Substrate processing apparatus

The substrate processing device addresses the challenge of maintaining a sealed chamber by using an inclined opening/closing plate and a sealing reinforcement member, ensuring efficient and defect-free processing.

WO2025116359A1PCT designated stage expired Publication Date: 2025-06-05ZEUS
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Patent Information

Application Number
PCT/KR2024/017875
Authority / Receiving Office
WO · WO
Patent Type
Applications
Current Assignee / Owner
Priority Date
2023-11-29
Filing Date
2024-11-12
Publication Date
2025-06-05

AI Technical Summary

Technical Problem

Existing substrate processing devices face challenges in maintaining a sealed chamber interior during substrate movement, particularly due to the difficulty in sealing caused by internal mechanisms and pressure differences.

Method used

A substrate processing device with a chamber portion, a sealing portion, and an inclined opening/closing plate that moves back and forth to seal the chamber without interfering with the substrate's movement path, enhanced by a sealing reinforcement member made of an elastically deformable material.

Benefits of technology

The device ensures a sealed chamber environment during substrate processing, preventing defects and maintaining internal pressure, while allowing smooth substrate entry and exit without compromising the seal.

✦ Generated by Eureka AI based on patent content.

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Abstract

A substrate processing apparatus according to the present invention comprises: a chamber part; a sealing part provided in the chamber part and having a passage part through which a substrate is moved in a first direction; and an opening / closing plate disposed inside the chamber part to open and close the passage part, wherein the opening / closing plate is inclined in the first direction. The opening / closing plate moves up and down to open and close the passage part formed in the chamber part, enabling the smooth entry and exit of the substrate through the passage part while maintaining the internal sealing of the chamber part, thereby preventing substrate processing defects.
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Description

Substrate processing equipment

[0001] The present invention relates to a substrate processing device, and more particularly, to a substrate processing device capable of processing a substrate while maintaining a sealed interior of a chamber without obstructing the movement path of the substrate.

[0002] Typically, wafer processing processes in the semiconductor manufacturing process include photoresist coating, development and bake, etching, chemical vapor deposition, ashing, and cleaning and drying processes.

[0003] Traditionally, wafer processing is performed within a chamber, with a door opening the chamber to allow wafer movement and closing it to transition the chamber into wafer processing mode. However, slit valve-type doors have the disadvantage of being pushed by internal chamber pressure, making sealing difficult. Furthermore, placing equipment within the chamber reduces sealing performance. Therefore, improvements are needed.

[0004] The present invention has been devised to improve the above-mentioned problems, and its purpose is to provide a substrate processing device capable of processing a substrate while maintaining a sealed interior of a chamber without interfering with the movement path of the substrate.

[0005] A substrate processing device according to one aspect of the present invention comprises: a chamber portion; a sealing portion provided in the chamber portion and having a passage portion through which a substrate moves in a first direction; and an opening / closing plate disposed inside the chamber portion and opening / closing the passage portion; wherein the opening / closing plate is inclined with respect to the first direction.

[0006] The above opening / closing plate is formed to be inclined, moves back and forth in the second direction, and is in surface contact with the sealing portion to seal the chamber portion.

[0007] At least one of the above opening / closing plate and the above sealing portion may further be provided with a sealing reinforcement portion.

[0008] A sealing groove may be formed in the other of the above-mentioned opening / closing plate and the above-mentioned sealing portion into which the sealing reinforcing portion is inserted when the above-mentioned opening / closing plate and the above-mentioned sealing portion are in close contact.

[0009] The above-mentioned sealing reinforcement may be made of an elastically deformable material.

[0010] The above-mentioned sealing reinforcement part may have a protrusion and a sealing part formed on the opening / closing plate and the sealing part.

[0011] A groove may be formed in the other of the above opening / closing plate and the sealing portion into which the sealing reinforcing portion is inserted when the opening / closing plate and the sealing portion are in close contact.

[0012] The above first direction and the above second direction may be orthogonal.

[0013] The substrate processing device according to the present invention may further include: an opening / closing control unit connected to the opening / closing plate and controlling the operation of the opening / closing plate.

[0014] The above opening / closing control unit may be placed on the outside of the chamber unit.

[0015] The above opening / closing control unit may be provided at least on one of the two ends of the chamber unit so as not to interfere with the path of the moving substrate.

