Method for stressing particles by means of electric pulses, and use of a device for stressing particles

Abstract

The invention relates to a method for stressing particles (100) by means of electric pulses (200) using a device (1) comprising a process column (2) with a vertically oriented process chamber (3), wherein the process chamber (3) has an inlet (4) at an upper end (5) of the process column (2) and an outlet (6) at a lower end (7) of the process column (2), and the process chamber (3) has a substantially constant width (30) between the inlet (4) and the outlet (6). A supply device (8) for supplying particles (100) to be stressed is paired with the inlet (4), and a discharge device (9) for discharging stressed particles (100) is paired with the outlet (6). The process chamber (3) is associated with two electrodes (10) which are provided on different sides of the process chamber (3) and which are connected to an electric pulse generator (11). The particles (100) to be stressed are continuously guided, as a particle bed (150), from the inlet (4) to the outlet (6) through the process chamber (3) and are stressed by means of electric pulses (200) using the electrodes (100). The invention also relates to the use of such a device for stressing particles (100) by means of electric pulses (200) in order to carry out a method according to one of the preceding claims.

Description

[0001]HEM, TUBAF Method for stressing particles with electrical pulses and use of a device for stressing particles Description The present invention relates to methods for stressing particles with electrical pulses using at least one device comprising at least one process column with at least one essentially vertically oriented process chamber (for stressing particles), wherein the process chamber comprises at least one inlet at an upper end of the process column and at least one outlet at a lower end of the process column. At least one feed device for feeding particles to be stressed is assigned to the inlet, and at least one discharge device for discharging stressed particles is assigned to the outlet. Furthermore, at least two electrodes arranged on different sides of the process chamber are assigned to the process chamber and are connected to at least one electrical pulse generator.The present invention also relates to the use of a device for subjecting particles to electrical pulses. The principle of subjecting solids or particles to electrical pulses is known in the art. Depending on the application, this is intended to weaken the particles before actual comminution or to influence their structural integrity. This should make subsequent comminution more effective and advantageously require less energy. HEM, TUBAF DE 102018 131541 A1, for example, discloses a device for electrodynamically subjecting particles in a vertical pipe section, wherein the particles are guided relatively individually in countercurrent from top to bottom through the pipe section in a flowable medium.A Marx generator and several electrodes are used to generate electrical pulses inside the pipe section, which stress the particles as they pass through the pipe section. A disadvantage, however, is that the throughput of the aforementioned device is relatively low and that the effectiveness of the stress on the particles in the flowable medium is also in need of improvement. DE 102014008 989 A1 also relates to a device for comminuting solids with electrical pulses. Ring-shaped pulse generators with different diameters are arranged, partly nested, in a process chamber. In the area where solids are fed in, i.e. when larger solids are present, fewer rings are provided, resulting in larger spacing between the rings. In the direction of flow towards the outlet, the number of rings increases, and the spacing between them becomes smaller and smaller.Solids then rest on a ring, are crushed, and fall down to the next ring level. This is intended to ensure that highly crushed particles ultimately leave the process chamber. A disadvantage of such systems, however, is that blockages can quickly occur if the solids or particles remain on the rings or cannot fall through between the rings. There is no way to remove blockages or control the material flow. Therefore, the object of the present invention is to provide a method for subjecting particles to electrical pulses for HEM, TUBAF, which enables higher throughput and is more effective. This object is achieved by a method for subjecting particles to electrical pulses having the features of claim 1 and by using a device for subjecting particles to electrical pulses having the features of claim 14.Preferred developments of the invention are the subject of the dependent claims. Further advantages and features of the present inventions emerge from the general description and the description of the exemplary embodiment. The method according to the invention serves for stressing particles with electrical pulses using at least one device comprising at least one process column with at least one essentially vertically oriented process chamber (for stressing particles), wherein the process chamber comprises at least one inlet at an upper end of the process column and at least one outlet at a lower end of the process column. The process chamber has an essentially constant width between the inlet and the outlet. At least one feed device for feeding particles