Cleaning disc structure and control method therefor, and cleaning device

Abstract

A cleaning disc structure and a control method therefor, and a cleaning device. The cleaning disc structure comprises: a first disc (110) and a second disc (120), which are arranged opposite each other, an inner side wall of the first disc (110) and an inner side wall of the second disc (120) forming at least part of a circumferential side wall of a suction cavity; and an elastic structure (140), which is arranged between the first disc (110) and the second disc (120) and is configured to provide an elastic acting force between the first disc (110) and the second disc (120), thereby changing the dimension of a gap between the first disc (110) and the second disc (120) in a direction from the second disc (120) to the first disc (110). The elastic acting force of the elastic structure (120) in the cleaning disc structure and the cleaning device enables the cleaning disc structure to maintain a fit to a surface to be cleaned, thereby improving the suction stability of the suction cavity, and reducing the risk that the cleaning device using the cleaning disc structure slips off.

Description

Cleaning disc structure and control method thereof, cleaning device

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS

[0002] This application claims priority to Chinese Patent Application No. 202410122050.0 filed on January 29, 2024, priority to Chinese Patent Application No. 202410353985.X filed on March 26, 2024, priority to Chinese Patent Application No. 202410687098.6 filed on May 30, 2024, and priority to Chinese Patent Application No. 202411132110.3 filed on August 16, 2024. The contents of the above-mentioned Chinese patent application disclosures are hereby incorporated by reference in their entirety as part of this application. Technical Field

[0003] At least one embodiment of the present disclosure relates to a cleaning disk structure, a control method thereof, and a cleaning device. Background Art

[0004] Smart cleaning products, such as window cleaning machines, are designed to simplify cleaning tasks. For example, they can replace traditional manual window cleaning, providing users with an efficient, safe, and convenient cleaning experience. However, the adsorption stability of window cleaning machines in different usage scenarios needs to be improved. Summary of the Invention

[0005] At least one embodiment of the present disclosure provides a cleaning disk structure, a control method thereof, and a cleaning device.

[0006] At least one embodiment of the present disclosure provides a cleaning disc structure, which is configured to form an adsorption chamber with a surface to be cleaned, and the cleaning disc structure includes: a first disc and a second disc arranged opposite to each other, wherein the inner side walls of the first disc and the second disc form at least a portion of the circumferential side wall of the adsorption chamber; and an elastic structure, which is arranged between the first disc and the second disc and is configured to provide an elastic force between the first disc and the second disc to change the size of the interval between the first disc and the second disc in a direction along the second disc pointing to the first disc.

[0007] For example, according to at least one embodiment of the present disclosure, the cleaning disc structure is configured to rotate about a rotation axis that intersects with the surface to be cleaned and is not perpendicular to each other.

[0008] For example, according to at least one embodiment of the present disclosure, the cleaning disc structure further includes a sealing structure disposed between the first disc and the second disc and configured to seal the gap at least when the adsorption chamber is formed.

[0009] For example, according to at least one embodiment of the present disclosure, a rebound speed of the elastic structure is different from a rebound speed of the sealing structure.

[0010] For example, according to at least one embodiment of the present disclosure, the elastic structure is configured to undergo linear deformation, and the sealing structure is configured to undergo nonlinear deformation.

[0011] For example, according to at least one embodiment of the present disclosure, the elastic structure includes a spring, and the material of the sealing structure includes at least one of foam and silicone.

[0012] For example, according to at least one embodiment of the present disclosure, the sealing structure is an integrated annular structure.

[0013] For example, according to at least one embodiment of the present disclosure, the elastic structure is disposed through the sealing structure and is pre-pressed between the first disk and the second disk.

[0014] For example, according to at least one embodiment of the present disclosure, the cleaning disc structure further includes a connecting structure connected between the first disc and the second disc; the connecting structure passes through the sealing structure.

[0015] For example, according to at least one embodiment of the present disclosure, the elastic structure is provided in plurality, and the plurality of elastic structures are arranged at intervals along the circumference of the second disk; when the cleaning disk structure is configured to rotate around a rotation axis that intersects with the surface to be cleaned and is not perpendicular to each other, when the adsorption cavity is formed between the cleaning disk structure and the surface to be cleaned, at least two elastic deformation amounts of the plurality of elastic structures at different positions along the circumference are different.

[0016] For example, according to at least one embodiment of the present disclosure, the elastic structure is an annular integrated structure; when the cleaning disc structure is configured to rotate around a rotation axis that intersects with the surface to be cleaned and is not perpendicular to each other, when the adsorption cavity is formed between the cleaning disc structure and the surface to be cleaned, the elastic deformation of the elastic structure at at least two positions in the circumferential direction is different.

[0017] For example, according to at least one embodiment of the present disclosure, a guide portion extending in the direction from the second disk to the first disk is provided on the side of the second disk facing the first disk; the guide member is configured to guide the elastic structure to undergo elastic deformation in the direction from the second disk to the first disk.

[0018] For example, according to at least one embodiment of the present disclosure, the sealing structure includes an inner sealing structure and an outer sealing structure; the outer sealing structure is sleeved outside the inner sealing structure, and the elastic structure is located between the inner sealing structure and the outer sealing structure.

[0019] For example, according to at least one embodiment of the present disclosure, the cleaning disc structure further includes a connecting structure connected between the first disc and the second disc; the connecting structure is located between the inner sealing structure and the outer sealing structure.

[0020] For example, according to at least one embodiment of the present disclosure, a contact surface of the second plate for contacting the surface to be cleaned is formed of a flexible material.

[0021] For example, according to at least one embodiment of the present disclosure, the contact surface is provided with a plurality of ribs, and the plurality of ribs are arranged at intervals along the circumference of the second disk; when the adsorption cavity is formed between the cleaning disk structure and the surface to be cleaned, the elastic structure is configured to undergo elastic deformation according to the amount of airflow flowing between two adjacent ribs.

[0022] For example, according to at least one embodiment of the present disclosure, a receiving cavity is provided between the first disk and the second disk, and the sealing structure and the elastic structure are provided in the receiving cavity.

[0023] For example, according to at least one embodiment of the present disclosure, the cleaning disc structure includes: a sealing portion, located at the periphery of the cleaning disc structure, including an inner side wall and a sealing end face connected to each other, the inner side wall forming at least part of the circumferential side wall of the adsorption chamber, and the sealing end face being configured to seal the adsorption chamber along the circumference of the adsorption chamber; an adsorption portion, located in the middle of the cleaning disc structure, including an annular wall and an adsorption hole surrounded by the annular wall, the adsorption hole being configured to provide negative pressure to the adsorption chamber; an intermediate portion, including an air intake groove located between the sealing portion and the adsorption portion; the air intake groove includes a bottom wall connected to the inner side wall of the sealing portion and the annular wall of the adsorption portion, respectively, and a groove opening opposite to the bottom wall, two annular edges of the groove opening being respectively located at the inner edge of the sealing end face and the outer edge of the end of the annular wall away from the bottom wall; wherein the air intake groove is connected to the adsorption hole through a through hole, and the through hole includes an orifice connected to the air intake groove; the area of ​​the orifice is smaller than the area of ​​the groove opening.

[0024] For example, according to at least one embodiment of the present disclosure, the through hole is provided at a connection between the adsorption portion and the bottom wall.

[0025] For example, according to at least one embodiment of the present disclosure, the bottom wall of the air inlet groove includes a first surface and a second surface facing the groove opening, the second surface is closer to the center of the cleaning disk structure than the first surface; the distance between the first surface and the groove opening is greater than the distance between the second surface and the groove opening.

[0026] For example, according to at least one embodiment of the present disclosure, the bottom wall further includes a connecting surface connected between the first surface and the second surface, and the connecting surface intersects with the plane where the groove opening is located.

[0027] For example, according to at least one embodiment of the present disclosure, the cleaning disk structure also includes a plurality of ribs arranged at circumferential intervals along the adsorption hole, and the ribs extend along a first direction, which is the direction from the center of the cleaning disk structure to the edge; one end of the rib is connected to the adsorption part, and the other end is connected to the sealing part; the plurality of ribs divide the air intake groove into a plurality of sub-grooves, and the ribs are provided with notches at least at the position corresponding to the first surface, so that two adjacent sub-grooves are connected to each other.

[0028] For example, according to at least one embodiment of the present disclosure, on the reference plane where the groove opening is located, a portion of the orthographic projection of the notch overlaps with the orthographic projection of the first surface, and another portion of the orthographic projection of the notch overlaps with the orthographic projection of the second surface.

[0029] For example, according to at least one embodiment of the present disclosure, the sealing portion includes a main body and a raised portion protruding from the main body along a second direction, wherein the second direction is perpendicular to the plane where the groove opening is located; the surface of the main body and the surface of the raised portion jointly form the sealing end face.

[0030] For example, according to at least one embodiment of the present disclosure, the end of the protrusion away from the main body and the end of the portion of the rib outside the notch away from the bottom wall are approximately located in the same plane.

[0031] For example, according to at least one embodiment of the present disclosure, the end of the annular wall away from the bottom wall is located in the plane.

[0032] For example, according to at least one embodiment of the present disclosure, the end of the annular wall away from the bottom wall is located on a side of the plane close to the bottom wall.

[0033] For example, according to at least one embodiment of the present disclosure, the number of the raised portions is twice the number of the ribs and is evenly distributed along the circumference of the cleaning disc structure, and the raised portions include a plurality of first ridges connected to the ribs and a second ridge located between two adjacent first ridges.

[0034] For example, according to at least one embodiment of the present disclosure, at least two of the sealing part, the middle part and the adsorption part are integrally formed structures; or, the sealing part, the middle part and the adsorption part are separated structures.

[0035] For example, according to at least one embodiment of the present disclosure, the through hole is opened in the bottom wall.

[0036] For example, according to at least one embodiment of the present disclosure, the surface to be cleaned includes at least one of a flat surface and a curved surface.

[0037] An embodiment of the present disclosure provides a control method for a cleaning disk structure according to any of the above-mentioned embodiments, comprising: controlling the formation of the adsorption chamber between the cleaning disk structure and the surface to be cleaned, and controlling the cleaning disk structure to move in a preset direction; generating a trigger signal in response to the pressure difference between the air pressure in the adsorption chamber and the reference air pressure being less than a preset pressure difference; controlling the cleaning disk structure to move in a direction opposite to the preset direction within a signal transmission time based on the trigger signal; wherein, at least within the signal transmission time, the orthographic projection of the adsorption portion on the reference plane where the groove opening is located is within the range of the orthographic projection of the surface to be cleaned on the reference plane; the signal transmission time is the time difference between the moment when the trigger signal is generated and the moment when the cleaning disk structure moves in a direction opposite to the preset direction.

[0038] For example, according to at least one embodiment of the present disclosure, when at least part of the outer contour of the groove opening is located outside the outer contour of the positive projection of the surface to be cleaned on the reference plane, the pressure difference between the air pressure in the adsorption chamber and the reference air pressure is reduced to less than the preset pressure difference value to generate the trigger signal.

[0039] For example, according to at least one embodiment of the present disclosure, controlling the cleaning disk structure to move in a direction opposite to the preset direction based on the trigger signal includes: generating a control signal based on the trigger signal; and controlling the cleaning disk structure to move in a direction opposite to the preset direction based on the control signal.

[0040] For example, according to at least one embodiment of the present disclosure, controlling the cleaning disc structure to move in a direction opposite to the preset direction includes: controlling the cleaning disc structure to reverse around the rotation axis to move; or controlling the cleaning disc structure to move in a straight line opposite to the preset direction.

[0041] An embodiment of the present disclosure provides a cleaning device, comprising the cleaning disc structure of any of the above embodiments.

[0042] For example, according to at least one embodiment of the present disclosure, the cleaning disk structure includes a first cleaning disk structure; the cleaning device also includes: a main body; a first cleaning module, including the first cleaning disk structure; a second cleaning module, connected to the same side of the main body as the first cleaning module; wherein the first cleaning module and the second cleaning module are respectively located on both sides of a reference plane perpendicular to a line connecting their centers, and the first cleaning disk structure rotates around a first rotation axis, and there is an angle between the first rotation axis and the reference plane.

[0043] For example, according to at least one embodiment of the present disclosure, the cleaning device includes: a shell; a first driving unit, including a transmission mechanism and a first walking component, the transmission mechanism includes an output end, and the first walking component is connected to the output end of the transmission mechanism; a first cleaning unit, including the first cleaning disc structure and a first cleaning element arranged on the first cleaning disc structure, and the first cleaning disc structure is connected to the output end of the transmission mechanism; a second driving unit, including a second walking component, and the second walking component is spaced apart from the first walking component; and a second cleaning unit, arranged side by side with the first cleaning unit, and including a cleaning frame and a second cleaning element arranged on the cleaning frame, wherein the second walking component has a driving wheel, the rotating axis of the driving wheel is parallel to the surface to be cleaned, the first walking component includes a rotating disc and a friction member, the friction member is located on the side of the rotating disc away from the output end of the transmission mechanism, and the surface of the rotating disc farthest from the output end of the transmission mechanism has a first angle with the surface to be cleaned, and the first angle is greater than 0.

[0044] For example, according to at least one embodiment of the present disclosure, the friction member is configured to contact the surface to be cleaned, and the friction member is configured to generate friction with the surface to be cleaned.

[0045] For example, according to at least one embodiment of the present disclosure, a surface of the friction member farthest from the output end of the transmission mechanism has a second angle with the surface to be cleaned, and the second angle is greater than or equal to 0.

[0046] For example, according to at least one embodiment of the present disclosure, the friction coefficient between the friction member and the surface to be cleaned is greater than the friction coefficient between the first cleaning element and the surface to be cleaned.

[0047] For example, according to at least one embodiment of the present disclosure, a surface of the cleaning rack away from the housing is parallel to the surface to be cleaned.

[0048] For example, according to at least one embodiment of the present disclosure, the cleaning device includes: a shell; a first driving unit, including a transmission mechanism and a first walking component, the transmission mechanism includes an output end, and the first walking component is connected to the output end of the transmission mechanism; a first cleaning unit, including the first cleaning disc structure and a first cleaning element arranged on the first cleaning disc structure, and the first cleaning disc structure is connected to the output end of the transmission mechanism; a second driving unit, including a second walking component, and the second walking component is spaced apart from the first walking component; and a second cleaning unit, arranged side by side with the first cleaning unit, and including a cleaning frame and a second cleaning element arranged on the cleaning frame, wherein the second walking component has a driving wheel, the rotating axis of the driving wheel is parallel to the walking surface of the second walking component, the first walking component includes a rotating disc and a friction member, the friction member is located on the side of the rotating disc away from the output end of the transmission mechanism, the surface of the rotating disc farthest from the output end of the transmission mechanism has a first angle with the walking surface of the second walking component, and the first angle is greater than 0.

[0049] For example, according to at least one embodiment of the present disclosure, a surface of the friction member farthest from the output end of the transmission mechanism has a second angle with the walking surface of the second walking component, and the second angle is greater than or equal to 0.

[0050] For example, according to at least one embodiment of the present disclosure, the cleaning device includes: a shell; a first driving unit, including a transmission mechanism and a first walking component, the transmission mechanism includes an output end, and the first walking component is connected to the output end of the transmission mechanism; a first cleaning unit, including the first cleaning disc structure and a first cleaning element arranged on the first cleaning disc structure, and the first cleaning disc structure is connected to the output end of the transmission mechanism; a second driving unit, including a second walking component, and the second walking component is spaced apart from the first walking component; and a second cleaning unit, arranged side by side with the first cleaning unit, and including a cleaning frame and a second cleaning element arranged on the cleaning frame, wherein the second walking component has a driving wheel, the rotating axis of the driving wheel is parallel to the surface of the cleaning frame away from the shell, the first walking component includes a rotating disc and a friction member, the friction member is located on the side of the rotating disc away from the output end of the transmission mechanism, the surface of the rotating disc farthest from the output end of the transmission mechanism and the surface of the cleaning frame away from the shell have a first angle, and the first angle is greater than 0.

[0051] For example, according to at least one embodiment of the present disclosure, a surface of the friction member farthest from the output end of the transmission mechanism and a surface of the cleaning frame farthest from the housing have a second angle greater than or equal to 0.

[0052] For example, according to at least one embodiment of the present disclosure, the first cleaning unit has a first opening on a side away from the output end of the transmission mechanism, the first opening is configured to avoid the first walking part, the first cleaning disc structure has a hollow structure on a side away from the output end of the transmission mechanism, the first cleaning element has a hollow structure, and the hollow structure of the first cleaning disc structure and the hollow structure of the first cleaning element constitute the first opening.

[0053] For example, according to at least one embodiment of the present disclosure, the second cleaning unit has a second opening, the second opening is configured to avoid the second walking part, the cleaning frame has a hollow structure, the second cleaning element has a hollow structure, and the hollow structure of the cleaning frame and the hollow structure of the second cleaning element constitute the second opening.

[0054] For example, according to at least one embodiment of the present disclosure, the first angle is less than or equal to 10°, and the second angle is less than or equal to 10°.

[0055] For example, according to at least one embodiment of the present disclosure, the second angle is equal to 0°, and the ratio of the width of the surface of the friction member farthest from the output end of the transmission mechanism to the ring width of the friction member is greater than or equal to one quarter and less than 1.

[0056] For example, according to at least one embodiment of the present disclosure, the friction member is located at the edge of the rotating disk, the friction member is annular, the rotating disk is circular, and the ratio of the ring width of the ring to the radius of the circle is in the range of 0.25-0.5.

[0057] For example, according to at least one embodiment of the present disclosure, the ratio of the maximum diameter of the rotating disk to the maximum diameter of the first cleaning unit is in a range of 0.25-0.5.

[0058] For example, according to at least one embodiment of the present disclosure, a side of the rotating disk away from the output end of the transmission mechanism has a groove or a notch, and at least a portion of the friction member is located in the groove or the notch.

[0059] For example, according to at least one embodiment of the present disclosure, the friction member is flush with a surface of the rotating disk that is farthest from the output end of the transmission mechanism.

[0060] For example, according to at least one embodiment of the present disclosure, the friction member protrudes from a surface of the rotating disk that is farthest from the output end of the transmission mechanism.

[0061] For example, according to at least one embodiment of the present disclosure, the ratio of the size of the surface of the friction member protruding from the output end of the rotating disk farthest from the transmission mechanism to the maximum thickness of the friction member is less than or equal to one-fifth.

[0062] For example, according to at least one embodiment of the present disclosure, the first cleaning disk structure is connected to the rotating disk.

[0063] For example, according to at least one embodiment of the present disclosure, the rotating disk and the friction member are fixedly connected.

[0064] For example, according to at least one embodiment of the present disclosure, the first cleaning disk structure is connected to the output end of the transmission mechanism through a universal coupling, the input end of the universal coupling is connected to the output end of the transmission mechanism, the input end of the universal coupling and the output end of the universal coupling are connected through a connecting member, the connecting member has a hollow channel, the output end of the transmission mechanism has an output shaft, the output shaft is connected to the first walking part, and the output shaft passes through the hollow channel.

[0065] For example, according to at least one embodiment of the present disclosure, the connecting member has an annular structure and a cross frame connected to the annular structure and located within the annular structure, and the hollow channel runs through the cross portion of the cross frame.

[0066] For example, according to at least one embodiment of the present disclosure, when the first cleaning module is used for walking, the first cleaning module is configured to generate friction with the surface to be cleaned so that the first cleaning module rotates around the second cleaning module; when the second cleaning module is used for walking, the second cleaning module is configured to generate friction with the surface to be cleaned so that the second cleaning module rotates around the first cleaning module.

[0067] For example, according to at least one embodiment of the present disclosure, the cleaning disk structure also includes a second cleaning disk structure, and the second cleaning module includes the second cleaning disk structure; the first cleaning module also includes a first walking member, the first walking member and the first cleaning disk structure rotate synchronously, the first cleaning disk structure is configured to form a first adsorption chamber with the surface to be cleaned, and the first walking member is located in the first adsorption chamber; the second cleaning module also includes a second walking member that rotates synchronously, the second walking member and the second cleaning disk structure rotate synchronously, the second cleaning disk structure is configured to form a second adsorption chamber with the surface to be cleaned, and the second walking member is located in the second adsorption chamber.

[0068] For example, according to at least one embodiment of the present disclosure, the first traveling member and the first cleaning disc structure are both fixedly connected to the first drive shaft; the second traveling member and the second cleaning disc structure are both fixedly connected to the second drive shaft.

[0069] For example, according to at least one embodiment of the present disclosure, the first cleaning module is configured to rotate around a first rotation axis of the first driving shaft, and the second cleaning module is configured to rotate around a second rotation axis of the second driving shaft; the first cleaning module and the second cleaning module are respectively located on both sides of a reference plane perpendicular to a line connecting their centers, and the first rotation axis and the second rotation axis have a non-zero angle with the reference plane.

[0070] For example, according to at least one embodiment of the present disclosure, the intersection of the first rotation axis and the reference plane is located on the side of the first cleaning module away from the main body, and the intersection of the second rotation axis and the reference plane is located on the side of the second cleaning module away from the main body.

[0071] For example, according to at least one embodiment of the present disclosure, the reference surface passes through the midpoint of the center line, and the first rotation axis and the second rotation axis intersect the reference surface at the same point.

[0072] For example, according to at least one embodiment of the present disclosure, the angle between the first rotation axis and the reference plane is equal to the angle between the second rotation axis and the reference plane.

[0073] For example, according to at least one embodiment of the present disclosure, the first walking member includes a first force-applying surface, and a non-zero angle is formed between the first force-applying surface and the surface to be cleaned; the second walking member includes a second force-applying surface, and a non-zero angle is formed between the second force-applying surface and the surface to be cleaned.

