Vapor deposition device, and production method for display device

Abstract

This vapor deposition device comprises a crucible (2). The crucible includes an annular belt (21) constituting an inner wall, a roller (22) for feeding the belt, and a roller drive unit (24) for driving the roller. Alternatively, the vapor deposition device comprises: a crucible; a support part for supporting the crucible; and a drive part for swinging the crucible by swinging the support part.

Description

Vapor deposition device and display device manufacturing method

[0001] The present disclosure relates to a vapor deposition apparatus and a method for manufacturing a display device provided with a light-emitting element including a thin film formed using the vapor deposition apparatus.

[0002] A known thin film formation method is a vapor deposition method in which a material in a crucible is melted and evaporated using a heater, and then brought into contact with the surface of an object positioned above the crucible and solidified to form a thin film containing the material on the surface of the object. Furthermore, in a manufacturing method of a display device including light-emitting elements such as OLEDs, a vapor deposition method using a vapor deposition apparatus is sometimes adopted to form each layer of the light-emitting element in order to reduce deterioration of the layers. Patent Document 1 discloses a method for forming organic layers of an organic EL element in a vapor deposition process using a vapor deposition apparatus.

[0003] Japanese Patent Publication No. 2010-40529

[0004] In the vapor deposition method described in Patent Document 1, it is considered that vapor deposition is continuously performed while appropriately adding vapor deposition material to the crucible. However, in this case, the vapor deposition material located at the top of the crucible sublimes preferentially and is deposited on the substrate, so old vapor deposition material may accumulate at the bottom of the crucible for a long period of time. Because the old vapor deposition material is repeatedly heated and cooled, it may be deteriorated compared to newly added vapor deposition material. If such old vapor deposition material is mixed into the vapor deposition layer, it may cause deterioration of the vapor deposition layer.

[0005] A vapor deposition apparatus according to one aspect of the present disclosure includes a crucible having an opening for releasing a vapor deposition material toward a vapor deposition target, the crucible including at least an annular belt that forms an inner wall of a space in which the vapor deposition material is stored, at least one roller that feeds out the belt, and a roller drive unit that drives at least one of the rollers.

[0006] A vapor deposition apparatus according to another aspect of the present disclosure includes a crucible having an opening for releasing a vapor deposition material toward a vapor deposition target, a support unit for supporting the crucible, and a drive unit for rocking the support unit to rock the crucible.

[0007] A method for manufacturing a display device according to one aspect of the present disclosure is a method for manufacturing a display device having a plurality of light-emitting elements, each of which has a first electrode, a second electrode, and a functional layer including at least a light-emitting layer between the first electrode and the second electrode, and includes forming at least a portion of the functional layer by releasing a vapor deposition material from a crucible toward a substrate of the display device, the crucible including at least a circular belt that forms the inner wall of a space in which the vapor deposition material is stored, and at least one roller that feeds out the belt, and in forming at least a portion of the functional layer, at least one of the rollers is driven to feed out the belt.

[0008] Another aspect of the present disclosure relates to a method for manufacturing a display device having a plurality of light-emitting elements, each of which has a first electrode, a second electrode, and a functional layer including at least a light-emitting layer between the first electrode and the second electrode, and includes forming at least a portion of the functional layer by releasing a vapor deposition material from a crucible toward a substrate of the display device, and rocking the crucible during the formation of at least a portion of the functional layer.

[0009] The present invention provides a vapor deposition device capable of forming a more uniform vapor deposition film by stirring a vapor deposition material in a crucible, and a display device equipped with light-emitting elements of improved quality.

[0010] 1 is a schematic cross-sectional side view of a crucible and a housing according to embodiment 1. FIG. 2 is a schematic plan view of a display device according to embodiment 1. FIG. 3 is a schematic cross-sectional side view of a display device according to embodiment 1. FIG. 4 is a schematic plan view of a vapor deposition device according to embodiment 1. FIG. 5 is a schematic cross-sectional side view of a crucible and a housing according to embodiment 1 when the crucible is moving in a first direction. FIG. 6 is a schematic cross-sectional side view of a crucible and a housing according to embodiment 1 when the crucible is moving in a second direction. FIG. 7 is a schematic cross-sectional side view of a crucible and a housing according to embodiment 2 when the crucible is rotating in a first rotation direction. FIG. 8 is a schematic cross-sectional side view of a crucible and a housing according to embodiment 2 when the crucible is rotating in a second rotation direction.

[0011] [Embodiment 1] Hereinafter, an embodiment of the present disclosure will be described with reference to the drawings. Note that in each drawing, similar configurations are assigned the same reference numerals, and their description will be omitted. Furthermore, in this disclosure, for simplicity of illustration, components assigned the same reference numerals may be shown at different scales or with different hatching depending on the drawing. However, the components shown in each drawing of the present disclosure are merely examples, and the scales are not limited to those shown in the drawings. Furthermore, in this disclosure, even for components with different hatching, components assigned the same reference numerals have similar configurations as described above.

[0012] <Display Device: Overview> The present disclosure relates to a vapor deposition apparatus, and more particularly to a vapor deposition apparatus used to form at least a portion of a thin film of a light-emitting element in a manufacturing method of a display device including the light-emitting element. First, an example of a display device including a light-emitting element at least a portion of which is formed by the vapor deposition apparatus according to the present disclosure will be described.

[0013] FIG. 2 is a schematic plan view of a display device DP according to this embodiment. The display device DP is a device that can be used, for example, as a display for a television or a smartphone. As shown in FIG. 2, the display device DP includes a frame region NDA and a display region DA. The display region DA of the display device DP includes a plurality of pixels P, each of which includes a red subpixel RSP, a green subpixel GSP, and a blue subpixel BSP. However, this embodiment is not limited to this. For example, the pixel P may include subpixels of other colors in addition to the red subpixel RSP, the green subpixel GSP, and the blue subpixel BSP.