[0016] The substrate processing device according to the present invention may further include: an additional sealing portion provided on the other side of the chamber portion and having an additional passage portion through which the substrate moves; and an additional opening / closing plate disposed inside the chamber portion and opening and closing the additional passage portion.

[0017] The substrate processing device according to the present invention opens and closes a passage formed in a chamber portion as the opening / closing plate moves up and down, thereby enabling smooth entry and exit of substrates through the passage portion and maintaining the internal seal of the chamber portion, thereby preventing substrate processing defects.

[0018] FIG. 1 is a drawing schematically showing a state in which a substrate is movable in a substrate processing device according to one embodiment of the present invention.

[0019] FIG. 2 is a drawing schematically showing a state in which processing of a substrate is possible in a substrate processing device according to one embodiment of the present invention.

[0020] Figure 3 is a drawing schematically showing a sealing part according to one embodiment of the present invention.

[0021] FIG. 4 is a drawing schematically showing a door structure according to one embodiment of the present invention.

[0022] Figure 5 is a drawing schematically showing a sealing reinforcement part according to one embodiment of the present invention.

[0023] Figure 6 is a drawing schematically showing a modified example of a sealing reinforcement part according to one embodiment of the present invention.

[0024] FIG. 7 is a drawing schematically showing a state in which a groove and a protrusion are formed in a sealing portion and a door structure according to one embodiment of the present invention.

[0025] FIG. 8 is a drawing schematically showing a modified example in which a groove and a protrusion are formed in a sealing portion and a door structure according to one embodiment of the present invention.

[0026] FIG. 9 is a drawing schematically showing an opening / closing control unit and a door structure according to one embodiment of the present invention.

[0027] Fig. 10 is a drawing schematically showing an opening / closing control unit and a door structure according to another embodiment of the present invention.

[0028] Fig. 11 is a drawing schematically showing a state in which an additional passage part is formed in a chamber part according to one embodiment of the present invention.

[0029] Hereinafter, embodiments of a substrate processing device according to the present invention will be described with reference to the attached drawings. In this process, the thickness of lines and the sizes of components depicted in the drawings may be exaggerated for clarity and convenience. Furthermore, the terms described below are defined based on their functions in the present invention and may vary depending on the intentions or practices of the user or operator. Therefore, the definitions of these terms should be based on the contents throughout this specification.

[0030] FIG. 1 is a drawing schematically showing a state in which a substrate is movable in a substrate processing device according to one embodiment of the present invention, FIG. 2 is a drawing schematically showing a state in which processing of a substrate is possible in a substrate processing device according to one embodiment of the present invention, FIG. 3 is a drawing schematically showing a sealing part according to one embodiment of the present invention, and FIG. 4 is a drawing schematically showing a door structure according to one embodiment of the present invention.

[0031] Referring to FIGS. 1 and 4, a substrate processing device (1) according to one embodiment of the present invention may include a chamber portion (10), a passage portion (20), a door structure (30), an opening / closing control portion (40), and a sealing portion (50).

[0032] The chamber unit (10) can form a space so that equipment can be built into it. The chamber unit (10) can be fixedly installed on the ground or equipment and can have a hexahedral shape. The processing unit (100) built into the chamber unit (10) can spray a processing material onto the substrate (90) while rotating the substrate (90) when the substrate (90) is placed thereon. Alternatively, the processing unit (100) can perform a semiconductor process while the substrate (90) is fixed without rotating it. Meanwhile, the substrate (90) can be a wafer used in a semiconductor process.

[0033] A passageway (20) is provided in the chamber (10), and a substrate (90) can be moved in a first direction (x) between the outside and the inside of the chamber (10). The passageway (20) can penetrate the upper part of one side of the chamber (10) and allow the substrate (90) to pass in the first direction (x). For example, the substrate (90) can be moved in the +first direction (+x) to be introduced into the chamber (10) through the passageway (20) by a transport means, or can be moved in the -first direction (-x) to be taken out of the chamber (10). For example, the passageway (20) can be a hole formed in one side of the chamber (10).

[0034] The door structure (30) can open and close the passageway (20). The door structure (30) can open the passageway (20) to allow entry and exit of a substrate (90) through the passageway (20). In this case, the interior of the chamber (10) may be at normal pressure. The door structure (30) can close the passageway (20) while a processing process is being performed on the substrate (90) placed in the chamber (10).

[0035] In this case, the interior of the chamber (10) may be subjected to a pressure greater than atmospheric pressure. The door structure (30) may be positioned within the chamber (10). The door structure (30) will be described in detail with reference to FIG. 4.