[0074] For example, according to at least one embodiment of the present disclosure, the first force-applying surface includes a first part and a second part; when the first walking member moves, the first part is in frictional contact with the surface to be cleaned, and the second part does not contact the surface to be cleaned; the second force-applying surface includes a third part and a fourth part; when the second walking member moves, the third part is in frictional contact with the surface to be cleaned, and the fourth part does not contact the surface to be cleaned.

[0075] For example, according to at least one embodiment of the present disclosure, the first force-applying surface includes a first part and a second part; when the first walking member moves, the pressure applied by the first part to the surface to be cleaned is greater than the pressure applied by the second part to the surface to be cleaned; the second force-applying surface includes a third part and a fourth part; when the second walking member moves, the pressure applied by the third part to the surface to be cleaned is greater than the pressure applied by the fourth part to the surface to be cleaned.

[0076] For example, according to at least one embodiment of the present disclosure, in the direction of the center line connecting the first walking member and the second walking member: the first part is located on the side of the first walking member away from the second walking member, and the second part is located on the side of the first walking member close to the second walking member; the third part is located on the side of the second walking member away from the first walking member, and the fourth part is located on the side of the second walking member close to the first walking member.

[0077] For example, according to at least one embodiment of the present disclosure, in the direction of the center line connecting the first walking member and the second walking member: the first part is located on the side of the first walking member close to the second walking member, and the third part is located on the side of the second walking member close to the first walking member.

[0078] For example, according to at least one embodiment of the present disclosure, on the side away from the main body: the first cleaning disk structure protrudes from the first walking member, and after the first cleaning disk structure undergoes elastic deformation, the first cleaning disk structure and the first walking member can both contact the surface to be cleaned; the second cleaning disk structure protrudes from the second walking member, and after the second cleaning disk structure undergoes elastic deformation, the second cleaning disk structure and the second walking member can both contact the surface to be cleaned.

[0079] For example, according to at least one embodiment of the present disclosure, when the first walking member is moving, the friction force between the first walking member and the surface to be cleaned is greater than the friction force between the first cleaning disk structure and the surface to be cleaned; when the second walking member is moving, the friction force between the second walking member and the surface to be cleaned is greater than the friction force between the second cleaning disk structure and the surface to be cleaned.

[0080] For example, according to at least one embodiment of the present disclosure, the cleaning device also includes a first cleaning member and a second cleaning member; the first cleaning member is wrapped outside the first cleaning disk structure; when the first adsorption chamber is formed, the first cleaning member is in close contact with the surface to be cleaned; the second cleaning member is wrapped outside the second cleaning disk structure, and when the second adsorption chamber is formed, the second cleaning member is in close contact with the surface to be cleaned.

[0081] For example, according to at least one embodiment of the present disclosure, on the side away from the main body: the first cleaning member protrudes from the first walking member, and after the first cleaning disk structure is elastically deformed, the first cleaning member and the first walking member are both in contact with the surface to be cleaned; the second cleaning member protrudes from the second walking member, and after the second cleaning disk structure is elastically deformed, the second cleaning member and the second walking member are both in contact with the surface to be cleaned.

[0082] For example, according to at least one embodiment of the present disclosure, when the first walking member is moving, the friction force between the first walking member and the surface to be cleaned is greater than the friction force between the first cleaning member and the surface to be cleaned; when the second walking member is moving, the friction force between the second walking member and the surface to be cleaned is greater than the friction force between the second cleaning member and the surface to be cleaned.

[0083] For example, according to at least one embodiment of the present disclosure, the cleaning device further includes a first driving member and a second driving member; the first driving member is configured to drive the first cleaning module to rotate, and the second driving member is configured to drive the second cleaning module to rotate.

[0084] For example, according to at least one embodiment of the present disclosure, the axis of the output shaft of the first driving member intersects with the first rotation axis; the axis of the output shaft of the second driving member intersects with the second rotation axis. BRIEF DESCRIPTION OF THE DRAWINGS

[0085] In order to more clearly illustrate the technical solutions of the embodiments of the present disclosure, the drawings of the embodiments will be briefly introduced below. Obviously, the drawings in the following description only relate to some embodiments of the present disclosure, rather than limiting the present disclosure.

[0086] FIG1 is an exploded schematic diagram of a cleaning disk structure provided by at least one embodiment of the present disclosure.

[0087] 2A and 2B are schematic diagrams of the adsorption chamber formed by the cleaning disc structure shown in FIG. 1 .

[0088] FIG3 is a bottom schematic diagram of a cleaning disk structure provided by at least one embodiment of the present disclosure.

[0089] FIG4 is an exploded schematic diagram of a cleaning disk structure provided by at least one embodiment of the present disclosure.

[0090] FIG5 is an exploded schematic diagram of a cleaning device provided by at least one embodiment of the present disclosure.

[0091] FIG6 is a schematic cross-sectional view of a cleaning device provided by at least one embodiment of the present disclosure.

[0092] FIG7 is a schematic diagram of a first rotation axis, a second rotation axis, and a reference surface in a cleaning device provided by at least one embodiment of the present disclosure.

[0093] FIG8 is a schematic diagram of a partial structure of a cleaning device provided by at least one embodiment of the present disclosure.

[0094] FIG9 is a schematic diagram of a wiper in a cleaning device according to at least one embodiment of the present disclosure.

[0095] FIG10 is a schematic diagram of a cleaning disk structure provided in an example of at least one embodiment of the present disclosure.

[0096] FIG11 is a schematic diagram of an adsorption cavity formed between a cleaning disk structure and a surface to be cleaned according to at least one embodiment of the present disclosure.

[0097] FIG. 12 is a schematic diagram of a partial structure of a cleaning disk structure provided by at least one embodiment of the present disclosure.

[0098] 13 is a schematic diagram of an orthographic projection of a notch, an orthographic projection of a first surface, and an orthographic projection of a second surface of a cleaning disk structure provided by at least one embodiment of the present disclosure.

[0099] FIG14 is a flow chart of a method for controlling a cleaning disk structure provided in an example according to at least one embodiment of the present disclosure.

[0100] FIG15 is a schematic diagram of the orthographic projection of the groove opening and the surface to be cleaned of the cleaning disk structure provided by at least one embodiment of the present disclosure on a reference plane.

[0101] FIG16 is a schematic diagram of a cleaning device provided in an embodiment of the present disclosure.

[0102] FIG17 is a partially enlarged view of FIG16 .

[0103] FIG18 is a schematic diagram of a first moving component in a cleaning device provided in an embodiment of the present disclosure.

[0104] FIG19 is a schematic diagram of a first moving component in a cleaning device provided in an embodiment of the present disclosure.

[0105] FIG20 is a schematic diagram of a first moving component in a cleaning device provided in an embodiment of the present disclosure.

[0106] FIG21 is a schematic diagram of a first moving component and a first cleaning unit in a cleaning device provided in an embodiment of the present disclosure.

[0107] FIG22 is a side view of a universal joint in a cleaning device provided in an embodiment of the present disclosure.

[0108] FIG23 is a front view of a universal joint in a cleaning device provided in an embodiment of the present disclosure.

[0109] FIG24 is a top view of a connecting member in a universal joint in a cleaning device provided in an embodiment of the present disclosure.

[0110] FIG. 25 is a motion control method for a cleaning device further provided in an embodiment of the present disclosure.

[0111] FIG26 is a schematic diagram of the movement of a cleaning device provided in an example of at least one embodiment of the present disclosure.

[0112] FIG27 is a schematic cross-sectional view of a cleaning device provided in an example of at least one embodiment of the present disclosure.

[0113] FIG. 28 is an exploded schematic diagram of a cleaning device provided in an example of at least one embodiment of the present disclosure.

[0114] FIG29 is a schematic diagram of a partial structure of a cleaning device provided in an example of at least one embodiment of the present disclosure.

[0115] FIG30 is a schematic diagram of a first rotation axis, a second rotation axis, and a reference surface in a cleaning device provided in an example of at least one embodiment of the present disclosure.

[0116] FIG31 is a schematic diagram of a first walking member and a second walking member provided in an example of at least one embodiment of the present disclosure. DETAILED DESCRIPTION

[0117] To make the purpose, technical solutions, and advantages of the embodiments of the present disclosure more clear, the technical solutions of the embodiments of the present disclosure will be clearly and completely described below in conjunction with the accompanying drawings of the embodiments of the present disclosure. Obviously, the described embodiments are part of the embodiments of the present disclosure, not all of the embodiments. Based on the described embodiments of the present disclosure, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present disclosure.

[0118] Unless otherwise defined, technical or scientific terms used in this disclosure should have the ordinary meanings understood by people with ordinary skills in the field to which this disclosure belongs. The words "first", "second" and similar terms used in this disclosure do not indicate any order, quantity or importance, but are simply used to distinguish different components. The words "include" or "comprising" and similar terms mean that the elements or objects preceding the word include the elements or objects listed after the word and their equivalents, without excluding other elements or objects.

[0119] The features such as "perpendicular", "parallel" and "same" used in this disclosure include the features such as "perpendicular", "parallel" and "same" in the strict sense, as well as the cases where "approximately perpendicular", "approximately parallel" and "approximately the same" include certain errors, taking into account the errors associated with the measurement and the measurement of specific quantities (that is, the limitations of the measurement system), and are expressed as being within the acceptable deviation range for a specific value determined by a person of ordinary skill in the art. The "center" in the embodiments of the present disclosure can include a position strictly at the geometric center and a position approximately at the center of a small area around the geometric center. For example, "approximately" can mean within one or more standard deviations, or within 10% or 5% of the value.

[0120] With the rapid development of modern technology, a wide variety of household appliances have emerged. These cleaning devices, such as window cleaning robots and sweeping robots, utilize advanced technology and automated systems to assist users with daily cleaning tasks. By replacing manual labor with automated operations, they significantly improve cleaning efficiency and comfort.

[0121] When a cleaning device such as a window cleaning machine is cleaning a surface, it must be securely attached to the surface, ensuring that the machine can operate safely without slipping, even at high altitudes. Therefore, the stability of the window cleaning machine's attachment is crucial.

[0122] During the research, the inventors of this application found that when there is an angle between the wiping surface used by the window cleaning machine and the surface to be cleaned, for example, when the surface to be cleaned is an inclined surface, a non-flat surface or a curved surface, the risk of air leakage between the window cleaning machine and the surface to be cleaned will greatly increase, resulting in unstable adsorption of the window cleaning machine and the risk of slipping.

[0123] In addition, the sealing ability of the window cleaning machine also affects the adsorption stability of the window cleaning machine. Some window cleaning machines use foam or silicone as a sealing element. When an adsorption chamber is formed between the window cleaning machine and the surface to be cleaned, the elastic force of the foam or silicone is used to make the window cleaning machine fit the surface to be cleaned, and at the same time, the adsorption chamber is sealed in the circumferential direction. However, the use environment of foam or silicone is limited. In high temperature environments or low temperature environments, the elastic properties of foam or silicone will deteriorate. Moreover, after long-term use of foam or silicone, the microstructure of materials such as foam or silicone will fatigue and cannot be fully restored to its original state. Therefore, it is difficult for the window cleaning machine to simultaneously achieve the fit of the window cleaning machine to the surface to be cleaned and the circumferential sealing of the adsorption chamber using only foam or silicone.

[0124] At least one embodiment of the present disclosure provides a cleaning disc structure and a cleaning device, wherein the cleaning disc structure is configured to form an adsorption chamber with a surface to be cleaned, and the cleaning disc structure includes: a first disc and a second disc arranged opposite to each other, wherein the inner side walls of the first disc and the second disc form at least a portion of the circumferential side wall of the adsorption chamber; and an elastic structure, which is arranged between the first disc and the second disc and is configured to provide an elastic force between the first disc and the second disc to change the size of the interval between the first disc and the second disc in a direction along the second disc pointing to the first disc.

[0125] At least one embodiment of the present disclosure provides a cleaning disc structure with an elastic structure disposed between a first disc and a second disc. The elastic force of the elastic structure can change the size of the gap, thereby enabling the cleaning disc structure to maintain contact with the surface to be cleaned in various usage scenarios. This allows the air intake of the cleaning disc structure to be adjusted, improving the adsorption stability of the adsorption chamber and reducing the risk of slipping of a cleaning device using the cleaning disc structure.

[0126] At least one embodiment of the present disclosure provides a cleaning device, comprising a main body; at least two cleaning disc structures according to any of the above embodiments, wherein the at least two cleaning disc structures are connected to one side of the main body; the at least two cleaning disc structures include a first cleaning disc structure and a second cleaning disc structure, the first cleaning disc structure is configured to rotate around a first rotation axis, and the second cleaning disc structure is configured to rotate around a second rotation axis; the first cleaning disc structure and the second cleaning disc structure are respectively located on both sides of a reference plane perpendicular to a line connecting their centers, and the first rotation axis and the second rotation axis respectively have a non-zero angle with the reference plane.

[0127] In at least one embodiment of the present disclosure, a cleaning device is provided in which a first cleaning disc structure rotates about an inclined first rotation axis, and a second cleaning disc structure rotates about an inclined second rotation axis. This increases the friction between the two cleaning disc structures and the surface to be cleaned, thereby improving travel efficiency and cleaning effectiveness. Furthermore, the elastic and sealing structures in the two cleaning disc structures ensure stable adsorption between the two cleaning disc structures and the surface to be cleaned in various usage scenarios, thereby preventing the cleaning device from slipping.

[0128] The cleaning disc structure and the cleaning device are described below with reference to the accompanying drawings and through some embodiments.

[0129] It should be noted that in different drawings, the same reference numeral may correspond to different components, and the specific reference numeral shall prevail.

[0130] Figure 1 is an exploded schematic diagram of a cleaning disc structure provided by at least one embodiment of the present disclosure. Figures 2A and 2B are schematic diagrams of the cleaning disc structure shown in Figure 1 forming an adsorption chamber.

[0131] With reference to Figures 1 to 2B , in some examples, the cleaning disc structure is configured to form an adsorption chamber Z with the surface to be cleaned S. The cleaning disc structure includes a first disc 110, a second disc 120, a sealing structure 130, and an elastic structure 140. The first disc 110 and the second disc 120 are disposed opposite each other, with the inner sidewall 110a of the first disc 110 and the inner sidewall 120a of the second disc 120 forming at least a portion of the circumferential sidewall of the adsorption chamber Z. For example, the first disc 110 further includes a disc body 110b, and the inner sidewall 110a is connected to a side surface of the disc body 110b facing the second disc 120. For example, the second disc 120 further includes a disc body 120b, and the inner sidewall 120a is connected to a side surface of the disc body 120b facing the first disc 110. For example, during relative movement of the first disc 110 and the second disc 120, the inner sidewall 110a of the first disc 110 and the inner sidewall 120a of the second disc 120 partially or completely overlap in the radial direction of the cleaning disc structure. Figure 2B schematically shows a schematic diagram of the second disk 120 of the cleaning disk structure contacting the surface to be cleaned S to form an adsorption chamber Z, but the present disclosure is not limited to this. For example, a wiper may be provided outside the cleaning disk structure, and the wiper may directly contact the surface to be cleaned.

[0132] For example, the inner sidewalls of the first disk and the second disk may form the circumferential sidewall of the adsorption chamber together with the sidewalls of other structures (eg, the sidewalls of the sealing structure in the examples described later, such as the surface of the wiper).

[0133] For example, FIG1 schematically illustrates a first disk as an annular disk, which may also be referred to as the first annular disk. FIG1 schematically illustrates a second disk as an annular disk, which may also be referred to as the second annular disk. However, the present disclosure is not limited to this. For example, the first disk may be a circular disk, and the second disk may be a circular disk. For example, the first disk may be a square disk, and the second disk may be a square disk. For example, the first disk and the second disk may also have other shapes, which are not limited by the present disclosure.

[0134] 1 , the elastic structure 140 is disposed between the first tray 110 and the second tray 120 and is configured to provide an elastic force between the first tray 110 and the second tray 120 to change the dimension of the distance D between the first tray 110 and the second tray 120 in a direction from the second tray 120 toward the first tray 110 (see distance D1 and distance D2 shown in FIG. 2B ). For example, the elastic structure 140 may be elastically connected between the first tray 110 and the second tray 120. For example, when an accommodating cavity 100 a is disposed between the first tray 110 and the second tray 120, the elastic structure 140 may be disposed within the accommodating cavity 100 a.

[0135] Referring to Figures 1 to 2B , the cleaning disc structure provided by the presently disclosed embodiments includes an elastic structure 140 disposed between a first disc 110 and a second disc 120. The elastic force of the elastic structure 140 can change the size of the gap D, thereby enabling the cleaning disc structure to maintain contact with the surface S to be cleaned in various usage scenarios. For example, referring to Figure 2A , when the cleaning disc structure is suspended, the gap D between the first disc 110 and the second disc 120 is constant at all locations, and there is an angle between the second disc 120 and the surface S to be cleaned. Referring to Figure 2B , when the cleaning disc structure shown in Figure 2A is placed on the surface S to be cleaned and an adsorption chamber Z is formed, the second disc 120 in the cleaning disc structure is in contact with the surface S to be cleaned, and the gaps D1 and D2 between the first disc 110 and the second disc 120 at different locations are different. Thus, by changing the gap D between the first disc 110 and the second disc 120 through the elastic structure 140, the contact surface 121 is essentially completely in contact with the surface S to be cleaned, preventing air leakage in the adsorption chamber Z.

[0136] 1 and 2A , in some examples, the cleaning disc structure is configured to rotate around a selected axis R that intersects with the surface to be cleaned S and is not perpendicular to each other. For example, the rotation axis R and the surface to be cleaned S have an angle γ, and the angle γ is less than 90°. For example, the rotation axes of the first disc 110 and the second disc 120 coincide with the rotation axis R of the cleaning disc structure. For example, with reference to FIG2A , before the adsorption chamber Z is formed between the cleaning disc structure and the surface to be cleaned S, there is an inclination angle between the contact surface 121 of the second disc 120 used to form the adsorption chamber Z with the surface to be cleaned S and the surface to be cleaned S. When the adsorption chamber Z is formed between the cleaning disc structure and the surface to be cleaned S, the pressure between the contact surface 121 and the surface to be cleaned S is different, so that the friction between the contact surface 121 and the surface to be cleaned S is different, so that when the cleaning disc structure is applied to the cleaning device, it is beneficial to the cleaning and movement of the cleaning device.

[0137] 1 , in some examples, a sealing structure 130 is disposed between the first plate 110 and the second plate 120 and is configured to seal the gap D between the first plate 110 and the second plate 120, at least when forming the adsorption chamber Z. For example, the sealing structure 130 may be fixed to the first plate 110 or to the second plate 120. For example, the first plate 110 and the second plate 120 may be interlocked with each other, thereby forming a receiving chamber 100 a between the first plate 110 and the second plate 120, and the sealing structure 130 may be disposed in the receiving chamber 100 a.

[0138] Referring to Figures 1 to 2B, the elastic structure 140 and the sealing structure 130 in the cleaning disc structure realize elastic deformation and sealing respectively, and the functions of each component are simplified, which is conducive to extending the service life of the cleaning disc structure and is easy to repair and replace. The elastic structure 140 changes the interval D between the first annular disc 110 and the second annular disc 120, so that the contact surface 121 is basically completely fitted with the surface to be cleaned S, preventing air leakage in the adsorption chamber Z. At the same time, the sealing structure 130 can adaptively deform according to the different sizes of the interval D to seal the interval D. Through the cooperation of the elastic structure 140 and the sealing structure 130, the cleaning disc structure can adjust the air intake of the cleaning disc structure, improve the adsorption stability of the adsorption chamber Z, and thus reduce the risk of slipping of the cleaning device using the cleaning disc structure.

[0139] With reference to Figures 1 to 2B, the cleaning disc structure may further include a connecting disc 160. When the cleaning disc structure is applied to a cleaning device (with reference to Figure 5), the connecting disc 160 is used to connect the cleaning disc structure to the main body of the cleaning device, and a running disc 170 connected to the connecting disc 160 may also be provided to generate friction with the surface S to be cleaned and realize the walking of the cleaning device. For example, the connecting disc 160 is connected to the first disc 110, and the connecting disc 160 and the running disc 170 are respectively connected to the drive shaft of the drive mechanism in the embodiment described later. For example, the rotation axis of the connecting disc 160, the running disc 170, the first disc 110, and the second disc 120 all coincide with the rotation axis R of the cleaning disc structure. For example, the rotation axis R of the cleaning disc structure coincides with the axis of the drive shaft of the drive mechanism, and the connecting disc 160 and the running disc 170 are both located at the annular center of the first disc 110 and the second disc 120, so that when an adsorption chamber Z is formed between the cleaning disc structure and the surface S to be cleaned, the connecting disc 160 and the running disc 170 are both located in the adsorption chamber Z.

[0140] Referring to Figures 2A and 2B , in some examples, the surface to be cleaned S includes at least one of a flat surface and a curved surface. When an adsorption chamber Z is formed between the cleaning disc structure and the surface to be cleaned S, the elastic structure 140 can exhibit different elastic deformations based on different surface conditions and adjust the gap D between the first disc 110 and the second disc 120, thereby maintaining contact between the second disc 120 and the surface to be cleaned S without air leakage. The sealing structure 130 simultaneously seals the gap D to enhance air leakage prevention. This allows the cleaning disc structure to adapt to different usage scenarios without slipping.

[0141] For example, the surface to be cleaned S may be a plane as shown in Figures 2A and 2B. For example, the surface to be cleaned may be a plane having an inclination angle of 0° to 270° with respect to the ground. For example, the surface to be cleaned may be formed by connecting a plurality of planes having angles therebetween. For example, the surface to be cleaned may include a curved surface having an arc of 0° to 30°. For example, the surface to be cleaned may also be a non-flat surface.

