Ion source grid adjustable structure, adjustment method, and ion source device

Abstract

An ion source grid adjustable structure (100), an adjustment method, and an ion source device (1000). The ion source grid adjustable structure (100) comprises: a grid holder (101) rotatably mounted at an opening of an ion source cavity (200), wherein the grid holder (101) has a mounting surface configured to face an ion source in the ion source cavity (200); grid assemblies (102), wherein there are at least two grid assemblies (102) which are sequentially mounted on the mounting surface in a spaced manner along a direction away from the mounting surface; and adjustment assemblies (103), where there are a plurality of adjustment assemblies (103), and at least one adjustment assembly (103) is provided between two adjacent grid assemblies (102). When the direction of an ion beam led out by the ion source needs to be changed, the grid holder (101) correspondingly rotates, so that the ion beam perpendicular to the grid assemblies (102) follows the rotation to change the emission angle, thereby expanding application scenarios of the ion source. When the distance between the grid assemblies (102) cannot meet usage requirements or a processing error is present, the distance between the grid assemblies (102) is adjusted by means of the adjustment assemblies (103), thereby ameliorating the problems of non-uniform ion beam current and the like.

Description

Ion source grid adjustable structure, adjustment method and ion source equipment

[0001] This application claims priority to the Chinese patent application filed with the China Patent Office on December 25, 2023, with application number 2023118073913 and application name “An adjustable ion source grid structure, adjustment method and ion source equipment”, the entire contents of which are incorporated by reference into this application. Technical Field

[0002] The present application relates to the technical field of semiconductor chip production, and in particular to an ion source grid adjustable structure, an adjustment method, and an ion source device. Background Art

[0003] Ion beam coating and etching play a crucial role in semiconductor chip production. Relying on high-energy ion beams, any material can be etched / sputtered, thereby removing surface material from wafers or depositing coatings on sputtering targets (high-purity materials). The device that generates the ion beam is an ion source, and its operating principle can be roughly divided into the following steps: 1. High-purity process gas is introduced, ionized into positive ions and electrons within the ion source; 2. A multi-layer grid is arranged at the ion source outlet, and a voltage is applied to the grid to form an electric field; 3. The positive ions are accelerated and ejected by the electric field; 4. A neutralizer emits electrons to neutralize the positive ion beam, achieving an electrically neutral ion beam.

[0004] During the operation of the ion source, the energy, beam direction, and beam bombardment area of ​​the extracted ion beam are all controlled by the grid structure. In the existing ion source structure, multiple layers of grids are installed on the ion source cavity with a certain spacing between them. The grids are completely fixed and cannot be moved. This type of grid structure often has the following problems: First, due to the processing errors of the grid fixings, the ion beam is uneven or even sparks occur, affecting the operation of the ion source; second, due to the relatively fixed grid spacing, the energy adjustment range of the extracted ion beam is small, and its application is limited; third, due to the fixed shape and position of the grid, the parameters such as the angle and bombardment area of ​​the extracted beam are difficult to change, and the application scenarios are limited.

[0005] In summary, how to expand the application scenarios of ion sources and improve the non-uniformity of ion beam current is an urgent problem to be solved by those skilled in the art.

[0006] Application Contents

[0007] In view of this, the first purpose of the present application is to provide an adjustable ion source grid structure to expand the application scenarios of the ion source and improve the non-uniformity of the ion beam.

[0008] The second object of this application is to provide an ion source grid adjustment method.

[0009] The third object of this application is to provide an ion source device.

[0010] In order to achieve the above first purpose, this application provides the following solutions:

[0011] An ion source grid adjustable structure, comprising:

[0012] A grid fixing frame rotatably mounted at the opening of the ion source cavity, wherein the grid fixing frame has a mounting surface for facing the ion source arrangement inside the ion source cavity;

[0013] Grid assemblies, the number of which is at least two, and which are installed on the mounting surface in a sequentially spaced manner in a direction away from the mounting surface;

[0014] There are multiple adjustment components, and at least one adjustment component is set between adjacent grid components to adjust the distance between adjacent grid components.

[0015] In a specific embodiment, the adjustment assembly includes a coarse adjustment fastener, an elastic member, and a fine adjustment fastener;

[0016] In two adjacent grid assemblies, the coarse adjustment fastener is fastened to one and elastically connected to the other via the elastic member, and the fine adjustment fastener is fastened to one and abuts against the other.

[0017] In another specific embodiment, in two adjacent grid assemblies, the coarse adjustment fastener abuts against one, and the screw of the coarse adjustment fastener passes through one and is threadedly connected to the other; the screw of the fine adjustment fastener is threadedly connected to one, passes through the one and abuts against the other; or the fine adjustment fastener passes through one and is threadedly connected to the other.