[0036] The opening / closing control unit (40) is connected to the door structure (30) and can control the operation of the door structure (30). The opening / closing control unit (40) can be placed outside the chamber unit (10). A part of the opening / closing control unit (40) can have its own length variable so that the door structure (30) can move to open or close the passage unit (20).

[0037] In addition, the opening / closing control unit (40) can control movement of the door structure (30) through various power transmissions from the outside of the chamber unit (10). This opening / closing control unit (40) can also be placed inside the chamber unit (10).

[0038] The first direction (x) refers to the direction of movement of the substrate (90), and the second direction (y) intersecting the first direction (x) refers to the direction of movement of the door structure (30). In Fig. 3, the third direction (z) intersecting the first direction (x) and the second direction (y) refers to the width direction of the passageway (20).

[0039] The third direction (z) may be the longitudinal direction of the opening / closing plate (35, see FIG. 7). The first direction (x) to the third direction (z) may be used to define the object throughout the description of the invention. The first direction (x) and the second direction (y) may intersect. The first direction (x) in which the substrate (90) moves may refer to the horizontal direction of the installation surface on which the substrate processing device is installed, and the second direction (y) in which the door structure (30) moves may refer to the vertical direction of the installation surface on which the substrate processing device is installed.

[0040] The sealing portion (50) has a passage portion (20) and can seal the chamber portion (10) in correspondence with the door structure (30). The sealing portion (50) can be arranged to surround the passage portion (20). In other words, the passage portion (20) can be formed by penetrating a portion of the sealing portion (50).

[0041] Referring to FIG. 3, the sealing portion (50) may include an upper sealing portion (51), a lower sealing portion (52), and a side sealing portion (53).

[0042] The upper sealing part (51) is located at the upper part of the passage part (20), the lower sealing part (52) is located at the lower part of the passage part (20), and the side sealing parts (53) are arranged on both sides of the passage part (20) to physically connect the upper sealing part (51) and the lower sealing part (52).

[0043] The sealing portion (50) may correspond to a part of the chamber portion (10). The sealing portion (50) may be formed integrally with the chamber portion (10). The sealing portion (50) may be formed separately from the chamber portion (10), in which case it may be joined to a part of the side surface of the chamber portion (10).

[0044] The upper sealing portion (51), the lower sealing portion (52), and the side sealing portion (53) of the sealing portion (50) may have an inner surface (54) exposed to the inner space of the chamber portion (10). The inner surface (54) of the sealing portion (50) may be formed to have a slope to induce surface contact with the door structure (30). The inner surface (54) of the sealing portion (50) may have a first angle (a1, see FIG. 4) with respect to the lower surface of the chamber portion (10). The lower surface of the chamber portion (10) may be parallel to the first direction (x). The first angle (a1) may be, for example, an acute angle.

[0045] Referring to FIG. 4, the door structure (30) can move back and forth in the second direction (y) to correspond to the sealing portion (50) to seal the chamber portion (10), or to connect the internal space and the external space of the chamber portion (10) by being spaced apart from the sealing portion (50).

[0046] When the door structure (30) is lowered in the second direction (y), the internal space of the passageway (20) and the chamber (10) can be connected. When the door structure (30) is raised in the second direction (y), the door structure (30) is brought into close contact with the sealing portion (50), thereby disconnecting the internal space of the passageway (20) and the chamber (10), thereby sealing the chamber (10).

[0047] The door structure (30) may include an opening / closing plate (35) that is arranged at an angle and can be in surface contact with the inner surface (54) of the sealing portion (50), and an opening / closing connecting portion (36) that is coupled to the opening / closing plate (35). At this time, as mentioned above, the door structure (30) corresponding to the sealing portion (50) may include that the opening / closing plate (35) of the door structure (30) is in close contact with the inner surface (54) of the sealing portion (50) to cover the passageway (20).

[0048] The opening / closing plate (35) may be arranged to be inclined so as to have a second angle (a2) with respect to the lower surface of the chamber portion (10). The first angle (a1) and the second angle (a2) may be the same. The opening / closing plate (35) may extend in a third direction (z) corresponding to the left-right width of the passage portion (20) in FIG. 3.

[0049] The opening / closing connection part (36) is connected to the opening / closing control part (40) and can be moved by the opening / closing control part (40). The third direction (z) length corresponding to the width of the opening / closing plate (35) can be formed to be longer than the width of the passage part (20).

