The transmitting member 20 is Δa ＊ b ＊is preferably 5 or less, more preferably 4 or less, even more preferably 3 or less, particularly preferably 2 or less, and most preferably 1 or less. ＊ b ＊ is a value in the CIE-Lab color system obtained from the 5-degree incident visible light reflectance spectrum ＊ b ＊ It refers to the distance from the origin coordinate. ＊ b ＊ is calculated by the following formula (6): ＊ b ＊ When the color is in this range, the visible light reflected from the transparent member 20 has a neutral color, and an appearance that ensures designability can be achieved.

[0088] Δa ＊ b ＊ = (a ＊２ +b ＊２ ) ０．５ ...(6)

[0089] a ＊ and b ＊ are the chromaticity coordinates of reflected light in the CIE-Lab color system when standard illuminant D65 is used as illumination light, and can be calculated based on JIS Z 8781-4 using the spectral reflectance measured based on JIS R3106.

[0090] (Tape Test) When the tape test described below is performed on the transparent member 20, the surface (the surface on which the anti-reflection film 40 is provided) does not peel off. The tape test here is a test in which tape having an adhesive strength of 10 N±1 N per 25 mm width is attached to five locations on the surface of the transparent member according to the provisions of IEC 60454-2 and then peeled off. That is, after the tape is attached to the surface of the transparent member (e.g., surface 20A), the tape is peeled off five times, with the tape attached to different positions on the surface. Note that the tape attachment position in the five attachments may be arbitrary. When the tape is attached and peeled off five times in this manner, the surface of the transparent member 20 does not peel off. Here, "the surface does not peel off" means that at least a portion of the portion of the transparent member 20 attached to the tape is peeled off from the transparent member 20 while remaining attached to the peeled tape.

[0091] Since the transparent member 20 does not peel off the surface when a tape test is performed, low-strength peeling of the anti-reflection coating 40 can be suppressed. Any means may be used to prevent the surface from peeling off when a tape test is performed. For example, in the manufacturing method of the transparent member 20 described below, the substrate 30 is plasma cleaned to remove carbon components from the surface of the substrate 30, thereby preventing surface peeling when a tape test is performed. Furthermore, by appropriately selecting the material of the substrate 30, surface peeling when a tape test is performed can be prevented. For example, by selecting a substrate 30 with a low carbon component on the surface (i.e., a high level of cleanliness), surface peeling when a tape test is performed can be prevented. Furthermore, by appropriately selecting the material of the adhesion layer 50, surface peeling when a tape test is performed can be prevented. For example, by using ZnO as a main component of the adhesion layer 50, surface peeling when a tape test is performed can be prevented.

[0092] (Cut Tape Test) When the cut tape test described below is performed on the transparent member 20, it is preferable that the surface (the surface on which the antireflection film 40 is provided) does not peel off. The tape test here is performed in accordance with the provisions of JIS K5600-5-6: Adhesion (Cross-Cut Method), in which a glass cutter (diamond cutting edge, fixed type, blade angle 135°) is used to make an incision on the surface of the transparent member 20. When the cut tape test is performed in this manner, the surface of the transparent member 20 does not peel off. Here, "the surface does not peel off" means that at least a portion of the portion incised with the glass cutter peels off from the transparent member 20.

[0093] In this way, when the cutting tape test is performed, the surface of the transmitting member 20 does not peel off, which indicates that the resistance to high-strength peeling that occurs when scratches are involved is improved. By setting the oxide ratio of the substrate 30 in the above-described range, the surface of the transmitting member 20 does not peel off when the cutting tape test is performed, and the resistance to high-strength peeling can be improved.

[0094] (Shape of the Transparent Member) As shown in FIG. 3 , the exterior surface 20A of the transparent member 20 is preferably formed flush (continuous) with the exterior surface of the light-shielding region A2. In other words, the exterior surface 20A of the transparent member 20 is attached so as to be continuous with the surface 12A of the glass substrate 12. By making the surface 20A of the transparent member 20 continuous with the surface 12A of the glass substrate 12 in this manner, the wiping effect of the wiper can be prevented from being impaired. In addition, the presence of a step can be prevented from impairing the design of the vehicle V, and the risk of sand and dust accumulating on the step can be prevented. Furthermore, the transparent member 20 is preferably shaped to fit the curved shape of the vehicle glass 1 to which it is applied. The method for shaping the transparent member 20 is not particularly limited, but polishing or molding can be selected depending on the curved shape and the member.