[0014] The display device DP includes light-emitting elements in the red subpixels RSP, green subpixels GSP, and blue subpixels BSP. In particular, the light-emitting elements in the red subpixels RSP emit red light, the light-emitting elements in the green subpixels GSP emit green light, and the light-emitting elements in the blue subpixels BSP emit blue light. The display device DP performs full-color display in the display area DA by controlling the light emission from each light-emitting element in the display area DA via, for example, a driver circuit and a pixel circuit (not shown) formed in the frame area NDA. Note that the light-emitting elements included in the display device DP may all have the same configuration, except for the emitted color, regardless of the subpixel in which they are located.

[0015] The structure of the display area DA of the display device DP, particularly the structure of the light-emitting elements of each subpixel, will be described in more detail with reference to Fig. 3. Fig. 3 is a schematic side cross-sectional view of the display device DP according to an embodiment of the present disclosure, particularly showing a cross section perpendicular to the display surface of the display device DP and passing through one of the light-emitting elements. In other words, the cross section shown in Fig. 3 is a cross section parallel to the film thickness direction of, for example, the light-emitting layer E3 described below.

[0016] 3, the display device DP according to this embodiment includes a light-emitting element E and a substrate X in a display area DA, and in particular includes a plurality of light-emitting elements E on the substrate X. The display device DP has a structure in which the layers of the light-emitting element E are stacked on the substrate X on which, for example, TFTs (Thin Film Transistors) (not shown) are formed as pixel circuits. In this specification, the direction from the light-emitting element E of the display device DP to the substrate X is referred to as the "downward direction," and the direction opposite to the downward direction is referred to as the "upward direction."

[0017] The light-emitting element E has, on a substrate X, an anode E1 as a first electrode, a hole transport layer E2, an emitting layer E3, an electron transport layer E4, and a cathode E5 as a second electrode, in this order from the side of the substrate X. However, this is not limited to this embodiment, and the light-emitting element E may have, on the substrate X, a cathode E5, an electron transport layer E4, an emitting layer E3, a hole transport layer E2, and an anode E1, in this order from the side of the substrate X. In other words, the light-emitting element E has an anode E1, a cathode E5 facing the anode E1, and a hole transport layer E2, an emitting layer E3, and an electron transport layer E4 between the anode E1 and the cathode E5.

[0018] As described below, the hole transport layer E2 and the electron transport layer E4 have the function of transporting holes from the anode E1 and electrons from the cathode E5 to the light-emitting layer E3, respectively. Furthermore, as described below, the light-emitting layer E3 contains a light-emitting material that emits light due to excitons generated by the recombination of holes from the anode E1 and electrons from the cathode E5, and has the function of emitting light that is extracted from the light-emitting element E. Therefore, in the present disclosure, each of the hole transport layer E2, the light-emitting layer E3, and the electron transport layer E4 may be referred to as a functional layer. Therefore, the light-emitting element E has an anode E1, a cathode E5 facing the anode E1, and a functional layer including at least the light-emitting layer E3 between the anode E1 and the cathode E5.

[0019] The anode E1 may be formed in an island shape for each subpixel of the display device DP, and may be electrically connected to a pixel circuit on the substrate X and driven individually. The cathode E5 may be formed in common to multiple subpixels of the display device DP, and may be applied with a common potential via an auxiliary power supply (not shown) of the display device DP, etc. In this way, the display device DP may drive the light-emitting element E for each subpixel individually.

[0020] <Display Device: Light-Emitting Element> The structure of each layer of the light-emitting element E will be described in more detail below.

[0021] The anode E1 and the cathode E5 comprise a conductive material and are electrically connected to the hole transport layer E2 and the electron transport layer E4, respectively.

[0022] At least one of the anode E1 and the cathode E5 is a transparent electrode that transmits visible light. Alternatively, either the anode E1 or the cathode E5 may be a reflective electrode that reflects visible light, and may contain, for example, a metal material. The anode E1 and the cathode E5 may be formed by a sputtering method or the like, or may be patterned by dry etching or the like. However, from the viewpoint of reducing deterioration of each functional layer described below, the electrode of the anode E1 or the cathode E5 that is formed after the functional layer may be formed by a vacuum deposition method.

[0023] The hole transport layer E2 is a layer containing a hole transport material that transports holes from the anode E1 to the light-emitting layer E3. In this embodiment, the material of the hole transport layer E2 can be various organic or inorganic materials, including materials conventionally used in light-emitting elements. In particular, in this embodiment, the hole transport layer E2 may contain a material that can be formed into a film by vacuum deposition.

[0024] The electron transport layer E4 is a layer containing an electron transport material that transports electrons from the cathode E5 to the light-emitting layer E3. In this embodiment, the material of the electron transport layer E4 can be various organic or inorganic materials, including materials conventionally used in light-emitting elements. In particular, in this embodiment, the electron transport layer E4 may contain a material that can be formed into a film by vacuum deposition.

[0025] In this embodiment, the light-emitting element E may have a hole injection layer between the anode E1 and the hole transport layer E2, or may have an electron injection layer between the cathode E5 and the electron transport layer E4. Furthermore, the light-emitting element E may have an intermediate layer such as a charge blocking layer between the hole transport layer E2 and the light-emitting layer E3, or between the electron transport layer E4 and the light-emitting layer E3. These electron injection layers and intermediate layers may be formed by the same method as the hole transport layer E2 or the electron transport layer E4.

[0026] The light-emitting layer E3 includes a light-emitting material that emits light due to excitons generated by recombination of holes injected from the anode E1 via the hole-transporting layer E2 and electrons injected from the cathode E5 via the electron-transporting layer E4. For example, the light-emitting layer E3 may include at least one of an organic fluorescent material and an organic phosphorescent material as the light-emitting material. In particular, in this embodiment, the light-emitting layer E3 may include a material that can be formed into a film by vacuum deposition.

[0027] The light-emitting material contained in the light-emitting layer E3 may be selected appropriately depending on the emission color of the subpixel in which the light-emitting element E is located. For example, the light-emitting layer E3 of the light-emitting element E in each of the red subpixel RSP, the green subpixel GSP, and the blue subpixel BSP may contain light-emitting materials that emit red light, green light, and blue light.

[0028] <Vapor Deposition Apparatus: Overview> At least one of the functional layers of the light-emitting element E of the display device DP according to this embodiment is formed by a vacuum vapor deposition method using a vapor deposition apparatus. The vapor deposition apparatus according to this embodiment will be described with reference to Fig. 4. Fig. 4 is a schematic plan view of the vapor deposition apparatus 1 according to this embodiment.