[0018] The elastic member is sleeved on the coarse adjustment fastener, and one end of the elastic member abuts or is connected to the nut of the coarse adjustment fastener, and the other end abuts or is connected to the grid assembly closer to the nut of the coarse adjustment fastener; or, the elastic member is sleeved on the coarse adjustment fastener and is located between two adjacent grid assemblies, one end of the elastic member abuts or is connected to one of the two adjacent grid assemblies, and the other end abuts or is connected to the other.

[0019] In another specific embodiment, a receiving groove is further provided on the grid assembly, and the receiving groove is used to receive the elastic member.

[0020] In another specific embodiment, the adjustment assembly further comprises a locking fastener;

[0021] The locking fastener is used to lock two adjacent grid assemblies.

[0022] In another specific embodiment, the grid assembly includes a grid fixing ring and a grid;

[0023] An annular mounting groove is provided on the inner ring wall of the grid fixing ring, and the edge of the grid is mounted in the annular mounting groove.

[0024] In another specific embodiment, the grid assembly further comprises a grid locking member;

[0025] The grid locking member is an insulating member, which is used to lock the grid in the annular mounting groove.

[0026] In another specific embodiment, a measuring block is further provided on the grid fixing ring;

[0027] The measuring block has a measuring surface flush with the grid.

[0028] In another specific embodiment, a measuring hole for inserting measurement is provided on the measuring surface of the measuring block.

[0029] In another specific embodiment, a positioning post is provided on the grid fixing frame, and each grid assembly is provided with a positioning hole that is positioned and matched with the positioning post.

[0030] In another specific embodiment, the ion source grid adjustable structure further comprises a rotation drive assembly for driving the grid fixing frame to rotate.

[0031] In another specific embodiment, the rotary drive assembly includes a driving member, a reduction mechanism, and a magnetic fluid shaft;

[0032] The magnetic fluid shaft passes through the ion source cavity, and one end is connected to the vacuum shaft on the grid fixing frame, and the other end is connected to the output end of the speed reduction mechanism. The driving member is connected to the input end of the speed reduction mechanism.

[0033] In another specific embodiment, the driving member is an adjustment knob;

[0034] The deceleration mechanism is provided with a rotation scale, and the adjustment knob is provided with a pointer pointing to the rotation scale for displaying the rotation angle of the grid fixing frame.

[0035] The various embodiments of the present application can be arbitrarily combined as needed. The embodiments obtained after these combinations are also within the scope of the present application and are part of the specific implementation methods of the present application.

[0036] In order to achieve the above second purpose, this application provides the following solution:

[0037] An ion source device comprises an ion source, an ion source cavity and an ion source grid adjustable structure as described in any one of the above;

[0038] The ion source is installed in the ion source cavity, the ion source adjustable grid structure is rotatably installed at the opening of the ion source cavity, and the ion beam emitted by the ion source is perpendicular to the grid component of the ion source adjustable grid structure.

[0039] In order to achieve the third objective above, this application provides the following solutions:

[0040] A method for adjusting an ion source grid, comprising:

[0041] Providing an adjustable ion source grid structure as described in any one of the above;

[0042] The adjusting components of the ion source grid adjustable structure are adjusted so that the spacing between the grid components of the ion source grid adjustable structure is a preset value.

[0043] In a specific embodiment, the adjusting component for adjusting the adjustable structure of the ion source grid specifically includes:

[0044] Adjusting the coarse adjustment fastener of the adjustment assembly so that the spacing between adjacent grid assemblies is smaller than the preset value;

[0045] Adjusting the fine-adjustment fasteners of the adjustment assembly so that the spacing between adjacent grid assemblies increases to the preset value;

[0046] The adjacent grid assemblies are locked by the locking fasteners of the adjustment assembly.

[0047] In another specific embodiment, after adjusting the spacing of the grid assembly to a preset value, the method further comprises:

[0048] Detect whether the distance between adjacent grid components is the preset value, if so, end the process, if not, continue to adjust the distance between adjacent grid components by adjusting the adjustment component.

[0049] The ion source grid adjustable structure provided by the present application is installed at the opening of the ion source cavity when in use. When the direction of the ion beam extracted from the ion source needs to be changed, the grid fixing frame rotates accordingly, causing the grid assembly to rotate, so that the ion beam perpendicular to the grid assembly changes the exit angle following the rotation of the grid assembly, thereby meeting the use requirements and expanding the application scenarios of the ion source. When the spacing between the grid assemblies cannot meet the use requirements, the spacing between the grid assemblies is adjusted by adjusting the assembly, thereby increasing the ion beam flow adjustment range. In addition, when there is a processing error, the spacing between the grid assemblies can be adjusted by adjusting the assembly to improve problems such as uneven ion beam flow. BRIEF DESCRIPTION OF THE DRAWINGS

[0050] In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the following briefly introduces the drawings required for use in the embodiments or the description of the prior art. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without any creative work.

