Optical laminate, method for producing optical laminate, and article

Abstract

Provided is a method for producing an optical laminate including a substrate, a high-refractive-index layer provided directly or via another layer on the substrate, a low-refractive-index layer formed on the high-refractive-index layer and containing SiO2 as a main component, and an antifouling layer formed on the low-refractive-index layer, the method comprising: a high-refractive-index layer forming step; a low-refractive-index layer forming step for forming a low-refractive-index layer in a dry atmosphere; a plasma treatment step for performing plasma treatment on the low-refractive-index layer; and an antifouling layer forming step for forming an antifouling layer on the surface, wherein in the plasma processing step, the low-refractive-index layer is subjected to plasma treatment at an electrode power density of 4,400 W / m2 to 18,000 W / m2 under an environment in which a mixed gas of water vapor and argon gas is introduced. Also provided is an optical laminate in which the binding energy of SiO2 as measured by X-ray photoelectron spectroscopy (ESCA) from the antifouling layer side is 103.25 eV or less.

Description

Optical laminate, method for producing optical laminate, and article

[0001] The present invention relates to an optical laminate, a method for producing an optical laminate, and an article. This application claims priority to Japanese Patent Application No. 2024-023257 filed on February 19, 2024, and Japanese Patent Application No. 2025-21608 filed on February 13, 2025, the contents of which are incorporated herein by reference.

[0002] Antireflection films are applied to various devices to prevent surface reflection. For example, they are applied to in-vehicle films such as head-up displays, touch panels for smartphones, etc. Antireflection films are typically optical laminates in which a hard coat layer is formed on a transparent substrate, high refractive index layers and low refractive index layers are alternately formed on the hard coat layer as optical functional layers, and an antifouling layer made of a fluorine compound is formed on the optical functional layer.

[0003] As a method for manufacturing an antireflection film made of an optical laminate, for example, a method is known in which a resin solution containing fine particles with different refractive indices is prepared, and layers with different refractive indices are successively coated with the resin solution and dried to obtain a laminate (e.g., Patent Document 1). Also known is a method in which an optical functional layer is formed on a substrate by sputtering, vapor deposition, or the like, and an antifouling layer is further formed by vapor deposition, or the like (e.g., Patent Documents 2, 3, 4, and 5). In Patent Documents 2 and 3, the outermost layer of the optical functional layer, which is the farthest from the substrate, is a SiO 2 layer formed as a low refractive index layer. ２ The low refractive index layer is formed by sputtering, and an antifouling layer made of a fluorine-based compound is formed on the low refractive index layer by coating or vapor deposition.

[0004] Furthermore, Patent Documents 2 and 3 disclose that reactive sputtering using water vapor as a reactive gas is performed when forming an inorganic layer in order to form an optical laminate in which organic layers such as an antifouling layer and inorganic layers have high adhesion.

[0005] JP 2015-197634 A JP 2012-251193 A JP 2014-43600 A JP 2009-117569 A WO 2015 / 097898

[0006] Anti-reflective films are expected to be touched by users, and in doing so, they may become contaminated with sebum, dust, and other contaminants. In particular, sebum contamination affects visibility. The fluorine-based compounds that make up the anti-fouling layer bond with the substrate that makes up the inorganic layer, and play a role in suppressing such contamination. If contamination does adhere to the surface of an anti-reflective film, it can be maintained by removing it with an alkaline chemical. Head-up displays and smartphone touch panels that use anti-reflective films are used for long periods of time, so they are required to have long-term alkali resistance.

[0007] Here, when an inorganic layer is formed by sputtering in a water vapor environment as in Patent Documents 1 and 2, it is believed that hydroxy groups are formed inside the inorganic layer. ２ The inorganic layer made of oxides such as H ２ It is known that inorganic layers are dissolved by hydrolysis with O. As the dissolution of the inorganic layer progresses, optical properties such as refractive index may change. Furthermore, the dissolution of the inorganic layer is facilitated by the substitution of alkali metals for H elements in the hydroxyl groups.

[0008] The present invention has been made in view of the above circumstances, and an object of the present invention is to provide an optical layered body that exhibits excellent alkali resistance over a long period of time, a method for producing the optical layered body, and an article.

[0009] The present inventors have found that by forming hydroxy groups on the outermost surface of the inorganic layer that bond to the substrate of the inorganic layer, it becomes easier to add the substrate of the antifouling layer, and that if excessive hydroxy groups are formed even inside the inorganic layer, excellent alkali resistance may not be obtained.

[0010] (1) A method for producing an optical laminate according to one aspect of the present invention includes the steps of: a substrate; a high refractive index layer provided on the substrate directly or via another layer; and a SiO 2 film formed on the high refractive index layer. ２ as a main component, and an antifouling layer formed on the low refractive index layer, the method comprising the steps of: a high refractive index layer-forming step of forming a high refractive index layer; a low refractive index layer-forming step of forming the low refractive index layer in a dry atmosphere; a plasma treatment step of plasma-treating the low refractive index layer; and an antifouling layer-forming step of forming an antifouling layer on the surface, wherein in the plasma treatment step, a mixed gas of water vapor and argon gas is introduced and an electrode power density of 4400 W / m ２ More than 18000W / m ２ The low refractive index layer is then plasma treated as follows.

[0011] (2) In the method for producing an optical laminate according to (1) above, in the plasma treatment step, the flow rate of water vapor in the mixed gas of water vapor and argon gas introduced may be 10% or more and 90% or less.

[0012] (3) The electrode power density in the plasma treatment step of (1) or (2) above is 7000 W / m ２ More than 14000W / m ２ It may be the following:

[0013] (4) In the method for producing an optical laminate according to any one of (1) to (3) above, the low refractive index layer may be formed by sputtering in the low refractive index layer forming step.

[0014] (5) In the method for producing an optical laminate according to any one of (1) to (4) above, in the antifouling layer forming step, the antifouling layer may be formed by a vapor deposition method, and the antifouling layer may contain a compound having an alkoxysilyl group and a fluorine-modified organic group.

[0015] (6) In the method for producing an optical laminate according to any one of (1) to (5), in the plasma treatment step, H in the atmosphere in the space where the low refractive index layer is plasma treated is ２ The proportion of O may be 6.5% or more and 50% or less.

[0016] (7) An optical laminate according to one aspect of the present invention includes a substrate, a high refractive index layer formed on the substrate directly or via another layer, and a SiO ２ as a main component, and an antifouling layer formed on the low refractive index layer, and after dropping a 0.1 (mol / L) NaOH aqueous solution onto the antifouling layer and leaving it at 55°C for 4 hours, the ΔE value represented by the following formula (1) is 8 or less. ΔE ＊ ａｂ = {(L ＊ ２ -L ＊ １ ) ２ + (a ＊ ２ -a ＊ １ ) ２ +(b ＊ ２ -b ＊ １ ) ２} １／２ ...(1) (In the formula, L ＊ １ : Brightness before adding NaOH aq., L ＊ ２ : Brightness after a predetermined time has passed since the dropping of NaOH aq. ＊ １ : Color before adding NaOH aq., a ＊ ２ : Color after leaving for a predetermined time after dropping NaOH aq., b ＊ １ : Color before adding NaOH aq., b ＊ ２ (Color intensity after the specified time has elapsed since the drop of NaOH aq.)

[0017] (8) The optical laminate of (7) above has a SiO measured by X-ray photoelectron spectroscopy (ESCA) from the antifouling layer side. ２ The bond energy may be 103.25 eV or less.

[0018] (9) In the optical laminate of (7) and (8) above, the high refractive index layer may be composed of an oxide of a first metal, the low refractive index layer may be composed of an oxide of a second metal, and the metal elements detected by ESCA measurement may be only the first metal element and the second metal element.

[0019] (10) The optical laminate of (7) and (8) above further comprises an adhesive layer between the substrate and the high refractive index layer, wherein the high refractive index layer is made of an oxide of a first metal, the low refractive index layer is made of an oxide of a second metal, and the adhesive layer is made of an oxide of a third metal, and the metal elements detected by ESCA measurement may be only the first metal element, the second metal element, and the third metal element. (11) An article according to one aspect of the present invention comprises the optical laminate of any of (7) to (9) above.

[0020] According to the present invention, it is possible to provide an optical layered body that exhibits excellent alkali resistance over a long period of time, a method for producing the optical layered body, and an article.

[0021] Fig. 4 is a cross-sectional view showing an example of the configuration of an optical laminate according to one embodiment of the present invention. Fig. 5 is a cross-sectional view of an optical laminate according to another example of Fig. 1. Fig. 6 is a perspective view showing an example of the configuration of an article to which an optical laminate according to one embodiment of the present invention is applied. Fig. 7 is a schematic view showing an example of a manufacturing apparatus that can be used in a method for manufacturing an optical laminate according to one embodiment of the present invention. Fig. 8 is a view showing an example of a pretreatment apparatus 2B in the manufacturing apparatus shown in Fig. 4.

[0022] The present embodiment will be described in detail below with reference to the drawings as appropriate. The drawings used in the following description may show characteristic portions enlarged for the sake of clarity, and the dimensional ratios of each component may differ from the actual ones. The materials, dimensions, etc. exemplified in the following description are merely examples, and the present invention is not limited thereto. Appropriate changes can be made within the scope of the present invention.

[0023] [Optical laminate] Fig. 1 is a cross-sectional view showing an example of the configuration of an optical laminate according to one embodiment of the present invention. The optical laminate 101 shown in Fig. 1 is formed by sequentially laminating a transparent substrate 11, a hard coat layer 12, an adhesive layer 13, an optical functional layer 14 composed of a high refractive index layer 14a and a low refractive index layer 14b, and an antifouling layer 15. In the optical laminate 101, the high refractive index layer 14a is located closer to the transparent substrate 11, and the low refractive index layer 14b is located farther from the transparent substrate 11 than the high refractive index layer 14a.

[0024] Fig. 2 is a cross-sectional view of an optical laminate according to another example of Fig. 1. The optical laminate 102 shown in Fig. 2 has an optical function layer 14 in which high refractive index layers 14a and low refractive index layers 14b are alternately stacked. In the optical laminate 102, the high refractive index layer 14a is provided at a position of the optical function layer 14 closest to the transparent substrate 11, and the low refractive index layer 14b is provided at a position furthest from the transparent substrate 11. That is, in both the examples of Fig. 1 and Fig. 2, the antifouling layer 15 is in contact with the low refractive index layer 14b of the optical function layer 14. The low refractive index layer 14b is made of SiO ２ It is a layer containing as a main component.