[0142] With reference to Figures 1 and 2A, in some examples, the rebound speed of the elastic structure 140 is different from the rebound speed of the sealing structure 130. Rebound speed refers to the speed at which an object returns to its original shape after being stretched or compressed by an external force and the external force is released. For example, the rebound speed of the elastic structure 140 can be greater than the rebound speed of the sealing structure 130. Thus, when the cleaning disc structure and the surface to be cleaned S need to be separated, the elastic structure 140, which rebounds faster, increases the gap D first, while the sealing structure 130 rebounds more slowly, thereby forming a gap between the first disc 110 or the second disc 120. Airflow can flow through the gap, accelerating the pressure differential balance between the external space and the adsorption chamber Z, thereby accelerating the separation of the cleaning disc structure from the surface to be cleaned S. For example, the rebound speed of the elastic structure 140 can also be less than the rebound speed of the sealing structure 130. When the elastic structure 140 in the cleaning disc structure undergoes elastic deformation based on the surface to be cleaned S, the sealing structure 130, which rebounds faster, can always maintain the seal inside the cleaning disc structure.

[0143] Referring to Figure 1 , in some examples, the elastic structure 140 is configured to undergo linear deformation. For example, the elastic structure 140 has linear elasticity, and the stress and strain experienced by the elastic structure 140 are linearly related. The sealing structure 130 is configured to undergo nonlinear deformation. For example, the sealing structure 130 has nonlinear elasticity, and the stress and strain experienced by the sealing structure 130 are nonlinearly related. As a result, the elastic deformation processes of the elastic structure 140 and the sealing structure 130 differ, and the air intake volume can be adjusted based on this difference.

[0144] Referring to Figure 1 , in some examples, the elastic structure 140 includes a spring, and the sealing structure 130 is made of at least one of foam and silicone. This allows the spring to meet the cleaning disc structure's greater elastic deformation requirements while ensuring a seal. In other examples, the elastic structure may also include at least one of foam and silicone. Of course, the elastic structure may also be other structures with elastic force, and the sealing structure may also be other materials capable of achieving a seal, and this disclosure is not limited thereto.

[0145] Referring to FIG. 1 , in some examples, the sealing structure 130 is an integral annular structure that seals the adsorption chamber Z along its circumference, preventing air from the external space from entering between the first and second disks 110 , 120 and causing leakage from the adsorption chamber Z. For example, the shape of the sealing structure 130 can match the shape of the space formed between the first and second disks 110 , 120 . For example, when a receiving chamber 100 a is formed between the first and second disks 110 , 120 , the shape of the sealing structure 130 can match the shape of the receiving chamber 100 a.

[0146] Referring to Figure 1 , in some examples, the elastic structure 140 is disposed through the sealing structure 130 and pre-compressed between the first plate 110 and the second plate 120. For example, the elastic structure 140 is disposed through the sealing structure 130 having an integral annular structure as shown in Figure 1 . As a result, the sealing structure 130 can substantially fill the space between the first plate 110 and the second plate 120, preventing air leakage at locations such as the connection between the first plate 110 and the second plate 120. For example, the sealing structure 130 can be an integral annular structure, and a hole can be provided in the sealing structure 130 for the elastic structure 140 to extend into. The hole provided in the sealing structure 130 also facilitates the installation and positioning of the elastic structure 140.

[0147] FIG3 is a bottom schematic diagram of a cleaning disk structure provided by at least one embodiment of the present disclosure.

[0148] With reference to Figures 1 and 3, in some examples, the cleaning disc structure further includes a connecting structure 150 connected between the first disc 110 and the second disc 120. The connecting structure 150 is disposed through the sealing structure 130. For example, the connecting structure 150 is disposed through the sealing structure 130, which is an integral annular structure as shown in Figure 1. The provision of the connecting structure 150 prevents the first disc 110 from separating from the second disc 120 and allows the elastic structure 140 to be pre-loaded between the first disc 110 and the second disc 120. Furthermore, the sealing structure 130 can surround the connecting structure 150, thereby providing an airtight seal at the connection points (e.g., bolt holes) between the connecting structure 150 and the first disc 110 and at the connection points (e.g., bolt holes) between the connecting structure 150 and the second disc 120. For example, the sealing structure 130 can be an integral annular structure, and can include a hole for the connecting structure 150 to extend therethrough. For example, the connecting structure 150 can include bolts and nuts.

[0149] Referring to Figures 1 to 2B , in some examples, a plurality of elastic structures 140 are provided, with the plurality of elastic structures 140 spaced apart along the circumference of the second disk 120. When the cleaning disk structure is configured to rotate about a rotation axis R that intersects and is not perpendicular to the surface to be cleaned S, and when an adsorption chamber Z is formed between the cleaning disk structure and the surface to be cleaned S, at least two of the plurality of elastic structures 140 at different circumferential locations exhibit different elastic deformations, thereby increasing the degree of freedom of deformation of the elastic structures 140. For example, when the rotation axis R of the cleaning disk structure is tilted relative to the surface to be cleaned S, the elastic structures 140 can be elastically deformed according to the degree of tilt between the rotation axis R and the surface to be cleaned S, thereby varying the spacing D between the first disk 110 and the second disk 120 at different locations, such as spacing D1 and spacing D2 shown in Figure 2B , to allow the second disk 120 to conform to the surface to be cleaned S. For example, only one of the plurality of elastic structures 140 may be elastically deformed, i.e., only one of the plurality of elastic structures 140 may exhibit an elastic deformation greater than zero. For example, two or more elastic structures 140 among the plurality of elastic structures 140 may undergo elastic deformation, and the elastic deformation amounts of at least two elastic structures 140 are different.

[0150] In some examples, the elastic structure is an annular integral structure. When the cleaning disc structure is configured to rotate about a rotation axis that intersects with the surface to be cleaned and is not perpendicular to each other, when an adsorption cavity is formed between the cleaning disc structure and the surface to be cleaned, the elastic deformation amount of the elastic structure at at least two positions in the circumferential direction is different. For example, the elastic structure of the annular integral structure can be a spring whose inner diameter size matches the inner diameter size of the second disc. For example, the material of the elastic structure of the annular integral structure can also include foam, silicone or other elastic materials, and the shape of the elastic structure can be similar to the sealing structure 130 shown in Figure 1, and the present disclosure is not limited to this.

[0151] Referring to FIG. 1 , in some examples, a guide portion 1201 extending in the direction from the second disk 120 to the first disk 110 is provided on the side of the second disk 120 facing the first disk 110. The guide portion 1201 is configured to guide the elastic structure 140 to undergo elastic deformation in the direction from the second disk 120 to the first disk 110. For example, the direction from the second disk 120 to the first disk 110 can be parallel to the rotation axis R. For example, the elastic structure 140 can be disposed within a guide groove of the guide portion 1201. For example, the elastic structure 140 can be sleeved outside the guide portion 1201. Thus, the guide portion 1201 can guide the elastic deformation of the elastic structure 140 without deviation. In addition, the guide portion 1201 can also facilitate the positioning and installation of the elastic structure 140.

[0152] 2B and 3 , in some examples, the contact surface 121 of the second tray 120 that is in contact with the surface to be cleaned S is formed of a flexible material. A contact surface of a flexible material can better conform to the surface to be cleaned, for example, adapt to an inclined surface to be cleaned or a curved surface to be cleaned, thereby improving the adsorption stability of the adsorption chamber. For example, when the second tray is used to conform to a curved surface to be cleaned, the contact surface of the second tray can be roughly curved. Of course, in other examples, the contact surface of the second tray can also be a hard material, thereby improving the support strength for the wiper when applied to a cleaning device. For example, when the second tray is used to conform to a flat surface to be cleaned, the contact surface of the second tray can be roughly flat.

[0153] 1 and 3 , in some examples, the contact surface 121 is provided with a plurality of ribs 122 convexly disposed, and the plurality of ribs 122 are spaced apart along the circumference of the second disc 120. When an adsorption chamber Z is formed between the cleaning disc structure and the surface to be cleaned S, the elastic structure 140 is configured to undergo elastic deformation according to the amount of airflow flowing between two adjacent ribs 122. In the process of forming the adsorption chamber Z, the gap between the contact surface 121 of the second disc 120 and the surface to be cleaned S can be determined based on the amount of airflow between two adjacent ribs 122, and the elastic deformation of the elastic structure 140 can be changed based on the gap, so that the contact surface 121 of the second disc 120 can form an adsorption chamber Z with the surface to be cleaned S. For example, when a wiper is provided on the outer cover of the cleaning disc structure, the ribs 122 can also be used to increase the friction between the wiper and the surface to be cleaned S.

[0154] FIG4 is an exploded schematic diagram of the cleaning disc structure provided by at least one embodiment of the present disclosure. The difference between the cleaning disc structure shown in FIG4 and the cleaning disc structure shown in FIG1 is that the sealing structure 130 of FIG4 is different from the sealing structure 130 of FIG1. ​​Of course, the cleaning disc structure shown in FIG4 may also have other differences from the cleaning disc structure shown in FIG1, for example, the structures of the first disc 110 and the second disc 120 shown in FIG4 and FIG1 are different, for example, the structures of the connecting disc 160 shown in FIG4 and FIG1 are different, for example, FIG4 does not show a walking disc. The cleaning disc structure shown in FIG4 may also have other differences from the cleaning disc structure shown in FIG1, and the present disclosure does not limit this.

[0155] Referring to Figure 4, in some examples, the sealing structure 130 includes an inner sealing structure 131 and an outer sealing structure 132. The outer sealing structure 132 is sleeved outside the inner sealing structure 131, and the elastic structure 140 is located between the inner sealing structure 131 and the outer sealing structure 132. Thus, the inner sealing structure 131 and the outer sealing structure 132 work together to prevent air leakage from the adsorption chamber Z through the inner sealing structure 131, while the outer sealing structure 132 prevents external air from entering between the first disc 110 and the second disc 120, thereby improving the sealing effect of the cleaning disc structure. Furthermore, the placement of the elastic structure 140 between the inner sealing structure 131 and the outer sealing structure 132 can position the points where the elastic force is applied to the first disc 110 and the second disc 120 closer to the middle of the annular width, thereby making the forces acting on the first disc 110 and the second disc 120 more uniform across the width of the annular ring. For example, the elastic structure 140 may be clamped between the inner sealing structure 131 and the outer sealing structure 132 , so that the elastic deformation of the elastic structure 140 is guided by the side walls of the inner sealing structure 131 and the outer sealing structure 132 facing each other.

[0156] As shown in conjunction with Figures 3 and 4 , in some examples, the cleaning disc structure further includes a connecting structure 150 connected between the first disc 110 and the second disc 120. The connecting structure 150 is located between the inner sealing structure 131 and the outer sealing structure 132. The provision of the connecting structure 150 prevents the first disc 110 from separating from the second disc 120 and allows the elastic structure 140 to be pre-loaded between the first disc 110 and the second disc 120. Furthermore, the connecting structure 150 is disposed between the inner sealing structure 131 and the outer sealing structure 132, thereby simultaneously providing an airtight seal at the connection points (e.g., bolt holes) between the connecting structure 150 and the first disc 110 and at the connection points (e.g., bolt holes) between the connecting structure 150 and the second disc 120 from both the inside and the outside. For example, the connecting structure 150 may include bolts and nuts.

[0157] Figure 5 is an exploded schematic diagram of a cleaning device provided by at least one embodiment of the present disclosure. Figure 6 is a cross-sectional schematic diagram of a cleaning device provided by at least one embodiment of the present disclosure. Figure 7 is a schematic diagram of a first rotation axis, a second rotation axis, and a reference surface in a cleaning device provided by at least one embodiment of the present disclosure. Figure 5 schematically illustrates a cleaning device using the cleaning disk structure shown in Figure 1, but the present disclosure is not limited thereto. The cleaning device may also use the cleaning disk structure shown in Figure 4, and the cleaning device may also use the cleaning disk structure of the aforementioned embodiments.

[0158] With reference to Figures 5 to 7, at least one embodiment of the present disclosure provides a cleaning device comprising a main body 200 and at least two cleaning disc structures. The at least two cleaning disc structures are connected to one side of the main body 200, and the at least two cleaning disc structures include a first cleaning disc structure 101 and a second cleaning disc structure 102. The first cleaning disc structure 101 is configured to rotate about a first rotation axis R1, and the second cleaning disc structure 102 is configured to rotate about a second rotation axis R2. The first cleaning disc structure 101 and the second cleaning disc structure 102 are respectively located on either side of a reference plane S0 perpendicular to a line connecting their centers, and the first rotation axis R1 and the second rotation axis R2 respectively have a non-zero angle α and angle β with the reference plane S0. For example, the angle α and the angle β may be equal.

[0159] Referring to Figures 5 to 7, the first cleaning disc structure 101 rotates around the inclined first rotation axis R1, and the second cleaning disc structure 102 rotates around the inclined second rotation axis R2, which can increase the friction between the two cleaning disc structures and the surface to be cleaned S, thereby improving walking efficiency and cleaning effect. At the same time, the elastic structure 140 and the sealing structure 130 in the two cleaning disc structures can ensure the adsorption stability between the two cleaning disc structures and the surface to be cleaned S in different usage scenarios, thereby preventing the cleaning device from slipping. For example, the angle between the first rotation axis R1 and the second rotation axis R2 can be greater than 0° and not greater than 90°. The elastic structure in the first cleaning disc structure 101 and the second cleaning disc structure 102 can meet the requirements of the elastic deformation amount, and the sealing effect of the adsorption chamber can be ensured through the sealing structure.

[0160] FIG8 is a schematic diagram of a partial structure of a cleaning device provided by at least one embodiment of the present disclosure.

[0161] 5 and 8 , for example, the main body 200 may include a housing 210, and the first cleaning disc structure 101 and the second cleaning disc structure 102 may be connected to the housing 210, respectively. For example, the main body 200 may include an adsorption module 220, so that when the cleaning device is in use, the adsorption module 220 provides negative pressure so that the first cleaning disc structure 101 and the second cleaning disc structure 102 respectively form an adsorption chamber Z with the surface to be cleaned S. The adsorption module 220 may include a fan. For example, the main body 200 may include a drive mechanism 230 that is respectively connected to the first cleaning disc structure 101 and the second cleaning disc structure 102, so that the drive mechanism 230 drives the first cleaning disc structure 101 to rotate around the first rotation axis R1 and drives the second cleaning disc structure 102 to rotate around the second rotation axis R2. For example, the drive mechanism 230 may include a motor. For example, the drive mechanism 230 further includes a transmission structure connected to the motor, and the transmission structure includes two drive shafts corresponding to the first cleaning disc structure 101 and the second cleaning disc structure 102, respectively, and the two drive shafts are configured to respectively drive the first cleaning disc structure 101 and the second cleaning disc structure 102 to rotate. For example, the main body 200 may include a bracket 240 connected to the housing 210 to support the drive mechanism 230 via the bracket 240.

[0162] FIG9 is a schematic diagram of a wiper in a cleaning device according to at least one embodiment of the present disclosure.

[0163] 9 and 6 , for example, the cleaning device may further include a wiper 300 , which may be provided in a plurality, for example, two wipers 300 . The two wipers 300 may be respectively disposed outside the first cleaning disc structure 101 and outside the second cleaning disc structure 102 , so that the surface S to be cleaned is wiped by the wipers 300 .

[0164] Smart cleaning devices, such as window cleaning machines, can improve cleaning efficiency and safety. During operation, the window cleaning machine can attach to a window and move relative to it, cleaning the window with a cloth at its base. For example, the cleaning disc of some window cleaning machines is roughly annular, with a large opening designed to increase friction. For example, the opening of the cleaning disc is a suction port for securing the cleaning disc to the window.

[0165] During research, the inventors of this application discovered that when a window cleaning machine is cleaning frameless or thin-framed windows, it is difficult to detect the window edge in a timely manner. When the window cleaning machine moves a certain distance beyond the window edge, the seal of the suction chamber formed between the window cleaning machine and the window fails. Furthermore, when the window cleaning machine is operating on certain inclined or curved surfaces, air leakage is prone to occur due to the unevenness of the wiping surface. Due to the large opening area of ​​the cleaning disc, it is difficult to maintain a stable suction force between the window cleaning machine and the window, which can cause the window cleaning machine to fail or shut down due to air leakage. To prevent the window cleaning machine from falling, the suction stability of the window cleaning machine needs to be improved.

[0166] At least one embodiment of the present disclosure provides a cleaning disc structure for forming an adsorption chamber between the cleaning disc structure and the surface to be cleaned, the cleaning disc structure comprising: a sealing portion, located at the periphery of the cleaning disc structure, comprising an inner side wall and a sealing end face connected to each other, the inner side wall forming at least part of the circumferential side wall of the adsorption chamber, the sealing end face being configured to seal the adsorption chamber along the circumference of the adsorption chamber; an adsorption portion, located in the middle of the cleaning disc structure, comprising an annular wall and an adsorption hole surrounded by the annular wall, the adsorption hole being configured to provide negative pressure to the adsorption chamber; an intermediate portion, comprising an air intake groove located between the sealing portion and the adsorption portion; the air intake groove comprising a bottom wall connected to the inner side wall of the sealing portion and the annular wall of the adsorption portion, respectively, and a groove opening opposite to the bottom wall, the two annular edges of the groove opening being respectively located at the inner edge of the sealing end face and the outer edge of the end of the annular wall away from the bottom wall; wherein the air intake groove is connected to the adsorption hole through a through hole, the through hole comprising an orifice connected to the air intake groove; the area of ​​the orifice is smaller than the area of ​​the groove opening.

[0167] At least one embodiment of the present disclosure provides a cleaning device, comprising the cleaning disc structure in the above embodiment.

[0168] At least one embodiment of the present disclosure provides a cleaning disc structure and cleaning device that applies negative pressure to the adsorption chamber via the adsorption holes in the adsorption portion, and achieves circumferential sealing of the adsorption chamber via the sealing portion. The air intake groove in the middle portion communicates with the adsorption holes via a through-hole, thereby providing negative pressure to the space within the air intake groove through the adsorption holes. Because the orifice area of ​​the through-hole is smaller than the area of ​​the groove opening, it facilitates limiting the flow of gas through the orifice. This prevents the cleaning disc structure from shutting down or shutting down due to air leaks if the sealing portion of the cleaning disc structure fails to provide a circumferential seal on the adsorption chamber.

[0169] At least one embodiment of the present disclosure provides a control method for a cleaning disk structure, comprising: controlling the formation of the adsorption chamber between the cleaning disk structure and the surface to be cleaned, and controlling the cleaning disk structure to move in a preset direction; generating a trigger signal in response to the pressure difference between the air pressure in the adsorption chamber and the reference air pressure being less than a preset pressure difference; controlling the cleaning disk structure to move in a direction opposite to the preset direction within a signal transmission time based on the trigger signal; wherein, at least within the signal transmission time, the orthographic projection of the adsorption portion on the reference plane where the groove opening is located is within the range of the orthographic projection of the surface to be cleaned on the reference plane; the signal transmission time is the time difference between the moment when the trigger signal is generated and the moment when the cleaning disk structure moves in a direction opposite to the preset direction.

[0170] At least one embodiment of the present disclosure provides a control method for a cleaning disk structure. When the cleaning disk structure leaks, the pressure differential between the air pressure within the adsorption chamber and a reference air pressure falls below a preset pressure differential, generating a trigger signal. During at least the signal transmission time, the orthographic projection of the adsorption portion of the cleaning disk structure on the reference plane is within the orthographic projection of the surface to be cleaned on the reference plane, meaning that the adsorption portion does not extend beyond the surface to be cleaned. This facilitates maintaining a minimum adsorption force through the adsorption portion to maintain stable adsorption of the cleaning disk structure to the surface to be cleaned.

[0171] Figure 10 is a schematic diagram of a cleaning disc structure provided by at least one embodiment of the present disclosure. Figure 11 is a schematic diagram of an adsorption cavity formed between a cleaning disc structure provided by at least one embodiment of the present disclosure and a surface to be cleaned.

[0172] 10 and 11 , an embodiment of the present disclosure provides a cleaning disc structure, which includes a sealing portion 110, an adsorption portion 120, and a middle portion 130. The cleaning disc structure is used to form an adsorption chamber C with the surface to be cleaned S0.

[0173] For example, the surface to be cleaned can be the surface of a window, a wall, the ground, etc. For example, the surface to be cleaned can include a plane, a curved surface. For example, the surface to be cleaned can include an inclined plane with an angle between it and the horizontal plane.

[0174] 10 and 11 , in some examples, the sealing portion 110 is located at the periphery of the cleaning disk structure and includes an inner sidewall 111 and a sealing end face 112 connected to each other, wherein the inner sidewall 111 forms at least a portion of the circumferential sidewall of the adsorption chamber C, and the sealing end face 112 is configured to seal the adsorption chamber C along the circumference of the adsorption chamber C.

[0175] FIG11 only schematically shows that the sealing end face of the cleaning disc structure is in direct contact with the surface to be cleaned to form an adsorption chamber, but the present disclosure is not limited to this. For example, a wiper may be provided on the outside of the cleaning disc structure, and the wiper is in direct contact with the surface to be cleaned. The sealing end face may apply pressure to the wiper so that the pressed portion of the wiper is sealed with the surface to be cleaned. For example, the inner side wall of the sealing portion may be the circumferential side wall of the adsorption chamber. For example, the inner side wall of the sealing portion may form the circumferential side wall of the adsorption chamber together with the surface of other structures (for example, it may be a partial surface of the wiper), and the present disclosure does not impose any restrictions on this.

[0176] 10 and 11 , the adsorption portion 120 is located in the middle of the cleaning disc structure. For example, the middle of the cleaning disc structure may be the region where the geometric center of the cleaning disc structure is located. The adsorption portion 120 may include an annular wall 121 and an adsorption hole 122 surrounded by the annular wall 121 . The adsorption hole 122 is configured to provide negative pressure to the adsorption chamber C. For example, when the cleaning disc structure is applied to a cleaning device, the cleaning device may include an adsorption component such as a blower or a vacuum pump. The adsorption component may be in communication with the adsorption hole 122 , thereby providing negative pressure to the adsorption chamber C through the adsorption hole 122 .

