High frequency application system including contact resistance reducing means

Abstract

Provided is a high frequency application system characterized by comprising: an electrode which is in contact with an object; a contact resistance adjusting means capable of adjusting the contact resistance between the electrode and the object; and a measurement means for measuring a variable associated with the power application effect of power applied from the electrode, wherein the contact resistance is determined according to the variable measured by the measurement means.

Description

High-frequency application system including contact resistance reduction means

[0001] The present invention relates to a high frequency application system including a contact resistance reduction means, and more particularly, to a high frequency application system including a contact resistance reduction means that, when applying power to a region of interest in a subject using a single electrode or an electrode array in a high frequency power application system, adjusts the contact resistance between the electrode and the skin to a certain level or less and makes the current density distribution applied to the electrode uniform, thereby preventing side effects that may occur during high frequency (RF) application in advance and maximizing the RF application effect.

[0002] Electrotherapy is the use of electrical energy for therapeutic purposes, and uses electrodes to supply electricity to the human body. In addition to electrical stimulation therapy for various types of nerve paralysis, it also uses thermal effects such as electrotherapy (heat baths) and ultrashortwave therapy, and cancer treatment using alternating voltage (see Non-Patent Documents 1-6).

[0003] Generally, electrotherapy, which applies power to the body by attaching electrodes to the skin, utilizes the power (or current generated by voltage) generated within the body by the applied power. In order for electrotherapy to be effective, it is necessary to apply power only to the region of interest (ROI) as much as possible and minimize the power unnecessarily transferred to normal tissues outside the region of interest.

[0004] For example, the effect of electrical therapy on cancer cells varies depending on the intensity of the electric field applied to the tumor tissue. Specifically, the greater the intensity of the electric field, the greater the effect of killing and inhibiting division on cancer cells, so it can be said that there is a proportional relationship between the intensity of the electric field and the effect of killing cancer cells (see non-patent literature 7 and 8). In the case of currently commercialized high-frequency treatment systems, the intensity of the power used is applied to provide treatment by applying the maximum power within a range that does not cause burns, which are side effects on the skin. In general, in order to prevent burns on the skin in electrical therapy, the current density must be maintained below a certain limit value (limiting current density), and according to the literature, the limiting current density is 100 mArms / cm based on the root mean square (RMS) value. 2 It is recommended to keep it below (Non-patent literature 7).

[0005] The problem is that even if the current density is maintained below the limit, if the contact resistance between the electrode and the skin is high, significant heat generation between the electrode and the skin can occur, leading to adverse effects. Furthermore, high contact resistance can lead to a significant voltage drop at the electrode contact surface, which can reduce the internal electric field delivered to cancer cells and reduce the therapeutic effect. Electrotherapy using electrodes typically uses a viscous conductive medium, such as a medical gel or hydrogel, between the skin and the electrode to reduce contact resistance. However, even with a viscous conductive medium, contact resistance can increase during treatment due to factors such as patient sweat, movement, and other factors.

[0006] Therefore, in order to minimize side effects due to an increase in electrode temperature in a high-frequency application system using electrodes while simultaneously maximizing the power applied to the target, a means for reducing contact resistance that can maintain the contact resistance between the electrode and the skin below a certain level is required.

[0007] [Prior Art Literature]

[0008] [비특허문헌]

[0009] (비특허문헌 1) K. Heimrath et al, Transcranial direct current stimulation (tDCS) over the auditory cortex modulates GABA and glutamate: a 7 T MR-spectroscopy study, Scientific Report, 10, 20111 (2020).

[0010] (비특허문헌 2) Eilon D. Kirson et al, Disruption of cancer cell replication by alternating electric fields, Cancer Research, 64, 3288-3295 (2004)

[0011] (비특허문헌 3) Miklos Pless, Uri Weinberg, Tumor treating fields: concept, evidence, future, Expert Opinion, 20(8), 1099-1106 (2011)

[0012] (비특허문헌 4) Stupp et al, Effect of Tumor-Treating Fields Plus Maintenance Temozolomide vs Maintenance Temozolomide Alone on Survival in Patients With Glioblastoma: A Randomized Clinical Trial, Journal of the American Medical Association, 318(23), 2306-2316 (2017)

[0013] (비특허문헌 5) Eilon D. Kirson et al. Alternating electric fields (TTFields) inhibit metastatic spread of solid tumors to the lungs, Clin Exp Metastasis 26, 633-640 (2009)

