Improved carrier degassing

Abstract

A treatment station for substrate storage and transport containers including a chamber configured to hold a sealed environment therein, and configured to hold at least one container of the containers within the sealed environment, the chamber is connected to at least one of a wet cleaning and vacuum drying equipment, so as to at least one of wet clean and vacuum dry the at least one container within the sealed environment, and a heater connected to the chamber with at least one IR radiation source disposed so as to irradiate and dry the container in the sealed environment, to a predetermined dry condition, in an optimal drying time period and within maximum temperature limits of the at least one container, the at least one IR radiation source has a radiant output spectrum commensurate with a peak heat absorption characteristic of material making up the at least one container.

Description

Atty. Docket No. 1229P017072-W0(EQV) EFS-WEB IMPROVED CARRIER DEGASSING CROSS REFERENCE TO RELATED APPLICATIONS

[0001] This application claims priority from and the benefit of United States Provisional Patent Application No. 63 / 637,690 filed on April 23, 2024, the disclosure of which is incorporated by reference herein in its entirety. 1. Field

[0002] This invention relates to apparatuses and methods for treating workpiece containers, such as wafer carriers used in the semiconductor fabrication industry. 2. Brief Description of Related Developments

[0003] Semiconductor transport containers need to be cleaned occasionally in order to maintain a standard of cleanliness required in processing the semiconductor wafers. The cleaning process can be performed in chambers having wet cleaning, drying, or degas equipment. With increasing requirements for cleanliness, the number of cleaning cycles in the modern semiconductor factory rises. There are circumstances when it is desirable to clean aAtty. Docket No. 1229P017072-W0(EQV) EFS-WEB container after each individual use in order to prevent, for example, cross contamination from one wafer load to the next.

[0004] The cleaning must be very thorough in order to fulfill the cleanliness requirements of modern semiconductor factories. The Diffusive process that contributes to container degassing isgoverned by Fick’s law of diffusion. Steady state: J D whereJ is a flux of molecules per unit area per second, c is concentration of diffusing molecules per volume which depends on a distance x, and D is coefficient of diffusion depending on a nature of diffusing molecules and material they diffuse in (see, FIG. 8). The flux is proportional to the concentration gradient with the flow in the direction of decreasing concentration (mainly, towards gas-solid interface).

[0005] Generally, in order to accelerate diffusion and desorption of entrapped species (“foreign bodies”) such as water, molecular bases (MB), molecular acids (MA), molecular condensables (MC) molecular dopants (MD), etc., an IR source is utilized to heat the container after wet cleaning The conventional design includes a container placed inside a vacuum chamber with IR lamp / lamps (about 500-2000 watt, short to medium wavelength)Atty. Docket No. 1229P017072-W0(EQV) EFS-WEB positioned around the container or within the container cavity. These conventional IR lamps, due to their design and shape (cylindrical), result in sub optimal heating (see, FIG. 9; where container temperature (in °C) utilizing the conventional IR lamp configuration is shown in each square after 3 min of IR radiation (about 500W with 100% utilization)), especially FOUP back placed in front of lamp tip. Additionally, application of short-to- medium wavelengths IR lamps generates IR energy that is not efficiently absorbed by polycarbonate materials (widely used to fabricate semiconductor transport containers).

[0006] Thus, it is desirable to maximize removal of foreign molecules from shaped surfaces of containers. BRIEF DESCRIPTION OF THE DRAWINGS

[0007] FIG. 1A is a schematic illustration of a treatment station in accordance with aspects of the disclosed embodiment;

[0008] FIG. 1B is a schematic illustration of another treatment station in accordance with aspects of the disclosed embodiment;Atty. Docket No. 1229P017072-W0(EQV) EFS-WEB

[0009] FIG. 1C is a schematic illustration of a portion of the treatment station of FIG. 1B in accordance with aspects of the disclosed embodiment;

[0010] FIGS. 2A-2B are exemplary schematic illustrations of the treatment station in accordance with aspects of the disclosed embodiment;

[0011] FIGS. 3A-3B are exemplary illustrations of transport containers in accordance with aspects of the present disclosure;

[0012] FIGS. 4A and 4B are exemplary heater panels in accordance with aspects of the disclosed embodiment;

[0013] FIG. 5 is a graph illustrating single point temperature over time and IR lamp utilization percentage of an exemplary transport containers in accordance with aspects of the disclosed embodiment;

[0014] FIG. 6 is an exemplary illustration of a portion a transport container with a temperature grid in accordance with aspects of the present disclosure;

[0015] FIG. 7 is a graph illustrating single point temperature measurement over time while utilizing bank of IR lamps placed ~5Atty. Docket No. 1229P017072-W0(EQV) EFS-WEB cm away from the surface of an exemplary transport container in accordance with aspects of the disclosed embodiment;

[0016] FIG. 8 is an exemplary illustration of a portion a transport container with a temperature grid in accordance with aspects of the present disclosure;

[0017] FIG. 9 is an illustration of the diffusive process in accordance with aspects of the disclosed embodiment; and

[0018] FIG. 10 is an exemplary flow diagram of a method of treating transport containers in accordance with aspects of the disclosed embodiment. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0019] FIG. 1A shows an exemplary schematic illustration of a treatment station 100 for treating substrate storage and transport containers 190 (e.g., F300 and Spectra EBM). The treatment station 100 includes at least one chamber 110 for accelerated by IR radiation degassing / drying of the transport containers 190. Although the aspects of the disclosed embodiment will be described with reference to the drawings, it should be understood that theAtty. Docket No. 1229P017072-W0(EQV) EFS-WEB aspects of the disclosed embodiment could be embodied in many alternate forms such as utilization of vacuum or utilization of purge gas (clean dry air or nitrogen) for treatment station 100 Corresponding hardware is known to the skilled in the art and not shown on FIG. 1 In addition, any suitable size, shape or type of elements or materials could be used.