[0177] Referring to Figures 10 and 11 , the intermediate portion 130 includes an air inlet groove 131 located between the sealing portion 110 and the adsorption portion 120. The air inlet groove 131 may be part of the adsorption chamber C. The air inlet groove 131 includes a bottom wall 1311 connected to the inner sidewall 111 of the sealing portion 110 and the annular wall 121 of the adsorption portion 120, respectively, and a groove opening 1312 opposite the bottom wall 1311. The bottom wall 1311 and the groove opening 1312 may be opposite each other in the thickness direction of the cleaning disk structure. The two annular edges A0 of the groove opening 1312 are located at the inner edge A1 of the sealing end surface 112 and the outer edge A2 of the end E0 of the annular wall 121 away from the bottom wall 1311, respectively. For example, the inner edge A1 of the sealing end surface 112 may be the edge of the sealing end surface 112 closest to the geometric center of the cleaning disk structure. For example, the outer edge A2 of the end E0 of the annular wall 121 away from the bottom wall 1311 may be the edge of the end E0 away from the geometric center of the cleaning disk structure.

[0178] Referring to Figures 10 and 11 , the air inlet groove 131 communicates with the adsorption hole 122 via a through hole 132. The through hole 132 includes an orifice 1321 communicating with the air inlet groove 131. The area of ​​the orifice 1321 is smaller than the area of ​​the groove opening 1312. For example, the diameter of the through hole can remain consistent along the through-hole direction, for example, being equal to the diameter of the orifice. However, the present disclosure is not limited thereto; the diameter of the through hole can also be configured to vary along the through-hole direction as desired.

[0179] For example, when the cleaning disc structure is attached to a frameless or thin-framed window for cleaning, if the sealing portion extends beyond a certain range of the window edge, the groove opening may align with the window edge, causing the sealing portion to lose its circumferential seal against the adsorption chamber. For example, if the working surface of the cleaning disc structure has a slope, such as an inclined or curved surface, the sealing portion of the cleaning disc structure may rise relative to the working surface, causing the sealing portion to lose its circumferential seal against the adsorption chamber.

[0180] 10 and 11 , the cleaning disc structure provided by the embodiment of the present disclosure is advantageous in limiting the flow of gas through the orifice 1321 by setting the area of ​​the orifice 1321 of the through hole 132 to be smaller than the area of ​​the groove opening 1312. For example, while the adsorption hole 122 of the cleaning disc structure provides negative pressure, it indirectly provides negative pressure to the internal space of the air inlet groove 131 through the orifice 1321 with a smaller area. In this way, when the sealing part 110 of the cleaning disc structure fails to seal, the negative pressure in the adsorption hole 122 will not drop suddenly. By setting the orifice 1321 to limit the gas flow, the detection module in the cleaning device can realize staged gas leakage detection. Therefore, when the sealing part 110 of the cleaning disc structure fails to seal the circumferential seal of the adsorption chamber C, the cleaning disc structure can be prevented from shutting down or stopping due to gas leakage.

[0181] 10 and 11 , in some examples, a through hole 132 is provided at the connection J between the suction portion 120 and the bottom wall 1311 to facilitate processing and assembly of the components. For example, the through hole 132 may be a slit between the suction portion 120 and the bottom wall 1311 .

[0182] In some examples, the through hole can be opened in the bottom wall. For example, the through hole can also be opened in the annular wall. As long as the adsorption hole and the adsorption chamber can be connected, the present disclosure is not limited thereto.

[0183] FIG. 12 is a schematic diagram of a partial structure of a cleaning disk structure provided by at least one embodiment of the present disclosure.

[0184] 10 and 12 , in some examples, the bottom wall 1311 of the air inlet groove 131 includes a first surface S1 facing the groove opening 1312 and a second surface S2, wherein the second surface S2 is closer to the center of the cleaning disk structure than the first surface S1. For example, the first surface S1 is connected between the second surface S2 and the inner sidewall 111 of the sealing portion 110. The distance D1 between the first surface S1 and the groove opening 1312 is greater than the distance D2 between the second surface S2 and the groove opening 1312. For example, the distance D1 between the first surface S1 and the groove opening 1312 refers to the distance in the thickness direction of the cleaning disk structure, and the distance D2 between the second surface S2 and the groove opening 1312 refers to the distance in the thickness direction of the cleaning disk structure. For example, in the air inlet groove 131, the groove depth at the position corresponding to the first surface S1 is greater than the groove depth at the position corresponding to the second surface S2.

[0185] Referring to Figures 10 to 12 , when the seal between the sealing end surface 112 and the surface to be cleaned S0 fails, for example, when the cleaning disc structure moves to the edge of the surface to be cleaned S0, the distance between the first surface S1 and the groove opening 1312 is greater than the distance between the second surface S2 and the groove opening 1312, causing a sudden increase in the gas flow rate entering the adsorption chamber C. Based on this sudden increase in gas flow, the detection module in the cleaning device can detect that the cleaning disc structure is leaking, facilitating timely adjustments to the movement of the cleaning disc structure by the control module in the cleaning device. Consequently, a cleaning device using this cleaning disc structure has higher gas leakage detection sensitivity and a faster response, reducing the risk of the cleaning device shutting down or failing.

[0186] Referring to Figures 10 to 12 , in some examples, the bottom wall 1311 further includes a connecting surface S3 connecting the first surface S1 and the second surface S2, intersecting the plane in which the recess opening 1312 is located. For example, the connecting surface S3 may extend perpendicularly to the recess opening 1312, facilitating machining of the middle portion 130 and facilitating design of the dimensions of various structures in the middle portion 130 based on varying adsorption force requirements. However, the present disclosure is not limited thereto; the connecting surface may also intersect the plane in which the recess opening is located, but not perpendicularly.

[0187] With reference to Figures 10 to 12 , for example, the first surface S1 is a plane parallel to the groove opening 1312. For example, the second surface S2 is a plane parallel to the groove opening 1312. However, the present disclosure is not limited thereto. For example, the plane on which the first surface lies may intersect with the plane on which the groove opening lies, but not be perpendicular to each other; and the plane on which the second surface lies may intersect with the plane on which the groove opening lies, but not be perpendicular to each other. For example, both the first surface and the second surface may be non-planar.

[0188] Referring to Figures 10 to 12 , in some examples, the cleaning disc structure further includes a plurality of ribs 140 spaced circumferentially around the adsorption holes 122. The ribs 140 extend in a first direction X, which is a direction from the center of the cleaning disc structure toward its edge. One end of the rib 140 is connected to the adsorption portion 120, and the other end is connected to the sealing portion 110. The ribs 140 divide the air inlet groove 131 into a plurality of sub-grooves 1301. This helps limit the flow of leaking gas from the cleaning disc structure. For example, a sub-groove 1301 is formed between two adjacent ribs 140. The ribs 140 are provided with notches 141 at least at locations corresponding to the first surface S1, connecting two adjacent sub-grooves 1301. Providing notches 141 at locations corresponding to the first surface S1 facilitates timely detection of failure of the sealing end surface 112 of the cleaning disc structure. Each notch 141 connects two adjacent sub-grooves 1301, helping to control the negative pressure within the entire adsorption chamber C.

[0189] 13 is a schematic diagram of an orthographic projection of a notch, an orthographic projection of a first surface, and an orthographic projection of a second surface of a cleaning disk structure provided by at least one embodiment of the present disclosure.

[0190] With reference to Figures 10 and 13 , in some examples, on reference plane S1 where groove opening 1312 is located, a portion P01 of orthographic projection P0 of notch 141 overlaps with orthographic projection P1 of first surface S1, and another portion P02 of orthographic projection P0 of notch 141 overlaps with orthographic projection P2 of second surface S2. This helps increase the gas flow area between two adjacent sub-grooves 1301.

[0191] For example, the structure of the rib at the notch corresponding to the first surface can be flush with the first surface or can protrude from the first surface. For example, the structure of the rib at the notch (e.g., the structure corresponding to the first surface or the structure corresponding to the second surface) can be flush with the second surface or can protrude from the second surface, and this disclosure does not limit this.

[0192] Referring to FIG. 10 , in some examples, the sealing portion 110 includes a main body 1101 and a raised portion 1102 that protrudes from the main body 1101 along a second direction Z, where the second direction Z is perpendicular to the plane in which the groove opening 1312 is located. The surface of the main body 1101 and the surface of the raised portion 1102 together form a sealing end surface 112. For example, the surface of the main body 1101 can be a plane parallel to the groove opening 1312. For example, the raised portion 1102 that protrudes from the main body 1101 can apply pressure to a wiper mounted outside the cleaning disk structure, thereby increasing the friction between the wiper and the surface to be cleaned S0.

[0193] Referring to Figure 10 , in some examples, the number of raised portions 1102 is twice the number of ribs 140 and is evenly distributed along the circumference of the cleaning disc structure. The raised portions 1102 include a plurality of first ridges 01 connected to the ribs 140 and second ridges 02 located between two adjacent first ridges 01. Providing the first ridges 01 connected to the ribs 140 facilitates a simplified manufacturing process. Providing the second ridges 02 between two adjacent first ridges 01 facilitates increased friction between the wiper and the surface S0 to be cleaned.

[0194] 10 , for example, when the protrusion 1102 includes a first ridge 01 and a second ridge 02 , both the first ridge 01 and the second ridge 02 may extend along the first direction X. However, the present disclosure is not limited thereto, and the protrusion 1102 may also be other structures, such as a columnar protrusion.

[0195] Referring to Figure 10 , in some examples, the end E1 of the raised portion 1102, which is distal to the main portion 1101, and the end E2 of the portion 142 of the rib 140, which is distal to the bottom wall 1311, are substantially located in the same plane. For example, the raised portion 1102 and the portion 142 of the rib 140, which is distal to the notch 141, can respectively press the wiper against both sides in the first direction X to increase friction between the wiper and the surface S0 to be cleaned. For example, the end E1 of the raised portion 1102, which is distal to the main portion 1101, and the end E2 of the portion 142 of the rib 140, which is distal to the bottom wall 1311, can be completely located in the same plane, or there can be a certain standard deviation due to factors such as manufacturing tolerances.

[0196] 10 , in some examples, the end E0 of the annular wall 121 away from the bottom wall 1311 lies within a plane. For example, the annular wall 121 can cooperate with the protrusion 1102 and the portion of the rib 140 outside the notch 141 to compress the wiper, thereby increasing friction between the wiper and the surface to be cleaned S0.

[0197] Referring to Figure 10 , in some examples, the end E0 of the annular wall 121, distal to the bottom wall 1311, is located on the side of the plane closest to the bottom wall 1311. For example, if the protrusion 1102 and the portion of the rib 140 other than the notch 141 jointly compress the wiper, the end E0 of the annular wall 121, distal to the bottom wall 1311, may not exert pressure on the wiper. For example, a gap may exist between the end E0 of the annular wall 121, distal to the bottom wall 1311, and the wiper. In this case, the air inlet groove 131 and the adsorption hole 122 may communicate through the gap between the end E0 of the annular wall 121, distal to the bottom wall 1311, and the wiper.

[0198] Referring to FIG. 10 , in some examples, at least two of the sealing portion 110, the intermediate portion 130, and the suction portion 120 are integrally formed, which facilitates simplifying the assembly steps of the cleaning disc structure. For example, any two of the sealing portion, the intermediate portion, and the suction portion can be integrally formed. For example, the sealing portion, the intermediate portion, and the suction portion can be integrally formed.

[0199] In some examples, the sealing portion, the middle portion, and the adsorption portion are separate structures, which facilitates replacement and maintenance of each structure.

[0200] The present disclosure provides a cleaning device including the cleaning disc structure of any one of the above embodiments. Since the cleaning disc structure according to the present disclosure is used in the above cleaning device, it also has corresponding beneficial technical effects, which will not be described in detail here.

[0201] FIG14 is a flow chart of a method for controlling a cleaning disk structure provided in an example according to at least one embodiment of the present disclosure.

[0202] The embodiment of the present disclosure provides a control method for a cleaning disk structure. Referring to Figures 10 and 14 , the control method includes the following steps S110 to S130 .

[0203] Step S110: Controlling the formation of an adsorption chamber C between the cleaning disc structure and the surface to be cleaned S0, and controlling the cleaning disc structure to move in a predetermined direction. For example, negative pressure can be applied to the adsorption chamber C through the adsorption holes 122 of the cleaning disc structure. For example, if the cleaning disc structure is generally circular, the entire machine can be driven forward in the predetermined direction by rotating the cleaning disc structure. For example, if the cleaning disc structure is generally square, the entire machine can move forward in a straight line.

[0204] Step S120: In response to the pressure difference between the air pressure in the adsorption chamber C and the reference air pressure being less than a preset pressure difference, a trigger signal is generated. For example, when the pressure difference is less than the preset pressure difference, it can be determined that the cleaning disk structure is in a leaking state, thereby generating a trigger signal.

[0205] Step S130: Based on the trigger signal, the cleaning disk structure is controlled to move in a direction opposite to the preset direction within the signal transmission time. During at least the signal transmission time, the orthographic projection of the suction portion 120 on the reference plane S1 where the groove opening 1312 is located is within the range of the orthographic projection of the surface to be cleaned S0 on the reference plane S1. The signal transmission time is the time difference between the moment the trigger signal is generated and the moment the cleaning disk structure moves in the direction opposite to the preset direction.

[0206] Referring to Figures 10 and 14 , when the cleaning disc structure leaks, the pressure differential between the air pressure in adsorption chamber C and the reference air pressure falls below a preset pressure differential, generating a trigger signal. For at least the duration of the signal transmission, the orthographic projection of the adsorption portion 120 of the cleaning disc structure on reference plane S1 is kept within the orthographic projection of the surface to be cleaned S0 on reference plane S1. In other words, the adsorption portion 120 does not extend beyond the surface to be cleaned S0. This helps maintain the minimum adsorption force of the adsorption portion 120, which helps maintain stable adsorption of the cleaning disc structure to the surface to be cleaned S0.

[0207] For example, the parameters of the sealing portion, the middle portion, and the adsorption portion of the cleaning disc structure can be designed based on parameters such as the actual signal transmission time of the cleaning device, the travel speed of the cleaning disc structure, and the adsorption force of the adsorption portion (for example, the power generated by fans of different specifications varies). This disclosure is not limited to this.

[0208] FIG15 is a schematic diagram of the orthographic projection of the groove opening and the surface to be cleaned of the cleaning disk structure provided by at least one embodiment of the present disclosure on a reference plane.

[0209] Referring to Figures 10, 11 and 15, in some examples, when at least part of the outer contour of the groove opening 1312 is located outside the outer contour of the positive projection PS of the surface to be cleaned S0 on the reference plane S1, the pressure difference between the air pressure in the adsorption chamber C and the reference air pressure is reduced to less than the preset pressure difference value to generate a trigger signal.

[0210] 10 , 11 , and 15 , for example, if, on reference plane S1, at least a portion of the outer contour of the groove opening 1312 is outside the outer contour of the orthographic projection PS of the surface to be cleaned S0, the sealing end surface 112 fails to seal the adsorption chamber C. For example, the portion of the outer contour of the groove opening 1312 that is outside the outer contour of the orthographic projection PS of the surface to be cleaned S0 corresponds to the portion of the groove opening 1312 where air leakage occurs.

[0211] Referring to Figures 10, 11, and 15, using a circular cleaning disc as an example, when the cleaning disc rotates beyond the surface to be cleaned S0 to a certain extent, the groove opening 1312 communicates with the external space. For example, as the cleaning disc structure continues to rotate away from the surface to be cleaned S0, the area of ​​the cleaning disc structure experiencing air leakage increases, and the pressure difference between the air pressure within the adsorption chamber C and the reference pressure decreases. When the pressure difference is less than a preset pressure difference, the cleaning disc structure is determined to be leaking, and a trigger signal is generated. For example, the reference pressure can be the atmospheric pressure of the external space.

[0212] 10 and 14 , in some examples, step S130 includes generating a control signal based on the trigger signal, and controlling the cleaning disk structure to move in a direction opposite to a predetermined direction based on the control signal. For example, after the trigger signal is generated, a module such as a computing module in the cleaning device can convert the trigger signal into a control signal, and the control signal can be used to control the retraction of the cleaning disk structure.

[0213] Referring to Figures 10 and 14 , since signal transmission and conversion requires time, the intermediate portion 130, located between the sealing portion 110 and the suction portion 120, allows time for the cleaning disc structure to retract. During this process, the suction portion 120 maintains a minimum suction force between the suction portion 120 and the surface to be cleaned (S0), ensuring stable adhesion of the cleaning device to the surface (S0), preventing the risk of the cleaning device shutting down or failing.

[0214] In some examples, controlling the cleaning disc structure to move in a direction opposite to a preset direction includes controlling the cleaning disc structure to reverse around a rotation axis to move, or controlling the cleaning disc structure to move in a straight line opposite to the preset direction.

[0215] For example, when the cleaning disc structure is in the form of a disc, the cleaning disc structure can move by rotating. For example, when the cleaning disc structure rotates forward to move forward, the cleaning disc structure can be controlled to reverse and move back after detecting a leak.

[0216] For example, when the cleaning disc structure is in the form of a square disc, the cleaning disc structure moves forward in a straight line through running members such as crawlers. After air leakage is detected, the cleaning disc structure can be controlled to move in the reverse direction to achieve retreat.

[0217] The present disclosure provides a cleaning device including the cleaning disc structure described in any of the above examples. Since the cleaning device according to the present disclosure uses the above cleaning disc structure, it also has corresponding beneficial technical effects, which will not be described in detail here.

[0218] In some examples, the cleaning disc structure includes a first cleaning disc structure. The cleaning device includes a main body, a first cleaning module, and a second cleaning module. The first cleaning module includes a first cleaning disc structure, and the second cleaning module and the first cleaning module are respectively connected to the same side of the main body. The first cleaning module and the second cleaning module are respectively located on both sides of a reference plane perpendicular to the line connecting their centers, and the first cleaning disc structure rotates around a first rotation axis, and there is an angle between the first rotation axis and the reference plane. The cleaning device includes a first cleaning disc structure, which can enable the first cleaning disc structure in the cleaning device to maintain contact with the surface to be cleaned in different usage scenarios through the elastic force of the elastic structure in the first cleaning disc structure. Moreover, there is an angle between the first rotation axis of the first cleaning disc structure and the reference plane, that is, the first rotation axis is tilted, which can make the first cleaning disc structure have uneven friction when walking on the surface to be cleaned, thereby improving walking efficiency and cleaning effect.

[0219] The round window cleaning robot has strong cleaning power, but it will leave claw-like marks (water marks) on the glass after cleaning. The square window cleaning robot uses a flat pushing and wiping method to clean without leaving any marks, but its cleaning power is not as good as the rotary cleaning method.

[0220] The embodiments of the present disclosure provide a cleaning device and a motion control method thereof, so that the cleaning device has a better cleaning effect and is beneficial to the motion control of the cleaning device. The cleaning device provided by the embodiments of the present disclosure is provided with two cleaning units of different forms. The first cleaning unit wipes during rotation and has a good cleaning effect. The second cleaning unit wipes in a flat pushing manner, which can wipe off the water marks left after wiping by the first cleaning unit. The first cleaning unit and the second cleaning unit cooperate to avoid water marks left after wiping by the cleaning device, which is beneficial to improving the cleaning effect. The cleaning device provided by the embodiments of the present disclosure not only has a strong cleaning force, but also will not leave claw-like marks on the glass after cleaning, thereby effectively solving the glass cleaning problem. In the cleaning device provided by the embodiments of the present disclosure, the first walking component and the first cleaning unit are both connected to the output end of the same transmission mechanism, which simplifies the structure and reduces the weight of the cleaning device.

[0221] Figure 16 is a schematic diagram of a cleaning device provided by an embodiment of the present disclosure. Figure 17 is a partial enlarged view of Figure 16 .

[0222] As shown in Figures 16 and 17, an embodiment of the present disclosure further provides a cleaning device for cleaning a surface to be cleaned S0, comprising: a housing 100, a first driving unit 101, a first cleaning unit 201, a second driving unit 102, and a second cleaning unit 202. The first driving unit 101 comprises a transmission mechanism 501 and a first walking component 601, the transmission mechanism 501 comprises an output end 500, and the first walking component 601 is connected to the output end 500 of the transmission mechanism 501; the first cleaning unit 201 comprises a first cleaning disc structure 211 and a first cleaning element 221 provided on the first cleaning disc structure 211, and the first cleaning disc structure 211 is connected to the output end 500 of the transmission mechanism 501; the second driving unit 102 comprises a second walking component 602, and the second walking component 602 is spaced apart from the first walking component 601; the second cleaning unit 201 comprises a first cleaning disc structure 211 and a first cleaning element 221 provided on the first cleaning disc structure 211, and the first cleaning disc structure 211 is connected to the output end 500 of the transmission mechanism 501; the second driving unit 102 comprises a second walking component 602, and the second walking component 602 is spaced apart from the first walking component 601; Unit 202 is arranged side by side with the first cleaning unit 201, and includes a cleaning frame 212 and a second cleaning element 222 arranged on the cleaning frame 212; the second walking component 602 has a driving wheel Q, and the rotation axis AX of the driving wheel Q is parallel to the surface to be cleaned S0. The first walking component 601 includes a rotating disk 66 and a friction member 88. The friction member 88 is located on the side of the rotating disk 66 away from the output end 500 of the transmission mechanism 501. The surface S1 of the rotating disk 66 farthest from the output end 500 of the transmission mechanism 501 has a first angle A1 with the surface to be cleaned S0, and the first angle A1 is greater than 0.