[0014] (비특허문헌 6) Novocure Corporate Presentation (https: / 3sj0u94bgxp33grbz1fkt62h-wpengine.netdna-ssl.com / wpcontent /

[0015] (비특허문헌 7)uploads / 2019 / 05 / 201905_NVCR_Corporate_Presentation_vFF.pdf)

[0016] (비특허문헌 8) Eilon D. Kirson et al, Alternating electric fields arrest cell proliferation in animal tumor models and human brain tumors,

[0017] (비특허문헌 9)PNAS, 104(24), 10152-10157 (2007)

[0018] (비특허문헌 10) Yunhui Jo et al, Effectiveness of a Fractionated Therapy Scheme in Tumor Treating Fields Therapy, Technology in Cancer Research & Treatment,18, 1-10 (2019)

[0019]

[0020] Accordingly, the problem to be solved by the present invention is to provide a high frequency application system including a contact resistance reduction means that reduces the contact resistance between an electrode and a target object by using a contact resistance reduction means in a high frequency application system for the purpose of applying high frequency to a target object, while at the same time maximizing the intensity of power transmitted to a region of interest.

[0021] The present invention provides a high frequency application system, comprising: an electrode in contact with a target object; a measuring means for measuring a variable related to the effect of power application applied from the electrode; and a contact resistance adjusting means capable of adjusting contact resistance between the electrode and the target object, wherein the contact resistance adjusting means is determined in response to a variable measured by the measuring means.

[0022] In one embodiment of the present invention, the variable is a voltage or current or impedance of the electrode.

[0023] In one embodiment of the present invention, the contact resistance control means controls the contact resistance to be less than or equal to a preset resistance so that the power application effect applied from the electrode is greater than or equal to a preset intensity.

[0024] In one embodiment of the present invention, the contact resistance control means is a means for controlling the pressure between the electrode and the target object.

[0025] In one embodiment of the present invention, the electrodes are plural, and the measuring means independently measures variables from each of the plural electrodes.

[0026] In one embodiment of the present invention, the contact resistance control means includes an elastic member that presses the electrode toward the object.

[0027] In one embodiment of the present invention, the contact resistance adjustment means includes a pneumatic pressure applying means for pressing the electrode toward the object.

[0028] In one embodiment of the present invention, the high frequency application system further includes a judgment unit that determines whether at least one of the variables is outside a preset range.

[0029] In one embodiment of the present invention, the high-frequency application system further includes an information providing unit that provides contact resistance adjustment information for restoring a variable out of the preset range back to within the preset range when the judgment unit determines that at least one of the variables is out of the preset range.

[0030] In one embodiment of the present invention, the high frequency application system further includes a pressure sensor for measuring pressure applied to the electrode.

[0031] In one embodiment of the present invention, the pressure sensor is attached to the electrode.

[0032] In one embodiment of the present invention, the high frequency application system transmits AC power including a frequency range of 10 kHz to 1 MHz to the target object.

[0033] In one embodiment of the present invention, the high frequency application system transmits AC power including a frequency range of 10 MHz to 50 MHz to the target object.

[0034] The present invention also comprises a high-frequency application system, comprising: an electrode array in which a plurality of electrodes are arrayed to contact a target object; and a contact resistance control means capable of controlling contact resistance between the electrodes and the target object, wherein the contact resistance control means controls contact resistance by pressing the entire electrode array toward the target object, and wherein the pressure difference ratio between the electrodes (minimum pressure compared to maximum pressure / maximum pressure) is within 20%.

[0035] In one embodiment of the present invention, the electrode array is a mesh structure in which a plurality of electrodes are connected by an elastic material, and thus, as the elastic material contracts, the electrode array itself presses the target object with a force greater than a predetermined level.

[0036] In one embodiment of the present invention, the high frequency application system further includes a measuring means for measuring a variable associated with the effect of power application from the electrode.

[0037] In one embodiment of the present invention, the variable is a voltage or current or impedance of the electrode.

[0038] In one embodiment of the present invention, the contact resistance is determined in response to a variable measured by the measuring means.

[0039] In one embodiment of the present invention, the high frequency application system further includes a judgment unit that determines whether at least one of the variables is outside a preset range.

