Deployable compact electromagnetic pulse generator munition system based on spiral generators

Abstract

Disclosed herein are systems and methods that utilize a pulsed power supply to generate electromagnetic pulses ("EMPs") for disabling targets, including single or multiple targets that may be subsurface, ground, surface, maritime and / or aerial targets. An example system for generation of an EMP comprises a pulsed power supply for generating pulsed power, wherein the pulsed power supply comprises a spiral generator; and an electromagnetic wave source electrically coupled to the pulsed power supply and configured to generate one or more EMPs from the pulsed power.

Description

DEPLOYABLE COMPACT ELECTROMAGNETIC PULSE GENERATOR MUNITION SYSTEM BASED ON SPIRAL GENERATORSBACKGROUND

[0001] Current militaries utilize extensive electronic systems including communication systems (radios, satellite links), navigation systems (GPS units), radar systems, sonar systems, surveillance systems, avionics (aircraft electronics), defense computing platforms, and electronic warfare systems. These electronic systems may include active and / or passive elements, such as electronically guided munitions, military drones, unmanned aerial systems and vehicles, unmanned ground systems and vehicles, traditional military7vehicles, relay links, traditional landmines, and smart mines, as well as jammers and spoofers and other RF interference systems. The ability' to counteract these electronic systems is a premier and demanding problem, particularly in conflict zones. For example, a traditional method of drone / aircraft neutralization or mine clearance principally involves physical elements such as heavily armored vehicles for mine clearing or launched fire power to down drones. Such methods are not only resource-intensive but also face limitations as to effectiveness making it essential to find innovative and lightweight solutions for neutralizing military electrical systems. More agile and versatile solutions are needed to swiftly remove both electronic threats and electronic protection systems without compromising the safety of military personnel, civilian populations or nearby structures.SUMMARY

[0002] Disclosed herein is an example system for generation of an electromagnetic pulse C’EMP). comprising: a pulsed power supply for generating pulsed power, wherein the pulsed power supply comprises a spiral generator; and an electromagnetic wave source electrically coupled to the pulsed power supply and configured to generate one or more EMPs from the pulsed power.

[0003] Disclosed herein is another example system for generation of an EMP, comprising: a pulsed power supply for generating pulsed power, wherein the pulsed power supply comprises multiple generator stages that each comprise a spiral generator, wherein a final one of the generator stages comprise a pulse forming network, and wherein each of the generator stages is configured to step up power from a previous one of the generator stages; and an electromagnetic generator wave source electrically coupled to the pulsed power supply and configured to generate one or more EMPs from the pulsed power source.

[0004] It is to be understood that both the foregoing general description and the following detailed description are exemplary and explanatory in nature and are intended to provide an understandingof the present disclosure without limiting the scope of the present disclosure. In that regard, additional aspects, features, and advantages of the present disclosure will be apparent to one skilled in the art from the following detailed description.BRIEF DESCRIPTION OF THE DRAWINGS

[0005] These drawings illustrate certain aspects of some of the embodiments of the present invention and should not be used to limit or define the invention.

[0006] Figure 1 A is a schematic illustration of a process for the electric field vector inversion in accordance with one or more embodiments of the present disclosure.

[0007] Figure IB is another schematic illustration of a process for the electric field vector inversion in accordance with one or more embodiments of the present disclosure.

[0008] Figure 1C is another schematic illustration of a process for the electric field vector inversion in accordance with one or more embodiments of the present disclosure.

[0009] Figure 2 is a waveform illustration of vector inversion in accordance with one or more embodiments of the present disclosure.

[0010] Figure 3 is another waveform illustration of vector inversion in accordance with one or more embodiments of the present disclosure.

[0011] Figure 4 illustrates a generator in accordance with one or more embodiments of the present disclosure.

[0012] Figure 5 illustrates a generator in accordance with one or more embodiments of the present disclosure.

[0013] Figure 6 is a cross-sectional view of a portion of a generator of Figure 5 taken along line 6-6 of Figure 5, in accordance with one or more embodiments of the present disclosure.

[0014] Figure 7 is a cross-sectional view of the generator of Figure 6 taken along line 7-7, in accordance with one or more embodiments of the present disclosure.

[0015] Figures 8 A and 8B are block diagram of pulsed power systems with a spiral generator in accordance with one or more embodiments.

[0016] Figure 9 is a block diagram showing a pulsed power system arranged in a pulse forming network with multiple spiral generators in accordance with one or more embodiments.

[0017] Figures 10A and 10B are block diagrams showing additional examples of pulsed power systems arranged in a pulse forming network in accordance with one or more embodiments.

[0018] Figure 11 is a block diagram showing another example of a pulsed power system in accordance with one or more embodiments.

[0019] Figure 12 is a block diagram showing an EMP generator in accordance with one more embodiments.

[0020] Figure 13 is a block diagram showing another example of an EMP generator in accordance with one more embodiments.

[0021] Figure 14 is a schematic diagram showing an EMP generator munition system in accordance with one more embodiments.

[0022] Figure 15 illustrates an EMP generator munition system deployed from an aircraft in accordance with one more embodiments.

[0023] Figure 16 illustrates an EMP generator munition system deployed from an aircraft in accordance with one more embodiments.

[0024] Figure 17 illustrates an EMP generator munition system deployed from the ground against arial targets in accordance with one or more embodiments.

[0025] Figure 18 illustrates ground targets for EMP generator munition system in accordance with one or more embodiments.

[0026] Figure 19 illustrates an EMP generator munition system deployed to deactivate the ground targets of Figure 18 in accordance with one or more embodiments.

[0027] Figure 20 illustrates receiver antenna deployed from an EMP generator munition system tow ard the ground targets of Figure 18 in accordance with one or more embodiments.

[0028] Figure 21 illustrates receiver antenna from an EMP generator munition system engaging the ground targets of Figure 18 in accordance with one or more embodiments.

[0029] Figure 22 illustrates generation of an EMP from an EMP generator munition system with the receiver antenna engaged with the ground targets of Figure 18 in accordance with one or more embodiments.

[0030] Figure 23 illustrates coupling of the EMP with the receiver antenna in accordance with one or more embodiments.

[0031] Figure 24 illustrates triggering of ground targets with an EMP generator munition system in accordance with one or more embodiments.

[0032] Figure 25 illustrates a pulsed powder supply explosive detonation system in accordance with one or more embodiments of the present disclosure.

[0033] Figure 26 illustrates a plurality of pulsed power supply explosive detonation system for clearing ground targets in accordance with one or more embodiments of the present disclosure.

[0034] Figure 27 illustrates deployment of a pulsed power supply explosive detonation system against ground targets in accordance with one or more embodiments.

[0035] Figure 28 illustrates engagement of a pulse power supply explosive detonation system with a first ground target in accordance with one or more embodiments.

[0036] Figure 29 illustrates engagement of a pulse power supply explosive detonation system with a second ground target in accordance with one or more embodiments.

[0037] Figure 30 illustrates engagement of a pulse power supply explosive detonation system with a third ground target in accordance with one or more embodiments.

[0038] Figures 31 illustrates coupling of the pulsed power supply explosive detonation system with multiple ground targets in accordance with one or more embodiments.

[0039] Figure 32 illustrates powder pulses delivered to the ground targets from the pulsed power supply explosive detonation system in accordance with one or more embodiments.

[0040] Figure 33 illustrates triggering of the ground targets with the pulsed power supply explosive detonation system in accordance with one or more embodiments.DETAILED DESCRIPTION

[0041] Disclosed herein are systems and methods that utilize a pulsed power supply to generate EMPs for disabling targets, including single or multiple targets that may be subsurface, ground, surface, maritime and / or aerial targets. For example, the systems and methods may be used as an EMP munition system for disabling targets, such as landmines, radars, vehicles, maritime vessels, aircraft, command and control assets, communication assets, unmanned aerial vehicles (UAV), unmanned aerial systems (UAS), unmanned surface vessels (USV), electrical infrastructure, and other electronic assets. Certain targets (e.g., landmines) may be disabled by detonation while others may be disabled by internal damage.

[0042] EMP systems have been developed for disabling military targets. EMPs are brief, intense bursts of electromagnetic energy. EMPs may be characterized as brief (e.g., less than 100 microseconds) bursts of electromagnetic energy that is greater than 100 kilowatts. However, current EMP systems typically use low specific energy capacitors or solid state amplifiers resulting in systems that under energized or are very large often truck mounted, and thus, expensive and difficult to deploy. The generated EMP energy generates strong electric fields which electrically couples to conductive materials which induce currents that produce high voltages resulting in overvolting of electronics and electrical circuitry. Or alternatively, the electric fields couple with dielectric materials which creates electrical arcing and material degradation resulting in disablement of electronics and electrical circuity.

[0043] Disclosed herein are example EMP pulse generator munition systems that utilize compact pulsed power supplies (e.g., power density volume of greater than 100 megawatts per m3) to generate highly energetic EMPs for damaging or destroying electronic systems, and as example detonating landmines, disabling aerial targets such as UAS and missiles, disabling ground vehicles, disabling maritime vessels, disabling USV, disabling communication equipment, and electricalinfrastructure. The EMP pulse generator munition systems may include a pulsed power supply, an EMP generator, and an optional antenna. These EMPs can directly disrupt and defeat elements containing electrical circuity wherein the electromagnetic energy directly disrupts and defeats military assets and systems containing electrical circuity, such as radars, vehicle, aircraft, UAS, command and control systems, communication systems, electrical infrastructure, and other military electrical equipment. Such an approach may disrupt and defeat specific targets, including, vehicles (e.g., tanks, unmanned ground vehicles, Humvees, robotic vehicles, etc.), airborne systems and assets (including in space and in earth’s atmosphere), maritime vessels and systems (including subsurface vessels), as well support assets such as anti-air assets, communication systems and assets, logistical assets, etc.Example Pulsed Power Supplies

[0044] Example embodiments of the method for disabling and / or defeating targets, such as military electronic systems, with EMPs may use a pulsed power supply. The pulses may be high voltage, high current or low voltage, high current and thus be high-energy pulses. In addition, the pulsed power supply can deliver power to an electromagnetic wave source with a range of discharge times enabling electrical breakdown or localized heating or other defeat mechanism to disable or defeat military systems. The energy may be pulsed, for example, in an amount of about 1 millijoule to about 1 megajoule and at a frequency of about 1 millihertz to about 1 megahertz. This energy may then be channeled to an electromagnetic wave source. In particular embodiments, the energy may be pulsed in an amount of about 1 millijoules to 1 megajoules and at a discharge time range of about 1 nanosecond to 1 second. To defeat the targets, a single EMP or multiple EMPs may be deployed.

[0045] Any suitable technique may be used to provide pulsed power. Examples of suitable power supplies may include a variety of pulse generators, including, linear transformer drivers, vector inversion spiral generator, Marx generators, capacitive discharge, inductive discharge, tesla coils, Blumlein pulse forming networks, pulse transformers, transverse electromagnetic mode cell, magnetic pulse compression, explosively driven pulsed power, compact magnetic pulse compression, capacitor banks, and transmission line transformers. In some embodiments, pulsed power may be provided with a generator. For example, DC power supply may be connected to a vector inversion generator to provide the pulsed power. While example embodiments described herein may illustrate a pulsed power supply that uses a vector inversion spiral generator, the disabling and defeating techniques of EMP propagation may use any suitable power supply providing the requisite pulsed power.

[0046] Example embodiments may include coupling multiple pulse generators (e.g., more than one spiral generator 102 shown on Figures 1 A, IB, 1C, 4-6. 8 A. 8B) arranged into a pulse forming network. Example pulse forming networks may include a plurality of pulse generators wired together in any suitable manner, including in parallel, in series, or in Guillemin Type A, Type B, Type C, Type D, or Type E networks. In accordance with example embodiments, discharge pulses from the pulse forming networks may be spaced in time, for example, resulting in square, rectangular, or trapezoidal pulses, which may have a relatively flat top, or pulses that support formation of a sinusoidal, triangular, saw tooth or other wave form for specific frequency output power.

[0047] In accordance with present embodiments, the pulsed power supply may use vector inversion to achieve voltage magnification. Vector inversion refers to the rapid reversal of electric fields to allow series voltage multiplication. By vector inversion, a lower voltage supply may be shaped to a narrow pulse at a higher voltage or higher current w hich then excite the electromagnetic wave source.

[0048] Example embodiments of the pulsed power supply may comprise a pulse generator having insulator and conductor layers. In some embodiments, the insulator and conductor layers may be wound in a spiral geometry to form a spiral generator. As used herein, spiral generators are pulsed generators that use a pair of conducting foils wound in a spiral (or other suitable geometry) in conjunction with a switch to convert electrostatically stored energy into higher power electromagnetic energy. In other embodiments, the insulator and conductor layers of the spiral generator may be otherwise wound to form other shapes, such as spool, tubular, cone, reel, multiposition, centerless, and flanged, triangular, quadrilateral, pentagon, hexagon, heptagon, octagon, nonagon, decagon, hendecagon, dodecagon and other polygons.

[0049] The pulsed power supply may be charged from a power source, such as an electrochemical energy device, electrolytic energy storage device, or a ram air turbine. In some embodiments, the pulsed power supply may include an electric generator, electrochemical battery, a turbine (e.g., RAM air turbine), a solar cell, a fuel cell, wall power, electrolytic capacitor, super capacitor, electrolytic capacitor, or other power system, which may be direct current (DC) or alternating current (AC), for example. An input switch may isolate the spiral generator from the power source. To discharge power, a shorting switch connected to the outer end of the conductor layers can be closed, shorting the pulsed power supply causing the stored charge to have a longer path length than the length of the capacitor-transmission line combination. The path length is the total distance electrons travel from the end of the positive line to the end of the negative line. The transmission line is the conductive material in the wound composite sheets. The transmission line is connectedto both the input power source and the output into load. As a result, the pulsed power supply may be considered underdamped causing electrons to stack up on the ground plate. When the ground plate is at its highest charge state, the pulsed power supply may deliver its highest output voltage, which then allows high energy electrons to be delivered to a load. By vary ing the feed voltage, any arbitrary output voltage may be produced allowing the pulsed power supply to drive current into any load. It should also be noted that a generator described herein can also be architected to supply nominal voltage but high current. In some embodiments, the pulsed power supply may be rechargeable.