[0025] The optical laminate of the present invention includes a substrate (transparent substrate 11), a high refractive index layer 14a formed on the substrate directly or via another layer, and a SiO ２ as a main component and an antifouling layer 15 formed on the low refractive index layer 14b, and after dropping a 0.1 (mol / L) NaOH aqueous solution onto the optical laminate and leaving it to stand at 55°C for 4 hours, the ΔE value represented by the following formula (1) is 8 or less. The optical properties of the optical laminate, such as lightness and chromaticity, are measured using an integrating sphere spectrocolorimeter, as will be described later.

[0026] ΔE ＊ ａｂ = {(L ＊ ２ -L ＊ １ ) ２ + (a ＊ ２ -a ＊ １ ) ２ +(b ＊２ -b ＊ １ ) ２} １／２ ...(1) (In the formula, L ＊ １ : Brightness before adding NaOH aq., L ＊ ２ : Brightness after a predetermined time has passed since the dropping of NaOH aq. ＊ １ : Color before adding NaOH aq., a ＊ ２ : Color after leaving for a predetermined time after dropping NaOH aq., b ＊ １ : Color before adding NaOH aq., b ＊ ２ : Color after leaving for a predetermined time after dropping NaOH aq.

[0027] In the optical laminate, when the high refractive index layer 14a is formed on the substrate via another layer, for example, a hard coat layer 12 and an adhesive layer 13 are formed between the substrate and the high refractive index layer 14a. The optical laminates 101 and 102 each include, for example, a transparent substrate 11, a hard coat layer 12, an adhesive layer 13, an optical functional layer 14, and an antifouling layer 15. The optical laminate can be formed, for example, by measuring SiO 2 from the antifouling layer 15 side by X-ray photoelectron spectroscopy (ESCA). ２ The bond energy is 103.25 eV or less.

[0028] The transparent substrate 11 may be formed from a transparent material that can transmit light in the visible light range. For example, a plastic film is preferably used as the transparent substrate 11. Specific examples of materials that can be used for the plastic film include polyester-based resins, acetate-based resins, polyethersulfone-based resins, polycarbonate-based resins, polyamide-based resins, polyimide-based resins, polyolefin-based resins, (meth)acrylic-based resins, polyvinyl chloride-based resins, polyvinylidene chloride-based resins, polystyrene-based resins, polyvinyl alcohol-based resins, polyarylate-based resins, and polyphenylene sulfide-based resins.

[0029] In the present invention, the term "transparent material" refers to a material having a transmittance of 80% or more for light in the wavelength range used, provided that the effect of the present invention is not impaired. In addition, in this embodiment, "(meth)acrylic" means methacrylic and acrylic.

[0030] The transparent substrate 11 may contain a reinforcing material as long as the optical properties are not significantly impaired. Examples of the reinforcing material include cellulose nanofiber and nanosilica. In particular, polyester-based resins, acetate-based resins, polycarbonate-based resins, and polyolefin-based resins are preferably used as the reinforcing material. Specifically, a triacetyl cellulose (TAC) substrate is preferably used as the reinforcing material. Furthermore, a glass film, which is an inorganic substrate, can also be used as the transparent substrate 11.

[0031] When the plastic film is a TAC substrate, when the hard coat layer 12 is formed on one side thereof, a permeation layer is formed in which some of the components constituting the hard coat layer 12 penetrates into the transparent substrate 11. As a result, the adhesion between the transparent substrate 11 and the hard coat layer 12 is improved, and the occurrence of interference fringes due to the difference in refractive index between the layers can be suppressed.

[0032] The transparent substrate 11 may be a film having optical and / or physical functions, such as a polarizing plate, a retardation compensation film, a heat-shielding film, a transparent conductive film, a brightness-enhancing film, and a barrier-enhancing film.

[0033] The thickness of the transparent substrate 11 is not particularly limited, but is preferably, for example, 25 μm or more. The film thickness of the transparent substrate 11 is more preferably 40 μm or more. When the thickness of the transparent substrate 11 is 25 μm or more, the rigidity of the substrate itself is ensured, and wrinkles are less likely to occur even when stress is applied to the optical laminates 101, 102. Furthermore, when the thickness of the transparent substrate 11 is 25 μm or more, wrinkles are less likely to occur even when the hard coat layer 12 is continuously formed on the transparent substrate 11, and there are fewer concerns about production, which is preferable. When the thickness of the transparent substrate 11 is 40 μm or more, wrinkles are even less likely to occur, which is preferable.

[0034] When production is carried out using a roll, the thickness of the transparent substrate 11 is preferably 1000 μm or less, and more preferably 600 μm or less. When the thickness of the transparent substrate 11 is 1000 μm or less, the optical laminates 101, 102 during production and the optical laminates 101, 102 after production can be easily wound into a roll, and the optical laminates 101, 102 can be produced efficiently. Furthermore, when the thickness of the transparent substrate 11 is 1000 μm or less, the optical laminates 101, 102 can be made thinner and lighter. When the thickness of the transparent substrate 11 is 600 μm or less, the optical laminates 101, 102 can be produced more efficiently and can be made even thinner and lighter, which is preferable.

[0035] The surface of the transparent substrate 11 may be previously subjected to an etching treatment such as sputtering, corona discharge, ultraviolet irradiation, electron beam irradiation, conversion treatment, oxidation, etc., and / or a primer treatment. By previously performing these treatments, it is possible to improve adhesion to the hard coat layer 12 to be formed on the transparent substrate 11. Furthermore, before forming the hard coat layer 12 on the transparent substrate 11, it is also preferable to remove dust and clean the surface of the transparent substrate 11 by subjecting the surface of the transparent substrate 11 to solvent washing, ultrasonic cleaning, etc., as necessary.

[0036] A known material can be used as the hard coat layer 12. The hard coat layer 12 may be made of only a binder resin, or may contain a filler together with the binder resin to the extent that transparency is not impaired. The filler may be made of an organic substance, an inorganic substance, or a mixture of organic and inorganic substances.

[0037] The binder resin used in the hard coat layer 12 is preferably transparent, and examples thereof include ionizing radiation curable resins that are cured by ultraviolet light or electron beams, thermoplastic resins, and thermosetting resins.

[0038] Examples of the ionizing radiation curable resin used as the binder resin of the hard coat layer 12 include ethyl(meth)acrylate, ethylhexyl(meth)acrylate, styrene, methylstyrene, and N-vinylpyrrolidone. Examples of the ionizing radiation curable resin compound having two or more unsaturated bonds include trimethylolpropane tri(meth)acrylate, tripropylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, dipropylene glycol di(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol hexa(meth)acrylate, 1,6-hexanediol di(meth)acrylate, neopentyl glycol di(meth)acrylate, trimethylolpropane tri(meth)acrylate, ditrimethylolpropane ... Examples of suitable polyfunctional compounds include erythritol penta(meth)acrylate, tripentaerythritol octa(meth)acrylate, tetrapentaerythritol deca(meth)acrylate, isocyanuric acid tri(meth)acrylate, isocyanuric acid di(meth)acrylate, polyester tri(meth)acrylate, polyester di(meth)acrylate, bisphenol di(meth)acrylate, diglycerin tetra(meth)acrylate, adamantyl di(meth)acrylate, isobornyl di(meth)acrylate, dicyclopentane di(meth)acrylate, tricyclodecane di(meth)acrylate, and ditrimethylolpropane tetra(meth)acrylate. Among these, pentaerythritol triacrylate (PETA), dipentaerythritol hexaacrylate (DPHA), and pentaerythritol tetraacrylate (PETTA) are preferably used. The term "(meth)acrylate" refers to methacrylate and acrylate. Furthermore, the ionizing radiation curable resin may be a resin obtained by modifying the above-mentioned compounds with PO (propylene oxide), EO (ethylene oxide), CL (caprolactone), or the like.

[0039] Examples of thermoplastic resins used as the binder resin of the hard coat layer 12 include styrene-based resins, (meth)acrylic resins, vinyl acetate-based resins, vinyl ether-based resins, halogen-containing resins, alicyclic olefin-based resins, polycarbonate-based resins, polyester-based resins, polyamide-based resins, cellulose derivatives, silicone-based resins, and rubber or elastomers. The thermoplastic resins are preferably amorphous and soluble in organic solvents (particularly common solvents capable of dissolving multiple polymers and curable compounds). In particular, from the viewpoints of transparency and weather resistance, styrene-based resins, (meth)acrylic resins, alicyclic olefin-based resins, polyester-based resins, cellulose derivatives (cellulose esters, etc.), and the like are preferred.

[0040] Examples of the thermosetting resin used as the binder resin of the hard coat layer 12 include phenol resin, urea resin, diallyl phthalate resin, melamine resin, guanamine resin, unsaturated polyester resin, polyurethane resin, epoxy resin, aminoalkyd resin, melamine-urea co-condensation resin, silicon resin, polysiloxane resin (including so-called silsesquioxanes such as cage-shaped and ladder-shaped), and the like.

[0041] The hard coat layer 12 may contain an organic resin and an inorganic material, or may be an organic-inorganic hybrid material. One example is a material formed by a sol-gel method. Examples of inorganic materials include silica, alumina, zirconia, and titania. Examples of organic materials include acrylic resin. The filler contained in the hard coat layer 12 can be selected from a variety of materials depending on the application of the optical laminates 101 and 102, from the viewpoints of anti-glare properties, adhesion to the optical functional layer 14 described below, and anti-blocking properties. Specifically, known fillers such as silica (oxide of silicon) particles, alumina (aluminum oxide) particles, and organic fine particles can be used.

[0042] The hard coat layer 12 may contain, for example, a binder resin and silica particles and / or alumina particles as a filler. By dispersing silica particles and / or alumina particles as a filler in the hard coat layer 12, fine irregularities can be formed on the surface of the hard coat layer 12. These silica particles and / or alumina particles may be exposed on the surface of the hard coat layer 12 facing the optical function layer 14. In this case, the binder resin of the hard coat layer 12 and the optical function layer 14 are strongly bonded. This improves the adhesion between the hard coat layer 12 and the optical function layer 14, increases the hardness of the hard coat layer 12, and improves the scratch resistance of the optical laminates 101 and 102.

[0043] The average particle size of the silica particles and / or alumina particles used as a filler in the hard coat layer 12 is, for example, 800 nm or less, preferably 780 nm or less, and more preferably 100 nm or less.

[0044] From the viewpoint of improving the antiglare properties of the optical laminates 101 and 102, organic fine particles can be used as the filler contained in the hard coat layer 12. Examples of organic fine particles include acrylic resins. The particle diameter of the organic fine particles is preferably 10 μm or less, more preferably 5 μm or less, and particularly preferably 3 μm or less. In order to impart toughness to the hard coat layer 12, various reinforcing materials can be used as the filler contained in the hard coat layer 12 within a range that does not impair the optical properties. Examples of reinforcing materials include cellulose nanofibers.