[0051] FIG1 is a schematic diagram of the main structure of the ion source device provided in this application;

[0052] FIG2 is a schematic diagram of the right side structure of the ion source device provided in this application;

[0053] FIG3 is a schematic diagram of the AA cross-sectional structure of FIG2 provided by this application;

[0054] FIG4 is a schematic diagram of a partial cross-sectional structure of the present application when the spacing between grid components is roughly adjusted;

[0055] FIG5 is a schematic diagram of a partial cross-sectional structure of the grid components provided by the present application when fine-tuning the spacing between them;

[0056] FIG6 is a schematic diagram of a partial cross-sectional structure of the grid components provided by the present application when the spacing between the grid components is adjusted and tightened;

[0057] FIG7 is a schematic structural diagram of the ion source device provided by the present application when facing the target;

[0058] FIG8 is a schematic diagram of the structure of the ion source grid adjustable structure provided by the present application after being rotated to face the target;

[0059] FIG9 is a schematic structural diagram of the spacing between grid components provided in this application;

[0060] FIG10 is a flow chart of the ion source grid adjustment method provided by the present application;

[0061] FIG11 is a sequence diagram of adjusting each grid component of an ion source grid adjustment method provided in a specific embodiment of the present application.

[0062] Among them, in Figures 1 to 11:

[0063] Ion source grid adjustable structure 100, grid fixing frame 101, positioning column 101a, vacuum shaft 101b, grid assembly 102, grid fixing ring 102-1, measuring block 102-1a, measuring hole 102-1b, grid 102-2, grid locking member 102-3, adjustment assembly 103, coarse adjustment fastener 103-1, elastic member 103-2, fine adjustment fastener 103-3, locking fastener 103-4, rotation drive assembly 104, drive member 104-1, deceleration mechanism 104-2, magnetohydrodynamic shaft 104-3, ion source chamber 200, ion source equipment 1000. DETAILED DESCRIPTION

[0064] The following will be combined with Figures 1-11 of the embodiments of this application to clearly and completely describe the technical solutions in the embodiments of this application. Obviously, the embodiments described are only part of the embodiments of this application, not all of the embodiments. Based on the embodiments of this application, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of this application.

[0065] In the description of this application, it should be understood that the terms "upper," "lower," "top," and "bottom" and the like, indicating orientations or positional relationships, are based on the orientations or positional relationships shown in the accompanying drawings and are intended solely to facilitate the description of this application and simplify the description. They are not intended to indicate or imply that the positions or elements referred to must have a specific orientation, be constructed, or operate in a specific orientation. Therefore, they should not be construed as limitations of this application. Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance.

[0066] 1 to 11 , a first aspect of the present application provides an ion source grid adjustable structure 100 to expand the application scenarios of the ion source and improve the non-uniformity of the ion beam.

[0067] As shown in Figures 1-3, the adjustable ion source grid structure 100 includes a grid mounting frame 101, a grid assembly 102, and an adjustment assembly 103. The grid mounting frame 101 is rotatably mounted at the opening of the ion source chamber 200. When the direction of the ion beam extracted from the ion source needs to be changed, the grid mounting frame 101 rotates accordingly, causing the grid assembly 102 to rotate. This allows the ion beam perpendicular to the grid assembly 102 to change its exit angle as the grid assembly 102 rotates, meeting the user's needs.

[0068] The grid holder 101 has a mounting surface for facing the ion source inside the ion source chamber 200 . Specifically, taking the grid holder 101 as an annular plate structure as an example, the mounting surface is the cross section of the hollow portion of the grid holder 101 .

[0069] The number of grid assemblies 102 is at least two, and they are installed on the mounting surface in a sequentially spaced manner along a direction away from the mounting surface. It should be noted that the direction away from the mounting surface here refers to the direction from the end of the mounting surface facing the ion source to the direction close to the ion source when the ion source device 1000 is in use.

[0070] There are multiple adjustment assemblies 103, with at least one adjustment assembly 103 disposed between adjacent grid assemblies 102 to adjust the spacing between adjacent grid assemblies 102. The number of adjustment assemblies 103 between adjacent grid assemblies 102 is not limited and is determined based on specific needs. When the spacing between grid assemblies 102 does not meet operational requirements, the adjustment assemblies 103 can be used to adjust the spacing between grid assemblies 102, thereby increasing the ion beam flux adjustment range. Furthermore, when processing errors occur, the adjustment assemblies 103 can be used to adjust the spacing between grid assemblies 102, thereby improving problems such as uneven ion beam flux.