[0040] In one embodiment of the present invention, the high-frequency application system further includes an information providing unit that provides contact resistance adjustment information for restoring a variable out of the preset range back to within the preset range when the judgment unit determines that at least one of the variables is out of the preset range.

[0041] The present invention also provides a contact resistance control means for the above-described high-frequency application system, wherein the contact resistance control means includes a mesh structure in which a plurality of electrodes are connected by an elastic material, and thus the electrode array itself includes a contact resistance control means for applying a force of a predetermined level or higher to an object according to the contraction of the elastic material.

[0042] The high-frequency application system according to the present invention provides a contact resistance reduction means capable of reducing contact resistance by maintaining the contact force between the electrode for applying power and the target object at a predetermined level or higher. In particular, the present invention focuses on the fact that the power intensity varies depending on the contact intensity of the electrode actually coming into contact with the target object, and the pressure can be diagnosed and predicted conversely through the electrical variable (measurable) of the contact resistance that varies depending on the pressure. As a result, the power intensity applied to the target object can be maintained at a predetermined level or higher, thereby maximizing the power application to the region of interest.

[0043]

[0044] FIG. 1 is a block diagram of a high-frequency application system according to one embodiment of the present invention.

[0045] Figure 2 is a drawing for explaining the change in contact resistance according to the contact area between the electrode and the target.

[0046] Figure 3 is a drawing for explaining the change in applied voltage according to the contact area in constant current mode.

[0047] Figure 4 is a drawing to explain that the temperature of the electrode increases in proportion to the increase in contact resistance in constant voltage mode.

[0048] Figure 5 is a drawing explaining that as contact resistance increases in constant voltage mode, the electric field size of the region of interest decreases in proportion to this.

[0049] FIG. 6 is a drawing illustrating a contact resistance reduction means according to one embodiment of the present invention.

[0050] FIG. 7 is a drawing for explaining a contact resistance reduction means according to another embodiment of the present invention.

[0051] Fig. 8 is a schematic diagram of a high-frequency system having a pressurized contact resistance means according to one embodiment of the present invention.

[0052] Figure 9 is a schematic diagram of a high frequency system that provides information on actual contact resistance.

[0053] Figure 10 is a step diagram for the operation method of the high-frequency system described above.

[0054] Hereinafter, with reference to the attached drawings, embodiments of the present invention will be described in detail so that those skilled in the art can easily implement the present invention. The present invention may be implemented in various different forms and is not limited to the embodiments described herein.

[0055] In order to clearly explain the present invention, parts that are not related to the description are omitted, and the same reference numerals are used for identical or similar components throughout the specification.

[0056] Throughout the specification, when a part is said to be "connected" to another part, this includes not only the cases where the parts are "directly connected" but also the cases where the parts are "electrically connected" with other elements intervening. Furthermore, when a part is said to "include" a component, this does not exclude other components, but rather includes other components, unless otherwise stated.

[0057] When a part is said to be "on" another part, it can be directly on top of the other part, or there can be other parts between them. Conversely, when a part is said to be "directly on" another part, there are no other parts between them.

[0058] The terms first, second, and third, etc., are used to describe, but are not limited to, various parts, components, regions, layers, and / or sections. These terms are used only to distinguish one part, component, region, layer, or section from another part, component, region, layer, or section. Accordingly, a first part, component, region, layer, or section described below may be referred to as a second part, component, region, layer, or section without departing from the scope of the present invention.

[0059] The terminology used herein is for the purpose of describing particular embodiments only and is not intended to limit the present invention. As used herein, the singular forms "singular" and "comprising" include plural forms as well, unless the context clearly dictates otherwise. The word "comprising" as used herein specifies a particular feature, region, integer, step, operation, element, and / or component, but does not exclude the presence or addition of other features, regions, integers, steps, operations, elements, and / or components.

[0060] Terms indicating relative space, such as "below" and "above," may be used to more easily describe the relationship of one part to another part depicted in the drawings. These terms are intended to encompass other meanings or operations of the device being used, along with the intended meaning in the drawings. For example, if a device in a drawing is turned over, some parts described as being "below" other parts will be described as being "above" the other parts. Therefore, the exemplary term "below" includes both the up and down directions. The device can be rotated 90 degrees or at other angles, and the relative space terms will be interpreted accordingly.

