Apparatus for processing substrate using double bellows by using pneumatic cylinder

Abstract

Disclosed is an apparatus for processing a substrate using double bellows by using a pneumatic cylinder, which blocks noise generated by the rapid movement of a piston, induces smooth motion, and precisely controls the vertical movement of a lower container. The apparatus comprises: double extension parts which are disposed outside a rotary shaft for supporting a substrate chuck and a support shaft for supporting a lower container, and which have double bellows for controlling the vertical movement of the substrate chuck and the lower container; and a second driving part including a pneumatic cylinder for raising or lowering the lower container, wherein the pneumatic cylinder uses a solenoid and is operated by means of a five-port valve for regulating the flow of a fluid.

Description

Substrate processing device using a double bellows pneumatic cylinder

[0001] The present invention relates to a substrate processing device, and more particularly, to a substrate processing device that effectively and precisely moves a container for processing a substrate by means of a double bellows using a pneumatic cylinder.

[0002] Substrate processing equipment manufactures various thin films on substrates such as semiconductor wafers and glass substrates. In particular, plasma can be used to lower process temperatures and increase deposition rates. Plasma uses active species such as radicals and ions to perform micro-processing, such as etching, on the substrate surface. These processing equipment requires precise control of process variables within the chamber, such as gas flow, temperature distribution, and plasma state, to achieve the desired conditions. However, substrate entrances and exits are formed on some of the chamber's sidewalls, which cause asymmetry in the gas flow and temperature distribution within the chamber. This asymmetry results in uneven film thickness and quality, deteriorating the physical properties of various devices.

[0003] Korean Patent No. 10-2317402 proposes a substrate processing device utilizing a double bellows that precisely moves the inner container up and down, preventing substrate chuck shake during the process. To block noise caused by rapid piston movement and ensure smooth operation, a known pneumatic cylinder was used as the second drive unit. However, the known pneumatic cylinder does not provide precise control over the vertical movement of the lower container, necessitating a second drive unit capable of addressing this issue.

[0004] The problem to be solved by the present invention is to provide a substrate processing device using a double bellows pneumatic cylinder that blocks noise generated by rapid movement of a piston, induces smooth operation, and enables precise control of the up-and-down movement of a lower container.

[0005] A substrate processing device using a double bellows using a pneumatic cylinder for solving the problem of the present invention includes an inner container built inside a chamber and comprising an upper container and a lower container, a substrate chuck installed inside the inner container, a first driving unit disposed at the lower portion of the inner container and moving the substrate chuck up and down, a second driving unit disposed at the lower portion of the inner container and moving the lower container up and down, and a double expansion unit disposed outside a rotation shaft supporting the substrate chuck and a support shaft supporting the lower container and having a double bellows for controlling the vertical movement of the substrate chuck and the lower container. At this time, the second driving unit includes a pneumatic cylinder for raising or lowering the lower container, and the pneumatic cylinder is operated by a 5-port valve that uses a solenoid to control the flow of fluid.

[0006] In the device of the present invention, the pneumatic cylinder is combined with an ascending speed controller that controls an ascending speed for ascending the lower container and a descending speed controller that controls a descending speed for descending the lower container. The combination of the ascending speed controller and the descending speed controller controls the speed by either a first combination of meter-in speed controllers for advancing the pneumatic cylinder piston or a second combination of meter-out speed controllers for retracting the piston. Each of the ascending speed controller and the descending speed controller comprises a third combination of the meter-in speed controller and the meter-out speed controller for advancing and retracting the pneumatic cylinder piston. A second flow rate controller is connected to each of the ascending speed controller and the descending speed controller to control the pressure and flow rate of the fluid flowing into each of the ascending speed controller and the descending speed controller.

[0007] In a preferred device of the present invention, the pressure between the 5-port valve and the second flow controller can be checked by a first pressure indicator. The pressures between the second flow controller and the rising-side speed controller and the speed controller can be checked by a second pressure indicator.

[0008] According to the substrate processing device using a double bellows pneumatic cylinder of the present invention, by utilizing an improved pneumatic cylinder, noise generated by rapid movement of the piston is blocked, smooth movement is induced, and precise control of the up-and-down movement of the lower container is achieved.