[0095] The shape of the transparent member 20 is not particularly limited, but it is preferably a plate-like shape that matches the shape of the opening 19. That is, for example, if the opening 19 is circular, the transparent member 20 is preferably disc-shaped (cylindrical). From the standpoint of design, the surface shape of the transparent member 20 on the vehicle exterior side may be processed to match the curvature of the outer surface shape of the glass substrate 12. Furthermore, for reasons such as achieving both a wider viewing angle of the far-infrared camera CA1 and improved mechanical properties, the transparent member 20 may be lenticular. This configuration is preferable because it allows the far-infrared light to be efficiently focused even if the area of ​​the transparent member 20 is small. In this case, the number of lens-shaped transparent members 20 is preferably one to three, and typically two. Furthermore, it is particularly preferable that the lens-shaped transparent member 20 is pre-aligned and modularized, and is integrated with a housing or bracket that adheres the far-infrared camera CA1 to the vehicle glass 1.

[0096] In the vehicle glass 1 of this embodiment, the area of ​​the opening 19 on the vehicle interior surface may be smaller than the area of ​​the opening 19 on the vehicle exterior surface, and the shape of the transparent member 20 may also be such that the area on the vehicle interior surface is smaller than the area on the vehicle exterior surface accordingly. This configuration improves the resistance and strength against impact when the transparent member 20 is pushed in from the vehicle exterior. Furthermore, if the vehicle glass 1 of this embodiment is a laminated glass including a glass substrate 12 (vehicle exterior side) and a glass substrate 14 (vehicle interior side), the opening 19 is formed by overlapping the opening 12a of the glass substrate 12 and the opening 14a of the glass substrate 14. In this case, the area of ​​the opening 12a of the glass substrate 12 may be larger than the area of ​​the opening 14a of the glass substrate 14, and a transparent member 20 matching the size of the opening 12a of the glass substrate 12 may be disposed within the opening 12a of the glass substrate 12. In another embodiment (not shown), the area of ​​the opening 12a of the glass substrate 12 may be made smaller than the area of ​​the opening 14a of the glass substrate 14, and the transparent member 20 may be disposed within the opening 12a of the glass substrate 12. This configuration allows for less precision in aligning the opening 19 when the glass substrate 12 (on the vehicle exterior side) and the glass substrate 14 are laminated with the intermediate layer 16, thereby improving processing yield. In yet another embodiment (not shown), the area of ​​the opening 12a of the glass substrate 12 and the area of ​​the opening 14a of the glass substrate 14 may be made the same, and the transparent member 20 may be disposed within the opening 12a of the glass substrate 12. In this configuration, the glass substrate 12 and the glass substrate 14 are laminated in advance with the intermediate layer 16 interposed therebetween, and the opening 19 is then formed in the laminated glass structure all at once. By forming the opening 19 in the laminated glass structure, the process load for aligning the openings is not imposed and the number of processing steps can be further reduced, thereby lowering manufacturing costs, compared to when an opening is provided in each of the glass substrates 12 (exterior side of the vehicle) and 14 (interior side of the vehicle). The relationship in size between the opening in the glass substrate 12 and the opening in the glass substrate 14 can be appropriately selected taking the above-mentioned advantages into consideration.

[0097] As shown in FIG. 3 , the length d1 of the longest straight line connecting any two points on the exterior surface of the transparent member 20 is preferably 80 mm or less. The length d1 is more preferably 70 mm or less, and even more preferably 65 mm or less. The length d1 is preferably 60 mm or more. As shown in FIG. 3 , the length d2 of the longest straight line connecting any two points on the exterior surface of the opening 19 in the far-infrared transmitting region B is preferably 80 mm or less. The length d2 is more preferably 70 mm or less, and even more preferably 65 mm or less. The length d2 is preferably 60 mm or more. The length d2 can also be considered the length of the longest straight line connecting any two points on the outer periphery of the opening 19 on the exterior surface (surface 12A) of the vehicle glass 1. By setting the length d1 of the transparent member 20 and the length d2 of the opening 19 within this range, a decrease in the strength of the vehicle glass 1 can be suppressed, and the amount of perspective distortion around the opening 19 can also be suppressed. Note that, when the shape of the vehicle exterior surface of the transparent member 20 is circular, the lengths d1 and d2 are lengths corresponding to the diameter of the vehicle exterior surface. Furthermore, the lengths d1 and d2 here refer to the lengths of the vehicle glass 1 in a state in which it is mounted on the vehicle V. For example, when the glass is bent into a shape to be mounted on the vehicle V, the lengths d1 and d2 are the lengths in a state after bending. The same applies to the descriptions of dimensions and positions other than the lengths d1 and d2 unless otherwise specified.

