Tank cover and substrate liquid processing tank
By designing an adaptive floating tank cover assembly, the problem of the tank cover fitting the liquid surface is solved, which simplifies installation, reduces pollution and improves cleaning effect.
Patent Information
- Application Number
- PCT/CN2025/077940
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2024-03-27
- Filing Date
- 2025-02-19
- Publication Date
- 2025-10-02
AI Technical Summary
In the prior art, it is difficult for the tank cover to maintain contact with the liquid surface, resulting in splashing and contamination of the cleaning liquid, and the structure is complex and requires an additional driving device.
A tank cover assembly is designed, including a main cover body and a limiter. The main cover body floats along the liquid surface by its own gravity and liquid buoyancy, and the limiter is combined to limit the range of movement, avoiding the need for an additional driving mechanism.
The tank cover can be adaptively fitted to the liquid surface, simplifying the installation process, reducing particulate pollution, lowering energy consumption and improving cleaning effects.
Smart Images

Figure CN2025077940_02102025_PF_FP_ABST
Abstract
Description
Tank cover and substrate liquid treatment tank Technical Field
[0001] The present application relates to the field of semiconductor manufacturing technology, and in particular to a tank cover and a substrate liquid processing tank. Background Art
[0002] In a tank-type cleaning system for substrates (such as wafers), the tank cover plays an important role. On the one hand, it prevents cleaning fluid from splashing around the tank during wafer cleaning, potentially impacting the surrounding environment. On the other hand, it prevents contaminants from entering the tank and affecting the cleaning effect. Furthermore, it maintains the cleaning temperature within the tank, reduces cleaning fluid evaporation, and ensures process requirements are met.
[0003] In order to better prevent the cleaning liquid from splashing and reducing volatilization, and to avoid the gas in the environment from entering the cleaning tank and reacting with the cleaning liquid, thereby affecting the purity of the cleaning liquid, it is necessary to ensure that the tank cover is always in contact with the liquid surface in the cleaning tank.
[0004] However, after a conventional tank cover is installed, its position cannot usually be changed unless it is disassembled and reinstalled, and it is usually difficult to ensure that the tank cover always fits the liquid surface in the cleaning tank. U.S. Patent US7900640B2 discloses a cleaning device including a cleaning tank with an improved cover, which drives the tank cover to move by providing a follow-up mechanism that can move vertically so that the tank cover follows the liquid surface and maintains contact with the liquid surface. Although it can be ensured to a certain extent that the tank cover always fits the liquid surface, the addition of a driving device (i.e., a follow-up mechanism) not only makes the structure of the original tank body and tank cover more complicated, but also requires additional energy to drive the tank cover to move. In addition, without adding a feedback device to achieve closed-loop control, it is difficult to ensure that the tank cover can accurately follow the liquid surface.
[0005] Therefore, how to provide a tank cover with a simple structure that can ensure effective contact with the liquid surface becomes a technical problem that needs to be solved. Summary of the Invention
[0006] In view of the above-mentioned shortcomings of the prior art, an object of the present invention is to provide a tank cover for solving the technical problem in the prior art that the tank cover is difficult to maintain contact with the liquid surface.
[0007] To achieve the above-mentioned purpose and other related purposes, one aspect of the present invention provides a tank cover, which is applied to a substrate liquid processing tank, including a tank cover assembly, wherein the tank cover assembly includes a main cover body and a limiting member for forming a limiting space; the periphery of the main cover body is at least partially movably located in the limiting space, and the limiting space is used to limit the range of movement of the main cover body; the main cover body is configured to float as the liquid level of the processing liquid in the substrate liquid processing tank changes when the tank cover is closed under the action of its own gravity and the buoyancy of the processing liquid, so that the bottom surface of the main cover body remains in contact with the liquid surface.
[0008] Optionally, the limiting member includes a circumferential limiting portion, which is used to cooperate with the peripheral edge of the main cover body located in the limiting space to limit the circumferential movable range of the main cover body.
[0009] Optionally, the limiting member further includes an upper limiting portion and a lower limiting portion, which are used to cooperate with the periphery of the main cover body located in the limiting space to limit the upper and lower movable range of the main cover body, wherein the upper limiting portion is located above the lower limiting portion, and the circumferential limiting portion is arranged on the upper limiting portion or the lower limiting portion.
[0010] Optionally, the limiting member further includes a first protrusion, which extends from the limiting member toward the interior of the limiting space and is configured to contact a peripheral edge of the main cover in the limiting space to limit the range of movement of the main cover.