[0223] The cleaning device provided by the embodiment of the present disclosure comprises a first walking component 601 including a rotating disk 66 and a friction member 88, a surface S1 of the rotating disk 66 which is farthest from the output end 500 of the transmission mechanism 501 and has a first angle A1 with the surface to be cleaned S0, and the first angle A1 is greater than 0, so that the surface S1 of the rotating disk 66 which is farthest from the output end 500 of the transmission mechanism 501 is tilted relative to the surface to be cleaned S0, which is conducive to the friction between the rotating disk 66 and the surface to be cleaned S0 as a driving force for travel, and is conducive to the climbing of the cleaning device, and the second walking component 602 has a driving wheel Q, and the rotation axis AX of the driving wheel Q is parallel to the surface to be cleaned S0, so that the first walking component 601 and the second walking component 602 can operate simultaneously to control the movement of the cleaning device, which is conducive to the motion control of the cleaning device and the smooth operation of the cleaning device.

[0224] For example, the rotary disk 66 is configured to rotate while the second traveling member 602 is configured to travel to drive the cleaning device.

[0225] For example, as shown in Figures 16 and 17, the friction member 88 is configured to contact the surface to be cleaned S0, and the friction member 88 is configured to generate friction with the surface to be cleaned S0. This friction force serves as the driving force for the cleaning device to move. The friction force can be the friction force along the tangential direction of the first traveling member 601. The friction member 88 is used to provide friction, providing the climbing force of the cleaning device.

[0226] The upward climbing force is driven by the friction coefficient between the friction member 88 and the surface to be cleaned S0, and the whole machine moves. For example, the walking route includes an N-shaped (up and down reciprocating wiping) and a Z-shaped (left and right reciprocating wiping).

[0227] For example, when the motor 701 rotates clockwise, the cleaning device moves upward, and when the motor 701 rotates counterclockwise, the cleaning device moves downward.

[0228] For example, as shown in Figures 16 and 17 , a surface S2 of the friction member 88 that is farthest from the output end 500 of the transmission mechanism 501 forms a second angle A2 with the surface to be cleaned S0, and the second angle A2 is greater than or equal to 0. Thus, the surface S2 of the friction member 88 that is farthest from the output end 500 of the transmission mechanism 501 is tilted relative to the surface to be cleaned S0.

[0229] 16 and 17 , the friction coefficient between the friction member 88 and the surface to be cleaned S0 is greater than the friction coefficient between the first cleaning element 221 and the surface to be cleaned S0 , thereby increasing the friction between the friction member 88 and the surface to be cleaned S0 and facilitating motion control of the cleaning device.

[0230] For example, the friction coefficient between the friction member 88 and the surface to be cleaned S0 is 0.5-0.7, and the friction coefficient between the first cleaning element 221 and the surface to be cleaned S0 is 0.2-0.3.

[0231] The above description is based on the surface S0 to be cleaned. In the cleaning device provided by the embodiment of the present disclosure, as shown in Figure 16, the surface P2 of the cleaning rack 212 away from the housing 100 is parallel to the surface S0 to be cleaned, and the walking surface P1 of the second walking component 602 is parallel to the surface S0 to be cleaned. Thus, the surface S0 to be cleaned can be replaced with the surface P2 of the cleaning rack 212 away from the housing 100 as a reference, or the walking surface P1 of the second walking component 602 can be replaced with the surface P2 of the cleaning rack 212 away from the housing 100 as a reference. The following description is based on the surface P2 of the cleaning rack 212 away from the housing 100 or the walking surface P1 of the second walking component 602 as a reference. In the cleaning device provided by the embodiment of the present disclosure, the surface P2 of the cleaning rack 212 away from the housing 100 is parallel to the walking surface P1 of the second walking component 602.

[0232] The following describes the situation using the walking surface P1 of the second walking component 602 as a reference. As shown in FIG16 , an embodiment of the present disclosure further provides a cleaning device, comprising: a housing 100, a first drive unit 101, a first cleaning unit 201, a second drive unit 102, and a second cleaning unit 202; the first drive unit 101 comprises a transmission mechanism 501 and a first walking component 601, the transmission mechanism 501 comprises an output end 500, and the first walking component 601 is connected to the output end 500 of the transmission mechanism 501; the first cleaning unit 201 comprises a first cleaning disc structure 211 and a first cleaning element 221 disposed on the first cleaning disc structure 211, and the first cleaning disc structure 211 is connected to the output end 500 of the transmission mechanism 501; the second drive unit 102 comprises a second walking component 602, The second walking component 602 is spaced apart from the first walking component 601; the second cleaning unit 202 is arranged side by side with the first cleaning unit 201, and includes a cleaning frame 212 and a second cleaning element 222 arranged on the cleaning frame 212; the second walking component 602 has a driving wheel Q, and the rotation axis AX of the driving wheel Q is parallel to the walking surface P1 of the second walking component 602. The first walking component 601 includes a rotating disk 66 and a friction member 88. The friction member 88 is located on the side of the rotating disk 66 away from the output end 500 of the transmission mechanism 501. The surface S1 of the rotating disk 66 farthest from the output end 500 of the transmission mechanism 501 has a first angle A1 with the walking surface P1 of the second walking component 602, and the first angle A1 is greater than 0.

[0233] As shown in Figure 16, since the walking surface P1 of the second walking component 602 is parallel to the surface to be cleaned S0, the first angle A1 between the surface S1 of the output end 500 of the rotating disk 66 farthest from the transmission mechanism 501 and the walking surface P1 of the second walking component 602 can be regarded as the first angle A1 between the surface S1 of the output end 500 of the rotating disk 66 farthest from the transmission mechanism 501 and the surface to be cleaned S0.

[0234] In the cleaning device provided by the embodiment of the present disclosure, the first walking component 601 includes a rotating disk 66 and a friction member 88. The surface S1 of the rotating disk 66, which is farthest from the output end 500 of the transmission mechanism 501, and the walking surface P1 of the second walking component 602 have a first angle A1. The first angle A1 is greater than 0. Therefore, the surface S1 of the rotating disk 66, which is farthest from the output end 500 of the transmission mechanism 501, is tilted relative to the walking surface P1 of the second walking component 602. That is, the surface S1 of the rotating disk 66, which is farthest from the output end 500 of the transmission mechanism 501, is tilted relative to the walking surface P1 of the second walking component 602. The first traveling member 601 and the second traveling member 602 are arranged at an angle relative to the surface to be cleaned S0. This arrangement facilitates the friction between the rotating disk 66 and the surface to be cleaned S0 to serve as a driving force for travel, thereby facilitating the climbing of the cleaning device. The second traveling member 602 includes a driving wheel Q, and the rotation axis AX of the driving wheel Q is parallel to the traveling surface P1 of the second traveling member 602. That is, the rotation axis AX of the driving wheel Q is parallel to the surface to be cleaned S0. Therefore, the first traveling member 601 and the second traveling member 602 can operate simultaneously to control the movement of the cleaning device, which is beneficial to the movement control of the cleaning device and facilitates the smooth operation of the cleaning device.

[0235] The second traveling unit 602 may include at least one drive wheel Q. The surface of the drive wheel Q proximate to the surface to be cleaned S0 may be considered the traveling surface P1 of the second traveling unit 602, and the traveling surface P1 is a plane. The second traveling unit 602 may also include at least two drive wheels Q and a track disposed outside the at least two drive wheels Q. In this case, the surface of the track proximate to the surface to be cleaned S0 may be considered the traveling surface P1 of the second traveling unit 602.

[0236] For example, a surface S2 of the friction member 88 that is farthest from the output end 500 of the transmission mechanism 501 forms a second angle A2 with the walking surface P1 of the second walking component 602 , and the second angle A2 is greater than or equal to 0.

[0237] As shown in Figure 16, since the walking surface P1 of the second walking component 602 is parallel to the surface to be cleaned S0, the second angle A2 between the surface S2 of the output end 500 of the friction member 88 farthest from the transmission mechanism 501 and the walking surface P1 of the second walking component 602 can be regarded as the second angle A2 between the surface S2 of the output end 500 of the friction member 88 farthest from the transmission mechanism 501 and the surface to be cleaned S0.

[0238] The following description uses the surface P2 of the cleaning rack 212 away from the housing 100 as a reference. As shown in FIG16 , an embodiment of the present disclosure further provides a cleaning device, comprising: a housing 100; a first driving unit 101, comprising a transmission mechanism 501 and a first traveling component 601, wherein the transmission mechanism 501 comprises an output end 500, and the first traveling component 601 is connected to the output end 500 of the transmission mechanism 501; a first cleaning unit 201, comprising a first cleaning disc structure 211 and a first cleaning element 221 disposed on the first cleaning disc structure 211, wherein the first cleaning disc structure 211 is connected to the output end 500 of the transmission mechanism 501; a second driving unit 102, comprising a second traveling component 602, wherein the second traveling component 602 is spaced apart from the first traveling component 601; and The second cleaning unit 202 is arranged side by side with the first cleaning unit 201, and includes a cleaning frame 212 and a second cleaning element 222 arranged on the cleaning frame 212, wherein the second walking component 602 has a driving wheel Q, and the rotation axis AX of the driving wheel Q is parallel to the surface P2 of the cleaning frame 212 away from the shell 100. The first walking component 601 includes a rotating disk 66 and a friction member 88, and the friction member 88 is located on the side of the rotating disk 66 away from the output end 500 of the transmission mechanism 501. The surface S1 of the rotating disk 66 farthest from the output end 500 of the transmission mechanism 501 has a first angle A1 with the surface P2 of the cleaning frame 212 away from the shell 100, and the first angle A1 is greater than 0.

[0239] Because the surface P2 of the cleaning rack 212 away from the shell 100 is parallel to the surface to be cleaned S0, the first angle A1 between the surface S1 of the rotating disk 66 farthest from the output end 500 of the transmission mechanism 501 and the surface P2 of the cleaning rack 212 farthest from the shell 100 can be regarded as the first angle A1 between the surface S1 of the rotating disk 66 farthest from the output end 500 of the transmission mechanism 501 and the surface to be cleaned S0.

[0240] In the cleaning device provided by the embodiment of the present disclosure, the first walking component 601 includes a rotating disk 66 and a friction member 88. The surface S1 of the rotating disk 66, which is farthest from the output end 500 of the transmission mechanism 501, and the surface P2 of the cleaning rack 212, which is far away from the shell 100, have a first angle A1. The first angle A1 is greater than 0. Therefore, the surface S1 of the rotating disk 66, which is farthest from the output end 500 of the transmission mechanism 501, is inclined relative to the surface P2 of the cleaning rack 212, which is far away from the shell 100. That is, the surface S1 of the rotating disk 66, which is farthest from the output end 500 of the transmission mechanism 501, is inclined relative to the surface P2 of the cleaning rack 212, which is far away from the shell 100. Surface S1 is tilted relative to the surface to be cleaned S0. This setting facilitates the friction between the rotating disk 66 and the surface to be cleaned S0 as a moving power, which facilitates the climbing of the cleaning device. The second walking component 602 has a driving wheel Q, and the rotation axis AX of the driving wheel Q is parallel to the surface P2 of the cleaning frame 212 away from the shell 100, that is, the rotation axis AX of the driving wheel Q is parallel to the surface to be cleaned S0. Therefore, the first walking component 601 and the second walking component 602 can operate simultaneously to control the movement of the cleaning device, which is beneficial to the motion control of the cleaning device and the smooth operation of the cleaning device.

[0241] For example, as shown in FIG. 16 , a surface S2 of the friction member 88 farthest from the output end 500 of the transmission mechanism 501 and a surface P2 of the cleaning frame 212 farthest from the housing 100 have a second angle A2 , and the second angle A2 is greater than or equal to 0.

[0242] As shown in Figure 16, since the surface P2 of the cleaning frame 212 away from the shell 100 is parallel to the surface to be cleaned S0, the second angle A2 between the surface S2 of the output end 500 of the friction member 88 farthest from the transmission mechanism 501 and the surface P2 of the cleaning frame 212 away from the shell 100 can be regarded as the second angle A2 between the surface S2 of the output end 500 of the friction member 88 farthest from the transmission mechanism 501 and the surface to be cleaned S0.

[0243] For example, as shown in Figure 16, the first cleaning unit 201 has a first opening K1 on the side away from the output end 500 of the transmission mechanism 501, and the first opening K1 is configured to avoid the first walking part 601. The side of the first cleaning disc structure 211 away from the output end 500 of the transmission mechanism 501 has a hollow structure, and the first cleaning element 221 has a hollow structure. The hollow structure of the first cleaning disc structure 211 and the hollow structure of the first cleaning element 221 constitute the first opening K1.

[0244] For example, as shown in Figure 16, the second cleaning unit 202 has a second opening K2, the second opening K2 is configured to avoid the second walking part 602, the cleaning frame 212 has a hollow structure, the second cleaning element 222 has a hollow structure, and the hollow structure of the cleaning frame 212 and the hollow structure of the second cleaning element 222 constitute the second opening K2.

[0245] As shown in FIG. 16 , the first cleaning unit 201 is used to clean the surface to be cleaned S0 . The first cleaning unit 201 is disposed at the bottom of the housing 100 and may form a chamber with the surface to be cleaned S0 .

[0246] As shown in FIG. 16 , the first moving component 601 is located at the bottom of the housing 100 . The first moving component 601 may be referred to as an inner ring, and the first cleaning unit 201 may be referred to as an outer ring.

[0247] As shown in FIG. 16 , the second cleaning unit 202 is used to clean the surface to be cleaned S0 . The second cleaning unit 202 is disposed at the bottom of the housing 100 and may form a chamber with the surface to be cleaned S0 .

[0248] Figure 16 also shows an adsorption unit 80. By providing this adsorption unit 80, negative pressure can be generated, allowing the cleaning device to adhere closely to the surface to be cleaned without falling. Accordingly, the cleaning device has a sealed structure and an air chamber to facilitate its adsorption onto the surface to be cleaned. For example, the adsorption unit 80 may include a blower. The adsorption unit 80 is connected to the chamber of the first cleaning unit 201 and to the chamber of the second cleaning unit 202. By extracting air from the chamber to create a negative pressure, the two cleaning units are adsorbed onto the surface to be cleaned S0.

[0249] For example, a sealing structure is provided on the periphery of the cleaning device, and during the vacuum adsorption process, the first cleaning unit 201 (outer ring) is deformed.

[0250] Because first angle A1 (inclination angle) is relatively small, first cleaning element 221 has a certain degree of elasticity, forming a closed space between first cleaning unit 201 (outer ring) and surface to be cleaned S0. Adsorption unit 80 operates, causing the cleaning device to adhere to surface to be cleaned S0, while first angle A1 (inclination angle) still exists.

[0251] FIG16 also shows a control unit 90, a motor 701, and a motor 702. The motor 701 is configured to drive the transmission mechanism 501, thereby driving the first cleaning unit 201 and the first traveling member 601. The motor 702 is configured to drive the second traveling member 602. The control unit 90 can be configured to control the motor 701 and the motor 702. The control unit 90 can also be configured to control the fan in the adsorption unit 80.

[0252] For example, as shown in FIG. 16 , the motor 701 is configured to drive the first cleaning unit 201 to rotate, and is also configured to drive the first traveling member 601 to rotate.

[0253] For example, in some embodiments of the present disclosure, the cleaning device can be a robot for cleaning non-horizontal surfaces, such as a window cleaning robot, and the surface to be cleaned can be a wall or a window. For example, the window can be a framed window or a frameless window. For example, a framed window can be a household window, and a frameless window can be a large French window, etc. For this type of cleaning device, a negative pressure mechanism can be included to ensure that it is adsorbed on the surface to be cleaned. In some embodiments, as shown in Figure 16, the negative pressure mechanism (adsorption unit 80) may cause the friction member 88 in the first walking component 601 to deform while applying adsorption force to the cleaning device, thereby causing the contact mode between the friction member 88 and the surface to be cleaned S0 to change from point contact to surface contact, or increasing the contact area between the friction member 88 and the surface to be cleaned S0. In this case, according to the structural form of the cleaning device, the inclined output shaft 99 causes the inner and outer sides of the rotating disk 66 to be subjected to different pressures, resulting in different friction forces. Therefore, under the drive of the motor 701, the first walking component 601 can drive the cleaning device to move by rotating.

[0254] Figure 18 is a schematic diagram of a first moving part in a cleaning device provided in an embodiment of the present disclosure. Figure 19 is a schematic diagram of a first moving part in a cleaning device provided in an embodiment of the present disclosure.

[0255] In the embodiment of the present disclosure, the friction member 88 may protrude from or be flush with the surface S1 of the rotating disk 66 farthest from the output end 500 of the transmission mechanism 501. Whether it is protruding or flush, friction can be generated between the friction member 88 and the surface to be cleaned.

[0256] For example, as shown in FIG. 17 , the friction member 88 is flush with a surface S1 of the rotary disk 66 that is farthest from the output end 500 of the transmission mechanism 501 .

[0257] For example, as shown in FIG. 18 and FIG. 19 , in order to increase friction or extend the service life of the friction member 88 , the friction member 88 protrudes from a surface S1 of the rotating disk 66 that is farthest from the output end 500 of the transmission mechanism 501 .

[0258] As shown in FIG. 18 and FIG. 19 , the dimension of the surface S1 of the friction member 88 protruding from the rotating disk 66 and farthest from the output end 500 of the transmission mechanism 501 is W0.

[0259] For example, as shown in Figures 18 and 19, in order to take into account the connection firmness between the friction member 88 and the rotating disk 66 and improve the friction force, the ratio of the size W0 of the surface S1 of the friction member 88 protruding from the output end 500 of the rotating disk 66 farthest from the transmission mechanism 501 to the maximum thickness Ws of the friction member 88 is less than or equal to one-fifth.

[0260] For example, to take cost into consideration, the dimension W0 of the friction member 88 protruding from the surface S1 of the rotating disk 66 farthest from the output end 500 of the transmission mechanism 501 is less than or equal to 6 mm, generally about 3 mm, for example, 0.5-3 mm.

[0261] For example, as shown in FIG19 , to increase the friction area and friction force, the ratio of the width W1 of the surface S2 of the friction member 88 furthest from the output end 500 of the transmission mechanism 501 to the annular width W2 of the friction member 88 is greater than or equal to one-fourth and less than 1. Furthermore, for example, the ratio of the width W1 of the surface S2 of the friction member 88 furthest from the output end 500 of the transmission mechanism 501 to the annular width W2 of the friction member 88 is greater than or equal to one-third and less than or equal to four-fifths. The surface S2 of the friction member 88 furthest from the output end 500 of the transmission mechanism 501 serves as the friction surface of the friction member 88.

[0262] As shown in Figures 16 to 18 , a surface S1 of the rotating disk 66 that is furthest from the output end 500 of the transmission mechanism 501 may be parallel to a surface S2 of the friction member 88 that is furthest from the output end 500 of the transmission mechanism 501. For further example, as shown in Figures 16 and 17 , the surface S1 of the rotating disk 66 that is furthest from the output end 500 of the transmission mechanism 501 may be flush with the surface S2 of the friction member 88 that is furthest from the output end 500 of the transmission mechanism 501, but the present invention is not limited thereto.

[0263] As shown in FIG. 16 to FIG. 18 , the first moving member 601 (inner ring) forms a first angle A1 with the surface to be cleaned S0 .

[0264] As shown in Figure 16, the first cleaning unit 201 rotates with an axis perpendicular to the surface to be cleaned S0 as the rotation axis. The axis perpendicular to the surface to be cleaned S0 may be a normal line of the surface to be cleaned S0.

[0265] As shown in FIG. 16 , the second cleaning unit 202 may operate in a straight line parallel to the surface to be cleaned S0 .

[0266] For example, as shown in Figures 16 to 19, the first angle A1 is greater than or equal to the second angle A2.

[0267] For example, as shown in Figures 16 to 18, the first angle A1 is less than or equal to 10°, and the second angle A2 is less than or equal to 10°. The first angle A1 and the second angle A2 are within the above ranges, which can facilitate motion control and improve motion stability of the cleaning device.

[0268] For example, the first angle A1 is less than or equal to 5°, and the second angle A2 is less than or equal to 5°. As shown in Figures 16 to 18, the first angle A1 can be 0.5-5°.

[0269] For example, the first angle A1 may be 0.4°, 0.5°, 3°, 5°, 7°, or 10°.

[0270] As shown in Figure 19, the second angle A2 can be 0. In this case, the surface S2 of the friction member 88 farthest from the output end 500 of the transmission mechanism 501 is parallel to the surface to be cleaned S0, so as to increase the contact area and friction force.

[0271] Figure 20 is a schematic diagram of a first moving member in a cleaning device according to an embodiment of the present disclosure. Figure 21 is a schematic diagram of a first moving member and a first cleaning unit in a cleaning device according to an embodiment of the present disclosure. Figures 20 and 21 are bottom views. Figures 20 and 21 show the center of the circle O.

[0272] If the width of the friction member 88 is too narrow, the adhesion between the friction member 88 and the rotating disk 66 will be relatively weak. The larger the contact area between the friction member 88 and the surface to be cleaned S0, the greater the friction. The size design can be performed to improve the adhesion between the friction member 88 and the rotating disk 66 and the friction between the friction member 88 and the surface to be cleaned S0.

[0273] For example, as shown in Figures 16 to 21 , to improve adhesion between the friction member 88 and the rotating disk 66 while balancing cost and friction, the friction member 88 is located at the edge of the rotating disk 66. The friction member 88 is annular, and the rotating disk 66 is circular. The ratio of the annular ring width W2 to the circular radius W11 is in the range of 0.25-0.5. Furthermore, to reduce cost, the ratio of the annular ring width W2 to the circular radius W11 is in the range of 0.25-0.4.

[0274] For example, as shown in FIG. 21 , in order to balance improving friction and improving cleaning efficiency, the ratio of the maximum diameter W11 of the rotating disk 66 to the maximum diameter W12 of the first cleaning unit 201 is in the range of 0.25-0.5.

[0275] In some embodiments, the annular ring width W2 (the width of the friction member 88 ) is about 10 mm.

[0276] In some embodiments, the maximum diameter of the first cleaning disc structure 211 is 144-160 mm.

[0277] In some embodiments, the maximum diameter of the rotating disk 66 is 40-110 mm.