[0029] In order to explain each part of the vapor deposition apparatus 1 in detail, Fig. 4 shows the interior of a chamber 1A (described later) in a see-through manner. Also, Fig. 4 shows each part located inside a housing 5 (described later) by dotted lines. Furthermore, Fig. 4 shows the vapor deposition apparatus 1 when a crucible 2 (described later) is at a first position P1 and when it is at a second position P2. Additionally, Fig. 4 shows a state in which a substrate X, which is the target of vapor deposition, is placed above the crucible 2 inside the chamber 1A. The outline of the substrate X is shown by dotted lines, and each part located further back than the substrate X is also shown through the substrate X.

[0030] The deposition apparatus 1 includes a chamber 1A having an opening (not shown) through which the interior can be appropriately evacuated and through which the substrate X can be inserted into and removed from the chamber 1A. The deposition apparatus 1 also includes a crucible 2, a support unit 3, a power unit 4, and a housing 5 inside the chamber 1A.

[0031] The crucible 2 stores a vapor deposition material to be used to form a film on the substrate X, which is the target of vapor deposition, and heats and sublimes the vapor deposition material, releasing the vapor deposition material toward the substrate X. In this embodiment, the crucible 2 is disposed inside the chamber 1A so that its longitudinal direction is aligned with the short-side direction of the substrate X stored inside the chamber 1A in a plan view of the vapor deposition apparatus 1. The crucible 2 will be described in detail later.

[0032] The support parts 3 support the crucible 2 relative to the chamber 1A. In this embodiment, the vapor deposition apparatus 1 includes, for example, two support parts 3 extending from the side surface of the chamber 1A toward the crucible 2 in the longitudinal direction of the crucible 2. In other words, each of the support parts 3 extends in a direction substantially perpendicular to the direction from the crucible 2 toward the vapor deposition target X. Each of the support parts 3 is connected to the crucible 2, and in particular, connects to partition walls 28 (described below) located at each end of the crucible 2 in the longitudinal direction to support the crucible 2.

[0033] The power unit 4 is located, for example, on the side of the support unit 3 facing the chamber 1A, and moves the crucible 2 by moving the support unit 3 in a direction perpendicular to the longitudinal direction of the crucible 2. In particular, the power unit 4 moves the crucible 2 in a first direction D1, which is a direction for moving the crucible 2 from the first position P1 to the second position P2, and in a second direction D2, which is a direction for moving the crucible 2 from the second position P2 to the first position P1, in other words, a direction opposite to the first direction D1.

[0034] The housing 5 houses the crucible 2 therein and has a plurality of vapor deposition holes 51 between the crucible 2 and the substrate X. Therefore, the vapor deposition material sublimated from inside the crucible 2 by a method described below passes through the vapor deposition holes 51 in the housing 5 and reaches the substrate X, where it is deposited as a film on the crucible 2 side of the substrate X. The support unit 3 penetrates the side surface of the crucible 2 on the end side in the longitudinal direction and supports the crucible 2. Therefore, the housing 5 moves within the chamber 1A together with the movement of the crucible 2 by the power unit 4.

[0035] The evaporation device 1 forms a thin film of the evaporation material at each position of the crucible 2 on the substrate X by sublimating the evaporation material from the crucible 2 while moving the crucible 2 in the first direction D1 and the second direction D2 using the power unit 4. The evaporation device 1 may be provided with a metal mask between the crucible 2 and the substrate X, the metal mask having openings at positions corresponding to the positions where the thin film containing the evaporation material is to be formed. In this case, the evaporation device 1 can form a thin film only at specific positions on the substrate X.

[0036] <Vapor Deposition Apparatus: Crucible: Overview> Details of the crucible 2 according to this embodiment will be described with reference to Fig. 1. Fig. 1 is a schematic side cross-sectional view showing the crucible 2 according to this embodiment together with the housing 5, and in particular a cross-sectional view taken along the line A-A shown in Fig. 4. In other words, Fig. 1 is a schematic side cross-sectional view of the crucible 2 and the housing 5 taken along a plane that is parallel to the direction from the crucible 2 to the substrate X and a direction perpendicular to the longitudinal direction of the crucible 2, and that passes through the vapor deposition hole 51 of the housing 5. Fig. 1 also shows the vapor deposition material M stored inside the crucible 2.

[0037] 1 , the crucible 2 according to the present embodiment includes a belt 21, rollers 22 and 23, and a roller driving unit 24. The crucible 2 may include a heater (not shown) inside the crucible 2 or outside the crucible 2 and inside the housing 5 for heating the deposition material M stored inside the crucible 2.

[0038] The deposition material M according to this embodiment may be a solid material such as a powdery sublimation material having a certain sublimation point, or may be a liquid material having a melting point and a boiling point and having fluidity at a temperature equal to or higher than the melting point and lower than the boiling point.

[0039] <Vapor Deposition Apparatus: Crucible: Belt> The belt 21 is a flexible, annular thin plate and forms at least the inner wall of a space in which the vapor deposition material M is stored. For example, the belt 21 has a bottom 2B located on the lower side of the crucible 2, side walls 2W located at each end of the crucible 2 in the first direction D1 or the second direction D2, and a connecting portion 2C connecting the bottom 2B and the side walls 2W. Therefore, the belt 21 forms a part of the space 2S in which the above-mentioned vapor deposition material M is stored, by means of the bottom 2B, the side walls 2W, and the connecting portion 2C that are inside the crucible 2.

[0040] As a result, the crucible 2 has a space 2S defined by the belt 21 in which the deposition material M is stored, and has openings 2A between the side walls 2W of the belt 21 and above the space 2S. In other words, the crucible 2 defines the space 2S in which the deposition material M is stored by the portion of the belt 21 inside the crucible 2 and the opening 2A. The opening 2A is located on the side of the crucible 2 that faces the deposition hole 51 of the housing 5, in other words, on the side of the crucible 2 that faces the substrate X that is the deposition target. Therefore, the crucible 2 has the opening 2A for discharging the sublimated deposition material M onto the substrate X that is the deposition target.