to be stressed is assigned to the inlet, and at least one discharge device for discharging stressed particles is assigned to the outlet.Furthermore, at least two electrodes arranged on different sides of the process chamber are assigned to the process chamber, which electrodes are connected to at least one electric pulse generator. The particles to be stressed are conveyed as a particle bed essentially continuously from the inlet to the outlet through the process chamber and subjected to at least one electric pulse or pulses by means of the electrodes. The method according to the invention is, in particular, an electrodynamic method or an electric pulse comminution HEM, TUBAF, particularly for the areas or materials of ores, slag, concrete and building material recycling, recycling of, for example, photovoltaic systems or photovoltaic modules, electronic waste, and / or mineral raw materials and / or residues.The fact that the process chamber has a substantially constant width between the inlet and the outlet means in particular that the process chamber has the same contour or the same cross-section over its entire length. In particular, no tapers or constrictions or bottlenecks are provided which could lead to a blockage of the particles to be stressed and / or to the formation of bridges between the particles. The fact that electrodes are assigned to the process chamber on or on at least two different sides means in particular that the electrodes are arranged to the left and right in the "flow direction" of the particles, preferably in one plane or at the same height. If more than two electrodes are provided, they are preferably provided in pairs on one plane, so that electrode pairs are then arranged one above the other or one below the other in the "flow direction" of the particles.The process chamber is preferably surrounded by suitable insulation. The electrodes are preferably arranged within the insulation in operative connection to the process chamber. According to the application, a particle bed is in particular a packing of particles, wherein it is particularly preferred that no individual particle stress occurs by means of the method according to the invention. In this case, it is preferred that a particle bed that is as closed as possible (i.e. in particular with particles that touch and support one another) is present in the process chamber of the process column. In this case, a fluidized particle bed is particularly preferred, which according to the application HEM, TUBAF represents a packing of particles through which a fluid flows. The electrical pulse generator is designed in particular as a Marx generator and is generally used to generate (short) high-voltage pulses, by means of which the particles or the particle bed is acted upon.In addition to the Marx generator design, all other types of electric pulse generators can also be used expediently, in particular so-called Tesla transformers and / or high-voltage cascades. The fact that the particle bed is guided essentially continuously through the process chamber or the process column means in particular that a continuous, uniform or permanent passage or speed through the process chamber is provided. In particular, particle sizes of less than 25 mm can be processed, stressed or treated using the method according to the invention. Depending on the design, larger or smaller particle sizes can also be provided. In particular, particles smaller than 10 mm, preferably smaller than 6 mm and particularly preferably between approximately 0.2 and 5 mm, preferably between approximately 1 mm and 2 mm, can be stressed.The diameter of the process chamber, which is preferably tubular, can preferably be between 50 mm and 200 mm, preferably between 75 mm and 150 mm, in particular 100 mm. The electrode spacing is preferably adapted to the diameter of the process chamber or the process column. Thus, depending on the diameter of the process column or the process chamber, the electrode spacing can also be between 50 mm and 200 mm, preferably HEM, TUBAF between 75 mm and 100 mm, in particular 100 mm. In general, depending on the design, the electrode spacing can be selected to be the same as the diameter of the process column, or even larger or smaller. When the particles are subjected to stress by electrical pulses, ultrafine particles are preferably discharged upwards, downwards and / or in the throughflow. The insulation can preferably comprise at least one insulation chamber surrounding the process chamber, which insulation chamber is preferably filled with at least one insulation medium.In particular, deionized water (fully demineralized water) can be used as the insulation medium. However, it is also possible to use another suitable non-conductive or insulating medium or fluid as the insulation medium. For example, the use of transformer oil or insulator oil as a suitable insulation medium is also possible. The insulation space is preferably provided or designed such that the contacting of the electrodes from the electron pulse generator takes place at least partially through this insulation space. For this purpose, for example, at least one contact from the electron pulse generator to at least one electrode can be guided at least partially through the insulation space and thus through the insulation medium contained therein, for example by means of a suitable electrical connection