Reactor capable of performing continuous process and silicon-based negative electrode material manufacturing facility including same

Abstract

The present invention provides a reactor capable of performing a continuous process. The reactor capable of performing a continuous process comprises: a reactor body part which is provided in a horizontal direction, has a reaction space formed therein, and is exposed to a heating temperature set from the outside; a reactive gas supply part for supplying one or a plurality of reactive gases to the reaction space through one end of the reactor body part; a powder supply part which is connected to the circumference of the reactor body part and supplies powder to the reaction space of the reactor body part; a screw part, opposite ends of which are rotatably supported by the reaction space, and which is rotated by power provided from the outside, to continuously mix the powder and the reactive gas supplied to the reaction space and thus generate and transfer a reactant thereof, along the axial direction from one side of the reaction space to the other side thereof; a rotation part for rotating the screw part; and a discharge part formed on the lower end of the other end side of the reactor body part and discharging the transferred reactant. In addition, the present invention provides a silicon-based negative electrode material manufacturing facility.

Description

A reactor capable of continuous processing and a silicon-based cathode material manufacturing facility including the reactor

[0001] The present invention relates to a reactor capable of continuous processing and a silicon-based anode material manufacturing facility including the same, and more particularly, to a reactor capable of continuous processing and a silicon-based anode material manufacturing facility including the same, which can achieve mass productivity and post-processing uniformity in the production of silicon-based anode materials.

[0002] Secondary batteries have become an irreplaceable core component of electrical devices. With the trend toward larger capacity and lighter weight, existing secondary battery technology can no longer meet the rapidly growing demands, such as extending the driving range of electric vehicles and reducing the weight of intelligent wearable devices. The core of this problem lies in the practical issue of the low energy density of existing secondary batteries.

[0003] Graphite-based anode materials are currently the most widely used anode materials for secondary batteries, with a theoretical capacity per gram of only 372 mAh / g. Existing technologies are very close to this theoretical capacity per gram, and the development of anode materials with higher capacities per gram is urgently needed. Silicon-based anode materials have been extensively studied due to their exceptionally high capacity per gram (theoretical capacity per gram of 4200 mAh / g).

[0004] Additionally, silicon anode materials are considered as next-generation anode materials due to their advantages such as low lithium desorption potential and abundant raw material supply.

[0005] All materials used in the manufacturing process for these silicon-based anode materials are in powder form. These powders have extremely small particle sizes (<10 ㎛) and high specific surface areas (>900 m2 / g), making handling difficult. Therefore, they are produced using batch methods.

[0006] Accordingly, problems arise in that mass productivity and post-processing uniformity are low, and yield inevitably decreases as the process goes through multiple batch processes.

[0007] When manufacturing silicon-based negative electrode materials through a batch process, the following problems may occur.

[0008] First, mass productivity may be reduced. Because batch processes require individual processing of powders, productivity is lower than that of continuous processes. In particular, the silicon-based anode material manufacturing process uses very small particles with a high specific surface area, making handling difficult. Therefore, the reduced productivity of batch processes is even more severe.

[0009] Second, post-processing uniformity may deteriorate. Since batch processing processes process powders individually, the uniformity of the post-processing process can deteriorate. In particular, the post-processing process for silicon-based anode materials is highly complex and demanding, and batch processing requires each step to be performed manually, making it difficult to ensure consistent quality.

[0010] Third, yields may decrease. Batch methods inevitably experience yield reductions as they involve multiple processes. In particular, the silicon-based anode material manufacturing process, characterized by extremely small particles and high surface areas, makes handling difficult. This yield reduction is even more severe.

[0011] For this reason, in recent years, there has been a demand for the development of a technology that can convert the silicon-based cathode material manufacturing process into a continuous process to solve conventional problems, automate the post-treatment process to improve productivity, and increase the uniformity of the post-treatment process.

[0012] The present invention has been devised to solve the above-described problems, and the purpose of the present invention is as follows.

[0013] The purpose of the present invention is to provide a reactor capable of continuous processing and a silicon-based anode material manufacturing facility including the same, which can uniformly move powder and prevent the powder from sticking to the screw blades by applying a configuration in which powder and gas are made to flow using a rotating screw portion during the process of manufacturing a silicon-based anode material, and a plurality of baffles are formed at predetermined positions of screw blades formed on the rotational axis of the screw portion, thereby continuously processing a porous carbon structure, a nano-sized silicon particle CVD / CVI, and a silicon oxidation prevention layer, a carbon deposition process, and imparting uniformity to the post-processing process.