[0061] Although not defined otherwise, all terms, including technical and scientific terms, used herein have the same meaning as commonly understood by those of ordinary skill in the technical field to which the present invention pertains. Terms defined in commonly used dictionaries are further interpreted to have meanings consistent with the relevant technical literature and the present disclosure, and are not to be construed as ideal or overly formal unless otherwise defined.

[0062] Hereinafter, with reference to the attached drawings, embodiments of the present invention will be described in detail so that those skilled in the art can easily implement the present invention. However, the present invention may be implemented in various different forms and is not limited to the embodiments described herein.

[0063] In order to solve the above-described problem, the present invention can directly or indirectly predict contact resistance, and predicts the contact resistance through a variable that can be measured during the power application time (hereinafter, measured variable), and when the predicted (calculated) resistance is excessively high, a reduction means that can reduce the contact resistance to a preset level or lower is used to reduce the resistance. In one embodiment of the present invention, the reduction means simultaneously pressurizes a plurality of unit (individual) electrodes in consideration of the uneven characteristics of the human body, thereby solving the problem that only a specific individual electrode has excessively low resistance, resulting in an uneven electric field.

[0064] FIG. 1 is a block diagram of a high-frequency application system according to one embodiment of the present invention.

[0065] Referring to FIG. 1, a high-frequency system according to one embodiment of the present invention includes an electrode (10) that contacts a non-flat object such as human skin; a measuring means (30) for measuring a variable related to the effect of power application applied from the electrode (10); and a contact resistance adjusting means (20) that can adjust the contact resistance between the electrode (10) and the object, wherein the contact resistance is determined in response to a variable measured by the measuring means.

[0066] In one embodiment of the present invention, the variable may be a voltage, current, or impedance of the electrode. That is, the variable here is a variable that can be measured from the electrode during the power application time and that can determine the contact resistance between the skin and the electrode.

[0067] In one embodiment of the present invention, the contact resistance control means controls the contact resistance to be below a preset resistance so that the power application effect (e.g., therapeutic effect due to use of high frequency, etc.) applied from the electrode is above a preset level. For example, the contact resistance control means may be a means for controlling the pressure between the electrode and the target object at all times.

[0068] The present invention particularly focuses on the fact that the intensity of an electric field applied to a subject for purposes such as treatment varies significantly depending on the contact resistance between the electrode and the skin. Accordingly, the present invention increases the pressure between the electrode and the subject to increase the effective area for actual electric field application between the electrode and the subject, and the degree of such increase is determined through the contact resistance.

[0069] Figure 2 is a drawing for explaining the change in contact resistance according to the contact area between the electrode and the target.

[0070] Referring to Figure 2, it can be seen that as the contact area increases, the contact resistance decreases proportionally. This suggests that contact resistance can be reduced by increasing the contact area using an appropriate pressure means between the electrode and the target.

[0071] Figure 3 is a drawing for explaining the change in applied voltage according to the contact area in constant current mode.

[0072] Referring to Figure 3, it can be seen that as the contact area increases in constant current mode, the voltage applied between the electrode and the target decreases proportionally. This indicates that increasing the contact area between the electrode and the target using an appropriate pressure means can reduce the voltage between the electrode and the target, thereby reducing the temperature of the electrode, and thus the side effects caused by the high-frequency application system.

[0073] Figure 4 is a drawing to explain that the temperature of the electrode increases in proportion to the increase in contact resistance in constant voltage mode.

[0074] Referring to FIG. 4, it can be seen that by reducing the contact resistance between the electrode and the target using an appropriate pressure means, the contact resistance between the electrode and the target is reduced and the temperature of the electrode is reduced, thereby reducing the side effects caused by the high-frequency application system.

[0075] Figure 5 is a drawing explaining that as contact resistance increases in constant voltage mode, the electric field size of the region of interest decreases in proportion to this.

[0076] Referring to Fig. 5, if the contact area between the electrode and the target is increased by using an appropriate pressure means and the contact resistance between the electrode and the target is reduced based on this, the size of the electric field applied to the region of interest within the target can be increased, thereby improving the effectiveness of the high-frequency application system.

[0077] Referring to the above-described drawings 2 to 5, it can be seen that using a contact resistance reduction means in a high-frequency application system reduces side effects occurring in a target object while increasing the size of the electric field transmitted to the area of ​​interest, thereby improving the effectiveness of the high-frequency application system.

[0078] FIG. 6 is a drawing illustrating a contact resistance reduction means according to one embodiment of the present invention.