[0050] The height of the opening / closing plate (35) (i.e., the length in the second direction (y)) can be formed to be greater than the height of the passageway (20). That is, the opening / closing plate (35) can be designed to have a size that covers the entire opened area of ​​the passageway (20). The opening / closing connection part (36) can be mounted on both left and right ends of the opening / closing plate (35) to prevent interference with the substrate (90) passing through the passageway (20).

[0051] FIG. 5 is a drawing schematically showing a sealing reinforcement part according to one embodiment of the present invention, and FIG. 6 is a drawing schematically showing a modified example of the sealing reinforcement part according to one embodiment of the present invention.

[0052] Referring to FIGS. 5 and 6, a substrate processing device (1) according to one embodiment of the present invention may further include a sealing reinforcement part (60). The sealing reinforcement part (60) may be provided in at least one of the door structure (30) and the sealing part (50).

[0053] Referring to Fig. 5, the sealing reinforcement part (60) can be installed on the sealing part (50). As shown in Fig. 5a, the sealing reinforcement part (60) can be placed on the inner surface (54) of the sealing part (50) so as to surround the passage part (20). Specifically, the sealing reinforcement part (60) is placed on the inner surface (54) of each of the upper sealing part (51), the lower sealing part (52), and the side sealing part (53), and can be in close contact with the opening / closing plate (35) to maintain airtightness.

[0054] As illustrated in Fig. 5b, a sealing groove (60a) may be formed in the opening / closing plate (35). The sealing groove (60a) may be formed at a portion of the opening / closing plate (35) where the sealing reinforcement portion (60) on the sealing portion (50) faces when the opening / closing plate (35) and the sealing portion (50) are in close contact. Therefore, the sealing reinforcement portion (60) on the sealing portion (50) may be inserted into the sealing groove (60a) when the opening / closing plate (35) and the sealing portion (50) are in close contact. This may improve the sealing between the opening / closing plate (35) and the sealing portion (50).

[0055] Referring to Fig. 6, the sealing reinforcement part (60) can be installed on the opening / closing plate (35) of the door structure (30). As shown in Fig. 6b, the sealing reinforcement part (60) can be placed on the opening / closing plate (35) so as to surround the passageway (20) when the opening / closing plate (35) and the sealing part (50) are in close contact. The area of ​​the sealing reinforcement part (60) placed on the opening / closing plate (35) can surround the entire area of ​​the passageway (20) formed on the sealing part (50).

[0056] As illustrated in Fig. 6a, a sealing groove (60a) may be formed in the sealing portion (50). Specifically, the sealing groove (60a) may be formed on the inner surface (54) of each of the upper sealing portion (51), the lower sealing portion (52), and the side sealing portion (53). The sealing groove (60a) may be formed on the inner surface (54) of the sealing portion (50) where the sealing reinforcement portion (60) on the opening / closing plate (35) faces when the opening / closing plate (35) and the sealing portion (50) are in close contact. Therefore, the sealing reinforcement portion (60) on the opening / closing plate (35) may be inserted into the sealing groove (60a) when the opening / closing plate (35) and the sealing portion (50) are in close contact. This may improve the sealing between the opening / closing plate (35) and the sealing portion (50).

[0057] The sealing reinforcement part (60) may be made of an elastically deformable material. The sealing reinforcement part (60) may be molded from a rubber or silicone material.

[0058] FIG. 7 is a drawing schematically showing a state in which a groove and a protrusion are formed in a sealing portion and a door structure according to one embodiment of the present invention, and FIG. 8 is a drawing schematically showing a modified example in which a groove and a protrusion are formed in a sealing portion and a door structure according to one embodiment of the present invention.

[0059] Referring to Fig. 7, a groove (61) may be formed on the inner surface (54) of the sealing portion (50). The sealing reinforcement portion (60) may be installed on the opening / closing plate (35) and may be provided with a protrusion (62) and a sealing portion (63). The groove (61) of the sealing portion (50) may be arranged to correspond to the protrusion (62) of the sealing reinforcement portion (60), and the protrusion (62) may be configured to be inserted into the groove (61).