[0278] In one embodiment, the annular ring width W2 (width of the friction member 88 ) is about 10 mm, the maximum diameter of the first cleaning disc structure 211 is about 144 mm, and the maximum diameter of the rotating disc 66 is about 70 mm.

[0279] 16 to 19 , the rotating disk 66 has a groove or notch 660 on one side away from the output end 500 of the transmission mechanism 501, and at least a portion of the friction member 88 is located in the groove or notch 660. The cleaning device provided in the embodiment of the present disclosure takes the rotating disk 66 having a notch as an example.

[0280] For example, as shown in Figure 21, the first cleaning disc structure 211 is connected to the rotating disc 66. For example, the first cleaning disc structure 211 and the rotating disc 66 can be connected by a snap fastener. In other words, the inner ring and the outer ring can be connected together by a snap fastener. Of course, the connection method between the inner ring and the outer ring is not limited to a snap fastener connection.

[0281] For example, as shown in Figures 16 to 21, the rotating disk 66 and the friction member 88 are fixedly connected. For example, the rotating disk 66 and the friction member 88 can be molded into a single piece by in-mold injection molding, or can be bonded by a bonding member.

[0282] For example, the rotating disk 66 may be a plastic member, such as acrylonitrile butadiene styrene (ABS) plastic or polycarbonate (PC), but is not limited thereto.

[0283] For example, the friction member 88 may be a soft rubber member, such as rubber, polyurethane (PU), or silicone, but is not limited thereto.

[0284] Figure 22 is a side view of a universal joint in a cleaning device according to an embodiment of the present disclosure. Figure 23 is a front view of a universal joint in a cleaning device according to an embodiment of the present disclosure. Figure 24 is a top view of a connector in a universal joint in a cleaning device according to an embodiment of the present disclosure.

[0285] For example, as shown in Figures 16, 17, and 22 to 24, the first cleaning disk structure 211 is connected to the output end 500 of the transmission mechanism 501 via a universal coupling 300. The input end 31 of the universal coupling 300 is connected to the output end 500 of the transmission mechanism 501. The input end 31 of the universal coupling 300 and the output end 32 of the universal coupling 300 are connected via a connector 301. The connector 301 has a hollow passage H. The output end 500 of the transmission mechanism 501 has an output shaft 99, which is connected to the first traveling member 601. The output shaft 99 passes through the hollow passage H. Thus, by providing the universal coupling 300, when the surface S1 of the rotating disk 66 farthest from the output end 500 of the transmission mechanism 501 is tilted, the output end 500 of the transmission mechanism 501 is connected to the first traveling member 601 and the first cleaning disk structure 211, respectively. By setting the universal joint 300, the first walking component 601 connected to the output end 500 of the transmission mechanism 501 and the first cleaning unit 201 can have different angles, so that the first walking component 601 connected to the output end 500 of the transmission mechanism 501 and the first cleaning unit 201 have rotation axes that are not parallel to each other, and the rotation axes of the first walking component 601 connected to the output end 500 of the transmission mechanism 501 and the first cleaning unit 201 have an angle greater than 0.

[0286] 24 shows that the connector 301 has a first connection end 3011, a second connection end 3012, a third connection end 3013, and a fourth connection end 3014 sequentially arranged along its circumference. The first connection end 3011 and the third connection end 3013 are arranged opposite each other, and the second connection end 3012 and the fourth connection end 3014 are arranged opposite each other.

[0287] For example, the output end 32 of the universal joint 300 is connected to the first connection end 3011 and the third connection end 3013 , and the input end 31 of the universal joint 300 is connected to the second connection end 3012 and the fourth connection end 3014 .

[0288] FIG24 shows that the connector 301 includes an annular structure 332 and a cross frame 333 connected to and located within the annular structure 332, with a hollow channel H extending through the intersection of the cross frame 333. The cross frame 333 is provided to enhance the stability of the connector 301 and to extend its service life.

[0289] For example, the input end 31 of the universal joint 300 is a driving shaft, and the output end 32 of the universal joint 300 is a driven shaft.

[0290] 16 , the output end 32 of the universal coupling 300 is connected to the first cleaning disc structure 211. That is, the universal coupling 300 is connected to the outer ring to control the first cleaning elements 221 on the first cleaning disc structure 211 to clean the surface S0 to be cleaned.

[0291] For example, as shown in Figures 16 and 17, the output shaft 99 is tilted relative to the normal to the surface to be cleaned S0. That is, the output shaft 99 and the normal to the surface to be cleaned S0 have an angle that is the same as the first angle A1.

[0292] The output shaft 99 is tilted, and the first cleaning unit 201 can be substantially parallel to the surface to be cleaned S0 due to the provision of the universal joint 300. That is, by providing the universal joint 300, the output shaft 99 can be tilted.

[0293] As shown in Figure 16 , the output shaft 99 extends parallel to the direction of extension of the rotation axis of the first traveling member 601. The rotation axis of the first traveling member 601 forms an angle with the normal to the surface to be cleaned S0, which is the same as the first angle A1. The output shaft 99 rotates at the same speed as the first traveling member 601.

[0294] FIG25 is a motion control method for a cleaning device further provided by an embodiment of the present disclosure. As shown in FIG25 , an embodiment of the present disclosure further provides a motion control method for any of the above-mentioned cleaning devices, comprising: S1: controlling the first walking component 601 to move along the surface to be cleaned S0 at a speed V1, the first cleaning unit 201 rotates and moves following the first walking component 601, and controlling the second walking component 602 to also move at a speed V1, thereby realizing a linear motion mode of the cleaning device; S2: controlling the first walking component 601 to move along the surface to be cleaned S0 at a speed V2, the first cleaning unit 201 rotates and moves following the first walking component 601, and controlling the second walking component 602 to move at a speed V3, wherein the speed V2 is not equal to the speed V3, thereby realizing a curved motion mode of the cleaning device; and S3: switching between the linear motion mode and the curved motion mode.

[0295] Compared with the conventional technology in which the rotating disk is adsorbed and immobilized and only performs cleaning without providing moving power, in the motion control method of the cleaning device in the embodiment of the present disclosure, the first walking component 601 and the second walking component 602 jointly provide the moving power of the cleaning device, which is beneficial to the motion control of the cleaning device.

[0296] The order of steps S1 and S2 is not limited. That is, when the cleaning device is running, step S1 may be performed first and then step S2, i.e., the linear motion mode is switched to the curved motion mode. Alternatively, step S2 may be performed first and then step S1, i.e., the curved motion mode is switched to the linear motion mode.

[0297] For example, in the motion control method of the cleaning device provided in the embodiment of the present disclosure, the same position of the surface S0 to be cleaned is first cleaned by the first cleaning unit and then cleaned by the second cleaning unit to avoid leaving water marks and improve the cleaning effect.

[0298] In the embodiment of the present disclosure, the speed of the first traveling component 601 may be the linear speed of the friction member 88 .

[0299] In the embodiment of the present disclosure, the speed of the second walking component 602 may be the linear speed of the crawler or the driving wheel Q.

[0300] In the embodiment of the present disclosure, the surface to be cleaned S0 includes a glass surface, but is not limited thereto.

[0301] In the embodiment of the present disclosure, the first cleaning element 221 may be a rag, and the first cleaning disc structure 211 may be a frame structure, such as a first rag frame. For example, the first cleaning element 221 may be mounted on the first cleaning disc structure 211, but is not limited thereto. Other methods such as bonding may also be used.

[0302] In the embodiment of the present disclosure, the first cleaning element 221 is only provided on the first cleaning disc structure 211, that is, the first cleaning element 221 is provided only on the outer ring, and the first walking component 601 (inner ring) is not provided with the first cleaning element 221, so that the friction member 88 contacts the surface to be cleaned S0.

[0303] In the embodiment of the present disclosure, the second cleaning element 222 can be a rag, and the cleaning frame 212 can be referred to as a second rag frame. For example, the second cleaning element 222 can be sleeved on the cleaning frame 212, but is not limited thereto, and other methods such as bonding can also be used.

[0304] In an embodiment of the present disclosure, the transmission mechanism 501 may be a gear box.

[0305] In an embodiment of the present disclosure, the second driving unit 102 may also include a transmission structure, and the motor 702 may be connected to the second traveling component 602 via the transmission mechanism, which may be a gear box.

[0306] It should be noted that the first cleaning tray structure 211 involved in Figures 16 to 25 can also be called a first cleaning rack, and the cleaning rack 212 involved in Figures 16 to 25 can also be called a second cleaning rack.

[0307] With the widespread adoption of intelligent household appliances, cleaning devices can replace or assist manual labor in various cleaning tasks, improving cleaning efficiency. Window cleaning machines, for example, can significantly improve the efficiency and safety of window cleaning, playing a particularly important role in cleaning the exterior windows of high-rise buildings. Unlike square-shaped window cleaning machines, circular window cleaning machines use a rotating friction mechanism to achieve both movement and wiping. This creates a polishing effect, resulting in superior window cleaning performance.

[0308] During research, the inventors of this application discovered that because circular window cleaning machines require rotation and twisting to move and clean, they are prone to slipping and falling during the cleaning process when the suction force is unstable. Furthermore, improving the cleaning efficiency of circular window cleaning machines is difficult. When the circular window cleaning machine travels too fast, it becomes difficult to clean the windows thoroughly. Reducing the speed of the circular window cleaning machine also makes it difficult to shorten the cleaning time. Therefore, it is difficult for cleaning devices to achieve a balanced cleaning efficiency and suction stability.

[0309] In some examples, the cleaning device includes: a main body; a first cleaning module and a second cleaning module respectively connected to the same side of the main body; when the first cleaning module is used for walking, the first cleaning module is configured to generate friction with the surface to be cleaned so that the first cleaning module rotates around the second cleaning module; when the second cleaning module is used for walking, the second cleaning module is configured to generate friction with the surface to be cleaned so that the second cleaning module rotates around the first cleaning module.

[0310] The cleaning device provided by at least one embodiment of the present disclosure generates kinetic friction through the self-rotation of the first cleaning module on the surface to be cleaned when the first cleaning module is moving, so that the first cleaning module can rotate with the second cleaning module as the center of the circle, thereby enabling the first cleaning module to move. When the second cleaning module is switched to move, kinetic friction can be generated by the self-rotation of the second cleaning module on the surface to be cleaned, so that the second cleaning module can rotate with the first cleaning module as the center of the circle, thereby enabling the second cleaning module to move. Thus, the first cleaning module and the second cleaning module respectively move forward by the friction generated by their own rotation to achieve alternating movement, which can improve the adsorption stability of the cleaning device while improving the cleaning efficiency of the cleaning device on the surface to be cleaned.

[0311] FIG26 is a schematic diagram of the movement of a cleaning device provided in an example of at least one embodiment of the present disclosure.

[0312] 26 , in some examples, a cleaning device includes: a main body, a first cleaning module 100 and a second cleaning module 200, each connected to the same side of the main body. When the first cleaning module 100 is used for walking, the first cleaning module 100 is configured to generate friction with the surface to be cleaned S0, so that the first cleaning module 100 rotates around the second cleaning module 200; when the second cleaning module 200 is used for walking, the second cleaning module 200 is configured to generate friction with the surface to be cleaned S0, so that the second cleaning module 200 rotates around the first cleaning module 100.

[0313] For example, the surface to be cleaned can be a plane, a curved surface, or an irregular surface. For example, the surface to be cleaned can be a glass surface, a wall surface, a floor surface, or other surface that needs to be cleaned. The present disclosure is described using the plane surface to be cleaned as an example.

[0314] Referring to Figure 26, when the first cleaning module 100 is moving, the rotation of the first cleaning module 100 on the surface to be cleaned S0 generates kinetic friction, allowing the first cleaning module 100 to rotate around the second cleaning module 200, thereby causing the first cleaning module 100 to move around the second cleaning module 200. When the second cleaning module 200 is switched to moving, the rotation of the second cleaning module 200 on the surface to be cleaned S0 generates kinetic friction, allowing the second cleaning module 200 to rotate around the first cleaning module 100, thereby causing the second cleaning module 200 to move around the first cleaning module 100. By allowing the first cleaning module 100 and the second cleaning module 200 to move alternately, each advancing due to the friction generated by their own rotation, the cleaning module not moving can be firmly attached to the surface to be cleaned. Therefore, the cleaning efficiency of the cleaning device on the surface to be cleaned S0 can be improved while improving the adsorption stability of the cleaning device.

[0315] Figure 27 is a schematic cross-sectional view of a cleaning device according to an example of at least one embodiment of the present disclosure. Figure 28 is an exploded view of a cleaning device according to an example of at least one embodiment of the present disclosure.

[0316] With reference to Figures 26 to 28, in some examples, the first cleaning module 100 also includes a first walking member 110, and the first walking member 110 and the first cleaning disc structure 120 rotate synchronously. For example, the first cleaning module 100 and the second cleaning module 200 are respectively connected to the main body 10. For example, the main body 10 may include a shell 11, and the first cleaning module 100 and the second cleaning module 200 may be respectively connected to the shell 11. For example, the rotation axis of the first walking member 110 and the rotation axis of the first cleaning disc structure 120 are parallel or coincident. The first cleaning disc structure 120 is configured to form a first adsorption chamber with the surface to be cleaned S0, and the first walking member 110 is located in the first adsorption chamber. For example, the first cleaning disc structure 120 is sleeved outside the first walking member 110. For example, the first cleaning module 100 can be adsorbed on the surface to be cleaned S0 through the first adsorption chamber.

[0317] In this embodiment, the component that provides adsorption force or is used to form the adsorption chamber (cleaning disc structure) and the component that is mainly used to generate walking power (walking part) are different components, so that the adsorption force and the friction force used for walking can be better generated or controlled; in addition, the two rotate synchronously, so they can be driven by the same driving component, or be arranged on the same driving shaft, which simplifies the structure and saves costs on the basis of well realizing the above-mentioned adsorption and walking functions.

[0318] With reference to Figures 26 to 28, in some examples, the cleaning disc structure further includes a second cleaning disc structure 220, and the second cleaning module 200 includes the second cleaning disc structure 220. The second cleaning module 200 also includes a second walking member 210, and the second walking member 210 and the second cleaning disc structure 220 rotate synchronously. For example, the axis of rotation of the second walking member 210 is parallel to or coincides with the axis of rotation of the second cleaning disc structure 220. The second cleaning disc structure 220 is configured to form a second adsorption chamber with the surface to be cleaned S0, and the second walking member 210 is located in the second adsorption chamber. For example, the second cleaning disc structure 220 is sleeved outside the second walking member 210. For example, the second cleaning module 200 can be adsorbed on the surface to be cleaned S0 through the second adsorption chamber.

[0319] With reference to Figure 26 to Figure 28, in some examples, the first walking member 110 and the first cleaning disc structure 120 are all fixedly connected with the first drive shaft, and the second walking member 210 and the second cleaning disc structure 220 are all fixedly connected with the second drive shaft.By making the first walking member 110 and the first cleaning disc structure 120 be fixedly connected with same axle (first drive shaft), the first walking member 110 and the second cleaning disc structure 220 can be made to rotate synchronously with the same speed.By making the second walking member 210 and the second cleaning disc structure 220 be fixedly connected with same axle (second drive shaft), the second walking member 210 and the second cleaning disc structure 220 can be made to rotate synchronously with the same speed.For example, the first drive shaft can be connected with the drive shaft transmission of the first driving member hereinafter, and the second drive shaft can be connected with the drive shaft transmission of the second driving member hereinafter.

[0320] 26 to 28 , in some examples, the first cleaning module 100 is configured to rotate about a first rotation axis R1 of the first drive shaft, and the second cleaning module 200 is configured to rotate about a second rotation axis R2 of the second drive shaft. For example, the first walking member 110 and the first cleaning disc structure 120 both rotate synchronously about the first rotation axis R1, and the second walking member 210 and the second cleaning disc structure 220 both rotate synchronously about the second rotation axis R2.

[0321] Referring to Figures 27 and 28 , for example, the first cleaning disc structure 120 includes a first disc 121, a first sealing member 122, and a second disc 123. The first disc 121 is connected to the main body 10, and the second disc 123 is configured to elastically move relative to the first disc 121, thereby elastically deforming the first cleaning disc structure 120 to form a first adsorption chamber with the surface to be cleaned S0. The first sealing member 122 is sealed between the first disc 121 and the second disc 123, thereby enhancing the sealing effect of the first adsorption chamber.

[0322] Referring to Figures 27 and 28, for example, the second cleaning disc structure 220 includes a third disc 221, a second sealing member 222, and a fourth disc 223. The third disc 221 is connected to the main body 10, and the fourth disc 223 is configured to elastically move relative to the third disc 221, so that the second cleaning disc structure 220 elastically deforms to form a second adsorption chamber with the surface to be cleaned S0. The second sealing member 222 is sealed between the third disc 221 and the fourth disc 223, thereby enhancing the sealing effect of the second adsorption chamber. For example, the third disc can be identical to the first disc, and the fourth disc can be identical to the second disc.

[0323] 26 and 28 , the first walking member 110 in the first adsorption chamber and the second walking member 210 in the second adsorption chamber can move alternately, thereby ensuring stable adsorption through the first adsorption chamber and the second adsorption chamber while cleaning the surface S0 to be cleaned and moving forward along a predetermined route.

[0324] FIG29 is a schematic diagram of a partial structure of a cleaning device provided in an example of at least one embodiment of the present disclosure.

[0325] 27 , 28 , and 29 , for example, the main body 10 includes a shell 11 and an adsorption module 12 disposed within the shell 11. The adsorption module 12 is configured to provide negative pressure to the first adsorption chamber and the second adsorption chamber so that the first cleaning module 100 and the second cleaning module 200 are adsorbed on the surface to be cleaned S0. For example, the adsorption module 12 may include a fan. For example, the adsorption module 12, the first adsorption chamber, and the second adsorption chamber are interconnected, so that negative pressure is simultaneously provided to the first adsorption chamber and the second adsorption chamber through the adsorption module 12, so that the first cleaning module 100 and the second cleaning module 200 can both be reliably adsorbed on the surface to be cleaned S0. For example, the main body 10 also includes a mounting member 13 disposed within the shell 11, and the adsorption module 12 can be mounted on the mounting member 13.

[0326] FIG30 is a schematic diagram of a first rotation axis, a second rotation axis, and a reference surface in a cleaning device provided in an example of at least one embodiment of the present disclosure.

[0327] With reference to Figures 26, 27, and 30, the first cleaning module 100 and the second cleaning module 200 are respectively located on either side of a reference plane S1 perpendicular to a center line L between the first and second cleaning modules, and the first rotation axis R1 and the second rotation axis R2 have a non-zero angle with the reference plane S1. For example, the center line L of the first cleaning module 100 and the second cleaning module 200 can be the center line of the first walking member 110 and the second walking member 210. For example, the center line L of the first cleaning module 100 and the second cleaning module 200 can be the center line of the first cleaning disc structure 120 and the second cleaning disc structure 220. For example, the outer contour of the first cleaning module 100 can be circular, the outer contour of the second cleaning module 200 can be circular, and the center line L of the first cleaning module 100 and the second cleaning module 200 can be the center line of the two circles. For example, the first rotation axis R1 passes through the center of the first cleaning module 100, and the second rotation axis R2 passes through the center of the second cleaning module 200.

[0328] With reference to Figures 27 to 30, for example, the reference plane S1 is located between the first cleaning module 100 and the second cleaning module 200. For example, the first rotation axis R1 and the second rotation axis R2 both intersect with the reference plane S1. Thus, the first cleaning module 100 and the second cleaning module 200 are both tilted. That is, the first cleaning disc structure 120 and the second cleaning disc structure 220 are both tilted, and the first walking member 110 and the second walking member 210 are both tilted. Thus, after the cleaning device is placed on the surface to be cleaned S0, the kinetic friction force generated by the tilted first walking member 110 during its rotation is not zero, thereby enabling the first cleaning module 100 to rotate around the second cleaning module 200 through the rotation of the first walking member 110. Correspondingly, the kinetic friction force generated by the tilted second walking member 210 during its rotation is not zero, thereby enabling the second cleaning module 200 to rotate around the first cleaning module 100 through the rotation of the second walking member 210.

[0329] With reference to Figures 27 and 30, in some examples, the intersection of the first rotation axis R1 and the reference surface S1 is located at a side of the first cleaning module 100 away from the main body 10, and the intersection of the second rotation axis R2 and the reference surface S1 is located at a side of the second cleaning module 200 away from the main body 10. For example, the first rotation axis R1 and the second rotation axis R2 are roughly in the shape of "\ / ", that is, the outer edge of the first cleaning module 100 is lower than its inner edge, and the outer edge of the second cleaning module 200 is lower than its inner edge. When the cleaning device is placed on the surface to be cleaned S0, the side of the first walking member 110 away from the second walking member 210 is used to generate friction with the surface to be cleaned S0. In this embodiment, the friction generated on the outside of the walking member along the center line direction of the cleaning module is greater, which can improve walking efficiency.

[0330] In other examples, the intersection of the first rotation axis and the reference surface is located on the side of the first cleaning module close to the main body, and the intersection of the second rotation axis and the reference surface is located on the side of the second cleaning module close to the main body. For example, in the direction of the center line connecting the first walking member and the second walking member: the first part is located on the side of the first walking member close to the second walking member, and the third part is located on the side of the second walking member close to the first walking member. For example, the first rotation axis and the second rotation axis are roughly in the shape of " / \", that is, the friction force is generated between the inner edge of the first cleaning module and the surface to be cleaned, causing the first cleaning module to move, and the friction force is generated between the inner edge of the second cleaning module and the surface to be cleaned, causing the second cleaning module to move.