[0020] The present embodiment relates to maximizing removal of “foreign molecules” (e.g., water and other entrapped species) from shaped surfaces 195, 197 through improved heat absorption (heating) of the surfaces 195, 197 by optimizing uniformity of heat application. As will be described herein, the heat application is improved by utilizing a long wave IR heater 130 shaped (conformal) to the shaped surfaces 195, 197 for improvement of heating uniformity. Accordingly, the heater has a conformal shape so as to “get in close” and uniformly radiate the “nooks and crannies” of the shaped surfaces 195, 197 (also figure 2A)

[0021] Generally, the production of semiconductor (and other flat panels with microelectronics) components requires cleanliness, such as control of particles and impurities of different nature, the presence of these particulates / contaminantsAtty. Docket No. 1229P017072-W0(EQV) EFS-WEB can affect, e.g., the yield of processed substrates / wafers. Thus, the transport of these substrates / wafers and other flat panels is typically carried out in transport containers 190, such as cassettes, carriers or trays, as well as closable or sealable containers or boxes, including Front Opening Unified Pods [FOUPs], Front-Opening Shipping Box [FOSB], Standard Mechanical Interface [SMIF] pods or boxes, EUV reticles, etc. The following description is described with respect to FOUPs and EUV reticle carriers as an example, but the embodiment is not so limited, and can be applied toward any objects / containers having stringent cleanliness requirements, such as low particulate contaminations and low outgassing components.

[0022] In order to control the cleanliness in the microelectronic or semiconductor systems having transport containers 190, it is desirable to treat / clean the transport containers 190 frequently. Treatment methods consist of ways to remove particles of different nature and / or contaminations entrapped within materials of transport containers such as molecular acids (MA), molecular bases (MB), molecular condensables (MB) and molecular dopants (MD) as well as removing entrapped water. As such, the present embodiment discloses treatmentAtty. Docket No. 1229P017072-W0(EQV) EFS-WEB processes and systems for high-level cleanliness of containers (such as conforming to semi cleanliness standards and equivalents), which can include cleaning with Ultra-pure water (UPW) or other appropriate aqueous fluids, drying, degas, and / or vacuum decontamination and an optimized heat application for diffusion and desorption of entrapped species - “foreign molecules”. In the cleaning and heating process, removal of particles in the range of few microns down to sub-micron levels and reduction of trace contaminants is achieved. The treatment process(s) can provide effective surface cleaning with minimal entrapped residues.

[0023] Referring to FIGS. 1-4B, as noted above, the treatment station 100 includes the at least one chamber 110, having a sealed environment 120 configured to hold, enclosed therein, at least one transport container 190 and a heater 130 (with an IR radiation source(s) 133; FIG. 4A, 4B). The treatment station 100 provides treatment via irradiation the at least one container 190 in the sealed environment 120, to a predetermined cleanliness condition, in an optimal cleaning time period and within maximum temperature limits (about 80ºC) of the at least one container 190 (so that the at least one container 190 remains substantially structurallyAtty. Docket No. 1229P017072-W0(EQV) EFS-WEB unchanged, throughout a duty / life cycle of the at least one container 190).

[0024] As will be described below, the sealed environment 120 of the at least one chamber 110, with the IR heater 130 disposed therein (i.e., embedded or mounted to / from an interior surface 123S of the sealed environment 120), is configured so as to irradiate and degas the surface(s) 195, 197 of a respective one of the transport containers 190 held within. Irradiating and drying / degassing the surface(s) 195, 197 of the respective one of the transport containers 190 effects removal of the foreign molecules on the surface(s) 195, 197 to a predetermined cleanliness and dry condition (e.g., a characteristic determined by mid-long wave IR sources (e.g., >3 um) absorption of heat, or any other suitable characteristic; where absorbed IR energy uniformly increases temperature of the container material so as to accelerate diffusion and desorption of entrapped foreign molecules).