[0045] The thickness of the hard coat layer 12 is not particularly limited, but is preferably 0.5 μm or more, and more preferably 1 μm or more. The thickness of the hard coat layer 12 is preferably 100 μm or less. When the thickness of the hard coat layer 12 is 0.5 μm or more, sufficient hardness is obtained, making it less likely to suffer from scratches during production. Furthermore, when the thickness of the hard coat layer 12 is 100 μm or less, the optical laminates 101, 102 can be made thinner and lighter. Furthermore, when the thickness of the hard coat layer 12 is 100 μm or less, microcracks in the hard coat layer 12 that occur when the optical laminates 101, 102 are bent during production are less likely to occur, improving productivity.

[0046] The hard coat layer 12 may be a single layer or a laminate of multiple layers. The hard coat layer 12 may further be provided with known functions such as ultraviolet absorption, antistatic properties, refractive index adjustment, and hardness adjustment. The functions provided to the hard coat layer 12 may be provided in a single hard coat layer or may be provided separately in multiple layers.

[0047] The adhesion layer 13 is a layer formed to improve adhesion between the transparent substrate 11 or hard coat layer 12, which is an organic film, and the optical functional layer 14, which is an inorganic film. In the optical laminates 101 and 102 shown in FIGS. 1 and 2 , the adhesion layer 13 is provided between the hard coat layer 12 and the optical functional layer 14. The adhesion layer 13 functions to adhere the hard coat layer 12 and the optical functional layer 14. The adhesion layer 13 is preferably made of an oxygen-deficient metal oxide or metal. An oxygen-deficient metal oxide refers to a metal oxide in which the number of oxygen atoms is deficient compared to the stoichiometric composition. Examples of oxygen-deficient metal oxides include SiOx, AlOx, TiOx, ZrOx, CeOx, MgOx, ZnOx, TaOx, SbOx, SnOx, and MnOx. Examples of metals include Si, Al, Ti, Zr, Ce, Mg, Zn, Ta, Sb, Sn, Mn, and In. In this embodiment, the metal elements constituting the adhesion layer 13 and the metal elements in the metal oxides may be referred to as third metal elements. The adhesion layer 13 may be, for example, SiOx, where x is greater than 0 and less than 2.0. The adhesion layer may also be formed from a mixture of multiple metals or metal oxides.

[0048] The thickness of the adhesive layer 13 is preferably more than 0 nm and not more than 20 nm, particularly preferably 1 nm or more and not more than 10 nm, from the viewpoint of maintaining adhesion between the substrate and the optical functional layer 14 and obtaining good optical properties.

[0049] The optical function layer 14 is a laminate that exhibits an anti-reflection function. The optical function layer 14 is formed by alternately laminating high-refractive index layers 14a and low-refractive index layers 14b in this order from the transparent substrate 11 side, and is composed of a total of two layers in the example shown in Fig. 1 and a total of four layers in the example shown in Fig. 2. The number of high-refractive index layers 14a and low-refractive index layers 14b is not particularly limited and can be any number of layers.

[0050] Since the optical function layer 14 is made of a laminate in which low refractive index layers 14b and high refractive index layers 14a are alternately stacked, the light incident from the antifouling layer 15 side interferes with each other in the optical function layer 14, thereby reducing the intensity of the reflected light and providing an antireflection function. Therefore, an antireflection function is obtained that prevents light incident from the antifouling layer 15 side from being reflected in one direction.

[0051] The low refractive index layer 14b is made of, for example, SiO ２ This layer is mainly composed of SiO (oxide of silicon). ２ The single layer film is colorless and transparent. In this embodiment, the main component of the low refractive index layer 14b means a component that is contained in the low refractive index layer 14b in an amount of 50 mass % or more.

[0052] When the low-refractive-index layer 14b is a layer primarily composed of an oxide of Si, it may contain less than 50 mass% of another element, or may be composed of an oxide of Si. In this embodiment, silicon, which is the metal element of the metal oxide primarily contained in the low-refractive-index layer 14b, may be referred to as a "second metal element." The content of elements other than the oxide of Si is preferably 10% or less. Examples of other elements that may be included include Na for improving durability, Zr, Al, or N for improving hardness, and Zr and Al for improving alkali resistance.

[0053] The refractive index of the high refractive index layer 14a is preferably 2.00 to 2.60, and more preferably 2.10 to 2.45. The dielectric material used for the high refractive index layer 14a is niobium pentoxide (Nb ２ O ５ , refractive index 2.33), titanium oxide (TiO ２ , refractive index 2.33 to 2.55), tungsten oxide (WO ３ , refractive index 2.2), cerium oxide (CeO ２ , refractive index 2.2), tantalum pentoxide (Ta ２ O ５ , refractive index 2.16), zinc oxide (ZnO, refractive index 2.1), indium tin oxide (ITO, refractive index 2.06), zirconium oxide (ZrO ２, refractive index 2.2). In this embodiment, the metal element of the metal oxide contained as the main component in the high refractive index layer, such as niobium, titanium, tungsten, cerium, tantalum, zinc, or zirconium, may be referred to as the first metal element. When it is desired to impart conductive properties to the high refractive index layer 14a, for example, ITO or indium zinc oxide (IZO) can be selected.

[0054] The optical function layer 14 may include, for example, a high refractive index layer 14a made of niobium pentoxide (Nb ２ O ５ , refractive index 2.33), and SiO ２ It is preferable to use one consisting of:

[0055] The film thickness of the low-refractive index layer 14b may be in the range of 1 nm to 200 nm, and is appropriately selected depending on the wavelength range in which anti-reflection function is required. The film thickness of the high-refractive index layer 14a may be, for example, in the range of 1 nm to 200 nm, and is appropriately selected depending on the wavelength range in which anti-reflection function is required. The film thicknesses of the high-refractive index layer 14a and the low-refractive index layer 14b can each be appropriately selected depending on the design of the optical function layer 14. In the optical stack 102, for example, from the adhesive layer 13 side, the high-refractive index layer 14a can be 5 to 50 nm, the low-refractive index layer 14b can be 10 to 80 nm, the high-refractive index layer 14a can be 20 to 200 nm, and the low-refractive index layer 14b can be 50 to 200 nm. In the optical stack 101, the film thicknesses of the high-refractive index layer 14a and the low-refractive index layer 14b can also be selected to any desired thickness from the above-mentioned film thicknesses.

[0056] Of the layers forming the optical functional layer 14, a low refractive index layer 14b is disposed on the side facing the antifouling layer 15. That is, the high refractive index layers 14a and the low refractive index layers 14b are alternately disposed so that the layer in the optical functional layer 14 that is in contact with the antifouling layer 15 is the low refractive index layer 14b. When the low refractive index layer 14b of the optical functional layer 14 is in contact with the antifouling layer 15, the antireflection performance of the optical functional layer 14 is better than when the high refractive index layer 14a is in contact with the antifouling layer 15. Furthermore, as will be described in detail later, in the optical laminates 101 and 102, the Si element located on the outermost surface of the low refractive index layer 14b facing the antifouling layer 15 is bonded to the fluorine organic compound contained in the antifouling layer 15 via an oxygen atom.

[0057] The antifouling layer 15 is formed on the outermost surface of the optical functional layer 14 and prevents the optical functional layer 14 from being soiled or damaged. Furthermore, when the antifouling layer 15 is applied to a touch panel or the like, its abrasion resistance suppresses wear of the optical functional layer 14. The antifouling layer 15 of this embodiment is made of a vapor-deposited film formed by vapor-depositing an antifouling material. In this embodiment, the antifouling layer 15 is formed by vacuum-depositing a fluorine-based organic compound as the antifouling material on one surface of the low-refractive index layer 14b that constitutes the optical functional layer 14. In this embodiment, since the antifouling material contains a fluorine-based organic compound, the optical laminates 101, 102 have even better friction resistance and alkali resistance.

[0058] A compound comprising a fluorine-based organic compound and a reactive silyl group (e.g., alkoxysilane) is preferably used as the fluorine-based organic compound constituting the anti-fouling layer 15. The anti-fouling layer 15 preferably contains a compound having an alkoxysilyl group and a fluorine-modified organic group such as a perfluoropolyether group or a fluoroalkyl group. Commercially available products include Optool DSX (manufactured by Daikin Corporation) and the KY-100 series (manufactured by Shin-Etsu Chemical Co., Ltd.).

[0059] The fluorine-based organic compound constituting the antifouling layer 15 is a compound consisting of a fluorine-modified organic group and a reactive silyl group (for example, alkoxysilane), and the low refractive index layer 14b of the optical function layer 14 in contact with the antifouling layer 15 is made of SiO ２When a compound consisting of the above is used, the silanol groups generated from the reactive silyl groups of the fluorine-based organic compound and SiO ２ A siloxane bond is formed between the hydroxyl groups present on the surface, which is preferable because it improves the adhesion between the optical function layer 14 and the antifouling layer 15.

[0060] The optical thickness of the antifouling layer 15 may be in the range of 1 nm or more and 20 nm or less, and preferably in the range of 3 nm or more and 10 nm or less. If the thickness of the antifouling layer 15 is 1 nm or more, sufficient abrasion resistance can be ensured when the optical laminates 101, 102 are applied to touch panel applications, etc. Furthermore, if the thickness of the antifouling layer 15 is 3 nm or more, the liquid resistance, etc. of the optical laminates 101, 102 are improved. Furthermore, if the thickness of the antifouling layer 15 is 20 nm or less, the time required for vapor deposition can be shortened, allowing for efficient production.

[0061] In the optical laminates 101 and 102 configured as described above, SiO measured by X-ray photoelectron spectroscopy (ESCA) from the antifouling layer 15 side of the optical laminates 101 and 102 ２ The bond energy of is, for example, 103.25 eV or less. The bond energy is, for example, 103.00 eV or more, and more preferably 103.01 eV or more and 103.15 eV or less. Generally, SiO ２ The bond energy of is known to be 103.6 eV, and in the optical laminates 101 and 102, it takes a value lower than this value.

[0062] Furthermore, it is desirable that the alkali resistance be improved by such a wide scan measured by X-ray photoelectron spectroscopy (ESCA) from the antifouling layer 15 side of the optical laminates 101 and 102 that no metal elements other than those constituting the metal oxides used in the optical laminates are detected. That is, when the high refractive index layer 14a is composed of an oxide of a first metal and the low refractive index layer 14b is composed of an oxide of a second metal different from the first metal, it is preferable that the metal elements detected by ESCA are only the first metal element and the second metal element. When the optical laminate further includes an adhesive layer 13 and the adhesive layer is composed of an oxide of a third metal, it is preferable that the metal elements detected by ESCA are only the first metal element, the second metal element, and the third metal element. For example, when the adhesive layer is SiOx and the high refractive index layer is Nb ２ O ５ The low refractive index layer is a SiO ２ In the optical laminate, which is a film, it is preferable that no metal elements other than Si and Nb are detected. Metal elements that can be mixed into such an optical laminate, other than the metals that constitute the metal oxide used in the optical laminate, are mainly metals used in electrodes for plasma treatment, such as Al, Zr, and Ti.