[0014] The above-described purposes of the present invention are not limited to the aforementioned purposes. Other unmentioned purposes and advantages of the present invention can be understood through the following description and will be more clearly understood through the embodiments of the present invention. Furthermore, it will be readily apparent that the purposes and advantages of the present invention can be realized by the means and combinations thereof set forth in the claims.

[0015] To achieve the above objectives, the present invention provides a reactor capable of continuous processing.

[0016] The reactor capable of continuous processing includes: a reactor body that follows a horizontal direction, has a reaction space formed therein, and is exposed to a heating temperature set externally; a reaction gas supply unit that supplies one or more reaction gases to the reaction space through one end of the reactor body; a powder supply unit that is connected to the circumference of the reactor body and supplies powder to the reaction space of the reactor body; a screw unit that is rotatably supported at both ends of the reaction space and rotates by externally provided power to continuously stir the reaction gas and the powder supplied to the reaction space along an axial direction from one side to the other side of the reaction space while generating a reactant and transporting the same; a rotation unit that rotates the screw unit; and a discharge unit that is formed at the lower end of the other end of the reactor body and discharges the transported reactant.

[0017] Here, in the multiple locations of the reactor body,

[0018] A plurality of auxiliary gas supply units for supplying auxiliary gas to the above reaction space are formed at intervals,

[0019] The above multiple auxiliary gas supply units are:

[0020] It is preferable to connect the above reaction gas supply unit and auxiliary gas supply path.

[0021] And the above screw part,

[0022] A rotating shaft whose ends are rotatably supported inside the main body of the above reactor,

[0023] It includes screw blades formed in a screw shape around the above rotation axis,

[0024] It is preferable that the above-mentioned rotating part include a rotating motor that is connected to the rotating shaft in an axial manner and rotates the rotating shaft to achieve a set rotation speed according to the control of the control part.

[0025] Also, on the outer surface of the above screw blades,

[0026] It is formed in a shape where a bevel of a certain shape protrudes, and it is preferable to install one or more of them.

[0027] Also, the above beple,

[0028] It is preferable that it be formed on at least one side of the above screw blades.

[0029] In addition, at multiple locations around the periphery of the reactor body,

[0030] An ultrasonic generator is installed,

[0031] It is preferable that the above ultrasonic generator transmits ultrasonic waves at a level set according to the control of the control unit to the interior of the reactor body through the periphery of the reactor body.

[0032] In addition, on the other end of the reactor body,

[0033] It is preferable that a waste gas discharge unit be connected to discharge waste gas remaining in the above reaction space to the outside.

[0034]

[0035] According to another embodiment, the present invention can provide a silicon-based cathode material manufacturing facility including a structure in which a plurality of reactors capable of continuous processing as described above are sequentially connected.

[0036] Through the means for solving the above problem, the present invention has the effect of uniformly moving the powder and preventing the powder from sticking to the screw blades by applying a configuration in which the powder and gas are made to flow using a rotating screw portion in the process of manufacturing a silicon-based negative electrode material, and at the same time, a plurality of baffles are formed on the outer surface of the screw blades formed on the rotational axis of the screw portion, thereby continuously processing a porous carbon structure, a nano-sized silicon particle CVD / CVI, and a carbon deposition process as a silicon oxidation prevention layer, and providing uniformity in the post-processing process.

[0037] In addition to the effects described above, specific effects of the present invention are described below while explaining specific details for carrying out the invention.

[0038] Figure 1 is a perspective view showing an example of the configuration of a reactor capable of continuous processing according to the present invention.

[0039] Figure 2 is a drawing showing a schematic diagram of the configuration of the reactor of Figure 1.

[0040] Figure 3 is a perspective view showing the configuration of a screw portion according to the present invention.

[0041] Figure 4 is a perspective view showing bepples according to the present invention.

[0042] Figure 5 is a front view showing a screw portion having one of the bevels installed according to the present invention.

[0043] Figure 6 is a front view showing a screw portion having another bevel installed according to the present invention.

[0044] Figure 7 is a perspective view showing another example of the configuration of a reactor capable of continuous processing according to the present invention.

[0045] Figure 8 is a drawing showing a schematic diagram of the configuration of the reactor of Figure 7.

[0046] Figure 9 is a drawing showing the process flow in a silicon-based cathode material manufacturing facility including a reactor capable of continuous processing of the present invention.

[0047] Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings so that a person having ordinary skill in the art to which the present invention pertains can easily implement the present invention.

[0048] The present invention can be implemented in many different forms and is not limited to the embodiments described herein.

[0049] In order to clearly explain the present invention, parts that are not related to the description are omitted, and the same reference numerals are used for identical or similar components throughout the specification.