[0041] The crucible 2 may include a plurality of belts 21 arranged along the longitudinal direction of the crucible 2. In this case, two belts 21 adjacent to each other in the arrangement direction may overlap each other in order to reduce leakage of the deposition material M between the belts 21. Alternatively, the crucible 2 may include a single belt 21 extending from one end to the other end along the longitudinal direction of the crucible 2. The material of the belt 21 is not particularly limited as long as it is not a material that reacts with the deposition material M, and may include, for example, a metal material having a melting point higher than the sublimation point of the deposition material M. For example, the belt 21 may include stainless steel or titanium.

[0042] The belt 21 may have a plurality of claw portions 25. The claw portions 25 protrude toward the inside of the space 2S when located inside the space 2S. On the other hand, the claw portions 25 may protrude toward the outside of the space 2S when located outside the space 2S.

[0043] <Vapor Deposition Apparatus: Crucible: Roller and Roller Driving Unit> Roller 22 and roller 23 have rotation axes aligned along the longitudinal direction of crucible 2, are positioned inside circular belt 21, and rub against belt 21. Therefore, roller 22 and roller 23 rotate while frictionally rotating against belt 21, thereby feeding out belt 21. For example, of rollers 22 and roller 23, roller 22 may be positioned inside belt 21, at either end of crucible 2 in the lateral direction, and above crucible 2.

[0044] Roller driving unit 24 drives and rotates at least one of roller 22 and roller 23. For example, roller driving unit 24 drives roller 22 to control the rotation direction, thereby transporting belt 21 in first transport direction T1 and second transport direction T2. ​​Therefore, roller 23, which is not driven by roller driving unit 24, may be a driven roller that rotates by friction with belt 21 transported by roller 22, or may have a function of supporting belt 21.

[0045] For example, when the belt 21 is transported in the first transport direction T1, the bottom 2B of the belt 21 is transported in the first direction D1 inside the space 2S. Also, when the belt 21 is transported in the first transport direction T1, the side wall 2W on the first direction D1 side inside the space 2S is transported to the opening 2A side, and the side wall 2W on the second direction D2 side is transported to the bottom 2B side.

[0046] For example, when the belt 21 is transported in the second transport direction T2, the bottom 2B of the belt 21 is transported in the second direction D2 inside the space 2S. Also, when the belt 21 is transported in the second transport direction T2, the side wall 2W on the first direction D1 side inside the space 2S is transported toward the bottom 2B, and the side wall 2W on the second direction D2 side is transported toward the opening 2A.

[0047] Assume that the belt 21 continues to be conveyed in either the first conveying direction T1 or the second conveying direction T2. ​​In this case, the portion of the belt 21 located inside the space 2S is conveyed to an end of the space 2S as the belt 21 is conveyed, and then moves outside the space 2S. If the conveyance of the belt 21 continues further, this portion is conveyed from one end of the space 2S to the other end thereof outside the space 2S, and then moves back inside the space 2S.

[0048] Therefore, the belt 21 is an endless belt that passes inside and outside the space 2S of the crucible 2. Note that "inside and outside the space 2S" refers to the inside and outside of the space 2S formed by the belt 21 and in which the deposition material M is stored. In this embodiment, the belt 21 is located inside the housing 5, and therefore inside the chamber 1A of the deposition device 1, and therefore "the belt 21 moves inside and outside the space 2S" does not refer to the belt 21 moving outside the housing 5 or outside the chamber 1A.

[0049] Since the belt 21 is an endless belt, the crucible 2 can continue to stir the deposition material M by conveying the belt 21 in one direction. Therefore, the deposition device 1 can achieve stirring of the deposition material M more efficiently using the belt 21 with a simple configuration.

[0050] <Vapor deposition device: Crucible: Stirring of vapor deposition material> As the belt 21 is transported in the first transport direction T1 or the second transport direction T2, the vapor deposition material M in the space 2S of the crucible 2 is stirred by the movement of the belt 21. As a result, the crucible 2 transports the belt 21 and stirs the vapor deposition material M while sublimating the vapor deposition material M, thereby reducing the possibility of only a portion of the vapor deposition material M being sublimated. Therefore, the vapor deposition device 1 equipped with the crucible 2 reduces the accumulation of old vapor deposition material M, and enables a more uniform vapor deposition film to be formed on the substrate X, which is the target of vapor deposition.

[0051] Therefore, the vapor deposition apparatus 1 improves the quality of the vapor deposition film by making the vapor deposition film formed on the substrate X more uniform. Furthermore, the vapor deposition apparatus 1 reduces the frequency of maintenance required to remove old vapor deposition material M from the crucible 2, thereby improving the maintainability of the vapor deposition apparatus 1 and reducing costs by reducing the amount of vapor deposition material M to be discarded. Furthermore, since the belt 21 has multiple claws 25, the crucible 2 can more efficiently stir the vapor deposition material M stored inside the space 2S by the claws 25 as it transports the belt 21.

[0052] The vapor deposition apparatus 1 according to this embodiment can more efficiently stir the vapor deposition material M when the vapor deposition material M introduced into the crucible 2 is a solid material such as a powdery sublimable material. In particular, when the belt 21 has the claw portions 25 according to this embodiment, the solid material interferes with the claw portions 25, and therefore the vapor deposition apparatus 1 according to this embodiment can more efficiently stir the vapor deposition material M.

[0053] The display device DP according to this embodiment is manufactured by preparing a substrate X and sequentially forming each layer of the light-emitting element E, from the anode E1 to the cathode E5, on the substrate X. In particular, the manufacturing method for the display device DP according to this embodiment includes forming at least one functional layer of the light-emitting element E by discharging a vapor deposition material M from the crucible 2 of the vapor deposition device 1 toward the substrate X. In this embodiment, when forming the functional layer, the roller 22 of the crucible 2 of the vapor deposition device 1 is driven by the roller driving unit 24 to feed the belt 21. Therefore, in the manufacturing method for the display device DP, it is possible to reduce the mixing of old vapor deposition material M into the functional layer during film formation. The manufacturing method for the display device DP improves the quality of the functional layer, making it possible to form a higher-quality display device DP.