[0063] In the optical laminates 101 and 102, as will be described in detail later, after the low refractive index layer 14b is formed, the low refractive index layer is subjected to plasma treatment in an environment where water vapor and argon gas are introduced, i.e., H ２ The low refractive index layer 14b is subjected to plasma treatment in an environment where O and Ar are present, thereby ２ The siloxane bonds of Si and O located on the outermost surface of the silicon dioxide are partially broken, and the H ２ It reacts with O to generate a hydroxy group bonded to Si, which then bonds to the fluorine-based organic compound that constitutes the antifouling layer 15 .

[0064] The optical laminates 101 and 102 exhibit high alkali resistance over the long term. Specifically, after dropping 0.1 (mol / L) aqueous NaOH solution and then leaving the laminate at 55°C for 4 hours, the ΔE value (see formula (1) below) is 8 or less, and preferably 4 or less. If there is no change from before the dropping of the aqueous NaOH solution to after 4 hours, the ΔE value is 0. The ΔE value of the optical laminates 101 and 102 is 0 or more, and may be 0.5 or more.

[0065] ΔE ＊ ａｂ = {(L ＊ ２ -L ＊ １ ) ２ + (a ＊ ２ -a ＊ １ ) ２ +(b ＊ ２ -b ＊ １ ) ２} １／２ ...(1) (In formula (1), L ＊ １ : Brightness before adding NaOH aq., L ＊ ２ : Brightness after a predetermined time has passed since the dropping of NaOH aq. ＊ １ : Color before adding NaOH aq., a ＊ ２ : Color after leaving for a predetermined time after dropping NaOH aq., b ＊ １ : Color before adding NaOH aq., b ＊ ２ : Color after leaving for a predetermined time after dropping NaOH aq.

[0066] [Article] FIG. 3 is a perspective view showing an example of the configuration of an article to which an optical laminate according to one embodiment of the present invention is applied. The optical laminates 101 and 102 of this embodiment are provided on the display surface of an image display unit of an article such as a liquid crystal display panel or an organic EL display panel. While FIG. 3 shows an example in which the optical laminate 101 is provided on a main portion 202 surrounded by a frame 201 of the article 200, the optical laminate 102 may also be provided. Furthermore, the article is not limited to image display devices, and may be any object to which an optical laminate can be applied, such as goggles having the optical laminate of this embodiment provided on their surface, the light-receiving surface of a solar cell, a smartphone screen or personal computer display, an information input terminal, a tablet terminal, an AR (augmented reality) device, a VR (virtual reality) device, an electronic display board, the surface of a glass table, an amusement machine, a navigation support device for an aircraft or train, a navigation system, an instrument panel, or the surface of an optical sensor. For example, the optical laminate may be attached to the curved surface of an article having a curved surface. Preferably, the article according to this embodiment has the optical laminate provided on the surface of a touch panel. The main portion 202 of the article 200 is typically a display portion corresponding to the screen in an article having a screen, and is, for example, a light-transmitting portion that transmits light in an article without a screen. The article according to the present embodiment has such a configuration, and can exhibit long-term durability even when maintenance is performed in which acidic dirt such as sebum is removed with an alkaline chemical or the like.

[0067] [Method for Manufacturing Optical Laminate] The optical laminates 101, 102 of this embodiment shown in FIGS. 1 and 2 can be manufactured, for example, by the method described below. In this embodiment, as an example of a method for manufacturing the optical laminates 101, 102, a case in which the optical laminates 101, 102 are manufactured using a transparent substrate 11 wound in a roll shape will be described. First, the transparent substrate 11 wound in a roll shape is unwound. Then, a slurry containing a material that will become the hard coat layer 12 is applied to the transparent substrate 11 by a known method, and cured by a known method corresponding to the material that will become the hard coat layer 12. In this way, the hard coat layer 12 is formed (hard coat layer forming step). Thereafter, the transparent substrate 11 with the hard coat layer 12 formed on its surface is wound into a roll by a known method.

[0068] Next, an adhesion layer forming step is performed to form an adhesion layer 13 on the hard coat layer 12, and an optical function layer forming step is performed to form an optical function layer 14. The optical function layer forming step includes a high refractive index layer forming step to form a high refractive index layer 14a and a low refractive index layer forming step to form a low refractive index layer 14b in a dry atmosphere. In this embodiment, a dry atmosphere means that it is not a humid atmosphere, and that water vapor is not allowed to flow. Thereafter, a plasma treatment step is performed to plasma treat the low refractive index layer 14b, and an antifouling layer forming step is performed to form an antifouling layer 15 on the surface. In the plasma treatment step, plasma treatment is performed on the low refractive index layer 14b in an environment where a mixed gas of water vapor and argon gas is introduced. That is, the plasma treatment step is performed using H ２ The plasma treatment is carried out in an atmosphere containing O and Ar. The flow rate of water vapor in the mixed gas of water vapor and argon gas introduced in the plasma treatment step can be, for example, 2% to 100%, and preferably 10% to 90%. Here, the flow rate of H in the mixed gas in the plasma treatment step can be, for example, 2% to 100%, and preferably 10% to 90%. ２ The flow rate of O is determined by the ratio of H to the total flow rate (sccm) of gases flowed as reactive gases in plasma processing. ２ It means the ratio of the flow rate of O (the total flow rate minus the flow rate of argon gas) (sccm).

[0069] The electrode power density in the plasma treatment process was 1400 W / m２ More than 44,200W / m ２ For example, 4400 W / m ２ or more, 18000 W / m ２ or less, 7000 W / m ２ More than 14000W / m ２ It is preferable that:

[0070] In the low refractive index layer forming step, the low refractive index layer is formed by sputtering.

[0071] In the antifouling layer forming step, the antifouling layer 15 is formed by a vapor deposition method. The antifouling layer 15 preferably contains a compound having an alkoxysilyl group and a fluorine-modified organic group such as a perfluoropolyether group or a fluoroalkyl group. In this embodiment, it is preferable to perform a surface treatment step of treating the surface of the hard coat layer 12 before the optical function layer forming step, and then perform the adhesion layer forming step and the optical function layer forming step.

[0072] An example of a manufacturing apparatus that can be used in the manufacturing method of the optical laminate of this embodiment is a manufacturing apparatus 20 shown in Fig. 4. The manufacturing apparatus 20 is a roll-to-roll type manufacturing apparatus that unwinds a substrate from a roll, passes the substrate successively through connected devices (pretreatment device 2A, sputtering device 1, pretreatment device 2B, and vapor deposition device 3 in Fig. 4), and then winds the substrate, thereby continuously forming multiple layers on the substrate.

[0073] When the optical laminates 101 and 102 are manufactured using a roll-to-roll manufacturing apparatus, the conveying speed (line speed) of the optical laminates 101 and 102 during manufacturing can be appropriately set. The conveying speed is, for example, preferably 0.5 to 20 m / min, and more preferably 0.5 to 10 m / min.

[0074] <Roll Unwinding Device> The roll unwinding device 4 has a chamber 34 the interior of which is maintained at a predetermined reduced pressure, one or more vacuum pumps 21 (one in FIG. 4 ) that exhaust gas from the chamber 34 to create a reduced pressure atmosphere, and an unwinding roll 23 and a guide roll 22 installed in the chamber 34. As shown in FIG. 4 , the chamber 34 is connected to the chamber 31 of the sputtering device 1. The transparent substrate 11 having the hard coat layer 12 formed on its surface is wound around the unwinding roll 23. The unwinding roll 23 supplies the transparent substrate 11 having the hard coat layer 12 formed on its surface to the pretreatment device 2A at a predetermined transport speed.

[0075] <Pretreatment Device 2A> The pretreatment device 2A has a chamber 32, the interior of which is kept at a predetermined reduced pressure, a can roll 26, a plurality of guide rolls 22 (two in FIG. 4), and a plasma discharge device 42. As shown in FIG. 4, the can roll 26, the guide rolls 22, and the plasma discharge device 42 are installed in the chamber 32. As shown in FIG. 4, the chamber 32 is connected to the chamber 31 of the sputtering device 1.

[0076] The can roll 26 and the guide roll 22 transport the transparent substrate 11 on which the hard coat layer 12 has been formed, sent from the roll unwinding device 4, at a predetermined transport speed, and deliver the transparent substrate 11 with the surface of the hard coat layer 12 treated to the sputtering device 1. As shown in FIG. 4 , the plasma discharge device 42 is disposed opposite the outer circumferential surface of the can roll 26 at a predetermined distance. The plasma discharge device 42 ionizes a gas by glow discharge. The gas is preferably inexpensive, inert, and does not affect optical properties. Examples of suitable gases include argon gas, oxygen gas, nitrogen gas, and helium gas. Argon gas is preferred because it has a large mass, is chemically stable, and is readily available. In this embodiment, the plasma discharge device 42 is preferably a glow discharge device that ionizes argon gas using high-frequency plasma.

[0077] <Sputtering Apparatus> The sputtering apparatus 1 has a chamber 31 inside which a predetermined reduced pressure atmosphere is maintained, one or more vacuum pumps 21 (two in FIG. 4 ) that exhaust gas from the chamber 31 to create a reduced pressure atmosphere, a film-forming roll 25, a plurality of (two in FIG. 4 ) guide rolls 22, and a plurality of (four in the example shown in FIG. 4 ) film-forming units 41. As shown in FIG. 4 , the film-forming roll 25, the guide roll 22, and the film-forming units 41 are installed in the chamber 31. As shown in FIG. 4 , the chamber 31 is connected to a chamber 32 of the pretreatment device 2B.

[0078] The film-forming roll 25 and the guide roll 22 transport the transparent substrate 11 having the surface-treated hard coat layer 12 formed thereon, sent from the pretreatment device 2A, at a predetermined transport speed, and supply the transparent substrate 11 having the adhesion layer 13 and the optical function layer 14 formed on the hard coat layer 12 to the pretreatment device 2B. In the sputtering device 1 shown in Fig. 4, the adhesion layer 13 is laminated by sputtering on the hard coat layer 12 of the transparent substrate 11 traveling on the film-forming roll 25, and high refractive index layers 14a and low refractive index layers 14b are alternately laminated thereon to form the optical function layer 14.