[0009] Fig. 1 is a cross-sectional view showing a substrate processing device according to the present invention.

[0010] Fig. 2 is a perspective view showing the double elastic portion of Fig. 1.

[0011] Figure 3 is a cross-sectional view taken along line Ⅲ-Ⅲ of Figure 2.

[0012] Fig. 4 is a block diagram showing the second driving unit of Fig. 1.

[0013] Figures 5 to 7 are cross-sectional views showing the process of raising the substrate chuck and lower container according to the present invention.

[0014] Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the attached drawings. The embodiments described below may be modified in various other forms, and the scope of the present invention is not limited to the embodiments described below. The embodiments of the present invention are provided to more completely explain the present invention to those skilled in the art. In the drawings, exaggerated representations are used for convenience of explanation. Meanwhile, terms indicating positions such as "upper," "lower," and "front" are only related to those shown in the drawings. In practice, the processing device can be used in any optional direction, and the spatial direction during actual use varies depending on the orientation and rotation of the processing device.

[0015] An embodiment of the present invention proposes a substrate processing device using a double bellows that utilizes an improved pneumatic cylinder to block noise generated by rapid movement of a piston, induce smooth operation, and precisely control the vertical movement of a lower container. To this end, a substrate processing device using a double bellows equipped with an improved pneumatic cylinder will be described in detail, and a process of moving the lower container up and down by the improved pneumatic cylinder will be described in detail. The substrate processing device according to an embodiment of the present invention is used to form various thin films on substrates such as semiconductor wafers and glass substrates or to perform micro-processing to manufacture micro-elements, and also utilizes plasma.

[0016] Fig. 1 is a cross-sectional view showing a substrate processing device (100) according to an embodiment of the present invention. However, it is not a drawing in the strict sense, and there may be components not shown in the drawing for the convenience of explanation.

[0017] According to FIG. 1, a substrate processing device (100) includes a chamber (10), a substrate chuck (20), an internal vessel (bowl, 30), and a double expansion member (40). The chamber (10) has the internal vessel (30) built in, and a gas injector (11) is mounted on the upper portion. The substrate chuck (20) is a plate of a predetermined thickness that supports a substrate (S), and has a shape similar to that of the substrate (S), but is not limited thereto and may be changed into various shapes. The substrate chuck (20) is installed horizontally inside the internal vessel (30). A heating element (not shown) is provided inside the substrate chuck (20) to heat the substrate (S) placed on the upper portion of the substrate chuck (20). The heating element may be installed in various ways and structures, and is not particularly limited. In addition, the substrate chuck (20) may also be used as a lower electrode for forming plasma. For example, the substrate chuck (20) is grounded and power is applied to the gas injector (11), so that plasma can be formed between the substrate chuck (20) and the gas injector (11).

[0018] On the side of the chamber (10), there are located an entrance (12) through which a substrate (S) enters and exits, and a gate (13) for opening and closing the entrance (12). The substrate (S) is loaded onto a substrate chuck (20) located inside an internal container (30) through the entrance (12). After the substrate (S) is loaded, various processes for manufacturing micro-elements, such as thin film formation and micro-machining, are performed on the substrate (S). The chamber (10), gas supply (11), entrance (12), and gate (13) are known in the art and can be modified in various ways within the scope of the present invention. However, due to the entrance (12) of the chamber (10), the symmetry of the internal space of the chamber (10) is lost.

[0019] The substrate chuck (20) is connected to a rotation shaft (21), a bracket (23), a first case (24), and a first driving unit (25). The rotation shaft (21) is connected vertically to the bottom surface of the substrate chuck (20), and the bracket (23) accommodates the rotation shaft (21). The rotation shaft (21) may include a coupling (22) connected to a motor, a spindle, etc. At this time, the lower part of the double expansion part (40) is fixed to the first case (24). The first case (24) has a hollow interior, and fixes the bracket (23) while being coupled with the bracket (23). The first driving unit (25) moves the substrate chuck (20) up and down. Specifically, the force that induces the rotation and vertical movement of the first driving unit (25) is transmitted to the substrate chuck (20) via the rotation shaft (21). During the process of the substrate chuck (20) rotating and moving up and down, the shaking of the substrate chuck (20) must be minimized. If the substrate chuck (20) shakes, the mounted substrate may move out of its proper position, causing fatal defects in the physical properties of the micro-element or causing losses such as reloading the substrate.