[0050] Figures 1A to 1C are a schematic illustration of a voltage magnification mechanism in accordance with example embodiments. The voltage magnification mechanism illustrated on these figures uses vector inversion for series voltage multiplication. Figures 1A to 1C schematically illustrates a pulsed power supply 100 comprising a generator, shown as a spiral generator 102. A shorting switch 104 connects the spiral generator 102 with a ground side 106 of the pulsed power supply 100. With reference to Figure 1A, spiral generator 102 has a stored charge, illustrated as electrons 108. When the shorting switch 104 is closed and the spiral generator 102 is shorted, as shown on Figure IB, the electrons 108 move from the spiral generator 102 and send an electromagnetic wave down the shorting switch 104 in the direction indicated by arrows 110. With reference now to Figure 1 C, the electromagnetic wave charges the ground side 106 of pulsed power supply 100 with electrons 108 being repelled from the ground side 106 to a load (not shown) in the direction indicated by arrow 112.

[0051] With additional reference to Figure 2, a graph of voltage versus time showing a hypothetical waveform depiction of vector inversion is provided in accordance with example embodiments. At Step 1A (corresponding to Figure 1A), the spiral generator 102 is charged by the external power source. At Step IB (corresponding to Figure IB), the spiral generator 102 is shorted with electrons 108 moving from the spiral generator 102 down to the shorting switch 104 by the voltage reduction. At step 1C (corresponding to Figure 1C), the spiral generator 102 discharges maximum voltage as the electromagnetic wave charges the ground side 106 with electrons being discharged to load by the negative peak.

[0052] With additional reference to Figure 3, another hypothetical w aveform depiction of vector inversion is illustrated, in accordance with example embodiments. As illustrated, the pulsed power supply 100 (e.g., shown on Figure 1A) is charged at Time = 0 with an initial field configuration. When shorted, the pulsed power supply 100 discharges electrons 108 (e.g., shown on Figure 1C) until a maximum negative peak is reached, referred to as a magnification field configuration.

[0053] Example embodiments may use a pulsed power supply 100. As previously described, the pulsed power supply 100 includes a spiral generator 102 that is charged then releases pulsed energy. The energy pulses may be high voltage, low current, low voltage, high current and thus be high-energy pulses. The energy pulses can also be low voltage, low current or high voltage, high current based upon the load impendence, input charge voltage and spiral generator geometry. In addition, the pulsed power supply 100 can deliver power with a range of discharge times enabling the ability to produce electromagnetic fields when coupled to an appropriate electromagnetic wave source.

[0054] To charge the pulsed power supply 100, power is inputted to the spiral generator charge line. For example, a power source, such as an electrochemical energy device, electrolytic energy storage device, or a ram air turbine, may be coupled to the spiral generator 102 to provide input power. In some embodiments, the pulsed power supply may include an electric generator, electrochemical battery, a turbine (e.g., RAM air turbine), a solar cell, a fuel cell, wall power, electrolytic capacitor, super capacitor, electrolytic capacitor, or other power system, which may be direct current (DC) or alternating current (AC), for example. The input power to the pulsed power supply 100 may range, for example, from about 1 watt to about 100,000 watts or more. In some embodiments, the input power to the pulsed power supply 100 may range from about 100 watts to about 10,000 watts. In some embodiments, the input power to the pulsed power supply 100 may range from about 1,000 watts to 1.000,000,000 watts.

[0055] The pulsed power supply 100 may be controlled to provide high-energy pulses. For example, the pulsed power supply 100 may output instantaneous power at a range from about 1 watt to about 1 terawatt. In some embodiments, the pulsed power supply 100 may output instantaneous power at a range from about 1 kilowatt to 1 megawatt. In some embodiments, the pulsed power supply 100 may output instantaneous power at a range from about 1 megawatt to 1 terawatt. By way of further example, the pulsed power supply 100 may have an output voltage of about 50 millivolts to about 50 megavolts. In some embodiments, the pulsed power supply may have an output voltage of about 50 millivolts to about 40 kilovolts, about 40 kilovolts to about 1 megavolt, about 600 kilovolts to about 10 megavolts, or about 10 megavolts to about 1 gigavolt. The instantaneous power output and / or output voltage from the pulsed power supply 100 can depend, for example, on the total length of wind, number of winding turns, size of the pulsed power supply 100, dielectric material, conductive material and load inductance. For example, the number of winding turns may range from about 2 to about 100,000, alternatively about 2 to about 1,000, about 1,000 to about 10.000, or about 10,000 to about 100,000. By way of further example, the radius of the wound composite sheets (e.g., spiral composite structure 400 on FIG. 5) may rangefrom about 1 millimeter to about 1 meter or 0.01 millimeter to 1 centimeter. By way of further example, the individual sheets (e.g., first dielectric layer 500 and second dielectric layer 502 on FIG. 5) may have a height of about 1 centimeter to about 1 meter or 1 micrometer to 1 centimeter (as shown on FIG. 4).

[0056] The power may be discharged from the pulsed power supply 100 at a discharge time that ranges from about 1 picosecond to about 100 milliseconds. In some embodiments, the discharge time from the pulsed power supply 100 may range from about 1 picosecond to 1 nanosecond. In some embodiments, the discharge time from the pulsed power supply 100 may range from about 1 nanosecond to 1 millisecond. The discharge time can depend, for example, on the inductance of the load, relative permittivity of the dielectric material, relative permeability of the conductor, spacing between the conductors, and switching speed of the switch.

[0057] The power may be pulsed from the pulsed power supply 100 at a fast-firing rate to provide energy pulses at a rapid rate. For example, the power may be pulsed at a firing rate of about 1 hertz to about 100 Megahertz. In some embodiments, the pulse rate from the power system may range from about 100 Hertz to 1 kilohertz. The pulse rate can depend, for example on the inductance of the spiral generator, relative permittivity of the dielectric material used in the spiral generator 102, relative permeability of the conductor used in the spiral generator 102, resistivity of the conductor used in the spiral generator 102, spacing betw een the conductors of the spiral generator 102, and available current from the power source.

[0058] Example embodiments may include potting of the pulse generator (e.g., spiral generator 102). For example, the pulse generator may be contained in a hardened liquid, for example epoxy, polycarbonate, polyethylene, nylon, acrylic, polypropylene, polystyrene, polyvinyl chloride, polyethylene terephthalate, polycarbonate, acrylonitrile butadiene styrene, polyoxymethylene, polyurethane, polyethylene vinyl acetate, polyethylene oxide, polyether ether ketone, thermoplastic elastomers, to protect the pulse generator when undergoing high accelerations, which may be encountered during deployment.

[0059] Figure 4 illustrates a spiral generator 102 with a spiral geometry for use in a pulsed power supply 100 (e.g., shown on Figures 1A, IB, 1C. 5) in accordance with example embodiments. As illustrated, the spiral generator 102 may comprise spiral composite structure 400. In the illustrated embodiment, the spiral composite structure 400 is fabricated with a spiral geometry to form a spiral composite structure 400. The number of turns controls the voltage multiplier. Typical number of turns ranges, for example, from 5 to 5,000 for applications that use input voltages ranging from 2V DC to 120V DC or 120 VDC to 10,000 V DC. or 2V AC to 120 V AC or 120vAC to 10,000V AC dependent upon scale of operations and particular requirements. For higher power applicationssuch as high voltage power conversion, the number of turns can increase to 10,000 or more due to the higher output voltages needed. The radius of the spiral composite structure 400 may range, for example, from about 0. 1 micrometers to about 1 meter.

[0060] With additional reference to Figure 5, a pulsed power supply 100 comprising a spiral generator 102 is illustrated in accordance with example embodiments. In the illustrated embodiments, the spiral generator 102 comprises a spiral composite structure 400 with a spiral geometry that is fabricated around a core 402, which may be circular as show n or otherwise formed. As illustrated, the spiral composite structure 400 comprises a first dielectric layer 500 and a second dielectric layer 502. While Figures 4 and 5 illustrate the first dielectric layer 500 and second dielectric layer 502 as being separate layers, they may be a single layer, in some embodiments. The spiral composite structure also comprises first and second conductive layers 504. 506, wherein the first dielectric layer 500, second dielectric layer 502, first conductive layer 504, and second conductive layer 506 are arranged in alternating layers in a spiral geometry'. The first and second conductive layers 504, 506 form alternating layers between the first and second dielectric layers 500, 502, respectively, in the spiral composite structure 400. For example, the spiral composite structure 400 includes the first conductive layer 504, first dielectric layer 500, second conductive layer 506, and second dielectric layer 502, starting from the exterior. The first and second conductive layers 504, 506 and first and second dielectric layers 500, 502 are coupled to one another. For example, the first conductive layer 504 is layered on the first dielectric layer 500, which is layered on the second conductive layer 506, which is layered on the second dielectric layer 502. By way of further example, the first dielectric layer 500 and second dielectric layer 502 may have a height hl (show n on Figure 4) of about 1 micrometer to about 1 meter.

[0061] The first and second conductive layers 504, 506 may comprise any of a variety of suitable conductors, including a conductor, such as metal or metalloid including copper, aluminum, Inconel, graphene, carbon silver, gold, nickel, silicon, graphite, chromium, platinum, tin, lead, silicon or stainless steel. The first and second conductive layers 504, 506 may have any suitable thickness, such as 10 nanometers to 5 millimeters. In accordance with present embodiments, the first and / or second dielectric layers 500, 502 may comprise a highly polarizable dielectric material. In some embodiments, the highly polarizable dielectric material is in the first dielectric. In some embodiments, the highly polarizable material is in the first dielectric layer 500, the second dielectric layer 502, or both of the first and second dielectric layers 500, 502. As used herein, highly polarizable materials have a relative permittivity of 2 to 100, or a higher relative permittivity of 1 0 or greater. For example, the polarizable dielectric materials can have a relative permittivity of about 2 to about 40 or about 40 to about 100,000 or about 1,000 to about 100,000. Polarizabledielectric materials with a corresponding high relative permittivity should have a stronger polarization response to an imposed electric field, allowing the material to store more energy unit per mass. In some embodiments, the polarizable dielectric material may be mixed with a dielectric matrix material. In some embodiments, the polarizable dielectric material may be disposed on a dielectric substrate. Examples of suitable dielectric matrix materials or substrates include epoxies, polyethylene, polyethylene terephthalate, polyimides, polyurethane, ceramic pastes, ceramic matrix and combinations thereof. The dielectric layer may have any suitable thickness, such as between 10 nanometers to 5 millimeters. In some embodiments, the polarizable dielectric material may be disposed on a conductive substrate. Examples of suitable conductive substrates include aluminum, Inconel, nickel, stainless steel, copper, platinum, silver, gold, chromium, tin, lead, carbon, silicon and combinations thereof. In some embodiments, the polarizable dielectric material may be disposed on a substrate comprising a conductive material, such as copper, aluminum, Inconel, graphene, carbon silver, gold, nickel, silicon, graphite, chromium, platinum, tin, lead, silicon or stainless steel, or other suitable conductor. The conductive layer may have any suitable thickness, for example, between about 10 nanometers to about 5 millimeters.

[0062] The highly polarizable material can be integrated with the first and second conductive layers 504, 506 an suitable technique. For example, the highly polarizable material (e.g., of the first and / or second dielectric layers 500, 502) may be physically attached to the first and second conductive layers 504, 506, or may be integrating together with suitable techniques including film deposition and photolithography, spraying / masking, screen printing, pick and place, chemical etching, ion beam milling, electron beam deposition, nanoimprint lithography, atomic layer deposition, other physical and chemical deposition approaches, additive manufacturing, die cutting / adhering, and other additive and subtractive manufacturing approaches. The highly polarizable dielectric material may include, for example, a ferroelectric material, a conjugated polymer, or combinations thereof. Examples of suitable ferroelectric materials include barium titanate, strontium titanate, potassium niobate, calcium copper titanate, lithium niobate, lead titanate, barium strontium titanate and lead zirconium titanate or other perovskite or ferroelectric materials. Examples of suitable conjugated polymers include: poly(3,4-ethylenedioxythiophene); polystyrene sulfonate (PEDOT:PSS); poly(phenylene vinylene) (PPV); poly(2,7-carbazole) (PCZ); polyimides (PI) and poly(phenylene oxide) (PPO). Examples of suitable glass include silicates such as: borosilicate, lead silicate, alkali silicate, sodium borosilicate, aluminosilicate, lead borosilicate, and zinc borosilicate The highly polarizable dielectric material may be included in the first and second dielectric layers 500, 502 in any suitable amount, for example, in an amount of about 5% to about 80% by mass of the corresponding dielectric layer.