[0079] The film forming units 41 are arranged facing the outer peripheral surface of the film forming roll 25 at a predetermined distance, and multiple film forming units 41 are provided to surround the film forming roll 25. The number of film forming units 41 is determined based on the total number of layers of the adhesive layer 13 and the high-refractive index layers 14a and low-refractive index layers 14b that form the optical functional layer 14. If the total number of layers of the adhesive layer 13 and the high-refractive index layers 14a and low-refractive index layers 14b that form the optical functional layer 14 is large and it is difficult to ensure the distance between adjacent film forming units 41, multiple film forming rolls 25 may be provided in the chamber 31, and film forming units 41 may be arranged around each film forming roll 25. When multiple film forming rolls 25 are provided, additional guide rolls 22 may be installed as necessary. Multiple chambers 31 each equipped with a film forming roll 25 and a film forming unit 41 may be connected together. Furthermore, the diameter of the film forming roll 25 may be appropriately changed to make it easier to ensure the distance between adjacent film forming units 41.

[0080] A predetermined target (not shown) is installed in each film forming unit 41. A voltage is applied to the target using a known structure. In this embodiment, a gas supply unit (not shown) that supplies a predetermined reactive gas and carrier gas to the target at a predetermined flow rate, and a known magnetic field generating source (not shown) that forms a magnetic field on the surface of the target are installed near the target.

[0081] The target material and the type and flow rate of the reactive gas are appropriately determined depending on the compositions of the adhesive layer 13, the high refractive index layer 14a, and the low refractive index layer 14b formed on the transparent substrate 11 by passing between the film forming unit 41 and the film forming roll 25. For example, the low refractive index layer 14b may be made of SiO ２ In order to form a layer containing as a main component, Si was used as a target and O was used as a reactive gas. ２ For example, Nb ２ O ５ When forming the high refractive index layer 14a containing Nb as a main component, Nb is used as the target and O is used as the reactive gas. ２ is used.

[0082] In this embodiment, it is preferable to use magnetron sputtering as the sputtering method from the viewpoint of increasing the film formation rate. However, the sputtering method is not limited to magnetron sputtering, and a two-pole sputtering method using plasma generated by direct current glow discharge or high frequency, a three-pole sputtering method with a hot cathode, or the like may also be used.

[0083] The sputtering apparatus 1 is equipped with an optical monitor (not shown) as a measurement unit that measures optical properties after forming each layer that will become the adhesion layer 13 and the optical functional layer 14. This makes it possible to confirm the quality of the formed adhesion layer 13 and optical functional layer 14. When the sputtering apparatus 1 has, for example, two or more chambers, it is preferable to install an optical monitor in each chamber.

[0084] An example of an optical monitor (not shown) is one that uses an optical head capable of scanning in the width direction to measure the optical properties in the width direction of the adhesion layer 13 and the optical functional layer 14 formed on the hard coat layer 12. When such an optical monitor is provided, for example, the peak wavelength of reflectance is measured as the optical property, and converted into an optical thickness, thereby making it possible to measure the optical thickness distribution in the width direction of the adhesion layer 13 and the optical functional layer 14. By measuring the optical properties using the optical monitor, it is possible to form optical laminates 101, 102 that include an adhesion layer 13 and an optical functional layer 14 having optimal optical properties while adjusting the sputtering conditions in real time.

[0085] <Pretreatment Device 2B> Pretreatment device 2B has a chamber 32, the interior of which is maintained at a predetermined reduced pressure, a can roll 26, a plurality of guide rolls 22 (two in FIG. 4 ), and a plasma discharge device 44. As shown in FIG. 4 , can roll 26, guide rolls 22, and plasma discharge device 44 are installed in chamber 36. Pretreatment device 2B is connected to a mixed gas adjustment unit 60 that introduces a mixed gas into chamber 36. As shown in FIG. 4 , chamber 36 is connected to chamber 33 of vapor deposition device 3.

[0086] The can roll 26 and the guide roll 22 transport the transparent substrate 11, on which each layer up to the optical functional layer 14 has been formed, sent from the sputtering device 1 at a predetermined transport speed, and send the transparent substrate 11, on which the surface of the optical functional layer 14 has been treated, to the vapor deposition device 3. As the plasma discharge device 44, for example, one similar to the pretreatment device 2A can be used.

[0087] As shown in Figure 4, the plasma discharge device 44 is disposed opposite the outer circumferential surface of the can roll 26 at a predetermined distance. The plasma discharge device 44 ionizes gas by glow discharge. As the gas, water vapor and argon gas can be used, and other gases such as oxygen gas, nitrogen gas, and helium gas can also be mixed. That is, H2O is supplied from the mixed gas adjustment unit 60 to the chamber 36 in which the plasma discharge device 44 is provided. ２A mixed gas containing O and argon gas can be introduced. In this embodiment, it is preferable to use a glow discharge device that ionizes argon gas by high-frequency plasma as the plasma discharge device 44.

[0088] The electrode power density in the plasma treatment process was 1400 W / m ２ More than 44,200W / m ２ is equal to or less than 4400 W / m ２ More than 18000W / m ２ less than 7000 W / m ２ More than 14000W / m ２ More preferably, it is:

[0089] Fig. 5 is a diagram showing an example of the pretreatment device 2B in the manufacturing apparatus shown in Fig. 4. Fig. 5 shows an enlarged view of an example of the mixed gas adjustment unit 60 shown in a simplified form in Fig. 4. The mixed gas adjustment unit 60 includes, for example, an argon gas supply source 61, a water vapor supply source 62 containing water, a heater 63 for heating the water vapor supply source 62, an adjustment chamber 65 connected to the argon gas supply source 61 and the water vapor supply source 62, a vacuum pump 64 for exhausting gas from the adjustment chamber 65, and a H ２ 5 is provided with a thermometer 66. The component indicated by the symbol NB in ​​Fig. 5 represents a needle valve, and the component indicated by the symbol MFC represents a mass flow controller.

[0090] Argon gas, the flow rate of which is measured by a mass flow controller (MFC1), and water vapor contained in a water vapor supply source 62 and evaporated by heating by a heater 63 are supplied into the adjustment chamber 65 from an argon gas supply source. A mixed gas of argon gas and water vapor, the flow rate of which is adjusted by a mass flow controller (MFC2) provided between the adjustment chamber 65 and the chamber 36, is supplied, and the gas in the adjustment chamber 65 that is not supplied into the chamber 36 is exhausted by a vacuum pump 64.

[0091] It has been found that argon gas is introduced into the chamber 36 from the adjustment chamber 65 with priority over water vapor. The proportion of each gas composition in the chamber 36 can be measured by a partial pressure vacuum gauge (not shown) provided in the chamber 36. The flow rate of water vapor relative to the total of argon gas and water vapor (total mixed gas) supplied into the chamber 36 is thought to depend on the absolute value of the flow rate of argon gas. By previously experimenting with the dependence of the flow rate of water vapor relative to the total mixed gas on the flow rate of argon gas, it is possible to adjust the flow rate of argon gas to achieve the desired flow rate of water vapor relative to the total mixed gas supplied into the chamber 36.

[0092] <Vapor Deposition Apparatus> The vapor deposition apparatus 3 includes a chamber 33 the interior of which is maintained at a predetermined reduced pressure, one or more vacuum pumps 21 (one in FIG. 4 ) that evacuate gas from the chamber 33 to create a reduced pressure atmosphere, multiple guide rolls 22 (four in FIG. 4 ), a vapor deposition source 43, and a heating device 53. As shown in FIG. 4 , the guide rolls 22 and the vapor deposition source 43 are installed in the chamber 33. The chamber 33 is connected to a chamber 35 of the roll winding device 5.

[0093] The vapor deposition source 43 is disposed opposite the transparent substrate 11, the surface of which is treated and is being transported substantially horizontally between two adjacent guide rolls 22. The vapor deposition source 43 supplies evaporation gas composed of the material that will become the antifouling layer 15 onto the optical function layer 14. The orientation of the vapor deposition source 43 can be set as desired. The heating device 53 heats the material that will become the antifouling layer 15 to a vapor pressure temperature. The heating device 53 can be a resistance heating device, a heater heating device, an induction heating device, an electron beam heating device, or the like. In the resistance heating device, a container containing the antifouling material that will become the antifouling layer 15 is heated by passing electricity through it as a resistor. In the heater heating device, the container is heated by a heater disposed around the container. In the induction heating device, the container or the antifouling material is heated by electromagnetic induction from an externally installed induction coil.

[0094] The vapor deposition device 3 includes a guide plate (not shown) that guides the vapor deposition material evaporated by the vapor deposition source 43 to a predetermined position, a film thickness meter (not shown) that observes the thickness of the antifouling layer 15 formed by vapor deposition, a vacuum pressure gauge (not shown) that measures the pressure inside the chamber 33, and a power supply (not shown). The guide plate may have any shape as long as it can guide the evaporated vapor deposition material to the desired position. If the guide plate is not necessary, it does not have to be provided. For example, an ion gauge can be used as the vacuum pressure gauge. For example, a high-frequency power supply can be used as the power supply.

[0095] <Roll Winding Device> The roll winding device 5 has a chamber 35 the interior of which is maintained at a predetermined reduced pressure, one or more vacuum pumps 21 (one in FIG. 4 ) that exhaust gas from the chamber 35 to create a reduced pressure atmosphere, and a winding roll 24 and a guide roll 22 installed in the chamber 35. The transparent substrate 11 (optical laminates 101, 102) having each layer up to the antifouling layer 15 formed on its surface is wound around the winding roll 24. The winding roll 24 and the guide roll 22 wind up the optical laminates 101, 102 at a predetermined winding speed. A carrier film may also be used as necessary.

[0096] The vacuum pump 21 provided in the manufacturing apparatus 20 may be, for example, a dry pump, an oil rotary pump, a turbomolecular pump, an oil diffusion pump, a cryopump, a sputter ion pump, or a getter pump. The vacuum pump 21 may be appropriately selected or combined to create a desired reduced pressure state in each of the chambers 31, 32, 33, 34, and 35.

[0097] The vacuum pump 21 may be installed at any position and in any number in the manufacturing apparatus 20 as long as it can maintain both the chamber 31 of the sputtering apparatus 1 and the chamber 33 of the vapor deposition apparatus 3 at a desired reduced pressure. In the manufacturing apparatus 20 shown in Fig. 4, the roll unwinding device 4, the pretreatment device 2A, the sputtering apparatus 1, the pretreatment device 2B, the vapor deposition apparatus 3, and the roll winding device 5 are connected to each other. Therefore, the vacuum pump 21 may be installed in each of the chambers 31, 32, 33, 34, and 35, or may be installed in only some of the chambers 31, 32, 33, 34, and 35 as long as it can maintain both the chamber 31 of the sputtering apparatus 1 and the chamber 33 of the vapor deposition apparatus 3 at a desired reduced pressure.