[0011] Optionally, the slot cover assembly further includes a blocking portion, the limiting space has an opening, and the blocking portion is located in an area close to the opening, for preventing particles generated by the contact between the periphery of the main cover body located in the limiting space and the limiting member from leaving the limiting space.
[0012] Optionally, the limiting member further includes an exhaust port for extracting air from the limiting space to the outside.
[0013] Optionally, the main cover further includes a through hole, and the through hole is provided on the periphery of the main cover located in the limiting space.
[0014] Optionally, the tank cover assembly further includes a support member, the limiting member is fixedly mounted on the support member, and the support member is configured to be rotatably mounted above the substrate liquid processing tank to drive the main cover body to move between a closed position and an open position.
[0015] Optionally, the slot cover assembly further includes a mounting member, wherein the mounting member is located below the limiting member, the limiting member is mounted on the mounting member, and is fixedly mounted on the supporting member through the mounting member.
[0016] Optionally, the limiting member is provided with a drainage hole for discharging liquid accumulated in the main cover.
[0017] Optionally, the main cover includes a bottom wall and a side wall extending upward from the bottom wall, wherein the side wall close to the support member and extending along the rotation axis of the support member is inclined from the bottom wall toward the support member.
[0018] Optionally, the tank cover assembly further includes a shielding portion for shielding an area at the slot of the substrate liquid processing tank that is not covered by the main cover body.
[0019] Another aspect of the present invention provides a substrate liquid processing tank, comprising a tank body and the tank cover as described above, wherein the tank cover is located at the notch of the tank body.
[0020] As described above, the present invention provides a tank cover and a substrate liquid treatment tank, which have at least the following beneficial effects:
[0021] 1) The main cover body floats along with the liquid surface and maintains contact with the liquid surface by relying on the gravity of the main cover body and the buoyancy of the processing liquid in the substrate liquid processing tank, without the need for an additional follower mechanism to drive the main cover body to move;
[0022] 2) The main cover itself has a certain amount of space for movement, so there is a certain amount of room for error during installation, making installation easier and eliminating the need for precise positioning and installation like traditional fixed slot covers.
[0023] 3) By optimizing the design of the limiter, the particles generated by the contact between the main cover and the limiter are reduced, and the particles are prevented from contaminating the processing liquid under the tank cover.
[0024] Summary of the Figures
[0025] The features and performance of the present application are further described by the following examples and drawings.
[0026] 1 and 2 are perspective views of a substrate liquid treatment tank using a tank cover according to a first embodiment of the present invention;
[0027] FIG3 is a schematic cross-sectional view taken along the AA direction in FIG1 ;
[0028] FIG4 is an exploded view of the slot cover assembly according to the first embodiment of the present invention;
[0029] FIG5 is a partial view of a sectional perspective view taken along the BB direction in FIG1 ;
[0030] FIG6 is a cross-sectional view of a substrate liquid treatment tank using the tank cover of the second embodiment;
[0031] FIG7 is a perspective view of a slot cover according to a second embodiment of the present invention; and
[0032] FIG8 is an exploded view of the slot cover assembly according to the second embodiment of the present invention.
[0033] Preferred embodiment of this application
[0034] The following describes the embodiments of the present invention through specific examples. Those skilled in the art will readily understand the other advantages and benefits of the present invention from the disclosure herein. The present invention may also be implemented or applied through various other specific embodiments, and the details of this disclosure may be modified or altered based on different perspectives and applications without departing from the spirit of the present invention.
[0035] It should be noted that the drawings of the present disclosure only illustrate the basic concept of the present invention in a schematic manner, so the drawings only show components related to the present invention rather than being drawn according to the number, shape and size of components in actual implementation. In actual implementation, the form, quantity and proportion of each component may be changed at will, and the component layout may also be more complicated.
[0036] In the following description, when referring to the accompanying drawings, unless otherwise indicated, the same numbers in different drawings represent the same or similar elements. The embodiments described in the following exemplary embodiments do not represent all embodiments consistent with the present invention. Instead, they are merely examples of devices consistent with some aspects of the present invention as detailed in the appended claims.
[0037] The terms used in this disclosure are for the purpose of describing specific embodiments only and are not intended to limit the disclosure. As used in this disclosure and the appended claims, the singular forms "a," "an," "the," and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise. It should also be understood that the term "and / or" as used herein refers to and encompasses any and all possible combinations of one or more of the associated listed items.