[0054] The vapor deposition apparatus 1 may include a plurality of granular stirring materials MS stored inside the crucible 2 together with the vapor deposition material M. The stirring materials MS may be made of various materials as long as they have a melting point higher than the sublimation point of the vapor deposition material M and do not react with the vapor deposition material M. The stirring materials MS may include, for example, at least one of stainless steel, titanium, aluminum, alumina (aluminum oxide) ceramics, and zirconia ceramics. The shape of the stirring materials MS is not particularly limited, but when the stirring materials MS include ceramics, they may be substantially spherical as shown in FIG. 1 . By providing the vapor deposition material M and the stirring materials MS inside the crucible 2, the vapor deposition apparatus 1 can more efficiently stir the vapor deposition material M using the crucible 2.

[0055] <Vapor Deposition Apparatus: Crucible: Contact Portion> The crucible 2 according to this embodiment includes a contact portion 26. The contact portion 26 contacts the belt 21 on the side of the opening 2A of the belt 21. The contact portion 26 extends from one end to the other end of the crucible 2 along the longitudinal direction of the crucible 2. The contact portion 26 is located, for example, on the upper side of the belt 21 of the crucible 2 and on each of the end sides in the first direction D1 or the second direction D2. In this case, each of the two contact portions 26 protrudes, for example, from the end side of the belt 21 in the first direction D1 or the second direction D2 toward the center of the crucible 2. However, in this case, the two contact portions 26 do not come into contact with each other, thereby forming an opening 2A between the two contact portions 26.

[0056] 1, the contact portion 26 is not limited to a configuration in which it is constantly in contact with the belt 21, and for example, the contact portion 26 may be in contact with a part of the claw portion 25 of the conveyed belt 21. In other words, a gap large enough to allow the part of the belt 21 having the claw portion 25 to pass between the roller 22 and the contact portion 26 may be secured. In particular, the claw portion 25 shown in FIG. 1 is illustrated larger than the actual scale in order to clearly show the claw portion 25, and may actually have a shape large enough to allow the part to pass between the roller 22 and the contact portion 26.

[0057] Alternatively, the contact portion 26 may be made of a flexible member, and may be curved by contacting the claw portion 25 of the conveyed belt 21, allowing the claw portion 25 to pass between the roller 22 and the contact portion 26. Furthermore, the claw portion 25 may be made of an elastic material, and may be deformed by contacting the abutment portion 26, for example, and pass between the roller 22 and the abutment portion 26.

[0058] The vapor deposition material M may adhere to the surface of the belt 21 on the inner side of the space 2S, and when the belt 21 is transported in this state, the vapor deposition material M may be transported along with the belt 21. Here, the contact portion 26 comes into contact with the belt 21 on the opening 2A side, thereby scraping off the vapor deposition material M adhering to the belt 21 into the space 2S. In this way, the contact portion 26 reduces the overflow of the vapor deposition material M outside the space 2S of the crucible 2, making it possible to use the vapor deposition material M more efficiently.

[0059] As described above, the contact portions 26 are located on the upper side of the belt 21 of the crucible 2 and on the side of the end in the first direction D1 or the second direction D2. Therefore, regardless of whether the belt 21 is transported in the first transport direction T1 or the second transport direction T2, one of the contact portions 26 scrapes off the vapor deposition material M adhering to the belt 21 into the inside of the crucible 2.

[0060] <Vapor Deposition Apparatus: Crucible: Internal Roller> The crucible 2 according to this embodiment includes at least one internal roller 27. The internal roller 27 is located inside the space 2S of the crucible 2 and presses the belt 21 from the inside toward the outside of the space 2S. For example, the internal roller 27 presses and pulls the belt 21 and sandwiches it together with the roller 22 or the roller 23, thereby defining the positions of each portion of the belt 21; in other words, defining the shape of the space 2S defined by the belt 21. For example, when looking at the crucible 2 in the longitudinal direction, the internal rollers 27 may be located between the bottom 2B and the connecting portion 2C and between the connecting portion 2C and the side wall 2W.

[0061] When the crucible 2 includes the internal roller 27 inside the space 2S, the vapor deposition material M stirred by the transport of the belt 21 comes into contact with the internal roller 27. This allows the vapor deposition apparatus 1 to more efficiently stir the vapor deposition material M inside the crucible 2. Furthermore, the vapor deposition apparatus 1 can define the shape of the space 2S of the crucible 2 formed by the belt 21 with a simple configuration.

[0062] 4, the crucible 2 may include a partition wall 28 at each of both ends in the longitudinal direction. In this case, the partition wall 28 may constitute an inner wall of the space 2S at each of both ends in the longitudinal direction of the crucible 2. Here, in order to reduce leakage of the vapor deposition material M from between the belt 21 and the partition wall 28, the partition wall 28 may always rub against both ends of the belt 21 in the longitudinal direction of the crucible 2, regardless of whether the belt 21 is being transported or not.

[0063] In the present embodiment, for example, as the belt 21 is transported, the vapor deposition material M adhering to the belt 21 passes between the belt 21 and the contact portion 26, and the vapor deposition material M may leak from the inside to the outside of the space 2S of the crucible 2. Furthermore, the vapor deposition material M may leak from the inside to the outside of the space 2S of the crucible 2, for example, between the multiple belts 21, or between the belt 21 and the partition wall 28, etc.

[0064] However, in this embodiment, the vapor deposition material M that leaks from inside the space 2S of the crucible 2 to the outside is stored inside the housing 5, in other words, it does not leak to the outside of the vapor deposition device 1, such as the outside of the chamber 1A. Therefore, in this embodiment, the vapor deposition device 1 recovers the vapor deposition material M stored inside the housing 5 during maintenance of the crucible 2, and then introduces the recovered vapor deposition material M back into the crucible 2, thereby enabling efficient use of the vapor deposition material M.

[0065] <Relationship Between the Moving Direction of the Crucible and the Transport Direction of the Belt> In this embodiment, the deposition film is formed using the deposition apparatus 1 while, for example, moving the crucible 2 in the first direction D1 or the second direction D2 within the chamber 1A. In addition, the deposition film is formed while transporting the belt 21 of the crucible 2 in accordance with the movement of the crucible 2. Hereinafter, an example of the relationship between the moving direction of the crucible 2 and the transport direction of the belt 21 according to this embodiment will be described with reference to FIGS. 5 and 6 .