[0063] As illustrated, the first and second conductive layers 504, 506 may each be separated by first and second dielectric layers 500, 502. The first and second conductive layers 504, 506 have input ends 508, 510 (e.g., outer ends) and output ends 512, 514 (e.g., inner ends). Tn the illustrated embodiments, the input ends 508, 510 are coupled across a shorting switch 516. In some embodiments, the shorting switch 516 may include a solid state switch, for example, a semiconductor that can control its conductivity through input of voltage to its gate to allow it to open and close controllably. Example materials for the solid state switch may include doped silicon, doped silicon carbide, doped gallium nitride, doped gallium arsenide, and / or doped germanium. In another embodiment, the shorting switch 516 may include a photoconductive switch with photoconductive material which exhibits an increase in its electrical conductance as a consequence of irradiation with light. In some embodiments, the shorting switch 516 may be designed for a high power throughput (greater than 1 kW). In an alternative embodiment, a shorting switch 516 is coupled across the output ends 512, 514. One of the output ends 512, 514, identified as first output end 512 is coupled to a load 518 and a variable inductor 520 that are in series. Another switch 519 may be positioned between the load 518 and the spiral generator 102, for example, to isolate the load 518 from the spiral generator 102. - In some embodiments, the switch 519 may be pulsed width modulated, for example, to adjust the input voltage to a reduced level and charge for step-down operations. In other embodiments, the switch 519 may be opened / closed, for example, to allow isolation from low voltage section. A power source 522 is coupled to the input ends 508, 510 by way of the shorting switch 51 . The power source 522 may be any source of input power including, for example, such as an electrochemical energy' device, electrolytic energy' storage device, or a ram air turbine. In some embodiments, the pulsed power supply may include an electric generator, electrochemical battery, a turbine (e.g., RAM air turbine), a solar cell, a fuel cell, wall power, electrolytic capacitor, super capacitor, electrolytic capacitor, or other power system, which may be direct current (DC) or alternating current (AC), for example. The shorting switch 516 may enable, for example, power conditioning of an output from the spiral generator 102. For example, the shorting switch 516 may enable magnification of an input voltage or current with vector inversion. By way of further example, the shorting switch 516 may enable reduction of an input voltage or current with vector inversion.

[0064] With the shorting switch 516 open, the power source 522 may be coupled to the second input end 510 of the second conductive layer 506 and provides energy’ for charging the spiral generator 102. When charging, the input switch 515 may be closed to provide power from the power source 522 to the spiral generator 102. The input switch 515 may be opened to isolate the spiral generator 102 from the power source 522. As previously described.- 12 - the power source 522may be an AC or DC power supply, for example. In some embodiments, the power source 522 may be a DC power supply with a power input ranging from 10 watts to 100.000 watts or more, for example, when the shorting switch 516 is closed, the spiral generator 102 provides power to the load 518. The electrons begin flowing from the charged line to the ground line 524 where they launch an electrostatic / electromagnetic wave which propagates through the line until reaching the center of the spiral generator 102 where it reaches it maximum intensification and outputs into the load 518.

[0065] With the shorting switch 516 open, the power source 522 is coupled to the second input end 510 of the second conductive layer 506 and provides energy for charging the spiral generator 102. When charging, the input switch 515 may be closed to provide power from the power source 522 to the spiral generator 102. The input switch 515 may be opened to isolate the spiral generator 102 from the power source 522. As previously described, the power source 522 may be an AC or DC power supply, for example. When the shorting switch 516 is closed, the spiral generator 102 provides power to the load 518. The electrons begin flowing from the charged line to the ground line 524 where they launch an electrostatic / electromagnetic wave which propagates through the line until reaching the center of the spiral generator 102 where it reaches it maximum intensification and outputs into the load 518.

[0066] In the illustrated embodiment, the variable inductor 520 is positioned in series with the load 518. As illustrated, the variable inductor 520 is disposed between the load 518 and the spiral generator 102. The variable inductor 520 generally may vary the current output. In some embodiments, the variable inductor 520 is an electronic device. In other embodiments, the variable inductor 520 is provided by spacing between the load 518 and the spiral generator 102. With inclusion of the variable inductor 520, the output from the spiral generator 102 can be controlled in accordance with present embodiments.

[0067] Figure 6 is a cross-sectional view of the spiral composite structure 400 of the spiral generator 102 taken along line 6-6 of Figure 5, in accordance with example embodiments. As illustrated, the spiral composite structure 400 comprises alternating lay ers of the first and second dielectric layers 500, 502 and the first and second conductive layers 504. 506. In the illustrated embodiment, at least one of the second dielectric layers 502 comprises a composite 600 disposed on a dielectric substrate, wherein the composite 600 comprises a dielectric material and at least one additional material selected from the group consisting of a ferroelectric material, a conjugated polymer, and a glass. For example, composite 600 may include, for example, an additional material (e.g.. a ferroelectric ceramic such as barium titanate, a conjugated polymer, or a glass, such as silicate glass) dispersed in a dielectric matrix. In some embodiments, the composite 600 maycomprise the additional material (e.g., a ferroelectric ceramic such as barium titanate, a conjugated polymer, or a glass, such as silicate glass) mixed with a varying fraction of dielectric matrix material such as, polymers, of which some examples include epoxies, polyvinyl butyral, polytetrafluoroethylene, polyethylene, polyethylene terephthalate, polyimides, poly and polyurethane. The dielectric substrate 602 may comprise any suitable dielectric material, polyvinyl butyral, polytetrafluoroethylene including polymers, epoxies, polyethylene, polyethylene terephthalate, polyimides, ceramic pastes, ceramic matrix and combinations thereof.

[0068] While Figure 6 illustrates the composite 600 disposed in at least one of the second dielectric layers 502, it should be understood that the composite 600 may be otherwise configured. For example, the composite 600 may be included in only one of the second dielectric layers 502, all of the second dielectric layers 502, or a subset of the second dielectric layers 502. In addition, the composite 600 may be disposed in at least one of the first dielectric layers 500 in addition to, or in place, of the second dielectric layers, for example, in only one of the first dielectric layers 500, all of the first dielectric layers, or a subset of the first dielectric layers 500.

[0069] In some embodiments, at least one of the first and second dielectric layers 500, 502 comprises at least one metamaterial 604 disposed in at least one of the dielectric layers, such as the first and second dielectric layers 500, 502. As illustrated, two or more of the alternating layers of the first and second dielectric layers 500, 502 comprise the at least one metamaterial 604. In some embodiments, at least one metamaterial 604 may be disposed in the ferroelectric material, conjugated polymer, or glass, for example, the composite 600. Suitable metamaterials for use as the metamaterial 604 include materials engineered to have a geometry that interacts with an electromagnetic field. The metamaterial may be a conductive material (e.g., copper, aluminum, Inconel, graphene, silver, gold, nickel or stainless steel) embedded in the dielectric material, for example, as specific shapes or features and at specific locations. Any of a variety of suitable metamaterial features may be used, including negative refractive index metamaterials, fishnet structures, helical structures, hyperbolic dispersive metamaterials, magnetic metamaterials, and metamaterial resonators (e.g.. metamaterial resonator 702 shown on Figure 7). Examples of suitable metamaterial resonators include circular split-ring resonators, rectangular split-ring resonators, labyrinth resonators, and fractal resonators. Among other things, the at least one metamaterial 604 modifies the dielectric properties to help sharpen the output pulse to enable faster discharges. For example, the metamaterial 604 may trap magnetic fields to prevent retardation of the output pulse and can enable engineered dispersive properties to enable the output pulse to sharpen as it exits the spiral geometry.

[0070] Any suitable technique may be used to form at least one metamaterial 604 in at least one of the dielectric layers, such as the first and second dielectric layers 500, 502. Examples of suitable techniques include photolithography, spraying / masking, screen printing, pick and place, chemical etching, ion beam milling, electron beam deposition, nanoimprint lithography, atomic layer deposition, other physical and chemical deposition approaches, additive manufacturing, and die cutting / adhering and other additive or subtractive manufacturing approaches. In some embodiments, at least one metamaterial 604 may be etched or otherwise drawn. In other embodiments, at least one metamaterial 604 may be cut from conductive ribbon materials and implanted into the dielectric layer using adhesives or deposited using masking.

[0071] While at least one metamaterial 604 is shown in at least one of the second dielectric layers 502, it should be understood that at least one metamaterial 604 may be otherwise configured. For example, at least one metamaterial 604 may be included in only one of the second dielectric layers 502, all of the second dielectric layers 502, or a subset of the second dielectric layers 502. In addition, the at least one metamaterial 604 may be disposed in at least of the first dielectric layers 500 in addition to, or in place, of the second dielectric layers, for example, in only one of the first dielectric layers 500, all of the first dielectric layers, or a subset of the first dielectric layers 500.

[0072] Figure 7 is a cross-sectional view of one of the second dielectric layers 502 of the spiral composite structure 400 taken along line 7-7 of Figure 6, in accordance with example embodiments. In the illustrated embodiment, at least one metamaterial 604 of the second dielectric layer 502 is shown. As illustrated, at least one metamaterial 604 includes a plurality of resonators arranged in an array 700 to modify the relative permittivity to enable faster discharge times. As illustrated, at least one metamaterial 604 may be in the form of a metamaterial resonators 702 (e.g., circular split-ring resonators), as shown on this figure, for example. While only a single dielectric layer (e.g., second dielectric layer 502) is shown on Figure 7. example embodiments may include two or more of the first and second dielectric layers 500, 502 comprising metamaterial resonators 702. In the illustrated embodiment, the metamaterial resonators 702 each comprise an inner ring 704 with a first split 706 on one side disposed inside of an outer ring 708 with a second split 710 on an opposite side from the first split 706. A number of variables can be adjusted to tune the performance of the metamaterial resonators 702, including number of the metamaterial resonators 702, spacing of the metamaterial resonators 702, radius of the inner ring 704, radius of the outer ring 708, conductivity of the resonator ring material, and size of the first and second splits 706, 710, among others. The spacing of the metamaterial resonators 702 may vary, for example, from 10 pm to 1 cm and. in other embodiments, from 1 mm to 1 cm. The unit cell size of the metamaterial resonators 702 may vary, for example, from 10 pm to 1 cm and, in other embodiments, from 10um to 1 mm. The radius of the inner ring 704 may vary, for example, from 10 nm to 10 cm and, in other embodiments, from 1 mm to 5 mm. The radius of the outer ring 708 may vary, for example, from 10 pm to 4 mm and, in other embodiments, from 50 pm to 3 mm.

[0073] Figure 8A is a block diagram illustrating a pulsed power supply 100 with a spiral generator 102 for providing energy to a load 518 in accordance with example embodiments. In the illustrated embodiment, a power source 522 (e.g., a DC power supply) is electrically coupled to the spiral generator 102. As previously described, power source 522 may be used to charge spiral generator 102, which is configured to discharge power to a load 518 when a shorting switch 516 (e.g., referring to Figure 5) is activated. Figure 8B is another illustrated embodiment of a pulsed power supply 100 that further includes a feed capacitor 802 positioned electrically between the power source 522 and the spiral generator 102, for example, to regulate voltage provided to the spiral generator 102. The feed capacitor 800 provides additional energy to allow tailoring for total output energy and power. The feed capacitor 800 can also provide power directly to load 518, which may be an electromagnetic wave source, for example.

[0074] As previously described, pulsed power supply 100 may include multiple spiral generators (e.g., spiral generator 102 on Figures 4-6) arranged into a pulse forming network, in accordance with example embodiments. As used herein, the term “pulse forming network” refers to an electrical circuit that stores then release electrical power rapidly (i.e., <100 microseconds) in short- duration pulses that are less than 100 microseconds. For example, two or more spiral generators may be arranged in parallel or senes to store energy then release it rapidly in short-duration pulses.

[0075] The pulse forming network may include two or more spiral generators. For example, the pulse forming network may include from 2 to 25,000 spiral generators. By way of further example, the pulse forming network may include from 100 to 25,000 spiral generators. By way of further example, the pulse forming network may include from 1.000 to 25,000 spiral generators. By way of further example, the pulse forming network may include from 2,500 to 20,000 spiral generators. By way of further example, the pulse forming network may include from 5,000 to 15,000 spiral generators.

[0076] To form the pulse forming network, the spiral generators may be wired together in any suitable manner, including in parallel, in series, in series-parallel, or in Guillemin Type A, Type B, Type C, Type D, or Type E networks. In accordance with example embodiments, discharge pulses from the pulse forming networks may be spaced in time, for example, resulting in square, rectangular, or trapezoidal pulses, which may have a relatively flat top. By tuning a spiral pulse forming network, certain waveforms may be achieved. Arbitrary waveform output can be achieved by combining primitive pulses formed with the network and modulating their voltage heightthrough initial voltage charge control. These primitive pulses are sequenced in time to synthesize the desired arbitrary waveform through the pulse amplitude modulation of the pulse forming network output. For example, a pulse forming network may allow creation of power output with a range of output waveforms including: sine, square, saw tooth, chirp, triangle, exponential rise, exponential decay, unit step, and impulse. In alternative embodiments, the pulse forming network may be formed by a single spiral generator combined with an impedance matching network, for example, to obtain desired waveforms.

[0077] Figure 9 illustrates a pulse forming network 900 comprising multiple spiral generators (e.g., spiral generator 102 on Figures 4-6), in accordance with example embodiments. As illustrated, a first spiral generator 102a, second spiral generator 102b, a third spiral generator 102c, and a fourth spiral generator 102d may each be electrically coupled to a load 518. which may be an electromagnetic wave source (e.g., electromagnetic wave source 1202 on Figure 12) in some embodiments. For simplicity, additional equipment that may be required including switches, inductors, resistors, filters, and input power supply, among others, are not shown on Figure 9. Each of the first, second, third, and fourth spiral generators 102a, 102b, 102c. and 102d may include one or more features disclosed herein to provide pulsed power, for example, using vector inversion to achieve voltage magnification. In accordance with example embodiments, the first, second, third, and fourth spiral generators 102a, 102b, 102c, and 102d may be configured to discharge in series or in parallel. When fired in series, the first, second, third, and fourth spiral generators 102a, 102b, 102c, and 102d may output an instantaneous power that is constant or near constant. When fired in parallel, as shown on Figure 9, the first, second, third, and fourth spiral generators 102a, 102b, 102c, and 102d may output an instantaneous power that is additive to provide higher output power.