[0098] Next, a method for manufacturing optical laminates 101 and 102 using a roll-to-roll method will be described, in which a high refractive index layer forming process, a low refractive index layer forming process, a plasma treatment process, and an antifouling layer forming process are performed on a substrate using a manufacturing apparatus 20 shown in FIG.

[0099] First, the unwinding roll 23 around which the transparent substrate 11 having the hard coat layer 12 formed on its surface is wound is placed in the chamber 34 of the roll unwinding device 4. Then, the unwinding roll 23 and the guide roll 22 are rotated to feed the transparent substrate 11 having the hard coat layer 12 formed on its surface to the pretreatment device 2A at a predetermined transport speed.

[0100] Next, in the chamber 32 of the pretreatment device 2A, a surface treatment step is performed as a pretreatment for the surface on which the adhesion layer 13 and the optical functional layer 14 are to be formed. In this embodiment, the surface treatment step is performed on the transparent substrate 11 on which the hard coat layer 12 is formed. In the surface treatment step, the can roll 26 and the guide roll 22 are rotated to transport the transparent substrate 11 on which the hard coat layer 12 is formed at a predetermined transport speed, while treating the surface of the hard coat layer 12 running on the can roll 26.

[0101] Examples of methods that can be used to treat the surface of the hard coat layer 12 include glow discharge treatment, plasma treatment, ion etching, and alkali treatment. Among these, glow discharge treatment is preferred because it allows for large-area treatment. The glow discharge treatment can be performed at a treatment intensity of, for example, 0.1 to 10 kWh. By performing glow discharge treatment on the surface of the hard coat layer 12, the surface of the hard coat layer 12 is roughened at the nanometer level and substances with weak bonding strength that are present on the surface of the hard coat layer 12 are removed. As a result, adhesion between the hard coat layer 12 and the optical functional layer 14 formed on the hard coat layer 12 is improved.

[0102] Next, an adhesion layer forming step and an optical function layer forming step are performed in the chamber 31 of the sputtering apparatus 1. Specifically, the film forming roll 25 and the guide roll 22 are rotated to transport the transparent substrate 11 on which the hard coat layer 12 has been formed at a predetermined transport speed, and the adhesion layer 13 and the optical function layer 14 are formed on the hard coat layer 12 running on the film forming roll 25.

[0103] Next, an adhesion layer forming step and an optical function layer forming step are performed in the chamber 31 of the sputtering apparatus 1. The adhesion layer forming step and the optical function layer forming step are performed, for example, while rotating the film forming roll 25 and the guide roll 22 and transporting the transparent substrate 11 on which the hard coat layer 12 has been formed at a predetermined transport speed.

[0104] In this embodiment, first, the adhesive layer 13 is formed by sputtering while changing the target material installed in each film forming unit 41 or the type and flow rate of the reactive gas supplied from the gas supply unit. Then, in the high-refractive-index layer forming process and the low-refractive-index layer forming process, high-refractive-index layers 14a and low-refractive-index layers 14b are alternately laminated on the substrate. In the high-refractive-index layer forming process, a high-refractive-index layer is formed on the substrate directly or via another layer. Here, in this embodiment, "on the substrate" means on the transparent substrate 11, and does not necessarily have to be in direct contact with the transparent substrate 11. In this embodiment, the high-refractive-index layer 14a and the low-refractive-index layer 14b are formed on the transparent substrate 11 via the hard coat layer 12 and the adhesive layer 13.

[0105] When a SiOx film is formed as the adhesion layer 13, a silicon target is used and oxygen gas and argon are introduced. When the adhesion layer 13, the high-refractive index layer 14a, and the low-refractive index layer 14b are successively laminated by sputtering, different target materials may be used when forming the high-refractive index layer 14a and the low-refractive index layer 14b during the formation of the adhesion layer 13. Alternatively, for example, one type of material may be used as the target, and layers composed of the target material and layers composed of an oxide of the target material may be alternately formed by changing the oxygen (reactive gas) flow rate during sputtering to form the adhesion layer 13, the high-refractive index layer 14a, and the low-refractive index layer 14b.

[0106] During the low refractive index layer forming process, H ２ The process is carried out in a dry atmosphere without introducing O. ２ When O is introduced, the SiO ２ When the siloxane bond inside the optical functional layer is broken and a hydroxyl group is generated, the SiO ２ It is thought that hydroxy groups bonded to Si elements inside the optical functional layer, but not on the surface, are not substituted with a silane coupling agent, and therefore hydroxy groups bonded to Si elements inside the low refractive index layer away from the surface do not contribute to improving the alkali resistance of the optical laminate even after undergoing the antifouling layer forming step.

[0107] The sputtering pressure during the formation of the adhesion layer 13 and the optical function layer 14 may be 2 Pa or less, preferably 1 Pa or less, more preferably 0.6 Pa or less, and particularly preferably 0.2 Pa or less. When the sputtering pressure is reduced to 1 Pa or less, the mean free path of the film-forming molecules becomes longer, and the film-forming molecules are deposited while maintaining high energy, resulting in a denser and better film quality.

[0108] Thereafter, the transparent substrate 11 having the adhesive layer 13 and the optical functional layer 14 formed on the hard coat layer 12 is sent to the pretreatment device 2B by the rotation of the film-forming roll 25 and the guide roll 22. In the pretreatment device 2B, a plasma treatment step is performed. In the plasma treatment step, the low refractive index layer 14b is plasma-treated in an environment where a mixed gas of water vapor and argon gas is introduced. That is, in the plasma treatment step, H is used as a reactive gas. ２ The plasma treatment is carried out in an atmosphere containing O and Ar. The mixed gas introduced in the plasma treatment step preferably consists of only water vapor and argon gas. The atmosphere in the chamber 32 of the pretreatment device 2B where the plasma treatment step is carried out is preferably an atmosphere containing water vapor and argon gas.

[0109] In the pretreatment device 2B, a pretreatment is performed on the low refractive index layer 14b located on the outermost surface of the optical laminate before the antifouling layer 15 is formed. The pretreatment is a plasma treatment of the surface of the low refractive index layer 14b in an atmosphere containing water vapor and argon gas. Specifically, a plasma discharge device 44 is used to treat the surface of the low refractive index layer 14b with Ar gas and H ２ A glow discharge treatment is performed in which one or both of the O gases are ionized by high frequency plasma.

[0110] As described above, the atmosphere in the chamber 36 is an atmosphere containing water vapor and argon gas. Although oxygen gas, nitrogen gas, helium gas, etc. may also be mixed in, an atmosphere consisting solely of water vapor and argon gas is preferred. The introduction of water vapor and argon gas into the chamber 36 can be performed, for example, by a mixed gas adjustment unit 60. In the mixed gas adjustment unit 60, a mixed gas that has passed through a mass flow controller (MFC2) and a needle valve (NB) from an adjustment chamber 65 is introduced into the chamber 36. As described above, argon gas, the flow rate of which is measured by a mass flow controller (MFC1) from the argon gas supply source 61, and water vapor from the water vapor supply source 62 are supplied to the adjustment chamber 65. It has been confirmed that, of the mixed gases introduced from the adjustment chamber 65 into the chamber 36, argon gas is introduced preferentially over water vapor. Therefore, the flow rate ratio (target %) of water vapor in the mixed gas supplied into chamber 36 can be calculated based on an approximation curve of the dependency of the flow rate ratio of water vapor in the total flow rate of argon gas and water vapor supplied into chamber 36 on the flow rate of argon gas supplied into chamber 36, which has been confirmed in advance through experiments.

[0111] The flow rate (target %) of water vapor in the mixed gas introduced into the chamber 36 can be, for example, 2% or more and 100% or less, and preferably 10% or more and 90% or less. By performing the plasma treatment process under the above conditions, the surface of the low refractive index layer 14b of the optical laminate becomes hydrophilic, and in the anti-fouling layer formation process described below, the fluorine-based organic compound constituting the anti-fouling layer easily bonds with the hydroxy groups generated in the low refractive index layer 14b. This makes it possible to increase the amount of fluorine-based organic compound constituting the anti-fouling layer on the outermost surface of the optical laminate 101, 102. If the moisture content of the atmosphere in the chamber 36 is excessive, some of the hydroxy groups will not bond with the fluorine-based organic compound, and some hydroxy groups will remain on the surface. When the optical laminate is exposed to an alkaline solution or atmosphere, alkali metals may replace H on the surface, leading to deterioration due to the alkaline solution or atmosphere. Due to this mechanism, it is believed that long-term alkali resistance is particularly high when the moisture content of the atmosphere in the plasma treatment process is below a predetermined value.

[0112] 4 and 5, the argon gas and water vapor in the mixed gas are once stored in the adjusting chamber 65 and then supplied into the chamber 36, so the ratio of water vapor to the total amount of argon gas and water vapor in the atmosphere in the chamber 36 does not necessarily match the flow rate ratio of water vapor in the mixed gas. The ratio (actual ratio) of water vapor to the total amount of water vapor and argon gas in the atmosphere present in the chamber 36 is, for example, more than 0.5% and not more than 70%, preferably 6% to 65%, and more preferably 6.5% to 50%.

[0113] The total pressure in the chamber during the plasma treatment step is preferably set to 0.008 Pa or more and 0.02 Pa or less.

[0114] Thereafter, the transparent substrate 11 with the treated surface of the optical functional layer 14 is sent to the vapor deposition device 3 by the rotation of the can roll 26 and the guide roll 22. Next, an antifouling layer forming step is performed in the chamber 33 of the vapor deposition device 3. In this embodiment, the antifouling layer forming step is performed on the laminate whose surface of the outermost low refractive index layer 14b has been plasma-treated in the plasma treatment step. In the antifouling layer forming step, the guide roll 22 is rotated to transport the transparent substrate 11 with the treated surface of the optical functional layer 14 at a predetermined transport speed, while vapor deposition sources 43 are vapor-deposited on the surface of the optical functional layer 14.

[0115] In this embodiment, for example, an antifouling material made of a fluorine-based organic compound that will become the antifouling layer 15 is heated to a vapor pressure temperature using a heating device 53, and the resulting evaporated gas is supplied from a vapor deposition source 43 in a reduced pressure environment and adhered to the surface-treated optical function layer 14, thereby forming the antifouling layer 15 by vacuum deposition. As the antifouling material, a compound made of a fluorine-modified organic group and a reactive silyl group (e.g., alkoxysilane) is preferably used as the fluorine-based organic compound. Commercially available products include Optool DSX (manufactured by Daikin Corporation) and the KY-100 series (manufactured by Shin-Etsu Chemical Co., Ltd.).

[0116] The pressure during vacuum deposition of the antifouling layer 15 is, for example, preferably 0.05 Pa or less, more preferably 0.01 Pa or less, and particularly preferably 0.001 Pa or less. When the pressure during vacuum deposition is a reduced pressure of 0.05 Pa or less, the mean free path of the film-forming molecules is long and the deposition energy is high, resulting in a denser and better antifouling layer 15.