[0071] In some embodiments, the adjustment assembly 103 includes a coarse adjustment fastener 103-1, an elastic member 103-2, and a fine adjustment fastener 103-3. Of two adjacent grid assemblies 102, the coarse adjustment fastener 103-1 is securely connected to one and elastically connected to the other via the elastic member 103-2. In other words, the coarse adjustment fastener 103-1 can quickly adjust the spacing between the two adjacent grid assemblies 102 to within a certain range, and the spacing between the two adjacent grid assemblies 102 is adjustable within this range. The fine adjustment fastener 103-3 is securely connected to one and abuts against the other, enabling precise adjustment of the spacing between the two adjacent grid assemblies 102.

[0072] Specifically, of two adjacent grid assemblies 102, coarse adjustment fastener 103-1 abuts one, and the screw of coarse adjustment fastener 103-1 passes through one and is threadedly connected to the other. Elastic member 103-2 is sleeved over coarse adjustment fastener 103-1, and one end of elastic member 103-2 abuts or connects with the nut of coarse adjustment fastener 103-1, while the other end abuts or connects with the grid assembly 102 closer to the nut of coarse adjustment fastener 103-1. It can be understood that the grid assembly 102 closer to the nut of coarse adjustment fastener 103-1 here refers to the grid assembly 102 closer to the nut of coarse adjustment fastener 103-1 of the two adjacent grid assemblies 102. It should be noted that the elastic member 103 - 2 may also be disposed between two adjacent grid assemblies 102 , with one end of the elastic member 103 - 2 abutting or connecting with one of the two adjacent grid assemblies 102 and the other end abutting or connecting with the other.

[0073] The screw of the fine-adjustment fastener 103-3 is threadedly connected to one of the mesh components, passes through the mesh component, and abuts against the other mesh component. For example, the mesh component 102 to which the fine-adjustment fastener 103-3 is threadedly connected is the first mesh component, and the mesh component 102 abutted by the fine-adjustment fastener 103-3 is the second mesh component. The spacing between the first and second mesh components is fine-adjusted and increased. By turning the fine-adjustment fastener 103-3, the length of the screw extending beyond the first mesh component of the fine-adjustment fastener 103-3 increases, and the end of the screw of the fine-adjustment fastener 103-3 abuts against the second mesh component. Consequently, the end of the screw of the fine-adjustment fastener 103-3 pushes the second mesh component away from the first mesh component, thereby increasing the spacing between the two mesh components. Alternatively, the fine-adjustment fastener 103-3 may pass through one of two adjacent mesh components 102 and be threadedly connected to the other mesh component.

[0074] As shown in FIG4 , in a specific embodiment of the present application, two adjacent grid assemblies 102 are disclosed, one of which has a first threaded hole and a fine adjustment threaded hole, and the other of which has a first through hole. The screw of a coarse adjustment fastener 103-1 passes through the first through hole and is threadedly connected to the first threaded hole. The nut of the coarse adjustment fastener 103-1 abuts against the grid assembly 102 with the first through hole. An elastic member 103-2 is sleeved on the coarse adjustment fastener 103-1, with one end of the elastic member 103-2 abutting or connecting with the nut of the coarse adjustment fastener 103-1 and the other end abutting or connecting with the grid assembly 102 with the first through hole. By twisting the coarse adjustment fastener 103-1, the depth of the coarse adjustment fastener 103-1 screwed into the first threaded hole is adjusted, thereby achieving adjustment of the spacing between the two adjacent grid assemblies 102. Since the outer cover of the coarse adjustment fastener 103-1 is provided with an elastic member 103-2, the distance between the two adjacent grid assemblies 102 connected by the coarse adjustment fastener 103-1 can be adjusted within a certain range by compressing the elastic member 103-2. Specifically, the coarse adjustment fastener 103-1 adjusts the distance between the two adjacent grid assemblies 102 to be less than the preset value. It should be noted that the preset value refers to the distance value that meets the use requirements. The fine adjustment fastener 103-3 is threadedly connected to the fine adjustment threaded hole, and the end portion passes through the fine adjustment threaded hole and abuts against the grid assembly 102 with the first through hole. Adjust the fine adjustment fastener 103-3, and increase the distance between the two adjacent grid assemblies 102 by the cooperation between the fine adjustment fastener 103-3 and the fine adjustment threaded hole until the distance between the two reaches the preset value, as shown in Figure 5.