or, depending on the design, in particular through a sheet metal strip.Depending on the design, the opposing electrode is preferably also grounded at least partially through the insulation chamber. The method according to the invention offers many advantages. A significant advantage is that the method according to the invention pre-damages or even breaks up the particles by subjecting them to HEM or TUBAF electrical pulses. In particular, mineral raw materials and residues or other materials can be pre-treated using the electrical pulses, so that the material is fatigued or weakened and at least prepared for subsequent comminution, enabling more energetically favorable comminution. Because the particles are guided through the process column or through the process chamber in a particle bed, a significantly higher throughput is possible than with conventional particle stressing in a fluid flow (in countercurrent).Because the particles are guided through the process column in a particle bed, meaning the particles are in contact with one another, the stress can be applied much more effectively than, for example, with relatively isolated particles in water, since every water-filled space between particles reduces efficiency. Particles conveyed through the process chamber in a particle bed can be stressed much more efficiently, which is aided, among other things, by their higher permittivity. The particle bed is preferably present in the process chamber in a compact bed. To achieve this, the broadest possible particle size distribution can be provided for the material to be stressed. Material with a variety of particle proportions or with a different particle size distribution can be packed particularly densely, so that the free space between the individual particles is kept as small as possible.As already explained, any space between particles to be stressed is a negative factor for efficiency. Thus, a compact bed is particularly efficient when it comes to stressing. HEM, TUBAF Particularly preferably, the particle bed in the process chamber is present in at least one process medium. The process medium can, for example, as is also known in the prior art, be fed in from below and preferably refilled or kept constant. However, the process medium can preferably also be fed in differently, for example from above. The process medium can, in particular, comprise at least one liquid. Depending on the design, the process medium can preferably also be or comprise air and / or a gas or a gas mixture. Particularly preferably, the process medium comprises or is process water. Preferably, the process water can be, for example, normal tap water or well water or.(untreated) naturally occurring water can be used. The process water can, however, also be water with a (particularly) low conductivity. In expedient embodiments, the particle bed is passed through the process chamber. In this case, passing through the process chamber means in particular that no drive means are provided within the process chamber to convey the particle bed through the process column or the process chamber. So-called gravity conveying takes place due to the weight of the particles, whereby the speed at which the particles pass through the column can depend on or be influenced by how quickly the particles are transported away at the lower end of the column. If, for example, no product were to be transported away, no further transport could take place, so that depending on the speed orThroughput of the discharge device the passive passage of the particle bed through the process chamber depends on the active removal of product at the end or at the exit of the process chamber. Depending on the design, active conveying within the process column or the process chamber can also be provided. HEM, TUBAF In preferred designs, particles are fed in continuously. Continuous means in particular continuously, but also not continuously / uniformly, or also in a timed manner or when required and in particular similar to a fill level control with a predetermined minimum and maximum fill height. In particular, it is preferred that a particle bed is present at least up to the area above the electrodes and, depending on the design, a compact filling. The feed can be carried out using any type of conveying technology that can be used sensibly.In particular, any conveying and / or dosing device can be provided, in particular using a vibration exciter such as a vibrating trough or magnetic trough, through which material is continuously trickled in or fed into the process chamber. Continuous refilling of the process medium is particularly preferred. Continuous means in particular continuously, but also discontinuously / uniformly or intermittently or as required, whereby intermittent refilling or refilling as required can also be provided. Here, too, the liquid level is provided in particular up to the area of ​​the electrodes, so that the particles or the particle bed are surrounded by the process medium, particularly in the area subject to electrical impulses. The throughput speed of the particles is preferably adjusted.The throughput speed can influence the stress on the particles. The slower particles are fed through the process column or the process chamber, the longer and / or more frequently the particles can be subjected to electrical pulses. In particular, the throughput speed can be adjusted