[0050] Hereinafter, the phrase “any component is provided or arranged on the “upper (or lower)” of the description or “upper (or lower)” of the description means that any component is provided or arranged in contact with the upper surface (or lower surface) of the description.

[0051] Additionally, it is not limited to not including any other configuration between the above description and any configuration provided or arranged on (or under) the description.

[0052] The following describes a continuous processing reactor and a silicon-based cathode material manufacturing facility including the reactor according to the present invention with reference to the attached drawings.

[0053] First, the reactor capable of continuous processing of the present invention will be described.

[0054] Fig. 1 is a perspective view showing an example of the configuration of a reactor capable of continuous processing according to the present invention. Fig. 2 is a drawing showing a schematic diagram of the configuration of the reactor of Fig. 1. Fig. 3 is a perspective view showing the configuration of a screw section according to the present invention.

[0055] Referring to FIGS. 1 to 3, a reactor capable of continuous processing according to the present invention includes a reactor body (100), a reaction gas supply unit (200), a powder supply unit (300), a screw unit (400), a rotation unit (500), and a discharge unit (600).

[0056] The reactor body (100) may be formed in a tubular shape with a reaction space formed therein. The reactor body (100) may be exposed to a heating temperature set externally through a separate heating device. The reactor body (100) according to the present invention may be arranged in a horizontal direction.

[0057] The above reaction gas supply unit (200) is connected to one end of the reactor body (100) and supplies the reaction gas to the reaction space. The reaction gas supply unit (200) has a reaction gas supply pipe (210) and a reaction gas supplier (220). The reaction gas supply pipe (210) is connected to one end of the reactor body (100) in communication with it. The reaction gas supplier (220) supplies the reaction gas through the reaction gas supply pipe (210).

[0058] The above powder supply unit (300) is formed as a powder supply pipe. The powder supply pipe is connected to a predetermined position on the outer circumference of one end of the reactor body (100) and supplies powder supplied from the outside to the reaction space.

[0059] The screw unit (400) according to the present invention is supported at both ends in a reaction space and is rotated by externally provided power, so that the reaction gas and the powder supplied to the reaction space can be continuously stirred in an axial direction from one side of the reaction space to the other side to generate a reactant and transport it.

[0060] The above screw part (400) has a rotational axis (410) that is rotatably supported at both ends at the center of the reaction space, and screw blades (420) formed in a spiral shape or screw shape along the longitudinal direction of the rotational axis (410).

[0061] The spacing between the screw blades (420) may be different depending on the process.

[0062] The rotating part (500) according to the present invention includes a rotating motor. The rotating motor is connected to one end of a rotating shaft (410) in an axial manner, and can rotate the rotating shaft (410) to achieve a rotating speed set by the control of the control part (700).

[0063]

[0064] Figure 4 is a perspective view showing baffles according to the present invention. Figure 5 is a front view showing a screw portion having one baffle installed according to the present invention. Figure 6 is a front view showing a screw portion having another baffle installed according to the present invention.

[0065] Referring to FIGS. 4 to 6, the outer surface of the screw blades (420) according to the present invention is formed with a baffle (430) of a certain shape protruding, and one or more of them can be installed.

[0066] The baffle (430) according to the present invention may be formed on at least one side of the screw blades (410). For example, the baffle (430) may be formed on either the front or the back of each of the screw blades (410). Preferably, the baffle (430) may be formed on both the front and back of each of the screw blades (410), i.e., on both sides.

[0067] The above baffles (430) may be formed as protrusions in a crescent shape, a square shape, a rectangular shape, or a polygonal shape. In addition, the baffles (430) may be formed integrally on the outer surface of each screw blade (420). The baffles (430) may be installed so as to be in contact with the tips of the screw blades (420).

[0068] In addition, the above-described bevels (430) may be installed at different locations on the outer surface of each screw blade (420) and facing different directions.

[0069] And the discharge unit (600) according to the present invention is formed as a discharge pipe. The discharge pipe is formed at the lower end of the other end of the reactor main body (100) and can discharge the transported reactant.

[0070] In addition, an ultrasonic generator (800) may be installed at multiple locations around the periphery of the reactor body (100).

[0071] The above ultrasonic generator (800) can transmit ultrasonic waves at a level set according to the control of the control unit (700) to the inside of the reactor body (100) through the periphery of the reactor body (100) using ultrasonic generator modules (810).

[0072] Additionally, a waste gas discharge unit (150) for discharging waste gas remaining in the reaction space to the outside may be connected to the other end of the reactor body (100). The waste gas discharge unit (150) may be formed as a waste gas discharge pipe.