[0025] Referring to FIGS. 1 and 3A-3B, in one aspect, the transport containers 190 may be FOUPs used in, e.g., transporting of semiconductor substrates within a processing facility. Again, although the aspects of the disclosed embodiment will be describedAtty. Docket No. 1229P017072-W0(EQV) EFS-WEB herein with respect to FOUPs and EUV reticle carriers, the disclosed embodiment may be utilized with any transport container, such as SMIF, FOSB, etc. In this aspect, where the transport container 190 is a FOUP, the transport container 190 includes a rigid, box-like structure designed to encase and protect semiconductor wafers. The housing is constructed from materials suitable for the semiconductor industry and complies with SEMI standards for materials and cleanliness. The structure of the FOUP transport containers 190 generally includes a housing 191 and a door / lid 192. The housing 191 includes a top 191T, a back 191R, a first side 191FS, a second side 191SS, and a bottom 191B. The transport container 190 is a hollow container having a pot-like basic form with a specified surface / shaped area and also means for introduction and distribution of purge gas within container 190 (see FIG. 1B) The housing 191 may include handles to interface with an automated transport system or an operator. The door 192 may be mechanically coupled to the housing 191 and can be moved from a closed to an open position or vice versa. The housing 191 and door 192 may be equipped with complementary mechanical elements, such as hinges, cams, support shelves, actuators, or other suitable drive systems, to open and close the door 192, whileAtty. Docket No. 1229P017072-W0(EQV) EFS-WEB maintaining a controlled environment within the transport container 190. The housing 191 and door 192 coupled together defines an enclosure 193 having exterior surfaces 197 and interior surfaces 195. Within the enclosure 193 are supports 194 disposed on the interior surface 195 of the sides 191FS, 191SS (and back 191R) of the housing 193. Each support 194 defines a shelf 196 to store / hold a wafer during storage or transport. The transport container 190 may also include sensors to detect obstructions or irregularities within the transport container 190. Each of the shelves, mechanical elements, corners, handles, etc. are shaped and contain spaces where foreign molecules may become entrapped. An example of a system with transport containers 190 in the context of semiconductor processing is described in U.S. Patent No. 8,856,368, published December 21, 2010, the disclosure of which is incorporated herein in its entirety; or any other suitable context.

[0026] In another aspect, referring to FIG. 3B, an exemplary configuration of a EUV reticle carrier 190A to be cleaned is illustrated. EUV reticles are typically stored in double- container carriers 190A, together with having nitrogen in the space 77 between the inner container 70 and the outer container 71. An inner container is typically made of metal, comprising an upperAtty. Docket No. 1229P017072-W0(EQV) EFS-WEB lid 70A mated with a lower support 70B. An outer container 71 is typically made of low outgassing polymer, comprising an upper lid 71A mated with a lower support 71B. Both containers can have handles for holding by an operator or by an automatic transport system. A handle 75 is shown for the upper lid 71A of the outer container. The support 71B of the outer container 71 can have inlets 78 for accepting nitrogen purge to the inner volume 77 of the reticle carrier. The double container EUV reticle carrier 190A (figure 3B) is an example of the high level of cleanliness for semiconductor processing, where the reticle is stored in two levels of container to prevent contamination. In addition, the volume between the two levels is purged with nitrogen to provide an inert environment, or to prevent any outgassing or residual particles from the outer container to attach to the inner container.

[0027] Referring again to FIGS. 1-4B, the treatment station 100 includes the at least one chamber 110 for assisting in maintaining the cleanliness of the containers in a system. In the following description, the term “dirty” is used to indicate a relationship to the term “treated” or “clean”, and is meant to indicate a less clean object. For example, an object can be dirty, e.g., in needAtty. Docket No. 1229P017072-W0(EQV) EFS-WEB of treatment, in term of cleanliness levels required in semiconductor processing, and not of everyday operation. After treatment, the object can be clean, e.g., cleaner than before, when the object is in the dirty state.

[0028] As noted above, the transport containers 190 need to be cleaned frequently to maintain the standard of cleanliness required in processing semiconductor wafers. In an aspect, the chamber 110 may include one or more chambers with one or more input / output port(s) 115 and sealed environment 120 therein. The input / output port(s) 115 of the chamber 110 are configured for ingress / egress of the transport container 190 into the sealed environment 120. The input / output port(s) 115 may be configured such that during ingress / egress cross contamination between the sealed environment 120 and an outside environment is prevented. . In another aspect, the chamber 110 is purged with clean purge gas (e.g., clean dry air or nitrogen) before opening the input / output port(s) 115 to the outside environment. In addition, a positive pressure can be established in the chamber 110 before opening the input / output port(s) 115 to the outside environment, thus minimizing any backflow of dirty or ambient air. The treatment process can be performed in a combination cleaning and dryingAtty. Docket No. 1229P017072-W0(EQV) EFS-WEB chamber or in multiple separated chambers, each performing a portion (cleaning or drying) of the treatment. The treatment station 100 for cleaning the transport containers 190 may be utilized to treat shaped surfaces 195, 197 of the transport containers 190 of water, molecular bases (MB), molecular acids (MA), molecular condensables (MC), molecular dopants (MD) and etc. entrapped or located thereon. For example, the chamber may be connected to at least one of wet cleaning equipment 140 and vacuum drying equipment 150, so as to at least one of wet clean and vacuum dry / degassing the at least one container 190 within the sealed environment 120. Where multiple chambers are utilized, one chamber may include wet cleaning equipment 140 while another includes vacuum drying equipment 150 (including the heater 130).

[0029] For example, with wet cleaning equipment, the article / container to be cleaned is positioned with minimum liquid traps, such as on horizontal or vertical surfaces. In addition, at potential trap locations, gas nozzles can be located to blow away any trapped liquid to help in minimizing liquid residue and assisting the drying process. Gas nozzles preferably provide nitrogen or filtered air, but can also provide fluids or aeratedAtty. Docket No. 1229P017072-W0(EQV) EFS-WEB liquid. The liquid nozzles and gas nozzles can perform cleaning action.