[0060] When the opening / closing plate (35) rises in the second direction (y) to cover the inner surface (54) of the sealing portion (50), the protrusion (62) of the sealing reinforcement portion (60) can be placed within the recessed portion (61) of the sealing portion (50). The sealing reinforcement portion (60) does not simply have an O-ring shape, but has a protrusion (62) to increase the sealing between the opening / closing plate (35) and the sealing portion (50) and to suppress the movement of the opening / closing plate (35) with respect to the sealing portion (50).

[0061] A plurality of protrusions (62) may be provided, and the plurality of protrusions (62) may be spaced apart from each other along the edge of the opening / closing plate (35) on one side of the opening / closing plate (35) corresponding to the sealing portion (50). A sealing portion (63) may be provided between the plurality of protrusions (62). The sealing portion (63) connects the plurality of protrusions (62) and is provided between the opening / closing plate (35) and the sealing portion (50) to prevent gas leakage. The plurality of protrusions (62) and the sealing portion (63) may form a closed curve. The sealing reinforcing portion (60) may be made of an elastically deformable material.

[0062] Referring to Fig. 8, the sealing reinforcement portion (60) may be placed on the inner surface (54) of the sealing portion (50) and may be provided with a protrusion (62) and a sealing portion (63). A groove (61) may be formed on the upper surface of the opening / closing plate (35).

[0063] The groove (61) of the opening / closing plate (35) may be arranged to correspond to the protrusion (62) of the sealing reinforcement part (60) on the sealing part (50), and the protrusion (62) may be configured to be inserted into the groove (61).

[0064] When the opening / closing plate (35) rises in the second direction (y) to cover the inner surface (54) of the sealing portion (50), the protrusion (62) of the sealing reinforcement portion (60) can be placed within the recessed portion (61) of the opening / closing plate (35). The sealing reinforcement portion (60) does not simply have an O-ring shape, but has a protrusion (62) to increase the sealing between the opening / closing plate (35) and the sealing portion (50) and to suppress the movement of the opening / closing plate (35) with respect to the sealing portion (50).

[0065] A plurality of protrusions (62) may be provided, and the plurality of protrusions (62) may be spaced apart from each other so as to surround the passage (20) on the inner surface (54) of the sealing portion (50). A sealing portion (63) may be provided between the plurality of protrusions (62). The sealing portion (63) connects the plurality of protrusions (62) and is provided between the opening / closing plate (35) and the sealing portion (50) to prevent gas leakage. The plurality of protrusions (62) and the sealing portion (63) may form a closed curve. The sealing reinforcing portion (60) may be made of an elastically deformable material.

[0066] Fig. 9 is a schematic diagram illustrating an opening / closing control unit and a door structure according to one embodiment of the present invention. Referring to Fig. 9, the opening / closing control unit (40) may be positioned on the outside of the chamber unit (10). The opening / closing control unit (40) may be provided on at least one of the two end portions of the chamber unit (10) so as not to interfere with the path of the moving substrate (90).

[0067] The opening / closing control unit (40) may include a control driving unit (41) that is driven when power is applied, a control variable unit (42) whose length is changed or moved in the second direction (y) by the control driving unit (41), a control horizontal bar unit (43) connected to the control variable unit (42), and a control vertical bar unit (44) that is connected to both ends of the control horizontal bar unit (43) and extends downward.

[0068] The control variable part (42) can be arranged between the control driving part (41) and the door structure (30). The control variable part (42) connects the control driving part (41) and the control horizontal bar part (43), and the door structure (30) can be moved in the second direction (y) by the control variable part (42) to open and close the passage part (20). When the door structure (30) is moved in the second direction (y), the length of the control variable part (42) in the second direction (y) can be changed.

[0069] When the door structure (30) is lowered in the second direction (y), the control variable part (42) may be lengthened in the second direction (y). In this case, the door structure (30) may be spaced apart from the inner surface (54) of the sealing part (50) so that the passage part (20) and the inside of the chamber part (10) may be connected.

[0070] When the door structure (30) rises in the second direction (y), the control variable part (42) may be shortened in the second direction (y). In this case, the door structure (30) may be in close contact with the inner surface (54) of the sealing part (50), so that the passage part (20) and the inside of the chamber part (10) may be separated. The control variable part (42) may be arranged within at least one of the sealing part (50), the passage part (20), and the chamber part (10).

[0071] The control horizontal bar (43) can be placed between the control variable part (42) and the control vertical bar part (44) to connect them. The control horizontal bar part (43) can be moved up and down within at least one of the sealing part (50), the passage part (20), and the chamber part (10) by the control variable part (42).