[0073] The reactor according to the present invention as described above can continuously move and uniformly stir powder having a very small particle size (<10 ㎛) and a high specific surface area (>900 m2 / g) used in the cathode material manufacturing process. This can be achieved through the rotational drive of the screw portion (400) described above.

[0074] In particular, the reactor according to the present invention is characterized in that it has a screw section (400) having rotating screw blades (420), and baffles (430) that come into contact with powder that is transported while being stirred are formed on the screw blades (420).

[0075] That is, by forming at least one bevel (430) of a certain shape on the outer surface of each screw blade (420) at a portion in contact with the powder, the powder can be uniformly stirred while being moved by the rotating screw portion (400), thereby inducing a uniform reaction between the reaction gas and the powder.

[0076] Meanwhile, the reaction time in the reaction space of the reactor according to the present invention can be variably set by the control unit (700) by the pitch interval of the rotating screw blade (420) and the rotational speed of the rotational axis (410) of the screw part (400).

[0077] The powder flow in the reaction space of the reactor can proceed horizontally. Accordingly, the powder can be deposited on the lower wall of the reaction space to form a layer. However, in the present invention, by installing ultrasonic generators (800) at multiple locations around the lower outer periphery of the reactor to continuously transmit ultrasonic waves through the lower part of the reactor, the problem of powder deposition can be solved.

[0078]

[0079] Fig. 7 is a perspective view showing another example of the configuration of a reactor capable of continuous processing according to the present invention. Fig. 8 is a drawing showing a schematic diagram of the configuration of the reactor of Fig. 7.

[0080] Figures 7 and 8 show other examples of a reactor according to the present invention.

[0081] The above reactor may have substantially the same configuration as the reactor described with reference to FIGS. 1 to 6. However, a plurality of auxiliary gas supply units (180) for supplying auxiliary gas to the reaction space may be formed at intervals at a plurality of locations in the reactor body (100).

[0082] The above-described plurality of auxiliary gas supply units (180) can be connected to the above-described reaction gas supply unit (200) through an auxiliary gas supply path.

[0083] Here, the auxiliary gas supply units (180) may be injectors that inject and supply reaction gas supplied through the auxiliary gas supply path (181) to different locations in the reaction space of the reactor.

[0084] In addition, the auxiliary gas supply units (180) are formed along the periphery of the reactor body (100), and may be formed in parallel along the longitudinal direction of the reactor body (100), or may be formed at different positions along a path forming a vortex shape.

[0085] Through this, the reaction gas can be supplied simultaneously to one end of the reactor and multiple locations along the movement path of the powder, thereby enabling the reaction between the reaction gas and the powder to occur more efficiently.

[0086] Figure 9 is a drawing showing the process flow in a silicon-based cathode material manufacturing facility including a reactor capable of continuous processing of the present invention.

[0087] Referring to Fig. 9, the silicon-based cathode material manufacturing facility includes a storage tank (10), a first process unit (1), a second process unit (2), and a third process unit (3).

[0088] The above storage tank (10) stores the spherical carbon structure to be processed.

[0089] The above storage tank (10) includes a device that controls the amount of carbon structure to be loaded into the first reactor (101) of the first process unit (1) in a fixed volume or weight, and may include an agitator that can suppress the formation of a bridge during loading.

[0090] The first, second, and third reactors (101, 102, 103) described below can be applied to reactors according to the present invention.

[0091]

[0092] First Public Government (1)

[0093] The first process unit (1) according to the present invention may include a first reactor (101). The first reactor (101) is a steam-activated reactor.

[0094] The above first reactor (101) increases the specific surface area of ​​the loaded spherical carbon structure to 300 to 2000 m2 / g. The above first reactor (101) is operated at less than 1200°C, and a set amount of steam is continuously introduced into the reaction space of the first reactor (101).

[0095] During this process, the spherical carbon structure reacts with steam, increasing its specific surface area to form a "porous carbon structure." After the reaction, gas (such as CO2) is discharged through the exhaust gas outlet, and the porous carbon structure is discharged downward through the exhaust outlet by gravity.

[0096]

[0097] Second Public Government (2)

[0098] The second process unit (2) according to the present invention may include a second reactor (102). The second reactor (102) is a Si CVD (Chemical vapor deposition).

[0099] The above second reactor (102) deposits / impregnates Si into the porous carbon structure.

[0100] Here, the operating temperature is 300-700℃, and the reaction gases (silane, hydrogen, inert gas) can be introduced sequentially or simultaneously according to the purpose. Through this reaction, a Si / C composite is manufactured.