[0117] By the method described above, the optical laminates 101 and 102 shown in FIGS. 1 and 2 can be manufactured.

[0118] The optical laminate according to this embodiment may be an optical laminate that does not have the hard coat layer 12 and the adhesive layer 13. When forming such an optical laminate, a substrate that does not have the hard coat layer 12, i.e., a substrate made of the transparent substrate 11, may be used, and the surface treatment step and the adhesive layer formation step may be omitted. Furthermore, in this embodiment, "on the substrate" only needs to be located above the transparent substrate 11, and may not be in contact with the transparent substrate 11.

[0119] According to the above embodiment, by performing the plasma treatment process under conditions in which a mixed gas of argon gas and water vapor is introduced, in addition to the hydroxyl groups that bond to Si on the outermost surface of the optical function layer 14 within a few nanometers from the surface thereof, which are generated by the plasma treatment using argon gas, the hydroxyl groups generated by hydrolysis of SiO bonds near the outermost surface of the optical function layer 14 can easily react with the fluorine-based organic compound having a reactive silyl group that constitutes the antifouling layer 15. In other words, the amount of fluorine-based organic compound in the antifouling layer 15 formed on the optical function layer 14 can be increased, and even if an alkaline solution adheres to the surface of the optical laminates 101 and 102, the amount of exposure of the SiO bonds in the optical function layer 14 can be reduced. Here, by forming the low refractive index layer 14b in a dry atmosphere, the increase in hydroxyl groups and hydrolysis that do not contribute to bonding with the antifouling layer 15 within the low refractive index layer 14b can be suppressed, thereby suppressing deterioration of the optical properties.

[0120] Furthermore, glow discharge treatment in the plasma treatment step on the low refractive index layer 14b can increase the surface energy of the optical functional layer 14, making it easier to adhere the antifouling layer 15. Glow discharge makes the layer hydrophilic, reducing the water contact angle and reducing the amount of fluorine-based organic compound that cannot adhere to the substrate and becomes free. In this way, according to this embodiment, an optical laminate with excellent long-term alkali resistance can be provided.

[0121] Although the embodiments of the present invention have been described in detail above, the present invention is not limited to the above embodiments, and various omissions, substitutions, modifications, and alterations are possible within the scope of the gist of the present invention as set forth in the claims. These embodiments and their modifications are included in the scope of the invention as set forth in the claims and their equivalents, as well as in the scope and gist of the invention.

[0122] The upper and / or lower limits of the numerical ranges described herein can be arbitrarily combined to define a preferred range. For example, the upper and lower limits of the numerical ranges can be arbitrarily combined to define a preferred range, the upper limits of the numerical ranges can be arbitrarily combined to define a preferred range, and the lower limits of the numerical ranges can be arbitrarily combined to define a preferred range.

[0123] Throughout this disclosure, singular terms should be understood to include the plural concept unless otherwise specified. Thus, singular articles (e.g., "a," "an," "the," etc. in English) should be understood to include the plural concept unless otherwise specified.

[0124] Examples of the present invention will be described below. Note that the optical laminates produced in the following examples and comparative examples are examples that function as anti-reflection films, and the gist of the present invention is not limited to these.

[0125] Example 1-1 First, a resin film was prepared by forming a 4 μm thick acrylic resin coating (hard coat layer) containing silicon oxide fine particles on a TAC substrate having a thickness of 80 μm as a transparent substrate.

[0126] Next, using a roll-to-roll method, an adhesive layer was formed on the transparent substrate on which the hard coat layer had been formed by the method described below, and then high refractive index layers and low refractive index layers were alternately formed as optical functional layers.After forming the low refractive index layer located on the uppermost surface of the optical functional layers, a plasma treatment process was performed, and then an anti-fouling layer was formed, thereby producing an optical laminate (anti-reflection film).

[0127] The manufacturing apparatus used was the manufacturing apparatus 20 shown in Fig. 4. The line speed was 2 m / min. The total pressure during formation of the optical laminate was 1 Pa or less.

[0128] The treatment speed of the glow discharge treatment for the hard coat layer 12 was 400 W·min / m ２ Then, on the hard coat layer 12 after the glow discharge treatment, a 5 nm thick adhesion layer 13 made of SiOx was formed by sputtering in a chamber with a pressure of 1.0 Pa or less, and a 15 nm thick Nb ２ O ５ Film (high refractive index layer), SiO 38 nm thick ２ film (low refractive index layer), 30 nm thick Nb ２ O ５ film (high refractive index layer), and SiO ２ The optical function layer 14 (laminate) consisting of a film (low refractive index layer) was formed. ２ The reaction was carried out in a dry atmosphere without introducing O.

[0129] Next, the low refractive index layer was subjected to a plasma treatment in an atmosphere containing moisture and argon gas. The plasma treatment of the surface of the low refractive index layer was carried out by introducing water vapor and argon gas into a chamber. ２ The experiment was carried out in an atmosphere of O and Ar. The total flow rate of water vapor and argon gas from the adjusting chamber 65 into the chamber 36 was set to 500 sccm, and the amount of argon gas supplied from the argon gas supply source 61 to the adjusting chamber 65 was set to 500 sccm. In this way, in Example 1-1, the flow rate ratio of water vapor in the mixed gas of water vapor and argon gas introduced into the chamber 36 was set to 10%, and the flow rate ratio of argon gas was set to 90%. The flow rate ratio of water vapor in the mixed gas of water vapor and argon gas introduced into the chamber 36 was set to H ２ In Example 1-1, H ２ The target percentage is 10%. ２ O target % is the H obtained in advance ２ Based on the approximate curve for the average O ratio. ２The flow rate of argon gas is determined according to the target O %. ２ O, Ar, H ２ and O ２ The proportion of each of the amounts was measured using a partial pressure vacuum gauge (manufactured by ULVAC, Inc., model number: CGM051). ２ The proportion of the amount of O in the atmosphere in the chamber 36 was 9.4%. ２ The ratio of the amount of O to H ２ It may be indicated as O%.

[0130] The above H ２ The approximation curve for the average O proportion was obtained in advance by the following method. First, using the apparatus used in Example 1-1, predetermined amounts of argon gas and water vapor were supplied into a chamber under the same environment as in Example 1-1. At this time, the flow rate of argon gas was measured using a mass flow meter installed between the argon gas supply source and the chamber, and the proportion of each composition of gas in the chamber was measured using a partial pressure vacuum gauge installed in the chamber. The proportion of water vapor relative to the total mixed gas supplied into the chamber when the argon gas was set to 10, 20, 50, 100, 150, 175, 200, 250, 300, 400, and 500 SCCM was measured and plotted on a graph. Next, an approximation curve for the dependence of the flow rate of water vapor in the total mixed gas on the argon gas flow rate was created using the plotted data using the nonlinear least squares method. The argon gas flow rate required to obtain a predetermined amount of water vapor can be determined from this approximation curve.

[0131] The electrode power density of the glow discharge treatment when performing the glow discharge treatment on the outermost surface of the low refractive index layer is 4421 (W / m ２ )

[0132] Next, an antifouling layer 15 made of an alkoxysilane compound having a perfluoropolyether group (KY-1901, manufactured by Shin-Etsu Chemical Co., Ltd.), which is an organic compound having fluorine, was formed on the optical functional layer by vapor deposition at a pressure of 0.01 Pa or less and a vapor deposition temperature of 230° C., so as to have an optical thickness of 4 nm. The layer was then wound into a roll to obtain the optical laminate (antireflection film) of Example 1.

[0133] (1) Scratch resistance test using a waste cloth (nonwoven wiper) A scratch resistance test was carried out using a waste cloth (nonwoven wiper) (Bencotto Lint Free CT-8, manufactured by Asahi Chemical Industry Co., Ltd.) as the friction body. The test was carried out under a load of 250 g / cm. ２ The friction body was horizontally reciprocated 4,000 times.

[0134] The water contact angle of the test piece after rubbing was measured, and the water contact angles of the test piece before rubbing and after rubbing with 4000 horizontal reciprocating movements were determined. The test was carried out within 30 minutes after rubbing.

[0135] (2) Alkali Resistance Test The back surface of the optical laminate was attached to a black acrylic plate with transparent tape to eliminate back surface reflection. The untreated optical laminate was subjected to the CIE 1976 (L ＊ a ＊ b ＊ ) SCI color space brightness L ＊ , chromaticity a ＊ and b ＊ For the optical measurement, an integrating sphere spectrophotometer (SP-64, manufactured by X-rite Corporation) was used. The settings were a D65 light source and a viewing angle of 10°.

[0136] In addition, a 0.1 (mol / L) aqueous sodium hydroxide solution was prepared. The optical laminate was placed in a cylindrical member with an inner diameter of 38 mm, a reagent was dropped into the cylindrical member, and the upper opening was covered with a glass plate. Then, after leaving the liquid temperature at 55°C for 4 hours, each test piece was washed with distilled water to obtain a treated sample. The optical properties of the optical laminate after leaving for 4 hours were evaluated in the same manner as for the untreated optical laminate. The ΔE value of the optical laminate after 4 hours of treatment, expressed by the following formula (1), was measured relative to the untreated optical laminate. ΔE ＊ ａｂ = {(L ＊ ２ -L ＊ １ ) ２ + (a ＊ ２ -a ＊ １ ) ２ +(b ＊２ -b ＊ １ ) ２} １／２ ...(1) (In the formula, L ＊ １ : Brightness before adding NaOH aq., L ＊ ２ : Brightness after a predetermined time has passed since the dropping of NaOH aq. ＊ １ : Color before adding NaOH aq., a ＊ ２ : Color after leaving for a predetermined time after dropping NaOH aq., b ＊ １ : Color before adding NaOH aq., b ＊ ２ : Color after leaving for a predetermined time after dropping NaOH aq.

[0137] (3) Fluorine Amount Measurement Test The fluorine amount (cps: counts per unit time) of the optical laminate (test piece) was measured (fluorine amount before cleaning (fluorine amount in the initial state)).

[0138] The fluorine content was measured using an X-ray photoelectron spectrometer (Electron Spectroscopy for Chemical Analysis, ESCA) (PHI5000 VersaProbeIII, manufactured by ULVAC-PHI, Inc.) and an X-ray fluorescence analysis (XRF) (EDX-8000, manufactured by Shimadzu Corporation). The fluorine value (cps) determined by the X-ray photoelectron spectrometer and X-ray fluorescence analysis was an average value calculated from the results obtained by measurement in the initial state (n=3).