[0078] In operation, the pulse forming network 900 may operate as a PFN (e.g., a Guillemin Type E PFN) by using discharge of power from each individual spiral generator (e.g.. first, second, third, and fourth spiral generators 102a, 102c, 102d) to synthesize a waveform. In the illustrated embodiment, this can be done by having the individual waves phase shift to allow superposition of the outputs from the first, second, third, and fourth spiral generators 102a. 102c, 102d to make the final waveform. The phase shift can be done through either software control of the switching of each individual spiral generator to time lag the discharge of power from each of the first, second, third, and fourth spiral generators 102a, 102c, 102d to synthesize the desired waveform, or to add in time delay lines on either the high voltage output from the first, second, third, and fourth spiral generators 102a, 102c, 102d or the triggering of such spiral generators. For example, the delay elements can be ferrites, specific lengths of transmission line, or capacitor / inductor networks toappropriately phase shift the output signals from the first, second, third, and fourth spiral generators 102a. 102c, 102d to synthesized the desired PFN waveform.

[0079] Figure 10A illustrates another example of a pulse forming network 900, in accordance with example embodiments. The pulse forming network 900 includes a spiral generator 102, an impedance match network 1000, and a load 518. For simplicity, additional equipment that may be required including switches, inductors, resistors, and input power supply, among others, are not shown on Figure 10A. The spiral generator 102 may include one or more features disclosed herein to provide pulsed power, for example, using vector inversion to achieve voltage magnification. Examples of the spiral generator 102 are described in more detail herein on Figures 1A-1C and 4- 6. As illustrated, the spiral generator 102 may provide pulsed power to the impedance match network 1000 that phase shifts the input signal from spiral generators to match the reactive impendence of the load 518. The impedance match network 1000 may include inductors and capacitors. The impedance match network 1000 may be electrically coupled to the load 518, for example, to output impedance-matched power to the load 518, which may be an electromagnetic wave source (e.g., electromagnetic wave source 1202 on Figure 12) in some embodiments.

[0080] Figure 10B illustrates another example of a pulse forming network 900 comprising multiple spiral generators (e.g., spiral generator 102 on Figures 4-6), in accordance with example embodiments. As illustrated, a first spiral generator 102a and a second spiral generator 102b may each be electrically coupled to an impedance matching network 1000 and a load 518, which may be an electromagnetic wave source (e.g., electromagnetic wave source 1202 on Figure 12) in some embodiments. For simplicity, additional equipment that may be required including switches, inductors, resistors, filters, and input power supply, among others, are not shown on Figure 10B. The first spiral generator 102a and second spiral generator 102b may include one or more features disclosed herein to provide pulsed power, for example, using vector inversion to achieve voltage magnification. Examples of the spiral generators are described in more detail herein on Figures 1 A-1C and 4-6. As illustrated, the first spiral generator 102a may provide stepped up to the second spiral generator spiral generator 102, which may in turn provide pulsed pow er to the impedance match network 1000 that phase shifts the input signal from spiral generators to match the reactive impendence of the load 518. The impedance match network 1000 may include inductors and capacitors. The impedance match network 1000 may be electrically coupled to the load 518, for example, to output impedance-matched pow er to the load 518, which may be an electromagnetic wave source (e.g., electromagnetic wave source 1202 on Figure 12) in some embodiments.

[0081] While only two spiral generators are shown on Figure 10B, examples embodiments may include more than two spiral generators in the pulse forming network 900 of Figure 10B. Forexample, the pulse forming network 900 may include any number of spiral generators, including from 2 to 10 of the spiral generators or from 2 to 4 of the spiral generators, shown as first spiral generator 102a and second spiral generator 102b. While not separately shown, each of the spiral generators (e.g., first spiral generator 102a and second spiral generator 102b) may include switching (e.g., shorting switch 516 and input switch 515 on Figure 5). The spiral generators (e.g., first spiral generator 102a and second spiral generator 102b) may be wired together in suitable configuration, including in parallel, in series, in series-parallel, or in a Guillemin Type A, Type B, Type C, Type D, or Type E network. In some embodiments, the generator modules 1002 may be wired to form a Guillemin Type E network.

[0082] By forming a pulse forming network 1000 with the one or more spiral generators (e.g., first spiral generator 102a and second spiral generator 102b, the pulse forming network 1000 may be tuned to discharge a predetermined waveform, voltage, and pulse width. In some embodiments, the pulse forming network 1000 can output power with an output voltage ranging from 5 V to about 500 kV or higher and a frequency ranging from about 0 Hz to about 100 GHz. As desired for a particular application, the pulse forming network 1000 may output power in a different form than was input, including changing AC to DC, DC to AC, voltage step up, voltage step down, and frequency change. In some embodiments, the pulse forming network 1000 may be incorporated into a generator stage (e.g., generator stage 1302d on Figure 13).

[0083] Figure 11 illustrates an example of a pulsed power supply 100 in accordance with example embodiments. In the illustrated embodiment, the pulsed power supply 100 includes a power source 522, spiral generator 102, and a filter 1100. As illustrated, the filter 1100 may be electrically coupled to a load 518, which may be an electromagnetic wave source (e.g., electromagnetic wave source 1202 on Figure 12) in some embodiments. The spiral generator 102 may be charged with input power from power source 522. which may be AC or DC power. As previously described, the power source 522 may be any suitable power source, such as an electrochemical energy device, electrolytic energy7storage device, or a ram air turbine. In some embodiments, the pulsed power supply may include an electric generator, electrochemical battery7, a turbine (e.g., RAM air turbine), a solar cell, a fuel cell, wall power, electrolytic capacitor, super capacitor, electrolytic capacitor, or other power system, which may be direct current (DC) or alternating current (AC), for example. The spiral generator 102 (or multiple of the spiral generator 102) may output stepped up power to the filter 1100 that may function to, among other things, smooth out power fluctuations and / or reduce noise. In some embodiments, the filter 1100 (or multiple of the filter 1100) may further step up the power output from the spiral generator. While now shown, the pulse power supply 100 may include additional electronic devices such as switches (e.g., input switch 515 and shorting switch516 on Figures 5), wiring, and / or inductors, among others. In some embodiments, the pulsed power supply 100 of Figure 11 may be include a single generator stage (e.g., generator stage 1302 of Figure 13).

[0084] The fdter 1100 may include any suitable filter. The filter 1100 may output power to the load 518, in accordance with example embodiments. Examples filters for use in the pulsed power supply 100 may include a ladder (n) low-pass, LC ladder (T) low-pass, Butterworth low-pass, Chebyshev low-pass, elliptic (Cauer) low-pass, Bessel low-pass, and L-section low-pass filters. High-pass filters include LC ladder (n) high-pass, LC ladder (T) high-pass, Butterworth high-pass, Chebyshev high-pass, elliptic (Cauer) high-pass, Bessel high-pass, and L-section high-pass filters. Band-pass filters consist of parallel resonant band-pass, series resonant band-pass, multiple resonator band-pass. Butterworth band-pass, Chebyshev band-pass, elliptic band-pass, and Bessel band-pass filters. Band-stop (notch) filters include parallel resonant band-stop, series resonant band-stop, twin-T notch, elliptic (Cauer) notch, Chebyshev notch, and Butterworth notch filters. Additionally, there are special LC filters that may be used, such as elliptic LC ladder filters, constant-K filters, m-derived filters. Zobel networks for impedance matching, lattice filters, and diplex filters. In some embodiments, the filter 1100 may further function as a converter circuit that can amplify input voltage and / or rectify pulsed DC input voltage to continuous DC output voltage. Examples of suitable converter circuits for use as the filter 1100 may include Villard cascade voltage multipliers, Dickson multipliers, Cockcroft-Walton (“CW”) multipliers, half-wave rectifier circuits, buck-booster converter, flyback converter, boost converter, cuk converter, voltage doubler, wye-wye rectifier, rectifier with LC filter, resonant converter, and full-wave rectifier circuits. In some embodiments, the filter 1100 may include multiple diode-capacitor cells. In some embodiments, the filter 1100 may include one or more CW multiplier, which may be configured to step up and / o rectify the output power from the spiral generator 102 (or spiral generators if multiple). CW multipliers are an electric circuit configured to both step up and rectify electric power. In general, CW multipliers include a network of capacitors and diodes to generate high voltages.Example Electromagnetic Pulse (EMP) Generator Munition Systems

[0085] Example embodiments of the EMP generator munition systems may include a munition and an EMP generator carried by the munition. The EMP generator may include a pulsed power supply (e.g., pulsed power supply 100 on Figures 1A, IB, 1C, 4, 5, 8A, 8B, 9, 10A, 10B, 12, 13, 14) and an electromagnetic wave source. In some embodiments, the electromagnetic wave source may be omitted with the pulsed power supply itself emitting microwaves as the EMP. Instead, the pulsed power supply may be operated to generate a rapid flux of electrons which can be driveninto an electromagnetic wave source that is specific for the production of electromagnetic radiation, including, for example, a vircator, magnetron, klystron, vircatron, milotron. ubitron. cavity magnetron, magnetically insulated line oscillator, spiral generator, non-linear transmission line, gyrotron, spark gap generator, traveling wave tubes, gyrotrons, free electron lasers, backward wave oscillators, solid state power amplifiers, gunn diodes, or other electromagnetic wave generating device. This electromagnetic radiation may then be pulsed due to the pulsed from the pulsed power supply and can be so energetic (because of the pulsed power supply’s energy storage capacity) that when projected through an antenna it generates an EMP that can disable electronic circuits located in the nearby environments. In some embodiments, the EMP generator munition system may be multi-use wherein the pulsed power supply may be rechargeable, for example, to enable multiple firings of the EMP.

[0086] Figure 12 illustrates an EMP generator 1200 in accordance with example embodiments. As illustrated, the EMP generator 1200 may include a power source 522, a controller 1004, a pulsed power supply 100, an electromagnetic wave source 1202, and an antenna 1204. In example embodiments, the charging / discharging of the pulsed power supply 100 is enabled by switching controlled by timing or by software programming on the controller 1004. The software can be used to determine the parameters of operation of the EMP generator 1200 including charging time, charge capacity, switch control of pulse width and pulse length, rise time, and charging and discharging delay time. The connection of pulsed power supply 100 with the electromagnetic wave source 1202 allows the generated electrical high-power pulses to enter the electromagnetic wave source 1202, for example, causing a large electric current to flow from the cathode of the electromagnetic wave source 1202 to the anode structure. This current pulse results in the generation of an electromagnetic radiation pulse emitted through radiation transparent window7in the EMP generator 1200. This electromagnetic pulse can be fed into an antenna 1204 which then delivers a high intensity electromagnetic radiation pulse (an EMP) in a predetermined direction at frequencies that may be defined, among other things by the geometry electromagnetic wave source 1202 and / or the design of the antenna 1204. Alternatively, the EMP can be emitted directly from electromagnetic wave source 1202, for example, to emit an omnidirectional EMP.

[0087] Any suitable power source 522 may be used in the EMP generator 1200 for charging the pulsed powder supply 100. Example embodiments of the pow er source 522 may be charged with input pow er from power source 522, which may be AC or DC pow er. As previously described, the power source 522 may be any suitable power source, such as an electrochemical energy device, electrolytic energy storage device, or a ram air turbine. In some embodiments, the pulsed power supply may include an electric generator, electrochemical battery, a turbine (e.g., RAM air turbine),a solar cell, a fuel cell, wall power, electrolytic capacitor, super capacitor, electrolytic capacitor, or other power system, which may be direct current (DC) or alternating current (AC), for example. Example solar cells may include photovoltaic solar cells. In some embodiments, the solar cells may be placed externally on a housing (e.g., housing 1404 on Figure 14. By including solar cells, the EMP generator may be able to recharge and fire indefinitely (or until a command is received to turn off). In some embodiments, the solar cells may enable recharging of the pulsed power supply every 120 minutes, every 60 minutes, every 30 minutes, every 20 minutes, or less. In some embodiments, the EMP generator 1200 does not include a separate power source 522 for charging the pulsed power supply 100. Rather, the EMP generator 1200 may be pre-charged prior to deployment.

[0088] The controller 1004 may be in electrical communication with other components of the EMP generator 1200, including the power source 522, pulsed power supply 100, and / or electromagnetic wave source 1202. For example, the controller 1004 may be in electrical communication with generator switching (e.g., input switches 515 and shorting switch 516 on Figure 5) to control charging and / or firing of the pulsed power supply 100. The controller 1004 may include a processor or other suitable device for processing instructions. For example, the controller may include a programable logic circuit, microprocessor, microcontroller, embedded microcontroller, programmable digital signal processor, or other programmable device. The controller 1004 may also, or instead, be embodied in an application specific integrated circuit, a programmable gate array, programmable array logic, or any other device or combinations of devices operable to process electric signals. The controller 1004 may provide instructions to the pulsed power supply 100. For example, the controller 1004 may send instructions to the pulse power supply 100 to cause firing of its generators (e.g., spiral generators 102 on Figures 4 and 5), such as by controlling switching (e.g., shorting switch 516 on Figure 5). By way of further example, the controller 1004 may send instructions to the pulsed power supply 100 to cause charging of it generators, such as by closing its switching (e.g., input switches 515 on Figure 5). In particular embodiments, the controller 1004 provides control power to charging, discharging, and triggering switching (e.g., input switch 515. shorting switch 516, etc.) to allow the pulsed power supply 100 to output a range of pulse amplitude heights, and the timing of these switching signals allows synthesis of these pulses into the desired output waveforms. The controller 1004 may also include a timing clock, for example, to ensure triggering is done at the right times to allow clean output and prevent generation of undesired higher frequency harmonics. Accordingly, in some embodiments, the controller 1004 may function to adjust output from the power source 522, for example, by adjusting the input voltage, closing time and / or rise time of the switches to, for example, adjust the output frequency,volage, and current. This adjustment may be done through pulse width modulation and input waveform adjustment by using the rectangle wave output from the controller 1004 and directly feeding it to the switches or running it through an op-amp before feeding it to the switches, in some embodiments. By adjustment with the controller 1004, the power source 522 may be considered to be digitally adjustable.