[0038] In the description of the present disclosure, unless otherwise specified and limited, it should be noted that the terms "install", "connect" and "connect" should be understood in a broad sense. For example, it can be a mechanical connection or an electrical connection, or it can be the internal connection between two components. It can be a direct connection or an indirect connection through an intermediate medium. For those skilled in the art, the specific meaning of the above terms can be understood according to the specific circumstances.
[0039] It should be understood that although the terms first, second, third, etc. may be used in the present disclosure to describe various information, such information should not be limited to these terms. These terms are only used to distinguish information of the same type from each other.
[0040] For ease of description, an XYZ orthogonal coordinate system is used in the drawings of this disclosure, and reference is made to it as needed. The X direction is sometimes referred to as the "front-back direction," with the positive direction referred to as the "front side" or "front," and the negative X direction referred to as the "back side" or "rear." The Y direction is sometimes referred to as the "left-right direction," with the positive Y direction referred to as the "right side" or "right," and the negative Y direction referred to as the "left side" or "left." The Z direction is sometimes referred to as the "upper side" or "upper," with the positive Z direction referred to as the "upper side" or "above," and the negative Z direction referred to as the "lower side" or "lower."
[0041] Example 1
[0042] The first embodiment of the present invention provides a tank cover 1, which is applied to a substrate liquid treatment tank. Figures 1 and 2 show three-dimensional schematic diagrams of a substrate liquid treatment tank using the tank cover 1 in the first embodiment of the present invention, wherein the tank cover 1 in Figure 1 is in a closed position, and the tank cover 1 in Figure 2 is in an open position. Figure 3 shows a cross-sectional schematic diagram along the AA direction in Figure 1. The tank cover 1 includes a tank cover assembly 10. In the present embodiment, the tank cover 1 is a double-opening structure that is flipped open and closed, and includes two symmetrically arranged tank cover assemblies 10. The tank cover assembly 10 includes a main cover body 11 and a limiting member 12. The limiting member 12 is used to form a limiting space, and the periphery of the main cover body 11 is at least partially movably located in the limiting space, and the limiting space is used to limit the range of motion of the main cover body 11.
[0043] It should be understood that in other possible embodiments, the tank cover 1 may also have a single-opening structure, namely, including a tank cover assembly 10, and the dimensions of the tank cover assembly 10 are adapted to the dimensions of the substrate liquid processing tank. Alternatively, the tank cover 1 may also adopt other opening and closing methods, including but not limited to conventional cover opening and closing methods such as vertical lifting or horizontal sliding. The specific opening and closing method to be adopted requires reasonable selection by those skilled in the art based on the actual usage scenario.
[0044] It should be noted that another aspect of the present invention further provides a substrate liquid processing tank. As shown in Figures 1 to 3, the substrate liquid processing tank comprises a tank body 2 and a tank cover 1, wherein the tank cover 1 is located at the notch of the tank body.
[0045] For example, in this embodiment, the substrate liquid processing tank is a substrate cleaning tank. The tank body 2 includes an inner tank 21 and an outer tank 22. The inner tank 21 forms a substrate processing space, which accommodates substrates W to be processed and processing liquid (to clearly illustrate the structure and positional relationship of each component, only the liquid surface S of the processing liquid is shown in Figure 3). The processing liquid in the inner tank 21 continuously gushes to clean the substrates W and overflows from the edge of the slot of the inner tank 21 into the outer tank 22. A tank cover 1 is installed at the opening at the top of the substrate liquid processing tank to cover the slot of the inner tank 21 when closed.
[0046] As shown in FIG3 , the main cover 11 is configured to float with the liquid level S of the processing liquid in the substrate liquid processing tank under the action of its own weight and the buoyancy of the processing liquid in the substrate liquid processing tank when the tank cover 1 is closed, so that the bottom surface of the main cover 11 remains in contact with the liquid level S. On the one hand, the main cover 11 floats with the liquid level S and remains in contact with the liquid level S by relying on the main cover 11's own weight and the buoyancy of the processing liquid in the substrate liquid processing tank, without the need for an additional follower mechanism to drive the main cover 11 to move; on the other hand, the traditional fixed tank cover requires precise positioning during installation to ensure that the tank cover is in contact with the liquid level. However, the main cover 11 in this embodiment has a certain amount of movable space itself, so there is a certain amount of room for error during installation, which makes installation easier and does not require the precise positioning and installation required by traditional fixed tank covers.