[0066] Fig. 5 is a schematic cross-sectional side view of the crucible 2 and the housing 5 when the crucible 2 is moving in the first direction D1. Fig. 6 is a schematic cross-sectional side view of the crucible 2 and the housing 5 when the crucible 2 is moving in the second direction D2. Figs. 5 and 6 show cross sections of the crucible 2 and the housing 5 at positions corresponding to the cross section shown in Fig. 1. While the crucible 2 and the housing 5 shown in Figs. 5 and 6 have simplified and omitted some of the components for ease of illustration, they have the same configuration as the crucible 2 and the housing 5 shown in Fig. 1. Figs. 5 and 6 also show the evaporation material M stored inside the crucible 2.

[0067] In forming a vapor-deposited film using the vapor deposition apparatus 1 according to this embodiment, for example, it is assumed that the crucible 2 is initially located at a first position P1 shown in Fig. 4. In this case, in forming a vapor-deposited film using the vapor deposition apparatus 1 according to this embodiment, first, as shown in Fig. 5, for example, the crucible 2 is moved in a first direction D1 within the chamber 1A while the vapor deposition material M is released from the opening 2A of the crucible 2. The movement of the crucible 2 in the first direction D1 and the release of the vapor deposition material M from the opening 2A of the crucible 2 may be continued until the crucible 2 reaches a second position P2.

[0068] In this case, for example, the vapor deposition apparatus 1 drives the rollers 22 of the crucible 2 by a roller driving unit 24 (not shown in Fig. 5) to transport the belt 21 of the crucible 2 in the second transport direction T2. ​​In other words, while the crucible 2 moves in the first direction D1, the rollers 22 feed out the belt 21 so that the belt 21 moves toward the second direction D2 on the side of the bottom 2B of the space 2S.

[0069] As the crucible 2 moves in the first direction D1, the vapor deposition material M inside the crucible 2 is biased toward the second direction D2 due to inertia. Here, by transporting the belt 21 in the second transport direction T2, the bottom 2B inside the space 2S is transported in the second direction D2, and the side wall 2W on the second direction D2 side is transported toward the opening 2A.

[0070] 5 by the movement of the crucible 2 in the first direction D1 and the transport of the belt 21 in the second transport direction T2. ​​The first stirring direction S1 is a direction that further increases the movement of the vapor deposition material M that has been biased toward the second direction D2 by the movement of the crucible 2. Therefore, by controlling the movement of the crucible 2 and the transport of the belt 21 as described above, the vapor deposition device 1 more efficiently stirs the vapor deposition material M.

[0071] In forming a vapor-deposited film using the vapor deposition apparatus 1 according to this embodiment, it is assumed that the crucible 2 reaches the second position P2 shown in Fig. 4 as described above. In this case, in forming a vapor-deposited film using the vapor deposition apparatus 1 according to this embodiment, the crucible 2 is then moved in the second direction D2 within the chamber 1A, while the vapor deposition material M is released from the opening 2A of the crucible 2, as shown in Fig. 6, for example. The movement of the crucible 2 in the second direction D2 and the release of the vapor deposition material M from the opening 2A of the crucible 2 may be continued until the crucible 2 reaches the first position P1.

[0072] In this case, for example, the vapor deposition apparatus 1 drives the rollers 22 of the crucible 2 by a roller driving unit 24 (not shown in Fig. 6) to transport the belt 21 of the crucible 2 in the first transport direction T1. In other words, while the crucible 2 moves in the second direction D2, the rollers 22 feed out the belt 21 so that the belt 21 moves toward the first direction D1 on the side of the bottom 2B of the space 2S.

[0073] As the crucible 2 moves in the second direction D2, the vapor deposition material M inside the crucible 2 is biased toward the first direction D1 due to inertia. Here, by transporting the belt 21 in the first transport direction T1, the bottom 2B inside the space 2S is transported in the first direction D1, and the side wall 2W on the first direction D1 side is transported toward the opening 2A.

[0074] 6 by the movement of the crucible 2 in the second direction D2 and the transport of the belt 21 in the first transport direction T1. The second stirring direction S2 is a direction that further increases the movement of the vapor deposition material M that has been biased toward the first direction D1 by the movement of the crucible 2. Therefore, by controlling the movement of the crucible 2 and the transport of the belt 21 as described above, the vapor deposition device 1 more efficiently stirs the vapor deposition material M.

[0075] However, the relationship between the movement direction of the crucible 2 and the conveyance direction of the belt 21 is not limited to the above. For example, when the crucible 2 moves in the first direction D1, the belt 21 may be conveyed in the first conveyance direction T1, or when the crucible 2 moves in the second direction D2, the belt 21 may be conveyed in the second conveyance direction T2. ​​In this case, the conveyance direction of the belt 21 is a direction that cancels out any uneven distribution of the vapor deposition material M that occurs with the movement of the crucible 2. Therefore, with the above configuration, the vapor deposition device 1 agitates the vapor deposition material M inside the crucible 2 by conveying the belt 21, while reducing overflow of the vapor deposition material M from the opening 6A of the crucible 2 due to the agitation of the vapor deposition material M. Furthermore, regardless of the movement direction of the crucible 2, the conveyance direction of the belt 21 may be switched as appropriate between the first conveyance direction T1 and the second conveyance direction T2.

[0076] When the crucible 2 has moved again to the first position P1, the deposition of the deposition material M on the substrate X using the deposition apparatus 1 may be completed. As the crucible 2 moves, a part of the belt 21, such as the bottom portion 2B of the belt 21, can move parallel to the moving direction of the crucible 2. Therefore, the deposition apparatus 1 efficiently agitates the deposition material M while depositing a deposition film on the substrate X.

[0077] The movement of the crucible 2 and the release of the vapor deposition material M from the crucible 2 during the movement may be repeated thereafter. After the substrate X is removed from the vapor deposition apparatus 1, the substrate X may be placed in the chamber 1A of another vapor deposition apparatus 1 in which a different vapor deposition material M is stored inside the crucible 2, and the deposition of the vapor deposition material M on the substrate X may be performed again.