[0075] It should be noted that the connection method of the adjustment component 103 in Figure 4 is only a specific implementation method of the present application. In actual applications, it can also be set to other forms, for example: among the two adjacent grid components 102, one has a fine-adjustment threaded hole and a first through hole, and the other has a first threaded hole and a connecting through hole. The screw of the coarse-adjustment fastener 103-1 passes through the first through hole and is threadedly connected to the first threaded hole. The nut of the coarse-adjustment fastener 103-1 abuts against the grid component 102 with the first through hole. The screw of the fine-adjustment fastener 103-3 passes through the connecting through hole and is threadedly connected to the fine-adjustment threaded hole. The nut of the fine-adjustment fastener 103-3 abuts against the grid component 102 with the connecting through hole. The method for coarsely adjusting the distance between two adjacent grid assemblies 102 is the same as that in the above embodiment. When fine-tuning two adjacent grid assemblies 102, taking the need to reduce the distance between the two grid assemblies 102 as an example, the fine-tuning fastener 103-3 is screwed, and the depth of the screw of the fine-tuning fastener 103-3 screwed into the fine-tuning threaded hole increases. The nut of the fine-tuning fastener 103-3 drives the grid assembly 102 with the connecting through hole to move toward the grid assembly 102 with the fine-tuning threaded hole, thereby reducing the distance between the two adjacent grid assemblies 102, and finally completing the distance adjustment.

[0076] In order to facilitate the installation of the elastic member 103 - 2 , a specific embodiment of the present application discloses that a receiving groove is further provided on the grid assembly 102 , and the receiving groove is used to receive the elastic member 103 - 2 .

[0077] In order to prevent the fine-adjustment fastener 103 - 3 from being exposed, the fine-adjustment threaded hole may be configured as a countersunk hole.

[0078] In order to achieve fixation between adjacent grid assemblies 102 with adjusted spacing, a specific embodiment of the present application discloses that the adjustment assembly 103 also includes a locking fastener 103 - 4 , as shown in FIG. 6 , the locking fastener 103 - 4 is used to lock two adjacent grid assemblies 102 .

[0079] Specifically, one of the two adjacent grid assemblies 102 may have a second threaded hole, and the other may have a second through hole, and the locking fastener 103-4 may pass through the second through hole and be threadedly connected to the second threaded hole to lock the two adjacent grid assemblies 102. It should be noted that the above-disclosed method of locking the two adjacent grid assemblies 102 with the locking fastener 103-4 is only one specific embodiment of the present application. In actual applications, it is also possible to respectively have through holes in the two adjacent grid assemblies 102, and to respectively pass the locking fastener 103-4 through the two adjacent grid assemblies 102, and then achieve locking of the two grid assemblies 102 by using a mating nut.

[0080] Taking the example of three grid assemblies 102, as shown in FIG3, for ease of description, the three grid assemblies 102 are named, in order, along the direction close to the installation surface, as the first grid assembly, the second grid assembly, and the third grid assembly. The adjustment assembly 103 connecting the first grid assembly and the second grid assembly is named the first adjustment assembly, and the adjustment assembly 103 connecting the second grid assembly and the third grid assembly is named the second adjustment assembly. The first grid assembly and the second grid assembly are connected via six first adjustment assemblies, wherein the six first adjustment assemblies are evenly distributed around the circumference of the first grid assembly and the second grid assembly. The second grid assembly and the third grid assembly are connected via six second adjustment assemblies, wherein the six second adjustment assemblies are evenly distributed around the circumference of the second grid assembly and the third grid assembly. To facilitate installation of the first and second adjustment assemblies, adjacent first and second adjustment assemblies are staggered to avoid interference.

[0081] In some embodiments, the coarse adjustment fastener 103 - 1 , the fine adjustment fastener and the locking fastener 103 - 4 are all made of high temperature resistant and non-conductive materials such as PEEK or ceramics to prevent current conduction between the grid components 102 and cause electric field failure.

[0082] The elastic member 103 - 2 is a high temperature resistant spring. It can be understood that the elastic member 103 - 2 disclosed above as a high temperature resistant spring is only a specific embodiment of the present application. In actual applications, the elastic member 103 - 2 can also be made of other high temperature resistant elastic materials.

[0083] In some embodiments, the grid assembly 102 includes a grid fixing ring 102-1 and a grid 102-2. An annular mounting groove is provided on the inner ring wall of the grid fixing ring 102-1, and the edge of the grid 102-2 is installed in the annular mounting groove.

[0084] A connecting protrusion is provided on the outer ring wall of the grid fixing ring 102 - 1 , and the connecting protrusion is used to connect to the adjustment component 103 .

[0085] Furthermore, the grid assembly 102 further includes a grid locking member 102 - 3 , which is an insulating member and is used to lock the grid 102 - 2 in the annular mounting groove.

[0086] Specifically, the grid locking member 102 - 3 may be a ceramic bead, a ceramic column, or a locking ceramic member.

[0087] In some embodiments, a measuring block 102-1a is further provided on the grid retaining ring 102-1. The measuring block 102-1a has a measuring surface that is flush with the surface of the grid 102-2 facing the ion source. The provision of the measuring surface facilitates measuring the spacing between adjacent grids 102-2 using the grid retaining ring 102-1.