by adjusting the removal speed of the particles at the end of the process column or at the outlet. Preferably, a variation in the throughput speed or HEM, TUBAF throughput speed can be predetermined on a material-specific basis, or can be dynamically adjusted if the particle size composition in the feed changes. In expedient embodiments, a dewatering of the particle bed is arranged downstream of the process chamber. For example, and preferably, a dewatering screening machine can be provided at the outlet, which separates the water and solids.Depending on the design, any other type of dewatering technology, such as a dewatering screw, can also be provided. At the inlet to the process chamber, for example and preferably, an overflow can also be provided, via which preferably very fine particles and water are separated. In general, a water-solids separation can also be provided here. Preferably, several electrodes are arranged in operative connection to the electric pulse generator, in particular at different levels. This makes it possible in particular for a particle to be subjected to multiple electric pulses as it passes through the process column or through the process chamber. Preferably, at least one filter device is provided to treat the process medium. It is therefore particularly preferred that process water is recycled.For example, an ion exchanger can also be provided to remove ions dissolved in the process water during stress from the process water or the process medium. Ions would increase the conductivity of the process water in the long term. Classic filters or fine filters and other filter technologies can also preferably be used. HEM, TUBAF Preferably, at least one vibration generator is assigned to the process column. Such a vibration generator can, for example, also be used to clear a product blockage in the column from the outside. Preferably, instead of generating vibrations from the outside, the process medium can also be made to pulsate additionally or alternatively. In this way, blockages are also advantageously cleared by the pulsation of the process medium column. In advantageous developments, at least one two-way valve is assigned to the outlet.A two-way valve can be used advantageously, particularly at the start of the process, when unstressed material is present beneath the electrodes during the initial filling of the process chamber. This material can then preferably either be returned to the process or put to another use. The invention also relates to the use of a device for stressing particles with electrical pulses for carrying out a method as described above. The device comprises at least one process column with at least one essentially vertically oriented process chamber (for stressing particles), wherein the process chamber comprises at least one inlet at an upper end of the process column and at least one outlet at the lower end of the process column.At least one feed device for feeding particles to be stressed is assigned to the inlet, and at least one discharge device for discharging stressed particles is assigned to the outlet. Furthermore, at least two electrodes arranged on different sides of the process chamber are assigned to the process chamber and are connected to at least one electrical pulse generator. HEM, TUBAF In general, the device can be developed as previously described for the method according to the invention. The use according to the invention also offers the advantages already explained above for the method according to the invention. Further advantages and features of the present invention emerge from the exemplary embodiment, which is explained below with reference to the accompanying figures. The figures show: Fig.1 is a purely schematic representation of an embodiment of a device for carrying out a method according to the invention for subjecting particles to electrical pulses; Fig. 2 is a purely schematic representation of an embodiment of a device for carrying out a method according to the invention for subjecting particles to electrical pulses in a sectional view; Fig. 3 is a purely schematic representation of a further embodiment of a device for carrying out a method according to the invention for subjecting particles to electrical pulses in a sectional view; Fig. 4 is a purely schematic representation of a process chamber of an embodiment of a device for carrying out a method according to the invention; Fig. 5 is a purely schematic representation of a process chamber of an embodiment of a device for carrying out a method according to the invention; and HEM, TUBAF Fig.6 shows three purely schematic representations of exemplary embodiments of devices for carrying out a method according to the invention. Figure 1 shows a purely schematic representation of a device 1 for subjecting particles to electrical pulses, with which the method according to the invention can be carried out. In this case, the device 1 for subjecting particles 100 to electrical pulses 200 in the exemplary embodiment comprises a process column 2 in which a substantially vertically oriented process chamber 3 is provided. The process chamber 3 has an inlet 4 at an upper end 5 of the process column 2, via which particles 100 can be introduced into the process chamber. Furthermore, the process column 2 has an outlet 6 of the process chamber 3 at the lower end 7, via which stressed particles can exit the