[0020] The first driving unit (25) is preferably a precision motor that can be precisely controlled, such as a servo motor or a stepping motor. The servo motor is a motor that converts an input voltage into a rotation angle, and a two-phase AC or DC servo motor is used. The stepping motor is also called a pulse motor because it rotates by an angle proportional to a given number of pulses by giving a sequence to step-state pulses. Since the precision motor precisely controls the rotation and vertical movement of the substrate chuck (20), the shaking of the substrate chuck (20) can be minimized. The first driving unit (25) is fixed to the motor mounting unit (26), and the motor mounting unit (26) is fixed to the second case (36).

[0021] One side of the motor mounting portion (26) is connected to a guide (27), and the other side of the guide (27) is connected to the chamber (10). The guide (27) is connected to the motor mounting portion (26) by penetrating the bracket (23) and the shaft support (35), and the guide (27) guides the bracket (23) connected to the first case (24) and guides the shaft support (35) connected to the second case (36). The guide (27) prevents shaking when the substrate chuck (20) and the lower container (31) move up and down. The guide (27) on the chamber (10) side is inserted into the stopper (28). The stopper (28), as will be described later, stops the forward movement of the first flange (42a). In the drawing, one guide (27) and a stopper (28) are shown, but a plurality of guides (27) and stoppers (28) may be provided.

[0022] The inner container (30) is composed of a lower container (31) that reciprocates and an upper container (32) from which the lower container (31) is detached. The upper surface of the lower container (31) is brought into close contact with or separated from the lower surface of the upper container (32) by the first driving unit (25). The upper container (32) is fixed to the upper side of the chamber (10) and may be arranged to surround the inner wall of the upper side of the chamber (10). For example, the upper container (32) may have an annular ring shape. The lower container (31) has a container shape and includes a bottom surface spaced apart from the lower surface of the substrate chuck (20) at a constant interval and a side wall spaced apart from the side surface of the substrate chuck (20) at a constant interval. The lower container (31) has a symmetrical structure with respect to the center of the substrate chuck (20).

[0023] Optionally, a connecting portion (33) may be provided on the upper surface of the lower container (31) and the lower surface of the upper container (32). The connecting portion (33) may have a protrusion on the upper surface of the lower container (31) and a groove on the lower surface of the upper container (32) into which the protrusion can be inserted. In some cases, the protrusion and the groove may be positioned in opposite directions. The connecting portion (33) improves the adhesion between the lower container (31) and the upper container (32) and facilitates the connecting. At least one or both of the lower container (31) and the upper container (32) may be made of a ceramic material. The ceramic has excellent heat retention, thermal stability, and corrosion resistance, and is therefore preferable as a material for the inner container (30) in which the process of manufacturing the micro-device is performed.

[0024] The lower container (31) is connected to a support shaft (34), a bearing (35), a second case (36), and a second driving unit (50). The second case (36) is connected to the second driving unit (50), and the second case (36) moves up and down by the second driving unit (50). The support shaft (34) is vertically connected to the bottom surface of the substrate chuck (20), and the bearing (35) fixes the support shaft (34). The second case (36) has a hollow interior and fixes the bearing (35) by being coupled with the bearing (35). The second driving unit (50) moves the lower container (31) up and down. Specifically, the vertical movement force of the second driving unit (50) is transmitted to the lower container (31) through the second case (36), the bearing (35), and the supporting shaft (34).

[0025] The drawing represents an open state before the lower and upper containers (31, 32) are combined, and the lower and upper containers (31, 32) are spaced apart by a first gap (D1). In the open state, the substrate (S) is loaded onto the substrate chuck (20) through the entrance (12) and the first gap (D1). At this time, the first driving unit (25) is built into the second case (36), and the second driving unit (50) is built into the first case (24). The second driving unit (50) built into the first case (24) is in contact with the second case (36). The operation of the second driving unit (50) will be described in detail later.