[0089] In some embodiments, the controller 1004 may be programmable with triggering and pulsing parameters. Example triggering and pulsing parameters may include, for example, input voltage, pulse width, and rise time into the triggering switches (e.g., shorting switch 516 and input switch 515 on Figure 5). This adjusts the closing time and input frequency into the spiral generator (e.g., spiral generator 102 on Figures 4 and 5). Pulsing parameters may include the input voltage going into the spiral generator, which may be controlled through pulse width modulation for the charging switch (e.g., input switch 515 on Figure 5). In some embodiments, the controller 1004 may adjust rise time and closing time of the shorting switch (e.g., shorting switch 516 on Figure 5), as well as synchronization of the shorting switches for multiple spiral generators (e.g., spiral generators 102a-102d on Figure 9). In a specific example, the controller 1004 could provide a 10ns pulse width modulated 3.3V signal to an op-amp that then combines this with a sine wave from a voltage source oscillator to output a triangle wave of 10ns rise time to go into the gate of the triggering switch of the spiral generator. In another example, the controller 1004 may provide a lus pulse width modulated 3.3V signal to the charging switch of the spiral generator to have it charge the spiral generator to 100V.

[0090] The pulsed power supply 100 is a system that emits pulsed power that may be high voltage, high current or low voltage, high current and thus be high-energy pulses. Example embodiments of the pulsed power supply 100 are described herein, for example, on Figures 1A, IB, 1C, 4, 5, 8A, 8B, 9, 10A, 10B, 12. 13. 14. In some embodiments, the pulsed power supply 100 may include one or more spiral generators (e.g., spiral generator 102 on Figures 4 and 5). The pulsed power supply 100 can deliver power to an electromagnetic wave source 1202 with a range of discharge times enabling electrical breakdown or localized heating or other defeat mechanism to disable or defeat military systems. The power may be pulsed, for example, with energy in an amount of about 1 millijoule to about 1 megajoule and at a frequency of about 1 millihertz to about 1 megahertz. This power may then be channeled to the electromagnetic wave source 1202. In particular embodiments, the power may be pulsed with energy' in an amount of about 1 millijoules to 1 megajoules and at a discharge time range of about 1 nanosecond to 1 second.

[0091] The electromagnetic wave source 1202 may receive pulsed power from the pulsed power supply 100 and convert the pulsed power to one or more EMPs. Example embodiments of theelectromagnetic wave source 1202 may include a microwave source, including a vircator, magnetron, klystron, vircatron, milotron, ubitron, cavity magnetron, magnetically insulated line oscillator, spiral generator, non-linear transmission line, gyrotron, spark gap generator, traveling wave tubes, gyrotrons, free electron lasers, backward wave oscillators, solid state power amplifiers, gunn diodes, or other rf generating device that may be excited by the pulsed power supply 100. As example, a magnetron among other components may use magnets and waveguides to generate and direct microwaves. For example, a magnetron may include a cylinder with cavities opening to a central vacuum chamber within which there is a cathode. An electrical pulse of specific voltage and current is supplied between the cathode and the cavity container acting as the anode generating an electrical discharge and resultant microwave pulse. A permanent magnet may be used to provide a magnetic field to confine the electrical pulse, and a waveguide may be used to direct the generated microwaves to the antenna 1204. Magnetrons are commonly used in micro wave ovens, but also have been employed in sonar and in the production of EMPs. Example embodiments of the electromagnetic wave source 1202 in the EMP generator 1200 may generate EMPs having frequency outputs of about 500 Mhz to about 40 Ghz and power outputs of about 100 watts to about 1 terawatt with the standard working range being about 500 watts to about 1 Gigawatt. In some embodiments, the spiral generator (e.g., spiral generator 102 on Figures 1A-1C, 4-6, and 8A- 11) may be configured to emit the EMP without a separate electromagnetic wave source. For example, one or more properties of the spiral generator may be modified for it to operate as the electromagnetic wave source of Figure 12. Example properties may include tightness of the wind changes, for example, being tighter inside than they are further out.

[0092] The antenna 1204 may be used to direct EMPs received from the electromagnetic wave source 1202. For example, the antenna 1204 may direct the EMPs toward the targets. Examples of suitable antennas may include labyrinth parabolic, slot, hom, yogi-uda array, and micropatch antennas. The antenna may be directly connected to the electromagnetic wave source 1202, for example, using transmission lines including a microstrip, coaxial, triaxial, hollow wave guide or alternatively a feed hom connected through a micro wave network. The antenna 1204, for example, may focus the EMPs to an area over a 3-dimensional, 365-degree area. For example, the EMPs may be focused into a region from 5 to 180 degrees in span. Examples of the antenna 1204 can be a combination of positive and negative index materials and include labyrinth, fractal, microstrip, patch, lumped element transmission line structures. Examples of potential dielectrics in the antenna 1204 can include epoxy, polycarbonate, polyethylene, nylon, acrylic, polypropylene, polystyrene, polyvinyl chloride, polyethylene terephthalate, polycarbonate, acrylonitrile butadiene styrene, polyoxymethylene, polyurethane, polyethylene vinyl acetate, polyethylene oxide, polyether etherketone, thermoplastic elastomers, barium titanate, strontium titanate, potassium niobate, calcium copper titanate, lithium niobate, lead titanate, barium strontium titanate and lead zirconium titanate or other perovskite or ferroelectric materials. Examples of suitable conjugated polymers include: poly(3,4-ethylenedioxythiophene): polystyrene sulfonate (PEDOTPSS); poly (phenylene vinylene) (PPV): poly(2,7-carbazole) (PCz); polyimides (PI)1 and poly (phenylene oxide) (PPO). The antenna 1204 may have a low mass, e.g., about 5 to 1000 grams, about 2 grams, about 1 gram, or less per antenna 1204.

[0093] The EMP generator 1200 may be lightweight to enable deployment by a variety of munitions. For example, the EMP generator 1200 may weigh about 100 kilograms (kg), about 50 kg, about 5 kg, about 1kg or less. In some embodiments, the EMP generator 1200 may have a weight of about 47.6 kg or less for deployment in a 155-millimeter artillery shell. In some embodiments, the EMP generator 1200 may have a weight of about 5 kg or less for deployment by drones and UAS. In some embodiments, the EMP generator 1200 may have a weight of about 100 kg to 10,000 kg for fixed antenna systems.

[0094] Figure 13 illustrates another example of the EMP generator 1200 in accordance with example embodiments. As illustrated, the EMP generator 1200 may include a power source 522, a controller 1004, a pulsed power supply 100, an electromagnetic wave source 1202, and an antenna 1204. The power source 522, controller 1004, electromagnetic wave source 1202, and antenna 1204 may be similar and function similar to the components described with respect to Figure 12. However, the pulsed power supply 100 shown on Figure 13 is illustrated in more detail. In the illustrated embodiment, the pulsed power supply 100 comprises multiple generator stages, wherein each of the generator stages comprises at least one spiral generator (e.g., spiral generator 102 shown on Figures 1A-1C and 4-6), and wherein the final stage comprises a pulse forming network (e.g., pulse forming network 900 shown on Figures 9-11) that comprise multiple spiral generators (e.g., spiral generator 102 shown on Figures 1A-1C and 4-6). For example, the generator stages may include a first generator stage 1302a, second generator stage 1302b, third generator stage 1302c, and fourth generator PFN stage 1302d that each output stepped up power. As previously described herein, the pulse forming network of the fourth generator PFN stage 1302d may be wired in parallel or series.

[0095] Each of the generator stages (e.g., first generator stage 1302a, second generator stage 1302b, third generator stage 1302dc, and fourth generator PFN stage 1302d) may include one or more features disclosed herein to provide pulsed power, for example, using vector inversion to achieve voltage magnification. For simplicity, additional equipment that may be required including switches, inductors, resistors, and input power supply, among others, are not shown on Figure 13.In some embodiments, one or more of the generator stages may be a voltage source converter that steps up voltage to the next generator stage. In some embodiments, the generator stages may not require a spiral generator but may include other electronic circuits for voltage step up, such as the filters described herein that step up voltage. In some embodiments, the first generator stage 1302 may be considered a low voltage stage. For example, the first generator stage 1302 may receive power from the power source 522 at a voltage of 3.7V to 1,000V and output stepped up power at 480V to 10,000V. The generator stages can be charged with input power (AC or DC) as previously described, for example, with a voltage ranging from about 0.001 V to about 10,000 kV for AC or about + / - 0.0005 V to about + / - 5,000 kV for DC with a frequency ranging from about 0 Hz to about 100 GHz. The fourth spiral generator PFN stage 1302d may discharge output power ranging from 0.002 V to about 20,000 kV for AC or about + / - 0.0005 V to about + / - 5,000 kV for DC with a frequency ranging from about 0 Hz to about 100 GHz. While not shown separately, one or more of the generator stages may include filter (e.g., filter 1100 on Figure 11). For example, first generator stage 1302a. second generator stage 1302b, third generator stage 1302c, and / or fourth generator PFN stage 1302d may include a filter. While not illustrated in detail on Figure 13, the generator stages may each include other components of the pulsed power supply 100 as described herein, for example, switching and wiring, among other components.

[0096] In operation, the pulsed power supply 100 may be charged by the power source 522 in accordance with example embodiments. The controller 1004 may operate to control charging and firing of the generator stages. Each of the generator stages may output stepped up power from a previous one of the generator stages. For example, first spiral generator stage 1302a may output stepped up power from the power source 522 to the second spiral generator stage 1302b. The second spiral generator stage 1302b may output stepped up power from the first spiral generator stage 1302a to the third spiral generator stage 1302c. The third spiral generator stage 1302c may output stepped up power from the second spiral generator stage 1302b to the fourth spiral generator PFN stage 1302d. The fourth spiral generator stage 1302d may output stepped up power from the third spiral generator stage 1302c to the electromagnetic wave source 1202. The electromagnetic wave source 1202 may generate an EMP that can be directed by antenna 1204.

[0097] Figure 14 illustrates an EMP generator munition system 1400 that includes a munition 1402 that houses the EMP generator 1200, in accordance with example embodiments. As previously described, a munition 1402 may be used to deploy the EMP generator 1200 to a desired location with respect to a target. When deployed, the EMP generator 1200 may be activated to discharge EMPs. For example, the pulsed power supply 100 may discharge power pulses to the electromagnetic wave source 1202 that converts the power pulses to EMPs. The EMPs may besufficient to disable the target, for example, by overvolting of electronics and electrical circuitry in the target.

[0098] The munition 1402 in the EMP generator munition system 1400 may be any suitable munition for deploying the pulsed power supply 100 and the respective electromagnetic wave source 1202. In the illustrated embodiment, the munition 1402 comprises a housing 1404 that houses the EMP generator 1200. The housing 1404 may further include one or more fins 1406, for example, that may help to stabilize the munition 1402 as it travels in the air. In some embodiments, the housing 1404 may be designed and configured to be handheld, for example, so that the munition 1402 may be deployable by a soldier in the field. In handheld embodiments, the munition 1402 may have a weight of about 5 kilograms or less. In some embodiments, the housing 1404 may be configured for attachment to a variety of vehicular systems, including maritime vessels, aerial vehicles, and ground vehicles. In some embodiments, the housing 1404 may be in the form of a projectile for firing from an artillery system, such as a rocket or a gun. In some embodiments, the housing may be configured for deployment from a solid or chemical rocket system. The fins 1406 and shape of the munition 1402 may. for example, enable deployment from artillery and rocket systems.

[0099] Additional examples of suitable munitions 1402 may include fixed antenna, missiles, rockets, bombs, artillery shells, shoulder-fired projectiles, bullet, grenade, mortars and drones. The munition 1402 may be used with a wide variety of platforms for delivering the munition 1402, including, fixed wing, rotary wing, multi-copter, hybrid fixed wing / rotary wing, vertical takeoff and landing vehicle, helicopters, drones, artillery, shoulder-fired weapon systems, rocket launchers, land vehicles, maritime vessels, submersible vessels, spacecraft, guns, and mortars. For example, the munition 1402 may be fired from a deployment system or may be delivered by a deployment system. In some embodiments, the munition 1402 may be a cluster bomb that launches EMP generator 1200. In some embodiments, the munition 1402 may include a precision-guided munition, such as a missile, launched rocket, guided bomb or a UAS. In some embodiments, the pulsed power supply 100 may be contained in a cavity formed in a munition body. In some embodiments, the pulsed power supply 100 and electromagnetic wave source 1202 may be attached to an exterior or interior of the deployment system body, for example, in a container attached to the munition body. In some embodiments, the pulsed power supply 100 and electromagnetic wave source 1202 may be permanently attached to UAS, UAV or drone system. In some embodiments, the electromagnetic wave source 1202 may be contained in the same cavity of the munition body or a different cavity in the munition body. In some embodiments, the electromagnetic wave source 1202 may be attached to an exterior of the munition body. As analternative to a deployable munition, the EMP generator 1200 may be a fixed system that may be attached to a vehicle, which may be manned or unmanned, that can deploy the EMP generator 1200 to a desired location for activation. For example, the EMP generator 1200 may be attached an antitank vehicle, robotic vehicle, or other suitable vehicle that can carry the EMP generator 1200 to a desired location. As an alternative to a deploy able munition, the EMP generator 1200 may be a fixed system that may be attached to a fixed antenna, which may be manned or unmanned, that can deploy the EMP generator munition system 1400 to a desired location for activation. For example, the EMP generator 1200 may be fixed to a base to protect against enemy drones, rockets and / or missiles.

[0100] The power source 522 may be housed in the housing 1404 of the munition 1402. Example of the power source 522 are previously described, for example, with respect to Figure 4 and Figure 12. As previously described, the power source 522 may be in suitable power source 522 for charging the pulsed power supply 100, including an electric generator, electrochemical battery’ (e.g. lithium-ion battery', thermal battery ), supercapacitors, electrolytic capacitors, film capacitors, miniature gas generator, miniature auxiliary power unit, a turbine (e.g., RAM air turbine), a solar cell, a fuel cell, wall power or other power system, which may be direct cunent (DC) or alternating current (AC), for example. In some embodiments, the power source 522 may be omitted, for example, where the pulsed power supply 100 may be pre-charged.