[0078] [Embodiment 2] <Vapor deposition apparatus with a rocking crucible> A vapor deposition apparatus 1 according to another embodiment will be described below. The vapor deposition apparatus 1 according to this embodiment differs in configuration from the vapor deposition apparatus 1 according to the previous embodiment in that it includes a crucible 6 instead of the crucible 2.

[0079] Details of the crucible 6 according to this embodiment will be described with reference to Fig. 7. Fig. 7 is a schematic cross-sectional side view showing the crucible 6 according to this embodiment together with the housing 5, and in particular shows the cross section of the crucible 6 and the housing 5 at a position corresponding to the cross section shown in Fig. 1.

[0080] The crucible 6 includes a container portion 61 having a longitudinal direction, for example, perpendicular to the first direction D1 or the second direction D2. The container portion 61 has a cylindrical inner wall and an opening 6A at the top. Therefore, the container portion 61, together with the inner wall and the opening 6A, defines a space 6S inside the crucible 6. As shown in FIG. 7 , the above-mentioned deposition material M and stirring material MS can be stored in the space 6S.

[0081] The material of the container 61 is not particularly limited as long as it does not react with the deposition material M and has a melting point higher than the sublimation point or boiling point of the deposition material M, and may include, for example, a metal material. The shape of the container 61 may be, for example, as shown in Fig. 7, a polygonal shape with an opening 6A on one side when viewed in the longitudinal direction. In this case, if the deposition material M has fluidity, turbulence of the deposition material M occurs near the corners of the polygon, and the deposition material M is stirred more efficiently. However, the shape of the container 61 is not limited to this, and the container 61 may also be a cylindrical shape with the opening 6A in part of the cylinder.

[0082] The container part 61 has a partition wall (not shown) at each end in a direction perpendicular to the first direction D1 or the second direction D2, the partition wall having the same configuration as the partition wall 28. Here, in Fig. 7, the support part 3 connected to the partition wall and supporting the crucible 6 is shown by a dotted line. The support part 3 is connected to approximately the center of the partition wall of the container part 61, for example, when the container part 61 is viewed in the longitudinal direction.

[0083] Furthermore, the power unit 4 according to this embodiment not only moves the support unit 3 in the first direction D1 and the second direction D2, but also functions as a drive unit that swings the support unit 3 by rotating the support unit 3 around the extension direction of the support unit 3. In this way, the power unit 4 swings the support unit 3 around an axis in a direction substantially perpendicular to the first direction D1.

[0084] With the above-described configuration, the support unit 3 also functions as a rotation axis of the crucible 6, and the power unit 4 also functions as a drive unit for rocking the crucible 6. Therefore, with the above-described configuration, the burden of separately providing a mechanism for rocking the crucible 6 is reduced, and the configuration of the deposition apparatus 1 according to this embodiment becomes simpler.

[0085] When the support part 3 swings around the extension direction of the support part 3, the container part 61 of the crucible 6 connected to the support part 3 also swings. Therefore, the power part 4 also functions as a drive part that swings the crucible 6 through the swinging of the support part 3. More specifically, the power part 4 rotates the support part 3 alternately in a first rotation direction R1 and a second rotation direction R2 opposite to the first rotation direction R1 shown in FIG. 7 , among the rotation directions around the extension direction of the support part 3.

[0086] The manner in which the crucible 6 rocks will be described in more detail with reference to FIGS. 8 and 9. FIG. 8 is a schematic cross-sectional side view of the crucible 6 and the housing 5 when the crucible 6 is moving in the first rotation direction R1. FIG. 9 is a schematic cross-sectional side view of the crucible 6 and the housing 5 when the crucible 6 is moving in the second rotation direction R2. FIGS. 8 and 9 show cross sections of the crucible 6 and the housing 5 at positions corresponding to the cross section shown in FIG. 7. For ease of illustration, the crucible 6 and the housing 5 shown in FIGS. 8 and 9 have simplified the components and omitted component numbers, but have the same configuration as the crucible 6 and the housing 5 shown in FIG. 7. Furthermore, FIGS. 8 and 9 also show the evaporation material M stored inside the crucible 6.

[0087] Assume that the power unit 4 rotates the support unit 3 in the first rotation direction R1 from a state in which the opening 6A of the container unit 61 is at the uppermost position, thereby rotating the crucible 6 in the first rotation direction R1. In this case, as shown in Fig. 8 , the deposition material M inside the crucible 6 is stirred in a first stirring direction S1 in accordance with the rotation of the crucible 6 in the first rotation direction R1.

[0088] Here, in order to reduce leakage of the vapor deposition material M from the crucible 6, the rotation of the crucible 6 may be stopped to a position where the upper surface of the vapor deposition material M is lower than the lowermost part of the opening 6A. Alternatively, in order to reduce a decrease in the amount of vapor deposition material M released from the crucible 6, the rotation of the crucible 6 may be stopped to an extent where the opening 6A overlaps with any of the vapor deposition holes 51 in a plan view of the vapor deposition device 1.

[0089] Next, the power unit 4 rotates the support unit 3 in the second rotation direction R2, thereby rotating the crucible 6 in the second rotation direction R2. In this case, as shown in Fig. 9, the evaporation material M inside the crucible 6 is stirred in the second stirring direction S2 in accordance with the rotation of the crucible 6 in the second rotation direction R2. Therefore, by the power unit 4 alternately rotating the crucible 6 in the first rotation direction R1 and the second rotation direction R2, the power unit 4 rocks the crucible 6 and stirs the evaporation material M inside the crucible 6.

[0090] Except for the above, the deposition apparatus 1 according to this embodiment has the same configuration as the deposition apparatus 1 according to the previous embodiment. The deposition apparatus 1 according to this embodiment can agitate the crucible 6 to agitate the deposition material inside the crucible 6, thereby reducing the possibility of partial sublimation of the deposition material M. Therefore, the deposition apparatus 1 including the crucible 6 reduces the accumulation of old deposition material M, making it possible to form a more uniform deposition film on the substrate X that is the deposition target.