[0030] Each chamber 110 includes a chamber housing 121 which defines an interior chamber 123 of the sealed environment 120 in which the transport containers 190 are treated. The chamber 110 may be manufactured of any suitable materials (e.g., stainless steel) that confines the IR radiation dispersed by the heater 130 disposed within the interior chamber 123. The chamber housing 121 is shaped and sized (e.g., dimensioned) to receive and hold the transport containers 190 and the heater 130 disposed within the interior chamber 123. In one aspect, the chamber housing 121 may be dimensioned such that the interior chamber 123 defined by the chamber housing 121 is configured to hold at least one transport container 190. For example, the chamber housing 121 has a dimension (length L, width W, and height H) substantially the size of a standard FOUP. In another aspect, the interior chamber 123 is configured to hold any number of transport containers 190 or container parts. For example, the interior chamber 123 may include one or more compartments or have a dimension for receiving different containers or parts of container (such as the lid 192Atty. Docket No. 1229P017072-W0(EQV) EFS-WEB separate from the body 191 or disassembled parts of the EUV reticle carrier).

[0031] For example, FIG. 2B illustrates an exemplary configuration of a treatment system with multiple chambers 110A- 110D according to an aspect of the present embodiment. The chambers 110A-D separates the outside environment from the sealed environment 120, with a “dirty robot” (robot to handle “dirty” containers) 12B and an input loading port 116 located in the outside environment, and a “clean” robot (robot to handle “clean” containers) 16B and an output unloading port 117 that communicates with the sealed environment in the sealed environment 120. In a typical workpiece flow, a container 190 to be treated, such as a FOUP, is loaded to the input loading port 116, and then is transferred by the “dirty” robot 12B to the chamber 110. After being treated in the chamber 110, the cleaned container is transferred by the “clean” robot 16B to the output unloading port 117 to be unloaded. The chamber 110 can have separate input door and output door, with the dirty object entering the dirty input door, and the treated object exiting the clean output door. Further considerations can be included to prevent cross contamination between the sealed and outside environment. ForAtty. Docket No. 1229P017072-W0(EQV) EFS-WEB example, higher pressure can be established in the sealed environment during the transfer of the transport container 190 to generate a laminar flow away from the sealed environment 120, minimizing particles backflow from the outside environment. In addition, isolation can be established between the sealed and outside environment, for example, by interlocking the chamber 110 doors, preventing the input door and the output door to be open at a same time.

[0032] Still referring to FIGS. 1-4B, each sealed environment 120 is configured such that the heater 130, disposed within the sealed environment 120, is positioned to irradiate and dry / degas shaped surface(s) 195, 197 of the transport containers 190 held in the sealed environment 120 (i.e., the heater 130 is shaped (conformal) to the surfaces 195, 197 of the transport container 190). In other aspects, the container exterior 197 may not be degasses. Irradiating and drying / degassing the surface(s) 195 of the transport containers 190 with the heater 130 effects treatment and removal of foreign molecules (MA, MB, MC and MD as above) on the surface(s) / sub-surface 195 of the transport containers 190 to the predetermined cleanliness and dry condition that determines the surface(s) 195 being treated. In one aspect, the heater 130Atty. Docket No. 1229P017072-W0(EQV) EFS-WEB is a single heater with an IR radiation source 133 that is shaped (conformal) to the shaped surfaces 195 of the transport container 190. For example, the heater 130 is disposed so as to irradiate and dry the at least one inside surface 195 of the at least one container 190 in the sealed environment 120, to a predetermined cleanliness condition, in an optimal process time period and within maximum temperature limits (about 80ºC) of the at least one container 190 so that the at least one container 190 remains structurally unchanged, throughout a duty / life cycle of the at least one container 190. In another aspect, the heater 130 is multiple heaters positioned in, e.g., an array or matrix to contour the shaped surfaces 195 of the transport container 190. The IR heater panels 130 are positioned to be disposed at least inside (contouring the interior shaped surfaces 195) and may be outside (contouring the exterior shaped surfaces 197) of the container enclosure 193. For example, five appropriately shaped panel heaters 130 may be placed in an array within the transport container 190, occupying the FOUP cavity 193 at a predetermined distance D, for example, about 5cm from FOUP surface 195 (substantially throughout the surface area). In other aspects, the heaters 130 may be placed any distance (more or less than 5cm)Atty. Docket No. 1229P017072-W0(EQV) EFS-WEB from FOUP surface 195. The IR heater panels 130 being positioned close to the interior surfaces 195 of the transport container 190 may provide additional high-speed heating. The transport container 190 heats at a quicker rate with lower power consumption (lower cost of ownership) and retain the heat longer during the treatment process (improvement in FOUP cleanliness).

[0033] In another aspect, the at least one IR radiation source 133 has a radiant output spectrum (band) commensurate (that is matched) with a peak IR absorption characteristic of material making up the at least one container 190. The IR radiation source radiant output spectrum of the heater 130 is characterized by mid to long wave IR radiation. For example, the output spectrum may be characterized by wavelengths greater than about 2.5 µm or any other suitable wavelengths tuned to specific material of container The long wave IR sources (>3 um) improve absorption of heat and exist in the form of panels (see FIG. 4A, 4B). This is in contrast to conventional IR lamps radiating short-mid wave IR.