[0072] When the control variable section (42) is lengthened in the second direction (y) (i.e., when the door structure (30) is lowered in the second direction (y)), the control horizontal bar section (43) can be placed in at least one of the upper sealing section (51), the passage section (20), and the chamber section (10).

[0073] When the control variable portion (42) is shortened in the second direction (y) (i.e., when the door structure (30) rises in the second direction (y)), the control horizontal bar portion (43) may be placed within the upper sealing portion (51). In this case, the upper sealing portion (51) may be provided with a groove (not shown) corresponding to the control horizontal bar portion (43).

[0074] The control vertical rod (44) can be connected to both ends of the control horizontal rod (43). The control vertical rod (44) can be arranged between the control horizontal rod (43) and the opening / closing connection (36) to connect them. The control vertical rod (44) can be moved up and down within at least one of the sealing portion (50), the passage portion (20), and the chamber portion (10) by the control variable portion (42).

[0075] When the control variable section (42) is lengthened in the second direction (y) (i.e., when the door structure (30) is lowered in the second direction (y)), the control vertical rod section (44) can be placed in at least one of the upper sealing section (51), the passage section (20), and the chamber section (10).

[0076] When the control variable section (42) is shortened in the second direction (y) (i.e., when the door structure (30) rises in the second direction (y)), the control vertical rod section (44) may be placed within the upper sealing section (51). In this case, the upper sealing section (51) may be provided with a groove (not shown) corresponding to the control vertical rod section (44).

[0077] The substrate (90) can be moved through a space (S) formed by a control horizontal bar (43), a control vertical bar (44), and an opening / closing plate (35). Accordingly, the space (S) can have a minimum width and height that allow the substrate (90) and the moving means (not shown) to move within the space (S).

[0078] Fig. 10 is a schematic drawing of an opening / closing control unit and a door structure according to another embodiment of the present invention. Referring to Fig. 10, the opening / closing control unit (40) may include a control operating unit (45) that is driven when power is applied, and a control moving unit (46) whose length is changed or moved in the second direction (y) by the control operating unit (45).

[0079] The control moving part (46) may be arranged between the control operating part (45) and the door structure (30). The control moving part (46) connects the control operating part (45) and the opening / closing connection part (36), and the door structure (30) may be moved in the second direction (y) by the control moving part (46) to open / close the passageway (20). For example, the control moving part (46) may be provided within the sealing part (50). For another example, the control moving part (46) may be provided within the sealing part (50) and the passageway (20). In one embodiment, the space (S) may be an area formed by the control moving part (46) and the opening / closing plate (35).

[0080] Fig. 11 is a schematic diagram illustrating a state in which an additional passage section is formed in a chamber section according to one embodiment of the present invention. Referring to Fig. 9, a substrate processing device (1) according to one embodiment of the present invention may further include an additional passage section (71), an additional door structure (72), and an additional opening / closing control section (73).

[0081] An additional passage (71) is provided in the chamber (10), and the substrate (90) can be moved in the first direction (x) between the outer and inner sides of the chamber (10). The additional passage (71) can penetrate the upper part of the other side of the chamber (10) and allow the substrate (90) to pass in the first direction (x). For example, the additional passage (71) can be a hole formed in the other side of the chamber (10). The substrate (90) is introduced into the chamber (10) by passing through the passage (20) in the first direction (x) by a transport means, and when the processing of the substrate (90) is completed, the substrate (90) can be taken out from the chamber (10) by passing through the additional passage (71) in the first direction (x) by the transport means.

[0082] The additional door structure (72) can open and close the additional passageway (71). The additional door structure (72) can open the additional passageway (71) to allow entry and exit of a substrate (90) through the additional passageway (71). The additional door structure (72) can close the additional passageway (71) while a processing process is being performed on a substrate (90) placed in the chamber (10).

[0083] The additional opening / closing control unit (73) is connected to the additional door structure (72) and can control the operation of the additional door structure (72). The additional opening / closing control unit (73) can be arranged outside the chamber unit (10). The additional opening / closing control unit (73) has a variable length and can move the additional door structure (72) so that the additional door structure (72) opens or closes the additional passageway (71). In addition, the additional opening / closing control unit (73) can control the movement of the additional door structure (72) through various power transmissions from the outside of the chamber unit (10). This additional opening / closing control unit (73) can also be arranged inside the chamber unit (10).