[0139] (4) SiO ２ Bond energy measurement test: The optical laminate was measured from the antifouling layer side by X-ray photoelectron spectroscopy (ESCA) as used in (3) under the following conditions. ２ In ESCA, the bond energy of SiO was measured at a distance of several nanometers from the surface of the optical laminate. ２ For reference, the bond energy of silicon alone is 99.2 eV, the bond energy of silicon is 102.4 eV, and the bond energy of SiO２ is 103.6 eV. In other words, if it is below 103.6 eV, it can be seen that the antifouling layer is formed thicker or with higher density. Similarly, a wide scan was also performed to confirm the metal elements contained in the optical laminate. Metal elements other than the metals constituting the optical laminate were also detected, and contamination of metal elements other than the metals constituting the metal oxide used in the optical laminate (metal elements other than Nb and Si in Example 1-1) was confirmed. ESCA measurement conditions Measurement: narrow scan, wide scan X-ray source: monoAl X-ray gun: 200 μmφ50w15V Dwel (1 step time): 20 ms Step (measurement interval): 0.05 eV Sweeps (accumulation): 10 times Pass energy: 55 eV

[0140] (Examples 1-2 to 1-5) The amount of argon gas supplied from the argon gas supply source 61 to the adjustment chamber 65 in the plasma treatment process for the surface of the low refractive index layer was adjusted to obtain the H ２ An optical laminate was produced and evaluated in the same manner as in Example 1-1, except that the target content was adjusted to 0%.

[0141] (Examples 2-1 to 2-3) In Examples 2-1 to 2-5, the electrode power density during the glow discharge treatment was set to 7516 (W / m ２ ) and the amount of argon gas supplied from the argon gas supply source 61 to the adjustment chamber 65 was adjusted to obtain the H ２ An optical laminate was produced and evaluated in the same manner as in Example 1-1, except that the H 2 O target % was adjusted. ２ The O% was as shown in Table 3.

[0142] (Examples 3-1 to 3-5) In Examples 3-1 to 3-5, during the plasma treatment process on the surface of the low refractive index layer, the electrode power density during glow discharge treatment was set to 8842 (W / m ２ ) and the amount of argon gas supplied from the argon gas supply source 61 to the adjustment chamber 65 was adjusted to obtain the H ２ An optical laminate was produced and evaluated in the same manner as in Example 1-1, except that the H 2 O target % was adjusted.２ The O% was as shown in Table 3.

[0143] (Examples 4-1 to 4-5) In Examples 4-1 to 4-5, during the plasma treatment process on the surface of the low refractive index layer, the electrode power density during the glow discharge treatment was set to 13263 (W / m ２ ) and the amount of argon gas supplied from the argon gas supply source 61 to the adjustment chamber 65 was adjusted to obtain the H ２ An optical laminate was produced and evaluated in the same manner as in Example 1-1, except that the H 2 O target % was adjusted. ２ The O% was as shown in Table 3.

[0144] (Examples 5-1 to 5-3) In Examples 5-1 to 5-3, the electrode power density during the glow discharge treatment was set to 17684 (W / m ２ ) and the amount of argon gas supplied from the argon gas supply source 61 to the adjustment chamber 65 was adjusted to obtain the H ２ An optical laminate was produced and evaluated in the same manner as in Example 1-1, except that the H 2 O target % was adjusted. ２ The O% was as shown in Table 3.

[0145] Comparative Example 1 An optical laminate was produced in the same manner as in Example 1-1, except that during the surface treatment of the low refractive index layer surface and the glow discharge treatment, water vapor was not introduced as a reactive gas into the chamber 36, and only argon gas was flowed. ２ The O% was as shown in Table 4.

[0146] Comparative Example 2 An optical laminate was produced in the same manner as in Example 2-1, except that during the surface treatment of the low refractive index layer surface and the glow discharge treatment, water vapor was not introduced as a reactive gas into the chamber 36, and only argon gas was flowed. ２ The O% was as shown in Table 4.

[0147] (Comparative Example 3) During the surface treatment of the low refractive index layer surface, the electrode power density during the glow discharge treatment was 17684 W / m ２An optical laminate was produced in the same manner as in Example 1-1, except that water vapor was not introduced as a reactive gas into the chamber 36, and only argon gas was flowed. ２ The O% was as shown in Table 4.

[0148] (Comparative Examples 4-1 to 4-4) During the surface treatment of the low refractive index layer surface, the electrode power density during the glow discharge treatment was 1326 W / m ２ The amount of argon gas supplied from the argon gas supply source 61 to the adjustment chamber 65 was adjusted to obtain the H ２ An optical laminate was produced in the same manner as in Example 1-1, except that the target O % was adjusted. ２ The O% was as shown in Table 4.

[0149] As described above, the properties of the optical laminates produced in the Examples and Comparative Examples were evaluated. The measurement results for the properties of the optical laminates of Examples 1-1 to 5-3 are summarized in Table 1, and the measurement results for the properties of the optical laminates of Comparative Examples 1 to 4-4 are summarized in Table 2. In Tables 1 and 2, the column for "Detection of metal elements such as Al by ESCA" indicates "○" if contamination with metal elements other than the metals constituting the metal oxide used in the optical laminate was detected by ESCA, and indicates "-" if not detected. Furthermore, the proportions of each gas in the atmosphere within chamber 36 and the total pressure (TP value) within chamber 36, measured with a partial pressure vacuum gauge, are summarized in Table 3 for Examples 1-1 to 5-3, and in Table 4 for Comparative Examples 1 to 4-4.

[0150]

[0151]

[0152]

[0153]

[0154] By comparing Examples 1-1 to 5-3 with Comparative Examples 1 to 4-4, it is clear that in the plasma treatment process, H ２ By flowing O, H ２It was confirmed that the film exhibited better alkali resistance than the film without O. From these results, it was confirmed that the film had a higher alkali resistance than the film without O. ２ The presence of O gas indicates high alkali resistance after the formation of the antifouling layer.

[0155] However, when comparing Comparative Examples 4-1 to 4-5 with Examples 1-1 to 5-3, it is clear that the same target H ２ 0%, and the H in the examples and comparative examples is in the same range. ２ Even when the content of the fluorine-containing compound was 0%, the alkali resistance was low in Comparative Examples 4-1 to 4-5. ２ It can be seen that even when O gas is introduced, a certain level of electrode power density during the plasma treatment step is required to improve alkali resistance.

[0156] That is, it can be seen that the change in the conditions of the plasma treatment step increased the amount of fluorine-based organic compounds in the antifouling layer formed on the low refractive index layer. ２ It is believed that this reduces the area of ​​contact with water, hydrolysis of the siloxane bond, and suppresses the substitution of H in the hydroxy group by alkali metal, thereby achieving the above-mentioned alkali resistance.

[0157] DESCRIPTION OF SYMBOLS 1 Sputtering apparatus, 2A Pretreatment apparatus, 2B Pretreatment apparatus, 3 Vapor deposition apparatus, 4 Apparatus, 11 Transparent substrate, 12 Hard coat layer, 13 Adhesion layer, 14 Optical functional layer, 14a High refractive index layer, 14b Low refractive index layer, 15 Antifouling layer, 20 Manufacturing apparatus, 21 Vacuum pump, 22 Guide roll, 23 Roll, 25 Film formation roll, 26 Can roll, 31 Chamber, 32 Chamber, 34 Chamber, 41 Film formation section, 42 Plasma discharge apparatus, 101, 102 Optical laminate

Claims

1. A substrate, a high refractive index layer provided on the substrate directly or via another layer, and a SiO ２ as a main component, and an antifouling layer formed on the low refractive index layer, the method comprising: a high refractive index layer forming step of forming a high refractive index layer; a low refractive index layer forming step of forming the low refractive index layer in a dry atmosphere; a plasma treatment step of plasma treating the low refractive index layer; and an antifouling layer forming step of forming an antifouling layer on the surface, wherein in the plasma treatment step, an electrode power density of 4400 W / m is applied in an environment where a mixed gas of water vapor and argon gas is introduced. ２ More than 18000W / m ２ The method for producing an optical laminate includes subjecting the low refractive index layer to a plasma treatment as follows.

2. The method for producing an optical laminate according to claim 1, wherein in the plasma treatment step, the flow rate of water vapor in the mixed gas of water vapor and argon gas introduced is 10% or more and 90% or less.

3. The electrode power density in the plasma treatment step is 7000 W / m ２ More than 14000W / m ２ The method for producing an optical laminate according to claim 1 or 2, wherein:

4. The method for producing an optical laminate according to claim 1 or 2, wherein in the low refractive index layer forming step, the low refractive index layer is formed by a sputtering method.

5. The method for producing an optical laminate according to claim 1 or 2, wherein in the anti-fouling layer forming step, the anti-fouling layer is formed by a vapor deposition method, and the anti-fouling layer contains a compound having an alkoxysilyl group and a fluorine-modified organic group.

6. In the plasma treatment step, H in the atmosphere in the space where the low refractive index layer is plasma treated ２ The method for producing an optical laminate according to claim 1 , wherein the proportion of O is 6.5% or more and 50% or less.

7. A substrate, a high refractive index layer provided on the substrate directly or via another layer, and a SiO ２ as a main component, and an antifouling layer formed on the low refractive index layer, wherein, after a 0.1 (mol / L) aqueous NaOH solution is dropped onto the optical laminate and the optical laminate is allowed to stand at 55°C for 4 hours, the ΔE value represented by the following formula (1) is 8 or less. ＊ ａｂ = {(L ＊ ２ -L ＊ １ ) ２ + (a ＊ ２ -a ＊ １ ) ２ +(b ＊ ２ -b ＊ １ ) ２ } １／２ ...(1) (In the formula, L ＊ １ : Brightness before adding NaOH aq., L ＊ ２ : Brightness after a predetermined time has passed since the dropping of NaOH aq. ＊ １ : Color before adding NaOH aq., a ＊ ２ : Color after leaving for a predetermined time after dropping NaOH aq., b ＊ １ : Color before adding NaOH aq., b ＊ ２ (Color intensity after the specified time has elapsed since the drop of NaOH aq.) 8. SiO measured by X-ray photoelectron spectroscopy (ESCA) from the antifouling layer side ２ The optical laminate according to claim 7, wherein the bond energy of 9. The optical laminate according to claim 7, wherein the high refractive index layer is made of an oxide of a first metal element, the low refractive index layer is made of an oxide of a second metal element, and the metal elements detected by ESCA measurement are only the first metal element and the second metal element.

10. The optical laminate according to claim 7, further comprising an adhesive layer between the substrate and the high refractive index layer, wherein the high refractive index layer is made of an oxide of a first metal, the low refractive index layer is made of an oxide of a second metal, and the adhesive layer is made of an oxide of a third metal, and the metal elements detected by ESCA measurement are only the first metal element, the second metal element, and the third metal element.

11. An article comprising the optical laminate according to any one of claims 7 to 10.

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