[0047] Referring now to Figures 4 and 5, Figure 4 shows an exploded view of the tank cover assembly 10, and Figure 5 shows a partial view of a sectional perspective view taken along the BB direction in Figure 1, wherein the tank body 2 is omitted. In this embodiment, the main cover body 11 includes a bottom wall 111 located at the bottom and a side wall 112 extending upward from the bottom wall 111. The bottom wall 111 and the side wall 112 enclose a certain accommodation space. The main cover body 11 further includes an extension portion 113, which extends horizontally outward from the upper end of the side wall 112, that is, extends in a direction away from the side wall 112, constituting part or all of the periphery of the main cover body 11. The extension portion 113 is located within the confined space. Thus, when the main cover body 11 is in the closed position, while the lower surface of the bottom wall 111 is in contact with the liquid surface S, the side wall 112 having a certain height can prevent the treatment liquid from overflowing onto the upper surface of the bottom wall 111. Moreover, even if the processing liquid overflows from above the side wall 112, or the liquid carried by other equipment (such as a robot passing above the substrate liquid processing tank) drips onto the upper surface of the main cover body 11, the storage space enclosed by the bottom wall 111 and the side wall 112 also has a certain storage function, thereby preventing the processing liquid from overflowing and polluting the environment and damaging other components.
[0048] It should be understood that the shape of the main cover 11 in the present embodiment is merely exemplary. In other possible embodiments, the main cover 11 may also be a plate-like structure, or the main cover 11 may be a box structure formed by a top wall at the top, a bottom wall 111 at the bottom, and a side wall 112 connecting the top wall and the bottom wall 111. The extension 113 may extend outward from the top wall in a horizontal direction, that is, extend in a direction away from the top wall. The top wall and the bottom wall 111 of the box structure have a certain height difference, which can prevent the processing liquid in the substrate liquid processing tank from overflowing to the top wall. At the same time, the box structure is formed by the top wall, the bottom wall 111 and the side wall 112, and has a cavity inside to reduce the weight of the main cover 11, ensuring that the main cover 11 can float following the liquid surface S.
[0049] Specifically, the limiting member 12 includes a circumferential limiting portion 123, which encloses a limiting space and is used to cooperate with the extension portion 113 to limit the circumferential range of motion of the main cover body 12. As shown in Figures 4 and 5, the extension portion 113 of this embodiment is provided at both ends of the main cover body 11 in the front-to-back direction (X direction). The left and right sides (both sides in the Y direction) and the front side of the extension portion 113 at the front end correspond to the circumferential limiting portions 123, and the left and right sides and the rear side of the extension portion 113 at the rear end correspond to the circumferential limiting portions 123. The extension portion 113 is located within the limiting space, which neither prevents the main cover body 11 from floating with the liquid surface S nor limits the range of motion of the main cover body 11, thereby preventing the main cover body 11 from deflecting or even detaching from the limiting member 12 and failing to perform the necessary covering function.
[0050] In other possible embodiments, without affecting the opening and closing of the tank cover 1 and the floating of the main cover body 11 with the change of the liquid level S, the extension portion 113 can also extend throughout the upper end of the side wall 112 or be set at other positions on the upper end of the side wall 112.
[0051] Furthermore, as previously mentioned, in this embodiment, the tank cover 1 is a double-opening structure. Exemplarily, the tank cover assembly 10 further includes a support member 13, and the limit member 12 is fixedly mounted on the support member 13. The support member 13 is configured to be rotatably mounted on the substrate liquid treatment tank to drive the main cover body 11 to move between a closed position and an open position. In conjunction with Figures 1 to 2, exemplarily, the support member 13 is a rotating shaft extending along the X direction. For the tank cover assembly 10 located on the right side, the support member 13 is arranged on the right side of the main cover body 11. Correspondingly, on the other symmetrically arranged tank cover assembly 10, the support member 13 is arranged on the left side of the main cover body 11. The support member 13 rotates around its own axis to drive the main cover body 11 to rotate between the closed position and the open position, thereby realizing the opening and closing of the tank cover 1. Specifically, as shown by arrow C in Figure 1, the support member 13 on the right rotates clockwise to drive the main cover body 11 on the right to flip to the right, and the support member 13 on the left rotates counterclockwise to drive the main cover body 11 on the left to flip to the left, thereby driving the slot cover 1 in Figure 1 to move to the position in Figure 2 to open the slot cover 1; correspondingly, as shown by arrow D in Figure 2, the support member 13 on the right rotates counterclockwise to drive the main cover body 11 on the right to flip to the left, and the support member 13 on the left rotates clockwise to drive the main cover body 11 on the left to flip to the right, thereby driving the slot cover 1 in Figure 2 to move to the position in Figure 1 to close the slot cover 1.