[0026] The double expansion member (40) is arranged on the outside of the rotation shaft (21) supporting the substrate chuck (20) and the support shaft (34) supporting the lower container (31). The double expansion member (40) controls the vertical movement of the substrate chuck (20) by the first driving unit (25) and the vertical movement of the lower container (31) by the second driving unit (50). Controlling the vertical movement serves to ensure that the substrate chuck (20) and the lower container (31) move stably and to limit the distance that the substrate chuck (20) and the lower container (31) move. The double expansion member (40) will be described in detail later.

[0027] Fig. 2 is a perspective view showing the double elastic portion (40) of Fig. 1, and Fig. 3 is a cross-sectional view taken along line Ⅲ-Ⅲ of Fig. 2. At this time, the substrate processing device (100) will be referred to Fig. 1.

[0028] Referring to FIGS. 2 and 3, the double expansion member (40) includes a double bellows (41) and a flange (42) that accommodates the double bellows (41). The double bellows (41) and the flange (42) are fixed by a fixing member (43), and the fixing member (43) is coupled to the chamber (10). The double bellows (41) is composed of a first bellows (41a) and a second bellows (41b), and the first bellows (41a) is accommodated in the first flange (42a) and the second bellows (41b) is accommodated in the second flange (42b). At this time, the second flange (42b) is fixed to the bracket (23). The double bellows (41) is flexible in movement and is stably expanded and contracted without residual stress by the first and second driving members (25, 50). The double bellows (41) is preferably made of a metal material that prevents deterioration while providing stable movement.

[0029] Hereinafter, the process of moving the substrate chuck (20) up and down by the first driving unit (25) and moving the lower container (31) up and down by the second driving unit (50) will be described. At this time, it is assumed that the initial state is as shown in Fig. 1, in which the lower and upper containers (31, 32) maintain the first gap (D2). In the initial state, the gap between the second case (36) and the second driving unit (50) has a first height difference (H1).

[0030] Fig. 4 is a block diagram showing the second driving unit (50) of Fig. 1. At this time, the substrate processing device (100) refers to Fig. 1.

[0031] According to Fig. 4, the second driving unit (50) utilizes a pneumatic cylinder and includes a first flow controller (51), a 2-port valve (52), a 5-port valve (53), and a pneumatic cylinder (59). One side of the second driving unit (50) raises the lower container (31), and the other side lowers the lower container (31). The first flow controller (51) controls the flow rate and pressure of the fluid for operating the pneumatic cylinder (59). The 2-port valve (52) is a solenoid valve and supplies or blocks the fluid by turning the flow of the fluid on / off. The 5-port valve (53) is a solenoid valve and operates in either a single-acting or double-acting manner, and a double-acting solenoid valve is shown in the drawing.

[0032] The 5-port valve (53) uses a solenoid to control the flow of fluid and moves the piston (59a) of the pneumatic cylinder (59) forward or backward. Since the 5-port valve (53) uses a solenoid and 5 ports, it has the advantages of a fast response time, high accuracy, and easy installation, and is therefore suitable for controlling the vertical movement of the lower container (31) of the present invention. Accordingly, it is obvious that the 5-port valve (53) is adopted based on the concept of appropriately controlling the operation of the lower container (31), and that the 5-port valve (53) is not simply adopted.

[0033] When the piston (59a) moves forward, the lower container (31) is raised, and when the piston (59a) moves backward, the lower container (31) is lowered. Meanwhile, it is necessary to precisely control the vertical movement of the lower container (31). An embodiment of the present invention includes a first pressure indicator (54), a second flow controller (55), a second pressure indicator (56), an up-side speed controller (57), and a down-side speed controller (58). The first pressure indicator (54) is divided into an up-side pressure indicator (54a) and a down-side pressure indicator (54b). The up-side pressure indicator (54a) is located on the up-side path of the second driving unit (50), and the down-side pressure indicator (54b) is located on the down-side path of the second driving unit (50). The first pressure indicator (54) displays the pressure of the fluid flowing into or out of the 5-port valve (53), so that it can be confirmed whether the 5-port valve (53) is operating properly.