[0098] (Method for Manufacturing the Transmitting Member) The transmitting member 20 may be manufactured by any method, but an example of a method for manufacturing the transmitting member 20 will be described below.

[0099] (Cleaning Process) In this embodiment, the substrate 30 is prepared, and a cleaning process is performed to clean the substrate 30. In the cleaning process, the surface of the substrate 30 is plasma cleaned using Ar ions. That is, for example, the substrate 30 is placed in a space such as a container, and after air is discharged from the space, gaseous argon is supplied into the space. Then, a voltage is applied to electrodes provided in the space to convert the argon into plasma and generate Ar ions, and the surface of the substrate 30 is cleaned with the Ar ions. This removes unnecessary substances such as carbon from the surface of the substrate 30, cleans the surface of the substrate 30, and makes it possible to suppress low-strength peeling of the surface of the transmitting member 20.

[0100] In the cleaning process, the cleaning time using Ar ions is preferably 10 seconds to 10 minutes, more preferably 10 seconds to 5 minutes, and even more preferably 1 minute to 2 minutes. By setting the lower limit of the cleaning time within this range, the surface of the substrate 30 can be properly cleaned and low-strength peeling of the surface of the transmitting member 20 (i.e., peeling of the anti-reflection coating 40 from the substrate 30) can be suppressed. Furthermore, by setting the upper limit of the cleaning time within this range, oxidation of the surface of the substrate 30 can be suppressed, reducing the oxide ratio of the substrate 30 and appropriately suppressing high-strength peeling of the transmitting member 20. That is, even when Ar ions are used, the degree of oxidation of the substrate 30 may increase if cleaning is performed for a long period of time. However, by setting the upper limit of the cleaning time within this range, the degree of oxidation of the surface of the substrate 30 can be suppressed. The cleaning time may refer to the time from the start of voltage application to the end of voltage application. Furthermore, in the cleaning step, the power applied to the electrodes is preferably 1000 kW to 5000 kW, more preferably 2000 kW to 4000 kW, and even more preferably 2500 kW to 3500 kW. By applying power within this range, the surface of the substrate 30 can be properly cleaned, and high-strength peeling of the transparent member 20 can be properly suppressed while low-strength peeling of the surface of the transparent member 20 is suppressed.

[0101] In the cleaning step, the substrate 30 may be cleaned with a liquid (such as acetone, ethanol, or pure water) and dried, and then placed in a container and plasma cleaned.

[0102] (Laminating Step) In this embodiment, the transmissive member 20 is manufactured by performing a laminating step of laminating the adhesive layer 50 and the anti-reflection film 40 in this order on the substrate 30 after plasma cleaning.

[0103] In the lamination step, the adhesion layer 50 and the anti-reflection film 40 may be laminated by any method, for example, by sputtering. In this case, any sputtering method may be used, for example, reactive sputtering or post-oxidation sputtering may be used, and post-oxidation sputtering is preferably used.

[0104] (Effects) As described above, the transmitting member 20 according to the first aspect of the present disclosure includes the base material 30 containing M, which is Si or Ge, as a main component, and the ZrO ｘ , TiO ｘ , ZnO, Al ｘ O ｙ , and Nb ｘ O ｙ and an antireflection film 40 provided on the adhesion layer 50. When the surface of the substrate 30 of the transparent member 20 is measured by XPS, the ratio of the peak intensity of the M-O bond to the peak intensity of the M-M bond (oxide ratio) is 7.5% or less. Furthermore, when a tape test is performed in accordance with the provisions of IEC 60454-2, in which tape having an adhesive strength of 10 N±1 N per 25 mm width is attached to five locations on the surface of the transparent member 20 and then pulled off, the surface of the transparent member 20 does not peel off.