[0079] Referring to Fig. 6, when the electrode of a high-frequency application system is composed of a target object - conductive medium - electrode, the contact resistance between the electrode and the target object can be reduced by adding a pressure application means external to the electrode. In particular, the present invention reduces the contact resistance by applying pressure to all electrodes as a whole, taking into account the uneven characteristics of the human body, thereby resolving the problem of electric field concentration due to uneven resistance reduction between electrodes.

[0080] FIG. 7 is a drawing for explaining a contact resistance reduction means according to another embodiment of the present invention.

[0081] Referring to FIG. 7, when the electrode of the high-frequency application system according to one embodiment of the present invention is composed of a target object (100) and an electrode array (Electrode array, 110), an elastic structure (Elastic Device, 120)) can be used between a support fixture (Support Fixture, 130)) that supports the electrode array (110) to apply appropriate pressure to each electrode constituting the electrode array. In one embodiment of the present invention, a conducting media such as a hydrogel may be provided between the target object and the electrode array, but the scope of the present invention is not limited thereto.

[0082] In addition, in another embodiment of the present invention, the electrode array is a mesh structure in which a plurality of electrodes are connected by an elastic material, and thus, as the elastic material contracts, the electrode array itself can pressurize an object with a force greater than a predetermined level, and in particular, by the pulling force, all individual electrodes connected to the mesh structure are pressed with a constant force, thereby solving the problem of deviation in contact resistance.

[0083] Fig. 8 is a schematic diagram of a high-frequency system having a pressurized contact resistance means according to one embodiment of the present invention.

[0084] Referring to Fig. 8, an elastic device is provided between the support and the electrode pad, so that when the support is pulled and force is applied, the elastic device is compressed and can pressurize the electrode pad.

[0085] A high frequency system according to another embodiment of the present invention provides a method for providing contact resistance information to a user, thereby enabling the user to reduce contact resistance.

[0086] In another embodiment of the present invention, in order to solve the problem that the applied electric field is induced in a specific direction (i.e., a low resistance direction) as the resistance becomes uneven when the pressure difference between the individual electrodes is large, when the entire electrode array is pressed toward the object to control the contact resistance, the pressure difference ratio between the electrodes (minimum pressure compared to maximum pressure / maximum pressure) is configured to be within 20%. If the pressure difference is larger than the above numerical range, a problem occurs in which the electric field direction is induced in a low resistance direction due to a deviation in the contact resistance.

[0087] In one embodiment of the present invention, the high-frequency generation system can transmit power to a target using an AC voltage having a frequency range of 10 kHz to 1 MHz, and more preferably, transmit power to the target using an AC voltage of 10 MHz to 50 MHz. This can be expected to have cancer cell death and proliferation inhibition effects.

[0088] Figure 9 is a schematic diagram of a high frequency system that provides information on actual contact resistance.

[0089] Referring to FIG. 9, a high-frequency system according to one embodiment of the present invention may further include a judgment unit (50) that judges whether at least one of the variables measured from each individual electrode is out of a preset range, and an information provision unit (60) that provides contact resistance adjustment information to restore the variable out of the preset range back to within the preset range when the judgment unit determines that at least one of the variables is out of the preset range.

[0090] For example, if the voltage or impedance of any one of the plurality of electrodes increases excessively, the judgment unit determines that the contact resistance has increased excessively. Thereafter, the information provision unit (60) can externally display information about the determined electrode and information for reducing the resistance within a preset value (e.g., the degree of pressure), thereby allowing the user to take appropriate action.

[0091] In the case of a pressurized method, the high frequency application system according to one embodiment of the present invention may further include a pressure sensor for measuring the pressure applied to the electrode, and the pressurization may be a pneumatic method, but the scope of the present invention is not limited thereto.

[0092] Figure 10 is a step diagram for the operation method of the high-frequency system described above.

[0093] Referring to FIG. 10, a method for operating a high-frequency system according to an embodiment of the present invention may include the steps of: setting a limit contact resistance between an electrode and skin; measuring the contact resistance while applying high-frequency power; determining whether the contact resistance is lower than or equal to the limit contact resistance while applying high-frequency power; and modifying a contact resistance reduction means so that the contact resistance becomes lower than or equal to the set limit contact resistance. Thereafter, contact resistance reduction information (e.g., pressure level) that becomes lower than or equal to the limit contact resistance is stored, and when the electrode is used again, the stored contact resistance reduction information can be utilized as initial setting information.