[0034] The second flow controller (55) is divided into an upward flow controller (55a) and a downward flow controller (55b). The upward flow controller (55a) is located in the upward path of the second driving unit (50), and the downward flow controller (55b) is located in the downward path of the second driving unit (50). The second flow controller (55) appropriately lowers the flow rate and pressure so as to precisely control the pneumatic cylinder (59). For example, if the pressure in the first flow controller (51) is 0.5 Mpa, the pressure in the second flow controller (55) may be 0.2 Mpa. The second pressure indicator (56) is divided into an upward pressure indicator (56a) and a downward pressure indicator (56b). The rising side pressure indicator (56a) is located in the rising side path of the second driving unit (50), and the falling side pressure indicator (56b) is located in the falling side path of the second driving unit (50). The second pressure indicator (56) indicates the pressure of the fluid flowing in or out of the second flow controller (55), thereby making it possible to check whether the fluid pressure in the pneumatic cylinder (59) is appropriate.

[0035] The pneumatic cylinder (59) is coupled with an up-side speed controller (57) that controls the rising speed for raising the lower container (31) and a down-side speed controller (58) that controls the falling speed for lowering the lower container (31). The up-side speed controller (57) may include one of a meter-in speed controller [57 (MI)] and a meter-out speed controller [57 (MO)]. The down-side speed controller (58) may include one of a meter-in speed controller [57 (MI)] and a meter-out speed controller [57 (MO)]. Each of the meter-in speed controllers [57 (MI), 58 (MI)] and the meter-out speed controllers [57 (MO), 58 (MO)] is composed of a throttle valve and a check valve. The above-mentioned pressure relief valve controls the pressure and flow rate of the fluid, and the above-mentioned check valve directs the flow of the fluid in one direction.

[0036] The meter-in speed control unit [57(MI), 58(MI)] advances the piston (59a) with respect to the lower container (31), and the meter-out speed control unit [57(MO), 58(MO)] moves the piston (59a) backward. Speed ​​control for the forward movement of the piston (59a) is achieved by a first combination of the meter-in speed control units [57(MI), 58(MI)], and speed control for the backward movement of the piston (59a) is achieved by a second combination of the meter-out speed control units [57(MO), 58(MO)]. Speed ​​control for the forward and backward movement of the piston (59a) is achieved by a third combination of the meter-in speed control units [57(MI), 58(MI)] and the meter-out speed control units [57(MO), 58(MO)]. The third combination is shown in the drawing. The ascending speed controller (57) and descending speed controller (58) of the present invention are preferably one of the first combination, the second combination, or the third combination, and more preferably the third combination that controls the speed for forward and backward movement.

[0037] Meanwhile, the operation of the second driving unit (50) is required to be controlled so that the substrate chuck (20) does not shake even if it is not as precisely controlled as the first driving unit (25). Since the lower container (31) is in close contact with the inner wall of the chamber (10), unlike the substrate chuck (20), even if the shaking of the lower container (31) is small, the movement of the lower container (31) is not stable, and the substrate chuck (20) may shake due to impact during the process of combining the lower and upper containers (31, 32), defects that occur unintentionally during the manufacturing process, etc. If the substrate chuck (20) shakes, the mounted substrate may move out of its proper position, which may cause fatal defects in the physical properties of the micro-elements or cause losses such as reloading the substrate. Accordingly, in the operation of the second driving unit (50), it is necessary to fundamentally block the shaking of the substrate chuck (20) that causes the above-mentioned loss.

[0038] The second driving unit (50) according to the embodiment of the present invention can fundamentally block the shaking of the substrate chuck (20) that causes the above-mentioned loss by applying a 5-port valve (53) that stably induces the movement of the lower container (31). In order to fundamentally block the shaking of the substrate chuck (20), speed controllers (57, 58) can be employed on the rising and falling sides. The speed controller (57, 58) may apply any one of the first combination of meter-in speed controllers [57(MI), 58(MI)] that control the speed for the forward movement of the piston (59a), the second combination of meter-out speed controllers [57(MO), 58(MO)] that control the speed for the backward movement of the piston (59a), or the third combination of meter-in speed controllers [57(MI), 58(MI)] and meter-out speed controllers [57(MO), 58(MO)] that control the speed for the forward and backward movements of the piston (59a).