[0052] Furthermore, in this embodiment, the limit member 12 also includes an upper limit portion 121 and a lower limit portion 122, which are used to cooperate with the extension portion 113 to limit the upper and lower movement range of the main cover body 11, wherein the upper limit portion 121 is located above the lower limit portion 122, and the circumferential limit portion 123 is arranged on the upper limit portion 121 or the lower limit portion 122.
[0053] Specifically, in this embodiment, the circumferential limiting portion 123 is provided on the lower limiting portion 122 and extends upward from the lower limiting portion 122. As shown in FIG4 , taking the limiting member 12 located at the front end of the main cover body 11 as an example, it includes three circumferential limiting portions 123 located on the left and right sides and the front side of the extension portion 113, respectively. For example, the circumferential limiting portions 123 can be integrally formed with the lower limiting portion 122. After the slot cover assembly 10 is installed, the upper limiting portion 121, the lower limiting portion 122, and the circumferential limiting portion 123 together enclose a limiting space.
[0054] On the one hand, the extension portion 113 is located in the limiting space. When the main cover 11 is flipped between the closed position and the open position, the limiting member 12 can limit the range of movement of the main cover 11, preventing the main cover 11 from detaching from the limiting member 12 and falling into or outside the substrate liquid processing tank. On the other hand, when the main cover 11 is in the closed position, the upper limit portion 121 and the lower limit portion 122 can respectively act as the upper limit and the lower limit. Without preventing the main cover 11 from floating with the liquid level S, the range of movement of the main cover 11 can be further limited, thereby improving the stability of the tank cover 1. Even if the liquid level S fluctuates violently, the main cover 11 will not detach from the limiting member 12 or touch the substrate W downward to cause damage to the substrate W. In addition, in this embodiment, the upper limit portion 121, the lower limit portion 122 and the circumferential limit portion 123 are all plate-like structures with a certain coverage area. Therefore, when the main cover body 11 is in the closed position, the limit member 12 can cover the gap between the main cover body and the slot body.
[0055] It should be understood that as the main cover 11 floats with changes in the liquid level S, the extension 113 may contact or even collide with the stopper 12, potentially generating particulate matter. These particulate matter may enter the substrate liquid processing tank and contaminate the processing liquid therein. To reduce the probability of particulate matter generation, in this embodiment, the extensions 113 are provided at both ends of the main cover 11 in the front-to-back direction (X direction), while the extensions 113 are not provided at both ends of the main cover 11 in the left-to-right direction (Y direction), and accordingly, the stopper 12 is not provided. This effectively reduces the area where the extension 113 and the stopper 12 may come into contact, thereby reducing the probability of particulate matter generation.
[0056] Preferably, in order to minimize the particles that may be generated by the contact between the extension 113 and the limiter 12 and to prevent the particles from entering the substrate liquid treatment tank, the limiter 12 is further optimized in this embodiment. In conjunction with Figures 4 and 5, in this embodiment, the limiter 12 also includes a first protrusion 124, which extends from the limiter 12 to the inside of the limiting space and is used to contact the extension 113 to limit the range of motion of the main cover 11. For example, in this embodiment, the upper limiter 121, the lower limiter 122 and the circumferential limiter 123 are all provided with a first protrusion 124, and the first protrusion 124 of each part is continuous. In other possible embodiments, the first protrusion 124 of each part may also be spaced apart. Optionally, the first protrusion 124 may also be provided only in a partial area of the upper limiter 121, the lower limiter 122 and the circumferential limiter 123.
[0057] When the main cover 11 floats with the fluctuation of the liquid level S (please refer to the liquid level S in Figure 3), the extension portion 113 contacts the first protrusion 124 of the limit member 12, reducing the contact area between the extension portion 113 and the limit member 12, thereby reducing the particulate matter that may be generated due to the contact between the extension portion 113 and the limit member 12.