[0094] In addition, in one embodiment of the present invention, the contact resistance reducing means can reduce the contact resistance by pressing the electrode toward the target object, and for this purpose, an elastic member or the like can be provided and used between the electrode and the support.

[0095] The present invention is a high-frequency application system including a contact resistance reduction means, and is recognized as having industrial applicability.

Claims

1. With a high frequency application system, An electrode that comes into contact with the target; A measuring means for measuring a variable associated with the effect of power applied from the above electrode; and A high-frequency application system comprising a contact resistance control means capable of controlling the contact resistance between the electrode and the target, wherein the contact resistance control means is determined in response to a variable measured by the measuring means.

2. In paragraph 1, A high frequency application system, wherein the above variable is a voltage or current or impedance of the electrode.

3. In paragraph 2, A high-frequency application system characterized in that the contact resistance control means controls the contact resistance to be below a preset resistance so that the power application effect applied from the electrode is above a preset intensity.

4. In paragraph 3, A high-frequency application system, characterized in that the above contact resistance control means is a means for controlling the pressure between the electrode and the target object at all times.

5. In paragraph 4, A high-frequency application system characterized in that the electrodes are plural in number and the measuring means independently measures variables from each of the plural electrodes.

6. In paragraph 3, A high-frequency application system, characterized in that the contact resistance control means includes an elastic member that presses the electrode in the direction of the target object.

7. In Article 3 A high-frequency application system, characterized in that the contact resistance adjustment means includes a pneumatic application means for pressing the electrode in the direction of the target object.

8. In the second paragraph, the high frequency application system, A high frequency application system further characterized by including a judgment unit that determines whether at least one of the above variables is out of a preset range.

9. In paragraph 8, the high frequency application system, A high-frequency application system characterized in that the judgment unit further includes an information providing unit that provides contact resistance adjustment information for restoring a variable out of the preset range back to within the preset range when at least one of the variables is out of the preset range.

10. In paragraph 5, A high frequency application system, characterized in that the high frequency application system further includes a pressure sensor for measuring the pressure applied to the electrode.

11. In paragraph 10, A high frequency application system characterized in that the above pressure sensor is attached to the above electrode.

12. In the first paragraph, the high frequency application system, A high-frequency application system characterized by delivering AC power covering a frequency range of 10 kHz to 1 MHz to a target object.

13. In the 12th paragraph, the high frequency application system, A high-frequency application system characterized by delivering AC power having a frequency range of 10 MHz to 50 MHz to a target object.

14. With a high frequency authorization system An electrode array in which the plurality of electrodes form an array and come into contact with the target object; and A high-frequency application system comprising a contact resistance control means capable of controlling the contact resistance between the electrodes and the target object, wherein the contact resistance control means controls the contact resistance by pressing the entire electrode array toward the target object, and wherein the pressure difference ratio between the electrodes (minimum pressure compared to maximum pressure / maximum pressure) is characterized in that it is within 20%.

15. In paragraph 14, The above electrode array is a mesh structure in which a plurality of electrodes are connected by an elastic material, and thus, the electrode array itself presses the target object with a force greater than a predetermined level according to the contraction of the elastic material. A high-frequency application system.

16. In the 14th paragraph, the high frequency application system, A high frequency application system further characterized by including a measuring means for measuring a variable related to the effect of power application applied from the above electrode.

17. In paragraph 16, A high frequency application system, wherein the above variable is a voltage or current or impedance of the electrode.

18. In paragraph 17, A high-frequency application system, characterized in that the above contact resistance is determined in response to a variable measured by the above measuring means.

19. In paragraph 18, the high frequency application system, A high frequency application system further characterized by including a judgment unit that determines whether at least one of the above variables is out of a preset range.

20. In paragraph 19, the high frequency application system, A high-frequency application system characterized in that the judgment unit further includes an information providing unit that provides contact resistance adjustment information for restoring a variable out of the preset range back to within the preset range when at least one of the variables is out of the preset range.

21. A contact resistance control means for a high-frequency application system according to any one of Articles 1 to 13, The above contact resistance control means is a contact resistance control means characterized in that it includes a mesh structure in which a plurality of electrodes are connected by an elastic material, and thus the electrode array itself presses the target object with a force greater than a predetermined level according to the contraction of the elastic material.

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