process column 2 again. In order toIn order to apply electrical pulses 200 to particles 100 guided through the process chamber 3, an electrical pulse generator 11 is provided, which here is operatively connected to two essentially opposing electrodes 10 on the process chamber 3 or on the process column 2. Electrical pulses 200 can be introduced into the process chamber via the electrodes 10. These electrical pulses 200 weaken the particles 100 guided through the process chamber 3, so that they can be comminuted more efficiently and preferably with less energy during subsequent comminution, for example. This weakening is in particular a large number of microcracks within the particle. HEM, TUBAF In the exemplary embodiment shown, the electrode pulse generator is designed as a Marx generator 16. Depending on the design, however, other suitable electrical pulse generators can also be used.In the exemplary embodiment shown, a supply 23 is arranged upstream of the process column 2 for supplying particles 100, from which supply device 23 particles 100 can be supplied to a supply device 8, wherein the particles are then supplied to the process column 2 or into the process chamber 3 via the supply device 8. A vibration generator, or specifically a vibrating trough 19 or a magnetic trough 19, is provided here, via which the particles 100 are supplied to the process chamber 3. A discharge device 9, which in the exemplary embodiment shown comprises a screw conveyor 18, is arranged downstream of the outlet 6. The particle bed 110 is guided "passively" through the process chamber, which means that no conveying means are provided in the process chamber 3. The transport is effected by the weight of the particles 100 and can only be influenced by the speed of the discharge device 9.In the exemplary embodiment shown here, the particles 100 are guided according to the invention as a particle bed 110 and here specifically as a compact packing 120 through the process column 2 or through the process chamber 3. The difference between a particle bed 110 and a compact packing 120 is that with a compact packing 120 different particle sizes are provided so that as little free space as possible remains between the individual particles 100, so that the HEM, TUBAF electrical pulses 100 introduced into the process column 2 or into the process chamber 3 pass as little as possible through a space not occupied by particles 100. In the exemplary embodiment shown here, it is provided that the particle bed 110 is permeated by fluid or is filled with process medium 150 and here specifically with process water 160 with a particularly low electrical conductivity.By passing the particles 100 as a particle bed 110 and specifically in a compact bed 120, a particularly efficient method for subjecting particles to electrical pulses is provided. Furthermore, it is shown that various sensors 20 can be assigned to the process chamber 3, wherein, purely by way of example and not exclusively, a fill level sensor 21 for the process medium 150 and a fill level sensor 22 for solids or for the particles 100 are provided here. For example, a sensor for particle size determination can also advantageously be used here. Figure 1 further shows that a water-solids separation device 23 is connected downstream of the discharge device 9, via which the exposed particles 100 can be separated from the process medium 150 used. A further separation device 24 for separating the solids portion into defective material 25 and valuable material 26 is connected downstream of the water-solids separation device 23.The process water or process medium 150 separated as part of the water-solids separation 23 can also be fed to further treatment in the illustrated embodiment. For this purpose, a filter device 13 is provided which, depending on its design, can perform conventional filtration of the HEM, TUBAF process water 160. The filter device 13 is particularly intended to separate it into a solid portion and a liquid portion. A hydrocyclone is provided here, for example. Depending on the design, an ion exchanger 27 can also be provided, for example. By subjecting the particles 100 in the process column 3 to electrical pulses, ions can be released from the stressed material, which could, in some cases, significantly increase the conductivity of the process medium 100 or the process water 160 over time. The process water can be optimally recycled via an ion exchanger 27.Depending on the design, the treated process medium 150 can then be fed, for example, to a tank 28 or directly back into the process. Figure 1 shows that two electrodes 10 are provided in a plane 12 to introduce electrical pulses 200 into the process chamber 3. Depending on the design, more than one pair of electrodes can also be provided in different planes 12. Furthermore, it is shown that a vibration generator 14 can be assigned to the process column 2, with which, for example, a product blockage within the process chamber 3 can be resolved. In the lower region of the process chamber 3 or at the lower region 7 of the process column 2, a fresh water supply is indicated, wherein in the embodiment shown here the fresh water can be fed into the process chamber 3 from above, whereas in the embodiment shown the (recycled) process water 150 is fed into the process chamber from below.In general, the particle bed 110 can be flowed through with process