[0101] The controller 1004 may also be housed in the housing 1404 of the munition 1402. Examples of the controller 1004 are previously described, for example, with respect to Figures 12 and 13. As previously described, the controller 1004, for example, may7be used to control charging / discharging of the pulsed power supply 100.

[0102] The pulsed power supply 100 is a system that emits pulsed power that may be high voltage high current or low voltage high cunent and thus be high-energy pulses. Example embodiments of the pulsed power supply 100 are described herein, for example, on Figures 1A, IB, 1C, 4, 5, 8A, 8B, 9, 10A, 10B, and 13. As illustrated, the pulsed powder supply 100 may include multiple generator stages and at least on filter 1100. For example, the pulsed power supply 100 may include a first generator stage 1302a. second generator stage 1302b, third generator stage 1302c, and fourth generator PFN stage 1302d. The pulsed power supply 100 can deliver pow er to the electromagnetic wave source 1202 with a range of discharge times enabling electrical breakdown or localized heating or other defeat mechanism to disable or defeat military' systems. The power may be pulsed, for example, with energy in an amount of about 1 millijoule to about 1 megajoule and at a frequency of about 1 millihertz to about 1 megahertz. This power may then be channeled to the electromagnetic wave source 1202. In particular embodiments, the power may be pulsed withenergy in an amount of about 1 millijoules to 1 megajoules and at a discharge time range of about 1 nanosecond to 1 second.

[0103] Each of the generator stages (e.g., first generator stage 1302a, second generator stage 1302b, third generator stage 1302dc, and fourth generator PFN stage 1302d) may include one or more features disclosed herein to provide pulsed power, for example, using vector inversion to achieve voltage magnification. For simplicity, additional equipment that may be required including switches, inductors, resistors, and input power supply, among others, are not shown on Figure 14. In the illustrated embodiment, the pulsed power supply 100 comprises multiple generator stages, wherein each of the generator stages comprises at least one spiral generator (e.g., spiral generator 102 shown on Figures 1A-1C and 4-6), and wherein the final stage comprises a pulse forming network (e.g., pulse forming network 900 shown on Figures 9-11) that comprise multiple spiral generators (e.g., spiral generator 102 shown on Figures 1 A-1C and 4-6). For example, the generator stages may include a first generator stage 1302a, second generator stage 1302b, third generator stage 1302c, and fourth generator PFN stage 1302d that each output stepped up power. As previously described herein, the pulse forming network of the fourth generator PFN stage 1302d may be wired in parallel or series.

[0104] The electromagnetic wave source 1202 may receive pulsed power from the pulsed power supply 100 and convert the pulsed power to one or more EMPs. Example embodiments of the electromagnetic wave source 1202 may include a microwave source, including a vircator, magnetron, klystron, vircatron, milotron, ubitron, cavity magnetron, magnetically insulated line oscillator, spiral generator, non-linear transmission line, gyrotron, spark gap generator, traveling wave tubes, gy rotrons, free electron lasers, backward wave oscillators, solid state power amplifiers, gunn diodes, or other rf generating device that may be excited by the pulsed power supply 100. Example embodiments of the electromagnetic wave source 1202 in the EMP generator 1200 may generate EMPs having frequency outputs of about 500 Mhz to about 40 Ghz and power outputs of about 100 watts to about 1 terawatt with the standard working range being about 500 watts to about 500 Megawatts.

[0105] The antenna 1204 may be used to direct EMPs received from the electromagnetic wave source 1202. For example, the antenna 1204 may direct the EMPs toward the targets. Examples of suitable antennas may include labyrinth parabolic, slot, hom, yogi-uda array, and micropatch antennas. Alternatively, the EMP can be emitted directly from electromagnetic wave source 1202, for example, with omission of the antenna 1204. As illustrated, the antenna 1204 may further include a radome 1408, in accordance with some embodiments. For example, the radome 1408 may be used to enclose the antenna 1204.

[0106] As previously described, the EMPs emited from the EMP generator 1200 may be used to disable a wide variety of targets. Examples of suitable targets may include landmines, vehicles, airborne systems and assets, maritime vessels and systems, and land-based defense or offence systems and assets.. Additional examples of targets may include unexploded ordinance. In some embodiments, the vehicles may include tanks, trucks, Humvees, and other utility vehicles. In some embodiments, the airborne systems and assets may include planes, helicopters, spacecraft, space telescopes, and satellites, whether in space or in the earth’s atmosphere. In some embodiments, the maritime vessels and systems may include ships, barges, and subsurface vessels. In some embodiments, the land-based assets may include defensive assets including anti-air assets, communication systems and assets, and logistical assets among others, or offensive assets including rocket launch bateries, UAV launch bateries, EMP source bateries among others.

[0107] In operation, the EMP generator munition system 1400 comprising a munition 1402 and an EMP generator 1200 may be deployed to a desired location in accordance with example embodiments. For example, the munition may be launched, dropped, fired, or otherwise deploy the EMP generator munition system 1400 to a location proximate to a target that so it can be exposed to the generated EMPs. In some embodiments, the housing 1404 of the munition 1402 may further include a parachute for the EMP generator 1200 that may be dropped or directly dropped from a drone or other aircraft. In other embodiments, the munition 1402 may be fired or launched directly on the deployment platform. In some embodiments, the munition 1402 may be a cluster bomb that launches EMP generators. After deployment, the EMP generator 1200 may be activated to discharge EMPs. In some embodiments, the EMP may be delivered from a fixed antenna. Any suitable technique may be used to activate the EMP generator 1200, including a wired signal, wireless signal (e.g., radio, cellular, etc.), altimeter, magnetic sensor, pressure sensor, gravity sensor, or alternative sensor. In some embodiments, the triggering sensors may be coupled to the shorting switch (e g., shorting switch 104 on Figures 1 A-l C and 5) connected to the pulse generator (e.g., spiral generator 102 on Figures 1A-1C and Figures 4 and 5) to trigger the power pulses at a desired time. In some embodiments, an altimeter may be used to trigger the EMP generator 1200 when a desired altitude is reached upon descent of the EMP generator 1200. When the EMP generator 1200 is activated, the pulsed power supply 100 may discharge power pulses to the electromagnetic wave source 1202 that converts the power pulses to EMPs. The EMPs may be coupled with the target and be sufficient to disable the target, for example, by overvolting of electronics and circuitry in the target.

[0108] Figure 15 illustrates air deployment of an EMP generator munition system 1400 from an aerial system, such as a drone, shown as UAS 1500, in accordance with example embodiments. Insome examples, the EMP generator munition system 1400 may be releasably attached to the UAS 1500 (or other suitable aerial system) that it is a dropped munition that can be released from the UAS 1500 prior to discharge. In some embodiments, the EMP generator munition system 1400 may be pre-charged, for example, by power source 522 (e.g., batteries) shown on Figure 14. In some embodiments, the EMP generator munition system 1400 may be charged from batteries prior to dropping, or charged by power from the UAS 1500 prior to dropping. In another example of air deployment, the deployment mechanism may include attachment of the EMP generator to the UAS 1500 until UAS is proximate the target with EMP generator munition system 1400 generating the EMP 1502 turn on just prior to impact. The UAS 1500 may fire the EMP generator munition system 1400 in a single attack or may be configured to survive the EMP 1502 to perform multiple attacks. In yet other embodiments, the EMP generator munition system 1400 may be fixed (e.g., permanently attached) to UAS 1500 so that it is deployed and triggered while fixed to the UAS 1500. In contrast to being releasably attached where release of EMP generator munition system 1400 may triggered while the UAS 1500 is deployed in the air, the EMP generator munition system 1400 is considered permanently attached to the UAS 1500 where physical intervention is required to detach the EMP generator munition system 1400 from the UAS 1500.

[0109] In some embodiments, the EMP generator munition system 1400 may further include a guidance sensor 1504. In the illustrated embodiment, the guidance sensor 1504 is supported by the UAS 1500. but in alternative embodiments, the guidance sensor 1504 may be directly or indirectly attached to the munition 1402. The guidance sensor 1504 may provide active guidance, targeting RF emissions from targets. In response to the sensed RF emissions, for example, the EMP generator munition system 1400 may be directed towards a target. Examples of the guidance sensor 1504 may include radio direction finders, cameras (e.g.. LIDAR), and / or radar.

[0110] Figure 16 illustrates air deployment of an EMP generator munition system 1400 from an aerial system, such as a drone, shown as UAV 1600, in accordance with example embodiments. In some examples, the EMP generator munition system 1400 may be fixed to the UAV 1600. For example, the munition 1402 may be fixed to the UAV 1600 with power provided to the EMP generator munition system 1400 from power source 522 (e.g.. batteries) shown on Figure 14 or from power supplied by the UAV 1600. For example, the EMP generator munition system 1400 may be permanently attached to the UAV 1600 or other suitable aerial system. In some embodiments, the EMP generator munition system 1400 may releasably attached to the UAV 1600 (or other suitable ariel system) so that is a dropped munition that can be dropped from the UAV 1600 prior to discharge of the EMP 1502. In other embodiments, the EMP generator munitionsystem 1400 may earn' the EMP generator munition system 1400 as it discharges the EMP 1502, which may be a single attack or multiple attacks.[01 1 1] Figure 17 illustrates ground deployment of an EMP generator munition system 1400 from aground surface 1700. As illustrated, the EMP generator munition system 1400 may emit the EMP 1502 towards one or more targets 1702. In the illustrated embodiment, the antenna 1204 of the EMP generator munition system 1400 may be used to direct the EMP 1502 towards the one or more targets 1702. Targets may include a manner or unmanned ariel system, such as a drone, airplane, and / or helicopter. It is not necessary that the EMP generator munition system 1400 be directly on the ground surface 1700, but it may be deployed from a vehicle, structure, building, or other deployment system on the ground surface 1700.

[0112] While the preceding discussion, describes use of the EMP generator 1200 for military applications, it should be understood that the EMP generator 1200 may be used in other applications where discharge of the EMP 1502 may be desired. For example, the EMP generator 1200 may be used where focused radiofrequency (“rf ’) heating is required, including medical procedures like radiofrequency ablation (tumor destruction), diathermy (deep tissue heating in physical therapy), certain types of surgery, industrial processes like plastic welding and metal heating, and some advanced security technologies like millimeter wave scanners, which all may utilized targeted rf pulses that may be emitted from the EMP generator 1200 for their ability to generate localized heat or to flood an area with frequency and intensity controlled rf radiation. Example Ground Target Clearing with EMP Generator System

[0113] Breaching of mine fields on land is a task performed by military forces in order to move through enemy-emplaced obstacles intended to disrupt and fix friendly forces. As shown in current conflicts, landmines can be rapidly emplaced or scattered by quick-delivery mechanisms such as aircraft and artillery. These landmine obstacles consist of anti-vehicle and / or anti-personnel mines that may be surface-laid or buried. Landmines are generally categorized into two classes, ‘'smart” vs. “conventional.” Smart landmines include triggering mechanisms containing electrical circuitry which detonates a mine's explosive when triggered compared to conventional landmines which purely relies on a mechanical triggering mechanism. Both are challenging to disarm in combat scenarios. The traditional approach involves the deployment of a mine clearing line charge (MICLIC) or use of vehicles equipped with plows, flails or electrical jamming devices to clear paths for friendly armor to penetrate enemy positions. While effective, recent experience show s smart landmines are being adapted to avoid neutralization from MICLIC and plow removal / disablement approaches making smart landmine disablement in combat scenarios a critical technology gap.

[0114] In response to these challenges, the development of specialized lightweight demining and non-nuclear EMP solutions has become an area of development. Compact robotic systems and demining equipment designed for rapid deployment offer a more agile and efficient means of mine clearance or defeat of enemy systems than current solutions. These new demining systems can navigate challenging terrains, avoid triggering mines, and minimize the risk to human operators. By leveraging advanced technologies such as sensors, artificial intelligence, and remotely operated systems, these demining systems contribute to the timely and effective removal of mines, allowing military forces to navigate through minefields with increased speed and reduced risk. This shift towards lightweight demining solutions represents an advancement in the field of military7engineering, addressing the unique challenges posed by modem conflict scenarios.

[0115] Turning now to Figures 18-24, use of an EMP generator munition system 1400 for detonating a target will now be described in accordance with one or more embodiments. Figure 18 illustrates a plurality of targets, shown as landmines 1800, arranged in a minefield 1802. As illustrated, each of the landmines may include a housing 1804 that contains primers 1806 and an explosive material 1808.

[0116] Figure 19 illustrates an EMP generator munition system 1400 deployed near the landmines 1800. In the illustrated embodiments, the EMP generator munition system 1400 is deployed above the landmines 1800. However, the EMP generator munition system 1400 can be deployed on land near the landmines 1800 in accordance with alternative embodiments so long as the EMP generator munition system 1400 can send EMPs to the landmines 1800. The EMP generator munition system 1400 may include an EMP generator 1200 and a plurality of receiver antennas 1900. The receiver antennas 1900 may be designed to penetrate into the landmines 1800, for example, w ith a projectile (e.g., flechette), thus providing an electrical pathway into the landmines 1800. In some embodiments, the receiver antennas 1900 may have a mass of about 1 gram to about 2 grams per antenna. In some embodiments, the receiver antennas 1900 may be omitted. As illustrated, the plurality of receiver antennas 1900 may be clustered with the EMP generator 1200. While not shown separately, the EMP generator 1200 may include a pulsed power supply (e.g., pulsed power supply 100 shown on Figures 1A, IB, 1C, 5, 8A. 8B, 9, 10A, 10B. 12, and 13), an EM wave source (e.g., EM wave source shown on Figures 12-14), and an optional antenna (e.g., antenna 1204 shown on Figures 12-14).