[0034] As noted above, in one aspect, the IR source is long wave IR so that the IR energy is fully absorbed by, e.g., polymeric materials used for manufacturing FOUPs. Fully absorbed IR energyAtty. Docket No. 1229P017072-W0(EQV) EFS-WEB that is also uniformly supplied increases temperature of the material more efficiently so as to accelerate diffusion and desorption of all entrapped foreign molecules. The IR source is configured to remain activated 100% during process time but may be also intermittent) with supplied power 170 regulated in accordance with temperature reading and temperature limitations (e.g., ~80°C for current material standards but some material may withstand more or less). The heater 130 is configured so that radiant output commensurate with peak heat absorption is substantially steady and continuous throughout the drying / degassing time period. The heater is configures so that IR radiant energy, of the at least one IR radiation source 133, impinging a surface of material making up the container is substantially steady and continuous throughout the drying / degassing process time.. This is in contrast to conventional heaters with pulsed on / off cycles during the drying time period.

[0035] The heater 130 is disposed in the sealed environment 120 so that an IR radiation source facet (side) 135 (FIG. 4A) of the at least one IR radiation source 133 faces each containment side 191T, 191B, 191R, 191FS, 191SS (FIG. 2A) of the transport container 190. The at least one IR radiation source facet 135 has as a shapeAtty. Docket No. 1229P017072-W0(EQV) EFS-WEB that conforms substantially close to a respective containment side 191T, 191B, 191R, 191FS, 191SS of the transport container 190 so that at least one respective IR radiation source facet 135 is juxtaposed proximate each containment side 191T, 191B, 191R, 191FS, 191SS of the transport container 190. Each containment side 191T, 191B, 191R, 191FS, 191SS of the transport container 190 is irradiated directly by IR radiation emitted by the respective IR radiation source facet 135 juxtaposed proximate the containment side 191T, 191B, 191R, 191FS, 191SS of the transport container 190. The optimal container treatment process time period is effected for the transport container 190 with each containment side 191T, 191B, 191R, 191FS, 191SS of the transport container 190 dried / degassed substantially in entirety by IR radiation of the respective IR radiation source facet 135 impinging the juxtaposed proximate containment side 191T, 191B, 191R, 191FS, 191SS of the transport container 190. The radiant output spectrum is selectable (e.g., IR radiating LED’s have a selectably variable IR radiation output spectrum) in conformance with drying / degassing the at least one container 190 within the optimal process time.

[0036] Referring now to FIG. 1B, an exemplary schematic illustration of another treatment station 100B for treatingAtty. Docket No. 1229P017072-W0(EQV) EFS-WEB substrate storage and transport containers 190. The treatment station 100B includes at least one chamber 110B with a conformal frame (i.e., the chamber has a shape which complements the contours of the transport containers 190 so as to have a minimal degas volume) for accelerated by IR radiation degassing / drying of the transport containers 190. The at least one chamber 110B includes a minimal degas sealed environment 120B configured to hold, enclosed therein, at least one transport container 190 and one or more conformal heater(s) 130B (with an IR radiation source(s) 133; FIG. 4A, 4B). The treatment station 100B provides treatment via irradiation the at least one container 190 in the minimal degas sealed environment 120B, to a predetermined cleanliness condition, in an optimal cleaning time period and within maximum temperature limits (about 80ºC) of the at least one container 190 (so that the at least one container 190 remains substantially structurally unchanged, throughout a duty / life cycle of the at least one container 190). In one aspect, the chamber 110B may include one or more purge port(s) 129 configured for a pre-vacuum purge. The minimal degas sealed environment 120B provides for a reduced vacuum process time. For example, the chamber 110 may be purged with hot purge gas. In another aspect, the one or more conformal heater(s)Atty. Docket No. 1229P017072-W0(EQV) EFS-WEB 130B include multiple lamp sections (FIG. 1C) disposed so that the lamps align co-planar / linear to the conformal chamber and at least one container 190 (i.e., the one or more heater 130B may have gaps, joints, or seams at corners or in linear sections as seen in FIG. 1C.

[0037] The electrical components needed to activate the heater 130 are disposed within the sealed environment 120 or in other aspects is introduced into sealed environment via vacuum feedthroughs. It should be noted that a power source 170 (FIG. 1A) to the heater 130 may be derived from batteries, alternating current (A / C) source, or a combination of both, such as with a battery backup to the A / C source. In one aspect, the heater 130 may be activated via a remote network.

[0038] Referring to FIGS. 1 and 2A, in one aspect, the at least one chamber 110 further includes a controller 160 configured to control various aspects of the treatment station 100 as will be described in detail herein. The controller 160 may be programmed to include a device accountant 1622. The controller 160 is configured to at least control power supply 170 so as to supply substantially continuous power to the IR radiation source 133 soAtty. Docket No. 1229P017072-W0(EQV) EFS-WEB that the radiant output spectrum is substantially steady and continuous throughout the process time.. In one aspect, the sealed environment 120 includes a sensor 127A (FIG. 1A), such as, a contactless temperature sensor, communicably coupled to the controller 160 and configured to measure the temperature of the surfaces 195 of the transport container 190. For example, sensors may be utilized to measure temperature of any of the heated surfaces, such as, e.g., the top portion 191T (FIG. 6) of the transport container 190, the bottom portion 191B of the transport container 190, the sides 191FS, 191SS including the shelving area 196 where substrates are held, the rear 191R, and any portion of the lid 192). The sensors 127A can provide direct temperature readings in real time. These sensors 127A may drive heating of each panel until a desired FOUP temperature is reached (e.g., ~80°C for material standards but may be higher or lower) and maintain the desired temperature by conditioning of supplied power during the treatment. Repeated testing and direct temperature measurements at selected point on the transport container 190 have resulted in the desired temperature (~70°C) being reached within ~20 sec of IR radiation utilizing bank of conventional IR lampsAtty. Docket No. 1229P017072-W0(EQV) EFS-WEB (see, FIG. 7) with good spatial temperature uniformity and desired beneficial ballistic heating. .