[0039] In addition, in order to more stably induce the lower container (31), the pressure and flow rate of the fluid flowing into the speed controller (57, 58) can be controlled using the second flow controller (55). The first and second pressure indicators (54, 56) can check the pressure controlled by the second flow controller (55) and control the pressure and flow rate of the second flow controller (55) in conjunction with the movement of the pneumatic cylinder (59).

[0040] Figures 5 to 7 are cross-sectional views showing the process of raising the substrate chuck (20) and the lower container (32) according to an embodiment of the present invention. At this time, the substrate processing device (100) refers to Figure 1.

[0041] According to Fig. 5, the second driving unit (50) is operated to raise the lower container (31). The first bellows (41a) is compressed, and the second bellows (41b) is relaxed. The first and second flanges (42a, 42b) limit the compression and relaxation of the first and second bellows (41a, 41b). At this time, while the second driving unit (50) is operated to raise the lower container (31), the first driving unit (25) does not operate. If the first driving unit (25) does not operate, the substrate chuck (20) is maintained in the initial state in which the substrate (S) is mounted. In this case, the gap between the lower and upper containers (31, 32) is reduced from the first gap (D1) to the second gap (D2). When the second gap (D2) is reduced, the gap between the second case (36) and the second driving unit (50) has a second height difference (H2) greater than the first height difference (H1).

[0042] According to Fig. 6, the first and second driving units (25, 50) are operated simultaneously to simultaneously raise the substrate chuck (20) and the lower container (31). The first driving unit (25) raises the substrate chuck (20) by a predetermined height. In order to prevent shaking due to rapid elevation of the substrate chuck (20), it moves to a position lower than the process position (see Fig. 7) for performing the process. The second driving unit (50) connects the lower and upper containers (31, 32) by the connecting unit (33) (c). When the lower and upper containers (31, 32) are connected, the gap between the second case (36) and the second driving unit (50) has a third height difference (H3) different from the second height difference (H2). The third height difference (H3) is determined in consideration of the elevation of the substrate chuck (20) and the lower container (31).

[0043] The first bellows (41a) is compressed by the first and second driving units (25, 50), and the second bellows (41b) is compressed by the first driving unit (25) but released by the second driving unit (50). The first and second flanges (42a, 42b) limit the compression and release of the first and second bellows (41a, 41b). In particular, the rise of the first flange (42a) is stopped by the stopper (28). That is, the stopper (28) serves to stop the forward movement of the first flange (42a).

[0044] According to Fig. 7, the first driving unit (25) is operated to raise the substrate chuck (20) to a process position where the process is to be performed. The first and second bellows (41a, 41b) are compressed. The first and second flanges (42a, 42b) limit the compression of the first and second bellows (41a, 41b). While the first driving unit (25) is operated to raise the substrate chuck (20), the second driving unit (50) does not operate. When the second driving unit (50) does not operate, the gap between the second case (36) and the second driving unit (50) has a fourth height difference (H4) due to the raising of the substrate chuck (20).

[0045] When the elevation of the substrate chuck (20) is completed, a first space (a) is formed between the chamber (10) and the inner container (30), and a second space (b) is provided inside the inner container (30). The first space (a) has no symmetry near the entrance (12) through which the substrate (S) enters and exits. On the other hand, the second space (b) of the inner container (30) has a symmetrical structure with respect to the center of the substrate chuck (20). Since the second space (b) maintains symmetry, when the substrate chuck (20) is heated, the substrate chuck (20) and its surroundings are maintained at a uniformly high temperature. That is, the second space (b) is blocked from the first space (a), symmetry is maintained, and the second space (b) has excellent heat retention, so that the substrate (S) is uniformly processed. When the substrate (S) is uniformly processed, a microdevice with excellent physical properties can be manufactured. Additionally, the second space (b) has a smaller volume than the first space (a). If the volume of the second space (b) is smaller, the processing gas flowing into the second space (b) can quickly reach the substrate (S), thereby improving the processing speed and reducing the amount of processing gas required.