medium 150, for example, from below. Depending on the design, the process water 150 can also be supplied in a different way. HEM, TUBAF In the exemplary embodiment shown, a two-way valve 15 is connected downstream of the outlet 6 or the discharge device 9, via which valve particles 100 can, for example, also be fed directly back into the process. This is particularly useful when refilling the process chamber, when unstressed particles 100, which are present below the electrodes 10, also leave the process chamber 3. Figure 2 shows, purely schematically, a sectional view through a process column 2 of a device 1 for stressing particles 100 with electrical pulses 200. It is shown that the process chamber 3 extends here within the process column 2 from an upper end 5 downwards to a lower end 7.Thus, in the exemplary embodiment shown, particles 100 to be stressed can be fed into the process chamber by means of a feed device 8 (not shown here) through an inlet 4 at the upper end 5 and fed to the discharge device 9, here a screw conveyor 18, via an outlet 6 at the lower end 7. In order to guide the particles 100 to be stressed through the process chamber as a particle bed 110 or as a compact bulk material 120, the process chamber 3 has the same width 30 or the same cross-section 31 throughout. This makes it possible to avoid blockages and / or bridging, which would disrupt or even prevent the transport of the particles 100 through the process chamber. It is further shown that the process column 2 comprises insulation 32 which surrounds the process chamber 3. The electrodes 10 are arranged within the insulation 32 in operative connection to the process chamber 3.HEM, TUBAF Figure 3 shows a sectional view of another embodiment of a process column 2 with an electric pulse generator 11 of a device 1 for subjecting particles 100 to electric pulses 200. The basic structure corresponds to the previously shown embodiments. Furthermore, it is shown that the insulation 32 in the embodiment shown here comprises an insulation space 33 surrounding the process chamber 3, which is filled with at least one insulation medium 34. In this case, demineralized water (DI water) is provided as the insulation medium 34. However, it is also possible to use another suitable non-conductive or insulating medium or fluid as the insulation medium 34. For example, the use of transformer oil or insulator oil as a suitable insulation medium is also possible.The insulation space 35 is designed here such that the contacting of the electrodes 10 from the electron pulse generator 11, here a Marx generator 16, takes place at least partially through this insulation space 33. For this purpose, in the exemplary embodiment shown here, a common contact 35 runs from the electron pulse generator 11 through the insulation space 33 to the three levels of electrodes 10. A sheet metal strip 36 is provided here as the contact. The respective opposite sides of the electrodes 10 connected to the electron pulse generator 11 are also led outwards via a contact 35 or, in this case, a sheet metal strip 36, through the insulation space 33 and the insulation 32 and connected to an earth 37 or an earth connection. HEM, TUBAF Figure 4 shows a purely schematic section of a process space 3 through which particles 100 are passed in a particle bed 110.Here it can be seen that due to a relatively uniform design of the particle sizes, some free spaces still exist between the particles 100, which are filled with process medium 150 or process water 160. This generally reduces the efficiency of the stress. In contrast, Figure 5 shows a purely schematic illustration that in a particle bed 110 with a compact packing 120, considerably less free space remains for the process medium 150, so that the stress with electrical pulses can be carried out even more effectively. Figure 6 shows a purely schematic illustration of three different exemplary embodiments of devices 1 with a different number of electrodes 10, which are each operatively connected to one or more electrical pulse generators 11. In the left-hand view, two electron pairs or four electrodes 10 are provided in two different planes 12.The middle view shows a comparable design with six electrodes 10 in three levels 12, and the right view shows a variant with eight electrodes in four levels 12. Any other number of electrodes 10 and levels 12 can also be used advantageously. The more electrodes 10 are provided in different levels 12, the more effectively particles can generally be treated, since each particle 100 is generally subjected to electrical pulses more often as it passes through the process chamber 3.HEM, TUBAF List of reference symbols 1 Device 34 Insulation medium 2 Process column 35 Contact 3 Process chamber 36 Sheet metal strip 4 Inlet 37 Grounding 5 Upper end 100 Particles 6 Outlet 110 Particle bed 7 Lower end 120 Compact bed 8 Feed device 150 Process medium 9 Discharge device 160 Process water 10 200 Electropulse electrodes 11 Electropulse generator 12 Level 13 Filter device 14 Vibration generator 15 Two-way valve 16 Marx generator 17 Reservoir 18 Screw conveyor 19 Magnetic trough 20 Sensor 21 Level sensor (liquid) 22 Level sensor (particles) 23 Water-solids separation 24 Separation device 25 Defective material 26 Recyclable material 27 Ion exchanger 28 Tank 29 Fresh water supply 30 Width 31 Cross section 32 Isolation 33 Isolation room.