[0105] Here, an anti-reflection film 40 may be provided on the substrate 30 of the transparent member 20 to properly transmit light such as far-infrared rays. However, providing the anti-reflection film 40 on the substrate 30 in this manner may cause the anti-reflection film 40 to peel off due to a low-intensity external force that does not cause scratches, or may damage the surface of the transparent member 20 and cause peeling due to a high-intensity external force that causes scratches. In contrast, the transparent member 20 according to this embodiment has an adhesion layer 50 provided between the substrate 30 and the anti-reflection film 40, and the surface does not peel off in a tape test. This appropriately prevents peeling of the surface of the transparent member 20 due to a low-intensity external force (low-intensity peeling). Furthermore, the inventors have found that if the oxide ratio of the substrate 30 is too high, the adhesion of the adhesion layer 50 to the substrate 30 decreases, reducing resistance to peeling due to a high-intensity external force (high-intensity peeling). However, by setting the oxide ratio of the substrate 30 within the above range, it is possible to prevent a decrease in adhesion and improve resistance to high-intensity peeling. That is, in the transmitting member 20 according to this embodiment, the oxide ratio of the substrate 30 is 7.5% or less, and therefore it is possible to appropriately improve resistance to high-strength peeling.

[0106] The transmitting member 20 according to the second aspect of the present disclosure includes a substrate 30 containing Si or Ge as a main component, and a ZrO ｘ , TiO ｘ , ZnO, Al ｘ O ｙ , and Nb ｘ O ｙand an anti-reflection film 40 provided on the adhesion layer 50. The substrate 30 includes a base material layer 30A mainly composed of M and an oxide layer 30B, which is a layer of an oxide of M, formed on the surface of the base material layer 30A, and the thickness of the oxide layer 30B is less than 5 nm. Furthermore, when a tape test is performed in accordance with the provisions of IEC 60454-2, in which tape having an adhesive strength of 10 N±1 N per 25 mm width is attached to five locations on the surface of the transparent member 20 and then pulled, the surface of the transparent member 20 does not peel. According to the present disclosure, the adhesion layer 50 is provided between the substrate 30 and the anti-reflection film 40, and the surface does not peel in the tape test. This makes it possible to appropriately suppress peeling of the surface of the transparent member 20 due to a low-strength external force (low-strength peeling). Furthermore, the present inventors have found that if the oxide layer 30B is too thick, the adhesion of the adhesion layer 50 to the substrate 30 decreases, and resistance to peeling due to a strong external force (high-strength peeling) decreases, but by setting the thickness of the oxide layer 30B within the above range, it is possible to suppress the decrease in adhesion and improve resistance to high-strength peeling. That is, in the transmitting member 20 according to this embodiment, the thickness of the oxide layer 30B is less than 5.0 nm, and therefore resistance to high-strength peeling can be appropriately improved.

[0107] The transparent member 20 according to the third aspect of the present disclosure is the transparent member 20 according to the first or second aspect, wherein the thickness D1 of the substrate 30 is preferably 0.5 mm or more and 5 mm or less, the thickness D3 of the adhesion layer 50 is preferably 0.02 μm or more and 0.5 μm or less, and the thickness D2 of the antireflection coating 40 is preferably 800 nm or more and 3000 nm or less. By setting the thicknesses in this manner, low-strength peeling and high-strength peeling on the surface of the transparent member 20 can be appropriately suppressed.

[0108] The transparent member 20 according to a fourth aspect of the present disclosure is the transparent member 20 according to any one of the first to third aspects, and preferably contains Si as a main component of the base material 30. By using such a base material 30, low-strength peeling and high-strength peeling on the surface of the transparent member 20 can be appropriately suppressed.

[0109] The transmitting member 20 according to a fifth aspect of the present disclosure is the transmitting member 20 according to any one of the first to fourth aspects, wherein the adhesive layer 50 is made of ZrO２ By using such an adhesive layer 50, it is possible to appropriately suppress low-strength peeling and high-strength peeling of the surface of the transmitting member 20.

[0110] The transmissive member 20 according to a sixth aspect of the present disclosure is the transmissive member 20 according to any one of the first to fifth aspects, wherein the anti-reflection film 40 is made of MgO, ZrO ｘ , NiO ｘ , ZnO, Si, Ge, B ２ O ３ It is preferable that the functional layer 44 contains at least one of the above as a main component. This allows the far-infrared rays to be transmitted appropriately while suppressing the interference color of the transmitting member 20, thereby ensuring design.