[0058] Furthermore, in this embodiment, the slot cover assembly 10 also includes a blocking portion, and the limiting space has an opening 129 so that the periphery of the main cover body 11 located in the limiting space can enter the limiting space. The blocking portion is located in the area near the opening 129 and is used to prevent the particles generated by the contact between the periphery of the main cover body 11 located in the limiting space and the limiting member 12 from leaving the limiting space.
[0059] As shown in Figures 4 and 5 , in this embodiment, the blocking portion includes a first blocking portion 151 disposed on the limiting member 12. The first blocking portion 151 extends from the limiting member 12 into the limiting space, thereby providing a certain degree of blocking effect on particulate matter within the limiting space, to a certain extent preventing particulate matter from reaching the outside of the limiting space through the opening 129, thereby reducing the probability of particulate matter entering the substrate liquid processing tank below the main cover 11 (see the substrate liquid processing tank in Figures 1 to 3 ). Specifically, one first blocking portion 151 is disposed on an end of the upper limiting member 121 near the opening 129 and extends downward, while another first blocking portion 151 is disposed on an end of the lower limiting member 122 near the opening 129 and extends upward. Optionally, the blocking portion may further include a second blocking portion 152 disposed on the periphery of the main cover 11 located within the limiting space, namely, on the extension portion 113 in this embodiment, extending from the extension portion 113 into the limiting space, further enhancing the blocking effect on particulate matter.
[0060] Furthermore, in the present embodiment, the limiting member 12 further includes an exhaust port 126 for extracting air from the confined space to the outside. As shown in Figures 4 and 5, in the present embodiment, the exhaust port 126 is provided on the upper limit portion 121. In other possible embodiments, the exhaust port 126 may also be provided at other suitable positions on the limiting member 12. The exhaust port 126 is connected to an external exhaust device, which can extract particulate matter that may exist in the confined space and maintain the cleanliness of the confined space. Preferably, the main cover 11 further includes a through hole 115, which is provided on the periphery of the main cover 11 located in the confined space. In the present embodiment, the through hole 115 is provided on the extension portion 113, which can enhance the fluidity of the airflow in the confined space when extracting air from the exhaust port 126, thereby enhancing the exhaust effect. In addition, the provision of the through hole 115 can also reduce the weight of the main cover 11.
[0061] In this embodiment, the slot cover assembly 10 further includes a mounting member 14, which is fixedly connected to the support member 13. The position limiting member 12 is mounted on the mounting member 14 and fixedly mounted on the support member 13 via the mounting member 14. As shown in FIG4 , in this embodiment, the shape of the mounting member 14 is adapted to that of the position limiting member 12. The mounting member 14 includes an upper mounting portion 141 adapted to the upper position limiting portion 121, a lower mounting portion 142 adapted to the lower position limiting portion 122, and a circumferential mounting portion 143 adapted to the circumferential position limiting portion 123. Specifically, in this embodiment, the upper limit portion 121 is fixedly mounted on the upper mounting portion 141, and the upper mounting portion 141, the lower mounting portion 142 and the circumferential mounting portion 143 enclose an installation space. The circumferential limit portion 123 is accommodated on the inner side of the circumferential mounting portion 143, and the circumferential limit portions 123 on both sides of the left and right directions (Y direction) are accommodated below the upper mounting portion 141 and are surrounded by the upper mounting portion 141 and the circumferential mounting portions 143 on both sides of the left and right directions.
[0062] Optionally, the tank cover assembly 10 further includes a shielding portion for shielding the area of the notch of the substrate liquid processing tank that is not covered by the main cover 11. As previously described, the extension 13 and the stopper 12 in this embodiment are located at both ends of the main cover 11 in the front-to-back direction (X direction) to reduce the area of contact or collision between the extension 113 and the stopper 12. Therefore, as shown in Figure 3, a gap J exists between the side wall 112 near the support member 13 and the wall of the inner tank 21 to prevent it from affecting the floating of the main cover 11. To prevent the processing liquid in the inner tank 21 from overflowing from this gap J when the tank cover 1 is in the closed position, in this embodiment, the shielding portion includes a first shielding portion 161 for shielding the gap J between the main cover 11 and the wall of the inner tank 21. In conjunction with Figures 1 and 3 to 5, in this embodiment, the upper mounting portion 141 near the support member 13 extends and connects with each other to form the first shielding portion 161. In other possible implementations, the extension portion 113 may extend over the edge of the main cover body 11, and correspondingly, the limit member 12 may also extend over the edge of the main cover body 11, so that the gap J will be blocked by the extension portion 113 and the limit member 12, so the first shielding portion 161 can be formed by the limit member 12 located above the gap J. Optionally, in this embodiment, the tank cover 1 is a double-opening design, so there should be a certain gap between the tank cover assemblies 10 on the left and right sides to avoid mutual interference between the two tank cover assemblies 10 during the opening and closing process. In order to prevent the processing liquid in the inner tank 21 from overflowing from the gap when the tank cover 1 is in the closed position, the shielding portion may further include a second shielding portion 162. As shown in Figures 1 and 3, the second shielding portion 162 is provided on the upper limit portion 121 to cover the gap between the two tank cover assemblies 10 on the left and right sides.