[0331] Referring to Figures 27, 28 and 30, in some examples, the reference surface S1 passes through the midpoint of the center line L, and the first rotation axis R1 and the second rotation axis R2 intersect the reference surface S1 at the same point. That is, the first cleaning module 100 and the second cleaning module 200 are symmetrically arranged on both sides of the reference surface S1, and the inclination degrees of the first cleaning module 100 and the second cleaning module 200 relative to the reference surface S1 tend to be consistent. In some examples, the angle α between the first rotation axis R1 and the reference surface S1 and the angle β between the second rotation axis R2 and the reference surface S1 are equal. Thus, the first cleaning module 100 and the second cleaning module 200 are symmetrically arranged. That is, the first walking member 110 and the second walking member 210 are symmetrically arranged, and the first cleaning disc structure 120 and the second cleaning disc structure 220 are symmetrically arranged.

[0332] Referring to Figures 27, 28, and 30, after the cleaning device is placed on the surface to be cleaned S0, the first cleaning disc structure 120 undergoes elastic deformation to form a first adsorption chamber between the first cleaning disc structure 120 and the surface to be cleaned S0, and the second cleaning disc structure 220 undergoes deformation to form a second adsorption chamber between the first cleaning disc structure 120 and the surface to be cleaned S0. The symmetrical arrangement of the first cleaning module 100 and the second cleaning module 200 makes the elastic deformation amount of the first cleaning disc structure 120 and the elastic deformation amount of the second cleaning disc structure 220 tend to be consistent. Moreover, the dynamic friction force generated between the first walking member 110 and the surface to be cleaned S0 and the dynamic friction force generated between the second walking member 210 and the surface to be cleaned S0 also tend to be consistent, thereby making the cleaning device move more smoothly.

[0333] FIG31 is a schematic diagram of a first walking member and a second walking member provided in an example of at least one embodiment of the present disclosure.

[0334] With reference to Figures 27 and 28 to 31, in some examples, the first walking member 110 includes a first force-applying surface 111. For example, the first force-applying surface 111 is a side surface of the first walking member 110 for frictionally contacting the surface to be cleaned S0. There is a non-zero angle between the first force-applying surface 111 and the surface to be cleaned S0, that is, when the cleaning device is not placed on the surface to be cleaned S0, the first force-applying surface 111 is tilted relative to the surface to be cleaned S0. Thus, when the cleaning device cleans the surface to be cleaned S0, the friction force generated by the rotation of the first force-applying surface 111 relative to the surface to be cleaned S0 is not zero, thereby causing the first cleaning module 100 to walk through the first force-applying surface 111.

[0335] With reference to Figures 27 and 28 to 31, in some examples, the second walking member 210 includes a second force-applying surface 211. For example, the second force-applying surface 211 is a side surface of the second walking member 210 for frictionally contacting the surface S0 to be cleaned. There is a non-zero angle between the second force-applying surface 211 and the surface S0 to be cleaned, that is, when the cleaning device is not placed on the surface S0 to be cleaned, the second force-applying surface 211 is tilted relative to the surface S0 to be cleaned. Thus, when the cleaning device cleans the surface S0 to be cleaned, the friction force generated by the second force-applying surface 211 rotating relative to the surface S0 to be cleaned is not zero, thereby causing the second cleaning module 200 to walk through the second force-applying surface 211.

[0336] With reference to Figures 27 and 28 to 31, in some examples, the first force-applying surface 111 includes a first portion 1111 and a second portion 1112; when the first walking member 110 moves, the first portion 1111 is in frictional contact with the surface to be cleaned S0, and the second portion 1112 is not in contact with the surface to be cleaned S0. For example, the first portion can be the outer edge of the first walking member (that is, the edge of the first walking member away from the second walking member), and the first walking member and the surface to be cleaned are close to point contact or line contact. For example, the first portion 1111 can be the partial surface of the first force-applying surface 111 away from the second walking member 210 (with reference to Figure 31), and the first walking member 110 is in frictional contact with the surface to be cleaned S0 through the first portion 1111. For example, the first moving member 110 may be an elastic member. After the cleaning device is placed on the surface to be cleaned S0, the first moving member 110 may be elastically deformed, so that the first portion 1111 of the first force-applying surface 111 is bent relative to the second portion 1112 to fit the surface to be cleaned S0, and the second portion 1112 is separated from the surface to be cleaned S0. After the cleaning device is separated from the surface to be cleaned S0, the first portion 1111 can be reset to be flush with the second portion 1112.

[0337] With reference to Figures 27 and 28 to 31, in some examples, the second force-applying surface 211 includes a third portion 2111 and a fourth portion 2112; when the second walking member 210 moves, the third portion 2111 is in frictional contact with the surface to be cleaned S0, and the fourth portion 2112 is not in contact with the surface to be cleaned S0. For example, the third portion can be the outer edge of the second walking member (that is, the edge of the second walking member away from the first walking member), and the second walking member is close to point contact or line contact with the surface to be cleaned. For example, the third portion 2111 can be the partial surface of the first force-applying surface 111 away from the second walking member 210 (with reference to Figure 31), and the second walking member 210 is in frictional contact with the surface to be cleaned S0 through the third portion 2111. For example, the second walking member 210 may be an elastic member. After the cleaning device is placed on the surface to be cleaned S0, the second walking member 210 may be elastically deformed, so that the third portion 2111 of the first force-applying surface 111 is bent relative to the fourth portion 2112 to fit the surface to be cleaned S0, and the fourth portion 2112 is separated from the surface to be cleaned S0. After the cleaning device is separated from the surface to be cleaned S0, the third portion 2111 can be reset to be flush with the fourth portion 2112.

[0338] 27, 28, and 31, for example, in the direction of the center line connecting the first walking member 110 and the second walking member 210 (e.g., the extending direction of the center line L connecting the first cleaning module 100 and the second cleaning module 200): the first portion 1111 is located on the side of the first walking member 110 away from the second walking member 210, and the second portion 1112 is located on the side of the first walking member 110 closer to the second walking member 210. Thus, the outer side of the first walking member 110 is used for walking, which can prevent the second walking member 210, which is used for adsorption and fixation, from being affected and separated from the surface to be cleaned S0 when the first walking member 110 moves.

[0339] 27 , 28 , and 31 , for example, in the direction of the center line connecting the first walking member 110 and the second walking member 210 (e.g., the extending direction of the center line L connecting the first cleaning module 100 and the second cleaning module 200): the third portion 2111 is located on the side of the second walking member 210 away from the first walking member 110, and the fourth portion 2112 is located on the side of the second walking member 210 closer to the first walking member 110. The side of the second walking member 210 away from the first walking member 110 is used to generate friction with the surface to be cleaned S0, thereby preventing the first walking member 110, which is used for adsorption and fixation, from being affected and separated from the surface to be cleaned S0 when the second walking member 210 moves.

[0340] With reference to Figures 27, 28, and 31, for example, the center of the first running member 110 coincides with the center of the first cleaning module 100, and the center of the second running member 210 coincides with the center of the second cleaning module 200. For example, the outer contour of the first running member 110 is circular, and the outer contour of the second running member 210 is circular. The line connecting the centers of the first running member 110 and the second running member 210 is the line connecting the centers of the first running member 110 and the second running member 210. For example, the line connecting the centers of the first running member 110 and the second running member 210 is the line L connecting the centers of the first cleaning module 100 and the second cleaning module 200.

[0341] 27 , 28 , and 31 , in some examples, the first force-applying surface 111 includes a first portion 1111 and a second portion 1112. When the first moving member 110 moves, the pressure applied by the first portion 1111 to the surface to be cleaned S0 is greater than the pressure applied by the second portion 1112. For example, after the cleaning device is placed on the surface to be cleaned S0, the first portion 1111 of the first force-applying surface 111 contacts the surface to be cleaned S0, while the second portion 1112 does not. In this case, the pressure applied by the second portion 1112 to the surface to be cleaned S0 is zero, meaning that the pressure applied by the first portion 1111 to the surface to be cleaned S0 is greater than the pressure applied by the second portion 1112 to the surface to be cleaned S0.

[0342] For example, after the cleaning device is placed on the surface to be cleaned, the first portion and the second portion of the first force-applying surface can both be in contact with the surface to be cleaned. It is understood that because the first force-applying surface is arranged at an angle, when the first force-applying surface contacts the surface to be cleaned, the elastic deformation of the first portion is greater, thereby applying greater pressure to the surface to be cleaned, and the friction between the first portion and the surface to be cleaned is greater than the friction between the second portion and the surface to be cleaned.

[0343] 27, 28, and 31, in some examples, the second force-applying surface 211 includes a third portion 2111 and a fourth portion 2112. When the second moving member 210 moves, the pressure applied by the third portion 2111 to the surface to be cleaned S0 is greater than the pressure applied by the fourth portion 2112. For example, after the cleaning device is placed on the surface to be cleaned S0, the third portion 2111 of the second force-applying surface 211 contacts the surface to be cleaned S0, while the fourth portion 2112 does not. In this case, the pressure applied by the fourth portion 2112 to the surface to be cleaned S0 is zero, meaning that the pressure applied by the third portion 2111 to the surface to be cleaned S0 is greater than the pressure applied by the fourth portion 2112 to the surface to be cleaned S0.

[0344] For example, after the cleaning device is placed on the surface to be cleaned, the third and fourth portions of the second force-applying surface can both be in contact with the surface to be cleaned. It is understood that, because the second force-applying surface is inclined, when the second force-applying surface contacts the surface to be cleaned, the third portion undergoes a greater degree of elastic deformation, thereby applying greater pressure to the surface to be cleaned. Consequently, the friction between the third portion and the surface to be cleaned is greater than the friction between the fourth portion and the surface to be cleaned.

[0345] With reference to Figures 27 to 31, in some examples, on the side away from the main body 10: the first cleaning disc structure 120 protrudes from the first walking member 110, and after the first cleaning disc structure 120 undergoes elastic deformation, the first cleaning disc structure 120 and the first walking member 110 can both contact the surface to be cleaned S0. After the cleaning device is placed on the surface to be cleaned S0, the first cleaning disc structure 120 undergoes elastic deformation to better fit the surface to be cleaned S0, thereby better adsorbing the surface to be cleaned S0 through the first adsorption chamber Z1. At the same time, after the first cleaning disc structure 120 undergoes elastic deformation, the first walking member 110 and the surface to be cleaned S0 can be in frictional contact, thereby causing the first cleaning module 100 to move through the rotation of the first walking member 110.

[0346] With reference to Figures 27 to 31, in some examples, on the side away from the main body 10: the second cleaning disc structure 220 protrudes from the second walking member 210, and after the second cleaning disc structure 220 undergoes elastic deformation, the second cleaning disc structure 220 and the second walking member 210 can both contact the surface to be cleaned S0. After the cleaning device is placed on the surface to be cleaned S0, the second cleaning disc structure 220 undergoes elastic deformation and better fits the surface to be cleaned S0, thereby better adsorbing on the surface to be cleaned S0 through the second adsorption chamber Z2. At the same time, after the second cleaning disc structure 220 undergoes elastic deformation, the second walking member 210 can frictionally contact the surface to be cleaned S0, thereby causing the second cleaning module 200 to move through the rotation of the second walking member 210.

[0347] With reference to Figures 27 to 31, in some examples, when the first walking member 110 walks, the friction force between the first walking member 110 and the surface to be cleaned S0 is greater than the friction force between the first cleaning disc structure 120 and the surface to be cleaned S0. For example, when the first walking member 110 walks, the friction force between the first walking member 110 and the surface to be cleaned S0 is much greater than the friction force between the first cleaning disc structure 120 and the surface to be cleaned S0. For example, the friction coefficient of the surface of the first walking member 110 in contact with the surface to be cleaned S0 can be set so that the friction force generated between the first walking member 110 and the surface to be cleaned S0 is greater than the friction force between the first cleaning disc structure 120 and the surface to be cleaned S0. Thus, when the first cleaning module 100 rotates, it is mainly dependent on the friction force generated by the rotation of the first walking member 110 to achieve walking. It is understandable that the friction force generated between the first cleaning disc structure 120 and the surface to be cleaned S0 can assist the walking of the first cleaning module 100, and this disclosure is not limited to this.

[0348] With reference to Figures 27 to 31, in some examples, when the second walking member 210 walks, the friction force between the second walking member 210 and the surface to be cleaned S0 is greater than the friction force between the second cleaning disc structure 220 and the surface to be cleaned S0. For example, when the second walking member 210 walks, the friction force between the second walking member 210 and the surface to be cleaned S0 is much greater than the friction force between the second cleaning disc structure 220 and the surface to be cleaned S0. For example, the friction coefficient of the surface of the second walking member 210 in contact with the surface to be cleaned S0 can be set so that the friction force generated between the second walking member 210 and the surface to be cleaned S0 is greater than the friction force between the second cleaning disc structure 220 and the surface to be cleaned S0. Thus, when the second cleaning module 200 rotates, the friction force generated by the second walking member 210 rotation is mainly relied on to realize walking. It is understandable that the friction force generated between the second cleaning disc structure 220 and the surface to be cleaned S0 can assist the walking of the second cleaning module 200, and this disclosure is not limited to this.

[0349] Referring to Figures 28 and 31 , in some examples, the cleaning device further includes a first cleaning member 301 and a second cleaning member 302. For example, the first cleaning member 301 and the second cleaning member 302 can clean the surface to be cleaned S0. For example, the first cleaning member 301 and the second cleaning member 302 can be rags. The first cleaning member 301 is wrapped around the first cleaning disc structure 120. For example, the first cleaning member 301 can completely cover the side surface of the first cleaning disc structure 120 facing away from the main body 10. For example, the first cleaning member can only cover a portion of the surface of the side of the first cleaning disc structure facing away from the main body. For example, the first cleaning member can completely cover the circumferential side surface of the first cleaning disc structure, or it can only cover a portion of the circumferential side surface of the first cleaning disc structure. When the first adsorption chamber Z1 is formed, the first cleaning member 301 is in close contact with the surface to be cleaned S0. As a result, the first cleaning member 301 can be sealed between the surface to be cleaned S0 and the main body 10, thereby preventing the sealing of the first adsorption chamber Z1 from failing and improving the adsorption stability of the first adsorption chamber Z1. In addition, the close contact between the first cleaning member 301 and the surface to be cleaned S0 can also improve the cleaning effect of the first cleaning member 301 on the surface to be cleaned S0.

[0350] 28 and 31 , in some examples, the second cleaning member 302 is wrapped around the outside of the second cleaning disc structure 220. For example, the second cleaning member 302 can completely cover the surface of the side of the second cleaning disc structure 220 away from the main body 10. For example, the second cleaning member can only cover a portion of the surface of the side of the second cleaning disc structure away from the main body. For example, the second cleaning member can completely cover the side surface of the second cleaning disc structure in the circumferential direction, or can only cover a portion of the side surface of the second cleaning disc structure in the circumferential direction. When the second adsorption chamber Z2 is formed, the second cleaning member 302 is in close contact with the surface to be cleaned S0. Thus, the second cleaning member 302 can be sealed between the surface to be cleaned S0 and the main body 10, thereby preventing the sealing failure of the second adsorption chamber Z2 and improving the adsorption stability of the second adsorption chamber Z2. In addition, through the close contact between the second cleaning member 302 and the surface to be cleaned S0, the cleaning effect of the second cleaning member 302 on the surface to be cleaned S0 can also be improved.

[0351] With reference to Figures 28 and 31 , in some examples, on the side away from the main body 10: the first cleaning member 301 protrudes from the first walking member 110, and after the first cleaning disc structure 120 undergoes elastic deformation, the first cleaning member 301 and the first walking member 110 both contact the surface to be cleaned S0. The surface of the first cleaning member 301 on the side away from the main body 10 is approximately a plane, and the surface of the first cleaning disc structure 120 on the side away from the main body 10 is approximately a plane. Therefore, the surface of the first cleaning member 301 on the side away from the main body 10 protrudes from the surface of the first cleaning disc structure 120 on the side away from the main body 10.

[0352] 28 and 31 , after the cleaning device is placed on the surface to be cleaned S0, the first cleaning disc structure 120 elastically deforms, allowing the first cleaning member 301 to better fit the surface to be cleaned S0, thereby achieving a better cleaning effect. Furthermore, through the elastic deformation of the first cleaning disc structure 120, the first moving member 110 contacts the surface to be cleaned S0, thereby generating friction through self-rotation that causes the first cleaning module 100 to move around the second cleaning module 200.

[0353] 28 and 31 , the second cleaning member 302 protrudes from the second moving member 210, and after the second cleaning disc structure 220 is elastically deformed, both the second cleaning member 302 and the second moving member 210 come into contact with the surface to be cleaned S0. The side surface of the second cleaning member 302 facing away from the main body 10 is approximately a plane, and the side surface of the second cleaning disc structure 220 facing away from the main body 10 is approximately a plane. Therefore, the side surface of the second cleaning member 302 facing away from the main body 10 protrudes from the side surface of the second cleaning disc structure 220 facing away from the main body 10.

[0354] 28 and 31 , after the cleaning device is placed on the surface to be cleaned S0, the second cleaning disc structure 220 elastically deforms, allowing the second cleaning member 302 to better fit the surface to be cleaned S0, thereby achieving a better cleaning effect. Furthermore, through the elastic deformation of the second cleaning disc structure 220, the second moving member 210 contacts the surface to be cleaned S0, thereby generating friction through self-rotation that causes the second cleaning module 200 to move around the first cleaning module 100.

[0355] It is understood that the first cleaning member is wrapped around the first cleaning disc structure, and the first cleaning disc structure can either protrude from the first moving member or be flush with the first moving member, or the first moving member can protrude from the first cleaning disc structure. As long as the first cleaning member is in close contact with the surface to be cleaned, the first moving member can move in frictional contact with the surface to be cleaned. The thickness of the first cleaning member can be specifically set, and this disclosure does not impose any restrictions on this.

[0356] Accordingly, the second cleaning member is wrapped around the second cleaning disc structure, and the second cleaning disc structure can protrude from the second moving member or be flush with the second moving member, or the second moving member can protrude from the second cleaning disc structure. As long as the second cleaning member is in close contact with the surface to be cleaned, the second moving member can move in frictional contact with the surface to be cleaned. The thickness of the second cleaning member can be specifically set, and the present disclosure does not impose any restrictions on this.

[0357] With reference to Figure 31, in some examples, when the first walking member 110 walks, the friction force between the first walking member 110 and the surface to be cleaned S0 is greater than the friction force between the first cleaning member 301 and the surface to be cleaned S0. For example, when the first walking member 110 walks, the friction force between the first walking member 110 and the surface to be cleaned S0 is much greater than the friction force between the first cleaning member 301 and the surface to be cleaned S0. For example, the first walking member 110 can be provided with a coefficient of friction on a surface in contact with the surface to be cleaned S0 so that the friction force generated between the first walking member 110 and the surface to be cleaned S0 is greater than the friction force between the first cleaning member 301 and the surface to be cleaned S0. Thus, when the first cleaning module 100 rotates, the friction force generated by the rotation of the first walking member 110 is mainly relied on to realize walking. It is understandable that the friction force generated between the first cleaning member 301 and the surface to be cleaned S0 as the first cleaning disc structure 120 rotates can assist the walking of the first cleaning module 100, and this disclosure does not limit this.

[0358] With reference to Figure 31, when the second walking member 210 walks, the friction force between the second walking member 210 and the surface to be cleaned S0 is greater than the friction force between the second cleaning member 302 and the surface to be cleaned S0. For example, when the second walking member 210 walks, the friction force between the second walking member 210 and the surface to be cleaned S0 is much greater than the friction force between the second cleaning member 302 and the surface to be cleaned S0. For example, the friction coefficient of the surface that the second walking member 210 is used for contacting with the surface to be cleaned S0 can be set, so that the friction force generated between the second walking member 210 and the surface to be cleaned S0 is greater than the friction force between the second cleaning member 302 and the surface to be cleaned S0. Thus, when the second cleaning module 200 rotates, the friction force that mainly depends on the second walking member 210 rotation generation realizes walking. It is understandable that the friction force that the second cleaning member 302 rotates with the second cleaning disc structure 220 and generates between the surface to be cleaned S0 can assist the walking of the second cleaning module 200, and this disclosure does not limit this.

[0359] With reference to Figure 28 and Figure 31, in some examples, the cleaning device further includes a first driving member 401 and a second driving member 402. For example, the first driving member 401 and the second driving member 402 are both located in the housing 11. The first driving member 401 is configured to drive the first cleaning module 100 to rotate. For example, the first driving member 401 is configured to drive the first walking member 110 to rotate, thereby generating friction between the first walking member 110 and the surface to be cleaned S0, thereby causing the first cleaning module 100 to rotate around the second cleaning module 200 to achieve walking. For example, the first driving member 401 is also configured to drive the first cleaning disc structure 120 to rotate. For example, the first cleaning member 301 rotates with the rotation of the first cleaning disc structure 120, thereby wiping and cleaning the surface to be cleaned S0 by the first cleaning member 301.

[0360] With reference to Figures 28 and 31, in some examples, the second driving member 402 is configured to drive the second cleaning module 200 to rotate. For example, the second driving member 402 is configured to drive the second traveling member 210 to rotate, thereby generating friction between the second traveling member 210 and the surface to be cleaned S0 through the rotation of the second traveling member 210, thereby causing the second cleaning module 200 to rotate around the first cleaning module 100 to achieve movement. For example, the second driving member 402 is also configured to drive the second cleaning disk structure 220 to rotate. For example, the second cleaning member 302 rotates with the rotation of the second cleaning disk structure 220, thereby wiping and cleaning the surface to be cleaned S0 through the second cleaning member 302.

[0361] 28 and 31 , the first cleaning module 100 is driven by the first driving member 401, and the second cleaning module 200 is driven by the second driving member 402. This allows the different cleaning modules to be driven independently, thereby providing more precise driving of the first cleaning module 100 and the second cleaning module 200. Furthermore, the independent driving method reduces the number of transmission parts, simplifies the structure of the cleaning device, and reduces intermediate transmission losses.