[0039] As noted above, the controller 160 is communicably coupled to the sensor 127A. Upon sensing, e.g., a predetermined dosage of radiation, the sensor 127A sends a signal to the controller 160 embodying the measure, which is determinative of the predetermined cleanliness condition. In one aspect, the sensor 127A is configured so as to measure a dosage of radiation received by the surface(s) of the transport containers 190, via the heater 130, and signal receipt of efficacious measured dose of radiation to each of the at least one of the transport containers 190. Also, in array one heater facet / element may emit a different predetermined dosage for radiation (e.g., longer or shorter) than another heater facet.

[0040] Referring to FIGS. 1 and 7, as noted above, the treatment station 100 may include the controller 160 connected to, e.g., the at least one chamber 110. The controller 160 is configured to control power (provided from the power source 170) to the heater 130 (i.e., the controller turns on / off the heater 130 to maintain substantially steady continuous power on emission throughoutAtty. Docket No. 1229P017072-W0(EQV) EFS-WEB process time). In one aspect, the sealed environment 120 may include a system health monitoring function. For example, the controller 160 may monitor the current draw from the heater 130. When one of the heaters 130 malfunction or cease to operate, the system health monitoring function of the controller 160 is configured to detect any discrepancy in the current draw and determine that at least one of the heaters 130 needs to be replaced.

[0041] Referring to FIGS. 1 and 10, a method 1000 for cleaning transport containers 190 is illustrated. For example, a transport container 190 may be received at the treatment station 100. Transport container 190 is utilized throughout a semiconductor processing facility thereby making the transport container 190 contaminated (“dirty”). Once contaminated, the transport container 190 is sent to treatment station 100 to be cleaned / treated. The transport container 190 is placed into sealed environment 120 of chamber 110 (FIG. 10, Block 1001).The chamber 110 closes / seals the sealed environment 120 and the treatment cycle is initiated (FIG. 10, Block 1002). When the cleaning cycle is initiated, at least the heater 130, disposed within the sealed environment 120, is activated or energized to irradiate theAtty. Docket No. 1229P017072-W0(EQV) EFS-WEB surface(s) of the transport container 190 enclosed in the sealed environment 120 (FIG. 10, Block 1003). A sensor 127A located within the sealed environment 120 measures the surface(s) 195 of the transport container 190 for a predetermined cleanliness condition (FIG. 10, Block 1004). When the temperature sensor 127A senses completion of the predetermined process condition (FIG. 10, Block 1005), the heater 130 is deactivated or de-energized (FIG. 10, Block 1006). The sealed environment 120 is opened (manually or automatically) upon completion of the cleaning cycle or reaching predetermined cleanliness) and the transport container 190 is removed from the sealed environment 120 (FIG. 10, Block 1007).

[0042] In accordance with one aspect of the disclosed embodiment a treatment station for substrate storage and transport containers is provided. The treatment station including a chamber configured to hold a sealed environment therein. The chamber further configured to hold at least one container of the containers within the sealed environment. The chamber is connected to at least one of a wet cleaning and vacuum drying equipment, so as to at least one of wet clean and vacuum dry the at least one container within the sealed environment; heater is utilized inside the chamber, the heater includes at least one IR radiation sourceAtty. Docket No. 1229P017072-W0(EQV) EFS-WEB disposed so as to irradiate the at least one container in the sealed environment, to a predetermined cleanliness condition, in an optimal drying / degassing time period and within maximum temperature limits (about 80ºC) of the at least one container (so that the at least one container remains substantially structurally unchanged, throughout a duty / life cycle of the at least one container), the at least one IR radiation source has a radiant output spectrum (band) commensurate (that’s matched) with a peak heat absorption characteristic of material making up the at least one container.

[0043] In accordance with one aspect of the disclosed embodiment the IR radiation source radiant output spectrum is characterized by mid to long wave IR radiation. The output spectrum is characterized by wavelengths greater than about 2.5 µm.

[0044] In accordance with one aspect of the disclosed embodiment the heater is disposed inside the sealed environment of the chamber.

[0045] In accordance with one aspect of the disclosed embodiment the treatment station further includes a controllerAtty. Docket No. 1229P017072-W0(EQV) EFS-WEB communicably connected to the heater. The controller is configured to control power supply so as to supply substantially continuous power to the IR radiation source so that radiant output spectrum is substantially steady and continuous throughout the drying time period.

[0046] In accordance with one aspect of the disclosed embodiment the heater is configured so that radiant output commensurate with peak heat absorption is substantially steady and continuous throughout the drying time period.

[0047] In accordance with one aspect of the disclosed embodiment the heater is configures so that IR radiant energy, of the at least one IR radiation source, impinging a surface of material making up the container is substantially steady and continuous throughout the dry / degas time period.