[0091] The manufacturing method for the display device DP according to this embodiment includes forming at least one functional layer of the light-emitting element E by releasing the vapor deposition material M from the crucible 6 of the vapor deposition device 1 toward the substrate X. In this embodiment, when forming the functional layer, the vapor deposition film is formed while the crucible 6 of the vapor deposition device 1 is rocked. Therefore, in the manufacturing method for the display device DP, it is possible to reduce the mixing of old vapor deposition material M into the functional layer during the formation of the functional layer. The manufacturing method for the display device DP improves the quality of the functional layer, making it possible to form a higher quality display device DP.

[0092] In particular, in forming a vapor-deposited film using the vapor deposition apparatus 1 according to this embodiment, the power unit 4 may continue to rock the crucible 6 while the crucible 6 moves in at least one of the first direction D1 and the second direction D2. This allows the vapor deposition apparatus 1 to continuously stir the vapor deposition material inside the crucible 6 while forming the vapor-deposited film, thereby enabling a more uniform vapor-deposited film to be formed on the substrate X, which is the target of vapor deposition.

[0093] The vapor deposition apparatus 1 according to this embodiment can more efficiently stir the vapor deposition material M when the vapor deposition material M introduced into the crucible 6 is, for example, a liquid material having fluidity. In particular, the vapor deposition apparatus 1 according to this embodiment shakes the entire crucible 2 to stir the entire vapor deposition material M, thereby reducing the possibility of only a portion of the liquid vapor deposition material being stirred. Furthermore, even when the vapor deposition material M introduced into the crucible 6 is a solid material, the vapor deposition apparatus 1 according to this embodiment can more efficiently stir the vapor deposition material M when the vapor deposition material M is a powder material containing finer particles.

[0094] However, the vapor deposition apparatus according to the present disclosure may include a crucible that agitates the vapor deposition material by conveying a belt that forms the inner wall of the crucible, and may also agitate the vapor deposition material by shaking the crucible, thereby enabling the vapor deposition apparatus to more efficiently agitate the vapor deposition material inside the crucible.

[0095] The present disclosure is not limited to the above-described embodiments, and various modifications are possible within the scope of the claims. Embodiments obtained by appropriately combining the technical means disclosed in different embodiments are also included in the technical scope of the present disclosure. Furthermore, new technical features can be formed by combining the technical means disclosed in each embodiment.

[0096] DESCRIPTION OF SYMBOLS 1 Vapor deposition device 2 Crucible 2A Opening 2B Bottom 2S Space 3 Support 4 Power unit (drive unit) 5 Housing 21 Belt 22 Roller 24 Roller drive unit 25 Claw 26 Contact unit 27 Internal roller D1 First direction D2 Second direction T1 First transport direction T2 Second transport direction R1 First rotation direction R2 Second rotation direction DP Display device E Light-emitting element E1 Anode E2 Hole transport layer (functional layer) E3 Light-emitting layer (functional layer) E4 Electron transport layer (functional layer) E5 Cathode X Substrate (vapor deposition target) M Vapor deposition material MS Stirring material

Claims

1. A vapor deposition apparatus comprising: a crucible having an opening for discharging a vapor deposition material toward a vapor deposition target, the crucible including: a circular belt that forms at least an inner wall of a space in which the vapor deposition material is stored; at least one roller that feeds out the belt; and a roller drive unit that drives at least one of the rollers.

2. The vapor deposition apparatus according to claim 1, wherein the belt has a plurality of claws inside the space that protrude toward the inside of the space.

3. The vapor deposition apparatus according to claim 1 or 2, wherein the crucible includes a contact portion that contacts the belt on the side of the opening of the belt and scrapes off the vapor deposition material adhering to the belt into the space.

4. The vapor deposition apparatus according to any one of claims 1 to 3, wherein the crucible includes at least one internal roller that presses the belt from the inside to the outside of the space.

5. The vapor deposition apparatus according to any one of claims 1 to 4, wherein the belt is an endless belt that passes inside and outside the space.

6. The vapor deposition apparatus according to any one of claims 1 to 5, further comprising a power unit that moves the crucible in a first direction and a second direction opposite to the first direction, and the roller feeds out the belt so that the belt moves in either the first direction or the second direction on the side of the bottom of the space.

7. The deposition apparatus of claim 6, wherein while the crucible moves in the first direction, the roller feeds the belt so that the belt moves toward the second direction on the bottom side of the space, and while the crucible moves in the second direction, the roller feeds the belt so that the belt moves toward the first direction on the bottom side of the space.

8. A vapor deposition apparatus comprising: a crucible having an opening for discharging a vapor deposition material toward a vapor deposition target; a support part for supporting the crucible; and a drive part for shaking the support part to shake the crucible.

9. The vapor deposition apparatus according to claim 8, wherein the support portion extends along a direction substantially perpendicular to a direction from the crucible to the vapor deposition target and is connected to the crucible, and the drive portion swings the support portion around the extension direction of the support portion.

10. The vapor deposition apparatus according to claim 8 or 9, further comprising a power unit that moves the crucible in a first direction and a second direction opposite to the first direction, and the drive unit swings the support unit around an axis in a direction substantially perpendicular to the first direction.

11. The deposition apparatus according to claim 10, wherein the driving unit continues to rock the crucible while the crucible moves in at least one of the first direction and the second direction.

12. The vapor deposition apparatus according to any one of claims 1 to 11, further comprising a granular stirring material stored inside the crucible together with the vapor deposition material.

13. A method for manufacturing a display device having a plurality of light-emitting elements, each having a first electrode, a second electrode, and a functional layer including at least a light-emitting layer between the first electrode and the second electrode, comprising forming at least a portion of the functional layer by releasing a vapor deposition material from a crucible toward a substrate of the display device, the crucible comprising: an annular belt that forms at least the inner wall of a space in which the vapor deposition material is stored; and at least one roller that feeds out the belt, wherein in forming at least a portion of the functional layer, at least one of the rollers is driven to feed out the belt.

14. A method for manufacturing a display device having a plurality of light-emitting elements, each having a first electrode, a second electrode, and a functional layer including at least a light-emitting layer between the first electrode and the second electrode, the method including forming at least a portion of the functional layer by releasing a vapor deposition material from a crucible toward a substrate of the display device, and rocking the crucible during the formation of at least a portion of the functional layer.

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