[0111] The transparent member 20 according to the seventh aspect of the present disclosure is the transparent member 20 according to any one of the first to sixth aspects, and is preferably mounted on a vehicle. The transparent member 20 is suitable for use in a vehicle.

[0112] The method for manufacturing the transmission member 20 according to the eighth aspect of the present disclosure includes plasma cleaning the surface of the substrate 30 containing M, which is Si or Ge, as a main component, using Ar ions, and depositing Si, Ge, MgO, NiO, etc., on the plasma-cleaned surface of the substrate 30. ｘ , CuO ｘ , ZnS, Al ２ O ３ , ZrO ２ , SiO ２ , TiO ２ , ZnO, and Bi ２ O ３ and manufacturing a transparent member 20 by laminating, in this order, an adhesion layer 50 containing at least one of the above as a main component and an antireflection film 40. When the surface of the substrate 30 of the transparent member 20 is measured by XPS, the ratio of the peak intensity of the M-O bond to the peak intensity of the M-M bond (oxide ratio) is 7.5% or less. Furthermore, when a tape test is performed in accordance with the provisions of IEC 60454-2, in which tape having an adhesive strength of 10 N±1 N per 25 mm width is attached to five locations on the surface of the transparent member 20 and then pulled, the surface of the transparent member 20 does not peel. According to the present disclosure, low-strength peeling and high-strength peeling of the surface of the transparent member 20 can be appropriately suppressed.

[0113] The method for manufacturing the transmission member 20 according to the ninth aspect of the present disclosure includes plasma cleaning the surface of the substrate 30 containing M, which is Si or Ge, as a main component, using Ar ions, and depositing Si, Ge, MgO, NiO, etc., on the plasma-cleaned surface of the substrate 30. ｘ , CuO ｘ , ZnS, Al ２ O ３ , ZrO ２ , SiO ２ , TiO ２ , ZnO, and Bi ２ O ３ and manufacturing a transparent member 20 by laminating, in this order, an adhesion layer 50 containing at least one of the above as a main component and an antireflection film 40. The substrate 30 includes a base material layer 30A containing M as a main component and an oxide layer 30B, which is a layer of an oxide of M, formed on the surface of the base material layer 30A, and the oxide layer 30B has a thickness of less than 5 nm. Furthermore, when a tape test is performed in accordance with the provisions of IEC 60454-2, in which tape having an adhesive strength of 10 N±1 N per 25 mm width is attached to five locations on the surface of the transparent member 20 and then pulled, the surface of the transparent member 20 does not peel. According to the present disclosure, low-strength peeling and high-strength peeling of the surface of the transparent member 20 can be appropriately suppressed.

[0114] EXAMPLES The present invention will be specifically described below with reference to examples, but the present invention is not limited thereto. Table 1 shows the layer structure of the transmitting member of each example and the evaluation results.

[0115]

[0116] Example 1 In Example 1, a substrate made of Si (manufactured by Atopical Corp.) was not subjected to plasma cleaning, and ZrO was applied to both sides of the substrate. ２ film (adhesion layer), NiO film (anti-reflection film; functional layer), ZrO ２ Film (anti-reflection film; hue adjustment layer 1), NiO film (anti-reflection film; hue adjustment layer 2), ZrO ２ A film (anti-reflection film; outermost layer) was formed by sputtering under the following film-forming conditions in this order to obtain a transparent member: substrate, ZrO ２The thicknesses of the NiO film and NiO film are shown in Table 1. The thickness of the substrate was measured with a digital caliper (CD-15CX, manufactured by Mitutoyo Corporation).

[0117] (ZrO ２ Film formation conditions) Apparatus: Load-lock sputtering apparatus (RAS-1100BII, manufactured by Shincron) Target: Zr target Sputtering gas: Ar gas (flow rate: 150 sccm) Input power: 6 kW Reactive gas: O ２ (Flow rate: 100 sccm) RF power: 4 kW Film formation pressure: 0.20 Pa

[0118] (NiO ｘ Film formation conditions) Target: NiO (70 mass%) + Ni (30 mass%) mixed target Sputtering gas: Ar gas (flow rate: 150 sccm) Input power: 6 kW Reactive gas: Ar (flow rate 70 sccm) + O ２ (Flow rate: 10 sccm) RF power: 4 kW Film formation pressure: 0.20 Pa

[0119] The oxide ratio (M-O bond peak intensity / M-M bond peak intensity) of the obtained substrate of the transmitting member was measured by the method described in the above embodiment. Furthermore, a tape test was performed on the obtained transmitting member by the method described in the above embodiment. The results are shown in Table 1.