[0117] Turning now to Figure 20, the receiver antennas 1900 may be deployed from the EMP generator munition system 1400. While the receiver antennas 1900 are shown clustered with the EMP generator 1200, the receiver antennas 1900 may alternately be deployed separately from the EMP generator 1200, for example, from a separate munition. The receiver antennas 1900 mayspread and drop from the EMP generator munition system 1400 with at least some of the receiver antennas 1900 penetrating the landmines 1800, as shown on Figure 21. The EMP generator 1200 may be delayed to generate an EMP 1502 after the receiver antennas 1900 are deployed, as shown on Figure 22. Where no receiver antennas 1900 are used, the EMP 1502 may be generated by the EMP generator 1200 and travel to the landmines 1800 (or other suitable target). With at least a portion of the receiver antennas 1900 in the landmines 1800, the EMP 1502 may couple electrical energy with the landmines 1800 as shown on Figure 23. Where no receiver antennas 1900 are used, the EMP 1502 may couple electrical energy with the landmines 1800 (or other suitable target) without the receiver antennas 1900. In some embodiments, the electrical energy may generate a high energy plasma that emits from the receiver antenna 1900. The EMP 1502 may couple sufficient electrical energy to disable landmines 1800 by triggering mine detonation 2400. as shown on Figure 24.

[0118] Accordingly, example embodiments may use a pulsed pow er supply 100 to disable targets, such as landmines 1800. Among the many advantages, some embodiments of the pulsed power supplies 100 (e.g.. spiral generators 102) may have significantly higher specific energy’ than prior pulsed power supplies and, thus, can be much smaller than traditional non-nuclear EMP systems. This may allow- a system which is currently deployed in a cruise missile to be fired by a mortar, UAS or artillery shell or be airdropped by aerial vehicles and systems. Even further, the addition of receiver antenna may also enable disablement of targets that do not have circuity, such as convention landmines.Example Explosive Detonation System

[0119] Further disclosed herein are explosive detonation systems that include a pulsed power supply. Example detonation systems may include a pulsed power supply and corresponding electrodes mounted on a vehicle. The pulsed power supply may be configured to deliver pulsed power to the electrodes for generation of a plasma. By placing the electrodes proximate to a landmine, plasma generated at the electrodes may be used to detonate the landmine. Multiple electrodes may be carried by the vehicle to enable detonation of a series of landmines by the explosive detonation system. Alternatively, the pulsed power supply may be configured to deliver pulsed power to the electrodes, for example, a high voltage discharge of IkV or more. By placing the electrodes proximate a landmine, the high voltage generated at the electrodes may be used to detonate the landmine. Multiple electrodes may be carried by the vehicle to enable detonation of a series of landmines by the explosive detonation system.

[0120] Further disclosed herein are penetrator explosive detonation systems that include a pulsed power supply. Example penetrator explosive detonation systems may include a pulsed powersupply and a penetrator portion. The pulsed power supply may be configured to deliver pulsed power to the penetrator portion which functions as an electrode for exploding a bridge wire connecting the penetrator portion to a center electrode. By placing the penetrator portion at least partially inside a vehicle or as example partially inside a landmine or other explosive (e.g., primary or tertiary high explosive), the exploding bridge wire may be used to detonate a landmine or destroy a military system. In some embodiments, the penetrator portion may penetrate into the filler explosive of the landmine or other explosive system. Alternatively, the system could be used to overvolt and destroy other electrical systems of the vehicle or of the exampled landmine by delivering pulsed power high voltage discharge of 5kV or even 50kV. Multiple penetrator explosive detonation systems may be carried by a munition, vehicle, or other deployment method to enable detonation of a series of landmines by the explosive detonation system. Alternatively, the pulsed power supply may be configured to deliver pulsed power to the penetrator portion, for example, a high voltage discharge of IkV or more. By placing the penetrator portion proximate a landmine or military system, the high voltage generated at the penetrator portion may be used to destroy a military system or detonate the landmine or destroy a military system. Multiple penetrator explosive detonation systems may be carried by the vehicle to enable detonation of a series of landmines.

[0121] Example embodiments of the explosive detonation system may include a vehicle, a pulsed power supply secured to the vehicle, an electrode(s) electrically coupled to the pulsed power supply, and an extension element that carries the electrode pair. The vehicle may be used to deploy the explosive detonation system to a desired location with respect to a target. The extension element may be used to position the electrode pair proximate the target. The pulse power supply may discharge pulsed power to the electrode pair generating a plasma at the electrode for disabling the target. Multiple electrode pairs may be carried by the vehicle to enable detonation of a series of targets by the explosive detonation system.

[0122] Any of a variety of vehicles may be used to deploy the explosive detonation system. Examples of suitable vehicles may include, but are not limited to, human-operated vehicles whether remote or onboard, autonomous vehicles, and drones. In some embodiments, the explosive detonation system may function without a vehicle with a pulsed power supply being electrically coupled to a pair of electrodes an extension element, wherein the extension element may be deployed by a human. In some embodiments, the pulsed power supply may be deployed in a reinforced containment vessel deployed in or a connected to the vehicle. In some embodiments, the vehicle may be drone or other aerial vehicle (e.g.. fixed wing, rotary wing, or hybrid fixed / rotary wing aircraft ) that drops the electrodes onto the target.

[0123] Examples embodiments of the explosive detonation system may include a pulsed power supply. The pulsed power supply may include a pulse generator or a pulse forming networks for generating power pulses, as described herein. The power may be pulsed, for example, with pulse energy in an amount of about 1 millijoule to about 1 megajoule and at a frequency of about 1 kilohertz to about 1 megahertz. In particular embodiments, the power may be pulsed with pulse energy in an amount of about 1 millijoule to about 1 kilojoule and at a discharge time range of about 1 nanosecond to 1 second. The pulsed power supply may use any suitable technique to provide pulsed power. Examples of suitable pulse generators for the pulsed power supply may include linear transformer drivers, Marx generators, capacitive discharge, inductive discharge, tesla coils, Blumlein pulse forming networks, pulse transformers, transverse electromagnetic mode cell, magnetic pulse compression, explosively driven pulsed power, compact magnetic pulse compression, capacitor bank, transmission line transformer. In some embodiments, the pulsed power supply 100 with spiral generator 102 described on Figures 1A, IB, 1C, 3-6, and 8 may be used with the explosive detonation systems described herein. In some embodiments, the explosive power supply includes a separate power supply for charging the pulsed power supply as described herein. In other embodiments, the pulsed power supply may be pre-charged without a separate power supply for charging. Example embodiments of the explosive detonation system may include solar cells for recharging the pulsed power supply. Example solar cells may include photovoltaic solar cells. In some embodiments, the solar cells may be placed externally on a housing of the pulsed power supply or on the vehicle. By including solar cells, the pulsed power supply may be able to recharge and fire indefinitely (or until a command is received to turn off). In some embodiments, the solar cells may enable recharging of the pulsed power supply every7120 minutes, every 60 minutes, every 30 minutes, every 20 minutes, or less.

[0124] Example embodiments of the explosive detonation system may include an electrode pair electrically coupled to the pulsed power supply. For example, the electrode pairs may be electrically coupled to the pulsed power supply by way of one or more conductive wires touching the electrode pair to the pulse generator of the pulsed power supply. By way of further example, the electrode pairs may be wired to the pulse generator by a peaking switching (spark gap which self-breaks) or a solid state thyristor. The electrode pair may be held by an external fixture or may be placed onto the target.

[0125] The electrode(s) may receive power pulsed from the pulsed power supply. In some embodiments, passing electrons from the pulsed power between an electrode pair may generate plasma at the electrode pair. In some embodiments, the pulsed power delivered to the electrode(s) may produce a flux of electrons at the electrode(s)s that may be passed, for example, to theproximate target (e.g., landmine), spot welding a hole it its shell or other casing. In some embodiments, the vehicle and / or the extension element may carry a supply of electrodes (or electrode pairs), for example, a magazine of electrode pairs, to dispense electrodes as electrodes are consumed by mine detonation. The supply of electrodes (or electrode pairs) may enable replacement of the electrode (electrode pairs) for detonating a plurality of landmines with the explosive detonation system. Example embodiments of the explosive detonation system may include optional projectiles as the electrode in place of the electrode pair that can be used to penetrate the landmine. In some embodiments, the electrode projectiles may be carried by the extension element for deployment into the landmine. For example, the electrode projectiles may be fired from a gun or other suitable delivery device that can propel the electrode projectile using, for example, explosive force or pressure. Example electrode projectiles may include darts, nails, or other suitable projectiles capable of penetrating into the target. The electrode projectiles may be electrically coupled (e.g., wired) to the pulsed power supply, which would emit power pulsed through the electrode projectile and into the landmine to cause the landmine to explode.

[0126] Example embodiments of the explosive detonation system may include an extension element. Example extension elements may include, but is not limited to, a boom arm, a telescoping arm, or an articulating arm. The extension element may allow positioning of the electrode pair proximate the target, for example, by moving the electrode pair horizontally and / or vertically with respect to the vehicle.

[0127] The explosive detonation system may be used to disable a wide variety of targets. Examples of suitable targets may include landmines, vehicles, airborne systems and assets, maritime vessels and systems, and supports assets. In some embodiments, the landmines may include smart or conventional landmines. For example, the landmines may be arranged in a minefield of smart landmines, conventional landmines, or a combination of smart and conventional landmines. In some embodiments, the vehicles may include tanks, trucks, Humvees, and other utility vehicles. In some embodiments, the airborne systems and assets may include fixed wing, rotary wing, hybrid fixed / rotary wing aviation, helicopters, spacecraft, space telescopes, and satellites, whether in space or in the earth’s atmosphere. In some embodiments, the maritime vessels and systems may include ships, barges, and subsurface vessels. In some embodiments, the support assets may include anti-air assets, communication systems and assets, and logistical assets. Additional examples of targets may include unexploded ordinance.

[0128] Figure 25 illustrates an explosive detonation system 2500 in accordance with example embodiments. As illustrated, the explosive detonation system 2500 may include a vehicle 2502 and a pulsed power supply 100 carried by the vehicle 2502. While not shown separately, the pulsedpower supply 100 may include a spiral generator (e.g., spiral generator 102 shown on Figures 4 and 5). An extension element 2506 may also be carried by the vehicle 2502. As illustrated, the extension element 2506. The extension element 2506 may also carry a plurality of electrode pairs (e.g., first electrode pair 2508a), for example, at a distal end. The electrode pairs (e.g., first electrode pair 2508a) may be contained in a first cartridge 2510a secured to the extension element 2506.

[0129] Figure 26 illustrates a plurality of landmines 1800 arranged in a minefield 902 in accordance with example embodiments. As illustrated, two or more of the explosive detonation system 2500 may be deployed to the minefield 902, for example, to disable the landmines 1800.

[0130] Figures 27 to 33 illustrate use of the explosive detonation system 2500 for disabling landmines 1800 arranged in a minefield 1802 in accordance with example embodiments. Figure 27 illustrates deployment of the explosive detonation system 2500 to the minefield 1802 for disabling landmines 1802a- 1802c in accordance with example embodiments. As illustrated, the explosive detonation system 2500 may include a vehicle 2502, a pulsed power supply 100, an extension element 2506, and a plurality of electrode pairs (e.g., first electrode pair 2508a) on a first cartridge 2510a. As illustrated by Figure 28, the vehicle 2502 and / or the extension element 2506 may be positioned for placement of a first electrode pair 2508a on top of a first landmine 1800a electrically coupling the first landmine 1800a to the pulsed power supply 100. While not shown, wires may electrically couple the electrode pair 2508 to the pulsed power supply 100.

[0131] Figure 29 illustrates positioning of the vehicle 2502 and / or the extension element 2506 for placement of a second electrode pair 2508b in a second cartridge 2510b on top of a second landmine 1800b electrically coupling the second landmine 1800b to the pulsed power supply 100 in accordance with example embodiments. As illustrated, the first electrode pair 2508a with a corresponding first cartridge 2510a may have been left on the first landmine 1800a while still be electrically connected by wiring 2900 to the pulsed power supply 100. This process may be repeated as shown on Figure 30 for placement of a third electrode pair 2508c in a third cartridge 2510c onto a third landmine 1800c. As shown on Figure 31, the first electrode pair 2508a, second electrode pair 2508b. and third electrode pair 2510c may each be electrically coupled to the pulsed power supply 100 by wiring 2900. In this manner, the pulsed power supply 100 may be electrically coupled to the first, second, and third landmines 1800a, 1800b, 1800v. To detonate the first, second, and third landmines 1800a, 900b, 900c with the explosive detonation system 2500, the pulsed power supply 100 may send high voltage power pulses (e.g., 5 kV or higher generating electric fields in the target of 10 MV / m or greater) to the first, second, and third electrode pairs2508a, 2508b, 2508c. The electrode pairs may trigger primers in each of the first, second, and third landmines 1800a, 1800b, 1800c. causing detonation 3300, as shown on Figure 33.

[0132] Figure 34 illustrates a penetrator detonation system 3400 in accordance with example embodiments. As illustrated, the penetrator detonation system 3400 may include a power supply 3405 (e.g., pulsed power supply 100 shown on Figures 1A, IB, 1C. 3-6, and 8). The penetrator detonation system may include an elongated portion 3410 that extends from the power supply 3405. The elongated portion 3410 may include a penetrator portion 3415 at a distal end 3420 and an exploding wire 3425 between the penetrator portion 3415 and the power supply 3405. The penetrator portion 3415 may be any suitable penetrator for penetrating into a landmine or other military system. Examples of suitable penetrators may include needles, such as tungsten needles, depleted uranium needles, and stainless-steel needles. The exploding wire 3425 may include a wire (e.g., narrow gauge wire) such that the wire vaporizes when current is discharged from the power supply 3405 to the penetrator portion 3415.