[0063] Example 2
[0064] This second embodiment provides a tank cover 1 for use in a substrate liquid processing tank. Figure 6 shows a cross-sectional schematic diagram of a substrate liquid processing tank employing the tank cover 1 of this second embodiment. Similar to the first embodiment, the tank cover 1 of this second embodiment also has a double-opening structure. The main difference from the first embodiment is that the entire periphery of the main cover 11 is located within the confined space of the stopper 12, and the stopper 12 has a different shape and structure.
[0065] Referring to Figures 7 and 8 , Figure 7 shows a perspective schematic diagram of the tank cover 1 in the second embodiment, and Figure 8 shows an exploded view of the tank cover assembly 10 in the second embodiment. The shape and structure of the main cover 11 are substantially the same as those in the first embodiment, comprising a bottom wall 111 and side walls 112 extending upward from the bottom wall 111. The main cover 11 also includes an extension 113 extending horizontally outward from the upper end of the side wall 112, i.e., extending away from the side wall 112. The primary difference is that the extension 113 constitutes the entire periphery of the main cover 11, i.e., the extension 113 extends over the entire area of the upper end of the side wall 112.
[0066] The limiting member 12 is configured as a frame structure surrounding the periphery of the main cover body 11. The circumferential limiting portion 123 is arranged along the outer side of the extension portion 113 and cooperates with the extension portion 113 to achieve circumferential limiting. The upper limiting portion 121 is located above the extension portion 113 and is arranged along the upper side of the extension portion 113. The lower limiting portion 122 is located below the extension portion 113 and is arranged along the lower side of the extension portion 113. The upper limiting portion 121 is connected to the circumferential limiting portion 123 as a whole and is detachably fixedly connected to the lower limiting portion 122. Exemplarily, the lower end of the circumferential limiting portion 123 extends outward in the horizontal direction to form a lip portion 1231, and the circumferential limiting portion 123 is fixedly connected to the lower limiting portion 122 via the lip portion 1231. For example, the lip portion 1231 and the lower limiting portion 122 are correspondingly provided with limiting member connection holes 127 for screws 128 to pass through, and the fixed connection is achieved by screws.
[0067] Compared with the first embodiment, in this embodiment, the limiting member 12 surrounds the periphery of the main cover 11, and the periphery of the main cover 11 is entirely located within the limiting space of the limiting member 12, which has a better limiting effect and can enhance the stability of the main cover 11.
[0068] Furthermore, in this embodiment, the mounting member 14 is configured as a frame structure adapted to the position-limiting member 12, and the mounting member 14 is located below the lower position-limiting portion 122. Optionally, the mounting member 14 may be provided with a mounting member connection hole 147 corresponding to the connection hole 127, so that the position-limiting member 12 is mounted and fixed to the mounting member 14 via screws 128.
[0069] It should be understood that the function of the mounting member 14 is to install the limiting member 12 so that the limiting member 12 can be more firmly connected to the supporting member 13. Therefore, in other possible embodiments, the mounting member 14 is not limited to the complete frame structure surrounding the periphery of the main cover body 11 as shown in Figure 8, and it may also be possible that only a partial structure or other form in the frame structure can realize the installation and fixation of the limiting member 12.
[0070] Furthermore, considering that the bottom wall 111 and the side wall 112 of the main cover body 11 in this embodiment enclose a box structure with an opening facing upward, there is a certain amount of storage space, and liquid may accumulate in the storage space. In order to be able to discharge these liquids after the main cover body 11 is flipped open, the limiting member 12 is also provided with a drainage hole 17. As shown in Figures 6 and 8, in this embodiment, the lower limiting portion 122 is provided with a drainage hole 17, and the mounting member 14 is provided with a hole 18 that coincides with the drainage hole 17. After the main cover body 11 is flipped open, the liquid accumulated in the main cover body 11 flows into the limiting space along the periphery of the limiting space and is discharged through the drainage hole 17 and the hole 18.