[0088] In order to facilitate insertion measurement using a vernier caliper or the like, a specific embodiment of the present application discloses that a measuring hole 102 - 1 b for insertion measurement is provided on the measuring surface of the measuring block 102 - 1 a .

[0089] In some embodiments, the grid mounting frame 101 is provided with positioning posts 101a, and each grid assembly 102 is provided with a positioning hole that mates with the positioning posts 101a. Specifically, the positioning holes are provided in the grid fixing ring 102-1 of each grid assembly 102. The provision of positioning posts 101a facilitates quick installation and positioning of the grid assembly 102.

[0090] Furthermore, there are multiple positioning posts 101a, and each grid fixing ring 102-1 has multiple positioning holes distributed in a corresponding ring shape.

[0091] It is understandable that the positioning posts 101a are also made of high-temperature resistant, non-conductive materials such as PEEK or ceramics to prevent current conduction between the grids 102-2 and cause electric field failure.

[0092] In some embodiments, as shown in FIG. 2 , the ion source grid adjustable structure 100 further includes a rotation drive assembly 104 , wherein the rotation start assembly is used to drive the grid fixing frame 101 to rotate.

[0093] Furthermore, the rotation drive assembly 104 includes a driving member 104-1, a reduction mechanism 104-2 and a magnetic fluid shaft 104-3. The magnetic fluid shaft 104-3 passes through the ion source chamber 200, and one end is connected to the vacuum shaft 101b on the grid fixing frame 101, and the other end is connected to the output end of the reduction mechanism 104-2. The driving member 104-1 is connected to the input end of the reduction mechanism 104-2.

[0094] When the grid fixing frame 101 is driven to drive the grid assembly 102 to rotate, the driving member 104-1 outputs torque to the reduction mechanism 104-2, which is decelerated by the reduction mechanism 104-2 and then transmitted to the magnetic fluid shaft 104-3. The magnetic fluid shaft 104-3 drives the vacuum shaft 101b to rotate, thereby driving the grid fixing frame 101 to rotate, and finally realizing the rotation of the grid assembly 102.

[0095] Furthermore, the driving member 104-1 is an adjustment knob, a rotating scale is provided on the speed reduction mechanism 104-2, and a pointer pointing to the rotating scale is provided on the adjustment knob for displaying the rotation angle of the grid fixing frame 101, so as to facilitate the adjustment of the specific angle of the grid assembly 102.

[0096] 1 to 9 , the second aspect of the present application provides an ion source device 1000 , wherein the ion source device 1000 includes an ion source, an ion source chamber 200 , and an adjustable ion source grid structure 100 as in any one of the above embodiments.

[0097] The ion source is installed in the ion source chamber 200 . The ion source adjustable grid structure 100 is rotatably installed at the opening of the ion source chamber 200 . The ion beam emitted by the ion source is perpendicular to the grid assembly 102 of the ion source adjustable grid structure 100 .

[0098] In the present application, the direction of the ion beam extracted by the ion source is perpendicular to the plane of the grid 102-2. By rotating the grid fixing frame 101, the grid 102-2 is driven to rotate, thereby changing the ion beam extraction direction of the crystal grid 102-2 to adapt to the target 300, as shown in Figures 7 and 8; wherein, the angle adjustment process of the grid 102-2: the adjustment knob drives the magnetic fluid axis 104-3 to rotate through the deceleration mechanism 104-2, thereby driving the grid fixing frame 101 to rotate, thereby adjusting the angle of the grid 102-2.

[0099] The spacing between the grids 102-2 affects the voltage range applied to the grids 102-2, and affects the electric field strength and the extracted beam current strength. By adjusting the spacing between the grids 102-2, the energy range of the ion beam can be adjusted, and the working conditions of the ion source can be expanded.

[0100] The consistency of the spacing between the grids 102 - 2 affects the uniform distribution of the ion beam. By adjusting the spacing between the grids 102 - 2 , the unstable operation of the ion source caused by hardware size errors, wear and tear during use, and other issues can be improved.

[0101] As shown in Figure 9: The spacing between the grids 102-2 can be adjusted arbitrarily according to actual needs. The four spacings A, B, C, and D are several groups of spacings on a plane, with a total of 6 planes. By adjusting these spacing values, the overall or local spacing of the grid 102-2 can be changed to achieve zoning control.

[0102] As shown in FIG10 , the third aspect of the present application provides an ion source grid adjustment method, comprising:

[0103] Step S1: providing an ion source grid adjustable structure 100;

[0104] Specifically, the ion source grid adjustable structure 100 is the ion source grid adjustable structure 100 in any one of the above embodiments.

[0105] Step S2: adjusting the adjustment component 103 of the ion source grid adjustable structure 100 so that the spacing between the grid components 102 of the ion source grid adjustable structure 100 is a preset value.