[0084] The specific configuration of the additional door structure (72) and the additional opening / closing control unit (73) corresponds to the detailed configuration of the door structure (30) and the opening / closing control unit (40) described above, and therefore, a detailed description thereof is omitted. In addition, an additional sealing unit (74) corresponding to the sealing unit (50) of FIG. 3 may be formed in the chamber unit (10), and the additional passage unit (71) may be formed by penetrating a portion of the additional sealing unit (74). Meanwhile, the additional door structure (72) may be provided with an additional opening / closing connection unit that is connected to the additional opening / closing plate and the additional opening / closing control unit (73).

[0085] The operation process of a substrate processing device according to one embodiment of the present invention having the above structure is described as follows.

[0086] When the substrate (90) is emptied in the chamber (10), the opening / closing control unit (40) is operated so that the door structure (30) opens the passage (20), the transport means grips the substrate (90) and inserts the substrate (90) into the chamber (10).

[0087] When the substrate (90) is inserted into the chamber (10), the opening / closing control unit (40) is operated so that the door structure (30) closes the passage (20). When the passage (20) is closed, a processing process for the substrate (90) is performed inside the chamber (10).

[0088] When processing of the substrate (90) inside the chamber (10) is completed, the door structure (30) opens the passage (20), and the transport means takes the substrate (90) installed in the chamber (10) out of the chamber (10) and moves it to the post-process.

[0089] Meanwhile, in the case where an additional passageway (71), an additional door structure (72), and an additional opening / closing control unit (73) are additionally provided, the substrate (90) can be introduced into the chamber (10) through the passageway (20), and the substrate (90) can be withdrawn from the chamber (10) through the additional passageway (71).

[0090] In a substrate processing device (1) according to one embodiment of the present invention, a door structure (30) moves up and down to open and close a passage (20) formed in a chamber (10), thereby enabling smooth entry and exit of a substrate (90) through the passage (20), and preventing defective processing of the substrate (90) by maintaining the chamber (10) itself airtight.

[0091] While the present invention has been described with reference to the embodiments illustrated in the drawings, these are merely exemplary, and those skilled in the art will understand that various modifications and equivalent embodiments are possible. Accordingly, the true technical protection scope of the present invention should be defined by the following claims.

Claims

1. Chamber; A sealing part provided in the chamber part and having a passage part through which the substrate moves in the first direction; and Including an opening / closing plate arranged inside the chamber and opening / closing the passage; The above-mentioned opening and closing plate is a substrate processing device tilted with respect to the first direction.

2. In paragraph 1, the opening / closing plate, A substrate processing device characterized in that it is formed inclined, moves back and forth in a second direction, and makes surface contact with the sealing portion to seal the chamber portion.

3. In paragraph 1, A substrate processing device characterized in that one of the above opening / closing plate and the above sealing part further comprises a sealing reinforcing part.

4. In paragraph 3, A substrate processing device in which a sealing groove is formed in the other of the above opening / closing plate and the above sealing member, into which the sealing reinforcing member is inserted when the above opening / closing plate and the above sealing member are in close contact.

5. In paragraph 3, A substrate processing device, characterized in that the above-mentioned sealing reinforcement member is made of an elastically deformable material.

6. In paragraph 3, A substrate processing device characterized in that the above sealing reinforcement part has a protrusion and a sealing part formed on one of the opening / closing plate and the sealing part.

7. In paragraph 6, A substrate processing device in which a groove is formed in the other of the above opening / closing plate and the above sealing member into which the sealing reinforcing member is inserted when the above opening / closing plate and the above sealing member are in close contact.

8. In paragraph 2, A substrate processing device, characterized in that the first direction and the second direction are orthogonal.

9. In paragraph 1, A substrate processing device further comprising: an opening / closing control unit connected to the opening / closing plate and controlling the operation of the opening / closing plate.

10. In paragraph 9, A substrate processing device, characterized in that the above opening / closing control unit is arranged on the outside of the chamber unit.

11. In paragraph 9, A substrate processing device characterized in that the opening / closing control unit is provided at least on one end of both sides of the chamber unit so as not to interfere with the path of the moving substrate.

12. In paragraph 1, An additional sealing section provided on the other side of the chamber section and having an additional passage section through which the substrate moves; and A substrate processing device characterized by further comprising an additional opening / closing plate disposed inside the chamber section and opening / closing the additional passage section.

Citation Information

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