[0071] Preferably, to facilitate drainage of liquid accumulated within the main cover 11 through the drainage hole 17, in this embodiment, the sidewall 112 adjacent to the support member 13 has a certain inclination. As shown in Figure 6, the sidewall 112, which is adjacent to the support member 13 and extends along the rotation axis of the support member 13, is inclined from the bottom wall 111 of the main cover 11 toward the support member 13. After the main cover 11 is flipped open, liquid accumulated within the main cover 11 flows along this inclined sidewall 112 toward the drainage hole 17.
[0072] The above embodiments are merely illustrative of the principles and effects of the present invention and are not intended to limit the present invention. Anyone skilled in the art may modify or alter the above embodiments without departing from the spirit and scope of the present invention. Therefore, all equivalent modifications or alterations made by one of ordinary skill in the art without departing from the spirit and technical principles disclosed herein are intended to be covered by the claims of the present invention.
Claims
1. A tank cover, used for a substrate liquid processing tank, characterized in that: The slot cover assembly includes a main cover body and a limiting member for forming a limiting space; At least a portion of the periphery of the main cover is movably located within the limiting space, and the limiting space is used to limit the range of movement of the main cover; The main cover is configured to float with the change of the liquid level of the processing liquid under the action of its own gravity and the buoyancy of the processing liquid in the substrate liquid processing tank when the tank cover is closed, so that the bottom surface of the main cover remains in contact with the liquid surface.
2. The slot cover according to claim 1, wherein: The limiting member includes a circumferential limiting portion, which is used to cooperate with the peripheral edge of the main cover body located in the limiting space to limit the circumferential movable range of the main cover body.
3. The slot cover according to claim 2, wherein: The limiting member also includes an upper limiting portion and a lower limiting portion, which are used to cooperate with the peripheral edge of the main cover body located in the limiting space to limit the upper and lower movable range of the main cover body, wherein the upper limiting portion is located above the lower limiting portion, and the circumferential limiting portion is arranged on the upper limiting portion or the lower limiting portion.
4. The tank cover according to claim 1, wherein: The limiting member further includes a first protrusion extending from the limiting member toward the interior of the limiting space and configured to contact a peripheral edge of the main cover in the limiting space to limit a range of movement of the main cover.
5. The tank cover according to claim 1, wherein: The slot cover assembly also includes a blocking portion, the limiting space has an opening, and the blocking portion is located in an area close to the opening, for preventing particles generated by the contact between the periphery of the main cover body located in the limiting space and the limiting member from leaving the limiting space.
6. The tank cover according to claim 1, wherein: The limiting member further includes an air exhaust port for extracting air from the limiting space to the outside.
7. The tank cover according to claim 6, characterized in that: The main cover body further includes a through hole, and the through hole is arranged on the periphery of the main cover body located in the limiting space.
8. The tank cover according to claim 1, wherein: The slot cover assembly further includes a support member, and the limiting member is fixedly mounted on the support member. The support member is configured to be rotatably mounted above the substrate liquid processing tank, and is used to drive the main cover to move between a closed position and an open position.
9. The tank cover according to claim 8, characterized in that: The slot cover assembly further includes a mounting member, the limiting member is mounted on the mounting member, and is fixedly mounted on the supporting member through the mounting member.
10. The tank cover according to claim 8, wherein: The limiting member is provided with a drainage hole for discharging the liquid accumulated in the main cover.
11. The tank cover according to claim 10, wherein: The main cover includes a bottom wall and a side wall extending upward from the bottom wall, wherein the side wall, which is close to the support member and extends along the rotation axis of the support member, is inclined from the bottom wall toward the support member.
12. The tank cover according to claim 1, wherein: The tank cover assembly further includes a shielding portion for shielding an area of the slot of the substrate liquid processing tank that is not covered by the main cover.
13. A substrate liquid treatment tank, characterized in that: It comprises a trough body and a trough cover according to any one of claims 1 to 12, wherein the trough cover is located at the trough opening of the trough body.
Citation Information
Patent Citations
Tank body integral structure for wafer washing
CN110600409A
Chemical processing apparatus, chemical processing method, and method for manufacturing circuit substrate
CN1574237A
Substrate cleaning apparatus
JP1994104234A
Hydrogen and oxygen generator
JP1998265988A
Washing Device and Washing Method
US20090120466A1