[0133] In operation, the penetrator detonation system 3400 may be deployed into a proximate a military system. In some embodiments, the penetrator detonation system 3400 penetrates into the military system. For example, the penetrator portion 3415 may extend into the military system, such as a landmine. In some embodiments, the penetrator portion 3415 may extend into the explosive contained in the landmine. After deployment, the power supply 3405 may be activated to discharge pulsed power to the penetrator portion 3415, thereby causing the exploding wire 3425 to explode. If deployed into the landmine (or other explosive system), this explosion may also cause detonation of the explosive system. However, by being proximate to certain components, the discharge of pulsed power and exploding of the exploding wire 3425 can result in overvolting of electrical components in the military system thus potentially disabling the military system.

[0134] Figure 35 illustrates a cross-sectional view of the penetrator detonation system 3400 of Figure 34 in accordance with example embodiments. As illustrated, the penetrator detonation system 3400 includes a power supply 3405 and an elongated portion 3410 extending from the power supply 3405. The elongated portion 3410 includes a penetrator portion 3415 at distal end 3420 of the elongated portion 3410. The elongated portion 3410 further includes a center electrode 3500 coupled to power supply 3405. Center electrode 3500 may be positioned between the power supply 3405 and penetrator portion 3415. Center electrode 3500 may be electrically coupled to the power supply 3405. Exploding wire 3425 may form at least a portion of the electrical connection between the center electrode 3500 and penetrator portion 3415. Elongated portion 3410 may further include switch 3505. Switch 3505 may control the electrical connection between the center electrode 3500 and penetrator portion 3415. Once the penetrator detonation system 3400 isdeployed, for example, with the penetrator portion 3415 penetrating into a target, such as a landmine, the power supply 3405 may then send pulsed power to the penetrator portion 3415, which function as an electrode, causing the exploding wire 3425 to explode and, in turn, causing detonation of the target or overvolting of electrical components in the target.

[0135] Further disclosed herein are penetrator detonation systems that include a pulsed power supply. Example penetrator explosive detonation systems may include a pulsed power supply and corresponding contains a penetrator portion. The pulsed power supply may be configured to deliver pulsed power to the penetrator portion which functions as an electrode for exploding a bridge wire connecting the penetrator portion to a center electrode. By placing the penetrator portion at least partially inside a landmine or other explosive (e g., (primary or tertiary high explosive) the exploding bridge wire may be used to detonate a landmine or destroy a military system. In some embodiments, the penetrator portion may penetrate into the filler explosive of the landmine or other explosive system. Alternatively, the system could be used to overvolt and destroy other electrical systems. Multiple penetrator explosive detonation systems may be carried by a munition, vehicle or other deployment method to enable detonation of a series of landmines by the explosive detonation system. Alternatively, the pulsed power supply may be configured to deliver pulsed power to the penetrator portion, for example, a high voltage discharge of IkV or more. By placing the penetrator portion proximate a landmine or military system, the high voltage generated at the penetrator portion may be used to detonate the landmine or destroy a military system. Multiple penetrator explosive detonation systems may be carried by the vehicle to enable detonation of a series of landmines.

[0136] It is to be understood that the present disclosure is not limited to particular devices or methods, which may, of course, vary'. It is also to be understood that the terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting. All numbers and ranges disclosed herein may vary by some amount. Whenever a numerical range with a lower limit and an upper limit is disclosed, any number and any included range falling within the range are specifically disclosed. Although individual embodiments are discussed herein, the invention covers all combinations of all those embodiments. As used herein, the singular forms ■‘a”, “an’’, and “the” include singular and plural referents unless the content clearly dictates otherwise. Furthermore, the w ord “may” is used throughout this application in a permissive sense (i.e., having the potential to, being able to), not in a mandatory sense (i.e., must). The term “include,” and derivations thereof, mean “including, but not limited to.” The term “coupled” means directly or indirectly connected. If there is any conflict in the usages of a word or term in this specification and one or more patent or other documents that may be incorporated herein byreference, the definitions that are consistent with this specification should be adopted for the purposes of understanding this invention.

[0137] Although specific embodiments have been described above, these embodiments are not intended to limit the scope of the present disclosure, even where only a single embodiment is described with respect to a particular feature. Examples of features provided in the disclosure are intended to be illustrative rather than restrictive unless stated otherwise. The above description is intended to cover such alternatives, modifications, and equivalents as would be apparent to a person skilled in the art having the benefit of this disclosure.

[0138] The scope of the present disclosure includes any feature or combination of features disclosed herein (either explicitly or implicitly), or any generalization thereof, whether or not it mitigates any or all of the problems addressed herein. Various advantages of the present disclosure have been described herein, but embodiments may provide some, all, or none of such advantages, or may provide other advantages.

Claims

CLAIMSWhat is claimed is:1 . A system for generation of an electromagnetic pulse (“EMP), comprising: a pulsed power supply for generating pulsed power, wherein the pulsed power supply comprises a spiral generator: and an electromagnetic wave source electrically coupled to the pulsed power supply and configured to generate one or more EMPs from the pulsed power.

2. The system of claim 1, further comprising a plurality of spiral generators integrated into a pulse forming network, wherein the pulse forming network comprises the spiral generators.

3. The system of claim 1, wherein the spiral generator comprises one or more conductive layers and one or more dielectric layers arranged in alternating layers, and wherein at least one of the one or more dielectric layers comprises a polarizable dielectric material.

4. The system of claim 3, wherein the one or more conductive layers and one or more dielectric layers are arranged in a spiral geometry.

5. The system of claim 3, wherein the polarizable dielectric material comprises a ferroelectric material.

6. The system of claim 5, wherein the ferroelectric material comprises a ferroelectric ceramic.

7. The system of claim 5, wherein the polarizable dielectric material is disposed on a substrate comprising the dielectric material.

8. The system of claim 5, wherein the polarizable dielectric material is disposed on a substrate comprising a conductive material.

9. The system of claim 5, wherein the polarizable dielectric material is embedded in a matrix comprising the dielectric material.

10. The system of claim 3, further comprising one or more shorting switches coupled across output ends of the one or more conductive layers.

11. The system of claim 3, wherein the at least one of the one or more dielectric layers comprises a metamaterial.

12. The system of claim 3, wherein the at least one of the one or more dielectric lavers comprises a metamaterial resonator.

13. The system of claim 3, wherein the at least one of the one or more dielectric layers comprises two or more metamaterial resonators.

14. The system of claim 3, wherein at least one of the one or more dielectric layers contains a metamaterial resonator feature selected from the group consisting of a circular split-ring resonator, a rectangular split-ring resonator, and any combinations thereof.

15. The system of claim 3, wherein each of the one or more dielectric layers has a thickness of about 10 nanometers to about 5 millimeters, and wherein each of the conductive layers has a thickness of about 10 nanometers to about 5 millimeters.

16. The system of claim 3, wherein the conductive layers and the one or more dielectric layers are fabricated to form a spiral composite structure, wherein the spiral composite structure has a number of turns that range from about 2 to about 100,000, wherein the spiral composite structure has a radius of about 1 micrometer to about 1 meter, and wherein the one or more dielectric layers each have a height of about 1 micrometer to about 1 meter.

17. The system of claim 1, wherein the pulsed power supply further comprises a controller in electrical communication with at least one input switch and at least one shorting switch for the spiral generator to control charging and discharging from the spiral generator.

18. The system of claim 17 wherein the shorting sw itch comprises a solid state switch.

19. The system of claim 17 wherein the shorting switch comprises a photoconductive switch.

20. The system of claim 1, wherein the pulsed power supply further comprises a controller that is programmable to adjust pulsing and firing parameters of the spiral generator.

21. The system of claim 20, wherein pulsed power supply further comprises a power source configured to charge the pulsed power supply, wherein controller is configured to digitally adjust pow er output from the pow er source.

22. The system of claim 1, wherein, the system is multi-use with the pulsed power supply being rechargeable.

23. The system of claim 1, wherein the pulsed pow er supply further comprises at least one filter electrically coupled to the spiral generator to receive electric power output from the spiral generator, and wherein the electromagnetic wave source receives power output from the at least one filter.

24. The system of claim 1, further comprising a power source electrically coupled to the pulsed powder supply to provide powder to the pulsed power supply.

25. The system of claim 24, wherein the power source comprises a power storage device.

26. The system of claim 1, wherein the pulsed power supply comprises multiple generator stages that each comprise a spiral generator, and wherein at least one of the generator stages comprises a filter, and at least one of the generator stages comprises a pulse forming network.

27. The system of claim 26, wherein the generator stages comprises a first generator stage configured to receive power at a voltage of 3.7V to 1000V, wherein the first generator stage is configured to output powder at a voltage of 480V to 10.000 V, and wherein the pulsed power supply is configured to output power at a voltage of 50,000V - 1,000,000V.

28. The system of claim 26, wherein a final stage of the generator stages is directly connected to the electromagnetic wave source and comprises a plurality of spiral generators integrated into a pulse forming network.

29. The system of claim 1, further comprising a voltage source converter electrically coupled to the spiral generator, wherein the voltage source converter is configured to step up voltage to the spiral generator.

30. The system of claim 1, wherein the electromagnetic wave source comprises a microwave source.

31. The system of claim 1, wherein the spiral generator is directly connected to the electromagnetic wave source.

32. The system of claim 1, further comprising an antenna electrically coupled to the electromagnetic wave source, and wherein the antenna is configured to direct the EMPs generated by the electromagnetic wave source.

33. The system of claim 1, further comprising a munition that carries an electromagnetic wave generator comprising the pulsed power supply and the electromagnetic wave source.

34. The system of claim 33, wherein the munition comprises a housing that houses an electromagnetic wave generator comprising the pulsed power supply and the electromagnetic wave source.

35. The system of claim 34, wherein the housing comprises one or more fins that extend from the housing.

36. The system of claim 34, wherein the housing is configured to be handheld.

37. The system of claim 33, wherein the munition comprises an aerial system.

38. The system of claim 37, wherein the aerial system comprises a drone.

39. The system of claim 37. wherein the munition is releasably attached to the aerial system for deployment by dropping from the aerial system.

40. The system of claim 37, wherein the munition is permanently mounted to the aerial system.

41. The system of claim 33. further comprising a guidance sensor coupled to the munition, wherein the guidance sensor is configured to measure electromagnetic waves from a target.

42. They system of claim 1, wherein the spiral generator is configured as the electromagnetic wave source.

43. A system for generation of an electromagnetic pulse (“EMP), comprising: a pulsed power supply for generating pulsed power, wherein the pulsed power supply comprises multiple generator stages that each comprise a spiral generator, wherein a final one ofthe generator stages comprise a pulse forming network, and wherein each of the generator stages is configured to step up power from a previous one of the generator stages; and an electromagnetic generator wave source electrically coupled to the pulsed power supply and configured to generate one or more EMPs from the pulsed power source.

44. The system of claim 43, wherein the spiral generator in each of the generator stages individually comprise one or more conductive layers and one or more dielectric layers arranged in alternating layers, and wherein at least one of the one or more dielectric layers comprises a polarizable dielectric material.

45. The system of claim 44, wherein the one or more conductive layers and one or more dielectric layers are arranged in a spiral geometry.

46. The system of claim 44, wherein the polarizable dielectric material comprises a ferroelectric material.

47. The system of claim 44 further comprising one or more shorting switches coupled across output ends of the one or more conductive layers.

48. The system of claim 44, wherein the at least one of the one or more dielectric layers comprises a metamaterial.

49. The system of claim 44, wherein the at least one of the one or more dielectric layers comprises a metamaterial resonator.

50. The system of claim 44, wherein the at least one of the one or more dielectric layers contains a metamaterial resonator feature selected from the group consisting of a circular split-ring resonator, a rectangular split-ring resonator, and any combinations thereof.

51. The system of claim 43, wherein the pulsed power supply further comprises a controller in electrical communication with at least one input switch and at least one shorting switch to control charging and discharging from the generator stages.

52. The system of claim 43, further comprising a power source electrically coupled to the pulsed power supply to provide power to the pulsed power supply.

53. The system of claim 52, wherein the power source comprises a electrochemical energy device, electrolytic energy storage device or a ram air turbine.

54. The system of claim 43, wherein the second generator stage comprises a plurality of spiral generators integrated into a pulse forming network, wherein the pulse forming network comprises the second spiral generator.

55. The system of claim 43, wherein the filter comprise a converter circuit.

56. The system of claim 43, wherein the filter comprises a Cuk converter.

57. The system of claim 43, wherein the electromagnetic wave source comprises a microwave source.

58. The system of claim 43, further comprising an antenna electrically coupled to the electromagnetic wave source, and wherein the antenna is configured to direct the EMPs generated by the electromagnetic wave source.

59. The system of claim 43, further comprising a munition that carries an electromagnetic wave generator comprising the pulsed power supply and the electromagnetic wave source.

60. The system of claim 59, wherein the munition comprises a housing that houses an electromagnetic wave generator comprising the pulsed power supply and the electromagnetic wave source, wherein the munition further comprises an antenna coupled to the electromagnetic wave source.

61. The system of claim 60, wherein the housing comprises one or more fins that extend from the housing.

62. The system of claim 60, wherein the housing is configured to be handheld.

63. The system of claim 60, wherein the munition comprises an ariel system.

64. The system of claim 63, wherein the ariel system comprises a drone.

65. The system of claim 63, wherein the munition is releasably attached to the ariel system for deployment by dropping from the ariel system.

66. The system of claim 63, wherein the munition is permanently mounted to the ariel system.

67. The system of claim 61, wherein the housing is configured to be mounted on a vehicular system.

68. The system of claim 67, wherein the vehicular system comprises a maritime vessel.

69. The system of claim 61, wherein the housing is in the form of a projectile for firing from an artillery system.

70. The system of claim 61, wherein the housing is configured for deployment from an solid or chemical rocket.

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