[0120] (Example 2) In Example 2, the same substrate as in Example 1 was subjected to plasma cleaning under the following conditions. Then, ZrO was deposited on the plasma-cleaned substrate under the same conditions as in Example 1. ２ film (adhesion layer), NiO film (anti-reflection film; functional layer 1), ZrO ２ Film (anti-reflection film; hue adjustment layer 1), NiO film (anti-reflection film; hue adjustment layer 2), ZrO ２ A film (anti-reflection film; outermost layer) was formed in this order to obtain a transparent member. ２ The thicknesses of the NiO film and NiO film are shown in Table 1. The oxide ratio and tape test results for the obtained transmitting member are shown in Table 1. In Example 2, the thickness of the oxide layer of the substrate was measured by the method described in the above embodiment. The results are shown in Table 1.

[0121] (Plasma cleaning conditions) Apparatus: load-lock sputtering apparatus (RAS-1100BII, manufactured by Shincron) Gas: Ar gas Input power: 3 kW Cleaning time: 20 minutes

[0122] In Examples 3 and 4, transmission members were obtained under the same conditions as in Example 2, except that the plasma cleaning conditions were as shown in Table 1. The oxide ratios and tape test results for the obtained transmission members were as shown in Table 1. For Example 4, the thickness of the oxide layer of the substrate was measured in the same manner as in Example 2.

[0123] In Example 5, a transmission member was obtained under the same conditions as in Example 1, except that ZnO was used as the adhesion layer and the thickness of each layer was as shown in Table 1. The oxide ratio and tape test results for the obtained transmission member were as shown in Table 1.

[0124] In Example 6, a transmission member was obtained under the same conditions as in Example 5, except that plasma cleaning was performed under the conditions shown in Table 1. The oxide ratio and tape test results for the obtained transmission member were as shown in Table 1. Furthermore, the thickness of the oxide layer of the substrate was measured in the same manner as in Example 2.

[0125] In Example 7, a transmission member was obtained under the same conditions as in Example 1, except that a highly clean Si (manufactured by Atoptical Corp.) substrate was used. The oxide ratio and tape test results for the obtained transmission member are shown in Table 1. The thickness of the oxide layer of the substrate was measured in the same manner as in Example 2.

[0126] (Evaluation) For each example, low strength releasability and high strength releasability were evaluated. In the evaluation of low strength releasability, a case where the number of peels in the tape test was 0 was marked as ◯, and a case where the number of peels was 1 or more was marked as ×. In the evaluation of high strength releasability, a cut tape test was performed on the transparent member of each example using the method described in the above embodiment. In the evaluation of high strength releasability, a case where no peeling occurred in the cut tape test was marked as ◯, and a case where peeling occurred was marked as ×. A case where both low strength releasability and high strength releasability were marked as ◯ was evaluated as pass, and a case where at least one of low strength releasability and high strength releasability was marked as × was evaluated as fail.

[0127] As shown in Table 1, in Example 1 (Comparative Example), in which peeling was performed in the tape test without plasma cleaning, both low-strength peelability and high-strength peelability were evaluated as "x," indicating that peeling could not be adequately suppressed. Furthermore, in Examples 2 and 6 (Comparative Examples), in which the oxide ratio of the substrate and the oxide layer thickness were high, the high-strength peelability was evaluated as "x," indicating that resistance to high-strength peelability could not be adequately improved. On the other hand, in Examples 3 to 5 and 7 (Examples), in which peeling did not occur in the tape test and the oxide ratio and oxide layer thickness were low, it was found that resistance to high-strength peelability could be improved while suppressing low-strength peeling. Furthermore, Example 7 shows that by selecting a substrate with high cleanliness, peeling can be adequately suppressed even without plasma cleaning.