[0046] The lower container (31) first rises alone, and secondarily rises together with the substrate chuck (20). That is, the lower container (31) rises in two stages. The substrate chuck (20) first rises together with the lower container (31), and secondarily rises alone with the substrate chuck (20). That is, the substrate chuck (20) rises in two stages. If the substrate chuck (20) is raised after the lower container (31) and the upper container (32) are combined without the process of rising together with the lower container (31), it may rise too rapidly, causing shaking. When raising the lower container (31), if the substrate chuck (20) is raised together, the time for raising the substrate chuck (20) can be saved by the same amount as the time for raising the lower container (31).

[0047] Above, the present invention has been described in detail with reference to preferred embodiments, but the present invention is not limited to the above embodiments, and various modifications are possible by a person having ordinary skill in the art within the scope of the technical idea of ​​the present invention.

[0048] *Explanation of symbols

[0049] 10; Chamber 11; Gas supply

[0050] 12; Entrance 13; Gate

[0051] 20; substrate chuck 21; rotation axis

[0052] 22; Coupling 23; Bracket

[0053] 24, 36; Cases 1 and 2

[0054] 25, 50; first and second driving units

[0055] 26; Motor mount 27; Guide

[0056] 28; Stopper 30; Inner container

[0057] 31; lower container 32; upper container

[0058] 33; joint 34; support shaft

[0059] 35; Axle support 40; Double elastic member

[0060] 41; Double bellows 42; Flange

[0061] 43; fixed part

[0062] 51, 55; first and second flow controllers

[0063] 52, 53; 2-port and 5-port valves

[0064] 54, 56; first and second pressure indicators

[0065] 57, 58; Upward and downward speed controllers

[0066] 59; pneumatic cylinder

Claims

1. An inner container built into the interior of the chamber and consisting of an upper container and a lower container; A substrate chuck installed inside the above inner container; A first driving unit positioned at the bottom of the inner container and moving the substrate chuck up and down; A second driving unit positioned at the bottom of the inner container and moving the lower container up and down; and It includes a double expansion member having a double bellows that is arranged outside of a rotating shaft that supports the substrate chuck and a supporting shaft that supports the lower container, and that controls the vertical movement of the substrate chuck and the lower container. A substrate processing device using a double bellows pneumatic cylinder, wherein the second driving unit includes a pneumatic cylinder that raises or lowers the lower container, and the pneumatic cylinder is operated by a 5-port valve that controls the flow of fluid using a solenoid.

2. A substrate processing device using a double bellows using a pneumatic cylinder, characterized in that in the first paragraph, the pneumatic cylinder is combined with an ascending-side speed controller that controls an ascending speed for ascending the lower container and a descending-side speed controller that controls a descending speed for descending the lower container.

3. In the second paragraph, a substrate processing device using a double bellows using a pneumatic cylinder, characterized in that the combination of the rising-side speed controller and the falling-side speed controller controls the speed by either a first combination of a meter-in speed controller for the forward movement of the pneumatic cylinder piston or a second combination of a meter-out speed controller for the backward movement of the piston.

4. In the second paragraph, the substrate processing device using a double bellows using a pneumatic cylinder is characterized in that each of the ascending speed controller and the descending speed controller is formed by a third combination of the meter-in speed controller and the meter-out speed controller that adjusts the speed for the forward and backward movement of the pneumatic cylinder piston.

5. A substrate processing device using a double bellows using a pneumatic cylinder, characterized in that in the second paragraph, a second flow rate controller is connected to each of the rising-side speed controller and the falling-side speed controller to control the pressure and flow rate of the fluid flowing into each of the rising-side speed controller and the falling-side speed controller.

6. A substrate processing device using a double bellows pneumatic cylinder, characterized in that in the fifth paragraph, the pressure between the five-port valve and the second flow controller is checked by a first pressure indicator.

7. A substrate processing device using a double bellows pneumatic cylinder, characterized in that in the fifth paragraph, each pressure between the second flow controller, the rising-side speed controller, and the speed controller is checked by a second pressure indicator.

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