[0362] Referring to Figure 28, for example, the main body 10 may further include a bracket 14, and the mounting member 13 may be installed between the bracket 14 and the housing 11. For example, the bracket 14 is configured to support a first driving member 401 and a second driving member 402. For example, the cleaning device may further include a first transmission member 501 and a second transmission member 502, and the bracket 14 is configured to support the first transmission member 501 and the second transmission member 502. The first transmission member 501 is transmission-connected between the first driving member 401 and the first cleaning module 100, and the second transmission member 502 is transmission-connected between the second driving member 402 and the second cleaning module 200. Thus, the first driving member 401 can transmit driving force to the first cleaning module 100 via the first transmission member 501, and the second driving member 402 can transmit driving force to the second cleaning module 200 via the second transmission member 502.

[0363] With reference to Figure 28, for example, the first cleaning module 100 includes a first connecting disk 130, which is connected between the first cleaning disk structure 120 and the first walking member 110, and the output shaft of the first driving member 401 is connected to the first connecting disk 130. Thus, by driving the first connecting disk 130 to rotate by the first driving member 401, the first cleaning disk structure 120 and the first walking member 110 can be driven to rotate synchronously. For example, the first driving member 401 can be a motor. For example, the first connecting disk 130 is connected to the first transmission member 501. For example, the rotation axis of the first connecting disk 130 is parallel to or coincides with the rotation axis of the first transmission member 501. For example, the rotation axis of the first connecting disk 130 and the rotation axis of the first transmission member 501 both coincide with the first rotation axis R1.

[0364] With reference to Figure 28, for example, the second cleaning module 200 includes a second connecting disk 230, which is connected between the second cleaning disk structure 220 and the second walking member 210, and the output shaft of the second driving member 402 is connected to the second connecting disk 230. Thus, by driving the second connecting disk 230 to rotate by the second driving member 402, the second cleaning disk structure 220 and the second walking member 210 can be driven to rotate synchronously. For example, the second driving member 402 can be a motor. For example, the second connecting disk 230 is connected to the second transmission member 502. For example, the rotation axis of the second connecting disk 230 is parallel to or overlaps with the rotation axis of the second transmission member 502. For example, the rotation axis of the second connecting disk 230 and the rotation axis of the second transmission member 502 both overlap with the second rotation axis R2.

[0365] Referring to Figure 28, in some examples, the axis of the output shaft of the first driving member 401 intersects the first rotation axis R1. For example, the axis of the output shaft of the first driving member 401 is perpendicular to the first rotation axis R1. The axis of the output shaft of the second driving member 402 intersects the second rotation axis R2. For example, the axis of the output shaft of the second driving member 402 is perpendicular to the second rotation axis R2. This allows for efficient utilization of the internal space of the cleaning device and reduces its height.

[0366] It should be noted that the first cleaning disc structure 120 involved in Figures 26 to 31 can also be referred to as a first elastic component, and the second cleaning disc structure 220 involved in Figures 26 to 31 can also be referred to as a second elastic component.

[0367] There are a few points to note:

[0368] (1) The drawings of the embodiments of the present disclosure only involve structures related to the embodiments of the present disclosure, and other structures can refer to general designs.

[0369] (2) In the absence of conflict, features in the same embodiment and different embodiments of the present disclosure may be combined with each other.

[0370] The foregoing description is merely an exemplary embodiment of the present disclosure and is not intended to limit the scope of protection of the present disclosure. The scope of protection of the present disclosure is determined by the appended claims.

Claims

1. A cleaning disc structure, configured to form an adsorption cavity with a surface to be cleaned, comprising: a first plate and a second plate disposed opposite to each other, wherein inner sidewalls of the first plate and the second plate form at least a portion of a circumferential sidewall of the adsorption chamber; The elastic structure is provided between the first disk and the second disk and is configured to provide an elastic force between the first disk and the second disk to change the size of the interval between the first disk and the second disk in a direction along the second disk pointing to the first disk.

2. The cleaning disc structure according to claim 1, wherein: The cleaning disc structure is configured to rotate around a rotation axis that intersects with the surface to be cleaned and is not perpendicular to each other.

3. The cleaning disk structure according to claim 1 or 2, further comprising: The sealing structure is provided between the first disk and the second disk and is configured to seal the gap at least when the adsorption chamber is formed.

4. The cleaning disc structure according to claim 3, wherein: The sealing structure is an integrated annular structure.

5. The cleaning disc structure according to claim 4, wherein: The elastic structure is disposed through the sealing structure and is pre-pressed between the first disk and the second disk.

6. The cleaning disc structure according to claim 3, wherein: The elastic structure is provided in plurality, and the plurality of elastic structures are arranged at intervals along the circumference of the second disk; When the cleaning disc structure is configured to rotate around a rotation axis that intersects with the surface to be cleaned and is not perpendicular to each other, when the adsorption cavity is formed between the cleaning disc structure and the surface to be cleaned, at least two elastic deformation amounts of the multiple elastic structures at different positions along the circumferential direction are different.

7. The cleaning disc structure according to any one of claims 1 to 6, wherein: A guide portion is provided on a side of the second disk facing the first disk and extending in a direction from the second disk to the first disk; The guide member is configured to guide the elastic structure to elastically deform in a direction from the second disk to the first disk.

8. The cleaning disc structure according to any one of claims 3 to 6, wherein: The sealing structure includes an inner sealing structure and an outer sealing structure; The outer sealing structure is sleeved outside the inner sealing structure, and the elastic structure is located between the inner sealing structure and the outer sealing structure.

9. The cleaning disc structure according to any one of claims 1 to 8, wherein: The contact surface of the second plate for contacting the surface to be cleaned is formed of a flexible material.

10. The cleaning disc structure according to claim 9, wherein: The contact surface is provided with a plurality of ribs, and the plurality of ribs are arranged at intervals along the circumference of the second disk; When the adsorption cavity is formed between the cleaning disc structure and the surface to be cleaned, the elastic structure is configured to undergo elastic deformation according to the amount of air flowing between two adjacent ribs.

11. The cleaning disk structure according to claim 1, comprising: a sealing portion, located at the periphery of the cleaning disc structure, comprising an inner sidewall and a sealing end surface connected to each other, wherein the inner sidewall forms at least a portion of a circumferential sidewall of the adsorption chamber, and the sealing end surface is configured to seal the adsorption chamber along the circumference of the adsorption chamber; an adsorption portion, located in the middle of the cleaning disc structure, comprising an annular wall and an adsorption hole surrounded by the annular wall, wherein the adsorption hole is configured to provide negative pressure to the adsorption chamber; a middle portion, comprising an air inlet groove located between the sealing portion and the adsorption portion; the air inlet groove comprising a bottom wall connected to the inner side wall of the sealing portion and the annular wall of the adsorption portion, respectively, and a groove opening opposite to the bottom wall, wherein two annular edges of the groove opening are respectively located at the inner edge of the sealing end surface and the outer edge of the end of the annular wall away from the bottom wall; Wherein, the air inlet groove is connected to the adsorption hole through a through hole, and the through hole includes an orifice connected to the air inlet groove; The area of the orifice is smaller than the area of the groove opening.

12. The cleaning disc structure according to claim 11, wherein: The through hole is provided at the connection between the adsorption portion and the bottom wall.

13. The cleaning disc structure according to claim 12, wherein: The bottom wall of the air inlet groove includes a first surface facing the groove opening and a second surface, the second surface being closer to the center of the cleaning disk structure than the first surface; The distance between the first surface and the groove opening is greater than the distance between the second surface and the groove opening.

14. The cleaning disc structure according to claim 13, wherein: The bottom wall further includes a connecting surface connected between the first surface and the second surface, and the connecting surface intersects with the plane where the groove opening is located.

15. The cleaning disk structure according to claim 13 or 14, further comprising a plurality of ribs spaced apart along the circumference of the adsorption hole, the ribs extending along a first direction, the first direction being a direction from the center of the cleaning disk structure to the edge; One end of the rib is connected to the adsorption portion, and the other end is connected to the sealing portion; The plurality of ribs divide the air intake groove into a plurality of sub-grooves, and the ribs are provided with notches at least at positions corresponding to the first surface, so that two adjacent sub-grooves communicate with each other.

16. The cleaning disc structure according to claim 15, wherein: On the reference plane where the groove opening is located, a portion of the orthographic projection of the notch overlaps with the orthographic projection of the first surface, and another portion of the orthographic projection of the notch overlaps with the orthographic projection of the second surface.

17. The cleaning disc structure according to claim 15 or 16, wherein: The sealing portion includes a main body portion and a protruding portion protruding from the main body portion along a second direction, wherein the second direction is perpendicular to the plane where the groove opening is located; The surface of the main body portion and the surface of the protruding portion jointly form the sealing end surface.

18. The cleaning disc structure according to claim 17, wherein: An end portion of the protrusion away from the main body portion and an end portion of the rib portion outside the notch away from the bottom wall are substantially located in the same plane.

19. The cleaning disc structure according to claim 18, wherein: The end portion of the annular wall away from the bottom wall is located in the plane; or, the end portion of the annular wall away from the bottom wall is located on a side of the plane close to the bottom wall.

20. The cleaning disc structure according to any one of claims 11 to 19, wherein: The through hole is opened on the bottom wall.

21. A method for controlling the cleaning disk structure according to any one of claims 11 to 20, comprising: Controlling the formation of the adsorption chamber between the cleaning disc structure and the surface to be cleaned, and controlling the cleaning disc structure to move along a preset direction; generating a trigger signal in response to a pressure difference between the air pressure in the adsorption chamber and the reference air pressure being less than a preset pressure difference; controlling the cleaning disk structure to move in a direction opposite to the preset direction within a signal transmission time based on the trigger signal; In which, at least within the signal transmission time, the orthographic projection of the adsorption part on the reference plane where the groove opening is located is within the range of the orthographic projection of the surface to be cleaned on the reference plane; the signal transmission time is the time difference between the moment when the trigger signal is generated and the moment when the cleaning disk structure moves in a direction opposite to the preset direction.

22. The method according to claim 21, wherein When at least part of the outer contour of the groove opening is located outside the outer contour of the positive projection of the surface to be cleaned on the reference plane, the pressure difference between the air pressure in the adsorption chamber and the reference air pressure decreases to less than the preset pressure difference value to generate the trigger signal.

23. The method according to claim 21 or 22, wherein Controlling the cleaning disk structure to move in a direction opposite to the preset direction based on the trigger signal includes: generating a control signal based on the trigger signal; The cleaning disc structure is controlled to move in a direction opposite to the preset direction based on the control signal.

24. A cleaning device comprising the cleaning disc structure according to any one of claims 1 to 23.

25. The cleaning device according to claim 24, wherein The cleaning disc structure includes a first cleaning disc structure; The cleaning device also includes: main body; A first cleaning module, comprising the first cleaning disc structure; a second cleaning module, connected to the same side of the main body as the first cleaning module; The first cleaning module and the second cleaning module are respectively located on both sides of a reference plane perpendicular to a line connecting their centers, and the first cleaning disk structure rotates around a first rotation axis, and an angle is formed between the first rotation axis and the reference plane.

26. The cleaning device of claim 25, comprising: case; A first driving unit includes a transmission mechanism and a first traveling component, wherein the transmission mechanism includes an output end, and the first traveling component is connected to the output end of the transmission mechanism; a first cleaning unit, comprising the first cleaning disc structure and a first cleaning element disposed on the first cleaning disc structure, wherein the first cleaning disc structure is connected to an output end of the transmission mechanism; A second driving unit includes a second traveling component, wherein the second traveling component is spaced apart from the first traveling component; as well as The second cleaning unit is arranged side by side with the first cleaning unit and comprises a cleaning frame and a second cleaning element arranged on the cleaning frame, Wherein, the second walking component has a driving wheel, and the rotation axis of the driving wheel is parallel to the surface to be cleaned. The first walking component includes a rotating disk and a friction member, the friction member is located on the side of the rotating disk away from the output end of the transmission mechanism, the surface of the rotating disk farthest from the output end of the transmission mechanism has a first angle with the surface to be cleaned, and the first angle is greater than 0.

27. The cleaning device according to claim 26, wherein The friction member is configured to contact the surface to be cleaned, and the friction member is configured to generate friction force with the surface to be cleaned.

28. The cleaning device according to claim 26 or 27, wherein A surface of the friction member farthest from the output end of the transmission mechanism has a second angle with the surface to be cleaned, and the second angle is greater than or equal to 0.

29. The cleaning device according to any one of claims 26 to 28, wherein: The surface of the cleaning frame away from the housing is parallel to the surface to be cleaned.

30. The cleaning device of claim 25, comprising: case; A first driving unit includes a transmission mechanism and a first traveling component, wherein the transmission mechanism includes an output end, and the first traveling component is connected to the output end of the transmission mechanism; a first cleaning unit, comprising the first cleaning disc structure and a first cleaning element disposed on the first cleaning disc structure, wherein the first cleaning disc structure is connected to an output end of the transmission mechanism; A second driving unit includes a second traveling component, wherein the second traveling component is spaced apart from the first traveling component; as well as The second cleaning unit is arranged side by side with the first cleaning unit and comprises a cleaning frame and a second cleaning element arranged on the cleaning frame, The second traveling component has a driving wheel, and the rotation axis of the driving wheel is parallel to the traveling surface of the second traveling component. The first walking component includes a rotating disk and a friction member, the friction member is located on the side of the rotating disk away from the output end of the transmission mechanism, the surface of the rotating disk farthest from the output end of the transmission mechanism has a first angle with the walking surface of the second walking component, and the first angle is greater than 0.

31. The cleaning device according to claim 30, wherein A surface of the friction member that is farthest from the output end of the transmission mechanism has a second angle with the walking surface of the second walking component, and the second angle is greater than or equal to 0.

32. The cleaning device of claim 25, comprising: case; A first driving unit includes a transmission mechanism and a first traveling component, wherein the transmission mechanism includes an output end, and the first traveling component is connected to the output end of the transmission mechanism; a first cleaning unit, comprising the first cleaning disc structure and a first cleaning element disposed on the first cleaning disc structure, wherein the first cleaning disc structure is connected to an output end of the transmission mechanism; A second driving unit includes a second traveling component, wherein the second traveling component is spaced apart from the first traveling component; as well as The second cleaning unit is arranged side by side with the first cleaning unit and comprises a cleaning frame and a second cleaning element arranged on the cleaning frame, The second walking component has a driving wheel, and the rotation axis of the driving wheel is parallel to the surface of the cleaning frame away from the housing. The first walking component includes a rotating disk and a friction member, the friction member is located on a side of the rotating disk away from the output end of the transmission mechanism, the surface of the rotating disk farthest from the output end of the transmission mechanism and the surface of the cleaning frame farthest from the shell have a first angle, and the first angle is greater than 0.

33. The cleaning device according to claim 32, wherein A surface of the friction member farthest from the output end of the transmission mechanism and a surface of the cleaning frame farthest from the housing form a second angle, and the second angle is greater than or equal to 0.

34. The cleaning device according to any one of claims 26 to 33, wherein: The first cleaning unit has a first opening on a side away from the output end of the transmission mechanism, and the first opening is configured to avoid the first walking component. The first cleaning disc structure has a hollow structure on a side away from the output end of the transmission mechanism, and the first cleaning element has a hollow structure. The hollow structure of the first cleaning disc structure and the hollow structure of the first cleaning element constitute the first opening.

35. The cleaning device according to any one of claims 25 to 34, wherein: The second cleaning unit has a second opening, which is configured to avoid the second walking component. The cleaning frame has a hollow structure, and the second cleaning element has a hollow structure. The hollow structures of the cleaning frame and the second cleaning element constitute the second opening.

36. The cleaning device of claim 28, 31 or 33, wherein: The first angle is less than or equal to 10°, and the second angle is less than or equal to 10°; or, the second angle is equal to 0°, and the ratio of the width of the surface of the friction member farthest from the output end of the transmission mechanism to the ring width of the friction member is greater than or equal to one-fourth and less than 1.

37. The cleaning device according to any one of claims 26 to 36, wherein: The cleaning device is configured to satisfy at least one of the following conditions: The friction member is located at the edge of the rotating disk, the friction member is annular, the rotating disk is circular, and the ratio of the ring width of the annular ring to the radius of the circle is in a range of 0.25-0.5; A ratio of a maximum diameter of the rotating disk to a maximum diameter of the first cleaning unit is in a range of 0.25-0.

5.

38. The cleaning device according to any one of claims 26 to 37, wherein: A groove or a notch is formed on one side of the rotating disk away from the output end of the transmission mechanism, and at least a portion of the friction member is located in the groove or the notch.

39. The cleaning device according to claim 38, wherein The friction member is flush with the surface of the rotating disk that is farthest from the output end of the transmission mechanism; or, the friction member protrudes from the surface of the rotating disk that is farthest from the output end of the transmission mechanism.

40. The cleaning device according to claim 39, wherein When the friction member protrudes from the surface of the rotating disk farthest from the output end of the transmission mechanism, the ratio of the size of the friction member protruding from the surface of the rotating disk farthest from the output end of the transmission mechanism to the maximum thickness of the friction member is less than or equal to one-fifth.

41. The cleaning device according to claim 25, wherein When the first cleaning module is used for walking, the first cleaning module is configured to generate friction between the first cleaning module and the surface to be cleaned, so that the first cleaning module rotates around the second cleaning module; When the second cleaning module is used for walking, the second cleaning module is configured to generate friction between the second cleaning module and the surface to be cleaned, so that the second cleaning module rotates around the first cleaning module.

42. The cleaning device according to claim 41, wherein The cleaning disk structure further includes a second cleaning disk structure, and the second cleaning module includes the second cleaning disk structure; The first cleaning module further includes a first moving member, the first moving member and the first cleaning disc structure rotate synchronously, the first cleaning disc structure is configured to form a first adsorption chamber with the surface to be cleaned, and the first moving member is located in the first adsorption chamber; The second cleaning module further includes a second moving member that rotates synchronously. The second moving member and the second cleaning disk structure rotate synchronously. The second cleaning disk structure is configured to form a second adsorption chamber with the surface to be cleaned. The second moving member is located in the second adsorption chamber.

43. The cleaning device according to claim 42, wherein The first walking member and the first cleaning disc structure are both fixedly connected to the first driving shaft; The second walking member and the second cleaning disc structure are both fixedly connected to the second driving shaft.

44. The cleaning device according to claim 43, wherein The first cleaning module is configured to rotate about a first rotation axis of the first drive shaft, and the second cleaning module is configured to rotate about a second rotation axis of the second drive shaft; The first cleaning module and the second cleaning module are respectively located on two sides of a reference plane perpendicular to a line connecting their centers, and the first rotation axis and the second rotation axis have a non-zero angle with the reference plane.

45. The cleaning device according to claim 44, wherein The cleaning device is configured to satisfy at least one of the following conditions: The intersection of the first rotation axis and the reference surface is located on a side of the first cleaning module away from the main body, and the intersection of the second rotation axis and the reference surface is located on a side of the second cleaning module away from the main body; The reference surface passes through the midpoint of the center line, and the first rotation axis and the second rotation axis intersect the reference surface at the same point; An included angle between the first rotation axis and the reference plane is equal to an included angle between the second rotation axis and the reference plane.

46. The cleaning device according to any one of claims 42 to 45, wherein: The first walking member includes a first force-applying surface, and a non-zero angle is formed between the first force-applying surface and the surface to be cleaned; The second walking member includes a second force-exerting surface, and a non-zero angle is formed between the second force-exerting surface and the surface to be cleaned.

47. The cleaning device according to claim 46, wherein The first force-applying surface includes a first portion and a second portion; when the first moving member moves, the first portion is in frictional contact with the surface to be cleaned, and the second portion is not in contact with the surface to be cleaned; The second force-applying surface includes a third portion and a fourth portion; when the second moving member moves, the third portion is in frictional contact with the surface to be cleaned, and the fourth portion is not in contact with the surface to be cleaned.

48. The cleaning device of claim 46, wherein The first force-applying surface includes a first portion and a second portion; when the first moving member moves, the pressure applied by the first portion to the surface to be cleaned is greater than the pressure applied by the second portion to the surface to be cleaned; The second force-applying surface includes a third portion and a fourth portion; when the second moving member moves, the pressure applied by the third portion to the surface to be cleaned is greater than the pressure applied by the fourth portion to the surface to be cleaned.

49. A cleaning device according to claim 47 or 48, wherein In the direction of the center line connecting the first walking member and the second walking member: The first portion is located on a side of the first traveling member away from the second traveling member, and the second portion is located on a side of the first traveling member close to the second traveling member; The third portion is located on a side of the second traveling member away from the first traveling member, and the fourth portion is located on a side of the second traveling member close to the first traveling member; or, The first portion is located on a side of the first traveling member close to the second traveling member, and the third portion is located on a side of the second traveling member close to the first traveling member.

50. The cleaning device according to any one of claims 42 to 49, wherein: On the side facing away from the subject: The first cleaning disc structure protrudes from the first moving member, and after the first cleaning disc structure undergoes elastic deformation, both the first cleaning disc structure and the first moving member can contact the surface to be cleaned; The second cleaning disc structure protrudes from the second traveling member, and after the second cleaning disc structure is elastically deformed, both the second cleaning disc structure and the second traveling member can contact the surface to be cleaned.

51. The cleaning device according to any one of claims 42 to 50, further comprising a first cleaning member and a second cleaning member; The first cleaning member is wrapped around the first cleaning disc structure; when the first adsorption chamber is formed, the first cleaning member is in close contact with the surface to be cleaned; The second cleaning member is wrapped around the second cleaning disc structure. When the second adsorption chamber is formed, the second cleaning member is in close contact with the surface to be cleaned.

52. The cleaning device according to claim 51, wherein On the side facing away from the subject: The first cleaning member protrudes from the first moving member, and after the first cleaning disc structure is elastically deformed, both the first cleaning member and the first moving member are in contact with the surface to be cleaned; The second cleaning member protrudes from the second moving member, and after the second cleaning disc structure is elastically deformed, both the second cleaning member and the second moving member are in contact with the surface to be cleaned.

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