[0106] Specifically, step S2 includes:

[0107] Step S21: Adjust the coarse adjustment fastener 103-1 of the adjustment assembly 103 so that the spacing between adjacent grid assemblies 102 is smaller than a preset value.

[0108] That is to say, a coarse adjustment is performed first: the grid fixing frame 101 is laid flat, and the grid fixing ring 102-1 of the bottom layer (closest to the grid fixing frame 101) is passed through the positioning column 101a; the grid fixing ring 102-1 adjacent to the bottom layer of the grid fixing ring 102-1 is passed through the positioning column 101a so that the holes correspond one to one; the coarse adjustment fastener 103-1, the elastic member 103-2 and the fine adjustment fastener 103-3 are installed in the manner shown in Figure 4, and by adjusting the fine adjustment fastener 103-3 and tightening the coarse adjustment screw, the spacing between the measuring surfaces on the two adjacent grid fixing rings 102-1 is made slightly smaller than the actual required spacing (limited to within 1 mm). At this time, the elastic member 103-2 is compressed, and the two adjacent grid fixing rings 102-1 are preliminarily fixed.

[0109] It should be noted that a high-precision measuring tool (such as a micrometer, etc.) is used to detect the spacing value between two adjacent grid assemblies 102.

[0110] Step S22: Adjust the fine-tuning fastener 103-3 of the adjustment assembly 103 so that the spacing between adjacent grid assemblies 102 increases to a preset value.

[0111] It should be noted that, when there are multiple adjustment components 103 , each adjustment component 103 needs to be adjusted in sequence according to step S21 and step S22 .

[0112] Step S23: Lock the adjacent grid assembly 102 by adjusting the locking fastener 103 - 4 of the assembly 103 .

[0113] Specifically, tighten locking fastener 103-4 into position. Adjust fine-adjustment fastener 103-3 and locking fastener 103-4 until the spacing between adjacent grids 102-2 is at the preset value. Tighten locking fastener 103-4 to a torque of 2 N·m, and tighten fine-adjustment fastener 103-3 to a torque of 2 N·m. For example, if adjacent grids 102-2 are connected via six adjustment assemblies 103, follow the steps above in the order shown in Figure 11.

[0114] In some embodiments, step S2 further includes:

[0115] Step S3: Detect whether the spacing between adjacent grid assemblies 102 is a preset value. If so, lock the grid assemblies 102 onto the grid fixing frame 101. If not, go to step S4.

[0116] According to the sequence in Figure 11, the inspection and action are carried out in sequence; if the spacing just meets the preset value, the process ends; if the measured spacing at any position in the above spacing detection is different from the required value, go to step S4 for adjustment.

[0117] Step S4: Continue to adjust the spacing between adjacent grid assemblies 102 by adjusting the adjustment assembly 103, and then go to step S3.

[0118] When the spacing between adjacent grids 102-2 is greater than a preset value, the fine-adjustment fastener 103-3 is loosened appropriately, and then the locking fastener 103-4 is locked with a torque of 2N·m, and then the fine-adjustment fastener 103-3 is tightened with a torque of 2N·m.

[0119] When the spacing between adjacent grids 102-2 is less than the preset value, loosen the locking fastener 103-4 appropriately, then tighten the fine-tuning fastener 103-3 with a torque of 2N·m, and then tighten the locking fastener 103-4 with a torque of 2N·m; check the spacing between adjacent grids 102-2. If the spacing is qualified, lock the positioning column 101a with the grid assembly 102 farthest from the mounting surface through the nut; if the spacing is unqualified, continue to adjust the spacing.

[0120] The various embodiments in this specification are described in a progressive manner, and each embodiment focuses on the differences from other embodiments. The same or similar parts between the various embodiments can be referenced to each other.

[0121] The preferred embodiments of the present application disclosed above are intended only to help illustrate the present application. The preferred embodiments do not describe all details in detail, nor do they limit the present application to specific embodiments. Obviously, many modifications and variations can be made based on the contents of this specification. This specification selects and describes these embodiments in detail to better explain the principles and practical applications of the present application, so that those skilled in the art can better understand and utilize the present application. The present application is limited only by the claims and their full scope and equivalents.

Claims

1. An adjustable structure of an ion source grid, characterized in that, Comprising: A grid fixing frame rotatably mounted at the opening of the ion source cavity, the grid fixing frame having a mounting surface, and the mounting surface facing the ion source inside the ion source cavity; A grid assembly, the number of the grid assemblies being at least two, and the grid assemblies being sequentially and spacedly mounted on the mounting surface along the direction away from the mounting surface; An adjusting assembly, the number of the adjusting assemblies being multiple, and at least one adjusting assembly being provided between adjacent grid assemblies to adjust the spacing between adjacent grid assemblies.