[0048] In accordance with one aspect of the disclosed embodiment the at least one IR radiation source is disposed in the sealed environment so that an IR radiation source facet (side) of the at least one IR radiation source faces each containment side of the container. The at least one IR radiation source facet has as a shape that conforms substantially close to containment sidesAtty. Docket No. 1229P017072-W0(EQV) EFS-WEB of the at least one container so that at least one respective IR radiation source facet is juxtaposed proximate each containment side of the at least one container. Each containment side is irradiated directly by IR radiation emitted by the respective IR radiation source facet juxtaposed proximate the containment side.

[0049] In accordance with one aspect of the disclosed embodiment the optimal drying / degassing time period is effected for the container with each containment side treated substantially in entirety by IR radiation of the respective IR radiation source facet impinging the juxtaposed proximate containment side. The radiant output spectrum may be selectable (e.g., IR radiating LED’s may have variable IR radiation output spectrum) in conformance with cleaning goals the at least one container within the optimal process time.

[0050] In accordance with one aspect of the disclosed embodiment a treatment station for substrate storage and transport containers is provided. The treatment station including a chamber configured to hold a sealed environment therein, and configured to hold at least one container of the containers within the sealed environment, wherein the chamber is connected to at least one ofAtty. Docket No. 1229P017072-W0(EQV) EFS-WEB a wet cleaning and vacuum drying equipment, so as to at least one of wet clean and vacuum dry the at least one container within the sealed environment; and a heater connected to the chamber, the heater having a heater radiant facet with at least one IR radiation source, disposed in the radiant facet, so as to irradiate and dry / degas the at least one container in the sealed environment, to a predetermined dry condition, in an optimal drying time period and within maximum temperature limits (about 80ºC) of the at least one container (so that the at least one container remains substantially structurally unchanged throughout a duty / life cycle of the at least one container); wherein the heater radiant facet is shaped conformal to a containment side of the at least one container so that each containment side is juxtaposed a corresponding heater radiant facet that faces and is proximate a surface of the containment side (so that IR radiation from the IR radiation source of the corresponding heater radiant facet is directed towards each containment side and impinges substantially uniformly commensurate with illumination.

[0051] In accordance with one aspect of the disclosed embodiment the IR radiation source radiant output spectrum is characterized by mid to long wave IR radiation. The outputAtty. Docket No. 1229P017072-W0(EQV) EFS-WEB spectrum is characterized by wavelengths greater than about 2.5 µm.

[0052] In accordance with one aspect of the disclosed embodiment the heater is disposed inside the sealed environment of the chamber.

[0053] In accordance with one aspect of the disclosed embodiment the treatment station further includes a controller communicably connected to the heater. The controller is configured to control power supply so as to supply substantially continuous power to the IR radiation source so that radiant output spectrum is substantially steady and continuous throughout the drying / degassing process time

[0054] In accordance with one aspect of the disclosed embodiment the heater is configured so that radiant output commensurate with peak heat absorption is substantially steady and continuous throughout the drying / degassing process time

[0055] In accordance with one aspect of the disclosed embodiment the heater is configures so that IR radiant energy, of the at least one IR radiation source, impinging a surface ofAtty. Docket No. 1229P017072-W0(EQV) EFS-WEB material making up the container is substantially steady and continuous throughout the dry / degassing process time.

[0056] In accordance with one aspect of the disclosed embodiment the at least one IR radiation source is disposed in the sealed environment so that an IR radiation source facet (side) of the at least one IR radiation source faces each containment side of the container. The at least one IR radiation source facet has as a shape that conforms substantially close to containment sides of the at least one container so that at least one respective IR radiation source facet is juxtaposed proximate each containment side of the at least one container. Each containment side is irradiated directly by IR radiation emitted by the respective IR radiation source facet juxtaposed proximate the containment side.

[0057] In accordance with one aspect of the disclosed embodiment the optimal drying / degassing process time is effected for the container with each containment side cleaned substantially in entirety by IR radiation of the respective IR radiation source facet impinging the juxtaposed proximate containment side. The radiant output spectrum is selectable (e.g., IR radiating LED’s have a selectably variable IR radiation output spectrum) inAtty. Docket No. 1229P017072-W0(EQV) EFS-WEB conformance with drying / degassing the at least one container within the optimal process time. The present disclosure may be embodied in other specific forms without departing from the spirit or attributes thereof, and it is therefore desired that the present aspects be considered in all respects as illustrative and not restrictive, reference being made to the appended claims rather than to the foregoing description to indicate the scope of the invention.

[0058] It should be understood that the foregoing description is only illustrative of the aspects of the present disclosure. Various alternatives and modifications can be devised by those skilled in the art without departing from the aspects of the present disclosure. Accordingly, the aspects of the present disclosure are intended to embrace all such alternatives, modifications and variances that fall within the scope of any claims appended hereto. Further, the mere fact that different features are recited in mutually different dependent or independent claims does not indicate that a combination of these features cannot be advantageously used, such a combination remaining within the scope of the aspects of the present disclosure.Atty. Docket No. 1229P017072-W0(EQV) EFS-WEB

[0059] What is claimed in

Claims

Atty. Docket No. 1229P017072-W0(EQV) EFS-WEB CLAIMS 1. A treatment station for substrate storage and transport containers, the station comprising: a chamber configured to hold a sealed environment therein, and configured to hold at least one container of the containers within the sealed environment, wherein the chamber is connected to at least one of a wet cleaning and vacuum drying equipment, so as to at least one of wet clean and vacuum dry the at least one container within the sealed environment; and a heater connected to the chamber with at least one IR radiation source disposed so as to irradiate and dry the at least one container in the sealed environment, to a predetermined dry condition, in an optimal drying time period and within maximum temperature limits of the at least one container; wherein the at least one IR radiation source has a radiant output spectrum commensurate with a peak heat absorption characteristic of material making up the at least one container.Atty. Docket No. 1229P017072-W0(EQV) EFS-WEB 2. The treatment station of claim 1, wherein the IR radiation source radiant output spectrum is characterized by mid to long wave IR radiation.