Claims

HEM, TUBAF Claims:

1. A method for stressing particles (100) with electrical pulses (200) with at least one device (1) comprising at least one process column (2) with at least one substantially vertically oriented process chamber (3) (for stressing particles), wherein the process chamber (3) comprises at least one inlet (4) at an upper end (5) of the process column (2) and at least one outlet (6) at a lower end (7) of the process column (2), and wherein the process chamber (3) has a substantially constant width (30) between the inlet (4) and the outlet (6), wherein at least one feed device (8) for feeding particles (100) to be stressed is assigned to the inlet (4), and wherein at least one discharge device (9) for discharging stressed particles (100) is assigned to the outlet (6), and wherein at least two electrodes (10) arranged on different sides of the process chamber (2) are assigned to the process chamber (3),which are connected to at least one electric pulse generator (11), characterized in that the particles (100) to be stressed are guided as a particle bed (110) essentially continuously from the inlet (4) to the outlet (6) through the process chamber (3) and are stressed with electric pulses (200) by means of the electrodes (10).

2. The method according to claim 1, wherein the particle bed (110) is present in a compact bed (120) in the process chamber (3).

3. The method according to one of the preceding claims, wherein the particle bed in the process chamber (3) is present in at least one process medium (150). HEM, TUBAF 4. The method according to the preceding claim, wherein the process medium (150) is process water (160).

5. The method according to one of the preceding claims, wherein the particle bed (110) is passively guided through the process chamber (3).

6. The method according to one of the preceding claims, wherein the process medium (150) is continuously refilled.

7. The method according to one of the preceding claims, wherein the flow rate of the particle bed (110) is adjusted.

8. The method according to one of the preceding claims, wherein a dewatering of the particle bed (110) is arranged downstream of the process chamber (3).

9. The method according to one of the preceding claims, wherein a plurality of electrodes (10) are operatively connected to the electric pulse generator (11) and arranged at different levels (12).

10. The method according to one of the preceding claims, wherein at least one filter device (13) is provided to treat the process medium.Method according to one of the preceding claims, wherein at least one vibration generator (14) is assigned to the process column.

12. Method according to one of the preceding claims, wherein pulsation of the process medium is caused in the process chamber.

13. Method according to one of the preceding claims, wherein at least one two-way valve (15) is assigned to the outlet. HEM, TUBAF 14. Use of a device (1) for subjecting particles (100) to stress with electrical pulses, comprising at least one process column (2) with at least one substantially vertically oriented process chamber (3) (for stressing particles), wherein the process chamber (3) comprises at least one inlet (4) at an upper end (5) of the process column (2) and at least one outlet (6) at a lower end (7) of the process column (2), wherein at least one feed device (8) for feeding particles (100) to be stressed is assigned to the inlet (4), and wherein at least one discharge device (9) for discharging stressed particles (100) is assigned to the outlet (6), and wherein at least two electrodes (10) arranged on different sides of the process chamber (3) are assigned to the process chamber (2), which electrodes are connected to at least one electrical pulse generator (11), for carrying out a method according to one of the preceding claims.

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