[0128] Although the embodiments of the present invention have been described above, the embodiments are not limited to the contents of these embodiments. Furthermore, the above-described components include those that can be easily imagined by a person skilled in the art, those that are substantially the same, and those that are within the scope of what is called equivalents. Furthermore, the above-described components can be combined as appropriate. Furthermore, various omissions, substitutions, or modifications of the components can be made without departing from the spirit of the above-described embodiments.

[0129] REFERENCE SIGNS LIST 1 Vehicle glass 10, 12, 14 Glass substrate 20 Transmitting member 30 Base material 40, 40A, 40B Anti-reflection film 42 Outermost layer 42a First layer 44 Functional layer 44a Second layer 50 Adhesion layer

Claims

1. A substrate containing Si or Ge as a main component, and a ZrO ｘ , TiO ｘ , ZnO, Al ｘ O ｙ , and Nb ｘ O ｙ and an antireflection film provided on the adhesion layer, wherein a ratio of a peak intensity of an M-O bond to a peak intensity of an M-M bond is 7.5% or less when the surface of the base material is measured by XPS, and when a tape test is performed in which a tape having an adhesive strength of 10 N±1 N per 25 mm width is attached to five points on the surface of the transparent member and then peeled off according to the provisions of IEC 60454-2, the surface of the transparent member does not peel off.

2. A substrate mainly composed of M, which is Si or Ge; and a ZrO ｘ , TiO ｘ , ZnO, Al ｘ O ｙ , and Nb ｘ O ｙ and an anti-reflection film provided on the adhesion layer, wherein the substrate includes a base material layer mainly composed of M, and an oxide layer which is an oxide of M formed on a surface of the base material layer, the oxide layer having a thickness of less than 5 nm, and when a tape test is performed in which a tape having an adhesive strength of 10 N±1 N per 25 mm width is attached to five points on the surface of the transparent member and then peeled off in accordance with the provisions of IEC 60454-2, the surface of the transparent member does not peel off.

3. The transparent member according to claim 1 or 2, wherein the thickness of the substrate is 0.5 mm or more and 5 mm or less, the thickness of the adhesion layer is 0.02 μm or more and 0.5 μm or less, and the thickness of the anti-reflection film is 800 nm or more and 3000 nm or less.

4. The transparent member according to claim 1 or 2, wherein the base material is mainly composed of Si.

5. The adhesion layer is made of ZrO ２ The transparent member according to claim 1 or 2, comprising as a main component.

6. The anti-reflective film is made of MgO, ZrO ｘ , NiO ｘ , ZnO, Si, Ge, B ２ O ３ The transmission member according to claim 1 or 2, comprising a functional layer containing at least one of the following as a main component.

7. The transparent member according to claim 1 or 2, which is mounted on a vehicle.

8. Plasma cleaning the surface of a substrate mainly composed of M, which is Si or Ge, using Ar ions; and depositing ZrO on the plasma-cleaned surface of the substrate. ｘ , TiO ｘ , ZnO, Al ｘ O ｙ , and Nb ｘ O ｙ and laminating, in this order, an adhesion layer mainly composed of at least one of the above and an antireflection film to produce a transparent member, wherein, when the surface of the base material is measured by XPS, the ratio of the peak intensity of an M-O bond to the peak intensity of an M-M bond is 7.5% or less, and when a tape test is performed in which a tape having an adhesion strength of 10 N±1 N per 25 mm width is attached to five points on the surface of the transparent member and then peeled off according to the provisions of IEC 60454-2, the surface of the transparent member does not peel off.

9. Plasma cleaning the surface of a substrate mainly composed of M, which is Si or Ge, using Ar ions; and depositing ZrO on the plasma-cleaned surface of the substrate. ｘ , TiO ｘ , ZnO, Al ｘ O ｙ , and Nb ｘ O ｙ and laminating, in this order, an adhesion layer mainly composed of at least one of the above and an antireflection film to produce a transparent member, wherein the substrate includes a base material layer mainly composed of M, and an oxide layer which is an oxide of M formed on the surface of the base material layer, the oxide layer having a thickness of less than 5 nm, and when a tape test is performed in which a tape having an adhesion strength of 10 N±1 N per 25 mm width is attached to five points on the surface of the transparent member and then peeled off in accordance with the provisions of IEC 60454-2, the surface of the transparent member does not peel off.

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