3. The treatment station of claim 1, wherein the output spectrum is characterized by wave lengths greater than about 2.5 µm.

4. The treatment station of claim 1, wherein the heater is disposed inside the sealed environment of the chamber.

5. The treatment station of claim 1, further comprising a controller communicably connected to the heater and configured to control power supply so as to supply substantially continuous power to the IR radiation source so that radiant output spectrum is substantially steady and continuous throughout the drying time period.

6. The treatment station of claim 1, wherein the heater is configured so that radiant output commensurate with peak heat absorption is substantially steady and continuous throughout the drying time period.

7. The treatment station of claim 1, wherein the heater is configures so that IR radiant energy, of the at least one IRAtty. Docket No. 1229P017072-W0(EQV) EFS-WEB radiation source, impinging a surface of material making up the container is substantially steady and continuous throughout the dry time period.

8. The treatment station of claim 1, wherein the at least one IR radiation source is disposed in the sealed environment so that an IR radiation source facet of the at least one IR radiation source faces each containment side of the container.

9. The treatment station of claim 1, wherein the at least one IR radiation source facet has as a shape that conforms substantially close to containment sides of the at least one container so that at least one respective IR radiation source facet is juxtaposed proximate each containment side of the at least one container.

10. The treatment station of claim 1, wherein each containment side is irradiated directly fy IR radiation emitted by the respective IR radiation source facet juxtaposed proximate the containment side.

11. The treatment station of claim 1, wherein the optimal drying time period is effected for the container with each containment side dried substantially in entirety by IR radiation of theAtty. Docket No. 1229P017072-W0(EQV) EFS-WEB respective IR radiation source facet impinging the juxtaposed proximate containment side.

12. The treatment station of claim 1, wherein the radiant output spectrum is selectable in conformance with drying the at least one container within the optimal drying time.

13. A treatment station for substrate storage and transport containers, the station comprising: a chamber configured to hold a sealed environment therein, and configured to hold at least one container of the containers within the sealed environment, wherein the chamber is connected to at least one of a wet cleaning and vacuum drying equipment, so as to at least one of wet clean and vacuum dry the at least one container within the sealed environment; and a heater connected to the chamber, the heater having a heater radiant facet with at least one IR radiation source, disposed in the radiant facet, so as to irradiate and dry the at least one container in the sealed environment, to a predetermined dry condition, in an optimal drying time period and within maximum temperature limits of the at least one container;Atty. Docket No. 1229P017072-W0(EQV) EFS-WEB wherein the heater radiant facet is shaped conformal to a containment side of the at least one container so that each containment side is juxtaposed a corresponding heater radiant facet that faces and is proximate a surface of the containment side.

14. The treatment station of claim 13, wherein the at least one IR radiation source has a radiant output spectrum commensurate with a peak heat absorption characteristic of material making up the at least one container.

15. The treatment station of claim 13, wherein the IR radiation source radiant output spectrum is characterized by mid to long wave IR radiation.

16. The treatment station of claim 13, wherein the output spectrum is characterized by wave lengths greater than about 2.5 µm.

17. The treatment station of claim 13, wherein the heater is disposed inside the sealed environment of the chamber.

18. The treatment station of claim 13, further comprising a controller communicably connected to the heater and configured to control power supply so as to supply substantially continuous powerAtty. Docket No. 1229P017072-W0(EQV) EFS-WEB to the IR radiation source so that radiant output spectrum is substantially steady and continuous throughout the drying time period.

19. The treatment station of claim 13, wherein the heater is configured so that radiant output commensurate with peak heat absorption is substantially steady and continuous throughout the drying time period.

20. The treatment station of claim 13, wherein the heater is configures so that IR radiant energy, of the at least one IR radiation source, impinging a surface of material making up the container is substantially steady and continuous throughout the dry time period.

21. The treatment station of claim 13, wherein the at least one IR radiation source is disposed in the sealed environment so that an IR radiation source facet of the at least one IR radiation source faces each containment side of the container.

22. The treatment station of claim 13, wherein the at least one IR radiation source facet has as a shape that conforms substantially close to containment sides of the at least one container so thatAtty. Docket No. 1229P017072-W0(EQV) EFS-WEB at least one respective IR radiation source facet is juxtaposed proximate each containment side of the at least one container.

23. The treatment station of claim 13, wherein each containment side is irradiated directly fy IR radiation emitted by the respective IR radiation source facet juxtaposed proximate the containment side.

24. The treatment station of claim 13, wherein the optimal drying time period is effected for the container with each containment side dried substantially in entirety by IR radiation of the respective IR radiation source facet impinging the juxtaposed proximate containment side.

25. The treatment station of claim 13, wherein the radiant output spectrum is selectable in conformance with drying the at least one container within the optimal drying time.

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