[0101] At this time, auxiliary gas supply units (180) can be introduced crosswise or additionally into the reaction space of the second reactor (102). Through this, the concentration of gas can be varied according to each position of the reaction space of the second reactor (102), and thus single / multiple layers can be controlled.

[0102]

[0103] Third Public Government (3)

[0104] The third process unit (3) according to the present invention may include a third reactor (103). The third reactor (103) is a carbon CVD.

[0105] The third reactor (103) can form a passivation layer with carbon to block oxidation / side reaction of the Si / C composite.

[0106] Here, the third reactor (103) is operated at 300 to 600°C, and the reaction gas (carbon source-containing gas, hydrogen, inert gas) can be introduced sequentially or simultaneously to suit the set purpose.

[0107] In the present invention, by applying a reactor using a screw section to the first, second, and third process sections as described above, three stages of post-treatment processes can be performed continuously, thereby improving mass productivity and minimizing material loss by eliminating unnecessary movement between each process, which is different from the conventional batch post-treatment method.

[0108] In addition, since the present invention can periodically change the moving position of the powder or material through the baffle formed on the outer surface of each screw blade, there is an advantage in that the uniformity of post-processing can be improved.

[0109] In addition, by generating ultrasonic waves at multiple locations on the bottom of each of the first, second, and third reactors, the problem of powder or material sticking to the bottom of the reaction space of the corresponding reactor and being lost can be solved.

[0110] The present invention is not limited to the specific preferred embodiments described above, and anyone with ordinary skill in the art to which the present invention pertains can make various modifications without departing from the gist of the present invention claimed in the claims, and such modifications are within the scope of the claims.

[0111] 100: Reactor main body

[0112] 150: Waste gas exhaust section

[0113] 180: Auxiliary gas supply unit

[0114] 181: Auxiliary gas supply route

[0115] 200: Reaction gas supply unit

[0116] 210: Reaction gas supply pipe

[0117] 220: Reaction gas supply

[0118] 300: Powder supply section

[0119] 400: Screw part

[0120] 410: Rotation axis

[0121] 420: Screw Blade

[0122] 500: Rotating part

[0123] 600: exhaust section

[0124] 700: Control Unit

[0125] 800: Ultrasonic generator

[0126] 810: Ultrasonic generation module

Claims

1. A reactor body that follows a horizontal direction, has a reaction space formed inside, and is exposed to a heating temperature set externally; A reaction gas supply unit for supplying one or more reaction gases to the reaction space through one end of the reactor body; A powder supply unit connected to the periphery of the above reactor body and supplying powder to the reaction space of the above reactor body A screw section which is rotatably supported at both ends in the reaction space and rotates by external power to continuously stir the reaction gas and the powder supplied to the reaction space along the axial direction from one side to the other side of the reaction space to generate reactants while transporting them; A rotating part that rotates the above screw part; It is characterized by including a discharge section formed at the lower end of the other end of the main body of the reactor and discharging the reactant being transported. A reactor capable of continuous processing.

2. In paragraph 1, At multiple locations in the main body of the above reactor, A plurality of auxiliary gas supply units are formed at intervals to supply auxiliary gas to the reaction space. The above multiple auxiliary gas supply units are: Characterized in that it is connected through the above reaction gas supply unit and auxiliary gas supply path, A reactor capable of continuous processing.

3. In paragraph 1, The above screw part, A rotating shaft whose ends are rotatably supported inside the main body of the above reactor, It includes screw blades formed in a screw shape around the above rotation axis, The above rotating part is characterized in that it includes a rotating motor that is connected to the rotating shaft in an axial manner and rotates the rotating shaft to achieve a set rotation speed according to the control of the control part. A reactor capable of continuous processing.

4. In paragraph 3, On the outer surface of the above screw blades, It is characterized by being formed in a shape in which a bevel of a certain shape protrudes and being installed in one or more. A reactor capable of continuous processing.

5. In paragraph 4, The above beple is, characterized in that it is formed on at least one side of the screw blades, A reactor capable of continuous processing.

6. In paragraph 1, At multiple locations around the perimeter of the above reactor body, An ultrasonic generator is installed, The above ultrasonic generator is characterized in that it transmits ultrasonic waves at a level set according to the control of the control unit to the interior of the reactor body through the periphery of the reactor body. A reactor capable of continuous processing.

7. In paragraph 1, On the other end of the main body of the above reactor, It is characterized in that a waste gas discharge unit for discharging waste gas remaining in the above reaction space to the outside is connected. A reactor capable of continuous processing.

8. A structure characterized by including a plurality of reactors capable of continuous processing of any one of clauses 1 to 7, which are sequentially connected. Silicon-based cathode material manufacturing equipment.

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