2. The ion source grid adjustable structure according to claim 1, characterized in that, The adjusting assembly includes a coarse adjustment fastener, an elastic member and a fine adjustment fastener; Among two adjacent grid assemblies, the coarse adjustment fastener is fixedly connected to one of them and elastically connected to the other through the elastic member, the fine adjustment fastener is fixedly connected to one of them and abuts against the other.

3. The ion source grid adjustable structure according to claim 2, wherein Among two adjacent grid assemblies, the coarse adjustment fastener abuts against one of them, and the screw of the coarse adjustment fastener passes through one of them and is threadedly connected to the other; the screw of the fine adjustment fastener is threadedly connected to one of them, passes through this one and abuts against the other; or, the fine adjustment fastener passes through one of them and is threadedly connected to the other; The elastic member is sleeved on the coarse adjustment fastener, and one end of the elastic member abuts against or is connected to the nut of the coarse adjustment fastener, and the other end abuts against or is connected to the grid assembly closer to the nut of the coarse adjustment fastener; or, the elastic member is sleeved on the coarse adjustment fastener and is located between two adjacent grid assemblies, one end of the elastic member abuts against or is connected to one of the two adjacent grid assemblies, and the other end abuts against or is connected to the other.

4. The ion source grid adjustable structure according to claim 2, characterized in that, A receiving groove is further formed on the grid assembly for receiving the elastic member.

5. The ion source grid adjustable structure according to claim 2, characterized in that, The adjusting assembly further includes a locking fastener; The locking fastener is used for locking two adjacent grid assemblies.

6. The ion source grid adjustable structure according to claim 1, characterized in that, The grid assembly includes a grid fixing ring and a grid; An annular mounting groove is formed on the inner ring wall of the grid fixing ring, and the edge of the grid is mounted in the annular mounting groove.

7. The ion source grid adjustable structure according to claim 6, characterized in that, The grid assembly further includes a grid locking member; The grid locking member is an insulating member for locking the grid in the annular mounting groove.

8. The ion source grid adjustable structure according to claim 6, characterized in that A measuring block is further provided on the grid fixing ring; The measuring block has a measuring surface flush with the grid.

9. The ion source grid adjustable structure according to claim 8, characterized in that A measuring hole for inserting a measurement is formed on the measuring surface of the measuring block.

10. The ion source grid adjustable structure according to claim 1, characterized in that, Positioning columns are provided on the grid fixing frame, and positioning holes for positioning and cooperating with the positioning columns are respectively formed on each grid assembly.

11. The ion source grid adjustable structure according to any one of claims 1-10, characterized in that, It further includes a rotation driving assembly for driving the grid fixing frame to rotate.

12. The ion source grid adjustable structure according to claim 11, wherein, The rotation driving assembly includes a driving member, a speed reducing mechanism and a magnetohydrodynamic shaft; The magnetohydrodynamic shaft penetrates through the ion source cavity, one end of which is connected to the vacuum rotating shaft on the grid fixing frame, the other end of which is connected to the output end of the speed reducing mechanism, and the driving member is connected to the input end of the speed reducing mechanism.

13. The ion source grid adjustable structure according to claim 12, characterized in that, The driving member is an adjusting knob; A rotation scale is provided on the speed reducing mechanism, and a pointer pointing to the rotation scale is provided on the adjusting knob for displaying the rotation angle of the grid fixing frame.

14. An ion source device, characterized in that, It includes an ion source, an ion source cavity, and an ion source grid adjustable structure as described in any one of claims 1-13; The ion source is installed in the ion source cavity. The ion source grid adjustable structure is rotatably installed at the opening of the ion source cavity, and the ion beam emitted by the ion source is perpendicular to the grid assembly of the ion source grid adjustable structure.

15. A method for adjusting an ion source grid, characterized in that, It includes: Providing an ion source grid adjustable structure as described in any one of claims 1-13; Adjusting the adjusting component of the ion source grid adjustable structure so that the distance between each of the grid assemblies of the ion source grid adjustable structure is a preset value.

16. The ion source grid adjustment method according to claim 15, wherein The adjusting component for adjusting the ion source grid adjustable structure specifically includes: Adjusting the coarse adjustment fastener of the adjusting component so that the distance between adjacent grid assemblies is less than the preset value; Adjusting the fine adjustment fastener of the adjusting component so that the distance between adjacent grid assemblies increases to the preset value; Locking adjacent grid assemblies through the locking fastener of the adjusting component.

17. The ion source grid adjustment method according to claim 15 or 16, characterized in that, After adjusting the distance between the grid assemblies to the preset value, it further includes: Detecting whether the distance between adjacent grid assemblies is the preset value. If so, end. If not, continue to adjust the distance between adjacent grid assemblies by adjusting the adjusting component.

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